201013500 六、發明說明： 【發明所屬之技術領域】 本發明是有關於一種觸控螢幕，以及該觸控螢幕的 製造方法，特別是有關於一種電容式觸控螢幕及其製造 方法。 【先前技術】 Φ 電容式觸控螢幕包括沿X方向和沿Y方向縱橫交叉 的兩組導線，習知之電容式觸控螢幕導線佈線結構存在 如下問題： 1、 由於導電層材料採用透明材料，膜層較薄，在 兩組導線相交叉點處位於上方的橋接層層容易出現斷線 現象，導致導線局部斷線； 2、 導電層的線電阻較高，故使得觸控螢幕性能不 佳； φ 3、 X方向和Y方向兩組導線空間交叉，其製程係 依序沈積底層導電層、絕緣層以及上層導電層。由於兩 組導線的透明導電層必須分別製作，會引起兩層導電層 的顏色差異，降低觸控螢幕的產品品質； 4、由於觸控螢幕缺乏屏蔽結構，觸控螢幕無法屏 蔽來自顯示器的電磁干擾，導致觸控螢幕性能受到影響。 201013500 【發明内容】 有鑑於上述習知技藝之問題，本發明之其中一目的 就是在提供一種電容式觸控螢幕，以解決習知之電容式 觸控螢幕導線局部斷線、導電層線電阻過高以及色差等 問題。 有鑑於上述習知技藝之問題，本發明之另一目的就 是在提供一種電容式觸控螢幕佈線的製造方法，以解決 習知之導線局部斷線、導電層線電阻高以及色差等問題。 根據本發明之一目的，提出一種電容式觸控螢幕， 其包含一基板以及在基板上分別沿X、γ方向佈置的第 一透明導電層及第一透明導電層，以及一絕緣層。 其中，第一透明導電層，其係連續設置於基板上成 導線狀；而第二透明導電層係被第一透明導電層截斷， 而呈被分段設置之導線狀；絕緣層係覆蓋此兩透明導 層和基板表面。 其中， 少一個通孔 每段第二透明導電層上方的絕緣層更包含至 一其中，此觸控螢幕更包括附著在絕緣層上對應於 二透明導電層的金屬橋接層，此金屬橋接層係橫^第一 透明導電層，鋪由絕緣層上的通孔連接位㈣ 導電層兩侧成間隔設置狀的第二透明導電層， 連續導線狀。 成為 其中，設置在每段第二透明導電層上方的絕緣層上 201013500 之通孔數量係為兩個或兩個以上。 其中’通孔的形狀係為圓形、長方形、正方形或擴 圓形之一。 其中，金屬橋接層係為一層或一層以上的金屬層或 金屬合金層。 其中，金屬橋接層的寬度小於第二透明導電層的寬 度。 在本發明的電容式觸控螢幕中，更包括一屏蔽層， 此屏蔽層係為附著在基板設置兩透明導電層和絕緣層一 側相對的另—侧表面上，係為—層或—層以上的透明導 J層，屏蔽層的區域與第一及第二透明導電層的佈置區 域相對應。 其中，屏蔽層係為連續的透明導電層或設置圖案的 透明導電層。 % 在本發明的電容式觸控螢幕中，更包括覆蓋在屏蔽 上並露出屏蔽層局部連接點的絕緣保護層。 的製發Γ之另一目的，提出一種電容式觸控螢幕 氣乂方法，包含下列步驟： 佈置基板上製作分別沿χ、γ方向 月導電層係為連續設置成導透 第-透明導雷^ 導線第二透明導電層係以 S2 . 層為間隔’而呈被分段設置之導線狀； 層、第二Si:::二:緣層覆蓋於第-透明導電 電層上方絕緣層之上製;;=個=段第二透明導 201013500 透明作—金屬橋接層’此金屬橋接層係橫跨第一 心:r隔設置狀的第二透明導電層’而使: 在本發明的電容式觸控螢幕的製造方法中，更包括 在基板設置兩透明導電層和絕緣層-侧相對的另-侧表 t ’ ΐ作附著在該表面上的透明導電層之—屏蔽層的 步驟，該屏蔽層的設置區域與第―、第二透明導 佈置區域相對應。 在本發明的電容式觸控螢幕的製造方法中，更包括 在屏蔽層上製作覆蓋該屏蔽層且露出屏蔽層局部連接點 的絕緣保護層的步驟。 ‘ 承上所述，依本發明之電容式觸控螢幕及其製造方 法，其可具有一或多個下述優點： (1) 金屬橋接層較厚，不易出現斷線現象，提高了 第二透明導電層的連續性。 (2) 金屬橋接層的線電阻遠小於第二透明導電層的 線電阻，進而提高了觸控螢幕的性能。 (3) 兩透明導電層可以同時製作，避免了分別製作 造成的色差’因而提高了觸控螢幕的產品品質。 (4) 由於在基板背面設置了透明導電層作為屏蔽 層，可以有效排除來自顯示器件的電磁干擾，進而避免 使觸控螢幕性能受到影響。 201013500 【實施方式】 請參閱第1圖和第2圖，係為本發明電容式觸控螢 幕之第一實施例之節點結構平面圖及截面圖。本發明 電谷式觸控螢幕包括一基板1、一第二透明導電層2、二 第一透明導電層4以及一絕緣層3。其中，該第—透明 導電層2係於基板1上沿X方向布置之導線，而該第— 透明導電層4則係於基板1上沿γ方向布置之導線。 ❹ 第一透明導電層4係為連續設置而成導線狀；而第 二透明導電層2則以第一透明導電層4為間隔，呈分段 設置狀。 ^ 絕緣層3係覆蓋在兩透明導電層（第二透明導電層 2及第一透明導電層4)和基板1的表面上。 在各段第二透明導電層2上方的絕緣層上係設有至 少一個通孔5,且在絕緣層3上對應於第二透明導電層2 更設有一金屬橋接層6 (即設置金屬橋接層6對應於第 ❹一透明導電層2的每一段）。此金屬橋接層6橫跨第一透 明導電層4’並藉由絕緣層3上的通孔5連接位於第一 透明導電層4兩侧成間隔設置狀的第二透明導電層2， 而使之成為連續導線狀。 另外，在觸控螢幕邊緣的引線區，絕緣層3係局部 露出第一透明導電層4和第二透明導電層2，以便連接 兩透明導電層的引線。 其中’基板1可以採用玻璃基板或其他替代玻璃的 透明板材。 201013500 j中，上述在各段第二透明導電層2上方的絕緣層 3上叹置的通孔5,可以為一個、兩個、三個或複數個； 通孔5的形狀則可以採用包括但不限於圓形、長方形、 正方形或橢圓形。 其中，上述的金屬橋接層6可以採用一層或一層以 上的金屬層或金屬合金層。 在本實施例中，金屬橋接層6的寬度係小於第二透 明導電層2的寬度。而在其他實施例中，根據需要，金 屬橋接層6的寬度可以等於或大於第二透明導電層2的 寬度。 為了排除來自顯示器的電磁干擾，避免觸控螢幕的 性能受到影響，本發明的電容式觸控螢幕可以嗖 蔽層7。 # 請參閱第2圖，係為本發明電容式觸控螢幕之第一 實施例之節點結構剖面圖，本圖係為第丨圖中之AA戴 面圖。屏蔽層7係設於基板1設置兩透明導電層（第_ 透明導電層2及第—透明導電層4)和絕緣層3 一侧: 對的另一側表面上，為一層或一層以上的透明導電^ 膜。屏蔽層7的設置區域與第一和第二透明導電層的佈 置區域相適應，即在滿足屏蔽要求的條件下，屏蔽層7 的區域可以等於、小於或大於第一和第二透明 佈置區域。 电贋的 屏蔽層7可以採用連續的透明導電層，根據需要， 亦可以採用設置滿足需要的圖案的透明導電層。 ’ 為了保護屏蔽層7，可以設置覆蓋屏蔽層7的絕緣 201013500 保護層（圖中未示出），絕緣保護層上露出屏蔽層的局部 連接點，以便連接屏蔽層7的引線。 ，請參閱第3圖’係為本發明電容式觸㈣幕的製造 方法之第一實施例流程圖。本發明的電容式觸控螢幕的 製造方法包括如下步驟： 51 :同時在基板上製作分別沿χ、γ方向佈置第二 透明導電層2及第一透明導電層，第_透明導電層4係 為連續設置成導線狀，而第二透明導電層2則以第一透 ❹明導電層4為間隔’呈分段設置狀； 52 :製作一絕緣層3，此絕緣層3係覆蓋於第一透 明導電層4、第二透明導電層2和基板i的表面，並在 各段第二透明導電層2上方的絕緣層3上製作至少一 孔5 ; 53 :製作一金屬橋接層6，此金屬橋接層6係橫跨 第透明導電層4，並藉由絕緣層3上的通孔5連接位 於第一透明導電層4兩側呈間隔設置狀的第二透明導電 參層2，而使之成為連續導線狀。 在第一步中，根據需要而分佈在基板上之第一透明 導電層4及第二透明導電層2,不影響本發明目的的實 現。 在其他實施例中，為了實現觸控螢幕的屏蔽要求， 本發明的電容式觸控螢幕的製造方法更包括一製作屏蔽 層的步驟’該步驟在基板〗設置兩透明導電層（第—透 明導電層4及第二透明導電層2)和絕緣層3 —侧相對 的另一侧表面上製作附著在該表面上的一透明導電層屏 9 201013500 蔽層7，該屏蔽層7的設置區域與第一透明導電層4及 第二透明導電層2的佈置區域相對應。該步驟可以在上 述第一步、第二步、第三步之前、之中或之後進行。 在其他實施例中，為了實現對觸控螢幕的屏蔽層7 的保護’本發明的電容式觸控螢幕的製造方法更包括一 製作屏蔽層的絕緣保護層的步驟，該步驟在屏蔽層7上 製作覆蓋該屏蔽層7,並露出屏蔽層局部連接點的絕緣 保護層。該步驟在上述製作屏蔽層的步驟之後進行。 【圖式簡單說明】 第1圖係為本發明電容式觸控螢幕之第一實施例之節 點結構平面圖。 第2圖係為本發明電容式觸控螢幕之第，實施例之節 點結構剖面圖。 第3圖係為本發明電容式觸控螢幕的製造方法之第一 實施例流程圖。 