WO2017172692A1 - Sputtering target assembly having a graded interlayer and methods of making - Google Patents

Sputtering target assembly having a graded interlayer and methods of making Download PDF

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Publication number
WO2017172692A1
WO2017172692A1 PCT/US2017/024440 US2017024440W WO2017172692A1 WO 2017172692 A1 WO2017172692 A1 WO 2017172692A1 US 2017024440 W US2017024440 W US 2017024440W WO 2017172692 A1 WO2017172692 A1 WO 2017172692A1
Authority
WO
WIPO (PCT)
Prior art keywords
layer
sputtering target
backing plate
interlayer
target
Prior art date
Application number
PCT/US2017/024440
Other languages
English (en)
French (fr)
Inventor
Stephane Ferrasse
Susan D. Strothers
Xinlin SHI
Diane L. MORALES
Original Assignee
Honeywell International Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Honeywell International Inc. filed Critical Honeywell International Inc.
Priority to JP2018552003A priority Critical patent/JP6728389B2/ja
Priority to CN201780028419.XA priority patent/CN109154073A/zh
Priority to EP17776421.4A priority patent/EP3436618B1/en
Priority to KR1020187030315A priority patent/KR102267761B1/ko
Publication of WO2017172692A1 publication Critical patent/WO2017172692A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y10/00—Processes of additive manufacturing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y80/00—Products made by additive manufacturing
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
    • C23C24/10—Coating starting from inorganic powder by application of heat or pressure and heat with intermediate formation of a liquid phase in the layer
    • C23C24/103—Coating with metallic material, i.e. metals or metal alloys, optionally comprising hard particles, e.g. oxides, carbides or nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
    • C23C24/10—Coating starting from inorganic powder by application of heat or pressure and heat with intermediate formation of a liquid phase in the layer
    • C23C24/103—Coating with metallic material, i.e. metals or metal alloys, optionally comprising hard particles, e.g. oxides, carbides or nitrides
    • C23C24/106—Coating with metal alloys or metal elements only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/129—Flame spraying
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/131—Wire arc spraying
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/134—Plasma spraying
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3435—Target holders (includes backing plates and endblocks)

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Powder Metallurgy (AREA)
  • Standing Axle, Rod, Or Tube Structures Coupled By Welding, Adhesion, Or Deposition (AREA)
  • Pressure Welding/Diffusion-Bonding (AREA)
PCT/US2017/024440 2016-04-01 2017-03-28 Sputtering target assembly having a graded interlayer and methods of making WO2017172692A1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2018552003A JP6728389B2 (ja) 2016-04-01 2017-03-28 傾斜中間層を有するスパッタリングターゲットアセンブリ及び作製方法
CN201780028419.XA CN109154073A (zh) 2016-04-01 2017-03-28 具有分级夹层的溅射靶组件和制造方法
EP17776421.4A EP3436618B1 (en) 2016-04-01 2017-03-28 Sputtering target assembly having a graded interlayer and methods of making
KR1020187030315A KR102267761B1 (ko) 2016-04-01 2017-03-28 그레이딩된 중간층을 갖는 스퍼터링 타깃 조립체 및 제조 방법

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201662316701P 2016-04-01 2016-04-01
US62/316,701 2016-04-01
US15/470,581 US20170287685A1 (en) 2016-04-01 2017-03-27 Sputtering target assembly having a graded interlayer and methods of making
US15/470,581 2017-03-27

Publications (1)

Publication Number Publication Date
WO2017172692A1 true WO2017172692A1 (en) 2017-10-05

Family

ID=59961223

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2017/024440 WO2017172692A1 (en) 2016-04-01 2017-03-28 Sputtering target assembly having a graded interlayer and methods of making

Country Status (7)

Country Link
US (1) US20170287685A1 (ko)
EP (1) EP3436618B1 (ko)
JP (1) JP6728389B2 (ko)
KR (1) KR102267761B1 (ko)
CN (1) CN109154073A (ko)
TW (1) TWI791432B (ko)
WO (1) WO2017172692A1 (ko)

