WO2017128670A1 - Crystalline silicon solar cell - Google Patents

Crystalline silicon solar cell Download PDF

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Publication number
WO2017128670A1
WO2017128670A1 PCT/CN2016/092197 CN2016092197W WO2017128670A1 WO 2017128670 A1 WO2017128670 A1 WO 2017128670A1 CN 2016092197 W CN2016092197 W CN 2016092197W WO 2017128670 A1 WO2017128670 A1 WO 2017128670A1
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electrode portion
electrode
solar cell
crystalline silicon
silicon solar
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PCT/CN2016/092197
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French (fr)
Chinese (zh)
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何凤琴
张思远
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张甘霖
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0224Electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0224Electrodes
    • H01L31/022408Electrodes for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/022425Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • H01L31/022433Particular geometry of the grid contacts
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Definitions

  • the present invention relates to the field of solar cell technologies, and in particular, to a crystalline silicon solar cell.
  • a crystalline silicon solar cell is an electronic component that converts solar energy into electrical energy.
  • the preparation of crystalline silicon solar cells is generally carried out by processes such as texturing, diffusion, coating, screen printing, and sintering.
  • the velvet is divided into single crystal and polycrystalline velvet.
  • the single crystal battery is formed by the method of alkali velvet to form a pyramid suede on the surface of the silicon wafer, and the polycrystalline battery is formed by using an acid etching method to form a pitted surface on the surface of the silicon wafer.
  • the suede surface of the silicon surface can increase the absorption of sunlight on the surface of the battery to achieve the light trapping effect; the diffusion process forms a PN junction into the interior of the silicon wafer by means of thermal diffusion, so that when light is irradiated, a voltage can be formed inside the silicon wafer. It is the basis of solar cell power generation; the coating process is to reduce the composite of minority carriers on the surface of the battery, and can improve the conversion efficiency of the crystalline silicon solar cell; the screen printing process is to make the electrode of the solar cell, so that when the light is irradiated It is possible to derive the current. Screen printing is one of the most widely used processes in the preparation of crystalline silicon cells. The process sequence is to first print and dry the back electrode, then print and dry the aluminum back field, and finally print and dry the front electrode. When sintering is performed, the silver paste used for preparing the electrode is brought into contact with the battery.
  • the electrode structure In the front electrode of the crystalline silicon solar cell, the electrode structure generally includes a main gate line and a sub-gate line which are criss-crossed, and the main gate line is electrically connected to the sub-gate line.
  • the battery When there is light, the battery generates a current, and the current flows through the internal emitter to the surface electrode sub-gate line, collects through the sub-gate line and then flows to the battery main grid for export. The current will be lost during the collection of the secondary gate line, which we call the power loss of the resistor.
  • the main grid line and the sub-gate line of the battery are on the light-receiving surface of the battery, which inevitably blocks a part of the light from being irradiated on the surface of the battery, thereby reducing the effective light-receiving area of the battery, which is called optical loss.
  • optical loss the effective light-receiving area of the battery
  • the number of main gate lines is usually three, and the width thereof is about 1.5 mm; the number of the sub-gate lines is usually 80 to 100, and the width thereof is about 40 ⁇ m.
  • the width of the main gate line is wide, so that the front electrode and the battery ribbon can be soldered well, but the light shielding area is also large.
  • the industry has proposed a front electrode structure without a main gate, which mainly removes three main gate lines in the front electrode structure, and only retains the sub-gate line. After the battery is completed, the use is extremely fine.
  • the cylindrical ribbon is directly soldered to the secondary grid and the current is directly extracted by the ribbon.
  • the power of the photovoltaic module is lowered due to the abnormality of the soldering or the inability to solder due to the small width of the sub-gate line and the sub-gate line being too low.
  • the present invention provides a crystalline silicon solar cell.
  • the front electrode structure can achieve the purpose of reducing the shading area and ensuring smooth current export; further, corresponding
  • the back electrode structure in the solar cell is improved, and the amount of silver paste in the back electrode structure is saved.
  • soldering contact is formed on the fine grid line by a secondary printing process.
  • the plurality of sub-gate lines are equally spaced along the first direction
  • the M fine gate lines are equally spaced along the second direction
  • the second direction is perpendicular to the first direction.
  • soldering contact is disposed at a position where the fine gate line intersects the sub-gate line.
  • N solder contacts on each of the fine gate lines are arranged at equal intervals along the length direction of the thin gate lines.
  • solder contacts in the front electrode are distributed in an array of N rows x M columns.
  • the electrode unit includes a first electrode portion, a second electrode portion, and a third electrode portion spaced apart from each other in the first direction, and in the first direction, the length of the second electrode portion is greater than The length of one electrode portion and the third electrode portion.
  • a ratio of lengths of the first electrode portion, the second electrode portion, and the third electrode portion is (0.4 to 0.6): 1: (0.4 to 0.6).
  • the length of the second electrode portion is 0.6 to 1 mm, and the distance between the second electrode portion and the first electrode portion and the third electrode portion is 0.3 to 0.6 mm.
  • the crystalline silicon solar cell provided by the embodiment of the present invention uses a larger number of fine gate lines with smaller widths instead of the main gate lines in the front electrode, and the overall shading area is smaller. , reducing the optical loss, and a larger number of fine grid lines are evenly distributed on the front side of the solar cell, so that the current collected by the sub-gate line can be more smoothly derived, reducing power loss; in addition, stacking on the fine grid line There is a large circular welding contact, which increases the contact area of the solder joint and the height of the solder joint. When soldering the solder ribbon, there is less problem of abnormal soldering of the solder ribbon and the battery. Further, the back electrode is divided into electrode units that are in one-to-one correspondence with the solder contacts, and the electrode unit is segmented, which effectively reduces the amount of silver paste in the back electrode structure.
