WO2017213370A1 - Micropattern roll manufacturing method and micropattern roll manufacturing device therefor - Google Patents

Micropattern roll manufacturing method and micropattern roll manufacturing device therefor Download PDF

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Publication number
WO2017213370A1
WO2017213370A1 PCT/KR2017/005579 KR2017005579W WO2017213370A1 WO 2017213370 A1 WO2017213370 A1 WO 2017213370A1 KR 2017005579 W KR2017005579 W KR 2017005579W WO 2017213370 A1 WO2017213370 A1 WO 2017213370A1
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Prior art keywords
roll
cliché
sheet
fine pattern
manufacturing
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PCT/KR2017/005579
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French (fr)
Korean (ko)
Inventor
권신
강동우
우규희
장윤석
이승현
이택민
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한국기계연구원
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Publication of WO2017213370A1 publication Critical patent/WO2017213370A1/en

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
    • H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
    • H01L21/02288—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating printing, e.g. ink-jet printing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/288—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/34—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/0405, H01L21/0445, H01L21/06, H01L21/16 and H01L21/18 with or without impurities, e.g. doping materials
    • H01L21/44—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/38 - H01L21/428
    • H01L21/447—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/38 - H01L21/428 involving the application of pressure, e.g. thermo-compression bonding
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/93—Batch processes
    • H01L2224/95—Batch processes at chip-level, i.e. with connecting carried out on a plurality of singulated devices, i.e. on diced chips
    • H01L2224/951—Supplying the plurality of semiconductor or solid-state bodies
    • H01L2224/95115—Supplying the plurality of semiconductor or solid-state bodies using a roll-to-roll transfer technique

Definitions

  • the present invention relates to a method for manufacturing a micropattern and a device for manufacturing a micropattern roll therefor, and more particularly, to manufacturing a micropattern roll for forming a cliché sheet on which a micropattern is formed and manufacturing a cliché roll using the cliché sheet.
  • the present invention relates to a method for manufacturing a fine pattern roll and a method therefor.
  • Conventional ROLL PRINTING apparatus includes a blanket roll to which the printing composition is applied and a cliché roll in contact with the blanket roll to change the printing composition applied to the blanket roll into a specific pattern.
  • the fine pattern is embossed on the cliché roll, and the part of the printing composition in contact with the fine pattern is transferred to the cliché roll, and the specific pattern to be printed is left on the cranket roll.
  • the laser is irradiated on the roll to form a flaw on the surface of the roll, and then the etching process is performed by immersing the roll in an acid solution to corrode the flaw to form a fine pattern on the roll surface.
  • a roll machining method using a machine, a laser machining method using a laser on a roll surface, and a method of forming a fine pattern on a roll surface by etching after deposition of E-beam evaporation (E-BEAM) were used.
  • an object of the present invention in view of the above point is easy to fine pattern depth control and shape control, economical by reducing the processing time, it is possible to form micro-pattern fine pattern, expensive equipment is required To provide a method for producing a fine pattern roll and a manufacturing apparatus for a fine pattern roll for this.
  • Method of manufacturing a micro pattern roll of an embodiment of the present invention for achieving the above object the step of producing a master plate embossed with a fine pattern on the surface through a semiconductor process, by replicating the master plate is engraved fine pattern Manufacturing the prepared cliché sheet, and attaching the cliché sheet to the roll surface.
  • the master flat plate may be imprinted to produce a cliché sheet of synthetic resin material in which a fine pattern is engraved.
  • the UV cured resin may be applied to the roll surface, and after attaching the cliché sheet to the roll surface, the UV cured resin may be cured and the cliché sheet may be separated from the roll surface.
  • the master plate in the step of manufacturing the cliché sheet, can be plated by electroplating to produce a pre-plated cliché sheet in which a fine pattern is engraved.
  • the tension control dancer to control the tension of the roll mounting portion, the roll mounting portion moving in the longitudinal direction, and the cliché sheet attached to the roll located on one side of the roll mounting portion A, based on the image of the cliché sheet obtained by the camera provided on one side of the roll, the cliché sheet can be wound to the set position.
  • Apparatus for producing a micropattern roll of an embodiment of the present invention for achieving the above object is, the citrate sheet portion is mounted and the cliché sheet unrolled from the citrate sheet is wound around A tension control dancer positioned between the roll holding portion on which the losing pattern roll is mounted, the crolling sheet portion and the roll holding portion, and contacting the cliché sheet moving from the sea troll toward the pattern roll to apply tension to the cliché sheet; And an idle roller having a height difference from the tension control dancer and positioned at the front and rear sides of the tension control dancer.
  • a driving device for rotating the pattern roll in the roll mounting portion may be provided.
  • both longitudinal ends of the tension control dancer may be inserted into the height movement guide perpendicular to the tension control dancer, respectively, and an actuator may be built in the height movement guide to move the longitudinal end of the tension control dancer in height.
  • marks are formed on both sides in the width direction of the cliché sheet at equal intervals along the length direction of the cliché sheet, and a camera is provided on one side of the roll mounting portion, and the pattern is based on the image signal detected by the camera.
  • the roll can move in the longitudinal direction.
  • the roll mounting portion, the fixing member which is fixed to the center axis bar is fixed to the pattern roll, the central axis bar, both sides of the longitudinal axis of the center axis bar is inserted, the lower end of the fixing member, the image signal detected by the camera It may include a left and right moving device for moving the fixing member in the longitudinal direction of the central axis bar on the basis.
  • an adhesive film or an adhesive solution for fixing the cliché sheet to the pattern roll may be applied to the pattern roll.
  • the roll mounting portion may be provided with a pressure roller for pressing the cliché sheet toward the pattern roll.
  • both ends of the pressing roller in the longitudinal direction may be provided with a pressure generating device for driving each of them separately, and to adjust the distance between the pressing roller and the pattern roll.
  • UV curable resin may be applied to the pattern roll.
  • the master plate is manufactured through the semiconductor process, fine pattern depth control and shape control are easy, and micro-unit fine pattern formation is possible.
  • FIG. 1 is a flowchart illustrating a method of manufacturing a fine pattern roll according to an embodiment of the present invention.
  • 2A to 2C are process diagrams illustrating a method of manufacturing the fine pattern roll of FIG. 1.
  • FIG. 3 is a flowchart illustrating a method of manufacturing a fine pattern roll according to another embodiment of the present invention.
  • 4A to 4C are process diagrams illustrating a method of manufacturing the fine pattern roll of FIG. 3.
  • FIG. 5 is a perspective view illustrating an apparatus for manufacturing a fine pattern roll for the method of manufacturing the fine pattern roll of FIGS. 1 and 3.
  • FIG. 6 is a schematic diagram schematically showing an apparatus for manufacturing a fine pattern roll of FIG. 5.
  • 7A to 7D are process diagrams illustrating a state in which resin is applied to a pattern roll of the apparatus for manufacturing a fine pattern roll of FIG. 5.
  • control unit 110 control circuit 100: control unit 110: control
  • mark 200 roll mounting portion
  • pattern roll 220 camera
  • FIG. 1 is a flowchart illustrating a method of manufacturing a fine pattern roll according to an embodiment of the present invention.
  • 2A to 2C are process diagrams illustrating a method of manufacturing the fine pattern roll of FIG. 1.
  • the method for manufacturing a fine pattern roll according to the present embodiment, the step of producing a master plate (P1) embossed with a fine pattern on the surface through a semiconductor process (S100) And duplicating the master plate P1 to produce a cliché sheet C having a fine pattern engraved therein (S200), and attaching the cliché sheet C to the surface of the pattern roll 210 (S300). do.
  • the cliché sheet C of the synthetic resin material having the fine pattern engraved by imprinting the master plate P1 is produced.
  • the master plate (P1) is produced through a semiconductor process, a fine pattern can be produced in a very fine size of a micro unit.
