WO2018074726A1 - Quantum dot dispersion, spontaneous emission photosensitive resin composition containing same, color filter manufactured using same, and image display device - Google Patents

Quantum dot dispersion, spontaneous emission photosensitive resin composition containing same, color filter manufactured using same, and image display device Download PDF

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Publication number
WO2018074726A1
WO2018074726A1 PCT/KR2017/009292 KR2017009292W WO2018074726A1 WO 2018074726 A1 WO2018074726 A1 WO 2018074726A1 KR 2017009292 W KR2017009292 W KR 2017009292W WO 2018074726 A1 WO2018074726 A1 WO 2018074726A1
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Prior art keywords
quantum dot
group
resin composition
photosensitive resin
solvent
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PCT/KR2017/009292
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French (fr)
Korean (ko)
Inventor
김형주
신규철
왕현정
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동우화인켐 주식회사
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Priority to CN201780064905.7A priority Critical patent/CN109863222B/en
Priority to JP2019521057A priority patent/JP2019532348A/en
Publication of WO2018074726A1 publication Critical patent/WO2018074726A1/en

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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/02Use of particular materials as binders, particle coatings or suspension media therefor
    • C09K11/025Use of particular materials as binders, particle coatings or suspension media therefor non-luminescent particle coatings or suspension media
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/02Use of particular materials as binders, particle coatings or suspension media therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0048Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

Definitions

  • the present invention relates to a quantum dot dispersion comprising a solvent having a specific dielectric constant value, a self-luminous photosensitive resin composition comprising the same, a color filter and an image display device manufactured using the same.
  • the color filter is a thin film type optical component that extracts three colors of red, green, and blue from white light and makes them possible in fine pixel units.
  • the size of one pixel is about tens to hundreds of micrometers.
  • Such a color filter includes a black matrix layer formed in a predetermined pattern on a transparent substrate to shield the boundary between each pixel, and a plurality of colors (typically red (R), green (G) and The pixel units in which the three primary colors of blue (B) are arranged in a predetermined order are stacked in this order.
  • color filters are used in various fields, including various image display devices, not only excellent pattern characteristics but also high color reproducibility and excellent performance such as high brightness and high contrast ratio are required.
  • a color filter manufacturing method using the self-luminous photosensitive resin composition containing is proposed.
  • the quantum dots included in the self-luminous photosensitive resin composition are generally purchased and used in commercially available forms, and these quantum dots are dispersed and sold in non-polar solvents harmful to the human body, such as chloroform, toluene, n-hexane, or benzene. Solvents described above are highly volatile compounds (Volatile Organic Compound) or carcinogenic, neurotoxic, and have a high risk of abnormal reproductive function.
  • Korean Patent Application Publication No. 2015-0034013 relates to a quantum dot-resin nanocomposite and a method for manufacturing the same, and discloses a content related to a quantum dot-resin nanocomposite in which a curable resin and a plurality of quantum dots form nanoparticles.
  • Korean Patent Laid-Open No. 2016-0069393 relates to a method for manufacturing a light conversion composite, a light conversion composite, a light conversion film, a backlight unit, and a display device including the same, including a matrix resin; And a quantum dot-polymer bead dispersed in the matrix resin, wherein the light conversion composite has scattering intensity according to a wave number measured by Small Angle X-ray Scattering.
  • a light conversion composite material having a wave number q of a peak point of an intensity graph of 0.0056 ⁇ ⁇ 1 to 0.045 ⁇ ⁇ 1 .
  • An object of the present invention is to provide a quantum dot dispersion containing no solvent harmful to a human body, and a self-luminous photosensitive resin composition comprising the same.
  • the present invention is to provide a quantum dot dispersion having excellent dispersibility and excellent light emission characteristics, a self-luminous photosensitive resin composition comprising the same.
  • an object of the present invention is to provide a color filter and an image display device having excellent light emission characteristics manufactured by using the aforementioned quantum dot dispersion and a self-luminous photosensitive resin composition.
  • a quantum dot dispersion according to the present invention for achieving the above object is a quantum dot; And a first solvent having a dielectric constant of less than 12.0 at 20 ° C., including a halogenated hydrocarbon solvent; Aromatic hydrocarbon solvents; And aliphatic saturated hydrocarbon solvents.
  • the present invention is a quantum dot dispersion described above; And photopolymerizable compounds; Alkali-soluble resins; Photopolymerization initiator; And it provides a self-luminous photosensitive resin composition further comprising one or more selected from the group consisting of a second solvent.
  • this invention provides the color filter containing the hardened
  • the present invention provides an image display device including the color filter described above.
  • the quantum dot dispersion according to the present invention and the self-luminous photosensitive resin composition including the same include a solvent having a specific dielectric constant, there is an advantage of excellent dispersibility and excellent light emission characteristics, and does not contain a human toxic substance. There is an advantage.
  • the color filter and the image display device made of the self-luminous photosensitive resin composition according to the present invention has an advantage of excellent light emission characteristics.
  • a member when a member is located "on" another member, this includes not only when one member is in contact with another member but also when another member exists between the two members.
  • One aspect of the invention relates to a quantum dot dispersion.
  • one aspect of the present invention is a quantum dot; And a first solvent having a dielectric constant of less than 12.0 at 20 ° C., including a halogenated hydrocarbon solvent; Aromatic hydrocarbon solvents; And an aliphatic saturated hydrocarbon solvent; relates to a quantum dot dispersion not containing.
  • the quantum dot dispersion according to the present invention includes a quantum dot.
  • the quantum dots may refer to nanoscale semiconductor materials. Atoms form molecules, and molecules form clusters of small molecules called clusters that form nanoparticles, which are called quantum dots when they are semiconducting. When the quantum dots reach the excited state from the outside, the quantum dots emit energy according to their corresponding energy bandgap.
  • the color filter made of the self-luminous photosensitive resin composition according to the present invention can emit light (light luminescence) by light irradiation by including the quantum dots.
  • a typical image display apparatus including a color filter
  • white light is transmitted through the color filter to implement color.
  • a part of the light is absorbed by the color filter, thereby degrading light efficiency.
  • the color filter made of the self-luminous photosensitive resin composition according to the present invention since the color filter is self-luminous by the light of the light source, it is possible to implement more excellent light efficiency, and also emit light with color Since the color reproducibility is excellent, and the light is emitted in all directions by the photoluminescence, the viewing angle is also improved.
  • group II-VI semiconductor compound Group III-V semiconductor compounds; Group IV-VI semiconductor compounds; A Group IV element or a compound containing the same; And it can be selected from the group consisting of these, these can be used alone or in combination of two or more.
  • the II-VI semiconductor compound may be selected from the group consisting of CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, and mixtures thereof; CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe And an elemental compound selected from the group consisting of CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnS, H
  • the group III-V semiconductor compound may be selected from the group consisting of GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, and mixtures thereof; Three-element compounds selected from the group consisting of GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP and mixtures thereof; And an elemental compound selected from the group consisting of GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, InAlPSb and mixtures thereof.
  • the Group IV-VI semiconductor compound may be selected from the group consisting of SnS, SnSe, SnTe, PbS, PbSe, PbTe, and mixtures thereof; A three-element compound selected from the group consisting of SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, and mixtures thereof; And SnPbSSe, SnPbSeTe, SnPbSTe, and one or more selected from the group consisting of an elemental compound selected from the group consisting of mixtures thereof, but are not limited thereto.
  • the group IV element or a compound including the same may include an element compound selected from the group consisting of Si, Ge, and mixtures thereof; And a binary element compound selected from the group consisting of SiC, SiGe, and mixtures thereof.
  • the quantum dots are homogeneous single structures; Dual structures such as core-shell, gradient structures, and the like; Or a mixed structure thereof.
  • the material constituting each core and shell may be made of the above-mentioned different semiconductor compounds.
  • the core may include one or more materials selected from the group consisting of CdSe, CdS, ZnS, ZnSe, CdTe, CdSeTe, CdZnS, PbSe, AgInZnS, and ZnO, but is not limited thereto.
  • the shell may include one or more materials selected from the group consisting of CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe, and HgSe, but is not limited thereto.
  • the quantum dot may be a part of the surface is substituted with an organic ligand, but is not limited thereto.
  • the organic ligand is preferably bonded to the surface of the quantum dot to play a role of stabilizing the quantum dot.
  • the organic ligand is not limited in the present invention, but C5 to C20 alkyl carboxylic acid, alkenyl carboxylic acid or alkynyl carboxylic acid; Pyridine; Mercapto alcohol; Thiols; Phosphine; Phosphine oxides; Primary amine; Secondary amines; And the like.
  • the method of replacing a part of the surface of the quantum dot with an organic ligand is not limited in the present invention, and conventional methods performed in the art may be used.
  • the quantum dots may be synthesized by a wet chemical process, a metal organic chemical vapor deposition (MOCVD), or a molecular beam epitaxy (MBE), but are not limited thereto. .
  • MOCVD metal organic chemical vapor deposition
  • MBE molecular beam epitaxy
  • the wet chemical process is a method of growing a particle by adding a precursor material to an organic solvent.
  • the organic solvent naturally coordinates the surface of the quantum dot crystal and acts as a dispersant to control the growth of the crystal. Therefore, the nano solvent is easier and cheaper than the vapor deposition method such as the organometallic chemical vapor deposition process or molecular beam epitaxy. Since the growth of the particles can be controlled, it is preferred to produce the quantum dots according to the invention using the wet chemical process.
  • the quantum dot may be included in 20 to 99 parts by weight, preferably 30 to 99 parts by weight, more preferably 50 to 99 parts by weight based on 100 parts by weight of the total quantum dot dispersion solids.
  • the quantum dot is included in the above range, it is possible to provide a self-luminous photosensitive resin composition having excellent photosensitivity.
  • the quantum dot is included in the range below the photosensitive properties may be slightly reduced, and when included in excess of the above range, the content of the other components, such as alkali-soluble resin, photopolymerizable compound to be described later in contrast to the quantum dot Since it is relatively small, there is a problem that the manufacture of the color filter may be somewhat difficult, so it is preferably included within the above range.
  • the quantum dot dispersion according to the present invention includes a first solvent having a dielectric constant of less than 12.0 at 20 ° C.
  • the solvent according to the present invention is a halogenated hydrocarbon solvent; Aromatic hydrocarbon solvents; And aliphatic saturated hydrocarbon solvents.
  • the halogenated hydrocarbon solvent may include, but is not limited to, for example, chloroform, dichloromethane, methylene chloride tetrachloride, dichloroethane, tetrachloroethane, and the like.
  • the aromatic hydrocarbon solvent may include, but is not limited to, benzene, toluene, dichlorobenzene, xylene, and the like.
  • the aliphatic saturated hydrocarbon solvent may include, but is not limited to, chain alkanes such as N-hexane, pentane, heptane, cyclic alkanes such as cyclopentane, cyclohexane, kerosene, and the like.
  • the first solvent according to the present invention may be a halogenated hydrocarbon solvent such as chloroform or dichloromethane; Aromatic hydrocarbon solvents such as benzene or toluene; Or an aliphatic saturated hydrocarbon solvent such as N-hexane; the content of 100 ppm. Specifically, it may be 50 ppm, more specifically 10 ppm or less.
  • the solvent according to the present invention does not contain a solvent harmful to the human body there is an advantage that can protect the worker from potential danger.
  • the first solvent may be a dielectric constant of less than 8.0 at 20 °C.
  • the first solvent may be a dielectric constant of less than 6.0 at 20 °C.
  • the quantum dot dispersion according to the present invention has an advantage of excellent quantum dot dispersion characteristics by including a first solvent satisfying the dielectric constant value. For this reason, the color filter and the image display apparatus made of the self-luminous photosensitive resin composition including the quantum dot dispersion according to the present invention has an advantage of excellent light emission characteristics.
  • the dielectric constant of the first solvent is 12.0 or more at 20 ° C.
  • the dispersibility of the quantum dots is somewhat lowered, and thus, the phenomenon of aggregation of the quantum dots may occur, thereby reducing the overall luminescence properties, and the color filter having nonuniform performance is manufactured.
  • the first solvent is methyl isoamyl ketone, diisobutyl ketone, diethyl carbonate, butyl acetate, isobutyl acetate, isoamyl acetate, isobutyl isobutyrate, 2-ethylhexyl acetate , Hexyl acetate, neryl acetate, dipropylene glycol dimethyl ether and dipropylene glycol methyl ether acetate, ethyl o-formate, ethyl butyrate, diethyl acetal, methyl hexanoate, methyl octanoate, ethyl isovalerate, methyl 3 -Methylbutanoate, isopentyl 3-methylbutanoate, isopentyl butanoate, ethyl methyl carbonate, pentyl pentanoate, isoamyl propionate, isobut
  • the first solvent may be included in an amount of 25 to 95 parts by weight, preferably 30 to 95 parts by weight, and more preferably 40 to 90 parts by weight based on 100 parts by weight of the total quantum dot dispersion.
  • the first solvent is included in the range based on 100 parts by weight of the total quantum dot dispersion, it is preferable to improve the dispersibility of the quantum dot.
  • the first solvent is included in the less than the above range, the optical properties are advantageous, but the dispersion properties may be slightly lowered.
  • the first solvent is exceeded, the dispersion properties are advantageous, but the optical properties may be slightly lowered, thus satisfying the above range. It is preferable.
  • the quantum dot dispersion may further include one or more selected from the group consisting of a phosphate ester-based dispersant, an acrylic dispersant and a urethane-based dispersant.
  • the quantum dot dispersion further comprises one or more selected from the group consisting of the phosphate ester-based dispersant, the acrylic dispersant and the urethane-based dispersant, the dispersibility of the quantum dot and the first solvent is improved, thereby providing excellent quantum efficiency.
  • the phosphate ester-based dispersant may include a phosphate ester-based compound, wherein the phosphate ester-based compound is a hydroxy group or a hydroxy group present in phosphate ester ((HO) 2 PO (OR)) or phosphoric acid (H 3 PO 4 )
  • the hydrogen atom may be substituted or unsubstituted with another functional group.
  • the phosphate ester compound may be represented in the form of (H 2 PO 3 ⁇ ), but is not limited thereto.
  • the "phosphate ester type" may include one or more selected from the group consisting of phosphorous acid derivatives, phosphoric acid derivatives, phosphonic acid derivatives and phosphinic acid derivatives.
  • the dispersant includes the phosphate ester compound, there is an advantage in that the light efficiency and the photosensitive characteristics can be suppressed.
  • the phosphate ester compound may further include at least one of a polyether moiety, a polyester moiety, and a phosphate group in one molecule.
  • poly- may refer to a compound composed of a large number of repeating units
  • the "polyether portion” and “polyester portion” may have 1 to 20 repeating units each containing an ether group or an ester group. It can be referred to as a part consisting of.
  • the repeating unit may be composed of 5 to 20, more preferably 10 to 20, in this case there is an excellent compatibility.
  • the phosphate ester compound further includes a polyether moiety in one molecule
  • compatibility with alkali-soluble resins to be described later is improved
  • the phosphate ester compound further includes a polyester moiety in one molecule.
  • the compatibility with the alkali-soluble resin and the dissolution characteristics for the alkaline developer are improved.
  • the phosphate ester compound may serve as a protective layer through adsorption on the surface of the quantum dot, and has the advantage of deagglomerating the quantum dot.
  • the phosphate ester compound according to the present invention may include a polyether moiety, a polyester moiety, and a phosphate group in one molecule, in which case deagglomeration of quantum dots reduces the particle size of the dispersion, and compatibility with alkali-soluble resins. And dissolution properties in alkaline developing solution, which is advantageous because it has an advantageous advantage in pattern formation.
  • the "acid value” is a value measured as the amount (mg) of potassium hydroxide required to neutralize 1 g of the acrylic polymer and may be involved in solubility in the self-luminous photosensitive resin composition described later.
  • the acid value of the phosphate ester compound is 10 (KOHmg / g) or more, specifically 10 to 200 (KOHmg / g) is preferable in view of the development rate of the self-luminous photosensitive resin composition containing the dispersant.
  • the acid value When the acid value is less than the above range, it may be somewhat difficult to secure a sufficient developing speed, and when the acid value exceeds the above range, adhesion to the substrate may be reduced, thereby causing short circuiting of the pattern, and lowering the storage stability of the overall composition to increase the viscosity. Since the problem may occur, it is preferable to satisfy the above range.
  • an acrylic block copolymer is mentioned as said acrylic dispersing agent.
  • the block copolymer which has the block containing a basic group and an acidic group, and the block which does not contain the said basic group or the said acidic group is preferable.
  • Quantum dot adsorber The basic group and the acid group (hereinafter, these groups may be collectively referred to as “quantum dot adsorber”) each exhibit an action of adsorbing the quantum dots described above.
  • quantum dot adsorption block containing the said quantum dot adsorber what is comprised by using the monomer which has an acidic group with the monomer which has a basic group is mentioned.
  • the monomer which has the said basic group As a monomer which has the said basic group, the monomer which has a primary amino group, a secondary amino group, a tertiary amino group, or a quaternary ammonium group is mentioned.
  • Specific examples of the monomers include N, N-dimethylaminoethyl (meth) acrylate, N, N-diethylaminoethyl (meth) acrylate, N, N-dimethylacrylamide, diethylacrylamide, and dimethylaminopropyl Methacrylamide, acryloyl morpholine, vinylimidazole, 2-vinylpyridine, monomers having an amino group and a caprolactone skeleton;
  • a reaction product of a compound having a glycidyl group such as glycidyl (meth) acrylate with a compound having one secondary amino group in a molecule thereof;
  • the monomer which has the said acid group As a monomer which has the said acid group, the monomer which has a carboxy group and a sulfo group is mentioned.
  • a monomer which has a carboxy group Unsaturated monocarboxylic acid compounds, such as acrylic acid, methacrylic acid, and crotonic acid; Unsaturated dicarboxylic acid compounds such as maleic acid, fumaric acid and itaconic acid, and half esters thereof; Etc. can be mentioned.
  • 2-acrylamide-2-methyl-1-propanesulfonic acid, 2-methacrylamide-2-methyl-1-propanesulfonic acid, styrenesulfonic acid, etc. are mentioned as a monomer which has a sulfo group.
  • Aromatic vinyl compounds such as styrene, (alpha) -methylstyrene, vinyltoluene, and benzyl chloride; Unsaturated carboxylic acid alkyl esters such as methyl (meth) acrylate, ethyl (meth) acrylate and butyl (meth) acrylate; Unsaturated carboxylic acid arylalkyl esters such as benzyl (meth) acrylate; The block derived from a polycaprolactone containing compound, a polyalkylene glycol monoester type compound, etc. are mentioned.
  • the acrylic block copolymer can be obtained by a conventionally known polymerization method such as living anion polymerization.
  • the amine titer of the said acryl-type block copolymer is 0-200 mgKOH / g normally, Preferably it is 0-120 mgKOH / g, More preferably, it is 0-80 mgKOH / g.
  • a dispersant obtained by reacting a compound having a number-average molecular weight of 300 to 10,000 with one or more hydroxyl groups in a molecule and a basic group-containing compound having a functional group capable of reacting with an isocyanate group in the molecule, isocyanate group of a polyisocyanate compound Can be.
  • polyisocyanate compound As said polyisocyanate compound, the isocyanate compound which has two or more isocyanate groups is mentioned,
  • Polyisocyanate having isocyanuric groups derived from the diisocyanate (polyisocyanate having an isocyanuric group formed by trimming the diisocyanate);
  • Polyisocyanate obtained by reacting diisocyanate with a polyol
  • polyisocyanates having isocyanuric groups derived from diisocyanates such as tolylene diisocyanate and isophorone diisocyanate are preferable.
  • numerator As a compound which has one or more hydroxyl groups in the said molecule
  • numerator a polyether compound, a polyester compound, etc. are mentioned.
  • Polyalkylene glycol such as polyethyleneglycol, polypropylene glycol, polybutylene glycol, polytetramethylene glycol;
  • Alkylene glycols such as ethylene glycol, propanediol, propylene glycol, tetramethylene glycol, pentamethylene glycol, hexanediol, neopentyl glycol, glycerin, trimethylolpropane, pentaerythritol, diglycerol, ditrimethylolpropane, dipentaerythritol ;
  • modified substances of the low molecular monools include ethylene oxide modified substances, propylene oxide modified substances, butylene oxide modified substances, tetrahydrofuran modified substances and the like.
  • polyester compound examples include ethylene glycol, propanediol, propylene glycol, tetramethylene glycol, pentamethylene glycol, hexanediol, neopentyl glycol, glycerin, trimethylolpropane, pentaerythritol, diglycerol, ditrimethylol propane, dipenta Modified products of alkylene glycols such as erythritol;
  • Modified substances of low molecular weight monools such as methanol and ethanol;
  • Esterified products of aliphatic dicarboxylic acids such as adipic acid and dimer acid, and polyols such as neopentyl glycol and methylpentanediol, that is, aliphatic polyester polyols;
  • Polyhydric hydroxy group compounds such as polycarbonate polyol, acryl polyol, polytetramethylenehexaglyceryl ether (tetrahydrofuran modified product of hexaglycerin), fumaric acid, phthalic acid, isophthalic acid, itaconic acid, adipic acid, sebacic acid, maleic acid Esterified products with dicarboxylic acids such as;
  • Polyhydric hydroxy group-containing compounds such as monoglycerides obtained by transesterification of polyhydric hydroxy group-containing compounds such as glycerin and fatty acid esters;
  • modified substances of alcohols such as alkylene glycols and low molecular weight monools
  • modified substances of alcohols such as alkylene glycols and low molecular weight monools
  • ⁇ -caprolactone modified substances ⁇ -butyrolactone modified substances
  • ⁇ -valerolactone modified substances ⁇ -valerolactone modified substances
  • methylvalerolactone modified substances have.
  • ⁇ -caprolactone adducts of alcohols are preferable.
  • numerator is 300-10,000, Preferably it is 300-6,000.
  • a number average molecular weight and a weight average molecular weight can be measured by a column chromatography method.
  • a compound having an active hydrogen atom of Zerewitinoff and at least one nitrogen atom-containing basic group for example, a polyol or polythiol having an N, N-disubstituted amino group or a heterocyclic nitrogen atom And at least one compound selected from the group consisting of amines.
  • Such basic group-containing compounds include N, N-dimethyl-1,3-propanediamine, N, N-diethyl1,4-butanediamine, 2-dimethylaminoethanol, 1- (2-aminoethyl) -Piperazine, 2- (1-pyrrolidyl) -ethylamine, 4-amino-2-methoxypyrimidine, 4- (2-aminoethyl) -pyridine, 1- (2-hydroxyethyl) -pipe Razine, 4- (2-hydroxyethyl) -morpholine, 2-mercaptopyrimidine, 2-mercaptobenzoimidazole, 2-amino-6-methoxybenzothiazole, N, N-diallyl-melamine , 3-amino-1,2,4-triazole, 1- (2-hydroxyethyl) -imidazole, 3-mercapto-1,2,4-triazole, and the like.
  • amines having a heterocyclic nitrogen atom are prefer
  • the urethane-based dispersant can be synthesized by a conventionally known method.
  • the amine titer of the said urethane type dispersing agent becomes like this.
  • it is 0-200 mgKOH / g, More preferably, it is 0-120 mgKOH / g, More preferably, it is 0-80 mgKOH / g.
  • it is preferable that it is 0-55 mgKOH / g, and, as for the amine titer of the said urethane type dispersing agent, it is more preferable that it is 5-40 mgKOH / g.
  • Disperbyk-161 (Amine value 11 mgKOH / g, Big Chem Corporation make), Disperbyk-162 (Amine value 13 mgKOH / g Big Chemistry company make), Disperbyk-167 (Amine value 13 mgKOH / g, Big Chemistry company make) And Disperbyk-182 (amine value 13 mgKOH / g, manufactured by BIC Chem).
  • the amine number means the amine value per 1 g of the solid content of the dispersant, and using a 0.1 mol / l hydrochloric acid aqueous solution, a potentiometric titration method [for example, COMTITE (AUTO TITRATOR COM-900, BURET B-900, TITSTATIONK-900) ), Manufactured by Hiranumasan Co., Ltd., and then converted into equivalents of potassium hydroxide.
  • COMTITE AUTO TITRATOR COM-900, BURET B-900, TITSTATIONK-900
  • the dispersant may be included in an amount of 1 to 250 parts by weight based on 100 parts by weight of the total quantum dot solids, preferably 3 to 200 parts by weight, more preferably 5 to 100 parts by weight.
  • the dispersant is included in the above range is excellent in the deagglomeration effect of the quantum dot, it is possible to suppress the precipitation phenomenon by the polarity difference in the quantum dot dispersion according to the present invention and the self-luminous photosensitive resin composition comprising the same, manufacturing a color filter It is preferable because it can act as a protective layer of the quantum dots in the process.
  • Another aspect of the present invention is a quantum dot dispersion described above; And photopolymerizable compounds; Alkali-soluble resins; Photopolymerization initiator; And it is related with the self-luminous photosensitive resin composition containing 1 or more types chosen from the group which consists of a 2nd solvent.
  • the quantum dot dispersion is 3 to 80 parts by weight, preferably 5 to 70 parts by weight, more preferably 10 to 60 parts by weight based on 100 parts by weight of the total self-luminous photosensitive resin composition. May be included as a wealth.
  • the self-luminous photosensitive resin composition according to the present invention includes the quantum dot dispersion described above within the above range, there is an advantage in that a color filter having excellent luminescence properties can be manufactured. If the quantum dot dispersion is included in less than the above range, the light emission characteristics may be slightly lowered. If the quantum dot dispersion is included in the above range, the formation of a pattern may be somewhat difficult as the content of the other composition is reduced, and reliability Since it may be lowered, it is preferable to be included in the above range.
  • the self-luminous photosensitive resin composition according to the present invention may include a photopolymerizable compound.
  • the photopolymerizable compound contained in the self-luminous photosensitive resin composition of this invention is a compound which can superpose
  • the kind of the monofunctional monomer is not particularly limited, and for example, nonylphenylcarbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexyl carbitol acrylate, 2-hydroxyethyl acryl
  • the rate, N-vinylpyrrolidone, etc. are mentioned.
  • the kind of the said bifunctional monomer is not specifically limited, For example, 1, 6- hexanediol di (meth) acrylate, ethylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, and triethylene Glycol di (meth) acrylate, bis (acryloyloxyethyl) ether of bisphenol A, 3-methylpentanediol di (meth) acrylate, and the like.
  • the kind of the polyfunctional monomer is not particularly limited, and examples thereof include trimethylolpropane tri (meth) acrylate, ethoxylated trimethylol propane tri (meth) acrylate, and propoxylated trimethylolpropane tree (meth).
  • photopolymerizable compound examples include, but are not limited to, A9550 manufactured by Shin-Nakamura Corporation.
  • the photopolymerizable compound may be included in an amount of 5 to 50 parts by weight, specifically 15 to 45 parts by weight, and more specifically 20 to 37 parts by weight based on 100 parts by weight of the total solid of the self-luminous photosensitive resin composition.
  • the photopolymerizable compound is included in the above range, there is a preferable advantage in terms of intensity or smoothness of the pixel portion.
  • the intensity of the pixel portion may be lowered slightly, and when the photopolymerizable compound is included in the above range, smoothness may be slightly lowered, so it is preferably included within the range. .
  • the self-luminous photosensitive resin composition according to the present invention may include an alkali soluble resin.
  • the alkali-soluble resin may serve to make the non-exposed part of the color filter made of the self-luminous photosensitive resin composition alkali-soluble and to remove it, and to leave the exposure area.
  • the quantum dots may be evenly dispersed in the composition, and may serve to maintain the brightness by protecting the quantum dots during the process.
  • the alkali-soluble resin according to the present invention can be selected to have an acid value of 50 to 200 (KOHmg / g).
  • the alkali-soluble resin may consider the limitation of the molecular weight and the molecular weight distribution (Mw / Mn) in order to improve the surface hardness for use as a color filter.
  • Mw / Mn molecular weight distribution
  • the weight average molecular weight is 3,000 to 35,000, preferably 5,000 to 32,000
  • the molecular weight distribution is 1.5 to 6.0, preferably 1.8 to 4.0 so as to directly polymerize or purchase and use.
  • Alkali-soluble resins having a molecular weight and molecular weight distribution in the above range can be improved in the hardness already mentioned, as well as high residual film ratio, solubility of the non-exposed portion in the developing solution can be excellent and the resolution can be improved.
  • the alkali-soluble resin includes at least one member selected from the group consisting of polymers of carboxyl group-containing unsaturated monomers, copolymers with monomers having unsaturated bonds copolymerizable therewith, and combinations thereof.
  • the carboxyl group-containing unsaturated monomer may be unsaturated monocarboxylic acid, unsaturated dicarboxylic acid, unsaturated tricarboxylic acid, or the like.
  • unsaturated monocarboxylic acid acrylic acid, methacrylic acid, crotonic acid, (alpha)-chloroacrylic acid, cinnamic acid etc. are mentioned, for example.
  • unsaturated dicarboxylic acid maleic acid, a fumaric acid, itaconic acid, a citraconic acid, a mesaconic acid, etc. are mentioned, for example.
  • the unsaturated polyhydric carboxylic acid may be an acid anhydride, and specific examples thereof include maleic anhydride, itaconic anhydride and citraconic anhydride.
  • unsaturated polyhydric carboxylic acid may be mono (2-methacryloyloxyalkyl) ester, for example, succinic acid mono (2-acryloyloxyethyl), succinic acid mono (2-methacryloyloxyethyl) And phthalic acid mono (2-acryloyloxyethyl), phthalic acid mono (2-methacryloyloxyethyl) and the like.
  • the unsaturated polyhydric carboxylic acid may be mono (meth) acrylate of the sock end dicarboxy polymer, and examples thereof include? -Carboxypolycaprolactone monoacrylate and? -Carboxypolycaprolactone monomethacrylate.
  • These carboxyl group-containing monomers can be used individually or in mixture of 2 or more types, respectively.
  • monomers copolymerizable with carboxyl group-containing unsaturated monomers include aromatic vinyl compounds, unsaturated carboxylic acid ester compounds, unsaturated carboxylic acid aminoalkyl ester compounds, unsaturated carboxylic acid glycidyl ester compounds, carboxylic acid vinyl ester compounds, unsaturated ether compounds, vinyl cyanide compounds, One type selected from the group consisting of an unsaturated imide compound, an aliphatic conjugated diene compound, a macromonomer having a monoacryloyl group or a monomethacryloyl group at the terminal of the molecular chain, a bulky monomer, and a combination thereof is possible.
  • the copolymerizable monomer may be styrene, ⁇ -methylstyrene, o-vinyltoluene, m-vinyltoluene, p-vinyltoluene, p-chlorostyrene, o-methoxystyrene, m-methoxystyrene, p- Methoxy styrene, o-vinyl benzyl methyl ether, m-vinyl benzyl methyl ether, p-vinyl benzyl methyl ether, o-vinyl benzyl glycidyl ether, m-vinyl benzyl glycidyl ether, p-vinyl benzyl glycidyl Aromatic vinyl compounds such as ether and indene; Methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl g
  • Macromonomers having; Bulky monomers, such as a monomer having a norbornyl skeleton, a monomer having an adamantane skeleton, and a monomer having a rosin skeleton, can lower the dielectric constant.
  • the alkali-soluble resin may be included in 10 to 80 parts by weight, specifically 15 to 70 parts by weight, and more specifically 20 to 45 parts by weight based on 100 parts by weight of the total solids of the self-luminous photosensitive resin composition.
  • the solubility in the developing solution is sufficient, so that pattern formation is easy, and the film reduction of the pixel portion of the exposed portion is prevented at the time of development, so that the dropping of the non-pixel portion is good, which is preferable.
  • the alkali-soluble resin is included in less than the above range, the non-pixel portion may be somewhat missing, and when the alkali-soluble resin is included in more than the above range, the solubility in the developing solution is slightly lowered may be somewhat difficult to form a pattern.
  • the self-luminous photosensitive resin composition according to the present invention may include a photopolymerization initiator, and the photopolymerization initiator may be used without particular limitation as long as it can polymerize the photopolymerizable compound.
  • the photopolymerization initiator is an acetophenone compound, a benzophenone compound, a triazine compound, a biimidazole compound, an oxime compound, and a thioxanthone compound in terms of polymerization properties, start efficiency, absorption wavelength, availability, and price. It is preferable to use at least one compound selected from the group consisting of compounds.
  • acetophenone-based compound examples include diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyl dimethyl ketal, 2-hydroxy-1- [4- (2-hydroxy Hydroxyethoxy) phenyl] -2-methylpropan-1-one, 1-hydroxycyclohexylphenyl ketone, 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butan-1-one, 2-hydroxy-2-methyl-1- [4- (1-methylvinyl) phenyl] propane-1 -One, 2- (4-methylbenzyl) -2- (dimethylamino) -1- (4-morpholinophenyl) butan-1-one, and the like.
  • benzophenone type compound for example, benzophenone, methyl o-benzoyl benzoate, 4-phenylbenzophenone, 4-benzoyl-4'-methyldiphenyl sulfide, 3,3 ', 4,4'- tetra ( tert-butylperoxycarbonyl) benzophenone, 2,4,6-trimethylbenzophenone, and the like.
  • triazine-based compound examples include 2,4-bis (trichloromethyl) -6- (4-methoxyphenyl) -1,3,5-triazine and 2,4-bis (trichloromethyl) -6 -(4-methoxynaphthyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6-piperonyl-1,3,5-triazine, 2,4-bis (Trichloromethyl) -6- (4-methoxystyryl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (5-methylfuran-2- Yl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (furan-2-yl) ethenyl] -1,3,5-triazine , 2,4-bis (trichloromethyl) -6- [2- (furan
  • biimidazole compound examples include 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2,3-dichloro Phenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetra (alkoxyphenyl) biimidazole , 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetra (trialkoxyphenyl) biimidazole, 2,2-bis (2,6-dichlorophenyl) -4, The imidazole compound etc.
  • oxime compound examples include o-ethoxycarbonyl- ⁇ -oxyimino-1-phenylpropan-1-one and the like, and commercially available BASF Irgacure OXE 01 and OXE 02 are typical examples.
  • thioxanthone type compound 2-isopropyl thioxanthone, 2, 4- diethyl thioxanthone, 2, 4- dichloro thioxanthone, 1-chloro-4- propoxy thioxanthone, etc. are mentioned, for example. There is this.
  • the photopolymerization initiator may be included in an amount of 0.1 to 10 parts by weight, preferably 1 to 9.5 parts by weight, and more preferably 5 to 9.5 parts by weight based on 100 parts by weight of the total solid of the self-luminous photosensitive resin composition.
  • the self-luminous photosensitive resin composition may be highly sensitive, and thus the exposure time may be shortened, so that productivity may be improved and high resolution may be maintained. Moreover, there exists an advantage that the intensity
  • the photopolymerization initiator may further include a photopolymerization initiation aid in order to improve the sensitivity of the self-luminous photosensitive resin composition in the present invention.
  • a photopolymerization start adjuvant When the photopolymerization start adjuvant is included, there is an advantage in that the sensitivity is higher and the productivity is improved.
  • the photopolymerization initiation assistant may be preferably used, for example, at least one compound selected from the group consisting of an amine compound, a carboxylic acid compound, and an organic sulfur compound having a thiol group, but is not limited thereto.
  • an aromatic amine compound as the amine compound, and specifically, aliphatic amine compounds such as triethanolamine, methyl diethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, 4- Dimethylaminobenzoic acid isoamyl, 4-dimethylaminobenzoic acid 2-ethylhexyl, benzoic acid 2-dimethylaminoethyl, N, N-dimethylparatoluidine, 4,4'-bis (dimethylamino) benzophenone (common name: Michler's ketone ), 4,4'-bis (diethylamino) benzophenone and the like can be used.
  • aliphatic amine compounds such as triethanolamine, methyl diethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, 4- Dimethyl
  • the carboxylic acid compound is preferably an aromatic heteroacetic acid, specifically, phenylthioacetic acid, methylphenylthioacetic acid, ethylphenylthioacetic acid, methylethylphenylthioacetic acid, dimethylphenylthioacetic acid, methoxyphenylthioacetic acid, dimethoxyphenylthioacetic acid, Chlorophenylthioacetic acid, dichlorophenylthioacetic acid, N-phenylglycine, phenoxyacetic acid, naphthylthioacetic acid, N-naphthylglycine, naphthoxyacetic acid, etc. are mentioned.
  • organic sulfur compound having the thiol group examples include 2-mercaptobenzothiazole, 1,4-bis (3-mercaptobutyryloxy) butane, 1,3,5-tris (3-mercaptobutyloxyethyl)- 1,3,5-triazine-2,4,6 (1H, 3H, 5H) -trione, trimethylolpropanetris (3-mergaptopropionate), pentaerythritol tetrakis (3-mercaptobutyl Late), pentaerythritol tetrakis (3-mercaptopropionate), dipentaerythritol hexakis (3-mercaptopropionate), tetraethylene glycol bis (3-mercaptopropionate), etc. are mentioned. Can be.
  • the photopolymerization start adjuvant can be appropriately added and used within a range that does not impair the scope of the present invention.
  • the second solvent included in the self-luminous photosensitive resin composition of the present invention is not particularly limited, and may include an organic solvent commonly used in the art.
  • the first solvent may be the same as the second solvent, or may be different from each other.
  • the second solvent may be a halogenated hydrocarbon solvent; Aromatic hydrocarbon solvents; And aliphatic saturated hydrocarbon solvents.
  • the second solvent is ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl Diethylene glycol dialkyl ethers such as ether, diethylene glycol dipropyl ether and diethylene glycol dibutyl ether; Ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate; Alkylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, and the like; Alkoxyalkyl acetates such as methoxybutyl acetate and methoxypentyl acetate; Ke
  • the second solvent is preferably an organic solvent having a boiling point of 100 ° C to 200 ° C in the second solvent, more preferably alkylene glycol alkyl ether acetates, ketones, or 3 Esters such as ethyl ethoxypropionate and methyl 3-methoxypropionate, and more preferably propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, 3-ethoxypropionate ethyl and 3-meth Methyl oxypropionate etc. are mentioned.
  • These 2nd solvents can be used individually or in mixture of 2 or more types, respectively.
  • the second solvent may be included in an amount of 25 to 90 parts by weight, specifically 30 to 80 parts by weight, based on 100 parts by weight of the total self-luminous photosensitive resin composition, but is not limited thereto.
  • the coating property when applied with a coating device such as a roll coater, spin coater, slit and spin coater, slit coater (sometimes referred to as die coater), inkjet, etc. It is preferable because it can become good. If the content of the second solvent is less than the above range, the process may be somewhat difficult as the applicability is slightly lowered. If the second solvent exceeds the above range, the performance of the color filter formed of the self-luminous photosensitive resin composition may be slightly lowered. This can cause problems.
  • the self-luminous photosensitive resin composition according to the present invention may further include an additive such as an adhesion promoter and a surfactant to enhance the coating property or adhesion.
  • the adhesion promoter may include a silane coupling agent having a reactive substituent selected from the group consisting of carboxyl groups, methacryloyl groups, isocyanate groups, epoxy groups, and combinations thereof, which may be added to increase adhesion to the substrate. It is not limited.
  • the silane coupling agent is trimethoxysilyl benzoic acid, ⁇ -methacryl oxypropyl trimethoxy silane, vinyltriacetoxysilane, vinyl trimethoxysilane, ⁇ -isocyanate propyl triethoxysilane, ⁇ -glycidoxy If propyl trimethoxysilane, (beta)-(3, 4- epoxycyclohexyl) ethyltrimethoxysilane, etc. are mentioned, these can be used individually and in combination of 2 or more types.
  • the self-luminous photosensitive resin composition according to the present invention includes the surfactant
  • the surfactant is BM-1000, BM-1100 (BM Chemie Co., Ltd.), Proride FC-135 / FC-170C / FC-430 (Sumitomo 3M Co., Ltd.), SH-28PA / -190 / SZ-6032 (Dore Siri).
  • Fluorine-based surfactants such as Corn Co., Ltd. may be used, but is not limited thereto.
  • the self-luminous photosensitive resin composition according to the present invention may further include additives such as antioxidants, ultraviolet absorbers and anti-agglomerating agents in a range that does not impair the effects of the present invention, the additives also inhibit the effects of the present invention It can be used by those skilled in the art as long as it does not.
  • the additive may be used in an amount of 0.05 to 10 parts by weight, specifically 0.1 to 10 parts by weight, more specifically 0.1 to 5 parts by weight based on the total weight of the self-luminous photosensitive resin composition, but is not limited thereto.
  • Yet another aspect of the present invention relates to a color filter manufactured using the above-described self-luminous photosensitive resin composition.
  • Color filter according to the present invention is a quantum dot; And a first solvent having a dielectric constant of less than 12.0 at 20 ° C .; and a halogenated hydrocarbon solvent such as chloroform or dichloromethane; Aromatic hydrocarbon solvents such as benzene or toluene; And a cured product of a self-luminous photosensitive resin composition including a quantum dot dispersion having excellent dispersibility, which does not include an aliphatic saturated hydrocarbon-based solvent such as N-hexane. Since there is no solvent harmful to the human body in the environment there is an excellent advantage.
  • the color filter includes a substrate and a pattern layer formed on the substrate.
  • the substrate may be the substrate of the color filter itself, or may be a portion where the color filter is positioned in a display device or the like, and is not particularly limited.
  • the substrate may be glass, silicon (Si), silicon oxide (SiOx), or a polymer substrate, and the polymer substrate may be polyethersulfone (PES) or polycarbonate (PC).
  • the pattern layer is a layer including the self-luminous photosensitive resin composition of the present invention, and may be a layer formed by applying the self-luminous photosensitive resin composition and exposing, developing and thermosetting in a predetermined pattern.
  • the pattern layer may be formed by performing a method commonly known in the art.
  • the color filter including the substrate and the pattern layer may further include a partition formed between each pattern, and may further include a black matrix, but is not limited thereto.
  • a protective film formed on the pattern layer of the color filter may be further included.
  • the color filter may include one or more selected from the group consisting of a red pattern layer, a green pattern layer and a blue pattern layer.
  • the color filter may include one or more selected from the group consisting of a red pattern layer including a red quantum dot, a green pattern layer including a green quantum dot, and a blue pattern layer including a blue quantum dot according to the present invention.
  • the red pattern layer, the green pattern layer, and the blue pattern layer may respectively emit red light, green light, and blue light when irradiated with light.
  • the emission light of the light source is not particularly limited, but blue light may be generated in terms of better color reproducibility.
  • a light source that emits can be used.
  • the color filter may include only a pattern layer of two colors among the red pattern layer, the green pattern layer, and the blue pattern layer, but is not limited thereto. However, when the color filter includes only the pattern layer of two colors, the pattern layer may further include a transparent pattern layer containing no quantum dot particles.
  • a light source emitting light having a wavelength representing a color other than the two colors may be used.
  • a light source emitting blue light may be used.
  • red quantum dots emit red light and green quantum dots emit green light
  • the transparent pattern layer may As the blue light transmitted by the light source is transmitted as it is, blue can be obtained.
  • Another aspect of this invention is related with the image display apparatus containing the color filter mentioned above.
  • the color filter of the present invention can be applied to various image display devices such as electroluminescent display devices, plasma display devices, field emission display devices, as well as ordinary liquid crystal display devices.
  • the image display apparatus which concerns on this invention contains the hardened
  • the image display apparatus may further include a light source emitting blue light and a transparent pattern layer, and the above-described information may be applied to the light source emitting blue light and the transparent pattern layer.
  • the photoluminescence spectrum of the obtained nanoquantum dot was 635 nm.
  • a flask equipped with a stirrer, a thermometer, a reflux condenser, a dropping lot, and a nitrogen inlet tube was prepared, while 45 parts by weight of N-benzylmaleimide, 45 parts by weight of methacrylic acid, 10 parts by weight of tricyclodecyl methacrylate, 4 parts by weight of t-butylperoxy-2-ethylhexanoate and 40 parts by weight of propylene glycol monomethyl ether acetate (hereinafter referred to as PGMEA) were added thereto, stirred and mixed to prepare a monomer dropping lot, and 6 parts by weight of n-dodecanethiol.
  • PGMEA propylene glycol monomethyl ether acetate
  • B-1 Dipropylene glycol dimethyl ether 10.5
  • B-2 Dipropylene Glycol Methyl Ether Acetate 8.3
  • B-3 Hexyl acetate 4.42
  • B-4 diethyl carbonate 2.82
  • B-5 2,6-dimethyl-4-heptanone 9.91
  • B-6 propylene glycol methyl ether (PGME) 12.3
  • B-7 DAA (Diacetone Alcohol) 18.2
  • the color filter was manufactured using the self-luminous photosensitive resin composition prepared according to the above Examples and Comparative Examples. Specifically, each self-luminous photosensitive resin composition was applied on a glass substrate by spin coating, and then placed on a heating plate and maintained at a temperature of 100 ° C. for 3 minutes to form a thin film. Subsequently, a test photomask having a transmissive pattern of horizontal ⁇ vertical 20 mm ⁇ 20 mm squares and a line / space pattern of 1 ⁇ m to 100 ⁇ m was placed on the thin film and irradiated with ultraviolet rays at a distance of 100 ⁇ m from the test photomask.
  • the ultraviolet light source was irradiated with an exposure amount (365 nm) of 200 mJ / cm 2 under an atmospheric atmosphere using an ultra high pressure mercury lamp (trade name USH-250D) manufactured by Ushio Denki Co., Ltd., and no special optical filter was used.
  • the thin film irradiated with ultraviolet rays was developed by soaking for 80 seconds in a KOH aqueous solution developing solution of pH 10.5.
  • the thin film coated glass plate was washed with distilled water, dried by blowing nitrogen gas, and heated in a heating oven at 150 ° C. for 10 minutes to prepare a color filter pattern.
  • the film thickness of the self-luminous color pattern prepared above was 3.0 ⁇ m.
  • Dispersion particle size was measured using ELSZ-2000ZS (manufactured by Otsuka Co., Ltd.), and is shown in Table 4 below. In general, when the quantum dot particles are agglomerated, the dispersion particle size becomes large, thereby causing a problem in that the luminescence property is degraded.
  • the light-converted area was measured by a 365nm-type 4W UV irradiator (VL-4LC, VILBER LOURMAT) in the pattern part formed by the pattern of 20mm ⁇ 20mm square, It measured using USB2000 + (made by Ocean Optics). As the measured photoluminescence intensity is higher, it can be determined to exhibit excellent self-luminescence characteristics, and the results of photoluminescence intensity measurement are shown in Table 4 below.

