WO2018038522A1 - Pointe d'ongle et procédé de production de pointe d'ongle - Google Patents

Pointe d'ongle et procédé de production de pointe d'ongle Download PDF

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Publication number
WO2018038522A1
WO2018038522A1 PCT/KR2017/009193 KR2017009193W WO2018038522A1 WO 2018038522 A1 WO2018038522 A1 WO 2018038522A1 KR 2017009193 W KR2017009193 W KR 2017009193W WO 2018038522 A1 WO2018038522 A1 WO 2018038522A1
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WO
WIPO (PCT)
Prior art keywords
layer
pattern
dimensional film
coated
nail
Prior art date
Application number
PCT/KR2017/009193
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English (en)
Korean (ko)
Inventor
강명석
박성한
Original Assignee
주식회사 엔에스디자인
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Publication of WO2018038522A1 publication Critical patent/WO2018038522A1/fr

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    • A—HUMAN NECESSITIES
    • A44—HABERDASHERY; JEWELLERY
    • A44C—PERSONAL ADORNMENTS, e.g. JEWELLERY; COINS
    • A44C15/00—Other forms of jewellery
    • A—HUMAN NECESSITIES
    • A45—HAND OR TRAVELLING ARTICLES
    • A45D—HAIRDRESSING OR SHAVING EQUIPMENT; EQUIPMENT FOR COSMETICS OR COSMETIC TREATMENTS, e.g. FOR MANICURING OR PEDICURING
    • A45D31/00—Artificial nails
    • A—HUMAN NECESSITIES
    • A44—HABERDASHERY; JEWELLERY
    • A44C—PERSONAL ADORNMENTS, e.g. JEWELLERY; COINS
    • A44C15/00—Other forms of jewellery
    • A44C15/0045—Jewellery specially adapted to be worn on a specific part of the body not fully provided for in groups A44C1/00 - A44C9/00
    • A44C15/0075—Jewellery specially adapted to be worn on a specific part of the body not fully provided for in groups A44C1/00 - A44C9/00 on the hand or nails
    • A44C15/008—Jewellery specially adapted to be worn on a specific part of the body not fully provided for in groups A44C1/00 - A44C9/00 on the hand or nails on the nails
    • A—HUMAN NECESSITIES
    • A44—HABERDASHERY; JEWELLERY
    • A44C—PERSONAL ADORNMENTS, e.g. JEWELLERY; COINS
    • A44C27/00—Making jewellery or other personal adornments
    • A—HUMAN NECESSITIES
    • A45—HAND OR TRAVELLING ARTICLES
    • A45D—HAIRDRESSING OR SHAVING EQUIPMENT; EQUIPMENT FOR COSMETICS OR COSMETIC TREATMENTS, e.g. FOR MANICURING OR PEDICURING
    • A45D29/00—Manicuring or pedicuring implements
    • A45D29/18—Manicure or pedicure sets, e.g. combinations without case, etui, or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C45/00—Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C3/00—Processes, not specifically provided for elsewhere, for producing ornamental structures
    • B44C3/02—Superimposing layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C45/00—Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
    • B29C2045/0086—Runner trees, i.e. several articles connected by a runner

Definitions

  • the present invention relates to a nail tip and a method for manufacturing the nail tip.
  • Nail tips such as accessories for beauty or decoration, are attached to a person's nails, etc. make the nails look more beautiful.
  • Nail tips are readily available on the market and are common enough to be used by private beauty shops or individuals.
  • nail tips have become commonplace, and various researches are being conducted on nail tips that can provide a beauty different from the competition.
  • Nail tips and a method for manufacturing a nail tip according to an embodiment of the present invention is to provide a nail tip that can provide a three-dimensional impression.
  • the nail body including a curved surface; A three-dimensional film formed to have a concave-convex pattern formed in the base layer to be seen in three dimensions, and bent to cover the curved surface of the nail body; And it is provided a nail tip comprising an adhesive portion for bonding the three-dimensional film and the nail body.
  • preparing a nail body having a curved surface Inserting the three-dimensional film formed so that the uneven pattern formed on the base layer appears three-dimensionally in the mold part; Bending the three-dimensional film by applying heat to the mold; And combining the three-dimensional film and the nail body such that the ridge portion of the three-dimensional film corresponds to the curved surface of the nail body.
  • Nail tips and a method for manufacturing a nail tip according to an embodiment of the present invention is to provide a nail tip that can provide a three-dimensional effect by attaching a three-dimensional film to the nail body.
  • FIG. 1A to 1D illustrate a method for manufacturing a nail tip according to an embodiment of the present invention.
  • FIG. 2 is a side view schematically showing a three-dimensional film.
  • FIG. 3 is an enlarged side view of the color conversion layer illustrated in FIG. 2.
  • FIG. 4 is a side view illustrating an image in which light reflected by the pattern layer of the base layer illustrated in FIG. 3 is directed to both eyes.
  • FIG. 5 is a modified example of FIG. 2.
  • FIG. 6 is a flowchart illustrating a method for manufacturing the three-dimensional film of FIG. 2.
  • FIG. 7 is a side view schematically showing a glass master specimen manufactured according to the method of FIG. 6.
  • FIG. 8 is a side view schematically showing a three-dimensional film according to a second embodiment.
  • FIG. 9 is a modification of FIG. 8.
  • FIG. 10 is a flowchart illustrating a method for manufacturing the three-dimensional film of FIG. 8.
  • FIG. 11 illustrates slot masks for depositing on a base layer according to the method of FIG. 10.
  • FIG. 13 shows an example of the shape of a pattern portion.
  • 14A to 14D show a method of manufacturing the three-dimensional film of FIG. 12.
  • 15 is for explaining a manufacturing method of a general three-dimensional film.
  • 18A to 18C show a change in focal length according to the protection part.
  • a nail body 11 having a curved surface is prepared.
  • the nail body 11 may be made of resin, but is not limited thereto.
