WO2017202066A1 - 显示面板及其制作方法、以及显示装置 - Google Patents

显示面板及其制作方法、以及显示装置 Download PDF

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Publication number
WO2017202066A1
WO2017202066A1 PCT/CN2017/073751 CN2017073751W WO2017202066A1 WO 2017202066 A1 WO2017202066 A1 WO 2017202066A1 CN 2017073751 W CN2017073751 W CN 2017073751W WO 2017202066 A1 WO2017202066 A1 WO 2017202066A1
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WO
WIPO (PCT)
Prior art keywords
substrate
display panel
retaining wall
spacer
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2017/073751
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English (en)
French (fr)
Inventor
蒋松阳
芮洲
尹傛俊
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
Original Assignee
BOE Technology Group Co Ltd
Hefei Xinsheng Optoelectronics Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BOE Technology Group Co Ltd, Hefei Xinsheng Optoelectronics Technology Co Ltd filed Critical BOE Technology Group Co Ltd
Priority to US15/755,985 priority Critical patent/US10768489B2/en
Publication of WO2017202066A1 publication Critical patent/WO2017202066A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13396—Spacers having different sizes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13398—Spacer materials; Spacer properties
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/13625—Patterning using multi-mask exposure

Definitions

  • the present disclosure relates to the field of display technologies, and in particular, to a display panel, a method of fabricating the same, and a display device.
  • one or more spacers (Post Spacer) 1 are placed inside the display panel to support the upper and lower opposite glass substrates.
  • the upper and lower glass substrates are relatively displaced.
  • the black matrix located on the upper substrate is shifted to cause light leakage.
  • the spacer 1 on the upper substrate may be displaced to the pixel light-emitting region, and thus it is possible to scratch the alignment film (PI film) on the lower substrate, thereby displacing the liquid crystal orientation there.
  • Embodiments of the present disclosure provide a display panel, a method of fabricating the same, and a display device.
  • an embodiment of the present disclosure provides a display panel including opposing first and second substrates.
  • the display panel further comprises: a spacer located on the first substrate; and at least two retaining walls located on the second substrate.
  • at least two retaining walls constitute a recessed area, and the spacer corresponds to the recessed area, and at least two retaining walls are configured to limit the movement of the spacer.
  • the retaining wall includes a retaining wall body layer that is located on the second substrate and protrudes from the second substrate toward the first substrate.
  • a retaining wall buffer layer is located on a surface of the main body layer of the retaining wall facing the first substrate.
  • the surface roughness of the retaining wall buffer layer is less than the retaining wall body layer.
  • the slope of the retaining wall buffer layer away from the side of the spacer is less than 45 degrees.
  • the stiffness of the retaining wall buffer layer is less than the hardness of the retaining wall body layer.
  • the retaining wall body layer is formed of a source drain material.
  • the retaining wall body layer is formed of a source drain material and an active layer material.
  • the barrier rib layer is formed of a photoresist material.
  • the first substrate is a color filter substrate
  • the second substrate is an array substrate
  • the first substrate is provided with an opaque region, and the spacer is located in the opaque region of the first substrate.
  • the display panel further includes: a protrusion located in the recessed area of the second substrate and in contact with the spacer.
  • the bumps are formed from source drain material.
  • an embodiment of the present disclosure provides a method of fabricating a display panel, the display panel including a first substrate and a second substrate, and the manufacturing method includes: forming a spacer on the first substrate; At least two retaining walls are formed on the upper wall. Wherein, at least two retaining walls constitute a recessed area, and the spacer corresponds to the recessed area, and at least two retaining walls are configured to limit the movement of the spacer.
  • forming the retaining wall includes: forming a retaining wall body layer located on the second substrate and protruding from the second substrate toward the first substrate; forming a retaining wall buffer layer facing the facing surface of the retaining wall body layer The surface of a substrate.
  • the fabricating method includes forming a bump that is located in a recessed region of the second substrate and in contact with the spacer.
