WO2016208981A1 - Laveur de traitement de gaz résiduaire formé d'une combinaison de moyens de contact gaz-liquide qui présentent de multiples fonctions afin d'être appropriés pour le traitement selon des propriétés à gaz résiduaire - Google Patents

Laveur de traitement de gaz résiduaire formé d'une combinaison de moyens de contact gaz-liquide qui présentent de multiples fonctions afin d'être appropriés pour le traitement selon des propriétés à gaz résiduaire Download PDF

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Publication number
WO2016208981A1
WO2016208981A1 PCT/KR2016/006665 KR2016006665W WO2016208981A1 WO 2016208981 A1 WO2016208981 A1 WO 2016208981A1 KR 2016006665 W KR2016006665 W KR 2016006665W WO 2016208981 A1 WO2016208981 A1 WO 2016208981A1
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WO
WIPO (PCT)
Prior art keywords
gas
liquid contact
contact means
waste gas
scrubber
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PCT/KR2016/006665
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English (en)
Korean (ko)
Inventor
서익환
박대연
박승철
김지영
Original Assignee
주식회사 효진아이디에스
삼성엔지니어링 주식회사
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Application filed by 주식회사 효진아이디에스, 삼성엔지니어링 주식회사 filed Critical 주식회사 효진아이디에스
Publication of WO2016208981A1 publication Critical patent/WO2016208981A1/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/06—Spray cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/77—Liquid phase processes
    • B01D53/78—Liquid phase processes with gas-liquid contact
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof

Definitions

  • the present invention relates to a scrubber for treating waste gas, and more particularly, to a waste gas treating scrubber combined with a multi-functional gas-liquid contacting unit so as to be suitable for treatment according to the properties of toxic exhaust gas discharged from a semiconductor manufacturing process.
  • the exhaust gas (waste gas) discharged from a process of forming or etching a thin film on a wafer of a semiconductor manufacturing process includes acidic gases such as hydrogen fluoride, sulfur oxides, nitrogen oxides, hydrogen sulfide and sulfurous acid gas, and alkaline gases such as ammonia. Since these components are not only harmful to human body but also cause environmental pollution, the exhaust gas emitted from the semiconductor manufacturing process should be discharged to the atmosphere after purification.
  • the cleaning solution is sprayed on the exhaust gas (waste gas), which is a wet method, to contact gas-liquid contact.
  • the scrubber method to be used is widely known, and in the related art, for example, in the case of installing a gas flow path device, a gas-liquid reaction device, and a dehumidification device in a housing in Korean Patent Publication No. 10-0816822, the gas flow path device is used.
  • a multi scrubber for simultaneously treating a complex pollutant characterized in that No. 10-1020258 includes a waste gas inlet formed on one side and a waste gas outlet formed on the other side, and a housing formed in a box shape and an acid gas introduced into one side of the housing and introduced into the housing.
  • It is formed to include a first injection unit for removing the acid gas by injecting water to the waste gas to be included and a discharge dust collector for collecting the acid mist introduced from the first injection unit by the corona discharge formed inside the other side of the housing
  • An acidic waste gas treatment system is disclosed.
  • the gas-liquid contact device used for the scrubber plate-shaped body 10 made of a predetermined shape in the Korean Patent Publication No. 10-1320638; It is composed of a bent portion 20 having a certain curvature by folding the center of the plate 10, the plate 10 is a polyolefin such as polyethylene, polypropylene, vinylidene chloride, polyester, nylon And organic fibers such as aramid and carbon fiber, inorganic fibers, and metal fibers, and the grid 10 has a grid 12 having a predetermined shape therein, and the grid 12 2 to 10 mm in width and 2 to 10 mm in length, and the bent portion 20 discloses a porous filter and a gas-liquid contact device using the same, wherein the cross-sectional shape is formed in a U shape or a V shape.
  • the plate 10 is a polyolefin such as polyethylene, polypropylene, vinylidene chloride, polyester, nylon And organic fibers such as aramid and carbon fiber, inorganic fibers, and metal fibers
  • the prior art has a problem in the separation and removal efficiency of the waste gas according to the type of waste gas because it is a technology for uniformly separating and removing the waste gas by the gas-liquid contact regardless of the type of the waste gas, that is, component, concentration.
  • the present invention differs in function according to the types and concentrations of toxic gas components such as hydrogen fluoride, sulfur oxides, nitrogen oxides, hydrogen sulfide, ammonia sulfite and the like in the exhaust gases emitted from the semiconductor manufacturing process.
  • the present invention has been confirmed by improving the exhaust gas removal efficiency by applying a plurality of unit gas-liquid contact means in combination.
  • An object of the present invention is to provide a scrubber for removing toxic waste gas.
  • the gas is exhausted by a multi-layer gas-liquid contact means combination of a plurality of unit gas-liquid contact means having different gas-liquid contact functions so as to be suitable for treatment according to the properties of the waste gas. It aims at providing the scrubber which processes a gas.
  • the present invention treats the exhaust gas by a multi-layer gas-liquid contact means combination comprising a plurality of unit gas-liquid contact means having different gas-liquid contact functions so as to be suitable for the treatment according to the concentration of the alkaline exhaust gas discharged from the semiconductor manufacturing process.
  • the purpose is to provide a scrubber.
  • Exhaust gas, HF, HCl, Cl 2 Toxic waste gases which are acidic exhaust gases containing and the like, alkaline exhaust gases containing NH 3 , and combustible exhaust gases containing SiF 4 , HF and the like, are discharged, and the perfluorocarbon (PFC) exhaust gases, acidic exhaust gases, Alkaline exhaust gas and combustible exhaust gas are not only discharged depending on the conditions of the semiconductor manufacturing process, operating hours, and products, but also emitted at high concentrations (50 to 500 ppm) to low concentrations (less than 50 ppm).
  • PFC perfluorocarbon
  • the present invention is a waste gas treatment scrubber that combines two or more gas-liquid contact means units having different functions of gas-liquid contact by geometrical differences in order to optimize the treatment according to the type and concentration of the waste gas (G) to improve treatment efficiency. Is done.
  • the waste gas treatment scrubber combined with a multi-functional gas-liquid contact means to fit the characteristics of the waste gas is provided with an exhaust pipe (1a) for discharging the purification gas upwards, the inside In the upper part of the cleaning liquid injection nozzle (1b) is installed, the middle part of the gas-liquid contact means combination (MS), the lower part of the scrubber (1), the waste liquid storage tank (1c) is installed, and the waste liquid storage tank (1c) of In the scrubber comprising a waste gas inlet pipe (2) connected to one side and a cleaning liquid supply pipe (3) connected to the cleaning liquid injection nozzle (1b) installed on the inside of the scrubber (1), the gas-liquid contact means combination (MS) Is a plurality of gas-liquid contact means units (M1) and gas-liquid contact means units having different geometries so as to be suitable for treatment in accordance with a change in the concentration of alkaline exhaust gas containing NH 3 , which is an inflowing waste gas (G).
