WO2017114359A1 - 清洁覆层设施中基底运输机构的方法和设备以及覆层设施 - Google Patents

清洁覆层设施中基底运输机构的方法和设备以及覆层设施 Download PDF

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Publication number
WO2017114359A1
WO2017114359A1 PCT/CN2016/112133 CN2016112133W WO2017114359A1 WO 2017114359 A1 WO2017114359 A1 WO 2017114359A1 CN 2016112133 W CN2016112133 W CN 2016112133W WO 2017114359 A1 WO2017114359 A1 WO 2017114359A1
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WIPO (PCT)
Prior art keywords
transport mechanism
transport
substrate
particles
cladding
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PCT/CN2016/112133
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English (en)
French (fr)
Inventor
米夏勒·哈尔
彭寿
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中国建材国际工程集团有限公司
Ctf太阳能有限公司
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Publication of WO2017114359A1 publication Critical patent/WO2017114359A1/zh

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4407—Cleaning of reactor or reactor parts by using wet or mechanical methods
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating

Definitions

  • the present invention relates to a method and apparatus for cleaning a substrate transport mechanism in a cladding facility during operation of a cladding facility and such a cladding facility.
  • Coating facilities are used, for example, in the semiconductor industry, in the manufacture of solar cells, and in the manufacture of liquid crystal displays or special glass articles, in particular for applying a layer of material to a planar semiconductor substrate, glass substrate or other substrate.
  • the substrate to be coated is for example supported on a shaft or roller and guided past the source of the cladding.
  • the substrate can be in direct mechanical contact with the shaft or the roller or can be supported in a carrier which in turn is supported on a shaft or roller.
  • a cladding source or a plurality of cladding sources are arranged vertically or almost vertically in the installation, wherein the substrate is likewise vertical or almost vertical (for example small in, for example, 7°)
  • the slope is guided from the side of the cladding source.
  • one cladding source or multiple cladding sources are arranged side by side horizontally, wherein the substrate is transported horizontally or under the cladding source (top-down cladding, Top-Down-Be harshung ) Transport either above the cladding source (bottom-up cladding, Bottom-Up-Be harshung).
  • the cladding facility operates either in a vacuum or in a different process atmosphere including air at different pressures.
  • the transport roller or the transport shaft is also exposed to the material flow to a certain extent, so that a parasitic layer is formed on the transport roller or the transport shaft.
  • the radius of the roller or shaft is continuously increased due to the continuous parasitic coating, for example due to a change in the distance of the substrate relative to the cladding source or the thermal or transport of the transport roller or transport shaft to the substrate Changes in electrical interactions can result in changes and/or interference with transport to the substrate and can result in an impact on the cladding process.
  • a reduction in the quality of the substrate coating can occur due to uncontrolled detachment of the particles from the transport rollers or transport shaft.
  • a method for solving this problem is to provide a shielding of the transport roller or the transport shaft relative to the coating source by a structural measure, which is described, for example, in DE 10 2005 016 403 A1.
  • a structural measure which is described, for example, in DE 10 2005 016 403 A1.
  • Another solution is to carry out the transport roller or transport shaft in such a way that the material to be deposited onto the substrate does not adhere to the surface of the transport roller, as described in US 2007/0125304 A1.
  • the adhesion of a material to other materials is related to many factors such as surface roughness, temperature, ambient atmosphere and the presence of charge carriers, even when the transport roller or transport shaft is properly selected. Parasitic coatings also occur in the case of surface materials.
  • the transport rollers or transport axles are adapted according to the prior art and are cleaned off-line, that is to say outside the cladding installation. For this reason, the cladding facility must at least sometimes stop running. It is often necessary to wait for cooling of the components. After replacing the transport roller or transport shaft to be cleaned, the installation must be restarted and, if necessary, entered in a defined state (temperature, pressure, atmosphere). Therefore, this cleaning method requires a long waiting time (for example, approximately 16 hours) and a high cost.
  • the method according to the invention comprises cleaning the transport mechanism during operation of the cladding facility and inside the cladding facility, with the use of a process for detaching the parasitic layer or particles from the transport mechanism in the cladding facility.
  • the transport mechanism is cleaned while the one or more substrates are being coated, that is, online.
  • the cleaning of the transport mechanism can also take place during the time interval between the coating of the two substrates (as long as the coating is not opened for the cleaning of the transport mechanism, nor is it set off for the coating process)
  • Operating parameters, especially temperature and pressure, should also be understood as "cladding facilities are running").
  • the output of the material particles from the cladding source to the cladding facility can be briefly interrupted during the cleaning of the transport mechanism.
  • the cladding source may be covered by a shutter (shear) or may be shielded from a particle beam that causes the particles to be output from the cladding source.
  • the parasitic layer or particles are removed from the transport mechanism by a thermal disengagement process or by a mechanical disengagement process.
  • the transport mechanism is locally heated as follows, ie, Parasitic layers or particles are evaporated from the surface of the transport mechanism.
  • the parasitic layer or particles are preferably removed continuously, that is to say, every revolution of the transport mechanism.
  • the transport mechanism is cleaned at least in one section of the transport mechanism.
  • the section of the transport mechanism is an area having a transport mechanism that is smaller than the entire extended dimension of the transport mechanism along the axis of rotation of the transport mechanism, wherein the section comprises a cross section of the transport mechanism.
  • the entire circumference in the area For example, it is possible to clean only the transport rollers assembled or constructed on the transport shaft, or to clean the transport mechanism at specific times or generally only in a partial area of the transport mechanism along the entire extended dimension of the axis of rotation. However, it is also possible to simultaneously clean the entire transport mechanism over the entire extension of the transport mechanism along the axis of rotation.
  • the equipment required for this purpose is adapted to the particular design of the method and the use of the parasitic layer or particles used herein. Process.
  • transport mechanism all components of the cladding installation for transporting the substrate, which are here fixed and rotating, and subjected to a parasitic coating inside the cladding installation, are referred to by the term "transport mechanism". It relates in particular to transport rollers, transport shafts, rollers, bushings and other parts which are connected to the transport rollers and/or the transport shaft and which are inside the cladding installation.
  • transport rollers transport shafts, rollers, bushings and other parts which are connected to the transport rollers and/or the transport shaft and which are inside the cladding installation.
  • only a single, multiple or all parts of the transport mechanism can be cleaned by means of the method and device according to the invention.
  • the method and apparatus according to the invention are suitable for all types of cladding installations, for vertical installations as well as for different types of horizontal installations, especially for bottom-up installations.
  • the parasitic layer or particles are removed from the transport mechanism by a mechanical detachment process.
  • this takes place by means of at least one component that is mechanically applied to the transport mechanism, which removes the parasitic layers or particles from the rotating transport mechanism.
  • the mechanically acting component is preferably a brush or a doctor blade.
  • at least one of the mechanically acting components is arranged relative to the transport mechanism such that the detached (removed) particles of the parasitic layer or the detached portions do not accumulate on the surface of the substrate.
  • the parasitic layers or particles of the transport mechanism on the side opposite the substrate in the cross section of the transport mechanism are removed.
  • the cross section of the transport mechanism is understood to be transverse to the cross section of the transport mechanism transverse to the axis of rotation of the transport mechanism.
  • the mechanically acting component and the detached particles in the vicinity of the transport mechanism are removed from the coating facility by means of a suction device so that the particles do not reach the surface of the substrate nor reach the source of the coating or The path between the cladding source and the surface of the substrate, and therefore does not adversely affect the coating process.
  • a suction device can in particular be advantageously used in a cladding installation that does not operate in a vacuum.
  • the following material is selected as the material for the surface of the transport mechanism from which the parasitic layer or particles are to be mechanically removed, on which the coating is adhered to the substrate
  • the material to be applied to the substrate in the facility is more difficult to adhere to.
  • the entire transport mechanism can be constructed of selected materials, or the transport mechanism can have a corresponding layer of selected material on its outer surface at least at the point where the parasitic layer or particle cleaning is to be cleaned.
  • graphite, pure quartz glass or fused silica is particularly suitable as such a material, of which pure quartz glass and graphite are particularly preferred, and graphite in the form of glassy carbon is completely particularly preferred.
  • the parasitic layer or particles are removed from the transport mechanism by a thermal detachment process.
  • the transport mechanism is locally heated in such a way that the parasitic layer or particles are evaporated from the surface of the transport mechanism.
  • “Partial” means that the transport mechanism is not heated over the entire cross section of the transport mechanism, but only in the region of the section to be cleaned which is adjacent to the circumference of the cross section in cross section.
  • the region of the section here has a smaller length along the circumference of the cross section than the entire circumference of the cross section and is, for example, a circular arc-shaped or sector-shaped region of the cross section or a partial region of such a region.
  • the transport mechanism can also be heated in different regions of the one or more spaced apart sections along the extent of the transport mechanism in the direction of the axis of rotation of the transport mechanism. All areas of the cross section of the section of the transport mechanism to be cleaned are heated and cleaned in time due to the rotation of the transport mechanism.
  • the temperature of the transport mechanism is locally increased above the temperature of the substrate by a value in the range between 50K and 100K.
  • the transport mechanism is heated to, for example, the same temperature as the substrate to be coated (the average temperature of the transport mechanism).
  • the temperature is increased locally in at least one section of the surface of the transport mechanism by introducing thermal energy into the transport mechanism or generating thermal energy in the transport mechanism.
  • the thermal energy necessary for the thermal detachment process is generated by means of laser radiation in the transport mechanism.
  • the coupled laser power is absorbed by the material of the parasitic layer or of the particles and results in a strong, but very short and spatially limited heating of the material of the parasitic layer or particles, so that the parasitic layer or particles The material evaporates from the warmed surface of the transport mechanism.
  • the wavelength of the laser used matches the material of the parasitic layer or particle to be removed. Therefore, the corresponding material can be removed from the surface of the transport mechanism very efficiently without damaging the transport mechanism.
  • the laser used is operated in pulse mode with a pulse length in the range of 0.1 ns to 300 ns, particularly preferably in the range of 1 ns to 30 ns. Therefore, all of the energy input into the transport mechanism is kept small and it is ensured that the heated local area of the transport mechanism or transport mechanism is rapidly cooled after the laser treatment.
  • the thermal energy necessary for the thermal detachment process is introduced into the transport mechanism via a local heat source arranged in the vicinity of the transport mechanism.
  • the thermal energy from the local heat source is mainly transmitted via thermal radiation to a partial area of the surface of the transport mechanism.
  • thermal detachment process it is advantageous to generate thermal energy or heat energy in the transport mechanism at a position near the point of contact of the surface of the transport mechanism with the substrate and behind the contact point in the direction of rotation.