201013500 【主要元件符號說明】 1 :基板 2 :第二透明導電層 3 :絕緣層 4:第一透明導電層 5 :通孔 6 :金屬橋接層 7 :屏蔽層[Technical Field] The present invention relates to a touch screen, and a method of manufacturing the touch screen, and more particularly to a capacitive touch screen and a method of fabricating the same. [Prior Art] Φ Capacitive touch screen includes two sets of wires that cross each other in the X direction and in the Y direction. The conventional capacitive touch screen wire wiring structure has the following problems: 1. Since the conductive layer material is made of transparent material, the film The layer is thinner, and the bridging layer located above the intersection of the two sets of wires is prone to wire breakage, resulting in partial wire breakage; 2. The wire resistance of the conductive layer is high, so the performance of the touch screen is not good; 3. The two sets of wires in the X direction and the Y direction intersect in space, and the process sequentially deposits the underlying conductive layer, the insulating layer and the upper conductive layer. Since the transparent conductive layers of the two sets of wires must be separately fabricated, the color difference between the two conductive layers is caused, and the quality of the touch screen is lowered. 4. Since the touch screen lacks the shielding structure, the touch screen cannot shield the electromagnetic interference from the display. Causes touch screen performance to be affected. 201013500 SUMMARY OF THE INVENTION In view of the above problems, one of the objects of the present invention is to provide a capacitive touch screen to solve the problem that the conventional capacitive touch screen wire is partially broken and the conductive layer resistance is too high. And problems such as chromatic aberration. In view of the above-mentioned problems of the prior art, another object of the present invention is to provide a method of manufacturing a capacitive touch screen wiring to solve the problems of conventional wire breakage, high conductive layer resistance, and chromatic aberration. According to an aspect of the present invention, a capacitive touch screen is provided, comprising a substrate and a first transparent conductive layer and a first transparent conductive layer disposed on the substrate in the X and γ directions, respectively, and an insulating layer. Wherein, the first transparent conductive layer is continuously disposed on the substrate in a wire shape; and the second transparent conductive layer is cut by the first transparent conductive layer, and is formed in a segmented wire shape; the insulating layer covers the two Transparent conductive layer and substrate surface. The insulating layer above the second transparent conductive layer is further included in one of the via holes, and the touch screen further comprises a metal bridge layer corresponding to the two transparent conductive layers attached to the insulating layer, the metal bridge layer The first transparent conductive layer is provided with a through-hole connection on the insulating layer. (4) A second transparent conductive layer which is spaced apart on both sides of the conductive layer and has a continuous wire shape. Among them, the number of through holes in the 201013500 is set to be two or more on the insulating layer above each second transparent conductive layer. Wherein the shape of the through hole is one of a circle, a rectangle, a square or an enlarged circle. Wherein, the metal bridging layer is one or more metal layers or metal alloy layers. Wherein, the width of the metal bridging layer is smaller than the width of the second