WO2017122771A1 - Supply-liquid producing apparatus and supply-liquid producing method - Google Patents

Abstract

Provided is a supply-liquid producing apparatus that can produce a supply liquid in an amount needed at a point of use. A supply-liquid producing apparatus according to the present invention includes: a mixer 113 that mixes water and ozone gas to produce ozone water; a booster pump 112 that increases the pressure of the water to be supplied to the mixer 113; a gas-liquid separation tank 114 that separates the ozone water produced by the mixer 113 into ozone water to be supplied to a point of use 119 and exhaust gas to be discharged from an exhaust port 125; a flowmeter 117 that measures the flow rate of the ozone water to be supplied from the gas-liquid separation tank 114 to the point of use 119; a flow-rate control unit 126 that adjusts the pressure (flow rate) of water to be increased in pressure and supplied to the mixer 113 by controlling the booster pump 112 according to the flow rate of the ozone water measured by the flowmeter 117; and an exhaust pressure control unit 123 that controls the exhaust pressure of the exhaust gas so as to maintain the water level constant in the gas-liquid separation tank 114.

Description

Supply liquid manufacturing apparatus and supply liquid manufacturing method

The present invention relates to a supply liquid production apparatus for producing a supply liquid by mixing a first raw material and a second raw material.

In recent years, the cleaning of products in semiconductor device factories and liquid crystal and other electronic component manufacturing factories has become increasingly sophisticated as the manufacturing process becomes more complex and circuit patterns become finer. For example, using high-purity gas or special liquid (cleaning liquid) in which high-purity gas and chemicals are dissolved in functional water (such as ultrapure water), fine particles, metals, organic substances, etc. adhering to the silicon wafer are removed. ing.

As a cleaning method, in addition to the “batch processing method” that repeats the operation of simultaneously immersing and cleaning a plurality of silicon wafers, chemical cleaning and ultrapure water are performed for each wafer corresponding to products of various types and small quantities. A “single-wafer processing method” for cleaning is adopted. The single wafer processing method has a longer cleaning process time (takt time) per wafer than the batch processing method, and the amount of cleaning liquid used is increased. Therefore, it is required to shorten the tact time and reduce the amount of cleaning liquid used. It has been. At present, in order to reduce effective cleaning and usage of cleaning liquid in a short time, an advanced cleaning process is performed in which a plurality of functional waters and chemicals are used alone or simultaneously to switch the cleaning process in a short time. Yes.

As functional water, for example, ozone water in which ozone gas is dissolved in ultrapure water is used. Since ozone dissolved in ultrapure water has a very strong oxidizing power even at a low concentration (several ppm), it is possible to remove organic substances and metals. This ozone water is generally produced by an ozone water production apparatus. With the sophistication and complexity of the cleaning process, it is required to supply and stop ozone water to the cleaning device in a short time. However, once the production of ozone water is stopped, the conventional device once again requires the required ozone. It takes a certain time (rise time) before the ozone water having the concentration and the required flow rate can be supplied. Therefore, in order to meet the demand for supplying ozone water to the cleaning device, ozone water is always manufactured by the ozone water manufacturing device and continuously supplied to the cleaning device. As a result, an excessive amount of ozone water is supplied to the cleaning device, and unused ozone water that is not used for cleaning the silicon wafer is discharged from the cleaning device as waste water.

Therefore, conventionally, a circulation type ozone water supply device that can supply ozone water with a constant concentration and a constant pressure regardless of the amount of ozone water used at the point of use and that can reuse unused ozone water has been proposed. (See Patent Document 1).

In the conventional circulation type ozone water supply apparatus, as shown in FIG. 6, water and ozone gas are supplied to the ozone dissolution tank 12 to generate ozone water, and ozone water is supplied from the ozone dissolution tank 12 to the circulation tank 21. The ozone water supplied from the circulation tank 21 to the use point via the ozone water supply pipe 22 is returned to the circulation tank 21 via the ozone water return pipe 23, and again from the circulation tank 21. Supply ozone water to the point of use. And the tank internal pressure of the ozone dissolution tank 12, the tank internal pressure of the circulation tank 21, and the internal pressure of the ozone water return pipe 23 are kept constant, and the tank internal pressure of the circulation tank 21 is maintained in the tank of the ozone dissolution tank 12. The pressure and the pressure in the ozone water return pipe 23 are controlled to be lower than each pressure.

JP 2014-117628 A

However, since the conventional ozone water supply device is a circulation type that circulates ozone water (unused ozone water) to be reused, the temperature rise or contamination of ozone water due to the circulation of ozone water (unused ozone water) It was necessary to take measures against the outbreak. Therefore, it has been desired to develop a technique for producing ozone water in an amount necessary for a use point.

The present invention has been made in view of the above-mentioned problems, and it is not necessary to take measures against the temperature rise or the occurrence of contamination of a supply liquid (for example, ozone water) by circulation, or at least reduce the necessity thereof, and the use point One object of the present invention is to provide a supply liquid production apparatus capable of producing a supply liquid as much as necessary. More specifically, an object is to provide a supply liquid production apparatus that can supply a supply liquid with a constant flow rate or a constant pressure and a constant concentration to a use point.

The supply liquid manufacturing apparatus of the present invention includes a mixing unit that mixes a first raw material and a second raw material to generate a mixed liquid, a pump unit that changes a flow rate of the first raw material supplied to the mixing unit, A gas-liquid separation tank unit that gas-liquid separates the mixed liquid generated by the mixing unit into a supply liquid supplied to a use point and an exhaust gas discharged from an exhaust port, and a discharge amount of the exhaust gas is determined. A valve for adjusting the opening degree, a flow rate measurement unit for measuring the flow rate of the supply liquid supplied from the gas-liquid separation tank unit to the use point, and a flow rate value of the supply liquid measured by the flow rate measurement unit The first raw material supplied to the mixing unit by generating a control signal for controlling the pump unit according to the received flow rate value and transmitting the control signal to the pump unit to control the pump Adjust the flow rate of Provided that the flow rate control unit.

According to this configuration, since the flow rate of the liquid (supply liquid) supplied to the use point is measured after gas-liquid separation, the gas (exhaust gas) generated by mixing the first raw material and the second raw material The flow rate of the supplied liquid can be accurately measured without being substantially affected by the bubbles. Then, the flow rate value of the supply liquid measured by the flow rate measurement unit is received, a control signal for controlling the pump unit is generated according to the received flow rate value, and the control signal is transmitted to the pump unit to control the pump As a result, the flow rate of the first raw material is adjusted according to the flow rate of the supply liquid measured in this way, so that the supply liquid (for example, ozone water) can be produced as much as required at the use point. it can.

In addition, the supply liquid manufacturing apparatus of the present invention includes a second flow rate measurement unit that measures the flow rate of the first raw material supplied to the mixing unit, and the first flow rate measured by the second flow rate measurement unit. The flow rate control unit may perform feedback control so that the flow rate of the raw material matches the flow rate of the supply liquid measured by the flow rate measurement unit.

According to this configuration, the flow rate of the first raw material is monitored, and the feedback control of the pump can be performed to correct the flow rate when it deviates from the desired flow rate.

In addition, the supply liquid manufacturing apparatus of the present invention includes a flow rate controller that determines the flow rate of the second raw material, and the flow rate controller uses the flow rate controller according to the flow rate of the first raw material measured by the second flow rate measurement unit. You may adjust the production amount of a 2nd raw material.

According to this configuration, the relationship between the flow rates of the first raw material and the second raw material is obtained in advance so that a supply liquid with a target concentration can be obtained, and the second raw material is allowed to flow according to the flow rate of the first raw material. it can.

The supply liquid manufacturing apparatus of the present invention includes a mixing unit that mixes a first raw material and a second raw material to generate a mixed liquid, a booster pump unit that pressurizes the first raw material supplied to the mixing unit, and the mixing The liquid mixture generated by the gas-liquid separation tank unit for gas-liquid separation into the supply liquid supplied to the use point and the exhaust gas discharged from the exhaust port, and the gas-liquid separation tank unit from the use liquid A flow rate measuring unit that measures the flow rate of the supply liquid supplied to the point, and the boost pump unit is controlled according to the flow rate of the supply liquid measured by the flow rate measurement unit to boost the pressure to the mixing unit A pressure increase control unit that adjusts the pressure of the first raw material to be supplied; and an exhaust pressure control unit that controls the exhaust pressure of the exhaust gas so as to keep the amount of liquid in the gas-liquid separation tank unit constant. Yes.

According to this configuration, since the flow rate of the liquid (supply liquid) supplied to the use point is measured after gas-liquid separation, the gas (exhaust gas) generated by mixing the first raw material and the second raw material The flow rate of the supplied liquid can be accurately measured without being substantially affected by the bubbles. The pressure of the first raw material (suppressed and supplied to the mixing unit) is adjusted according to the flow rate of the supply liquid thus measured, and the exhaust pressure of the exhaust gas is controlled to control the gas-liquid separation tank. The amount of liquid in the section is kept constant. Thereby, supply liquid (for example, ozone water etc.) can be manufactured as much as required at the use point.

The supply liquid manufacturing apparatus of the present invention may further include a liquid amount adjusting unit for adjusting the liquid amount in the gas-liquid separation tank unit to be constant.

According to this configuration, the amount of liquid in the gas-liquid separation tank can be kept constant, and a supply liquid (for example, ozone water) can be produced as much as required at the use point.

In the supply liquid manufacturing apparatus of the present invention, the liquid amount adjusting unit may include a liquid amount measuring unit that measures the amount of liquid in the gas-liquid separation tank unit.

According to this configuration, the amount of liquid in the gas-liquid separation tank unit can be measured by the liquid amount measurement unit, so that the amount of liquid in the gas-liquid separation tank unit can be kept constant. Only a supply liquid (such as ozone water) can be produced.

In the supply liquid manufacturing apparatus of the present invention, the liquid amount adjustment unit may include the flow rate measurement unit and a second flow rate measurement unit that measures the flow rate of the liquid supplied to the mixing unit.

According to this configuration, the flow rate of the liquid supplied to the mixing unit is measured, and the flow rate of the liquid discharged from the gas-liquid separation tank unit (supplied to the use point) is measured and supplied to the mixing unit. By making the flow rate of the liquid to be the same as the flow rate of the liquid discharged from the gas-liquid separation tank, it becomes possible to keep the amount of liquid in the gas-liquid separation tank part constant and only as much as needed at the point of use. A supply liquid (such as ozone water) can be produced.