  • a retaining wall body layer, a retaining wall buffer layer, and a bump are formed in the same photolithography process using a gray scale reticle or a halftone reticle.
  • the photoresist on the bulkhead body layer is retained to form a barrier layer buffer layer.
  • an embodiment of the present disclosure provides a display device including the above display panel.
  • a display panel, a method of fabricating the same, and a display device according to an embodiment of the present disclosure effectively prevent the spacer 1 from sliding to a display area when an external force is applied to the display panel.
  • FIG. 1 is a schematic view showing a structural change of a display panel before and after a force according to a first embodiment of the present disclosure
  • FIG. 2 is a schematic view showing a comparison of the structure of the retaining wall of the display panel provided by the second embodiment of the present disclosure and the retaining wall of the display panel provided by the first embodiment;
  • FIG. 3 is a first schematic view showing a structural change of a display panel before and after a force according to a second embodiment of the present disclosure
  • FIG. 4 is a second schematic diagram showing a structural change of a display panel before and after a force according to a second embodiment of the present disclosure
  • FIG. 5 is a flowchart of a step of forming a retaining wall and a protrusion on a second substrate in a method of fabricating a display panel according to an embodiment of the present disclosure
  • Figure 6 is a schematic view showing the structure of the second substrate at the time of exposure shown in Figure 5;
  • Figure 7 is a schematic view showing the structure of the second substrate after development shown in Figure 5;
  • FIG. 8 is a schematic view showing the structure of the etched second substrate shown in FIG. 5;
  • Fig. 9 is a schematic view showing the structure of the second substrate after ashing shown in Fig. 5.
  • Embodiments of the present disclosure provide a display panel including opposing first and second substrates.
  • the display panel further comprises: a spacer located on the first substrate; and at least two retaining walls located on the second substrate.
  • at least two retaining walls constitute a recessed area, and the spacer corresponds to the recessed area, and at least two retaining walls are configured to limit the movement of the spacer.
  • the display panel may further include: a protrusion located in a recessed area of the second substrate and in contact with the spacer.
  • the first substrate may be a color film substrate
  • the second substrate may be an array substrate.
  • An opaque region may be disposed on the first substrate, and the spacer is located in the opaque region of the first substrate.
  • FIG. 1 is a schematic diagram of a structural change of a display panel provided before and after a force according to a first embodiment of the present disclosure.
  • the spacer 1 limits the relative displacement of the first substrate 2 and the second substrate 3 in the vertical direction in the drawing. Further, the first substrate 2 and the second substrate 3 are relatively displaced in the horizontal direction in the drawing.
  • the retaining wall 4 restricts the movement of the spacer 1 such that the relative displacement of the first substrate 2 and the second substrate 3 is restricted.
  • the retaining wall 4 effectively prevents the spacer 1 from sliding to the display area when subjected to an external force.
  • the projections 5 are in contact with the spacer 1 to provide support for better spacing of the first substrate 2 and the second substrate 3.
  • the spacer 1 is located in the opaque region of the first substrate 2 (for example, the spacer 1 is located between the black matrix 6 of the first substrate 2 and the gate line 7 of the second substrate 3), and does not affect the display effect.
  • the spacer 1 can be located on the color filter substrate, and the retaining wall 4 can be located on the array substrate, which can be compatible with the structure of the existing display panel and reduce the cost.
  • the retaining wall 4 may include: a retaining wall body layer 401 located on the second substrate 3 and protruding from the second substrate 3 toward the first substrate 2; and a retaining wall buffer layer 402 located at the main body layer of the retaining wall The surface of the 401 facing the first substrate 2.
  • FIG. 3 is a first schematic diagram showing a structural change of a display panel before and after a force according to a second embodiment of the present disclosure.
  • the spacer 1 limits the relative displacement of the first substrate 2 and the second substrate 3 in the vertical direction in the drawing.
  • the first substrate 2 and the second substrate 3 are relatively displaced in the horizontal direction in the drawing.
  • the retaining wall 4 restricts the movement of the spacer 1 such that the relative displacement of the first substrate 2 and the second substrate 3 is restricted.
