WO2018093034A1 - Quantum dot dispersion liquid, self-luminescent photosensitive resin composition, color filter prepared by using same and image display device - Google Patents

Quantum dot dispersion liquid, self-luminescent photosensitive resin composition, color filter prepared by using same and image display device Download PDF

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Publication number
WO2018093034A1
WO2018093034A1 PCT/KR2017/010278 KR2017010278W WO2018093034A1 WO 2018093034 A1 WO2018093034 A1 WO 2018093034A1 KR 2017010278 W KR2017010278 W KR 2017010278W WO 2018093034 A1 WO2018093034 A1 WO 2018093034A1
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Prior art keywords
acetate
methyl
quantum dot
acid
ester
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PCT/KR2017/010278
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French (fr)
Korean (ko)
Inventor
왕현정
김주호
김형주
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동우화인켐 주식회사
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Priority to CN201780070674.0A priority Critical patent/CN109952360B/en
Priority to JP2019525834A priority patent/JP6778818B2/en
Publication of WO2018093034A1 publication Critical patent/WO2018093034A1/en

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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • C09K11/0805Chalcogenides
    • C09K11/0811Chalcogenides with zinc or cadmium
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/08Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials
    • C09K11/54Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing zinc or cadmium
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • G02B5/223Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0048Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Definitions

  • the present invention relates to a quantum dot dispersion, a self-luminous photosensitive resin composition, and a color filter manufactured using the same, which are excellent in dispersing properties and harmless to a human body.
  • the color filter is a thin film type optical component that extracts three colors of red, green, and blue from white light and makes them possible in fine pixel units.
  • the size of one pixel is about tens to hundreds of micrometers.
  • Such a color filter includes a black matrix layer formed in a predetermined pattern on a transparent substrate to shield the boundary between each pixel, and a plurality of colors (typically red (R), green (G) and The pixel units in which the three primary colors of blue (B) are arranged in a predetermined order are stacked in this order.
  • color filters are used in various fields, including various image display devices, not only excellent pattern characteristics but also high color reproducibility and excellent performance such as high brightness and high contrast ratio are required.
  • a color filter manufacturing method using the self-luminous photosensitive resin composition containing is proposed.
  • Korean Patent Laid-Open Publication No. 2006-0084668 relates to a quantum dot phosphor, and discloses a light emitting diode which maintains excellent light emission efficiency by including a quantum dot and a solid carrier supporting the quantum dot.
  • the Republic of Korea Patent Publication No. 2006-0084668 uses a solvent harmful to the human body such as chloroform, toluene, hexane and the like excellent dispersibility as a dispersing solvent for dispersing the quantum dot phosphor.
  • Solvents described above are highly volatile compounds (Volatile Organic Compound) or carcinogenic, neurotoxic, and have a high risk of abnormal reproductive function.
  • Patent Document 1 Republic of Korea Patent Publication No. 2006-0084668 (2006.07.25)
  • An object of the present invention is to provide a quantum dot dispersion liquid, harmless to the human body and excellent in dispersibility, and a self-luminous photosensitive resin composition comprising the same.
  • an object of the present invention is to provide a color filter and an image display device having excellent luminescence properties manufactured using the quantum dot dispersion liquid and the self-luminous photosensitive resin composition described above.
  • the quantum dot dispersion according to the present invention for achieving the above object comprises a quantum dot and a solvent, the solvent satisfies the conditions of the Hansen solubility parameter of the following formula (1), halogenated hydrocarbon solvent; Aromatic hydrocarbon solvents; And aliphatic hydrocarbon solvents.
  • ⁇ d is the dispersion component
  • ⁇ p is the polar component
  • ⁇ h is the hydrogen bonding component
  • the present invention is a quantum dot dispersion described above; And an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, an additional solvent, and an additive.
  • the self-luminous photosensitive resin composition further comprises one or more selected from the group consisting of:
  • the present invention provides a color filter including a cured product of the above-described self-luminous photosensitive resin composition and an image display apparatus including the same.
  • the quantum dot dispersion of the present invention is excellent in dispersing characteristics, there is an advantage that does not contain a human toxic substance, the self-luminous photosensitive resin composition comprising the same also has the above advantages.
  • the color filter manufactured by using the self-luminous photosensitive resin composition of the present invention and an image display device including the same have excellent light emission characteristics.
  • a member when a member is located "on" another member, this includes not only when one member is in contact with another member but also when another member exists between the two members.
  • One aspect of the invention relates to a quantum dot dispersion.
  • one embodiment of the present invention comprises a quantum dot and a solvent, the solvent satisfies the conditions of the Hansen solubility parameter of the following equation (1), halogenated hydrocarbon-based solvents; Aromatic hydrocarbon solvents; And an aliphatic hydrocarbon solvent; and a quantum dot dispersion liquid not included.
  • ⁇ d is the dispersion component
  • ⁇ p is the polar component
  • ⁇ h is the hydrogen bonding component
  • Quantum dot dispersions in accordance with an aspect of the present invention include quantum dots.
  • the quantum dots may refer to nanoscale semiconductor materials. Atoms form molecules, and molecules form clusters of small molecules called clusters that form nanoparticles, which are called quantum dots when they are semiconducting. When the quantum dots reach the excited state from the outside, the quantum dots emit energy according to their corresponding energy bandgap.
  • the color filter made of the self-luminous photosensitive resin composition containing the quantum dot dispersion liquid according to one embodiment of the present invention can emit light (luminescence) by light irradiation by including the quantum dots.
  • a typical image display apparatus including a color filter
  • white light is transmitted through the color filter to implement color.
  • a part of the light is absorbed by the color filter, thereby degrading light efficiency.
  • the color filter made of the self-luminous photosensitive resin composition according to the present invention since the color filter is self-luminous by the light of the light source, it is possible to implement more excellent light efficiency, and also emit light with color Since the color reproducibility is excellent, and the light is emitted in all directions by the photoluminescence, the viewing angle is also improved.
  • the quantum dot is not particularly limited as long as it is a quantum dot particle capable of emitting light by stimulation caused by light.
  • the II-VI semiconductor compound may be selected from the group consisting of CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, and mixtures thereof; CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe And an elemental compound selected from the group consisting of CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnS, H
  • the group III-V semiconductor compound may be selected from the group consisting of GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, and mixtures thereof; Three-element compounds selected from the group consisting of GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP and mixtures thereof; And an elemental compound selected from the group consisting of GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, InAlPSb and mixtures thereof.
  • the Group IV-VI semiconductor compound may be selected from the group consisting of SnS, SnSe, SnTe, PbS, PbSe, PbTe, and mixtures thereof; A three-element compound selected from the group consisting of SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, and mixtures thereof; And SnPbSSe, SnPbSeTe, SnPbSTe, and one or more selected from the group consisting of an elemental compound selected from the group consisting of mixtures thereof, but are not limited thereto.
  • the group IV element or a compound including the same may include an element compound selected from the group consisting of Si, Ge, and mixtures thereof; And a binary element compound selected from the group consisting of SiC, SiGe, and mixtures thereof.
  • the quantum dots are homogeneous single structures; Dual structures such as core-shell, gradient structures, and the like; Or a mixed structure thereof.
  • the material constituting each core and shell may be made of the above-mentioned different semiconductor compounds.
  • the core may include one or more materials selected from the group consisting of CdSe, CdS, ZnS, ZnSe, CdTe, CdSeTe, CdZnS, PbSe, AgInZnS, and ZnO, but is not limited thereto.
  • the shell may include one or more materials selected from the group consisting of CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe, and HgSe, but is not limited thereto.
  • the quantum dots may be synthesized by a wet chemical process, a metal organic chemical vapor deposition (MOCVD), or a molecular beam epitaxy (MBE), but are not limited thereto. .
  • MOCVD metal organic chemical vapor deposition
  • MBE molecular beam epitaxy
  • the wet chemical process is a method of growing a particle by adding a precursor material to an organic solvent.
  • the organic solvent naturally coordinates the surface of the quantum dot crystal and acts as a dispersant to control the growth of the crystal. Therefore, the nano solvent is easier and cheaper than the vapor deposition method such as the organometallic chemical vapor deposition process or molecular beam epitaxy. Since the growth of the particles can be controlled, it is preferred to produce the quantum dots according to the invention using the wet chemical process.
  • the quantum dots may further include an organic ligand.
  • the organic ligand may be bound to the surface of the quantum dots to serve to stabilize the quantum dots.
  • the organic ligand is not limited in the present invention, such as C5 to C20 alkyl carboxylic acid, alkenyl carboxylic acid or alkynyl carboxylic acid; Alkyl carboxylic acids, al, C5 to C20, which may include thiol, phosphoric acid, pyridine, mercapto alcohol, phosphine, phosphine oxide, etc., and in terms of improving stability by effectively protecting the surface of the quantum dot.
  • Kenyl carboxylic acid or alkynyl carboxylic acid It is preferable to include one or more selected from the group consisting of thiol and phosphoric acid.
  • the organic ligand may cover 5% or more of the surface of the total area of the quantum dots.
  • the organic ligand may be included in the quantum dot dispersion in the form of a commercially available form, or may be added directly to the quantum dot dispersion when not included in the quantum dot dispersion, and the organic ligand may be added directly to the quantum dot dispersion.
  • the content may be added in an amount of 0.1 to 10 moles with respect to 1 mole of the quantum dot.
  • the quantum dots may be included in 5 to 70% by weight, preferably 10 to 65% by weight, more preferably 15 to 60% by weight relative to the total 100% by weight of the quantum dot dispersion. .
  • the quantum dot is included in the above range, it is possible to provide a self-luminous photosensitive resin composition having excellent photosensitivity.
  • the quantum dot is included in the range below the photosensitive properties may be slightly reduced, and when included in excess of the above range, the content of the other components, such as alkali-soluble resin, photopolymerizable compound to be described later in contrast to the quantum dot Since it is relatively small, there is a problem that the manufacture of the color filter may be somewhat difficult, so it is preferably included within the above range.
  • the quantum dot dispersion according to the present invention has an advantage of uniformly dispersing the quantum dots by including a solvent that satisfies the conditions of the Hansen solubility parameter of Equation 1 below, halogenated hydrocarbon solvent such as chloroform or dichloromethane harmful to human body; Aromatic hydrocarbon solvents such as benzene or toluene; And aliphatic hydrocarbon-based solvents such as N-hexane, there is an advantage that can prevent workers to deal with this dangerous environment such as carcinogenicity, neurotoxicity, causing reproductive dysfunction.
  • halogenated hydrocarbon solvent such as chloroform or dichloromethane harmful to human body
  • Aromatic hydrocarbon solvents such as benzene or toluene
  • aliphatic hydrocarbon-based solvents such as N-hexane
  • ⁇ d is the dispersion component
  • ⁇ p is the polar component
  • ⁇ h is the hydrogen bonding component
  • the solvent may specifically include one or more selected from the group consisting of ether and ester having 6 to 10 carbon atoms, in which case the dispersibility is improved and includes the same.
  • the solvent is specifically methyl isoamyl ketone, diisobutyl ketone, diethyl carbonate, ethyl butyrate, ethyl isobutyrate, tert-butyl acetate, isopropyl propionate, methyl-3-methylbutanoate, propyl Propionate, methyl 2-methyl butanoate, sec-butyl acetate, methyl pentanoate, isobutyl acetate, butyl acetate, methyl pibarate, sec-butyl propionate, n-butyl propionate, 2-methyl Butyl acetate, ethyl 2-methylbutyrate, methyl 2-methylpentanoate, 2-pentyl acetate, neopentyl acetate, 3-methylbutan-2-yl acetate, isopropyl isobutyrate, propyl isobutyrate, ethyl isovalerate, Methyl 3-methyl
  • the said solvent can be used individually or in mixture of 2 or more types, respectively.
  • the content of the solvent may be included in 5 to 95% by weight, preferably 20 to 90% by weight, more preferably 30 to 80% by weight relative to 100% by weight of the total quantum dot dispersion. If the solvent is included in less than the above range may cause a problem that the dispersibility deteriorates, if it exceeds the above range may cause a problem that it is difficult to control the solid content of the resin composition.
  • the quantum dot dispersion of the present invention the solvent as a whole satisfies the above-described conditions of the solvent, that is, the Hansen solubility parameter of the above formula (1), halogenated hydrocarbon solvent; Aromatic hydrocarbon solvents; And an aliphatic hydrocarbon solvent; satisfies a condition not included. Therefore, according to one embodiment of the present invention, even if the individual solvent component in the quantum dot dispersion of the present invention does not satisfy the Hansen solubility parameter of Equation 1 above, the entire solvent composed of these satisfies the Hansen solubility parameter of Equation 1 .
  • the quantum dot dispersion may further include a phosphate ester compound.
  • the phosphate ester compound is further included, the dispersibility between the quantum dot and the solvent is improved, and thus, the quantum efficiency is excellent, and the light efficiency is lowered and the photosensitive characteristic can be suppressed.
  • the phosphate ester compound may include a form in which a hydroxy group or a hydrogen atom of a hydroxy group present in phosphate ester ((HO) 2 PO (OR)) or phosphoric acid (H 3 PO 4 ) is substituted or unsubstituted with another functional group.
  • the phosphate ester compound may be represented in the form of (H 2 PO 3 ⁇ ), but is not limited thereto.
  • the "phosphate ester type" may include at least one selected from the group consisting of phosphorous acid derivatives, phosphoric acid derivatives, phosphonic acid derivatives, and phosphinic acid derivatives.
  • the phosphate ester compound may further include at least one of a polyether moiety, a polyester moiety, and a phosphate group in one molecule.
  • poly- may refer to a compound composed of a large number of repeating units
  • the "polyether portion” and “polyester portion” may have 1 to 20 repeating units each containing an ether group or an ester group. It can be referred to as a part consisting of.
  • the repeating unit may be composed of 5 to 20, more preferably 10 to 20, in this case there is an excellent compatibility.
  • the phosphate ester compound further includes a polyether moiety in one molecule
  • compatibility with alkali-soluble resins to be described later is improved
  • the phosphate ester compound further includes a polyester moiety in one molecule.
  • the compatibility with the alkali-soluble resin and the dissolution characteristics for the alkaline developer are improved.
  • the phosphate ester compound may serve as a protective layer through adsorption on the surface of the quantum dot, and has the advantage of deagglomerating the quantum dot.
  • the phosphate ester compound according to the present invention may include a polyether moiety, a polyester moiety, and a phosphate group in one molecule, in which case deagglomeration of quantum dots reduces the particle size of the dispersion, and compatibility with alkali-soluble resins. And dissolution properties in alkaline developing solution, which is advantageous because it has an advantageous advantage in pattern formation.
  • the "acid value” is a value measured as the amount (mg) of potassium hydroxide required to neutralize 1 g of the acrylic polymer and may be involved in solubility in the self-luminous photosensitive resin composition described later.
  • the acid value of the phosphate ester compound is 10 (KOHmg / g) or more, specifically 10 to 200 (KOHmg / g) is preferable in terms of the development rate of the self-luminous photosensitive resin composition containing the surface treatment agent.
  • the acid value When the acid value is less than the above range, it may be somewhat difficult to secure a sufficient developing speed, and when the acid value exceeds the above range, adhesion to the substrate may be reduced, thereby causing short circuiting of the pattern, and lowering the storage stability of the overall composition to increase the viscosity. Since the problem may occur, it is preferable to satisfy the above range.
  • the phosphoric acid ester compound may be included in an amount of 1 to 300 parts by weight, preferably 3 to 250 parts by weight, and more preferably 5 to 200 parts by weight, based on 100 parts by weight of the total quantum dot solids.
  • the surface treating agent is included in the above range, the deagglomeration effect of the quantum dots is excellent, and the precipitation phenomenon due to the polarity difference in the quantum dot dispersion liquid and the self-luminous photosensitive resin composition including the same according to the present invention is possible, and color filter manufacture It is preferable because it can act as a protective layer of the quantum dots in the process.
  • the phosphate ester compound When the phosphate ester compound is included in the range below, the deagglomeration effect of the quantum dots may be slightly lowered. When the phosphate ester compound is included in the range above, the development characteristics of the self-luminous photosensitive resin composition including the quantum dot dispersion may be slightly lowered. Since it is possible, it is preferable to be included in the above range.
  • Another aspect of the invention is a quantum dot dispersion described above; And an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, an additional solvent, and at least one selected from the group consisting of additives.
  • the quantum dot dispersion described above is 3 to 80% by weight, preferably 5 to 70% by weight, more preferably 10 to 60% by weight based on 100% by weight of the total of the self-luminous photosensitive resin composition May contain%.
  • the self-luminous photosensitive resin composition according to the present invention includes the above-described quantum dot dispersion in the above range, there is an advantage in that a color filter having excellent light emission characteristics can be manufactured.
  • the quantum dot dispersion When the quantum dot dispersion is included in the range below the light emission characteristics may be slightly reduced, when the quantum dot dispersion is included in the above range, the formation of the pattern may be somewhat difficult as the content of the other composition is reduced, the reliability Since it may be lowered, it is preferable to be included in the above range.
  • the self-luminous photosensitive resin composition according to the present invention may further include an alkali-soluble resin.
  • the alkali-soluble resin may serve to make the non-exposed part of the color filter made of the self-luminous photosensitive resin composition alkali-soluble and to remove it, and to leave the exposure area.
  • the quantum dots may be evenly dispersed in the composition, and may serve to maintain the brightness by protecting the quantum dots during the process.
  • the alkali-soluble resin according to the present invention can be selected to have an acid value of 50 to 200 (KOHmg / g).
  • the "acid value” is a value measured as the amount (mg) of potassium hydroxide required to neutralize 1 g of the acrylic polymer and is involved in solubility.
  • the acid value of the alkali-soluble resin is less than the above range, it may be difficult to secure a sufficient developing speed, when the acid value of the alkali-soluble resin is exceeded, the adhesion to the substrate is reduced, the short circuit of the pattern is likely to occur, the storage stability of the entire composition is lowered viscosity The problem may arise.
  • the alkali-soluble resin may consider the limitation of the molecular weight and the molecular weight distribution (Mw / Mn) in order to improve the surface hardness for use as a color filter.
  • Mw / Mn molecular weight distribution
  • the weight average molecular weight is 3,000 to 30,000, preferably 5,000 to 20,000
  • the molecular weight distribution is 1.5 to 6.0, preferably 1.8 to 4.0 to directly polymerize or purchase and use.
  • Alkali-soluble resins having a molecular weight and molecular weight distribution in the above range can be improved in the hardness already mentioned, as well as high residual film ratio, solubility of the non-exposed portion in the developing solution can be excellent and the resolution can be improved.
  • the alkali-soluble resin includes at least one member selected from the group consisting of polymers of carboxyl group-containing unsaturated monomers, copolymers with monomers having unsaturated bonds copolymerizable therewith, and combinations thereof.
  • the carboxyl group-containing unsaturated monomer may be unsaturated monocarboxylic acid, unsaturated dicarboxylic acid, unsaturated tricarboxylic acid, or the like.
  • unsaturated monocarboxylic acid acrylic acid, methacrylic acid, crotonic acid, (alpha)-chloroacrylic acid, cinnamic acid etc. are mentioned, for example.
  • unsaturated dicarboxylic acid maleic acid, a fumaric acid, itaconic acid, a citraconic acid, a mesaconic acid, etc. are mentioned, for example.
  • the unsaturated polyhydric carboxylic acid may be an acid anhydride, and specific examples thereof include maleic anhydride, itaconic anhydride and citraconic anhydride.
  • unsaturated polyhydric carboxylic acid may be mono (2-methacryloyloxyalkyl) ester, for example, succinic acid mono (2-acryloyloxyethyl), succinic acid mono (2-methacryloyloxyethyl) And phthalic acid mono (2-acryloyloxyethyl), phthalic acid mono (2-methacryloyloxyethyl) and the like.
  • the unsaturated polyhydric carboxylic acid may be mono (meth) acrylate of the sock end dicarboxy polymer, and examples thereof include? -Carboxypolycaprolactone monoacrylate and? -Carboxypolycaprolactone monomethacrylate.
  • These carboxyl group-containing monomers can be used individually or in mixture of 2 or more types, respectively.
  • monomers copolymerizable with carboxyl group-containing unsaturated monomers include aromatic vinyl compounds, unsaturated carboxylic acid ester compounds, unsaturated carboxylic acid aminoalkyl ester compounds, unsaturated carboxylic acid glycidyl ester compounds, carboxylic acid vinyl ester compounds, unsaturated ether compounds, vinyl cyanide compounds, One type selected from the group consisting of an unsaturated imide compound, an aliphatic conjugated diene compound, a macromonomer having a monoacryloyl group or a monomethacryloyl group at the terminal of the molecular chain, a bulky monomer, and a combination thereof is possible.
  • the copolymerizable monomer may be styrene, ⁇ -methylstyrene, o-vinyltoluene, m-vinyltoluene, p-vinyltoluene, p-chlorostyrene, o-methoxystyrene, m-methoxystyrene, p- Methoxy styrene, o-vinyl benzyl methyl ether, m-vinyl benzyl methyl ether, p-vinyl benzyl methyl ether, o-vinyl benzyl glycidyl ether, m-vinyl benzyl glycidyl ether, p-vinyl benzyl glycidyl Aromatic vinyl compounds such as ether and indene; Methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl g
  • Macromonomers having; Bulky monomers, such as a monomer having a norbornyl skeleton, a monomer having an adamantane skeleton, and a monomer having a rosin skeleton, can lower the dielectric constant.
  • the alkali-soluble resin may be included in 5 to 80% by weight, specifically 10 to 70% by weight, more specifically 15 to 60% by weight based on 100% by weight of the total solid content of the self-luminous photosensitive resin composition.
  • the solubility in the developing solution is sufficient, so that pattern formation is easy, and the film reduction of the pixel portion of the exposed portion is prevented at the time of development, so that the dropping of the non-pixel portion is good, which is preferable.
  • the alkali-soluble resin is included in less than the above range, the non-pixel portion may be somewhat missing, and when the alkali-soluble resin is included in more than the above range, the solubility in the developing solution is slightly lowered may be somewhat difficult to form a pattern.
  • the photopolymerizable compound which may be further included in the self-luminous photosensitive resin composition of the present invention is a compound which can be polymerized by the action of light and a photopolymerization initiator to be described later, and may include monofunctional monomers, bifunctional monomers, other polyfunctional monomers, and the like. have.
  • the kind of the monofunctional monomer is not particularly limited, and for example, nonylphenylcarbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexyl carbitol acrylate, 2-hydroxyethyl acryl
  • the rate, N-vinylpyrrolidone, etc. are mentioned.
  • the kind of the said bifunctional monomer is not specifically limited, For example, 1, 6- hexanediol di (meth) acrylate, ethylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, and triethylene Glycol di (meth) acrylate, bis (acryloyloxyethyl) ether of bisphenol A, 3-methylpentanediol di (meth) acrylate, and the like.
  • the kind of the polyfunctional monomer is not particularly limited, and examples thereof include trimethylolpropane tri (meth) acrylate, ethoxylated trimethylol propane tri (meth) acrylate, and propoxylated trimethylolpropane tree (meth).
  • the photopolymerizable compound may be included in an amount of 5 to 70% by weight, specifically 10 to 60% by weight, and more specifically 15 to 50% by weight, based on 100% by weight of the total solid of the self-luminous photosensitive resin composition.
  • the photopolymerizable compound is included in the above range, there is a preferable advantage in terms of intensity or smoothness of the pixel portion.
  • the intensity of the pixel portion may be lowered slightly, and when the photopolymerizable compound is included in the above range, smoothness may be slightly lowered, so it is preferably included within the range. .
  • the self-luminous photosensitive resin composition according to the present invention may further include a photopolymerization initiator, and the photopolymerization initiator may be used without particular limitation as long as it can polymerize the photopolymerizable compound.
  • the photopolymerization initiator is an acetophenone compound, a benzophenone compound, a triazine compound, a biimidazole compound, an oxime compound, and a thioxanthone compound in terms of polymerization properties, start efficiency, absorption wavelength, availability, and price. It is preferable to use at least one compound selected from the group consisting of compounds.
  • acetophenone-based compound examples include diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyl dimethyl ketal, 2-hydroxy-1- [4- (2-hydroxy Hydroxyethoxy) phenyl] -2-methylpropan-1-one, 1-hydroxycyclohexylphenyl ketone, 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butan-1-one, 2-hydroxy-2-methyl-1- [4- (1-methylvinyl) phenyl] propane-1 -One, 2- (4-methylbenzyl) -2- (dimethylamino) -1- (4-morpholinophenyl) butan-1-one, and the like.
  • benzophenone type compound for example, benzophenone, methyl o-benzoyl benzoate, 4-phenylbenzophenone, 4-benzoyl-4'-methyldiphenyl sulfide, 3,3 ', 4,4'- tetra ( tert-butylperoxycarbonyl) benzophenone, 2,4,6-trimethylbenzophenone, and the like.