transparent conductive layer. In the capacitive touch screen of the present invention, a shielding layer is further disposed on the other side surface opposite to the side where the transparent conductive layer and the insulating layer are disposed on the substrate, and is a layer or a layer. In the above transparent conductive J layer, the region of the shielding layer corresponds to the arrangement area of the first and second transparent conductive layers. Wherein, the shielding layer is a continuous transparent conductive layer or a patterned transparent conductive layer. % In the capacitive touch screen of the present invention, an insulating protective layer covering the shield and exposing a local connection point of the shield layer is further included. Another purpose of the hairpin is to provide a capacitive touch screen gas smashing method, which comprises the following steps: arranging on the arranging substrate, respectively, the monthly conductive layer along the χ and γ directions is continuously arranged to be transparent to the transparent-guided thunder ^ The second transparent conductive layer of the wire is in the form of a segmented wire with the S2 layer being spaced apart; the layer, the second Si::: two: edge layer is overlaid on the insulating layer above the first transparent conductive layer; ; = = = segment second transparent guide 201013500 transparent work - metal bridge layer 'this metal bridge layer across the first core: r spacer shaped second transparent conductive layer' to: in the capacitive touch of the present invention In the manufacturing method of the screen, the method further includes the step of disposing two transparent conductive layers on the substrate and the opposite side surface of the insulating layer-side as a shielding layer of the transparent conductive layer attached to the surface, the shielding layer The setting area corresponds to the first and second transparent guiding arrangement areas. In the method of manufacturing a capacitive touch screen of the present invention, the method further includes the step of forming an insulating protective layer covering the shielding layer and exposing a local connection point of the shielding layer on the shielding layer. According to the capacitive touch screen of the present invention and the manufacturing method thereof, it may have one or more of the following advantages: (1) The metal bridge layer is thick, and the wire breakage phenomenon is not easy to occur, and the second is improved. The continuity of the transparent conductive layer. (2) The line resistance of the metal bridge layer is much smaller than the line resistance of the second transparent conductive layer, thereby improving the performance of the touch screen. (3) The two transparent conductive layers can be fabricated at the same time, avoiding the color difference caused by the separate manufacturing, thereby improving the quality of the touch screen. (4) Since a transparent conductive layer is provided as a shielding layer on the back surface of the substrate, electromagnetic interference from the display device can be effectively eliminated, thereby preventing the touch screen performance from being affected. 