  • the retaining wall 4 of the multi-layer structure can further effectively limit the movement of the spacer.
  • FIG. 4 is a second schematic diagram showing a structural change of a display panel before and after a force according to a second embodiment of the present disclosure.
  • the display panel when the display panel is pressed by an external force, the relative displacement of the first substrate 2 and the second substrate 3 in the horizontal direction in the drawing is large, and the spacer 1 slides outside the retaining wall 4.
  • the spacer 1 When the external force is removed, it is desirable that the spacer 1 quickly returns to the initial state after sliding out.
  • the surface roughness of the retaining wall buffer layer 402 may be smaller than the retaining wall main body layer 401.
  • the slope angle of the retaining wall buffer layer 402 away from the side of the spacer 1 may be less than 45 degrees.
  • the hardness of the retaining wall buffer layer 402 may be less than the hardness of the retaining wall body layer 401.
  • the retaining wall buffer layer 402 has a small surface roughness, a small hardness, and slides along a smaller slope angle during the recovery of the spacer 1 , and these features further facilitate separation After the mat 1 slides out, it quickly returns to the initial state. Therefore, even if the spacer 1 is slid outside the retaining wall 4, the spacer 1 can be quickly restored to the initial position and state. At this time, there is no light leakage on the display panel, and the image quality of the display panel does not decrease.
  • the retaining wall body layer may be formed of a source drain material.
  • the barrier layer may be formed of a photoresist material.
  • the bumps can be formed from source and drain materials.
  • the retaining wall body layer and the bumps may also be formed of a source drain material and an active layer material.
  • the barrier body layer is formed directly using the source drain material
  • the barrier buffer layer is formed using the photoresist material
  • the bump is formed using the source drain material, which can reduce the cost without adding additional materials.
  • An embodiment of the present disclosure further provides a method for fabricating a display panel, the display panel comprising the first substrate and the second substrate, the manufacturing method comprising: forming a spacer on the first substrate; At least two retaining walls are formed on the substrate. Wherein, at least two retaining walls constitute a recessed area, and the spacer corresponds to the recessed area, and at least two retaining walls are configured to limit the movement of the spacer.
  • forming the retaining wall includes: forming a retaining wall body layer located on the second substrate and protruding from the second substrate toward the first substrate; forming a retaining wall buffer layer facing the facing surface of the retaining wall body layer The surface of a substrate.
  • the fabricating method includes forming a bump that is located in a recessed region of the second substrate and in contact with the spacer.
  • a retaining wall body layer, a retaining wall buffer layer, and a bump are formed in the same photolithography process using a gray scale reticle or a halftone reticle.
  • the photoresist on the bulkhead body layer is retained to form a barrier layer buffer layer.
  • FIG. 5 is a flowchart of a step of forming a retaining wall and a protrusion on a second substrate in a method of fabricating a display panel according to an embodiment of the present disclosure.
  • the steps of forming the retaining wall and the protrusion include: step S501, depositing a source/drain layer and coating a photoresist layer; step S502, exposing the photoresist layer; and step S503, applying a photoresist layer Developing; step S504, etching the source/drain layer; and step S505, ashing the photoresist layer.
  • Fig. 6 is a schematic view showing the structure of a second substrate at the time of exposure shown in Fig. 5.
  • a source/drain layer is deposited, and a photoresist layer is applied to obtain the second substrate 3 in FIG.
  • Depositing a source drain layer and coating the photoresist layer comprises: first depositing a thickness by sputtering or thermal evaporation The source drain layer 10 is then coated with a photoresist layer.
  • the exposing includes covering the mask 8 over the second substrate 3 and irradiating to expose the photoresist layer 9.
  • the mask 8 may be a gray scale reticle, a halftone reticle or the like in order to control the photosensitive thickness of the photoresist layer 9 by controlling the luminous flux of the mask.
  • the mask may include a plurality of occlusion regions having different degrees of light transmission, for example, a occlusion region 801 having a lower degree of light transmission and a occlusion region 802 having a higher degree of light transmission, and the opacity may be opaque to a lower degree of light transmission.