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Abstract

According to the present invention, a quantum dot dispersion comprises: a quantum dot; and a first solvent having a dielectric constant less than 12.0 at 20°C, but does not comprise a halogenated hydrocarbon-based solvent, an aromatic hydrocarbon-based solvent, and an aliphatic saturated hydrocarbon-based solvent.

Description

양자점 분산체, 이를 포함하는 자발광 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치Quantum dot dispersion, self-luminous photosensitive resin composition comprising the same, color filter and image display device manufactured using the same
본 발명은 특정 유전상수 값을 가지는 용제를 포함하는 양자점 분산체, 이를 포함하는 자발광 감광성 수지 조성물, 이를 이용하여 제조된 컬러필터 및 화상 표시 장치에 관한 것이다.The present invention relates to a quantum dot dispersion comprising a solvent having a specific dielectric constant value, a self-luminous photosensitive resin composition comprising the same, a color filter and an image display device manufactured using the same.
컬러필터는 백색광에서 적색, 녹색 및 청색의 3가지 색을 추출하여 미세한 화소단위로 가능하게 하는 박막 필름형 광학부품으로서, 한 화소의 크기가 수십에서 수백 마이크로미터 정도이다. 이러한 컬러필터는 각각의 화소 사이의 경계부분을 차광하기 위하여 투명 기판 상에 정해진 패턴으로 형성된 블랙 매트릭스 층 및 각각의 화소를 형성하기 위해 복수의 색(통상적으로 적색(R), 녹색(G) 및 청색(B))의 3원색을 정해진 순서로 배열한 화소부가 차례로 적층된 구조를 취하고 있다.The color filter is a thin film type optical component that extracts three colors of red, green, and blue from white light and makes them possible in fine pixel units. The size of one pixel is about tens to hundreds of micrometers. Such a color filter includes a black matrix layer formed in a predetermined pattern on a transparent substrate to shield the boundary between each pixel, and a plurality of colors (typically red (R), green (G) and The pixel units in which the three primary colors of blue (B) are arranged in a predetermined order are stacked in this order.
최근에는 컬러필터를 구현하는 방법 중의 하나로서, 안료 분산형의 감광성 수지를 이용한 안료 분산법이 적용되고 있으나, 광원에서 조사된 광이 컬러필터를 투과하는 과정에서 광의 일부가 컬러필터에 흡수되어 광 효율이 저하되고, 또한 색 필터에 포함되어 있는 안료의 특성으로 인하여 색재현이 저하되는 문제점이 발생하고 있다.Recently, as one of the methods of implementing a color filter, a pigment dispersion method using a pigment-dispersible photosensitive resin has been applied, but a part of the light is absorbed by the color filter while the light emitted from the light source passes through the color filter. The problem is that the efficiency is lowered and the color reproduction is lowered due to the characteristics of the pigment contained in the color filter.
특히, 컬러필터가 각종 화상표시장치를 비롯한 다양한 분야에 사용됨에 따라 우수한 패턴 특성뿐만 아니라 높은 색재현율과 함께 우수한 고휘도, 고명암비와 같은 성능이 요구되고 있는 바, 이러한 문제를 해결하기 위하여, 양자점을 포함하는 자발광 감광성 수지 조성물을 이용한 컬러필터 제조 방법이 제안되었다.In particular, as color filters are used in various fields, including various image display devices, not only excellent pattern characteristics but also high color reproducibility and excellent performance such as high brightness and high contrast ratio are required. A color filter manufacturing method using the self-luminous photosensitive resin composition containing is proposed.
자발광 감광성 수지 조성물에 포함되는 양자점은 시판되는 형태를 구입하여 사용하는 것이 일반적인데, 이러한 양자점은 클로로포름, 톨루엔, n-헥산, 또는 벤젠과 같은 인체에 유해한 비극성 용제에 분산되어 판매되고 있다. 앞서 기술한 용제의 경우 고휘발성 화합물(Volatile Organic Compound)이거나 또는 발암성, 신경독성을 띠고, 생식기능의 이상에 대한 고위험성이 있어 작업자의 취급환경에 대한 엄격한 관리가 필요하다. The quantum dots included in the self-luminous photosensitive resin composition are generally purchased and used in commercially available forms, and these quantum dots are dispersed and sold in non-polar solvents harmful to the human body, such as chloroform, toluene, n-hexane, or benzene. Solvents described above are highly volatile compounds (Volatile Organic Compound) or carcinogenic, neurotoxic, and have a high risk of abnormal reproductive function.
대한민국 공개특허 제2015-0034013호는 양자점-수지 나노복합체 및 그 제조 방법에 관한 것으로서, 경화성 수지와 다수의 양자점이 나노입자 형태를 이루며 존재하는 양자점-수지 나노복합체에 관련된 내용을 개시하고 있다.Korean Patent Application Publication No. 2015-0034013 relates to a quantum dot-resin nanocomposite and a method for manufacturing the same, and discloses a content related to a quantum dot-resin nanocomposite in which a curable resin and a plurality of quantum dots form nanoparticles.
대한민국 공개특허 제2016-0069393호는 광 변환 복합재의 제조방법, 광 변환 복합재, 이를 포함하는 광 변환 필름, 백라이트 유닛 및 표시장치에 관한 것으로서, 매트릭스 수지; 및 상기 매트릭스 수지 내에 분산되는 양자점-고분자 비드를 포함하는 광 변환 복합재이며, 상기 광 변환 복합재는 소각 X선 산란(Small Angle X-ray Scattering)에 의해 측정되는 파수(wave number)에 따른 산란 강도(intensity) 그래프의 피크점(peak point)의 파수(wave number) q가 0.0056Å-1 내지 0.045Å-1 인 광 변환 복합재에 관한 내용을 개시하고 있다.Korean Patent Laid-Open No. 2016-0069393 relates to a method for manufacturing a light conversion composite, a light conversion composite, a light conversion film, a backlight unit, and a display device including the same, including a matrix resin; And a quantum dot-polymer bead dispersed in the matrix resin, wherein the light conversion composite has scattering intensity according to a wave number measured by Small Angle X-ray Scattering. Disclosed is a light conversion composite material having a wave number q of a peak point of an intensity graph of 0.0056 Å −1 to 0.045 Å −1 .
상기 문헌들의 경우 용제로서 인체에 유해한 용제를 사용하거나, 또는 분산특성이 우수하지 않아 패터닝이 되지 않기 때문에 컬러필터용으로 적용할 수 없는 문제점이 있다.In the case of the above documents, a solvent harmful to the human body is used as the solvent, or because the patterning is not performed because the dispersion property is not excellent, there is a problem that it cannot be applied for a color filter.
그러므로, 인체에 유해한 성분을 함유하고 있지 않으면서도 분산성이 우수하고 뛰어난 발광특성의 구현이 가능한 양자점 분산체, 자발광 감광성 수지 조성물의 개발이 요구되고 있다.Therefore, development of a quantum dot dispersion and a self-luminous photosensitive resin composition which are excellent in dispersibility and capable of realizing excellent luminescent properties without containing components harmful to a human body are required.
[선행기술문헌][Preceding technical literature]
[특허문헌][Patent Documents]
대한민국 공개특허 제2015-0034013호 (2015.04.02.)Republic of Korea Patent Publication No. 2015-0034013 (2015.04.02.)
대한민국 공개특허 제2016-0069393호 (2016.06.16.)Republic of Korea Patent Publication No. 2016-0069393 (2016.06.16.)
본 발명은 인체에 유해한 용제를 함유하지 않은 양자점 분산체, 이를 포함하는 자발광 감광성 수지 조성물을 제공하고자 한다.An object of the present invention is to provide a quantum dot dispersion containing no solvent harmful to a human body, and a self-luminous photosensitive resin composition comprising the same.
또한, 본 발명은 분산성이 우수하고, 발광특성이 우수한 양자점 분산체, 이를 포함하는 자발광 감광성 수지 조성물을 제공하고자 한다.In addition, the present invention is to provide a quantum dot dispersion having excellent dispersibility and excellent light emission characteristics, a self-luminous photosensitive resin composition comprising the same.
또한, 본 발명은 전술한 양자점 분산체, 자발광 감광성 수지 조성물을 이용하여 제조된 발광 특성이 우수한 컬러필터 및 화상표시장치를 제공하고자 한다.In addition, an object of the present invention is to provide a color filter and an image display device having excellent light emission characteristics manufactured by using the aforementioned quantum dot dispersion and a self-luminous photosensitive resin composition.
상기 목적을 달성하기 위한 본 발명에 따른 양자점 분산체는 양자점; 및 유전상수가 20℃에서 12.0 미만인 제1 용제;를 포함하고, 단, 할로겐화 탄화수소계 용제; 방향족 탄화수소계 용제; 및 지방족 포화 탄화수소계 용제;를 포함하지 않는 것을 특징으로 한다.A quantum dot dispersion according to the present invention for achieving the above object is a quantum dot; And a first solvent having a dielectric constant of less than 12.0 at 20 ° C., including a halogenated hydrocarbon solvent; Aromatic hydrocarbon solvents; And aliphatic saturated hydrocarbon solvents.
또한, 본 발명은 전술한 양자점 분산체; 및 광중합성 화합물; 알칼리 가용성 수지; 광중합 개시제; 및 제2 용제로 이루어진 군에서 선택되는 1종 이상을 더 포함하는 자발광 감광성 수지 조성물을 제공한다.In addition, the present invention is a quantum dot dispersion described above; And photopolymerizable compounds; Alkali-soluble resins; Photopolymerization initiator; And it provides a self-luminous photosensitive resin composition further comprising one or more selected from the group consisting of a second solvent.
또한, 본 발명은 전술한 자발광 감광성 수지 조성물의 경화물을 포함하는 컬러필터를 제공한다.Moreover, this invention provides the color filter containing the hardened | cured material of the above self-luminous photosensitive resin composition.
또한, 본 발명은 전술한 컬러필터를 포함하는 화상표시장치를 제공한다.In addition, the present invention provides an image display device including the color filter described above.
본 발명에 따른 양자점 분산체, 이를 포함하는 자발광 감광성 수지 조성물은 특정 유전상수를 가지는 용제를 포함하기 때문에 분산성이 우수하고 뛰어난 발광특성의 구현이 가능한 이점이 있고, 인체독성 물질을 함유하지 않는 이점이 있다.Since the quantum dot dispersion according to the present invention and the self-luminous photosensitive resin composition including the same include a solvent having a specific dielectric constant, there is an advantage of excellent dispersibility and excellent light emission characteristics, and does not contain a human toxic substance. There is an advantage.
또한, 본 발명에 따른 자발광 감광성 수지 조성물로 제조된 컬러필터 및 화상표시장치는 발광특성이 우수한 이점이 있다.In addition, the color filter and the image display device made of the self-luminous photosensitive resin composition according to the present invention has an advantage of excellent light emission characteristics.
이하, 본 발명에 대하여 더욱 상세히 설명한다.Hereinafter, the present invention will be described in more detail.
본 발명에서 어떤 부재가 다른 부재 "상에" 위치하고 있다고 할 때, 이는 어떤 부재가 다른 부재에 접해 있는 경우뿐 아니라 두 부재 사이에 또 다른 부재가 존재하는 경우도 포함한다.In the present invention, when a member is located "on" another member, this includes not only when one member is in contact with another member but also when another member exists between the two members.
본 발명에서 어떤 부분이 어떤 구성요소를 "포함" 한다고 할 때, 이는 특별히 반대되는 기재가 없는 한 다른 구성요소를 제외하는 것이 아니라 다른 구성요소를 더 포함할 수 있는 것을 의미한다.In the present invention, when a part "includes" a certain component, this means that it may further include other components, without excluding the other components unless otherwise stated.
<양자점 분산체><Quantum dot dispersion>
본 발명의 한 양태는 양자점 분산체에 관한 것이다. 구체적으로, 본 발명의 한 양태는 양자점; 및 유전상수가 20℃에서 12.0 미만인 제1 용제;를 포함하고, 단, 할로겐화 탄화수소계 용제; 방향족 탄화수소계 용제; 및 지방족 포화 탄화수소계 용제;를 포함하지 않는 양자점 분산체에 관한 것이다.One aspect of the invention relates to a quantum dot dispersion. Specifically, one aspect of the present invention is a quantum dot; And a first solvent having a dielectric constant of less than 12.0 at 20 ° C., including a halogenated hydrocarbon solvent; Aromatic hydrocarbon solvents; And an aliphatic saturated hydrocarbon solvent; relates to a quantum dot dispersion not containing.
본 발명에 따른 양자점 분산체는 양자점을 포함한다. 상기 양자점은 나노 크기의 반도체 물질을 일컬을 수 있다. 원자가 분자를 이루고, 분자는 클러스터라고 하는 작은 분자들의 집합체를 구성하여 나노 입자를 이루게 되는데, 이러한 나노 입자들이 반도체 특성을 띠고 있을 때 양자점이라고 한다. 상기 양자점은 외부에서 에너지를 받아 들뜬 상태에 이르면, 상기 양자점의 자체적으로 해당하는 에너지 밴드갭에 따른 에너지를 방출하게 된다.The quantum dot dispersion according to the present invention includes a quantum dot. The quantum dots may refer to nanoscale semiconductor materials. Atoms form molecules, and molecules form clusters of small molecules called clusters that form nanoparticles, which are called quantum dots when they are semiconducting. When the quantum dots reach the excited state from the outside, the quantum dots emit energy according to their corresponding energy bandgap.
본 발명에 따른 자발광 감광성 수지 조성물로 제조된 컬러필터는 상기 양자점을 포함함으로써 광 조사에 의해 발광(광 루미네선스(luminescence))할 수 있다.The color filter made of the self-luminous photosensitive resin composition according to the present invention can emit light (light luminescence) by light irradiation by including the quantum dots.
컬러필터를 포함하는 통상의 화상표시장치에서는 백색광이 상기 컬러필터를 투과하여 컬러가 구현되는데, 이 과정에서 광의 일부가 컬러필터에 흡수되므로 광 효율이 저하된다. 그러나, 본 발명에 따른 자발광 감광성 수지 조성물로 제조된 컬러필터를 포함하는 경우에는, 컬러필터가 광원의 광에 의해 자체 발광하므로, 보다 뛰어난 광 효율을 구현할 수 있으며, 또한 색상을 가진 광이 방출되는 것이므로 색 재현성이 보다 우수하고, 광루미네선스에 의해 전 방향으로 광이 방출되므로 시야각도 개선될 수 있는 이점이 있다. In a typical image display apparatus including a color filter, white light is transmitted through the color filter to implement color. In this process, a part of the light is absorbed by the color filter, thereby degrading light efficiency. However, in the case of including the color filter made of the self-luminous photosensitive resin composition according to the present invention, since the color filter is self-luminous by the light of the light source, it is possible to implement more excellent light efficiency, and also emit light with color Since the color reproducibility is excellent, and the light is emitted in all directions by the photoluminescence, the viewing angle is also improved.
광에 의한 자극으로 발광할 수 있는 양자점 입자라면 특별히 한정되지 않는다. 예컨대, II-VI족 반도체 화합물; III-V족 반도체 화합물; IV-VI족 반도체 화합물; IV족 원소 또는 이를 포함하는 화합물; 및 이들의 조합으로 이루어진 군에서 선택될 수 있으며, 이들은 단독 또는 2종 이상 혼합하여 사용할 수 있다.It will not specifically limit, if it is a quantum dot particle which can emit light by stimulation by light. For example, group II-VI semiconductor compound; Group III-V semiconductor compounds; Group IV-VI semiconductor compounds; A Group IV element or a compound containing the same; And it can be selected from the group consisting of these, these can be used alone or in combination of two or more.
구체적으로, 상기 II-VI족 반도체 화합물은 CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe 및 이들의 혼합물로 이루어진 군에서 선택되는 이원소 화합물; CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe 및 이들의 혼합물로 이루어진 군에서 선택되는 삼원소 화합물; 및 CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe, HgZnSTe 및 이들의 혼합물로 이루어진 군에서 선택되는 사원소 화합물로 이루어진 군에서 선택될 수 있으나 이에 한정되는 것은 아니다.Specifically, the II-VI semiconductor compound may be selected from the group consisting of CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, and mixtures thereof; CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe And an elemental compound selected from the group consisting of CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe, HgZnSTe, and mixtures thereof.
상기 III-V족 반도체 화합물은 GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb 및 이들의 혼합물로 이루어진 군에서 선택되는 이원소 화합물; GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP 및 이들의 혼합물로 이루어진 군에서 선택되는 삼원소 화합물; 및 GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, InAlPSb 및 이들의 혼합물로 이루어진 군에서 선택되는 사원소 화합물로 이루어진 군에서 선택될 수 있다.The group III-V semiconductor compound may be selected from the group consisting of GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, and mixtures thereof; Three-element compounds selected from the group consisting of GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP and mixtures thereof; And an elemental compound selected from the group consisting of GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, InAlPSb and mixtures thereof.
상기 IV-VI족 반도체 화합물은 SnS, SnSe, SnTe, PbS, PbSe, PbTe 및 이들의 혼합물로 이루어진 군에서 선택되는 이원소 화합물; SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe 및 이들의 혼합물로 이루어진 군에서 선택되는 삼원소 화합물; 및 SnPbSSe, SnPbSeTe, SnPbSTe 및 이들의 혼합물로 이루어진 군에서 선택되는 사원소 화합물로 이루어진 군에서 선택되는 하나 이상일 수 있으나, 역시 이에 한정되지 않는다.The Group IV-VI semiconductor compound may be selected from the group consisting of SnS, SnSe, SnTe, PbS, PbSe, PbTe, and mixtures thereof; A three-element compound selected from the group consisting of SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, and mixtures thereof; And SnPbSSe, SnPbSeTe, SnPbSTe, and one or more selected from the group consisting of an elemental compound selected from the group consisting of mixtures thereof, but are not limited thereto.
이에 한정되지는 않으나, 상기 IV족 원소 또는 이를 포함하는 화합물은 Si, Ge 및 이들의 혼합물로 이루어진 군에서 선택되는 원소 화합물; 및 SiC, SiGe 및 이들의 혼합물로 이루어진 군에서 선택되는 이원소 화합물로 이루어진 군에서 선택될 수 있다.Although not limited thereto, the group IV element or a compound including the same may include an element compound selected from the group consisting of Si, Ge, and mixtures thereof; And a binary element compound selected from the group consisting of SiC, SiGe, and mixtures thereof.
상기 양자점은 균질한(homogeneous) 단일 구조; 코어-쉘(core-shell), 그래디언트(gradient) 구조 등과 같은 이중 구조; 또는 이들의 혼합 구조일 수 있다.The quantum dots are homogeneous single structures; Dual structures such as core-shell, gradient structures, and the like; Or a mixed structure thereof.
구체적으로, 상기 코어-쉘의 이중 구조에서, 각각의 코어(core)와 쉘(shell)을 이루는 물질은 상기 언급된 서로 다른 반도체 화합물로 이루어질 수 있다. 예컨대, 상기 코어는 CdSe, CdS, ZnS, ZnSe, CdTe, CdSeTe, CdZnS, PbSe, AgInZnS 및 ZnO로 이루어진 군으로부터 선택된 하나 이상의 물질을 포함할 수 있으나, 이에 한정되는 것은 아니다. 상기 쉘은 CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe 및 HgSe으로 이루어진 군으로부터 선택된 하나 이상의 물질을 포함할 수 있으나, 역시 이에 한정되는 것은 아니다.Specifically, in the dual structure of the core-shell, the material constituting each core and shell may be made of the above-mentioned different semiconductor compounds. For example, the core may include one or more materials selected from the group consisting of CdSe, CdS, ZnS, ZnSe, CdTe, CdSeTe, CdZnS, PbSe, AgInZnS, and ZnO, but is not limited thereto. The shell may include one or more materials selected from the group consisting of CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe, and HgSe, but is not limited thereto.
상기 양자점은 표면의 일부가 유기 리간드로 치환된 것일 수 있으나, 이에 한정되지 않는다. 상기 유기 리간드는 상기 양자점의 표면에 결합되어 상기 양자점을 안정화시키는 역할을 수행할 수 있어 바람직하다. 상기 유기 리간드는 본 발명에서 한정하는 것은 아니나 C5 내지 C20의 알킬 카르복실산, 알케닐 카르복실산 또는 알키닐 카르복실산; 피리딘(pyridine); 메르캅토 알콜(mercapto alcohol); 티올(thiol); 포스핀(phosphine); 포스핀 산화물(phosphine oxide); 1차 아민(primary amine); 2차 아민(secondary amine); 등을 포함할 수 있다.The quantum dot may be a part of the surface is substituted with an organic ligand, but is not limited thereto. The organic ligand is preferably bonded to the surface of the quantum dot to play a role of stabilizing the quantum dot. The organic ligand is not limited in the present invention, but C5 to C20 alkyl carboxylic acid, alkenyl carboxylic acid or alkynyl carboxylic acid; Pyridine; Mercapto alcohol; Thiols; Phosphine; Phosphine oxides; Primary amine; Secondary amines; And the like.
상기 양자점의 표면의 일부를 유기 리간드로 치환하는 방법은 본 발명에서는 제한하지 않으며, 당업계에서 수행되는 통상적인 방법을 사용할 수 있다.The method of replacing a part of the surface of the quantum dot with an organic ligand is not limited in the present invention, and conventional methods performed in the art may be used.
상기 양자점은 습식 화학 공정(wet chemical process), 유기금속 화학증착 공정(MOCVD, metal organic chemical vapor deposition) 또는 분자선 에피텍시 공정(MBE, molecular beam epitaxy)에 의해 합성될 수 있으나 이에 한정되는 것은 아니다.The quantum dots may be synthesized by a wet chemical process, a metal organic chemical vapor deposition (MOCVD), or a molecular beam epitaxy (MBE), but are not limited thereto. .
상기 습식 화학 공정이란 유기용제에 전구체 물질을 넣어 입자를 성장시키는 방법이다. 결정이 성장될 때 유기용제가 자연스럽게 양자점 결정의 표면에 배위되어 분산제 역할을 하여 결정의 성장을 조절하게 되므로, 유기금속 화학증착 공정이나 분자선 에피텍시와 같은 기상증착법보다 더 쉽고 저렴한 공정을 통하여 나노 입자의 성장을 제어할 수 있으므로, 상기 습식 화학 공정을 사용하여 본 발명에 따른 상기 양자점을 제조하는 것이 바람직하다.The wet chemical process is a method of growing a particle by adding a precursor material to an organic solvent. When the crystal grows, the organic solvent naturally coordinates the surface of the quantum dot crystal and acts as a dispersant to control the growth of the crystal. Therefore, the nano solvent is easier and cheaper than the vapor deposition method such as the organometallic chemical vapor deposition process or molecular beam epitaxy. Since the growth of the particles can be controlled, it is preferred to produce the quantum dots according to the invention using the wet chemical process.
상기 양자점은 상기 양자점 분산체 고형분 전체 100 중량부에 대하여 20 내지 99 중량부, 바람직하게는 30 내지 99 중량부, 더욱 바람직하게는 50 내지 99 중량부로 포함될 수 있다. 상기 양자점이 상기 범위 내로 포함되는 경우 감광특성이 우수한 자발광 감광성 수지 조성물의 제공이 가능하다. 상기 양자점이 상기 범위 미만으로 포함될 경우 감광특성이 다소 저하될 수 있으며, 상기 범위를 초과하여 포함하는 경우 상기 양자점과 대비하여 후술할 다른 구성들, 예컨대 알칼리 가용성 수지, 광중합성 화합물과 같은 구성들의 함량이 상대적으로 적어지므로 컬러필터의 제조가 다소 어려울 수 있는 문제가 있으므로, 상기 범위 내로 포함되는 것이 바람직하다.The quantum dot may be included in 20 to 99 parts by weight, preferably 30 to 99 parts by weight, more preferably 50 to 99 parts by weight based on 100 parts by weight of the total quantum dot dispersion solids. When the quantum dot is included in the above range, it is possible to provide a self-luminous photosensitive resin composition having excellent photosensitivity. When the quantum dot is included in the range below the photosensitive properties may be slightly reduced, and when included in excess of the above range, the content of the other components, such as alkali-soluble resin, photopolymerizable compound to be described later in contrast to the quantum dot Since it is relatively small, there is a problem that the manufacture of the color filter may be somewhat difficult, so it is preferably included within the above range.
본 발명에 따른 양자점 분산체는 유전상수가 20℃에서 12.0 미만인 제1 용제;를 포함한다. 단, 본 발명에 따른 용제는 할로겐화 탄화수소계 용제; 방향족 탄화수소계 용제; 및 지방족 포화 탄화수소계 용제;를 포함하지 않는다. The quantum dot dispersion according to the present invention includes a first solvent having a dielectric constant of less than 12.0 at 20 ° C. However, the solvent according to the present invention is a halogenated hydrocarbon solvent; Aromatic hydrocarbon solvents; And aliphatic saturated hydrocarbon solvents.
