WO2017163841A1 - ガス濃度計測装置 - Google Patents
ガス濃度計測装置 Download PDFInfo
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- WO2017163841A1 WO2017163841A1 PCT/JP2017/008798 JP2017008798W WO2017163841A1 WO 2017163841 A1 WO2017163841 A1 WO 2017163841A1 JP 2017008798 W JP2017008798 W JP 2017008798W WO 2017163841 A1 WO2017163841 A1 WO 2017163841A1
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- WIPO (PCT)
- Prior art keywords
- gas
- measurement
- light
- measuring device
- purge
- Prior art date
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- 238000005259 measurement Methods 0.000 title claims abstract description 117
- 238000010926 purge Methods 0.000 claims abstract description 64
- 230000003287 optical effect Effects 0.000 claims abstract description 29
- 239000007789 gas Substances 0.000 description 195
- 238000000041 tunable diode laser absorption spectroscopy Methods 0.000 description 7
- 230000005540 biological transmission Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 4
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- 238000002485 combustion reaction Methods 0.000 description 3
- 239000000446 fuel Substances 0.000 description 3
- 238000009434 installation Methods 0.000 description 3
- 238000011144 upstream manufacturing Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 239000002737 fuel gas Substances 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- 238000004847 absorption spectroscopy Methods 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- TXKMVPPZCYKFAC-UHFFFAOYSA-N disulfur monoxide Inorganic materials O=S=S TXKMVPPZCYKFAC-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000012433 hydrogen halide Substances 0.000 description 1
- 229910000039 hydrogen halide Inorganic materials 0.000 description 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- XTQHKBHJIVJGKJ-UHFFFAOYSA-N sulfur monoxide Chemical compound S=O XTQHKBHJIVJGKJ-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N21/03—Cuvette constructions
- G01N21/05—Flow-through cuvettes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/85—Investigating moving fluids or granular solids
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N21/03—Cuvette constructions
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N21/15—Preventing contamination of the components of the optical system or obstruction of the light path
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N21/3504—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing gases, e.g. multi-gas analysis
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N21/03—Cuvette constructions
- G01N21/05—Flow-through cuvettes
- G01N2021/052—Tubular type; cavity type; multireflective
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N21/15—Preventing contamination of the components of the optical system or obstruction of the light path
- G01N2021/151—Gas blown
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/85—Investigating moving fluids or granular solids
- G01N2021/8578—Gaseous flow
Definitions
- the present invention relates to a gas concentration measuring device for measuring a component concentration in a gas flowing in a pipeline, and particularly to a gas concentration measuring device by light irradiation.
- a gas concentration measurement device using light has been used to measure various gas components in exhaust gas from combustion engines such as internal combustion engines and incinerators and fuel gas to gas engines such as gas engines and fuel cells. It has been adopted.
- FTIR Fourier transform infrared spectroscopy
- FTIR Fourier transform infrared spectrometer
- TDLAS tunable semiconductor laser light absorption spectroscopy
- a gas concentration measurement apparatus using the TDLAS method measures the concentration of a measurement target gas by irradiating laser light having a wavelength that matches the absorption spectrum of the measurement target gas and measuring the attenuation of the laser light after transmission. (See Patent Document 1).
- the gas concentration measuring apparatus based on the TDLAS method prevents contamination and dew condensation of the optical system by blowing a purge gas such as instrument air or nitrogen gas to the measuring optical system.
- the gas concentration of the measurement target gas is measured based on the following equation (1) based on Lambert-Beer's law. That is, in the measurement of the gas concentration by the TDLAS method, the optical path length (transmitted optical path length) of the laser light that passes through the measurement target is included as a parameter. In order to analyze the gas concentration with high accuracy, it is preferable that the optical path length of the laser light transmitted through the sample gas (region) does not vary. Therefore, it is necessary to make the measurement width through which the measurement target gas flows constant.