  • FIG. 1 is a schematic structural view of a crystalline silicon solar cell according to an embodiment of the present invention.
  • FIG. 2 is a schematic structural view of a front electrode in an embodiment of the present invention.
  • Figure 3 is an enlarged schematic view of a portion A of Figure 2;
  • FIG. 4 is a schematic structural view of a back electrode in an embodiment of the present invention.
  • Fig. 5 is a schematic structural view of an electrode unit in an embodiment of the present invention.
  • this embodiment firstly provides a crystalline silicon solar cell mainly comprising a battery body 1 and a front electrode 2 located on the front surface of the battery body 1 and a back electrode 3 located on the back surface of the battery body 1 .
  • the battery body 1 mainly uses a silicon wafer to prepare a PN junction battery formed by a texturing process, a diffusion process, and an etching process.
  • the front electrode 2 and the back electrode 3 are mainly formed on both sides of the battery body 1 by a screen printing process for outputting the electric energy converted by the battery body 1.
  • the front electrode 2 in this embodiment includes a plurality of sub-gate lines 10 spaced apart from each other in the first direction (in the Y direction in FIG. 2) and arranged in parallel, along the second direction (eg, A plurality of fine gate lines 20 spaced apart from each other and arranged in parallel in the X direction in FIG. 2, the plurality of sub-gate lines 10 and the plurality of fine gate lines 20 being electrically connected to each other.
  • the sub-gate line 10 is mainly used to collect the photo-generated current generated by the solar cell, and the fine-gate line 20 is used to collect and output the current collected by the sub-gate line 10.
  • each of the fine gate lines 20 is further provided with a plurality of soldering contacts 30 spaced apart from each other, and the soldering contacts 30 are stacked on the fine gate lines 20 and electrically connected to the fine grid lines 20. Connected, the shape of the solder contact 30 is circular.
  • the soldering contact 30 is mainly used for soldering connection to the solder ribbon after the battery is fabricated.
  • the number of the sub-gate lines 10 may be selected from the range of 80 to 100, and the width may be selected to be in the range of 30 to 50 ⁇ m.
  • the number M of the fine gate lines 20 can be selected in the range of 10 to 20, and the width D1 can be selected in the range of 0.10 to 0.25 mm.
  • the number N of the soldering contacts 30 provided on each of the fine gate lines 20 may be selected to be in the range of 5 to 15, and the diameter R of the soldering contacts 30 may be selected to be in the range of 0.2 to 1 mm, and the soldering contacts 30 are to be satisfied.
  • the diameter R is larger than the width of the fine grid line 20.
  • the solder contacts 30 are stacked on the fine gate lines 20. Specifically, in the preparation of the front electrode structure, the sub-gate lines 10 and the fine gate lines 20 are first prepared by a single printing process, and then the solder contacts 30 are prepared on the fine gate lines 20 by a secondary printing process.
  • the plurality of sub-gate lines 10 are arranged at equal intervals in a first direction (such as the Y direction in FIG. 2), and the M thin gate lines 20 are in a second direction ( Arranged at equal intervals in the X direction as in FIG. 2, the second direction is perpendicular to the first direction.
  • the soldering contact 30 is disposed at a position where the fine gate line 20 intersects the sub-gate line 10, and N soldering contacts 30 on each of the fine gate lines 20 along the thin grid line 20 is arranged at equal intervals in the longitudinal direction.
  • the arrangement pitch of the N solder contacts 30 on each of the fine gate lines 20 is equal, and therefore, in the entire front electrode structure, all the solder contacts 30 are provided.
  • the front electrode of the crystalline silicon solar cell provided by the above embodiments can effectively reduce the light shielding area.
  • the shading area is calculated according to the front electrode of the existing three main grid and the front electrode structure provided by the embodiment of the present invention:
  • the front electrode structure of the existing three main grids In the conventional structure of three 1.5mm wide main gate lines and 90 40 ⁇ m sub grid lines, the main gate lines can be designed in a hollow form to reduce the silver paste used for printing, but all areas of the main grid will still be soldered to a width of about 1.5 mm during soldering.
  • the total occlusion area of the conventional three-main gate front electrode is 1262.6 mm 2 .
  • the number of sub-gate lines is 90 and the width is 40 ⁇ m; the number of fine gate lines is 15 and the width is 0.2 mm; the number of solder contacts on each fine grid line is 10
  • the shape of the solder contact is circular and its diameter R is 0.8 mm.
  • the back electrode 3 in this embodiment includes N ⁇ M electrode units 31, that is, the number of the electrode units 31 and the soldering contacts 30 are equal, and the electrodes
  • the unit 31 has a one-to-one correspondence with the welding contacts 30, and the lengths of the electrode units 31 in the first direction (such as the Y direction in FIG. 4) and the second direction (in the X direction in FIG. 4) are not less than The length of the soldering contact in the corresponding direction.
  • the length of the electrode unit 31 in the first direction and the second direction is not less than the diameter of the circular soldering contact 30, respectively.
  • the electrode unit 31 includes the first electrode portion 311, the second electrode portion 312, and the third electrode portion 313 spaced apart from each other in the first direction, and in the first direction, Second electrode
  • the length of the portion 312 is greater than the length of the first electrode portion 311 and the third electrode portion 313, respectively.
  • the length L21 of the second electrode portion 312 may be selected to be 0.6 to 1 mm, and the distances D21 and D22 between the second electrode portion 312 and the first electrode portion 311 and the third electrode portion 313 may be selected to be 0.3. ⁇ 0.6mm.
  • L21 and L23 can be selected as equal values
  • D21 and D22 can be selected as equal values.
  • the crystalline silicon solar cell provided by the above embodiment has a smaller number of narrow gate lines instead of the prior art main gate lines in the front electrodes, and the overall shading area is smaller and smaller.
  • the optical loss, and a larger number of fine grid lines are evenly distributed on the front side of the solar cell, so that the current collected by the sub-gate line can be more smoothly derived, reducing the power loss; in addition, the area on the fine grid line is set to be thinner.
  • Large round welded contacts increase the contact area of the solder joints and the height of the solder joints. When soldering the solder ribbon, there is less problem of abnormal soldering of the solder ribbon and the battery.
  • the back electrode is divided into electrode units that are in one-to-one correspondence with the solder contacts, and the electrode unit is segmented, which effectively reduces the amount of silver paste in the back electrode structure.