201013500 [Embodiment] Please refer to FIG. 1 and FIG. 2, which are a plan view and a cross-sectional view showing a node structure of a first embodiment of a capacitive touch screen of the present invention. The electric valley touch screen of the present invention comprises a substrate 1, a second transparent conductive layer 2, two first transparent conductive layers 4 and an insulating layer 3. The first transparent conductive layer 2 is a wire arranged on the substrate 1 in the X direction, and the first transparent conductive layer 4 is a wire arranged on the substrate 1 in the γ direction. ❹ The first transparent conductive layer 4 is continuously provided in a wire shape, and the second transparent conductive layer 2 is arranged in a segmented manner at intervals of the first transparent conductive layer 4. The insulating layer 3 is coated on the surfaces of the two transparent conductive layers (the second transparent conductive layer 2 and the first transparent conductive layer 4) and the substrate 1. At least one through hole 5 is disposed on the insulating layer above the second transparent conductive layer 2, and a metal bridge layer 6 is disposed on the insulating layer 3 corresponding to the second transparent conductive layer 2 (ie, a metal bridge layer is disposed) 6 corresponds to each segment of the first transparent conductive layer 2). The metal bridge layer 6 spans the first transparent conductive layer 4 ′ and connects the second transparent conductive layer 2 disposed on both sides of the first transparent conductive layer 4 via the through holes 5 on the insulating layer 3 to make it It becomes a continuous wire. In addition, in the lead region of the edge of the touch screen, the insulating layer 3 partially exposes the first transparent conductive layer 4 and the second transparent conductive layer 2 to connect the leads of the two transparent conductive layers. Wherein the substrate 1 may be a glass substrate or other transparent plate instead of glass. In 201013500, the through holes 5 which are slanted on the insulating layer 3 above the second transparent conductive layer 2 of each segment may be one, two, three or plural; the shape of the through hole 5 may be included but It is not limited to a circle, a rectangle, a square, or an ellipse. Wherein, the metal bridging layer 6 may be a metal layer or a metal alloy layer of one or more layers. In the present embodiment, the width of the metal bridging layer 6 is smaller than the width of the second transparent conductive layer 2. In other embodiments, the width of the metal bridge layer 6 may be equal to or greater than the width of the second transparent conductive layer 2, as desired. In order to eliminate electromagnetic interference from the display and to avoid the performance of the touch screen being affected, the capacitive touch screen of the present invention can shield the layer 7. #Please refer to FIG. 2, which is a cross-sectional view of a node structure of a first embodiment of the capacitive touch screen of the present invention, and this figure is an AA wearing diagram in the third drawing. The shielding layer 7 is disposed on the substrate 1 on which two transparent conductive layers (the first transparent conductive layer 2 and the first transparent conductive layer 4) and the insulating layer 3 are disposed: on the other side surface of the pair, one or more layers are transparent. Conductive film. The arrangement area of the shield layer 7 is adapted to the arrangement area of the first and second transparent conductive layers, i.e., the area of the shield layer 7 may be equal to, smaller or larger than the first and second transparent arrangement areas, under the condition that the shielding requirements are satisfied. The shield layer 7 of the electrode can be a continuous transparent conductive layer, and a transparent conductive layer that satisfies a desired pattern can also be used as needed. In order to protect the shield layer 7, an insulating layer 201013500 covering the shield layer 