In the supply liquid manufacturing apparatus of the present invention, the first raw material may be water, and the second raw material may be ozone gas or a chemical raw material.

According to this configuration, ozone water can be produced by mixing water and ozone gas in the mixing section. Alternatively, chemical water (for example, ammonia water) can be produced by mixing water and a chemical raw material (for example, ammonia) in the mixing section. In this case, since the booster pump unit is disposed upstream of the mixing unit (upstream side of the mixing unit), only water is passed through the booster pump unit. Therefore, the lifetime of the booster pump unit is longer than when the booster pump unit is provided at the subsequent stage of the mixing unit.

The supply liquid manufacturing method of the present invention includes a step of boosting a first raw material by a boosting pump unit and supplying the first raw material to a mixing unit, and a step of mixing the first raw material and the second raw material in the mixing unit to generate a mixed liquid Gas-liquid separation of the mixed liquid generated by the mixing unit into a supply liquid supplied to a use point and an exhaust gas discharged from an exhaust port in a gas-liquid separation tank unit; Measuring the flow rate of the supply liquid supplied from the separation tank unit to the use point, and controlling the boost pump unit according to the measured flow rate of the supply liquid to boost the pressure to the mixing unit Adjusting the pressure of the first raw material, and controlling the exhaust pressure of the exhaust gas so as to keep the amount of liquid in the gas-liquid separation tank unit constant.

Also in this manufacturing method, since the flow rate of the liquid (supply liquid) supplied to the use point is measured after gas-liquid separation, a gas (exhaust gas) generated by mixing the first raw material and the second raw material The flow rate of the supplied liquid can be accurately measured without being affected by the bubbles. Then, the pressure (or flow rate) of the first raw material (suppressed and supplied to the mixing unit) is adjusted according to the flow rate of the supply liquid thus measured, and the exhaust pressure of the exhaust gas is controlled. The amount of liquid (or pressure) in the gas-liquid separation tank is kept constant. Thereby, supply liquid (for example, ozone water etc.) can be manufactured as much as required at the use point.

The supply liquid manufacturing apparatus of the present invention includes a mixing unit that mixes a first raw material and a second raw material to generate a mixed liquid, a pump unit that changes a flow rate of the first raw material supplied to the mixing unit, From the gas-liquid separation tank unit, the gas-liquid separation tank unit that gas-liquid separates the mixed liquid generated by the mixing unit into a supply liquid supplied to a use point and an exhaust gas discharged from an exhaust port; A first flow rate measuring unit for measuring a flow rate of the supply liquid supplied to the use point; an exhaust valve for adjusting a discharge amount of the exhaust gas discharged from the exhaust port; and the supply supplied to the use point. According to the flow rate of the supply liquid measured by the flow rate measuring unit, the exhaust valve is controlled to adjust the discharge amount of the exhaust gas discharged from the exhaust port so as to keep the liquid flow rate constant. exhaust And the exhaust controller controls the amount of the exhaust gas discharged from the exhaust port when the flow rate of the supply liquid measured by the first flow rate measuring unit increases with respect to the constant flow rate. The discharge amount is increased, and when the flow rate of the supply liquid measured by the first flow rate measurement unit decreases with respect to the constant flow rate, the discharge amount of the exhaust gas discharged from the exhaust port is decreased.

According to this configuration, when the flow rate of the supply liquid supplied to the use point increases with respect to the target constant flow rate, that is, the constant flow rate where the flow rate of the supply liquid measured by the first flow rate measurement unit is the target. In this case, the flow rate of the supply liquid supplied to the use point is decreased by increasing the discharge amount of the exhaust gas discharged from the exhaust port and lowering the pressure in the gas-liquid separation tank unit. On the other hand, when the flow rate of the supply liquid supplied to the use point decreases with respect to the target constant flow rate, that is, the flow rate of the supply liquid measured by the first flow rate measurement unit decreases with respect to the target constant flow rate. In this case, the flow rate of the supply liquid supplied to the use point is increased by decreasing the discharge amount of the exhaust gas discharged from the exhaust port and increasing the pressure in the gas-liquid separation tank unit. In this way, the flow rate of the supply liquid supplied to the use point can be kept constant.

The supply liquid manufacturing apparatus of the present invention adjusts the flow rate of the first raw material to be supplied to the mixing unit by controlling the pump unit according to the flow rate of the supply liquid measured by the first flow rate measurement unit. A flow rate control unit that controls the flow rate of the supply liquid measured by the first flow rate measurement unit to be the same as the flow rate of the first raw material supplied to the mixing unit. Good.

According to this configuration, the flow rate of the first raw material supplied to the mixing unit is adjusted so that the flow rate of the supply liquid measured by the first flow rate measuring unit and the flow rate of the first raw material supplied to the mixing unit are the same. The amount of liquid in the gas-liquid separation tank can be kept constant.

Moreover, the supply liquid manufacturing apparatus of the present invention may include a second flow rate measurement unit that measures the flow rate of the first raw material supplied to the mixing unit.

According to this configuration, the flow rate of the first raw material supplied to the mixing unit is adjusted so that the flow rate measured by the second flow rate measurement unit is the same as the flow rate measured by the first flow rate measurement unit. be able to.

The supply liquid manufacturing apparatus of the present invention further includes a liquid amount measuring unit that detects the amount of liquid in the gas-liquid separation tank unit, and the boost control unit is configured to measure the gas-liquid separation tank measured by the liquid amount measuring unit. When the amount of liquid in the unit increases with respect to a predetermined amount of liquid, the flow rate of the first raw material supplied to the mixing unit is decreased, and the amount of liquid in the gas-liquid separation tank unit measured by the liquid amount measuring unit May be increased with respect to a predetermined amount of liquid, the flow rate of the first raw material supplied to the mixing unit may be increased.

According to this configuration, the liquid amount in the gas-liquid separation tank unit can be kept constant by detecting the liquid amount in the gas-liquid separation tank unit without measuring the flow rate of the first raw material supplied to the mixing unit. The flow rate of the first raw material supplied to the mixing unit can be adjusted so as to maintain.

The supply liquid manufacturing method of the present invention includes a step of mixing a first raw material and a second raw material in a mixing unit to generate a mixed liquid, and a supply in which the mixed liquid generated in the mixing unit is supplied to a use point Gas-liquid separation in a gas-liquid separation tank unit into liquid and exhaust gas discharged from an exhaust port; and first flow rate measurement of the supply liquid supplied from the gas-liquid separation tank unit to the use point And a discharge from the exhaust port according to the flow rate of the supply liquid measured by the first flow rate measurement unit so that the flow rate of the supply liquid supplied to the use point is kept constant. Adjusting the discharge amount of the exhaust gas with an exhaust valve, and adjusting the discharge amount of the exhaust gas, wherein the flow rate of the supply liquid measured by the first flow rate measurement unit is When the flow rate of the supply liquid measured by the flow rate measurement unit decreases with respect to the constant flow rate, the discharge amount of the exhaust gas discharged from the exhaust port is increased when the flow rate increases with respect to the constant flow rate. Decreases the amount of exhaust gas discharged from the exhaust port.

Even in this manufacturing method, when the flow rate of the supply liquid supplied to the use point increases with respect to the target constant flow rate, that is, the flow rate of the supply liquid measured by the flow rate measuring unit is compared with the target constant flow rate. In this case, the flow rate of the supply liquid supplied to the use point is decreased by increasing the discharge amount of the exhaust gas discharged from the exhaust port and lowering the pressure in the gas-liquid separation tank unit. On the other hand, when the flow rate of the supply liquid supplied to the use point decreases with respect to the target constant flow rate, that is, when the flow rate of the supply liquid measured by the flow measurement unit decreases with respect to the target constant flow rate First, the flow rate of the supply liquid supplied to the use point is increased by decreasing the discharge amount of the exhaust gas discharged from the exhaust port and increasing the pressure in the gas-liquid separation tank unit. In this way, the flow rate of the supply liquid supplied to the use point can be kept constant.

The supply liquid manufacturing apparatus of the present invention includes a mixing unit that mixes a first raw material and a second raw material to generate a mixed liquid, a pump unit that changes a flow rate of the first raw material supplied to the mixing unit, From the gas-liquid separation tank unit, the gas-liquid separation tank unit that gas-liquid separates the mixed liquid generated by the mixing unit into a supply liquid supplied to a use point and an exhaust gas discharged from an exhaust port; A pressure measuring unit for measuring a pressure of the supply liquid supplied to the use point; an exhaust valve for adjusting a discharge amount of the exhaust gas discharged from the exhaust port; and a supply liquid supplied to the use point. Exhaust control that controls the exhaust valve and adjusts the exhaust gas discharged from the exhaust port according to the pressure of the supply liquid measured by the pressure measuring unit so as to keep the pressure constant. And the exhaust control unit increases the discharge amount of the exhaust gas discharged from the exhaust port when the pressure of the supply liquid measured by the pressure measurement unit increases with respect to the constant pressure. When the pressure of the supply liquid measured by the pressure measuring unit decreases with respect to the constant pressure, the discharge amount of the exhaust gas discharged from the exhaust port is decreased.

According to this configuration, when the pressure of the supply liquid supplied to the use point increases, that is, when the pressure of the supply liquid measured by the pressure measuring unit increases, the amount of the exhaust gas discharged from the exhaust port is increased. By increasing the discharge amount and lowering the pressure in the gas-liquid separation tank, the pressure of the supply liquid supplied to the use point is decreased. On the other hand, when the pressure of the supply liquid supplied to the use point decreases, that is, when the pressure of the supply liquid measured by the pressure measuring unit decreases, the discharge amount of the exhaust gas discharged from the exhaust port is decreased. By increasing the pressure in the gas-liquid separation tank, the pressure of the supply liquid supplied to the use point is increased. In this way, the pressure of the supply liquid supplied to the use point can be kept constant.

The supply liquid manufacturing apparatus of the present invention is a first flow rate measurement unit that measures a flow rate of the supply liquid supplied from the gas-liquid separation tank unit to the use point, and the first flow rate measurement unit that measures the flow rate. A flow rate control unit that controls the pump unit and adjusts the flow rate of the first raw material supplied to the mixing unit according to the flow rate of the supply liquid, and the flow rate control unit includes the first flow rate measurement unit. The flow rate of the supply liquid measured in step 1 may be controlled to be the same as the flow rate of the first raw material supplied to the mixing unit.