  • the mask may be a completely opaque occlusion area at the retaining wall 4, and may be a partially transparent occlusion area at the protrusion 5, and the mask does not need to correspond to the second substrate 3.
  • the area at the position where the source/drain layer 10 is left is a completely light-transmitting area.
  • Fig. 7 is a schematic view showing the structure of the developed second substrate shown in Fig. 5. As shown in FIG. 7, in step S503, development is performed on the second substrate to remove a portion of the photoresist of the photoresist layer.
  • FIG. 8 is a schematic view showing the structure of the second substrate after etching shown in FIG. 5.
  • etching includes removing the source/drain layer 10 without the photoresist. The source and drain layers 10 at the retaining wall 4 and the bumps 5 are retained.
  • Fig. 9 is a schematic view showing the structure of the second substrate after ashing shown in Fig. 5.
  • ashing includes removing the photoresist of the photoresist layer 9.
  • the photoresist remains at the barrier 4.
  • the thickness and shape of the photoresist at the retaining wall 4 can be adjusted by controlling the ashing time.
  • the photoresist remaining at the retaining wall 4 forms a barrier buffer layer 402.
  • the retaining wall buffer layer 402 will have a smoother surface profile with a smaller surface roughness, less than 45 degrees (and also less than the corresponding slope angle of the retaining wall body layer 401) away from the spacer. The slope angle on one side allows the spacer 1 to quickly return to its original position after it slides out.
  • the photoresist at the retaining wall 4 may be cured by heat treatment.
