WO2017004975A1 - 电容触摸屏及其制备方法、触控装置 - Google Patents

电容触摸屏及其制备方法、触控装置 Download PDF

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Publication number
WO2017004975A1
WO2017004975A1 PCT/CN2016/070859 CN2016070859W WO2017004975A1 WO 2017004975 A1 WO2017004975 A1 WO 2017004975A1 CN 2016070859 W CN2016070859 W CN 2016070859W WO 2017004975 A1 WO2017004975 A1 WO 2017004975A1
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Prior art keywords
bridge
touch screen
transparent
capacitive touch
line
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PCT/CN2016/070859
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English (en)
French (fr)
Inventor
曾亭
胡明
谢涛峰
王庆浦
李君�
李可丰
Original Assignee
京东方科技集团股份有限公司
合肥鑫晟光电科技有限公司
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Priority to US15/511,083 priority Critical patent/US20170277308A1/en
Publication of WO2017004975A1 publication Critical patent/WO2017004975A1/zh

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    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04111—Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate

Definitions

  • the present invention relates to the field of touch technologies, and in particular, to a capacitive touch screen, a method for fabricating the same, and a touch device.
  • the existing bridge type capacitive touch screen has the advantages of good durability, high reliability, multi-touch, and the like, and has been widely used in the field of consumer electronics.
  • the basic working principle of the capacitive touch screen is to use the current sensing of the human body to determine the specific location of the touch point.
  • the basic working unit of the capacitive touch screen includes four transparent electrodes, and the four transparent electrodes are respectively located at the four corners of the basic working unit.
  • the capacitor is a direct conductor, so the user's finger will draw a small amount of current from the contact point of the capacitive touch screen.
  • This current flows out from the four transparent electrodes located at the four corners of the capacitive touch screen, respectively, and the magnitude of the current flowing through the four transparent electrodes is proportional to the distance of the user's finger to the four corners. Therefore, by accurately calculating the ratio between the above four currents, the position of the touched point can be determined.
  • FIG. 4 shows a schematic structure of a prior art bridge type capacitive touch screen
  • FIG. 5 shows a schematic plan view of a pattern of an X-axis electrode and a Y-axis electrode in the capacitive touch screen
  • FIG. 6 is a portion A of FIG. A magnified view of the.
  • an ITO (Indium Tin Oxide) pattern in which a plurality of X-axis electrodes and a plurality of Y-axis electrodes are arranged in an array is formed on the upper surface of the glass substrate, and ITO (shielding ITO) is formed on the lower surface of the glass substrate.
  • FIG. 4 shows a so-called single-sided ITO (SITO) bridged capacitive touch screen.
  • SITO single-sided ITO
  • each of the X-axis electrodes is physically and electrically connected to each other by a bridge between adjacent two X-axis electrodes, and each Y-axis electrode passes through a bridge between adjacent two Y-axis electrodes They are physically and electrically connected to each other.
  • the bridge portion of the X-axis electrode is interleaved with the bridge portion of the Y-axis electrode and insulated from each other.
  • the laminated structure of the above capacitive touch screen is complicated, and the transmittance of the capacitive touch screen Low and a base shadow appears at the bridge, which affects the appearance and performance of the capacitive touch screen.
  • the Electro-Static discharge (ESD) capability is lowered.
  • the present invention provides a capacitive touch screen, a method for fabricating the same, and a touch device.
  • the capacitive touch screen of the present invention has a simpler laminated structure and a higher capacitive touch screen. Transmittance, and there is no background in the bridge.
  • the capacitive touch screen includes: a substrate; a plurality of transparent electrodes in a display area of the substrate, the plurality of transparent electrodes are disposed in the same layer to form a touch sensing matrix; and a transparent insulating layer on the transparent electrode Wherein the transparent insulating layer is provided with a via corresponding to the transparent electrode, the transparent insulating layer is provided with a first bridge line, and the first bridge line is separated by at least one transparent through the via hole The two transparent electrodes of the electrode are electrically connected.
  • the transparent electrode includes a first electrode and a second electrode, a plurality of the first electrodes are continuously disposed, a plurality of the second electrodes are spaced apart, and the via holes are disposed corresponding to the second electrode,
  • the first bridge wire electrically connects the adjacent two second electrodes through the via holes.
  • a peripheral area of the substrate is disposed with a black matrix, a second bridge wire and a connecting line are disposed on the black matrix, and the second bridge wire passes through the via hole and a transparent electrode adjacent to the black matrix. Electrically connected, the connecting wire is electrically connected to the second bridge wire.
  • the transparent electrode is formed of an indium tin oxide material.
  • the first bridge line, the second bridge line, and the connection line are formed of an indium tin oxide material; or
  • the first bridge wire, the second bridge wire, and the connecting wire are formed of a metal material;
  • the first bridge line and the second bridge line are formed of an indium tin oxide material
  • the connecting wire is formed of a metal material.
  • the first bridge wire, the second bridge wire, and the connection line are disposed in the same layer and formed by one patterning process.
