WO2017122771A1 - Appareil de production de liquide d'alimentation et procédé de production de liquide d'alimentation - Google Patents

Appareil de production de liquide d'alimentation et procédé de production de liquide d'alimentation Download PDF

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Publication number
WO2017122771A1
WO2017122771A1 PCT/JP2017/000983 JP2017000983W WO2017122771A1 WO 2017122771 A1 WO2017122771 A1 WO 2017122771A1 JP 2017000983 W JP2017000983 W JP 2017000983W WO 2017122771 A1 WO2017122771 A1 WO 2017122771A1
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WIPO (PCT)
Prior art keywords
flow rate
unit
liquid
pressure
gas
Prior art date
Application number
PCT/JP2017/000983
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English (en)
Japanese (ja)
Inventor
卓 小澤
中川　洋一
宗人 高橋
涛 徐
横山　俊夫
Original Assignee
株式会社荏原製作所
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Priority claimed from JP2017001731A external-priority patent/JP6826437B2/ja
Application filed by 株式会社荏原製作所 filed Critical 株式会社荏原製作所
Priority to CN201780006815.2A priority Critical patent/CN108472610B/zh
Priority to EP17738523.4A priority patent/EP3403717B1/fr
Priority to US16/069,862 priority patent/US10654017B2/en
Priority to SG11201805417PA priority patent/SG11201805417PA/en
Priority to KR1020187019107A priority patent/KR102571000B1/ko
Publication of WO2017122771A1 publication Critical patent/WO2017122771A1/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/71—Feed mechanisms
    • B01F35/712—Feed mechanisms for feeding fluids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F21/00—Dissolving
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/40—Mixing liquids with liquids; Emulsifying
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/71—Feed mechanisms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/71—Feed mechanisms
    • B01F35/717—Feed mechanisms characterised by the means for feeding the components to the mixer
    • B01F35/7176—Feed mechanisms characterised by the means for feeding the components to the mixer using pumps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/75—Discharge mechanisms
    • B01F35/754—Discharge mechanisms characterised by the means for discharging the components from the mixer
    • B01F35/7547—Discharge mechanisms characterised by the means for discharging the components from the mixer using valves, gates, orifices or openings
    • B01F35/75471—Discharge mechanisms characterised by the means for discharging the components from the mixer using valves, gates, orifices or openings being adjustable
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
    • B01F35/80—Forming a predetermined ratio of the substances to be mixed
    • B01F35/88—Forming a predetermined ratio of the substances to be mixed by feeding the materials batchwise
    • B01F35/883—Forming a predetermined ratio of the substances to be mixed by feeding the materials batchwise using flow rate controls for feeding the substances

Definitions

  • the present invention relates to a supply liquid production apparatus for producing a supply liquid by mixing a first raw material and a second raw material.
  • a cleaning method in addition to the “batch processing method” that repeats the operation of simultaneously immersing and cleaning a plurality of silicon wafers, chemical cleaning and ultrapure water are performed for each wafer corresponding to products of various types and small quantities.
  • a “single-wafer processing method” for cleaning is adopted.
  • the single wafer processing method has a longer cleaning process time (takt time) per wafer than the batch processing method, and the amount of cleaning liquid used is increased. Therefore, it is required to shorten the tact time and reduce the amount of cleaning liquid used. It has been.
  • takt time cleaning process time
  • an advanced cleaning process is performed in which a plurality of functional waters and chemicals are used alone or simultaneously to switch the cleaning process in a short time. Yes.
  • ozone water in which ozone gas is dissolved in ultrapure water is used. Since ozone dissolved in ultrapure water has a very strong oxidizing power even at a low concentration (several ppm), it is possible to remove organic substances and metals.
  • This ozone water is generally produced by an ozone water production apparatus. With the sophistication and complexity of the cleaning process, it is required to supply and stop ozone water to the cleaning device in a short time. However, once the production of ozone water is stopped, the conventional device once again requires the required ozone. It takes a certain time (rise time) before the ozone water having the concentration and the required flow rate can be supplied.
  • ozone water is always manufactured by the ozone water manufacturing device and continuously supplied to the cleaning device.
  • an excessive amount of ozone water is supplied to the cleaning device, and unused ozone water that is not used for cleaning the silicon wafer is discharged from the cleaning device as waste water.
  • water and ozone gas are supplied to the ozone dissolution tank 12 to generate ozone water, and ozone water is supplied from the ozone dissolution tank 12 to the circulation tank 21.
  • the ozone water supplied from the circulation tank 21 to the use point via the ozone water supply pipe 22 is returned to the circulation tank 21 via the ozone water return pipe 23, and again from the circulation tank 21.
  • the tank internal pressure of the ozone dissolution tank 12, the tank internal pressure of the circulation tank 21, and the internal pressure of the ozone water return pipe 23 are kept constant, and the tank internal pressure of the circulation tank 21 is maintained in the tank of the ozone dissolution tank 12.
  • the pressure and the pressure in the ozone water return pipe 23 are controlled to be lower than each pressure.
  • the conventional ozone water supply device is a circulation type that circulates ozone water (unused ozone water) to be reused, the temperature rise or contamination of ozone water due to the circulation of ozone water (unused ozone water) It was necessary to take measures against the outbreak. Therefore, it has been desired to develop a technique for producing ozone water in an amount necessary for a use point.
  • the present invention has been made in view of the above-mentioned problems, and it is not necessary to take measures against the temperature rise or the occurrence of contamination of a supply liquid (for example, ozone water) by circulation, or at least reduce the necessity thereof, and the use point
  • a supply liquid production apparatus capable of producing a supply liquid as much as necessary. More specifically, an object is to provide a supply liquid production apparatus that can supply a supply liquid with a constant flow rate or a constant pressure and a constant concentration to a use point.
  • the supply liquid manufacturing apparatus of the present invention includes a mixing unit that mixes a first raw material and a second raw material to generate a mixed liquid, a pump unit that changes a flow rate of the first raw material supplied to the mixing unit, A gas-liquid separation tank unit that gas-liquid separates the mixed liquid generated by the mixing unit into a supply liquid supplied to a use point and an exhaust gas discharged from an exhaust port, and a discharge amount of the exhaust gas is determined.
  • a valve for adjusting the opening degree, a flow rate measurement unit for measuring the flow rate of the supply liquid supplied from the gas-liquid separation tank unit to the use point, and a flow rate value of the supply liquid measured by the flow rate measurement unit The first raw material supplied to the mixing unit by generating a control signal for controlling the pump unit according to the received flow rate value and transmitting the control signal to the pump unit to control the pump Adjust the flow rate of Provided that the flow rate control unit.
  • the flow rate of the liquid (supply liquid) supplied to the use point is measured after gas-liquid separation, the gas (exhaust gas) generated by mixing the first raw material and the second raw material The flow rate of the supplied liquid can be accurately measured without being substantially affected by the bubbles. Then, the flow rate value of the supply liquid measured by the flow rate measurement unit is received, a control signal for controlling the pump unit is generated according to the received flow rate value, and the control signal is transmitted to the pump unit to control the pump As a result, the flow rate of the first raw material is adjusted according to the flow rate of the supply liquid measured in this way, so that the supply liquid (for example, ozone water) can be produced as much as required at the use point. it can.
  • the supply liquid for example, ozone water
  • the supply liquid manufacturing apparatus of the present invention includes a second flow rate measurement unit that measures the flow rate of the first raw material supplied to the mixing unit, and the first flow rate measured by the second flow rate measurement unit.