상기 할로겐화 탄화수소계 용제는 예컨대, 클로로포름, 디클로로메탄, 메틸렌클로라이드 4염화탄소, 디클로로에탄, 테트라클로로에탄 등을 포함할 수 있으나 이에 한정되지는 않는다.The halogenated hydrocarbon solvent may include, but is not limited to, for example, chloroform, dichloromethane, methylene chloride tetrachloride, dichloroethane, tetrachloroethane, and the like.
상기 방향족 탄화수소계 용제는 벤젠, 톨루엔, 디클로로벤젠, 자일렌 등을 포함할 수 있으나 이에 한정되지 않는다.The aromatic hydrocarbon solvent may include, but is not limited to, benzene, toluene, dichlorobenzene, xylene, and the like.
상기 지방족 포화 탄화수소계 용제는 N-헥산, 펜탄, 헵탄 등의 쇄상 알칸, 사이클로펜탄, 사이클로헥산 등의 사이클릭알칸, 케로신(kerosene) 등을 포함할 수 있으나 이에 한정되지 않는다.The aliphatic saturated hydrocarbon solvent may include, but is not limited to, chain alkanes such as N-hexane, pentane, heptane, cyclic alkanes such as cyclopentane, cyclohexane, kerosene, and the like.
구체적으로, 본 발명에 따른 제1 용제는 클로로포름 또는 디클로로메탄과 같은 할로겐화 탄화수소계 용제; 벤젠 또는 톨루엔과 같은 방향족 탄화수소계 용제; 또는 N-헥산과 같은 지방족 포화 탄화수소계 용제;의 함량이 100ppm. 구체적으로 50ppm, 더욱 구체적으로 10ppm 이하일 수 있다.Specifically, the first solvent according to the present invention may be a halogenated hydrocarbon solvent such as chloroform or dichloromethane; Aromatic hydrocarbon solvents such as benzene or toluene; Or an aliphatic saturated hydrocarbon solvent such as N-hexane; the content of 100 ppm. Specifically, it may be 50 ppm, more specifically 10 ppm or less.
본 발명에 따른 용제는 인체에 유해한 용제를 포함하지 않기 때문에 작업자를 잠재적인 위험으로부터 보호할 수 있는 이점이 있다.Since the solvent according to the present invention does not contain a solvent harmful to the human body there is an advantage that can protect the worker from potential danger.
본 발명의 또 다른 실시형태에 있어서, 상기 제1 용제는 유전상수가 20℃에서 8.0 미만인 것일 수 있다.In another embodiment of the present invention, the first solvent may be a dielectric constant of less than 8.0 at 20 ℃.
본 발명의 또 다른 실시형태에 있어서, 상기 제1 용제는 유전상수가 20℃에서 6.0 미만인 것일 수 있다.In another embodiment of the present invention, the first solvent may be a dielectric constant of less than 6.0 at 20 ℃.
본 발명에 따른 양자점 분산체는 상기 유전상수 값을 만족하는 제1 용제를 포함함으로써 양자점 분산 특성이 우수한 이점이 있다. 이로 인하여, 본 발명에 따른 양자점 분산체를 포함하는 자발광 감광성 수지 조성물로 제조된 컬러 필터 및 화상표시장치는 발광특성의 구현이 우수한 이점이 있다.The quantum dot dispersion according to the present invention has an advantage of excellent quantum dot dispersion characteristics by including a first solvent satisfying the dielectric constant value. For this reason, the color filter and the image display apparatus made of the self-luminous photosensitive resin composition including the quantum dot dispersion according to the present invention has an advantage of excellent light emission characteristics.
상기 제1 용제의 유전상수가 20℃에서 12.0 이상일 경우 양자점의 분산성이 다소 저하되고, 이에 따라 양자점이 응집되는 현상이 발생하여 전체적인 발광특성이 저하될 수 있고, 성능이 불균일한 컬러필터가 제조될 수 있으므로, 유전상수가 20℃에서 12.0 미만인 제1 용제를 사용하는 것이 바람직하다.When the dielectric constant of the first solvent is 12.0 or more at 20 ° C., the dispersibility of the quantum dots is somewhat lowered, and thus, the phenomenon of aggregation of the quantum dots may occur, thereby reducing the overall luminescence properties, and the color filter having nonuniform performance is manufactured. As such, it is preferable to use a first solvent having a dielectric constant of less than 12.0 at 20 ° C.
본 발명의 또 다른 실시형태에 있어서, 상기 제1 용제는 메틸 이소아밀 케톤, 디이소부틸 케톤, 디에틸 카보네이트, 부틸 아세테이트, 이소부틸 아세테이트, 이소아밀 아세테이트, 이소부틸 이소부티레이트, 2-에틸헥실 아세테이트, 헥실 아세테이트, 네릴 아세테이트, 디프로필렌 글리콜 디메틸 에테르 및 디프로필렌 글리콜 메틸 에테르 아세테이트, 에틸 o-포르메이트, 에틸 부티레이트, 디에틸 아세탈, 메틸 헥사노에이트, 메틸 옥타노에이트, 에틸 이소발러레이트, 메틸 3-메틸부타노에이트, 이소펜틸 3-메틸부타노에이트, 이소펜틸 부타노에이트, 에틸 메틸 카보네이트, 펜틸 펜타노에이트, 이소아밀 프로피어네이트, 이소부틸 이소발러레이트, 프로필 이소발러레이트, 2-(2-(비닐옥시)에톡시)프로판, 1-알릴옥시-2-이소프록시-에탄, (2-이소부톡시-에톡시)-에텐, 1-비닐옥시-2-이소펜톡시-에탄, 1-비닐옥시-2-펜톡시-에탄으로 이루어진 군에서 선택되는 1 이상을 포함할 수 있다.In another embodiment of the invention, the first solvent is methyl isoamyl ketone, diisobutyl ketone, diethyl carbonate, butyl acetate, isobutyl acetate, isoamyl acetate, isobutyl isobutyrate, 2-ethylhexyl acetate , Hexyl acetate, neryl acetate, dipropylene glycol dimethyl ether and dipropylene glycol methyl ether acetate, ethyl o-formate, ethyl butyrate, diethyl acetal, methyl hexanoate, methyl octanoate, ethyl isovalerate, methyl 3 -Methylbutanoate, isopentyl 3-methylbutanoate, isopentyl butanoate, ethyl methyl carbonate, pentyl pentanoate, isoamyl propionate, isobutyl isovalerate, propyl isovalerate, 2- ( 2- (vinyloxy) ethoxy) propane, 1-allyloxy-2-isoproxy-ethane, (2-isobutoxy-ethoxy) And at least one selected from the group consisting of -ethene, 1-vinyloxy-2-isopentoxy-ethane, and 1-vinyloxy-2-pentoxy-ethane.
상기 제1 용제는 상기 양자점 분산체 전체 100 중량부에 대하여 25 내지 95 중량부, 바람직하게는 30 내지 95 중량부, 더욱 바람직하게는 40 내지 90 중량부로 포함될 수 있다. 상기 제1 용제가 상기 양자점 분산체 전체 100 중량부에 대하여 상기 범위 내로 포함될 경우 상기 양자점의 분산성을 향상시킬 수 있어 바람직하다. 상기 제1 용제가 상기 범위 미만으로 포함될 경우 광학 특성은 유리하나 분산특성이 다소 저하될 수 있으며, 상기 범위를 초과하는 경우 분산 특성은 유리하나 광학 특성이 다소 저하될 수 있으므로, 상기 범위를 만족하는 것이 바람직하다.The first solvent may be included in an amount of 25 to 95 parts by weight, preferably 30 to 95 parts by weight, and more preferably 40 to 90 parts by weight based on 100 parts by weight of the total quantum dot dispersion. When the first solvent is included in the range based on 100 parts by weight of the total quantum dot dispersion, it is preferable to improve the dispersibility of the quantum dot. When the first solvent is included in the less than the above range, the optical properties are advantageous, but the dispersion properties may be slightly lowered. When the first solvent is exceeded, the dispersion properties are advantageous, but the optical properties may be slightly lowered, thus satisfying the above range. It is preferable.
본 발명의 또 다른 실시형태에 있어서, 상기 양자점 분산체는 인산 에스테르계 분산제, 아크릴계 분산제 및 우레탄계 분산제로 이루어진 군에서 선택되는 1 이상을 더 포함할 수 있다.In another embodiment of the present invention, the quantum dot dispersion may further include one or more selected from the group consisting of a phosphate ester-based dispersant, an acrylic dispersant and a urethane-based dispersant.
상기 양자점 분산체가 상기 인산 에스테르계 분산제, 아크릴계 분산제 및 우레탄계 분산제로 이루어진 군에서 선택되는 1 이상을 더 포함하는 경우 양자점과 상기 제1 용제와의 분산성이 향상되어 양자 효율이 우수한 이점이 있다.When the quantum dot dispersion further comprises one or more selected from the group consisting of the phosphate ester-based dispersant, the acrylic dispersant and the urethane-based dispersant, the dispersibility of the quantum dot and the first solvent is improved, thereby providing excellent quantum efficiency.
상기 인산 에스테르계 분산제는 인산 에스테르계 화합물을 포함하는 것일 수 있으며, 상기 인산 에스테르계 화합물은 인산 에스테르((HO)2PO(OR)) 또는 인산(H3PO4)에 존재하는 히드록시기 또는 히드록시기의 수소원자를 다른 작용기로 치환 또는 비치환한 형태를 포함할 수 있다. 예컨대 상기 인산 에스테르계 화합물은 (H2PO3-)의 형태로 표현될 수 있으나, 이에 한정되는 것은 아니다. 또한, 본 발명에서 상기 "인산 에스테르계"란 아인산 유도체, 인산 유도체, 포스폰산 유도체 및 포스핀산 유도체로 구성되는 군에서 선택되는 1 이상을 포함할 수도 있다.The phosphate ester-based dispersant may include a phosphate ester-based compound, wherein the phosphate ester-based compound is a hydroxy group or a hydroxy group present in phosphate ester ((HO) 2 PO (OR)) or phosphoric acid (H 3 PO 4 ) The hydrogen atom may be substituted or unsubstituted with another functional group. For example, the phosphate ester compound may be represented in the form of (H 2 PO 3 −), but is not limited thereto. In the present invention, the "phosphate ester type" may include one or more selected from the group consisting of phosphorous acid derivatives, phosphoric acid derivatives, phosphonic acid derivatives and phosphinic acid derivatives.
상기 분산제가 상기 인산 에스테르계 화합물을 포함하는 경우 광효율 저하 및 감광특성 불량을 억제할 수 있는 이점이 있다.When the dispersant includes the phosphate ester compound, there is an advantage in that the light efficiency and the photosensitive characteristics can be suppressed.
상기 인산 에스테르계 화합물은 한 분자 내에 폴리에테르 부분, 폴리에스테르 부분 및 인산기 중 하나 이상을 더 포함할 수 있다.The phosphate ester compound may further include at least one of a polyether moiety, a polyester moiety, and a phosphate group in one molecule.
본 발명에서 "폴리-"란, 많은 수의 반복단위로 이루어진 화합물을 일컬을 수 있는 것으로서, 상기 "폴리에테르 부분", "폴리에스테르 부분"은 각각 에테르기 또는 에스테르기를 포함하는 반복단위가 1 내지 20 로 이루어진 부분을 일컬을 수 있다. 바람직하게는, 본 발명에서는 반복단위가 5 내지 20, 더욱 바람직하게는 10 내지 20으로 이루어질 수 있으며, 이 경우 상용성이 우수한 이점이 있다.In the present invention, "poly-" may refer to a compound composed of a large number of repeating units, and the "polyether portion" and "polyester portion" may have 1 to 20 repeating units each containing an ether group or an ester group. It can be referred to as a part consisting of. Preferably, in the present invention, the repeating unit may be composed of 5 to 20, more preferably 10 to 20, in this case there is an excellent compatibility.
상기 인산 에스테르계 화합물이 한 분자 내에 폴리에테르 부분을 더 포함하는 경우 후술할 알칼리 가용성 수지와의 상용성이 향상되는 이점이 있으며, 상기 인산 에스테르계 화합물이 한 분자 내에 폴리에스테르 부분을 더 포함하는 경우 알칼리 가용성 수지와의 상용성 및 알칼리 현상액에 대한 용해 특성이 향상되는 이점이 있다. 상기 인산 에스테르계 화합물이 한 분자 내에 인산기를 더 포함하는 경우 양자점 표면에 흡착을 통해 보호층 역할을 수행할 수 있고, 상기 양자점을 탈응집 시키는 이점이 있다.When the phosphate ester compound further includes a polyether moiety in one molecule, compatibility with alkali-soluble resins to be described later is improved, and the phosphate ester compound further includes a polyester moiety in one molecule. There is an advantage that the compatibility with the alkali-soluble resin and the dissolution characteristics for the alkaline developer are improved. When the phosphate ester compound further includes a phosphate group in one molecule, the phosphate ester compound may serve as a protective layer through adsorption on the surface of the quantum dot, and has the advantage of deagglomerating the quantum dot.
바람직하게는 본 발명에 따른 인산 에스테르계 화합물은 한 분자 내에 폴리 에테르 부분, 폴리에스테르 부분 및 인산기를 포함할 수 있으며, 이 경우 양자점을 탈응집시켜 분산입도를 작게 하고, 알칼리 가용성 수지와의 상용성 및 알칼리 현상액에 대한 용해 특성이 있어 패턴형성에 유리한 이점이 있으므로 가장 바람직하다.Preferably, the phosphate ester compound according to the present invention may include a polyether moiety, a polyester moiety, and a phosphate group in one molecule, in which case deagglomeration of quantum dots reduces the particle size of the dispersion, and compatibility with alkali-soluble resins. And dissolution properties in alkaline developing solution, which is advantageous because it has an advantageous advantage in pattern formation.
본 발명에서, "산가"란, 아크릴계 중합체 1g을 중화하는 데 필요한 수산화칼륨의 양(mg)으로서 측정되는 값으로 후술할 자발광 감광성 수지 조성물에 대한 용해성에 관여할 수 있다. 상기 인산 에스테르계 화합물의 산가가 10 (KOHmg/g) 이상, 구체적으로 10 내지 200 (KOHmg/g)인 경우 상기 분산제를 포함하는 자발광 감광성 수지 조성물의 현상 속도 면에서 바람직하다. 상기 산가가 상기 범위 미만인 경우 충분한 현상 속도를 확보하기 다소 어려울 수 있고, 상기 범위를 초과하는 경우 기판과의 밀착성이 감소되어 패턴의 단락이 발생하기 쉽고, 전체적인 조성물의 저장 안정성이 저하되어 점도가 상승하는 문제가 발생할 수 있으므로 상기 범위를 만족하는 것이 바람직하다.In the present invention, the "acid value" is a value measured as the amount (mg) of potassium hydroxide required to neutralize 1 g of the acrylic polymer and may be involved in solubility in the self-luminous photosensitive resin composition described later. When the acid value of the phosphate ester compound is 10 (KOHmg / g) or more, specifically 10 to 200 (KOHmg / g) is preferable in view of the development rate of the self-luminous photosensitive resin composition containing the dispersant. When the acid value is less than the above range, it may be somewhat difficult to secure a sufficient developing speed, and when the acid value exceeds the above range, adhesion to the substrate may be reduced, thereby causing short circuiting of the pattern, and lowering the storage stability of the overall composition to increase the viscosity. Since the problem may occur, it is preferable to satisfy the above range.
상기 아크릴계 분산제로는, 아크릴계 블록 공중합체를 들 수 있다. 아크릴계 블록 공중합체로는, 염기성기와 산기를 포함하는 블록과, 상기 염기성기나 상기 산기를 포함하지 않는 블록을 갖는 블록 공중합체가 바람직하다.An acrylic block copolymer is mentioned as said acrylic dispersing agent. As an acryl-type block copolymer, the block copolymer which has the block containing a basic group and an acidic group, and the block which does not contain the said basic group or the said acidic group is preferable.
상기 염기성기나 상기 산기(이하, 이들 기를 「양자점 흡착기」라고 총칭하는 경우가 있음)는, 각각 전술한 양자점을 흡착하는 작용을 나타낸다.The basic group and the acid group (hereinafter, these groups may be collectively referred to as "quantum dot adsorber") each exhibit an action of adsorbing the quantum dots described above.
상기 양자점 흡착기를 포함하는 양자점 흡착 블록으로는, 염기성기를 갖는 단량체와 함께 산기를 갖는 단량체를 이용함으로써 구성되는 것을 들 수 있다.As a quantum dot adsorption block containing the said quantum dot adsorber, what is comprised by using the monomer which has an acidic group with the monomer which has a basic group is mentioned.
상기 염기성기를 갖는 단량체로는, 1급 아미노기, 2급 아미노기, 3급 아미노기 또는 4급 암모늄기를 갖는 단량체를 들 수 있다. 상기 단량체의 구체예로서, N,N-디메틸아미노에틸(메트)아크릴레이트, N,N-디에틸아미노에틸(메트)아크릴레이트, N,N-디메틸아크릴아미드, 디에틸아크릴아미드, 디메틸아미노프로필메타크릴아미드, 아크릴로일모르폴린, 비닐이미다졸, 2-비닐피리딘, 아미노기와 카프로락톤 골격을 갖는 단량체; 글리시딜(메트)아크릴레이트 등의 글리시딜기를 갖는 화합물과 분자 중에 1개의 2급 아미노기를 갖는 화합물과의 반응물; (메트)아크릴로일알킬이소시아네이트 화합물과 4-(2-아미노메틸)-피리딘, 4-(2-아미노에틸)-피리딘, 4-(2-히드록시에틸)피리딘, 1-(2-아미노에틸)-피페라진, 2-아미노-6-메톡시벤조티아졸, 1-(2-히드록시에틸이미다졸), N,N-디알릴멜라민, N,N-디메틸-1,3-프로판디아민과의 반응물 등을 들 수 있다.As a monomer which has the said basic group, the monomer which has a primary amino group, a secondary amino group, a tertiary amino group, or a quaternary ammonium group is mentioned. Specific examples of the monomers include N, N-dimethylaminoethyl (meth) acrylate, N, N-diethylaminoethyl (meth) acrylate, N, N-dimethylacrylamide, diethylacrylamide, and dimethylaminopropyl Methacrylamide, acryloyl morpholine, vinylimidazole, 2-vinylpyridine, monomers having an amino group and a caprolactone skeleton; A reaction product of a compound having a glycidyl group such as glycidyl (meth) acrylate with a compound having one secondary amino group in a molecule thereof; (Meth) acryloylalkyl isocyanate compound with 4- (2-aminomethyl) -pyridine, 4- (2-aminoethyl) -pyridine, 4- (2-hydroxyethyl) pyridine, 1- (2-aminoethyl ) -Piperazine, 2-amino-6-methoxybenzothiazole, 1- (2-hydroxyethylimidazole), N, N-diallylmelamine, N, N-dimethyl-1,3-propanediamine And reactants with each other.
상기 산기를 갖는 단량체로는, 카르복시기, 술포기를 갖는 단량체를 들 수 있다. 카르복시기를 갖는 단량체로서, 아크릴산, 메타크릴산, 크로톤산 등의 불포화 모노카르복실산 화합물; 말레산, 푸마르산, 이타콘산 등의 불포화 디카르복실산 화합물 및 그 하프 에스테르; 등을 들 수 있다. 술포기를 갖는 단량체로서, 2-아크릴아미드-2-메틸-1-프로판술폰산, 2-메타크릴아미드-2-메틸-1-프로판술폰산, 스티렌술폰산 등을 들 수 있다. As a monomer which has the said acid group, the monomer which has a carboxy group and a sulfo group is mentioned. As a monomer which has a carboxy group, Unsaturated monocarboxylic acid compounds, such as acrylic acid, methacrylic acid, and crotonic acid; Unsaturated dicarboxylic acid compounds such as maleic acid, fumaric acid and itaconic acid, and half esters thereof; Etc. can be mentioned. 2-acrylamide-2-methyl-1-propanesulfonic acid, 2-methacrylamide-2-methyl-1-propanesulfonic acid, styrenesulfonic acid, etc. are mentioned as a monomer which has a sulfo group.
상기 양자점 흡착기를 포함하지 않는 블록으로는, 스티렌, α-메틸스티렌, 비닐톨루엔, 염화벤질 등의 방향족 비닐 화합물; 메틸(메트)아크릴레이트, 에틸(메트)아크릴레이트, 부틸(메트)아크릴레이트 등의 불포화 카르복실산알킬에스테르; 벤질(메트)아크릴레이트 등의 불포화 카르복실산아릴알킬에스테르; 폴리카프로락톤 함유 화합물, 폴리알킬렌글리콜모노에스테르계 화합물 등에서 유래되는 블록을 들 수 있다.As a block which does not contain the said quantum dot adsorption agent, Aromatic vinyl compounds, such as styrene, (alpha) -methylstyrene, vinyltoluene, and benzyl chloride; Unsaturated carboxylic acid alkyl esters such as methyl (meth) acrylate, ethyl (meth) acrylate and butyl (meth) acrylate; Unsaturated carboxylic acid arylalkyl esters such as benzyl (meth) acrylate; The block derived from a polycaprolactone containing compound, a polyalkylene glycol monoester type compound, etc. are mentioned.
상기 아크릴계 블록 공중합체는, 리빙 음이온 중합 등의 종래 공지된 중합 방법에 의해 얻을 수 있다.The acrylic block copolymer can be obtained by a conventionally known polymerization method such as living anion polymerization.
상기 아크릴계 블록 공중합체의 아민가는, 통상 0~200 mgKOH/g이고, 바람직하게는 0~120 mgKOH/g이며, 보다 바람직하게는 0~80 mgKOH/g이다.The amine titer of the said acryl-type block copolymer is 0-200 mgKOH / g normally, Preferably it is 0-120 mgKOH / g, More preferably, it is 0-80 mgKOH / g.
상기 아크릴계 블록 공중합체의 시판품으로는, 빅케미·재팬사에서 제조한 「Disperbyk(등록상표)-112(아민가 36 mgKOH/g)」, 「Disperbyk(등록상표)-2000(아민가 4 mgKOH/g)」, 「Disperbyk-2001(아민가 29 mgKOH/g)」, 「Disperbyk(등록상표)-2020(아민가 38 mgKOH/g)」, 「Disperbyk(등록상표)-2050(아민가 30 mgKOH/g)」, 「Disperbyk(등록상표)-2070(아민가 20 mgKOH/g)」 등을 들 수 있다.As a commercial item of the said acryl-type block copolymer, "Disperbyk (trademark) -112 (amine value 36 mgKOH / g)" and "Disperbyk (registered trademark) -2000 (amine value 4 mgKOH / g) manufactured by BIC Chemie Japan Co., Ltd. were manufactured. "Disperbyk-2001 (amine value 29 mgKOH / g)", "Disperbyk (registered trademark) -2020 (amine value 38 mgKOH / g)", "Disperbyk (registered trademark) -2050 (amine value 30 mgKOH / g)", " Disperbyk (R) -2070 (amine value 20 mgKOH / g) ”and the like.
상기 우레탄계 분산제로는, 분자 내에 히드록시기를 1개 이상 갖는 수 평균 분자량 300~10,000의 화합물 및 분자 내에 이소시아네이트기와 반응 가능한 작용기를 갖는 염기성기 함유 화합물을, 폴리이소시아네이트 화합물의 이소시아네이트기와 반응시켜 얻어지는 분산제를 이용할 수 있다.As the urethane-based dispersant, a dispersant obtained by reacting a compound having a number-average molecular weight of 300 to 10,000 with one or more hydroxyl groups in a molecule and a basic group-containing compound having a functional group capable of reacting with an isocyanate group in the molecule, isocyanate group of a polyisocyanate compound Can be.
이러한 우레탄계 분산제를 얻는 방법으로는, 일본 특허 공개 소화 제60-166318호에 기재되어 있는 방법 등을 이용할 수 있다.As a method of obtaining such a urethane type dispersing agent, the method etc. which are described in Unexamined-Japanese-Patent No. 60-166318 can be used.
상기 폴리이소시아네이트 화합물로는, 2개 이상의 이소시아네이트기를 갖는 이소시아네이트 화합물을 들 수 있고,As said polyisocyanate compound, the isocyanate compound which has two or more isocyanate groups is mentioned,
2,4-톨릴렌디이소시아네이트, 2,4-톨릴렌디이소시아네이트의 2량체, 2,6-톨릴렌디이소시아네이트, p-크실렌디이소시아네이트, m-크실렌디이소시아네이트, 4,4'-디페닐메탄디이소시아네이트, 1,5-나프틸렌디이소시아네이트, 3,3'-디메틸비페닐-4,4'-디이소시아네이트 등의 방향족 디이소시아네이트 화합물;Dimer of 2,4-tolylene diisocyanate, 2,4-tolylene diisocyanate, 2,6-tolylene diisocyanate, p-xylene diisocyanate, m-xylene diisocyanate, 4,4'-diphenylmethane diisocyanate, Aromatic diisocyanate compounds such as 1,5-naphthylene diisocyanate and 3,3'-dimethylbiphenyl-4,4'-diisocyanate;
헥사메틸렌디이소시아네이트, 이소포론디이소시아네이트, 4,4'-메틸렌비스(시클로헥실이소시아네이트), 메틸시클로헥산-2,4(또는 2,6)디이소시아네이트, 1,3-(이소시아네이트메틸렌)시클로헥산 등의 지방족 폴리이소시아네이트나 지환식 폴리이소시아네이트;Hexamethylene diisocyanate, isophorone diisocyanate, 4,4'-methylenebis (cyclohexyl isocyanate), methylcyclohexane-2,4 (or 2,6) diisocyanate, 1,3- (isocyanate methylene) cyclohexane, etc. Aliphatic polyisocyanates and alicyclic polyisocyanates;
상기 디이소시아네이트에서 유래되는 이소시아눌기를 갖는 폴리이소시아네이트(상기 디이소시아네이트가 3량화하여 형성되는 이소시아눌기를 갖는 폴리이소시아네이트 등);Polyisocyanate having isocyanuric groups derived from the diisocyanate (polyisocyanate having an isocyanuric group formed by trimming the diisocyanate);
폴리올에 디이소시아네이트를 반응시켜 얻어지는 폴리이소시아네이트;Polyisocyanate obtained by reacting diisocyanate with a polyol;
디이소시아네이트 화합물의 뷰렛 반응에 의해 얻어지는 폴리이소시아네이트; 등을 들 수 있다.Polyisocyanate obtained by the biuret reaction of a diisocyanate compound; Etc. can be mentioned.
상기 폴리이소시아네이트 화합물 중에서도, 톨릴렌디이소시아네이트, 이소포론디이소시아네이트 등의 디이소시아네이트에서 유래되는 이소시아눌기를 갖는 폴리이소시아네이트가 바람직하다.Among the above polyisocyanate compounds, polyisocyanates having isocyanuric groups derived from diisocyanates such as tolylene diisocyanate and isophorone diisocyanate are preferable.
상기 분자 내에 히드록시기를 1개 이상 갖는 화합물로는, 폴리에테르 화합물, 폴리에스테르 화합물 등을 들 수 있다.As a compound which has one or more hydroxyl groups in the said molecule | numerator, a polyether compound, a polyester compound, etc. are mentioned.
상기 폴리에테르 화합물로는, 폴리에틸렌글리콜, 폴리프로필렌글리콜, 폴리부틸렌글리콜, 폴리테트라메틸렌글리콜 등의 폴리알킬렌글리콜류;As said polyether compound, Polyalkylene glycol, such as polyethyleneglycol, polypropylene glycol, polybutylene glycol, polytetramethylene glycol;
에틸렌글리콜, 프로판디올, 프로필렌글리콜, 테트라메틸렌글리콜, 펜타메틸렌글리콜, 헥산디올, 네오펜틸글리콜, 글리세린, 트리메틸올프로판, 펜타에리스리톨, 디글리세린, 디트리메틸올프로판, 디펜타에리스리톨 등의 알킬렌글리콜류;Alkylene glycols such as ethylene glycol, propanediol, propylene glycol, tetramethylene glycol, pentamethylene glycol, hexanediol, neopentyl glycol, glycerin, trimethylolpropane, pentaerythritol, diglycerol, ditrimethylolpropane, dipentaerythritol ;
메탄올, 에탄올 등의 저분자 모노올류의 변성물 등을 들 수 있다.Modified products of low molecular weight monools, such as methanol and ethanol, etc. are mentioned.
상기 저분자 모노올류의 변성물로는, 에틸렌옥사이드 변성물, 프로필렌옥사이드 변성물, 부틸렌옥사이드 변성물, 테트라히드로푸란 변성물 등을 들 수 있다.Examples of the modified substances of the low molecular monools include ethylene oxide modified substances, propylene oxide modified substances, butylene oxide modified substances, tetrahydrofuran modified substances and the like.
상기 폴리에스테르 화합물로는, 에틸렌글리콜, 프로판디올, 프로필렌글리콜, 테트라메틸렌글리콜, 펜타메틸렌글리콜, 헥산디올, 네오펜틸글리콜, 글리세린, 트리메틸올프로판, 펜타에리스리톨, 디글리세린, 디트리메틸올프로판, 디펜타에리스리톨 등의 알킬렌글리콜류의 변성물;Examples of the polyester compound include ethylene glycol, propanediol, propylene glycol, tetramethylene glycol, pentamethylene glycol, hexanediol, neopentyl glycol, glycerin, trimethylolpropane, pentaerythritol, diglycerol, ditrimethylol propane, dipenta Modified products of alkylene glycols such as erythritol;