  • triazine-based compound examples include 2,4-bis (trichloromethyl) -6- (4-methoxyphenyl) -1,3,5-triazine and 2,4-bis (trichloromethyl) -6 -(4-methoxynaphthyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6-piperonyl-1,3,5-triazine, 2,4-bis (Trichloromethyl) -6- (4-methoxystyryl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (5-methylfuran-2- Yl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (furan-2-yl) ethenyl] -1,3,5-triazine , 2,4-bis (trichloromethyl) -6- [2- (furan
  • biimidazole compound examples include 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2,3-dichloro Phenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetra (alkoxyphenyl) biimidazole , 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetra (trialkoxyphenyl) biimidazole, 2,2-bis (2,6-dichlorophenyl) -4, The imidazole compound etc.
  • oxime compound examples include o-ethoxycarbonyl- ⁇ -oxyimino-1-phenylpropan-1-one and the like, and commercially available BASF Irgacure OXE 01 and OXE 02 are typical examples.
  • thioxanthone type compound 2-isopropyl thioxanthone, 2, 4- diethyl thioxanthone, 2, 4- dichloro thioxanthone, 1-chloro-4- propoxy thioxanthone, etc. are mentioned, for example. There is this.
  • the photopolymerization initiator may be included in an amount of 0.1 to 20% by weight, preferably 0.5 to 15% by weight, and more preferably 1 to 10% by weight, based on 100% by weight of the total solid of the self-luminous photosensitive resin composition.
  • the self-luminous photosensitive resin composition may be highly sensitive, and thus the exposure time may be shortened, so that productivity may be improved and high resolution may be maintained.
  • strength of the pixel part formed using the self-luminous photosensitive resin composition concerning this invention, and smoothness in the surface of the said pixel part become favorable.
  • the photopolymerization initiator may further include a photopolymerization initiation aid in order to improve the sensitivity of the self-luminous photosensitive resin composition in the present invention.
  • a photopolymerization start adjuvant When the photopolymerization start adjuvant is included, there is an advantage in that the sensitivity is higher and the productivity is improved.
  • the photopolymerization initiation assistant may be preferably used, for example, at least one compound selected from the group consisting of an amine compound, a carboxylic acid compound, and an organic sulfur compound having a thiol group, but is not limited thereto.
  • an aromatic amine compound as the amine compound, and specifically, aliphatic amine compounds such as triethanolamine, methyl diethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, 4- Dimethylaminobenzoic acid isoamyl, 4-dimethylaminobenzoic acid 2-ethylhexyl, benzoic acid 2-dimethylaminoethyl, N, N-dimethylparatoluidine, 4,4'-bis (dimethylamino) benzophenone (common name: Michler's ketone ), 4,4'-bis (diethylamino) benzophenone and the like can be used.
  • aliphatic amine compounds such as triethanolamine, methyl diethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, 4- Dimethyl
  • the carboxylic acid compound is preferably an aromatic heteroacetic acid, specifically, phenylthioacetic acid, methylphenylthioacetic acid, ethylphenylthioacetic acid, methylethylphenylthioacetic acid, dimethylphenylthioacetic acid, methoxyphenylthioacetic acid, dimethoxyphenylthioacetic acid, Chlorophenylthioacetic acid, dichlorophenylthioacetic acid, N-phenylglycine, phenoxyacetic acid, naphthylthioacetic acid, N-naphthylglycine, naphthoxyacetic acid, etc. are mentioned.
  • organic sulfur compound having the thiol group examples include 2-mercaptobenzothiazole, 1,4-bis (3-mercaptobutyryloxy) butane, 1,3,5-tris (3-mercaptobutyloxyethyl)- 1,3,5-triazine-2,4,6 (1H, 3H, 5H) -trione, trimethylolpropanetris (3-mergaptopropionate), pentaerythritol tetrakis (3-mercaptobutyl Late), pentaerythritol tetrakis (3-mercaptopropionate), dipentaerythritol hexakis (3-mercaptopropionate), tetraethylene glycol bis (3-mercaptopropionate), etc. are mentioned. Can be.
  • the photopolymerization start adjuvant can be appropriately added and used within a range that does not impair the scope of the present invention.
  • the additional solvent that may be further included in the self-luminous photosensitive resin composition of the present invention is not particularly limited, and may include an organic solvent commonly used in the art, which may be the same as the solvent contained in the quantum dot dispersion of the present invention. May be different.
  • the additional solvent include alkylene glycol alkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol methylethyl ether, Diethylene glycol dialkyl ethers such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether and diethylene glycol dibutyl ether; Alkylene glycol alkyl ether acetates such as methyl cellosolve acetate, ethyl cellosolve acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, and the like; Alkoxyalkyl acetates such as methoxybutyl acetate and methoxypent
  • the above additional solvent is preferably an organic solvent having a boiling point of 100 ° C to 200 ° C in the above additional solvent, more preferably alkylene glycol alkyl ether acetates, ketones, 3- Ester, such as ethyl ethoxy propionate and methyl 3-methoxy propionate, is mentioned, More preferably, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, 3-ethoxy propionate ethyl, 3-methoxy Methyl propionate etc. are mentioned.
  • These additional solvents can be used individually or in mixture of 2 or more types, respectively.
  • the total solvent (solvent in quantum dot dispersion and additional solvent) contained in the self-luminous photosensitive resin composition of the present invention is 20 to 90% by weight, preferably 25 to 85% by weight, based on 100% by weight of the total self-luminous photosensitive resin composition, More preferably, it may be included in 30 to 80% by weight. If the total solvent content is within the above range, the applicability may be improved when applied with a coating device such as a roll coater, spin coater, slit and spin coater, slit coater (sometimes referred to as die coater), inkjet, or the like. It is preferable. When the content of the total solvent is included in less than the above range, the process may be somewhat difficult as the applicability is slightly lowered. If the total solvent is exceeded, the performance of the color filter formed of the self-luminous photosensitive resin composition may be slightly lowered. Problems can arise.
  • the self-luminous photosensitive resin composition according to the present invention may further include an additive such as an adhesion promoter and a surfactant to enhance the coating property or adhesion.
  • the adhesion promoter may include a silane coupling agent having a reactive substituent selected from the group consisting of carboxyl groups, methacryloyl groups, isocyanate groups, epoxy groups, and combinations thereof, which may be added to increase adhesion to the substrate. It is not limited.
  • the silane coupling agent is trimethoxysilyl benzoic acid, ⁇ -methacryl oxypropyl trimethoxy silane, vinyltriacetoxysilane, vinyl trimethoxysilane, ⁇ -isocyanate propyl triethoxysilane, ⁇ -glycidoxy If propyl trimethoxysilane, (beta)-(3, 4- epoxycyclohexyl) ethyltrimethoxysilane, etc. are mentioned, these can be used individually and in combination of 2 or more types.
  • the self-luminous photosensitive resin composition according to the present invention includes the surfactant
  • the surfactant is BM-1000, BM-1100 (BM Chemie Co., Ltd.), Proride FC-135 / FC-170C / FC-430 (Sumitomo 3M Co., Ltd.), SH-28PA / -190 / SZ-6032 (Dore Siri).
  • Fluorine-based surfactants such as Corn Co., Ltd. may be used, but is not limited thereto.
  • the self-luminous photosensitive resin composition according to the present invention may further include additives such as antioxidants, ultraviolet absorbers and anti-agglomerating agents in a range that does not impair the effects of the present invention, the additives also inhibit the effects of the present invention It can be used by those skilled in the art as long as it does not.
  • the additive may be used in an amount of 0.05 to 10 parts by weight, specifically 0.1 to 10 parts by weight, more specifically 0.1 to 5 parts by weight based on the total weight of the self-luminous photosensitive resin composition, but is not limited thereto.
  • Yet another aspect of the present invention relates to a color filter manufactured using the above-described self-luminous photosensitive resin composition.
  • the color filter according to the present invention includes the cured product of the self-luminous photosensitive resin composition including the quantum dot dispersion liquid of the present invention, the quantum dot particles are uniformly dispersed, thereby providing excellent light emission characteristics.
  • the color filter includes a substrate and a pattern layer formed on the substrate.
  • the substrate may be the substrate of the color filter itself, or may be a portion where the color filter is positioned in a display device or the like, and is not particularly limited.
  • the substrate may be glass, silicon (Si), silicon oxide (SiOx), or a polymer substrate, and the polymer substrate may be polyethersulfone (PES) or polycarbonate (PC).
  • the pattern layer is a layer including the self-luminous photosensitive resin composition of the present invention, and may be a layer formed by applying the self-luminous photosensitive resin composition and exposing, developing and thermosetting in a predetermined pattern.
  • the pattern layer may be formed by performing a method commonly known in the art.
  • the color filter including the substrate and the pattern layer may further include a partition formed between each pattern, and may further include a black matrix, but is not limited thereto.
  • a protective film formed on the pattern layer of the color filter may be further included.
  • the color filter may include one or more selected from the group consisting of a red pattern layer, a green pattern layer, and a blue pattern layer.
  • the color filter may include one or more selected from the group consisting of a red pattern layer including a red quantum dot, a green pattern layer including a green quantum dot, and a blue pattern layer including a blue quantum dot according to the present invention.
  • the red pattern layer, the green pattern layer, and the blue pattern layer may respectively emit red light, green light, and blue light when irradiated with light.
  • the emission light of the light source is not particularly limited, but blue light may be generated in terms of better color reproducibility.
  • a light source that emits can be used.
  • the color filter may include only a pattern layer of two colors among the red pattern layer, the green pattern layer, and the blue pattern layer, but is not limited thereto. However, when the color filter includes only the pattern layer of two colors, the pattern layer may further include a transparent pattern layer containing no quantum dot particles.
  • a light source emitting light having a wavelength representing a color other than the two colors may be used.
  • a light source emitting blue light may be used.
  • red quantum dots emit red light and green quantum dots emit green light
  • the transparent pattern layer may As the blue light transmitted by the light source is transmitted as it is, blue can be obtained.
  • Another aspect of this invention is related with the image display apparatus containing the color filter mentioned above.
  • the color filter of the present invention can be applied to various image display devices such as electroluminescent display devices, plasma display devices, field emission display devices, as well as ordinary liquid crystal display devices.
  • the image display device includes the color filter made of the cured product of the self-luminous photosensitive resin composition containing the quantum dot dispersion liquid of the present invention, thereby exhibiting excellent light emission characteristics.
  • the image display apparatus may further include a light source emitting blue light and a transparent pattern layer, and the above-described information may be applied to the light source emitting blue light and the transparent pattern layer.
  • Quantum dot dispersions were prepared by mixing the components (quantum dots and solvents) and contents shown in Table 1 below, and Hansen solubility parameters of each preparation example (Preparation Examples 1-1 to 1-11) were also described in Table 1 below.
  • a flask equipped with a stirrer, a thermometer reflux condenser, a dropping lot, and a nitrogen introduction tube was prepared, 45 parts by weight of N-benzylmaleimide, 45 parts by weight of methacrylic acid, 10 parts by weight of tricyclodecyl methacrylate, and t-butyl 4 parts by weight of peroxy-2-ethylhexanoate and 40 parts by weight of propylene glycol monomethyl ether acetate (hereinafter referred to as "PGMEA”) were added, followed by stirring and mixing to prepare a monomer dropping lot, and n-dodecanethiol 6 weight Part and 24 parts by weight of PGMEA were added and stirred to prepare a chain transfer dropper lot.
  • PGMEA propylene glycol monomethyl ether acetate
  • the color filter was manufactured using the self-luminous photosensitive resin composition prepared in Examples 1 to 7 and Comparative Examples 1 to 4 below. Specifically, each of the self-luminous photosensitive resin composition was applied on a glass substrate by spin coating, then placed on a heating plate and maintained at a temperature of 100 ° C. for 3 minutes to form a thin film. Subsequently, a test photomask having a 20 mm ⁇ 20 mm square transmission pattern and a line / space pattern of 1 ⁇ m to 100 ⁇ m was placed on the thin film, and the ultraviolet rays were irradiated with a distance of 100 ⁇ m from the test photomask.
  • the ultraviolet light source was irradiated with an exposure amount (365 nm) of 200 mJ / cm 2 in an air atmosphere using an ultra high pressure mercury lamp (trade name USH-250D) manufactured by Ushio Denki Co., Ltd., and no special optical filter was used.
  • the thin film irradiated with ultraviolet rays was developed by soaking for 80 seconds in a KOH aqueous solution developing solution of pH 10.5.
  • the thin film coated glass plate was washed with distilled water, dried by blowing nitrogen gas, and heated in a heating oven at 150 ° C. for 10 minutes to prepare a color filter pattern.
  • the film thickness of the prepared self-luminous color filter pattern was 3 ⁇ m.
  • Dispersion particle size was measured using ELSZ-2000ZS (manufactured by Otsuka Co., Ltd.) and listed in Table 3 below. As the quantum dot particles aggregate, the dispersion particle size increases.
  • the emission intensity in the 550 nm region of the color filter manufactured in Preparation Example 3 was measured using a spectrometer (manufactured by Ocean Optics, Inc.), and is shown in Table 3 below. It is determined that the greater the measured emission intensity is, the better the self-luminous property is.

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Abstract

A quantum dot dispersion liquid according to the present invention comprises quantum dots and a solvent. The solvent does not comprise a halogenated hydrocarbon solvent, an aromatic hydrocarbon solvent and an aliphatic hydrocarbon solvent and satisfies a particular Hansen solubility parameter condition.

Description

양자점 분산액, 자발광 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상표시장치Quantum dot dispersion, self-luminous photosensitive resin composition, color filter and image display device manufactured using the same
본 발명은 분산 특성이 우수하면서 인체에 무해한 양자점 분산액, 자발광 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터에 관한 것이다. The present invention relates to a quantum dot dispersion, a self-luminous photosensitive resin composition, and a color filter manufactured using the same, which are excellent in dispersing properties and harmless to a human body.
컬러필터는 백색광에서 적색, 녹색 및 청색의 3가지 색을 추출하여 미세한 화소단위로 가능하게 하는 박막 필름형 광학부품으로서, 한 화소의 크기가 수십에서 수백 마이크로미터 정도이다. 이러한 컬러필터는 각각의 화소 사이의 경계부분을 차광하기 위하여 투명 기판 상에 정해진 패턴으로 형성된 블랙 매트릭스 층 및 각각의 화소를 형성하기 위해 복수의 색(통상적으로 적색(R), 녹색(G) 및 청색(B))의 3원색을 정해진 순서로 배열한 화소부가 차례로 적층된 구조를 취하고 있다.The color filter is a thin film type optical component that extracts three colors of red, green, and blue from white light and makes them possible in fine pixel units. The size of one pixel is about tens to hundreds of micrometers. Such a color filter includes a black matrix layer formed in a predetermined pattern on a transparent substrate to shield the boundary between each pixel, and a plurality of colors (typically red (R), green (G) and The pixel units in which the three primary colors of blue (B) are arranged in a predetermined order are stacked in this order.
최근에는 컬러필터를 구현하는 방법 중의 하나로서, 안료 분산형의 감광성 수지를 이용한 안료 분산법이 적용되고 있으나, 광원에서 조사된 광이 컬러필터를 투과하는 과정에서 광의 일부가 컬러필터에 흡수되어 광 효율이 저하되고, 또한 색 필터에 포함되어 있는 안료의 특성으로 인하여 색재현이 저하되는 문제점이 발생하고 있다.Recently, as one of the methods of implementing a color filter, a pigment dispersion method using a pigment-dispersible photosensitive resin has been applied, but a part of the light is absorbed by the color filter while the light emitted from the light source passes through the color filter. The problem is that the efficiency is lowered and the color reproduction is lowered due to the characteristics of the pigment contained in the color filter.
특히, 컬러필터가 각종 화상표시장치를 비롯한 다양한 분야에 사용됨에 따라 우수한 패턴 특성뿐만 아니라 높은 색재현율과 함께 우수한 고휘도, 고명암비와 같은 성능이 요구되고 있는 바, 이러한 문제를 해결하기 위하여, 양자점을 포함하는 자발광 감광성 수지 조성물을 이용한 컬러필터 제조 방법이 제안되었다.In particular, as color filters are used in various fields, including various image display devices, not only excellent pattern characteristics but also high color reproducibility and excellent performance such as high brightness and high contrast ratio are required. A color filter manufacturing method using the self-luminous photosensitive resin composition containing is proposed.
대한민국 공개특허 제2006-0084668호는 양자점 형광체에 관한 것으로서, 양자점 및 상기 양자점을 고정시키는 고체상태의 담지체를 포함함으로써 우수한 발광 효율을 유지하는 발광 다이오드에 관한 내용을 개시하고 있다. Korean Patent Laid-Open Publication No. 2006-0084668 relates to a quantum dot phosphor, and discloses a light emitting diode which maintains excellent light emission efficiency by including a quantum dot and a solid carrier supporting the quantum dot.
하지만, 상기 대한민국 공개특허 제2006-0084668호에서는 상기 양자점 형광체를 분산시키기 위한 분산용제로써 분산성이 우수한 클로로포름, 톨루엔, 헥산 등과 같은 인체에 유해한 용제를 사용하고 있다. 앞서 기술한 용제의 경우 고휘발성 화합물(Volatile Organic Compound)이거나 또는 발암성, 신경독성을 띠고, 생식기능의 이상에 대한 고위험성이 있어 작업자의 취급환경에 대한 엄격한 관리가 필요하다. However, the Republic of Korea Patent Publication No. 2006-0084668 uses a solvent harmful to the human body such as chloroform, toluene, hexane and the like excellent dispersibility as a dispersing solvent for dispersing the quantum dot phosphor. Solvents described above are highly volatile compounds (Volatile Organic Compound) or carcinogenic, neurotoxic, and have a high risk of abnormal reproductive function.
따라서 이러한 양자점을 사용하기 위해서는 건조를 통하여 인체에 유해한 용제를 제거하거나, 분산 용제를 제거한 후 고휘발성 화합물이 아니며, 발암성, 신경독성을 띠지 않고, 생식기능의 이상에 대한 위험성이 없거나 매우 낮은 용제로 치환하는 과정을 거치게 되는데, 이러한 과정에서 양자 효율이 저하되는 현상이 발생하고, 이 때문에 제조되는 컬러필터 또는 화상표시장치의 발광특성이 저하되는 문제가 발생하고 있다.Therefore, in order to use these quantum dots, solvents that are harmful to the human body through drying or dispersing solvents are not removed and are not highly volatile compounds, are not carcinogenic, neurotoxic, and have no or low risk of reproductive function. Subsequently, the quantum efficiency decreases, and thus, the light emission characteristics of the color filter or the image display device are lowered.
그러므로, 양자점에 대한 우수한 분산성을 보이면서, 이를 이용하여 제조되는 컬러필터 또는 화상표시장치의 발광 특성 또한 우수하며, 인체에 유해한 성분을 함유하고 있지 않은 양자점 분산액의 개발이 요구되고 있는 실정이다.Therefore, there is a demand for the development of a quantum dot dispersion liquid that exhibits excellent dispersibility to quantum dots, is excellent in light emission characteristics of a color filter or an image display device manufactured using the same, and does not contain harmful components.
[선행기술문헌][Preceding technical literature]
[특허문헌][Patent Documents]
(특허문헌 1) 대한민국 공개특허 제2006-0084668호(2006.07.25)(Patent Document 1) Republic of Korea Patent Publication No. 2006-0084668 (2006.07.25)
본 발명은 인체에 무해하면서도 분산성이 우수한 양자점 분산액, 이를 포함하는 자발광 감광성 수지 조성물을 제공하는 것을 목적으로 한다. An object of the present invention is to provide a quantum dot dispersion liquid, harmless to the human body and excellent in dispersibility, and a self-luminous photosensitive resin composition comprising the same.
또한, 본 발명은 전술한 양자점 분산액, 자발광 감광성 수지 조성물을 이용하여 제조된 발광특성이 우수한 컬러필터 및 화상표시장치를 제공하는 것을 목적으로 한다.In addition, an object of the present invention is to provide a color filter and an image display device having excellent luminescence properties manufactured using the quantum dot dispersion liquid and the self-luminous photosensitive resin composition described above.
상기 목적을 달성하기 위한 본 발명에 따른 양자점 분산액은 양자점 및 용제를 포함하고, 상기 용제는 하기 수학식 1의 한센 용해도 파라미터(Hansen solubility parameter)의 조건을 만족하며, 할로겐화 탄화수소계 용제; 방향족 탄화수소계 용제; 및 지방족 탄화수소계 용제;는 포함하지 않는 것을 특징으로 한다. The quantum dot dispersion according to the present invention for achieving the above object comprises a quantum dot and a solvent, the solvent satisfies the conditions of the Hansen solubility parameter of the following formula (1), halogenated hydrocarbon solvent; Aromatic hydrocarbon solvents; And aliphatic hydrocarbon solvents.
[수학식 1][Equation 1]
Figure PCTKR2017010278-appb-I000001
Figure PCTKR2017010278-appb-I000001
(상기 수학식 1에서, (In Equation 1,
δd는 분산 성분(dispersion component), δp는 극성 성분(polar component), δh는 수소 결합 성분(hydrogen bonding component)을 의미한다.)δ d is the dispersion component, δ p is the polar component, and δ h is the hydrogen bonding component.)
또한, 본 발명은 전술한 양자점 분산액; 및 알칼리 가용성 수지, 광중합성 화합물, 광중합 개시제, 추가 용제 및 첨가제로 이루어진 군으로부터 선택되는 하나 이상을 더 포함하는 자발광 감광성 수지 조성물을 제공한다. In addition, the present invention is a quantum dot dispersion described above; And an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, an additional solvent, and an additive. The self-luminous photosensitive resin composition further comprises one or more selected from the group consisting of:
또한, 본 발명은 전술한 자발광 감광성 수지 조성물의 경화물을 포함하는 컬러필터 및 이를 포함하는 화상표시장치를 제공한다. In addition, the present invention provides a color filter including a cured product of the above-described self-luminous photosensitive resin composition and an image display apparatus including the same.
본 발명의 양자점 분산액은 분산 특성이 우수하고, 인체 독성 물질을 함유하지 않는 이점이 있으며, 이를 포함하는 자발광 감광성 수지 조성물 또한 상기와 같은 이점이 있다. The quantum dot dispersion of the present invention is excellent in dispersing characteristics, there is an advantage that does not contain a human toxic substance, the self-luminous photosensitive resin composition comprising the same also has the above advantages.
또한, 본 발명의 자발광 감광성 수지 조성물을 이용하여 제조된 컬러필터 및 이를 포함하는 화상표시장치는 발광특성이 우수한 이점이 있다.In addition, the color filter manufactured by using the self-luminous photosensitive resin composition of the present invention and an image display device including the same have excellent light emission characteristics.
이하, 본 발명에 대하여 더욱 상세히 설명한다.Hereinafter, the present invention will be described in more detail.
본 발명에서 어떤 부재가 다른 부재 "상에" 위치하고 있다고 할 때, 이는 어떤 부재가 다른 부재에 접해 있는 경우뿐 아니라 두 부재 사이에 또 다른 부재가 존재하는 경우도 포함한다.In the present invention, when a member is located "on" another member, this includes not only when one member is in contact with another member but also when another member exists between the two members.
본 발명에서 어떤 부분이 어떤 구성요소를 "포함" 한다고 할 때, 이는 특별히 반대되는 기재가 없는 한 다른 구성요소를 제외하는 것이 아니라 다른 구성요소를 더 포함할 수 있는 것을 의미한다.In the present invention, when a part "includes" a certain component, this means that it may further include other components, without excluding the other components unless otherwise stated.
<양자점 분산액><Quantum store dispersion>
본 발명의 한 양태는 양자점 분산액에 관한 것이다. 구체적으로, 본 발명의 한 양태는 양자점 및 용제를 포함하고, 상기 용제는 하기 수학식 1의 한센 용해도 파라미터(Hansen solubility parameter)의 조건을 만족하며, 할로겐화 탄화수소계 용제; 방향족 탄화수소계 용제; 및 지방족 탄화수소계 용제;는 포함하지 않는 양자점 분산액에 관한 것이다. One aspect of the invention relates to a quantum dot dispersion. Specifically, one embodiment of the present invention comprises a quantum dot and a solvent, the solvent satisfies the conditions of the Hansen solubility parameter of the following equation (1), halogenated hydrocarbon-based solvents; Aromatic hydrocarbon solvents; And an aliphatic hydrocarbon solvent; and a quantum dot dispersion liquid not included.
[수학식 1][Equation 1]
Figure PCTKR2017010278-appb-I000002
Figure PCTKR2017010278-appb-I000002
(상기 수학식 1에서, (In Equation 1,
δd는 분산 성분(dispersion component), δp는 극성 성분(polar component), δh는 수소 결합 성분(hydrogen bonding component)을 의미한다.)δ d is the dispersion component, δ p is the polar component, and δ h is the hydrogen bonding component.)