  • G inflowing waste gas
  • the present invention provides a plurality of gas-liquid contact means units (M1) combined with the gas-liquid contact means assembly (MS) according to the present invention in order to optimize the treatment according to the concentration of the waste gas (G), that is, alkaline exhaust gas, and to increase the treatment efficiency.
  • the gas-liquid contact means unit M2 have different geometrical structures, and the functions of the gas-liquid contact appear differently depending on the geometry.
  • the gas-liquid contact means unit body M1 is a mesh of a predetermined thickness woven in two layers. It is a structure of a filter structure in which sheets are arranged zigzag between a plurality of vertical bulkheads, and induces foaming to filter and absorb contaminated particulate matter contained in waste gas and particulate matter generated by gas-liquid contact, and mist by foaming.
  • gas-liquid contact means unit (M2) is a bar-shaped circular rods are arranged in a plurality of layers while being arranged in parallel with a plurality of spaced intervals, between the gaps and the circular rods are arranged alternately, the gas Reflow and coarsening are repeated according to the flow rate of, and thus it has a function of promoting gas absorption.
  • the scrubber 1 according to the present invention is the gas-liquid contact means unit (M1) and according to the concentration of the waste gas (G), that is, alkaline exhaust gas containing NH 3 and the like, that is, high concentration (50 ⁇ 500ppm) to low concentration (less than 50ppm) and
  • G waste gas
  • the gas-liquid contact means assembly MS is achieved.
  • the gas-liquid contact means assembly (MS) is at the top and bottom of the gas-liquid contact means assembly (MS) when the gas-liquid contact means unit (M1) and the gas-liquid contact means unit (M2) are constantly combined.
  • the dispersion S1 having an equal distribution function of the cleaning liquid and the dispersion dispersion S2 having an equal distribution function of the cleaning liquid are respectively mounted.
  • Dispersion (S1) having an even distribution function of the cleaning solution is formed in a quadrangular through-hole is formed in four directions continuously by the partition wall, the four rectangular through-holes adjacent to the distribution structure in the center, the equal distribution of the cleaning solution Dispersion (S2) having a function is made of a structure in which the rectangular through-holes are arranged continuously in all directions by the partition wall.
  • the waste gas treatment scrubber combined with the multi-functional gas-liquid contact means to be suitable for the characteristics of the waste gas according to the present invention is optimized for treatment according to the concentration of the toxic waste gas (G), that is, the alkaline exhaust gas discharged from the semiconductor manufacturing process.
  • G toxic waste gas
  • the present invention has the advantage that can easily cope with the combination of gas-liquid contact means suitable for treatment for the concentration change of the waste gas has the advantage that the required cost of the change of the scrubber is reduced.
  • FIG. 1 is a front view schematically showing a scrubber of one embodiment according to the present invention
  • Figure 2 is a rear view schematically showing a scrubber of one embodiment according to the present invention
  • 3 to 6 is a view schematically showing a gas-liquid contact means unit and a dispersion in the present invention
  • FIG. 1 and 2 are front and rear views schematically showing a scrubber for treating a high concentration of waste gas G containing 50 to 500 ppm of alkaline exhaust gas according to an embodiment of the present invention. Reference will be made to the scrubber according to the present invention.
  • the scrubber 1 of the present invention is provided with an exhaust pipe 1a through which the purge gas is discharged at the upper end and a waste liquid storage tank 1c at the lower end thereof, and a cleaning liquid injection nozzle 1b is installed at the upper side of the scrubber 1.
  • a gas-liquid contact means combination MS is combined to be optimized for the treatment of the waste gas G which is a high concentration of alkaline exhaust gas flowing in.
  • the gas-liquid contact means combination is a dispersion (S1) having an even distribution function of the cleaning liquid sequentially from the top, induces the generation of bubbles, particulate matter contained in the waste gas by the foam and particles generated when the gas-liquid contact , Gas-liquid contact means unit (M1) having a function of filtering and absorbing mist, etc., gas-liquid contact means unit (M2) having a function of promoting resorption and coarsening by re-spreading and coarsening according to the flow rate of gas, and a cleaning liquid.
  • a dispersion (S2) having an even distribution function of is laminated.
  • the cleaning liquid supply pipe (3) is connected to the cleaning liquid injection nozzle (1b) to one side of the upper portion of the scrubber (1), the waste liquid storage tank (1c) installed at the lower end is introduced into the waste gas inlet pump (P 1 )
  • the waste gas inlet pipe 2 is connected, and on the other side, a waste liquid discharge pipe 1d is installed, and the cleaning liquid supply pipe 3 is equipped with a cleaning liquid supply pump P 2 for introducing the cleaning liquid from the cleaning liquid storage tank 3a.