  • the transparent insulating layer completely covers the display area.
  • the shape of the via hole comprises a circle, a square or a trapezoid.
  • the invention also provides a touch device comprising any of the above capacitive touch screens.
  • the invention also provides a preparation method of a capacitive touch screen, comprising:
  • Step S1 forming a plurality of transparent electrodes in the same layer in the display region of the substrate, the plurality of transparent electrodes forming a touch sensing matrix;
  • Step S2 forming a transparent insulating layer on the transparent electrode, wherein the transparent insulating layer is provided with a via corresponding to the transparent electrode;
  • Step S3 forming a first bridge line on the transparent insulating layer, the first bridge line electrically connecting two transparent electrodes spaced apart by at least one transparent electrode through the via hole.
  • the transparent electrode includes a first electrode and a second electrode, a plurality of the first electrodes are continuously disposed, a plurality of the second electrodes are spaced apart, and the via holes are disposed corresponding to the second electrode,
  • the first bridge wire electrically connects the adjacent two second electrodes through the via holes.
  • step S1 the method includes:
  • step S1 the method includes:
  • the method includes:
  • connection line is formed on the black matrix, and the connection line is electrically connected to the second bridge line.
  • the transparent electrode is formed of an indium tin oxide material.
  • the first bridge line, the second bridge line, and the connection line are formed of an indium tin oxide material; or
  • the first bridge wire, the second bridge wire, and the connecting wire are formed of a metal material;
  • the first bridge line and the second bridge line are formed of an indium tin oxide material, and the connection line is formed of a metal material.
  • a capacitive touch screen a method of manufacturing the same, and a touch device
  • the capacitive touch screen includes a substrate, a plurality of transparent electrodes disposed in the same layer in the display region of the substrate, and a transparent insulating layer on the transparent electrode, wherein a via hole corresponding to the transparent electrode is disposed in the transparent insulating layer, a first bridge line is disposed on the transparent insulating layer, and the first bridge line is separated by at least one transparent electrode through the via hole
  • the two transparent electrodes are electrically connected. Therefore, the capacitive touch screen provided by the invention simplifies the laminated structure, improves the transmittance and the elimination effect, thereby improving the appearance effect and the use performance of the capacitive touch screen, and reducing the product cost.
  • FIG. 1 is a schematic structural diagram of a capacitive touch screen according to an embodiment of the invention.
  • FIG. 2 is a cross-sectional view of the capacitive touch screen of FIG. 1 taken along line A-A.
  • FIG. 3 is a flow chart of a method of fabricating a capacitive touch screen in accordance with an embodiment of the present invention.
  • FIG. 4 is a diagram showing a schematic structure of a prior art bridge type capacitive touch screen.
  • FIG. 5 is a schematic plan view showing a pattern of an X-axis electrode and a Y-axis electrode in a prior art bridge type capacitive touch screen.
  • Fig. 6 is an enlarged schematic view of a portion A in Fig. 5.
  • FIG. 1 is a schematic structural view of a capacitive touch screen according to an embodiment of the invention
  • FIG. 2 is a cross-sectional view of the capacitive touch screen of FIG. 1 taken along line A-A.
  • the capacitive touch screen includes a substrate 100 including a display area and a peripheral area.
  • a plurality of transparent electrodes are disposed in the display area of the substrate 100, and the plurality of transparent electrodes are disposed in the same layer.
  • the plurality of transparent electrodes form a touch sensing matrix, and the transparent electrode is provided with a transparent insulating layer 103.
  • the transparent insulating layer completely covers the display area of the substrate 100, so that the bridging performance of the capacitive touch screen can be improved.
  • a via hole corresponding to the transparent electrode is disposed on the transparent insulating layer 103.
  • the shape of the via hole comprises a circle, a square or a trapezoid.
  • a first bridge wire 104 is disposed on the transparent insulating layer, and the first bridge wire 104 electrically connects two transparent electrodes spaced apart by at least one transparent electrode through the via hole.
  • the transparent electrode includes a first electrode 101 and a second electrode 102, a plurality of the first electrodes 101 are continuously disposed, and a plurality of the second electrodes 102 are spaced apart.
  • the transparent insulating layer 103 physically separates the first electrode 101 from the second electrode 102 and electrically insulates them from each other.
  • the transparent insulating layer 103 also physically separates the first bridge line 104 from the first electrode 101 and electrically insulates them from each other.
  • the via is disposed corresponding to the second electrode 102, and the first bridge 104 electrically connects the adjacent two second electrodes 102 through the via.
  • the above-mentioned via holes cause no slope at both ends of the bridge portion of the capacitive touch screen, thereby improving the antistatic discharge capability of the bridge portion of the capacitive touch screen.
  • the peripheral area of the substrate 100 is provided with a black matrix 106, and the black matrix 106 is provided with a second bridge line 105 and a connecting line 107.
  • the second bridge line 105 is electrically connected to the transparent electrode adjacent to the black matrix 106 through the via hole, and the connection line 107 is electrically connected to the second bridge line 105.
  • the transparent electrode is formed of an indium tin oxide material.