According to this configuration, the flow rate of the first raw material supplied to the mixing unit is adjusted so that the flow rate of the supply liquid measured by the first flow rate measuring unit and the flow rate of the first raw material supplied to the mixing unit are the same. The amount of liquid in the gas-liquid separation tank can be kept constant.

Moreover, the supply liquid manufacturing apparatus of the present invention may include a second flow rate measurement unit that measures the flow rate of the first raw material supplied to the mixing unit.

According to this configuration, the flow rate of the first raw material supplied to the mixing unit is adjusted so that the flow rate measured by the second flow rate measurement unit is the same as the flow rate measured by the first flow rate measurement unit. be able to.

In addition, the supply liquid manufacturing apparatus of the present invention has a liquid amount measurement unit that detects the amount of liquid in the gas-liquid separation tank unit, and the flow rate control unit is the gas-liquid separation tank measured by the liquid amount measurement unit When the amount of liquid in the unit increases with respect to a predetermined amount of liquid, the flow rate of the first raw material supplied to the mixing unit is decreased, and the amount of liquid in the gas-liquid separation tank unit measured by the liquid amount measuring unit May decrease the flow rate of the first raw material supplied to the mixing unit when the amount of liquid decreases with respect to a predetermined amount of liquid.

According to this configuration, the liquid amount in the gas-liquid separation tank unit can be kept constant by detecting the liquid amount in the gas-liquid separation tank unit without measuring the flow rate of the first raw material supplied to the mixing unit. The flow rate of the first raw material supplied to the mixing unit can be adjusted so as to maintain.

The supply liquid manufacturing method of the present invention includes a step of mixing a first raw material and a second raw material to generate a mixed liquid in a mixing unit, and a supply for supplying the mixed liquid generated in the mixing unit to a use point Gas-liquid separation in the gas-liquid separation tank unit into liquid and exhaust gas discharged from the exhaust port, and pressure of the supply liquid supplied from the gas-liquid separation tank unit to the point of use in the pressure measurement unit A step of measuring, and the discharge discharged from the exhaust port according to the pressure of the supply liquid measured by the pressure measurement unit so as to keep the pressure of the supply liquid supplied to the use point at a constant pressure Adjusting the discharge amount of the gas with an exhaust valve, and adjusting the discharge amount of the discharge gas, wherein the pressure of the supply liquid measured by the pressure measuring unit is a constant pressure When the pressure is applied, the discharge amount of the exhaust gas discharged from the exhaust port is increased. When the pressure of the supply liquid measured by the pressure measuring unit decreases with respect to a constant pressure, the discharge gas is discharged from the exhaust port. The amount of exhaust gas discharged is reduced.

Even in this manufacturing method, when the pressure of the supply liquid supplied to the use point increases with respect to the target constant pressure, that is, the pressure of the supply liquid measured by the pressure measuring unit with respect to the target constant pressure. In this case, the pressure of the supply liquid supplied to the use point is decreased by increasing the discharge amount of the exhaust gas discharged from the exhaust port and lowering the pressure in the gas-liquid separation tank unit. On the other hand, when the pressure of the supply liquid supplied to the use point decreases with respect to the target constant pressure, that is, when the pressure of the supply liquid measured by the pressure measuring unit decreases with respect to the target constant pressure. In this case, the pressure of the supply liquid supplied to the use point is increased by decreasing the discharge amount of the exhaust gas discharged from the exhaust port and increasing the pressure in the gas-liquid separation tank unit. In this way, the pressure of the supply liquid supplied to the use point can be kept constant.

The supply liquid manufacturing apparatus of the present invention includes a mixing unit that mixes a first raw material and a second raw material to generate a mixed liquid, a pump unit that changes a flow rate of the first raw material supplied to the mixing unit, From the gas-liquid separation tank unit, the gas-liquid separation tank unit that gas-liquid separates the mixed liquid generated by the mixing unit into a supply liquid supplied to a use point and an exhaust gas discharged from an exhaust port; A first flow rate measurement unit for measuring a flow rate of the supply liquid supplied to the use point; a pressure measurement unit for measuring a pressure of the supply liquid supplied from the gas-liquid separation tank unit to the use point; and the exhaust gas An exhaust valve for adjusting an exhaust amount of the exhaust gas discharged from the mouth; and the supply liquid measured by the first flow rate measurement unit so as to maintain a constant flow rate of the supply liquid supplied to the use point A constant flow control unit for controlling the exhaust valve according to the flow rate of the exhaust gas to adjust the discharge amount of the exhaust gas discharged from the exhaust port, and a constant pressure of the supply liquid supplied to the use point A pressure constant controller that controls the exhaust valve and adjusts the amount of exhaust gas discharged from the exhaust port according to the pressure of the supply liquid measured by the pressure measurement unit, A control selection unit that selects one of a constant flow control for adjusting the discharge amount of the exhaust gas by the constant flow control unit, and a constant pressure control for adjusting the discharge amount of the exhaust gas by the constant pressure control unit; And the constant flow rate control unit increases the flow rate of the supply liquid measured by the first flow rate measurement unit with respect to the constant flow rate. When the flow rate of the supply liquid measured by the flow rate measurement unit decreases with respect to the constant flow rate, the discharge amount of the exhaust gas discharged from the exhaust port is increased. When the discharge amount of the exhaust gas is decreased and the constant pressure control is selected by the control selection unit, the constant pressure control unit is configured such that the pressure of the supply liquid measured by the pressure measurement unit is the constant pressure. When the pressure of the supply liquid measured by the pressure measuring unit decreases with respect to the constant pressure, the amount of exhaust gas discharged from the exhaust port is increased when the pressure increases. The amount of the exhaust gas discharged from the exhaust gas is reduced.

According to this configuration, a control for keeping the flow rate of the supply liquid supplied to the use point constant (constant flow control) and a control for keeping the pressure of the supply liquid supplied to the use point constant (pressure constant control) are selected. can do.

In the constant flow control, when the flow rate of the supply liquid supplied to the use point increases with respect to the target constant flow rate, that is, the flow rate of the supply liquid measured by the flow rate measurement unit is compared with the target constant flow rate. When it increases, the flow rate of the supply liquid supplied to the use point is decreased by increasing the discharge amount of the exhaust gas discharged from the exhaust port and lowering the pressure in the gas-liquid separation tank unit. On the other hand, when the flow rate of the supply liquid supplied to the use point decreases with respect to the target constant flow rate, that is, when the flow rate of the supply liquid measured by the flow measurement unit decreases with respect to the target constant flow rate First, the flow rate of the supply liquid supplied to the use point is increased by decreasing the discharge amount of the exhaust gas discharged from the exhaust port and increasing the pressure in the gas-liquid separation tank unit. In this way, the flow rate of the supply liquid supplied to the use point can be kept constant.

In the constant pressure control, when the pressure of the supply liquid supplied to the use point is increased with respect to the target constant pressure, that is, the pressure of the supply liquid measured by the pressure measuring unit with respect to the target constant pressure. When it increases, the pressure of the supply liquid supplied to a use point is decreased by increasing the discharge amount of the exhaust gas discharged from the exhaust port and lowering the pressure in the gas-liquid separation tank unit. On the other hand, when the pressure of the supply liquid supplied to the use point decreases with respect to the target constant pressure, that is, when the pressure of the supply liquid measured by the pressure measuring unit decreases with respect to the target constant pressure. In this case, the pressure of the supply liquid supplied to the use point is increased by decreasing the discharge amount of the exhaust gas discharged from the exhaust port and increasing the pressure in the gas-liquid separation tank unit. In this way, the pressure of the supply liquid supplied to the use point can be kept constant.

The supply liquid manufacturing method of the present invention includes a step of mixing a first raw material and a second raw material in a mixing unit to generate a mixed liquid, and a supply in which the mixed liquid generated in the mixing unit is supplied to a use point Gas-liquid separation in the gas-liquid separation tank unit into liquid and exhaust gas discharged from the exhaust port, and the flow rate of the supply liquid supplied from the gas-liquid separation tank unit to the point of use A step of measuring, a step of measuring a pressure of the supply liquid supplied from the gas-liquid separation tank unit to the use point by a pressure measurement unit, and a flow rate of the supply liquid supplied to the use point to a constant flow rate In order to maintain the flow rate, the flow rate of the exhaust gas discharged from the exhaust port is adjusted by controlling the exhaust valve according to the flow rate of the supply liquid measured by the flow rate measurement unit. Control and control the exhaust valve according to the pressure of the supply liquid measured by the pressure measurement unit so as to keep the pressure of the supply liquid supplied to the use point constant. Pressure constant control for adjusting the discharge amount of the exhaust gas to be discharged, and selecting either one of them, and when the constant flow control is selected, the flow rate measurement unit measures the When the flow rate of the supply liquid is increased with respect to the constant flow rate, the discharge amount of the exhaust gas discharged from the exhaust port is increased, and the flow rate of the supply liquid measured by the flow rate measurement unit is increased with respect to the constant flow rate. When the discharge pressure of the exhaust gas discharged from the exhaust port is reduced and the constant pressure control is selected, the pressure of the supply liquid measured by the pressure measurement unit is The exhaust gas discharged from the exhaust port when increased with respect to pressure is increased, and the exhaust gas when the pressure of the supply liquid measured by the pressure measuring unit decreases with respect to the constant pressure. The discharge amount of the exhaust gas discharged from the mouth is reduced.

Even with this manufacturing method, control that keeps the flow rate of the supply liquid supplied to the use point constant (constant flow control) and control that keeps the pressure of the supply liquid supplied to the use point constant (pressure constant control) are selected. can do.

In the constant flow control, when the flow rate of the supply liquid supplied to the use point increases with respect to the target constant flow rate, that is, the flow rate of the supply liquid measured by the flow rate measurement unit is compared with the target constant flow rate. When it increases, the flow rate of the supply liquid supplied to the use point is decreased by increasing the discharge amount of the exhaust gas discharged from the exhaust port and lowering the pressure in the gas-liquid separation tank unit. On the other hand, when the flow rate of the supply liquid supplied to the use point decreases with respect to the target constant flow rate, that is, when the flow rate of the supply liquid measured by the flow measurement unit decreases with respect to the target constant flow rate First, the flow rate of the supply liquid supplied to the use point is increased by decreasing the discharge amount of the exhaust gas discharged from the exhaust port and increasing the pressure in the gas-liquid separation tank unit. In this way, the flow rate of the supply liquid supplied to the use point can be kept constant.