  • the waste gas (G) is introduced into the waste liquid of the waste liquid storage tank (1c) through the waste gas inflow pipe (2) by the waste gas inflow pump (P 1 ), and the washing liquid from the washing liquid storage tank (3a) is supplied with the washing liquid supply pump (P 2).
  • the cleaning liquid is lowered while being injected into the scrubber 1 while being supplied to the cleaning liquid injection nozzle 1b installed inside the scrubber 1 through the cleaning liquid supply pipe 3.
  • waste gas introduced into the waste liquid of the waste liquid storage tank 1c is preliminarily treated by the waste liquid of the waste liquid storage tank 1c, and the gas-liquid contact means combination (MS) combined to be optimized for the treatment of the waste gas G, which is a high concentration of alkaline exhaust gas (MS).
  • Waste gas is purified and discharged to the outside through the exhaust pipe (1a) installed on the top of the scrubber (1) as the washing liquid and the gas-liquid contact made descending while passing through).
  • the sprayed and descending washing liquid is first lowered while being dispersed more widely by the dispersion (S1) having an equal distribution function of the washing liquid, and the rising waste gas also firstly has a dispersion having an equal distribution function of the washing liquid. It is evenly distributed by (S2) and rises correspondingly, foaming is generated by the gas-liquid contact means unit M1, and particulate matter and mist generated when contacting the polluted particles contained in the waste gas and gas-liquid by the foam.
  • the gas-liquid contact means unit (M2) repeats the re-scattering and coarsening according to the flow rate of the gas to promote the absorption of the gas while improving the gas-liquid contact, so that the high concentration of alkaline exhaust gas It is processed efficiently.
  • the gas-liquid contact means unit M1 having a function of filtering and absorbing the contaminant particles contained in the waste gas and the gas-liquid particles generated by the foam and mist by inducing foam generation has two layers inside the frame F. It consists of a structure of the filter structure arranged while zigzag passing between the vertical partition wall (5) of approximately ' ⁇ ' shape arranged at a predetermined interval of the network sheet (4) of the predetermined thickness, (b).
  • the gas-liquid contact means unit (M2) having a function of promoting resorption and coarsening by reflowing and coarsening according to the flow rate of the gas has a rod-shaped circular rod (6) at a predetermined interval within the frame (F). Dogs are arranged in parallel and arranged in a plurality of layers, and the gaps and the circular rods 6 are alternately arranged between the layers and the layers.
  • the dispersion (S1) having an even distribution function of the cleaning liquid has a structure in which the rectangular through hole (Ha) consisting of partitions in the frame (F) is formed in all four directions continuously, and adjacent four rectangular through holes (Ha) flow in the center.
  • Dispersion (S2) has a structure in which the rectangular through hole (Hb) consisting of partition walls in the frame (F) is arranged in a continuous direction.
  • the waste gas to be treated (G) is a low concentration exhaust gas containing less than 50 ppm of alkaline exhaust gas
  • the gas-liquid contacting means assembly (MS) has a dispersion (S1) and foam having an equal distribution function of the cleaning liquid sequentially from above.
  • Gas-liquid contact means unit (M1) having the function of filtering and absorbing the contaminated particulate matter contained in the waste gas and the gas-liquid particulate matter, mist, etc. by inducing generation and foaming, and re-splashing and adjusting according to the gas flow rate.
  • the gas-liquid contact means unit (M2) having a function of promoting gas absorption, inducing foaming, and filtering contaminated particulate matter contained in the waste gas by the foam and particulate matter generated by gas-liquid contact, mist, etc. It is the same as that of ⁇ Example 1> except that the gas-liquid contact means unit M1 having an absorbing function and the dispersion S2 having an equal distribution function of the cleaning liquid are stacked. The waste gas was processed by the one scrubber 1.
  • the gas-liquid contact means unit (M1) and (M2) is preferably manufactured in the same standard in order to be assembled integrally, the material of each gas-liquid contact means unit is preferably a synthetic resin material.
  • each gas-liquid contact means unit is not limited because it is determined according to the treatment capacity of the waste gas in the scrubber (1), if the skilled in the art belongs to the present invention can be produced without difficulty according to the treatment capacity of the waste gas. I can say that.
  • Waste gas treatment scrubber using the multi-functional gas-liquid contact means according to the present invention described above is applied to the gas-liquid contact means combination optimized for treatment according to the concentration of toxic waste gas (G), that is, alkaline exhaust gas discharged from the semiconductor manufacturing process.
  • G toxic waste gas
  • the gas treatment efficiency of the scrubber is improved, and the gas-liquid contact unit suitable for treatment can be easily coped with the change in the properties of the waste gas.
  • the scrubber of the present invention described above has the advantage that it can be easily replaced by a combination of gas-liquid contact means suitable for treatment with respect to the change and concentration of the waste gas, thereby achieving the effect of improving the gas treatment efficiency of the scrubber and at the same time changing the scrubber Due to the advantage that the required cost is also reduced, the industrial availability is very high.