  • the specific position of the surface of the transport mechanism should be heated during the rotation of the transport mechanism, shortly after it comes into contact with the substrate or shortly after it leaves the substrate, so that the temperature of the surface of the transport mechanism in this position is as follows Intense warming, i.e., a thermal detachment process of the parasitic layer or particles occurs, wherein the temperature of the particular location during its remaining rotational path until the next contact with the substrate is again adapted to the average temperature of the transport mechanism.
  • Position is here understood to be a restricted, defined location on the surface of the transport mechanism.
  • the position can be embodied in the form of a point or a linear extension in the cross section of the transport device.
  • the position can be extended in a linear or planar manner or only in the shape of a point in the direction of the axis of rotation of the transport mechanism of the transport unit.
  • the apparatus for cleaning a transport mechanism according to the present invention is at least partially disposed inside the cladding facility and is suitable for use in the case of mechanical or locally limited thermal detachment processes utilizing parasitic layers or particles from the transport mechanism From the transport agency during the operation of the cladding facility At least one section of the strip removes parasitic layers or particles.
  • the device has means for mechanically acting on the transport mechanism or means for locally heating at least one section of the surface of the transport mechanism.
  • the device comprises at least one such component or a device arranged inside the cladding facility.
  • the part of the device inside the cladding installation is arranged stationary or movably inside the cladding installation.
  • the movable part of the device and which is inside the coating installation can, for example, be moved along the axis of rotation of the transport mechanism, so that the different sections of the transport mechanism along the extent of their extent in the direction of the rotational axis are in operation in time.
  • the equipment is clean.
  • the device may also comprise a plurality of mechanically acting components or a plurality of devices for locally heating the transport mechanism, wherein each of these components or devices is associated with a particular section of the transport mechanism. Therefore, different sections of the transport mechanism can be cleaned simultaneously.
  • the apparatus comprises at least one mechanically acting component, preferably a brush or doctor blade, which mechanically removes the parasitic layers or particles to be removed from the transport mechanism.
  • the mechanically acting components are arranged with respect to the transport mechanism such that the worn-out portions of the particles or parasitic layers that are worn away do not accumulate on the surface of the substrate.
  • the mechanically acting component is preferably arranged on the side of the transport mechanism which is situated opposite the base in the cross section of the transport mechanism.
  • the apparatus further comprises a suction device adapted to remove the worn-out portion of the worn (disengaged) particles or parasitic layers from the cladding facility.
  • the suction device is advantageously arranged in the vicinity of the mechanically acting component such that the detached particles neither reach the surface of the substrate nor reach the path between the source of the cladding or the source of the coating and the surface of the substrate, and therefore Will adversely affect the coating process.
  • an apparatus for cleaning a transport mechanism includes a laser, a control unit, and means for introducing laser power into the transport mechanism, wherein the control unit is adapted to control the introduced laser power as follows, That is, the transport mechanism is locally heated and the parasitic layers or particles are evaporated from the transport mechanism by the introduced laser power.
  • the laser is advantageously arranged outside the cladding installation and is used for the laser
  • the means for introducing power into the transport mechanism comprises a light guide, preferably a fiberglass, extending into the cladding facility.
  • the apparatus for cleaning the transport mechanism by means of a laser ablator is adapted to provide light having a wavelength that matches the material of the parasitic layer or particles to be removed.
  • the means for introducing laser power comprises at least two light guides for introducing laser power into the transport mechanism and for distributing the laser power generated by the laser to the at least two light guides sequentially or simultaneously.
  • the apparatus for cleaning the transport mechanism includes a localized heat source that is disposed relative to the transport mechanism as follows, that is, locally heats the transport mechanism and transports the parasitic layers or particles from the introduced thermal energy.
  • the mechanism evaporates.
  • the local heat source introduces thermal energy into the transport mechanism mainly by means of thermal radiation.
  • the apparatus of this embodiment comprises at least one electrical conductor adapted to convert electrical energy into thermal energy and output the thermal energy into the surrounding environment and a current source or voltage source adapted to generate a passing current through the conductor.
  • at least one section of the electrical conductor forms a local heat source.
  • the electrical conductor comprises at least two conductor sections which have different electrical conductivity values and are assigned to specific sections of the transport mechanism and are arranged relative to this particular section of the transport mechanism.
  • more electrical energy is converted to Joule heat than in a conductor segment having a relatively larger electrical conductivity value.
  • a conductor segment having a small electrical conductivity value is associated with a section of the transport mechanism that should be cleaned by evaporation of parasitic layers or particles, while a conductor segment having a large electrical conductivity value assigned to the transport mechanism should not be in this manner.
  • the different electrical conductivity values can be adjusted by different factors, for example by selecting the conductor material, that is to say the conductivity of the material, or by the cross-sectional area of the conductor in a particular conductor section.
  • the length of a particular conductor section, but if necessary also the width of such a conductor section is primarily corresponding to the transport mechanism
  • the size of the associated section is related. In this case, the length of the extension of the conductor section or of the transport section along the axis of rotation is measured, while the width is measured transversely to the axis of rotation.
  • the means for introducing laser power or a partial heat source is arranged relative to the transport mechanism such that laser power or thermal energy is situated near the point of contact of the surface of the transport mechanism with the substrate and in the direction of rotation. The rear position is introduced into the rotating transport mechanism.
  • the coating installation according to the invention comprises means for coating the substrate, at least one transport mechanism for transporting the substrate in the cladding installation, and at least one previously described apparatus for cleaning at least one transport mechanism.
  • Most of the cladding facilities typically used contain multiple transport mechanisms, such as multiple transport axles or transport rollers.
  • the coating facility according to the invention may also comprise a plurality of identical and/or plurality of different devices for cleaning the transport mechanism as previously described, wherein the particular device can only be used to clean specific
  • the transport mechanism can also be used to clean multiple identical or different transport agencies.
  • the equipment for cleaning moves from a specific transport mechanism to other specific transport mechanisms inside the cladding facility, thereby sequentially cleaning different transport mechanisms in time.
  • the specific cleaning device comprises a plurality of mechanically acting components or a plurality of devices for the local heating of the transport device, which are each assigned to a different transport device, wherein the device for cleaning One, more or all of the other parts are used by a plurality of these mechanical components or devices for localized heating.
  • a plurality of brushes may be arranged on a common brush holder, the laser being connected to a plurality of means for introducing laser power into the transport mechanism, or a voltage source or current source being connected to a plurality of local heat sources.
  • a plurality of different devices for cleaning a specific transport device can be combined, wherein the devices simultaneously clean different sections of the transport mechanism in time, or sequentially clean the transport mechanism in time. The same section.
  • At least one device for cleaning the transport mechanism is a device that mechanically disengages the parasitic layer or particles. Therefore, the surface of the transport mechanism associated with or cleaned by the device is at least in the section where the parasitic layer or particles should be removed.
  • the composition is such that, on the material, the material to be applied to the substrate in the cladding facility is more difficult to adhere than when adhered to the substrate.
  • the material is a suitable variant of graphite, pure quartz glass or fused silica, preferably a suitable variant of graphite or pure quartz glass, and particularly preferably graphite in the form of glassy carbon.
  • At least the section of the transport mechanism that should be cleaned is made of a material on which The material to be applied to the substrate in the cladding facility is more difficult to adhere than when adhered to the substrate.
  • Figure 1 shows a schematic diagram for illustrating a method with method step S2 according to the invention
  • Figure 2 shows a longitudinal section through a cladding installation 1 having two exemplary apparatus 5 for cleaning a transport mechanism 4 in which mechanical cleaning is performed;
  • Figure 3 shows a cross section through the cladding facility of Figure 2 along the cutting line A-A';
  • Figure 4 shows a section through the transport mechanism 4c of Figure 2 and the apparatus 52 for cleaning the transport mechanism along the cutting line B-B';
  • Figure 5 shows a schematic view of a cladding installation 1 having a transport mechanism 4 and means 5 for thermally cleaning the transport mechanism by means of a laser ablator;
  • Figure 6 shows a schematic view for showing the position 546 of the cleaning device of Figure 5, in which laser power is introduced into the transport mechanism 4;
  • Figure 7 shows a schematic view of a cladding installation 1 having a transport mechanism 4 and another apparatus 5 for thermally cleaning the transport mechanism by means of a local heat source;
  • Figures 8a to 8d respectively show enlarged views of section C of conductor segments 552 and 553 of Figure 7 having different designs
  • FIG. 9 shows a schematic view for showing a position 557 for the device 5 for cleaning of FIG. 7 in which thermal radiation is introduced into the transport mechanism 4.
  • FIG. 1 schematically shows the joining of a method step S2 according to the invention to the operation of a cladding installation in which one or more substrate cladding materials are applied.
  • one or more parasitic layers or parasitic particles S1 are formed on the surface of the transport mechanism that moves the one or more substrates in the cladding facility.
  • one or more parasitic layers or particles are removed from the surface of the transport mechanism directly during operation of the cladding facility (S2), wherein the parasitic layers or particles are continuously or only at defined times Remove.
  • the parasitic layers or particles are removed in the cladding facility by mechanical or thermal detachment processes.
  • Figure 2 shows a longitudinal section through a cladding installation 1 having two exemplary apparatus 5 for cleaning a transport mechanism 4 in which mechanical cleaning is performed.
  • the illustrated cladding facility 1 is a bottom-up horizontal installation and has a cladding chamber 10 in which the substrate 2 moves across the cladding source by means of the transport mechanism 4 in the transport direction 20 (x-direction) of the substrate 3.
  • material particles from the cladding source 3 are deposited on the surface of the substrate 2 facing the cladding source 3, which is schematically illustrated in Figure 2 by dashed arrows.
  • the cladding facility has other components, such as gates, vacuum pumps and air inlets with respective coupling ends leading to the cladding chamber 10, heating or heat dissipating components and control elements, which are arranged in the cladding.
  • components such as gates, vacuum pumps and air inlets with respective coupling ends leading to the cladding chamber 10, heating or heat dissipating components and control elements, which are arranged in the cladding.
  • FIG. 2 Four column-shaped transport mechanisms 4 (4a to 4d) are exemplarily shown in Fig. 2, wherein the transport mechanisms 4b and 4c arranged closest to the cladding source 3 constitute a parasitic layer or particles to a particular extent.
  • the transport mechanisms 4b and 4c arranged closest to the cladding source 3 constitute a parasitic layer or particles to a particular extent.
  • the circumferential side of the transport means 4b, 4c should be cleaned, but the top surface extending perpendicular to the axis of rotation of the transport means 4b, 4c can also be at least partially cleaned.