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Abstract

A crystalline silicon solar cell, comprising a cell body (1), as well as a front electrode (2) positioned at the front face of the cell body (1) and a rear electrode (3) positioned at the rear face of the cell body (1), the front electrode (2) comprising multiple secondary grid lines (10) extending in a first direction and arranged in rows at regular intervals, and the front electrode (2) also comprising a number M of fine grid lines (20) extending in a second direction and arranged in rows at regular intervals, the width of the fine grid lines (20) being 0.10-0.25mm; a number N of welding contacts (30) are provided at intervals on each fine grid line (20), the welding contacts (30) being layered over the fine grid line (20), the welding contacts (30) being circular, and length of the diameter of a circle being greater than the width of the fine grid line (20); the rear electrode (3) comprises a number N×M of electrode units (31), the electrode units (31) and welding contacts (30) corresponding one-to-one, and the length of each electrode unit (31) along the first direction and the second direction being no shorter than the length of a welding contact (30) along the corresponding direction. Light-blocking area is thus reduced.

Description

一种晶硅太阳能电池Crystal silicon solar cell 技术领域Technical field
本发明涉及太阳能电池技术领域,具体涉及一种晶硅太阳能电池。The present invention relates to the field of solar cell technologies, and in particular, to a crystalline silicon solar cell.
背景技术Background technique
晶硅太阳能电池是一种可以将太阳光能转化成为电能的电子元器件。晶体硅类太阳能电池的制备一般经过制绒、扩散、镀膜、丝网印刷、烧结等工序。制绒分为单晶、多晶制绒,单晶电池是使用碱制绒的方法在硅片表面形成金字塔绒面,多晶电池使用酸刻蚀的方法在硅片表面形成凹坑绒面,硅表面的绒面可以增加太阳光在电池表面的吸收,达到陷光作用;扩散工序是通过热扩散的方式向硅片内部形成P-N结,这样当有光照射时,硅片内部就可以形成电压,是太阳电池发电的基础;镀膜工艺是为了减少少数载流子在电池表面的复合,可以提高晶体硅太阳能电池片的转换效率;丝网印刷工序就是制作太阳能电池的电极,这样当光照射时就可以把电流导出。丝网印刷是现在晶硅电池制备中应用最广泛的一种工艺,工艺顺序为先进行背面电极印刷和烘干,然后进行铝背场的印刷和烘干,最后进行正面电极的印刷、烘干,在进行烧结,让制备电极使用的银浆和电池形成接触。A crystalline silicon solar cell is an electronic component that converts solar energy into electrical energy. The preparation of crystalline silicon solar cells is generally carried out by processes such as texturing, diffusion, coating, screen printing, and sintering. The velvet is divided into single crystal and polycrystalline velvet. The single crystal battery is formed by the method of alkali velvet to form a pyramid suede on the surface of the silicon wafer, and the polycrystalline battery is formed by using an acid etching method to form a pitted surface on the surface of the silicon wafer. The suede surface of the silicon surface can increase the absorption of sunlight on the surface of the battery to achieve the light trapping effect; the diffusion process forms a PN junction into the interior of the silicon wafer by means of thermal diffusion, so that when light is irradiated, a voltage can be formed inside the silicon wafer. It is the basis of solar cell power generation; the coating process is to reduce the composite of minority carriers on the surface of the battery, and can improve the conversion efficiency of the crystalline silicon solar cell; the screen printing process is to make the electrode of the solar cell, so that when the light is irradiated It is possible to derive the current. Screen printing is one of the most widely used processes in the preparation of crystalline silicon cells. The process sequence is to first print and dry the back electrode, then print and dry the aluminum back field, and finally print and dry the front electrode. When sintering is performed, the silver paste used for preparing the electrode is brought into contact with the battery.
晶硅太阳能电池的正面电极中,电极结构通常包括纵横交错的主栅线和副栅线,主栅线与副栅线电性相连。当有光照时,电池片就会产生电流,电流经过内部发射极流向表面电极副栅线,经由副栅线收集然后汇流到电池主栅线上进行导出。电流在副栅线收集的过程中会产生损失,这种我们称为是电阻的功率损失。电池主栅线和副栅线处于电池的受光面,这样必然会遮挡一部分光照射在电池表面,从而减少了电池的有效受光面积,这部分损失我们称之为光学损失。不论是P型或是N型电池,只要电池正面存在电极结构,就需要考虑到电极结构的不断优化,以达到既减小遮光面积又保证电流顺利导出的目的。In the front electrode of the crystalline silicon solar cell, the electrode structure generally includes a main gate line and a sub-gate line which are criss-crossed, and the main gate line is electrically connected to the sub-gate line. When there is light, the battery generates a current, and the current flows through the internal emitter to the surface electrode sub-gate line, collects through the sub-gate line and then flows to the battery main grid for export. The current will be lost during the collection of the secondary gate line, which we call the power loss of the resistor. The main grid line and the sub-gate line of the battery are on the light-receiving surface of the battery, which inevitably blocks a part of the light from being irradiated on the surface of the battery, thereby reducing the effective light-receiving area of the battery, which is called optical loss. Regardless of whether it is a P-type or an N-type battery, as long as the electrode structure exists on the front side of the battery, it is necessary to consider the continuous optimization of the electrode structure to achieve the purpose of reducing the shading area and ensuring smooth current export.
现有的正面电极结构中,主栅线的数量通常为3条,其宽度为1.5mm左右;副栅线的数量通常为80~100条,其宽度为40μm左右。主栅线的宽度较宽,使得正面电极和电池的焊带可以良好地焊接,但是遮光面积也较大。近年来,为 了减少正面电极的遮光面积,业内提出了一种无主栅的正面电极结构,主要是将正面电极结构中的3条主栅线去除,仅保留副栅线,电池制作完成后,使用极细的圆柱形焊带直接与副栅线焊接,由焊带直接导出电流。在极细的焊带与副栅线的焊接过程中,由于副栅线的宽度较小、副栅线过低等造成虚焊或无法焊接的异常情况,使光伏组件的功率降低。In the conventional front electrode structure, the number of main gate lines is usually three, and the width thereof is about 1.5 mm; the number of the sub-gate lines is usually 80 to 100, and the width thereof is about 40 μm. The width of the main gate line is wide, so that the front electrode and the battery ribbon can be soldered well, but the light shielding area is also large. In recent years, for In order to reduce the light-shielding area of the front electrode, the industry has proposed a front electrode structure without a main gate, which mainly removes three main gate lines in the front electrode structure, and only retains the sub-gate line. After the battery is completed, the use is extremely fine. The cylindrical ribbon is directly soldered to the secondary grid and the current is directly extracted by the ribbon. In the welding process of the extremely thin soldering strip and the sub-gate line, the power of the photovoltaic module is lowered due to the abnormality of the soldering or the inability to solder due to the small width of the sub-gate line and the sub-gate line being too low.
发明内容Summary of the invention
鉴于现有技术存在的不足,本发明提供了一种晶硅太阳能电池,通过对正面电极结构的改进,使得正面电极结构可以达到既减小遮光面积又保证电流顺利导出的目的;进一步地,相应改进了该太阳能电池中的背电极结构,节省了背电极结构中银浆的用量。In view of the deficiencies of the prior art, the present invention provides a crystalline silicon solar cell. By improving the structure of the front electrode, the front electrode structure can achieve the purpose of reducing the shading area and ensuring smooth current export; further, corresponding The back electrode structure in the solar cell is improved, and the amount of silver paste in the back electrode structure is saved.