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WO2019005972A1 (en) 2017-06-27 2019-01-03 Fluid Handling Llc METHOD FOR MODIFYING THE DIMENSIONS OF A PUMP PART IN CAST IRON
CA3200543A1 (en) 2017-07-28 2019-01-31 Fluid Handling Llc Fluid routing methods for a spiral heat exchanger with lattice cross section made via additive manufacturing
US11351590B2 (en) 2017-08-10 2022-06-07 Honda Motor Co., Ltd. Features of dissimilar material-reinforced blanks and extrusions for forming
US10532421B2 (en) * 2017-08-29 2020-01-14 Honda Motor Co., Ltd. UAM resistance spot weld joint transition for multimaterial automotive structures
US10870166B2 (en) 2018-02-01 2020-12-22 Honda Motor Co., Ltd. UAM transition for fusion welding of dissimilar metal parts
WO2019225472A1 (ja) * 2018-05-21 2019-11-28 株式会社アルバック スパッタリングターゲット及びその製造方法
CN113474108A (zh) * 2019-02-22 2021-10-01 欧瑞康表面处理解决方案股份公司普费菲孔 用于制造物理气相沉积(pvd)用靶的方法
JP7424093B2 (ja) * 2019-03-08 2024-01-30 株式会社リコー 立体造形物を造形する装置、立体造形物を造形する方法
CN110508809B (zh) * 2019-08-29 2020-11-17 华中科技大学 一种增材制造与表面涂覆复合成形系统及方法
EP3797904A1 (de) * 2019-09-27 2021-03-31 Flender GmbH Additives herstellungsverfahren mit härtung
US11465390B2 (en) 2020-03-02 2022-10-11 Honda Motor Co., Ltd. Post-process interface development for metal-matrix composites
US20230043638A1 (en) * 2020-10-14 2023-02-09 Questek Innovations Llc Steel to tungsten functionally graded material systems
US20220176449A1 (en) * 2020-12-07 2022-06-09 Divergent Technologies, Inc. Ultrasonic additive manufacturing of box-like parts
KR102370835B1 (ko) * 2020-12-16 2022-03-08 주식회사 이엠엘 3D 프린팅을 이용한 고효율 Zr계 실린더형 합금타겟 제조방법
CN112743216A (zh) * 2020-12-29 2021-05-04 宁波江丰电子材料股份有限公司 一种靶材和背板的焊接方法
CN112828316A (zh) * 2020-12-31 2021-05-25 西安铂力特增材技术股份有限公司 粉状金属实时混合均匀的方法及金属3d打印方法和装置
US11951542B2 (en) * 2021-04-06 2024-04-09 Eaton Intelligent Power Limited Cold spray additive manufacturing of multi-material electrical contacts
EP4323134A1 (en) * 2021-04-15 2024-02-21 Tokamak Energy Ltd Graded interlayer
GB202105385D0 (en) * 2021-04-15 2021-06-02 Tokamak Energy Ltd Graded interlayer
CN113523298B (zh) * 2021-06-30 2023-07-07 洛阳科威钨钼有限公司 一种平面锂靶材的制备方法
JP7378907B2 (ja) * 2022-02-28 2023-11-14 山陽特殊製鋼株式会社 ３ｄ造形用混合粉末の製造方法
CN117904619A (zh) 2023-04-28 2024-04-19 甚磁科技(上海)有限公司 一种合金靶材的制备装置及制备方法

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Title
See also references of EP3436618A4

Also Published As

Publication number Publication date
KR102267761B1 (ko) 2021-06-24
TW201807228A (zh) 2018-03-01
TWI791432B (zh) 2023-02-11
JP2019518865A (ja) 2019-07-04
EP3436618A4 (en) 2019-12-25
CN109154073A (zh) 2019-01-04
US20170287685A1 (en) 2017-10-05
EP3436618B1 (en) 2023-05-03
EP3436618A1 (en) 2019-02-06
JP6728389B2 (ja) 2020-07-22
KR20190004702A (ko) 2019-01-14

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