  • cleaning of the transport mechanisms 4b and 4c is achieved by means of a cleaning device 5 that mechanically acts on the surface of the respective transport mechanism.
  • the doctor blade 51 is shown for the transport mechanism 4b, the tip of which scrapes off the parasitic layer or particles from the surface of the transport mechanism 4b, and the transport mechanism 4c shows a brush 52 which brushes off the parasitic layer or particles from the surface of the transport mechanism 4c.
  • Two devices 5 for cleaning are here as follows Arranged in such a way that they remove parasitic layers or particles on the opposite side of the transport means 4b, 4c from the substrate 2 during the rotation of the transport means 4b, 4c.
  • the oppositely opposite sides of the transport mechanisms 4b, 4c should be understood as each of the following points on the circumferential side or top surface of the transport mechanism 4b, 4c, which pass through the transport mechanism transverse to the axis of rotation of the transport mechanisms 4b, 4c
  • the cross-section of 4b, 4c has an angle of at least -90° or less or equal to +90° with respect to the perpendicular (z direction) at the contact point of the transport mechanism 4b, 4c with the substrate 2 on the surface of the substrate 2.
  • the apparatus 5 for cleaning can also be inclined with respect to the surface of the substrate 2 or the transport direction 20 of the substrate 2, that is, at an angle greater than or equal to 90° and less than or equal to 270° with respect to the surface of the substrate 2.
  • Alpha (90° ⁇ ⁇ ⁇ 270°, as measured in the contact points of the transport mechanisms 4b, 4c and the substrate 2) is arranged, as exemplarily shown for the brush 52.
  • the arrangement on the side of the transport mechanism 4 opposite the substrate 2 by means of the device 5 for cleaning should ensure that the abrasive particles, that is to say the particles detached from the transport mechanism 4, do not accumulate as dust on the substrate in an undesired manner. on.
  • a suction device arranged in the vicinity of the device 5 for cleaning. 53, as this is shown schematically in Figure 2.
  • the suction device 53 removes the detached particles from the coating chamber 10.
  • the device 5 for cleaning and the suction device 53 are arranged in the wall or on the wall of the cladding chamber 10 or in other suitable manner inside the interior, wherein the wall is understood to be all the boundary faces of the cladding chamber 10, That is the side wall, the top and the bottom. Both the device 5 for cleaning and the suction device 53 are capable of moving in the x-direction, the y-direction and/or the z-direction inside the chamber, and in a manner capable of pivoting around one, more or all of these directions. Furthermore, it is also possible to rotate the device 5 about an axis which corresponds to a perpendicular line (line BB' in Fig.
  • the device 5 for cleaning and/or the suction device 53 can be packaged It includes components such as a motor and a control unit that can be disposed inside or outside the cladding chamber 10.
  • Figure 3 shows a cross section through the cladding facility of Figure 2 along the cutting line A-A'.
  • the transport mechanism 4 has a transport shaft 41 and a plurality of, for example five transport rollers 42 , 43 arranged or constructed on the surface of the transport shaft 41 , wherein the transport rollers 42 have, for example, a diameter of 80 mm and (measured in the y direction) It is approximately 3mm width.
  • the inner transport roller 42 supports the base 2 from below during transport of the substrate through the cladding facility, while the outer transport roller 43 has a larger radius than the inner transport roller 42 and prevents the base 2 from moving along the transport mechanism The extended size of 4, that is, slipping in the y direction.
  • the substrate 2 is preferably coated over its entire width (in the y-direction) by a cladding source 3 such that the inner transport roller 42 and at least the outer transport roller 43 are oriented inwardly facing the transport roller 42
  • the side is covered by a coating.
  • a transport roller 42 having a diameter of 80 mm is coated with a CdTe layer at a peripheral speed of approximately 1.85 m/min, and a CdTe layer is applied to the substrate 2, and the CdTe layer is at each revolution of the transport roller 42.
  • a loop it has a thickness of between 0.02 ⁇ m and 0.18 ⁇ m, preferably between 0.05 ⁇ m and 0.08 ⁇ m.
  • the outer side of the outer transport roller 43 and the shaft end portion 44 and the shaft support portion 45 by which the transport shaft 41 is held and supported in the wall of the cladding chamber 10 are coated with a very small amount. Therefore, cleaning of the inner transport roller 42 and the outer transport roller 43 is necessary in order to avoid a negative effect on the coating process of the substrate 2. However, it is also possible to clean other parts of the transport mechanism 4 continuously or at any time.
  • Figure 4 shows a section through the transport line 4c of Figure 2 and the brush 52 for cleaning the transport mechanism along the cutting line B-B in Figure 2, by means of which the embodiment of the brush 52 should be explained.
  • the brush 52 has a brush holder 521 and a plurality of brush heads 522 arranged on the brush holder, wherein each brush head 522 is associated with a specific transport roller 42 or 43 and from the respective associated transport roller 42 Or 43 remove the parasitic layer or particles.
  • the brush holder 521 is arranged in a suitable manner, for example held or supported inside the cladding, and can be moved inside the cladding as described with reference to FIG.
  • the brush head 522 is preferably slightly wider than the associated associated transport rollers 42, 43 so that the parasitic layers or particles are from the entire base of the transport rollers 42, 43 The bottom 2 is removed on the contact surface.
  • the width of the brush head 522 or the transport rollers 42, 43 is understood to be the extent of the brush head 522 or transport rollers 42, 43 in the direction along the axis of rotation of the transport shaft 41 (dotted line), respectively.
  • the brush head 522 has a profile over its width, so that the sides of the transport rollers 42, 43 can also be free of parasitic layers or particles.
  • the brush 52 can have other brush heads for cleaning the transport shaft 42 or the shaft end 44. It is also possible to provide only one brush head 522 which is moved along the transport mechanism 4c in an extended dimension in the direction of the axis of rotation of the transport mechanism and which in turn cleans the individual components of the transport mechanism 4c in time.
  • the doctor blade 51 of Fig. 2 can also be realized in a similar manner by a carrier and a plurality of doctor blades arranged on the carrier, as this is shown for the brush 52 in Fig. 4.
  • At least the component of the transport mechanism 4 that should be cleaned is made of a material having a material on the surface of the component, on which the cladding facility is adhered to the substrate 2
  • the material deposited on the substrate 2 in 1 is more difficult to adhere. Therefore, it is easy to clean the transport mechanism 4, thereby largely avoiding damage to the transport mechanism 4 due to mechanically acting components of the apparatus 5 for cleaning.
  • the present invention also includes methods and apparatus in which a thermal detachment process is utilized.
  • Figure 5 shows a schematic view of a cladding installation 1 having a transport mechanism 4 and a device 5 for thermally cleaning the transport mechanism 4.
  • the device 5 for cleaning is embodied as a device 54 for laser ablation and comprises a laser 540, a control unit 545 and A device that introduces laser power into the transport mechanism 4.
  • the means for introducing laser power into the transport mechanism 4 has an optical multiplexer or beam splitter 542, a light guide 541, and a plurality of additional light guides 543, wherein the light guide directs the laser from the laser 540 to optical multiplexing A consumer or beam splitter 542, a plurality of additional light guides direct laser light from the optical multiplexer or beam splitter 542 to the transport mechanism 4 and introduce laser power into a defined section in the transport mechanism 4.
  • These further light guides 543 are embodied as glass fibers in the embodiment shown, wherein only two glass fibers 543a, 543b are shown, wherein the glass fibers 543a transmit laser power to the outer transport rollers 43, The glass fibers 543b deliver laser power to the inner first transport roller 42 shown therein.
  • each light guide 543 is associated with a particular section of the transport mechanism 4.
  • the necessary temperature in a particular section is limited in terms of the necessary power in the corresponding light guide 543.
  • the laser 540, optical multiplexer or beam splitter 542, and light guide 541 and control unit 545 are advantageously disposed outside of the cladding facility 10.
  • the light guides 543 are introduced into the cladding chamber 10 by means of a vacuum penetration 544 and can be arranged on a common carrier. If only one light guide 543 is introduced into the cladding chamber 10, the optical multiplexer or beam splitter 542 and the light guide 541 can be omitted.
  • the laser power of the locally heated or warmed-out transport roller 43 and the inner first transport roller 42 and, if appropriate, the further part of the transport mechanism 4 for example also via the additional light guide 543 Additional inner and outer transport rollers are introduced therein to detach the parasitic layers or particles, such as evaporating.
  • the heating of the transport mechanism can be particularly well limited.
  • only the portion of the transport mechanism 4 that is in direct contact with the substrate, such as the transport rollers 42, 43 is warmed up in this manner, however, obviously, other regions or sections of the transport mechanism 4, such as the transport axle, are necessary when necessary.
  • the region of the 41 or shaft end 44 can also be heated by the laser power.
  • the laser power of the laser 540 can be pulsed to precisely control the value of the thermal energy generated in the transport mechanism 4 and can be by means of an optical multiplexer or sub-
  • the bundles 542 are sequentially or simultaneously dispensed onto different glass fibers 543a, 543b in time to heat the respective transport rollers 42, 43.
  • the wavelength of the laser produced can be matched to the material to be removed.
  • a typical TCO layer Transparent Conductive Oxide
  • ITO Indium Tin Oxide
  • FTO Fluorine-doped Tin Oxide
  • the tin is stripped, and the light having a wavelength of 512 nm is particularly well absorbed by the CdTe layer or the CdS layer, so that the respective layers can be selectively stripped with respect to other materials, respectively.
  • Control unit 545 is used to control laser 540 and/or optical multiplexer or beam splitter 542.
  • the position 546 for the apparatus for cleaning of FIG. 5 is explained in detail with reference to FIG. 6, in which laser power is introduced into the transport mechanism 4.
  • the base 2, the cover source 3, the transport mechanism 4 rotating in the direction of the arrow, and the laser and thus the laser are shown in a schematic view showing a section formed by a longitudinal section through the cladding installation. Power is transferred to the glass fibers 543 on the transport mechanism 4.
  • Location 546 is also shown.
  • a position 546, also referred to as a "hot spot” is a position on the surface of the transport mechanism 4 in which the laser light from the glass fiber 543 is absorbed and converted into thermal energy.
