WO2017041414A1 - 一种触控显示面板及其制作方法、触控显示装置 - Google Patents

一种触控显示面板及其制作方法、触控显示装置 Download PDF

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Publication number
WO2017041414A1
WO2017041414A1 PCT/CN2016/072141 CN2016072141W WO2017041414A1 WO 2017041414 A1 WO2017041414 A1 WO 2017041414A1 CN 2016072141 W CN2016072141 W CN 2016072141W WO 2017041414 A1 WO2017041414 A1 WO 2017041414A1
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Prior art keywords
transparent conductive
region
conductive layer
photoresist
thickness
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PCT/CN2016/072141
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English (en)
French (fr)
Inventor
刘波
夏龙
姜清华
李小和
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京东方科技集团股份有限公司
合肥京东方光电科技有限公司
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Priority to US15/325,415 priority Critical patent/US10234998B2/en
Publication of WO2017041414A1 publication Critical patent/WO2017041414A1/zh

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/13338—Input devices, e.g. touch panels
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1343—Electrodes
    • G02F1/134309—Electrodes characterised by their geometrical arrangement
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0445—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using two or more layers of sensing electrodes, e.g. using two layers of electrodes separated by a dielectric layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5873—Removal of material
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04107—Shielding in digitiser, i.e. guard or shielding arrangements, mostly for capacitive touchscreens, e.g. driven shields, driven grounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/0274—Optical details, e.g. printed circuits comprising integral optical means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01—Dielectrics
    • H05K2201/0104—Properties and characteristics in general
    • H05K2201/0108—Transparent
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/40—OLEDs integrated with touch screens

Definitions

  • the present invention relates to the field of display technologies, and in particular, to a touch display panel, a method for fabricating the same, and a touch display device.
  • touch panels have gradually spread throughout people's lives. Compared with a conventional display that can only provide a display function, a display using a touch display panel can enable information interaction between a user and a display control host, and thus, the touch display panel can completely or at least partially replace a commonly used input device. So that the existing display can not only display, but also touch control.
  • the most widely used touch display panel is a capacitive touch display panel, and the capacitive touch display panel is divided into a relative relationship with a thin film transistor (TFT) and a color filter substrate (Colour Filter, CF). In-cell, on-cell and plug-in.
  • TFT thin film transistor
  • CF color filter substrate
  • FIG. 1 A schematic diagram of a planar structure of a touch panel of a single-layer on-cell of the prior art is shown in FIG. 1 .
  • FIG. 2 A schematic cross-sectional view of the touch panel of FIG. 1 along the AA1 direction is shown in FIG. 2 , and the touch display panel of the prior art includes a relative array. a substrate 11 and a color filter substrate 12, and a sealant 13 and a liquid crystal layer (not shown) between the array substrate 11 and the color filter substrate 12, and a side of the color filter substrate 12 facing away from the array substrate 11 is disposed.
  • the touch electrode layer includes a sensing electrode 14 and a driving electrode 15 , and determines whether the touch display panel is touched by detecting the strength of the signal received by the sensing electrode 14 .
  • the width of the driving electrode 15 on the color filter substrate 12 is small, the width of the sensing electrode 14 is large, and thus the macroscopically, the region where the sensing electrode 14 is located and the region 17 where the driving electrode 15 is located is light.
  • There is a large difference in the transmittance and the reflectance so that the human eye can recognize the region where the sensing electrode 14 is located and the region where the driving electrode 15 is located, thereby causing a poor image.
  • the surface of the color filter substrate 12 is provided with the sensing electrode 14 and the driving electrode 15, static electricity is not released, which may cause the touch display panel to display whitening and the problem that the sensing electrode and the driving electrode are completely visible.
  • the touch display panel of the prior art may cause poor shadowing and cannot The problem of releasing static electricity.
  • the embodiment of the invention provides a touch display panel, a manufacturing method thereof, and a touch display device, which are used for reducing or avoiding the generation of image defects and achieving the purpose of electrostatic discharge.
  • a touch display panel includes an array substrate and a color filter substrate disposed opposite to each other, and a touch electrode layer on a side of the color filter substrate facing away from the array substrate, and is disposed on the color a transparent conductive layer that is insulated from the touch electrode layer between the film substrate and the touch electrode layer;
  • the transparent conductive layer includes a first region and a second region, wherein a thickness of the transparent conductive layer in the first region is greater than a thickness of the transparent conductive layer in the second region; the transparent conductive layer is grounded;
  • a projection area of the touch electrode layer on the color filter substrate overlaps with a projection area of the transparent conductive layer on the color film substrate in the second area;
  • the difference between the thickness of the touch electrode layer and the thickness of the transparent conductive layer located in the second region and the thickness of the transparent conductive layer located in the first region is within a preset range.
  • the touch display panel includes a transparent conductive layer disposed on the ground. Therefore, when static electricity is generated due to external factors, the embodiment of the present invention can introduce the generated static electricity to the ground through the transparent conductive layer. The end can effectively discharge static electricity and improve the touch quality.
  • the projection area of the touch electrode layer on the color filter substrate in the touch display panel of the embodiment of the present invention overlaps the projection area of the transparent conductive layer on the color film substrate in the second area; the touch electrode layer
  • the difference between the thickness and the thickness of the transparent conductive layer located in the second region and the thickness of the transparent conductive layer located in the first region are within a preset range, compared with the touch display panel of the prior art, the embodiment of the present invention
  • the difference between the transmittance and the reflectance of the area where the sensing electrode of the touch display panel is located and the area where the driving electrode is located is reduced or even not different, so that the generation of the shadow elimination can be well reduced or avoided.