In the constant pressure control, when the pressure of the supply liquid supplied to the use point is increased with respect to the target constant pressure, that is, the pressure of the supply liquid measured by the pressure measuring unit with respect to the target constant pressure. When it increases, the pressure of the supply liquid supplied to a use point is decreased by increasing the discharge amount of the exhaust gas discharged from the exhaust port and lowering the pressure in the gas-liquid separation tank unit. On the other hand, when the pressure of the supply liquid supplied to the use point decreases with respect to the target constant pressure, that is, when the pressure of the supply liquid measured by the pressure measuring unit decreases with respect to the target constant pressure. In this case, the pressure of the supply liquid supplied to the use point is increased by decreasing the discharge amount of the exhaust gas discharged from the exhaust port and increasing the pressure in the gas-liquid separation tank unit. In this way, the pressure of the supply liquid supplied to the use point can be kept constant.

According to the present invention, it is possible to produce a supply liquid (for example, ozone water) as much as needed at the point of use. Furthermore, according to the present invention, it is possible to supply an appropriate amount of ozone water (supply liquid) to the use point in a gas-liquid mixed state in which ozone water and ozone gas coexist.

It is explanatory drawing which shows the structure of the supply liquid manufacturing apparatus in the 1st Embodiment of this invention. It is explanatory drawing which shows the structure of the supply liquid manufacturing apparatus in the 2nd Embodiment of this invention. It is explanatory drawing which shows the structure of the supply liquid manufacturing apparatus in the 3rd Embodiment of this invention. It is explanatory drawing of the flow volume fixed control in the 3rd Embodiment of this invention. It is explanatory drawing which shows the structure of the supply liquid manufacturing apparatus in the 4th Embodiment of this invention. It is explanatory drawing which shows the structure of the conventional ozone water supply apparatus.

Hereinafter, a supply liquid manufacturing apparatus according to an embodiment of the present invention will be described with reference to the drawings. In this embodiment, the case of a supply liquid manufacturing apparatus used for manufacturing ozone water or the like used for cleaning an electronic component such as a semiconductor device or a liquid crystal is illustrated.

In the present specification, “constant pressure” and “constant pressure” mean that the average pressure value within a predetermined or arbitrary time interval is constant or substantially constant. Further, in this specification, “constant flow rate” and “constant flow rate” mean that the average flow rate value within a predetermined or arbitrary time interval is constant or substantially constant. Furthermore, in this specification, “constant concentration” and “constant concentration” mean that the value of the average component concentration of a chemical species dissolved in a certain liquid within a predetermined or arbitrary time interval is constant. Or it means that it is substantially constant.

(First embodiment)
The configuration of the supply liquid manufacturing apparatus according to the first embodiment of the present invention will be described with reference to the drawings. FIG. 1 is an explanatory diagram showing the configuration of the supply liquid manufacturing apparatus of the present embodiment. As shown in FIG. 1, the supply liquid manufacturing apparatus 100 includes a first gas (O ₂ gas) and a second gas (CO ₂ gas, N ₂ gas, or a mixed gas of CO ₂ gas and N ₂ gas) as raw materials. Supply sources 101 and 102 and flow rate controllers 103 and 104 for controlling the flow rates of the respective gases (first gas and second gas). The second gas (CO ₂ gas, N ₂ gas, or a mixed gas of CO ₂ gas and N ₂ gas) is not necessarily essential, and only the first gas (O ₂ gas) may be used. The first gas and the second gas are sent to the ozone gas generation unit 106 after the pressure is measured by the pressure sensor 105. The ozone gas generated by the ozone gas generation unit 106 is sent to the ozone water generation unit 107.

Further, the supply liquid manufacturing apparatus 100 includes a supply source 108 of water (ultra pure water) that is the first raw material. The supply liquid manufacturing apparatus 100 includes a deaeration processing unit 109 that performs a deaeration process in order to remove surplus gas (oxygen, nitrogen, carbon dioxide, etc.) in the water that is the first raw material. . For the deaeration treatment, a known method such as evacuation through a deaeration treatment film can be used. Further, the supply liquid manufacturing apparatus 100 is provided with a valve 110 for adjusting the flow rate of water as the first raw material and a flow meter 111 for measuring the flow rate of water as the first raw material. After the flow rate of the water, which is the first raw material, is measured by the flow meter 111, it is sent to a booster pump (or simply referred to as a pump, hereinafter the same) 112, and the pressure is adjusted (boosted) by the pressure pump 112. Then, it is sent to the ozone water generator 107. The pressure of water sent to the ozone water generation unit 107 is set to 0.1 to 1.0 MPa, for example. And the flow volume of the water sent to the ozone water production | generation part 107 is adjusted by changing the pressure of the pump 112. FIG.

The ozone water generator 107 includes a mixer 113 that mixes water (first raw material) and ozone gas (second raw material) to generate ozone water (mixed liquid). The mixer 113 is preferably one that mixes water and gas using the Venturi effect. For example, an aspirator or an ejector is used as such a mixer 113. The generated ozone water is sent to the gas-liquid separation tank 114. In the gas-liquid separation tank 114, the ozone water (mixed liquid) generated in the mixer 113 is gas-liquid separated into ozone water (supply liquid) and exhaust gas (exhaust gas). The gas-liquid separation tank 114 is provided with a water level sensor 115 for measuring the water level of ozone water. The pressure of the ozone water (supply liquid) that has been gas-liquid separated is measured by the pressure sensor 116, the flow rate is measured by the flow meter 117, and then the use point 119 (for example, a multi-chamber type single wafer is provided via the valve 118. Sent to a mold cleaning device).

Further, the ozone water (supply liquid) subjected to gas-liquid separation is discharged from the drain 121 after the concentration is measured by the ozone water concentration meter 120. On the other hand, the gas-liquid separated exhaust gas (exhaust gas) is sent from the gas-liquid separation tank 114 to the exhaust gas decomposition catalyst 123 via the valve 122 and decomposed, and then returned to the atmospheric pressure by the pressure relief valve 124. From the outlet 125. In the pressure relief valve 124, it is desirable to employ an air-controlled relief valve in that the pressure can be kept constant by preventing sudden pressure fluctuations. If there is no risk of sudden pressure fluctuations, a spring-type relief valve can be employed. The spring type relief valve is less expensive than the air control type relief valve, and is advantageous in reducing the cost.

The supply liquid manufacturing apparatus 100 includes a flow rate control unit (that is, a pressure increase control unit) 126 and an exhaust pressure control unit 127. The flow rate control unit (that is, the pressure increase control unit) 126 controls the pressure increase pump 112 according to the flow rate of water measured by the flow meter 111 or the flow rate of ozone water measured by the flow meter 117, and Adjust the pressure of water to be supplied by increasing the pressure. More specifically, for example, the flow value of ozone water measured by the flow meter 117 is received, a control signal for controlling the booster pump 112 is generated according to the received flow value, and this control signal is sent to the booster pump 112. By transmitting and controlling a drive unit (not shown) provided in the booster pump 112, the number of rotations of the pump can be controlled, and the pressure (or flow rate) of water supplied to the mixer 113 can be adjusted. Further, the exhaust pressure control unit 127 is configured to change the pressure relief valve 124 according to the flow rate of water measured by the flow meter 111, the flow rate of ozone water measured by the flow meter 117, and the concentration of ozone water measured by the ozone water concentration meter 120. And the exhaust pressure of the exhaust gas is adjusted so as to keep the water level in the gas-liquid separation tank 114 constant.

This supply liquid manufacturing apparatus 100 can adjust the water level of the gas-liquid separation tank 114 to be constant. For example, the water level in the gas-liquid separation tank 114 can be adjusted to be constant by measuring the water level in the gas-liquid separation tank 114 with the water level sensor 115. Further, the water level of the gas-liquid separation tank 114 is adjusted to be constant by controlling the flow rate so that the flow rate of water measured by the flow meter 111 and the flow rate of ozone water measured by the flow meter 117 are the same. Can do.

The operation of the supply liquid manufacturing apparatus 100 according to the first embodiment configured as described above will be described.

When ozone water is manufactured using the supply liquid manufacturing apparatus 100 of the first embodiment, first, a first gas (O ₂ gas) and a second gas (CO ₂ gas, N ₂ gas, Alternatively, a mixed gas of CO ₂ gas and N ₂ gas) is supplied from the supply sources 101 and 102. The flow rates of the first gas and the second gas are controlled by the flow rate controllers 103 and 104. Further, water (pure water) as the first raw material is supplied from the supply source 108. The flow rate of water is measured by the flow meter 111. The flow controllers 103 and 104 control the flow rates of the first gas and the second gas according to the flow rate of water measured by the flow meter 111. That is, in order to generate ozone water having a predetermined concentration, a relationship between the flow rate of water and the flow rates of the first gas and the second gas is obtained in advance, The flow rates of the first gas and the second gas are controlled.

The first gas and the second gas are sent to the ozone gas generation unit 106 after the pressure is measured by the pressure sensor 105. The ozone gas generator 106 generates ozone gas from the first gas (O ₂ gas) and the second gas (CO ₂ gas, N ₂ gas, or a mixed gas of CO ₂ gas and N ₂ gas) by discharge. The generated ozone gas (second raw material) is sent to the ozone water generation unit 107. On the other hand, after the flow rate is measured by the flow meter 111, the water (first raw material) is sent to the booster pump 112, the pressure is adjusted by the booster pump 112, and then sent to the ozone water generator 107. The booster pump 112 is controlled by the flow rate control unit 126 and adjusts the pressure of water sent to the ozone water generation unit 107 within a pressure range of 0.1 MPa to 1 MPa. As the booster pump 112, for example, a centrifugal pump or the like is used.

In the mixer 113 of the ozone water generation unit 107, water and ozone gas are mixed to generate ozone water, and the generated ozone water is sent to the gas-liquid separation tank 114. In the gas-liquid separation tank 114, the ozone water (mixed liquid) generated in the mixer 113 is gas-liquid separated into ozone water (supply liquid) and exhaust gas (exhaust gas). The pressure of the ozone water (supply liquid) that has been gas-liquid separated is measured by the pressure sensor 116, the flow rate is measured by the flow meter 117, and then the use point 119 (for example, a multi-chamber type single wafer is provided via the valve 118. Mold cleaning device). In this case, the flow control unit 126 controls the booster pump 112 according to the flow measured by the flow meter 111 or the flow meter 117.