- I1 I0 ⁇ exp ( ⁇ ⁇ N ⁇ L) (1) (I0: laser light intensity before transmission, I1: laser light intensity before transmission, ⁇ : molar extinction coefficient, N: molar concentration of measurement object, L: transmission optical path length)
- An object of the present invention is to provide a gas concentration measuring device that has been improved by examining the current situation as described above.
- a light emitting part and a light receiving part are arranged to face each other with a cylindrical measurement pipe interposed therebetween, and irradiation light from the light emitting part is transmitted through the measurement pipe and the light receiving part
- the measurement pipe is connected to the side wall of the measurement pipe and is arranged at a position facing each other and orthogonal to the flow direction of the measurement target gas, and the measurement pipe extends from the gas supply port to the downstream side in the measurement target gas flow direction. It has a tapered gas inlet that spreads out.
- the measurement pipe is configured such that the gas outlet provided on the downstream side of the measuring unit has a tapered shape that narrows toward the gas outlet at the downstream end of the measurement target gas flow direction. Also good.
- the exhaust outlet may be provided on the main path side, or the exhaust outlet may be provided on the bypass path side.
- the flow rate of the purge gas supplied to the purge gas guide tube is such that the ratio of the cross-sectional area of the measuring portion that becomes the long diameter portion to the cross-sectional area of the gas inlet that becomes the short diameter portion and the measuring pipe It is good also as what is calculated based on the gas flow velocity which flows into a path.
- a change in the flow rate of the gas flowing into the measurement pipe line may be detected and adjusted to a purge gas flow rate corresponding to the change in the flow rate.
- inflow of the sample gas into the connecting portion between the purge gas guide pipe and the measurement pipe can be suppressed in the measurement pipe. Therefore, the optical path length when the sample gas in the measurement pipe is irradiated with the laser light can be kept constant, and the reliability of the measured value of the gas concentration can be improved. Moreover, the supply flow rate of the purge gas to the purge gas guide tube can be suppressed. Accordingly, not only can each purge gas supply device be downsized, but also the power and fuel costs for supplying the purge gas can be reduced.
- the larger the ratio of the cross-sectional area of the long diameter portion to the cross-sectional area of the short diameter portion in the measurement pipe line the more the sample gas can be prevented from entering the purge gas guide pipe.
- the purge gas flow rate can be easily calculated, and the necessary purge gas flow rate can be set according to the flow rate of the sample gas.
- FIG. 1 It is a perspective view which shows the structure of the gas concentration measuring apparatus containing a measurement pipe line. It is the schematic which shows the system configuration
- FIG. 1 is a schematic perspective view showing a configuration of a gas concentration measuring apparatus in the present embodiment
- FIG. 2 is a schematic view showing a system configuration of a gas concentration measuring apparatus in the present embodiment
- FIG. It is sectional drawing which shows the structure of the gas concentration measuring apparatus in a form.
- the gas concentration measuring apparatus 1 of the present embodiment irradiates a measurement pipe (measurement cell) 2 through which a sample gas containing a measurement target gas flows, and the measurement pipe 2 with laser light.
- a light emitting unit 3 and a light receiving unit 4 that receives the laser light transmitted through the measurement pipe 2 are provided.
- the measurement pipe line 2 is installed between a gas supply pipe line 5 through which the sample gas flows out into the measurement pipe line 2 and a gas discharge pipe line 6 through which the sample gas flows in from the measurement pipe line 2. That is, the gas supply pipeline 5 is connected to the exhaust gas inlet side of the measurement pipeline 2, while the gas discharge pipeline 6 is connected to the exhaust gas outlet side of the measurement pipeline 2.
- sample gas for example, exhaust gas from the combustion engine or fuel gas to the gas engine is supplied, and as the measurement target gas, ammonia, hydrogen halide, nitrogen oxide, sulfur oxide, carbon monoxide, carbon dioxide
- concentration of a gas having the characteristic of absorbing light in the infrared region, such as oxygen, water, hydrocarbons, and hydrogen sulfide is measured.