  • the first bridge line 104, the second bridge line 105, and the connection line 107 are each formed of an indium tin oxide material.
  • the first bridge line 104, the second bridge line 105, and the connection line 107 may also be made of a metal material. form.
  • the first bridge line and the second bridge line 105 are formed by one patterning process, and the connection line 107 is formed by another patterning process, the first bridge line and the second bridge line may Formed from an indium tin oxide material, the connecting line may be formed of a metal material.
  • the capacitive touch screen provided in this embodiment includes a substrate, a plurality of transparent electrodes disposed in the same layer in the display region of the substrate, and a transparent insulating layer disposed on the transparent electrode, wherein the transparent insulating layer is disposed in the transparent insulating layer a transparent via corresponding to the transparent electrode, wherein the transparent insulating layer is provided with a first bridge wire, and the first bridge wire electrically connects the two transparent electrodes spaced apart by at least one transparent electrode through the via hole. Therefore, the capacitive touch screen provided by the embodiment simplifies the laminated structure, improves the transmittance and the image removing effect, thereby improving the appearance effect and the use performance of the capacitive touch screen, and reducing the product cost.
  • Embodiments of the present invention also provide a touch device including a capacitive touch screen provided according to an embodiment of the present invention.
  • the touch device may include the capacitive touch screen in the above embodiment.
  • the capacitive touch screen includes a substrate, a plurality of transparent electrodes disposed in the same layer in the display region of the substrate, and a transparent insulating layer disposed on the transparent electrode, wherein the transparent insulating layer a via hole corresponding to the transparent electrode is disposed in the layer, the transparent insulating layer is provided with a first bridge wire, and the first bridge wire electrically connects the two transparent electrodes of the at least one transparent electrode through the via hole connection.
  • the touch device of the embodiment of the present invention has a simplified structure, improved transmittance, and improved shadow elimination effect, so that the touch device has better performance and lower products. cost.
  • Embodiments of the present invention also provide a method of fabricating a capacitive touch screen. It should be noted that although this embodiment is only for One Glass Solution and On-Cell The scheme is specifically described, but the preparation method of the capacitive touch screen of other schemes also falls within the protection scope of the present invention.
  • FIG. 3 is a flowchart of a method for preparing a capacitive touch screen according to an embodiment of the present invention. As shown in FIG. 3, the method for preparing the capacitive touch screen includes:
  • Step S1 forming a plurality of transparent electrodes in the same layer in the display region of the substrate, the plurality of transparent electrodes forming a touch sensing matrix.
  • the capacitive touch screen includes a substrate, and the substrate includes a display area and a peripheral area.
  • a plurality of transparent electrodes are formed on the display region of the substrate, and the plurality of transparent electrodes are disposed in the same layer.
  • the plurality of transparent electrodes form a touch sensing matrix.
  • Step S2 forming a transparent insulating layer on the transparent electrode, wherein the transparent insulating layer is provided with a via hole corresponding to the transparent electrode.
  • a transparent insulating layer is formed on the transparent electrode.
  • the transparent insulating layer completely covers the display area of the substrate, so that the bridging performance of the capacitive touch screen can be improved.
  • a via hole corresponding to the transparent electrode is disposed in the transparent insulating layer.
  • the shape of the via hole comprises a circle, a square or a trapezoid.
  • Step S3 forming a first bridge line on the transparent insulating layer, the first bridge line electrically connecting two transparent electrodes spaced apart by at least one transparent electrode through the via hole.
  • a first bridge wire is formed on the transparent insulating layer, and the first bridge wire electrically connects two transparent electrodes spaced apart by at least one transparent electrode through the via hole.
  • the capacitive touch screen manufactured by the method for preparing a capacitive touch screen provided by the embodiment has a simplified laminated structure, improved transmittance and improved shadow elimination effect, so that the manufactured capacitive touch screen has better performance. Appearance and performance and lower product cost.
  • the transparent electrode includes a first electrode and a second electrode, a plurality of the first electrodes are continuously disposed, and a plurality of the second electrodes are spaced apart.
  • the transparent insulating layer separates the first electrode from the second electrode, and the transparent insulating layer also separates the first bridge from the first electrode, and the above arrangement can ensure the first The electrodes and the second electrode are electrically connected in respective directions, and it is also possible to effectively avoid a short circuit at a position where the first electrode and the second electrode are staggered.
  • the via hole is corresponding to the second electrode
  • the first bridge wire electrically connects the adjacent two second electrodes through the via hole.
  • the transparent electrode is formed of an indium tin oxide material.
  • the first bridge line, the second bridge line, and the connection line may each be formed of an indium tin oxide material or a metal material.
  • a black matrix is formed in a peripheral region of the substrate, a transparent conductive film is formed on the display region of the substrate, and a plurality of transparent electrodes are formed by a patterning process, and the plurality of transparent electrodes form a touch sensing matrix.
  • a transparent insulating layer film is formed on the transparent electrode, and a transparent insulating layer is formed by a patterning process, and a via hole corresponding to the transparent electrode is disposed in the transparent insulating layer.