  • the surface of the semiconductor material can be polished or cut, even if an error occurs during the production of the master plate (P1) it can be easily overcome.
  • a UV cured resin is formed on the surface of the pattern roll 210. Applying (G) (S210) may be further performed.
  • the cliché sheet C After attaching the cliché sheet C to the surface of the pattern roll 210 (S300), the cliché sheet C is pressed, the UV cured resin G is cured, and the cliché sheet C is patterned. Separating step S310 from the surface of the roll 210 is further performed, and cliché rolls may be produced.
  • an inverse phase pattern that is inverse to the fine pattern formed on the cliché sheet C is formed on the surface of the pattern roll 210.
  • the master plate P1 produced through the semiconductor process is likely to be worn and deformed by an external force.
  • the roll roll 200 is mounted on the pattern roll 210, and the roll roll portion 200 is moved in the longitudinal direction.
  • the tension control dancer 300 which is positioned at and controls the tension of the cliché sheet C attached to the pattern roll 210, is obtained by the camera 220 provided on one side of the pattern roll 210. Based on the image of C), the cliché sheet C is induced to be wound at the set position.
  • the cliché sheet C is accurately wound on the pattern roll 210 by the roll mounting unit 200 and the tension control dancer 300.
  • FIG. 3 is a flowchart illustrating a method of manufacturing a fine pattern roll according to another embodiment of the present invention.
  • 4A to 4C are process diagrams illustrating a method of manufacturing the fine pattern roll of FIG. 3.
  • the master plate (P1) in the step of manufacturing the cliché sheet (S210), the master plate (P1) may be reproduced by electroplating to produce an electroplated cliché sheet C in which a fine pattern is engraved.
  • the seed layer L is applied to the master plate P1 before the step S200 of fabricating the electroplating cliché sheet C is performed. ) Is formed.
  • the surface which is not in contact with the master flat plate P1 among both surfaces of the electroplating cliché sheet C is not smooth and has a large possibility of being bumpy.
  • the cliché sheet C manufactured by the method for manufacturing the micropattern roll described with reference to FIGS. 1 to 4C is the pattern roll 210 by the apparatus for manufacturing the micropattern roll, as shown in FIGS. 5 to 7D. It is used to form a fine pattern in.
  • FIG. 5 is a perspective view illustrating an apparatus for manufacturing a fine pattern roll for the method of manufacturing the fine pattern roll of FIGS. 1 and 3.
  • FIG. 6 is a schematic diagram schematically showing an apparatus for manufacturing a fine pattern roll of FIG. 5.
  • 7A to 7D are process diagrams illustrating a state in which resin is applied to a pattern roll of the apparatus for manufacturing a fine pattern roll of FIG. 5.
  • the apparatus for manufacturing fine pattern rolls includes: a situ control unit 100 on which a situ 110 on which a cliché sheet C of a soft material is wound is mounted, and a situ 110.
  • Cliché sheet (C) released from the roll roll portion 200 is placed between the pattern roll 210 is wound on the surface, and the seat control portion 100 and the roll placement portion 200, the sheet A tension control dancer 300 in the form of a roll for applying tension to the cliché sheet C by contacting the cliché sheet C moving from the roll 110 toward the pattern roll 210, and the tension control dancer 300; It includes an idle roller 400 having a height difference and located in the front and rear of the tension control dancer (300).
  • the apparatus for manufacturing a fine pattern roll is provided with a driving device for rotating the pattern roll 210 on the roll placement unit 200.
  • Both ends extending in the longitudinal direction of the tension control dancer 300 are inserted into the height movement guide 310 perpendicular to the tension control dancer 300, respectively.
  • the height movement guide 310 has a built-in actuator 320 for moving the one end extending in the longitudinal direction of the tension control dancer 300 in height.
  • the tension generated in the cliché sheet C moving from the sea troll 110 to the pattern roll 210 is added or subtracted.
  • the tension control dancer 300 moves high and the crest sheet C is formed so as to accurately wind the pattern roll 210 by adding or subtracting the tension generated in the cliché sheet C. Induce C).
  • the tension control dancer 300 induces the tension in the cliché sheet (C) to reduce the tension in the longitudinal direction of the cliché sheet (C).
  • Marks 111 are formed on both sides in the width direction of the cliché sheet C at equal intervals along the longitudinal direction of the cliché sheet C, respectively.
  • the camera 220 for detecting the mark 111 is provided at one side of the roll fixing unit 200, and the pattern roll 210 is moved in the longitudinal direction based on the image signal detected by the camera 220.
  • the cliché sheet C can move (meander) with a deviation in the width direction by the tension or the frictional force generated in the cliché sheet C. Therefore, the pattern roll 210 is moved in the rotation axis direction so that the meandering cliché sheet C can be accurately wound on the surface of the pattern roll 210.
  • the roll mounting unit 200 includes a center shaft bar 230 on which the pattern roll 210 is fixed, a fixing member 240 perpendicular to the center shaft bar 230, and both sides of the center shaft bar 230 in the longitudinal direction are inserted. And, located on the bottom of the fixing member 240, and includes a left and right moving device 250 for moving the fixing member 240 in the longitudinal direction of the central axis bar 230 based on the image signal detected by the camera 220 do.
  • the left and right moving device 250 According to the image signal sensed by the camera 220, the left and right moving device 250 to move the fixing member 240 left and right. Thereby, the meandering cliché sheet C is uniformly seated on the surface of the pattern roll 210.
  • an adhesive film or an adhesive solution for fixing the cliché sheet C to the pattern roll 210 is applied to the pattern roll 210.
  • the cliché sheet C seated on the pattern roll 210 by an adhesive film or an adhesive solution is fixed to the pattern roll 210.
  • the roll mounting unit 200 is provided with a pressure roller 260 for pressing the cliché sheet C toward the pattern roll 210. As the pressure roller 260 presses the cliché sheet C, the cliché sheet C is firmly attached to the pattern roll 210.
  • the pressure generator 261 is provided to drive each of the pressure rollers 260 and the distance between the pressure roller 260 and the pattern roll 210. According to the tension applied to the cliché sheet C, a greater force may be applied to the cliché sheet C seated on either side of the pattern roll 210.
  • the pressure roller 260 presses or depressurizes any one side of both sides of the cliché sheet C in the width direction.
  • the cliché sheet C is guided by the pressure roller 260 to be attached to the pattern roll 210 with a uniform force along the width direction.
  • UV cured resin (G) may be applied.
  • the cliché sheet C is pressed onto the UV curing resin G by the pressure roller 260 and seated thereon. After the UV curing resin G is cured, the cliché sheet C is separated from the pattern roll 210. In this case, as described above, an inverse pattern that is inverse to the fine pattern formed in the cliché sheet C is formed on the surface of the pattern roll 210.
  • the master plate (P1) is produced through a semiconductor process, it is easy to control the fine pattern depth and shape, and fine in the micro unit Pattern formation is possible.

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  • Condensed Matter Physics & Semiconductors (AREA)
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Abstract

Disclosed are a micropattern roll manufacturing device and a micropattern roll manufacturing device therefor. The micropattern roll manufacturing method comprises the steps of: fabricating a master flat plate having a micropattern engraved in relief on the surface thereof through a semiconductor process; fabricating a cliché sheet having a micropattern intaglio-engraved thereon by replicating the master flat plate; and attaching the cliché sheet to the roll surface. Accordingly, the master flat plate is fabricated through a semiconductor process, thereby facilitating control of the depth and shape of the micropattern, and enabling formation of a micropattern in a micro unit.