  • the flow rate control unit may perform feedback control so that the flow rate of the raw material matches the flow rate of the supply liquid measured by the flow rate measurement unit.
  • the flow rate of the first raw material is monitored, and the feedback control of the pump can be performed to correct the flow rate when it deviates from the desired flow rate.
  • the supply liquid manufacturing apparatus of the present invention includes a flow rate controller that determines the flow rate of the second raw material, and the flow rate controller uses the flow rate controller according to the flow rate of the first raw material measured by the second flow rate measurement unit. You may adjust the production amount of a 2nd raw material.
  • the relationship between the flow rates of the first raw material and the second raw material is obtained in advance so that a supply liquid with a target concentration can be obtained, and the second raw material is allowed to flow according to the flow rate of the first raw material. it can.
  • the supply liquid manufacturing apparatus of the present invention includes a mixing unit that mixes a first raw material and a second raw material to generate a mixed liquid, a booster pump unit that pressurizes the first raw material supplied to the mixing unit, and the mixing
  • a flow rate measuring unit that measures the flow rate of the supply liquid supplied to the point, and the boost pump unit is controlled according to the flow rate of the supply liquid measured by the flow rate measurement unit to boost the pressure to the mixing unit
  • a pressure increase control unit that adjusts the pressure of the first raw material to be supplied; and an exhaust pressure control unit that controls the exhaust pressure of the exhaust gas so as to keep the amount of liquid in the gas-liquid separation tank unit constant.
  • the gas (exhaust gas) generated by mixing the first raw material and the second raw material The flow rate of the supplied liquid can be accurately measured without being substantially affected by the bubbles.
  • the pressure of the first raw material (suppressed and supplied to the mixing unit) is adjusted according to the flow rate of the supply liquid thus measured, and the exhaust pressure of the exhaust gas is controlled to control the gas-liquid separation tank.
  • the amount of liquid in the section is kept constant. Thereby, supply liquid (for example, ozone water etc.) can be manufactured as much as required at the use point.
  • the supply liquid manufacturing apparatus of the present invention may further include a liquid amount adjusting unit for adjusting the liquid amount in the gas-liquid separation tank unit to be constant.
  • the amount of liquid in the gas-liquid separation tank can be kept constant, and a supply liquid (for example, ozone water) can be produced as much as required at the use point.
  • a supply liquid for example, ozone water
  • the liquid amount adjusting unit may include a liquid amount measuring unit that measures the amount of liquid in the gas-liquid separation tank unit.
  • the amount of liquid in the gas-liquid separation tank unit can be measured by the liquid amount measurement unit, so that the amount of liquid in the gas-liquid separation tank unit can be kept constant. Only a supply liquid (such as ozone water) can be produced.
  • the liquid amount adjustment unit may include the flow rate measurement unit and a second flow rate measurement unit that measures the flow rate of the liquid supplied to the mixing unit.
  • the flow rate of the liquid supplied to the mixing unit is measured, and the flow rate of the liquid discharged from the gas-liquid separation tank unit (supplied to the use point) is measured and supplied to the mixing unit.
  • the first raw material may be water
  • the second raw material may be ozone gas or a chemical raw material.
  • ozone water can be produced by mixing water and ozone gas in the mixing section.
  • chemical water for example, ammonia water
  • a chemical raw material for example, ammonia
  • the supply liquid manufacturing method of the present invention includes a step of boosting a first raw material by a boosting pump unit and supplying the first raw material to a mixing unit, and a step of mixing the first raw material and the second raw material in the mixing unit to generate a mixed liquid Gas-liquid separation of the mixed liquid generated by the mixing unit into a supply liquid supplied to a use point and an exhaust gas discharged from an exhaust port in a gas-liquid separation tank unit; Measuring the flow rate of the supply liquid supplied from the separation tank unit to the use point, and controlling the boost pump unit according to the measured flow rate of the supply liquid to boost the pressure to the mixing unit Adjusting the pressure of the first raw material, and controlling the exhaust pressure of the exhaust gas so as to keep the amount of liquid in the gas-liquid separation tank unit constant.
  • the supply liquid manufacturing apparatus of the present invention includes a mixing unit that mixes a first raw material and a second raw material to generate a mixed liquid, a pump unit that changes a flow rate of the first raw material supplied to the mixing unit, From the gas-liquid separation tank unit, the gas-liquid separation tank unit that gas-liquid separates the mixed liquid generated by the mixing unit into a supply liquid supplied to a use point and an exhaust gas discharged from an exhaust port; A first flow rate measuring unit for measuring a flow rate of the supply liquid supplied to the use point; an exhaust valve for adjusting a discharge amount of the exhaust gas discharged from the exhaust port; and the supply supplied to the use point.
  • the exhaust valve is controlled to adjust the discharge amount of the exhaust gas discharged from the exhaust port so as to keep the liquid flow rate constant.
  • the exhaust controller controls the amount of the exhaust gas discharged from the exhaust port when the flow rate of the supply liquid measured by the first flow rate measuring unit increases with respect to the constant flow rate. The discharge amount is increased, and when the flow rate of the supply liquid measured by the first flow rate measurement unit decreases with respect to the constant flow rate, the discharge amount of the exhaust gas discharged from the exhaust port is decreased.
  • the flow rate of the supply liquid supplied to the use point increases with respect to the target constant flow rate, that is, the constant flow rate where the flow rate of the supply liquid measured by the first flow rate measurement unit is the target.
  • the flow rate of the supply liquid supplied to the use point is decreased by increasing the discharge amount of the exhaust gas discharged from the exhaust port and lowering the pressure in the gas-liquid separation tank unit.
  • the flow rate of the supply liquid supplied to the use point decreases with respect to the target constant flow rate, that is, the flow rate of the supply liquid measured by the first flow rate measurement unit decreases with respect to the target constant flow rate.
  • the flow rate of the supply liquid supplied to the use point is increased by decreasing the discharge amount of the exhaust gas discharged from the exhaust port and increasing the pressure in the gas-liquid separation tank unit. In this way, the flow rate of the supply liquid supplied to the use point can be kept constant.
  • the supply liquid manufacturing apparatus of the present invention adjusts the flow rate of the first raw material to be supplied to the mixing unit by controlling the pump unit according to the flow rate of the supply liquid measured by the first flow rate measurement unit.
  • a flow rate control unit that controls the flow rate of the supply liquid measured by the first flow rate measurement unit to be the same as the flow rate of the first raw material supplied to the mixing unit. Good.
  • the flow rate of the first raw material supplied to the mixing unit is adjusted so that the flow rate of the supply liquid measured by the first flow rate measuring unit and the flow rate of the first raw material supplied to the mixing unit are the same.
  • the amount of liquid in the gas-liquid separation tank can be kept constant.
  • the supply liquid manufacturing apparatus of the present invention may include a second flow rate measurement unit that measures the flow rate of the first raw material supplied to the mixing unit.
  • the flow rate of the first raw material supplied to the mixing unit is adjusted so that the flow rate measured by the second flow rate measurement unit is the same as the flow rate measured by the first flow rate measurement unit. be able to.
  • the supply liquid manufacturing apparatus of the present invention further includes a liquid amount measuring unit that detects the amount of liquid in the gas-liquid separation tank unit, and the boost control unit is configured to measure the gas-liquid separation tank measured by the liquid amount measuring unit.
  • the boost control unit is configured to measure the gas-liquid separation tank measured by the liquid amount measuring unit.
  • the liquid amount in the gas-liquid separation tank unit can be kept constant by detecting the liquid amount in the gas-liquid separation tank unit without measuring the flow rate of the first raw material supplied to the mixing unit.