  • Position 546 is preferably located adjacent the point of contact 547 of the surface of transport mechanism 4 with substrate 2 and behind contact point 547 in the direction of rotation of transport mechanism 4. It is therefore ensured that, in addition to the position 546 of the transport mechanism 4, the locally warmed region of the region of the transport mechanism 4 which is adjacent to the position of the cross section of the transport mechanism 4 is moved away from the base 2 by the rotation of the transport mechanism 4 and is rotating During this time, it is cooled again to the average temperature of the transport mechanism 4, so that the transport mechanism does not inadvertently heat the substrate 2 in the next contact with the substrate 2. During the rotation of the transport mechanism 4, the coupled laser energy is also transferred to other areas of the transport mechanism 4 by thermal conduction, and thus it may be advantageous to maintain the desired average temperature of the transport mechanism 4.
  • Figure 7 shows a further apparatus 5 for thermally cleaning a transport mechanism, wherein local warming of the transport mechanism for a thermal detachment process is achieved by one or more local heat sources.
  • a coating installation 1 having a cladding chamber 10, a transport mechanism 4 and a device 5 for thermally cleaning the transport mechanism 4 is schematically illustrated, the transport mechanism having a transport axle 41.
  • a plurality of inner transport rollers 42, two outer transport rollers 43 and two shaft ends 44, and the two shaft ends are supported in the cladding chamber 10 via two shaft supports 45.
  • Apparatus 5 is a localized heat source comprising a carrier 551 of electrically insulating material such as ceramic, fused silica, quartz glass, mica or different carbides, a current source or voltage source 556, and an electrical coupling end 554 and vacuum penetration 555, the carrier has an electrical conductor disposed thereon.
  • the electrical conductor disposed on the carrier 551 includes a plurality of conductor segments 552 having a high electrical conductivity value and a plurality of conductor segments 553 having a low electrical conductivity value, and current via the electrical coupling terminal 554
  • the source or voltage source 556 is connected, and the electrical connection end is guided to the outside of the cladding chamber 10 through the vacuum penetration portion 555.
  • Each conductor section 553 is spaced apart from the other conductor sections 553 by the extent of the conductor section 552 along the transport mechanism 4 in the direction of its axis of rotation, and is respectively arranged relative to the transport rollers 42 , 43 to be cleaned, and These particular transport rollers 42, 43 are associated.
  • Each of the conductor segments 552 and 553 acts as a series resistor, with current flowing through them when the circuit is closed.
  • conductor section 553 a significant amount of electrical energy is converted to Joule heat, while conductor section 552 is significantly less warmed.
  • the conductor section 553 serves as a local heat source for the transport rollers 42, 43 respectively associated with the local heat source, and these transport rollers are strongly heated as follows, ie the parasitic layers or particles are detached.
  • the electrical conductivity of each conductor section 552, 553 can be precisely matched to the requirements of the section of the transport mechanism 4 assigned to the electrical conductivity.
  • the electrical conductors in all of the conductor segments 552, 553 are made of a self-conducting material, such as graphite or a refractory such as titanium, zirconium, hafnium, vanadium, niobium, tantalum, chromium, molybdenum or tungsten.
  • a self-conducting material such as graphite or a refractory such as titanium, zirconium, hafnium, vanadium, niobium, tantalum, chromium, molybdenum or tungsten.
  • Metals or alloys of these metals or of other alloying elements are produced, wherein different electrical conductivity values of different conductor segments are achieved by different geometrical dimensions. It is of course possible to use all other metal or non-metallic substances in addition to the electrically conductive substances mentioned, as long as the vapor pressure is sufficiently small at the respective use temperatures in order to avoid evaporation of the substance just to the transport means.
  • the conductor segments 553 are arranged in such a way that the conductor segments form a flat surface with the conductor segments 552.
  • the conductor section 553 can be embodied as a thin filament similar to the filament in an incandescent lamp in both Figures 8a and 8b.
  • the conductor section 553 having a low electrical conductivity value has the same thickness d as the conductor section 552 having a high electrical conductivity value (wherein the conductor Since the thickness of the surrounding material section 553 and the carrier 551 is not visible in the drawings), but for this purpose it has two significantly smaller than the width of the material section 552 b of the conductor material width b 1 (b 1 ⁇ b 2 ). It is also possible to reduce the thickness and width of the material in the conductor section 553 at the same time.