  • the size and shape of the vias are controlled by controlling parameters of the patterning process (eg, exposure conditions and development time).
  • the shape of the via hole includes a circular shape, a square shape, or a trapezoidal shape, and the circular via hole has an inner diameter ranging from 10 ⁇ m to 30 ⁇ m, and the square via hole has a side length ranging from 10 ⁇ m to 30 ⁇ m.
  • a transparent conductive film or a metal film on the transparent insulating layer and the black matrix, forming a first bridge line, a second bridge line and a connecting line by a patterning process, and the first bridge line is spaced through the via hole
  • Two transparent electrodes of at least one transparent electrode are electrically connected, and the second bridge wire is electrically connected to the transparent electrode adjacent to the black matrix through the via hole, and the connection line is electrically connected to the second bridge line.
  • the first bridge line and the second bridge line are formed by one patterning process, and the connection line is formed by another patterning process, the first bridge line and the second bridge
  • the wiring may be formed of an indium tin oxide material, and the connection line may be formed of a metal material.
  • a black matrix is formed in a peripheral region of the substrate, a transparent conductive film is formed on the display region of the substrate, and a plurality of transparent electrodes are formed by a patterning process, and the plurality of transparent electrodes form a touch sensing matrix.
  • a transparent insulating layer film is formed on the transparent electrode, and a transparent insulating layer is formed by a patterning process, and a via hole corresponding to the transparent electrode is disposed in the transparent insulating layer.
  • the size and shape of the vias are controlled by controlling parameters of the patterning process (eg, exposure conditions and development time).
  • the shape of the via hole includes a circular shape, a square shape, or a trapezoidal shape, and the circular via hole has an inner diameter ranging from 10 ⁇ m to 30 ⁇ m, and the square via hole has a side length ranging from 10 ⁇ m to 30 ⁇ m.