  • the flow rate of the first raw material supplied to the mixing unit can be adjusted so as to maintain.
  • the supply liquid manufacturing method of the present invention includes a step of mixing a first raw material and a second raw material in a mixing unit to generate a mixed liquid, and a supply in which the mixed liquid generated in the mixing unit is supplied to a use point Gas-liquid separation in a gas-liquid separation tank unit into liquid and exhaust gas discharged from an exhaust port; and first flow rate measurement of the supply liquid supplied from the gas-liquid separation tank unit to the use point And a discharge from the exhaust port according to the flow rate of the supply liquid measured by the first flow rate measurement unit so that the flow rate of the supply liquid supplied to the use point is kept constant.
  • the discharge amount of the exhaust gas discharged from the exhaust port is increased when the flow rate increases with respect to the constant flow rate. Decreases the amount of exhaust gas discharged from the exhaust port.
  • the flow rate of the supply liquid supplied to the use point increases with respect to the target constant flow rate, that is, the flow rate of the supply liquid measured by the flow rate measuring unit is compared with the target constant flow rate.
  • the flow rate of the supply liquid supplied to the use point is decreased by increasing the discharge amount of the exhaust gas discharged from the exhaust port and lowering the pressure in the gas-liquid separation tank unit.
  • the flow rate of the supply liquid supplied to the use point decreases with respect to the target constant flow rate, that is, when the flow rate of the supply liquid measured by the flow measurement unit decreases with respect to the target constant flow rate
  • the flow rate of the supply liquid supplied to the use point is increased by decreasing the discharge amount of the exhaust gas discharged from the exhaust port and increasing the pressure in the gas-liquid separation tank unit. In this way, the flow rate of the supply liquid supplied to the use point can be kept constant.
  • the supply liquid manufacturing apparatus of the present invention includes a mixing unit that mixes a first raw material and a second raw material to generate a mixed liquid, a pump unit that changes a flow rate of the first raw material supplied to the mixing unit, From the gas-liquid separation tank unit, the gas-liquid separation tank unit that gas-liquid separates the mixed liquid generated by the mixing unit into a supply liquid supplied to a use point and an exhaust gas discharged from an exhaust port; A pressure measuring unit for measuring a pressure of the supply liquid supplied to the use point; an exhaust valve for adjusting a discharge amount of the exhaust gas discharged from the exhaust port; and a supply liquid supplied to the use point.
  • Exhaust control that controls the exhaust valve and adjusts the exhaust gas discharged from the exhaust port according to the pressure of the supply liquid measured by the pressure measuring unit so as to keep the pressure constant. And the exhaust control unit increases the discharge amount of the exhaust gas discharged from the exhaust port when the pressure of the supply liquid measured by the pressure measurement unit increases with respect to the constant pressure. When the pressure of the supply liquid measured by the pressure measuring unit decreases with respect to the constant pressure, the discharge amount of the exhaust gas discharged from the exhaust port is decreased.
  • the supply liquid manufacturing apparatus of the present invention is a first flow rate measurement unit that measures a flow rate of the supply liquid supplied from the gas-liquid separation tank unit to the use point, and the first flow rate measurement unit that measures the flow rate.
  • a flow rate control unit that controls the pump unit and adjusts the flow rate of the first raw material supplied to the mixing unit according to the flow rate of the supply liquid, and the flow rate control unit includes the first flow rate measurement unit.
  • the flow rate of the supply liquid measured in step 1 may be controlled to be the same as the flow rate of the first raw material supplied to the mixing unit.
  • the flow rate of the first raw material supplied to the mixing unit is adjusted so that the flow rate of the supply liquid measured by the first flow rate measuring unit and the flow rate of the first raw material supplied to the mixing unit are the same.
  • the amount of liquid in the gas-liquid separation tank can be kept constant.
  • the supply liquid manufacturing apparatus of the present invention may include a second flow rate measurement unit that measures the flow rate of the first raw material supplied to the mixing unit.
  • the flow rate of the first raw material supplied to the mixing unit is adjusted so that the flow rate measured by the second flow rate measurement unit is the same as the flow rate measured by the first flow rate measurement unit. be able to.
  • the supply liquid manufacturing apparatus of the present invention has a liquid amount measurement unit that detects the amount of liquid in the gas-liquid separation tank unit, and the flow rate control unit is the gas-liquid separation tank measured by the liquid amount measurement unit
  • the amount of liquid in the unit increases with respect to a predetermined amount of liquid
  • the flow rate of the first raw material supplied to the mixing unit is decreased
  • the amount of liquid in the gas-liquid separation tank unit measured by the liquid amount measuring unit May decrease the flow rate of the first raw material supplied to the mixing unit when the amount of liquid decreases with respect to a predetermined amount of liquid.
  • the liquid amount in the gas-liquid separation tank unit can be kept constant by detecting the liquid amount in the gas-liquid separation tank unit without measuring the flow rate of the first raw material supplied to the mixing unit.
  • the flow rate of the first raw material supplied to the mixing unit can be adjusted so as to maintain.
  • the supply liquid manufacturing method of the present invention includes a step of mixing a first raw material and a second raw material to generate a mixed liquid in a mixing unit, and a supply for supplying the mixed liquid generated in the mixing unit to a use point Gas-liquid separation in the gas-liquid separation tank unit into liquid and exhaust gas discharged from the exhaust port, and pressure of the supply liquid supplied from the gas-liquid separation tank unit to the point of use in the pressure measurement unit
  • the pressure of the supply liquid measured by the pressure measuring unit is a constant pressure
  • the discharge amount of the exhaust gas discharged from the exhaust port is increased.
  • the pressure of the supply liquid measured by the pressure measuring unit decreases with respect
  • the pressure of the supply liquid supplied to the use point increases with respect to the target constant pressure, that is, the pressure of the supply liquid measured by the pressure measuring unit with respect to the target constant pressure.
  • the pressure of the supply liquid supplied to the use point is decreased by increasing the discharge amount of the exhaust gas discharged from the exhaust port and lowering the pressure in the gas-liquid separation tank unit.
  • the pressure of the supply liquid supplied to the use point decreases with respect to the target constant pressure, that is, when the pressure of the supply liquid measured by the pressure measuring unit decreases with respect to the target constant pressure.
  • the pressure of the supply liquid supplied to the use point is increased by decreasing the discharge amount of the exhaust gas discharged from the exhaust port and increasing the pressure in the gas-liquid separation tank unit. In this way, the pressure of the supply liquid supplied to the use point can be kept constant.
  • the supply liquid manufacturing apparatus of the present invention includes a mixing unit that mixes a first raw material and a second raw material to generate a mixed liquid, a pump unit that changes a flow rate of the first raw material supplied to the mixing unit, From the gas-liquid separation tank unit, the gas-liquid separation tank unit that gas-liquid separates the mixed liquid generated by the mixing unit into a supply liquid supplied to a use point and an exhaust gas discharged from an exhaust port; A first flow rate measurement unit for measuring a flow rate of the supply liquid supplied to the use point; a pressure measurement unit for measuring a pressure of the supply liquid supplied from the gas-liquid separation tank unit to the use point; and the exhaust gas An exhaust valve for adjusting an exhaust amount of the exhaust gas discharged from the mouth; and the supply liquid measured by the first flow rate measurement unit so as to maintain a constant flow rate of the supply liquid supplied to the use point A constant flow control unit for controlling the exhaust valve according to the flow rate of the exhaust gas to adjust the discharge amount of the exhaust gas discharged from the exhaust port, and a constant pressure of the supply liquid
  • the constant pressure control unit is configured such that the pressure of the supply liquid measured by the pressure measurement unit is the constant pressure.