  • the electrical conductors in conductor section 553 are produced from a material having a low electrical conductivity ⁇ 1 , such as graphite of a lower density and conductivity, while the material of the electrical conductors in conductor section 552 has a high The conductivity ⁇ 2 , such as molybdenum.
  • the material in the conductor section 553 can be constructed in such a way that it forms a flat surface with the conductor section 552, as shown in FIG. 8d.
  • the geometrical dimensions of the conductor segments 552 and 553 can also differ from one another, as described with reference to Figures 8a to 8c, in order to increase the difference in electrical conductivity between the conductor segments 552 and 553.
  • the length of the particular conductor section 553 is determined as follows and is associated with the transport device 4 .
  • the width of the section to be cleaned for example the width of the transport rollers 42, 43 is matched, ie the heat generated by the conductor section 553 is mainly transmitted only to the particular section of the transport mechanism 4 to be cleaned by means of thermal radiation. .
  • Figure 9 shows a preferred arrangement of the partial heat source 55 of Figure 7 with respect to the transport mechanism 4 in the cladding chamber.
  • the base 2, the cover source 3, the transport mechanism 4 rotating in the direction of the arrow, and the carrier 551 are shown in a schematic view showing a section formed by a longitudinal section through the cladding installation.
  • a position 557 is shown in which thermal radiation is introduced into the transport mechanism 4 from the conductor section 553.
  • a position 557 also referred to as a "hot spot" is a position on the surface of the transport mechanism 4 in which heat radiation is absorbed and the transport mechanism is warmed.
  • the location 557 is preferably located adjacent the contact point 558 of the surface of the transport mechanism 4 with the substrate 2 and behind the contact point 558 in the direction of rotation of the transport mechanism 4. It is therefore ensured that the locally warmed area of the transport mechanism 4 moves away from the substrate 2 due to the rotation of the transport mechanism 4 and is cooled again to the average temperature of the transport mechanism 4 during rotation, so that the transport mechanism is next to the substrate 2
  • the substrate 2 is not inadvertently heated during contact.
  • the introduced thermal energy is also transferred to other areas of the transport mechanism 4 by thermal conduction, and thus it may be advantageous to maintain the desired average temperature of the transport mechanism 4.

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Abstract

一种用于清洁位置固定的、旋转的、适用于在覆层设施（1）中对基底（2）进行运输的运输机构（4，4a-4d）的方法，至少在运输机构（4，4a-4d）的一个区段中，在利用使寄生层或颗粒从运输机构（4，4a-4d）脱离的工艺的情况下在覆层设施（1）运行期间并且在覆层设施（1）内部对运输机构（4，4a-4d）进行清洁，其中，通过热学上的脱离工艺或者通过机械式的脱离工艺从运输机构（4，4a-4d）去除掉寄生层或颗粒，在热学上的脱离工艺中，运输机构（4，4a-4d）在局部被如下这样地强烈加热，即，使寄生层或颗粒从运输机构（4，4a-4d）的表面蒸发掉。以及一种用于清洁位置固定的、旋转的、适用于在覆层设施（1）中对基底（2）进行运输的运输机构（4，4a-4d）的设备（5）和一种覆层设施（1）。

Description

清洁覆层设施中基底运输机构的方法和设备以及覆层设施 技术领域
本发明涉及用于在覆层设施运行期间清洁覆层设施中的基底运输机构的方法和设备以及这种覆层设施。覆层设施例如在半导体行业、太阳能电池制造中并且在制造液晶显示器或特殊玻璃制品时尤其用于将材料层施加到面式的半导体基底、玻璃基底或其它的基底上。
背景技术
为了将薄的材料层沉积在玻璃基底或其它板形的或面式的基底上，主要使用连续作业的覆层设施，例如溅射设施、CVD设施(化学气相沉积，Chemical Vapour Deposition)、尤其还使用等离子CVD设施或热蒸镀设施，尤其还使用CSS设施(近空间升华，Closed-Space Sublimation)。在这些设施中，待覆层的基底例如支承在轴或滚子上，并且从覆层源旁引导经过。在此，基底可以与轴或滚子直接机械式地接触，或者支承在载体(Carrier)中，载体又支承在轴或滚子上。在立式设施中，一个覆层源或多个覆层源竖直地或几乎竖直地布置在该设施中，其中，基底同样竖直地或几乎竖直地(比如以例如7°的小的倾斜度)从覆层源旁边引导经过。相反地，在卧式设施中，一个覆层源或多个覆层源水平地并排布置，其中，基底处于水平地要么在覆层源下方运输(自上而下覆层，Top-Down-Beschichtung)要么在覆层源上方运输(自下而上覆层，Bottom-Up-Beschichtung)。覆层设施要么以真空来作业要么以在不同的压力的情况下的包括空气在内的不同的工艺氛围来作业。
在对基底进行覆层期间，运输滚子或运输轴在一定的程度中也暴露在材料流中，从而出现了在运输滚子或运输轴上构成寄生层。由于持续的寄生式覆层而连续增大了滚子或轴的半径，这例如由于基底相对于覆层源的距离的改变或者运输滚子或运输轴与基底的热学上的或 电学上的相互作用的改变会导致改变和/或干扰对基底的运输并且会导致对覆层过程造成影响。此外，由于颗粒从运输滚子或运输轴不受控制的脱离也会出现基底覆层质量的降低。
用于解决该问题的方式是通过结构上的措施使运输滚子或运输轴相对覆层源产生屏蔽，这例如在DE 10 2005 016 403 A1中有所描述。借此，虽然可以经常降低对运输滚子或运输轴的不期望的寄生式覆层，但这些措施是昂贵的并且会导致其他方面的缺点。尤其是在自下而上的设施中，其中的运输滚子或运输轴布置在基底的待覆层的侧上，使得用于屏蔽的结构上的措施几乎不能够实现。
另一方案是以如下方式实施运输滚子或运输轴，即，使所要沉积到基底上的材料不粘附在运输滚子的表面上，这在US 2007/0125304 A1中有所描述。然而，一种材料在其他的材料上的粘附与许多因素(例如表面粗糙度、温度、周围环境氛围和电荷载流子的存在性)有关，从而即使在适当选择运输滚子或运输轴的表面材料的情况下也出现寄生覆层。
因此必要的是，至少在覆层达到限定的厚度时从运输滚子或运输轴上去除掉寄生覆层。为此目的，根据现有技术对运输滚子或运输轴进行改造，并且离线地，也就是在覆层设施外进行清洁。为此，覆层设施必须至少有时停止运行。经常还要等待对设施部件进行冷却。在更换待清洁的运输滚子或运输轴之后，必须重新启动设施并且必要时进入限定的状态(温度、压力、氛围)下。因此，该清洁方式需要长的等待时间(例如大致16小时)和高的费用。
发明内容
因此，本发明的任务是，提供一种用于清洁覆层设施中的运输滚子或运输轴的方法和针对于此的设备以及一种覆层设施，利用它们可以避免或减少现有技术的缺点。
任务通过根据权利要求1的方法、通过根据权利要求11的设备和根据权利要求23的覆层设施来解决。优选的实施方式处于从属权利要求中。
根据本发明的方法包含了在利用使寄生层或颗粒从覆层设施中的运输机构脱离的工艺的情况下在覆层设施运行期间并且在覆层设施内部就已经对运输机构进行清洁。优选地，在对一个或多个基底进行覆层期间的同时，也就是在线地对运输机构进行清洁。然而，对运输机构的清洁也可以在对两个基底进行覆层之间的时间间隔内进行(只要为了对运输机构的清洁既不打开覆层设施，另外也不脱离针对覆层过程所设置的运行参数，尤其是温度和压力，这就也应当被理解为“覆层设施在运行”)。然而，在清洁运输机构期间可以短暂地中断材料微粒从覆层源至覆层设施中的输出。例如，覆层源可以通过闸板(遮板)来遮盖，或者可以遮蔽住引起微粒从覆层源输出的微粒射束。在清洁运输机构时，通过热学上的脱离工艺或者通过机械式的脱离工艺从运输机构去除掉寄生层或颗粒，在热学上的脱离工艺中，运输机构在局部被如下这样地强烈加热，即，使寄生层或颗粒从运输机构的表面蒸发掉。在此，寄生层或颗粒优选连续地，也就是说，在运输机构每转一周时被去除掉。然而也能够实现的是，仅在限定的覆层时间之后或者在达到寄生层的限定的厚度或者达到寄生颗粒的限定的数量的情况下实施对运输机构的清洁。在此，至少在运输机构的一个区段中对运输机构进行清洁。在此，运输机构的区段是具有沿运输机构的旋转轴线的、小于运输机构的沿旋转轴线的整个延展尺寸的长度的运输机构的区域，然而其中，区段包括运输机构的横截面在该区域中的整个圆周。例如，可以仅清洁装配或构造在运输轴上的运输滚子，或者在特定的时刻或一般仅在运输机构的沿旋转轴线的整个延展尺寸的部分区域中对运输机构进行清洁。然而，也可以在运输机构的沿旋转轴线的整个延展尺寸上同时对整个运输机构进行清洁。为此所需的设备匹配于该方法的特定的设计方案和在此使用的使寄生层或颗粒脱离的 工艺。