  • a transparent conductive film on the transparent insulating layer and the black matrix, forming a first bridge line and a second bridge line by a patterning process, the first bridge line passing through the via hole to be spaced apart by at least one transparent electrode Transparent electrodes are electrically connected, and the second bridge wires pass through the via holes and are adjacent to the black matrix The transparent electrode is electrically connected.
  • a metal thin film is formed on the black matrix, and a connection line is formed by a patterning process, and the connection line is electrically connected to the second bridge line.
  • the method for preparing a capacitive touch screen includes: forming a plurality of transparent electrodes in the same layer in a display region of the substrate, the plurality of transparent electrodes forming a touch sensing matrix; forming a transparent insulating layer on the transparent electrode, a via hole corresponding to the transparent electrode is disposed in the transparent insulating layer; and a first bridge line is formed on the transparent insulating layer, and the first bridge line is separated by the via hole by at least one transparent electrode The transparent electrode is electrically connected.
  • the capacitive touch screen manufactured by the method for preparing a capacitive touch screen provided by the embodiment has a simplified laminated structure, improved transmittance, and improved image-removing effect, so that the manufactured capacitive touch screen has a better appearance. Performance and performance and lower product cost.

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
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Abstract

一种电容触摸屏及其制备方法、触控装置。所述电容触摸屏包括基板(100)、基板(100)上的透明电极(101,102)和透明电极(101,102)上的透明绝缘层(103)。透明绝缘层(103)上设置的第一桥接线(104)通过透明绝缘层(103)中设置的过孔将间隔至少一个透明电极的两个透明电极电连接。该电容触摸屏提高了电容触摸屏的外观效果和使用性能，降低了产品成本。

Description

电容触摸屏及其制备方法、触控装置 技术领域
本发明涉及触控技术领域，尤其涉及电容触摸屏及其制备方法、触控装置。
背景技术
现有的桥接式电容触摸屏具有耐用性好、可靠性高、多点触摸等优势，在消费性电子领域得到了广泛的应用。
电容式触摸屏的基本工作原理是利用人体的电流感应确定触摸点的具体位置。具体来说，电容式触摸屏的基本工作单元包括四个透明电极，四个透明电极分别位于基本工作单元的四个角上。当用户手指触摸电容式触摸屏时，由于存在人体电场，用户和电容式触摸屏表面形成耦合电容。对于高频电流来说，电容是直接导体，因此用户手指会从电容式触摸屏的接触点吸走部分很小的电流。这个电流分别从位于所述电容式触摸屏的四个角上的四个透明电极中流出，而且流经上述四个透明电极的电流大小与用户手指到上述四个角的距离成正比。因此，通过对上述四个电流之间的比例的精确计算，就可以确定触摸点的位置。
图4示出一个现有技术的桥接式电容触摸屏的示意性结构；图5示出该电容触摸屏中的X轴电极和Y轴电极的图案的示意性平面图；图6为图5中的部分A的放大示意图。如图4所示，在玻璃基板的上表面形成排列成阵列的多个X轴电极和多个Y轴电极的ITO(氧化铟锡)图案，在玻璃基板的下表面形成遮挡ITO(shielding ITO)层。即，图4示出了一个所谓的单面ITO(SITO)桥接式电容触摸屏。
参照图4和图5，各X轴电极通过相邻两个X轴电极之间的桥接部相互物理地且电学地连接，并且各Y轴电极通过相邻两个Y轴电极之间的桥接部相互物理地且电学地连接。如图4和图6所示，X轴电极的桥接部与Y轴电极的桥接部交错且相互绝缘。