  • the pressure of the supply liquid measured by the pressure measuring unit decreases with respect to the constant pressure, the amount of exhaust gas discharged from the exhaust port is increased when the pressure increases. The amount of the exhaust gas discharged from the exhaust gas is reduced.
  • the flow rate of the supply liquid supplied to the use point increases with respect to the target constant flow rate, that is, the flow rate of the supply liquid measured by the flow rate measurement unit is compared with the target constant flow rate.
  • the flow rate of the supply liquid supplied to the use point is decreased by increasing the discharge amount of the exhaust gas discharged from the exhaust port and lowering the pressure in the gas-liquid separation tank unit.
  • the flow rate of the supply liquid supplied to the use point decreases with respect to the target constant flow rate, that is, when the flow rate of the supply liquid measured by the flow measurement unit decreases with respect to the target constant flow rate
  • the flow rate of the supply liquid supplied to the use point is increased by decreasing the discharge amount of the exhaust gas discharged from the exhaust port and increasing the pressure in the gas-liquid separation tank unit. In this way, the flow rate of the supply liquid supplied to the use point can be kept constant.
  • the constant pressure control when the pressure of the supply liquid supplied to the use point is increased with respect to the target constant pressure, that is, the pressure of the supply liquid measured by the pressure measuring unit with respect to the target constant pressure.
  • the pressure of the supply liquid supplied to a use point is decreased by increasing the discharge amount of the exhaust gas discharged from the exhaust port and lowering the pressure in the gas-liquid separation tank unit.
  • the pressure of the supply liquid supplied to the use point decreases with respect to the target constant pressure, that is, when the pressure of the supply liquid measured by the pressure measuring unit decreases with respect to the target constant pressure.
  • the pressure of the supply liquid supplied to the use point is increased by decreasing the discharge amount of the exhaust gas discharged from the exhaust port and increasing the pressure in the gas-liquid separation tank unit. In this way, the pressure of the supply liquid supplied to the use point can be kept constant.
  • the supply liquid manufacturing method of the present invention includes a step of mixing a first raw material and a second raw material in a mixing unit to generate a mixed liquid, and a supply in which the mixed liquid generated in the mixing unit is supplied to a use point Gas-liquid separation in the gas-liquid separation tank unit into liquid and exhaust gas discharged from the exhaust port, and the flow rate of the supply liquid supplied from the gas-liquid separation tank unit to the point of use
  • the flow rate of the exhaust gas discharged from the exhaust port is adjusted by controlling the exhaust valve according to the flow rate of the supply liquid measured by the flow rate measurement unit.
  • Pressure constant control for adjusting the discharge amount of the exhaust gas to be discharged, and selecting either one of them, and when the constant flow control is selected, the flow rate measurement unit measures the When the flow rate of the supply liquid is increased with respect to the constant flow rate, the discharge amount of the exhaust gas discharged from the exhaust port is increased, and the flow rate of the supply liquid measured by the flow rate measurement unit is increased with respect to the constant flow rate.
  • the pressure of the supply liquid measured by the pressure measurement unit is The exhaust gas discharged from the exhaust port when increased with respect to pressure is increased, and the exhaust gas when the pressure of the supply liquid measured by the pressure measuring unit decreases with respect to the constant pressure. The discharge amount of the exhaust gas discharged from the mouth is reduced.
  • control that keeps the flow rate of the supply liquid supplied to the use point constant (constant flow control) and control that keeps the pressure of the supply liquid supplied to the use point constant (pressure constant control) are selected. can do.
  • the flow rate of the supply liquid supplied to the use point increases with respect to the target constant flow rate, that is, the flow rate of the supply liquid measured by the flow rate measurement unit is compared with the target constant flow rate.
  • the flow rate of the supply liquid supplied to the use point is decreased by increasing the discharge amount of the exhaust gas discharged from the exhaust port and lowering the pressure in the gas-liquid separation tank unit.
  • the flow rate of the supply liquid supplied to the use point decreases with respect to the target constant flow rate, that is, when the flow rate of the supply liquid measured by the flow measurement unit decreases with respect to the target constant flow rate
  • the flow rate of the supply liquid supplied to the use point is increased by decreasing the discharge amount of the exhaust gas discharged from the exhaust port and increasing the pressure in the gas-liquid separation tank unit. In this way, the flow rate of the supply liquid supplied to the use point can be kept constant.
  • the constant pressure control when the pressure of the supply liquid supplied to the use point is increased with respect to the target constant pressure, that is, the pressure of the supply liquid measured by the pressure measuring unit with respect to the target constant pressure.
  • the pressure of the supply liquid supplied to a use point is decreased by increasing the discharge amount of the exhaust gas discharged from the exhaust port and lowering the pressure in the gas-liquid separation tank unit.
  • the pressure of the supply liquid supplied to the use point decreases with respect to the target constant pressure, that is, when the pressure of the supply liquid measured by the pressure measuring unit decreases with respect to the target constant pressure.
  • the pressure of the supply liquid supplied to the use point is increased by decreasing the discharge amount of the exhaust gas discharged from the exhaust port and increasing the pressure in the gas-liquid separation tank unit. In this way, the pressure of the supply liquid supplied to the use point can be kept constant.
  • a supply liquid for example, ozone water
  • ozone water supply liquid
  • constant pressure and constant pressure mean that the average pressure value within a predetermined or arbitrary time interval is constant or substantially constant.
  • Constant flow rate and “constant flow rate” mean that the average flow rate value within a predetermined or arbitrary time interval is constant or substantially constant.
  • Constant concentration and “constant concentration” mean that the value of the average component concentration of a chemical species dissolved in a certain liquid within a predetermined or arbitrary time interval is constant. Or it means that it is substantially constant.
  • FIG. 1 is an explanatory diagram showing the configuration of the supply liquid manufacturing apparatus of the present embodiment.
  • the supply liquid manufacturing apparatus 100 includes a first gas (O 2 gas) and a second gas (CO 2 gas, N 2 gas, or a mixed gas of CO 2 gas and N 2 gas) as raw materials.
  • the second gas (CO 2 gas, N 2 gas, or a mixed gas of CO 2 gas and N 2 gas) is not necessarily essential, and only the first gas (O 2 gas) may be used.
  • the first gas and the second gas are sent to the ozone gas generation unit 106 after the pressure is measured by the pressure sensor 105.
  • the ozone gas generated by the ozone gas generation unit 106 is sent to the ozone water generation unit 107.
  • the supply liquid manufacturing apparatus 100 includes a supply source 108 of water (ultra pure water) that is the first raw material.
  • the supply liquid manufacturing apparatus 100 includes a deaeration processing unit 109 that performs a deaeration process in order to remove surplus gas (oxygen, nitrogen, carbon dioxide, etc.) in the water that is the first raw material.
  • a known method such as evacuation through a deaeration treatment film can be used.
  • the supply liquid manufacturing apparatus 100 is provided with a valve 110 for adjusting the flow rate of water as the first raw material and a flow meter 111 for measuring the flow rate of water as the first raw material.
  • the flow rate of the water which is the first raw material, is measured by the flow meter 111, it is sent to a booster pump (or simply referred to as a pump, hereinafter the same) 112, and the pressure is adjusted (boosted) by the pressure pump 112. Then, it is sent to the ozone water generator 107.