  • Nail body 11 may be made of a transparent material, a translucent material or a material that is difficult to transmit light.
  • the nail body 11 may have various colors such as colored or achromatic.
  • the plurality of nail bodies 11 may be connected by the connecting member 10, but a nail body 11 that is not connected to the connecting member 10 may be prepared.
  • the user can remove the nail tip from the connecting member 10 whenever necessary according to the embodiment of the present invention.
  • FIG. 1A a cross-sectional view of the nail body 11 is shown. As can be seen from the cross-sectional view, the nail body 11 may have a curved surface.
  • the three-dimensional film 15 formed to have a three-dimensional pattern of the uneven shape formed on the base layer is inserted into the mold part 13.
  • the three-dimensional film 15 will be described in detail later with reference to the drawings.
  • the mold part 13 is to bend the three-dimensional film 15, and one side surface of the upper part of the mold part 13 may have a concave curved surface so as to correspond to the curved surface of the nail body 11, One side of the bottom may have a convex curved surface.
  • the curvature of the curved surface of the mold part 13 may be the same as or different from the curvature of the nail body 11.
  • the three-dimensional film 15 is bent by applying heat to the mold part 13. That is, the mold parts 13 located on both sides of the three-dimensional film 15 move toward the three-dimensional film 15 to apply force and heat to the three-dimensional film 15. Thereby, the three-dimensional film 15 is bent.
  • the mold part 13 may supply the heat of 150 degrees or more and 250 degrees or less to the three-dimensional film 15 to bend the three-dimensional film 15.
  • the three-dimensional film 15 may not be sufficiently bent.
  • the resin material constituting the three-dimensional film 15 may be melted to deform or break the shape of the three-dimensional film 15.
  • the three-dimensional film 15 and the nail body 11 are coupled to each other so that the curved portion of the three-dimensional film 15 corresponds to the curved surface of the nail body 11.
  • the combination of the three-dimensional film 15 and the nail body 11 may use an adhesive portion 17 such as an adhesive or an adhesive sheet, but is not limited thereto.
  • the nail tip according to an embodiment of the present invention is formed so that the nail body 11 including the curved surface, the concave-convex pattern formed on the base layer is three-dimensionally visible, and the three-dimensional film bent to cover the curved surface of the nail body 11. 15, an adhesive part 17 for coupling the nail body 11 and the three-dimensional film 15 to each other.
  • the adhesive part 17 may be in a state of being previously attached to the three-dimensional film 15, or may be provided separately from the three-dimensional film 15 and attached to the three-dimensional film 15 and the nail body 11 in a manufacturing process.
  • the three-dimensional film 15 may be bent by the curvature of the curved surface of the nail body (11). As described above, the three-dimensional film 15 may be bent by the mold portion 13, wherein the degree of warpage is equal to the curvature of the curved surface of the nail body 11 between the three-dimensional film 15 and the nail body. Since the gap is reduced, the alignment and bonding of the nail body and the three-dimensional film 15 can be made smoothly.
  • the three-dimensional film may be formed in a plurality of nanostructures spaced apart from each other to form a fine pattern of the multi-layered form of one or two or more layers of the step shape.
  • the first embodiment may be processed by coating a color conversion layer having a multi-coating layer on a plurality of formed base layers spaced apart from each other in a staircase shape.
  • the color conversion layer may be formed by sequentially depositing a reflective layer or total reflection layer, a dielectric layer, a transparent layer, or a translucent layer.
  • the second embodiment is vacuum deposition on the base layer, the reflective layer or the total reflection layer, the stepped multilayer dielectric layer, and the transparent layer or translucent layer may be sequentially deposited and formed.
  • each layer may be gradually narrowed in width in the height direction on the side, or may be molded so that the area on the plane becomes narrow.
  • the three-dimensional film made of such a nanostructure may be expressed as the color of each layer as the viewing angle, the color of each layer is mixed with each other two or three or more may be mixed to express a new color
  • These colors may be expressed the same or different from layer to layer. That is, the depth can be expressed along with the multi-color and multi-color color conversion.
  • the three-dimensional film according to the first embodiment of the present invention includes a nanostructure 100 and a protective film layer 300.
  • the nanostructure 100 is formed by processing the base layer 110 so that a plurality of pattern layers 120 having a substantially stair-shaped pattern are spaced apart from each other, and the color conversion layer 130 is coated on the base layer 110.
  • the pattern layer 120 of the base layer 110 is an example, as shown in FIG. 3, the base layer 121, the primary pattern layer 122, the secondary pattern layer 123, and the tertiary pattern layer 124. It consists of four layers, including the pattern layer 120, can be molded in three places on the side.
  • the pattern layer 120 may be molded in addition to the base layer 121, only the primary pattern layer 122, only the first and second pattern layers 122 and 123 may be formed, 1,2,3rd pattern layer Higher pattern layers, including (122, 123, 124), may be molded, as well as one, two, or four or more on the side.
  • the spacing between the pattern layers 120 may be constant or may not be constant.
  • the pattern layer 120 may be formed independently of each other, may have a step shape on only one surface, may have a step shape on two or more surfaces, and may be formed into a polygon including a plane, a circle, a triangle, a rectangle, a pentagon, and a hexagon. Can be.
  • the primary pattern layer 122 may have a larger surface area than the secondary pattern layer 123, and the secondary pattern layer 123 may have a larger surface area than the tertiary pattern layer 124.
  • the base layer 110 may be a resin-based film.
  • the film is polyethylene terephthalate (PET), polycarbonate (PC; polycabonate), polyvinyl chloride (PVC; polyvinyl chloride), thermoplastic polyurethane resin (TPU) and polypropylene (PP; polypropylene ), Or may be a hard or soft transparent material, in addition, may be an opaque material.
  • the color conversion layer 130 includes a reflective layer 131, a dielectric layer 132, and a transparent layer 133 sequentially coated on the base layer 110 having the pattern layer 120.