On the other hand, the exhaust gas (exhaust gas) is sent to the exhaust gas decomposition catalyst 123 via the valve 122 and decomposed, and then returned to atmospheric pressure by the pressure relief valve 124 and then discharged from the discharge port 125. In this case, the exhaust pressure control unit 127 uses a pressure relief valve according to the flow rate of water measured by the flow meter 111, the flow rate of ozone water measured by the flow meter 117, and the concentration of ozone water measured by the ozone water concentration meter 120. 124 is controlled to adjust the exhaust gas exhaust pressure so that the water level in the gas-liquid separation tank 114 is kept constant. Further, the exhaust pressure control unit controls the pressure relief valve 124 according to the water level in the gas-liquid separation tank 114 measured by the water level sensor 115, and exhaust gas so as to keep the water level in the gas-liquid separation tank 114 constant. Adjust the exhaust pressure.

According to the supply liquid manufacturing apparatus 100 of the first embodiment as described above, the flow rate of the supply liquid (ozone water) supplied to the use point 119 is measured after gas-liquid separation. The flow rate of the supply liquid (ozone water) can be accurately measured without being affected by bubbles of gas (exhaust gas) generated by mixing water) and the second raw material (ozone gas). The pressure of the first raw material water (suppressed and supplied to the mixing section) is adjusted according to the flow rate of the supply liquid (ozone water) measured in this way, and the exhaust gas exhaust pressure is controlled. Thus, the water level in the gas-liquid separation tank 114 is kept constant. As a result, the supply liquid (ozone water) can be produced as much as required at the use point 119.

Further, in the present embodiment, the water level in the gas-liquid separation tank 114 can be kept constant, so that the supply liquid (ozone water) can be produced as much as required at the use point 119. For example, the water level in the gas-liquid separation tank 114 is measured by the water level sensor 115. As a result, the water level in the gas-liquid separation tank 114 can be kept constant, and the supply liquid (ozone water) can be produced as much as required at the use point 119.

Alternatively, the flow rate of water supplied to the mixer 113 is measured by the flow meter 111, and the flow rate of ozone water discharged from the gas-liquid separation tank 114 (supplied to the use point 119) is measured. In addition, by making the flow rate of water supplied to the mixer 113 and the flow rate of ozone water discharged from the gas-liquid separation tank 114 the same, the amount of liquid in the gas-liquid separation tank 114 can be kept constant. Thus, the supply liquid (ozone water) can be produced as much as required at the use point 119.

In this embodiment, ozone water can be produced by mixing water and ozone gas in the mixer 113. In this case, since the booster pump 112 is disposed upstream of the mixer 113 (upstream from the mixer 113), only water is passed through the booster pump 112 (no ozone water is passed through the booster pump 112). Therefore, the lifetime of the booster pump 112 is longer than when the booster pump 112 is provided at the subsequent stage of the mixer 113 (when ozone water is passed through the booster pump 112).

(Second Embodiment)
Next, the supply liquid manufacturing apparatus according to the second embodiment of the present invention will be described. Here, the supply liquid manufacturing apparatus according to the second embodiment will be described with a focus on differences from the first embodiment. Unless otherwise specified, the configuration and operation of the present embodiment are the same as those of the first embodiment.

FIG. 2 is an explanatory diagram showing the configuration of the supply liquid manufacturing apparatus of the present embodiment. As shown in FIG. 2, the supply liquid manufacturing apparatus 200 includes a supply source 201 for water (ultra pure water) as a first raw material and a supply source 202 for a chemical raw material (for example, ammonia) as a second raw material. . Further, the supply liquid manufacturing apparatus 200 is provided with a valve 203 for adjusting the flow rate of water as the first raw material and a flow meter 204 for measuring the flow rate of water as the first raw material. Water, which is the first raw material, is sent to the booster pump 205 after the flow rate is measured by the flow meter 204, the pressure is adjusted (pressurized) by the booster pump 205, and then sent to the mixer 206. The chemical raw material that is the second raw material is also sent to the mixer 206.

The mixer 206 mixes water and a chemical raw material (ammonia) to generate chemical water (ammonia water). The generated chemical water (ammonia water) is sent to the gas-liquid separation tank 207. In the gas-liquid separation tank 207, the chemical water (mixed liquid) generated by the mixer 206 is gas-liquid separated into chemical water (supply liquid) and exhaust gas (exhaust gas). The gas-liquid separation tank 207 is provided with two water level sensors 208 and 209 for measuring the upper and lower water levels of chemical water. The chemical water (supply liquid) that has been subjected to gas-liquid separation is measured for pressure by the pressure sensor 210, and after the flow rate is measured by the flow meter 211, the use point 213 (for example, multi-chamber type single wafer) is provided via the valve 212. Sent to a mold cleaning device).

On the other hand, the gas-liquid separated exhaust gas (exhaust gas) is sent from the gas-liquid separation tank 207 to the pressure relief valve 215 via the valve 214 and returned to the atmospheric pressure by the pressure relief valve 215 before the exhaust port 216. Discharged from.

The supply liquid manufacturing apparatus 200 includes a flow rate control unit (that is, a pressure increase control unit) 217 and an exhaust pressure control unit 218. The flow rate control unit (that is, the pressure increase control unit) 217 controls the pressure increase pump 205 according to the flow rate of the chemical water (ammonia water) measured by the flow meter 204 or the flow meter 211 to increase the pressure in the mixer 206. Adjust the pressure of the supplied water. More specifically, the flow value measured by the flow meter 204 or the flow meter 211 is received, a control signal for controlling the booster pump 205 is generated according to the received flow value, and this control signal is transmitted to the booster pump 205. Then, the pressure (or flow rate) of water supplied to the mixer 206 can be adjusted by controlling the number of rotations of the pump by controlling a driving unit (not shown) provided in the booster pump 205. Further, the exhaust pressure control unit 218 controls the pressure relief valve 215 according to the flow rate of water measured by the flow meter 204 and the flow rate of ammonia water measured by the flow meter 211, and the water level in the gas-liquid separation tank 207. The exhaust gas pressure is adjusted so that the air pressure is kept constant.

This supply liquid manufacturing apparatus 200 can adjust the water level of the gas-liquid separation tank 207 to be constant. For example, the water level in the gas-liquid separation tank 207 can be adjusted to be constant by measuring the upper and lower water levels in the gas-liquid separation tank 207 with the two water level sensors 208 and 209. Further, the water level of the gas-liquid separation tank 207 is kept constant by controlling the flow rate so that the flow rate of water measured by the flow meter 204 and the flow rate of chemical water (ammonia water) measured by the flow meter 211 are the same. Can be adjusted.

The same effects as those of the first embodiment can be obtained by the supply liquid manufacturing apparatus of the second embodiment. In the present embodiment, chemical water (for example, ammonia water) can be produced by mixing water and a chemical raw material (for example, ammonia) in the mixing section.

(Third embodiment)
Next, a supply liquid manufacturing apparatus according to a third embodiment of the present invention will be described. Here, the supply liquid manufacturing apparatus according to the third embodiment will be described focusing on the differences from the first embodiment. Unless otherwise specified, the configuration and operation of the present embodiment are the same as those of the first embodiment.

FIG. 3 is an explanatory diagram showing the configuration of the supply liquid manufacturing apparatus of the present embodiment. As shown in FIG. 3, the supply liquid manufacturing apparatus 300 includes a first gas (O ₂ gas) and a second gas (CO ₂ gas, N ₂ gas, or a mixed gas of CO ₂ gas and N ₂ gas) as raw materials. Supply sources 301 and 302 and flow rate controllers 303 and 304 for controlling the flow rates of the respective gases (first gas and second gas). The second gas (CO ₂ gas, N ₂ gas, or a mixed gas of CO ₂ gas and N ₂ gas) is not necessarily essential, and only the first gas (O ₂ gas) may be used. The first gas and the second gas are sent to the ozone gas generation unit 306 after the pressure is measured by the pressure sensor 305. The ozone gas generation unit 306 employs a silent discharge method, an electrolysis method, or an ultraviolet lamp method to generate ozone gas. The ozone gas generated by the ozone gas generation unit 306 is sent to the mixing unit 307. Note that, using the pressure value measured by the pressure sensor 305, the flow rate controllers 303 and 304 can monitor whether the flow rates of the first gas and the second gas are within an appropriate range.

Further, the supply liquid manufacturing apparatus 300 includes a supply source 308 of water (ultra pure water) that is the first raw material. In addition, the supply liquid manufacturing apparatus 100 is provided with a valve 309 for turning on and off the supply of water as the first raw material, and a flow meter 310 for measuring the flow rate of the water as the first raw material. After the flow rate is measured by the flow meter 310, the water that is the first raw material is sent to the pump 311, the flow rate is adjusted by the pump 311, and then sent to the mixing unit 307. Here, for example, a centrifugal pump is used as the pump 311. Hereinafter, the pump 311 will be described by taking a centrifugal pump as an example. The flow meter 310 corresponds to the second flow rate measuring unit.

The mixing unit 307 mixes water (first raw material) and ozone gas (second raw material) to generate ozone water (mixed liquid). The mixing unit 307 preferably uses a venturi effect to mix water and gas. For example, an aspirator or an ejector is used.

The ozone water generated in the mixing unit 307 is sent to the gas-liquid separation tank 312. In the gas-liquid separation tank 312, the ozone water (mixed liquid) generated in the mixing unit 307 is gas-liquid separated into ozone water (supply liquid) and exhaust gas (exhaust gas). The gas-liquid separation tank 312 is provided with a water level sensor 313 for measuring the water level of ozone water. The water level sensor 313 is, for example, a sensor that is installed at a predetermined height in the gas-liquid separation tank 312 and detects whether the level of ozone water is above or below the height of the water level sensor 313. Alternatively, the water level sensor 313 may always measure the water level (liquid amount) of ozone water in the gas-liquid separation tank 312. The ozone water (supply liquid) that has been gas-liquid separated is measured by the ozone water concentration meter 314, the flow rate is measured by the flow meter 315, the pressure is measured by the pressure sensor 316, and then used through the valve 317. It is sent to a point 318 (for example, a multi-chamber type single wafer cleaning device) or a drain 319.

It should be noted that at the timing when ozone water is not used at the use point during steady operation of this apparatus, the valve 317 is switched to the drain 319 side so that ozone water flows to the drain 319 at a minimum flow rate. This is to keep the quality of the ozone water constant. Further, unnecessary ozone water is discharged from the drain 319 at the time of starting up the apparatus or during maintenance.

On the other hand, the gas-liquid separated exhaust gas (exhaust gas) is sent from the gas-liquid separation tank 312 to the exhaust gas decomposition catalyst 321 via the valve 320 and decomposed, and then the exhaust port 323 via the opening adjustment valve 322. Discharged from. Here, the flow meter 315 corresponds to the first flow measurement unit of the present invention, and the pressure sensor 316 corresponds to the pressure measurement unit of the present invention. The opening adjustment valve 322 corresponds to the exhaust valve of the present invention.