然而，上述电容触摸屏的叠层结构复杂，电容触摸屏的透过率 低而且桥接处出现底影，从而影响电容触摸屏的外观效果和使用性能。另外，由于X轴电极的桥接部的两端存在斜坡部分，降低了抗静电释放(Electro-Static discharge，ESD)能力。
现有技术中的其他类型的电容触摸屏，比如SITO双层式或者双面ITO(DITO)式电容触摸屏同样存在叠层结构复杂、触摸屏透过率低等问题。
发明内容
为解决上述问题，本发明提供一种电容触摸屏及其制备方法、触控装置，与现有技术的电容触摸屏相比，本发明的电容触摸屏具有更简单的叠层结构、更高的电容触摸屏的透过率，并且桥接处不会出现底影。
本发明提供的电容触摸屏包括：基板；所述基板的显示区域中的多个透明电极，所述多个透明电极设置在同一层中以形成触摸感应矩阵；以及所述透明电极上的透明绝缘层，其中，所述透明绝缘层中设置有与所述透明电极对应的过孔，所述透明绝缘层上设置有第一桥接线，所述第一桥接线通过所述过孔将间隔至少一个透明电极的两个透明电极电连接。
可选的，所述透明电极包括第一电极和第二电极，多个所述第一电极连续设置，多个所述第二电极间隔设置，所述过孔与所述第二电极对应设置，所述第一桥接线通过所述过孔将相邻的两个第二电极电连接。
可选的，所述基板的周边区域设置有黑矩阵，所述黑矩阵上设置有第二桥接线和连接线，所述第二桥接线通过所述过孔与靠近所述黑矩阵的透明电极电连接，所述连接线与所述第二桥接线电连接。
可选的，所述透明电极由氧化铟锡材料形成。
可选的，所述第一桥接线、第二桥接线和连接线由氧化铟锡材料形成；或者
所述第一桥接线、第二桥接线和连接线由金属材料形成；或者
所述第一桥接线和所述第二桥接线由氧化铟锡材料形成，所述 连接线由金属材料形成。
可选的，所述第一桥接线、第二桥接线和连接线同层设置并且通过一次构图工艺形成。
可选的，所述透明绝缘层全面覆盖所述显示区域。
可选的，所述过孔的形状包括圆形、方形或者梯形。
本发明还提供一种触控装置，包括上述任一电容触摸屏。
本发明还提供一种电容触摸屏的制备方法，包括：
步骤S1、在基板的显示区域中同层形成多个透明电极，所述多个透明电极形成触摸感应矩阵；
步骤S2、在所述透明电极上形成透明绝缘层，所述透明绝缘层中设置有与所述透明电极对应的过孔；以及
步骤S3、在所述透明绝缘层上形成第一桥接线，所述第一桥接线通过所述过孔将间隔至少一个透明电极的两个透明电极电连接。
可选的，所述透明电极包括第一电极和第二电极，多个所述第一电极连续设置，多个所述第二电极间隔设置，所述过孔与所述第二电极对应设置，所述第一桥接线通过所述过孔将相邻的两个第二电极电连接。
可选的，所述步骤S1之前包括：
在基板的周边区域形成黑矩阵；并且
在所述透明绝缘层上形成第一桥接线的同时，在所述黑矩阵上形成第二桥接线和连接线，所述第二桥接线通过所述过孔与靠近所述黑矩阵的透明电极电连接，所述连接线与所述第二桥接线电连接。
可选的，所述步骤S1之前包括：
在基板的周边区域形成黑矩阵；并且
在所述透明绝缘层上形成第一桥接线的同时，在所述黑矩阵上形成第二桥接线，所述第二桥接线通过所述过孔与靠近所述黑矩阵的透明电极电连接；并且
所述步骤S3之后包括：
在所述黑矩阵上形成连接线，所述连接线与所述第二桥接线电连接。
可选的，所述透明电极由氧化铟锡材料形成。
可选的，所述第一桥接线、第二桥接线和连接线由氧化铟锡材料形成；或者
所述第一桥接线、第二桥接线和连接线由金属材料形成；或者
所述第一桥接线和所述第二桥接线由氧化铟锡材料形成，所述连接线由金属材料形成。
本发明具有下述有益效果：
根据本发明提供的电容触摸屏及其制备方法、触控装置，所述电容触摸屏包括基板、所述基板的显示区域中同层设置的多个透明电极和所述透明电极上的透明绝缘层，其中，所述透明绝缘层中设置有与所述透明电极对应的过孔，所述透明绝缘层上设置有第一桥接线，所述第一桥接线通过所述过孔将间隔至少一个透明电极的两个透明电极电连接。因此，本发明提供的电容触摸屏简化了叠层结构、提高了透过率和消影效果，从而提高了电容触摸屏的外观效果和使用性能，降低了产品成本。
附图说明
图1为根据本发明实施例的一种电容触摸屏的结构示意图。
图2为图1所示电容触摸屏的A-A剖面图。
图3为根据本发明实施的一种电容触摸屏的制备方法的流程图。
图4为示出现有技术的桥接式电容触摸屏的示意性结构的示图。
图5为示出现有技术的桥接式电容触摸屏中的X轴电极和Y轴电极的图案的示意性平面图。
图6为图5中的部分A的放大示意图。
具体实施方式
为使本领域的技术人员更好地理解本发明的技术方案，下面结合附图对本发明提供的电容触摸屏及其制备方法、触控装置进行详细描述。
图1为根据本发明实施例的一种电容触摸屏的结构示意图，图2为图1所示电容触摸屏的A-A剖面图。如图1和图2所示，所述电容触摸屏包括基板100，所述基板100包括显示区域和周边区域。所述基板100的显示区域中设置有多个透明电极，所述多个透明电极同层设置。本实施例中，所述多个透明电极形成触摸感应矩阵，所述透明电极上设置有透明绝缘层103。优选的，所述透明绝缘层全面覆盖所述基板100的显示区域，从而可以提高电容式触摸屏的桥接性能。所述透明绝缘层103上设置有与所述透明电极对应的过孔。可选的，所述过孔的形状包括圆形、方形或者梯形。所述透明绝缘层上设置有第一桥接线104，所述第一桥接线104通过所述过孔将间隔至少一个透明电极的两个透明电极电连接。本实施例提供的电容触摸屏简化了叠层结构、提高了透过率和消影效果，从而提高了电容触摸屏的外观效果和使用性能，降低了产品成本。