- the light emitting unit 3 and the light receiving unit 4 are provided at positions symmetrical with respect to the measurement pipe 2, and the optical axis from the light emitting unit 3 to the light receiving unit 4 flows in the flow direction of the sample gas flowing through the measurement pipe 2.
- Orthogonal to The measurement pipe line 2 includes a main pipe 7 through which sample gas flows.
- An incident tube (branch tube) 8 that guides the laser light from the light emitting unit 3 into the main tube 7 of the measurement pipe 2 is provided on the side wall of the main tube 7 so as to face the installation position of the light emitting unit 3.
- an emission tube (branch tube) 9 that guides the laser light transmitted through the main tube 7 to the light receiving unit 4 is provided so as to face the installation position of the light emitting unit 3. That is, each of the incident tube 8 and the emission tube 9 is provided at a position where the longitudinal direction is the radial direction of the main tube 7 and is symmetric about the axis of the main tube 7.
- the light emitting unit 3 includes a laser diode (not shown) that emits laser light, and is incident on an optical axis adjusting unit 10 that includes an optical system that adjusts the optical axis of the emitted laser light on the laser light emitting side.
- the sides are connected.
- the exit side of the optical axis adjustment unit 10 is connected to the incident tube 8 of the measurement pipe line 2 via a purge gas guide tube 11 for flowing a purge gas sprayed onto the optical axis adjustment unit 10. That is, the light emitting unit 3 is connected to the incident tube 8 of the measurement line 2 through the optical axis adjusting unit 10 and the purge gas guide tube 11.
- the light receiving unit 4 includes a photodiode (not shown) that receives laser light and performs photoelectric conversion, and an optical axis that includes an optical system that adjusts the optical axis of the incident laser light on the laser light incident side.
- the exit side of the adjustment unit 12 is connected.
- the incident side of the optical axis adjustment unit 12 is connected to the emission pipe 9 of the measurement pipe line 2 via a purge gas guide pipe 13 for flowing a purge gas sprayed onto the optical axis adjustment unit 12. That is, the light receiving unit 4 is connected to the emission pipe 9 of the measurement pipe line 2 through the optical axis adjustment unit 12 and the purge gas guide pipe 13.
- a purge gas such as instrument air or nitrogen gas is adjusted in flow rate by a purge flow rate adjusting unit 16 connected to a purge gas source 15 and is purged from a gas inlet port 19 or 20 through a branched gas pipe line 17 or 18. 11 and 13. That is, the gas introduction ports 19 and 20 of the purge gas guide pipes 11 and 13 and the purge flow rate adjusting unit 16 are connected by the gas pipe lines 17 and 18.
- Gas flow meters 30 and 31 are provided on the gas pipelines 17 and 18, respectively.
- the gas flow meters 30 and 31 measure the supply flow rate of the purge gas to the purge gas guide tubes 11 and 13, and output the measurement signal to the measurement control unit 32. Further, the purge flow rate adjustment unit 16 determines the purge gas supply flow rate based on a command signal from the measurement control unit 32.
- the measurement control unit 32 sets the purge gas supply flow rate based on the flow rate of the sample gas flowing in the main pipe 7 of the measurement pipeline 2 and outputs a command signal to the purge flow rate adjustment unit 16 to notify the set flow rate. To do.
- the measurement control unit 32 gives a command signal to the light emitting unit 3 to irradiate laser light having a wavelength that matches the absorption spectrum of the measurement target gas (laser light in the near infrared wavelength region). The amount of received laser light is received as a measurement signal.
- the measurement control unit 32 When the measurement control unit 32 receives the measurement signal from the light receiving unit 4, the measurement control unit 32 confirms the amount of transmitted light confirmed from the measurement signal, and based on the above equation (1) by the TDLAS method, the measurement target gas in the sample gas Calculate the concentration.
- the measurement control unit 32 detects a change in the flow rate of the sample gas and adjusts the purge gas flow rate according to the change in the flow rate.