为了实现上述目的,本发明采用了如下的技术方案:In order to achieve the above object, the present invention adopts the following technical solutions:
一种晶硅太阳能电池,包括电池本体以及位于电池本体正面的正面电极和位于电池本体背面的背电极,其中,所述正面电极包括沿第一方向相互间隔排列的多条副栅线,还包括沿第二方向相互间隔排列的M条细栅线,所述细栅线与所述副栅线电性连接,所述细栅线的宽度为0.10~0.25mm;其中,M=10~20;其中,每一细栅线上还设置有相互间隔的N个焊接触点,所述焊接触点叠层设置在所述细栅线上并且与所述细栅线电性连接,所述焊接触点的形状为圆形,所述圆形的直径的范围是0.2~1mm,并且所述圆形的直径大于所述细栅线的宽度;其中,N=5~15;所述背电极包括N×M个电极单元,所述电极单元与所述焊接触点一一对应,所述电极单元在第一方向和第二方向上的长度分别不小于所述焊接触点在对应方向上的长度。A crystalline silicon solar cell includes a battery body and a front electrode on a front surface of the battery body and a back electrode on a back surface of the battery body, wherein the front electrode includes a plurality of sub-gate lines spaced apart from each other in the first direction, and further includes The M gate lines are arranged in the second direction, the fine gate lines are electrically connected to the sub-gate lines, and the width of the fine gate lines is 0.10-0.25 mm; wherein M=10-20; Wherein, each of the fine gate lines is further provided with N soldering contacts spaced apart from each other, and the soldering contact stack is disposed on the fine gate line and electrically connected to the fine gate lines, the soldering contacts The shape of the dot is a circle, the diameter of the circle is in the range of 0.2 to 1 mm, and the diameter of the circle is larger than the width of the fine grid line; wherein, N = 5 to 15; the back electrode includes N × M electrode units, the electrode units are in one-to-one correspondence with the soldering contacts, and the lengths of the electrode units in the first direction and the second direction are respectively not less than the length of the soldering contacts in the corresponding direction.
进一步地,所述焊接触点通过二次印刷工艺形成于所述细栅线上。Further, the soldering contact is formed on the fine grid line by a secondary printing process.
进一步地,所述多条副栅线沿第一方向等间距排列,所述M条细栅线沿第二方向等间距排列,所述第二方向与所述第一方向相互垂直。Further, the plurality of sub-gate lines are equally spaced along the first direction, the M fine gate lines are equally spaced along the second direction, and the second direction is perpendicular to the first direction.
进一步地,所述焊接触点设置于所述细栅线与所述副栅线相交的位置。Further, the soldering contact is disposed at a position where the fine gate line intersects the sub-gate line.
进一步地,每一细栅线上的N个焊接触点沿所述细栅线的长度方向上等间距排列。Further, N solder contacts on each of the fine gate lines are arranged at equal intervals along the length direction of the thin gate lines.
进一步地,所述正面电极中的所有焊接触点呈N行×M列的阵列分布。Further, all of the solder contacts in the front electrode are distributed in an array of N rows x M columns.
进一步地,所述细栅线的宽度为0.2mm;所述圆形焊接触点的直径为0.8mm; 其中,M=15,N=10。Further, the width of the fine grid line is 0.2 mm; the diameter of the circular soldering contact is 0.8 mm; Where M=15 and N=10.
进一步地,所述电极单元在沿第一方向上包括相互间隔第一电极部、第二电极部和第三电极部,并且在沿第一方向上,所述第二电极部的长度分别大于第一电极部和第三电极部的长度。Further, the electrode unit includes a first electrode portion, a second electrode portion, and a third electrode portion spaced apart from each other in the first direction, and in the first direction, the length of the second electrode portion is greater than The length of one electrode portion and the third electrode portion.
进一步地,在沿第一方向上,所述第一电极部、第二电极部和第三电极部的长度之比为(0.4~0.6):1:(0.4~0.6)。Further, in a first direction, a ratio of lengths of the first electrode portion, the second electrode portion, and the third electrode portion is (0.4 to 0.6): 1: (0.4 to 0.6).
进一步地,在沿第一方向上,所述第二电极部的长度为0.6~1mm,所述第二电极部与第一电极部和第三电极部之间间隔的距离为0.3~0.6mm。Further, in the first direction, the length of the second electrode portion is 0.6 to 1 mm, and the distance between the second electrode portion and the first electrode portion and the third electrode portion is 0.3 to 0.6 mm.
相比于现有技术,本发明实施例提供的晶硅太阳能电池,其正面电极中,使用数量更多宽度更小的细栅线代替现有技术中的主栅线,总体上遮光面积更小,减小了光损耗,并且更多数量的细栅线均匀分布在太阳能电池正面,使得副栅线收集的电流可以更加顺利地导出,降低了功率损耗;另外,在细栅线上叠层设置有面积较大的圆形焊接触点,增加了焊接点的接触面积和焊接点的高度,在焊接焊带时,较少了焊带与电池片焊接异常的问题。进一步地,将背电极划分为与焊接触点一一对应的电极单元,并且电极单元采用分段式,有效地减少了背电极结构中银浆的用量。Compared with the prior art, the crystalline silicon solar cell provided by the embodiment of the present invention uses a larger number of fine gate lines with smaller widths instead of the main gate lines in the front electrode, and the overall shading area is smaller. , reducing the optical loss, and a larger number of fine grid lines are evenly distributed on the front side of the solar cell, so that the current collected by the sub-gate line can be more smoothly derived, reducing power loss; in addition, stacking on the fine grid line There is a large circular welding contact, which increases the contact area of the solder joint and the height of the solder joint. When soldering the solder ribbon, there is less problem of abnormal soldering of the solder ribbon and the battery. Further, the back electrode is divided into electrode units that are in one-to-one correspondence with the solder contacts, and the electrode unit is segmented, which effectively reduces the amount of silver paste in the back electrode structure.
附图说明DRAWINGS
图1是本发明实施例提供的晶硅太阳能电池的结构示意图;1 is a schematic structural view of a crystalline silicon solar cell according to an embodiment of the present invention;
图2是本发明实施例中的正面电极的结构示意图;2 is a schematic structural view of a front electrode in an embodiment of the present invention;
图3是图2中A部分的放大示意图;Figure 3 is an enlarged schematic view of a portion A of Figure 2;
图4是本发明实施例中的背电极的结构示意图;4 is a schematic structural view of a back electrode in an embodiment of the present invention;
图5是本发明实施例中的电极单元的结构示意图。Fig. 5 is a schematic structural view of an electrode unit in an embodiment of the present invention.
具体实施方式detailed description
为使本发明的目的、技术方案和优点更加清楚,下面结合附图对本发明的具体实施方式进行详细说明。这些实施方式的示例在附图中进行了例示。附图中所示和根据附图描述的本发明的实施方式仅仅是示例性的,并且本发明并不限于这些实施方式。The embodiments of the present invention will be described in detail below with reference to the accompanying drawings. Examples of these embodiments are exemplified in the drawings. The embodiments of the invention shown in the drawings and described in the drawings are merely exemplary, and the invention is not limited to the embodiments.
在此,还需要说明的是,为了避免因不必要的细节而模糊了本发明,在附 图中仅仅示出了与根据本发明的方案密切相关的结构和/或处理步骤,而省略了与本发明关系不大的其他细节。Here, it should also be noted that in order to avoid obscuring the present invention due to unnecessary details, Only the structural and/or processing steps closely related to the solution according to the invention are shown in the figures, while other details which are not relevant to the invention are omitted.
如图1所示,本实施例首先提供了一种晶硅太阳能电池,该晶硅太阳能电池主要包括电池本体1以及位于电池本体1正面的正面电极2和位于电池本体1背面的背电极3。电池本体1主要采用硅片通过制绒工艺、扩散工艺以及刻蚀工艺制备形成的PN结电池。正面电极2和背电极3主要是通过网版印刷工艺分别形成于电池本体1的两个侧面,用于输出电池本体1转换的电能。As shown in FIG. 1 , this embodiment firstly provides a crystalline silicon solar cell mainly comprising a battery body 1 and a front electrode 2 located on the front surface of the battery body 1 and a back electrode 3 located on the back surface of the battery body 1 . The battery body 1 mainly uses a silicon wafer to prepare a PN junction battery formed by a texturing process, a diffusion process, and an etching process. The front electrode 2 and the back electrode 3 are mainly formed on both sides of the battery body 1 by a screen printing process for outputting the electric energy converted by the battery body 1.