본 발명의 한 양태에 따른 양자점 분산액은 양자점을 포함한다. 상기 양자점은 나노 크기의 반도체 물질을 일컬을 수 있다. 원자가 분자를 이루고, 분자는 클러스터라고 하는 작은 분자들의 집합체를 구성하여 나노 입자를 이루게 되는데, 이러한 나노 입자들이 반도체 특성을 띠고 있을 때 양자점이라고 한다. 상기 양자점은 외부에서 에너지를 받아 들뜬 상태에 이르면, 상기 양자점의 자체적으로 해당하는 에너지 밴드갭에 따른 에너지를 방출하게 된다.Quantum dot dispersions in accordance with an aspect of the present invention include quantum dots. The quantum dots may refer to nanoscale semiconductor materials. Atoms form molecules, and molecules form clusters of small molecules called clusters that form nanoparticles, which are called quantum dots when they are semiconducting. When the quantum dots reach the excited state from the outside, the quantum dots emit energy according to their corresponding energy bandgap.
본 발명의 한 양태에 따른 양자점 분산액을 포함하는 자발광 감광성 수지 조성물로 제조된 컬러필터는 상기 양자점을 포함함으로써 광 조사에 의해 발광(광 루미네선스(luminescence))할 수 있다.The color filter made of the self-luminous photosensitive resin composition containing the quantum dot dispersion liquid according to one embodiment of the present invention can emit light (luminescence) by light irradiation by including the quantum dots.
컬러필터를 포함하는 통상의 화상표시장치에서는 백색광이 상기 컬러필터를 투과하여 컬러가 구현되는데, 이 과정에서 광의 일부가 컬러필터에 흡수되므로 광 효율이 저하된다. 그러나, 본 발명에 따른 자발광 감광성 수지 조성물로 제조된 컬러필터를 포함하는 경우에는, 컬러필터가 광원의 광에 의해 자체 발광하므로, 보다 뛰어난 광 효율을 구현할 수 있으며, 또한 색상을 가진 광이 방출되는 것이므로 색 재현성이 보다 우수하고, 광루미네선스에 의해 전 방향으로 광이 방출되므로 시야각도 개선될 수 있는 이점이 있다. In a typical image display apparatus including a color filter, white light is transmitted through the color filter to implement color. In this process, a part of the light is absorbed by the color filter, thereby degrading light efficiency. However, in the case of including the color filter made of the self-luminous photosensitive resin composition according to the present invention, since the color filter is self-luminous by the light of the light source, it is possible to implement more excellent light efficiency, and also emit light with color Since the color reproducibility is excellent, and the light is emitted in all directions by the photoluminescence, the viewing angle is also improved.
상기 양자점은 광에 의한 자극으로 발광할 수 있는 양자점 입자라면 특별히 한정되지 않는다. 예컨대, II-VI족 반도체 화합물; III-V족 반도체 화합물; IV-VI족 반도체 화합물; IV족 원소 또는 이를 포함하는 화합물; 및 이들의 조합으로 이루어진 군에서 선택될 수 있으며, 이들은 단독 또는 2종 이상 혼합하여 사용할 수 있다.The quantum dot is not particularly limited as long as it is a quantum dot particle capable of emitting light by stimulation caused by light. For example, group II-VI semiconductor compound; Group III-V semiconductor compounds; Group IV-VI semiconductor compounds; A Group IV element or a compound containing the same; And it can be selected from the group consisting of these, these can be used alone or in combination of two or more.
구체적으로, 상기 II-VI족 반도체 화합물은 CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe 및 이들의 혼합물로 이루어진 군에서 선택되는 이원소 화합물; CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe 및 이들의 혼합물로 이루어진 군에서 선택되는 삼원소 화합물; 및 CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe, HgZnSTe 및 이들의 혼합물로 이루어진 군에서 선택되는 사원소 화합물로 이루어진 군에서 선택될 수 있으나 이에 한정되는 것은 아니다.Specifically, the II-VI semiconductor compound may be selected from the group consisting of CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, and mixtures thereof; CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe And an elemental compound selected from the group consisting of CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe, HgZnSTe, and mixtures thereof.
상기 III-V족 반도체 화합물은 GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb 및 이들의 혼합물로 이루어진 군에서 선택되는 이원소 화합물; GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP 및 이들의 혼합물로 이루어진 군에서 선택되는 삼원소 화합물; 및 GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, InAlPSb 및 이들의 혼합물로 이루어진 군에서 선택되는 사원소 화합물로 이루어진 군에서 선택될 수 있다.The group III-V semiconductor compound may be selected from the group consisting of GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, and mixtures thereof; Three-element compounds selected from the group consisting of GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP and mixtures thereof; And an elemental compound selected from the group consisting of GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, InAlPSb and mixtures thereof.
상기 IV-VI족 반도체 화합물은 SnS, SnSe, SnTe, PbS, PbSe, PbTe 및 이들의 혼합물로 이루어진 군에서 선택되는 이원소 화합물; SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe 및 이들의 혼합물로 이루어진 군에서 선택되는 삼원소 화합물; 및 SnPbSSe, SnPbSeTe, SnPbSTe 및 이들의 혼합물로 이루어진 군에서 선택되는 사원소 화합물로 이루어진 군에서 선택되는 하나 이상일 수 있으나, 역시 이에 한정되지 않는다.The Group IV-VI semiconductor compound may be selected from the group consisting of SnS, SnSe, SnTe, PbS, PbSe, PbTe, and mixtures thereof; A three-element compound selected from the group consisting of SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, and mixtures thereof; And SnPbSSe, SnPbSeTe, SnPbSTe, and one or more selected from the group consisting of an elemental compound selected from the group consisting of mixtures thereof, but are not limited thereto.
이에 한정되지는 않으나, 상기 상기 IV족 원소 또는 이를 포함하는 화합물은 Si, Ge 및 이들의 혼합물로 이루어진 군에서 선택되는 원소 화합물; 및 SiC, SiGe 및 이들의 혼합물로 이루어진 군에서 선택되는 이원소 화합물로 이루어진 군에서 선택될 수 있다.Although not limited thereto, the group IV element or a compound including the same may include an element compound selected from the group consisting of Si, Ge, and mixtures thereof; And a binary element compound selected from the group consisting of SiC, SiGe, and mixtures thereof.
상기 양자점은 균질한(homogeneous) 단일 구조; 코어-쉘(core-shell), 그래디언트(gradient) 구조 등과 같은 이중 구조; 또는 이들의 혼합 구조일 수 있다.The quantum dots are homogeneous single structures; Dual structures such as core-shell, gradient structures, and the like; Or a mixed structure thereof.
구체적으로, 상기 코어-쉘의 이중 구조에서, 각각의 코어(core)와 쉘(shell)을 이루는 물질은 상기 언급된 서로 다른 반도체 화합물로 이루어질 수 있다. 예컨대, 상기 코어는 CdSe, CdS, ZnS, ZnSe, CdTe, CdSeTe, CdZnS, PbSe, AgInZnS 및 ZnO로 이루어진 군으로부터 선택된 하나 이상의 물질을 포함할 수 있으나, 이에 한정되는 것은 아니다. 상기 쉘은 CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe 및 HgSe으로 이루어진 군으로부터 선택된 하나 이상의 물질을 포함할 수 있으나, 역시 이에 한정되는 것은 아니다.Specifically, in the dual structure of the core-shell, the material constituting each core and shell may be made of the above-mentioned different semiconductor compounds. For example, the core may include one or more materials selected from the group consisting of CdSe, CdS, ZnS, ZnSe, CdTe, CdSeTe, CdZnS, PbSe, AgInZnS, and ZnO, but is not limited thereto. The shell may include one or more materials selected from the group consisting of CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe, and HgSe, but is not limited thereto.
상기 양자점은 습식 화학 공정(wet chemical process), 유기금속 화학증착 공정(MOCVD, metal organic chemical vapor deposition) 또는 분자선 에피텍시 공정(MBE, molecular beam epitaxy)에 의해 합성될 수 있으나 이에 한정되는 것은 아니다.The quantum dots may be synthesized by a wet chemical process, a metal organic chemical vapor deposition (MOCVD), or a molecular beam epitaxy (MBE), but are not limited thereto. .
상기 습식 화학 공정이란 유기용제에 전구체 물질을 넣어 입자를 성장시키는 방법이다. 결정이 성장될 때 유기용제가 자연스럽게 양자점 결정의 표면에 배위되어 분산제 역할을 하여 결정의 성장을 조절하게 되므로, 유기금속 화학증착 공정이나 분자선 에피텍시와 같은 기상증착법보다 더 쉽고 저렴한 공정을 통하여 나노 입자의 성장을 제어할 수 있으므로, 상기 습식 화학 공정을 사용하여 본 발명에 따른 상기 양자점을 제조하는 것이 바람직하다.The wet chemical process is a method of growing a particle by adding a precursor material to an organic solvent. When the crystal grows, the organic solvent naturally coordinates the surface of the quantum dot crystal and acts as a dispersant to control the growth of the crystal. Therefore, the nano solvent is easier and cheaper than the vapor deposition method such as the organometallic chemical vapor deposition process or molecular beam epitaxy. Since the growth of the particles can be controlled, it is preferred to produce the quantum dots according to the invention using the wet chemical process.
본 발명의 일 실시형태에 있어서, 상기 양자점은 유기 리간드를 더 포함하는 것일 수 있다. 상기 유기 리간드는 상기 양자점의 표면에 결합되어 상기 양자점을 안정화시키는 역할을 수행할 수 있다. 상기 유기 리간드는 본 발명에서 한정하는 것은 아니나 예컨대 C5 내지 C20의 알킬 카르복실산, 알케닐 카르복실산 또는 알키닐 카르복실산; 티올(thiol), 인산, 피리딘, 메르캅토 알콜, 포스핀, 포스핀 산화물 등을 포함할 수 있으며, 양자점 표면을 효과적으로 보호하여 안정성을 향상시킨 다는 측면에서, C5 내지 C20의 알킬 카르복실산, 알케닐 카르복실산 또는 알키닐 카르복실산; 티올 및 인산으로 이루어진 군으로부터 선택되는 1 종 이상을 포함하는 것이 바람직하다.In one embodiment of the present invention, the quantum dots may further include an organic ligand. The organic ligand may be bound to the surface of the quantum dots to serve to stabilize the quantum dots. The organic ligand is not limited in the present invention, such as C5 to C20 alkyl carboxylic acid, alkenyl carboxylic acid or alkynyl carboxylic acid; Alkyl carboxylic acids, al, C5 to C20, which may include thiol, phosphoric acid, pyridine, mercapto alcohol, phosphine, phosphine oxide, etc., and in terms of improving stability by effectively protecting the surface of the quantum dot. Kenyl carboxylic acid or alkynyl carboxylic acid; It is preferable to include one or more selected from the group consisting of thiol and phosphoric acid.
상기 유기 리간드는 상기 양자점의 총면적에 대하여 5% 이상의 표면을 덮고 있을 수 있다.The organic ligand may cover 5% or more of the surface of the total area of the quantum dots.
상기 유기 리간드는 시판되고 있는 형태의 상기 양자점 분산액 내에 포함되어 있을 수도 있고, 상기 양자점 분산액 내에 포함되어 있지 않는 경우는 직접 상기 양자점 분산액 내에 첨가할 수도 있으며, 상기 유기 리간드를 직접 상기 양자점 분산액 내에 첨가하는 경우 그 함량은 양자점 1몰에 대하여 0.1 내지 10몰 추가할 수 있다.The organic ligand may be included in the quantum dot dispersion in the form of a commercially available form, or may be added directly to the quantum dot dispersion when not included in the quantum dot dispersion, and the organic ligand may be added directly to the quantum dot dispersion. In this case, the content may be added in an amount of 0.1 to 10 moles with respect to 1 mole of the quantum dot.
본 발명의 일 실시형태에 따르면, 상기 양자점은 상기 양자점 분산액 전체 100중량%에 대하여, 5 내지 70중량%, 바람직하게는 10 내지 65중량%, 더욱 바람직하게는 15 내지 60중량%로 포함될 수 있다. 상기 양자점이 상기 범위 내로 포함되는 경우 감광특성이 우수한 자발광 감광성 수지 조성물의 제공이 가능하다. 상기 양자점이 상기 범위 미만으로 포함될 경우 감광특성이 다소 저하될 수 있으며, 상기 범위를 초과하여 포함하는 경우 상기 양자점과 대비하여 후술할 다른 구성들, 예컨대 알칼리 가용성 수지, 광중합성 화합물과 같은 구성들의 함량이 상대적으로 적어지므로 컬러필터의 제조가 다소 어려울 수 있는 문제가 있으므로, 상기 범위 내로 포함되는 것이 바람직하다.According to one embodiment of the invention, the quantum dots may be included in 5 to 70% by weight, preferably 10 to 65% by weight, more preferably 15 to 60% by weight relative to the total 100% by weight of the quantum dot dispersion. . When the quantum dot is included in the above range, it is possible to provide a self-luminous photosensitive resin composition having excellent photosensitivity. When the quantum dot is included in the range below the photosensitive properties may be slightly reduced, and when included in excess of the above range, the content of the other components, such as alkali-soluble resin, photopolymerizable compound to be described later in contrast to the quantum dot Since it is relatively small, there is a problem that the manufacture of the color filter may be somewhat difficult, so it is preferably included within the above range.
본 발명에 따른 양자점 분산액은 하기 수학식 1의 한센 용해도 파라미터의 조건을 만족하는 용제를 포함함으로써 양자점을 고르게 분산시킬 수 있는 이점이 있고, 인체에 해로운 클로로포름 또는 디클로로메탄과 같은 할로겐화 탄화수소계 용제; 벤젠 또는 톨루엔과 같은 방향족 탄화수소계 용제; 및 N-헥산과 같은 지방족 탄화수소계 용제;는 포함하지 않음으로써 이를 다루는 작업자들이 발암성, 신경독성, 생식기능 이상 유발 등의 위험성 있는 환경에 노출되는 것을 방지할 수 있는 이점이 있다. The quantum dot dispersion according to the present invention has an advantage of uniformly dispersing the quantum dots by including a solvent that satisfies the conditions of the Hansen solubility parameter of Equation 1 below, halogenated hydrocarbon solvent such as chloroform or dichloromethane harmful to human body; Aromatic hydrocarbon solvents such as benzene or toluene; And aliphatic hydrocarbon-based solvents such as N-hexane, there is an advantage that can prevent workers to deal with this dangerous environment such as carcinogenicity, neurotoxicity, causing reproductive dysfunction.
[수학식 1][Equation 1]
Figure PCTKR2017010278-appb-I000003
Figure PCTKR2017010278-appb-I000003
(상기 수학식 1에서, (In Equation 1,
δd는 분산 성분(dispersion component), δp는 극성 성분(polar component), δh는 수소 결합 성분(hydrogen bonding component)을 의미한다.)δ d is the dispersion component, δ p is the polar component, and δ h is the hydrogen bonding component.)
본 발명의 일 실시형태에 따르면, 상기 용제는 구체적으로, 탄소수가 6 ~ 10의 에테르 및 에스터로 이루어진 군으로부터 선택되는 하나 이상을 포함하는 것일 수 있으며, 이 경우 분산성이 향상되고 이를 포함하는 자발광 감광성 수지 조성물의 발광 강도가 증가하는 이점이 있다.According to one embodiment of the present invention, the solvent may specifically include one or more selected from the group consisting of ether and ester having 6 to 10 carbon atoms, in which case the dispersibility is improved and includes the same. There is an advantage that the light emission intensity of the light-emitting photosensitive resin composition is increased.
상기 용제는 구체적으로, 메틸 이소아밀 케톤, 디이소부틸 케톤, 디에틸 카르보네이트, 에틸 부티레이트, 에틸 이소부티레이트, tert-부틸 아세테이트, 이소프로필 프로피오네이트, 메틸-3-메틸부타노에이트, 프로필 프로피오네이트, 메틸 2-메틸 부타노에이트, sec-부틸 아세테이트, 메틸 펜타노에이트, 이소부틸아세테이트, 부틸 아세테이트, 메틸 피바레이트, sec-부틸 프로피오네이트, n-부틸 프로피오네이트, 2-메틸 부틸 아세테이트, 에틸 2-메틸부티레이트, 메틸 2-메틸펜타노에이트, 2-펜틸 아세테이트, 네오펜틸 아세테이트, 3-메틸부탄-2-일 아세테이트, 이소프로필 이소부티레이트, 프로필 이소부티레이트, 이소발레르산 에틸, 메틸 3-메틸 펜타노에이트, 에틸 펜타노에이트, 메틸 4-메틸 펜타노에이트, 메틸 헥사노에이트, 이소아밀 아세테이트, 펜틸 아세테이트, 이소프로필 부티레이트, 프로필 부타노에이트, 이소부틸 프로피오네이트, 2,2-디메틸 부타노익 애시드 메틸 에스터, 에틸 피발레이트, tert-아밀 아세테이트, tert-부틸 프로피오네이트, 메틸 3,3-디메틸부티레이트, 디에틸아세틱 애시드 메틸 에스터, 3-펜틸 아세테이트, 2,3-디메틸부타노익 애시드 메틸 에스터, 프로필 2-메틸부타노에이트, 에틸 헥사노에이트, 이소프로필 2-메틸부타노에이트, 이소부틸 이소부타노에이트, 2-메틸부틸 프로피오네이트, 2-헥실 아세테이트, 1-메틸부틸 프로파노에이트, 메틸 2-에틸-3-메틸부티레이트, 3-메틸펜틸 3-아세테이트, 3-헥실 아세테이트, 2,2-디메틸-3-아세톡시부탄, 에틸 2-메틸펜타노에이트, sec-부틸 부티레이트, 에틸 3-메틸펜타노에이트, 에틸 2,3-디메틸부타노에이트, 2,3-디메틸-2-부틸 아세테이트, 2-에틸부틸 아세테이트, 아세틱 애시드-(2,2-디메틸-부틸 에스터), 2,3-디메틸부틸 아세테이트, 3-메틸-1-펜틸 아세테이트, 3,3-디메틸부틸 아세테이트, n-부틸 이소부티레이트, 이소프로필 펜타노에이트, 부틸 부티레이트, 아밀 프로피오네이트, 헥실 아세테이트, 프로필 3-메틸부타노에이트, 메틸 헵타노에이트, 이소프로필 3-메틸부타노에이트, 이소부틸 부티레이트, sec-부틸 이소부티레이트, 프로필 펜타노에이트, 이소아밀 프로피오네이트, 에틸 4-메틸펜타노에이트, 4-메틸-1-펜틸 아세테이트, 메틸 5-메틸헥사노에이트, 메틸 2-에틸-2-메틸부티레이트, 2,2-디메틸-펜타노익 애시드 메틸 에스터, 에틸 2,2-디메틸부타노에이트, i-프로필 피발레이트, 프로필 2,2-디메틸프로파노에이트, 2,2-디메틸-1-프로판올 프로파노에이트, 에틸 3,3-디메틸부타노에이트, 2-메틸-3-펜틸 아세테이트, 아세틱 애시드-(2-메틸-펜틸 에스터), 4-메틸-2-펜틸 아세테이트, tert-부틸 2-메틸프로파노에이트, 2,3-디메틸-발레릭 애시드 메틸 에스터, 2-에틸-발레릭 애시드 메틸 에스터, 메틸-2-메틸카프로에이트, 2-메틸펜탄-2-일 아세테이트, tert-부틸 부티레이트, 3-에틸-발레릭 애시드 메틸 에스터, 에틸 2-에틸부타노에이트, sec-아밀 프로피오네이트, 메틸 2,3,3-트리메틸 부타노에이트, 3,3-디메틸펜타노익 애시드 메틸 에스터, tert-아밀 프로파노에이트, 메틸 2,4-디메틸 펜타노에이트, 메틸 2,2,3-트리메틸부타노에이트, 3-메틸-펜틸-2-아세테이트, 메틸 4,4-디메틸펜타노에이트, 메틸 3,4-디메틸펜타노에이트, 발레익 애시드 이소부틸 에스터, 2-메틸부틸 부타노에이트, 발레릭 애시드 sec-부틸 에스터, 2-펜틸 부타노에이트, 2-메틸프로필 2-메틸부타노에이트 n-부틸 2-메틸부타노에이트, 이소펜틸 부타노에이트, 이소부틸 이소펜타노에이트, 1-메닐 펜틸 프로파노에이트, 1-메틸헥실 아세테이트, 2-메틸-부티릭 애시드 sec-부틸 에스터, 2-메틸프로파노익 애시드 2-메틸부틸 에스터, 에틸 3-메틸헥사노에이트, 에틸 2-메틸헥사노에이트, 1-헵틸 아세테이트, 메틸 3-메틸헵타노에이트, 1,1,2,2-테트라메틸프로필 아세테이트, 1-아세톡시-2,3,3-트리메틸부탄, 아세틱 애시드-(2-에틸-2-메틸-부틸 에스터), 아세틱 애시드-(3,3-디메틸-펜틸 에스터), 아세틱 애시드-(1,3,3-트리메틸-부틸에스터), 2,4-디메틸-3-아세톡시펜테인, 아세틱 애시드-(2-에틸-3-메틸-부틸 에스터), 아세틱 애시드-(3-메틸-헥실 에스터), 아세틱 애시드-(4-메틸-헥실 에스터), 이소부티릭 애시드-(1,2-디메틸-프로필 에스터), 4-메틸-바레릭 애시드 프로필 에스터, 4-메틸-헥사노익 애시드 에틸 에스터, 메틸 5-메틸헵타노에이트, 이소바레릭 애시드 sec-부틸 에스터, 이소부티릭 애시드 이소펜틸 에스터, 부틸 펜타노에이트, 프로필 헥사노에이트, 헥실 프로피오네이트, 메틸 옥타네이트, 5-메틸헥실 아세테이트, 에틸 이소아밀아세테이트, 펜틸 부티레이트, 에틸 헵타노에이트, 이소프로필 헥사노에이트, 부틸 3-메틸부타노에이트, 2-에틸-3-메틸-바레릭 애시드 메틸 에스터, 메틸 2-이소프로필-3-메틸부타노에이트, 2-에틸-3-메틸-부티릭 애시드 에틸 에스터, 2-에틸-바레릭 애시드 에틸 에스터, 메틸 2-에틸헥사노에이트, 에틸 2,4-디메틸펜타노에이트, 메틸 2,5-디메틸헥사노에이트, 아세틱 애시드-(1-에틸-3-메틸-부틸 에스터), 4-헵틸 아세테이트, 4-메틸-2-펜틸 프로피오네이트, 5-메틸헥산-2-일 아세테이트, 2,2-디에틸-부티릭 애시드 메틸 에스터, 아세틱 애시드-(1,1-디에틸-프로필 에스터), 2,3-디메틸-헥사노익 애시드 메틸 에스터, 2-에틸-2-메틸-바레릭 애시드 메틸 에스터, 2-에틸-2-메틸부티릭 애시드 에틸 에스터, 에틸 2,2-디메틸펜타노에이트, 2,2-디메틸-헥사노익 애시드 메틸 에스터, 2,2-디메틸-부티릭 애시드 프로필 에스터, 피발릭 애시드 tert-부틸 에스터, 이소부틸 피발레이트, 피발릭 애시드 부틸 에스터, 아세틱 애시드-(1,2-디메틸-펜틸 에스터), 2,4,4-트리메틸-바레릭 애시드 메틸 에스터, 아세틱 애시드-(1-에틸-1-메틸-부틸 에스터), 3,3-디메틸-바레릭 애시드 에틸 에스터, 이소부티릭 애시드 tert-펜틸 에스터, tert-아밀 부티레이트, 3-아세톡시-2,2-디메틸-펜테인, 프로피오닉 애시드-(3,3-디메틸-부틸 에스터), 이소프로필 3,3-디메틸부타노에이트, 3,3-디메틸-부티릭 애시드 프로필 에스터, 네오펜틸 2-메틸프로파노에이트, 네오펜틸 부타노에이트, tert-부틸 3-메틸 부타노에이트, tert-부틸 펜타노에이트, 3,3,4-트리메틸-바레릭 애시드 메틸 에스터, 4,5-디메틸-헥사노익 애시드 메틸 에스터, 에틸 4,4-디메틸펜타노에이트, 3,4-디메틸-펜타노익 애시드 에틸 에스터, 아세틱 애시드-(1-이소프로필-부틸 에스터), 2-프로필 2-메틸펜타노에이트, 메틸 6-메틸헵타노에이트, 이소프로필 2-에틸부티레이트, 2-아세톡시-4-메틸-헥세인, 2,2,3,3-테트라메틸부타노에이트, 4-메틸-헵타노익 애시드 메틸 에스터, 메틸 4-에틸헥사노에이트, 에틸-2,3,3-트리메틸부타노에이트, 2,2-디메틸-펜타놀-(1)-아세테이트, 2,4-디메틸-2-펜틸 아세테이트, 2-메틸-2-헥실 아세테이트, 4,4-디메틸펜틸 아세테이트, 펜틸 이소부타노에이트, 메틸 