在下面，覆层设施的用于运输基底的、在此是位置固定的并且旋转的、并且在覆层设施内部受到寄生式覆层的所有部件都以术语“运输机构”来称谓。其尤其涉及到运输滚子、运输轴、滚轮、轴衬和其他与运输滚子和/或运输轴连接的并且处于覆层设施内部的部分。在此，利用根据本发明的方法和设备可以仅清洁该运输机构的单个的、多个或所有的部分。此外能够实现的是，同时或在时间上依次清洁运输机构的各个部分或区段。根据本发明的方法和设备适用于所有类型的覆层设施、适用于立式设施同样也适用于不同类型的卧式设施，尤其也适用于自下而上的设施。
在根据本发明的方法的实施方式中，通过机械式的脱离工艺从运输机构去除掉寄生层或颗粒。根据特殊的实施方式，这一点借助至少一个机械式地作用到运输机构上的部件来发生，这些部件将寄生层或颗粒从旋转的运输机构上去除掉。该机械式地作用的部件优选是刷子或刮刀。优选地，至少一个机械式地作用的部件如下这样地相对于运输机构布置，即，使寄生层的被脱离(被去除)的颗粒或被脱离的部分不积在基底表面上。有利地，去除掉运输机构的在运输机构的横截面中与基底相反对置的侧上的寄生层或颗粒。在该申请的意义中，运输机构的横截面被理解为横向于运输机构的旋转轴线穿过运输机构的横截面。在特别的实施方式中，借助抽吸设备将机械式地作用的部件和运输机构附近的被脱离的微粒从覆层设施去除掉，从而使微粒既不到达基底表面，也不到达覆层源或覆层源与基底表面之间的路径中，并且因此不会对覆层过程造成不利影响。这种抽吸设备尤其能够有利地用在不以真空来作业的覆层设施中。
在特别有利的方式中，将如下材料选择作为用于要从中机械式地脱离掉寄生层或颗粒的运输机构的表面的材料，在所述材料上，与粘附在基底上相比，覆层设施中要施加到基底上的材料更难以粘附。在 此，整个运输机构可以由所选出的材料构成，或者运输机构在其外表面上至少在要清洁掉寄生层或颗粒清洁的部位上具有由所选出的材料构成的相应的层。石墨的变体、纯净的石英玻璃或熔融石英尤其适用于作为这种材料，其中，特别优选纯净的石英玻璃和石墨，并且完全特别优选形式为玻璃碳的石墨。
在根据本发明的方法的另一实施方式中，通过热学上的脱离工艺从运输机构去除掉寄生层或颗粒。在此，运输机构在局部被如下这样地强烈加热，即，使寄生层或颗粒从运输机构的表面蒸发掉。“局部”在此意味着，运输机构并不在运输机构的整个横截面上被加热，而是仅在待清洁的区段的在横截面中与横截面的圆周邻接的区域中被加热。区段的区域在此沿横截面的圆周具有比横截面的整个圆周更小的长度，并且例如是横截面的圆弧形的或扇形的区域或者是这种区域的部分区域。然而，运输机构也可以在一个或多个彼此间隔开的区段的沿运输机构在运输机构的旋转轴线的方向上的延伸尺寸的不同的区域中被加热。由于运输机构的旋转而在时间上依次加热和清洁运输机构的待清洁的区段的横截面的所有区域。
优选地，在此在局部将运输机构的温度超过基底的温度提高了在50K至100K之间范围内的值。通常，运输机构被加热至例如与待覆层的基底相同的温度(运输机构的平均温度)。为了去除掉寄生层或颗粒，在局部至少在运输机构的表面的一个区段中通过将热能引入到运输机构中或在运输机构中产生热能来提高该温度。
优选地，借助运输机构中的激光辐射来产生对于热学上的脱离工艺来说必需的热能。在此，所耦入的激光功率被寄生层或颗粒的材料吸收，并且导致对寄生层或颗粒的材料的强烈的，但非常短暂的并且在空间上受限的加热，从而使寄生层或颗粒的材料从运输机构的升温的表面蒸发掉。
优选地，所使用的激光器的波长与待去除的寄生层或颗粒的材料相匹配。因此，可以非常有效地从运输机构的表面去除掉相应的材料，而不会损坏运输机构。
优选地，所使用的激光器在脉冲模式中以在0.1ns至300ns范围内的、特别优选在1ns至30ns范围内的脉冲长度来运行。因此，输入至运输机构中的所有能量保持得很小，并且确保在激光处理之后使运输机构或运输机构的被加热的局部区域快速冷却。
在热学上的脱离工艺的另一优选的实施方式中，对于热学上的脱离工艺来说必需的热能经由布置在运输机构附近的局部的热源引入到运输机构中。在此，来自局部的热源的热能主要经由热辐射传递到运输机构的表面的局部区域上。
在热学上的脱离工艺的这两个实施方式中有利的是，在位于运输机构的表面与基底的接触点附近且沿旋转方向位于该接触点后面的位置上在运输机构中产生热能或者将热能引入到运输机构中。也就是说，运输机构表面的特定的位置应该在运输机构旋转期间，在其与基底接触不久后或者在其离开基底不久后被加热，从而使运输机构表面在该位置中的温度被如下这样地强烈加温，即，发生寄生层或颗粒的热学上的脱离工艺，其中，该特定的位置在其剩余的直到下一次与基底接触的旋转路径期间的温度又与运输机构的平均温度相适应。“位置”在此被理解为运输机构的表面上的受限的、经限定的部位。在此，位置可以在运输机构的横截面中呈点状或呈线状延伸地构造。此外，位置可以沿运输机构的待清洁的区段的在运输机构的旋转轴线的方向上的延展尺寸呈线状或面式地延展或者仅呈点状地构造。
根据本发明的用于清洁运输机构的设备至少部分地布置在覆层设施内部，并且适用于在利用寄生层或颗粒从运输机构的机械式的或局部受限的热学上的脱离工艺的情况下在覆层设施运行期间从运输机构 的至少一个区段去除掉寄生层或颗粒。为此，设备具有机械式地作用在运输机构上的部件或局部加热运输机构表面的至少一个区段的装置。在此，设备包含有至少一个此类部件或布置在覆层设施内部的装置。设备的处于覆层设施内部的部分静止地或可运动地布置在覆层设施内部。设备的可运动的并且处于覆层设施内部的部分例如能够沿运输机构的旋转轴线运动，从而使运输机构沿其在旋转轴线方向上的延展尺寸的不同的区段在时间上依次被处于运行中的设备清洁。然而，设备也可以包含多个机械式地作用的部件或多个用于局部加热运输机构的装置，其中，这些部件或装置中的每一个都配属于运输机构的特定的区段。因此，可以同时清洁运输机构的不同的区段。
在一个实施方式中，设备包含有至少一个机械式地作用的部件，优选刷子或刮刀，其将待去除的寄生层或颗粒从运输机构机械式地去除掉。有利地，机械式地作用的部件如下这样地关于运输机构来布置，即，使被磨掉的颗粒或寄生层的被磨掉的部分不积在基底表面上。为此，机械式地作用的部件优选布置在运输机构的在运输机构的横截面中与基底对置的侧上。
在特别的实施方式中，设备此外还包含有抽吸装置，该抽吸装置适用于从覆层设施去除掉被磨掉的(已脱离的)颗粒或寄生层的被磨掉的部分。抽吸设备有利地布置在机械式地作用的部件附近，从而使已脱离的微粒既不到达基底表面上，也不到达覆层源或覆层源与基底表面之间的路径中，并且因此不会对覆层工艺造成不利影响。
在另一实施方式中，用于清洁运输机构的设备包含有激光器、控制单元以及用于将激光功率引入到运输机构中的装置，其中，控制单元适用于如下这样地控制所引入的激光功率，即，局部加热运输机构并且通过所引入的激光功率从运输机构蒸发掉寄生层或颗粒。
在此，以有利方式，激光器布置在覆层设施外，并且用于将激光 功率引入到运输机构中的装置包含有延伸到覆层设施中的光导、优选是玻璃纤维。
优选地，用于借助激光烧蚀器来清洁运输机构的设备适用于提供具有与待去除的寄生层或颗粒的材料相匹配的波长的光。
在特别优选的实施方式中，用于引入激光功率的装置包含有至少两个用于将激光功率引入到运输机构中的光导以及将由激光器产生的激光功率依次或同时分配到至少两个光导上的光学多路复用器或分束器，其中，至少两个光导中的每一个都配属于运输机构的特定的区段。
在又一实施方式中，用于清洁运输机构的设备包含有局部的热源，其如下这样地相对于运输机构布置，即，局部加热运输机构，并且通过所引入的热能将寄生层或颗粒从运输机构蒸发掉。在此，局部的热源主要借助热辐射将热能引入到运输机构中。
优选地，该实施方式的设备包含有至少一个适用于将电能转换为热能的并且将该热能输出到周围环境中的电导体以及适用于产生穿过导体的通过电流的电流源或电压源。在此，电导体的至少一个区段形成了局部的热源。有利地，电导体包含有至少两个导体区段，这些导体区段具有不同的导电值并且分别配属于运输机构的特定的区段并且相对于运输机构的该特定的区段布置。在此，在具有相对于其他导体区段更小的导电值的导体区段中，与在具有相对更大的导电值的导体区段中相比，有更多的电能被转换为焦耳热。因此，具有小导电值的导体区段配属于运输机构的应当通过蒸发掉寄生层或颗粒来进行清洁的区段，而具有大导电值的导体区段配属于运输机构的应当不以该方式来进行清洁的区段。不同的导电值可以通过不同的因素来调节，例如通过选择导体材料，也就是说，该材料的电导率来调节，或者通过导体在特定的导体区段中的横截面积来调节。尤其是特定的导体区段的长度，然而必要时还有这种导体区段的宽度主要与运输机构的相应 配属的区段的尺寸有关。在此，导体区段的或运输机构区段的沿旋转轴线的延展尺寸的长度测量，而宽度横向于旋转轴线地测量。
优选地，用于引入激光功率的装置或局部的热源如下这样地相对于运输机构布置，即，使激光功率或热能在位于运输机构的表面与基底的接触点附近且沿旋转方向位于该接触点后面的位置上引入到旋转的运输机构中。
根据本发明的覆层设施包含有用于覆层基底的装置、至少一个用于在覆层设施中运输基底的运输机构以及至少一个之前描述的用于清洁至少一个运输机构的设备。通常所采用的覆层设施大多包含有多个运输机构，例如多个运输轴或运输滚子。因此，根据本发明的覆层设施也可以包含有多个相同的和/或多个不同的像之前描述的那样的用于清洁运输机构的设备，其中，特定的设备仅可以用于清洁特定的运输机构，或者也可以用于清洁多个相同或不同的运输机构。在此，用于清洁的设备在覆层设施内部从一个特定的运输机构运动至其他特定的运输机构，从而在时间上依次对不同的运输机构进行清洁。但也能够实现的是，特定的清洁设备包含有多个机械式地作用的部件或多个用于局部加热运输机构的装置，它们分别配属于不同的运输机构，其中，用于清洁的设备的一个、多个或所有其他的部分被多个这些机械部件或用于局部加热的装置所使用。例如，多个刷子可以布置在共同的刷架上，激光器与多个用于将激光功率引入到运输机构中的装置连接，或者电压源或电流源与多个局部的热源连接。此外也能够实现的是，可以将多个不同的用于清洁特定的运输机构的设备组合起来，其中，这些设备在时间上同时清洁运输机构的不同的区段，或者在时间上依次清洁运输机构的相同的区段。
优选地，至少一个用于清洁运输机构的设备是如下设备，其机械式地使寄生层或颗粒脱离。因此，配属于该设备的或者由该设备清洁的运输机构的表面至少在应当去除掉寄生层或颗粒的区段中由如下材 料构成，在所述材料上，与粘附在基底上相比，覆层设施中要施加到基底上的材料更难以粘附。有利地，该材料是石墨的适当的变体、纯净的石英玻璃或熔融石英，优选是石墨的适当的变体或纯净的石英玻璃，并且特别优选地是形式为玻璃碳的石墨。
对于在其中使用用于清洁运输机构的热学上的脱离工艺的覆层设施来说也可以有利的是，至少运输机构的应当被清洁的区段由如下材料制成，在所述材料上，与粘附在基底上相比，覆层设施中要施加到基底上的材料更难以粘附。
附图说明
下面借助附图详细阐述本发明。其中：
图1示出用于阐述具有根据本发明的方法步骤S2的方法的示意图；
图2示出穿过具有两个示例性的用于清洁运输机构4的设备5的覆层设施1的纵截面，在该设备中进行机械式清洁；
图3示出沿切割线A-A‘穿过图2的覆层设施的横截面；
图4示出沿切割线B-B‘穿过图2的运输机构4c和用于清洁运输机构的设备52的截面；
图5示出覆层设施1的示意图，其具有运输机构4和用于借助激光烧蚀器来热学上地清洁运输机构的设备5；
图6示出用于示出针对图5的清洁设备的位置546的示意性的视图，在该位置中，激光功率引入到运输机构4中；
图7示出覆层设施1的示意图，其具有运输机构4和用于借助局部的热源来热学上地清洁运输机构的另一设备5；
图8a至图8d分别示出图7的具有不同的设计方案的导体区段552和553的截段C的放大图；
图9示出用于示出针对图7的用于清洁的设备5的位置557的示意性的视图，在该位置中，热辐射被引入到运输机构4中。
具体实施方式