- the measurement pipe line 2 includes a gas inlet portion 21 having an inlet through which sample gas flows, a gas outlet portion 22 having a discharge port for discharging the sample gas, and the gas inlet portion 21 and the gas outlet portion 22. And a cylindrical measuring unit 23 provided. That is, the main pipe 7 is constituted by the gas inlet part 21, the gas outlet part 22 and the measuring part 23, and the incident pipe 8 and the outgoing pipe 9 are projected from the side wall of the measuring part 23.
- the gas inlet 21 is connected to the gas supply pipe 5 and has a tapered shape in which the inner diameter increases toward the measuring unit 23.
- the gas outlet portion 22 is connected to the gas discharge pipe 6 and has a tapered shape in which the inner diameter increases toward the measuring portion 23.
- the inner diameter at the measuring section 23 is larger than the inner diameter of each of the inlet of the gas inlet section 21 and the outlet of the gas outlet section 22, and the main pipe 7 is connected to the gas supply pipe 5 and the gas. It has a bottle shape with narrowed both ends connected to each of the discharge pipes 6.
- the inner diameter of the measurement unit 23 serving as the measurement position of the measurement pipe line 2 is larger than the inner diameters of the gas supply pipe line 5 and the gas discharge pipe line 6.
- the measurement pipe line 2 has a tapered shape (conical shape) that reduces the cross-sectional area of the gas inlet 21 toward the upstream side of the sample gas flow. 8 and the exit tube 9 are prevented from flowing in.
- the sample gas tends to flow through the central part of the measuring unit 23, and is downstream of the gas inlet 21.
- the distribution range of the sample gas is widened toward.
- the entrance tube 8 and the exit tube 9 are installed upstream of the position where the distribution width of the sample gas reaches the inner wall of the measurement unit 23. Thereby, the amount of sample gas flowing into the entrance tube 8 and the exit tube 9 can be reduced, and the distribution width of the sample gas at the installation positions of the entrance tube 8 and the exit tube 9 can be made constant.
- the measurement control unit 32 receives the measurement signal of the flow rate Sf of the sample gas flowing through the gas supply pipe 5 and sets the purge gas supply flow rate Pf based on the following equation (2).
- Pf (K1 ⁇ Sf) / (R2 2 / R1 2 ) 2 (2) (K1: Constant)
- the light emitting unit 3 and the light receiving unit 4 are arranged to face each other with the cylindrical measuring pipe 2 interposed therebetween, and the irradiation light from the light emitting unit 3 is measured by the measuring tube.
- the concentration of the measurement target gas passing through the measurement pipe 2 is measured by being transmitted through the path 2 and received by the light receiving unit 4.
- Purge gas guide tubes 11 and 13 for introducing purge gas into the optical system in the light emitting unit 3 and the light receiving unit 4 are connected to the side wall of the measurement pipe 2.
- the measurement pipe line 2 has a tapered gas inlet 21 that extends from the gas supply port toward the downstream side.
- the purge gas guide pipes 11 and 13 are arranged at a position downstream of the gas inlet 21 and facing each other and orthogonal to the flow direction of the sample gas (longitudinal direction of the measurement pipe line 2).
- the inflow of the sample gas to the connecting portion between the purge gas guide pipes 11 and 13 and the measurement pipe line 2 can be suppressed in the measurement pipe line 2. Therefore, the optical path length when the sample gas in the measurement pipe line 2 is irradiated with laser light can be kept constant, and the reliability of the measured value of the gas concentration can be improved. Further, the supply flow rate of the purge gas to the purge gas guide tubes 11 and 13 can be suppressed. Accordingly, not only can each apparatus for supplying purge gas be miniaturized, but also the power or fuel cost for driving the apparatus can be reduced.
- the measurement section 23 connected to the purge gas guide pipes 11 and 13 has a cylindrical shape having an inner diameter that is the same as the maximum inner diameter of the gas inlet section 21.
- the measurement pipe line 2 has a gas outlet portion 22 at the downstream end that is tapered from the gas discharge port toward the upstream side.