  • the reflective layer 131 may be replaced by a partial reflective layer or a total reflective layer
  • the transparent layer 133 may be replaced by a translucent layer.
  • the reflective layer 131 is coated over the base layer 110.
  • the reflective layer 131 may be manufactured by coating a metal material having high reflectance by vacuum deposition in a visible light region such as aluminum (Al), silver (Ag), and gold (Au), and have a mirror-like function.
  • the reflective layer 131 may be uniformly coated over the entire area of the base layer 110, and may be coated only on the 1,2,3rd pattern layers 122, 123, and 124 as another example.
  • the first and second pattern layers 122, 123, and 124 may be coated only on a part of the base layer 121 between the pattern layers.
  • the reflective layer 131 is preferably made of gold, which is beautiful, easy to process, and does not discolor or corrode, and has an excellent reflecting effect to reflect about 98% of incident infrared rays.
  • the reflective layer 131 may include all of a metallic material that can obtain a reflection effect in addition to aluminum, silver, and gold.
  • the reflective layer 131 may be manufactured by a retroreflective method in which fine glass beads or fine reflective materials are coated to return incident light in the same direction, and the incident light is coated in various directions by coating glass beads or reflective materials. It may be produced in a diffuse reflection method to be reflected, or may be produced in a specular reflection method in which the incident light is reflected in a predetermined direction by making a smooth surface.
  • a diffuse reflection method is preferable.
  • This diffuse reflection method allows the hemispherical glass beads or reflecting materials to be placed and coated at random angles, or the glass beads or reflecting materials are coated so that the coating surface is irregularly bumpy so that the incident light can be reflected in an unexpected direction. .
  • the diffuse reflection method or the specular reflection method may divide the flat surface and reflect the light in a predetermined direction so that the light may be reflected in various predictable directions.
  • Dielectric layer 132 is coated over reflective layer 131.
  • the dielectric layer 132 may be evenly formed over the entire area of the reflective layer 131.
  • the dielectric layer 132 may be coated by vacuum deposition with a silicon oxide film (SiO 2), and various color conversion effects may be obtained by adjusting the thickness to approximately 200 to 550 nm.
  • SiO 2 silicon oxide film
  • the dielectric layer 132 is molded in various thicknesses for some or each of the pattern layers 120, and the heights of the dielectric layers 132 are different for each of the pattern layers 120 such as the heights h1 and h2 of the nanostructure 100. Can be.
  • various color conversion effects of the nanostructure 100 may be provided as well as a sense of depth depending on the thickness of the dielectric layer 132.
  • the thickness setting of the dielectric layer 132 may vary depending on the color to be expressed, and the number may also vary as necessary.
  • the same effect as the thickness change of the dielectric layer 132 may be obtained by varying the heights of at least one of the 1,2,3rd pattern layers 122,123,124, and the 1,2,3rd pattern layers 122,123,124 and the dielectric layer.
  • the thickness change of 132 may be set at the same time to express more various colors and depths.
  • the transparent layer 133 is molded over the dielectric layer 132.
  • the transparent layer 133 may be any material as long as it is a transparent material, and in particular, may be made of chromium (Cr) material.
  • the transparent layer 133 may be appropriately selected to suit the desired color conversion effect because the color observed from the outside may vary depending on optical characteristics such as transparency or refractive index.
  • the transparent layer 133 may be a simple unprinted surface, or the surface may be printed after the primer coating.
  • a primer-coated transparent printed layer may be molded, or a transparent primer-coated printed layer may be molded on the transparent layer 133.
  • the nanostructure 100 formed as described above is dispersed in four layers of the base layer 121 and the first, second, and third pattern layers 122, 123, and 124, and thus directly in four layers.
  • the reflected single color or the diffracted mixed color is induced to both eyes of the observer, so that the multicolor and depth can be realized (see FIG. 4).
  • the diffraction angle of the light may be changed because the distance between layers of the adjacent pattern layers 120 with respect to the flat surface is changed.
  • the three-dimensional film is, for example, a phenomenon in which two colors are mixed in a plane where the color diffracted in each layer may be expressed by mixing three or more colors, and thus, more various colors may be expressed.
  • the protective film layer 300 is molded on the color conversion layer 130.
  • the protective film layer 300 may be a transparent resin including acrylate and the like.
  • the protective film layer 300 prevents damage that may occur in the process of attaching the three-dimensional film 15 to the nail body 11, and the impact generated during the actual use of the nail tip to which the three-dimensional film 15 is attached.
  • the base layer can be protected from pollution and living gas.
  • a through hole 150 formed through the reflective layer 131 and the dielectric layer 132 in the direction may be further provided.
  • the print layer 140 is printed on the pattern layer 120 by printing letters or numbers, patterns, etc. of the three-dimensional film.
  • the printed layer 140 may be coated on a part or the entire area of the primary pattern layer 122, the secondary pattern layer 123, and / or the tertiary pattern layer 124.
  • the three-dimensional film is genuine or printed letters, numbers, symbols or patterns for the printing layer 140 may be printed. That is, the printed layer 140 on which letters, numbers, symbols, or patterns of each stereoscopic film are printed may be coated.
  • the print layer 140 may be coated by the number of letters, numbers, or patterns, and may be coated on the pattern layer 120 on any part of the three-dimensional film, and may be coated on one pattern layer 120 or a plurality of patterns.
  • the pattern layer 120 may be coated.
  • the through hole 150 is processed to form a space through the dielectric layer 132 while being upward of the printing layer 140. That is, the through hole 150 may be processed to pass through the reflective layer 131 and the dielectric layer 132 so that the print layer 140 is disposed therein.
  • the through-holes 150 are for checking the letters, numbers, symbols, or patterns printed on the print layer 140 through the naked eye from the outside.
  • the through-holes 150 are formed by color conversion of the reflective layer 131 and the dielectric layer 132. In order to prevent a phenomenon in which numbers, symbols, or patterns may not be recognized, they may be processed through the reflective layer 131 and the dielectric layer 132.