本实施例中，所述透明电极包括第一电极101和第二电极102，多个所述第一电极101连续设置，多个所述第二电极102间隔设置。所述透明绝缘层103将所述第一电极101与所述第二电极102物理地隔开并且使其相互电绝缘。另外，所述透明绝缘层103也将第一桥接线104与所述第一电极101物理地隔开并且使其相互电绝缘。上述设置既可以保证所述第一电极101与所述第二电极102在各自的方向上导通，又可以有效避免在所述第一电极101与所述第二电极102交错的位置出现短路。所述过孔与所述第二电极102对应设置，所述第一桥接线104通过所述过孔将相邻的两个第二电极102之间电连接。与现有技术相比，上述过孔使得所述电容式触摸屏的桥接部的两端不存在斜坡，因此提高了所述电容式触摸屏的桥接部的抗静电释放能力。
本实施例中，所述基板100的周边区域设置有黑矩阵106，所述黑矩阵106上设置有第二桥接线105和连接线107。所述第二桥接线105通过所述过孔与靠近所述黑矩阵106的透明电极电连接，所述连接线107与所述第二桥接线105电连接。
本实施例中，所述透明电极由氧化铟锡材料形成。当所述第一 桥接线104、第二桥接线105和连接线107通过一次构图工艺形成时，所述第一桥接线104、第二桥接线105和连接线107均由氧化铟锡材料形成。另外，当所述第一桥接线104、第二桥接线105和连接线107通过一次构图工艺形成时，所述第一桥接线104、第二桥接线105和连接线107也可以均由金属材料形成。当所述第一桥接线104和所述第二桥接线105通过一次构图工艺形成，而所述连接线107通过另一次构图工艺形成时，所述第一桥接线和所述第二桥接线可以由氧化铟锡材料形成，所述连接线可以由金属材料形成。
本实施例提供的电容触摸屏包括基板、所述基板的显示区域中同层设置的多个透明电极和所述透明电极上设置的透明绝缘层，其中，所述透明绝缘层中设置有与所述透明电极对应的过孔，所述透明绝缘层上设置有第一桥接线，所述第一桥接线通过所述过孔将间隔至少一个透明电极的两个透明电极电连接。因此，本实施例提供的电容触摸屏简化了叠层结构、提高了透过率和消影效果，从而提高了电容触摸屏的外观效果和使用性能，降低了产品成本。
本发明的实施例还提供了一种触控装置，包括根据本发明实施例提供的电容触摸屏。例如，所述触控装置可以包括上述实施例中的电容触摸屏。具体内容可参照上文的描述，此处不再赘述。
本实施例提供的触控装置中，所述电容触摸屏包括基板、所述基板的显示区域中同层设置的多个透明电极和所述透明电极上设置的透明绝缘层，其中，所述透明绝缘层中设置有与所述透明电极对应的过孔，所述透明绝缘层上设置有第一桥接线，所述第一桥接线通过所述过孔将间隔至少一个透明电极的两个透明电极电连接。由于使用了本发明实施例的电容触摸屏，本发明实施例的触控装置具有简化的结构、提高的透过率和改进的消影效果，从而该触控装置具有更好性能和更低的产品成本。
本发明的实施例还提供了一种电容触摸屏的制备方法。需要说明的是，尽管本实施例只针对One Glass Solution方案和On-Cell 方案进行具体描述，但是其它方案的电容触摸屏的制备方法也属于本发明的保护范围。
图3为本发明实施例提供的一种电容触摸屏的制备方法的流程图。如图3所示，所述电容触摸屏的制备方法包括：
步骤S1、在基板的显示区域中同层形成多个透明电极，所述多个透明电极形成触摸感应矩阵。
本实施例中，所述电容触摸屏包括基板，所述基板包括显示区域和周边区域。在所述基板的显示区域形成多个透明电极，所述多个透明电极同层设置。本实施例中，所述多个透明电极形成触摸感应矩阵。
步骤S2、在所述透明电极上形成透明绝缘层，所述透明绝缘层中设置有与所述透明电极对应的过孔。
本实施例中，所述透明电极上形成透明绝缘层。优选的，所述透明绝缘层全面覆盖所述基板的显示区域，从而可以提高电容式触摸屏的桥接性能。所述透明绝缘层中设置有与所述透明电极对应的过孔。可选的，所述过孔的形状包括圆形、方形或者梯形。
步骤S3、在所述透明绝缘层上形成第一桥接线，所述第一桥接线通过所述过孔将间隔至少一个透明电极的两个透明电极电连接。
本实施例中，所述透明绝缘层上形成第一桥接线，所述第一桥接线通过所述过孔将间隔至少一个透明电极的两个透明电极电连接。与现有技术相比，通过本实施例提供的电容触摸屏的制备方法制造的电容触摸屏具有简化的叠层结构、提高的透过率和改善的消影效果，从而制造的电容触摸屏具有更好的外观效果和使用性能以及更低的产品成本。
本实施例中，所述透明电极包括第一电极和第二电极，多个所述第一电极连续设置，多个所述第二电极间隔设置。所述透明绝缘层将所述第一电极与所述第二电极隔开，同时所述透明绝缘层也将第一桥接线与所述第一电极隔开，上述设置既可以保证所述第一电极与所述第二电极在各自的方向上导通，又可以有效避免在所述第一电极与所述第二电极交错的位置出现短路。所述过孔与所述第二电极对应设 置，所述第一桥接线通过所述过孔将相邻的两个第二电极电连接。
本实施例中，所述透明电极由氧化铟锡材料形成。当所述第一桥接线、第二桥接线和连接线通过一次构图工艺形成时，所述第一桥接线、第二桥接线和连接线可以均由氧化铟锡材料或者金属材料形成。具体来说，在基板的周边区域形成黑矩阵，在基板的显示区域形成透明导电薄膜，通过构图工艺形成多个透明电极，所述多个透明电极形成触摸感应矩阵。在所述透明电极上形成透明绝缘层薄膜，通过构图工艺形成透明绝缘层，所述透明绝缘层中设置有与所述透明电极对应的过孔。通过控制构图工艺的参数(例如，曝光条件和显影时间)来控制所述过孔的尺寸和形状。所述过孔的形状包括圆形、方形或者梯形，所述圆形过孔的内径范围为10μm至30μm，所述方形过孔的边长范围为10μm至30μm。在所述透明绝缘层和所述黑矩阵上形成透明导电薄膜或者金属薄膜，通过构图工艺形成第一桥接线、第二桥接线和连接线，所述第一桥接线通过所述过孔将间隔至少一个透明电极的两个透明电极电连接，所述第二桥接线通过所述过孔与靠近所述黑矩阵的透明电极电连接，所述连接线与所述第二桥接线电连接。