  • the display panel is formed to effectively prevent the spacer 1 from sliding to the display area when the display panel is subjected to an external force, and can quickly return to the initial position even after the spacer 1 is slid out.
  • it is only necessary to adjust the pattern of the mask, and control the ashing time when the source/drain layer 10 is formed, without increasing the number of exposures, and the fabrication steps are completely unchanged.
  • Embodiments of the present disclosure also provide a display device including the above display panel.
  • the display device may be any product or component having a display function, such as a liquid crystal panel, an electronic paper, an OLED panel, a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, and the like.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Liquid Crystal (AREA)

Abstract

一种显示面板及其制作方法、以及显示装置。显示面板包括相对的第一基板（2）和第二基板（3）。显示面板还包括：隔垫物（1），其位于第一基板（2）。以及至少两个挡墙（4），其位于第二基板（3），其中，至少两个挡墙（4）构成凹陷区域，隔垫物（1）对应凹陷区域，至少两个挡墙（4）被配置为限制隔垫物（1）的移动，有效防止在显示面板受到外力时，隔垫物（1）滑到显示区域。

Description

显示面板及其制作方法、以及显示装置
相关申请的交叉引用
本申请要求2016年5月26日递交的中国专利申请第201610369130.1号的优先权，在此全文引用上述中国专利申请所公开的内容以作为本申请的一部分。
技术领域
本公开涉及显示技术领域，尤其涉及显示面板及其制作方法、以及显示装置。
背景技术
液晶显示器设计制作过程中，在显示面板内部会放置一种或多种隔垫物(Post Spacer)1以支撑上下两块相对的玻璃基板。当显示面板受到外力按压时，上下玻璃基板发生相对位移。位于上基板上的黑矩阵发生偏移，产生漏光现象。同时，位于上基板上的隔垫物1可能会偏移到像素发光区域，进而有可能划伤下基板上的配向膜(PI膜)，使该处的液晶取向紊乱。
现有的显示面板存在改进空间。
发明内容
本公开的实施例提供了显示面板及其制作方法、以及显示装置。
根据第一个方面，本公开的实施例提供了一种显示面板，包括相对的第一基板和第二基板。其中，显示面板还包括：隔垫物，其位于第一基板；以及至少两个挡墙，其位于第二基板。其中，至少两个挡墙构成凹陷区域，隔垫物对应凹陷区域，至少两个挡墙被配置为限制隔垫物的移动。
在本公开的实施例中，挡墙包括：挡墙主体层，其位于第二基板且从第二基板向第一基板突起。挡墙缓冲层，其位于挡墙主体层的面向第一基板的表面。
在本公开的实施例中，挡墙缓冲层的表面粗糙度小于挡墙主体层。
在本公开的实施例中，挡墙缓冲层远离隔垫物一侧的坡度角小于45度。
在本公开的实施例中，挡墙缓冲层的硬度小于挡墙主体层的硬度。
在本公开的实施例中，挡墙主体层由源漏极材料形成。
在本公开的实施例中，挡墙主体层由源漏极材料和有源层材料形成。
在本公开的实施例中，挡墙缓冲层由光刻胶材料形成。
在本公开的实施例中，第一基板是彩膜基板，第二基板是阵列基板。
在本公开的实施例中，第一基板上设置有不透光区域，隔垫物位于第一基板的不透光区域。
在本公开的实施例中，显示面板还包括：凸起，其位于第二基板的凹陷区域，并且与隔垫物接触。