其中,参阅图2和图3,本实施例中的正面电极2包括沿第一方向(如图2中的Y方向)相互间隔且平行排列的多条副栅线10,沿第二方向(如图2中的X方向)相互间隔且平行排列的多条细栅线20,所述多条副栅线10与所述多条细栅线20相互电性连接。其中,副栅线10主要用于收集太阳能电池产生的光生电流,细栅线20用于将副栅线10收集的电流汇集输出。进一步地,每一细栅线20上还设置有相互间隔的多个焊接触点30,所述焊接触点30叠层设置在所述细栅线20上并且与所述细栅线20电性连接,所述焊接触点30的形状为圆形。所述焊接触点30主要是用于在电池制作完成后与焊带焊接连接。2 and FIG. 3, the front electrode 2 in this embodiment includes a plurality of sub-gate lines 10 spaced apart from each other in the first direction (in the Y direction in FIG. 2) and arranged in parallel, along the second direction (eg, A plurality of fine gate lines 20 spaced apart from each other and arranged in parallel in the X direction in FIG. 2, the plurality of sub-gate lines 10 and the plurality of fine gate lines 20 being electrically connected to each other. The sub-gate line 10 is mainly used to collect the photo-generated current generated by the solar cell, and the fine-gate line 20 is used to collect and output the current collected by the sub-gate line 10. Further, each of the fine gate lines 20 is further provided with a plurality of soldering contacts 30 spaced apart from each other, and the soldering contacts 30 are stacked on the fine gate lines 20 and electrically connected to the fine grid lines 20. Connected, the shape of the solder contact 30 is circular. The soldering contact 30 is mainly used for soldering connection to the solder ribbon after the battery is fabricated.
其中,副栅线10的数量可以选择在80~100条的范围内,其宽度可以选择在30~50μm的范围内。细栅线20的数量M可以选择在10~20的范围内,其宽度D1可以选择在0.10~0.25mm的范围内。每一细栅线20上设置的焊接触点30的数量N可以选择在5~15的范围内,焊接触点30的直径R可以选择在0.2~1mm的范围内,并且要满足焊接触点30的直径R大于细栅线20的宽度。在本实施例中,副栅线10的数量为90条,副栅线10的宽度为40μm;细栅线20的数量M=15,细栅线20的宽度D1为0.2mm;每一细栅线20上的焊接触点30的数量N=10,焊接触点30的形状为圆形,其直径R为0.8mm。The number of the sub-gate lines 10 may be selected from the range of 80 to 100, and the width may be selected to be in the range of 30 to 50 μm. The number M of the fine gate lines 20 can be selected in the range of 10 to 20, and the width D1 can be selected in the range of 0.10 to 0.25 mm. The number N of the soldering contacts 30 provided on each of the fine gate lines 20 may be selected to be in the range of 5 to 15, and the diameter R of the soldering contacts 30 may be selected to be in the range of 0.2 to 1 mm, and the soldering contacts 30 are to be satisfied. The diameter R is larger than the width of the fine grid line 20. In the present embodiment, the number of the sub-gate lines 10 is 90, the width of the sub-gate lines 10 is 40 μm; the number of the fine gate lines 20 is M=15, and the width D1 of the fine gate lines 20 is 0.2 mm; each fine gate The number of solder contacts 30 on line 20 is N = 10, and the shape of solder contact 30 is circular with a diameter R of 0.8 mm.
其中,所述焊接触点30叠层设置在所述细栅线20上。具体地,在制备正面电极结构时,首先通过一次印刷工艺制备获得副栅线10和细栅线20,然后再通过二次印刷工艺在所述细栅线20上制备获得焊接触点30。The solder contacts 30 are stacked on the fine gate lines 20. Specifically, in the preparation of the front electrode structure, the sub-gate lines 10 and the fine gate lines 20 are first prepared by a single printing process, and then the solder contacts 30 are prepared on the fine gate lines 20 by a secondary printing process.
在本实施例中,如图2所示,所述多条副栅线10沿第一方向(如图2中的Y方向)等间距排列,所述M条细栅线20沿第二方向(如图2中的X方向)等间距排列,所述第二方向与所述第一方向相互垂直。进一步地,所述焊接触点30设置于所述细栅线20与所述副栅线10相交的位置,并且,每一细栅线20上的N个焊接触点30沿所述细栅线20的长度方向上等间距排列。 In this embodiment, as shown in FIG. 2, the plurality of sub-gate lines 10 are arranged at equal intervals in a first direction (such as the Y direction in FIG. 2), and the M thin gate lines 20 are in a second direction ( Arranged at equal intervals in the X direction as in FIG. 2, the second direction is perpendicular to the first direction. Further, the soldering contact 30 is disposed at a position where the fine gate line 20 intersects the sub-gate line 10, and N soldering contacts 30 on each of the fine gate lines 20 along the thin grid line 20 is arranged at equal intervals in the longitudinal direction.
更具体地,在本实施例中,如图2所示,每一细栅线20上的N个焊接触点30的排列间距都相等,因此,在整个正面电极结构中,所有焊接触点30呈N行×M列的阵列分布。More specifically, in the present embodiment, as shown in FIG. 2, the arrangement pitch of the N solder contacts 30 on each of the fine gate lines 20 is equal, and therefore, in the entire front electrode structure, all the solder contacts 30 are provided. An array of N rows x M columns.
以上实施例提供的晶硅太阳能电池的正面电极可以有效地降低遮光面积。以太阳能电池正面的尺寸为156mm×156mm的正方形为例,按照现有的三主栅的正面电极和本发明实施例提供的正面电极结构分别计算遮光面积:The front electrode of the crystalline silicon solar cell provided by the above embodiments can effectively reduce the light shielding area. Taking the square of the front surface of the solar cell of 156 mm×156 mm as an example, the shading area is calculated according to the front electrode of the existing three main grid and the front electrode structure provided by the embodiment of the present invention:
1、现有的三主栅的正面电极结构。常规三根1.5mm宽主栅线、90根40μm副栅线的结构中,主栅线可设计为镂空形式,降低印刷使用的银浆,但焊接时主栅所有区域仍会焊上1.5mm宽度左右的焊带而遮挡阳光。因此主栅处对阳光的遮挡面积为1.5mm×3×156mm=702mm2;副栅线及4条边框遮挡面积为0.04mm×(90+2)×(153.5mm-1.5mm×3)+2×153.5mm×0.04mm=560.6mm2。常规三主栅正面电极的总遮挡面积为1262.6mm21. The front electrode structure of the existing three main grids. In the conventional structure of three 1.5mm wide main gate lines and 90 40μm sub grid lines, the main gate lines can be designed in a hollow form to reduce the silver paste used for printing, but all areas of the main grid will still be soldered to a width of about 1.5 mm during soldering. The welding strip blocks the sunlight. Therefore, the shielding area of the sun at the main grid is 1.5 mm × 3 × 156 mm = 702 mm 2 ; the shielding area of the sub grid and the four frames is 0.04 mm × (90 + 2) × (153.5 mm - 1.5 mm × 3) + 2 ×153.5 mm × 0.04 mm = 560.6 mm 2 . The total occlusion area of the conventional three-main gate front electrode is 1262.6 mm 2 .
2、本发明实施例提供的正面电极结构。按照具体地的例子,副栅线的数量为90条,其宽度为40μm;细栅线的数量为15条,其宽度为0.2mm;每一细栅线上的焊接触点的数量为10个,焊接触点的形状为圆形,其直径R为0.8mm。则:10根细栅线对阳光的遮挡面积为0.2mm×15×156mm=468mm2;副栅线及4条边框对阳光的遮挡为0.04mm×(90+2)×(153.5mm-0.2mm×15)+0.04mm×2×153.5mm=566.12mm2,除细栅线外0.8mm直径的圆形图案对阳光的遮挡为[π×0.42mm2-(0.8mm-0.2mm)×0.04mm-π×0.42mm2×29°×2÷360°-0.2×0.4×sin14.5]×150=56.64mm2,总遮挡面积为468mm2+566.12mm2+56.64mm2=1090.76mm2。本发明实施例提供的正面电极相比于现有的三主栅的正面电极,其减少的遮光面积为:1262.6mm2-1090.76mm2=171.84mm22. The front electrode structure provided by the embodiment of the invention. According to a specific example, the number of sub-gate lines is 90 and the width is 40 μm; the number of fine gate lines is 15 and the width is 0.2 mm; the number of solder contacts on each fine grid line is 10 The shape of the solder contact is circular and its diameter R is 0.8 mm. Then: the shielding area of 10 fine grid lines to sunlight is 0.2mm×15×156mm=468mm 2 ; the obstruction of sunlight by the sub-grid line and 4 frames is 0.04mm×(90+2)×(153.5mm-0.2mm ×15)+0.04mm×2×153.5mm=566.12mm 2 , the circular pattern of 0.8mm diameter except the fine grid line occludes sunlight [π×0.4 2 mm 2 -(0.8mm-0.2mm)×0.04 Mm-π×0.4 2 mm 2 ×29°×2÷360°-0.2×0.4×sin14.5]×150=56.64mm 2 , the total shielding area is 468mm 2 +566.12mm 2 +56.64mm 2 =1090.76mm 2 . The front electrode provided by the embodiment of the invention has a reduced light-shielding area of 1262.6 mm 2 -1090.76 mm 2 =171.84 mm 2 compared to the front electrode of the existing three-main gate.