Description

미세패턴롤의 제조방법 및 이를 위한 미세패턴롤의 제조장치Manufacturing method of fine pattern roll and apparatus for manufacturing fine pattern roll for same
본 발명은 미세패턴의 제조방법 및 이를 위한 미세패턴롤의 제조장치에 관한 것으로, 더욱 상세하게는, 미세패턴이 형성된 클리쉐 시트를 형성하고, 클리쉐 시트를 이용해 클리쉐롤을 제작하는 미세패턴롤의 제조방법, 및 이를 위한 미세패턴롤의 제조장치에 관한 것이다.The present invention relates to a method for manufacturing a micropattern and a device for manufacturing a micropattern roll therefor, and more particularly, to manufacturing a micropattern roll for forming a cliché sheet on which a micropattern is formed and manufacturing a cliché roll using the cliché sheet. The present invention relates to a method for manufacturing a fine pattern roll and a method therefor.
종래 롤-프린팅(ROLL PRINTING) 장치는, 인쇄 조성물이 도포되는 블랭킷롤과, 블랭킷롤과 접촉하며 블랭킷롤에 도포된 인쇄 조성물을 특정 패턴으로 변경하는 클리쉐롤을 포함한다.Conventional ROLL PRINTING apparatus includes a blanket roll to which the printing composition is applied and a cliché roll in contact with the blanket roll to change the printing composition applied to the blanket roll into a specific pattern.
클리쉐롤에는 미세 패턴이 양각되며, 인쇄 조성물 중 미세 패턴과 접촉되는 부분이 클리쉐롤로 전사되고, 클랭킷롤에는 미세 패턴 형상이 제거된 형태 즉, 프린팅 되는 특정 패턴만이 남게 된다.The fine pattern is embossed on the cliché roll, and the part of the printing composition in contact with the fine pattern is transferred to the cliché roll, and the specific pattern to be printed is left on the cranket roll.
종래 클리쉐롤에 미세 패턴을 형성하기 위해서, 롤에 레이저를 조사해 흠을 롤 표면에 형성한 후 롤을 산성용액에 담가 흠을 부식시켜 미세 패턴을 롤 표면에 형성하는 에칭가공방법, 롤 표면을 절삭기계로 가공하는 롤 기계가공방법, 롤 표면을 레이저로 가공하는 레이저 가공방법, E-BEAM(E-beam evaporation) 증착 후 에칭을 진행해 롤 표면에 미세 패턴을 형성하는 방법 등이 활용되었었다. In order to form a fine pattern on a conventional cliché roll, the laser is irradiated on the roll to form a flaw on the surface of the roll, and then the etching process is performed by immersing the roll in an acid solution to corrode the flaw to form a fine pattern on the roll surface. A roll machining method using a machine, a laser machining method using a laser on a roll surface, and a method of forming a fine pattern on a roll surface by etching after deposition of E-beam evaporation (E-BEAM) were used.
그러나, 이러한 종래 미세 패턴 형성 방법은, 식각 공정이 수행됨에 따라 미세 패턴 깊이 제어 및 형상 제어에 어려움이 있었고, 기계를 통해 초정밀 가공이 진행되야 하므로 가공 시간이 장시간 소요되는 문제가 있었으며, 레이저 빔 직경이 제한적이므로 마이크로 단위의 미세 패턴을 형성하기 어려운 문제가 있었으며, E-BEAM 장비와 같은 고가의 장비가 필요하였다.However, such a conventional fine pattern formation method has a difficulty in controlling the depth and shape of the fine pattern as the etching process is performed, and because the ultra-precision machining has to be performed through the machine, there is a problem that the processing time takes a long time, and the laser beam diameter Because of this limitation, there was a problem that it is difficult to form a micro pattern of micro units, and expensive equipment such as E-BEAM equipment was needed.
관련 선행기술 문헌으로는 대한민국 등록특허공보 제10-1024376호(2011.03.16.)가 있다. Related prior art documents include Korean Patent Publication No. 10-1024376 (2011.03.16.).
이에 상기와 같은 점을 감안하여 발명된 본 발명의 목적은, 미세 패턴 깊이 제어 및 형상 제어가 용이하고, 가공 시간을 감소시켜 경제적이고, 마이크로 단위의 미세 패턴 형성이 가능하고, 고가의 장비가 필요치 않은 미세패턴롤의 제조방법 및 이를 위한 미세패턴롤의 제조장치를 제공하는 것이다.Accordingly, an object of the present invention in view of the above point is easy to fine pattern depth control and shape control, economical by reducing the processing time, it is possible to form micro-pattern fine pattern, expensive equipment is required To provide a method for producing a fine pattern roll and a manufacturing apparatus for a fine pattern roll for this.
위와 같은 목적을 달성하기 위한 본 발명의 일실시예의 미세패턴롤을 제조하는 방법은, 반도체 공정을 통해 표면에 미세패턴이 양각된 마스터 평판을 제작하는 단계와, 마스터 평판을 복제해 미세패턴이 음각된 클리쉐 시트를 제작하는 단계와, 클리쉐 시트를 롤 표면에 부착하는 단계를 포함한다.Method of manufacturing a micro pattern roll of an embodiment of the present invention for achieving the above object, the step of producing a master plate embossed with a fine pattern on the surface through a semiconductor process, by replicating the master plate is engraved fine pattern Manufacturing the prepared cliché sheet, and attaching the cliché sheet to the roll surface.
또한, 클리쉐 시트를 제작하는 단계에서, 마스터 평판을 임프린트(IMPRINT) 복제해 미세패턴이 음각된 합성수지 소재의 클리쉐 시트를 제작할 수 있다.In addition, in the manufacturing of the cliché sheet, the master flat plate may be imprinted to produce a cliché sheet of synthetic resin material in which a fine pattern is engraved.
또한, 클리쉐 시트를 제작하는 단계 후에, 롤 표면에 UV 경화 레진을 도포하고, 클리쉐 시트를 롤 표면에 부착하는 단계 후에, UV 경화 레진을 경화시키고, 클리쉐 시트를 상기 롤 표면으로부터 분리할 수 있다.In addition, after the step of making the cliché sheet, the UV cured resin may be applied to the roll surface, and after attaching the cliché sheet to the roll surface, the UV cured resin may be cured and the cliché sheet may be separated from the roll surface.
또한, 클리쉐 시트를 제작하는 단계에서, 마스터 평판을 전주도금 복제해 미세패턴이 음각된 전주도금 클리쉐 시트를 제작할 수 있다.In addition, in the step of manufacturing the cliché sheet, the master plate can be plated by electroplating to produce a pre-plated cliché sheet in which a fine pattern is engraved.
또한, 클리쉐 시트를 롤 표면에 부착하는 단계에서, 롤이 거치되고, 길이방향으로 이동하는 롤거치부와, 롤거치부 일측에 위치되고, 롤에 부착되는 클리쉐 시트의 장력을 제어하는 장력제어 댄서가, 롤 일측에 구비된 카메라에 의해 획득된 클리쉐 시트의 영상을 바탕으로, 클리쉐 시트가 설정된 위치에 감기도록 할 수 있다.In addition, in the step of attaching the cliché sheet to the roll surface, the tension control dancer to control the tension of the roll mounting portion, the roll mounting portion moving in the longitudinal direction, and the cliché sheet attached to the roll located on one side of the roll mounting portion A, based on the image of the cliché sheet obtained by the camera provided on one side of the roll, the cliché sheet can be wound to the set position.
위와 같은 목적을 달성하기 위한 본 발명의 일실시예의 미세패턴롤을 제조하는 장치는, 연성재질의 클리쉐 시트가 감겨진 시트롤이 거치되는 시트롤거치부와, 시트롤로부터 풀려진 클리쉐 시트가 감겨지는 패턴롤이 거치되는 롤거치부와, 시트롤거치부 및 롤거치부 사이에 위치되고, 시트롤로부터 패턴롤을 향해 이동하는 클리쉐 시트와 접촉해 클리쉐 시트에 장력을 인가하는 장력제어 댄서와, 장력제어 댄서와 높이 차를 가지며 장력제어 댄서 전측 및 후측에 위치된 아이들롤러를 포함한다.Apparatus for producing a micropattern roll of an embodiment of the present invention for achieving the above object is, the citrate sheet portion is mounted and the cliché sheet unrolled from the citrate sheet is wound around A tension control dancer positioned between the roll holding portion on which the losing pattern roll is mounted, the crolling sheet portion and the roll holding portion, and contacting the cliché sheet moving from the sea troll toward the pattern roll to apply tension to the cliché sheet; And an idle roller having a height difference from the tension control dancer and positioned at the front and rear sides of the tension control dancer.