在本公开的实施例中，凸起由源漏极材料形成。
根据第二个方面，本公开的实施例提供了一种显示面板的制作方法，显示面板包含第一基板和第二基板，制作方法包括：在第一基板上形成隔垫物；在第二基板上形成至少两个挡墙。其中，至少两个挡墙构成凹陷区域，隔垫物对应凹陷区域，至少两个挡墙被配置为限制隔垫物的移动。
在本公开的实施例中，形成挡墙包括：形成挡墙主体层，其位于第二基板且从第二基板向第一基板突起；形成挡墙缓冲层，其位于挡墙主体层的面向第一基板的表面。
在本公开的实施例中，制作方法包括：形成凸起，凸起位于第二基板的凹陷区域，并且与隔垫物接触。
在本公开的实施例中，使用灰阶掩模版或者半色调掩模版在同一次光刻工艺中形成挡墙主体层、挡墙缓冲层和凸起。
在本公开的实施例中，在光刻工艺的去除光刻胶的过程中，保留挡墙主体层上的光刻胶以形成挡墙缓冲层。
根据第三个方面，本公开的实施例提供了一种显示装置，包括上述的显示面板。
根据本公开的实施例的显示面板及其制作方法、以及显示装置，有效防止在显示面板受到外力时，隔垫物1滑到显示区域。
附图说明
为了更清楚地说明本公开的实施例的技术方案，下面将对实施例的附图进行简要说明，应当知道，以下描述的附图仅仅涉及本公开的一些实施例，而非对本公开的限制，其中：
图1是本公开的第一实施例提供的显示面板在受力前后结构变化的示意图；
图2是本公开的第二实施例提供的显示面板的挡墙与第一实施例提供的显示面板的挡墙的结构对比的示意图；
图3是本公开的第二实施例提供的显示面板在受力前后结构变化的第一个示意图；
图4是本公开的第二实施例提供的显示面板在受力前后结构变化的第二个示意图；
图5是本公开的实施例提供的显示面板的制作方法中在第二基板形成挡墙和凸起的步骤的流程图；
图6是图5所示的曝光时的第二基板结构的示意图；
图7是图5所示的显影后的第二基板结构的示意图；
图8是图5所示的刻蚀后的第二基板结构的示意图；
图9是图5所示的灰化后的第二基板结构的示意图。
具体实施方式
为了使本公开的实施例的技术方案和优点更加清楚，下面将结合附图，对本公开的实施例的技术方案进行清楚、完整的描述。显然，所描述的实施例是本公开的一部分实施例，而不是全部的实施例。基于所描述的本公开的实施例，本领域技术人员在无需创造性劳动的前提下所获得的所有其他实施例，也都属于本公开保护的范围。
本公开的实施例提供了显示面板，包括相对的第一基板和第二基板。其中，显示面板还包括：隔垫物，其位于第一基板；以及至少两个挡墙，其位于第二基板。其中，至少两个挡墙构成凹陷区域，隔垫物对应凹陷区域，至少两个挡墙被配置为限制隔垫物的移动。
在本公开的实施例中，显示面板还可以包括：凸起，其位于第二基板的凹陷区域，并且与隔垫物接触。第一基板可以是彩膜基板，第二基板可以是阵列基板。第一基板上可以设置有不透光区域，隔垫物位于第一基板的不透光区域。
图1是本公开的第一实施例提供的显示面板在受力前后结构变化的示意图。如图1所示，显示面板在受到外力挤压时，隔垫物1限制了第一基板2与第二基板3在图中竖直方向上的相对位移。此外，第一基板2与第二基板3在图中水平方向上产生了相对位移。挡墙4限制隔垫物1的移动，使得第一基板2与第二基板3的相对位移被限制。
根据本公开的实施例的显示面板，挡墙4有效防止在受到外力时隔垫物1滑到显示区域。凸起5与隔垫物1接触，提供支撑，能够更好的间隔第一基板2和第二基板3。隔垫物1位于第一基板2不透光区域(例如隔垫物1位于第一基板2的黑矩阵6和第二基板3的栅线7之间)，不影响显示效果。隔垫物1可以位于彩膜基板，挡墙4可以位于阵列基板，这样能够与现有显示面板的结构兼容，降低成本。
图2是本公开的第二实施例提供的显示面板的挡墙与第一实施例提供的显示面板的挡墙的结构对比的示意图。如图2所示，挡墙4可以包括：挡墙主体层401，其位于第二基板3且从第二基板3向第一基板2突起；以及挡墙缓冲层402，其位于挡墙主体层401的面向第一基板2的表面。
图3是本公开的第二实施例提供的显示面板在受力前后结构变化的第一个示意图。如图3所示，显示面板在受到外力挤压时，隔垫物1限制了第一基板2与第二基板3在图中竖直方向上的相对位移。第一基板2与第二基板3在图中水平方向上产生了相对位移。挡墙4限制隔垫物1的移动，使得第一基板2与第二基板3的相对位移被限制。