  • the color filter substrate is provided with a ground lead, and the transparent conductive layer is electrically connected to the ground lead;
  • the color filter substrate is provided with a conductive electrode, and the transparent conductive layer is electrically connected to the conductive electrode through a connecting line; a conductive ball is disposed between the color filter substrate and the array substrate, and the conductive electrode passes through The conductive balls are connected to ground traces on the array substrate.
  • the sum of the thickness of the touch electrode layer and the thickness of the transparent conductive layer located in the second region may be equal to the thickness of the transparent conductive layer located in the first region.
  • an insulating layer is disposed between the transparent conductive layer and the touch electrode layer, and the transparent conductive layer and the touch electrode layer are insulated from each other by the insulating layer.
  • the transparent conductive layer is the same material as the touch electrode layer.
  • the embodiment of the present invention further provides a touch display device, which may include the touch display panel described in any of the above embodiments.
  • the embodiment of the invention further provides a method for fabricating a touch display panel, comprising: fabricating an array substrate and a color filter substrate, wherein the method further comprises:
  • the transparent conductive layer Forming a transparent conductive layer on a side of the color filter substrate facing away from the array substrate by a patterning process, the transparent conductive layer comprising a first region and a second region, wherein a thickness of the transparent conductive layer in the first region is greater than The thickness of the transparent conductive layer of the two regions; the transparent conductive layer is grounded;
  • a touch electrode layer on the insulating layer by a patterning process, wherein a projection area of the touch electrode layer on the color filter substrate overlaps a projection area of the transparent conductive layer on the color film substrate in the second area;
  • the difference between the thickness of the touch electrode layer and the thickness of the transparent conductive layer located in the second region and the thickness of the transparent conductive layer located in the first region is within a preset range.
  • the step of forming a transparent conductive layer by a patterning process on a side of the color filter substrate facing away from the array substrate may include:
  • Coating a photoresist on the transparent conductive film exposing and developing through the mask, forming a photoresist complete removal region, a photoresist partial removal region, and a photoresist completely reserved region, wherein the photoresist is completely
  • the reserved area corresponds to a region where a transparent conductive layer of the first region needs to be formed
  • the photoresist partial removal region corresponds to a region where a transparent conductive layer of the second region needs to be formed
  • the photoresist completely removed region corresponds to other regions;
  • the photoresist complete removal region, the photoresist partial removal region, and the photoresist complete retention region are etched to form a transparent conductive layer of the first region and a transparent conductive layer of the second region.
  • the mask may be a halftone or gray tone mask.
  • the photoresist complete removal region and the photoresist partial removal region And the step of etching the completely remaining region of the photoresist to form the transparent conductive layer of the first region and the transparent conductive layer of the second region may include:
  • the remaining photoresist is removed to form a transparent conductive layer of the first region.
  • FIG. 1 is a schematic plan view showing a planar structure of a touch display panel of the prior art
  • FIG. 2 is a schematic cross-sectional structural view of a touch display panel of the prior art
  • FIG. 3 is a schematic cross-sectional structural view of a touch display panel according to an embodiment of the present invention.
  • FIG. 4 is a schematic diagram showing a relationship between a thickness of a transparent electrode layer and a touch electrode layer in a touch display panel according to an embodiment of the present disclosure
  • FIG. 5 is a schematic diagram of a grounding manner of a transparent electrode layer in a touch display panel according to an embodiment of the invention
  • FIG. 6 is a flowchart of a method for fabricating a touch display panel according to an embodiment of the present invention.
  • FIG. 7 is a flowchart of a method for fabricating a transparent electrode layer according to an embodiment of the present invention.
  • FIG. 8 to FIG. 11 are schematic cross-sectional views showing different stages of manufacturing a touch display panel according to an embodiment of the present invention.
  • the embodiment of the invention provides a touch display panel, a manufacturing method thereof, and a touch display device, which are used to avoid the occurrence of poor shadowing and achieve the purpose of electrostatic discharge.
  • each film layer in the drawings do not reflect the true proportion of each film layer, and are merely intended to illustrate the embodiments of the present invention.
  • a touch display panel includes an array substrate 11 and a color filter substrate 12 disposed opposite to each other, and a touch electrode layer on the side of the color filter substrate 12 facing away from the array substrate 11
  • the touch display panel provided by the embodiment of the present invention further includes a transparent conductive layer 21 disposed between the color filter substrate 12 and the touch electrode layer 22 and insulated from the touch electrode layer 22;
  • the transparent conductive layer 21 includes a first region and a second region.
  • the thickness of the transparent conductive layer 21 in the first region is greater than the thickness of the transparent conductive layer 21 in the second region; the transparent conductive layer 21 is grounded;
  • a projection area of the touch electrode layer 22 on the color filter substrate 12 overlaps with a projection area of the transparent conductive layer 21 located on the color filter substrate of the second area;
  • the difference between the thickness of the touch electrode layer 22 and the thickness of the transparent conductive layer 21 located in the second region and the thickness of the transparent conductive layer 21 located in the first region are within a preset range.
  • an insulating layer 23 is disposed between the transparent conductive layer 21 and the touch electrode layer 22 , and the transparent conductive layer 21 and the touch electrode layer 22 are insulated from each other by the insulating layer 23 .
