TWI427519B - Capacitive touch structure and manufacturing method thereof - Google Patents

Description

Capacitive touch structure and manufacturing method thereof

The present invention relates to a touch structure, and a method of fabricating the touch structure, and more particularly to a capacitive touch structure and a method of fabricating the same.

The capacitive touch structure includes two sets of wires crossing in the X direction and in the Y direction. The conventional capacitive touch structure wire wiring structure has the following problems: 1. Since the conductive layer material is made of a transparent material, the film layer is thin, The bridging layer at the intersection of the two sets of wires is prone to wire breakage, resulting in partial wire breakage; 2. The wire resistance of the conductive layer is high, so the performance of the touch structure is poor; 3. X direction and Y In the direction, the two sets of wires intersect in space, and the process sequentially deposits the underlying conductive layer, the insulating layer and the upper conductive layer. Since the transparent conductive layers of the two sets of wires must be separately fabricated, the color difference between the two conductive layers is caused, and the quality of the touch screen is lowered. 4. Since the touch structure lacks the shielding structure, the touch screen cannot shield the electromagnetic interference from the display. Causes touch screen performance to be affected.

In view of the above problems in the prior art, one of the objects of the present invention is to provide a capacitive touch structure for solving the partial disconnection of a conventional capacitive touch structure wire. , Conductive layer line resistance is too high and chromatic aberration and other issues.

In view of the above problems in the prior art, another object of the present invention is to provide a method for fabricating a capacitive touch structure wiring to solve the problems of conventional wire breakage, high conductive layer resistance, and chromatic aberration.

According to an aspect of the present invention, a capacitive touch structure is provided, comprising a substrate and a second transparent conductive layer and a first transparent conductive layer disposed on the substrate in the X and Y directions, respectively, and an insulating layer.

Wherein, the first transparent conductive layer is continuously disposed on the substrate in a wire shape; and the second transparent conductive layer is cut by the first transparent conductive layer, and is formed in a segmented wire shape; the insulating layer covers the two Transparent conductive layer and substrate surface.

Wherein, the insulating layer above each of the second transparent conductive layers further comprises at least one through hole.

The touch structure further includes a metal bridge layer attached to the insulating layer corresponding to the second transparent conductive layer, the metal bridge layer spanning the first transparent conductive layer, and is connected by a through hole on the insulating layer A second transparent conductive layer is disposed on both sides of a transparent conductive layer so as to be in a continuous wire shape.

The number of through holes provided on the insulating layer above each of the second transparent conductive layers is two or more.

Wherein, the shape of the through hole is one of a circle, a rectangle, a square or an ellipse.

Wherein, the metal bridging layer is one or more metal layers or metal alloy layers.

Wherein, the width of the metal bridging layer is smaller than the width of the second transparent conductive layer.

In the capacitive touch structure of the present invention, a shielding layer is further disposed on the other side surface opposite to the side where the two transparent conductive layers and the insulating layer are disposed on the substrate, and is one layer or more. The transparent conductive layer has a region corresponding to the arrangement area of the first and second transparent conductive layers.

Wherein, the shielding layer is a continuous transparent conductive layer or a patterned transparent conductive layer.

In the capacitive touch structure of the present invention, an insulating protective layer covering the shielding layer and exposing a local connection point of the shielding layer is further included.

According to another aspect of the present invention, a method for fabricating a capacitive touch structure is provided, comprising the steps of: S1: simultaneously or separately forming a second transparent conductive layer and a first layer respectively arranged along the X and Y directions on a substrate. a transparent conductive layer, the first transparent conductive layer is continuously arranged in a wire shape; the second transparent conductive layer is separated by a first transparent conductive layer, and is formed in a segmented wire shape; S2: forming an insulating layer, The insulating layer covers the first transparent conductive layer, the second transparent conductive layer and the surface of the substrate, and at least one through hole is formed on the insulating layer above the second transparent conductive layer; S3: forming a metal bridge layer, the metal The bridging layer spans the first transparent conductive layer, and the second transparent conductive layer disposed at intervals on both sides of the first transparent conductive layer is connected by a through hole on the insulating layer to form a continuous conductive line.

In the manufacturing method of the capacitive touch structure of the present invention, the method further comprises: forming a shielding layer of the transparent conductive layer attached to the surface on the other side surface opposite to the side where the transparent conductive layer and the insulating layer are disposed on the substrate. Step, the setting area of the shielding layer and the 1. The arrangement area of the second transparent conductive layer corresponds.

In the manufacturing method of the capacitive touch structure of the present invention, the method further includes the step of forming an insulating protective layer covering the shielding layer and exposing the local connection point of the shielding layer on the shielding layer.

In view of the above, the capacitive touch structure and the method of manufacturing the same according to the present invention may have one or more of the following advantages:

(1) The metal bridging layer is thick, and the disconnection phenomenon is less likely to occur, and the continuity of the second transparent conductive layer is improved.

(2) The line resistance of the metal bridge layer is much smaller than the line resistance of the second transparent conductive layer, thereby improving the performance of the touch screen.

(3) The two transparent conductive layers can be fabricated at the same time, thereby avoiding the chromatic aberration caused by the separate fabrication, thereby improving the product quality of the touch screen.