进一步地,参阅图4和图5,本实施例中的背电极3包括N×M个电极单元31,即所述电极单元31与所述焊接触点30的数量是相等的,并且所述电极单元31与所述焊接触点30一一对应,所述电极单元31在第一方向(如图4中的Y方向)和第二方向(如图4中的X方向)上的长度分别不小于所述焊接触点在对应方向上的长度。具体地,所述电极单元31在第一方向和第二方向上的长度分别不小于圆形的焊接触点30的直径。Further, referring to FIG. 4 and FIG. 5, the back electrode 3 in this embodiment includes N×M electrode units 31, that is, the number of the electrode units 31 and the soldering contacts 30 are equal, and the electrodes The unit 31 has a one-to-one correspondence with the welding contacts 30, and the lengths of the electrode units 31 in the first direction (such as the Y direction in FIG. 4) and the second direction (in the X direction in FIG. 4) are not less than The length of the soldering contact in the corresponding direction. Specifically, the length of the electrode unit 31 in the first direction and the second direction is not less than the diameter of the circular soldering contact 30, respectively.
其中,如图5所示,所述电极单元31在沿第一方向上包括相互间隔第一电极部311、第二电极部312和第三电极部313,并且在沿第一方向上,所述第二电极 部312的长度分别大于第一电极部311和第三电极部313的长度。在本方案中,在沿第一方向上,所述第一电极部311、第二电极部312和第三电极部312的长度之比L21:L22:L23=(0.4~0.6):1:(0.4~0.6)。其中,所述第二电极部312的长度L21可以选择为0.6~1mm,所述第二电极部312与第一电极部311和第三电极部313之间间隔的距离D21和D22可以选择为0.3~0.6mm。其中,L21与L23可以选择为相等的数值,D21和D22可以选择为相等的数值。具体到本实施例中,各个参数的取值如下:L21=L23=0.5mm,L22=1mm,D21=D22=0.5mm;电极单元31在沿第二方向上的长度L24与焊接触点30的直径相等,即L24=0.8mm。Wherein, as shown in FIG. 5, the electrode unit 31 includes the first electrode portion 311, the second electrode portion 312, and the third electrode portion 313 spaced apart from each other in the first direction, and in the first direction, Second electrode The length of the portion 312 is greater than the length of the first electrode portion 311 and the third electrode portion 313, respectively. In the present embodiment, in the first direction, the ratio of the lengths of the first electrode portion 311, the second electrode portion 312, and the third electrode portion 312 is L21: L22: L23 = (0.4 - 0.6): 1: ( 0.4 to 0.6). The length L21 of the second electrode portion 312 may be selected to be 0.6 to 1 mm, and the distances D21 and D22 between the second electrode portion 312 and the first electrode portion 311 and the third electrode portion 313 may be selected to be 0.3. ~0.6mm. Among them, L21 and L23 can be selected as equal values, and D21 and D22 can be selected as equal values. Specifically, in this embodiment, the values of the respective parameters are as follows: L21=L23=0.5mm, L22=1mm, D21=D22=0.5mm; the length L24 of the electrode unit 31 in the second direction and the soldering contact 30 The diameter is equal, that is, L24 = 0.8mm.
现有的三主栅太阳能电池的背电极通常包括三列,每一列包括三个尺寸为21mm×3mm的电极块,背电极的整体面积为:21mm×3mm×9=567mm2The back electrode of the existing three-main grid solar cell generally comprises three columns, each column comprising three electrode blocks having a size of 21 mm x 3 mm, and the overall area of the back electrode is: 21 mm x 3 mm x 9 = 567 mm 2 .
本发明以上具体实施例提供的背电极结构中,包括10×15=150个电极单元,电极单元的宽度为L24=0.8mm,长度为L21+L22+L23=2mm,背电极的整体面积为:2mm×0.8mm×150=240mm2The back electrode structure provided by the above specific embodiment of the present invention includes 10×15=150 electrode units, the width of the electrode unit is L24=0.8 mm, the length is L21+L22+L23=2 mm, and the overall area of the back electrode is: 2 mm × 0.8 mm × 150 = 240 mm 2 .
本发明实施例提供的背电极相比于现有的三主栅太阳能电池的背电极,其整体面积减少了567mm2-240mm2=327mm2,在相同的网版印刷工艺的条件下,银浆用量减少了50%以上,大大降低了成本。The back electrode provided by the embodiment of the present invention has an overall area reduced by 567 mm 2 -240 mm 2 = 327 mm 2 compared with the back electrode of the existing three main grid solar cell, and under the same screen printing process, the silver paste The dosage is reduced by more than 50%, which greatly reduces the cost.
综上所述,以上实施例提供的晶硅太阳能电池,其正面电极中,使用数量更多宽度更小的细栅线代替现有技术中的主栅线,总体上遮光面积更小,减小了光损耗,并且更多数量的细栅线均匀分布在太阳能电池正面,使得副栅线收集的电流可以更加顺利地导出,降低了功率损耗;另外,在细栅线上叠层设置有面积较大的圆形焊接触点,增加了焊接点的接触面积和焊接点的高度,在焊接焊带时,较少了焊带与电池片焊接异常的问题。进一步地,将背电极划分为与焊接触点一一对应的电极单元,并且电极单元采用分段式,有效地减少了背电极结构中银浆的用量。In summary, the crystalline silicon solar cell provided by the above embodiment has a smaller number of narrow gate lines instead of the prior art main gate lines in the front electrodes, and the overall shading area is smaller and smaller. The optical loss, and a larger number of fine grid lines are evenly distributed on the front side of the solar cell, so that the current collected by the sub-gate line can be more smoothly derived, reducing the power loss; in addition, the area on the fine grid line is set to be thinner. Large round welded contacts increase the contact area of the solder joints and the height of the solder joints. When soldering the solder ribbon, there is less problem of abnormal soldering of the solder ribbon and the battery. Further, the back electrode is divided into electrode units that are in one-to-one correspondence with the solder contacts, and the electrode unit is segmented, which effectively reduces the amount of silver paste in the back electrode structure.
需要说明的是,在本文中,诸如第一和第二等之类的关系术语仅仅用来将一个实体或者操作与另一个实体或操作区分开来,而不一定要求或者暗示这些实体或操作之间存在任何这种实际的关系或者顺序。而且,术语“包括”、“包含”或者其任何其他变体意在涵盖非排他性的包含,从而使得包括一系列要素的过程、方法、物品或者设备不仅包括那些要素,而且还包括没有明确列出的其他要素,或者是还包括为这种过程、方法、物品或者设备所固有的要素。在没有更多限制的情况下,由语句“包括一个……”限定的要素,并不排除在包括所述要 素的过程、方法、物品或者设备中还存在另外的相同要素。It should be noted that, in this context, relational terms such as first and second are used merely to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply such entities or operations. There is any such actual relationship or order between them. Furthermore, the term "comprises" or "comprises" or "comprises" or any other variations thereof is intended to encompass a non-exclusive inclusion, such that a process, method, article, or device that comprises a plurality of elements includes not only those elements but also Other elements, or elements that are inherent to such a process, method, item, or device. In the absence of more restrictions, the elements defined by the statement "including one..." are not excluded from including the There are other similar elements in the process, method, article or equipment.
以上所述仅是本申请的具体实施方式,应当指出,对于本技术领域的普通技术人员来说,在不脱离本申请原理的前提下,还可以做出若干改进和润饰,这些改进和润饰也应视为本申请的保护范围。 The above description is only a specific embodiment of the present application, and it should be noted that those skilled in the art can also make several improvements and retouchings without departing from the principles of the present application. It should be considered as the scope of protection of this application.