2-메틸헵타노에이트, 부탄-2-일 2,2-디메틸프로파노에이트, 메틸 4,4-디메틸헥사노에이트, 2-프로필-펜타노익 애시드 메틸 에스터, 헥사노익 애시드-(2,4-디메틸 메틸 에스터), 2,2,3-트리메틸부타노익 애시드 에틸 에스터, 2-메틸헥실아세테이트, 메틸-3,4,4-트리메틸펜타노에이트, 프로필-2-에틸부타노에이트, 이소프로필 2,2-디메틸부타노에이트, 3-에틸-4-메틸-펜타노익 애시드 메틸 에스터, 메틸 2,2,4-트리메틸펜타노에이트, 2,3-디메틸-3-펜틸아세테이트, 펜탄-3-일 2-메틸프로파노에이트, 3-에틸-3-메틸-펜타노익 애시드 메틸 에스터, 메틸 3,4-디메틸헥사노에이트, 3,3-디메틸펜-1-틴, 에틸-3-에틸-펜타노에이트, 메틸 2,2,3-트리메틸펜타노에이트, 메틸 2-에틸-3,3-디메틸펜타노에이트, 펜탄-3-일 부티레이트, 4-메틸-3-헥실 아세테이트, 2-메틸-3-메틸부틸 프로마노익 애시드 에스터, 3-메톡시-1-펜틸 프로피오네이트, 2-펜틸 2-메틸프로파노에이트, tert-부틸 2-메틸부타노에이트, 메틸 5,5-디메틸헥사노에이트, 3,3-디메틸 2-부틸 프로피오네이트, 1-에틸 부틸 프로파노에이트, 2-메틸-1-펜틸 프로파노에이트, n-프로필 2-메틸바레레이트, sec-아밀 바레레이트, sec-부틸 헥사노에이트, 2-메틸부틸 이소바레레이트, 펜타노익 애시드 2-메틸부틸 에스터, 2,2,3-트리메틸-바레릭 애시드 에틸 에스터, 1-메틸헥실 프로파노에이트, 헥실-2-부타노에이트, 2,2-디메틸-3-헥실아세테이트, 2-메틸-1-부틸 2-메틸부타노에이트, 3-메틸부틸 2-메틸부타노에이트, 메틸 2,6-디메틸헵타노에이트, 2-옥틸 아세테이트, 1-에틸헥실 아세테이트, 아세틱 애시드-(1-이소프로필-2,2-디메틸-프로필 에스터), 아세틱 애시드-(2-에틸-3,3-디메틸-부틸 에스터), 아세틱 애시드-(2,2,3-트리메틸-펜틸 에스터), 아세틱 애시드-(2,2,3,3-테트라메틸-부틸 에스터), 아세틱 애시드-(1,2,2,3-테트라메틸-부틸 에스터), 아세틱 애시드-(2-이소프로필-3-메틸-부틸 에스터), 아세틱 애시드-(4-에틸-헥실 에스터), 아세틱 애시드-(2,2-디에틸-부틸 에스터), 3-메틸-바레릭 애시드 sec-부틸 에스터, 이소펜틸 3-메틸부타노에이트, 이소프로필 헵타노에이트, 4-메틸-바레릭 애시드 이소부틸 에스터, 4-메틸-헵타노익 애시드 에틸 에스터, 3-메틸부틸 펜타노에이트, 부틸 헥사노에이트, n-펜틸 n-펜타노에이트, n-프로필 헵타노에이트, 5-메틸-헵타노익 애시드 에틸 에스터, 에틸 6-메틸헵타노에이트, 헥실 부티레이트, 옥타노익 애시드 에틸 에스터, 메틸 6-메틸옥타노에이트, 헵틸 프로피오네이트, 노나노익 애시드 메틸 에스터, 1-옥틸 아세테이트, 2,2,3,3-테트라메틸-부티릭 애시드 에틸 에스터, 아세틱 애시드-(1-에틸-2,2-디메틸-부틸 에스터), 아세틱 애시드-(1-이소프로필-펜틸 에스터), 아세틱 애시드-(1,2-디메틸-헥실 에스터), 2-이소-프로필-3-메틸-부티릭 애시드 에틸 에스터, 프로피오닉 애시드-(3,3-디메틸-펜틸 에스터), 아세틱 애시드-(1-에틸-3-메틸-펜틸 에스터), 2,3,5-트리메틸-헥사노익 애시드 메틸 에스터, 아세틱 애시드-(1-에틸-2-메틸-펜틸 에스터), 프로피오닉 애시드-(1-에틸-2,2-디메틸-프로필 에스터), 에틸 2,2-디에틸부타노에이트, 2,2,3-트리메틸-부티릭 애시드 이소프로필 에스터, 아세틱 애시드-(1-에틸-3,3-디메틸-부틸 에스터), 부틸 2,2-디메틸부티레이트, 3-메틸-2-프로필-바레릭 애시드 메틸 에스터, 2-메틸-헵타노익 애시드 에틸 에스터, 메틸 2-메틸옥타노에이트, 부티릭 애시드-(1,3-디메틸-부틸 에스터), 3-에틸-헥사노익 애시드 에틸 에스터, 2-에틸-2-메틸-바레릭 애시드 에틸 에스터, 에틸 3,5-디메틸헥사노에이트, 3,3-디메틸-바레릭 애시드 프로필 에스터, 2,2,4,4-테트라메틸-펜타노익 애시드 매틸 에스터, 에틸 2,2-디메틸-헥사노에이트, 부티릭 애시드-(2-에틸-부틸에스터), 2-에틸-4-메틸-바레릭 애시드 에틸 에스터, 에틸 2-프로필펜타노에이트, 메틸 2-프로필헥사노에이트, 에틸 2-에틸헥사노에이트, 아세틱 애시드-(1,1-디에틸-부틸 에스터), 2,5-디메틸-헥사노익 애시드 에틸 에스터, 에틸 4,5-디메틸헥사노에이트, 아세틱 애시드-(1-이소부틸-부틸에스터), 아세틱 애시드-(1-에틸-4-메틸-펜틸 에스터), 아세틱 애시드-(1-메틸-1-프로필-부틸 에스터), 이소바레릭 애시드 tert-펜틸 에스터, 3-프로필-헥사노익 애시드 메틸 에스터, 3-에틸-헵타노익 애시드 메틸 에스터, 아세틱 애시드-(1,1,4-트리메틸-펜틸 에스터), 아세틱 애시드-(1,5-디메틸-헥실 에스터), 3-메틸-헵타노익 애시드 에틸 에스터, 3,3,5-트리메틸-헥사노익 애시드 메틸 에스터, 3,3-디메틸-헵타노익 애시드 메틸 에스터, 3,3-디메틸-바레릭 애시드 이소프로필 에스터, 2-에틸헥실 아세테이트, 에틸 2,4,4-트리메틸펜타노에이트, 부틸 네오펜타노에이트, 네오펜틸 피바레이트, 피바릭 애시드 이소펜틸 에스터, 2-에틸-부티릭 애시드 tert-부틸 에스터, 3,3-디메틸-부티릭 애시드 sec-부틸 에스터, 아세틱 애시드-(1,4-디메틸부틸)에스터, sec-아밀 이소바레레이트, 3-아세톡시-2,4-디메틸헥산, 3,3-디에틸-펜타노익 애시드 메틸 에스터, 메틸-4,4-디메틸헵타노에이트, 메틸 3,5,5-트리메틸헥사노에이트, 아세틱 애시드 4-옥틸 에스터, 3,5-디메틸-헵타노익 애시드 메틸 에스터, 1-아세톡시-4,4-디메틸-헥세인, 펜틸 3-메틸부타노에이트, 7-메틸옥타노익 애시드 메틸 에스터, 2-에틸-헵타노익 애시드 메틸 에스터, 메틸 2,4-디메틸헵타노에이트, 메틸 2,2-디메틸 헵타노에이트, 펜틸 2,2-디메틸 프로파노에이트, 에틸 2,3,4-트리메틸바레레이트, tert-부틸 헥사노에이트, 3-아세톡시-2,5-디메틸-헥세인, 1,1,3,3-테트라메틸부틸 아세테이트, 2,2,4-트리메틸펜틸 아세테이트, 메틸 2,2,3,3-테트라메틸펜타노에이트, 펜타노익 애시드-(2,2,3,4-테트라메틸-메틸 에스터), 2-프로필-2-메틸-펜타노익 애시드 메틸 에스터, 1,1-디메틸에틸 3,3-디메틸부타노에이트, tert-부틸 4-메틸펜타노에이트, 2-이소프로필-3,3-디메틸-부티릭 애시드 메틸 에스터, 메틸 2-에틸-2-메틸헥사노에이트, 에틸 2-에틸-3,3-디메틸부타노에이트, 헥실 이소부타노에이트, 메틸-5,5-디메틸헵타노에이트, 메틸-2,3,4-트리메틸헥사노에이트, 메틸 2,3-디메틸-2-에틸펜타노에이트, 3-메틸 옥타노익 애시드 메틸 에스터, 2,2-디메틸헥실 아세테이트, 프로필네오헵타노에이트, 이소프로필 2-메틸헥사노에이트, 2-프로필-펜틸-아세테이트, 부틸 2-에틸 부티레이트, 4-메틸옥타노익 애시드 메틸 에스터, 2-메틸펜타노익 애시드-(1-메틸 프로필 에스터), 2,2,4-트리메틸-헥사노익 애시드 메틸 에스터, 헥사노익 애시드-(2,2,5-트리메틸-메틸 에스터), 4-메틸펜틸 이소부티레이트, 3-메틸펜틸 부티레이트, 에틸 3,3,4-트리메틸펜타노에이트, 펜타노익 애시드-(3,4,4-트리메틸-에틸 에스터), tert-아밀 피바레이트, 이소부틸 3,3-디메틸부티레이트, 1-이소프로필-1,2-디메틸프로필 아세테이트, 에틸 4-에틸헥사노에이트, 메틸 2-에틸-3,3-디메틸펜타노에이트, 메틸 3,6-디메틸헵타노에이트, 이소부틸 헥사노에이트, 3,3,4,4-테트라메틸 펜타노익 애시드 메틸 에스터, 2-메틸바레릭 부틸 에스터, 펜틸 2-메틸부타노에이트, 네오펜틸 2-메틸부타노에이트, 에틸 3,3-디메틸헥사노에이트, 4-에틸-3-헥실 아세테이트, 2,4-디메틸펜탄-3-일 프로피오네이트, 메틸 네오노나노에이트, 메틸 4,4,5-트리메틸헥사노에이트, 메틸 디이소프로필 프로피오네이트, 1-메틸에틸 4-메틸헥사노에이트, 부타노익 애시드 1-에틸부틸 에스터, 1-에틸펜틸 프로파노에이트, 펜탄-3-일 펜타노에이트, 메틸 4-에틸헵타노에이트, 펜탄-3-일 3-메틸부타노에이트, 에틸 5,5-디메틸헥사노에이트, 2-메틸-3-메틸부틸 부타노익 애시드 에스터, 네릴 아세테이트, 디프로필렌 글리콜 디메틸 에테르 또는 디프로필렌 글리콜 메틸 에테르 아세테이트 등을 들 수 있으며, 본 발명의 일 실시형태에 따라, 휘도나 색재현력이 우수하다는 측면에서 tert-부틸 아세테이트, sec-부틸 아세테이트, 이소부틸아세테이트, n-부틸 아세테이트, 2-메틸 부틸 아세테이트, 2-펜틸 아세테이트, 네오펜틸 아세테이트, 3-메틸부탄-2-일 아세테이트, 이소아밀 아세테이트, n-펜틸 아세테이트, tert-아밀 아세테이트, 3-펜틸 아세테이트, 2-헥실 아세테이트, 3-메틸펜틸 3-아세테이트, 3-헥실 아세테이트, 2,3-디메틸-2-부틸 아세테이트, 2-에틸부틸 아세테이트, 2,3-디메틸부틸 아세테이트, 3-메틸-1-펜틸 아세테이트, 3,3-디메틸부틸 아세테이트, n-헥실 아세테이트, 4-메틸-1-펜틸 아세테이트, 2-메틸-3-펜틸 아세테이트, 4-메틸-2-펜틸 아세테이트, 2-메틸펜탄-2-일 아세테이트, 1-메틸헥실 아세테이트, 1-헵틸 아세테이트, 1,1,2,2-테트라메틸프로필 아세테이트, 5-메틸헥실 아세테이트, 에틸 이소아밀아세테이트, 4-헵틸 아세테이트, 5-메틸헥산-2-일 아세테이트, 2,4-디메틸-2-펜틸 아세테이트, 2-메틸-2-헥실 아세테이트, 4,4-디메틸펜틸 아세테이트, 4-메틸-3-헥실 아세테이트, 2-옥틸 아세테이트, 1-에틸헥실 아세테이트, 1-옥틸 아세테이트, 2-에틸헥실 아세테이트, 1,1,3,3-테트라메틸부틸 아세테이트, 2,2,4-트리메틸펜틸 아세테이트, 2,2-디메틸헥실 아세테이트, 1-이소프로필-1,2-디메틸프로필 아세테이트, 4-에틸-3-헥실 아세테이트, 디프로필렌 글리콜 디메틸 에테르 또는 디프로필렌 글리콜 메틸 에테르 아세테이트를 사용하는 것이 바람직하다. The solvent is specifically methyl isoamyl ketone, diisobutyl ketone, diethyl carbonate, ethyl butyrate, ethyl isobutyrate, tert-butyl acetate, isopropyl propionate, methyl-3-methylbutanoate, propyl Propionate, methyl 2-methyl butanoate, sec-butyl acetate, methyl pentanoate, isobutyl acetate, butyl acetate, methyl pibarate, sec-butyl propionate, n-butyl propionate, 2-methyl Butyl acetate, ethyl 2-methylbutyrate, methyl 2-methylpentanoate, 2-pentyl acetate, neopentyl acetate, 3-methylbutan-2-yl acetate, isopropyl isobutyrate, propyl isobutyrate, ethyl isovalerate, Methyl 3-methyl pentanoate, ethyl pentanoate, methyl 4-methyl pentanoate, methyl hexanoate, isoamyl acetate, pentyl ace Tate, isopropyl butyrate, propyl butanoate, isobutyl propionate, 2,2-dimethyl butanoic acid methyl ester, ethyl pivalate, tert-amyl acetate, tert-butyl propionate, methyl 3,3-dimethyl Butyrate, diethylacetic acid methyl ester, 3-pentyl acetate, 2,3-dimethylbutanoic acid methyl ester, propyl 2-methylbutanoate, ethyl hexanoate, isopropyl 2-methylbutanoate, isobutyl Isobutanoate, 2-methylbutyl propionate, 2-hexyl acetate, 1-methylbutyl propanoate, methyl 2-ethyl-3-methylbutyrate, 3-methylpentyl 3-acetate, 3-hexyl acetate, 2 , 2-dimethyl-3-acetoxybutane, ethyl 2-methylpentanoate, sec-butyl butyrate, ethyl 3-methylpentanoate, ethyl 2,3-dimethylbutanoate, 2,3-dimethyl-2- Butyl acetate, 2-ethylbutyl Cetate, Acetic Acid- (2,2-Dimethyl-Butyl Ester), 2,3-Dimethylbutyl Acetate, 3-Methyl-1-Pentyl Acetate, 3,3-Dimethylbutyl Acetate, n-Butyl Isobutyrate, Iso Propyl pentanate, butyl butyrate, amyl propionate, hexyl acetate, propyl 3-methylbutanoate, methyl heptanoate, isopropyl 3-methylbutanoate, isobutyl butyrate, sec-butyl isobutyrate, propyl penta Noate, isoamyl propionate, ethyl 4-methylpentanoate, 4-methyl-1-pentyl acetate, methyl 5-methylhexanoate, methyl 2-ethyl-2-methylbutyrate, 2,2-dimethyl- Pentanoic acid methyl ester, ethyl 2,2-dimethylbutanoate, i-propyl pivalate, propyl 2,2-dimethylpropanoate, 2,2-dimethyl-1-propanol propanoate, ethyl 3,3- Dimethylbutanoate, 2-methyl-3-pentyl acete , Acetic acid- (2-methyl-pentyl ester), 4-methyl-2-pentyl acetate, tert-butyl 2-methylpropanoate, 2,3-dimethyl-valeric acid methyl ester, 2-ethyl- Valeric acid methyl ester, methyl-2-methylcaproate, 2-methylpentan-2-yl acetate, tert-butyl butyrate, 3-ethyl- valeric acid methyl ester, ethyl 2-ethylbutanoate, sec-amyl Propionate, methyl 2,3,3-trimethyl butanoate, 3,3-dimethylpentanoic acid methyl ester, tert-amyl propanoate, methyl 2,4-dimethyl pentanoate, methyl 2,2,3 -Trimethylbutanoate, 3-methyl-pentyl-2-acetate, methyl 4,4-dimethylpentanoate, methyl 3,4-dimethylpentanoate, valeric acid isobutyl ester, 2-methylbutyl butanoate , Valeric acid sec-butyl ester, 2-pentyl butanoate, 2-methylpropyl 2-methylbutanoate n-butyl 2-methyl Tanoate, isopentyl butanoate, isobutyl isopentanoate, 1-menyl pentyl propanoate, 1-methylhexyl acetate, 2-methyl-butyric acid sec-butyl ester, 2-methylpropanoic acid 2 -Methylbutyl ester, ethyl 3-methylhexanoate, ethyl 2-methylhexanoate, 1-heptyl acetate, methyl 3-methylheptanoate, 1,1,2,2-tetramethylpropyl acetate, 1-ace Oxy-2,3,3-trimethylbutane, acetic acid- (2-ethyl-2-methyl-butyl ester), acetic acid- (3,3-dimethyl-pentyl ester), acetic acid- (1, 3,3-trimethyl-butylester), 2,4-dimethyl-3-acetoxypentane, acetic acid- (2-ethyl-3-methyl-butyl ester), acetic acid- (3-methyl-hexyl Esters), acetic acid- (4-methyl-hexyl ester), isobutyric acid- (1,2-dimethyl-propyl ester), 4-methyl-baric acid propyl ester, 4-methyl-hexanoic acid Deethyl ester, methyl 5-methylheptanoate, isovaleric acid sec-butyl ester, isobutyric acid isopentyl ester, butyl pentanoate, propyl hexanoate, hexyl propionate, methyl octanate, 5- Methylhexyl acetate, ethyl isoamyl acetate, pentyl butyrate, ethyl heptanoate, isopropyl hexanoate, butyl 3-methylbutanoate, 2-ethyl-3-methyl-baric acid methyl ester, methyl 2-isopropyl 3-methylbutanoate, 2-ethyl-3-methyl-butyric acid ethyl ester, 2-ethyl-bareric acid ethyl ester, methyl 2-ethylhexanoate, ethyl 2,4-dimethylpentanoate, Methyl 2,5-dimethylhexanoate, acetic acid- (1-ethyl-3-methyl-butyl ester), 4-heptyl acetate, 4-methyl-2-pentyl propionate, 5-methylhexane-2- Mono acetate, 2,2-diethyl-butyric acid methyl ester, Ctic acid- (1,1-diethyl-propyl ester), 2,3-dimethyl-hexanoic acid methyl ester, 2-ethyl-2-methyl-baric acid acid methyl ester, 2-ethyl-2-methylbutyric Acid ethyl ester, ethyl 2,2-dimethylpentanoate, 2,2-dimethyl-hexanoic acid methyl ester, 2,2-dimethyl-butyric acid propyl ester, pivalic acid tert-butyl ester, isobutyl pivalate , Pivalic acid butyl ester, acetic acid- (1,2-dimethyl-pentyl ester), 2,4,4-trimethyl-bareric acid methyl ester, acetic acid- (1-ethyl-1-methyl-butyl Esters), 3,3-dimethyl-barrelic acid ethyl ester, isobutyric acid tert-pentyl ester, tert-amyl butyrate, 3-acetoxy-2,2-dimethyl-pentane, propionic acid- (3, 3-dimethyl-butyl ester), isopropyl 3,3-dimethylbutanoate, 3,3-dimethyl-butyric acid propyl ester, neopentyl 2 -Methylpropanoate, neopentyl butanoate, tert-butyl 3-methyl butanoate, tert-butyl pentanoate, 3,3,4-trimethyl-barrelic acid methyl ester, 4,5-dimethyl-hexa Norick acid methyl ester, ethyl 4,4-dimethylpentanoate, 3,4-dimethyl-pentanoic acid ethyl ester, acetic acid- (1-isopropyl-butyl ester), 2-propyl 2-methylpentanoate , Methyl 6-methylheptanoate, isopropyl 2-ethylbutyrate, 2-acetoxy-4-methyl-hexane, 2,2,3,3-tetramethylbutanoate, 4-methyl-heptanoic acid methyl Ester, methyl 4-ethylhexanoate, ethyl-2,3,3-trimethylbutanoate, 2,2-dimethyl-pentanol- (1) -acetate, 2,4-dimethyl-2-pentyl acetate, 2 -Methyl-2-hexyl acetate, 4,4-dimethylpentyl acetate, pentyl isobutanoate, methyl 2-methylheptanoate, butan-2-yl 2,2-dimethylpropanoate, Tyl 4,4-dimethylhexanoate, 2-propyl-pentanoic acid methyl ester, hexanoic acid- (2,4-dimethyl methyl ester), 2,2,3-trimethylbutanoic acid ethyl ester, 2-methyl Hexyl acetate, methyl-3,4,4-trimethylpentanoate, propyl-2-ethylbutanoate, isopropyl 2,2-dimethylbutanoate, 3-ethyl-4-methyl-pentanoic acid methyl ester, Methyl 2,2,4-trimethylpentanoate, 2,3-dimethyl-3-pentyl acetate, pentan-3-yl 2-methylpropanoate, 3-ethyl-3-methyl-pentanoic acid methyl ester, methyl 3,4-dimethylhexanoate, 3,3-dimethylphen-1-tin, ethyl-3-ethyl-pentanoate, methyl 2,2,3-trimethylpentanoate, methyl 2-ethyl-3,3 -Dimethylpentanoate, pentan-3-yl butyrate, 4-methyl-3-hexyl acetate, 2-methyl-3-methylbutyl promanic acid ester, 3-methoxy-1-pentyl propionate, 2- Pentyl 2-methyl Ropanoate, tert-butyl 2-methylbutanoate, methyl 5,5-dimethylhexanoate, 3,3-dimethyl 2-butyl propionate, 1-ethyl butyl propanoate, 2-methyl-1- Pentyl propanoate, n-propyl 2-methylbarrerate, sec-amyl barrerate, sec-butyl hexanoate, 2-methylbutyl isovarerate, pentanoic acid 2-methylbutyl ester, 2,2,3- Trimethyl-barrelic acid ethyl ester, 1-methylhexyl propanoate, hexyl-2-butanoate, 2,2-dimethyl-3-hexyl acetate, 2-methyl-1-butyl 2-methylbutanoate, 3 -Methylbutyl 2-methylbutanoate, methyl 2,6-dimethylheptanoate, 2-octyl acetate, 1-ethylhexyl acetate, acetic acid- (1-isopropyl-2,2-dimethyl-propyl ester) , Acetic acid- (2-ethyl-3,3-dimethyl-butyl ester), acetic acid- (2,2,3-trimethyl-pentyl ester), acetic acid- (2,2,3,3- Tetrame -Butyl ester), acetic acid- (1,2,2,3-tetramethyl-butyl ester), acetic acid- (2-isopropyl-3-methyl-butyl ester), acetic acid- (4- Ethyl-hexyl ester), acetic acid- (2,2-diethyl-butyl ester), 3-methyl-baric acid sec-butyl ester, isopentyl 3-methylbutanoate, isopropyl heptanoate, 4 -Methyl-barelic acid isobutyl ester, 4-methyl-heptanoic acid ethyl ester, 3-methylbutyl pentanoate, butyl hexanoate, n-pentyl n-pentanoate, n-propyl heptanoate, 5 -Methyl-heptanoic acid ethyl ester, ethyl 6-methylheptanoate, hexyl butyrate, octanoic acid ethyl ester, methyl 6-methyloctanoate, heptyl propionate, nonanoic acid methyl ester, 1-octyl acetate , 2,2,3,3-tetramethyl-butyric acid ethyl ester, acetic acid- (1-ethyl-2,2-dimethyl- Ethyl ester), acetic acid- (1-isopropyl-pentyl ester), acetic acid- (1,2-dimethyl-hexyl ester), 2-iso-propyl-3-methyl-butyric acid ethyl ester, propy Onic acid- (3,3-dimethyl-pentyl ester), acetic acid- (1-ethyl-3-methyl-pentyl ester), 2,3,5-trimethyl-hexanoic acid methyl ester, acetic acid- ( 1-ethyl-2-methyl-pentyl ester), propionic acid- (1-ethyl-2,2-dimethyl-propyl ester), ethyl 2,2-diethylbutanoate, 2,2,3-trimethyl- Butyric acid isopropyl ester, acetic acid- (1-ethyl-3,3-dimethyl-butyl ester), butyl 2,2-dimethylbutyrate, 3-methyl-2-propyl-baric acid methyl ester, 2- Methyl-heptanoic acid ethyl ester, methyl 2-methyloctanoate, butyric acid- (1,3-dimethyl-butyl ester), 3-ethyl-hexanoic acid ethyl ester, 2-ethyl-2-methyl-barre Rick Acid On Ester, ethyl 3,5-dimethylhexanoate, 3,3-dimethyl-barrelic acid propyl ester, 2,2,4,4-tetramethyl-pentanoic acid methyl ester, ethyl 2,2-dimethyl-hexano Ate, butyric acid- (2-ethyl-butylester), 2-ethyl-4-methyl-barrelic acid ethyl ester, ethyl 2-propylpentanoate, methyl 2-propylhexanoate, ethyl 2-ethylhexa Noate, acetic acid- (1,1-diethyl-butyl ester), 2,5-dimethyl-hexanoic acid ethyl ester, ethyl 4,5-dimethylhexanoate, acetic acid- (1-isobutyl -Butyl ester), acetic acid- (1-ethyl-4-methyl-pentyl ester), acetic acid- (1-methyl-1-propyl-butyl ester), isovaric acid tert-pentyl ester, 3- Propyl-hexanoic acid methyl ester, 3-ethyl-heptanoic acid methyl ester, acetic acid- (1,1,4-trimethyl-pentyl ester), acetic acid- (1,5-dimethyl- Silester), 3-methyl-heptanoic acid ethyl ester, 3,3,5-trimethyl-hexanoic acid methyl ester, 3,3-dimethyl-heptanoic acid methyl ester, 3,3-dimethyl-barrelic acid iso Propyl ester, 2-ethylhexyl acetate, ethyl 2,4,4-trimethylpentanoate, butyl neopentanoate, neopentyl pibarate, pibaric acid isopentyl ester, 2-ethyl-butyric acid tert-butyl ester , 3,3-dimethyl-butyric acid sec-butyl ester, acetic acid- (1,4-dimethylbutyl) ester, sec-amyl isovarerate, 3-acetoxy-2,4-dimethylhexane, 3, 3-diethyl-pentanoic acid methyl ester, methyl-4,4-dimethylheptanoate, methyl 3,5,5-trimethylhexanoate, acetic acid 4-octyl ester, 3,5-dimethyl-heptanoic Acid methyl ester, 1-acetoxy-4,4-dimethyl-hexane, pentyl 3-methylbutanoate, 7-methyloctanoic acid Methyl ester, 2-ethyl-heptanoic acid methyl ester, methyl 2,4-dimethylheptanoate, methyl 2,2-dimethyl heptanoate, pentyl 2,2-dimethyl propanoate, ethyl 2,3,4- Trimethylbarrerate, tert-butyl hexanoate, 3-acetoxy-2,5-dimethyl-hexane, 1,1,3,3-tetramethylbutyl acetate, 2,2,4-trimethylpentyl acetate, methyl 2 , 2,3,3-tetramethylpentanoate, pentanoic acid- (2,2,3,4-tetramethyl-methyl ester), 2-propyl-2-methyl-pentanoic acid methyl ester, 1,1 -Dimethylethyl 3,3-dimethylbutanoate, tert-butyl 4-methylpentanoate, 2-isopropyl-3,3-dimethyl-butyric acid methyl ester, methyl 2-ethyl-2-methylhexanoate , Ethyl 2-ethyl-3,3-dimethylbutanoate, hexyl isobutanoate, methyl-5,5-dimethylheptanoate, methyl-2,3,4-trimethylhexanoate, methyl 2,3- Dimethyl-2-ethylpentanoate, 3- Yl octanoic acid methyl ester, 2,2-dimethylhexyl acetate, propyl neoheptanoate, isopropyl 2-methylhexanoate, 2-propyl-pentyl-acetate, butyl 2-ethyl butyrate, 4-methyloctanoic acid Methyl ester, 2-methylpentanoic acid- (1-methyl propyl ester), 2,2,4-trimethyl-hexanoic acid methyl ester, hexanoic acid- (2,2,5-trimethyl-methyl ester), 4 -Methylpentyl isobutyrate, 3-methylpentyl butyrate, ethyl 3,3,4-trimethylpentanoate, pentanoic acid- (3,4,4-trimethyl-ethyl ester), tert-amyl pibarate, isobutyl 3 , 3-dimethylbutyrate, 1-isopropyl-1,2-dimethylpropyl acetate, ethyl 4-ethylhexanoate, methyl 2-ethyl-3,3-dimethylpentanoate, methyl 3,6-dimethylheptanoate , Isobutyl hexanoate, 3,3,4,4-tetramethyl pentanoic acid methyl ester, 2-meth Bareric Butyl Ester, Pentyl 2-methylbutanoate, Neopentyl 2-methylbutanoate, Ethyl 3,3-dimethylhexanoate, 4-ethyl-3-hexyl acetate, 2,4-dimethylpentane-3- Monopropionate, methyl neononanoate, methyl 4,4,5-trimethylhexanoate, methyl diisopropyl propionate, 1-methylethyl 4-methylhexanoate, butanoic acid 1-ethylbutyl ester , 1-ethylpentyl propanoate, pentan-3-yl pentanoate, methyl 4-ethylheptanoate, pentan-3-yl 3-methylbutanoate, ethyl 5,5-dimethylhexanoate, 2- Methyl-3-methylbutyl butanoic acid ester, neryl acetate, dipropylene glycol dimethyl ether, or dipropylene glycol methyl ether acetate, and the like, and according to one embodiment of the present invention, tert in terms of excellent brightness and color reproduction. -Butyl acetate, sec-butyl acetate Yate, isobutyl acetate, n-butyl acetate, 2-methyl butyl acetate, 2-pentyl acetate, neopentyl acetate, 3-methylbutan-2-yl acetate, isoamyl acetate, n-pentyl acetate, tert-amyl acetate, 3-pentyl acetate, 2-hexyl acetate, 3-methylpentyl 3-acetate, 3-hexyl acetate, 2,3-dimethyl-2-butyl acetate, 2-ethylbutyl acetate, 2,3-dimethylbutyl acetate, 3- Methyl-1-pentyl acetate, 3,3-dimethylbutyl acetate, n-hexyl acetate, 4-methyl-1-pentyl acetate, 2-methyl-3-pentyl acetate, 4-methyl-2-pentyl acetate, 2-methyl Pentan-2-yl acetate, 1-methylhexyl acetate, 1-heptyl acetate, 1,1,2,2-tetramethylpropyl acetate, 5-methylhexyl acetate, ethyl isoamyl acetate, 4-heptyl acetate, 5-methyl Hexane-2-yl acetate, 2,4-dimethyl-2-phene Acetate, 2-methyl-2-hexyl acetate, 4,4-dimethylpentyl acetate, 4-methyl-3-hexyl acetate, 2-octyl acetate, 1-ethylhexyl acetate, 1-octyl acetate, 2-ethylhexyl acetate, 1,1,3,3-tetramethylbutyl acetate, 2,2,4-trimethylpentyl acetate, 2,2-dimethylhexyl acetate, 1-isopropyl-1,2-dimethylpropyl acetate, 4-ethyl-3- Preference is given to using hexyl acetate, dipropylene glycol dimethyl ether or dipropylene glycol methyl ether acetate.