  • the insulating layer 23 in the embodiment of the present invention is a single layer film of silicon oxide (SiO2) or silicon nitride (SiN), or a composite film of silicon oxide and silicon nitride, or a transparent organic layer.
  • the insulating film, the specific embodiment of the present invention does not specifically limit the material of the insulating layer 23.
  • the touch electrode layer 22 in the embodiment of the present invention includes the sensing electrode 14 and the driving electrode 15, the specific position design of the sensing electrode 14 and the driving electrode 15, and the process of receiving and detecting the touch signal by the sensing electrode 14 and the driving electrode 15 The same as the prior art, and will not be described again here.
  • the transparent conductive layer 21 is a single layer film of indium tin oxide (ITO) or indium zinc oxide (IZO), or a composite film of ITO and IZO.
  • ITO indium tin oxide
  • IZO indium zinc oxide
  • the transparent conductive layer 21 Other types of transparent conductive films may also be used.
  • the specific embodiment of the present invention does not specifically limit the material of the transparent conductive layer 21.
  • the touch electrode layer 22 is a single layer film of indium tin oxide (ITO) or indium zinc oxide (IZO), or a composite film of ITO and IZO.
  • ITO indium tin oxide
  • IZO indium zinc oxide
  • the touch electrode The layer 22 can also be other types of transparent conductive films.
  • the specific embodiment of the present invention does not specifically limit the material of the touch electrode layer 22.
  • the transparent conductive layer 21 is the same material as the touch electrode layer 22.
  • the touch electrode layer 22 of the specific embodiment of the present invention is shown in FIG.
  • the transparent conductive layer 21 and the touch electrode layer 22 of the embodiment of the present invention cover the entire transparent film layer 12, and the transparent conductive layer 21 and the touch electrode layer are covered.
  • the thickness of each of the transparent conductive layers of the 22 is the same. Therefore, compared with the touch display panel of the prior art, the area where the touch display panel 14 of the touch display panel of the present invention is located and the driving electrode 15 are located. The difference in light transmittance and reflectance of the region is reduced or even not different, so that the occurrence of poor shadowing can be well avoided.
  • the thickness d2 of the touch electrode layer 22 mentioned above and the thickness d1 of the transparent conductive layer 21 located in the second region and the thickness d of the transparent conductive layer 21 located in the first region may allow a certain difference. Values, and do not necessarily require them to be absolutely equal. For example, in one embodiment, as long as the absolute value of the difference between d1+d2 and d is maintained to be in the range of 5%, the occurrence of poor shadowing can be avoided to some extent in the actual production process.
  • the color filter substrate 12 is provided with a conductive electrode 40, and the transparent conductive layer 21 is electrically connected to the conductive electrode 40 through a connection line 41.
  • a conductive ball 42 is disposed between the color filter substrate 12 and the array substrate 11, and the conductive electrode 40 is connected to the ground trace 43 on the array substrate 11 through the conductive ball 42.
  • the conductive balls 42 provided may be conductive gold balls.
  • the transparent conductive layer 21 in the embodiment of the present invention is grounded, the static electricity generated by the transparent conductive layer 21 can be introduced to the ground end. Therefore, the static electricity can be effectively released, and the touch quality can be improved.
  • a ground lead may be disposed on the color filter substrate 12 to electrically connect the transparent conductive layer 21 to the ground lead disposed to achieve grounding of the transparent conductive layer 21.
  • the transparent conductive layer of the specific embodiment of the present invention may be grounded by other means, and details are not described herein.
  • Another embodiment of the present invention further provides a touch display device, which includes the touch display panel provided by the above embodiment of the present invention, and the touch display device can be a liquid crystal panel, a liquid crystal display, or a liquid crystal TV, Organic Light Emitting Diode (OLED) panel, OLED display, OLED TV or TV Display device such as paper.
  • OLED Organic Light Emitting Diode
  • a specific embodiment of the present invention further provides a method for fabricating a touch display panel, comprising: fabricating an array substrate and a color filter substrate, wherein the method further includes:
  • a transparent conductive layer on a side of the color filter substrate facing away from the array substrate by a patterning process, the transparent conductive layer comprising a first region and a second region, wherein a thickness of the transparent conductive layer in the first region is greater than a thickness of the transparent conductive layer located in the second region; the transparent conductive layer is grounded;
  • the touch electrode layer is formed on the insulating layer by a patterning process, and a projection area of the touch electrode layer on the color film substrate overlaps with a projection area of the transparent conductive layer located in the second area on the color filter substrate;
  • the difference between the thickness of the touch electrode layer and the thickness of the transparent conductive layer located in the second region and the thickness of the transparent conductive layer located in the first region are within a preset range.
  • the step of forming a transparent conductive layer by a patterning process on a side of the color filter substrate facing away from the array substrate may include the following steps:
  • a transparent conductive film 70 is first deposited on a side of the color filter substrate 12 facing away from the array substrate 11.
  • the method for depositing the transparent conductive film 70 includes thermal evaporation, magnetron sputtering, and the like.
  • the deposited transparent conductive film 70 is a single layer of ITO or IZO
  • the film, the embodiment of the present invention does not specifically define the material of the transparent conductive film and the deposition manner of the transparent conductive film.
  • a photoresist is coated on the transparent conductive film 70, and exposed and developed through the mask to form a photoresist complete removal region, a photoresist partial removal region, and a photoresist complete retention region.