Claims (19)

  1. 一种晶硅太阳能电池,包括电池本体以及位于电池本体正面的正面电极和位于电池本体背面的背电极,其中,A crystalline silicon solar cell includes a battery body and a front electrode on a front surface of the battery body and a back electrode on a back surface of the battery body, wherein
    所述正面电极包括沿第一方向相互间隔排列的多条副栅线,还包括沿第二方向相互间隔排列的M条细栅线,所述细栅线与所述副栅线电性连接,所述细栅线的宽度为0.10~0.25mm;其中,M=10~20;其中,每一细栅线上还设置有相互间隔的N个焊接触点,所述焊接触点叠层设置在所述细栅线上并且与所述细栅线电性连接,所述焊接触点的形状为圆形,所述圆形的直径的范围是0.2~1mm,并且所述圆形的直径大于所述细栅线的宽度;其中,N=5~15;The front electrode includes a plurality of sub-gate lines spaced apart from each other in the first direction, and further includes M thin gate lines arranged in a spaced relationship from each other in the second direction, the fine gate lines being electrically connected to the sub-gate lines, The width of the fine gate line is 0.10-0.25 mm; wherein, M=10-20; wherein each fine grid line is further provided with N soldering contacts spaced apart from each other, and the solder contact stack is disposed at The fine gate line is electrically connected to the fine grid line, the shape of the solder contact is circular, the diameter of the circle is 0.2 to 1 mm, and the diameter of the circle is larger than Describe the width of the fine grid line; wherein, N = 5 to 15;
    所述背电极包括N×M个电极单元,所述电极单元与所述焊接触点一一对应,所述电极单元在第一方向和第二方向上的长度分别不小于所述焊接触点在对应方向上的长度。The back electrode includes N×M electrode units, and the electrode unit has a one-to-one correspondence with the soldering contacts, and the lengths of the electrode units in the first direction and the second direction are not less than the soldering contacts respectively. Corresponding to the length in the direction.
  2. 根据权利要求1所述的晶硅太阳能电池,其中,所述焊接触点通过二次印刷工艺形成于所述细栅线上。The crystalline silicon solar cell of claim 1, wherein the solder contact is formed on the fine gate line by a secondary printing process.
  3. 根据权利要求1所述的晶硅太阳能电池,其中,所述多条副栅线沿第一方向等间距排列,所述M条细栅线沿第二方向等间距排列,所述第二方向与所述第一方向相互垂直。The crystalline silicon solar cell of claim 1 , wherein the plurality of sub-gate lines are equally spaced along a first direction, and the M fine gate lines are equally spaced along a second direction, the second direction being The first directions are perpendicular to each other.
  4. 根据权利要求3所述的晶硅太阳能电池,其中,所述焊接触点设置于所述细栅线与所述副栅线相交的位置。The crystalline silicon solar cell of claim 3, wherein the solder contact is disposed at a position where the fine gate line intersects the sub-gate line.
  5. 根据权利要求4所述的晶硅太阳能电池,其中,每一细栅线上的N个焊接触点沿所述细栅线的长度方向上等间距排列。The crystalline silicon solar cell of claim 4, wherein the N solder contacts on each of the fine gate lines are equally spaced along the length of the thin gate lines.
  6. 根据权利要求5所述的晶硅太阳能电池,其中,所述正面电极中的所有焊接触点呈N行×M列的阵列分布。The crystalline silicon solar cell of claim 5 wherein all of the solder contacts in the front side electrode are distributed in an array of N rows x M columns.
  7. 根据权利要求6所述的晶硅太阳能电池,其中,所述细栅线的宽度为0.2mm;所述圆形的焊接触点的直径为0.8mm;其中,M=15,N=10。The crystalline silicon solar cell of claim 6, wherein the fine gate line has a width of 0.2 mm; the circular solder contact has a diameter of 0.8 mm; wherein M = 15, N = 10.
  8. 根据权利要求1所述的晶硅太阳能电池,其中,所述电极单元在沿第一方向上包括相互间隔第一电极部、第二电极部和第三电极部,并且在沿第一方向上,所述第二电极部的长度分别大于第一电极部和第三电极部的长度。 The crystalline silicon solar cell of claim 1, wherein the electrode unit includes a first electrode portion, a second electrode portion, and a third electrode portion spaced apart from each other in a first direction, and in a first direction, The length of the second electrode portion is greater than the length of the first electrode portion and the third electrode portion, respectively.
  9. 根据权利要求8所述的晶硅太阳能电池,其中,在沿第一方向上,所述第一电极部、第二电极部和第三电极部的长度之比为(0.4~0.6):1:(0.4~0.6)。The crystalline silicon solar cell according to claim 8, wherein a ratio of lengths of the first electrode portion, the second electrode portion, and the third electrode portion in the first direction is (0.4 to 0.6): 1: (0.4 to 0.6).
  10. 根据权利要求9所述的晶硅太阳能电池,其中,在沿第一方向上,所述第二电极部的长度为0.6~1mm,所述第二电极部与第一电极部和第三电极部之间间隔的距离为0.3~0.6mm。The crystalline silicon solar cell according to claim 9, wherein the second electrode portion has a length of 0.6 to 1 mm in the first direction, and the second electrode portion and the first electrode portion and the third electrode portion The distance between the intervals is 0.3 to 0.6 mm.
  11. 根据权利要求2所述的晶硅太阳能电池,其中,所述电极单元在沿第一方向上包括相互间隔第一电极部、第二电极部和第三电极部,并且在沿第一方向上,所述第二电极部的长度分别大于第一电极部和第三电极部的长度。The crystalline silicon solar cell according to claim 2, wherein the electrode unit includes the first electrode portion, the second electrode portion, and the third electrode portion spaced apart from each other in the first direction, and in the first direction, The length of the second electrode portion is greater than the length of the first electrode portion and the third electrode portion, respectively.
  12. 根据权利要求11所述的晶硅太阳能电池,其中,在沿第一方向上,所述第一电极部、第二电极部和第三电极部的长度之比为(0.4~0.6):1:(0.4~0.6)。The crystalline silicon solar cell according to claim 11, wherein a ratio of lengths of the first electrode portion, the second electrode portion, and the third electrode portion in the first direction is (0.4 to 0.6): 1: (0.4 to 0.6).
  13. 根据权利要求12所述的晶硅太阳能电池,其中,在沿第一方向上,所述第二电极部的长度为0.6~1mm,所述第二电极部与第一电极部和第三电极部之间间隔的距离为0.3~0.6mm。The crystalline silicon solar cell according to claim 12, wherein the second electrode portion has a length of 0.6 to 1 mm in the first direction, and the second electrode portion and the first electrode portion and the third electrode portion The distance between the intervals is 0.3 to 0.6 mm.
  14. 根据权利要求3所述的晶硅太阳能电池,其中,所述电极单元在沿第一方向上包括相互间隔第一电极部、第二电极部和第三电极部,并且在沿第一方向上,所述第二电极部的长度分别大于第一电极部和第三电极部的长度。The crystalline silicon solar cell according to claim 3, wherein the electrode unit includes the first electrode portion, the second electrode portion, and the third electrode portion spaced apart from each other in the first direction, and in the first direction, The length of the second electrode portion is greater than the length of the first electrode portion and the third electrode portion, respectively.
  15. 根据权利要求14所述的晶硅太阳能电池,其中,在沿第一方向上,所述第一电极部、第二电极部和第三电极部的长度之比为(0.4~0.6):1:(0.4~0.6)。The crystalline silicon solar cell according to claim 14, wherein a ratio of lengths of the first electrode portion, the second electrode portion, and the third electrode portion in the first direction is (0.4 to 0.6): 1: (0.4 to 0.6).
  16. 根据权利要求15所述的晶硅太阳能电池,其中,在沿第一方向上,所述第二电极部的长度为0.6~1mm,所述第二电极部与第一电极部和第三电极部之间间隔的距离为0.3~0.6mm。The crystalline silicon solar cell according to claim 15, wherein the second electrode portion has a length of 0.6 to 1 mm in the first direction, and the second electrode portion and the first electrode portion and the third electrode portion The distance between the intervals is 0.3 to 0.6 mm.
  17. 根据权利要求4所述的晶硅太阳能电池,其中,所述电极单元在沿第一方向上包括相互间隔第一电极部、第二电极部和第三电极部,并且在沿第一方向上,所述第二电极部的长度分别大于第一电极部和第三电极部的长度。The crystalline silicon solar cell of claim 4, wherein the electrode unit includes the first electrode portion, the second electrode portion, and the third electrode portion spaced apart from each other in the first direction, and in the first direction, The length of the second electrode portion is greater than the length of the first electrode portion and the third electrode portion, respectively.
  18. 根据权利要求17所述的晶硅太阳能电池,其中,在沿第一方向上,所述第一电极部、第二电极部和第三电极部的长度之比为(0.4~0.6):1:(0.4~0.6)。The crystalline silicon solar cell according to claim 17, wherein the ratio of the lengths of the first electrode portion, the second electrode portion, and the third electrode portion in the first direction is (0.4 to 0.6): 1: (0.4 to 0.6).
  19. 根据权利要求18所述的晶硅太阳能电池,其中,在沿第一方向上,所述第二电极部的长度为0.6~1mm,所述第二电极部与第一电极部和第三电极部之间间隔的距离为0.3~0.6mm。 The crystalline silicon solar cell according to claim 18, wherein the second electrode portion has a length of 0.6 to 1 mm in the first direction, and the second electrode portion and the first electrode portion and the third electrode portion The distance between the intervals is 0.3 to 0.6 mm.
PCT/CN2016/092197 2016-01-28 2016-07-29 Crystalline silicon solar cell WO2017128670A1 (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109873054A (en) * 2019-04-04 2019-06-11 乐山新天源太阳能科技有限公司 Black silicon solar cell production line
CN115377230A (en) * 2022-09-26 2022-11-22 浙江晶科能源有限公司 Solar cell and photovoltaic module