在实际应用中，当所述第一桥接线和所述第二桥接线通过一次构图工艺形成、而所述连接线通过另一次构图工艺形成时，所述第一桥接线和所述第二桥接线可以由氧化铟锡材料形成，所述连接线可以由金属材料形成。具体来说，在基板的周边区域形成黑矩阵，在基板的显示区域形成透明导电薄膜，通过构图工艺形成多个透明电极，所述多个透明电极形成触摸感应矩阵。在所述透明电极上形成透明绝缘层薄膜，通过构图工艺形成透明绝缘层，所述透明绝缘层中设置有与所述透明电极对应的过孔。通过控制构图工艺的参数(例如，曝光条件和显影时间)来控制所述过孔的尺寸和形状。所述过孔的形状包括圆形、方形或者梯形，所述圆形过孔的内径范围为10μm至30μm，所述方形过孔的边长范围为10μm至30μm。在所述透明绝缘层和所述黑矩阵上形成透明导电薄膜，通过构图工艺形成第一桥接线和第二桥接线，所述第一桥接线通过所述过孔将间隔至少一个透明电极的两个透明电极电连接，所述第二桥接线通过所述过孔与靠近所述黑矩阵 的透明电极电连接。在所述黑矩阵上形成金属薄膜，通过构图工艺形成连接线，所述连接线与所述第二桥接线电连接。
本实施例提供的电容触摸屏的制备方法包括：在基板的显示区域中同层形成多个透明电极，所述多个透明电极形成触摸感应矩阵；在所述透明电极上形成透明绝缘层，所述透明绝缘层中设置有与所述透明电极对应的过孔；以及在所述透明绝缘层上形成第一桥接线，所述第一桥接线通过所述过孔将间隔至少一个透明电极的两个透明电极电连接。与现有技术相比，通过本实施例提供的电容触摸屏的制备方法制造的电容触摸屏具有简化的叠层结构、提高的透过率和改善消影效果，从而制造的电容触摸屏具有更好的外观效果和使用性能以及更低的产品成本。
可以理解的是，以上实施方式仅仅是为了说明本发明的原理而采用的示例性实施方式，然而本发明并不局限于此。对于本领域内的普通技术人员而言，在不脱离本发明的精神和实质的情况下，可以做出各种变型和改进，这些变型和改进也视为本发明的保护范围。

Claims (15)

  1. 一种电容触摸屏，包括
    基板；
    所述基板的显示区域中的多个透明电极，所述多个透明电极设置在同一层中以形成触摸感应矩阵；以及
    所述透明电极上的透明绝缘层，
    其中，所述透明绝缘层中设置有与所述透明电极对应的过孔，所述透明绝缘层上设置有第一桥接线，所述第一桥接线通过所述过孔将间隔至少一个透明电极的两个透明电极电连接。
  2. 根据权利要求1所述的电容触摸屏，其中，所述透明电极包括第一电极和第二电极，多个所述第一电极连续设置，多个所述第二电极间隔设置，所述过孔与所述第二电极对应设置，所述第一桥接线通过所述过孔将相邻的两个第二电极电连接。
  3. 根据权利要求1所述的电容触摸屏，其中，所述基板的周边区域设置有黑矩阵，所述黑矩阵上设置有第二桥接线和连接线，所述第二桥接线通过所述过孔与靠近所述黑矩阵的透明电极电连接，所述连接线与所述第二桥接线电连接。
  4. 根据权利要求1所述的电容触摸屏，其中，所述透明电极由氧化铟锡材料形成。
  5. 根据权利要求3所述的电容触摸屏，其中，所述第一桥接线、第二桥接线和连接线由氧化铟锡材料形成；或者
    所述第一桥接线、第二桥接线和连接线由金属材料形成；或者
    所述第一桥接线和所述第二桥接线由氧化铟锡材料形成，所述连接线由金属材料形成。
  6. 根据权利要求3所述的电容触摸屏，其中，所述第一桥接线、第二桥接线和连接线同层设置并且通过一次构图工艺形成。
  7. 根据权利要求1所述的电容触摸屏，其中，所述透明绝缘层全面覆盖所述显示区域。
  8. 根据权利要求1所述的电容触摸屏，其中，所述过孔的形状为圆形、方形或者梯形。
  9. 一种触控装置，包括权利要求1-8任一所述的电容触摸屏。
  10. 一种电容触摸屏的制备方法，包括：
    步骤S1、在基板的显示区域中同层形成多个透明电极，所述多个透明电极形成触摸感应矩阵；
    步骤S2、在所述透明电极上形成透明绝缘层，所述透明绝缘层中设置有与所述透明电极对应的过孔；以及
    步骤S3、在所述透明绝缘层上形成第一桥接线，所述第一桥接线通过所述过孔将间隔至少一个透明电极的两个透明电极电连接。
  11. 根据权利要求10所述的电容触摸屏的制备方法，其中，所述透明电极包括第一电极和第二电极，多个所述第一电极连续设置，多个所述第二电极间隔设置，所述过孔与所述第二电极对应设置，所述第一桥接线通过所述过孔将相邻的两个第二电极电连接。
  12. 根据权利要求10所述的电容触摸屏的制备方法，其中，所述步骤S1之前包括：
    在基板的周边区域形成黑矩阵；并且
    在所述透明绝缘层上形成第一桥接线的同时，在所述黑矩阵上形成第二桥接线和连接线，所述第二桥接线通过所述过孔与靠近所述黑矩阵的透明电极电连接，所述连接线与所述第二桥接线电连接。
  13. 根据权利要求10所述的电容触摸屏的制备方法，其中，所述步骤S1之前包括：
    在基板的周边区域形成黑矩阵；并且
    在所述透明绝缘层上形成第一桥接线的同时，在所述黑矩阵上形成第二桥接线，所述第二桥接线通过所述过孔与靠近所述黑矩阵的透明电极电连接；并且
    所述步骤S3之后包括：
    在所述黑矩阵上形成连接线，所述连接线与所述第二桥接线电连接。
  14. 根据权利要求10所述的电容触摸屏的制备方法，其中，所述透明电极由氧化铟锡材料形成。
  15. 根据权利要求12或权利要求13所述的电容触摸屏的制备方法，其中，所述第一桥接线、第二桥接线和连接线由氧化铟锡材料形成；或者
    所述第一桥接线、第二桥接线和连接线由金属材料形成；或者
    所述第一桥接线和所述第二桥接线由氧化铟锡材料形成，所述连接线由金属材料形成。
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