상기 용제는 각각 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다.The said solvent can be used individually or in mixture of 2 or more types, respectively.
상기 용제의 함량은 양자점 분산액 전체 100중량%에 대하여 5 내지 95중량%, 바람직하게는 20 내지 90중량%, 보다 바람직하게는 30 내지 80중량%로 포함될 수 있다. 상기 용제가 상기 범위 미만으로 포함될 경우 분산성이 악화되는 문제가 발생할 수 있으며, 상기 범위를 초과할 경우 수지 조성물의 고형분을 조절하기 어려운 문제가 발생할 수 있다.The content of the solvent may be included in 5 to 95% by weight, preferably 20 to 90% by weight, more preferably 30 to 80% by weight relative to 100% by weight of the total quantum dot dispersion. If the solvent is included in less than the above range may cause a problem that the dispersibility deteriorates, if it exceeds the above range may cause a problem that it is difficult to control the solid content of the resin composition.
본 발명의 양자점 분산액은 용제가 전체적으로 전술한 용제의 조건, 즉 상기 수학식 1의 한센 용해도 파라미터를 만족하며, 할로겐화 탄화수소계 용제; 방향족 탄화수소계 용제; 및 지방족 탄화수소계 용제;는 포함하지 않는 조건을 만족한다. 따라서, 본 발명의 일 실시형태에 따르면, 본 발명의 양자점 분산액 내 개별 용제 성분은 상기 수학식 1의 한센 용해도 파라미터를 만족하지 않더라도, 이들로 이루어진 용제 전체는 수학식 1의 한센 용해도 파라미터를 만족한다.The quantum dot dispersion of the present invention, the solvent as a whole satisfies the above-described conditions of the solvent, that is, the Hansen solubility parameter of the above formula (1), halogenated hydrocarbon solvent; Aromatic hydrocarbon solvents; And an aliphatic hydrocarbon solvent; satisfies a condition not included. Therefore, according to one embodiment of the present invention, even if the individual solvent component in the quantum dot dispersion of the present invention does not satisfy the Hansen solubility parameter of Equation 1 above, the entire solvent composed of these satisfies the Hansen solubility parameter of Equation 1 .
본 발명의 일 실시형태에 있어서, 상기 양자점 분산액은 인산 에스테르계 화합물을 더 포함하는 것일 수 있다. 상기 인산 에스테르계 화합물을 더 포함할 경우, 양자점과 용제와의 분산성이 향상되어 양자 효율이 우수한 이점이 있으며, 광효율 저하 및 감광특성 불량을 억제할 수 있는 이점이 있다. 또한, 이를 포함하는 자발광 감광성 수지 조성물을 구성하는 다른 구성들과의 상용성이 우수한 이점이 있다. In one embodiment of the present invention, the quantum dot dispersion may further include a phosphate ester compound. When the phosphate ester compound is further included, the dispersibility between the quantum dot and the solvent is improved, and thus, the quantum efficiency is excellent, and the light efficiency is lowered and the photosensitive characteristic can be suppressed. In addition, there is an advantage of excellent compatibility with other components constituting the self-luminous photosensitive resin composition comprising the same.
상기 인산 에스테르계 화합물은 인산 에스테르((HO)2PO(OR)) 또는 인산(H3PO4)에 존재하는 히드록시기 또는 히드록시기의 수소원자를 다른 작용기로 치환 또는 비치환한 형태를 포함할 수 있다. 예컨대 상기 인산 에스테르계 화합물은 (H2PO3-)의 형태로 표현될 수 있으나, 이에 한정되는 것은 아니다. 또한, 본 발명에서 상기 "인산 에스테르계"란 아인산 유도체, 인산 유도체, 포스폰산 유도체 및 포스핀산 유도체로 구성되는 군에서 선택되는 하나 이상을 포함할 수도 있다.The phosphate ester compound may include a form in which a hydroxy group or a hydrogen atom of a hydroxy group present in phosphate ester ((HO) 2 PO (OR)) or phosphoric acid (H 3 PO 4 ) is substituted or unsubstituted with another functional group. For example, the phosphate ester compound may be represented in the form of (H 2 PO 3 −), but is not limited thereto. In the present invention, the "phosphate ester type" may include at least one selected from the group consisting of phosphorous acid derivatives, phosphoric acid derivatives, phosphonic acid derivatives, and phosphinic acid derivatives.
상기 인산 에스테르계 화합물은 한 분자 내에 폴리에테르 부분, 폴리에스테르 부분 및 인산기 중 하나 이상을 더 포함할 수 있다.The phosphate ester compound may further include at least one of a polyether moiety, a polyester moiety, and a phosphate group in one molecule.
본 발명에서 "폴리-"란, 많은 수의 반복단위로 이루어진 화합물을 일컬을 수 있는 것으로서, 상기 "폴리에테르 부분", "폴리에스테르 부분"은 각각 에테르기 또는 에스테르기를 포함하는 반복단위가 1 내지 20 로 이루어진 부분을 일컬을 수 있다. 바람직하게는, 본 발명에서는 반복단위가 5 내지 20, 더욱 바람직하게는 10 내지 20으로 이루어질 수 있으며, 이 경우 상용성이 우수한 이점이 있다.In the present invention, "poly-" may refer to a compound composed of a large number of repeating units, and the "polyether portion" and "polyester portion" may have 1 to 20 repeating units each containing an ether group or an ester group. It can be referred to as a part consisting of. Preferably, in the present invention, the repeating unit may be composed of 5 to 20, more preferably 10 to 20, in this case there is an excellent compatibility.
상기 인산 에스테르계 화합물이 한 분자 내에 폴리에테르 부분을 더 포함하는 경우 후술할 알칼리 가용성 수지와의 상용성이 향상되는 이점이 있으며, 상기 인산 에스테르계 화합물이 한 분자 내에 폴리에스테르 부분을 더 포함하는 경우 알칼리 가용성 수지와의 상용성 및 알칼리 현상액에 대한 용해 특성이 향상되는 이점이 있다. 상기 인산 에스테르계 화합물이 한 분자 내에 인산기를 더 포함하는 경우 양자점 표면에 흡착을 통해 보호층 역할을 수행할 수 있고, 상기 양자점을 탈응집 시키는 이점이 있다. When the phosphate ester compound further includes a polyether moiety in one molecule, compatibility with alkali-soluble resins to be described later is improved, and the phosphate ester compound further includes a polyester moiety in one molecule. There is an advantage that the compatibility with the alkali-soluble resin and the dissolution characteristics for the alkaline developer are improved. When the phosphate ester compound further includes a phosphate group in one molecule, the phosphate ester compound may serve as a protective layer through adsorption on the surface of the quantum dot, and has the advantage of deagglomerating the quantum dot.
바람직하게는 본 발명에 따른 인산 에스테르계 화합물은 한 분자 내에 폴리 에테르 부분, 폴리에스테르 부분 및 인산기를 포함할 수 있으며, 이 경우 양자점을 탈응집시켜 분산입도를 작게 하고, 알칼리 가용성 수지와의 상용성 및 알칼리 현상액에 대한 용해 특성이 있어 패턴형성에 유리한 이점이 있으므로 가장 바람직하다.Preferably, the phosphate ester compound according to the present invention may include a polyether moiety, a polyester moiety, and a phosphate group in one molecule, in which case deagglomeration of quantum dots reduces the particle size of the dispersion, and compatibility with alkali-soluble resins. And dissolution properties in alkaline developing solution, which is advantageous because it has an advantageous advantage in pattern formation.
본 발명에서, "산가"란, 아크릴계 중합체 1g을 중화하는 데 필요한 수산화칼륨의 양(mg)으로서 측정되는 값으로 후술할 자발광 감광성 수지 조성물에 대한 용해성에 관여할 수 있다. 상기 인산 에스테르계 화합물의 산가가 10 (KOHmg/g) 이상, 구체적으로 10 내지 200 (KOHmg/g)인 경우 상기 표면처리제를 포함하는 자발광 감광성 수지 조성물의 현상 속도 면에서 바람직하다. 상기 산가가 상기 범위 미만인 경우 충분한 현상 속도를 확보하기 다소 어려울 수 있고, 상기 범위를 초과하는 경우 기판과의 밀착성이 감소되어 패턴의 단락이 발생하기 쉽고, 전체적인 조성물의 저장 안정성이 저하되어 점도가 상승하는 문제가 발생할 수 있으므로 상기 범위를 만족하는 것이 바람직하다.In the present invention, the "acid value" is a value measured as the amount (mg) of potassium hydroxide required to neutralize 1 g of the acrylic polymer and may be involved in solubility in the self-luminous photosensitive resin composition described later. When the acid value of the phosphate ester compound is 10 (KOHmg / g) or more, specifically 10 to 200 (KOHmg / g) is preferable in terms of the development rate of the self-luminous photosensitive resin composition containing the surface treatment agent. When the acid value is less than the above range, it may be somewhat difficult to secure a sufficient developing speed, and when the acid value exceeds the above range, adhesion to the substrate may be reduced, thereby causing short circuiting of the pattern, and lowering the storage stability of the overall composition to increase the viscosity. Since the problem may occur, it is preferable to satisfy the above range.
상기 인산 에스테르계 화합물은 상기 양자점 고형분 전체 100중량부에 대하여 1 내지 300중량부로 포함될 수 있으며, 바람직하게는 3 내지 250중량부, 더욱 바람직하게는 5 내지 200중량부로 포함될 수 있다. 상기 표면처리제가 상기 범위 내로 포함될 경우 상기 양자점의 탈응집 효과가 우수하고, 본 발명에 따른 양자점 분산액 및 이를 포함하는 자발광 감광성 수지 조성물 내의 극성 차이에 의한 석출현상의 억제가 가능하며, 컬러필터 제조 공정 시 양자점의 보호층 역할을 수행할 수 있으므로 바람직하다.The phosphoric acid ester compound may be included in an amount of 1 to 300 parts by weight, preferably 3 to 250 parts by weight, and more preferably 5 to 200 parts by weight, based on 100 parts by weight of the total quantum dot solids. When the surface treating agent is included in the above range, the deagglomeration effect of the quantum dots is excellent, and the precipitation phenomenon due to the polarity difference in the quantum dot dispersion liquid and the self-luminous photosensitive resin composition including the same according to the present invention is possible, and color filter manufacture It is preferable because it can act as a protective layer of the quantum dots in the process.
상기 인산 에스테르계 화합물이 상기 범위 미만으로 포함될 경우 상기 양자점의 탈응집 효과가 다소 저하될 수 있으며, 상기 범위를 초과하여 포함될 경우 상기 양자점 분산액을 포함하는 자발광 감광성 수지 조성물의 현상 특성이 다소 저하될 수 있으므로, 상기 범위 내로 포함되는 것이 바람직하다.When the phosphate ester compound is included in the range below, the deagglomeration effect of the quantum dots may be slightly lowered. When the phosphate ester compound is included in the range above, the development characteristics of the self-luminous photosensitive resin composition including the quantum dot dispersion may be slightly lowered. Since it is possible, it is preferable to be included in the above range.
<자발광 감광성 수지 조성물><Self-luminous photosensitive resin composition>
본 발명의 다른 양태는 전술한 양자점 분산액; 및 알칼리 가용성 수지, 광중합성 화합물, 광중합 개시제, 추가 용제 및 첨가제로 이루어진 군으로부터 선택되는 하나 이상을 더 포함하는 자발광 감광성 수지 조성물에 관한 것이다. Another aspect of the invention is a quantum dot dispersion described above; And an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, an additional solvent, and at least one selected from the group consisting of additives.
본 발명에 따른 자발광 감광성 수지 조성물은 전술한 양자점 분산액을 상기 자발광 감광성 수지 조성물 전체 100 중량%에 대하여 3 내지 80 중량%, 바람직하게는 5 내지 70 중량%, 더욱 바람직하게는 10 내지 60 중량%로 포함할 수 있다. 본 발명에 따른 자발광 감광성 수지 조성물이 전술한 양자점 분산액을 상기 범위 내로 포함할 경우 발광특성이 우수한 컬러필터의 제조가 가능한 이점이 있다. 상기 양자점 분산액이 상기 범위 미만으로 포함될 경우 발광 특성이 다소 저하될 수 있으며, 상기 양자점 분산액이 상기 범위를 초과하여 포함될 경우 상대적으로 다른 구성의 함량이 줄어듦에 따라 패턴의 형성이 다소 어려울 수 있으며, 신뢰성이 저하될 수 있으므로 상기 범위 내로 포함되는 것이 바람직하다.In the self-luminous photosensitive resin composition according to the present invention, the quantum dot dispersion described above is 3 to 80% by weight, preferably 5 to 70% by weight, more preferably 10 to 60% by weight based on 100% by weight of the total of the self-luminous photosensitive resin composition May contain%. When the self-luminous photosensitive resin composition according to the present invention includes the above-described quantum dot dispersion in the above range, there is an advantage in that a color filter having excellent light emission characteristics can be manufactured. When the quantum dot dispersion is included in the range below the light emission characteristics may be slightly reduced, when the quantum dot dispersion is included in the above range, the formation of the pattern may be somewhat difficult as the content of the other composition is reduced, the reliability Since it may be lowered, it is preferable to be included in the above range.
본 발명에 따른 자발광 감광성 수지 조성물은 알칼리 가용성 수지를 더 포함할 수 있다.The self-luminous photosensitive resin composition according to the present invention may further include an alkali-soluble resin.
상기 알칼리 가용성 수지는 상기 자발광 감광성 수지 조성물로 제조하는 컬러필터의 비노광부를 알칼리 가용성으로 만들어 제거 가능하게 하고, 노광 영역을 잔류시키는 역할을 수행할 수 있다. 또한, 상기 자발광 감광성 수지 조성물이 상기 알칼리 가용성 수지를 포함하는 경우, 상기 양자점이 조성물 내에 고르게 분산 될 수 있으며, 공정 중에 상기 양자점을 보호하여 휘도를 유지하도록 하는 역할을 수행할 수 있다.The alkali-soluble resin may serve to make the non-exposed part of the color filter made of the self-luminous photosensitive resin composition alkali-soluble and to remove it, and to leave the exposure area. In addition, when the self-luminous photosensitive resin composition includes the alkali-soluble resin, the quantum dots may be evenly dispersed in the composition, and may serve to maintain the brightness by protecting the quantum dots during the process.
본 발명에 따른 상기 알칼리 가용성 수지는 50 내지 200 (KOHmg/g)의 산가를 갖는 것을 선정하여 사용할 수 있다. 상기 "산가"란, 아크릴계 중합체 1g을 중화하는 데 필요한 수산화칼륨의 양(mg)으로서 측정되는 값으로 용해성에 관여한다. 상기 알칼리 가용성 수지의 산가가 상기 범위 미만인 경우 충분한 현상속도를 확보하기 어려울 수 있으며, 상기 범위를 초과하면 기판과의 밀착성이 감소되어 패턴의 단락이 발생하기 쉽고, 전체 조성물의 저장 안정성이 저하되어 점도가 상승하는 문제가 발생할 수 있다.The alkali-soluble resin according to the present invention can be selected to have an acid value of 50 to 200 (KOHmg / g). The "acid value" is a value measured as the amount (mg) of potassium hydroxide required to neutralize 1 g of the acrylic polymer and is involved in solubility. When the acid value of the alkali-soluble resin is less than the above range, it may be difficult to secure a sufficient developing speed, when the acid value of the alkali-soluble resin is exceeded, the adhesion to the substrate is reduced, the short circuit of the pattern is likely to occur, the storage stability of the entire composition is lowered viscosity The problem may arise.
또한, 상기 알칼리 가용성 수지는 컬러필터로 사용하기 위한 표면 경도 향상을 위해 분자량 및 분자량 분포도(Mw/Mn)의 한정을 고려할 수 있다. 바람직하기로 중량평균분자량이 3,000 내지 30,000, 바람직하게는 5,000 내지 20,000이 되도록 하고, 분자량 분포도는 1.5 내지 6.0, 바람직하기로 1.8 내지 4.0의 범위를 갖도록 직접 중합하거나 구입하여 사용한다. 상기 범위의 분자량 및 분자량 분포도를 갖는 알칼리 가용성 수지는 이미 언급한 경도가 향상될 수 있고, 높은 잔막율 뿐만 아니라 현상액 중의 비-노출부의 용해성이 탁월하고 해상도를 향상시킬 수 있다.In addition, the alkali-soluble resin may consider the limitation of the molecular weight and the molecular weight distribution (Mw / Mn) in order to improve the surface hardness for use as a color filter. Preferably, the weight average molecular weight is 3,000 to 30,000, preferably 5,000 to 20,000, and the molecular weight distribution is 1.5 to 6.0, preferably 1.8 to 4.0 to directly polymerize or purchase and use. Alkali-soluble resins having a molecular weight and molecular weight distribution in the above range can be improved in the hardness already mentioned, as well as high residual film ratio, solubility of the non-exposed portion in the developing solution can be excellent and the resolution can be improved.
상기 알칼리 가용성 수지는 카르복실기 함유 불포화 단량체의 중합체, 또는 이와 공중합 가능한 불포화 결합을 갖는 단량체와의 공중합체 및 이들의 조합으로 이루어진 군에서 선택된 1종 이상을 포함한다.The alkali-soluble resin includes at least one member selected from the group consisting of polymers of carboxyl group-containing unsaturated monomers, copolymers with monomers having unsaturated bonds copolymerizable therewith, and combinations thereof.