  • the exposure can be performed by a halftone or gray tone mask.
  • the transparent conductive film in the photoresist completely removed region is removed by the first etching, and then the photoresist in the photoresist partial removal region is removed, and the partially transparent conductive portion of the photoresist partially removed region is removed by the second etching.
  • Forming a transparent conductive layer of the second region, finally removing the remaining photoresist to form a transparent conductive layer of the first region, and the transparent conductive layer of the second region and the transparent conductive layer of the first region constitute a specific embodiment of the present invention
  • the transparent conductive layer 21 is as shown in Fig. 9 (the photoresist complete removal region is not shown in the figure).
  • the first etching and the second etching may be performed by wet etching; in the specific embodiment of the present invention, the photoresist in the partial removal region of the photoresist may be removed by ashing, and the method of peeling off The remaining photoresist is removed.
  • an insulating layer 23 is formed on the transparent conductive layer 21 by a patterning process, which may include coating, exposing, developing, etching, and removing part or all of the photoresist.
  • the specific method for fabricating the insulating layer 23 in the specific embodiment of the present invention may be the same as the method for fabricating the insulating layer in the prior art, and details are not described herein again.
  • a transparent conductive film 70 is deposited on the insulating layer 23, and the material of the transparent conductive film 70 deposited may be the same as the material of the transparent conductive film forming the transparent conductive layer 21, thus The selection, the environmental requirements in the specific production process, and the adjustment of the specific parameters of the production process are more convenient and simple.
  • a photoresist is coated on the transparent conductive film 70, and exposed, developed, and etched to form the touch electrode layer 22 of the embodiment of the present invention, as shown in FIG.
  • the specific method for fabricating the touch electrode layer 22 in the specific embodiment of the present invention may be the same as the prior art, and details are not described herein again.
  • the present invention provides a touch display panel, a method for fabricating the same, and a touch display device.
  • the touch display panel includes an array substrate and a color filter substrate disposed opposite to each other, and is located on the back of the color filter substrate.