메탄올, 에탄올 등의 저분자 모노올류의 변성물;Modified substances of low molecular weight monools such as methanol and ethanol;
아디프산이나 다이머산 등의 지방족 디카르복실산과, 네오펜틸글리콜이나 메틸펜탄디올 등의 폴리올과의 에스테르화물, 즉 지방족 폴리에스테르폴리올;Esterified products of aliphatic dicarboxylic acids such as adipic acid and dimer acid, and polyols such as neopentyl glycol and methylpentanediol, that is, aliphatic polyester polyols;
테레프탈산 등의 방향족 디카르복실산과, 네오펜틸글리콜 등의 폴리올과의 에스테르화물, 즉 폴리에스테르폴리올(방향족 폴리에스테르폴리올 등);Esterified products of aromatic dicarboxylic acids such as terephthalic acid with polyols such as neopentyl glycol, that is, polyester polyols (such as aromatic polyester polyols);
폴리카보네이트폴리올, 아크릴폴리올, 폴리테트라메틸렌헥사글리세릴에테르(헥사글리세린의 테트라히드로푸란 변성물) 등의 다가 히드록시기 화합물과, 푸마르산, 프탈산, 이소프탈산, 이타콘산, 아디프산, 세바신산, 말레산 등의 디카르복실산과의 에스테르화물;Polyhydric hydroxy group compounds such as polycarbonate polyol, acryl polyol, polytetramethylenehexaglyceryl ether (tetrahydrofuran modified product of hexaglycerin), fumaric acid, phthalic acid, isophthalic acid, itaconic acid, adipic acid, sebacic acid, maleic acid Esterified products with dicarboxylic acids such as;
글리세린 등의 다가 히드록시기 함유 화합물과 지방산 에스테르와의 에스테르 교환 반응에 의해 얻어지는 모노글리세리드 등의 다가 히드록시기 함유 화합물;Polyhydric hydroxy group-containing compounds such as monoglycerides obtained by transesterification of polyhydric hydroxy group-containing compounds such as glycerin and fatty acid esters;
등을 들 수 있다.Etc. can be mentioned.
알킬렌글리콜류나 저분자 모노올류 등의 알코올류의 변성물로는, ε-카프로락톤 변성물, γ-부티로락톤 변성물, δ-발레로락톤 변성물, 메틸발레로락톤 변성물 등을 들 수 있다.Examples of modified substances of alcohols such as alkylene glycols and low molecular weight monools include ε-caprolactone modified substances, γ-butyrolactone modified substances, δ-valerolactone modified substances, and methylvalerolactone modified substances. have.
상기 분자 내에 히드록시기를 1개 이상 갖는 화합물 중에서도 알코올류의 ε-카프로락톤 부가물이 바람직하다.Among the compounds having at least one hydroxyl group in the molecule, ε-caprolactone adducts of alcohols are preferable.
상기 분자 내에 히드록시기를 1개 이상 갖는 화합물의 수 평균 분자량은, 300~10,000, 바람직하게는 300~6,000이다.The number average molecular weight of the compound which has one or more hydroxyl groups in the said molecule | numerator is 300-10,000, Preferably it is 300-6,000.
또한, 수 평균 분자량, 중량 평균 분자량은 칼럼 크로마토그래피법에 의해 측정할 수 있다.In addition, a number average molecular weight and a weight average molecular weight can be measured by a column chromatography method.
상기 분자 내에 이소시아네이트기와 반응 가능한 작용기를 갖는 염기성기 함유 화합물로는, 특별히 한정되지 않고, 분산제의 기술 분야에서 관용으로 이용되고 있는 화합물을 사용할 수 있다.It does not specifically limit as a basic group containing compound which has a functional group which can react with an isocyanate group in the said molecule, The compound normally used in the technical field of a dispersing agent can be used.
상기 염기성기 함유 화합물로서, 체레비티노프(Zerewitinoff)의 활성 수소 원자와 적어도 1개의 질소 원자 함유 염기성기를 갖는 화합물, 예컨대, N,N-디치환 아미노기 또는 복소환 질소 원자를 갖는 폴리올, 폴리티올 및 아민류로 이루어진 군에서 선택되는 적어도 1종의 화합물이 바람직하다.As the basic group-containing compound, a compound having an active hydrogen atom of Zerewitinoff and at least one nitrogen atom-containing basic group, for example, a polyol or polythiol having an N, N-disubstituted amino group or a heterocyclic nitrogen atom And at least one compound selected from the group consisting of amines.
그와 같은 염기성기 함유 화합물로는, N,N-디메틸-1,3-프로판디아민, N,N-디에틸1,4-부탄디아민, 2-디메틸아미노에탄올, 1-(2-아미노에틸)-피페라진, 2-(1-피롤리딜)-에틸아민, 4-아미노-2-메톡시피리미딘, 4-(2-아미노에틸)-피리딘, 1-(2-히드록시에틸)-피페라진, 4-(2-히드록시에틸)-모르폴린, 2-머캅토피리미딘, 2-머캅토벤조이미다졸, 2-아미노-6-메톡시벤조티아졸, N,N-디알릴-멜라민, 3-아미노-1,2,4-트리아졸, 1-(2-히드록시에틸)-이미다졸, 3-머캅토-1,2,4-트리아졸 등을 들 수 있다. 그 중에서도 복소환 질소 원자를 갖는 아민류가 바람직하다.Such basic group-containing compounds include N, N-dimethyl-1,3-propanediamine, N, N-diethyl1,4-butanediamine, 2-dimethylaminoethanol, 1- (2-aminoethyl) -Piperazine, 2- (1-pyrrolidyl) -ethylamine, 4-amino-2-methoxypyrimidine, 4- (2-aminoethyl) -pyridine, 1- (2-hydroxyethyl) -pipe Razine, 4- (2-hydroxyethyl) -morpholine, 2-mercaptopyrimidine, 2-mercaptobenzoimidazole, 2-amino-6-methoxybenzothiazole, N, N-diallyl-melamine , 3-amino-1,2,4-triazole, 1- (2-hydroxyethyl) -imidazole, 3-mercapto-1,2,4-triazole, and the like. Among them, amines having a heterocyclic nitrogen atom are preferable.
상기 우레탄계 분산제는, 종래 공지된 방법에 의해 합성할 수 있다.The urethane-based dispersant can be synthesized by a conventionally known method.
상기 우레탄계 분산제의 아민가는, 바람직하게는 0~200 mgKOH/g이고, 보다 바람직하게는 0~120 mgKOH/g이며, 더욱 바람직하게는 0~80 mgKOH/g이다. 또한, 상기 우레탄계 분산제의 아민가는, 0~55 mgKOH/g인 것이 바람직하고, 5~40 mgKOH/g인 것이 보다 바람직하다.The amine titer of the said urethane type dispersing agent becomes like this. Preferably it is 0-200 mgKOH / g, More preferably, it is 0-120 mgKOH / g, More preferably, it is 0-80 mgKOH / g. Moreover, it is preferable that it is 0-55 mgKOH / g, and, as for the amine titer of the said urethane type dispersing agent, it is more preferable that it is 5-40 mgKOH / g.
상기 우레탄계 분산제의 시판품으로는, Disperbyk-161(아민가 11 mgKOH/g, 빅케미사 제조), Disperbyk-162(아민가 13 mgKOH/g 빅케미사 제조), Disperbyk-167(아민가 13 mgKOH/g, 빅케미사 제조), Disperbyk-182(아민가 13 mgKOH/g, 빅케미사 제조) 등을 들 수 있다.As a commercial item of the said urethane-type dispersing agent, Disperbyk-161 (Amine value 11 mgKOH / g, Big Chem Corporation make), Disperbyk-162 (Amine value 13 mgKOH / g Big Chemistry company make), Disperbyk-167 (Amine value 13 mgKOH / g, Big Chemistry company make) And Disperbyk-182 (amine value 13 mgKOH / g, manufactured by BIC Chem).
본 명세서에 있어서, 아민가는 분산제의 고형분 1 g당의 아민가를 의미하고, 0.1 mol/l의 염산 수용액을 이용하여, 전위차 적정법[예컨대, COMTITE(AUTO TITRATOR COM-900, BURET B-900, TITSTATIONK-900), 히라누마산교사 제조]에 의해 측정한 후, 수산화칼륨의 당량으로 환산한 값을 말한다.In the present specification, the amine number means the amine value per 1 g of the solid content of the dispersant, and using a 0.1 mol / l hydrochloric acid aqueous solution, a potentiometric titration method [for example, COMTITE (AUTO TITRATOR COM-900, BURET B-900, TITSTATIONK-900) ), Manufactured by Hiranumasan Co., Ltd., and then converted into equivalents of potassium hydroxide.
상기 분산제는 상기 양자점 고형분 전체 100 중량부에 대하여 1 내지 250 중량부로 포함될 수 있으며, 바람직하게는 3 내지 200 중량부, 더욱 바람직하게는 5 내지 100 중량부로 포함될 수 있다. 상기 분산제가 상기 범위 내로 포함될 경우 상기 양자점의 탈응집 효과가 우수하고, 본 발명에 따른 양자점 분산체 및 이를 포함하는 자발광 감광성 수지 조성물 내의 극성 차이에 의한 석출현상의 억제가 가능하며, 컬러필터 제조 공정 시 양자점의 보호층 역할을 수행할 수 있으므로 바람직하다.The dispersant may be included in an amount of 1 to 250 parts by weight based on 100 parts by weight of the total quantum dot solids, preferably 3 to 200 parts by weight, more preferably 5 to 100 parts by weight. When the dispersant is included in the above range is excellent in the deagglomeration effect of the quantum dot, it is possible to suppress the precipitation phenomenon by the polarity difference in the quantum dot dispersion according to the present invention and the self-luminous photosensitive resin composition comprising the same, manufacturing a color filter It is preferable because it can act as a protective layer of the quantum dots in the process.
<자발광 감광성 수지 조성물><Self-luminous photosensitive resin composition>
본 발명의 또 다른 양태는 전술한 양자점 분산체; 및 광중합성 화합물; 알칼리 가용성 수지; 광중합 개시제; 및 제2 용제로 이루어진 군에서 선택되는 1종 이상을 더 포함하는 자발광 감광성 수지 조성물에 관한 것이다.Another aspect of the present invention is a quantum dot dispersion described above; And photopolymerizable compounds; Alkali-soluble resins; Photopolymerization initiator; And it is related with the self-luminous photosensitive resin composition containing 1 or more types chosen from the group which consists of a 2nd solvent.
본 발명의 또 다른 실시형태에 있어서, 상기 양자점 분산체는 상기 자발광 감광성 수지 조성물 전체 100 중량부에 대하여 3 내지 80 중량부, 바람직하게는 5 내지 70 중량부, 더욱 바람직하게는 10 내지 60 중량부로 포함될 수 있다. 본 발명에 따른 자발광 감광성 수지 조성물이 전술한 양자점 분산체를 상기 범위 내로 포함할 경우 발광특성이 우수한 컬러필터의 제조가 가능한 이점이 있다. 상기 양자점 분산체가 상기 범위 미만으로 포함될 경우 발광 특성이 다소 저하될 수 있으며, 상기 양자점 분산체가 상기 범위를 초과하여 포함될 경우 상대적으로 다른 구성의 함량이 줄어듬에 따라 패턴의 형성이 다소 어려울 수 있으며, 신뢰성이 저하될 수 있으므로 상기 범위 내로 포함되는 것이 바람직하다.In another embodiment of the present invention, the quantum dot dispersion is 3 to 80 parts by weight, preferably 5 to 70 parts by weight, more preferably 10 to 60 parts by weight based on 100 parts by weight of the total self-luminous photosensitive resin composition. May be included as a wealth. When the self-luminous photosensitive resin composition according to the present invention includes the quantum dot dispersion described above within the above range, there is an advantage in that a color filter having excellent luminescence properties can be manufactured. If the quantum dot dispersion is included in less than the above range, the light emission characteristics may be slightly lowered. If the quantum dot dispersion is included in the above range, the formation of a pattern may be somewhat difficult as the content of the other composition is reduced, and reliability Since it may be lowered, it is preferable to be included in the above range.
본 발명에 따른 자발광 감광성 수지 조성물은 광중합성 화합물을 포함할 수 있다. 본 발명의 자발광 감광성 수지 조성물에 함유되는 광중합성 화합물은 광 및 후술할 광중합 개시제의 작용으로 중합할 수 있는 화합물로서, 단관능 단량체, 2관능 단량체, 그 밖의 다관능 단량체 등을 들 수 있다. The self-luminous photosensitive resin composition according to the present invention may include a photopolymerizable compound. The photopolymerizable compound contained in the self-luminous photosensitive resin composition of this invention is a compound which can superpose | polymerize by the action | action of light and the photoinitiator mentioned later, A monofunctional monomer, a bifunctional monomer, another polyfunctional monomer, etc. are mentioned.
상기 단관능 단량체의 종류는 특별히 한정되지 않으며, 예를 들면 노닐페닐카르비톨아크릴레이트, 2-히드록시-3-페녹시프로필아크릴레이트, 2-에틸헥실카르비톨아크릴레이트, 2-히드록시에틸아크릴레이트, N-비닐피롤리돈 등을 들 수 있다.The kind of the monofunctional monomer is not particularly limited, and for example, nonylphenylcarbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexyl carbitol acrylate, 2-hydroxyethyl acryl The rate, N-vinylpyrrolidone, etc. are mentioned.
상기 2관능 단량체의 종류는 특별히 한정되지 않으며, 예를 들면, 1,6-헥산디올디(메타)아크릴레이트, 에틸렌글리콜디(메타)아크릴레이트, 네오펜틸글리콜디(메타)아크릴레이트, 트리에틸렌글리콜디(메타)아크릴레이트, 비스페놀 A의 비스(아크릴로일옥시에틸)에테르, 3-메틸펜탄디올디(메타)아크릴레이트 등을 들 수 있다.The kind of the said bifunctional monomer is not specifically limited, For example, 1, 6- hexanediol di (meth) acrylate, ethylene glycol di (meth) acrylate, neopentyl glycol di (meth) acrylate, and triethylene Glycol di (meth) acrylate, bis (acryloyloxyethyl) ether of bisphenol A, 3-methylpentanediol di (meth) acrylate, and the like.
상기 다관능 단량체의 종류는 특별히 한정되지 않으며, 예를 들면, 트리메틸올프로판트리(메타)아크릴레이트, 에톡실레이티드트리메틸올프로판트리(메타)아크릴레이트, 프로폭실레이티드트리메틸올프로판트리(메타)아크릴레이트, 펜타에리스리톨트리(메타)아크릴레이트, 펜타에리스리톨테트라(메타)아크릴레이트, 디펜타에리스리톨트리(메타)아크릴레이트, 디펜타에리스리톨펜타(메타)아크릴레이트, 에톡실레이티드디펜타에리스리톨헥사(메타)아크릴레이트, 프로폭실레이티드디펜타에리스리톨헥사(메타)아크릴레이트, 디펜타에리스리톨헥사(메타)아크릴레이트 등을 들 수 있다. 이들 중에서 2관능 이상의 다관능 단량체가 바람직하게 사용된다.The kind of the polyfunctional monomer is not particularly limited, and examples thereof include trimethylolpropane tri (meth) acrylate, ethoxylated trimethylol propane tri (meth) acrylate, and propoxylated trimethylolpropane tree (meth). ) Acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol tri (meth) acrylate, dipentaerythritol penta (meth) acrylate, ethoxylated dipentaerythritol hexa (Meth) acrylate, propoxylated dipentaerythritol hexa (meth) acrylate, dipentaerythritol hexa (meth) acrylate, etc. are mentioned. Of these, bifunctional or higher polyfunctional monomers are preferably used.
상기 광중합성 화합물의 시판되는 예로는 신나카무라사의 A9550 등이 있으나, 이에 한정되지는 않는다.Commercially available examples of the photopolymerizable compound include, but are not limited to, A9550 manufactured by Shin-Nakamura Corporation.
상기 광중합성 화합물은 상기 자발광 감광성 수지 조성물 고형분 전체 100 중량부에 대하여 5 내지 50 중량부, 구체적으로 15 내지 45 중량부, 더욱 구체적으로 20 내지 37 중량부로 포함될 수 있다. 상기 광중합성 화합물이 상기 범위 내로 포함될 경우 화소부의 강도나 평활성 측면에서 바람직한 이점이 있다.The photopolymerizable compound may be included in an amount of 5 to 50 parts by weight, specifically 15 to 45 parts by weight, and more specifically 20 to 37 parts by weight based on 100 parts by weight of the total solid of the self-luminous photosensitive resin composition. When the photopolymerizable compound is included in the above range, there is a preferable advantage in terms of intensity or smoothness of the pixel portion.
상기 광중합성 화합물이 상기 범위 미만으로 포함되는 경우 화소부의 강도가 다소 저하될 수 있으며, 상기 광중합성 화합물이 상기 범위를 초과하여 포함되는 경우 평활성이 다소 저하될 수 있으므로 상기 범위 내로 포함되는 것이 바람직하다. When the photopolymerizable compound is included in the range below, the intensity of the pixel portion may be lowered slightly, and when the photopolymerizable compound is included in the above range, smoothness may be slightly lowered, so it is preferably included within the range. .
본 발명에 따른 자발광 감광성 수지 조성물은 알칼리 가용성 수지를 포함할 수 있다.The self-luminous photosensitive resin composition according to the present invention may include an alkali soluble resin.
상기 알칼리 가용성 수지는 상기 자발광 감광성 수지 조성물로 제조하는 컬러필터의 비노광부를 알칼리 가용성으로 만들어 제거 가능하게 하고, 노광 영역을 잔류시키는 역할을 수행할 수 있다. 또한, 상기 자발광 감광성 수지 조성물이 상기 알칼리 가용성 수지를 포함하는 경우, 상기 양자점이 조성물 내에 고르게 분산 될 수 있으며, 공정 중에 상기 양자점을 보호하여 휘도를 유지하도록 하는 역할을 수행할 수 있다.The alkali-soluble resin may serve to make the non-exposed part of the color filter made of the self-luminous photosensitive resin composition alkali-soluble and to remove it, and to leave the exposure area. In addition, when the self-luminous photosensitive resin composition includes the alkali-soluble resin, the quantum dots may be evenly dispersed in the composition, and may serve to maintain the brightness by protecting the quantum dots during the process.
본 발명에 따른 상기 알칼리 가용성 수지는 50 내지 200 (KOHmg/g)의 산가를 갖는 것을 선정하여 사용할 수 있다. 또한, 상기 알칼리 가용성 수지는 컬러필터로 사용하기 위한 표면 경도 향상을 위해 분자량 및 분자량 분포도(Mw/Mn)의 한정을 고려할 수 있다. 바람직하기로 중량평균분자량이 3,000 내지 35,000, 바람직하게는 5,000 내지 32,000이 되도록 하고, 분자량 분포도는 1.5 내지 6.0, 바람직하기로 1.8 내지 4.0의 범위를 갖도록 직접 중합하거나 구입하여 사용한다. 상기 범위의 분자량 및 분자량 분포도를 갖는 알칼리 가용성 수지는 이미 언급한 경도가 향상될 수 있고, 높은 잔막율 뿐만 아니라 현상액 중의 비-노출부의 용해성이 탁월하고 해상도를 향상시킬 수 있다.The alkali-soluble resin according to the present invention can be selected to have an acid value of 50 to 200 (KOHmg / g). In addition, the alkali-soluble resin may consider the limitation of the molecular weight and the molecular weight distribution (Mw / Mn) in order to improve the surface hardness for use as a color filter. Preferably, the weight average molecular weight is 3,000 to 35,000, preferably 5,000 to 32,000, and the molecular weight distribution is 1.5 to 6.0, preferably 1.8 to 4.0 so as to directly polymerize or purchase and use. Alkali-soluble resins having a molecular weight and molecular weight distribution in the above range can be improved in the hardness already mentioned, as well as high residual film ratio, solubility of the non-exposed portion in the developing solution can be excellent and the resolution can be improved.
상기 알칼리 가용성 수지는 카르복실기 함유 불포화 단량체의 중합체, 또는 이와 공중합 가능한 불포화 결합을 갖는 단량체와의 공중합체 및 이들의 조합으로 이루어진 군에서 선택된 1종 이상을 포함한다.The alkali-soluble resin includes at least one member selected from the group consisting of polymers of carboxyl group-containing unsaturated monomers, copolymers with monomers having unsaturated bonds copolymerizable therewith, and combinations thereof.
이때 카르복실기 함유 불포화 단량체는 불포화 모노카르복시산, 불포화 디카르복시산, 불포화 트리카르복시산 등이 가능하다. 구체적으로, 불포화 모노카르복시산으로서는, 예를 들면 아크릴산, 메타크릴산, 크로톤산, α-클로로아크릴산, 신남산 등을 들 수 있다. 불포화 디카르복시산으로서는, 예를 들면 말레산, 푸마르산, 이타콘산, 시트라콘산, 메사콘산 등을 들 수 있다. 불포화 다가 카르복시산은 산무수물일 수도 있으며, 구체적으로는 말레산 무수물, 이타콘산 무수물, 시트라콘산 무수물 등을 들 수 있다. 또한, 불포화 다가 카르복시산은 그의 모노(2-메타크릴로일옥시알킬)에스테르일 수도 있으며, 예를 들면 숙신산 모노(2-아크릴로일옥시에틸), 숙신산 모노(2-메타크릴로일옥시에틸), 프탈산 모노(2-아크릴로일옥시에틸), 프탈산 모노(2-메타크릴로일옥시에틸) 등을 들 수 있다. 불포화 다가 카르복시산은 그 양말단 디카르복시 중합체의 모노(메타)아크릴레이트일 수도 있으며, 예를 들면 ω-카르복시폴리카프로락톤 모노아크릴레이트, ω-카르복시폴리카프로락톤 모노메타크릴레이트 등을 들 수 있다. 이들 카르복실기 함유 단량체는 각각 단독으로 또는 2종 이상을 혼합하여 사용할 수 있다.In this case, the carboxyl group-containing unsaturated monomer may be unsaturated monocarboxylic acid, unsaturated dicarboxylic acid, unsaturated tricarboxylic acid, or the like. Specifically, as unsaturated monocarboxylic acid, acrylic acid, methacrylic acid, crotonic acid, (alpha)-chloroacrylic acid, cinnamic acid etc. are mentioned, for example. As unsaturated dicarboxylic acid, maleic acid, a fumaric acid, itaconic acid, a citraconic acid, a mesaconic acid, etc. are mentioned, for example. The unsaturated polyhydric carboxylic acid may be an acid anhydride, and specific examples thereof include maleic anhydride, itaconic anhydride and citraconic anhydride. Moreover, unsaturated polyhydric carboxylic acid may be mono (2-methacryloyloxyalkyl) ester, for example, succinic acid mono (2-acryloyloxyethyl), succinic acid mono (2-methacryloyloxyethyl) And phthalic acid mono (2-acryloyloxyethyl), phthalic acid mono (2-methacryloyloxyethyl) and the like. The unsaturated polyhydric carboxylic acid may be mono (meth) acrylate of the sock end dicarboxy polymer, and examples thereof include? -Carboxypolycaprolactone monoacrylate and? -Carboxypolycaprolactone monomethacrylate. These carboxyl group-containing monomers can be used individually or in mixture of 2 or more types, respectively.
또한, 카르복실기 함유 불포화 단량체와 공중합이 가능한 단량체는 방향족 비닐 화합물, 불포화 카르복시산 에스테르 화합물, 불포화 카르복시산 아미노알킬에스테르 화합물, 불포화 카르복시산 글리시딜에스테르 화합물, 카르복시산 비닐에스테르 화합물, 불포화 에테르류 화합물, 시안화 비닐 화합물, 불포화 이미드류 화합물, 지방족 공액 디엔류 화합물, 분자쇄의 말단에 모노아크릴로일기 또는 모노메타크릴로일기를 갖는 거대 단량체, 벌키성 단량체 및 이들의 조합으로 이루어진 군에서 선택된 1종이 가능하다.In addition, monomers copolymerizable with carboxyl group-containing unsaturated monomers include aromatic vinyl compounds, unsaturated carboxylic acid ester compounds, unsaturated carboxylic acid aminoalkyl ester compounds, unsaturated carboxylic acid glycidyl ester compounds, carboxylic acid vinyl ester compounds, unsaturated ether compounds, vinyl cyanide compounds, One type selected from the group consisting of an unsaturated imide compound, an aliphatic conjugated diene compound, a macromonomer having a monoacryloyl group or a monomethacryloyl group at the terminal of the molecular chain, a bulky monomer, and a combination thereof is possible.
보다 구체적으로, 상기 공중합 가능한 단량체는 스티렌, α-메틸스티렌, o-비닐톨루엔, m-비닐톨루엔, p-비닐톨루엔, p-클로로스티렌, o-메톡시스티렌, m-메톡시스티렌, p-메톡시스티렌, o-비닐벤질메틸에테르, m-비닐벤질메틸에테르, p-비닐벤질메틸에테르, o-비닐벤질글리시딜에테르, m-비닐벤질글리시딜에테르, p-비닐벤질글리시딜에테르, 인덴 등의 방향족 비닐 화합물; 메틸아크릴레이트, 메틸메타크릴레이트, 에틸아크릴레이트, 에틸메타크릴레이트, n-프로필아크릴레이트, n-프로필메타크릴레이트, i-프로필아크릴레이트, i-프로필메타크릴레이트, n-부틸아크릴레이트, n-부틸메타크릴레이트, i-부틸아크릴레이트, i-부틸메타크릴레이트, sec-부틸아크릴레이트, sec-부틸메타크릴레이트, t-부틸아크릴레이트, t-부틸메타크릴레이트, 2-히드록시에틸아크릴레이트, 2-히드록시에틸메타크릴레이트, 2-히드록시프로필아크릴레이트, 2-히드록시프로필메타크릴레이트, 3-히드록시프로필아크릴레이트, 3-히드록시프로필메타크릴레이트, 2-히드록시부틸아크릴레이트, 2-히드록시부틸메타크릴레이트, 3-히드록시부틸아크릴레이트, 3-히드록시부틸메타크릴레이트, 4-히드록시부틸아크릴레이트, 4-히드록시부틸메타크릴레이트, 알릴아크릴레이트, 알릴메타크릴레이트, 벤질아크릴레이트, 벤질메타크릴레이트, 시클로헥실아크릴레이트, 시클로헥실메타크릴레이트, 페닐아크릴레이트, 페닐메타크릴레이트, 2-메톡시에틸아크릴레이트, 2-메톡시에틸메타크릴레이트, 2-페녹시에틸아크릴레이트, 2-페녹시에틸메타크릴레이트, 메톡시디에틸렌글리콜아크릴레이트, 메톡시디에틸렌글리콜메타크릴레이트, 메톡시트리에틸렌글리콜아크릴레이트, 메톡시트리에틸렌글리콜메타크릴레이트, 메톡시프로필렌글리콜아크릴레이트, 메톡시프로필렌글리콜메타크릴레이트, 메톡시디프로필렌글리콜아크릴레이트, 메톡시디프로필렌글리콜메타크릴레이트, 이소보르닐아크릴레이트, 이소보르닐메타크릴레이트, 디시클로펜타디에닐아크릴레이트, 디시클로펜타디에틸메타크릴레이트, 아다만틸(메타)아크릴레이트, 노르보르닐(메타)아크릴레이트, 2-히드록시-3-페녹시프로필아크릴레이트, 2-히드록시-3-페녹시프로필메타크릴레이트, 글리세롤모노아크릴레이트, 글리세롤모노메타크릴레이트 등의 불포화 카르복시산 에스테르; 2-아미노에틸아크릴레이트, 2-아미노에틸메타크릴레이트, 2-디메틸아미노에틸아크릴레이트, 2-디메틸아미노에틸 메타크릴레이트, 2-아미노프로필아크릴레이트, 2-아미노프로필메타크릴레이트, 2-디메틸아미노프로필아크릴레이트, 2-디메틸아미노프로필메타크릴레이트, 3-아미노프로필아크릴레이트, 3-아미노프로필메타크릴레이트, 3-디메틸아미노프로필아크릴레이트, 3-디메틸아미노프로필메타크릴레이트 등의 불포화 카르복시산 아미노알킬에스테르 화합물; 글리시딜아크릴레이트, 글리시딜메타크릴레이트 등의 불포화 카르복시산 글리시딜에스테르 화합물; 아세트산 비닐, 프로피온산 비닐, 부티르산 비닐, 벤조산 비닐 등의 카르복시산 비닐에스테르 화합물; 비닐메틸에테르, 비닐에틸에테르, 알릴글리시딜에테르 등의 불포화 에테르 화합물; 아크릴로니트릴, 메타크릴로니트릴, α-클로로아크릴로니트릴, 시안화 비닐리덴 등의 시안화 비닐 화합물; 아크릴아미드, 메타크릴아미드, α-클로로아크릴아미드, N-2-히드록시에틸아크릴아미드, N-2-히드록시에틸메타크릴아미드 등의 불포화 아미드류; 말레이미드, 벤질말레이미드, N-페닐말레이미드, N-시클로헥실말레이미드 등의 불포화 이미드 화합물; 1,3-부타디엔, 이소프렌, 클로로프렌 등의 지방족 공액 디엔류; 및 폴리스티렌, 폴리메틸아크릴레이트, 폴리메틸메타크릴레이트, 폴리-n-부틸아크릴레이트, 폴리-n-부틸메타크릴레이트, 폴리실록산의 중합체 분자쇄의 말단에 모노아크릴로일기 또는 모노메타크릴로일기를 갖는 거대 단량체류; 비유전 상수값을 낮출수 있는 노르보닐 골격을 갖는 단량체, 아다만탄골격을 갖는 단량체, 로진 골격을 갖는 단량체 등의 벌키성 단량체가 사용 가능하다.More specifically, the copolymerizable monomer may be styrene, α-methylstyrene, o-vinyltoluene, m-vinyltoluene, p-vinyltoluene, p-chlorostyrene, o-methoxystyrene, m-methoxystyrene, p- Methoxy styrene, o-vinyl benzyl methyl ether, m-vinyl benzyl methyl ether, p-vinyl benzyl methyl ether, o-vinyl benzyl glycidyl ether, m-vinyl benzyl glycidyl ether, p-vinyl benzyl glycidyl Aromatic vinyl compounds such as ether and indene; Methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, n-propyl acrylate, n-propyl methacrylate, i-propyl acrylate, i-propyl methacrylate, n-butyl acrylate, n-butyl methacrylate, i-butyl acrylate, i-butyl methacrylate, sec-butyl acrylate, sec-butyl methacrylate, t-butyl acrylate, t-butyl methacrylate, 2-hydroxy Ethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate, 3-hydroxypropyl acrylate, 3-hydroxypropyl methacrylate, 2-hydroxy Hydroxybutyl acrylate, 2-hydroxybutyl methacrylate, 3-hydroxybutyl acrylate, 3-hydroxybutyl methacrylate, 4-hydroxybutyl acrylate, 4-hydroxybutyl methacrylate, allyl Relate, allyl methacrylate, benzyl acrylate, benzyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, phenyl acrylate, phenyl methacrylate, 2-methoxyethyl acrylate, 2-methoxyethyl Methacrylate, 2-phenoxyethyl acrylate, 2-phenoxyethyl methacrylate, methoxydiethylene glycol acrylate, methoxydiethylene glycol methacrylate, methoxytriethylene glycol acrylate, methoxytriethylene glycol meth Methacrylate, methoxy propylene glycol acrylate, methoxy propylene glycol methacrylate, methoxy dipropylene glycol acrylate, methoxy dipropylene glycol methacrylate, isobornyl acrylate, isobornyl methacrylate, dicyclopentadier Nyl acrylate, dicyclopentadiethyl methacrylate, adamantyl (meth) a Relate, norbornyl (meth) acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-hydroxy-3-phenoxypropyl methacrylate, glycerol monoacrylate, glycerol monomethacrylate, etc. Unsaturated carboxylic acid esters of; 2-aminoethyl acrylate, 2-aminoethyl methacrylate, 2-dimethylaminoethyl acrylate, 2-dimethylaminoethyl methacrylate, 2-aminopropyl acrylate, 2-aminopropyl methacrylate, 2-dimethyl Unsaturated carboxylic acids such as aminopropyl acrylate, 2-dimethylaminopropyl methacrylate, 3-aminopropyl acrylate, 3-aminopropyl methacrylate, 3-dimethylaminopropyl acrylate, and 3-dimethylaminopropyl methacrylate Alkyl ester compounds; Unsaturated carboxylic acid glycidyl ester compounds such as glycidyl acrylate and glycidyl methacrylate; Carboxylic acid vinyl ester compounds, such as vinyl acetate, a vinyl propionate, a vinyl butyrate, and a vinyl benzoate; Unsaturated ether compounds such as vinyl methyl ether, vinyl ethyl ether and allyl glycidyl ether; Vinyl cyanide compounds such as acrylonitrile, methacrylonitrile, α-chloroacrylonitrile and vinylidene cyanide; Unsaturated amides such as acrylamide, methacrylamide, α-chloroacrylamide, N-2-hydroxyethylacrylamide and N-2-hydroxyethyl methacrylamide; Unsaturated imide compounds such as maleimide, benzylmaleimide, N-phenylmaleimide, and N-cyclohexylmaleimide; Aliphatic conjugated dienes such as 1,3-butadiene, isoprene and chloroprene; And monoacryloyl or monomethacryloyl groups at the terminal of the polymer molecular chain of polystyrene, polymethylacrylate, polymethylmethacrylate, poly-n-butylacrylate, poly-n-butylmethacrylate, polysiloxane. Macromonomers having; Bulky monomers, such as a monomer having a norbornyl skeleton, a monomer having an adamantane skeleton, and a monomer having a rosin skeleton, can lower the dielectric constant.