이때 카르복실기 함유 불포화 단량체는 불포화 모노카르복시산, 불포화 디카르복시산, 불포화 트리카르복시산 등이 가능하다. 구체적으로, 불포화 모노카르복시산으로서는, 예를 들면 아크릴산, 메타크릴산, 크로톤산, α-클로로아크릴산, 신남산 등을 들 수 있다. 불포화 디카르복시산으로서는, 예를 들면 말레산, 푸마르산, 이타콘산, 시트라콘산, 메사콘산 등을 들 수 있다. 불포화 다가 카르복시산은 산무수물일 수도 있으며, 구체적으로는 말레산 무수물, 이타콘산 무수물, 시트라콘산 무수물 등을 들 수 있다. 또한, 불포화 다가 카르복시산은 그의 모노(2-메타크릴로일옥시알킬)에스테르일 수도 있으며, 예를 들면 숙신산 모노(2-아크릴로일옥시에틸), 숙신산 모노(2-메타크릴로일옥시에틸), 프탈산 모노(2-아크릴로일옥시에틸), 프탈산 모노(2-메타크릴로일옥시에틸) 등을 들 수 있다. 불포화 다가 카르복시산은 그 양말단 디카르복시 중합체의 모노(메타)아크릴레이트일 수도 있으며, 예를 들면 ω-카르복시폴리카프로락톤 모노아크릴레이트, ω-카르복시폴리카프로락톤 모노메타크릴레이트 등을 들 수 있다. 이들 카르복실기 함유 단량체는 각각 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다.In this case, the carboxyl group-containing unsaturated monomer may be unsaturated monocarboxylic acid, unsaturated dicarboxylic acid, unsaturated tricarboxylic acid, or the like. Specifically, as unsaturated monocarboxylic acid, acrylic acid, methacrylic acid, crotonic acid, (alpha)-chloroacrylic acid, cinnamic acid etc. are mentioned, for example. As unsaturated dicarboxylic acid, maleic acid, a fumaric acid, itaconic acid, a citraconic acid, a mesaconic acid, etc. are mentioned, for example. The unsaturated polyhydric carboxylic acid may be an acid anhydride, and specific examples thereof include maleic anhydride, itaconic anhydride and citraconic anhydride. Moreover, unsaturated polyhydric carboxylic acid may be mono (2-methacryloyloxyalkyl) ester, for example, succinic acid mono (2-acryloyloxyethyl), succinic acid mono (2-methacryloyloxyethyl) And phthalic acid mono (2-acryloyloxyethyl), phthalic acid mono (2-methacryloyloxyethyl) and the like. The unsaturated polyhydric carboxylic acid may be mono (meth) acrylate of the sock end dicarboxy polymer, and examples thereof include? -Carboxypolycaprolactone monoacrylate and? -Carboxypolycaprolactone monomethacrylate. These carboxyl group-containing monomers can be used individually or in mixture of 2 or more types, respectively.
또한, 카르복실기 함유 불포화 단량체와 공중합이 가능한 단량체는 방향족 비닐 화합물, 불포화 카르복시산 에스테르 화합물, 불포화 카르복시산 아미노알킬에스테르 화합물, 불포화 카르복시산 글리시딜에스테르 화합물, 카르복시산 비닐에스테르 화합물, 불포화 에테르류 화합물, 시안화 비닐 화합물, 불포화 이미드류 화합물, 지방족 공액 디엔류 화합물, 분자쇄의 말단에 모노아크릴로일기 또는 모노메타크릴로일기를 갖는 거대 단량체, 벌키성 단량체 및 이들의 조합으로 이루어진 군에서 선택된 1종이 가능하다.In addition, monomers copolymerizable with carboxyl group-containing unsaturated monomers include aromatic vinyl compounds, unsaturated carboxylic acid ester compounds, unsaturated carboxylic acid aminoalkyl ester compounds, unsaturated carboxylic acid glycidyl ester compounds, carboxylic acid vinyl ester compounds, unsaturated ether compounds, vinyl cyanide compounds, One type selected from the group consisting of an unsaturated imide compound, an aliphatic conjugated diene compound, a macromonomer having a monoacryloyl group or a monomethacryloyl group at the terminal of the molecular chain, a bulky monomer, and a combination thereof is possible.
보다 구체적으로, 상기 공중합 가능한 단량체는 스티렌, α-메틸스티렌, o-비닐톨루엔, m-비닐톨루엔, p-비닐톨루엔, p-클로로스티렌, o-메톡시스티렌, m-메톡시스티렌, p-메톡시스티렌, o-비닐벤질메틸에테르, m-비닐벤질메틸에테르, p-비닐벤질메틸에테르, o-비닐벤질글리시딜에테르, m-비닐벤질글리시딜에테르, p-비닐벤질글리시딜에테르, 인덴 등의 방향족 비닐 화합물; 메틸아크릴레이트, 메틸메타크릴레이트, 에틸아크릴레이트, 에틸메타크릴레이트, n-프로필아크릴레이트, n-프로필메타크릴레이트, i-프로필아크릴레이트, i-프로필메타크릴레이트, n-부틸아크릴레이트, n-부틸메타크릴레이트, i-부틸아크릴레이트, i-부틸메타크릴레이트, sec-부틸아크릴레이트, sec-부틸메타크릴레이트, t-부틸아크릴레이트, t-부틸메타크릴레이트, 2-히드록시에틸아크릴레이트, 2-히드록시에틸메타크릴레이트, 2-히드록시프로필아크릴레이트, 2-히드록시프로필메타크릴레이트, 3-히드록시프로필아크릴레이트, 3-히드록시프로필메타크릴레이트, 2-히드록시부틸아크릴레이트, 2-히드록시부틸메타크릴레이트, 3-히드록시부틸아크릴레이트, 3-히드록시부틸메타크릴레이트, 4-히드록시부틸아크릴레이트, 4-히드록시부틸메타크릴레이트, 알릴아크릴레이트, 알릴메타크릴레이트, 벤질아크릴레이트, 벤질메타크릴레이트, 시클로헥실아크릴레이트, 시클로헥실메타크릴레이트, 페닐아크릴레이트, 페닐메타크릴레이트, 2-메톡시에틸아크릴레이트, 2-메톡시에틸메타크릴레이트, 2-페녹시에틸아크릴레이트, 2-페녹시에틸메타크릴레이트, 메톡시디에틸렌글리콜아크릴레이트, 메톡시디에틸렌글리콜메타크릴레이트, 메톡시트리에틸렌글리콜아크릴레이트, 메톡시트리에틸렌글리콜메타크릴레이트, 메톡시프로필렌글리콜아크릴레이트, 메톡시프로필렌글리콜메타크릴레이트, 메톡시디프로필렌글리콜아크릴레이트, 메톡시디프로필렌글리콜메타크릴레이트, 이소보르닐아크릴레이트, 이소보르닐메타크릴레이트, 디시클로펜타디에닐아크릴레이트, 디시클로펜타디에틸메타크릴레이트, 아다만틸(메타)아크릴레이트, 노르보르닐(메타)아크릴레이트, 2-히드록시-3-페녹시프로필아크릴레이트, 2-히드록시-3-페녹시프로필메타크릴레이트, 글리세롤모노아크릴레이트, 글리세롤모노메타크릴레이트 등의 불포화 카르복시산 에스테르; 2-아미노에틸아크릴레이트, 2-아미노에틸메타크릴레이트, 2-디메틸아미노에틸아크릴레이트, 2-디메틸아미노에틸 메타크릴레이트, 2-아미노프로필아크릴레이트, 2-아미노프로필메타크릴레이트, 2-디메틸아미노프로필아크릴레이트, 2-디메틸아미노프로필메타크릴레이트, 3-아미노프로필아크릴레이트, 3-아미노프로필메타크릴레이트, 3-디메틸아미노프로필아크릴레이트, 3-디메틸아미노프로필메타크릴레이트 등의 불포화 카르복시산 아미노알킬에스테르 화합물; 글리시딜아크릴레이트, 글리시딜메타크릴레이트 등의 불포화 카르복시산 글리시딜에스테르 화합물; 아세트산 비닐, 프로피온산 비닐, 부티르산 비닐, 벤조산 비닐 등의 카르복시산 비닐에스테르 화합물; 비닐메틸에테르, 비닐에틸에테르, 알릴글리시딜에테르 등의 불포화 에테르 화합물; 아크릴로니트릴, 메타크릴로니트릴, α-클로로아크릴로니트릴, 시안화 비닐리덴 등의 시안화 비닐 화합물; 아크릴아미드, 메타크릴아미드, α-클로로아크릴아미드, N-2-히드록시에틸아크릴아미드, N-2-히드록시에틸메타크릴아미드 등의 불포화 아미드류; 말레이미드, 벤질말레이미드, N-페닐말레이미드, N-시클로헥실말레이미드 등의 불포화 이미드 화합물; 1,3-부타디엔, 이소프렌, 클로로프렌 등의 지방족 공액 디엔류; 및 폴리스티렌, 폴리메틸아크릴레이트, 폴리메틸메타크릴레이트, 폴리-n-부틸아크릴레이트, 폴리-n-부틸메타크릴레이트, 폴리실록산의 중합체 분자쇄의 말단에 모노아크릴로일기 또는 모노메타크릴로일기를 갖는 거대 단량체류; 비유전 상수값을 낮출수 있는 노르보닐 골격을 갖는 단량체, 아다만탄골격을 갖는 단량체, 로진 골격을 갖는 단량체 등의 벌키성 단량체가 사용 가능하다.More specifically, the copolymerizable monomer may be styrene, α-methylstyrene, o-vinyltoluene, m-vinyltoluene, p-vinyltoluene, p-chlorostyrene, o-methoxystyrene, m-methoxystyrene, p- Methoxy styrene, o-vinyl benzyl methyl ether, m-vinyl benzyl methyl ether, p-vinyl benzyl methyl ether, o-vinyl benzyl glycidyl ether, m-vinyl benzyl glycidyl ether, p-vinyl benzyl glycidyl Aromatic vinyl compounds such as ether and indene; Methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, n-propyl acrylate, n-propyl methacrylate, i-propyl acrylate, i-propyl methacrylate, n-butyl acrylate, n-butyl methacrylate, i-butyl acrylate, i-butyl methacrylate, sec-butyl acrylate, sec-butyl methacrylate, t-butyl acrylate, t-butyl methacrylate, 2-hydroxy Ethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 3-hydroxypropyl acrylate, 3-hydroxypropyl methacrylate, 2-hydroxy Hydroxybutyl acrylate, 2-hydroxybutyl methacrylate, 3-hydroxybutyl acrylate, 3-hydroxybutyl methacrylate, 4-hydroxybutyl acrylate, 4-hydroxybutyl methacrylate, allyl Relate, allyl methacrylate, benzyl acrylate, benzyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, phenyl acrylate, phenyl methacrylate, 2-methoxyethyl acrylate, 2-methoxyethyl Methacrylate, 2-phenoxyethyl acrylate, 2-phenoxyethyl methacrylate, methoxydiethylene glycol acrylate, methoxydiethylene glycol methacrylate, methoxytriethylene glycol acrylate, methoxytriethylene glycol meth Methacrylate, methoxy propylene glycol acrylate, methoxy propylene glycol methacrylate, methoxy dipropylene glycol acrylate, methoxy dipropylene glycol methacrylate, isobornyl acrylate, isobornyl methacrylate, dicyclopentadier Nyl acrylate, dicyclopentadiethyl methacrylate, adamantyl (meth) a Relate, norbornyl (meth) acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-hydroxy-3-phenoxypropyl methacrylate, glycerol monoacrylate, glycerol monomethacrylate, etc. Unsaturated carboxylic acid esters of; 2-aminoethyl acrylate, 2-aminoethyl methacrylate, 2-dimethylaminoethyl acrylate, 2-dimethylaminoethyl methacrylate, 2-aminopropyl acrylate, 2-aminopropyl methacrylate, 2-dimethyl Unsaturated carboxylic acids such as aminopropyl acrylate, 2-dimethylaminopropyl methacrylate, 3-aminopropyl acrylate, 3-aminopropyl methacrylate, 3-dimethylaminopropyl acrylate, and 3-dimethylaminopropyl methacrylate Alkyl ester compounds; Unsaturated carboxylic acid glycidyl ester compounds such as glycidyl acrylate and glycidyl methacrylate; Carboxylic acid vinyl ester compounds, such as vinyl acetate, a vinyl propionate, a vinyl butyrate, and a vinyl benzoate; Unsaturated ether compounds such as vinyl methyl ether, vinyl ethyl ether and allyl glycidyl ether; Vinyl cyanide compounds such as acrylonitrile, methacrylonitrile, α-chloroacrylonitrile and vinylidene cyanide; Unsaturated amides such as acrylamide, methacrylamide, α-chloroacrylamide, N-2-hydroxyethylacrylamide and N-2-hydroxyethyl methacrylamide; Unsaturated imide compounds such as maleimide, benzylmaleimide, N-phenylmaleimide, and N-cyclohexylmaleimide; Aliphatic conjugated dienes such as 1,3-butadiene, isoprene and chloroprene; And monoacryloyl or monomethacryloyl groups at the terminal of the polymer molecular chain of polystyrene, polymethylacrylate, polymethylmethacrylate, poly-n-butylacrylate, poly-n-butylmethacrylate, polysiloxane. Macromonomers having; Bulky monomers, such as a monomer having a norbornyl skeleton, a monomer having an adamantane skeleton, and a monomer having a rosin skeleton, can lower the dielectric constant.
상기 알칼리 가용성 수지는 상기 자발광 감광성 수지 조성물의 고형분 전체 100중량%에 대하여 5 내지 80중량%, 구체적으로 10 내지 70중량%, 더욱 구체적으로 15 내지 60중량%로 포함될 수 있다. 상기 알칼리 가용성 수지가 상기 범위 내로 포함될 경우 현상액에서의 용해성이 충분하여 패턴형성이 용이하며, 현상시에 노광부의 화소 부분의 막 감소가 방지되어 비화소 부분의 누락성이 양호해지므로 바람직하다. 상기 알칼리 가용성 수지가 상기 범위 미만으로 포함될 경우 비화소 부분이 다소 누락될 수 있으며, 상기 알칼리 가용성 수지가 상기 범위를 초과하여 포함될 경우 현상액에서의 용해성이 다소 저하되어 패턴형성이 다소 어려울 수 있다.The alkali-soluble resin may be included in 5 to 80% by weight, specifically 10 to 70% by weight, more specifically 15 to 60% by weight based on 100% by weight of the total solid content of the self-luminous photosensitive resin composition. When the alkali-soluble resin is included in the above range, the solubility in the developing solution is sufficient, so that pattern formation is easy, and the film reduction of the pixel portion of the exposed portion is prevented at the time of development, so that the dropping of the non-pixel portion is good, which is preferable. If the alkali-soluble resin is included in less than the above range, the non-pixel portion may be somewhat missing, and when the alkali-soluble resin is included in more than the above range, the solubility in the developing solution is slightly lowered may be somewhat difficult to form a pattern.
본 발명의 자발광 감광성 수지 조성물에 더 포함될 수 있는 광중합성 화합물은 광 및 후술할 광중합 개시제의 작용으로 중합할 수 있는 화합물로서, 단관능 단량체, 2관능 단량체, 그 밖의 다관능 단량체 등을 들 수 있다. The photopolymerizable compound which may be further included in the self-luminous photosensitive resin composition of the present invention is a compound which can be polymerized by the action of light and a photopolymerization initiator to be described later, and may include monofunctional monomers, bifunctional monomers, other polyfunctional monomers, and the like. have.
상기 단관능 단량체의 종류는 특별히 한정되지 않으며, 예를 들면 노닐페닐카르비톨아크릴레이트, 2-히드록시-3-페녹시프로필아크릴레이트, 2-에틸헥실카르비톨아크릴레이트, 2-히드록시에틸아크릴레이트, N-비닐피롤리돈 등을 들 수 있다.The kind of the monofunctional monomer is not particularly limited, and for example, nonylphenylcarbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexyl carbitol acrylate, 2-hydroxyethyl acryl The rate, N-vinylpyrrolidone, etc. are mentioned.
상기 2관능 단량체의 종류는 특별히 한정되지 않으며, 예를 들면, 1,6-헥산디올디(메타)아크릴레이트, 에틸렌글리콜디(메타)아크릴레이트, 네오펜틸글리콜디(메타)아크릴레이트, 트리에틸렌글리콜디(메타)아크릴레이트, 비스페놀 A의 비스(아크릴로일옥시에틸)에테르, 3-메틸펜탄디올디(메타)아크릴레이트 등을 들 수 있다.The kind of the said bifunctional monomer is not specifically limited, For example, 1, 6- hexanediol di (meth) acrylate, ethylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, and triethylene Glycol di (meth) acrylate, bis (acryloyloxyethyl) ether of bisphenol A, 3-methylpentanediol di (meth) acrylate, and the like.
상기 다관능 단량체의 종류는 특별히 한정되지 않으며, 예를 들면, 트리메틸올프로판트리(메타)아크릴레이트, 에톡실레이티드트리메틸올프로판트리(메타)아크릴레이트, 프로폭실레이티드트리메틸올프로판트리(메타)아크릴레이트, 펜타에리스리톨트리(메타)아크릴레이트, 펜타에리스리톨테트라(메타)아크릴레이트, 디펜타에리스리톨트리(메타)아크릴레이트, 디펜타에리스리톨펜타(메타)아크릴레이트, 에톡실레이티드디펜타에리스리톨헥사(메타)아크릴레이트, 프로폭실레이티드디펜타에리스리톨헥사(메타)아크릴레이트, 디펜타에리스리톨헥사(메타)아크릴레이트 등을 들 수 있다. 이들 중에서 2관능 이상의 다관능 단량체가 바람직하게 사용된다.The kind of the polyfunctional monomer is not particularly limited, and examples thereof include trimethylolpropane tri (meth) acrylate, ethoxylated trimethylol propane tri (meth) acrylate, and propoxylated trimethylolpropane tree (meth). ) Acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol tri (meth) acrylate, dipentaerythritol penta (meth) acrylate, ethoxylated dipentaerythritol hexa (Meth) acrylate, propoxylated dipentaerythritol hexa (meth) acrylate, dipentaerythritol hexa (meth) acrylate, etc. are mentioned. Of these, bifunctional or higher polyfunctional monomers are preferably used.
상기 광중합성 화합물은 상기 자발광 감광성 수지 조성물 고형분 전체 100중량%에 대하여 5 내지 70중량%, 구체적으로 10 내지 60중량%, 더욱 구체적으로 15 내지 50중량%로 포함될 수 있다. 상기 광중합성 화합물이 상기 범위 내로 포함될 경우 화소부의 강도나 평활성 측면에서 바람직한 이점이 있다. 상기 광중합성 화합물이 상기 범위 미만으로 포함되는 경우 화소부의 강도가 다소 저하될 수 있으며, 상기 광중합성 화합물이 상기 범위를 초과하여 포함되는 경우 평활성이 다소 저하될 수 있으므로 상기 범위 내로 포함되는 것이 바람직하다.The photopolymerizable compound may be included in an amount of 5 to 70% by weight, specifically 10 to 60% by weight, and more specifically 15 to 50% by weight, based on 100% by weight of the total solid of the self-luminous photosensitive resin composition. When the photopolymerizable compound is included in the above range, there is a preferable advantage in terms of intensity or smoothness of the pixel portion. When the photopolymerizable compound is included in the range below, the intensity of the pixel portion may be lowered slightly, and when the photopolymerizable compound is included in the above range, smoothness may be slightly lowered, so it is preferably included within the range. .
본 발명에 따른 자발광 감광성 수지 조성물은 광중합 개시제를 더 포함할 수 있으며, 상기 광중합 개시제는 상기 광중합성 화합물을 중합시킬 수 있는 것이라면 그 종류를 특별히 제한하지 않고 사용할 수 있다. 특히, 상기 광중합 개시제는 중합특성, 개시효율, 흡수파장, 입수성, 가격 등의 관점에서 아세토페논계 화합물, 벤조페논계 화합물, 트리아진계 화합물, 비이미다졸계 화합물, 옥심 화합물 및 티오크산톤계 화합물로 이루어지는 군으로부터 선택되는 1종 이상의 화합물을 사용하는 것이 바람직하다.The self-luminous photosensitive resin composition according to the present invention may further include a photopolymerization initiator, and the photopolymerization initiator may be used without particular limitation as long as it can polymerize the photopolymerizable compound. In particular, the photopolymerization initiator is an acetophenone compound, a benzophenone compound, a triazine compound, a biimidazole compound, an oxime compound, and a thioxanthone compound in terms of polymerization properties, start efficiency, absorption wavelength, availability, and price. It is preferable to use at least one compound selected from the group consisting of compounds.
상기 아세토페논계 화합물의 구체적인 예로는 디에톡시아세토페논, 2-히드록시-2-메틸-1-페닐프로판-1-온, 벤질디메틸케탈, 2-히드록시-1-[4-(2-히드록시에톡시)페닐]-2-메틸프로판-1-온, 1-히드록시시클로헥실페닐케톤, 2-메틸-1-(4-메틸티오페닐)-2-모르폴리노프로판-1-온, 2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)부탄-1-온, 2-히드록시-2-메틸-1-[4-(1-메틸비닐)페닐]프로판-1-온, 2-(4-메틸벤질)-2-(디메틸아미노)-1-(4-모르폴리노페닐)부탄-1-온 등을 들 수 있다. Specific examples of the acetophenone-based compound include diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyl dimethyl ketal, 2-hydroxy-1- [4- (2-hydroxy Hydroxyethoxy) phenyl] -2-methylpropan-1-one, 1-hydroxycyclohexylphenyl ketone, 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butan-1-one, 2-hydroxy-2-methyl-1- [4- (1-methylvinyl) phenyl] propane-1 -One, 2- (4-methylbenzyl) -2- (dimethylamino) -1- (4-morpholinophenyl) butan-1-one, and the like.
상기 벤조페논계 화합물로서는, 예를 들면 벤조페논, o-벤조일벤조산 메틸, 4-페닐벤조페논, 4-벤조일-4'-메틸디페닐술피드, 3,3',4,4'-테트라(tert-부틸퍼옥시카르보닐)벤조페논, 2,4,6-트리메틸벤조페논 등이 있다.As said benzophenone type compound, for example, benzophenone, methyl o-benzoyl benzoate, 4-phenylbenzophenone, 4-benzoyl-4'-methyldiphenyl sulfide, 3,3 ', 4,4'- tetra ( tert-butylperoxycarbonyl) benzophenone, 2,4,6-trimethylbenzophenone, and the like.
상기 트리아진계 화합물의 구체적인 예로는 2,4-비스(트리클로로메틸)-6-(4-메톡시페닐)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-(4-메톡시나프틸)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-피페로닐-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-(4-메톡시스티릴)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(5-메틸퓨란-2-일)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(퓨란-2-일)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(4-디에틸아미노-2-메틸페닐)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(3,4-디메톡시페닐)에테닐]-1,3,5-트리아진 등을 들 수 있다. Specific examples of the triazine-based compound include 2,4-bis (trichloromethyl) -6- (4-methoxyphenyl) -1,3,5-triazine and 2,4-bis (trichloromethyl) -6 -(4-methoxynaphthyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6-piperonyl-1,3,5-triazine, 2,4-bis (Trichloromethyl) -6- (4-methoxystyryl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (5-methylfuran-2- Yl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (furan-2-yl) ethenyl] -1,3,5-triazine , 2,4-bis (trichloromethyl) -6- [2- (4-diethylamino-2-methylphenyl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl ) -6- [2- (3,4-dimethoxyphenyl) ethenyl] -1,3,5-triazine and the like.
상기 비이미다졸 화합물의 구체적인 예로는 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(2,3-디클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라(알콕시페닐)비이미다졸, 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라(트리알콕시페닐)비이미다졸, 2,2-비스(2,6-디클로로페닐)-4,4'5,5'-테트라페닐-1,2'-비이미다졸 또는 4,4',5,5' 위치의 페닐기가 카르보알콕시기에 의해 치환되어 있는 이미다졸 화합물 등을 들 수 있다. 이들 중에서 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(2,3-디클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2-비스(2,6-디클로로페닐)-4,4'5,5'-테트라페닐-1,2'-비이미다졸이 바람직하게 사용된다.Specific examples of the biimidazole compound include 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2,3-dichloro Phenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetra (alkoxyphenyl) biimidazole , 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetra (trialkoxyphenyl) biimidazole, 2,2-bis (2,6-dichlorophenyl) -4, The imidazole compound etc. which the phenyl group of a 4'5,5'- tetraphenyl- 1,2'- biimidazole or a 4,4 ', 5,5' position are substituted by the carboalkoxy group are mentioned. Among them, 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2,3-dichlorophenyl) -4,4' , 5,5'-tetraphenylbiimidazole, 2,2-bis (2,6-dichlorophenyl) -4,4'5,5'-tetraphenyl-1,2'-biimidazole are preferably used do.