  • the touch electrode layer on the side of the array substrate further includes a transparent conductive layer disposed between the color filter substrate and the touch electrode layer and insulated from the touch electrode layer; the transparent conductive layer includes a region and a second region, wherein a thickness of the transparent conductive layer in the first region is greater than a thickness of the transparent conductive layer in the second region;
  • the transparent conductive layer is grounded; the projection area of the touch electrode layer on the color filter substrate overlaps with the projection area of the transparent conductive layer located on the color film substrate in the second area; the thickness of the touch electrode layer and the transparency in the second area
  • the difference between the thicknesses of the conductive layers and the thickness of the transparent conductive layer located in the first region is within a preset range.
  • the touch display panel of the embodiment of the present invention includes a transparent conductive layer disposed at the ground. Therefore, when static electricity is generated due to external factors, the specific embodiment of the present invention can introduce static electricity generated by the transparent conductive layer to the ground end, thereby being effective. The release of static electricity, to achieve improved touch quality.
  • the projection area of the touch electrode layer on the color filter substrate in the touch display panel of the embodiment of the present invention overlaps with the projection area of the transparent conductive layer on the color film substrate in the second area; the touch electrode layer
  • the difference between the thickness of the transparent conductive layer located in the second region and the thickness of the transparent conductive layer located in the first region is within a preset range, and the present invention is compared with the touch display panel of the prior art. In the touch display panel of the specific embodiment, the difference between the transmittance and the reflectance of the region where the sensing electrode is located and the region where the driving electrode is located is reduced or even not different, so that the generation of the shadowing defect can be well reduced or avoided.

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Abstract

一种触控显示面板及其制作方法、触控显示装置，用以减轻或避免消影不良的产生，以及实现静电释放的目的。触控显示面板包括相对设置的阵列基板（11）和彩膜基板（12），以及位于彩膜基板（12）背向阵列基板（11）侧的触控电极层（22），还包括设置于彩膜基板（12）与触控电极层（22）之间与触控电极层（22）相互绝缘的透明导电层（21）；透明导电层（21）包括第一区域和第二区域，位于第一区域的透明导电层（21）的厚度大于位于第二区域的透明导电层（21）的厚度；透明导电层（21）接地；触控电极层（22）在彩膜基板（12）上的投影区域与位于第二区域的透明导电层（21）在彩膜基板（12）上的投影区域重叠；触控电极层（22）的厚度与位于第二区域的透明导电层（21）的厚度之和与位于第一区域的透明导电层（21）的厚度的差值在预设范围内。

Description

一种触控显示面板及其制作方法、触控显示装置 技术领域
本发明涉及显示技术领域，尤其涉及一种触控显示面板及其制作方法、触控显示装置。
背景技术