- the gas outlet portion 22 provided on the downstream side of the measuring portion 23 has a tapered shape that narrows toward the gas outlet at the downstream end. That is, the measurement pipe line 2 has a bottle shape in which both ends are tapered and narrowed.
- the flow rate of the purge gas supplied to the purge gas guide pipes 11 and 13 is the ratio of the cross-sectional area of the measuring portion 23 that is the long diameter portion to the cross-sectional area of the gas inlet that is the short diameter portion, and the flow rate of the sample gas that flows through the measuring portion 23 Is calculated based on At this time, the larger the ratio of the cross-sectional area of the long diameter portion to the cross-sectional area of the short diameter portion in the measurement pipeline 2, the more the sample gas can be prevented from entering the purge gas guide tubes 11 and 13. Thereby, the purge gas flow rate can be easily calculated, and the necessary purge gas flow rate can be set according to the flow rate of the sample gas.
- each part is not limited to the illustrated embodiment, and various modifications can be made without departing from the spirit of the present invention.
- the purge gas guide pipes 11 and 13 may be omitted as the purge gas is supplied to the incident pipe 8 and the outgoing pipe 9 of the measurement pipe 2.
- the measurement part 23 of the measurement pipe line 2 was made into the cylindrical shape, it is not restricted to a cylindrical shape, For example, it is good also as a polygonal cylinder shape.
- Gas concentration measuring device Measurement pipeline (measurement cell) 3 Light Emitting Unit 4 Light Receiving Unit 5 Gas Supply Pipe Line 6 Gas Discharge Pipe Line 7 Main Pipe 8 Incident Pipe (Branch Pipe) 9 Outlet tube (branch tube) DESCRIPTION OF SYMBOLS 10 Optical axis adjustment part 11 Purge gas guide pipe 12 Optical axis adjustment part 13 Purge gas guide pipe 15 Purge gas source 16 Purge flow rate adjustment part 17 Gas pipe line 18 Gas pipe line 19 Gas inlet 20 Gas inlet 21 Gas inlet 22 Gas outlet 23 Measurement unit 30 Gas flow meter 31 Gas flow meter 32 Measurement control unit
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- Life Sciences & Earth Sciences (AREA)
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Abstract
Description
I1=I0×exp(-ε×N×L) … (1)
(I0:透過前のレーザ光強度、I1:透過前のレーザ光強度、ε:モル吸光係数、N:測定対象のモル濃度、L:透過光路長)
Pf=(K1×Sf)/(R22/R12)2 …(2)
(K1:定数)
2 計測管路(計測セル)
3 発光部
4 受光部
5 ガス供給管路
6 ガス排出管路
7 主管
8 入射管(枝管)
9 出射管(枝管)
10 光軸調整部
11 パージガスガイド管
12 光軸調整部
13 パージガスガイド管
15 パージガス源
16 パージ流量調整部
17 ガス管路
18 ガス管路
19 ガス導入口
20 ガス導入口
21 ガス入口部
22 ガス出口部
23 計測部
30 ガス流量計
31 ガス流量計
32 計測制御部
Claims (5)
- 筒型の計測管路を挟んで発光部及び受光部が対向して配置され、前記発光部からの照射光が前記計測管路内を透過して前記受光部で受光されることで、前記計測管路内を通過する計測対象ガスの濃度を測定するガス濃度計測装置であって、
前記発光部及び前記受光部における光学系にパージガスを導入させるパージガスガイド管が、前記計測管路の側壁に連結して、互いに対向する位置で計測対象ガスの流れ方向に直交させて配置されており、
前記計測管路がガス供給口から計測対象ガス流れ方向下流側に向かって広がるテーパー状のガス入口部を有していることを特徴とするガス濃度計測装置。 - 前記計測管路は、前記ガス入口部より計測対象ガス流れ方向下流側に、内径を一定として筒状の計測部を備えており、該計測部に前記パージガスガイド管が設置されることを特徴とする請求項1に記載のガス濃度計測装置。