상기 알칼리 가용성 수지는 상기 자발광 감광성 수지 조성물의 고형분 전체 100 중량부에 대하여 10 내지 80 중량부, 구체적으로 15 내지 70 중량부, 더욱 구체적으로 20 내지 45 중량부로 포함될 수 있다.The alkali-soluble resin may be included in 10 to 80 parts by weight, specifically 15 to 70 parts by weight, and more specifically 20 to 45 parts by weight based on 100 parts by weight of the total solids of the self-luminous photosensitive resin composition.
상기 알칼리 가용성 수지가 상기 범위 내로 포함될 경우 현상액에서의 용해성이 충분하여 패턴형성이 용이하며, 현상시에 노광부의 화소 부분의 막 감소가 방지되어 비화소 부분의 누락성이 양호해지므로 바람직하다. 상기 알칼리 가용성 수지가 상기 범위 미만으로 포함될 경우 비화소 부분이 다소 누락될 수 있으며, 상기 알칼리 가용성 수지가 상기 범위를 초과하여 포함될 경우 현상액에서의 용해성이 다소 저하되어 패턴형성이 다소 어려울 수 있다.When the alkali-soluble resin is included in the above range, the solubility in the developing solution is sufficient, so that pattern formation is easy, and the film reduction of the pixel portion of the exposed portion is prevented at the time of development, so that the dropping of the non-pixel portion is good, which is preferable. If the alkali-soluble resin is included in less than the above range, the non-pixel portion may be somewhat missing, and when the alkali-soluble resin is included in more than the above range, the solubility in the developing solution is slightly lowered may be somewhat difficult to form a pattern.
본 발명에 따른 자발광 감광성 수지 조성물은 광중합 개시제를 포함할 수 있으며, 상기 광중합 개시제는 상기 광중합성 화합물을 중합시킬 수 있는 것이라면 그 종류를 특별히 제한하지 않고 사용할 수 있다. 특히, 상기 광중합 개시제는 중합특성, 개시효율, 흡수파장, 입수성, 가격 등의 관점에서 아세토페논계 화합물, 벤조페논계 화합물, 트리아진계 화합물, 비이미다졸계 화합물, 옥심 화합물 및 티오크산톤계 화합물로 이루어지는 군으로부터 선택되는 1종 이상의 화합물을 사용하는 것이 바람직하다.The self-luminous photosensitive resin composition according to the present invention may include a photopolymerization initiator, and the photopolymerization initiator may be used without particular limitation as long as it can polymerize the photopolymerizable compound. In particular, the photopolymerization initiator is an acetophenone compound, a benzophenone compound, a triazine compound, a biimidazole compound, an oxime compound, and a thioxanthone compound in terms of polymerization properties, start efficiency, absorption wavelength, availability, and price. It is preferable to use at least one compound selected from the group consisting of compounds.
상기 아세토페논계 화합물의 구체적인 예로는 디에톡시아세토페논, 2-히드록시-2-메틸-1-페닐프로판-1-온, 벤질디메틸케탈, 2-히드록시-1-[4-(2-히드록시에톡시)페닐]-2-메틸프로판-1-온, 1-히드록시시클로헥실페닐케톤, 2-메틸-1-(4-메틸티오페닐)-2-모르폴리노프로판-1-온, 2-벤질-2-디메틸아미노-1-(4-모르폴리노페닐)부탄-1-온, 2-히드록시-2-메틸-1-[4-(1-메틸비닐)페닐]프로판-1-온, 2-(4-메틸벤질)-2-(디메틸아미노)-1-(4-모르폴리노페닐)부탄-1-온 등을 들 수 있다. Specific examples of the acetophenone-based compound include diethoxyacetophenone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, benzyl dimethyl ketal, 2-hydroxy-1- [4- (2-hydroxy Hydroxyethoxy) phenyl] -2-methylpropan-1-one, 1-hydroxycyclohexylphenyl ketone, 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) butan-1-one, 2-hydroxy-2-methyl-1- [4- (1-methylvinyl) phenyl] propane-1 -One, 2- (4-methylbenzyl) -2- (dimethylamino) -1- (4-morpholinophenyl) butan-1-one, and the like.
상기 벤조페논계 화합물로서는, 예를 들면 벤조페논, o-벤조일벤조산 메틸, 4-페닐벤조페논, 4-벤조일-4'-메틸디페닐술피드, 3,3',4,4'-테트라(tert-부틸퍼옥시카르보닐)벤조페논, 2,4,6-트리메틸벤조페논 등이 있다.As said benzophenone type compound, for example, benzophenone, methyl o-benzoyl benzoate, 4-phenylbenzophenone, 4-benzoyl-4'-methyldiphenyl sulfide, 3,3 ', 4,4'- tetra ( tert-butylperoxycarbonyl) benzophenone, 2,4,6-trimethylbenzophenone, and the like.
상기 트리아진계 화합물의 구체적인 예로는 2,4-비스(트리클로로메틸)-6-(4-메톡시페닐)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-(4-메톡시나프틸)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-피페로닐-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-(4-메톡시스티릴)-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(5-메틸퓨란-2-일)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(퓨란-2-일)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(4-디에틸아미노-2-메틸페닐)에테닐]-1,3,5-트리아진, 2,4-비스(트리클로로메틸)-6-[2-(3,4-디메톡시페닐)에테닐]-1,3,5-트리아진 등을 들 수 있다. Specific examples of the triazine-based compound include 2,4-bis (trichloromethyl) -6- (4-methoxyphenyl) -1,3,5-triazine and 2,4-bis (trichloromethyl) -6 -(4-methoxynaphthyl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6-piperonyl-1,3,5-triazine, 2,4-bis (Trichloromethyl) -6- (4-methoxystyryl) -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (5-methylfuran-2- Yl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl) -6- [2- (furan-2-yl) ethenyl] -1,3,5-triazine , 2,4-bis (trichloromethyl) -6- [2- (4-diethylamino-2-methylphenyl) ethenyl] -1,3,5-triazine, 2,4-bis (trichloromethyl ) -6- [2- (3,4-dimethoxyphenyl) ethenyl] -1,3,5-triazine and the like.
상기 비이미다졸 화합물의 구체적인 예로는 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(2,3-디클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라(알콕시페닐)비이미다졸, 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라(트리알콕시페닐)비이미다졸, 2,2-비스(2,6-디클로로페닐)-4,4'5,5'-테트라페닐-1,2'-비이미다졸 또는 4,4',5,5' 위치의 페닐기가 카르보알콕시기에 의해 치환되어 있는 이미다졸 화합물 등을 들 수 있다. 이들 중에서 2,2'-비스(2-클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2'-비스(2,3-디클로로페닐)-4,4',5,5'-테트라페닐비이미다졸, 2,2-비스(2,6-디클로로페닐)-4,4'5,5'-테트라페닐-1,2'-비이미다졸이 바람직하게 사용된다.Specific examples of the biimidazole compound include 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2,3-dichloro Phenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2-chlorophenyl) -4,4', 5,5'-tetra (alkoxyphenyl) biimidazole , 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetra (trialkoxyphenyl) biimidazole, 2,2-bis (2,6-dichlorophenyl) -4, The imidazole compound etc. which the phenyl group of a 4'5,5'- tetraphenyl- 1,2'- biimidazole or a 4,4 ', 5,5' position are substituted by the carboalkoxy group are mentioned. Among them, 2,2'-bis (2-chlorophenyl) -4,4 ', 5,5'-tetraphenylbiimidazole, 2,2'-bis (2,3-dichlorophenyl) -4,4' , 5,5'-tetraphenylbiimidazole, 2,2-bis (2,6-dichlorophenyl) -4,4'5,5'-tetraphenyl-1,2'-biimidazole are preferably used do.
상기 옥심 화합물의 구체적인 예로는 o-에톡시카르보닐-α-옥시이미노-1-페닐프로판-1-온등을 들 수 있으며, 시판품으로 바스프사의 Irgacure OXE 01, OXE 02가 대표적이다.Specific examples of the oxime compound include o-ethoxycarbonyl-α-oxyimino-1-phenylpropan-1-one and the like, and commercially available BASF Irgacure OXE 01 and OXE 02 are typical examples.
상기 티오크산톤계 화합물로서는, 예를 들면 2-이소프로필티오크산톤, 2,4-디에틸티오크산톤, 2,4-디클로로티오크산톤, 1-클로로-4-프로폭시티오크산톤 등이 있다. As said thioxanthone type compound, 2-isopropyl thioxanthone, 2, 4- diethyl thioxanthone, 2, 4- dichloro thioxanthone, 1-chloro-4- propoxy thioxanthone, etc. are mentioned, for example. There is this.
상기 광중합 개시제는 상기 자발광 감광성 수지 조성물 고형분 전체 100 중량부에 대하여 0.1 내지 10 중량부, 바람직하게는 1 내지 9.5 중량부, 더욱 바람직하게는 5 내지 9.5 중량부로 포함될 수 있다. The photopolymerization initiator may be included in an amount of 0.1 to 10 parts by weight, preferably 1 to 9.5 parts by weight, and more preferably 5 to 9.5 parts by weight based on 100 parts by weight of the total solid of the self-luminous photosensitive resin composition.
상기 광중합 개시제가 상기 범위 내로 포함되는 경우 상기 자발광 감광성 수지 조성물이 고감도화되어 노광 시간이 단축되므로 생산성이 향상되며 높은 해상도를 유지할 수 있기 때문에 바람직하다. 또한, 본 발명에 따른 자발광 감광성 수지 조성물을 사용하여 형성한 화소부의 강도와 상기 화소부의 표면에서의 평활성이 양호해지는 이점이 있다. In the case where the photopolymerization initiator is included in the above range, the self-luminous photosensitive resin composition may be highly sensitive, and thus the exposure time may be shortened, so that productivity may be improved and high resolution may be maintained. Moreover, there exists an advantage that the intensity | strength of the pixel part formed using the self-luminous photosensitive resin composition concerning this invention, and smoothness in the surface of the said pixel part become favorable.
상기 광중합 개시제는 본 발명에 자발광 감광성 수지 조성물의 감도를 향상시키기 위해서, 광중합 개시 보조제를 더 포함할 수 있다. 상기 광중합 개시 보조제가 포함되는 경우 감도가 더욱 높아져 생산성이 향상되는 이점이 있다.The photopolymerization initiator may further include a photopolymerization initiation aid in order to improve the sensitivity of the self-luminous photosensitive resin composition in the present invention. When the photopolymerization start adjuvant is included, there is an advantage in that the sensitivity is higher and the productivity is improved.
상기 광중합 개시 보조제는 예컨대, 아민 화합물, 카르복시산 화합물, 티올기를 가지는 유기 황화합물로 이루어진 군으로부터 선택되는 1종 이상의 화합물이 바람직하게 사용될 수 있으나 이에 한정되지 않는다.The photopolymerization initiation assistant may be preferably used, for example, at least one compound selected from the group consisting of an amine compound, a carboxylic acid compound, and an organic sulfur compound having a thiol group, but is not limited thereto.
상기 아민 화합물로는 방향족 아민 화합물을 사용하는 것이 바람직하며, 구체적으로 트리에탄올아민, 메틸디에탄올아민, 트리이소프로판올아민 등의 지방족 아민 화합물, 4-디메틸아미노벤조산메틸, 4-디메틸아미노벤조산에틸, 4-디메틸아미노벤조산이소아밀, 4-디메틸아미노벤조산2-에틸헥실, 벤조산2-디메틸아미노에틸, N,N-디메틸파라톨루이딘, 4,4'-비스(디메틸아미노)벤조페논(통칭: 미힐러 케톤), 4,4'-비스(디에틸아미노)벤조페논 등을 사용할 수 있다.It is preferable to use an aromatic amine compound as the amine compound, and specifically, aliphatic amine compounds such as triethanolamine, methyl diethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, 4- Dimethylaminobenzoic acid isoamyl, 4-dimethylaminobenzoic acid 2-ethylhexyl, benzoic acid 2-dimethylaminoethyl, N, N-dimethylparatoluidine, 4,4'-bis (dimethylamino) benzophenone (common name: Michler's ketone ), 4,4'-bis (diethylamino) benzophenone and the like can be used.
상기 카르복시산 화합물은 방향족 헤테로아세트산류인 것이 바람직하며, 구체적으로 페닐티오아세트산, 메틸페닐티오아세트산, 에틸페닐티오아세트산, 메틸에틸페닐티오아세트산, 디메틸페닐티오아세트산, 메톡시페닐티오아세트산, 디메톡시페닐티오아세트산, 클로로페닐티오아세트산, 디클로로페닐티오아세트산, N-페닐글리신, 페녹시아세트산, 나프틸티오아세트산, N-나프틸글리신, 나프톡시아세트산 등을 들 수 있다. The carboxylic acid compound is preferably an aromatic heteroacetic acid, specifically, phenylthioacetic acid, methylphenylthioacetic acid, ethylphenylthioacetic acid, methylethylphenylthioacetic acid, dimethylphenylthioacetic acid, methoxyphenylthioacetic acid, dimethoxyphenylthioacetic acid, Chlorophenylthioacetic acid, dichlorophenylthioacetic acid, N-phenylglycine, phenoxyacetic acid, naphthylthioacetic acid, N-naphthylglycine, naphthoxyacetic acid, etc. are mentioned.
상기 티올기를 가지는 유기 황화합물의 구체적인 예로서는 2-머캅토벤조티아졸, 1,4-비스(3-머캅토부티릴옥시)부탄, 1,3,5-트리스(3-머캅토부틸옥시에틸)-1,3,5-트리아진-2,4,6(1H,3H,5H)-트리온, 트리메틸올프로판트리스(3-머갑토프로피오네이트), 펜타에리트리톨테트라키스(3-머캅토부틸레이트), 펜타에리트리톨테트라키스(3-머캅토프로피오네이트), 디펜타에리트리톨헥사키스(3-머캅토프로피오네이트), 테트라에틸렌글리콜비스(3-머캅토프로피오네이트) 등을 들 수 있다.Specific examples of the organic sulfur compound having the thiol group include 2-mercaptobenzothiazole, 1,4-bis (3-mercaptobutyryloxy) butane, 1,3,5-tris (3-mercaptobutyloxyethyl)- 1,3,5-triazine-2,4,6 (1H, 3H, 5H) -trione, trimethylolpropanetris (3-mergaptopropionate), pentaerythritol tetrakis (3-mercaptobutyl Late), pentaerythritol tetrakis (3-mercaptopropionate), dipentaerythritol hexakis (3-mercaptopropionate), tetraethylene glycol bis (3-mercaptopropionate), etc. are mentioned. Can be.
상기 광중합 개시 보조제는 본 발명의 범위를 해치지 않는 범위에서 적절히 추가하여 사용할 수 있다.The photopolymerization start adjuvant can be appropriately added and used within a range that does not impair the scope of the present invention.
본 발명의 자발광 감광성 수지 조성물에 포함되는 제2 용제는 특별히 한정되지 않으며, 당 분야에서 통상적으로 사용되는 유기 용제를 포함할 수 있다. 상기 제1 용제는 상기 제2 용제와 서로 동일한 것을 사용하여도 무방하고, 서로 상이한 것을 사용하여도 무방하다. 다만, 상기 제2 용제는 할로겐화 탄화수소계 용제; 방향족 탄화수소계 용제; 및 지방족 포화 탄화수소계 용제;를 포함하지 않는다.The second solvent included in the self-luminous photosensitive resin composition of the present invention is not particularly limited, and may include an organic solvent commonly used in the art. The first solvent may be the same as the second solvent, or may be different from each other. However, the second solvent may be a halogenated hydrocarbon solvent; Aromatic hydrocarbon solvents; And aliphatic saturated hydrocarbon solvents.
상기 제2 용제는 구체적으로 에틸렌글리콜 모노메틸에테르, 에틸렌글리콜 모노에틸 에테르, 에틸렌글리콜 모노프로필에테르, 에틸렌글리콜 모노부틸에테르 등의 에틸렌글리콜 모노알킬에테르류, 디에틸렌글리콜 디메틸에테르, 디에틸렌글리콜 디에틸에테르, 디에틸렌글리콜 디프로필에테르, 디에틸렌글리콜 디부틸에테르 등의 디에틸렌글리콜 디알킬에테르류; 메틸셀로솔브아세테이트, 에틸셀로솔브아세테이트 등의 에틸렌글리콜 알킬에테르아세테이트류; 프로필렌글리콜 모노메틸에테르아세테이트, 프로필렌글리콜 모노에틸에테르아세테이트, 프로필렌글리콜 모노프로필에테르아세테이트, 등의 알킬렌글리콜 알킬에테르아세테이트류; 메톡시부틸아세테이트, 메톡시펜틸아세테이트 등의 알콕시알킬아세테이트류; 메틸에틸케톤, 아세톤, 메틸아밀케톤, 메틸이소부틸케톤, 시클로헥사논 등의 케톤류; 에탄올, 프로판올, 부탄올, 헥산올, 시클로헥산올, 에틸렌글리콜, 글리세린 등의 알코올류; 3-에톡시프로피온산에틸, 3-메톡시프로피온산메틸 등의 에스테르류; γ-부티롤락톤 등의 환상 에스테르류 등을 들 수 있다.Specifically, the second solvent is ethylene glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl Diethylene glycol dialkyl ethers such as ether, diethylene glycol dipropyl ether and diethylene glycol dibutyl ether; Ethylene glycol alkyl ether acetates such as methyl cellosolve acetate and ethyl cellosolve acetate; Alkylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, and the like; Alkoxyalkyl acetates such as methoxybutyl acetate and methoxypentyl acetate; Ketones such as methyl ethyl ketone, acetone, methyl amyl ketone, methyl isobutyl ketone and cyclohexanone; Alcohols such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, glycerin; Esters such as ethyl 3-ethoxypropionate and methyl 3-methoxypropionate; Cyclic ester, such as (gamma) -butyrolactone, etc. are mentioned.
상기의 제2 용제는 도포성 및 건조성면에서 바람직하게는 상기 제2 용제 중에서 비점이 100℃ 내지 200℃인 유기 용제를 들 수 있고, 보다 바람직하게는 알킬렌글리콜알킬에테르아세테이트류, 케톤류, 3-에톡시프로피온산 에틸이나, 3-메톡시프로피온산 메틸 등의 에스테르류를 들 수 있으며, 더욱 바람직하게는 프로필렌글리콜모노메틸에테르아세테이트, 프로필렌글리콜모노에틸에테르아세테이트, 3-에톡시프로피온산 에틸, 3-메톡시프로피온산 메틸 등을 들 수 있다. 이들 제2 용제는 각각 단독으로 또는 2종류 이상 혼합하여 사용할 수 있다.In view of applicability and dryness, the second solvent is preferably an organic solvent having a boiling point of 100 ° C to 200 ° C in the second solvent, more preferably alkylene glycol alkyl ether acetates, ketones, or 3 Esters such as ethyl ethoxypropionate and methyl 3-methoxypropionate, and more preferably propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, 3-ethoxypropionate ethyl and 3-meth Methyl oxypropionate etc. are mentioned. These 2nd solvents can be used individually or in mixture of 2 or more types, respectively.
상기 제2 용제는 상기 자발광 감광성 수지 조성물 전체 100 중량부에 대하여 25 내지 90 중량부, 구체적으로 30 내지 80 중량부로 포함될 수 있으나, 이에 한정되지는 않는다.The second solvent may be included in an amount of 25 to 90 parts by weight, specifically 30 to 80 parts by weight, based on 100 parts by weight of the total self-luminous photosensitive resin composition, but is not limited thereto.
다만, 상기 제2 용제의 함량이 상기 범위 이내로 포함될 경우에는 롤코터, 스핀 코터, 슬릿앤드 스핀 코터, 슬릿코터(다이 코터라고도 하는 경우가 있음), 잉크젯 등의 도포 장치로 도포했을 때 도포성이 양호해질 수 있어 바람직하다. 상기 제2 용제의 함량이 상기 범위 미만으로 포함될 경우 도포성이 다소 저하됨에 따라 공정이 다소 어려워질 수 있으며, 상기 범위를 초과하는 경우 상기 자발광 감광성 수지 조성물로 형성된 컬러 필터의 성능이 다소 저하될 수 있는 문제가 발생할 수 있다.However, when the content of the second solvent is included within the above range, the coating property when applied with a coating device such as a roll coater, spin coater, slit and spin coater, slit coater (sometimes referred to as die coater), inkjet, etc. It is preferable because it can become good. If the content of the second solvent is less than the above range, the process may be somewhat difficult as the applicability is slightly lowered. If the second solvent exceeds the above range, the performance of the color filter formed of the self-luminous photosensitive resin composition may be slightly lowered. This can cause problems.
본 발명에 따른 자발광 감광성 수지 조성물은 코팅성 또는 밀착성을 증진 시키기 위해서 밀착촉진제, 계면활성제와 같은 첨가제를 추가로 포함할 수 있다.The self-luminous photosensitive resin composition according to the present invention may further include an additive such as an adhesion promoter and a surfactant to enhance the coating property or adhesion.
상기 밀착촉진제는 기판과의 밀착성을 높이기 위하여 첨가될 수 있는 것으로서 카르복실기, 메타크릴로일기, 이소시아네이트기, 에폭시기 및 이들의 조합으로 이루어진 군에서 선택되는 반응성 치환기를 갖는 실란 커플링제를 포함할 수 있으나 이에 한정되는 것은 아니다. 예컨대, 상기 실란 커플링제는 트리메톡시실릴 벤조산, γ-메타크릴 옥시프로필 트리메톡시 실란, 비닐트리아세톡시실란, 비닐 트리메톡시실란, γ-이소시아네이트 프로필 트리에톡시실란, γ-글리시독시 프로필 트리메톡시실란, β-(3,4-에폭시시클로헥실)에틸트리메톡시실란 등을 들 수 있으면, 이것들은 단독 및 2종 이상 조합하여 사용할 수 있다The adhesion promoter may include a silane coupling agent having a reactive substituent selected from the group consisting of carboxyl groups, methacryloyl groups, isocyanate groups, epoxy groups, and combinations thereof, which may be added to increase adhesion to the substrate. It is not limited. For example, the silane coupling agent is trimethoxysilyl benzoic acid, γ-methacryl oxypropyl trimethoxy silane, vinyltriacetoxysilane, vinyl trimethoxysilane, γ-isocyanate propyl triethoxysilane, γ-glycidoxy If propyl trimethoxysilane, (beta)-(3, 4- epoxycyclohexyl) ethyltrimethoxysilane, etc. are mentioned, these can be used individually and in combination of 2 or more types.
본 발명에 따른 자발광 감광성 수지 조성물이 상기 계면활성제를 포함하는 경우 코팅성이 향상될 수 있는 이점이 있다. 예컨대 상기 계면활성제는 BM-1000, BM-1100(BM Chemie사), 프로라이드 FC-135/FC-170C/FC-430(스미토모 쓰리엠㈜), SH-28PA/-190/SZ-6032(도레 시리콘㈜)등의 불소계 계면 활성제를 사용할 수 있으나, 이에 한정되지는 않는다.When the self-luminous photosensitive resin composition according to the present invention includes the surfactant, there is an advantage that the coating property can be improved. For example, the surfactant is BM-1000, BM-1100 (BM Chemie Co., Ltd.), Proride FC-135 / FC-170C / FC-430 (Sumitomo 3M Co., Ltd.), SH-28PA / -190 / SZ-6032 (Dore Siri). Fluorine-based surfactants such as Corn Co., Ltd. may be used, but is not limited thereto.
이 외에도 본 발명에 따른 자발광 감광성 수지 조성물은 본 발명의 효과를 저해하지 않는 범위에서 산화 방지제, 자외선 흡수제, 응집 방지제와 같은 첨가제를 더 포함할 수도 있으며, 상기 첨가제는 역시 본 발명의 효과를 저해하지 않는 범위에서 당업자가 적절히 추가하여 사용이 가능하다. 예컨대 상기 첨가제는 상기 자발광 감광성 수지 조성물 전체 중량을 기준으로 0.05 내지 10 중량부, 구체적으로 0.1 내지 10 중량부, 더욱 구체적으로 0.1 내지 5 중량부로 사용할 수 있으나 이에 한정되는 것은 아니다.In addition, the self-luminous photosensitive resin composition according to the present invention may further include additives such as antioxidants, ultraviolet absorbers and anti-agglomerating agents in a range that does not impair the effects of the present invention, the additives also inhibit the effects of the present invention It can be used by those skilled in the art as long as it does not. For example, the additive may be used in an amount of 0.05 to 10 parts by weight, specifically 0.1 to 10 parts by weight, more specifically 0.1 to 5 parts by weight based on the total weight of the self-luminous photosensitive resin composition, but is not limited thereto.
<컬러필터><Color filter>
본 발명의 또 다른 양태는 전술한 자발광 감광성 수지 조성물을 이용하여 제조된 컬러필터에 관한 것이다.Yet another aspect of the present invention relates to a color filter manufactured using the above-described self-luminous photosensitive resin composition.