상기 옥심 화합물의 구체적인 예로는 o-에톡시카르보닐-α-옥시이미노-1-페닐프로판-1-온등을 들 수 있으며, 시판품으로 바스프사의 Irgacure OXE 01, OXE 02가 대표적이다.Specific examples of the oxime compound include o-ethoxycarbonyl-α-oxyimino-1-phenylpropan-1-one and the like, and commercially available BASF Irgacure OXE 01 and OXE 02 are typical examples.
상기 티오크산톤계 화합물로서는, 예를 들면 2-이소프로필티오크산톤, 2,4-디에틸티오크산톤, 2,4-디클로로티오크산톤, 1-클로로-4-프로폭시티오크산톤 등이 있다. As said thioxanthone type compound, 2-isopropyl thioxanthone, 2, 4- diethyl thioxanthone, 2, 4- dichloro thioxanthone, 1-chloro-4- propoxy thioxanthone, etc. are mentioned, for example. There is this.
상기 광중합 개시제는 상기 자발광 감광성 수지 조성물 고형분 전체 100중량%에 대하여 0.1 내지 20중량%, 바람직하게는 0.5 내지 15중량%, 더욱 바람직하게는 1 내지 10중량%로 포함될 수 있다. 상기 광중합 개시제가 상기 범위 내로 포함되는 경우 상기 자발광 감광성 수지 조성물이 고감도화되어 노광 시간이 단축되므로 생산성이 향상되며 높은 해상도를 유지할 수 있기 때문에 바람직하다. 또한, 본 발명에 따른 자발광 감광성 수지 조성물을 사용하여 형성한 화소부의 강도와 상기 화소부의 표면에서의 평활성이 양호해지는 이점이 있다.The photopolymerization initiator may be included in an amount of 0.1 to 20% by weight, preferably 0.5 to 15% by weight, and more preferably 1 to 10% by weight, based on 100% by weight of the total solid of the self-luminous photosensitive resin composition. In the case where the photopolymerization initiator is included in the above range, the self-luminous photosensitive resin composition may be highly sensitive, and thus the exposure time may be shortened, so that productivity may be improved and high resolution may be maintained. Moreover, there exists an advantage that the intensity | strength of the pixel part formed using the self-luminous photosensitive resin composition concerning this invention, and smoothness in the surface of the said pixel part become favorable.
상기 광중합 개시제는 본 발명에 자발광 감광성 수지 조성물의 감도를 향상시키기 위해서, 광중합 개시 보조제를 더 포함할 수 있다. 상기 광중합 개시 보조제가 포함되는 경우 감도가 더욱 높아져 생산성이 향상되는 이점이 있다.The photopolymerization initiator may further include a photopolymerization initiation aid in order to improve the sensitivity of the self-luminous photosensitive resin composition in the present invention. When the photopolymerization start adjuvant is included, there is an advantage in that the sensitivity is higher and the productivity is improved.
상기 광중합 개시 보조제는 예컨대, 아민 화합물, 카르복시산 화합물, 티올기를 가지는 유기 황화합물로 이루어진 군으로부터 선택되는 1종 이상의 화합물이 바람직하게 사용될 수 있으나 이에 한정되지 않는다.The photopolymerization initiation assistant may be preferably used, for example, at least one compound selected from the group consisting of an amine compound, a carboxylic acid compound, and an organic sulfur compound having a thiol group, but is not limited thereto.
상기 아민 화합물로는 방향족 아민 화합물을 사용하는 것이 바람직하며, 구체적으로 트리에탄올아민, 메틸디에탄올아민, 트리이소프로판올아민 등의 지방족 아민 화합물, 4-디메틸아미노벤조산메틸, 4-디메틸아미노벤조산에틸, 4-디메틸아미노벤조산이소아밀, 4-디메틸아미노벤조산2-에틸헥실, 벤조산2-디메틸아미노에틸, N,N-디메틸파라톨루이딘, 4,4'-비스(디메틸아미노)벤조페논(통칭: 미힐러 케톤), 4,4'-비스(디에틸아미노)벤조페논 등을 사용할 수 있다.It is preferable to use an aromatic amine compound as the amine compound, and specifically, aliphatic amine compounds such as triethanolamine, methyl diethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, 4- Dimethylaminobenzoic acid isoamyl, 4-dimethylaminobenzoic acid 2-ethylhexyl, benzoic acid 2-dimethylaminoethyl, N, N-dimethylparatoluidine, 4,4'-bis (dimethylamino) benzophenone (common name: Michler's ketone ), 4,4'-bis (diethylamino) benzophenone and the like can be used.
상기 카르복시산 화합물은 방향족 헤테로아세트산류인 것이 바람직하며, 구체적으로 페닐티오아세트산, 메틸페닐티오아세트산, 에틸페닐티오아세트산, 메틸에틸페닐티오아세트산, 디메틸페닐티오아세트산, 메톡시페닐티오아세트산, 디메톡시페닐티오아세트산, 클로로페닐티오아세트산, 디클로로페닐티오아세트산, N-페닐글리신, 페녹시아세트산, 나프틸티오아세트산, N-나프틸글리신, 나프톡시아세트산 등을 들 수 있다.The carboxylic acid compound is preferably an aromatic heteroacetic acid, specifically, phenylthioacetic acid, methylphenylthioacetic acid, ethylphenylthioacetic acid, methylethylphenylthioacetic acid, dimethylphenylthioacetic acid, methoxyphenylthioacetic acid, dimethoxyphenylthioacetic acid, Chlorophenylthioacetic acid, dichlorophenylthioacetic acid, N-phenylglycine, phenoxyacetic acid, naphthylthioacetic acid, N-naphthylglycine, naphthoxyacetic acid, etc. are mentioned.
상기 티올기를 가지는 유기 황화합물의 구체적인 예로서는 2-머캅토벤조티아졸, 1,4-비스(3-머캅토부티릴옥시)부탄, 1,3,5-트리스(3-머캅토부틸옥시에틸)-1,3,5-트리아진-2,4,6(1H,3H,5H)-트리온, 트리메틸올프로판트리스(3-머갑토프로피오네이트), 펜타에리트리톨테트라키스(3-머캅토부틸레이트), 펜타에리트리톨테트라키스(3-머캅토프로피오네이트), 디펜타에리트리톨헥사키스(3-머캅토프로피오네이트), 테트라에틸렌글리콜비스(3-머캅토프로피오네이트) 등을 들 수 있다.Specific examples of the organic sulfur compound having the thiol group include 2-mercaptobenzothiazole, 1,4-bis (3-mercaptobutyryloxy) butane, 1,3,5-tris (3-mercaptobutyloxyethyl)- 1,3,5-triazine-2,4,6 (1H, 3H, 5H) -trione, trimethylolpropanetris (3-mergaptopropionate), pentaerythritol tetrakis (3-mercaptobutyl Late), pentaerythritol tetrakis (3-mercaptopropionate), dipentaerythritol hexakis (3-mercaptopropionate), tetraethylene glycol bis (3-mercaptopropionate), etc. are mentioned. Can be.
상기 광중합 개시 보조제는 본 발명의 범위를 해치지 않는 범위에서 적절히 추가하여 사용할 수 있다.The photopolymerization start adjuvant can be appropriately added and used within a range that does not impair the scope of the present invention.
본 발명의 자발광 감광성 수지 조성물에 더 포함될 수 있는 추가 용제는 특별히 한정되지 않으며, 당 분야에서 통상적으로 사용되는 유기 용제를 포함할 수 있으며, 이는 본 발명의 양자점 분산액에 포함되는 용제와 동일한 것일 수도, 상이한 것일 수도 있다.The additional solvent that may be further included in the self-luminous photosensitive resin composition of the present invention is not particularly limited, and may include an organic solvent commonly used in the art, which may be the same as the solvent contained in the quantum dot dispersion of the present invention. May be different.
상기 추가 용제는 구체적으로 에틸렌글리콜 모노메틸에테르, 에틸렌글리콜 모노에틸 에테르, 에틸렌글리콜 모노프로필에테르, 에틸렌글리콜 모노부틸에테르, 프로필렌글리콜 모노메틸에테르, 프로필렌글리콜 메틸에틸에테르 등의 알킬렌글리콜 알킬에테르류, 디에틸렌글리콜 디메틸에테르, 디에틸렌글리콜 디에틸에테르, 디에틸렌글리콜 디프로필에테르, 디에틸렌글리콜 디부틸에테르 등의 디에틸렌글리콜 디알킬에테르류; 메틸셀로솔브아세테이트, 에틸셀로솔브아세테이트, 프로필렌글리콜 모노메틸에테르아세테이트, 프로필렌글리콜 모노에틸에테르아세테이트, 프로필렌글리콜 모노프로필에테르아세테이트, 등의 알킬렌글리콜 알킬에테르아세테이트류; 메톡시부틸아세테이트, 메톡시펜틸아세테이트 등의 알콕시알킬아세테이트류; 벤젠, 톨루엔, 크실렌, 메시틸렌 등의 방향족 탄화수소류; 메틸에틸케톤, 아세톤, 메틸아밀케톤, 메틸이소부틸케톤, 시클로헥사논 등의 케톤류, 에탄올, 프로판올, 부탄올, 헥산올, 시클로헥산올, 에틸렌글리콜, 글리세린 등의 알코올류; 3-에톡시프로피온산에틸, 3-메톡시프로피온산메틸 등의 에스테르류; γ-부티롤락톤 등의 환상 에스테르류 등을 들 수 있다.Specific examples of the additional solvent include alkylene glycol alkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol methylethyl ether, Diethylene glycol dialkyl ethers such as diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether and diethylene glycol dibutyl ether; Alkylene glycol alkyl ether acetates such as methyl cellosolve acetate, ethyl cellosolve acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, and the like; Alkoxyalkyl acetates such as methoxybutyl acetate and methoxypentyl acetate; Aromatic hydrocarbons such as benzene, toluene, xylene and mesitylene; Ketones such as methyl ethyl ketone, acetone, methyl amyl ketone, methyl isobutyl ketone and cyclohexanone, alcohols such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol and glycerin; Esters such as ethyl 3-ethoxypropionate and methyl 3-methoxypropionate; Cyclic ester, such as (gamma) -butyrolactone, etc. are mentioned.
상기의 추가 용제는 도포성 및 건조성 면에서 바람직하게는 상기 추가 용제 중에서 비점이 100℃ 내지 200℃인 유기 용제를 들 수 있고, 보다 바람직하게는 알킬렌글리콜알킬에테르아세테이트류, 케톤류, 3-에톡시프로피온산 에틸이나, 3-메톡시프로피온산 메틸 등의 에스테르류를 들 수 있으며, 더욱 바람직하게는 프로필렌글리콜 모노메틸에테르 아세테이트, 프로필렌글리콜 모노에틸에테르 아세테이트, 3-에톡시프로피온산 에틸, 3-메톡시프로피온산 메틸 등을 들 수 있다. 이들 추가 용제는 각각 단독으로 또는 2종류 이상 혼합하여 사용할 수 있다.In view of applicability and dryness, the above additional solvent is preferably an organic solvent having a boiling point of 100 ° C to 200 ° C in the above additional solvent, more preferably alkylene glycol alkyl ether acetates, ketones, 3- Ester, such as ethyl ethoxy propionate and methyl 3-methoxy propionate, is mentioned, More preferably, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, 3-ethoxy propionate ethyl, 3-methoxy Methyl propionate etc. are mentioned. These additional solvents can be used individually or in mixture of 2 or more types, respectively.
본 발명의 자발광 감광성 수지 조성물 내에 포함되는 전체 용제(양자점 분산액 내 용제 및 추가 용제)는 상기 자발광 감광성 수지 조성물 전체 100중량%에 대하여 20 내지 90중량%, 바람직하게는 25 내지 85중량%, 보다 바람직하게는 30 내지 80중량%로 포함될 수 있다. 상기 전체 용제의 함량이 상기 범위 이내로 포함될 경우에는 롤코터, 스핀 코터, 슬릿앤드 스핀 코터, 슬릿코터(다이 코터라고도 하는 경우가 있음), 잉크젯 등의 도포 장치로 도포했을 때 도포성이 양호해질 수 있어 바람직하다. 상기 전체 용제의 함량이 상기 범위 미만으로 포함될 경우 도포성이 다소 저하됨에 따라 공정이 다소 어려워질 수 있으며, 상기 범위를 초과하는 경우 상기 자발광 감광성 수지 조성물로 형성된 컬러 필터의 성능이 다소 저하될 수 있는 문제가 발생할 수 있다.The total solvent (solvent in quantum dot dispersion and additional solvent) contained in the self-luminous photosensitive resin composition of the present invention is 20 to 90% by weight, preferably 25 to 85% by weight, based on 100% by weight of the total self-luminous photosensitive resin composition, More preferably, it may be included in 30 to 80% by weight. If the total solvent content is within the above range, the applicability may be improved when applied with a coating device such as a roll coater, spin coater, slit and spin coater, slit coater (sometimes referred to as die coater), inkjet, or the like. It is preferable. When the content of the total solvent is included in less than the above range, the process may be somewhat difficult as the applicability is slightly lowered. If the total solvent is exceeded, the performance of the color filter formed of the self-luminous photosensitive resin composition may be slightly lowered. Problems can arise.
본 발명에 따른 자발광 감광성 수지 조성물은 코팅성 또는 밀착성을 증진 시키기 위해서 밀착촉진제, 계면활성제와 같은 첨가제를 추가로 포함할 수 있다.The self-luminous photosensitive resin composition according to the present invention may further include an additive such as an adhesion promoter and a surfactant to enhance the coating property or adhesion.
상기 밀착촉진제는 기판과의 밀착성을 높이기 위하여 첨가될 수 있는 것으로서 카르복실기, 메타크릴로일기, 이소시아네이트기, 에폭시기 및 이들의 조합으로 이루어진 군에서 선택되는 반응성 치환기를 갖는 실란 커플링제를 포함할 수 있으나 이에 한정되는 것은 아니다. 예컨대, 상기 실란 커플링제는 트리메톡시실릴 벤조산, γ-메타크릴 옥시프로필 트리메톡시 실란, 비닐트리아세톡시실란, 비닐 트리메톡시실란, γ-이소시아네이트 프로필 트리에톡시실란, γ-글리시독시 프로필 트리메톡시실란, β-(3,4-에폭시시클로헥실)에틸트리메톡시실란 등을 들 수 있으면, 이것들은 단독 및 2종 이상 조합하여 사용할 수 있다.The adhesion promoter may include a silane coupling agent having a reactive substituent selected from the group consisting of carboxyl groups, methacryloyl groups, isocyanate groups, epoxy groups, and combinations thereof, which may be added to increase adhesion to the substrate. It is not limited. For example, the silane coupling agent is trimethoxysilyl benzoic acid, γ-methacryl oxypropyl trimethoxy silane, vinyltriacetoxysilane, vinyl trimethoxysilane, γ-isocyanate propyl triethoxysilane, γ-glycidoxy If propyl trimethoxysilane, (beta)-(3, 4- epoxycyclohexyl) ethyltrimethoxysilane, etc. are mentioned, these can be used individually and in combination of 2 or more types.
본 발명에 따른 자발광 감광성 수지 조성물이 상기 계면활성제를 포함하는 경우 코팅성이 향상될 수 있는 이점이 있다. 예컨대 상기 계면활성제는 BM-1000, BM-1100(BM Chemie사), 프로라이드 FC-135/FC-170C/FC-430(스미토모 쓰리엠㈜), SH-28PA/-190/SZ-6032(도레 시리콘㈜)등의 불소계 계면 활성제를 사용할 수 있으나, 이에 한정되지는 않는다.When the self-luminous photosensitive resin composition according to the present invention includes the surfactant, there is an advantage that the coating property can be improved. For example, the surfactant is BM-1000, BM-1100 (BM Chemie Co., Ltd.), Proride FC-135 / FC-170C / FC-430 (Sumitomo 3M Co., Ltd.), SH-28PA / -190 / SZ-6032 (Dore Siri). Fluorine-based surfactants such as Corn Co., Ltd. may be used, but is not limited thereto.
이 외에도 본 발명에 따른 자발광 감광성 수지 조성물은 본 발명의 효과를 저해하지 않는 범위에서 산화 방지제, 자외선 흡수제, 응집 방지제와 같은 첨가제를 더 포함할 수도 있으며, 상기 첨가제는 역시 본 발명의 효과를 저해하지 않는 범위에서 당업자가 적절히 추가하여 사용이 가능하다. 예컨대 상기 첨가제는 상기 자발광 감광성 수지 조성물 전체 중량을 기준으로 0.05 내지 10 중량부, 구체적으로 0.1 내지 10 중량부, 더욱 구체적으로 0.1 내지 5 중량부로 사용할 수 있으나 이에 한정되는 것은 아니다.In addition, the self-luminous photosensitive resin composition according to the present invention may further include additives such as antioxidants, ultraviolet absorbers and anti-agglomerating agents in a range that does not impair the effects of the present invention, the additives also inhibit the effects of the present invention It can be used by those skilled in the art as long as it does not. For example, the additive may be used in an amount of 0.05 to 10 parts by weight, specifically 0.1 to 10 parts by weight, more specifically 0.1 to 5 parts by weight based on the total weight of the self-luminous photosensitive resin composition, but is not limited thereto.
<컬러필터><Color filter>
본 발명의 또 다른 양태는 전술한 자발광 감광성 수지 조성물을 이용하여 제조된 컬러필터에 관한 것이다.Yet another aspect of the present invention relates to a color filter manufactured using the above-described self-luminous photosensitive resin composition.
본 발명에 따른 컬러필터는 본 발명의 양자점 분산액을 포함하는 자발광 감광성 수지 조성물의 경화물을 포함하기 때문에 양자점 입자가 고르게 분산되어 발광 특성이 우수한 이점이 있다.Since the color filter according to the present invention includes the cured product of the self-luminous photosensitive resin composition including the quantum dot dispersion liquid of the present invention, the quantum dot particles are uniformly dispersed, thereby providing excellent light emission characteristics.
상기 컬러필터는 기판 및 상기 기판의 상부에 형성된 패턴층을 포함한다.The color filter includes a substrate and a pattern layer formed on the substrate.
상기 기판은 상기 컬러필터 자체 기판일 수 있으며, 또는 디스플레이 장치 등에 컬러필터가 위치되는 부위일 수도 있는 것으로, 특별히 제한되지 않는다. 상기 기판은 유리, 실리콘(Si), 실리콘 산화물(SiOx) 또는 고분자 기판일 수 있으며, 상기 고분자 기판은 폴리에테르설폰(polyethersulfone, PES) 또는 폴리카보네이트(polycarbonate, PC) 등일 수 있다.The substrate may be the substrate of the color filter itself, or may be a portion where the color filter is positioned in a display device or the like, and is not particularly limited. The substrate may be glass, silicon (Si), silicon oxide (SiOx), or a polymer substrate, and the polymer substrate may be polyethersulfone (PES) or polycarbonate (PC).
상기 패턴층은 본 발명의 자발광 감광성 수지 조성물을 포함하는 층으로, 상기 자발광 감광성 수지 조성물을 도포하고 소정의 패턴으로 노광, 현상 및 열경화하여 형된 층일 수 있다. 상기 패턴층은 당업계에서 통상적으로 알려진 방법을 수행함으로써 형성할 수 있다.The pattern layer is a layer including the self-luminous photosensitive resin composition of the present invention, and may be a layer formed by applying the self-luminous photosensitive resin composition and exposing, developing and thermosetting in a predetermined pattern. The pattern layer may be formed by performing a method commonly known in the art.
상기와 같은 기판 및 패턴층을 포함하는 컬러필터는 각 패턴 사이에 형성된 격벽을 더 포함할 수 있으며, 블랙 매트릭스를 더 포함할 수 있으나 이에 한정되지 않는다.The color filter including the substrate and the pattern layer may further include a partition formed between each pattern, and may further include a black matrix, but is not limited thereto.
또한, 상기 컬러필터의 패턴층 상부에 형성된 보호막을 더 포함할 수도 있다.In addition, a protective film formed on the pattern layer of the color filter may be further included.
상기 컬러필터는 적색 패턴층, 녹색 패턴층 및 청색 패턴층으로 이루어진 군에서 선택되는 1 이상을 포함할 수 있다. 구체적으로, 상기 컬러필터는 본 발명에 따른 적 양자점을 포함하는 적색 패턴층, 녹 양자점을 포함하는 녹색 패턴층 및 청 양자점을 포함하는 청색 패턴층으로 이루어진 군에서 선택되는 1 이상을 포함할 수 있다. 상기 적색 패턴층, 녹색 패턴층, 청색 패턴층은 각각 광 조사시 적색광, 녹색광, 청색광을 방출할 수 있으며, 이때, 상기 광원의 방출광은 특별히 한정되지는 않으나 보다 우수한 색 재현성의 측면에서 청색광을 방출하는 광원을 사용할 수 있다.The color filter may include one or more selected from the group consisting of a red pattern layer, a green pattern layer, and a blue pattern layer. Specifically, the color filter may include one or more selected from the group consisting of a red pattern layer including a red quantum dot, a green pattern layer including a green quantum dot, and a blue pattern layer including a blue quantum dot according to the present invention. . The red pattern layer, the green pattern layer, and the blue pattern layer may respectively emit red light, green light, and blue light when irradiated with light. In this case, the emission light of the light source is not particularly limited, but blue light may be generated in terms of better color reproducibility. A light source that emits can be used.
상기 컬러필터는 적색 패턴층, 녹색 패턴층 및 청색 패턴층 중 2종 색상의 패턴층만을 구비할 수도 있으나, 이에 한정되지 않는다. 다만, 상기 컬러필터가 2종 색상의 패턴층만을 구비하는 경우 상기 패턴층은 상기 양자점 입자를 함유하지 않는 투명 패턴층을 더 구비할 수 있다.The color filter may include only a pattern layer of two colors among the red pattern layer, the green pattern layer, and the blue pattern layer, but is not limited thereto. However, when the color filter includes only the pattern layer of two colors, the pattern layer may further include a transparent pattern layer containing no quantum dot particles.
상기 컬러필터가 상기 2종 색상의 패턴층만을 구비하는 경우에는 상기 2종 색상 외의 색상을 나타내는 파장의 빛을 방출하는 광원을 사용할 수 있다. 예컨대, 상기 컬러필터가 적색 패턴층 및 녹색 패턴층을 포함하는 경우에는 청색광을 방출하는 광원을 사용할 수 있으며, 이 경우 적 양자점은 적색광을, 녹 양자점은 녹색광을 방출하고, 상기 투명 패턴층은 상기 광원에 의한 청색광이 그대로 투과함에 따라 청색을 띨 수 있다.When the color filter includes only the pattern layers of the two colors, a light source emitting light having a wavelength representing a color other than the two colors may be used. For example, when the color filter includes a red pattern layer and a green pattern layer, a light source emitting blue light may be used. In this case, red quantum dots emit red light and green quantum dots emit green light, and the transparent pattern layer may As the blue light transmitted by the light source is transmitted as it is, blue can be obtained.
<화상표시장치><Image display device>
또한, 본 발명의 다른 양태는, 전술한 컬러필터를 포함하는 화상표시장치에 관한 것이다. Moreover, another aspect of this invention is related with the image display apparatus containing the color filter mentioned above.
본 발명의 컬러필터는 통상의 액정 표시 장치뿐만 아니라, 전계 발광 표시장치, 플라스마 표시 장치, 전계 방출 표시 장치 등 각종 화상 표시 장치에 적용이 가능하다.The color filter of the present invention can be applied to various image display devices such as electroluminescent display devices, plasma display devices, field emission display devices, as well as ordinary liquid crystal display devices.
본 발명에 따른 화상표시장치는 본 발명의 양자점 분산액을 포함하는 자발광 감광성 수지 조성물의 경화물로 제조된 컬러필터를 포함함으로써, 발광 특성이 우수한 효과가 있다. The image display device according to the present invention includes the color filter made of the cured product of the self-luminous photosensitive resin composition containing the quantum dot dispersion liquid of the present invention, thereby exhibiting excellent light emission characteristics.
상기 화상표시장치는 청색광을 방출하는 광원 및 투명 패턴층을 더 포함할 수 있으며, 상기 청색광을 방출하는 광원, 상기 투명 패턴층은 전술한 내용을 적용할 수 있다.The image display apparatus may further include a light source emitting blue light and a transparent pattern layer, and the above-described information may be applied to the light source emitting blue light and the transparent pattern layer.