- 前記計測管路は、前記計測部の下流側に設けたガス出口部を、計測対象ガス流れ方向下流側端部のガス排出口に向かって狭まるテーパー状としていることを特徴とする請求項2に記載のガス濃度計測装置。
- 前記パージガスガイド管に供給されるパージガスの流量は、短径部分となるガス流入口の断面積に対する長径部分となる前記計測部の断面積の比率と前記計測管路に流入するガス流速とに基づいて算出されることを特徴とする請求項2に記載のガス濃度計測装置。
- 前記計測管路に流入するガスの流速変化を検出し、この流速変化に応じたパージガス流量に調整する請求項4に記載のガス濃度計測装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201780014818.0A CN108780039A (zh) | 2016-03-24 | 2017-03-06 | 气体浓度测量装置 |
EP17769886.7A EP3435068A4 (en) | 2016-03-24 | 2017-03-06 | GAS CONCENTRATION MEASURING DEVICE |
KR1020187011588A KR102196822B1 (ko) | 2016-03-24 | 2017-03-06 | 가스 농도 계측 장치 |
US16/087,461 US10598601B2 (en) | 2016-03-24 | 2017-03-06 | Gas concentration measuring device |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016-060038 | 2016-03-24 | ||
JP2016060038A JP6947471B2 (ja) | 2016-03-24 | 2016-03-24 | ガス濃度計測装置 |
Publications (1)
Publication Number | Publication Date |
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WO2017163841A1 true WO2017163841A1 (ja) | 2017-09-28 |
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ID=59900169
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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PCT/JP2017/008798 WO2017163841A1 (ja) | 2016-03-24 | 2017-03-06 | ガス濃度計測装置 |
Country Status (6)
Country | Link |
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US (1) | US10598601B2 (ja) |
EP (1) | EP3435068A4 (ja) |
JP (1) | JP6947471B2 (ja) |
KR (1) | KR102196822B1 (ja) |
CN (1) | CN108780039A (ja) |
WO (1) | WO2017163841A1 (ja) |
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JP6924665B2 (ja) * | 2017-10-04 | 2021-08-25 | 東邦チタニウム株式会社 | ガス濃度測定システム |
KR102074727B1 (ko) * | 2017-12-18 | 2020-02-07 | 주식회사 포스코 | 가스 농도 측정 장치 |
KR102113028B1 (ko) * | 2018-10-05 | 2020-05-20 | 재단법인 포항산업과학연구원 | 가스 분석 장치 |
KR102222298B1 (ko) * | 2019-01-03 | 2021-03-04 | 주식회사 리트코 | 미립자 측정이 가능한 시스템 |
CN114963003A (zh) * | 2021-02-19 | 2022-08-30 | 中国科学院微电子研究所 | 一种用于半导体制造的供气系统及供气方法 |
CN113654757B (zh) * | 2021-08-27 | 2022-10-28 | 中国科学技术大学 | 一种模拟喷管中高超声速凝结过程的装置及诊断方法 |
KR102530591B1 (ko) * | 2022-12-06 | 2023-05-09 | 주식회사 사람과안전건설화재에너지연구원 | 화재 시험 장치 |
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- 2017-03-06 EP EP17769886.7A patent/EP3435068A4/en not_active Withdrawn
- 2017-03-06 KR KR1020187011588A patent/KR102196822B1/ko active IP Right Grant
- 2017-03-06 US US16/087,461 patent/US10598601B2/en not_active Expired - Fee Related
- 2017-03-06 WO PCT/JP2017/008798 patent/WO2017163841A1/ja active Application Filing
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Also Published As
Publication number | Publication date |
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KR20180059513A (ko) | 2018-06-04 |
JP2017173152A (ja) | 2017-09-28 |
EP3435068A1 (en) | 2019-01-30 |
EP3435068A4 (en) | 2019-01-30 |
JP6947471B2 (ja) | 2021-10-13 |
US20190094148A1 (en) | 2019-03-28 |
US10598601B2 (en) | 2020-03-24 |
KR102196822B1 (ko) | 2020-12-30 |
CN108780039A (zh) | 2018-11-09 |
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