본 발명에 따른 컬러필터는 양자점; 및 유전상수가 20℃에서 12.0 미만인 제1 용제;를 포함하고, 클로로포름 또는 디클로로메탄과 같은 할로겐화 탄화수소계 용제; 벤젠 또는 톨루엔과 같은 방향족 탄화수소계 용제; 및 N-헥산과 같은 지방족 포화 탄화수소계 용제;를 포함하지 않는 분산성이 우수한 양자점 분산체를 포함하는 자발광 감광성 수지 조성물의 경화물을 포함함으로써 발광특성의 구현이 우수한 이점이 있으며, 양자점 분산체 내에 인체에 유해한 용제를 함유하고 있지 않기 때문에 환경적인 측면에서도 우수한 이점이 있다.Color filter according to the present invention is a quantum dot; And a first solvent having a dielectric constant of less than 12.0 at 20 ° C .; and a halogenated hydrocarbon solvent such as chloroform or dichloromethane; Aromatic hydrocarbon solvents such as benzene or toluene; And a cured product of a self-luminous photosensitive resin composition including a quantum dot dispersion having excellent dispersibility, which does not include an aliphatic saturated hydrocarbon-based solvent such as N-hexane. Since there is no solvent harmful to the human body in the environment there is an excellent advantage.
상기 컬러필터는 기판 및 상기 기판의 상부에 형성된 패턴층을 포함한다.The color filter includes a substrate and a pattern layer formed on the substrate.
상기 기판은 상기 컬러필터 자체 기판일 수 있으며, 또는 디스플레이 장치 등에 컬러필터가 위치되는 부위일 수도 있는 것으로, 특별히 제한되지 않는다. 상기 기판은 유리, 실리콘(Si), 실리콘 산화물(SiOx) 또는 고분자 기판일 수 있으며, 상기 고분자 기판은 폴리에테르설폰(polyethersulfone, PES) 또는 폴리카보네이트(polycarbonate, PC) 등일 수 있다.The substrate may be the substrate of the color filter itself, or may be a portion where the color filter is positioned in a display device or the like, and is not particularly limited. The substrate may be glass, silicon (Si), silicon oxide (SiOx), or a polymer substrate, and the polymer substrate may be polyethersulfone (PES) or polycarbonate (PC).
상기 패턴층은 본 발명의 자발광 감광성 수지 조성물을 포함하는 층으로, 상기 자발광 감광성 수지 조성물을 도포하고 소정의 패턴으로 노광, 현상 및 열경화하여 형된 층일 수 있다. 상기 패턴층은 당업계에서 통상적으로 알려진 방법을 수행함으로써 형성할 수 있다.The pattern layer is a layer including the self-luminous photosensitive resin composition of the present invention, and may be a layer formed by applying the self-luminous photosensitive resin composition and exposing, developing and thermosetting in a predetermined pattern. The pattern layer may be formed by performing a method commonly known in the art.
상기와 같은 기판 및 패턴층을 포함하는 컬러필터는 각 패턴 사이에 형성된 격벽을 더 포함할 수 있으며, 블랙 매트릭스를 더 포함할 수 있으나 이에 한정되지 않는다.The color filter including the substrate and the pattern layer may further include a partition formed between each pattern, and may further include a black matrix, but is not limited thereto.
또한, 상기 컬러필터의 패턴층 상부에 형성된 보호막을 더 포함할 수도 있다.In addition, a protective film formed on the pattern layer of the color filter may be further included.
본 발명의 또 다른 실시형태에 있어서, 상기 컬러필터는 적색 패턴층, 녹색 패턴층 및 청색 패턴층으로 이루어진 군에서 선택되는 1 이상을 포함할 수 있다. 구체적으로, 상기 컬러필터는 본 발명에 따른 적 양자점을 포함하는 적색 패턴층, 녹 양자점을 포함하는 녹색 패턴층 및 청 양자점을 포함하는 청색 패턴층으로 이루어진 군에서 선택되는 1 이상을 포함할 수 있다. 상기 적색 패턴층, 녹색 패턴층, 청색 패턴층은 각각 광 조사시 적색광, 녹색광, 청색광을 방출할 수 있으며, 이때, 상기 광원의 방출광은 특별히 한정되지는 않으나 보다 우수한 색 재현성의 측면에서 청색광을 방출하는 광원을 사용할 수 있다.In another embodiment of the present invention, the color filter may include one or more selected from the group consisting of a red pattern layer, a green pattern layer and a blue pattern layer. Specifically, the color filter may include one or more selected from the group consisting of a red pattern layer including a red quantum dot, a green pattern layer including a green quantum dot, and a blue pattern layer including a blue quantum dot according to the present invention. . The red pattern layer, the green pattern layer, and the blue pattern layer may respectively emit red light, green light, and blue light when irradiated with light. In this case, the emission light of the light source is not particularly limited, but blue light may be generated in terms of better color reproducibility. A light source that emits can be used.
상기 컬러필터는 적색 패턴층, 녹색 패턴층 및 청색 패턴층 중 2종 색상의 패턴층만을 구비할 수도 있으나, 이에 한정되지 않는다. 다만, 상기 컬러필터가 2종 색상의 패턴층만을 구비하는 경우 상기 패턴층은 상기 양자점 입자를 함유하지 않는 투명 패턴층을 더 구비할 수 있다.The color filter may include only a pattern layer of two colors among the red pattern layer, the green pattern layer, and the blue pattern layer, but is not limited thereto. However, when the color filter includes only the pattern layer of two colors, the pattern layer may further include a transparent pattern layer containing no quantum dot particles.
상기 컬러필터가 상기 2종 색상의 패턴층만을 구비하는 경우에는 상기 2종 색상 외의 색상을 나타내는 파장의 빛을 방출하는 광원을 사용할 수 있다. 예컨대, 상기 컬러필터가 적색 패턴층 및 녹색 패턴층을 포함하는 경우에는 청색광을 방출하는 광원을 사용할 수 있으며, 이 경우 적 양자점은 적색광을, 녹 양자점은 녹색광을 방출하고, 상기 투명 패턴층은 상기 광원에 의한 청색광이 그대로 투과함에 따라 청색을 띨 수 있다.When the color filter includes only the pattern layers of the two colors, a light source emitting light having a wavelength representing a color other than the two colors may be used. For example, when the color filter includes a red pattern layer and a green pattern layer, a light source emitting blue light may be used. In this case, red quantum dots emit red light and green quantum dots emit green light, and the transparent pattern layer may As the blue light transmitted by the light source is transmitted as it is, blue can be obtained.
<화상 표시 장치><Image display device>
또한, 본 발명의 다른 양태는, 전술한 컬러필터를 포함하는 화상표시장치에 관한 것이다. Moreover, another aspect of this invention is related with the image display apparatus containing the color filter mentioned above.
본 발명의 컬러필터는 통상의 액정 표시 장치뿐만 아니라, 전계 발광 표시장치, 플라스마 표시 장치, 전계 방출 표시 장치 등 각종 화상 표시 장치에 적용이 가능하다.The color filter of the present invention can be applied to various image display devices such as electroluminescent display devices, plasma display devices, field emission display devices, as well as ordinary liquid crystal display devices.
본 발명에 따른 화상 표시 장치는 분산성이 우수한 양자점 분산체를 포함하는 자발광 감광성 수지 조성물의 경화물을 포함하기 때문에 발광 특성이 우수한 이점이 있다.Since the image display apparatus which concerns on this invention contains the hardened | cured material of the self-luminous photosensitive resin composition containing the quantum dot dispersion excellent in dispersibility, there exists an advantage which is excellent in luminescence characteristic.
상기 화상표시장치는 청색광을 방출하는 광원 및 투명 패턴층을 더 포함할 수 있으며, 상기 청색광을 방출하는 광원, 상기 투명 패턴층은 전술한 내용을 적용할 수 있다.The image display apparatus may further include a light source emitting blue light and a transparent pattern layer, and the above-described information may be applied to the light source emitting blue light and the transparent pattern layer.
이하, 본 명세서를 구체적으로 설명하기 위해 실시예를 들어 상세히 설명한다. 그러나, 본 명세서에 따른 실시예들은 여러 가지 다른 형태로 변형될 수 있으며, 본 명세서의 범위가 아래에서 상술하는 실시예들에 한정되는 것으로 해석되지는 않는다. 본 명세서의 실시예들은 당업계에서 평균적인 지식을 가진 자에게 본 명세서를 보다 완전하게 설명하기 위해 제공되는 것이다. 또한, 이하에서 함유량을 나타내는 "%" 및 "부"는 특별히 언급하지 않는 한 중량 기준이다.Hereinafter, the present invention will be described in detail with reference to Examples. However, the embodiments according to the present disclosure may be modified in various other forms, and the scope of the present specification is not to be interpreted as being limited to the embodiments described below. The embodiments of the present specification are provided to more fully describe the present specification to those skilled in the art. In addition, "%" and "part" which show content below are a basis of weight unless there is particular notice.
제조예Production Example 1:  One: InPInP /Of ZnSZnS 코어-쉘  Core-shell 양자점Quantum dots 입자의 합성 Synthesis of Particles
InPInP Core  Core 양자점의Quantum dots 제조 Produce
인듐 아세테이트(Indium acetate) 0.4 mmol (0.058g), 팔미트산(palmitic acid) 0.6mmol (0.15g), 1-옥타데센(octadecene) 20mL를 반응기에 넣고 진공 하에 120도씨로 가열하였다. 1시간 후 반응기 내 분위기를 질소로 전환하였다. 280도씨로 가열한 후, 트리스(트리메틸실릴)포스핀 (TMS3P) 0.2mmol (58uL) 및 트리옥틸포스핀 1.0mL의 혼합 용액을 신속히 주입하고 20분간 반응시켰다. 상온으로 신속하게 식힌 반응 용액에 아세톤을 넣고 원심 분리하여 얻은 침전을 톨루엔에 분산시켰다. 얻어진 InP 반도체 나노 결정은, UV 제1 흡수 최대 파장 560 내지 590nm를 나타낸다.0.4 mmol (0.058 g) of indium acetate, 0.6 mmol (0.15 g) of palmitic acid and 20 mL of 1-octadecene were placed in a reactor and heated to 120 ° C. under vacuum. After 1 hour the atmosphere in the reactor was switched to nitrogen. After heating to 280 ° C., a mixed solution of 0.2 mmol (58 uL) of tris (trimethylsilyl) phosphine (TMS3P) and 1.0 mL of trioctylphosphine was rapidly injected and reacted for 20 minutes. Acetone was added to the reaction solution cooled to room temperature rapidly, and the precipitate obtained by centrifugation was dispersed in toluene. The obtained InP semiconductor nanocrystal shows a UV first absorption maximum wavelength of 560 to 590 nm.
InPInP /Of ZnSZnS Core-Shell  Core-shell 양자점의Quantum dots 제조 Produce
아연 아세테이트 2.4mmoL (0.448g), 올레산 4.8mmol, 트리옥틸아민 20mL를 반응기에 넣고 진공 하에 120도씨로 가열하였다. 1시간 후 반응기 내 분위기를 질소로 전환하고 반응기를 280도로 승온시켰다. 앞서 합성한 InP 코어 용액 2 ml를 넣고, 이어서 S/TOP 4.8 mmol를 넣은 후, 최종 혼합물을 2시간 동안 반응 진행하였다. 상온으로 신속하게 식힌 반응 용액에 에탄올을 넣고 원심 분리하여 얻은 침전을 감압여과 후 감압 건조하여 InP/ZnS 코어-쉘 양자점을 수득하였다.2.4 mmol of zinc acetate (0.448 g), 4.8 mmol of oleic acid, 20 mL of trioctylamine were placed in a reactor and heated to 120 ° C. under vacuum. After 1 hour the atmosphere in the reactor was switched to nitrogen and the reactor was heated to 280 degrees. 2 ml of the synthesized InP core solution was added thereto, followed by 4.8 mmol of S / TOP, and the final mixture was reacted for 2 hours. Ethanol was added to the reaction solution cooled to room temperature rapidly, and the precipitate obtained by centrifugation was filtered under reduced pressure and dried under reduced pressure to obtain an InP / ZnS core-shell quantum dot.
얻어진 나노 양자점의 광발광 스펙트럼은 635nm였다.The photoluminescence spectrum of the obtained nanoquantum dot was 635 nm.
제조예Production Example 2: 알칼리 가용성 수지의 합성 2: Synthesis of Alkali Soluble Resin
교반기, 온도계, 환류 냉각관, 적하 로트 및 질소 도입관을 구비한 플라스크를 준비하고, 한편, N-벤질말레이미드 45중량부, 메타크릴산 45중량부, 트리사이클로데실 메타크릴레이트 10중량부, t-부틸퍼옥시-2-에틸헥사노에이트 4중량부, 프로필렌글리콜모노메틸에테르아세테이트(이하, PGMEA) 40중량부를 투입후 교반 혼합하여 모노머 적하 로트를 준비하고, n-도데칸티올 6중량부, PGMEA 24중량부를 넣고 교반 혼합하여 연쇄 이동제 적하 로트를 준비했다. 이후 플라스크에 PGMEA 395중량부를 도입하고 플라스크내 분위기를 공기에서 질소로 한 후 교반하면서 플라스크의 온도를 90℃까지 승온했다. 이어서 모노머 및 연쇄 이동제를 적하 로트로부터 적하를 개시했다. 적하는 90℃를 유지하면서 각각 2시간 동안 진행하고 1시간 후에 110℃로 승온하여 3시간 유지한 뒤, 가스 도입관을 도입시켜, 산소/질소=5/95(v/v) 혼합 가스의 버블링을 개시했다. 이어서, 글리시딜메타크릴레이트 10중량부, 2,2'-메틸렌비스(4-메틸-6-t-부틸페놀) 0.4중량부, 트리에틸아민 0.8중량부를 플라스크 내에 투입하여 110℃에서 8시간 반응을 계속하고, 그 후 실온까지 냉각하면서 고형분 29.1중량%, 중량평균분자량 32,000, 산가가 114㎎KOH/g인 알칼리 가용성 수지를 얻었다.A flask equipped with a stirrer, a thermometer, a reflux condenser, a dropping lot, and a nitrogen inlet tube was prepared, while 45 parts by weight of N-benzylmaleimide, 45 parts by weight of methacrylic acid, 10 parts by weight of tricyclodecyl methacrylate, 4 parts by weight of t-butylperoxy-2-ethylhexanoate and 40 parts by weight of propylene glycol monomethyl ether acetate (hereinafter referred to as PGMEA) were added thereto, stirred and mixed to prepare a monomer dropping lot, and 6 parts by weight of n-dodecanethiol. 24 parts by weight of PGMEA was added thereto, followed by stirring and mixing to prepare a lot of chain transfer agent dropping lot. Thereafter, 395 parts by weight of PGMEA was introduced into the flask, the atmosphere in the flask was changed to nitrogen from air, and the temperature of the flask was raised to 90 ° C. while stirring. Subsequently, dropping of the monomer and the chain transfer agent was started from the dropping lot. The dropwise addition proceeds for 2 hours each while maintaining 90 ° C, and after 1 hour, the temperature is raised to 110 ° C and maintained for 3 hours, and then a gas introduction tube is introduced to bubble oxygen / nitrogen = 5/95 (v / v) mixed gas. The ring started. Subsequently, 10 parts by weight of glycidyl methacrylate, 0.4 part by weight of 2,2'-methylenebis (4-methyl-6-t-butylphenol), and 0.8 part by weight of triethylamine were added to the flask, followed by 8 hours at 110 ° C. The reaction was continued and an alkali-soluble resin having a solid content of 29.1 wt%, a weight average molecular weight of 32,000, and an acid value of 114 mgKOH / g was then cooled to room temperature.
제조예Production Example 3:  3: 양자점Quantum dots 분산체의Dispersion 제조 Produce
하기 표 1의 조성으로 양자점 분산체(A')를 제조하였으며, 이때 제1 용제는 각각 하기 표 2와 같다.To prepare a quantum dot dispersion (A ') in the composition of Table 1, wherein the first solvent is shown in Table 2, respectively.
양자점 분산체Quantum dot dispersion (A) 양자점(A) quantum dots (B) 제1 용제(B) the first solvent (D) 분산제(D) dispersant
B-1B-1 B-2B-2 B-3B-3 B-4B-4 B-5B-5 B-6B-6 B-7B-7 D-1D-1 D-2D-2 D-3D-3 D-4D-4
제조예 1Preparation Example 1 3030 7070 -- -- -- -- -- -- -- -- -- --
제조예 2Preparation Example 2 3030 -- 7070 -- -- -- -- -- -- -- -- --
제조예 3Preparation Example 3 3030 -- -- 7070 -- -- -- -- -- --
제조예 4Preparation Example 4 3030 -- -- -- 7070 -- -- -- -- -- --
제조예 5Preparation Example 5 3030 -- -- -- -- 7070 -- -- -- -- -- --
제조예 6Preparation Example 6 3030 6565 -- -- -- -- -- -- 55 -- -- --
제조예 7Preparation Example 7 3030 6565 -- -- -- -- -- -- -- 55 -- --
제조예 8Preparation Example 8 3030 6565 -- -- -- -- -- -- -- -- 55 --
제조예 9Preparation Example 9 3030 6565 -- -- -- -- -- -- -- -- -- 55
제조예 10Preparation Example 10 3030 -- -- -- -- -- 7070 -- -- -- -- --
제조예 11Preparation Example 11 3030 -- -- -- -- -- 6565 -- 55 -- -- --
제조예 12Preparation Example 12 3030 -- -- -- -- -- 6565 -- -- -- -- 55
제조예 13Preparation Example 13 3030 -- -- -- -- -- -- 6565 55 -- -- --
A: 제조예 1에 따른 양자점D-1 : Disperbyk-111 (빅케미사제, 인산에스테르계 분산제)D-2 : Disperbyk-103 (빅케미사제, 인산에스테르계 분산제)D-3 : Disperbyk-161 (빅케미사제, 우레탄계 분산제)D-4 : Disperbyk-2001 (빅케미사제, 아크릴계 분산제)A: Quantum dot according to Preparation Example 1 D-1: Disperbyk-111 (manufactured by BICKEM Co., Ltd., phosphate ester dispersant) Vicchemy, urethane dispersant) D-4: Disperbyk-2001 (Vicchemy, acrylic dispersant)
제1 용제Primary solvent 유전상수(ε) @ 20℃Dielectric constant (ε) @ 20 ℃
B-1: Dipropylene glycol dimethyl etherB-1: Dipropylene glycol dimethyl ether 10.510.5
B-2: Dipropylene Glycol Methyl Ether AcetateB-2: Dipropylene Glycol Methyl Ether Acetate 8.38.3
B-3: Hexyl acetateB-3: Hexyl acetate 4.424.42
B-4: diethyl carbonateB-4: diethyl carbonate 2.822.82
B-5: 2,6-dimethyl-4-heptanoneB-5: 2,6-dimethyl-4-heptanone 9.919.91
B-6: PGME(propylene glycol methyl ether)B-6: propylene glycol methyl ether (PGME) 12.312.3
B-7: DAA(Diacetone Alcohol)B-7: DAA (Diacetone Alcohol) 18.218.2
실시예Example  And 비교예Comparative example :  : 자발광Self-luminescence 감광성 수지 조성물의 제조 Preparation of Photosensitive Resin Composition
하기 표 3에 따른 조성으로 실시예 및 비교예에 따른 자발광 감광성 수지 조성물을 제조하였다.To prepare a self-luminous photosensitive resin composition according to Examples and Comparative Examples to the composition according to Table 3.
실시예Example 비교예Comparative example
1One 22 33 44 55 66 77 88 99 1One 22 33 44
양자점 분산체 (A') Quantum Dot Dispersion (A ') 제조예 1Preparation Example 1 4040 -- -- -- -- -- -- -- -- -- -- -- --
제조예 2Preparation Example 2 -- 4040 -- -- -- -- -- -- -- -- -- -- --
제조예 3Preparation Example 3 -- 4040 -- -- -- -- -- -- -- -- -- --
제조예 4Preparation Example 4 -- -- -- 4040 -- -- -- -- -- -- -- -- --
제조예 5Preparation Example 5 -- -- -- -- 4040 -- -- -- -- -- -- -- --
제조예 6Preparation Example 6 -- -- -- -- -- 4040 -- -- -- -- -- -- --
제조예 7Preparation Example 7 -- -- -- -- -- -- 4040 -- -- -- -- -- --
제조예 8Preparation Example 8 -- -- -- -- -- -- -- 4040 -- -- -- -- --
제조예 9Preparation Example 9 -- -- -- -- -- -- -- -- 4040 -- -- -- --
제조예 10Preparation Example 10 -- -- -- -- -- -- -- -- -- 4040 -- -- --
제조예 11Preparation Example 11 -- -- -- -- -- -- -- -- -- -- 4040 -- --
제조예12Preparation Example 12 -- -- -- -- -- -- -- -- -- -- -- 4040 --
제조예 13Preparation Example 13 -- -- -- -- -- -- -- -- -- -- -- -- 4040
알칼리가용성 수지 (B')Alkali-soluble resin (B ') 2020 2020 2020 2020 2020 2020 2020 2020 2020 2020 2020 2020 2020
광중합성 화합물(C')Photopolymerizable Compound (C ') 2020 2020 2020 2020 2020 2020 2020 2020 2020 2020 2020 2020 2020
광중합 개시제(D')Photoinitiator (D ') 55 55 55 55 55 55 55 55 55 55 55 55 55
제2 용제(E')Second solvent (E ') 1515 1515 1515 1515 1515 1515 1515 1515 1515 1515 1515 1515 1515
A': 제조예 3에 따른 양자점 분산체B': 제조예 2에 따른 알칼리 가용성 수지C': 디펜타에리트리톨헥사아크릴레이트(KAYARAD DPHA; 닛본 카야꾸 ㈜ 제조)D': Irgacure-907 (BASF사)E': 프로필렌글리콜모노메틸에테르아세테이트(PGMEA)A ': Quantum dot dispersion B' according to Preparation Example 3 'Alkali-soluble resin C' according to Preparation Example 2 C: Dipentaerythritol hexaacrylate (KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.) D ': Irgacure-907 (BASF E ': propylene glycol monomethyl ether acetate (PGMEA)
컬러필터(Color filter Glass기판Glass substrate )의 제조Manufacturing
상기 실시예 및 비교예에 따라 제조된 자발광 감광성 수지 조성물을 이용하여 컬러필터를 제조하였다. 구체적으로, 각각의 자발광 감광성 수지 조성물을 스핀 코팅법으로 유리 기판 위에 도포한 다음, 가열판 위에 놓고 100℃의 온도에서 3분간 유지하여 박막을 형성시켰다. 이어서 상기 박막 위에 가로×세로 20mm×20mm 정사각형의 투과 패턴과 1㎛ 내지 100㎛의 라인/스페이스 패턴을 갖는 시험 포토마스크를 올려놓고 시험 포토마스크와의 간격을 100㎛로 하여 자외선을 조사하였다. 이때, 자외선 광원은 우시오 덴끼㈜제의 초고압 수은 램프(상품명 USH-250D)를 이용하여 대기 분위기하에 200mJ/cm2의 노광량(365㎚)으로 광조사하였으며, 특별한 광학 필터는 사용하지 않았다. 상기에서 자외선이 조사된 박막을 pH 10.5의 KOH 수용액 현상 용액에 80초 동안 담궈 현상하였다. 이 박막이 입혀진 유리판을 증류수를 사용하여 세척한 다음, 질소 가스를 불어서 건조하고, 150℃의 가열 오븐에서 10분 동안 가열하여 컬러필터 패턴을 제조하였다. 상기에서 제조된 자발광 컬러 패턴의 필름 두께는 3.0㎛이었다.The color filter was manufactured using the self-luminous photosensitive resin composition prepared according to the above Examples and Comparative Examples. Specifically, each self-luminous photosensitive resin composition was applied on a glass substrate by spin coating, and then placed on a heating plate and maintained at a temperature of 100 ° C. for 3 minutes to form a thin film. Subsequently, a test photomask having a transmissive pattern of horizontal × vertical 20 mm × 20 mm squares and a line / space pattern of 1 μm to 100 μm was placed on the thin film and irradiated with ultraviolet rays at a distance of 100 μm from the test photomask. At this time, the ultraviolet light source was irradiated with an exposure amount (365 nm) of 200 mJ / cm 2 under an atmospheric atmosphere using an ultra high pressure mercury lamp (trade name USH-250D) manufactured by Ushio Denki Co., Ltd., and no special optical filter was used. The thin film irradiated with ultraviolet rays was developed by soaking for 80 seconds in a KOH aqueous solution developing solution of pH 10.5. The thin film coated glass plate was washed with distilled water, dried by blowing nitrogen gas, and heated in a heating oven at 150 ° C. for 10 minutes to prepare a color filter pattern. The film thickness of the self-luminous color pattern prepared above was 3.0 μm.
실험예Experimental Example
(1) 양자점 분산체 및 자발광 감광성 수지 조성물의 분산입도 측정(1) Dispersion particle size measurement of quantum dot dispersion and self-luminous photosensitive resin composition
ELSZ-2000ZS(오츠카사 제)을 이용하여 분산입도를 측정한 뒤 하기 표 4에 나타내었다. 통상 양자점 입자가 응집되면 분산입도는 커지게 되고, 이에 따라 발광특성이 떨어지는 문제를 야기할 수 있다.Dispersion particle size was measured using ELSZ-2000ZS (manufactured by Otsuka Co., Ltd.), and is shown in Table 4 below. In general, when the quantum dot particles are agglomerated, the dispersion particle size becomes large, thereby causing a problem in that the luminescence property is degraded.
(2) 광발광 강도 (photoluminescence Intensity) 측정(2) photoluminescence intensity measurement
자발광 화소가 형성된 컬러필터 중 20mm × 20mm 정사각형의 패턴으로 형성된 패턴부에 365nm형 4W UV 조사기(VL-4LC, VILBER LOURMAT)를 통하여 광 변환된 영역을 측정하였으며, 광변환된 발광 강도를 Spectrum meter USB2000+(Ocean Optics사 제)를 이용하여 측정하였다. 측정된 광발광 강도(photoluminescence Intensity)가 높을수록 우수한 자발광 특성을 발휘하는 것으로 판단할 수 있으며, 광발광 강도(photoluminescence Intensity) 측정결과를 하기 표 4에 나타내었다. Among the color filters in which the self-luminous pixels were formed, the light-converted area was measured by a 365nm-type 4W UV irradiator (VL-4LC, VILBER LOURMAT) in the pattern part formed by the pattern of 20mm × 20mm square, It measured using USB2000 + (made by Ocean Optics). As the measured photoluminescence intensity is higher, it can be determined to exhibit excellent self-luminescence characteristics, and the results of photoluminescence intensity measurement are shown in Table 4 below.
양자점 분산체 입도(nm)Quantum dot dispersion particle size (nm) 자발광 감광성 수지조성물 입도 (nm)Self-luminous photosensitive resin composition particle size (nm) 광발광 강도(photoluminescence Intensity)Photoluminescence intensity
실시예1Example 1 77 88 53,27553,275
실시예2Example 2 88 99 55,93555,935
실시예3Example 3 88 88 59,35459,354
실시예4Example 4 77 77 53,21553,215
실시예5Example 5 88 77 54,25254,252
실시예6Example 6 77 88 58,44658,446
실시예7Example 7 99 1010 57,24357,243
실시예8Example 8 77 88 55,65855,658
실시예9Example 9 88 99 54,98254,982
비교예1Comparative Example 1 1515 11521152 18,54218,542
비교예2Comparative Example 2 1313 921921 25,65425,654
비교예3Comparative Example 3 1515 865865 28,56928,569
비교예4Comparative Example 4 3535 26712671 6,1796,179
상기 표 4를 보면 알 수 있듯이, 양자점 분산체 제조 시 유전상수 12 미만의 용제를 사용함으로써 매우 우수한 분산특성과 함께 뛰어난 광발광(Photoluminescence) 양자 효율을 갖는 양자점 분산체의 제공이 가능하였다.As can be seen from Table 4, it was possible to provide a quantum dot dispersion having excellent photoluminescence quantum efficiency with excellent dispersion characteristics by using a solvent having a dielectric constant of less than 12 when manufacturing the quantum dot dispersion.