  • the pressure of water sent to the ozone water generation unit 107 is set to 0.1 to 1.0 MPa, for example. And the flow volume of the water sent to the ozone water production
  • the ozone water generator 107 includes a mixer 113 that mixes water (first raw material) and ozone gas (second raw material) to generate ozone water (mixed liquid).
  • the mixer 113 is preferably one that mixes water and gas using the Venturi effect. For example, an aspirator or an ejector is used as such a mixer 113.
  • the generated ozone water is sent to the gas-liquid separation tank 114.
  • the ozone water (mixed liquid) generated in the mixer 113 is gas-liquid separated into ozone water (supply liquid) and exhaust gas (exhaust gas).
  • the gas-liquid separation tank 114 is provided with a water level sensor 115 for measuring the water level of ozone water.
  • the pressure of the ozone water (supply liquid) that has been gas-liquid separated is measured by the pressure sensor 116, the flow rate is measured by the flow meter 117, and then the use point 119 (for example, a multi-chamber type single wafer is provided via the valve 118. Sent to a mold cleaning device).
  • the ozone water (supply liquid) subjected to gas-liquid separation is discharged from the drain 121 after the concentration is measured by the ozone water concentration meter 120.
  • the gas-liquid separated exhaust gas (exhaust gas) is sent from the gas-liquid separation tank 114 to the exhaust gas decomposition catalyst 123 via the valve 122 and decomposed, and then returned to the atmospheric pressure by the pressure relief valve 124. From the outlet 125.
  • the pressure relief valve 124 it is desirable to employ an air-controlled relief valve in that the pressure can be kept constant by preventing sudden pressure fluctuations. If there is no risk of sudden pressure fluctuations, a spring-type relief valve can be employed.
  • the spring type relief valve is less expensive than the air control type relief valve, and is advantageous in reducing the cost.
  • the supply liquid manufacturing apparatus 100 includes a flow rate control unit (that is, a pressure increase control unit) 126 and an exhaust pressure control unit 127.
  • the flow rate control unit (that is, the pressure increase control unit) 126 controls the pressure increase pump 112 according to the flow rate of water measured by the flow meter 111 or the flow rate of ozone water measured by the flow meter 117, and Adjust the pressure of water to be supplied by increasing the pressure. More specifically, for example, the flow value of ozone water measured by the flow meter 117 is received, a control signal for controlling the booster pump 112 is generated according to the received flow value, and this control signal is sent to the booster pump 112.
  • the exhaust pressure control unit 127 is configured to change the pressure relief valve 124 according to the flow rate of water measured by the flow meter 111, the flow rate of ozone water measured by the flow meter 117, and the concentration of ozone water measured by the ozone water concentration meter 120. And the exhaust pressure of the exhaust gas is adjusted so as to keep the water level in the gas-liquid separation tank 114 constant.
  • This supply liquid manufacturing apparatus 100 can adjust the water level of the gas-liquid separation tank 114 to be constant.
  • the water level in the gas-liquid separation tank 114 can be adjusted to be constant by measuring the water level in the gas-liquid separation tank 114 with the water level sensor 115.
  • the water level of the gas-liquid separation tank 114 is adjusted to be constant by controlling the flow rate so that the flow rate of water measured by the flow meter 111 and the flow rate of ozone water measured by the flow meter 117 are the same. Can do.
  • a first gas (O 2 gas) and a second gas (CO 2 gas, N 2 gas, Alternatively, a mixed gas of CO 2 gas and N 2 gas) is supplied from the supply sources 101 and 102.
  • the flow rates of the first gas and the second gas are controlled by the flow rate controllers 103 and 104.
  • water (pure water) as the first raw material is supplied from the supply source 108.
  • the flow rate of water is measured by the flow meter 111.
  • the flow controllers 103 and 104 control the flow rates of the first gas and the second gas according to the flow rate of water measured by the flow meter 111. That is, in order to generate ozone water having a predetermined concentration, a relationship between the flow rate of water and the flow rates of the first gas and the second gas is obtained in advance, The flow rates of the first gas and the second gas are controlled.
  • the first gas and the second gas are sent to the ozone gas generation unit 106 after the pressure is measured by the pressure sensor 105.
  • the ozone gas generator 106 generates ozone gas from the first gas (O 2 gas) and the second gas (CO 2 gas, N 2 gas, or a mixed gas of CO 2 gas and N 2 gas) by discharge.
  • the generated ozone gas (second raw material) is sent to the ozone water generation unit 107.
  • the water (first raw material) is sent to the booster pump 112, the pressure is adjusted by the booster pump 112, and then sent to the ozone water generator 107.
  • the booster pump 112 is controlled by the flow rate control unit 126 and adjusts the pressure of water sent to the ozone water generation unit 107 within a pressure range of 0.1 MPa to 1 MPa.
  • a centrifugal pump or the like is used as the booster pump 112 for example.
  • the mixer 113 of the ozone water generation unit 107 water and ozone gas are mixed to generate ozone water, and the generated ozone water is sent to the gas-liquid separation tank 114.
  • the ozone water (mixed liquid) generated in the mixer 113 is gas-liquid separated into ozone water (supply liquid) and exhaust gas (exhaust gas).
  • the pressure of the ozone water (supply liquid) that has been gas-liquid separated is measured by the pressure sensor 116, the flow rate is measured by the flow meter 117, and then the use point 119 (for example, a multi-chamber type single wafer is provided via the valve 118. Mold cleaning device).
  • the flow control unit 126 controls the booster pump 112 according to the flow measured by the flow meter 111 or the flow meter 117.
  • the exhaust gas (exhaust gas) is sent to the exhaust gas decomposition catalyst 123 via the valve 122 and decomposed, and then returned to atmospheric pressure by the pressure relief valve 124 and then discharged from the discharge port 125.
  • the exhaust pressure control unit 127 uses a pressure relief valve according to the flow rate of water measured by the flow meter 111, the flow rate of ozone water measured by the flow meter 117, and the concentration of ozone water measured by the ozone water concentration meter 120.
  • 124 is controlled to adjust the exhaust gas exhaust pressure so that the water level in the gas-liquid separation tank 114 is kept constant.
  • the exhaust pressure control unit controls the pressure relief valve 124 according to the water level in the gas-liquid separation tank 114 measured by the water level sensor 115, and exhaust gas so as to keep the water level in the gas-liquid separation tank 114 constant. Adjust the exhaust pressure.
  • the flow rate of the supply liquid (ozone water) supplied to the use point 119 is measured after gas-liquid separation.
  • the flow rate of the supply liquid (ozone water) can be accurately measured without being affected by bubbles of gas (exhaust gas) generated by mixing water) and the second raw material (ozone gas).
  • the pressure of the first raw material water (suppressed and supplied to the mixing section) is adjusted according to the flow rate of the supply liquid (ozone water) measured in this way, and the exhaust gas exhaust pressure is controlled.
  • the water level in the gas-liquid separation tank 114 is kept constant.
  • the supply liquid (ozone water) can be produced as much as required at the use point 119.
  • the water level in the gas-liquid separation tank 114 can be kept constant, so that the supply liquid (ozone water) can be produced as much as required at the use point 119.
  • the water level in the gas-liquid separation tank 114 is measured by the water level sensor 115.
  • the water level in the gas-liquid separation tank 114 can be kept constant, and the supply liquid (ozone water) can be produced as much as required at the use point 119.
  • the flow rate of water supplied to the mixer 113 is measured by the flow meter 111, and the flow rate of ozone water discharged from the gas-liquid separation tank 114 (supplied to the use point 119) is measured.
  • the amount of liquid in the gas-liquid separation tank 114 can be kept constant.