图1中示意性地示出了将根据本发明的方法步骤S2接入到覆层设施的运行中，在覆层设施中，对一个或多个基底覆层材料。在此，在一个或多个基底的覆层过程期间，在运输机构的使一个或多个基底在覆层设施中运动的表面上构成一个或多个寄生层或寄生颗粒(S1)。根据本发明，直接在覆层设施运行期间，将一个或多个寄生层或颗粒从运输机构的表面被去除掉(S2)，其中，连续地或仅在限定的时刻进行对寄生层或颗粒的去除。寄生层或颗粒在覆层设施中借助机械式的或热学上的脱离工艺来去除。
图2示出了穿过具有两个示例性的用于清洁运输机构4的设备5的覆层设施1的纵截面，在该设备中进行机械式清洁。所示的覆层设施1是自下而上的卧式设施并且具有覆层室10，在覆层室中，基底2沿基底的运输方向20(x方向)借助运输机构4运动越过覆层源3。在基底2的覆层过程期间，来自于覆层源3的材料微粒沉积在基底2的朝向覆层源3的表面上，这在图2中示意性地通过虚线箭头示出。除了图2所示的部件以外，覆层设施还具有其他部件，例如闸门、真空泵和具有通向覆层室10的相应联接端的进气口、加热或散热元件以及控制元件，它们布置在覆层室10的内部或外部。
图2中示例性地示出了四个柱体形的运输机构4(4a至4d)，其中最接近覆层源3布置的运输机构4b和4c以特别的程度构成寄生层或颗粒。因此，即使仅示例性地针对这些运输机构示出清洁，然而却也可以针对每个在覆层室10中存在的运输机构实施清洁。尤其应当清洁运输机构4b、4c的周侧面，但垂直于运输机构4b、4c的旋转轴线地延伸的顶面也可以至少部分被清洁到。在所示情况下，借助机械式地作用到相应的运输机构的表面上的清洁设备5来实现对运输机构4b和4c的清洁。针对运输机构4b示出刮刀51，刮刀的尖部从运输机构4b的表面刮掉寄生层或颗粒，而针对运输机构4c示出刷子52，其从运输机构4c的表面刷掉寄生层或颗粒。两个用于清洁的设备5在此以如下 这样地布置，即，它们在运输机构4b、4c旋转期间在运输机构4b、4c的与基底2相反对置的侧上去除掉寄生层或颗粒。运输机构4b、4c的相反对置的侧应当被理解为运输机构4b、4c的周侧面或顶面上的如下每个点，其在横向于运输机构4b、4c的旋转轴线地穿过运输机构4b、4c的横截面中相对于基底2的表面上在运输机构4b、4c与基底2的接触点上的垂线(z方向)具有至少-90°或更小的或等于+90°的角度。因此，用于清洁的设备5也可以相对于基底2的表面或基底2的运输方向20倾斜地，也就是说，在相对于基底2的表面大于或等于90°并且小于或等于270°的角度α(90°≤α≤270°，在运输机构4b、4c与基底2的接触点中所测到的)的情况下进行布置，像这示例性地针对刷子52所示出的那样。利用用于清洁的设备5在运输机构4的与基底2对置的侧上的布置应当确保的是，磨粒，也就是从运输机构4脱离的微粒没有以不期望的方式作为灰尘积在基底上。
为了也减小或避免所脱离的微粒积存在覆层设施的其他部分上，或者减少或避免由于所脱离的微粒而影响覆层过程，优选可以在用于清洁的设备5附近布置有抽吸设备53，像这在图2中示意性地示出的那样。抽吸设备53从覆层室10中去除掉所脱离的微粒。
用于清洁的设备5以及抽吸设备53布置在覆层室10的壁中或壁上，或者以其他适当的方式布置在室内部，其中，壁被理解为覆层室10的所有边界面，也就是侧壁、顶部和底部。用于清洁的设备5和抽吸设备53都能够在室内部沿x方向、y方向和/或z方向移动，以及以能够围绕这些方向中的一个、多个或所有方向枢转的方式布置。此外，设备5围绕如下轴线的旋转也是能够实现的，该轴线相当于传输机构4的表面上在设备5至传输机构4上的作用点上的垂线(图2中的线B-B‘)，如果设备5作用到运输机构4上的面或点的设计使之发生的话。同样能够实现的是，设备5关于设备5到运输机构4上的作用点或关于在运输机构4的表面上在设备5到运输机构4上的作用点上的垂线进行摆动运动。为此，用于清洁的设备5和/或抽吸设备53可以包 含如下部件，例如马达和控制单元，它们可以布置在覆层室10的内部或外部。
借助图3详细阐述了运输机构4的设计方案。为此，图3示出了沿切割线A-A‘穿过图2的覆层设施的横截面。运输机构4具有运输轴41和多个、例如五个布置或构造在运输轴41的表面上的运输滚子42、43，其中，运输滚子42例如具有80mm的直径和(沿y方向所测到的)大致3mm的宽度。靠内的运输滚子42在基底运输通过覆层设施期间从下方支撑基底2，而靠外的运输滚子43具有比靠内的运输滚子42更大的半径，并且防止基底2沿运输机构4的延展尺寸，也就是说，沿y方向滑脱。基底2优选在其整个宽度上(沿y方向)通过覆层源3来覆层，从而使靠内的运输滚子42以及至少是靠外的运输滚子43的朝向靠内的运输滚子42的侧受到覆层。例如，直径为80mm的运输滚子42在大致1.85m/min的圆周速度的情况下，在对基底2进行CdTe覆层时被敷上CdTe层，该CdTe层在运输滚子42的每转一圈的情况下具有0.02μm至0.18μm之间，优选0.05μm至0.08μm之间的厚度。与此相对地，靠外的运输滚子43的外侧以及轴端部44和借助其在覆层室10的壁中保持和支承运输轴41的轴支承部45极为少量地被覆层。因此，尤其是对靠内的运输滚子42和靠外的运输滚子43的清洁是必要的，以便避免对基底2的覆层过程产生负面作用。然而，也可以连续或随时对运输机构4的其他部分进行清洁。
图4示出了沿图2中的切割线B-B‘穿过图2的运输机构4c和用于清洁运输机构的刷子52的截面，借助该截面应当阐述刷子52的实施方式。在此，刷子52具有刷架521以及多个布置在刷架上的刷头522，其中，每个刷头522配属于特定的运输滚子42或43，并且从分别所配属的运输滚子42或43去除掉寄生层或颗粒。刷架521以适当的方式布置、例如保持或支承在覆层室内部，并且可以像参照图2所描述的那样在覆层室内部运动。刷头522比相应所配属的运输滚子42、43优选稍微更宽地构造，因此寄生层或颗粒从运输滚子42、43的整个与基 底2处于接触的表面上被去除掉。刷头522或运输滚子42、43的宽度分别被理解为刷头522或运输滚子42、43在沿运输轴41的旋转轴线的方向(点划线)上的延展尺寸。此外也能够实现的是，刷头522在其宽度上具有型廓，从而运输滚子42、43的侧面也可以摆脱寄生层或颗粒。除了所示的刷头522以外，刷子52也可以具有其他的用于清洁运输轴42或轴端部44的刷头。同样也能够实现的是，仅设置一个刷头522，其沿运输机构4c在沿运输机构的旋转轴线的方向上的延展尺寸运动，并且在时间上依次对运输机构4c的各个组成部分进行清洁。
图2的刮刀51也可以以类似方式通过载体和多个布置在载体上的刮刀头来实现，像这针对刷子52在图4中示出的那样。
优选地，至少运输机构4的应当被清洁的组成部分由如下材料制成，或者在该组成部分的表面上具有如下材料，在该材料上，与粘附在基底2上相比，覆层设施1中沉积在基底2上的材料更难以粘附。因此，便于清洁运输机构4，从而很大程度上避免了由于用于清洁的设备5的机械作用的部件而对运输机构4的损坏。针对用于沉积CdS层或CdTe层的覆层设施，像它们在制造薄层太阳能模块时所使用的那样，石墨的特别适当的变体、纯净的石英玻璃或熔融石英适用于作为运输机构的物质或材料，其中，纯净的石英玻璃或石墨的变体、在此尤其是形式为玻璃碳(glassy carbon)的石墨是特别优选的。
除了参照图2和图4阐述的用于机械式地脱离寄生层或颗粒的方法和设备以外，本发明还包括其中利用了热学上的脱离工艺的方法和设备。
图5示出了覆层设施1的示意图，其具有运输机构4和用于热学上地清洁运输机构4的设备5。在此仅部分地不仅示出覆层室10和运输机构4，而且还示出用于清洁的设备5。用于清洁的设备5实施为用于激光烧蚀的设备54，并且包含有激光器540、控制单元545和用于 将激光功率引入到运输机构4中的装置。用于将激光功率引入到运输机构4中的装置具有光学多路复用器或分束器542、光导541以及多个另外的光导543，其中，光导将激光从激光器540引导至光学多路复用器或分束器542，多个另外的光导将来自光学多路复用器或分束器542的激光引导至运输机构4并且将激光功率引入到运输机构4中的限定的区段中。这些另外的光导543在所示的实施例中实施为玻璃纤维，其中，仅示出两个玻璃纤维543a、543b，其中的玻璃纤维543a将激光功率传递到靠外的运输滚子43上，而玻璃纤维543b将激光功率传递到在此示出的靠内的第一运输滚子42上。因此，每个光导543都配属于运输机构4的特定的区段。显然地也可以存在多于两个光导543，例如配属于运输机构4的另外的区段的另外的玻璃纤维，其中，光导543的数量通过由激光器540总共所产生的功率和对于在运输机构4的特定的区段中达到必要的温度来说在相应的光导543中必要的功率来限制。
激光器540、光学多路复用器或分束器542以及光导541和控制单元545有利地布置在覆层设施10的外面。光导543借助真空贯穿部544导入到覆层室10中，并且可以布置在共同的载体上。如果仅有一个光导543导入到覆层室10中，那么可以省略光学多路复用器或分束器542以及光导541。通过所引入的激光功率在局部加热或升温靠外的运输滚子43和靠内的第一运输滚子42以及必要时的运输机构4的另外的部分、例如同样经由另外的光导543将激光功率引入到其中的另外的靠内和靠外的运输滚子，从而使寄生层或颗粒脱离，例如蒸发掉。
随着激光功率的输入，可以特别好地在局部限制对运输机构的加温。优选地，仅运输机构4的直接与基底处于接触的部分，例如运输滚子42、43以该方式升温，然而显然地，在必要的时候，运输机构4的其他区域或区段，例如运输轴41的或轴端部44的区域也可以通过激光功率升温。激光器540的激光功率可以脉冲调制，以便精确控制在运输机构4中产生的热能的值，并且可以借助光学多路复用器或分 束器542在时间上依次或同时分配到不同的玻璃纤维543a、543b上，以便加热各个运输滚子42、43。此外，所产生的激光的波长可以与待去除的材料相匹配。如果激光的波长例如为1024nm，那么典型的TCO层(Transparent Conductive Oxide，透明导电氧化物层)从例如ITO(Indium Tin Oxide，铟锡氧化物)或FTO(Fluorine-doped Tin Oxide，氟掺杂氧化锡)中被剥除，而具有512nm波长的光特别好地被CdTe层或CdS层吸收，从而使相应的层分别可以相对于其他材料选择性地被剥除。控制单元545用于控制激光器540和/或光学多路复用器或分束器542。
参照图6详细阐述针对图5的用于清洁的设备的位置546，在该位置中，激光功率被引入到运输机构4中。在示出由穿过覆层设施的纵截面构成的截段的示意图中示出了沿运输方向20运动的基底2、覆层源3、沿箭头方向旋转的运输机构4和将激光和进而激光功率传递到运输机构4上的玻璃纤维543。此外还示出了位置546。也被称为“热点(hot spot)”的位置546是在运输机构4的表面上的如下位置，在该位置中吸收从玻璃纤维543出来的激光，并且将其转换为热能。位置546优选位于运输机构4的表面与基底2的接触点547附近且沿运输机构4的旋转方向位于该接触点547后面。因此确保的是，运输机构4的除了位置546以外也可以包括运输机构4的横截面的与该位置相邻的区域的局部升温的区域由于运输机构4的旋转而运动离开基底2，并且在旋转期间又冷却到运输机构4的平均温度，从而使运输机构在与基底2的下一次接触时不会无意地加热基底2。在运输机构4旋转期间，所耦入的激光能量通过热传导也被传递到运输机构4的其他区域上，并且因此可以有利于保持运输机构4的期望的平均温度。
图7示出了用于热学上地清洁运输机构的其他的设备5，其中，针对热学上的脱离工艺的对运输机构的局部加温通过一个或多个局部的热源来实现。示意性地示出了具有覆层室10、运输机构4以及用于热学地清洁运输机构4的设备5的覆层设施1，运输机构具有运输轴 41、多个靠内的运输滚子42、两个靠外的运输滚子43和两个轴端部44，并且两个轴端部经由两个轴支承部45支承在覆层室10中。设备5是局部的热源，其包括由电绝缘的材料，例如陶瓷、熔融石英、石英玻璃、云母或不同的碳化物构成的载体551、电流源或电压源556以及电联接端554和真空贯穿部555，载体具有布置在上面的电导体。在所示实施例中，布置在载体551上的电导体包括多个具有高的导电值的导体区段552和多个具有低的导电值的导体区段553，并且经由电联接端554与电流源或电压源556连接，电联接端通过真空贯穿部555向覆层室10的外部引导。每个导体区段553通过导体区段552沿运输机构4在其旋转轴线的方向上的延展尺寸与其他导体区段553间隔开，并且分别相对于待清洁的运输滚子42、43布置，并且配属于这些特定的运输滚子42、43。各个导体区段552和553作为串联电阻器起作用，在电路闭合的情况下，有电流流过它们。通过各个导体区段552和553的不同的导电值，也就是说，不同的电阻器的值，与在具有低的导电值的导体区段553中相比，在具有高的导电值的导体区段552中有更少的电能被转换为热能。因此在导体区段553中，大量的电能被转换为焦耳热，而导体区段552明显更少地被加温。因此，导体区段553用作针对分别配属于局部的热源的运输滚子42、43的局部的热源，并且如下这样地强烈加热这些运输滚子，即，使寄生层或颗粒脱离。在此，每个导体区段552、553的导电值可以精确地与运输机构4的配属于该导电值的区段的要求相匹配。