随着显示技术的飞速发展，触控显示面板(Touch Panel)已经逐渐遍及人们的生活中。与仅能提供显示功能的传统显示器相比较，使用触控显示面板的显示器能够使得使用者与显示控制主机之间进行信息交互，因此，触控显示面板可以完全或者至少部分取代了常用的输入装置，使得现有的显示器不仅能够显示，还能触控控制。目前，应用最广泛的触控显示面板为电容触控显示面板，电容触控显示面板根据与薄膜晶体管基板(Thin Film Transistor，TFT)及彩膜基板(Colour Filter，CF)的相对关系分为内嵌式(in-cell)、外嵌式(on-cell)及外挂式等三种。
现有技术单层on-cell的触控显示面板的平面结构示意图如图1所示，图1沿AA1方向的截面示意图如图2所示，现有技术的触控显示面板包括相对设置的阵列基板11和彩膜基板12，以及位于阵列基板11和彩膜基板12之间的封框胶13和液晶层(图中未示出)，彩膜基板12背向阵列基板11的一侧设置有触控电极层，触控电极层包括感应电极14和驱动电极15，通过检测感应电极14接收到的信号的强弱来确定触控显示面板是否被触控。
如图2所示，彩膜基板12上驱动电极15的宽度较小，感应电极14的宽度较大，因而表现在宏观上，感应电极14所在的区域16与驱动电极15所在的区域17的光的透过率和反射率存在较大的差异，从而人眼能够识别出感应电极14所在的区域与驱动电极15所在的区域，进而产生消影不良。
另外，由于彩膜基板12表面设置有感应电极14和驱动电极15，往往无法释放静电，这样会导致触控显示面板显示发白，以及感应电极和驱动电极完全可见的问题。
综上所述，现有技术的触控显示面板会产生消影不良，以及无法 释放静电的问题。
发明内容
本发明实施例提供了一种触控显示面板及其制作方法、触控显示装置，用以减轻或避免消影不良的产生，以及实现静电释放的目的。
本发明实施例提供的一种触控显示面板，包括相对设置的阵列基板和彩膜基板，以及位于所述彩膜基板背向所述阵列基板侧的触控电极层，以及设置于所述彩膜基板与所述触控电极层之间与所述触控电极层相互绝缘的透明导电层；
所述透明导电层包括第一区域和第二区域，位于第一区域的透明导电层的厚度大于位于第二区域的透明导电层的厚度；所述透明导电层接地；
所述触控电极层在所述彩膜基板上的投影区域与位于第二区域的透明导电层在彩膜基板上的投影区域重叠；
所述触控电极层的厚度与位于第二区域的透明导电层的厚度之和与位于第一区域的透明导电层的厚度的差值在预设范围内。
由本发明实施例提供的触控显示面板，由于该触控显示面板包括接地设置的透明导电层，因此当由于外界因素产生静电时，本发明实施例可以通过透明导电层将产生的静电引入到接地端，从而能够有效的释放静电，实现触控品质的提升。另外，由于本发明实施例的触控显示面板中的触控电极层在彩膜基板上的投影区域与位于第二区域的透明导电层在彩膜基板上的投影区域重叠；触控电极层的厚度与位于第二区域的透明导电层的厚度之和与位于第一区域的透明导电层的厚度的差值在预设范围内，与现有技术的触控显示面板相比，本发明实施例的触控显示面板感应电极所在的区域与驱动电极所在的区域的光的透过率和反射率的差异得到减小甚至没有差异，从而能够很好的减轻或避免消影不良的产生。
在一个实施例中，所述彩膜基板设置接地引线，所述透明导电层与所述接地引线电连接；或，
所述彩膜基板设置导通电极，所述透明导电层通过一连接线与所述导通电极电连接；所述彩膜基板和所述阵列基板之间设置导电球，所述导通电极通过所述导电球与阵列基板上的接地走线连接。
在另一实施例中，所述触控电极层的厚度与位于第二区域的透明导电层的厚度之和可与位于第一区域的透明导电层的厚度相等。
在另一实施例中，所述透明导电层与所述触控电极层之间设置有绝缘层，所述透明导电层和所述触控电极层通过该绝缘层相互绝缘。
在另一实施例中，所述透明导电层与所述触控电极层的材料相同。
本发明实施例还提供了一种触控显示装置，该触控显示装置可包括上述实施中的任何实施例所描述的触控显示面板。
本发明实施例还提供了一种触控显示面板的制作方法，包括制作阵列基板和彩膜基板，其中，该方法还包括：
在所述彩膜基板背向所述阵列基板的一侧通过构图工艺制作透明导电层，所述透明导电层包括第一区域和第二区域，位于第一区域的透明导电层的厚度大于位于第二区域的透明导电层的厚度；所述透明导电层接地；
在所述透明导电层上通过构图工艺制作绝缘层；
在所述绝缘层上通过构图工艺制作触控电极层，触控电极层在所述彩膜基板上的投影区域与位于第二区域的透明导电层在彩膜基板上的投影区域重叠；所述触控电极层的厚度与位于第二区域的透明导电层的厚度之和与位于第一区域的透明导电层的厚度的差值在预设范围内。
在一个实施例中，所述在所述彩膜基板背向所述阵列基板的一侧通过构图工艺制作透明导电层的步骤可包括：
在所述彩膜基板背向所述阵列基板的一侧沉积一层透明导电薄膜；
在所述透明导电薄膜上涂覆光刻胶，通过掩膜板进行曝光、显影，形成光刻胶完全去除区、光刻胶部分去除区和光刻胶完全保留区，其中，光刻胶完全保留区对应需要形成第一区域的透明导电层的区域，光刻胶部分去除区对应需要形成第二区域的透明导电层的区域，光刻胶完全去除区对应其它区域；
对光刻胶完全去除区、光刻胶部分去除区以及光刻胶完全保留区进行刻蚀，形成第一区域的透明导电层和第二区域的透明导电层。
在另一实施例中，所述掩膜板可以为半色调或灰色调掩膜板。
在另一实施例中，所述对光刻胶完全去除区、光刻胶部分去除区 以及光刻胶完全保留区进行刻蚀形成第一区域的透明导电层和第二区域的透明导电层的步骤可包括：
通过第一次刻蚀去除光刻胶完全去除区的透明导电薄膜；
去除光刻胶部分去除区的光刻胶，通过第二次刻蚀去除光刻胶部分去除区的部分透明导电薄膜，形成第二区域的透明导电层；
去除剩余的光刻胶，形成第一区域的透明导电层。
附图说明
图1为现有技术触控显示面板的平面结构示意图；
图2为现有技术触控显示面板的截面结构示意图；
图3为本发明实施例提供的一种触控显示面板的截面结构示意图；
图4为本发明实施例提供的触控显示面板中透明电极层和触控电极层的厚度关系示意图；
图5为本发明实施例提供的触控显示面板中透明电极层的接地方式示意图；
图6为本发明实施例提供的一种触控显示面板的制作方法流程图；
图7为本发明实施例提供的制作透明电极层的制作方法流程图；
图8-图11分别为本发明实施例提供的制作触控显示面板的不同阶段的截面结构示意图。
具体实施方式
本发明实施例提供了一种触控显示面板及其制作方法、触控显示装置，用以避免消影不良的产生，以及实现静电释放的目的。
为了使本发明的目的、技术方案和优点更加清楚，下面将结合附图对本发明作进一步地详细描述，显然，所描述的实施例仅仅是本发明一部分实施例，而不是全部的实施例。基于本发明中的实施例，本领域普通技术人员在没有做出创造性劳动前提下所获得的所有其它实施例，都属于本发明保护的范围。