Claims (9)

  1. 양자점; 및Quantum dots; And
    유전상수가 20℃에서 12.0 미만인 제1 용제;를 포함하고,A dielectric constant of less than 12.0 at 20 ° C .;
    단, 할로겐화 탄화수소계 용제; 방향족 탄화수소계 용제; 및 지방족 포화 탄화수소계 용제;를 포함하지 않는 양자점 분산체.However, halogenated hydrocarbon solvents; Aromatic hydrocarbon solvents; And aliphatic saturated hydrocarbon solvents.
  2. 제1항에 있어서,The method of claim 1,
    상기 제1 용제는 유전상수가 20℃에서 8.0 미만인 것인 양자점 분산체.The first solvent is a quantum dot dispersion having a dielectric constant of less than 8.0 at 20 ℃.
  3. 제2항에 있어서,The method of claim 2,
    상기 제1 용제는 유전상수가 20℃에서 6.0 미만인 것인 양자점 분산체.The first solvent is a quantum dot dispersion having a dielectric constant of less than 6.0 at 20 ℃.
  4. 제1항에 있어서,The method of claim 1,
    상기 제1 용제는 메틸 이소아밀 케톤, 디이소부틸 케톤, 디에틸 카보네이트, 부틸 아세테이트, 이소부틸 아세테이트, 이소아밀 아세테이트, 이소부틸 이소부티레이트, 2-에틸헥실 아세테이트, 헥실 아세테이트, 네릴 아세테이트, 디프로필렌 글리콜 디메틸 에테르 및 디프로필렌 글리콜 메틸 에테르 아세테이트, 에틸 o-포르메이트, 에틸 부티레이트, 디에틸 아세탈, 메틸 헥사노에이트, 메틸 옥타노에이트, 에틸 이소발러레이트, 메틸 3-메틸부타노에이트, 이소펜틸 3-메틸부타노에이트, 이소펜틸 부타노에이트, 에틸 메틸 카보네이트, 펜틸 펜타노에이트, 이소아밀 프로피어네이트, 이소부틸 이소발러레이트, 프로필 이소발러레이트, 2-(2-(비닐옥시)에톡시)프로판, 1-알릴옥시-2-이소프록시-에탄, (2-이소부톡시-에톡시)-에텐, 1-비닐옥시-2-이소펜톡시-에탄, 1-비닐옥시-2-펜톡시-에탄로 이루어진 군에서 선택되는 1 이상을 포함하는 것인 양자점 분산체.The first solvent is methyl isoamyl ketone, diisobutyl ketone, diethyl carbonate, butyl acetate, isobutyl acetate, isoamyl acetate, isobutyl isobutyrate, 2-ethylhexyl acetate, hexyl acetate, neryl acetate, dipropylene glycol Dimethyl ether and dipropylene glycol methyl ether acetate, ethyl o-formate, ethyl butyrate, diethyl acetal, methyl hexanoate, methyl octanoate, ethyl isovalerate, methyl 3-methylbutanoate, isopentyl 3- Methylbutanoate, isopentyl butanoate, ethyl methyl carbonate, pentyl pentanoate, isoamyl propionate, isobutyl isovalerate, propyl isovalerate, 2- (2- (vinyloxy) ethoxy) propane , 1-allyloxy-2-isoproxy-ethane, (2-isobutoxy-ethoxy) -ethene, 1-vinyloxy-2-isopentoxy-ethane, 1- A quantum dot dispersion comprising one or more selected from the group consisting of vinyloxy-2-pentoxy-ethane.
  5. 제1항에 있어서,The method of claim 1,
    상기 양자점 분산체는 인산 에스테르계 분산제, 아크릴계 분산제 및 우레탄계 분산제로 이루어진 군에서 선택되는 1 이상을 더 포함하는 것인 양자점 분산체.The quantum dot dispersion is a quantum dot dispersion further comprises one or more selected from the group consisting of a phosphate ester dispersant, an acrylic dispersant and a urethane-based dispersant.
  6. 제1항 내지 제5항 중 어느 한 항에 따른 양자점 분산체; 및A quantum dot dispersion according to any one of claims 1 to 5; And
    광중합성 화합물; 알칼리 가용성 수지; 광중합 개시제; 및 제2 용제로 이루어진 군에서 선택되는 1종 이상을 더 포함하는 자발광 감광성 수지 조성물.Photopolymerizable compounds; Alkali-soluble resins; Photopolymerization initiator; And at least one member selected from the group consisting of a second solvent.
  7. 제6항에 있어서,The method of claim 6,
    상기 양자점 분산체는 상기 자발광 감광성 수지 조성물 전체 100 중량부에 대하여 3 내지 80 중량부로 포함되는 것인 자발광 감광성 수지 조성물.The quantum dot dispersion is self-luminous photosensitive resin composition which is contained in 3 to 80 parts by weight based on 100 parts by weight of the total of the self-luminous photosensitive resin composition.
  8. 제6항에 따른 자발광 감광성 수지 조성물의 경화물을 포함하는 컬러필터.The color filter containing the hardened | cured material of the self-luminous photosensitive resin composition of Claim 6.
  9. 제8항에 따른 컬러필터를 포함하는 화상표시장치.An image display apparatus comprising the color filter according to claim 8.
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020055911A (en) * 2018-09-28 2020-04-09 山陽色素株式会社 Production method of quantum dot dispersion and quantum dot dispersion
JP2020166131A (en) * 2019-03-29 2020-10-08 山陽色素株式会社 Quantum dot dispersion and composition for coating film formation including quantum dot dispersion