또한, 롤거치부에 패턴롤을 회전시키는 구동장치가 구비될 수 있다.In addition, a driving device for rotating the pattern roll in the roll mounting portion may be provided.
또한, 장력제어 댄서의 길이방향 양단은 각각 장력제어 댄서와 수직한 높이이동 가이드에 삽입되고, 높이이동 가이드에 장력제어 댄서의 길이방향 일단을 높이 이동시키는 액츄에이터가 내장될 수 있다.In addition, both longitudinal ends of the tension control dancer may be inserted into the height movement guide perpendicular to the tension control dancer, respectively, and an actuator may be built in the height movement guide to move the longitudinal end of the tension control dancer in height.
또한, 클리쉐 시트의 폭방향 양측에 각각 클리쉐 시트의 길이방향을 따라 동일한 간격으로 마크가 형성되고, 롤거치부 일측에 마크를 감지하는 카메라가 구비되고, 카메라를 통해 감지된 영상신호를 바탕으로 패턴롤이 길이방향으로 이동할 수 있다.In addition, marks are formed on both sides in the width direction of the cliché sheet at equal intervals along the length direction of the cliché sheet, and a camera is provided on one side of the roll mounting portion, and the pattern is based on the image signal detected by the camera. The roll can move in the longitudinal direction.
또한, 롤거치부는, 패턴롤이 고정되는 중심축바와, 중심축바와 수직하고, 중심축바의 길이방향 양측이 각각 삽입된 고정부재와, 고정부재 하단에 위치되고, 카메라를 통해 감지된 영상신호를 바탕으로 고정부재를 중심축바의 길이방향으로 이동시키는 좌우이동장치를 포함할 수 있다.In addition, the roll mounting portion, the fixing member which is fixed to the center axis bar is fixed to the pattern roll, the central axis bar, both sides of the longitudinal axis of the center axis bar is inserted, the lower end of the fixing member, the image signal detected by the camera It may include a left and right moving device for moving the fixing member in the longitudinal direction of the central axis bar on the basis.
또한, 패턴롤에는 클리쉐 시트를 패턴롤에 고정하는 접착 필름 또는 접착 용액이 도포될 수 있다.In addition, an adhesive film or an adhesive solution for fixing the cliché sheet to the pattern roll may be applied to the pattern roll.
또한, 롤거치부에는, 패턴롤을 향해 클리쉐 시트를 가압하는 가압롤러가 구비될 수 있다.In addition, the roll mounting portion may be provided with a pressure roller for pressing the cliché sheet toward the pattern roll.
또한, 가압롤러의 길이방향 양단에는 각각 개별적으로 구동하고, 가압롤러와 패턴롤과의 거리를 가감하는 압력생성장치가 구비될 수 있다.In addition, both ends of the pressing roller in the longitudinal direction may be provided with a pressure generating device for driving each of them separately, and to adjust the distance between the pressing roller and the pattern roll.
또한, 패턴롤에 UV 경화 레진이 도포될 수 있다.In addition, UV curable resin may be applied to the pattern roll.
상기와 같은 본 발명의 실시예들에 따르면, 반도체 공정을 통해 마스터 평판이 제작되므로, 미세 패턴 깊이 제어 및 형상 제어가 용이하고, 마이크로 단위의 미세 패턴 형성이 가능하다. According to the embodiments of the present invention as described above, since the master plate is manufactured through the semiconductor process, fine pattern depth control and shape control are easy, and micro-unit fine pattern formation is possible.
또한, 종래 기계를 통한 표면 정밀 가공에 비해, 가공 시간을 단축할 수 있으며, 특히, 고가의 장비가 필요하지 않아, 종래 미세 패턴롤 제작에 비해 경제적이다.In addition, compared to the surface precision processing through the conventional machine, it is possible to shorten the processing time, in particular, expensive equipment is not necessary, it is more economical than the conventional fine pattern roll production.
도 1은 본 발명의 일실시예에 의한 미세패턴롤의 제조방법을 도시한 흐름도이다. 1 is a flowchart illustrating a method of manufacturing a fine pattern roll according to an embodiment of the present invention.
도 2a 내지 도 2c는 도 1의 미세패턴롤의 제조방법을 도시한 공정도들이다. 2A to 2C are process diagrams illustrating a method of manufacturing the fine pattern roll of FIG. 1.
도 3은 본 발명의 다른 실시예에 의한 미세패턴롤의 제조방법을 도시한 흐름도이다. 3 is a flowchart illustrating a method of manufacturing a fine pattern roll according to another embodiment of the present invention.
도 4a 내지 도 4c는 도 3의 미세패턴롤의 제조방법을 도시한 공정도들이다. 4A to 4C are process diagrams illustrating a method of manufacturing the fine pattern roll of FIG. 3.
도 5는 도 1 및 도 3의 미세패턴롤의 제조방법을 위한 미세패턴롤의 제조장치를 도시한 사시도이다.5 is a perspective view illustrating an apparatus for manufacturing a fine pattern roll for the method of manufacturing the fine pattern roll of FIGS. 1 and 3.
도 6은 도 5의 미세패턴롤의 제조장치를 간략하게 도시한 모식도이다. FIG. 6 is a schematic diagram schematically showing an apparatus for manufacturing a fine pattern roll of FIG. 5.
도 7a 내지 도 7d는 도 5의 미세패턴롤의 제조장치의 패턴롤에 레진이 도포되는 상태를 도시한 공정도들이다. 7A to 7D are process diagrams illustrating a state in which resin is applied to a pattern roll of the apparatus for manufacturing a fine pattern roll of FIG. 5.
<부호의 설명><Description of the code>
100: 시트롤거치부 110: 시트롤100: control unit 110: control
111: 마크 200: 롤거치부111: mark 200: roll mounting portion
210: 패턴롤 220: 카메라210: pattern roll 220: camera
230: 중심축바 240: 고정부재230: center axis bar 240: fixing member
250: 좌우이동장치 260: 가압롤러250: horizontal movement device 260: pressure roller
261: 압력생성장치 300: 장력제어 댄서261: pressure generating device 300: tension control dancer
310: 높이이동 가이드 320: 액츄에이터310: height movement guide 320: actuator
400: 아이들롤러 P1: 마스터 평판400: idle roller P1: master reputation
L: 시드 레이어 C: 클리쉐 시트L: Seed Layer C: Cliché Sheet
G: 레진 G: Resin
S100: 마스터 평판을 제작하는 단계S100: Steps to Build Master Plate
S200: 클리쉐 시트를 제작하는 단계S200: step of making cliché sheet
S300: 클리쉐 시트를 롤 표면에 부착하는 단계S300: attaching the cliché sheet to the roll surface
이하 첨부된 도면을 참고로, 본 발명의 바람직한 실시예를 자세히 설명한다. 우선, 도면들 중 동일한 구성요소 또는 부품들은 가능한 한 동일한 참조부호를 나타내고 있음에 유의해야 한다.Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. First, it should be noted that the same components or parts in the drawings represent the same reference numerals as much as possible.
본 발명을 설명하는 데 있어서, 관련된 공지 기술에 대한 구체적인 설명은 본 발명의 요지를 모호하게 하지 않기 위해 생략한다.In describing the present invention, detailed descriptions of related well-known techniques are omitted in order not to obscure the subject matter of the present invention.