下面结合附图详细介绍本发明具体实施例提供的触控显示面板及其制作方法。
附图中各膜层厚度和区域大小、形状不反应各膜层的真实比例，目的只是示意说明本发明的实施例。
如图3所示，本发明具体实施例提供了一种触控显示面板，包括相对设置的阵列基板11和彩膜基板12，以及位于彩膜基板12背向阵列基板11侧的触控电极层22，本发明具体实施例提供的触控显示面板还包括设置于彩膜基板12与触控电极层22之间，与触控电极层22相互绝缘的透明导电层21；
透明导电层21包括第一区域和第二区域，位于第一区域的透明导电层21的厚度大于位于第二区域的透明导电层21的厚度；透明导电层21接地设置；
触控电极层22在彩膜基板12上的投影区域与位于第二区域的透明导电层21在彩膜基板上的投影区域重叠；
触控电极层22的厚度与位于第二区域的透明导电层21的厚度之和，与位于第一区域的透明导电层21的厚度的差值在预设范围内。
如图3所示，本发明具体实施例在透明导电层21与触控电极层22之间设置有绝缘层23，透明导电层21和触控电极层22通过该绝缘层23相互绝缘。具体实施时，本发明具体实施例中的绝缘层23为氧化硅(SiO2)或氮化硅(SiN)的单层膜，或为氧化硅和氮化硅的复合膜，也可以为透明的有机绝缘膜，本发明具体实施例并不对绝缘层23的材料作具体限定。
本发明具体实施例中的触控电极层22包括感应电极14和驱动电极15，感应电极14和驱动电极15的具体位置设计，以及感应电极14和驱动电极15接收和检测触控信号的过程均与现有技术相同，这里不再赘述。
本发明具体实施例中透明导电层21为氧化铟锡(ITO)或氧化铟锌(IZO)的单层膜，或为ITO和IZO的复合膜，当然，在实际生产过程中，透明导电层21还可以为其它类型的透明导电薄膜，本发明具体实施例并不对透明导电层21的材料作具体限定。
本发明具体实施例中触控电极层22为氧化铟锡(ITO)或氧化铟锌(IZO)的单层膜，或为ITO和IZO的复合膜，当然，在实际生产过程中，触控电极层22还可以为其它类型的透明导电薄膜，本发明具体实施例并不对触控电极层22的材料作具体限定。在一个实施例中，透明导电层21与触控电极层22的材料相同。
在另一实施例中，如图4所示，本发明具体实施例触控电极层22 的厚度d2与位于第二区域的透明导电层21的厚度d1之和，可以与位于第一区域的透明导电层21的厚度d相等，即d＝d1+d2。
从图4中可以看到，本发明具体实施例的透明导电层21和触控电极层22组成的透明导电层覆盖在整个彩膜基板12的上方，且由透明导电层21和触控电极层22组成的透明导电层各个位置处的厚度均相同，因此，与现有技术的触控显示面板相比，本发明具体实施例的触控显示面板感应电极14所在的区域与驱动电极15所在的区域的光的透过率和反射率的差异得到减小甚至没有差异，从而能够很好的避免消影不良的产生。当然，以上提到的触控电极层22的厚度d2与位于第二区域的透明导电层21的厚度d1之和与位于第一区域的透明导电层21的厚度d之间可以允许存在一定的差值，而并不一定要求它们绝对相等。例如，在一个实施例中，只要保证d1+d2与d的差值的绝对值维持在5％的范围，在实际生产过程中也可以在一定程度上避免消影不良的产生。
如图5所示，在另一实施例中，彩膜基板12设置有导通电极40，透明导电层21通过一连接线41与导通电极40电连接。在图5所示的实施例中，彩膜基板12和阵列基板11之间设置有导电球42，导通电极40通过该导电球42与阵列基板11上的接地走线43连接。在实施例中，所设置的导电球42可以为导电金球。
这样，当彩膜基板侧由于外界因素，如撕保护膜产生静电时，由于本发明具体实施例中的透明导电层21接地，故可以通过该透明导电层21将产生的静电引入到接地端，从而能够有效的释放静电，实现触控品质的提升。
在其它实施例中，还可以在彩膜基板12上设置接地引线，将透明导电层21与设置的接地引线电连接，从而实现透明导电层21接地。当然，在实际生产过程中，还可以通过其它的方式将本发明具体实施例的透明导电层接地，这里不进行一一赘述。
本发明另一实施例还提供了一种触控显示装置，该触控显示装置包括本发明的以上实施例提供的上述触控显示面板，该触控显示装置可以为液晶面板、液晶显示器、液晶电视、有机发光二极管(Organic Light Emitting Diode，OLED)面板、OLED显示器、OLED电视或电 子纸等显示装置。
如图6所示，本发明具体实施例还提供了一种触控显示面板的制作方法，包括制作阵列基板和彩膜基板，其中，该方法还包括：
S601、在所述彩膜基板背向所述阵列基板的一侧通过构图工艺制作透明导电层，所述透明导电层包括第一区域和第二区域，位于第一区域的透明导电层的厚度大于位于第二区域的透明导电层的厚度；所述透明导电层接地；
S602、在所述透明导电层上通过构图工艺制作绝缘层；
S603、在所述绝缘层上通过构图工艺制作触控电极层，触控电极层在所述彩膜基板上的投影区域与位于第二区域的透明导电层在彩膜基板上的投影区域重叠；所述触控电极层的厚度与位于第二区域的透明导电层的厚度之和，与位于第一区域的透明导电层的厚度的差值在预设范围内。
本发明具体实施例制作阵列基板和彩膜基板的方法均与现有技术相同，这里不再赘述。
如图7所示，在一个实施例中，在彩膜基板背向阵列基板的一侧通过构图工艺制作透明导电层的步骤可包括以下步骤：
S701、在所述彩膜基板背向所述阵列基板的一侧沉积一层透明导电薄膜；
S702、在所述透明导电薄膜上涂覆光刻胶，通过掩膜板进行曝光、显影，形成光刻胶完全去除区、光刻胶部分去除区和光刻胶完全保留区，其中，光刻胶完全保留区对应需要形成第一区域的透明导电层的区域，光刻胶部分去除区对应需要形成第二区域的透明导电层的区域，光刻胶完全去除区对应其它区域。
能够理解的是，这里提到得到其它区域指的是光刻胶层中除掉光刻胶部分去除区和光刻胶完全保留区之后余下的区域。
S703、对光刻胶完全去除区、光刻胶部分去除区以及光刻胶完全保留区进行刻蚀，形成第一区域的透明导电层和第二区域的透明导电层。
如图8所示，在一个实施中，首先在彩膜基板12背向阵列基板11的一侧沉积一层透明导电薄膜70，透明导电薄膜70的沉积方法包括热蒸发、磁控溅射等方法，沉积的透明导电薄膜70为ITO或IZO的单层 膜，本发明具体实施例不对透明导电薄膜的材料以及透明导电薄膜的沉积方式作具体限定。
接着，在透明导电薄膜70上涂覆光刻胶，通过掩膜板进行曝光、显影，形成光刻胶完全去除区、光刻胶部分去除区和光刻胶完全保留区。在实施例中，可通过半色调或灰色调掩膜板进行曝光。