  • the through hole 150 may be further provided with a micro lens array layer having a convex lens function to enlarge and show letters, numbers, symbols, or patterns of the printing layer 140.
  • the through hole 150 may be further penetrated through the transparent layer 133.
  • the through hole 150 may be provided through deposition or etching using a slot mask when coating or depositing the reflective layer 131 or the dielectric layer 132.
  • a metal disc is produced (S10).
  • a photoresist, a photo-sensitive material is applied onto a glass substrate or a silicon substrate, and a laser, an electron beam, or an X-ray is exposed to the photoresist in two dimensions, and a developer is injected into the exposed photoresist.
  • the photoresist pattern is formed by developing a melted portion.
  • FIG. 7 illustrates a four-layered glass master specimen for fabricating a metal disc.
  • the first substrate mold is formed by exposing and developing a fine pattern corresponding to two layers to form two layers on a single layer base, and then performing hot heating. To produce.
  • the primary substrate mold may be manufactured in a temporary state without performing electro-plating through hot heating.
  • hot heating is performed to fabricate the secondary substrate mold in the state of the home state.
  • hot heating may be performed to fabricate the third substrate mold in the home state.
  • the primary pattern layer 122 formed on the base layer 110 has a larger exposed area than the secondary pattern layer 123, and the secondary pattern layer 123 has a larger exposed area than the tertiary pattern layer 124.
  • a fourth or more substrate mold can be produced, and a mold original plate of five or more layers can be produced.
  • UV curing embossing UV embossing
  • the base layer 110 is polyethylene terephthalate (PET), polycarbonate (PC; polycabonate), polyvinyl chloride (PVC), thermoplastic polyurethane resin (TPU; thermoplastic polyurethane), and polypropylene (PP; polypropylene).
  • PET polyethylene terephthalate
  • PC polycarbonate
  • PVC polyvinyl chloride
  • TPU thermoplastic polyurethane resin
  • PP polypropylene
  • the base layer 110 may be formed with the first, second, third order pattern layers 122, 123, and 124.
  • one or two pattern layers 120 or three or more pattern layers 120 may be molded.
  • the color conversion layer 130 of the nanostructure 100 is formed by applying a special coating to add a color conversion element by vacuum deposition on the molded fine pattern of the base layer 110 (S12).
  • the color conversion layer 130 may be formed by sequentially coating the reflective layer 131, the dielectric layer 132, and the transparent layer 133 on the base layer 110 by vacuum deposition.
  • the reflective layer 131 may be formed by at least one of the above-described retroreflection, diffuse reflection, and specular reflection.
  • a multi-color deposition of one color it may be a product having a three-dimensional effect and a monochromatic color of the nanostructure 100, which is an initial product of the first stage to obtain results similar to the nano-hologram region and the nano-stereoscopic region. This can be When three or more multi-coatings are applied to such an initial product, it may be a multi-layered, multi-color color converting three-dimensional film whose color changes depending on direction and time.
  • the color conversion layer 130 when the color conversion layer 130 is implemented using a local slot mask, different color change effects may be obtained for each of the multi-layered pattern layers 120. Can be used as a double security element.
  • the reflective layer 131 of the color conversion layer 130 may allow light and color to be reflected in various directions through a method such as retroreflection, diffuse reflection, or specular reflection.
  • the printed layer 140 is printed on the pattern layer 120 of the base layer 110 is printed letters, numbers, symbols or patterns. Before printing the reflective layer on the base layer 110, the printing layer 140 may be coated on the pattern layer 120. In addition, the printed layer 140 may be coated or attached after processing the through hole 150.
  • a through-hole 150 which is an empty space in the upper direction of the printed layer 140, is processed using a slot mask (S12-). 2).
  • the through hole 150 may be processed through the reflective layer 131 and the dielectric layer 132, and may be processed through the transparent layer 133.
  • a process of additionally providing a microlens array layer having a convex lens function to enlarge and show letters, numbers, symbols, or patterns of the printing layer 140 may be added to the through hole 150.
  • the primer film for attaching to the final product is coated and printed or the adhesive part 17 is molded (S13).
  • the adhesive part 17 may be provided on the side opposite to one surface on which the fine pattern is formed in the base layer 110.
  • the primer film coating printing may replace the transparent layer 133 of the color conversion layer 130, and may be coated and printed on the transparent layer 133.
  • the adhesive part 17 may be provided during manufacture of the three-dimensional film 15, or may be provided during the coupling of the three-dimensional film 15 and the nail body 11.
  • Multi-layered and multi-color three-dimensional color conversion three-dimensional film according to the present invention produced through the above process as shown in Figure 3, the light reflected from the base layer 121, the primary pattern while dispersing the image for each pattern layer 120
  • the light reflected from the layer 122, the light reflected from the secondary pattern layer 123, and the light reflected from the tertiary pattern layer 124 are reflected in a certain direction of rotation to both eyes of the observer.
  • By dividing and inducing it is possible to produce a nano-optical stereoscopic film that realizes stereoscopicization.
  • the three-dimensional film according to the second embodiment includes a nanostructure 100a, an adhesive part 17 (not shown in FIG. 8), and a protective film layer (not shown in FIG. 8). Is done.
  • This basic structure is the same as in the first embodiment.
  • the adhesive part, the protective film layer 300 is the same as the first embodiment, the description thereof will be replaced by the above description.
  • the nanostructure 100a is formed by coating a color conversion layer 130a in which a plurality of pattern layers having a substantially stepped shape are formed on the base layer 110.
  • the base layer 110 is a conventional flat form having a certain thickness.
  • the base layers 110a and 110 may be resin-based films.
  • the film is made of polyethylene terephthalate (PET), polycarbonate (PC; polycabonate), polyvinyl chloride (PVC), thermoplastic polyurethane (TPU), and polypropylene (PP). It may be any one of, in addition, it may be a rigid or soft transparent material, in addition, may be an opaque material.