도 1은 본 발명의 일실시예에 의한 미세패턴롤의 제조방법을 도시한 흐름도이다. 도 2a 내지 도 2c는 도 1의 미세패턴롤의 제조방법을 도시한 공정도들이다. 1 is a flowchart illustrating a method of manufacturing a fine pattern roll according to an embodiment of the present invention. 2A to 2C are process diagrams illustrating a method of manufacturing the fine pattern roll of FIG. 1.
도 1, 도 2a 내지 도 2c에 도시된 바와 같이, 본 실시예에 의한 미세패턴롤의 제조방법은, 반도체 공정을 통해 표면에 미세패턴이 양각된 마스터 평판(P1)을 제작하는 단계(S100)와, 마스터 평판(P1)을 복제해 미세패턴이 음각된 클리쉐 시트(C)를 제작하는 단계(S200)와, 클리쉐 시트(C)를 패턴롤(210) 표면에 부착하는 단계(S300)를 포함한다.As shown in Figure 1, Figure 2a to 2c, the method for manufacturing a fine pattern roll according to the present embodiment, the step of producing a master plate (P1) embossed with a fine pattern on the surface through a semiconductor process (S100) And duplicating the master plate P1 to produce a cliché sheet C having a fine pattern engraved therein (S200), and attaching the cliché sheet C to the surface of the pattern roll 210 (S300). do.
본 실시예에서는, 상기 클리쉐 시트(C)를 제작하는 단계(S200)에서, 마스터 평판(P1)을 임프린트(IMPRINT) 복제해 미세패턴이 음각된 합성수지 소재의 클리쉐 시트(C)가 제작된다. In the present embodiment, in the step S200 of manufacturing the cliché sheet C, the cliché sheet C of the synthetic resin material having the fine pattern engraved by imprinting the master plate P1 is produced.
위와 같은 본 실시예에 따르면, 반도체 공정을 통해 마스터 평판(P1)이 제작되므로, 미세패턴이 마이크로 단위의 매우 미세한 크기로 제작될 수 있다. According to the present embodiment as described above, since the master plate (P1) is produced through a semiconductor process, a fine pattern can be produced in a very fine size of a micro unit.
또한, 반도체 소재의 특성상 표면 연마 또는 절삭이 가능하므로, 마스터 평판(P1) 제작 중 오차가 발생하더라도 이를 쉽게 극복할 수 있다.In addition, since the surface of the semiconductor material can be polished or cut, even if an error occurs during the production of the master plate (P1) it can be easily overcome.
도 1에 도시된 바와 같이, 클리쉐 시트(C)를 제작하는 단계(S200)를 통해 미세패턴이 음각된 합성수지 소재의 클리쉐 시트(C)를 제작한 후에, 패턴롤(210) 표면에 UV 경화 레진(G)을 도포하는 단계(S210)가 추가로 수행될 수도 있다. As shown in FIG. 1, after producing the cliché sheet C of the synthetic resin material in which the fine pattern is engraved through the step S200 of manufacturing the cliché sheet C, a UV cured resin is formed on the surface of the pattern roll 210. Applying (G) (S210) may be further performed.
그리고, 클리쉐 시트(C)를 패턴롤(210) 표면에 부착하는 단계(S300) 후에, 클리쉐 시트(C)를 가압한 뒤, UV 경화 레진(G)을 경화시키고, 클리쉐 시트(C)를 패턴롤(210) 표면으로부터 분리하는 단계(S310)가 추가로 수행되며, 클리쉐롤이 제조될 수도 있다. After attaching the cliché sheet C to the surface of the pattern roll 210 (S300), the cliché sheet C is pressed, the UV cured resin G is cured, and the cliché sheet C is patterned. Separating step S310 from the surface of the roll 210 is further performed, and cliché rolls may be produced.
이러한 경우, 클리쉐 시트(C)에 형성된 미세패턴과는 역상인 역상패턴이 패턴롤(210) 표면에 형성된다.In this case, an inverse phase pattern that is inverse to the fine pattern formed on the cliché sheet C is formed on the surface of the pattern roll 210.
한편, 반도체 공정을 통해 제작된 마스터 평판(P1)은 외력에 의해 마모 및 변형되기 쉽다. On the other hand, the master plate P1 produced through the semiconductor process is likely to be worn and deformed by an external force.
클리쉐 시트(C)를 패턴롤(210) 표면에 부착하는 단계(S300)에서, 패턴롤(210)이 거치되고, 길이방향으로 이동하는 롤거치부(200)와, 롤거치부(200) 일측에 위치되고, 패턴롤(210)에 부착되는 클리쉐 시트(C)의 장력을 제어하는 장력제어 댄서(300)가, 패턴롤(210) 일측에 구비된 카메라(220)에 의해 획득된 클리쉐 시트(C)의 영상을 바탕으로, 클리쉐 시트(C)가 설정된 위치에 감기도록 유도하게 된다. In the step (S300) of attaching the cliché sheet C to the surface of the pattern roll 210, the roll roll 200 is mounted on the pattern roll 210, and the roll roll portion 200 is moved in the longitudinal direction. The tension control dancer 300, which is positioned at and controls the tension of the cliché sheet C attached to the pattern roll 210, is obtained by the camera 220 provided on one side of the pattern roll 210. Based on the image of C), the cliché sheet C is induced to be wound at the set position.
롤거치부(200) 및 장력제어댄서(300)에 의하여 클리쉐 시트(C)가 패턴롤(210)에 정확히 감기게 된다.The cliché sheet C is accurately wound on the pattern roll 210 by the roll mounting unit 200 and the tension control dancer 300.
도 3은 본 발명의 다른 실시예에 의한 미세패턴롤의 제조방법을 도시한 흐름도이다. 도 4a 내지 도 4c는 도 3의 미세패턴롤의 제조방법을 도시한 공정도들이다. 3 is a flowchart illustrating a method of manufacturing a fine pattern roll according to another embodiment of the present invention. 4A to 4C are process diagrams illustrating a method of manufacturing the fine pattern roll of FIG. 3.
본 실시예에 의한 미세패턴롤의 제조방법에서는, 상기 클리쉐 시트를 제작하는 단계를 제외하고는 도 1 내지 도 2c를 참조하여 설명한 미세패턴롤의 제조방법과 동일하므로 중복되는 설명은 생략한다. In the method for manufacturing a micropattern roll according to the present embodiment, except for preparing the cliché sheet, the same method as the method for manufacturing the micropattern roll described with reference to FIGS. 1 to 2c is omitted.
도 3 및 도 4a 내지 도 4c를 참조하면, 본 실시예에서는, 마스터 평판(P1)의 마모 및 변형이 최소화되도록, 도면에 도시된 바와 같이, 클리쉐 시트를 제작하는 단계(S210)에서, 마스터 평판(P1)을 전주도금 복제해 미세패턴이 음각된 전주도금 클리쉐 시트(C)를 제작할 수도 있다.Referring to FIGS. 3 and 4A to 4C, in the present embodiment, as illustrated in the drawing, in order to minimize wear and deformation of the master plate P1, in the step of manufacturing the cliché sheet (S210), the master plate (P1) may be reproduced by electroplating to produce an electroplated cliché sheet C in which a fine pattern is engraved.
전주도금 클리쉐 시트(C)를 마스터 평판(P1)으로부터 용이하게 분리할 수 있도록, 전주도금 클리쉐 시트(C)를 제작하는 단계(S200)가 수행되기 전에, 마스터 평판(P1)에 시드 레이어(L)가 형성된다.In order to easily separate the electroplating cliché sheet C from the master plate P1, the seed layer L is applied to the master plate P1 before the step S200 of fabricating the electroplating cliché sheet C is performed. ) Is formed.
또한, 전주도금 클리쉐 시트(C)의 양 표면 중, 마스터 평판(P1)과 접촉하지 않은 표면은, 매끄럽지 못하고 울퉁불퉁할 여지가 크다. Moreover, the surface which is not in contact with the master flat plate P1 among both surfaces of the electroplating cliché sheet C is not smooth and has a large possibility of being bumpy.