(4) Since a transparent conductive layer is provided as a shielding layer on the back surface of the substrate, electromagnetic interference from the display device can be effectively eliminated, thereby preventing the touch screen performance from being affected.

1‧‧‧Substrate

2‧‧‧Second transparent conductive layer

3‧‧‧Insulation

4‧‧‧First transparent conductive layer

5‧‧‧through hole

6‧‧‧Metal bridge layer

7‧‧‧Shield

S1~S3‧‧‧ steps

1 is a plan view of a node structure of a first embodiment of a capacitive touch structure of the present invention; and FIG. 2 is a cross-sectional view of a node structure of a first embodiment of the capacitive touch structure of the present invention; and FIG. A flow chart of a first embodiment of a method of fabricating a capacitive touch structure of the present invention.

1 and 2 are a plan view and a cross-sectional view of a node structure of a first embodiment of a capacitive touch structure according to the present invention. The capacitive touch structure of the present invention comprises a substrate 1, a second transparent conductive layer 2, a first transparent conductive layer 4 and an insulating layer 3. The second transparent conductive layer 2 is a wire disposed on the substrate 1 in the X direction, and the first transparent conductive layer 4 is a wire disposed on the substrate 1 in the Y direction.

The first transparent conductive layer 4 is continuously arranged in a wire shape, and the second transparent conductive layer 2 is arranged in a segmented manner at intervals of the first transparent conductive layer 4.

The insulating layer 3 covers the surfaces of the two transparent conductive layers (the second transparent conductive layer 2 and the first transparent conductive layer 4) and the substrate 1.

At least one through hole 5 is disposed on the insulating layer above the second transparent conductive layer 2, and a metal bridge layer 6 is disposed on the insulating layer 3 corresponding to the second transparent conductive layer 2 (ie, a metal bridge layer is disposed) 6 corresponds to each segment of the second transparent conductive layer 2). The metal bridge layer 6 straddles the first transparent conductive layer 4, and connects the second transparent conductive layer 2 disposed on both sides of the first transparent conductive layer 4 through the through holes 5 in the insulating layer 3, thereby making it It becomes a continuous wire.

In addition, in the lead region at the edge of the touch structure, the insulating layer 3 partially exposes the first transparent conductive layer 4 and the second transparent conductive layer 2 to connect the leads of the two transparent conductive layers.

The substrate 1 may be a glass substrate or other transparent plate instead of glass.

The through holes 5 disposed on the insulating layer 3 above the second transparent conductive layer 2 of each segment may be one, two, three or plural; the shape of the through holes 5 may include but not limited to a circle. Shape, rectangle, square or ellipse.

Wherein, the metal bridging layer 6 may be one or more metal layers or metal alloy layers.

In the present embodiment, the width of the metal bridging layer 6 is smaller than the width of the second transparent conductive layer 2. In other embodiments, the width of the metal bridging layer 6 may be equal to or greater than the width of the second transparent conductive layer 2, as needed.

In order to eliminate electromagnetic interference from the display and to avoid the performance of the touch screen being affected, the capacitive touch structure of the present invention may be provided with a shielding layer 7.

2 is a cross-sectional view of a node structure of a first embodiment of a capacitive touch structure according to the present invention. The figure is a cross-sectional view taken along line AA of FIG. 1. The shielding layer 7 is disposed on the other side surface of the substrate 1 where the two transparent conductive layers (the second transparent conductive layer 2 and the first transparent conductive layer 4) and the insulating layer 3 are opposite to each other, and is one or more transparent conductive layers. film. The arrangement area of the shielding layer 7 is adapted to the arrangement area of the first and second transparent conductive layers, that is, the area of the shielding layer 7 may be equal to, smaller or larger than the first and second transparent conductive layers, under the condition that the shielding requirement is satisfied. Arrange the area.

The shielding layer 7 may be a continuous transparent conductive layer, and a transparent conductive layer that satisfies a desired pattern may also be used as needed.

In order to protect the shielding layer 7, an insulating protective layer (not shown) covering the shielding layer 7 may be provided, and a local connection point of the shielding layer is exposed on the insulating protective layer to connect the leads of the shielding layer 7.

Please refer to FIG. 3, which is a flow chart of a first embodiment of a method for manufacturing a capacitive touch structure according to the present invention. The manufacturing method of the capacitive touch structure of the present invention comprises the following steps: S1: simultaneously forming a second transparent conductive layer 2 and a first transparent conductive layer in the X and Y directions on the substrate, the first transparent conductive layer 4 is continuously arranged in a wire shape, and the second transparent conductive layer 2 is The first transparent conductive layer 4 is spaced and arranged in a segment; S2: an insulating layer 3 is formed, and the insulating layer 3 covers the surfaces of the first transparent conductive layer 4, the second transparent conductive layer 2, and the substrate 1, and At least one through hole 5 is formed on the insulating layer 3 above each of the second transparent conductive layers 2: S3: a metal bridging layer 6 is formed, which crosses the first transparent conductive layer 4 and is insulated by an insulating layer The through hole 5 on the third transparent conductive layer 2 which is disposed at intervals on both sides of the first transparent conductive layer 4 is connected to be formed into a continuous wire shape. In the first step, the first transparent conductive layer 4 and the second transparent conductive layer 2 distributed on the substrate as needed do not affect the realization of the object of the present invention.