(Constant flow control)
The supply liquid manufacturing apparatus 300 includes an exhaust control unit 324 and a flow rate control unit 325. The exhaust control unit 324 has a function of performing a constant flow rate control for keeping the flow rate of ozone water (supply liquid) supplied to the use point 318 at a constant flow rate. Here, the constant flow rate is also referred to as a target flow rate. The constant flow rate or the target flow rate is not necessarily a fixed value in the supply liquid manufacturing apparatus 300, but is arbitrarily set as a flow rate required at a use point.
The gas-liquid separation tank 312 is connected to the opening adjustment valve 322, and the pressure in the upper space of the ozone water level in the gas-liquid separation tank 312 is adjusted by the opening adjustment valve 322. Since ozone gas escapes from the ozone water, the pressure in the upper space of the ozone water liquid level in the gas-liquid separation tank 322 changes over time. The flow rate of ozone water (supply liquid) supplied to the use point 318 is influenced not only by the rotation speed of the pump 311 but also by the pressure in the upper space in the gas-liquid separation tank.

When performing constant flow control, the exhaust control unit 324 controls the opening adjustment valve 322 in accordance with the flow rate of ozone water (supply liquid) measured by the flow meter 315 and exhaust gas discharged from the exhaust port 323. Adjust the amount of exhaust gas. More specifically, the exhaust control unit 324 detects exhaust gas (exhaust gas) discharged from the exhaust port 323 when the flow rate of ozone water (supply liquid) measured by the flow meter 315 increases with respect to the target constant flow rate. When the flow rate of ozone water (supply liquid) measured by the flow meter 315 decreases with respect to the target constant flow rate, the exhaust gas (exhaust gas) discharged from the exhaust port 323 is increased. Reduce emissions.

The flow control unit 325 adjusts the flow rate of the first raw material supplied to the mixing unit by controlling the rotation speed of the pump 310 according to the flow rate of ozone water (supply liquid) measured by the flow meter 315.
More specifically, control is performed so that the flow rate of the first raw material supplied to the mixing unit measured by the flow meter 310 is the same as the flow rate of ozone water (supply liquid) measured by the flow meter 315. Therefore, in this embodiment, the flow value measured by the flow meter 315 is received, a control signal for controlling the rotation speed of the pump 310 is generated according to the received flow value, and this control signal is transmitted to the pump 310. The flow rate supplied to the mixing unit is adjusted by controlling the rotational speed of the pump 310.

In addition, the flow rate control unit 315 reduces the flow rate of the first raw material supplied to the mixing unit when the amount of liquid in the gas-liquid separation tank 312 measured by the water level sensor 313 increases beyond a predetermined amount of liquid. When the amount of liquid in the gas-liquid separation tank 312 measured by the sensor 313 decreases below a predetermined amount, the flow rate of the first raw material supplied to the mixing unit may be increased. More specifically, when the water level of the ozone water in the gas-liquid separation tank 312 is higher than a certain level by using a water level sensor 313 that detects whether or not the water level is higher than a certain level, The flow rate of the first raw material supplied to the mixing unit is reduced. And if the water level of ozone water falls below the height of a water level sensor, the flow volume of the 1st raw material supplied to a mixing part will be raised. In this way, the water level (liquid amount) of ozone water in the gas-liquid separation tank 312 can be kept constant. Of course, two water level sensors may be installed at different heights and controlled so that the water level of ozone water falls within a certain range. If the water level of ozone water can be kept constant, the flow rate of ozone water (supply liquid) supplied to the use point 318 is basically the same as the flow rate of the first raw material supplied to the mixing section. Means.

If the water level sensor 313 detects the ozone water level in the gas-liquid separation tank 312, the flow meter 310 is not necessarily required to keep the ozone water level constant. However, in order to maintain the ozone gas concentration constant, it is necessary to control the flow rate of the raw material gas by measuring the flow rate of water. If the flow rate of the first raw material supplied to the mixing unit is controlled using a water level sensor 313 that detects the water level of the ozone water so that the water level of the ozone water is constant, the flow meter 315 is not provided. Only the flow meter 310 may be provided.

Further, the exhaust control unit 324 discharges exhaust gas (exhaust gas) discharged from the exhaust port 323 when the liquid amount in the gas-liquid separation tank 312 measured by the water level sensor 313 increases with respect to a predetermined liquid amount. The amount of liquid in the gas-liquid separation tank 312 may be decreased by decreasing the amount and increasing the pressure in the gas-liquid separation tank 312. On the other hand, when the amount of liquid in the gas-liquid separation tank 312 measured by the water level sensor 313 decreases with respect to a predetermined amount of liquid, the amount of exhaust gas (exhaust gas) discharged from the exhaust port 323 is increased, The amount of liquid in the gas-liquid separation tank 312 may be increased by lowering the pressure in the gas-liquid separation tank 312. Even in this case, the amount of liquid in the gas-liquid separation tank 312 can be kept constant.

According to the supply liquid manufacturing apparatus 300 of the third embodiment as described above, a constant flow rate control is possible. Therefore, when the flow rate of ozone water (supply liquid) supplied to the use point 318 is increased with respect to the target constant flow rate, that is, the flow rate of ozone water (supply liquid) measured by the flow meter 315 is the target. Is increased to a certain flow rate, the exhaust gas (exhaust gas) discharged from the exhaust port 323 is increased, and the pressure in the gas-liquid separation tank 312 is lowered to supply to the use point 318. Reduce the flow rate of ozone water (supply liquid). On the other hand, when the flow rate of the ozone water (supply liquid) supplied to the use point 318 decreases with respect to the target constant flow rate, that is, the flow rate of the ozone water (supply liquid) measured by the flow meter 315 is the target. When the flow rate decreases with respect to a certain flow rate, the exhaust gas (exhaust gas) discharged from the exhaust port 323 is reduced and the pressure in the gas-liquid separation tank 312 is increased to supply to the use point 318. Increase the flow rate of ozone water (supply liquid). In this way, the flow rate of ozone water (supply liquid) supplied to the use point 318 can be kept constant. By adjusting the pressure in the gas-liquid separation tank, the flow rate of ozone water supplied to the use point can be controlled with good responsiveness.

(Constant pressure control)
As another embodiment, by using the configuration of the supply liquid manufacturing apparatus shown in FIG. 3, it is possible to perform constant pressure control that maintains the pressure of ozone water (supply liquid) supplied to the use point 318 at a constant pressure. . Here, the constant pressure is also referred to as a target pressure. The constant pressure or the target pressure is not necessarily a fixed value in the supply liquid manufacturing apparatus 300, but is arbitrarily set as the pressure of the supply liquid to be supplied by the supply liquid manufacturing apparatus 300.

When performing constant pressure control, the exhaust control unit 324 controls the opening adjustment valve 322 according to the pressure of ozone water (supply liquid) measured by the pressure sensor 316 and exhaust gas discharged from the exhaust port 323. Adjust the amount of exhaust gas.
More specifically, when the pressure of the ozone water (supply liquid) supplied to the use point 318 increases with respect to the target constant pressure, that is, the ozone water (supply liquid) measured by the pressure sensor 316. When the pressure increases with respect to the target constant pressure, the amount of exhaust gas (exhaust gas) exhausted from the exhaust port 323 is increased, and the pressure in the gas-liquid separation tank 312 is lowered, so that the use The pressure of ozone water (supply liquid) supplied to the point 318 is decreased. On the other hand, when the pressure of the ozone water (supply liquid) supplied to the use point 318 decreases with respect to the target constant pressure, that is, the pressure of the ozone water (supply liquid) measured by the pressure sensor 316 is the target. When the pressure decreases with respect to a certain pressure, the amount of exhaust gas (exhaust gas) discharged from the exhaust port 323 is reduced, and the pressure in the gas-liquid separation tank 312 is increased to supply to the use point 318. Increase the pressure of ozone water (supply liquid). In this way, the pressure of ozone water (supply liquid) supplied to the use point 318 can be kept constant. The pressure measured by the pressure sensor 316 and kept constant is set to 0.1 to 1.0 MPa, for example.

∙ When performing constant pressure control, the flow rate of the first raw material supplied to the mixing unit is controlled to be the same as the flow rate of ozone water sent to the use point. The specific means is the same as the means described in the constant flow rate control.

Similarly, in the present embodiment, when the amount of liquid in the gas-liquid separation tank 312 measured by the water level sensor 313 increases or decreases with respect to a predetermined amount, exhaust gas (exhaust gas) discharged from the exhaust port 323. The amount of liquid in the gas-liquid separation tank 312 may be kept constant by adjusting the discharge amount of the gas.

FIG. 4 is a graph obtained by measuring the ozone water concentration and the ozone water supply pressure when the pressure is controlled to be constant while changing the flow rate of the ozone water supplied to the use point. As described above, according to the present embodiment, even when the flow rate required at the use point fluctuates, it is possible to supply the ozone water while keeping the pressure of the ozone water constant and maintaining the concentration of the ozone water constant. .

(Modification of the third embodiment)
FIG. 5 shows a modified example of the supply liquid manufacturing apparatus 300 according to the third embodiment. In the supply liquid manufacturing apparatus 300 of the present embodiment, it is possible to switch between constant flow control and constant pressure control. Therefore, the exhaust control unit 324 of the present embodiment includes a constant flow control unit 3240 that performs constant flow control, a constant pressure control unit 3241 that performs constant pressure control, and a control selection unit 3242 that switches between constant flow control and constant pressure control. It has.

The constant flow rate control unit 3240 adjusts the opening according to the flow rate of ozone water (supply liquid) measured by the flow meter 315 so as to keep the flow rate of ozone water (supply liquid) supplied to the use point 318 constant. The amount of exhaust gas (exhaust gas) discharged from the exhaust port 323 is adjusted by controlling the valve 322.

The constant pressure control unit 3241 adjusts the opening degree according to the pressure of the ozone water (supply liquid) measured by the pressure sensor 316 so as to keep the pressure of the ozone water (supply liquid) supplied to the use point 318 constant. The amount of exhaust gas (exhaust gas) discharged from the exhaust port 323 is adjusted by controlling the valve 322.