  • the supply liquid (ozone water) can be produced as much as required at the use point 119.
  • ozone water can be produced by mixing water and ozone gas in the mixer 113.
  • the booster pump 112 since the booster pump 112 is disposed upstream of the mixer 113 (upstream from the mixer 113), only water is passed through the booster pump 112 (no ozone water is passed through the booster pump 112). Therefore, the lifetime of the booster pump 112 is longer than when the booster pump 112 is provided at the subsequent stage of the mixer 113 (when ozone water is passed through the booster pump 112).
  • FIG. 2 is an explanatory diagram showing the configuration of the supply liquid manufacturing apparatus of the present embodiment.
  • the supply liquid manufacturing apparatus 200 includes a supply source 201 for water (ultra pure water) as a first raw material and a supply source 202 for a chemical raw material (for example, ammonia) as a second raw material.
  • the supply liquid manufacturing apparatus 200 is provided with a valve 203 for adjusting the flow rate of water as the first raw material and a flow meter 204 for measuring the flow rate of water as the first raw material.
  • Water, which is the first raw material is sent to the booster pump 205 after the flow rate is measured by the flow meter 204, the pressure is adjusted (pressurized) by the booster pump 205, and then sent to the mixer 206.
  • the chemical raw material that is the second raw material is also sent to the mixer 206.
  • the mixer 206 mixes water and a chemical raw material (ammonia) to generate chemical water (ammonia water).
  • the generated chemical water (ammonia water) is sent to the gas-liquid separation tank 207.
  • the chemical water (mixed liquid) generated by the mixer 206 is gas-liquid separated into chemical water (supply liquid) and exhaust gas (exhaust gas).
  • the gas-liquid separation tank 207 is provided with two water level sensors 208 and 209 for measuring the upper and lower water levels of chemical water.
  • the chemical water (supply liquid) that has been subjected to gas-liquid separation is measured for pressure by the pressure sensor 210, and after the flow rate is measured by the flow meter 211, the use point 213 (for example, multi-chamber type single wafer) is provided via the valve 212. Sent to a mold cleaning device).
  • the gas-liquid separated exhaust gas (exhaust gas) is sent from the gas-liquid separation tank 207 to the pressure relief valve 215 via the valve 214 and returned to the atmospheric pressure by the pressure relief valve 215 before the exhaust port 216. Discharged from.
  • the supply liquid manufacturing apparatus 200 includes a flow rate control unit (that is, a pressure increase control unit) 217 and an exhaust pressure control unit 218.
  • the flow rate control unit (that is, the pressure increase control unit) 217 controls the pressure increase pump 205 according to the flow rate of the chemical water (ammonia water) measured by the flow meter 204 or the flow meter 211 to increase the pressure in the mixer 206. Adjust the pressure of the supplied water. More specifically, the flow value measured by the flow meter 204 or the flow meter 211 is received, a control signal for controlling the booster pump 205 is generated according to the received flow value, and this control signal is transmitted to the booster pump 205.
  • the pressure (or flow rate) of water supplied to the mixer 206 can be adjusted by controlling the number of rotations of the pump by controlling a driving unit (not shown) provided in the booster pump 205. Further, the exhaust pressure control unit 218 controls the pressure relief valve 215 according to the flow rate of water measured by the flow meter 204 and the flow rate of ammonia water measured by the flow meter 211, and the water level in the gas-liquid separation tank 207. The exhaust gas pressure is adjusted so that the air pressure is kept constant.
  • This supply liquid manufacturing apparatus 200 can adjust the water level of the gas-liquid separation tank 207 to be constant.
  • the water level in the gas-liquid separation tank 207 can be adjusted to be constant by measuring the upper and lower water levels in the gas-liquid separation tank 207 with the two water level sensors 208 and 209. Further, the water level of the gas-liquid separation tank 207 is kept constant by controlling the flow rate so that the flow rate of water measured by the flow meter 204 and the flow rate of chemical water (ammonia water) measured by the flow meter 211 are the same. Can be adjusted.
  • chemical water for example, ammonia water
  • a chemical raw material for example, ammonia
  • FIG. 3 is an explanatory diagram showing the configuration of the supply liquid manufacturing apparatus of the present embodiment.
  • the supply liquid manufacturing apparatus 300 includes a first gas (O 2 gas) and a second gas (CO 2 gas, N 2 gas, or a mixed gas of CO 2 gas and N 2 gas) as raw materials.
  • Supply sources 301 and 302 and flow rate controllers 303 and 304 for controlling the flow rates of the respective gases (first gas and second gas).
  • the second gas CO 2 gas, N 2 gas, or a mixed gas of CO 2 gas and N 2 gas
  • the first gas and the second gas are sent to the ozone gas generation unit 306 after the pressure is measured by the pressure sensor 305.
  • the ozone gas generation unit 306 employs a silent discharge method, an electrolysis method, or an ultraviolet lamp method to generate ozone gas.
  • the ozone gas generated by the ozone gas generation unit 306 is sent to the mixing unit 307. Note that, using the pressure value measured by the pressure sensor 305, the flow rate controllers 303 and 304 can monitor whether the flow rates of the first gas and the second gas are within an appropriate range.
  • the supply liquid manufacturing apparatus 300 includes a supply source 308 of water (ultra pure water) that is the first raw material.
  • the supply liquid manufacturing apparatus 100 is provided with a valve 309 for turning on and off the supply of water as the first raw material, and a flow meter 310 for measuring the flow rate of the water as the first raw material.
  • the water that is the first raw material is sent to the pump 311, the flow rate is adjusted by the pump 311, and then sent to the mixing unit 307.
  • a centrifugal pump is used as the pump 311.
  • the pump 311 will be described by taking a centrifugal pump as an example.
  • the flow meter 310 corresponds to the second flow rate measuring unit.
  • the mixing unit 307 mixes water (first raw material) and ozone gas (second raw material) to generate ozone water (mixed liquid).
  • the mixing unit 307 preferably uses a venturi effect to mix water and gas. For example, an aspirator or an ejector is used.
  • the ozone water generated in the mixing unit 307 is sent to the gas-liquid separation tank 312.
  • the ozone water (mixed liquid) generated in the mixing unit 307 is gas-liquid separated into ozone water (supply liquid) and exhaust gas (exhaust gas).
  • the gas-liquid separation tank 312 is provided with a water level sensor 313 for measuring the water level of ozone water.
  • the water level sensor 313 is, for example, a sensor that is installed at a predetermined height in the gas-liquid separation tank 312 and detects whether the level of ozone water is above or below the height of the water level sensor 313. Alternatively, the water level sensor 313 may always measure the water level (liquid amount) of ozone water in the gas-liquid separation tank 312.
  • the ozone water (supply liquid) that has been gas-liquid separated is measured by the ozone water concentration meter 314, the flow rate is measured by the flow meter 315, the pressure is measured by the pressure sensor 316, and then used through the valve 317. It is sent to a point 318 (for example, a multi-chamber type single wafer cleaning device) or a drain 319.
  • valve 317 is switched to the drain 319 side so that ozone water flows to the drain 319 at a minimum flow rate. This is to keep the quality of the ozone water constant. Further, unnecessary ozone water is discharged from the drain 319 at the time of starting up the apparatus or during maintenance.
  • the gas-liquid separated exhaust gas (exhaust gas) is sent from the gas-liquid separation tank 312 to the exhaust gas decomposition catalyst 321 via the valve 320 and decomposed, and then the exhaust port 323 via the opening adjustment valve 322.