이하, 본 명세서를 구체적으로 설명하기 위해 실시예를 들어 상세히 설명한다. 그러나, 본 명세서에 따른 실시예들은 여러 가지 다른 형태로 변형될 수 있으며, 본 명세서의 범위가 아래에서 상술하는 실시예들에 한정되는 것으로 해석되지는 않는다. 본 명세서의 실시예들은 당업계에서 평균적인 지식을 가진 자에게 본 명세서를 보다 완전하게 설명하기 위해 제공되는 것이다. 또한, 이하에서 함유량을 나타내는 "%" 및 "부"는 특별히 언급하지 않는 한 중량 기준이다.Hereinafter, the present invention will be described in detail with reference to Examples. However, the embodiments according to the present disclosure may be modified in various other forms, and the scope of the present specification is not to be interpreted as being limited to the embodiments described below. The embodiments of the present specification are provided to more fully describe the present specification to those skilled in the art. In addition, "%" and "part" which show content below are a basis of weight unless there is particular notice.
제조예Production Example 1 내지 2 1 to 2
제조예Production Example 1:  One: 양자점Quantum dots 분산액의 제조 Preparation of Dispersion
하기 표 1에 기재된 각 성분(양자점 및 용제) 및 함량으로 혼합하여 양자점 분산액을 제조하였으며, 각 제조예(제조예 1-1 내지 1-11)의 한센 용해도 파라미터 또한 하기 표 1에 기재하였다.Quantum dot dispersions were prepared by mixing the components (quantum dots and solvents) and contents shown in Table 1 below, and Hansen solubility parameters of each preparation example (Preparation Examples 1-1 to 1-11) were also described in Table 1 below.
(단위: 중량%)(Unit: weight%) 양자점(A-1)Quantum Dots (A-1) 용제solvent 한센 용해도 파라미터Hansen Solubility Parameters
1One 22 33 44 55 66 77 88 δd δ d δp δ p δh δ h
제조예 1-1Preparation Example 1-1 3030 7070 16.316.3 4.94.9 88
제조예 1-2Preparation Example 1-2 3030 7070 14.914.9 2.12.1 3.83.8
제조예 1-3Preparation Example 1-3 3030 7070 1616 2.92.9 6.16.1
제조예 1-4Preparation Example 1-4 3030 7070 16.616.6 2.42.4 6.46.4
제조예 1-5Preparation Example 1-5 3030 6060 1010 15.215.2 5.45.4 4.64.6
제조예 1-6Preparation Example 1-6 3030 6060 1010 14.114.1 4.94.9 4.34.3
제조예 1-7Preparation Example 1-7 3030 6060 1010 15.215.2 5.65.6 5.65.6
제조예 1-8Preparation Example 1-8 3030 7070 16.116.1 6.16.1 6.66.6
제조예 1-9 Preparation Example 1-9 3030 7070 7.97.9 2.52.5 4.54.5
제조예 1-10Preparation Example 1-10 3030 7070 15.115.1 2.52.5 8.78.7
제조예 1-11Preparation Example 1-11 3030 7070 17.817.8 3.13.1 5.75.7
1: 디프로필렌글리콜 메틸에테르 아세테이트(DPMA, 다우 케미컬 제조)2: 디프로필렌글리콜 디메틸 에테르(다우 케미컬 제조)3: 헥실 아세테이트(Hexyl acetate, 알드리치 제조)4: 디에틸 카르보네이트(Diethyl carbonate, 알드리치 제조)5: 프로필렌글리콜 모노메틸에테르 아세테이트(PGMEA, 알드리치 제조)6: 에틸-3-에톡시 프로피오네이트(EEP, 다우케이컬 제조)7: 트리프로필렌글리콜 메틸 에테르(TPM, 다우케미컬 제조)8: 클로로포름(Chloroform, 알드리치 제조)DESCRIPTION OF SYMBOLS 1 dipropylene glycol methyl ether acetate (DPMA, Dow Chemical) 2 dipropylene glycol dimethyl ether (DOW Chemical) 3 hexyl acetate (Aldrich) 4 diethyl carbonate (Aldrich) 5: propylene glycol monomethyl ether acetate (PGMEA, manufactured by Aldrich) 6: ethyl-3-ethoxy propionate (EEP, manufactured by Dow Chemical) 7: tripropylene glycol methyl ether (TPM, manufactured by Dow Chemical) 8 : Chloroform (Aldrich)
제조예Production Example 2: 알칼리 가용성 수지의 제조 2: Preparation of Alkali Soluble Resin
교반기, 온도계 환류 냉각관, 적하 로트 및 질소 도입관을 구비한 플라스크를 준비하였고, N-벤질말레이미드 45 중량부, 메타크릴산 45 중량부, 트리사이클로데실 메타크릴레이트 10 중량부, t-부틸퍼옥시-2-에틸헥사노에이트 4 중량부 및 프로필렌글리콜모노메틸에테르아세테이트(이하, "PGMEA"라 함) 40 중량부를 투입후 교반 혼합하여 모노머 적하 로트를 준비하고, n-도데칸티올 6 중량부 및 PGMEA 24 중량부를 넣고 교반 혼합하여 연쇄 이동제 적하 로트를 준비하였다.A flask equipped with a stirrer, a thermometer reflux condenser, a dropping lot, and a nitrogen introduction tube was prepared, 45 parts by weight of N-benzylmaleimide, 45 parts by weight of methacrylic acid, 10 parts by weight of tricyclodecyl methacrylate, and t-butyl 4 parts by weight of peroxy-2-ethylhexanoate and 40 parts by weight of propylene glycol monomethyl ether acetate (hereinafter referred to as "PGMEA") were added, followed by stirring and mixing to prepare a monomer dropping lot, and n-dodecanethiol 6 weight Part and 24 parts by weight of PGMEA were added and stirred to prepare a chain transfer dropper lot.
이후 플라스크에 PGMEA 395 중량부를 도입하고 플라스크 내 분위기를 공기에서 질소로 교환한 후 교반하면서 플라스크의 온도를 90℃까지 승온시켰다. 이어서 모노머 및 연쇄 이동제를 적하 로트로부터 적하를 개시했다. 적하는, 90℃를 유지하면서, 각각 2시간 동안 진행하고 1시간 후에 110℃로 승온하여 3시간 동안 유지한 뒤, 가스 도입관을 도입시켜, 산소/질소=5/95(v/v) 혼합 가스의 버블링을 개시하였다. Thereafter, 395 parts by weight of PGMEA was introduced into the flask, and the atmosphere in the flask was exchanged with nitrogen in air, and then the temperature of the flask was raised to 90 ° C. while stirring. Subsequently, dropping of the monomer and the chain transfer agent was started from the dropping lot. The dropwise addition was carried out for 2 hours while maintaining 90 ° C, and after 1 hour, the temperature was raised to 110 ° C and maintained for 3 hours. The bubbling of the gas was initiated.
이어서, 글리시딜메타크릴레이트 10 중량부, 2,2'-메틸렌비스(4-메틸-6-t-부틸페놀) 0.4 중량부 및 트리에틸아민 0.8 중량부를 플라스크 내에 투입하여 110에서 8시간 반응을 계속하고, 그 후 실온까지 냉각하면서 고형분 29.1 중량%, 중량평균분자량 32,000, 산가가 114㎎KOH/g인 알칼리 가용성 수지를 얻었다.Subsequently, 10 parts by weight of glycidyl methacrylate, 0.4 part by weight of 2,2'-methylenebis (4-methyl-6-t-butylphenol) and 0.8 part by weight of triethylamine were added to the flask to react at 110 to 8 hours. Then, alkali-soluble resin whose solid content was 29.1 weight%, the weight average molecular weight 32,000, and the acid value was 114 mgKOH / g was cooled after cooling to room temperature.
제조예Production Example 3: 컬러필터의 제조 3: Manufacture of color filter
하기 실시예 1 내지 7 및 비교예 1 내지 4에서 제조된 자발광 감광성 수지 조성물을 이용하여 컬러필터를 제조하였다. 구체적으로, 상기 각각의 자발광 감광성 수지 조성물을 스핀 코팅법으로 유리 기판 위에 도포한 다음, 가열판 위에 놓고 100℃의 온도에서 3분간 유지하여 박막을 형성시켰다. 이어서 상기 박막 위에 20mm × 20mm 크기의 정사각형의 투과 패턴과 1㎛ 내지 100㎛의 라인/스페이스 패턴을 갖는 시험 포토마스크를 올려놓고 시험 포토마스크와의 간격을 100㎛로 하여 자외선을 조사하였다.The color filter was manufactured using the self-luminous photosensitive resin composition prepared in Examples 1 to 7 and Comparative Examples 1 to 4 below. Specifically, each of the self-luminous photosensitive resin composition was applied on a glass substrate by spin coating, then placed on a heating plate and maintained at a temperature of 100 ° C. for 3 minutes to form a thin film. Subsequently, a test photomask having a 20 mm × 20 mm square transmission pattern and a line / space pattern of 1 μm to 100 μm was placed on the thin film, and the ultraviolet rays were irradiated with a distance of 100 μm from the test photomask.
이 때, 자외선광원은 우시오 덴끼(주)제의 초고압 수은 램프(상품명 USH-250D)를 이용하여 대기 분위기하에서 200mJ/cm2의 노광량(365nm)으로 광조사 하였으며, 특별한 광학 필터는 사용하지 않았다. 상기에서 자외선이 조사된 박막을 pH 10.5의 KOH 수용액 현상 용액에 80초 동안 담궈 현상하였다. 이 박막이 입혀진 유리판을 증류수를 사용하여 세척한 다음, 질소 가스를 불어서 건조시키고, 150℃의 가열 오븐에서 10분 동안 가열하여 컬러필터 패턴을 제조하였다. 상기 제조된 자발광 컬러필터 패턴의 필름 두께는 3㎛였다.At this time, the ultraviolet light source was irradiated with an exposure amount (365 nm) of 200 mJ / cm 2 in an air atmosphere using an ultra high pressure mercury lamp (trade name USH-250D) manufactured by Ushio Denki Co., Ltd., and no special optical filter was used. The thin film irradiated with ultraviolet rays was developed by soaking for 80 seconds in a KOH aqueous solution developing solution of pH 10.5. The thin film coated glass plate was washed with distilled water, dried by blowing nitrogen gas, and heated in a heating oven at 150 ° C. for 10 minutes to prepare a color filter pattern. The film thickness of the prepared self-luminous color filter pattern was 3㎛.
실시예Example 1 내지 7 및  1 to 7 and 비교예Comparative example 1 내지 4 1 to 4
하기 표 2에 기재된 각 성분 및 함량으로 자발광 감광성 수지 조성물을 제조하였다.To each component and content shown in Table 2 below was prepared a self-luminous photosensitive resin composition.
(단위: 중량%)(Unit: weight%) 실시예 1Example 1 실시예 2Example 2 실시예 3Example 3 실시예 4Example 4 실시예 5Example 5 실시예 6Example 6 실시예 7Example 7 비교예 1Comparative Example 1 비교예 2Comparative Example 2 비교예 3Comparative Example 3 비교예 4Comparative Example 4
양자점 분산액1) Quantum Dot Dispersion 1) 제조예 1-1Preparation Example 1-1 4040
제조예 1-2Preparation Example 1-2 4040
제조예 1-3Preparation Example 1-3 4040
제조예 1-4Preparation Example 1-4 4040
제조예 1-5Preparation Example 1-5 4040
제조예 1-6Preparation Example 1-6 4040
제조예 1-7Preparation Example 1-7 4040
제조예 1-8Preparation Example 1-8 4040
제조예 1-9Preparation Example 1-9 4040
제조예 1-10Preparation Example 1-10 4040
제조예 1-11Preparation Example 1-11 4040
알칼리 가용성 수지2) Alkali soluble resin 2) 2020 2020 2020 2020 2020 2020 2020 2020 2020 2020 2020
광중합성 화합물3 ) Photopolymerizable compound 3 ) 2020 2020 2020 2020 2020 2020 2020 2020 2020 2020 2020
광중합 개시제4 ) Photopolymerization initiator 4 ) 55 55 55 55 55 55 55 55 55 55 55
추가 용제5 ) Additional Solvents 5 ) 1515 1515 1515 1515 1515 1515 1515 1515 1515 1515 1515
1: 제조예 1의 양자점 분산액2: 제조예 2의 알칼리 가용성 수지3: 디펜타에리트리톨 헥사아크릴레이트(KAYARAD DPHA, 닛본 가야꾸(주) 제조)4: Irgacure-907(BASF사 제조)5: 프로필렌글리콜 모노메틸에테르 아세테이트(PGMEA, 알드리치 제조)DESCRIPTION OF SYMBOLS 1: Quantum dot dispersion liquid of manufacture example 2: Alkali-soluble resin of manufacture example 3: Dipentaerythritol hexaacrylate (KAYARAD DPHA, Nippon Kayaku Co., Ltd.) 4: Irgacure-907 (made by BASF Corporation) 5: Propylene glycol monomethyl ether acetate (PGMEA, manufactured by Aldrich)
실험예Experimental Example
실험예Experimental Example 1:  One: 양자점Quantum dots 분산액 및  Dispersions and 자발광Self-luminescence 감광성 수지 조성물의 분산 입도 측정 Dispersion particle size measurement of photosensitive resin composition
ELSZ-2000ZS(오츠카사 제)를 이용하여, 분산입도를 측정하여 하기 표 3에 기재하였다. 양자점 입자가 응집될수록 분산입도는 커진다.Dispersion particle size was measured using ELSZ-2000ZS (manufactured by Otsuka Co., Ltd.) and listed in Table 3 below. As the quantum dot particles aggregate, the dispersion particle size increases.
실험예Experimental Example 2: 발광 강도(Intensity) 측정 2: Measurement of Intensity
상기 제조예 3에서 제조된 컬러필터에 대하여 550nm 영역에서의 발광 강도를 분광기(Ocean Optics사 제조)를 이용하여 측정하여 하기 표 3에 기재하였다. 측정된 발광 강도가 클수록 우수한 자발광 특성을 발휘하는 것으로 판단한다.The emission intensity in the 550 nm region of the color filter manufactured in Preparation Example 3 was measured using a spectrometer (manufactured by Ocean Optics, Inc.), and is shown in Table 3 below. It is determined that the greater the measured emission intensity is, the better the self-luminous property is.
분산입도(nm)Dispersion particle size (nm) 발광 강도(Intensity)Intensity
양자점 분산액Quantum dot dispersion 자발광 감광성 수지 조성물Self-luminous photosensitive resin composition
실시예 1Example 1 77 88 53,27553,275
실시예 2Example 2 88 99 55,93555,935
실시예 3Example 3 88 88 52,35452,354
실시예 4Example 4 77 77 53,21553,215
실시예 5Example 5 88 77 54,25254,252
실시예 6Example 6 77 88 54,44654,446
실시예 7Example 7 99 1010 51,24351,243
비교예 1Comparative Example 1 1515 852852 23,54223,542
비교예 2Comparative Example 2 1313 921921 28,65428,654
비교예 3Comparative Example 3 1515 865865 24,56924,569
비교예 4Comparative Example 4 77 88 55,65655,656
상기 표 3을 참고하면, 본 발명의 양자점 분산액 및 이를 포함하는 자발광 감광성 수지 조성물(실시예 1 내지 7)의 경우 본 발명의 양자점 분산액 및 이를 포함하는 자발광 감광성 수지 조성물이 아닌 경우(비교예 1 내지 3)보다 분산입도가 작은 것을 확인할 수 있다. 또한, 본 발명의 자발광 감광성 수지 조성물의 경화물을 포함하는 컬러필터의 경우(실시예 1 내지 7), 본 발명의 자발광 감광성 수지 조성물의 경화물을 포함하지 않는 경우(비교예 1 내지 3)보다 발광 강도가 우수한 것을 확인할 수 있다. Referring to Table 3, in the case of the quantum dot dispersion of the present invention and the self-luminous photosensitive resin composition comprising the same (Examples 1 to 7) is not the quantum dot dispersion of the present invention and the self-luminous photosensitive resin composition comprising the same (Comparative Example It can be confirmed that the dispersion particle size is smaller than 1 to 3). In addition, in the case of the color filter containing the hardened | cured material of the self-luminous photosensitive resin composition of this invention (Examples 1-7), when not including the hardened | cured material of the self-luminous photosensitive resin composition of this invention (Comparative Examples 1-3) It can be confirmed that the light emission intensity is superior to).
특히, 본 발명의 양자점 분산액, 자발광 감광성 수지 및 이를 이용하여 제조된 컬러필터의 경우(실시예 1 내지 7) 인체에 유해한 성분(클로로포름 등)을 함유하지 않았음에도 불구하고, 종래의 클로로포름을 사용한 경우(비교예 4)와 유사한 효과가 나타남을 확인할 수 있다.In particular, in the case of the quantum dot dispersion of the present invention, the self-luminous photosensitive resin and the color filter manufactured using the same (Examples 1 to 7), even though they do not contain harmful components (chloroform, etc.), the conventional chloroform is used. It can be seen that a similar effect to the case (Comparative Example 4) appears.

Claims (11)

  1. 양자점 및 용제를 포함하고, 상기 용제는 하기 수학식 1의 한센 용해도 파라미터(Hansen solubility parameter)의 조건을 만족하며, 할로겐화 탄화수소계 용제; 방향족 탄화수소계 용제; 및 지방족 탄화수소계 용제;는 포함하지 않는 양자점 분산액:A quantum dot and a solvent, wherein the solvent satisfies the conditions of the Hansen solubility parameter of Equation 1 below, and includes a halogenated hydrocarbon solvent; Aromatic hydrocarbon solvents; And aliphatic hydrocarbon solvents;
    [수학식 1][Equation 1]
    Figure PCTKR2017010278-appb-I000004
    Figure PCTKR2017010278-appb-I000004
    (상기 수학식 1에서, (In Equation 1,
    δd는 분산 성분(dispersion component), δp는 극성 성분(polar component), δh는 수소 결합 성분(hydrogen bonding component)을 의미한다).δ d is a dispersion component, δ p is a polar component, δ h is a hydrogen bonding component).
  2. 제1항에 있어서,The method of claim 1,
    상기 용제는 탄소수가 6 ~ 10인 에스터 및 에테르로 이루어진 군으로부터 선택되는 하나 이상을 포함하는 것인 양자점 분산액.The solvent is a quantum dot dispersion comprising one or more selected from the group consisting of esters and ethers having 6 to 10 carbon atoms.
  3. 제2항에 있어서,The method of claim 2,
    상기 용제는 tert-부틸 아세테이트, sec-부틸 아세테이트, 이소부틸아세테이트, n-부틸 아세테이트, 2-메틸 부틸 아세테이트, 2-펜틸 아세테이트, 네오펜틸 아세테이트, 3-메틸부탄-2-일 아세테이트, 이소아밀 아세테이트, n-펜틸 아세테이트, tert-아밀 아세테이트, 3-펜틸 아세테이트, 2-헥실 아세테이트, 3-메틸펜틸 3-아세테이트, 3-헥실 아세테이트, 2,3-디메틸-2-부틸 아세테이트, 2-에틸부틸 아세테이트, 2,3-디메틸부틸 아세테이트, 3-메틸-1-펜틸 아세테이트, 3,3-디메틸부틸 아세테이트, n-헥실 아세테이트, 4-메틸-1-펜틸 아세테이트, 2-메틸-3-펜틸 아세테이트, 4-메틸-2-펜틸 아세테이트, 2-메틸펜탄-2-일 아세테이트, 1-메틸헥실 아세테이트, 1-헵틸 아세테이트, 1,1,2,2-테트라메틸프로필 아세테이트, 5-메틸헥실 아세테이트, 에틸 이소아밀아세테이트, 4-헵틸 아세테이트, 5-메틸헥산-2-일 아세테이트, 2,4-디메틸-2-펜틸 아세테이트, 2-메틸-2-헥실 아세테이트, 4,4-디메틸펜틸 아세테이트, 4-메틸-3-헥실 아세테이트, 2-옥틸 아세테이트, 1-에틸헥실 아세테이트, 1-옥틸 아세테이트, 2-에틸헥실 아세테이트, 1,1,3,3-테트라메틸부틸 아세테이트, 2,2,4-트리메틸펜틸 아세테이트, 2,2-디메틸헥실 아세테이트, 1-이소프로필-1,2-디메틸프로필 아세테이트, 4-에틸-3-헥실 아세테이트, 디프로필렌 글리콜 디메틸 에테르 및 디프로필렌 글리콜 메틸 에테르 아세테이트로 이루어진 군으로부터 선택되는 하나 이상을 포함하는 것인 양자점 분산액.The solvent is tert-butyl acetate, sec-butyl acetate, isobutyl acetate, n-butyl acetate, 2-methyl butyl acetate, 2-pentyl acetate, neopentyl acetate, 3-methylbutan-2-yl acetate, isoamyl acetate , n-pentyl acetate, tert-amyl acetate, 3-pentyl acetate, 2-hexyl acetate, 3-methylpentyl 3-acetate, 3-hexyl acetate, 2,3-dimethyl-2-butyl acetate, 2-ethylbutyl acetate , 2,3-dimethylbutyl acetate, 3-methyl-1-pentyl acetate, 3,3-dimethylbutyl acetate, n-hexyl acetate, 4-methyl-1-pentyl acetate, 2-methyl-3-pentyl acetate, 4 -Methyl-2-pentyl acetate, 2-methylpentan-2-yl acetate, 1-methylhexyl acetate, 1-heptyl acetate, 1,1,2,2-tetramethylpropyl acetate, 5-methylhexyl acetate, ethyl iso Amyl acetate, 4-heptyl acetate , 5-methylhexane-2-yl acetate, 2,4-dimethyl-2-pentyl acetate, 2-methyl-2-hexyl acetate, 4,4-dimethylpentyl acetate, 4-methyl-3-hexyl acetate, 2 -Octyl acetate, 1-ethylhexyl acetate, 1-octyl acetate, 2-ethylhexyl acetate, 1,1,3,3-tetramethylbutyl acetate, 2,2,4-trimethylpentyl acetate, 2,2-dimethylhexyl Quantum dots comprising one or more selected from the group consisting of acetate, 1-isopropyl-1,2-dimethylpropyl acetate, 4-ethyl-3-hexyl acetate, dipropylene glycol dimethyl ether and dipropylene glycol methyl ether acetate Dispersion.
  4. 제1항에 있어서,The method of claim 1,
    상기 양자점은 C5 내지 C20의 알킬 카르복실산, 알케닐 카르복실산, 알키닐 카르복실산; 포스핀, 포스핀산화물 내지 티올기로 이루어진 군으로부터 선택되는 하나 이상을 포함하는 유기 리간드를 더 포함하는 양자점 분산액.The quantum dot is C5 to C20 alkyl carboxylic acid, alkenyl carboxylic acid, alkynyl carboxylic acid; A quantum dot dispersion further comprising an organic ligand comprising at least one selected from the group consisting of phosphines, phosphine oxides and thiol groups.
  5. 제1항에 있어서,The method of claim 1,
    상기 양자점 분산액은 인산 에스테르계 화합물을 더 포함하는 양자점 분산액.The quantum dot dispersion liquid further comprises a phosphate ester compound.
  6. 제1항에 있어서,The method of claim 1,
    상기 양자점 분산액 전체 100 중량%에 대하여, 상기 양자점이 5 내지 70 중량%로 포함되는 양자점 분산액.A quantum dot dispersion liquid containing 5 to 70% by weight based on 100% by weight of the total quantum dot dispersion.
  7. 제1항에 있어서,The method of claim 1,
    상기 양자점 분산액 전체 100 중량%에 대하여, 상기 용제가 5 내지 95 중량%로 포함되는 양자점 분산액.A quantum dot dispersion liquid containing 5 to 95 wt% of the solvent, based on 100 wt% of the quantum dot dispersion.
  8. 제1항 내지 제7항 중 어느 한 항의 양자점 분산액; 및 알칼리 가용성 수지, 광중합성 화합물, 광중합 개시제, 추가 용제 및 첨가제;로 이루어진 군으로부터 선택되는 하나 이상을 더 포함하는 자발광 감광성 수지 조성물.The quantum dot dispersion of any one of claims 1 to 7; And an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, an additional solvent, and an additive. The self-luminous photosensitive resin composition further comprising one or more selected from the group consisting of:
  9. 제8항에 있어서,The method of claim 8,
    상기 자발광 감광성 수지 조성물 전체 100 중량%에 대하여 상기 양자점 분산액이 3 내지 80 중량%로 포함되는 자발광 감광성 수지 조성물.A self-luminous photosensitive resin composition comprising 3 to 80% by weight of the quantum dot dispersion based on 100% by weight of the total self-luminous photosensitive resin composition.
  10. 제8항의 자발광 감광성 수지 조성물의 경화물을 포함하는 컬러필터.The color filter containing the hardened | cured material of the self-luminous photosensitive resin composition of Claim 8.
  11. 제10항의 컬러필터를 포함하는 화상표시장치.An image display device comprising the color filter of claim 10.
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JP7404199B2 (en) 2019-09-10 2023-12-25 東友ファインケム株式会社 Photoconversion ink composition, color filter, and image display device

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TW201825648A (en) 2018-07-16
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JP2020512570A (en) 2020-04-23
KR20180054249A (en) 2018-05-24

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