The control selection unit 3242 includes either a constant flow control that adjusts the exhaust amount of exhaust gas (exhaust gas) by the constant flow rate control unit 3240, or a constant pressure control that adjusts the exhaust amount of exhaust gas (exhaust gas) by the constant pressure control unit 3241. Select either one. For example, switching between constant flow control and constant pressure control can be performed by operating a touch panel (not shown) provided in the supply liquid manufacturing apparatus 300. Further, switching between constant flow control and constant pressure control may be performed based on a request signal from the use point 318.

When the constant flow control is selected by the control selection unit 3242, the constant flow control unit 3240 performs the constant flow control. More specifically, the constant flow rate control unit 3240 controls the exhaust gas (exhaust gas) discharged from the exhaust port 323 when the flow rate of ozone water (supply liquid) measured by the flow meter 315 increases with respect to the target constant flow rate. Exhaust gas (exhaust gas) discharged from the exhaust port 323 when the flow rate of ozone water (supply liquid) measured by the flow meter 315 decreases with respect to the target constant flow rate. Reduce the amount.

When the constant pressure control is selected by the control selection unit 3242, the constant pressure control unit 3241 performs the constant pressure control. More specifically, the constant pressure control unit 3241 is configured to detect the exhaust gas (exhaust gas) discharged from the exhaust port 323 when the pressure of the ozone water (supply liquid) measured by the pressure sensor 316 increases with respect to the target constant pressure. Exhaust gas (exhaust gas) discharged from the exhaust port 323 when the pressure of the ozone water (supply liquid) measured by the pressure sensor 316 decreases with respect to the target constant pressure. Reduce the amount.

According to such a modified example of the supply liquid manufacturing apparatus 300, control for keeping the flow rate of ozone water (supply liquid) supplied to the use point 318 constant (flow rate control), and ozone supplied to the use point 318. Control (pressure constant control) that keeps the pressure of water (supply liquid) constant can be selected.

In the constant flow control, when the flow rate of ozone water (supply liquid) supplied to the use point 318 increases with respect to the target constant flow rate, that is, the flow rate of ozone water (supply liquid) measured by the flow meter 315. Is increased with respect to the target constant flow rate, the amount of exhaust gas (exhaust gas) discharged from the exhaust port 323 is increased, and the pressure in the gas-liquid separation tank 312 is lowered, thereby reducing the use point. The flow rate of ozone water (supply liquid) supplied to 318 is decreased. On the other hand, when the flow rate of the ozone water (supply liquid) supplied to the use point 318 decreases with respect to the target constant flow rate, that is, the flow rate of the ozone water (supply liquid) measured by the flow meter 315 is the target. When the flow rate decreases with respect to a certain flow rate, the exhaust gas (exhaust gas) discharged from the exhaust port 323 is reduced and the pressure in the gas-liquid separation tank 312 is increased to supply to the use point 318. Increase the flow rate of ozone water (supply liquid). In this way, the flow rate of ozone water (supply liquid) supplied to the use point 318 can be kept constant.

In the constant pressure control, when the pressure of the ozone water (supply liquid) supplied to the use point 318 increases with respect to the target constant pressure, that is, the pressure of the ozone water (supply liquid) measured by the pressure sensor 316. Is increased with respect to the target constant pressure, the amount of exhaust gas (exhaust gas) discharged from the exhaust port 323 is increased, and the pressure in the gas-liquid separation tank 312 is lowered, thereby reducing the use point. The pressure of ozone water (supply liquid) supplied to 318 is decreased. On the other hand, when the pressure of the ozone water (supply liquid) supplied to the use point 318 decreases with respect to the target constant pressure, that is, the pressure of the ozone water (supply liquid) measured by the pressure sensor 316 is the target. When the pressure decreases with respect to a certain pressure, the amount of exhaust gas (exhaust gas) discharged from the exhaust port 323 is reduced, and the pressure in the gas-liquid separation tank 312 is increased to supply to the use point 318. Increase the pressure of ozone water (supply liquid). In this way, the pressure of ozone water (supply liquid) supplied to the use point 318 can be kept constant.

The embodiments of the present invention have been described above by way of example, but the scope of the present invention is not limited to these embodiments, and can be changed or modified according to the purpose within the scope of the claims. is there.

For example, in the above embodiment, the case where ozone gas or a chemical raw material (such as ammonia) and water are mixed is exemplified, but other chemicals (for example, H ₂ CO ₃ (carbonic acid), HF (hydrofluoric acid), DHF ( Dilute hydrofluoric acid), BHF (buffered hydrofluoric acid, ie, a mixture of NH ₄ F and HF), HCl (hydrochloric acid, dilute hydrochloric acid), H ₂ SO ₄ (sulfuric acid, dilute sulfuric acid), HNO ₃ (sulfuric acid, dilute sulfuric acid), It is also possible to mix aqua regia or an acid mixed with these and water.

As described above, the supply liquid manufacturing apparatus according to the present invention has an effect that the supply liquid can be manufactured as much as required at the use point, and is used for cleaning electronic components such as semiconductor devices and liquid crystals. Used and useful.

100 Supply Liquid Manufacturing Device 106 Ozone Gas Generation Unit 111 Flowmeter (Second Flow Rate Measurement Unit)
112 Booster pump (Boost pump part or pump)
113 Mixer (mixing part)
114 Gas-liquid separation tank (gas-liquid separation tank)
115 Water level sensor (Liquid quantity measuring part)
117 Flowmeter (flow rate measurement part)
119 Use point 124 Pressure relief valve 125 Discharge port 126 Flow rate control unit (step-up control unit)
127 Exhaust pressure control unit 200 Supply liquid manufacturing apparatus 211 Flow meter (second flow rate measuring unit)
205 Booster pump (Boost pump part or pump)
206 Mixer (mixing part)
207 Gas-liquid separation tank (gas-liquid separation tank)
208 Water level sensor (Liquid quantity measuring part)
209 Water level sensor (Liquid quantity measuring part)
211 Flowmeter (Flow measurement unit)
213 Use point 215 Pressure relief valve 216 Discharge port 217 Flow rate control unit (step-up control unit)
218 Exhaust pressure control unit 300 Supply liquid manufacturing apparatus 307 Mixing unit 311 Pump 312 Gas-liquid separation tank (gas-liquid separation tank unit)
313 Water level sensor (Liquid quantity measuring unit)
315 Flowmeter (Flow measurement unit)
316 Pressure sensor (pressure measurement unit)
318 Use point 322 Opening adjustment valve (exhaust valve)
324 Exhaust control unit 325 Flow rate control unit 3240 Constant flow rate control unit 3241 Constant pressure control unit 3242 Control selection unit

Claims (19)