7 (not shown) may be provided, and a local connection point of the shield layer is exposed on the insulating protective layer to connect the leads of the shield layer 7. Please refer to FIG. 3, which is a flow chart of a first embodiment of a method for manufacturing a capacitive touch (four) screen of the present invention. The manufacturing method of the capacitive touch screen of the present invention comprises the following steps: 51: simultaneously forming a second transparent conductive layer 2 and a first transparent conductive layer along the χ and γ directions on the substrate, wherein the transparent conductive layer 4 is Continuously disposed in a wire shape, and the second transparent conductive layer 2 is arranged in a segmented manner at intervals of the first transparent conductive layer 4; 52: an insulating layer 3 is formed, and the insulating layer 3 is covered with the first transparent a surface of the conductive layer 4, the second transparent conductive layer 2 and the substrate i, and at least one hole 5 is formed on the insulating layer 3 above each of the second transparent conductive layers 2; 53: a metal bridge layer 6 is formed, which is bridged The layer 6 straddles the transparent conductive layer 4, and connects the second transparent conductive layer 2 disposed on both sides of the first transparent conductive layer 4 through the through holes 5 in the insulating layer 3 to make it continuous. Wire-like. In the first step, the first transparent conductive layer 4 and the second transparent conductive layer 2, which are distributed on the substrate as needed, do not affect the achievement of the object of the present invention. In other embodiments, in order to achieve the shielding requirements of the touch screen, the manufacturing method of the capacitive touch screen of the present invention further includes a step of forming a shielding layer, which is provided with two transparent conductive layers on the substrate (first transparent conductive layer). The transparent conductive layer screen 9 201013500 is adhered to the surface of the layer 4 and the second transparent conductive layer 2) and the other side of the insulating layer 3, and the shielding layer 7 is disposed on the surface. A transparent conductive layer 4 and an arrangement area of the second transparent conductive layer 2 correspond to each other. This step can be performed before, during, or after the first step, the second step, the third step, or the third step. In other embodiments, in order to protect the shielding layer 7 of the touch screen, the manufacturing method of the capacitive touch screen of the present invention further includes a step of forming an insulating protective layer of the shielding layer on the shielding layer 7. An insulating protective layer covering the shielding layer 7 and exposing the local connection point of the shielding layer is formed. This step is performed after the step of fabricating the shield layer described above. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a plan view showing a node structure of a first embodiment of a capacitive touch screen of the present invention. Fig. 2 is a sectional view showing the structure of a node of the capacitive touch screen of the present invention. Fig. 3 is a flow chart showing a first embodiment of a method of manufacturing a capacitive touch screen of the present invention. 201013500 [Description of main component symbols] 1 : Substrate 2 : Second transparent conductive layer 3 : Insulation layer 4 : First transparent conductive layer 5 : Through hole 6 : Metal bridge layer 7 : Shield layer