在本公开的实施例中，多层结构的挡墙4可以进一步有效的限制隔垫物的移动。
图4是本公开的第二实施例提供的显示面板在受力前后结构变化的第二个示意图。如图4所示，显示面板在受到外力挤压时，第一基板2与第二基板3在图中水平方向上产生的相对位移较大，隔垫物1滑动到挡墙4之外。当外力撤去后，期望的是隔垫物1滑出后快速恢复至初始状态。
因此，在本公开的实施例中，挡墙缓冲层402的表面粗糙度可以小于挡墙主体层401。挡墙缓冲层402远离隔垫物1一侧的坡度角可以小于45度。挡墙缓冲层402的硬度可以小于挡墙主体层401的硬度。
根据本公开的实施例，挡墙缓冲层402具有较小的表面粗糙度、较小的硬度，并且，隔垫物1恢复的过程中沿着较小的坡度角滑动，这些特征进一步有利于隔垫物1滑出后快速恢复至初始状态。因此，即使出现了隔垫物1滑动到挡墙4之外的情况，隔垫物1也可以快速恢复至初始位置和状态。此时，在显示面板不会出现漏光现象，显示面板的画质不会下降。
在本公开的实施例中，挡墙主体层可以由源漏极材料成。挡墙缓冲层可以由光刻胶材料形成。凸起可以由源漏极材料形成。挡墙主体层和凸起也可以由源漏极材料和有源层材料形成。
根据本公开的实施例，直接使用源漏极材料形成挡墙主体层，使用光刻胶材料形成挡墙缓冲层，使用源漏极材料形成凸起，可以不增加额外的材料，降低成本。
本公开的实施例还提供了显示面板的制作方法，用于制作上述的显示面板，显示面板包含第一基板和第二基板，制作方法包括：在第一基板上形成隔垫物；在第二基板上形成至少两个挡墙。其中，至少两个挡墙构成凹陷区域，隔垫物对应凹陷区域，至少两个挡墙被配置为限制隔垫物的移动。
在本公开的实施例中，形成挡墙包括：形成挡墙主体层，其位于第二基板且从第二基板向第一基板突起；形成挡墙缓冲层，其位于挡墙主体层的面向第一基板的表面。
在本公开的实施例中，制作方法包括：形成凸起，凸起位于第二基板的凹陷区域，并且与隔垫物接触。
在本公开的实施例中，使用灰阶掩模版或者半色调掩模版在同一次光刻工艺中形成挡墙主体层、挡墙缓冲层和凸起。
在本公开的实施例中，在光刻工艺的去除光刻胶的过程中，保留挡墙主体层上的光刻胶以形成挡墙缓冲层。
图5是本公开的实施例提供的显示面板的制作方法中在第二基板形成挡墙和凸起的步骤的流程图。如图5所示，形成挡墙和凸起的步骤包括：步骤S501，沉积源漏层，并涂布光刻胶层；步骤S502，对光刻胶层曝光；步骤S503，对光刻胶层显影；步骤S504，对源漏层刻蚀；步骤S505，对光刻胶层灰化。
图6是图5所示的曝光时的第二基板结构的示意图。在步骤S501中，沉积源漏层，并涂布光刻胶层后得到图6中的第二基板3。沉积源漏层，并涂布光刻胶层包括：首先通过溅射或热蒸发的方法沉积厚度约
Figure PCTCN2017073751-appb-000001
Figure PCTCN2017073751-appb-000002
的源漏层10，然后涂布光刻胶层。
如图6所示，在步骤S502中，曝光包括：在第二基板3上方，覆盖掩模8，并进行照射，以对光刻胶层9进行曝光。掩模8可以是灰阶掩模版、半色调掩模版等，以便于通过控制掩模的光通量来控制光刻胶层9的感光厚度。掩模上可以包括多个透光程度不同的遮挡区域，例如，透光程度较低的遮挡区域801和透光程度较高的遮挡区域802，并且，透光程度较低可以是不透光。
在本公开的实施例中，掩模在挡墙4处可以是完全不透光的遮挡区域，在凸起5处可以是部分透光的遮挡区域，掩模对应于第二基板3的不需保留源漏层10的位置处的区域为完全透光区域。
图7是图5所示的显影后的第二基板结构的示意图。如图7所示，在步骤S503中，对于第二基板进行显影以去除光刻胶层的部分光刻胶。
在本公开的实施例中，显影后挡墙4上方仍有较厚的光刻胶覆盖，凸起5上方也有光刻胶覆盖，但厚度低于挡墙4上方的光刻胶，其余对应于 掩模的完全透光区域的第二基板3的位置无光刻胶胶覆盖。
图8是图5所示的刻蚀后的第二基板结构的示意图。在步骤S504中，刻蚀包括：将无光刻胶覆盖的源漏层10去除。挡墙4和凸起5处的源漏层10被保留。
图9是图5所示的灰化后的第二基板结构的示意图。在步骤S505中，灰化包括：去除光刻胶层9的光刻胶。在凸起5处的光刻胶被去除后，挡墙4处仍然存在光刻胶。并且，通过控制灰化时间可以调节挡墙4处的光刻胶的厚度以及形状。挡墙4处保留的光刻胶形成挡墙缓冲层402。不需要进行额外的加工，挡墙缓冲层402就会具有较平滑的表面轮廓，较小的表面粗糙度，小于45度(并且也小于挡墙主体层401的相应坡度角)的远离隔垫物1一侧的坡度角，使得隔垫物1滑出后也能快速恢复至初始位置。