1. A mixing section for mixing the first raw material and the second raw material to generate a mixed liquid;
   A pump unit for changing a flow rate of the first raw material supplied to the mixing unit;
   A gas-liquid separation tank unit that gas-liquid separates the mixed liquid generated by the mixing unit into a supply liquid supplied to a use point and an exhaust gas discharged from an exhaust port;
   A valve for adjusting the opening so as to determine the discharge amount of the exhaust gas;
   A flow rate measuring unit for measuring a flow rate of the supply liquid supplied from the gas-liquid separation tank unit to the use point;
   The flow rate value of the supply liquid measured by the flow rate measurement unit is received, a control signal for controlling the pump unit is generated according to the received flow rate value, and the control signal is transmitted to the pump unit to control the pump A flow rate control unit for adjusting the flow rate of the first raw material supplied to the mixing unit;
   A supply liquid production apparatus comprising:
2. A second flow rate measurement unit for measuring a flow rate of the first raw material supplied to the mixing unit;
   The flow rate control unit performs feedback control so that the flow rate of the first raw material measured by the second flow rate measurement unit matches the flow rate of the supply liquid measured by the flow rate measurement unit. The supply liquid production apparatus as described.
3. A flow controller for determining the flow rate of the second raw material;
   The supply liquid manufacturing apparatus according to claim 2, wherein a production amount of the second raw material is adjusted by the flow rate controller according to a flow rate of the first raw material measured by the second flow rate measurement unit.
4. A mixing section for mixing the first raw material and the second raw material to generate a mixed liquid;
   A booster pump unit that pressurizes the first raw material supplied to the mixing unit;
   A gas-liquid separation tank unit that gas-liquid separates the mixed liquid generated by the mixing unit into a supply liquid supplied to a use point and an exhaust gas discharged from an exhaust port;
   A flow rate measuring unit for measuring a flow rate of the supply liquid supplied from the gas-liquid separation tank unit to the use point;
   A boost control unit that controls the boost pump unit according to the flow rate of the supply liquid measured by the flow rate measurement unit and adjusts the pressure of the first raw material to be supplied to the mixing unit after being boosted;
   An exhaust pressure control unit for controlling the exhaust pressure of the exhaust gas so as to keep the amount of liquid in the gas-liquid separation tank unit constant;
   A supply liquid production apparatus comprising:
5. The supply liquid manufacturing apparatus according to claim 4, further comprising a liquid amount adjusting unit for adjusting a liquid amount in the gas-liquid separation tank unit to be constant.
6. The supply liquid manufacturing apparatus according to claim 4 or 5, wherein the first raw material is water and the second raw material is ozone gas or a chemical raw material.
7. Boosting the first raw material with a booster pump unit and supplying it to the mixing unit;
   Mixing the first raw material and the second raw material in the mixing unit to produce a mixed liquid;
   Gas-liquid separation of the mixed liquid generated by the mixing unit into a supply liquid supplied to a use point and an exhaust gas discharged from an exhaust port in a gas-liquid separation tank unit;
   Measuring the flow rate of the supply liquid supplied from the gas-liquid separation tank unit to the use point;
   According to the measured flow rate of the supply liquid, controlling the booster pump unit to adjust the pressure of the first raw material to be supplied after being pressurized to the mixing unit;
   Controlling the exhaust pressure of the exhaust gas so as to keep the amount of liquid in the gas-liquid separation tank part constant;
   A method for producing a supply liquid, comprising:
8. A mixing section for mixing the first raw material and the second raw material to generate a mixed liquid;
   A pump unit for changing a flow rate of the first raw material supplied to the mixing unit;
   A gas-liquid separation tank unit that gas-liquid separates the mixed liquid generated by the mixing unit into a supply liquid supplied to a use point and an exhaust gas discharged from an exhaust port;
   A first flow rate measurement unit for measuring a flow rate of the supply liquid supplied from the gas-liquid separation tank unit to the use point;
   An exhaust valve for adjusting an exhaust amount of the exhaust gas discharged from the exhaust port;
   The exhaust valve is controlled and discharged from the exhaust port according to the flow rate of the supply liquid measured by the flow rate measurement unit so that the flow rate of the supply liquid supplied to the use point is kept constant. An exhaust control unit for adjusting an exhaust amount of the exhaust gas;
   With
   The exhaust control unit increases the discharge amount of the exhaust gas discharged from the exhaust port when the flow rate of the supply liquid measured by the first flow rate measurement unit increases with respect to the constant flow rate, The supply liquid manufacturing apparatus, wherein when the flow rate of the supply liquid measured by the first flow rate measurement unit decreases with respect to the constant flow rate, the discharge amount of the exhaust gas discharged from the exhaust port is decreased. .
9. In accordance with the flow rate of the supply liquid measured by the first flow rate measurement unit, the flow rate control unit that controls the pump unit and adjusts the flow rate of the first raw material supplied to the mixing unit,
   9. The supply liquid according to claim 8, wherein the flow rate control unit controls the flow rate of the supply liquid measured by the first flow rate measurement unit and the flow rate of the first raw material supplied to the mixing unit to be the same. Manufacturing equipment.
10. The supply liquid manufacturing apparatus according to claim 9, further comprising a second flow rate measuring unit that measures a flow rate of the first raw material supplied to the mixing unit.
11. A liquid amount measuring unit for detecting the amount of liquid in the gas-liquid separation tank unit;
    The boost control unit reduces the flow rate of the first raw material supplied to the mixing unit when the liquid amount in the gas-liquid separation tank unit measured by the liquid amount measuring unit increases with respect to a predetermined liquid amount. The flow rate of the first raw material supplied to the mixing unit is increased when the liquid amount in the gas-liquid separation tank unit measured by the liquid amount measuring unit decreases with respect to a predetermined liquid amount. The supply liquid manufacturing apparatus described in 1.
12. Mixing a first raw material and a second raw material in a mixing unit to produce a mixed liquid;
    Gas-liquid separation of the mixed liquid generated in the mixing unit into a supply liquid supplied to a use point and an exhaust gas discharged from an exhaust port in a gas-liquid separation tank unit;
    Measuring a flow rate of the supply liquid supplied from the gas-liquid separation tank unit to the use point by a first flow rate measurement unit;
    Discharge of the exhaust gas discharged from the exhaust port according to the flow rate of the supply liquid measured by the first flow rate measurement unit so that the flow rate of the supply liquid supplied to the use point is kept constant. Adjusting the amount with the exhaust valve;
    Including
    In the step of adjusting the discharge amount of the exhaust gas, the exhaust gas discharged from the exhaust port when the flow rate of the supply liquid measured by the first flow rate measuring unit increases with respect to the constant flow rate. When the flow rate of the supply liquid measured by the flow rate measurement unit decreases with respect to the constant flow rate, the discharge amount of the exhaust gas discharged from the exhaust port is decreased. Supply liquid manufacturing method.
13. A mixing section for mixing the first raw material and the second raw material to generate a mixed liquid;
    A pump unit for changing a flow rate of the first raw material supplied to the mixing unit;
    A gas-liquid separation tank unit that gas-liquid separates the mixed liquid generated by the mixing unit into a supply liquid supplied to a use point and an exhaust gas discharged from an exhaust port;
    A pressure measuring unit that measures the pressure of the supply liquid supplied from the gas-liquid separation tank unit to the use point, an exhaust valve that adjusts an exhaust amount of the exhaust gas exhausted from the exhaust port, and
    The exhaust valve is controlled and discharged from the exhaust port according to the pressure of the supply liquid measured by the pressure measuring unit so as to keep the pressure of the supply liquid supplied to the use point at a constant pressure. An exhaust control unit for adjusting an exhaust amount of the exhaust gas;
    With
    The exhaust control unit increases the discharge amount of the exhaust gas discharged from the exhaust port when the pressure of the supply liquid measured by the pressure measurement unit increases with respect to the constant pressure, and the pressure measurement An apparatus for producing a supply liquid, wherein the discharge amount of the exhaust gas discharged from the exhaust port is reduced when the pressure of the supply liquid measured in the section decreases with respect to the constant pressure.
14. A first flow rate measurement unit for measuring a flow rate of the supply liquid supplied from the gas-liquid separation tank unit to the use point;
    According to the flow rate of the supply liquid measured by the first flow rate measurement unit, the flow rate control unit that controls the pump unit and adjusts the flow rate of the first raw material supplied to the mixing unit;
    With
    14. The supply liquid according to claim 13, wherein the flow rate control unit controls the flow rate of the supply liquid measured by the first flow rate measurement unit and the flow rate of the first raw material supplied to the mixing unit to be the same. Manufacturing equipment.
15. The supply liquid manufacturing apparatus according to claim 14, further comprising a second flow rate measuring unit that measures a flow rate of the first raw material supplied to the mixing unit.
16. A liquid amount measuring unit for detecting the amount of liquid in the gas-liquid separation tank unit;
    The flow rate control unit reduces the flow rate of the first raw material supplied to the mixing unit when the liquid amount in the gas-liquid separation tank unit measured by the liquid amount measurement unit increases with respect to a predetermined liquid amount. The flow rate of the first raw material supplied to the mixing unit is increased when the liquid amount in the gas-liquid separation tank unit measured by the liquid amount measuring unit decreases with respect to a predetermined liquid amount. The supply liquid manufacturing apparatus described in 1.
17. Mixing the first raw material and the second raw material to produce a mixed liquid in the mixing section;
    Gas-liquid separation of the mixed liquid generated in the mixing unit into a supply liquid supplied to a use point and an exhaust gas discharged from an exhaust port in a gas-liquid separation tank unit;
    Measuring a pressure of the supply liquid supplied from the gas-liquid separation tank unit to the use point by a pressure measuring unit;
    In order to keep the pressure of the supply liquid supplied to the use point at a constant pressure, the discharge amount of the exhaust gas discharged from the exhaust port is set according to the pressure of the supply liquid measured by the pressure measurement unit. Adjusting with the exhaust valve;
    Including
    In the step of adjusting the discharge amount of the exhaust gas, the discharge amount of the exhaust gas discharged from the exhaust port is increased when the pressure of the supply liquid measured by the pressure measuring unit increases with respect to a constant pressure. And a supply liquid manufacturing method for reducing the discharge amount of the exhaust gas discharged from the exhaust port when the pressure of the supply liquid measured by the pressure measuring unit decreases with respect to a constant pressure. .
18. A mixing section for mixing the first raw material and the second raw material to generate a mixed liquid;
    A pump unit for changing a flow rate of the first raw material supplied to the mixing unit;
    A gas-liquid separation tank unit that gas-liquid separates the mixed liquid generated by the mixing unit into a supply liquid supplied to a use point and an exhaust gas discharged from an exhaust port;
    A first flow rate measurement unit for measuring a flow rate of the supply liquid supplied from the gas-liquid separation tank unit to the use point;
    A pressure measuring unit for measuring the pressure of the supply liquid supplied from the gas-liquid separation tank unit to the use point;
    An exhaust valve for adjusting an exhaust amount of the exhaust gas discharged from the exhaust port;
    The exhaust valve is controlled and discharged from the exhaust port according to the flow rate of the supply liquid measured by the first flow rate measurement unit so that the flow rate of the supply liquid supplied to the use point is kept constant. A constant flow rate control unit for adjusting the discharge amount of the exhaust gas to be
    The exhaust valve is controlled and discharged from the exhaust port according to the pressure of the supply liquid measured by the pressure measuring unit so as to keep the pressure of the supply liquid supplied to the use point at a constant pressure. A constant pressure control unit for adjusting the discharge amount of the exhaust gas;
    A constant flow control for adjusting the discharge amount of the exhaust gas by the constant flow control unit;
    A control selection unit for selecting either one of the constant pressure controls for adjusting the discharge amount of the exhaust gas by the constant pressure control unit;
    With
    When the constant flow rate control is selected by the control selection unit, the constant flow rate control unit is configured such that when the flow rate of the supply liquid measured by the first flow rate measurement unit increases with respect to the constant flow rate, The amount of the exhaust gas discharged from the exhaust port is increased, and the amount of the exhaust gas discharged from the exhaust port when the flow rate of the supply liquid measured by the flow rate measurement unit decreases with respect to the constant flow rate. Reduce emissions,
    When the constant pressure control is selected by the control selection unit, the constant pressure control unit is configured so that the pressure of the supply liquid measured by the pressure measurement unit increases when the pressure of the supply liquid increases with respect to the constant pressure. The amount of exhaust gas discharged from the exhaust port when the pressure of the supply liquid measured by the pressure measuring unit decreases with respect to the constant pressure is increased. An apparatus for producing a supply liquid, characterized in that
19. Mixing a first raw material and a second raw material in a mixing unit to produce a mixed liquid;
    Gas-liquid separation of the mixed liquid generated in the mixing unit into a supply liquid supplied to a use point and an exhaust gas discharged from an exhaust port in a gas-liquid separation tank unit;
    Measuring a flow rate of the supply liquid supplied from the gas-liquid separation tank unit to the use point by a flow rate measurement unit;
    Measuring a pressure of the supply liquid supplied from the gas-liquid separation tank unit to the use point by a pressure measuring unit;
    The exhaust valve is controlled and discharged from the exhaust port according to the flow rate of the supply liquid measured by the flow rate measurement unit so that the flow rate of the supply liquid supplied to the use point is kept constant. In accordance with the pressure of the supply liquid measured by the pressure measuring unit so as to keep the pressure of the supply liquid supplied to the use point at a constant pressure, the flow rate constant control for adjusting the discharge amount of the exhaust gas, Selecting one of pressure constant control for controlling the exhaust valve to adjust the discharge amount of the exhaust gas discharged from the exhaust port; and
    Including
    When the constant flow control is selected, the discharge amount of the exhaust gas discharged from the exhaust port is increased when the flow rate of the supply liquid measured by the flow rate measuring unit increases with respect to the constant flow rate. And reducing the discharge amount of the exhaust gas discharged from the exhaust port when the flow rate of the supply liquid measured by the flow rate measurement unit decreases with respect to the constant flow rate,
    When the constant pressure control is selected, the discharge amount of the exhaust gas discharged from the exhaust port is increased when the pressure of the supply liquid measured by the pressure measuring unit increases with respect to the constant pressure. And a method for producing a supply liquid, wherein the discharge amount of the exhaust gas discharged from the exhaust port is reduced when the pressure of the supply liquid measured by the pressure measuring unit decreases with respect to the constant pressure. .

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