  • the color conversion layer 130a includes a total reflection layer 134, dielectric layers 132-1, 132-2, and 132-3 that are sequentially coated as shown in FIG. 8, and a light transmitting layer 135.
  • the dielectric layers 132-1, 132-2, and 132-3 are deposited in a step shape through a plurality of slot masks to form the pattern layer 120a.
  • the color conversion layer 130a may be formed in a substantially stepped shape.
  • the total reflection layer 134 may be replaced with some reflective layer or semi-transparent reflective layer.
  • a totally reflective mirror 134 is evenly coated on the base layer 110.
  • the total reflection layer 134 is manufactured by coating a metal material having high reflectance in vacuum in the visible light region such as aluminum (Al), silver (Ag), and gold (Au) by vacuum deposition, and having a mirror-like reflection function. .
  • the total reflection layer 134 is preferably made of gold, which is beautiful, easy to process, and does not discolor or corrode, and has an excellent reflection effect to reflect about 98% of incident infrared rays.
  • the total reflection layer 134 may include all of a metallic material that can obtain a reflection effect in addition to aluminum, silver, and gold.
  • the total reflection layer 134 may be manufactured in a retroreflective manner in which the incident light is returned in the same direction by coating the fine glass beads or the fine reflective material, or the incident light is coated by coating the glass beads or the reflective material. It may be manufactured by a diffuse reflection method to reflect in various directions, or may be produced by a specular reflection method in which the incident light is reflected in a predetermined direction by producing a smooth surface.
  • a diffuse reflection method is preferable.
  • This diffuse reflection method allows the hemispherical glass beads or reflecting materials to be placed and coated at random angles, or the glass beads or reflecting materials are coated so that the coating surface is irregularly bumpy so that the incident light can be reflected in an unexpected direction. .
  • the diffuse reflection method or the specular reflection method may divide the flat surface and reflect the light in a predetermined direction so that the light may be reflected in various predictable directions.
  • the dielectric layers 132-1, 132-2, and 132-3 are coated on the total reflection layer 134 to form a stepped multilayer pattern layer 120a.
  • the dielectric layers 132-1, 132-2, and 132-3 are formed in a stepped multilayer structure by a special masking coating technique using vacuum deposition, and a plurality of the multilayer structures can be formed at regular or non-uniform intervals. .
  • the dielectric layers 132-1, 132-2, and 132-3 may be vacuum-deposited with a silicon oxide film (SiO 2) to be formed into a plurality of multilayered structures, and various thickness conversion effects may be adjusted by adjusting the thickness to approximately 200 to 550 nm. You can get it.
  • SiO 2 silicon oxide film
  • the multilayer pattern layer 120a may be set to have the same height or different heights of the first dielectric layer 132-1, the second dielectric layer 132-2, and the third dielectric layer 132-3 as shown in FIG. 8. . That is, according to the heights of the first, second, and third dielectric layers 132-1, 132-2, and 132-3, the height of the nanostructure 100a may vary as a result of FIG. 3 of the first embodiment.
  • the structure of the multilayer pattern layer 120a of the dielectric layers 132-1, 132-2, and 132-3 may be formed into one, two, or four or more layers.
  • the angles of reflection of colors vary according to the heights of the dielectric layers 132-1, 132-2, and 132-3, and color mixtures vary according to the angles.
  • various color conversions of the nanostructure 100a are performed. Not only the effect, but also the depth can be given a difference.
  • various colors may be expressed according to various thickness settings of the dielectric layers 132-1, 132-2, and 132-3, and various depths may be expressed.
  • the dielectric layer 132a may be formed into a polygon including a circle, a triangle, a rectangle, a pentagram 132-1, 132-2, 132-3, and a hexagon in planar shape, and one, two, three, or five sides. It can be molded in more than one place.
  • only one surface may have a step shape, and two or more surfaces may have a step shape.
  • the first dielectric layer 132-1 may have a larger surface area than the second dielectric layer 132-2
  • the second dielectric layer ( 132-2 may have a larger surface area than the third dielectric layer 132-3.
  • the light transmitting layer 135 is formed on the dielectric layers 132-1, 132-2, and 132-3.
  • the light transmitting layer 135 may be any material as long as it is a transparent or semitransparent material, and in particular, may be made of chromium (Cr).
  • the light transmitting layer 135 may be appropriately selected to suit the desired color conversion effect because the color observed from the outside may vary depending on optical properties such as transparency or refractive index.
  • the light transmitting layer 135 may be a simple unprinted surface, or the surface may be printed after the primer coating.
  • a transparent printing layer coated with a primer may be formed instead of the light transmitting layer 135, or a transparent primer coating layer may be formed on the transparent layer 133.
  • an identification print layer 140 having letters, numbers, symbols, or patterns printed on the base layer 110, and an image of the printed layer 140.
  • the through hole 150 may be further provided through the total reflection layer 134 and the dielectric layers 132-1, 132-2, and 132-3 in the direction.
  • the print layer 140 may be printed on the base layer 110 by printing letters, numbers, symbols, or patterns of the three-dimensional film.
  • the print layer 140 may be coated on the entire area of the base layer 110, or may be coated only on the lower portions of the dielectric layers 132-1, 132-2, and 132-3.
  • the three-dimensional film is genuine or may be printed on the printed layer 140, such as letters, numbers, symbols or patterns for decoration. That is, the printed layer 140 on which letters, numbers, symbols, or patterns of each stereoscopic film are printed may be coated.
  • the print layer 140 may be coated by the number of letters, numbers, symbols, or patterns, and may be coated only under the dielectric layer 132a on any part of the three-dimensional film, and the one or more dielectric layers 132a may be coated. May be coated on the dielectric layer 132a below.
  • the printed layer 140 may be coated or adhered through the through hole 150 after the through hole 150 is processed.