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102028968B1 (en) * 2016-10-20 2019-10-07 동우 화인켐 주식회사 Quantum dot dispersion, self emission type photosensitive resin composition comprising the same, color filter and image display device produced using the same
KR102554285B1 (en) * 2017-02-03 2023-07-10 동우 화인켐 주식회사 Quantum Dot Dispersion, Self Emission Type Photosensitive Resin Composition, Color Filter and Display Device
JP7024336B2 (en) * 2017-11-10 2022-02-24 Dic株式会社 Ink composition, light conversion layer and color filter
CN110590549A (en) * 2019-09-30 2019-12-20 京东方科技集团股份有限公司 Ligand, quantum dot and patterning method of quantum dot layer
JP2021161393A (en) * 2020-03-31 2021-10-11 住友化学株式会社 Curable resin composition and display device
CN113956881B (en) * 2021-11-02 2023-05-26 西安文理学院 Terbium-doped lanthanum fluoride nano particle, sol-gel hybrid material and preparation method
JP2024054521A (en) * 2022-10-05 2024-04-17 信越化学工業株式会社 Photosensitive resin composition, photosensitive resin film, pattern formation method, and light-emitting element

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20100053409A (en) * 2008-11-11 2010-05-20 삼성전자주식회사 Photosensitive quantum dot, composition comprising the same and method for fabricating a pattern-including quantum dot using the composition
KR20160043860A (en) * 2014-10-14 2016-04-22 동우 화인켐 주식회사 Photosensitive resin composition
KR20160059546A (en) * 2014-11-18 2016-05-27 주식회사 상보 Manufacturing method of alloy-shell quantum dot, alloy-shell quantum dot and backlight unit including same
KR20160079218A (en) * 2014-12-26 2016-07-06 주식회사 엘지화학 Quantum dot composition and color conversion film comprising the same
KR20160097445A (en) * 2015-02-06 2016-08-18 삼성디스플레이 주식회사 Photosensitive resin composition and display panel

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103597546A (en) * 2011-06-20 2014-02-19 丰田自动车株式会社 Solid electrolyte microparticle production method
KR102223504B1 (en) 2013-09-25 2021-03-04 삼성전자주식회사 Quantum dot-resin nanocomposite and method of preparing same
KR102092165B1 (en) * 2014-09-23 2020-03-23 동우 화인켐 주식회사 Photosensitive resin composition
KR101879016B1 (en) * 2014-11-21 2018-07-16 동우 화인켐 주식회사 Self emission type photosensitive resin composition, color filter manufactured using thereof and image display device having the same
KR20160069393A (en) 2014-12-08 2016-06-16 엘지전자 주식회사 Method for manufacturing light conversion composite, light conversion film, backlight unit and display device comprising the same
KR102230594B1 (en) * 2014-12-26 2021-03-22 엔에스 마테리얼스 아이엔씨. Wavelength conversion member and method for manufacturing same
KR102116971B1 (en) * 2015-01-23 2020-06-02 삼성디스플레이 주식회사 Photosensitive resin composition and display device
JP6448397B2 (en) * 2015-02-02 2019-01-09 富士フイルム株式会社 Phosphor dispersion composition and fluorescent molded body, wavelength conversion film, wavelength conversion member, backlight unit, and liquid crystal display device obtained by using the same
KR102028968B1 (en) * 2016-10-20 2019-10-07 동우 화인켐 주식회사 Quantum dot dispersion, self emission type photosensitive resin composition comprising the same, color filter and image display device produced using the same

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20100053409A (en) * 2008-11-11 2010-05-20 삼성전자주식회사 Photosensitive quantum dot, composition comprising the same and method for fabricating a pattern-including quantum dot using the composition
KR20160043860A (en) * 2014-10-14 2016-04-22 동우 화인켐 주식회사 Photosensitive resin composition
KR20160059546A (en) * 2014-11-18 2016-05-27 주식회사 상보 Manufacturing method of alloy-shell quantum dot, alloy-shell quantum dot and backlight unit including same
KR20160079218A (en) * 2014-12-26 2016-07-06 주식회사 엘지화학 Quantum dot composition and color conversion film comprising the same
KR20160097445A (en) * 2015-02-06 2016-08-18 삼성디스플레이 주식회사 Photosensitive resin composition and display panel

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020055911A (en) * 2018-09-28 2020-04-09 山陽色素株式会社 Production method of quantum dot dispersion and quantum dot dispersion
JP7219950B2 (en) 2018-09-28 2023-02-09 山陽色素株式会社 Quantum dot dispersion manufacturing method and quantum dot dispersion
JP2020166131A (en) * 2019-03-29 2020-10-08 山陽色素株式会社 Quantum dot dispersion and composition for coating film formation including quantum dot dispersion

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