In other embodiments, in order to achieve the shielding requirements of the touch screen, the manufacturing method of the capacitive touch structure of the present invention further includes a step of fabricating a shielding layer, wherein the step of providing two transparent conductive layers on the substrate 1 (first transparent conductive) The transparent conductive layer shielding layer 7 attached to the surface is formed on the other side surface of the layer 4 and the second transparent conductive layer 2) opposite to the insulating layer 3, and the shielding layer 7 is disposed with the first transparent conductive layer. The arrangement regions of the layer 4 and the second transparent conductive layer 2 correspond to each other. This step can be carried out before, during or after the first step, the second step, the third step, or the like.

In other embodiments, in order to protect the shielding layer 7 of the touch structure, the manufacturing method of the capacitive touch structure of the present invention further includes the step of fabricating an insulating protective layer of the shielding layer on the shielding layer 7. An insulating protective layer covering the shielding layer 7 and exposing the local connection point of the shielding layer is formed. This step is performed after the step of fabricating the shield layer described above.

1‧‧‧Substrate

2‧‧‧Second transparent conductive layer

3‧‧‧Insulation

4‧‧‧First transparent conductive layer

5‧‧‧through hole

6‧‧‧Metal bridge layer

7‧‧‧Shield

Claims (11)

A capacitive touch structure comprises: a substrate; a first transparent conductive layer is a wire continuously arranged in the Y direction on the substrate; and a second transparent conductive layer is formed on the substrate along the X direction a wire having the first transparent conductive layer as a space and arranged in a segment; an insulating layer covering the first transparent conductive layer, the second transparent conductive layer and the surface of the substrate; at least one through hole Provided above the insulating layer above each of the second transparent conductive layer segments; and a metal bridge layer disposed on the insulating layer corresponding to each of the second transparent conductive layers, across the first transparent conductive layer And connecting, by the through hole, the second transparent conductive layer disposed in the segment; wherein the insulating layer is projected to overlap the length of the second transparent conductive layer, and the projection of the metal bridge layer overlaps the second transparent The length of the conductive layer; and any one end of the metal bridging layer in the X direction has a spacing from any one of the corresponding ends of the insulating layer X direction. The capacitive touch structure of claim 1, wherein the number of the through holes is two or more. The capacitive touch structure of claim 1, wherein the through hole has a circular, rectangular, square or elliptical shape. The capacitive touch structure of claim 1, wherein the metal bridge The layer is a layer of one or more metal layers or metal alloy layers. The capacitive touch structure of claim 1, wherein the metal bridge layer has a width smaller than a width of the second transparent conductive layer. The capacitive touch structure of any one of the preceding claims, further comprising a shielding layer, wherein the shielding layer is provided with the first transparent conductive layer attached to the substrate, the first The transparent conductive layer and the other side surface opposite to one side of the insulating layer are one or more transparent conductive layers, and the shielding layer is disposed on the first transparent conductive layer and the second transparent conductive layer The layout areas of the layers correspond. The capacitive touch structure of claim 6, wherein the shielding layer is a continuous transparent conductive layer or a patterned transparent conductive layer. The capacitive touch structure of claim 7, further comprising an insulating protective layer covering the shielding layer and exposing a local connection point of the shielding layer. A method for manufacturing a capacitive touch structure, comprising the steps of: simultaneously or separately forming a second transparent conductive layer disposed along an X direction on a substrate, and disposing a first transparent conductive layer along a Y direction, the first transparent The conductive layer is continuously disposed and has a wire shape, and the second transparent conductive layer is arranged in a segmented shape with the first transparent conductive layer as an interval; and an insulating layer is formed, the insulating layer covers the first a transparent conductive layer, the second transparent conductive layer and the surface of the substrate, and at least one through hole is formed on the insulating layer above each of the second transparent conductive layer segments; and a metal bridge layer is formed, the metal bridge layer is spanned a first transparent conductive layer, wherein the second transparent conductive layer disposed on both sides of the first transparent conductive layer is connected to the second transparent conductive layer on the insulating layer to form a continuous conductive line; wherein the insulating The layer projection overlaps the length of the second transparent conductive layer, which is greater than the gold The bridge layer projection overlaps the length of the second transparent conductive layer; and any one end of the metal bridge layer X direction has a spacing from the insulating layer at any corresponding end of the X direction. The method for manufacturing a capacitive touch structure according to claim 9 , further comprising: disposing the first transparent conductive layer, the second transparent conductive layer, and the other side of the insulating layer on the opposite side of the substrate On the surface, a step of forming a transparent conductive shielding layer on the surface is formed, and the disposed area of the shielding layer corresponds to the arrangement area of the first transparent conductive layer and the second transparent conductive layer. The method of manufacturing a capacitive touch structure according to claim 10, further comprising the step of forming an insulating protective layer covering the shielding layer and exposing one of the local connection points of the shielding layer on the shielding layer.