이에 따라, 클리쉐 시트(C)를 패턴롤(210) 표면에 부착하는 단계(S300) 수행 전에 전주도금 클리쉐 시트(C)의 울퉁불퉁한 표면을 연마하는 것이 바람직하다.Accordingly, it is preferable to polish the uneven surface of the pre-plated cliché sheet C before performing the step S300 of attaching the cliché sheet C to the surface of the pattern roll 210.
전주도금을 통해 전주도금 클리쉐 시트(C)가 제작되므로, 마스터 평판(P1)에 외력이 가해지지 않게 되고, 결과적으로 마스터 평판(P1)에 마모 및 변형이 발생되지 않는다. Since the electroplating cliché sheet C is produced through electroplating, no external force is applied to the master plate P1, and as a result, wear and deformation do not occur on the master plate P1.
또한, 반도체 공정을 통해 마이크로 단위의 정밀한 미세패턴을 제작하고, 이를 전주도금 복제해 전주도금 클리쉐 시트(C)를 제작하기 때문에, 클리쉐 시트(C)의 정밀도 및 생산성이 향상된다.In addition, since a fine micropattern of a micro unit is manufactured through the semiconductor process and the electroplating is replicated to produce the electroplating cliché sheet C, the precision and productivity of the cliché sheet C are improved.
도 1 내지 도 4c를 참조하여 설명한 미세패턴롤의 제조방법을 통해 제작되는 클리쉐 시트(C)는, 도 5 내지 도 7d에 도시된 바와 같은, 미세패턴롤의 제조장치에 의해 패턴롤(210)에 미세패턴을 형성하는데 활용 된다.The cliché sheet C manufactured by the method for manufacturing the micropattern roll described with reference to FIGS. 1 to 4C is the pattern roll 210 by the apparatus for manufacturing the micropattern roll, as shown in FIGS. 5 to 7D. It is used to form a fine pattern in.
보다 구체적으로, 상기 미세패턴롤의 제조장치에 대하여 상술한다. More specifically, the apparatus for manufacturing the fine pattern roll will be described in detail.
도 5는 도 1 및 도 3의 미세패턴롤의 제조방법을 위한 미세패턴롤의 제조장치를 도시한 사시도이다. 도 6은 도 5의 미세패턴롤의 제조장치를 간략하게 도시한 모식도이다. 도 7a 내지 도 7d는 도 5의 미세패턴롤의 제조장치의 패턴롤에 레진이 도포되는 상태를 도시한 공정도들이다.5 is a perspective view illustrating an apparatus for manufacturing a fine pattern roll for the method of manufacturing the fine pattern roll of FIGS. 1 and 3. FIG. 6 is a schematic diagram schematically showing an apparatus for manufacturing a fine pattern roll of FIG. 5. 7A to 7D are process diagrams illustrating a state in which resin is applied to a pattern roll of the apparatus for manufacturing a fine pattern roll of FIG. 5.
도 5 내지 도 7d를 참조하면, 상기 미세패턴롤의 제조장치는, 연성재질의 클리쉐 시트(C)가 감겨진 시트롤(110)이 거치되는 시트롤거치부(100)와, 시트롤(110)로부터 풀려진 클리쉐 시트(C)가 표면에 감겨지는 패턴롤(210)이 거치되는 롤거치부(200)와, 시트롤거치부(100) 및 롤거치부(200) 사이에 위치되고, 시트롤(110)로부터 패턴롤(210)을 향해 이동하는 클리쉐 시트(C)와 접촉해 클리쉐 시트(C)에 장력을 인가하는 롤 형태의 장력제어 댄서(300)와, 장력제어 댄서(300)와 높이 차를 가지며 장력제어 댄서(300) 전측 및 후측에 위치된 아이들롤러(400)를 포함한다.5 to 7D, the apparatus for manufacturing fine pattern rolls includes: a situ control unit 100 on which a situ 110 on which a cliché sheet C of a soft material is wound is mounted, and a situ 110. Cliché sheet (C) released from the roll roll portion 200 is placed between the pattern roll 210 is wound on the surface, and the seat control portion 100 and the roll placement portion 200, the sheet A tension control dancer 300 in the form of a roll for applying tension to the cliché sheet C by contacting the cliché sheet C moving from the roll 110 toward the pattern roll 210, and the tension control dancer 300; It includes an idle roller 400 having a height difference and located in the front and rear of the tension control dancer (300).
상기 미세패턴롤의 제조장치에는, 롤거치부(200)에 패턴롤(210)을 회전시키는 구동장치가 구비된다.The apparatus for manufacturing a fine pattern roll is provided with a driving device for rotating the pattern roll 210 on the roll placement unit 200.
장력제어 댄서(300)의 길이방향으로 연장된 양단은 각각 장력제어 댄서(300)와 수직한 높이이동 가이드(310)에 삽입된다. 높이이동 가이드(310)에 장력제어 댄서(300)의 길이방향으로 연장된 일단을 높이 이동시키는 액츄에이터(320)가 내장된다.Both ends extending in the longitudinal direction of the tension control dancer 300 are inserted into the height movement guide 310 perpendicular to the tension control dancer 300, respectively. The height movement guide 310 has a built-in actuator 320 for moving the one end extending in the longitudinal direction of the tension control dancer 300 in height.
장력제어 댄서(300)의 높이 이동에 따라, 시트롤(110)로부터 패턴롤(210)로 이동하는 클리쉐 시트(C)에 발생되는 장력이 가감된다. As the height of the tension control dancer 300 moves, the tension generated in the cliché sheet C moving from the sea troll 110 to the pattern roll 210 is added or subtracted.
시트롤(110)로부터 클리쉐 시트(C)가 비스듬히 풀리더라도 장력제어 댄서(300)가 높이 이동하며 클리쉐 시트(C)에 발생되는 장력을 가감해 패턴롤(210)로는 정확하게 감길 수 있도록 클리쉐 시트(C)를 유도한다. Even if the cliché sheet C is unscrewed from the sea troll 110, the tension control dancer 300 moves high and the crest sheet C is formed so as to accurately wind the pattern roll 210 by adding or subtracting the tension generated in the cliché sheet C. Induce C).
특히, 장력제어 댄서(300)는 클리쉐 시트(C)에 발생되는 장력을 가감해 클리쉐 시트(C)의 길이방향 인장이 일정하도록 유도한다.In particular, the tension control dancer 300 induces the tension in the cliché sheet (C) to reduce the tension in the longitudinal direction of the cliché sheet (C).
클리쉐 시트(C)의 폭방향 양측에 각각 클리쉐 시트(C)의 길이방향을 따라 동일한 간격으로 마크(111)가 형성된다. 롤거치부(200) 일측에 마크(111)를 감지하는 카메라(220)가 구비되고, 카메라(220)를 통해 감지된 영상신호를 바탕으로 패턴롤(210)이 길이방향으로 이동하게 된다. Marks 111 are formed on both sides in the width direction of the cliché sheet C at equal intervals along the longitudinal direction of the cliché sheet C, respectively. The camera 220 for detecting the mark 111 is provided at one side of the roll fixing unit 200, and the pattern roll 210 is moved in the longitudinal direction based on the image signal detected by the camera 220.
이를 좀 더 자세히 설명하면 다음과 같다. This is explained in more detail as follows.
즉, 클리쉐 시트(C)는, 클리쉐 시트(C)에 발생되는 장력 또는 마찰력에 의해 폭방향으로 편차를 가지고 이동(사행)할 수 있다. 따라서, 사행하는 클리쉐 시트(C)가 패턴롤(210) 표면에 정확히 감길 수 있도록 패턴롤(210)이 회전축 방향으로 이동한다.That is, the cliché sheet C can move (meander) with a deviation in the width direction by the tension or the frictional force generated in the cliché sheet C. Therefore, the pattern roll 210 is moved in the rotation axis direction so that the meandering cliché sheet C can be accurately wound on the surface of the pattern roll 210.