接着，通过第一次刻蚀去除光刻胶完全去除区的透明导电薄膜，之后去除光刻胶部分去除区的光刻胶，通过第二次刻蚀去除光刻胶部分去除区的部分透明导电薄膜，形成第二区域的透明导电层，最后去除剩余的光刻胶，形成第一区域的透明导电层，第二区域的透明导电层和第一区域的透明导电层组成本发明具体实施例的透明导电层21，如图9所示(该图中没有示出光刻胶完全去除区)。
在实施例中，第一次刻蚀和第二次刻蚀可采用湿法刻蚀；本发明具体实施例可通过灰化的方法去除光刻胶部分去除区的光刻胶，通过剥离的方法去除剩余的光刻胶。
接着，如图10所示，在透明导电层21上通过构图工艺制作绝缘层23，该构图工艺可包括光刻胶的涂覆、曝光、显影、刻蚀以及去除光刻胶的部分或全部过程，本发明具体实施例制作绝缘层23的具体方法可与现有技术制作绝缘层的方法相同，这里不再赘述。
接着，如图11所示，在绝缘层23上沉积一层透明导电薄膜70，这时沉积的透明导电薄膜70的材料可以与形成透明导电层21的透明导电薄膜的材料相同，这样在材料的选择、具体制作过程中对环境的要求，以及制作工艺具体参数的调节上更加方便、简单。
之后，在该透明导电薄膜70上涂覆光刻胶，并进行曝光、显影以及刻蚀，形成本发明具体实施例的触控电极层22，参见图3所示。本发明具体实施例制作触控电极层22的具体方法可与现有技术相同，这里不再赘述。
综上所述，本发明具体实施例提供一种触控显示面板及其制作方法、触控显示装置，触控显示面板包括相对设置的阵列基板和彩膜基板，以及位于所述彩膜基板背向所述阵列基板侧的触控电极层，还包括设置于所述彩膜基板与所述触控电极层之间、与所述触控电极层相互绝缘的透明导电层；透明导电层包括第一区域和第二区域，位于第一区域的透明导电层的厚度大于位于第二区域的透明导电层的厚度； 透明导电层接地设置；触控电极层在彩膜基板上的投影区域与位于第二区域的透明导电层在彩膜基板上的投影区域重叠；触控电极层的厚度与位于第二区域的透明导电层的厚度之和，与位于第一区域的透明导电层的厚度的差值在预设范围内。由于本发明具体实施例的触控显示面板包括接地设置的透明导电层，因此当由于外界因素产生静电时，本发明具体实施例可以通过透明导电层将产生的静电引入到接地端，从而能够有效的释放静电，实现触控品质的提升。另外，由于本发明具体实施例的触控显示面板中的触控电极层在彩膜基板上的投影区域与位于第二区域的透明导电层在彩膜基板上的投影区域重叠；触控电极层的厚度与位于第二区域的透明导电层的厚度之和，与位于第一区域的透明导电层的厚度的差值在预设范围内，与现有技术的触控显示面板相比，本发明具体实施例的触控显示面板感应电极所在的区域与驱动电极所在的区域的光的透过率和反射率差异得到减小甚至没有差异，从而能够很好的减轻或避免消影不良的产生。
显然，本领域的技术人员可以对本发明进行各种改动和变型而不脱离本发明的精神和范围。这样，倘若本发明的这些修改和变型属于本发明权利要求及其等同技术的范围之内，则本发明也意图包含这些改动和变型在内。

Claims (10)

  1. 一种触控显示面板，包括：
    相对设置的阵列基板和彩膜基板；
    位于所述彩膜基板背向所述阵列基板侧的触控电极层；以及设置于所述彩膜基板与所述触控电极层之间、与所述触控电极层相互绝缘的透明导电层；
    其中所述透明导电层包括第一区域和第二区域，位于第一区域的透明导电层的厚度大于位于第二区域的透明导电层的厚度；所述透明导电层接地；
    所述触控电极层在所述彩膜基板上的投影区域与位于第二区域的透明导电层在彩膜基板上的投影区域重叠；
    所述触控电极层的厚度与位于第二区域的透明导电层的厚度之和与位于第一区域的透明导电层的厚度的差值在预设范围内。
  2. 根据权利要求1所述的触控显示面板，其中所述彩膜基板设置接地引线，所述透明导电层与所述接地引线电连接；或，
    所述彩膜基板设置导通电极，所述透明导电层通过一连接线与所述导通电极电连接；所述彩膜基板和所述阵列基板之间设置导电球，所述导通电极通过所述导电球与阵列基板上的接地走线连接。
  3. 根据权利要求2所述的触控显示面板，其中所述触控电极层的厚度与位于第二区域的透明导电层的厚度之和与位于第一区域的透明导电层的厚度相等。
  4. 根据权利要求3所述的触控显示面板，其中所述透明导电层与所述触控电极层之间设置有绝缘层，所述透明导电层和所述触控电极层通过该绝缘层相互绝缘。
  5. 根据权利要求4所述的触控显示面板，其中所述透明导电层与所述触控电极层的材料相同。
  6. 一种触控显示装置，其中所述触控显示装置包括权利要求1-5任一权项所述的触控显示面板。
  7. 一种触控显示面板的制作方法，包括制作阵列基板和彩膜基板，其中该方法还包括：
    在所述彩膜基板背向所述阵列基板的一侧通过构图工艺制作透明 导电层，所述透明导电层包括第一区域和第二区域，位于第一区域的透明导电层的厚度大于位于第二区域的透明导电层的厚度；所述透明导电层接地；
    在所述透明导电层上通过构图工艺制作绝缘层；
    在所述绝缘层上通过构图工艺制作触控电极层，触控电极层在所述彩膜基板上的投影区域与位于第二区域的透明导电层在彩膜基板上的投影区域重叠；所述触控电极层的厚度与位于第二区域的透明导电层的厚度之和与位于第一区域的透明导电层的厚度的差值在预设范围内。
  8. 根据权利要求7所述的方法，其中所述在所述彩膜基板背向所述阵列基板的一侧通过构图工艺制作透明导电层的步骤包括：
    在所述彩膜基板背向所述阵列基板的一侧沉积一层透明导电薄膜；
    在所述透明导电薄膜上涂覆光刻胶，通过掩膜板进行曝光、显影，形成光刻胶完全去除区、光刻胶部分去除区和光刻胶完全保留区，其中，光刻胶完全保留区对应需要形成第一区域的透明导电层的区域，光刻胶部分去除区对应需要形成第二区域的透明导电层的区域，光刻胶完全去除区对应其它区域；
    对光刻胶完全去除区、光刻胶部分去除区以及光刻胶完全保留区进行刻蚀，形成第一区域的透明导电层和第二区域的透明导电层。
  9. 根据权利要求8所述的方法，其中所述掩膜板为半色调或灰色调掩膜板。
  10. 根据权利要求9所述的方法，其中所述对光刻胶完全去除区、光刻胶部分去除区以及光刻胶完全保留区进行刻蚀，形成第一区域的透明导电层和第二区域的透明导电层的步骤包括：
    通过第一次刻蚀去除光刻胶完全去除区的透明导电薄膜；
    去除光刻胶部分去除区的光刻胶，通过第二次刻蚀去除光刻胶部分去除区的部分透明导电薄膜，形成第二区域的透明导电层；
    去除剩余的光刻胶，形成第一区域的透明导电层。
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