  • the flow meter 315 corresponds to the first flow measurement unit of the present invention
  • the pressure sensor 316 corresponds to the pressure measurement unit of the present invention
  • the opening adjustment valve 322 corresponds to the exhaust valve of the present invention.
  • the supply liquid manufacturing apparatus 300 includes an exhaust control unit 324 and a flow rate control unit 325.
  • the exhaust control unit 324 has a function of performing a constant flow rate control for keeping the flow rate of ozone water (supply liquid) supplied to the use point 318 at a constant flow rate.
  • the constant flow rate is also referred to as a target flow rate.
  • the constant flow rate or the target flow rate is not necessarily a fixed value in the supply liquid manufacturing apparatus 300, but is arbitrarily set as a flow rate required at a use point.
  • the gas-liquid separation tank 312 is connected to the opening adjustment valve 322, and the pressure in the upper space of the ozone water level in the gas-liquid separation tank 312 is adjusted by the opening adjustment valve 322.
  • the flow rate of ozone water (supply liquid) supplied to the use point 318 is influenced not only by the rotation speed of the pump 311 but also by the pressure in the upper space in the gas-liquid separation tank.
  • the exhaust control unit 324 controls the opening adjustment valve 322 in accordance with the flow rate of ozone water (supply liquid) measured by the flow meter 315 and exhaust gas discharged from the exhaust port 323. Adjust the amount of exhaust gas. More specifically, the exhaust control unit 324 detects exhaust gas (exhaust gas) discharged from the exhaust port 323 when the flow rate of ozone water (supply liquid) measured by the flow meter 315 increases with respect to the target constant flow rate. When the flow rate of ozone water (supply liquid) measured by the flow meter 315 decreases with respect to the target constant flow rate, the exhaust gas (exhaust gas) discharged from the exhaust port 323 is increased. Reduce emissions.
  • the flow control unit 325 adjusts the flow rate of the first raw material supplied to the mixing unit by controlling the rotation speed of the pump 310 according to the flow rate of ozone water (supply liquid) measured by the flow meter 315. More specifically, control is performed so that the flow rate of the first raw material supplied to the mixing unit measured by the flow meter 310 is the same as the flow rate of ozone water (supply liquid) measured by the flow meter 315. Therefore, in this embodiment, the flow value measured by the flow meter 315 is received, a control signal for controlling the rotation speed of the pump 310 is generated according to the received flow value, and this control signal is transmitted to the pump 310. The flow rate supplied to the mixing unit is adjusted by controlling the rotational speed of the pump 310.
  • the flow rate control unit 315 reduces the flow rate of the first raw material supplied to the mixing unit when the amount of liquid in the gas-liquid separation tank 312 measured by the water level sensor 313 increases beyond a predetermined amount of liquid.
  • the flow rate of the first raw material supplied to the mixing unit may be increased. More specifically, when the water level of the ozone water in the gas-liquid separation tank 312 is higher than a certain level by using a water level sensor 313 that detects whether or not the water level is higher than a certain level, The flow rate of the first raw material supplied to the mixing unit is reduced.
  • the flow volume of the 1st raw material supplied to a mixing part will be raised.
  • the water level (liquid amount) of ozone water in the gas-liquid separation tank 312 can be kept constant.
  • two water level sensors may be installed at different heights and controlled so that the water level of ozone water falls within a certain range. If the water level of ozone water can be kept constant, the flow rate of ozone water (supply liquid) supplied to the use point 318 is basically the same as the flow rate of the first raw material supplied to the mixing section. Means.
  • the flow meter 310 is not necessarily required to keep the ozone water level constant. However, in order to maintain the ozone gas concentration constant, it is necessary to control the flow rate of the raw material gas by measuring the flow rate of water. If the flow rate of the first raw material supplied to the mixing unit is controlled using a water level sensor 313 that detects the water level of the ozone water so that the water level of the ozone water is constant, the flow meter 315 is not provided. Only the flow meter 310 may be provided.
  • the exhaust control unit 324 discharges exhaust gas (exhaust gas) discharged from the exhaust port 323 when the liquid amount in the gas-liquid separation tank 312 measured by the water level sensor 313 increases with respect to a predetermined liquid amount.
  • the amount of liquid in the gas-liquid separation tank 312 may be decreased by decreasing the amount and increasing the pressure in the gas-liquid separation tank 312.
  • the amount of exhaust gas (exhaust gas) discharged from the exhaust port 323 is increased,
  • the amount of liquid in the gas-liquid separation tank 312 may be increased by lowering the pressure in the gas-liquid separation tank 312. Even in this case, the amount of liquid in the gas-liquid separation tank 312 can be kept constant.
  • the supply liquid manufacturing apparatus 300 of the third embodiment as described above, a constant flow rate control is possible. Therefore, when the flow rate of ozone water (supply liquid) supplied to the use point 318 is increased with respect to the target constant flow rate, that is, the flow rate of ozone water (supply liquid) measured by the flow meter 315 is the target. Is increased to a certain flow rate, the exhaust gas (exhaust gas) discharged from the exhaust port 323 is increased, and the pressure in the gas-liquid separation tank 312 is lowered to supply to the use point 318. Reduce the flow rate of ozone water (supply liquid).
  • the flow rate of the ozone water (supply liquid) supplied to the use point 318 decreases with respect to the target constant flow rate, that is, the flow rate of the ozone water (supply liquid) measured by the flow meter 315 is the target.
  • the exhaust gas (exhaust gas) discharged from the exhaust port 323 is reduced and the pressure in the gas-liquid separation tank 312 is increased to supply to the use point 318.
  • the flow rate of ozone water (supply liquid) supplied to the use point 318 can be kept constant.
  • the pressure in the gas-liquid separation tank the flow rate of ozone water supplied to the use point can be controlled with good responsiveness.
  • Constant pressure control As another embodiment, by using the configuration of the supply liquid manufacturing apparatus shown in FIG. 3, it is possible to perform constant pressure control that maintains the pressure of ozone water (supply liquid) supplied to the use point 318 at a constant pressure.
  • the constant pressure is also referred to as a target pressure.
  • the constant pressure or the target pressure is not necessarily a fixed value in the supply liquid manufacturing apparatus 300, but is arbitrarily set as the pressure of the supply liquid to be supplied by the supply liquid manufacturing apparatus 300.
  • the exhaust control unit 324 controls the opening adjustment valve 322 according to the pressure of ozone water (supply liquid) measured by the pressure sensor 316 and exhaust gas discharged from the exhaust port 323. Adjust the amount of exhaust gas. More specifically, when the pressure of the ozone water (supply liquid) supplied to the use point 318 increases with respect to the target constant pressure, that is, the ozone water (supply liquid) measured by the pressure sensor 316. When the pressure increases with respect to the target constant pressure, the amount of exhaust gas (exhaust gas) exhausted from the exhaust port 323 is increased, and the pressure in the gas-liquid separation tank 312 is lowered, so that the use The pressure of ozone water (supply liquid) supplied to the point 318 is decreased.
  • the pressure of the ozone water (supply liquid) supplied to the use point 318 decreases with respect to the target constant pressure, that is, the pressure of the ozone water (supply liquid) measured by the pressure sensor 316 is the target.
  • the pressure decreases with respect to a certain pressure, the amount of exhaust gas (exhaust gas) discharged from the exhaust port 323 is reduced, and the pressure in the gas-liquid separation tank 312 is increased to supply to the use point 318.
  • the pressure measured by the pressure sensor 316 and kept constant is set to 0.1 to 1.0 MPa, for example.
  • the flow rate of the first raw material supplied to the mixing unit is controlled to be the same as the flow rate of ozone water sent to the use point.