  • the through hole 150 is processed to form a space through the total reflection layer 134 and the dielectric layers 132-1, 132-2, and 132-3 in the upward direction of the printing layer 140. That is, the through hole 150 may be processed to penetrate the total reflection layer 134 and the dielectric layers 132-1, 132-2, and 132-3 so that the printed layer 140 is placed therein.
  • the through hole 150 is for checking the letters, numbers, symbols, or patterns printed on the printed layer 140 through the naked eye from the outside.
  • the total reflection layer 134 and the dielectric layers 132-1, 132-2, 132-3) penetrates the total reflection layer 134 and the dielectric layers 132-1, 132-2, and 132-3 to prevent a phenomenon in which letters, numbers, symbols, or patterns may not be recognized by color conversion of 132-3. Can be processed.
  • the through-hole 150 may be further provided with a microlens array layer having a convex lens function to enlarge the letters, numbers, symbols or patterns of the printed layer 140 to show.
  • the through hole 150 may be provided through deposition or etching using a slot mask when coating or depositing the total reflection layer 134 and / or the dielectric layer 132a.
  • the first total deposition layer 134 is formed on the transparent base layer 110 (S20).
  • the total reflection layer 134 may use a substrate that is coated with a reflector.
  • the base layer 110 may be a resin-based film, the film is polyethylene terephthalate (PET; polyethylene terephthalate), polycarbonate (PC; polycabonate), polyvinyl chloride (PVC; polyvinyl chloride), thermoplastic polyurethane resin (TPU; thermoplastic polyurethane), polypropylene (PP; polypropylene) and the like may be any one of a transparent material.
  • PET polyethylene terephthalate
  • PC polycarbonate
  • PC polycabonate
  • PVC polyvinyl chloride
  • TPU thermoplastic polyurethane resin
  • PP polypropylene
  • PP polypropylene
  • the total reflection layer 134 totally reflects the light toward the front, which may serve as a simple reflection mirror that serves to output the color converted image to the front.
  • the total reflection layer 134 may be formed by at least one of the aforementioned retroreflection, diffuse reflection, and specular reflection methods.
  • Letters, numbers, symbols or patterns on the base layer 110 is coated with a printed layer 140 (not shown).
  • the print layer 140 may be coated in advance at a position where the dielectric layers 132-1, 132-2, and 132-3 are to be coated.
  • the printed layer 140 may be coated or attached after processing the through hole 150.
  • a through-hole 150 which is an empty space, is processed upwards of the printed layer 140 by using a slot mask.
  • a process of additionally providing a microlens array layer having a convex lens function may be added to the through hole 150 to enlarge and show letters, numbers, symbols, or patterns of the printing layer 140.
  • a stepped multilayer dielectric layer 132-1, 12-2, and 132-3 is formed on the total reflection layer 134 so that the exposed area gradually decreases in the height direction (S21).
  • the slot mask 1 of FIG. 11 is first formed on the upper side of the total reflection layer 134.
  • the first dielectric layer 132-1 is formed by coating a dielectric having a thickness of about 200 nm to about 250 nm by performing a nano deposition process for implementing primary dielectric colors.
  • the masking operation is performed by placing the second mask of FIG. 11 on the substrate and performing a nano deposition process to implement the secondary dielectric color, and coating the added dielectric having a thickness of about 100 to 200 nm to form the second dielectric layer 132. -2) molding.
  • a nano deposition process for implementing the third dielectric color is performed, and the third dielectric layer 132 is coated by further adding a dielectric having a thickness of about 100 to 200 nm. -3) molding.
  • Masking for forming these stepped dielectric layers 132-1, 132-2, and 132-3 is in the form of a conventional work.
  • the first dielectric layer 132-1, the second dielectric layer 132-2, and the third dielectric layer 132-3 may be formed so as to reduce the exposed area.
  • each of the slot masks or a separate slot mask is used to print the printed layer ( The through hole 150 extending in the upward direction of the 140 and the processed through hole 150 in the total reflection layer 134 is processed.
  • the entire transparent surface of the total reflection layer 134 and the dielectric layer (132-1, 132-2, 132-3) is semi-transparent coating to form a light transmitting layer (S22).
  • the dielectric layers 132a132-1, 132-2, and 132-3 are not formed, that is, between the dielectric layers 132a132-1, 132-2, and 132-3, the light transmitting layer (132) is formed on the surface of the total reflection layer 134. 135 may be directly coated, and the dielectric layers 132a132-1, 132-2, and 132-3 may be coated on exposed surfaces.
  • the adhesive part 17 may be provided on the side opposite to one surface on which the fine pattern is formed in the base layer 110a.
  • the primer film coating printing may replace the light transmitting layer 135 of the color conversion layer 130a and may be coated and printed on the light transmitting layer 135.
  • the creation of the adhesive portion 17 may not be made during the manufacture of the three-dimensional film 15.
  • three dielectric layers 132a132-1, 132-2, and 132-3 may be manufactured with a pattern thickness of about 200 nm to about 600 nm for the same wavelength to implement color.
  • the region A of which the thickness of the first dielectric layer 132-1 is 200 nm, and the region B of which the thickness of the first and second dielectric layers 132a132-1, 132-2, and 132-3 are 300 nm are combined.
  • the three-dimensional film 15 of FIG. 12 includes a base layer 1100, a lens unit 1300, a pattern unit 1500, and a reflecting unit 1700.
  • the adhesive part 17 may be attached to the lower part of the reflecting part. Accordingly, the reflective part 1700, the adhesive part 17, and the nail body 11 may be formed in this order.
  • the base layer 1100 may be made of a resin that allows light to pass, such as polycarbonate (PC) or polycarbonate acrylonitrile butadiene styrene (PCABS), but is not limited thereto.
  • PC polycarbonate
  • PCABS polycarbonate acrylonitrile butadiene styrene
  • the lens unit 1300 is made of the same material as the base layer 1100 on one side of the base layer 1100.
  • the lens unit 1300 focuses the light reflected from the reflector 1700 and transmits the light toward the outside of the lens unit 1300.