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105679850A (en) * 2016-01-28 2016-06-15 黄河水电光伏产业技术有限公司 Crystalline silicon solar cell
CN105679849B (en) * 2016-01-28 2018-11-02 黄河水电光伏产业技术有限公司 A kind of crystal silicon solar batteries
CN105552144B (en) * 2016-01-28 2018-02-23 黄河水电光伏产业技术有限公司 A kind of front electrode of crystal silicon solar batteries
CN105552145B (en) * 2016-01-28 2017-08-11 黄河水电光伏产业技术有限公司 A kind of crystal silicon solar batteries
CN107895748A (en) * 2016-09-06 2018-04-10 青岛瑞元鼎泰新能源科技有限公司 High-efficiency solar is without main grid crystal-silicon battery slice

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101976692A (en) * 2010-07-28 2011-02-16 常州天合光能有限公司 N type back contact battery
CN103594533A (en) * 2013-11-26 2014-02-19 合肥海润光伏科技有限公司 Back-contact back-junction solar battery three-dimension electrode and manufacturing method thereof
CN104810423A (en) * 2015-04-24 2015-07-29 苏州中来光伏新材股份有限公司 Novel main-gate-free efficient back-contact solar battery and module and production process
CN105679850A (en) * 2016-01-28 2016-06-15 黄河水电光伏产业技术有限公司 Crystalline silicon solar cell

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102800713A (en) * 2012-08-27 2012-11-28 英利能源(中国)有限公司 Solar cell sheet and solar cell
CN203071087U (en) * 2013-01-17 2013-07-17 太极能源科技(昆山)有限公司 Positive electrode structure of solar cell
CN104218104A (en) * 2014-08-26 2014-12-17 南昌大学 Solar cell positive electrode grid line structure with main grid line replaced by trigger discs
CN104576781A (en) * 2015-01-27 2015-04-29 苏州阿特斯阳光电力科技有限公司 Solar cell
CN204632769U (en) * 2015-05-29 2015-09-09 苏州阿特斯阳光电力科技有限公司 A kind of back electrode structure of many main grids solar cell

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101976692A (en) * 2010-07-28 2011-02-16 常州天合光能有限公司 N type back contact battery
CN103594533A (en) * 2013-11-26 2014-02-19 合肥海润光伏科技有限公司 Back-contact back-junction solar battery three-dimension electrode and manufacturing method thereof
CN104810423A (en) * 2015-04-24 2015-07-29 苏州中来光伏新材股份有限公司 Novel main-gate-free efficient back-contact solar battery and module and production process
CN105679850A (en) * 2016-01-28 2016-06-15 黄河水电光伏产业技术有限公司 Crystalline silicon solar cell

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109873054A (en) * 2019-04-04 2019-06-11 乐山新天源太阳能科技有限公司 Black silicon solar cell production line
CN115377230A (en) * 2022-09-26 2022-11-22 浙江晶科能源有限公司 Solar cell and photovoltaic module

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