  • the specific means is the same as the means described in the constant flow rate control.
  • exhaust gas discharged from the exhaust port 323.
  • the amount of liquid in the gas-liquid separation tank 312 may be kept constant by adjusting the discharge amount of the gas.
  • FIG. 4 is a graph obtained by measuring the ozone water concentration and the ozone water supply pressure when the pressure is controlled to be constant while changing the flow rate of the ozone water supplied to the use point. As described above, according to the present embodiment, even when the flow rate required at the use point fluctuates, it is possible to supply the ozone water while keeping the pressure of the ozone water constant and maintaining the concentration of the ozone water constant. .
  • FIG. 5 shows a modified example of the supply liquid manufacturing apparatus 300 according to the third embodiment.
  • the exhaust control unit 324 of the present embodiment includes a constant flow control unit 3240 that performs constant flow control, a constant pressure control unit 3241 that performs constant pressure control, and a control selection unit 3242 that switches between constant flow control and constant pressure control. It has.
  • the constant flow rate control unit 3240 adjusts the opening according to the flow rate of ozone water (supply liquid) measured by the flow meter 315 so as to keep the flow rate of ozone water (supply liquid) supplied to the use point 318 constant.
  • the amount of exhaust gas (exhaust gas) discharged from the exhaust port 323 is adjusted by controlling the valve 322.
  • the constant pressure control unit 3241 adjusts the opening degree according to the pressure of the ozone water (supply liquid) measured by the pressure sensor 316 so as to keep the pressure of the ozone water (supply liquid) supplied to the use point 318 constant.
  • the amount of exhaust gas (exhaust gas) discharged from the exhaust port 323 is adjusted by controlling the valve 322.
  • the control selection unit 3242 includes either a constant flow control that adjusts the exhaust amount of exhaust gas (exhaust gas) by the constant flow rate control unit 3240, or a constant pressure control that adjusts the exhaust amount of exhaust gas (exhaust gas) by the constant pressure control unit 3241. Select either one. For example, switching between constant flow control and constant pressure control can be performed by operating a touch panel (not shown) provided in the supply liquid manufacturing apparatus 300. Further, switching between constant flow control and constant pressure control may be performed based on a request signal from the use point 318.
  • the constant flow control unit 3240 When the constant flow control is selected by the control selection unit 3242, the constant flow control unit 3240 performs the constant flow control. More specifically, the constant flow rate control unit 3240 controls the exhaust gas (exhaust gas) discharged from the exhaust port 323 when the flow rate of ozone water (supply liquid) measured by the flow meter 315 increases with respect to the target constant flow rate. Exhaust gas (exhaust gas) discharged from the exhaust port 323 when the flow rate of ozone water (supply liquid) measured by the flow meter 315 decreases with respect to the target constant flow rate. Reduce the amount.
  • the constant pressure control unit 3241 When the constant pressure control is selected by the control selection unit 3242, the constant pressure control unit 3241 performs the constant pressure control. More specifically, the constant pressure control unit 3241 is configured to detect the exhaust gas (exhaust gas) discharged from the exhaust port 323 when the pressure of the ozone water (supply liquid) measured by the pressure sensor 316 increases with respect to the target constant pressure. Exhaust gas (exhaust gas) discharged from the exhaust port 323 when the pressure of the ozone water (supply liquid) measured by the pressure sensor 316 decreases with respect to the target constant pressure. Reduce the amount.
  • control for keeping the flow rate of ozone water (supply liquid) supplied to the use point 318 constant (flow rate control), and ozone supplied to the use point 318.
  • Control pressure constant control
  • Control that keeps the pressure of water (supply liquid) constant can be selected.
  • the pressure of the ozone water (supply liquid) supplied to the use point 318 increases with respect to the target constant pressure, that is, the pressure of the ozone water (supply liquid) measured by the pressure sensor 316.
  • the target constant pressure that is, the pressure of the ozone water (supply liquid) measured by the pressure sensor 316.
  • the amount of exhaust gas (exhaust gas) discharged from the exhaust port 323 is increased, and the pressure in the gas-liquid separation tank 312 is lowered, thereby reducing the use point.
  • the pressure of ozone water (supply liquid) supplied to 318 is decreased.
  • the pressure of the ozone water (supply liquid) supplied to the use point 318 decreases with respect to the target constant pressure, that is, the pressure of the ozone water (supply liquid) measured by the pressure sensor 316 is the target.
  • the pressure decreases with respect to a certain pressure, the amount of exhaust gas (exhaust gas) discharged from the exhaust port 323 is reduced, and the pressure in the gas-liquid separation tank 312 is increased to supply to the use point 318.
  • Increase the pressure of ozone water (supply liquid) supplied to the use point 318 can be kept constant.
  • ozone gas or a chemical raw material (such as ammonia) and water are mixed is exemplified, but other chemicals (for example, H 2 CO 3 (carbonic acid), HF (hydrofluoric acid), DHF ( Dilute hydrofluoric acid), BHF (buffered hydrofluoric acid, ie, a mixture of NH 4 F and HF), HCl (hydrochloric acid, dilute hydrochloric acid), H 2 SO 4 (sulfuric acid, dilute sulfuric acid), HNO 3 (sulfuric acid, dilute sulfuric acid), It is also possible to mix aqua regia or an acid mixed with these and water.
  • H 2 CO 3 carbonic acid
  • HF hydrofluoric acid
  • DHF Dilute hydrofluoric acid
  • BHF biuffered hydrofluoric acid, ie, a mixture of NH 4 F and HF
  • HCl hydroochloric acid, dilute hydrochloric acid
  • H 2 SO 4 sulfuric acid, dilute sulfuric acid
  • the supply liquid manufacturing apparatus has an effect that the supply liquid can be manufactured as much as required at the use point, and is used for cleaning electronic components such as semiconductor devices and liquid crystals. Used and useful.

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Abstract

La présente invention concerne un appareil de production de liquide d'alimentation qui peut produire un liquide d'alimentation en une quantité nécessaire à un point d'utilisation. Un appareil de production de liquide d'alimentation selon la présente invention comprend : un mélangeur 113 qui mélange de l'eau et du gaz d'ozone pour produire de l'eau ozonée ; une pompe de surpression 112 qui augmente la pression de l'eau devant être alimentée dans le mélangeur 113 ; une cuve de séparation gaz-liquide 114 qui sépare l'eau ozonée produite par le mélangeur 113 en eau ozonée devant être alimentée à un point d'utilisation 119 et un gaz d'échappement devant être évacué depuis un orifice d'échappement 125 ; un débitmètre 117 qui mesure le débit de l'eau ozonée devant être alimentée depuis la cuve de séparation gaz-liquide 114 au point d'utilisation 119 ; une unité de régulation de débit 126 qui ajuste la pression (débit) de l'eau dont la pression doit être augmentée et qui doit être alimentée dans le mélangeur 113 par commande de la pompe de surpression 112 en fonction du débit de l'eau ozonée mesuré par le débitmètre 117 ; et une unité de régulation de pression d'échappement 123 qui régule la pression d'échappement du gaz d'échappement de manière à maintenir le niveau d'eau constant dans la cuve de séparation gaz-liquide 114.
PCT/JP2017/000983 2016-01-15 2017-01-13 Appareil de production de liquide d'alimentation et procédé de production de liquide d'alimentation WO2017122771A1 (fr)

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US10654017B2 (en) 2016-01-15 2020-05-19 Ebara Corporation Supply-liquid producing apparatus and supply-liquid producing method
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