  • the focal length of the lens unit 1300 may be set during the design process of the three-dimensional film 15, and may satisfy the set focal length by changing the diameter, thickness, or curvature of the lens unit 1300.
  • the pattern portion 1500 is formed of irregularities formed on the other side opposite to one side. Accordingly, the pattern unit 1500 may also be made of the same material as the base layer 1100. In FIG. 12, the pattern unit 1500 includes patterns of the same size and shape, but may include patterns of different sizes or different shapes. For example, as shown in FIG. 13, the pattern may have a step shape. In FIG. 13, illustrations of the lens unit 1300 and the reflector 1700 are omitted for convenience of description.
  • the pattern unit 1500 may be scattered by light incident from one side of the base layer 1100 or reflected by the reflecting unit 1700 to travel toward one side of the base layer 1100, and the degree or direction of scattering may be
  • the shape of the pattern unit 1500 may vary.
  • the reflective part 1700 is provided on the other side of the base layer 1100 to contact the pattern part 1500 to reflect light toward the lens part 1300.
  • the reflector 1700 will be described later in more detail.
  • the reflector 1700 emits light to one side of the base layer 1100.
  • the pattern unit 1500 may scatter the incident or reflected light.
  • the lens unit 1300 may focus the reflected or scattered light according to the focal length, and thus, the observer outside the three-dimensional film 15 may visually sense the depth of the pattern, thereby feeling the three-dimensional feeling of the pattern.
  • the lens unit 1300, the base layer 1100, and the pattern unit 1500 may be simultaneously formed.
  • a first stamp 3100 for forming the lens unit 1300 and a second stamp 3300 for forming the pattern unit 1500 are prepared.
  • a first stamp pattern is formed in the first stamp 3100 to be concave to correspond to the shape of the lens unit 1300.
  • the second stamp 3300 is also formed with a second stamp pattern opposite to the unevenness of the pattern portion 1500 so as to correspond to the pattern portion 1500.
  • the first mold 3110 and the second mold 3310 may cover the outside of the first stamp 3100 and the second stamp 3300.
  • the first stamp pattern and the second stamp pattern of the first stamp 3100 and the second stamp 3300 may be formed through a microstructure manufactured through the LIGA process.
  • the LIGA process is a microscopic process that consists of three steps: X-ray lithography, electroforming, and molding.
  • the first letters of the German Lithographie, Galvanoformung and Abformung It is an abbreviated quote.
  • lithography using X-rays is a process of fabricating a fine resist structure by irradiating and developing X-rays on a resist through an X-ray mask.
  • Electroplating is a process of manufacturing a fine metal structure by removing the remaining resist and filling the metal by using electroplating to the portion where the resist is removed in the manufactured fine resist structure.
  • Injection molding is a process of injecting the microstructures of various shapes using the manufactured fine metal structure as a mold (mold).
  • the first stamp 3100 having the first stamp pattern and the second stamp 3300 having the second stamp pattern may be manufactured.
  • the first stamp 3100 and the second stamp 3300 may be made of nickel.
  • Nickel may implement a curved surface of the microstructure corresponding to the lens unit 1300 to be close to a circle.
  • resin is injected between the first stamp 3100 and the second stamp 3300 implemented as described above.
  • the first stamp 3100 and the second stamp 3300 are separated to form the lens unit 1300 and the pattern unit 1500 on one side and the other side of the base layer 1100, respectively.
  • the base layer 1100, the lens unit 1300, and the pattern unit 1500 may be simultaneously formed by using the first stamp 3100 and the second stamp 3300.
  • FIG. 15 is a diagram for describing a general three-dimensional film.
  • the pattern layer 20 may be implemented by a printing process after the lens sheet 10 on which a lens is formed is prepared. That is, in the case of a general stereoscopic film, the lens and the pattern are not simultaneously implemented.
  • the method of manufacturing the three-dimensional film 15 illustrated in FIGS. 14A to 14D is manufactured by simultaneously forming the lens unit 1300 and the pattern unit 1500 through the first stamp 3100 and the second stamp 3300.
  • the process can be simplified.
  • the three-dimensional film 15 may have the base layer 1100 and the lens unit ( The 1300 and the pattern unit 1500 may be made of the same material.
  • the general three-dimensional film is formed by printing an ink component on the lens sheet to form a pattern layer, the lens sheet and the pattern layer may be made of different materials.
  • the reflective part 1700 is coated on the other side of the base layer 1100 to reflect the light toward the lens part 1300 so as to contact the pattern part 1500.
  • the manufacturing method of the three-dimensional film 15 is made of the first stamp 3100 and the second stamp 3300 implemented through the LIGA process using X-rays, the lens unit 1300 and the pattern unit The line width 1500 and the thickness of the lens unit 1300 may be reduced.
  • the thickness of the lens unit 1300 is reduced in this manner, the thickness of the lens unit 1300, the base layer 1100, and the pattern layer may also be reduced.
  • the line widths L1 and L2 of the lens unit 1300 or the pattern unit 1500 may be 5 nm or more and 20 ⁇ m or less.
  • the thickness D1 of the lens unit 1300, the base layer 1100, and the pattern unit 1500 may be 30 ⁇ m or more and less than 300 ⁇ m.
  • the line widths L3 and L4 of the general three-dimensional film are 100. 200 ⁇ m to 200 ⁇ m, and the thickness D2 of the three-dimensional film and the pattern layer may be 300 ⁇ m to 400 ⁇ m.
  • the lens thickness is increased, so the lens may be easily damaged by an external impact.
  • a protective film 30 for protecting the lens is added, and thus the thickness of the three-dimensional film may be further increased.
  • the three-dimensional film 15 described above with reference to FIGS. 14A to 14D may form a fine lens unit 1300, durability of external impact may be higher than that of a general three-dimensional film, and thus a separate protective layer. There may not be.