롤거치부(200)는, 패턴롤(210)이 고정되는 중심축바(230)와, 중심축바(230)와 수직하고, 중심축바(230)의 길이방향 양측이 각각 삽입된 고정부재(240)와, 고정부재(240) 하단에 위치되고, 카메라(220)를 통해 감지된 영상신호를 바탕으로 고정부재(240)를 중심축바(230)의 길이방향으로 이동시키는 좌우이동장치(250)를 포함한다.The roll mounting unit 200 includes a center shaft bar 230 on which the pattern roll 210 is fixed, a fixing member 240 perpendicular to the center shaft bar 230, and both sides of the center shaft bar 230 in the longitudinal direction are inserted. And, located on the bottom of the fixing member 240, and includes a left and right moving device 250 for moving the fixing member 240 in the longitudinal direction of the central axis bar 230 based on the image signal detected by the camera 220 do.
카메라(220)를 통해 감지된 영상신호에 따라, 좌우이동장치(250)는 고정부재(240)를 좌우 이동시키게 된다. 이에 따라, 사행하는 클리쉐 시트(C)가 균일하게 패턴롤(210) 표면에 안착된다.According to the image signal sensed by the camera 220, the left and right moving device 250 to move the fixing member 240 left and right. Thereby, the meandering cliché sheet C is uniformly seated on the surface of the pattern roll 210.
한편, 도 7a 내지 도 7d를 참조하면, 패턴롤(210)에는 클리쉐 시트(C)를 패턴롤(210)에 고정하는 접착 필름 또는 접착 용액이 도포된다. 접착 필름 또는 접착 용액에 의해 패턴롤(210)에 안착된 클리쉐 시트(C)가 패턴롤(210)에 고정된다.7A to 7D, an adhesive film or an adhesive solution for fixing the cliché sheet C to the pattern roll 210 is applied to the pattern roll 210. The cliché sheet C seated on the pattern roll 210 by an adhesive film or an adhesive solution is fixed to the pattern roll 210.
롤거치부(200)에는, 패턴롤(210)을 향해 클리쉐 시트(C)를 가압하는 가압롤러(260)가 구비된다. 가압롤러(260)가 클리쉐 시트(C)를 가압함에 따라, 클리쉐 시트(C)가 견고히 패턴롤(210)에 부착된다.The roll mounting unit 200 is provided with a pressure roller 260 for pressing the cliché sheet C toward the pattern roll 210. As the pressure roller 260 presses the cliché sheet C, the cliché sheet C is firmly attached to the pattern roll 210.
가압롤러(260)의 길이방향 양단에는 각각 개별적으로 구동하고, 가압롤러(260)와 패턴롤(210)과의 거리를 가감하는 압력생성장치(261)가 구비된다. 클리쉐 시트(C)에 가해지는 장력에 따라 패턴롤(210)의 양측 중 어느 한 측부에 안착되는 클리쉐 시트(C)에 더 큰 힘이 가해질 수 있다. At both ends of the pressure roller 260 in the longitudinal direction, the pressure generator 261 is provided to drive each of the pressure rollers 260 and the distance between the pressure roller 260 and the pattern roll 210. According to the tension applied to the cliché sheet C, a greater force may be applied to the cliché sheet C seated on either side of the pattern roll 210.
가압롤러(260)는, 이를 감안해 클리쉐 시트(C)의 폭방향 양측 중 어느 한 측부를 가압하거나 감압한다. 가압롤러(260)에 의해 클리쉐 시트(C)가 폭방향을 따라 균일한 힘으로 패턴롤(210)에 부착될 수 있도록 유도된다.In view of this, the pressure roller 260 presses or depressurizes any one side of both sides of the cliché sheet C in the width direction. The cliché sheet C is guided by the pressure roller 260 to be attached to the pattern roll 210 with a uniform force along the width direction.
또한, 패턴롤(210)에 접착 필름 또는 접착 용액이 도포되지 않고, UV 경화 레진(G)이 도포될 수도 있다.In addition, the adhesive film or the adhesive solution is not applied to the pattern roll 210, UV cured resin (G) may be applied.
이러한 경우, 가압롤러(260)에 의해 클리쉐 시트(C)가 UV 경화 레진(G)에 가압되며 안착된다. 그리고, UV 경화 레진(G)이 경화된 후 클리쉐 시트(C)가 패턴롤(210)로부터 분리된다. 이러한 경우에는, 앞서 설명한 바와 같이, 클리쉐 시트(C)에 형성된 미세패턴과는 역상인 역상패턴이 패턴롤(210) 표면에 형성된다. In this case, the cliché sheet C is pressed onto the UV curing resin G by the pressure roller 260 and seated thereon. After the UV curing resin G is cured, the cliché sheet C is separated from the pattern roll 210. In this case, as described above, an inverse pattern that is inverse to the fine pattern formed in the cliché sheet C is formed on the surface of the pattern roll 210.
위와 같이 구성되는 본 발명의 일실시예의 미세패턴롤을 제조하는 방법 및 장치에 따르면, 반도체 공정을 통해 마스터 평판(P1)이 제작되므로, 미세 패턴 깊이 제어 및 형상 제어가 용이하고, 마이크로 단위의 미세 패턴 형성이 가능하다. According to the method and apparatus for manufacturing a micro pattern roll of an embodiment of the present invention configured as described above, since the master plate (P1) is produced through a semiconductor process, it is easy to control the fine pattern depth and shape, and fine in the micro unit Pattern formation is possible.
또한, 종래 기계를 통한 표면 정밀 가공에 비해, 가공 시간을 단축할 수 있으며, 특히, 고가의 장비가 필요하지 않아, 종래 미세 패턴롤 제작에 비해 경제적이다.In addition, compared to the surface precision processing through the conventional machine, it is possible to shorten the processing time, in particular, expensive equipment is not necessary, it is more economical than the conventional fine pattern roll production.
이상과 같이, 본 발명에 따른 미세패턴롤을 제조하는 방법 및 장치를 예시한 도면을 참조로 하여 설명하였으나, 본 명세서에 개시된 실시예와 도면에 의해 본 발명이 한정되는 것은 아니며, 본 발명의 기술사상범위 내에서 당업자에 의해 다양한 변형이 이루어질 수 있음은 물론이다.As described above, the method and apparatus for manufacturing a fine pattern roll according to the present invention have been described with reference to the drawings, but the present invention is not limited by the embodiments and drawings disclosed herein, and the present invention. Of course, various modifications may be made by those skilled in the art within the spirit and scope.

Claims (13)

  1. 반도체 공정을 통해 표면에 미세패턴이 양각된 마스터 평판을 제작하는 단계;Manufacturing a master plate having a fine pattern embossed on a surface thereof through a semiconductor process;
    상기 마스터 평판을 복제해 상기 미세패턴이 음각된 클리쉐 시트를 제작하는 단계; 및Replicating the master plate to produce a cliché sheet in which the micropattern is engraved; And
    상기 클리쉐 시트를 롤 표면에 부착하는 단계를 포함하는 미세패턴롤의 제조방법.The method of manufacturing a micropattern roll comprising attaching the cliché sheet to a roll surface.
  2. 제1항에 있어서,The method of claim 1,
    상기 클리쉐 시트를 제작하는 단계에서,In the manufacturing of the cliché sheet,
    상기 마스터 평판을 임프린트(IMPRINT) 복제해 상기 미세패턴이 음각된 합성수지 소재의 클리쉐 시트를 제작하는 것을 특징으로 하는 미세패턴롤의 제조방법.And imprinting the master plate to produce a cliché sheet of synthetic resin material in which the fine pattern is engraved.