在本公开的实施例中，可以进行加热处理固化保留挡墙4处的光刻胶。
根据本公开的实施例，制作了显示面板，有效防止在显示面板受到外力时，隔垫物1滑到显示区域，并且，即使隔垫物1滑出后也能快速恢复至初始位置。与常规显示面板的制作方法相比，仅需调整掩模的图案，以及在制作源漏层10时控制灰化时间，未增加曝光次数，制作步骤完全没有变化。
本公开的实施例还提供了一种显示装置，包括上述的显示面板。所述显示装置可以为：液晶面板、电子纸、OLED面板、手机、平板电脑、电视机、显示器、笔记本电脑、数码相框、导航仪等任何具有显示功能的产品或部件。
可以理解的是，以上实施方式仅仅是为了说明本公开的原理而采用的示例性实施方式，然而本公开并不局限于此。对于本领域内的普通技术人员而言，在不脱离本公开的精神和实质的情况下，可以做出各种变型和改进，这些变型和改进也视为本公开的保护范围。

Claims (18)

  1. 一种显示面板，包括相对的第一基板和第二基板；其中，所述显示面板还包括：
    隔垫物，其位于第一基板；以及
    至少两个挡墙，其位于第二基板，其中，所述至少两个挡墙构成凹陷区域，所述隔垫物对应所述凹陷区域，所述至少两个挡墙被配置为限制所述隔垫物的移动。
  2. 根据权利要求1所述的显示面板，其中，所述挡墙包括：
    挡墙主体层，其位于所述第二基板且从所述第二基板向所述第一基板突起；
    挡墙缓冲层，其位于所述挡墙主体层的面向所述第一基板的表面。
  3. 根据权利要求2所述的显示面板，其中，所述挡墙缓冲层的表面粗糙度小于所述挡墙主体层。
  4. 根据权利要求2所述的显示面板，其中，所述挡墙缓冲层远离所述隔垫物一侧的坡度角小于45度。
  5. 根据权利要求2所述的显示面板，其中，所述挡墙缓冲层的硬度小于所述挡墙主体层的硬度。
  6. 根据权利要求2-5任一项所述的显示面板，其中，所述挡墙主体层由源漏极材料形成。
  7. 根据权利要求2-5任一项所述的显示面板，其中，所述挡墙主体层由源漏极材料和有源层材料形成。
  8. 根据权利要求2-5任一项所述的显示面板，其中，所述挡墙缓冲层由光刻胶材料形成。
  9. 根据权利要求1所述的显示面板，其中，所述第一基板是彩膜基板，所述第二基板是阵列基板。
  10. 根据权利要求1所述的显示面板，其中，所述第一基板上设置有不透光区域，所述隔垫物位于所述第一基板的不透光区域。
  11. 根据权利要求1所述的显示面板，其中，所述显示面板还包括：
    凸起，其位于所述第二基板的所述凹陷区域，并且与所述隔垫物接触。
  12. 根据权利要求11所述的显示面板，其中，
    所述凸起由源漏极材料形成。
  13. 一种显示面板的制作方法，所述显示面板包含第一基板和第二基板，所述制作方法包括：
    在所述第一基板上形成隔垫物；
    在所述第二基板上形成至少两个挡墙；
    其中，所述至少两个挡墙构成凹陷区域，所述隔垫物对应所述凹陷区域，所述至少两个挡墙被配置为限制所述隔垫物的移动。
  14. 根据权利要求13所述的制作方法，其中，
    形成所述挡墙包括：形成所述挡墙主体层，其位于所述第二基板且从所述第二基板向所述第一基板突起；以及
    形成所述挡墙缓冲层，其位于所述挡墙主体层的面向所述第一基板的表面。
  15. 根据权利要求13所述的制作方法，其中，所述制作方法包括：形成凸起，所述凸起位于所述第二基板的所述凹陷区域，并且与所述隔垫物接触。
  16. 根据权利要求15所述的制作方法，其中，
    使用灰阶掩模版或者半色调掩模版在同一次光刻工艺中形成所述挡墙主体层、所述挡墙缓冲层和所述凸起。
  17. 根据权利要求16所述的制作方法，其中，
    在所述光刻工艺的去除光刻胶的过程中，保留所述挡墙主体层上的光刻胶以形成所述挡墙缓冲层。
  18. 一种显示装置，包括根据权利要求1-12中任一项所述的显示面板。
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