  • the reflector 1700 may include a reflective layer 1710 in contact with the pattern unit 1500 to reflect light toward the lens unit 1300.
  • the reflective layer 1710 may reflect some or all of the incident light.
  • the reflector 1700 may be disposed between the pattern layer 1500 and the reflective layer 1710 to reflect the light toward the lens unit 1300 and the thickness of the reflector 1700.
  • the reflective layer 1710 may include a dielectric layer 1730 that changes the color of light reflected by the reflective layer 1710.
  • the dielectric layer 1730 may be coated by vacuum deposition with a silicon oxide film (SiO 2 ), and various color conversion effects may be obtained by adjusting the thickness to approximately 200 to 550 nm.
  • SiO 2 silicon oxide film
  • the dielectric layer 1730 may be formed in various thicknesses for some or each of the patterns of the pattern unit 1500.
  • the thickness of the dielectric layer 1730 may vary the depth of the pattern as well as various color conversion effects of the pattern.
  • the thickness setting of the dielectric layer 1730 may vary depending on the color to be expressed.
  • the same effect as the thickness change of the dielectric layer 1730 may be obtained.
  • the reflective layer 1710 may be manufactured by coating a metal material having high reflectance in a visible light region such as aluminum (Al), silver (Ag), and gold (Au) by vacuum deposition.
  • a metal material having high reflectance in a visible light region such as aluminum (Al), silver (Ag), and gold (Au) by vacuum deposition.
  • Al aluminum
  • Ag silver
  • Au gold
  • the material is not limited thereto.
  • the reflective layer 1710 is made of gold, the reflective layer 1710 is beautiful, easy to process, does not discolor or corrode, and has an excellent reflection effect.
  • the reflective layer 1710 may be uniformly coated on the other side of the base layer 1100, coated only on the pattern of the pattern portion 1500, or coated only between the pattern and the pattern.
  • the reflective layer 1710 may include fine glass beads or fine reflective particles, and thus may be manufactured in a retroreflective manner in which incident light is returned in the same direction.
  • the incident light may be manufactured in a diffuse reflection method to reflect the light in various directions.
  • the incident light may be manufactured in a specular reflection method where the incident light is reflected in a predetermined direction.
  • hemispherical glass beads or reflective particles are arranged at an irregular angle, or the glass beads or reflective particles are coated so that the coating surface of the reflective layer 1710 is irregularly irregular so that the incident light is reflected in an unexpected direction. It may be.
  • the three-dimensional film 15 did not have a component for protecting the lens unit 1300, but may further include a protection unit for protecting the lens unit 1300 as necessary.
  • the protection unit 1900 is coated on the lens unit 1300 to protect the lens unit 1300, and the lens unit 1 at a point farther than the focal length of the lens unit 1300.
  • the light passing through 1300 may be focused.
  • the focal length F1 of the lens unit 1300 may be set smaller than the final focal length F3 according to the protection unit 1900.
  • the protection unit 1900 may include a first protection layer 1910 made of resin, and a second protection made of a conductive material positioned between the first protection layer 1910 and the lens unit 1300 to transmit light.
  • Layer 1930 may be made of a transparent conductive material such as indium tin oxide (ITO) or SiO 2 , but is not limited thereto.
  • the refractive index of the lens unit 1300 and the first passivation layer 1910 may be absent without the second passivation layer 1930. Since the refractive index of is almost similar, the first protective layer 1910 and the lens unit 1300 may not be distinguished.
  • the second protective layer 1930 made of a material having a different refractive index from the first protective layer 1910 and the lens unit 1300 is positioned between the first protective layer 1910 and the lens unit 1300, thereby being necessary.
  • the focal length F3 can be formed.
  • the protection unit 1900 may be applied to the three-dimensional film 15 of FIG. 16.

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Laminated Bodies (AREA)

Abstract

Une pointe d'ongle selon un mode de réalisation de la présente invention comprend : un corps d'ongle comprenant une surface incurvée ; un film tridimensionnel qui est formé de sorte qu'un motif concave et convexe formé sur une couche de base soit observé de façon tridimensionnelle, et qui est incurvé de façon à recouvrir une surface incurvée du corps d'ongle ; et une partie adhésive qui combine le corps d'ongle et le film tridimensionnel.
PCT/KR2017/009193 2016-08-24 2017-08-23 Pointe d'ongle et procédé de production de pointe d'ongle WO2018038522A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020160107460A KR101836682B1 (ko) 2016-08-24 2016-08-24 네일 팁 및 네일 팁의 제조방법
KR10-2016-0107460 2016-08-24

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WO2018038522A1 true WO2018038522A1 (fr) 2018-03-01

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Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR200338786Y1 (ko) * 2003-09-04 2004-01-24 조점섭 박판을 구비한 인조손톱
KR100765334B1 (ko) * 2006-09-19 2007-10-09 장성용 인조네일 제조방법
KR20090062607A (ko) * 2007-12-13 2009-06-17 제이씨아이 씨오., 엘티디 인조네일
KR101207315B1 (ko) * 2011-07-11 2012-12-03 장성용 입체형 장식물이 형성된 인조네일 제조방법
KR20130135052A (ko) * 2012-05-31 2013-12-10 (주)아모레퍼시픽 자성을 이용한 네일 아트 장치, 시스템 및 방법

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR200338786Y1 (ko) * 2003-09-04 2004-01-24 조점섭 박판을 구비한 인조손톱
KR100765334B1 (ko) * 2006-09-19 2007-10-09 장성용 인조네일 제조방법
KR20090062607A (ko) * 2007-12-13 2009-06-17 제이씨아이 씨오., 엘티디 인조네일
KR101207315B1 (ko) * 2011-07-11 2012-12-03 장성용 입체형 장식물이 형성된 인조네일 제조방법
KR20130135052A (ko) * 2012-05-31 2013-12-10 (주)아모레퍼시픽 자성을 이용한 네일 아트 장치, 시스템 및 방법

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