  3. 제2항에 있어서,The method of claim 2,
    상기 클리쉐 시트를 제작하는 단계 후에, After manufacturing the cliché sheet,
    상기 롤 표면에 UV 경화 레진을 도포하는 단계; 및Applying a UV cured resin to the roll surface; And
    상기 클리쉐 시트를 롤 표면에 부착하는 단계 후에,After attaching the cliché sheet to the roll surface,
    상기 UV 경화 레진을 경화시키고, 상기 클리쉐 시트를 상기 롤 표면으로부터 분리하는 단계를 더 포함하는 미세패턴롤의 제조방법.Hardening the UV cured resin and separating the cliché sheet from the roll surface.
  4. 제1항에 있어서,The method of claim 1,
    상기 클리쉐 시트를 제작하는 단계에서,In the manufacturing of the cliché sheet,
    상기 마스터 평판을 전주도금 복제해 상기 미세패턴이 음각된 전주도금 클리쉐 시트를 제작하는 것을 특징으로 하는 미세패턴롤의 제조방법.A method of manufacturing a fine pattern roll, characterized in that for producing a pre-plated cliché sheet with the fine pattern engraved by replicating the master plate.
  5. 제1항에 있어서,The method of claim 1,
    상기 클리쉐 시트를 롤 표면에 부착하는 단계에서,In attaching the cliché sheet to a roll surface,
    상기 롤이 거치되고, 길이방향으로 이동하는 롤거치부와, The roll is mounted, and roll roll portion moving in the longitudinal direction,
    상기 롤거치부 일측에 위치되고, 상기 롤에 부착되는 상기 클리쉐 시트의 장력을 제어하는 장력제어 댄서가,Located in one side of the roll mounting portion, the tension control dancer for controlling the tension of the cliché sheet attached to the roll,
    상기 롤 일측에 구비된 카메라에 의해 획득된 상기 클리쉐 시트의 영상을 바탕으로 상기 클리쉐 시트가 설정된 위치에 감기도록 하는 것을 특징으로 하는 미세패턴롤의 제조방법.The method of manufacturing a fine pattern roll, characterized in that the cliché sheet is wound to a set position based on the image of the cliché sheet obtained by the camera provided on one side of the roll.
  6. 연성재질의 클리쉐 시트가 감겨진 시트롤이 거치되는 시트롤거치부;A scitrol mounting portion on which a citrate sheet wound with a soft material is mounted;
    상기 시트롤로부터 풀려진 상기 클리쉐 시트가 감겨지는 패턴롤이 거치되는 롤거치부;A roll holding part on which a pattern roll on which the cliché sheet released from the sea troll is wound is mounted;
    상기 시트롤거치부 및 상기 롤거치부 사이에 위치되고, 상기 시트롤로부터 상기 패턴롤을 향해 이동하는 상기 클리쉐 시트와 접촉해 상기 클리쉐 시트에 장력을 인가하는 장력제어 댄서;A tension control dancer positioned between the sea troll portion and the roll trough portion, the tension control dancer applying a tension to the cliché sheet in contact with the cliché sheet moving from the sea troll toward the pattern roll;
    상기 장력제어 댄서와 높이 차를 가지며 상기 장력제어 댄서 전측 및 후측에 위치된 아이들롤러; 및An idle roller having a height difference from the tension control dancer and positioned at the front and rear sides of the tension control dancer; And
    상기 롤거치부에 구비되어 상기 패턴롤을 회전시키는 구동장치를 포함하는 미세패턴롤의 제조장치.Apparatus for manufacturing a fine patterned roll comprising a driving device provided on the roll mounting portion for rotating the pattern roll.
  7. 제6항에 있어서,The method of claim 6,
    상기 장력제어 댄서의 길이방향 양단은 각각 상기 장력제어 댄서와 수직한 높이이동 가이드에 삽입되고,Both longitudinal ends of the tension control dancer are inserted into a height moving guide perpendicular to the tension control dancer, respectively.
    상기 높이이동 가이드에 상기 장력제어 댄서의 길이방향 일단을 높이 이동시키는 액츄에이터가 내장된 것을 특징으로 하는 미세패턴롤의 제조장치.Apparatus for producing a fine pattern roll, characterized in that the actuator for moving the height in one end of the longitudinal direction of the tension control dancer in the height movement guide.
  8. 제6항에 있어서,The method of claim 6,
    상기 클리쉐 시트의 폭방향 양측에 각각 상기 클리쉐 시트의 길이방향을 따라 동일한 간격으로 마크가 형성되고,Marks are formed on both sides in the width direction of the cliché sheet at equal intervals along the longitudinal direction of the cliché sheet, respectively.
    상기 롤거치부 일측에 상기 마크를 감지하는 카메라가 구비되고,A camera for detecting the mark is provided on one side of the roll mounting unit,
    상기 카메라를 통해 감지된 영상신호를 바탕으로 상기 패턴롤이 길이방향으로 이동하는 것을 특징으로 하는 미세패턴롤의 제조장치.Apparatus for producing a fine pattern roll, characterized in that for moving the pattern roll in the longitudinal direction based on the image signal detected by the camera.
  9. 제8항에 있어서,The method of claim 8,
    상기 롤거치부는,The roll mounting portion,
    상기 패턴롤이 고정되는 중심축바;A center shaft bar to which the pattern roll is fixed;
    상기 중심축바와 수직하고, 상기 중심축바의 길이방향 양측이 각각 삽입된 고정부재; 및A fixing member perpendicular to the central axis bar and having both sides in the longitudinal direction of the central axis bar inserted therein; And
    상기 고정부재 하단에 위치되고, 상기 카메라를 통해 감지된 영상신호를 바탕으로 상기 고정부재를 상기 중심축바의 길이방향으로 이동시키는 좌우이동장치를 포함하는 것을 특징으로 하는 미세패턴롤의 제조장치.Located at the bottom of the fixing member, the apparatus for producing a fine pattern roll, characterized in that it comprises a left and right moving device for moving the fixing member in the longitudinal direction of the central axis bar based on the image signal detected by the camera.
  10. 제6항에 있어서,The method of claim 6,
    상기 패턴롤에는 상기 클리쉐 시트를 상기 패턴롤에 고정하는 접착 필름 또는 접착 용액이 도포되는 것을 특징으로 하는 미세패턴롤의 제조장치.The pattern roll is an apparatus for producing a fine pattern roll, characterized in that the adhesive film or an adhesive solution for fixing the cliché sheet to the pattern roll is applied.
  11. 제6항에 있어서,The method of claim 6,
    상기 롤거치부에는,In the roll mounting portion,
    상기 패턴롤을 향해 상기 클리쉐 시트를 가압하는 가압롤러가 구비되는 것을 특징으로 하는 미세패턴롤의 제조장치.Apparatus for producing a fine pattern roll, characterized in that the pressing roller for pressing the cliché sheet toward the pattern roll is provided.
  12. 제11항에 있어서,The method of claim 11,
    상기 가압롤러의 길이방향 양단에는 각각 개별적으로 구동하고, 상기 가압롤러와 상기 패턴롤과의 거리를 가감하는 압력생성장치가 구비되는 것을 특징으로 하는 미세패턴롤의 제조장치.A device for producing a fine patterned roll, characterized in that a pressure generating device for driving each of the lengthwise direction of the pressing roller separately and adding or subtracting the distance between the pressing roller and the pattern roll.
  13. 제6항에 있어서,The method of claim 6,
    상기 패턴롤에 UV 경화 레진이 도포되는 것을 특징으로 하는 미세패턴롤의 제조장치.Apparatus for producing a fine pattern roll, characterized in that the UV cured resin is applied to the pattern roll.
PCT/KR2017/005579 2016-06-07 2017-05-29 Micropattern roll manufacturing method and micropattern roll manufacturing device therefor WO2017213370A1 (en)

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