参照图8a至8d详细阐述了导体区段552和553的具体的设计方案。分别示出了在图7中标记的截段C。
在图8a至8c中，在所有导体区段552、553中的电导体由自身导电的材料，例如石墨或如钛、锆、铪、钒、铌、钽、铬、钼或钨那样的难熔金属或这些金属彼此间的或具有其他合金元素的合金制成，其中，不同的导体区段的不同的导电值通过不同的几何尺寸来实现。除了所提到的导电物质以外当然可以使用所有其他的金属或非金属的物 质，只要其蒸汽压在相应的使用温度下足够小，以便避免刚好给运输机构蒸镀该物质。在图8a和图8b中，这涉及导电材料的不同的厚度，而在图8c中涉及导电材料的不同的宽度。因此，在图8a和图8b中具有低的导电值的导电区段553具有比具有高的导电值的导体区段552中的材料厚度d2明显更小的材料厚度d1(d1<<d2)。在图8a中所示的实施例中，导体区段553作为通过载体551的电绝缘材料的区域彼此间隔开并且电绝缘的两个相邻的导体区段552之间和其上方的“桥”示出，并且没有与导体区段552形成平坦的表面。相反地，在图8b中，导体区段553以如下方式布置，即，该导体区段与导体区段552形成平坦的表面。在此，导体区段553在图8a和图8b中都可以实施为类似于白炽灯中的灯丝的薄细丝。在为了更好的理解示出电导体的线条透视图的图8c中，具有低的导电值的导体区段553虽然具有与具有高的导电值的导体区段552相同的厚度d(其中，导体区段553的厚度由于载体551的包围材料而在图中不可见)，但是为此却具有比导体区段552中的材料宽度b2明显更小的材料宽度b1(b1<<b2)。同时减小导体区段553中的材料的厚度和宽度也是可能的。
在图8d中，导体区段553中的电导体由具有低的电导率σ1的材料、例如由更小的密度和电导率的石墨产生，而导体区段552中的电导体的材料具有高的电导率σ2，例如钼。在此，在导体区段553中的材料可以如下这样地构造，即，其与导体区段552形成平坦的表面，像在图8d中示出的那样。此外附加地，导体区段552和553的几何尺寸也还可以彼此不同，像这参照图8a至8c所描述的那样，以便提高导体区段552与553之间的导电值的差异。
特定的导体区段553的长度，也就是说，导体区段553在运输机构4沿其旋转轴线的延展尺寸的方向上的延展尺寸在此如下这样地测定并且与运输机构4的配属于其的待清洁的区段的宽度、例如运输滚子42、43的宽度相匹配，即，使由导体区段553产生的热借助热辐射主要仅传递到运输机构4的特定的待清洁的区段上。
图9示出了图7的局部的热源55相对于覆层室中的运输机构4的优选的布置。在示出了由穿过覆层设施的纵截面构成的截段的示意图中示出了沿运输方向20运动的基底2、覆层源3、沿箭头方向旋转的运输机构4和具有载体551和具有低的导电值的导体区段553的热源55。此外示出了位置557，在该位置中，热辐射从导体区段553出发被引入到运输机构4中。也被称为“热点”的位置557是运输机构4的表面上的如下位置，在该位置中吸收热辐射并且运输机构被加温。与参照图6所描述的那样类似地，该位置557优选位于运输机构4的表面与基底2的接触点558附近且沿运输机构4的旋转方向位于该接触点558后面。因此确保的是，运输机构4的局部升温的区域由于运输机构4的旋转而运动离开基底2，并且在旋转期间又冷却到运输机构4的平均温度，从而使运输机构在与基底2的下一次接触中不会无意地加热基底2。在运输机构4旋转期间，所引入的热能通过热传导也被传递到运输机构4的其他区域上，并且因此可以有利于保持运输机构4的期望的平均温度。
附图标记列表
1         覆层设施
10        覆层室
2         基底
20        基底的运输方向
3         覆层源
4、4a-4b  运输机构
41        运输轴
42        靠内的运输滚子
43        靠外的运输滚子
44        轴端部
45        轴支承部
5         用于清洁运输机构的设备
51        刮刀
52        刷子
521       刷架
522       刷头
53        抽吸设备
54        用于激光烧蚀的设备
540       激光器
541       光导
542       光学多路复用器或分束器
543       光导
543a、b   玻璃纤维
544       真空贯穿部
545       控制单元
546       在运输机构中的吸收激光功率的位置
547       运输机构的表面与基底的接触点
55        局部的热源
551       载体
552       具有高的导电值的导体区段
553       具有低的导电值的导体区段
554       电联接端
555       真空贯穿部
556       电流源或电压源
557       在运输机构中的吸收热辐射的位置
558       运输机构的表面与基底的接触点
α        刷子相对于基底表面的角度
d1        导体区段553中的材料的厚度
b1        导体区段553中的材料的宽度
d2        导体区段552中的材料的厚度
b2        导体区段553中的材料的宽度

Claims (25)

  1. 一种用于清洁位置固定的、旋转的、适用于在覆层设施中对基底进行运输的运输机构的方法，其特征在于，至少在所述运输机构的一个区段中，在利用使寄生层或颗粒从所述运输机构脱离的工艺的情况下在所述覆层设施运行期间并且在所述覆层设施内部对所述运输机构进行清洁，其中，通过热学上的脱离工艺或者通过机械式的脱离工艺从所述运输机构去除掉所述寄生层或颗粒，在所述热学上的脱离工艺中，所述运输机构在局部被如下这样地强烈加热，即，使所述寄生层或颗粒从所述运输机构的表面蒸发掉。
  2. 根据权利要求1所述的方法，其特征在于，在所述运输机构旋转期间，借助至少一个机械式地作用到所述运输机构上的部件，优选是刷子或刮刀，在所述运输机构的与所述基底相反对置的侧上去除掉所述寄生层或颗粒。
  3. 根据权利要求2所述的方法，其特征在于，将如下材料选择作为用于所述运输机构的表面的材料，在所述材料上，与粘附在所述基底上相比，所述覆层设施中要施加到所述基底上的材料更难以粘附。
  4. 根据权利要求3所述的方法，其特征在于，将石墨的适当的变体、纯净的石英玻璃或熔融石英选择作为所述用于运输机构的表面的材料，优选石墨的适当的变体或纯净的石英玻璃，并且特别优选形式为玻璃碳的石墨。
  5. 根据权利要求1所述的方法，其特征在于，将所述运输机构的温度至少在局部超过所述基底的温度提高了在50K至100K之间范围内的值。
  6. 根据权利要求1或5所述的方法，其特征在于，对于所述热学上的脱离工艺来说必需的热能借助所述运输机构中的激光辐射来产 生。
  7. 根据权利要求6所述的方法，其特征在于，所使用的激光器的波长与待去除的寄生层或颗粒的材料相匹配。
  8. 根据权利要求6或7所述的方法，其特征在于，所使用的激光器在脉冲模式中以0.1ns至300ns范围内的、特别优选以1ns至30ns范围内的脉冲长度来运行。
  9. 根据权利要求1或5所述的方法，其特征在于，对于所述热学上的脱离工艺来说必需的热能通过布置在所述运输机构附近的局部的热源引入到所述运输机构中。
  10. 根据权利要求1或5至9中任一项所述的方法，其特征在于，将对于所述热学上的脱离工艺来说必需的热能在位于所述运输机构的表面与基底的接触点附近且沿旋转方向位于所述接触点后面的位置上引入到旋转的运输机构中或者在那里产生。
  11. 一种用于清洁位置固定的、旋转的、适用于在覆层设施中对基底进行运输的运输机构的设备，其特征在于，所述设备至少部分地布置在所述覆层设施内部，并且适用于在利用寄生层或颗粒从所述运输机构的机械式的或局部受限的热学上的脱离工艺的情况下在所述覆层设施运行期间从所述运输机构的至少一个区段去除掉所述寄生层或颗粒。
  12. 根据权利要求11所述的设备，其特征在于，所述设备包含机械式地作用到所述运输机构上的部件，优选是刷子或刮刀，所述部件将待去除的寄生层或颗粒从所述运输机构机械式地去除掉。
  13. 根据权利要求12所述的设备，其特征在于，所述机械式地作 用的部件相对于所述运输机构布置，从而使被磨掉的颗粒或寄生层的被磨掉的部分不积在基底表面上。
  14. 根据权利要求12或13所述的设备，其特征在于，此外，所述设备还包含抽吸装置，所述抽吸装置适用于从所述覆层设施中去除掉被磨掉的颗粒或寄生层的被磨掉的部分。
  15. 根据权利要求11所述的设备，其特征在于，所述设备包含激光器、控制单元以及用于将激光功率引入到运输机构中的装置，其中，所述控制单元适用于如下这样地控制所引入的激光功率，即，局部加热所述运输机构并且通过所引入的激光功率从所述运输机构蒸发掉所述寄生层或颗粒。
  16. 根据权利要求15所述的设备，其特征在于，所述激光器布置在所述覆层设施外，并且所述用于将激光功率引入到运输机构中的装置包含有一直延伸到所述覆层设施中的光导、优选是玻璃纤维。
  17. 根据权利要求15或16所述的设备，其特征在于，所述用于清洁运输机构的设备适用于提供具有与待去除的寄生层或颗粒的材料相匹配的波长的光。
  18. 根据权利要求15至17中任一项所述的设备，其特征在于，所述用于将激光功率引入的装置包含有用于将激光功率引入到所述运输机构中的至少两个光导以及将由激光器产生的激光功率依次或同时分配到所述至少两个光导上的光学多路复用器或分束器，其中，所述至少两个光导中的每一个都配属于所述运输机构的特定的区段。
  19. 根据权利要求11所述的设备，其特征在于，所述设备包括局部的热源，所述局部的热源如下这样地相对于所述运输机构布置，即，局部加热所述运输机构并且通过所引入的热能从所述运输机构蒸发掉 所述寄生层或颗粒。
  20. 根据权利要求19所述的设备，其特征在于，所述设备包含有适用于将电能转换为热能并且将所述热能输出到周围环境中的至少一个电导体以及适用于产生流过所述导体的电流的电流源或电压源，以及所述电导体的至少一个区段形成所述局部的热源。
  21. 根据权利要求20所述的设备，其特征在于，所述至少一个电导体包含至少两个导体区段，所述导体区段具有不同的导电值，并且分别配属于运输机构的特定的区段并且相对于该运输机构的特定的区段布置。
  22. 根据权利要求15至21中任一项所述的设备，其特征在于，所述用于将激光功率引入的装置或所述局部的热源如下这样地相对于所述运输机构布置，即，将激光功率或热能在位于所述运输机构的表面与基底的接触点附近且沿旋转方向位于所述接触点后面的位置上引入到旋转的运输机构中。
  23. 一种覆层设施，其具有用于对基底进行覆层的装置、至少一个位置固定的、旋转的运输机构以及至少一个根据权利要求11至22中任一项的用于清洁所述至少一个运输机构的设备，所述旋转的运输机构适用于在所述覆层设施中对所述基底进行运输。
  24. 根据权利要求23所述的覆层设施，其特征在于，所述至少一个用于清洁所述至少一个运输机构的设备是根据权利要求12的设备，并且待由所述设备清洁的运输机构的表面至少在应当从中去除掉寄生层或颗粒的区段中由如下材料构成，在所述材料上，与粘附在所述基底上相比，所述覆层设施中要施加到所述基底上的材料更难以粘附。
  25. 根据权利要求24所述的覆层设施，其特征在于，所述运输机 构的表面在所述应当从中去除掉寄生层或颗粒的区段中是石墨的适当的变体、纯净的石英玻璃或熔融石英，优选是石墨的适当的变体或纯净的石英玻璃，并且特别优选是形式为玻璃碳的石墨。
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