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Health & Medical Sciences (AREA)
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  • Condensed Matter Physics & Semiconductors (AREA)
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  • Manufacturing & Machinery (AREA)
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  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Treating Waste Gases (AREA)
  • Gas Separation By Absorption (AREA)

Abstract

La présente invention concerne un laveur qui traite un gaz résiduaire au moyen d'un ensemble de moyens de contact gaz-liquide multicouches, formé en combinant une pluralité de moyens de contact gaz-liquide unitaire qui présentent différentes fonctions de contact gaz-liquide afin d'être appropriés pour le traitement de gaz d'échappement alcalin selon les propriétés et la concentration de celui-ci, le gaz d'échappement alcalin étant émis à partir d'un procédé de fabrication de semi-conducteur. Le laveur est un laveur par voie humide qui absorbe et purifie un gaz d'échappement en faisant en sorte qu'une solution de nettoyage entre en contact avec un gaz d'échappement alcalin, les moyens de contact gaz-liquide installés à l'intérieur du laveur l'épurateur étant formés d'une structure multicouche formée en combinant une pluralité de corps unitaires de moyens de contact gaz-liquide des corps d'unités qui présentent différentes fonctions de contact gaz-liquide.
PCT/KR2016/006665 2015-06-26 2016-06-23 Laveur de traitement de gaz résiduaire formé d'une combinaison de moyens de contact gaz-liquide qui présentent de multiples fonctions afin d'être appropriés pour le traitement selon des propriétés à gaz résiduaire WO2016208981A1 (fr)

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Application Number Priority Date Filing Date Title
KR10-2015-0091188 2015-06-26
KR1020150091188A KR101564581B1 (ko) 2015-06-26 2015-06-26 폐가스 성상에 따라 처리에 적합하도록 복수기능의 기액접촉수단으로 조합된 폐가스 처리 스크러버

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Families Citing this family (4)

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Publication number Priority date Publication date Assignee Title
KR101844749B1 (ko) * 2016-07-28 2018-05-18 (주)효진아이디에스 복수기능의 기액접촉수단을 이용한 폐가스 처리용 수평식 스크러버
KR101947733B1 (ko) * 2016-07-28 2019-05-10 주식회사 효진엔지니어링 복수기능의 기액접촉수단을 이용한 폐가스 처리용 수평식 스크러버
KR102192344B1 (ko) 2019-04-16 2020-12-17 주식회사 효진엔지니어링 폐가스 처리 스크러버용 조립식 기액접촉수단 단위체 및 이를 이용한 폐가스 처리 스크러버
KR102402387B1 (ko) 2020-10-14 2022-05-26 주식회사 효진엔지니어링 폐가스 처리 스크러버용 조립식 기액접촉수단 단위체 및 이를 이용한 폐가스 처리 스크러버

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JP2006272034A (ja) * 2005-03-28 2006-10-12 Kurita Water Ind Ltd 光触媒を用いた汚染ガス処理装置及び方法
KR100816822B1 (ko) * 2006-01-13 2008-03-31 신도건공 주식회사 복합오염물질을 동시에 처리하는 멀티스크러버
KR101320638B1 (ko) * 2013-06-04 2013-10-23 엔텍이앤씨 주식회사 다공성 필터 및 이를 이용한 기액접촉장치
KR101478973B1 (ko) * 2014-09-05 2015-01-05 (주)효진엔지니어링 복수기능의 기액접촉수단을 이용한 산성 폐가스 처리 스크러버
KR101513682B1 (ko) * 2014-12-19 2015-04-21 (주)한국테크 세정식 다단 탈취장치

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006272034A (ja) * 2005-03-28 2006-10-12 Kurita Water Ind Ltd 光触媒を用いた汚染ガス処理装置及び方法
KR100816822B1 (ko) * 2006-01-13 2008-03-31 신도건공 주식회사 복합오염물질을 동시에 처리하는 멀티스크러버
KR101320638B1 (ko) * 2013-06-04 2013-10-23 엔텍이앤씨 주식회사 다공성 필터 및 이를 이용한 기액접촉장치
KR101478973B1 (ko) * 2014-09-05 2015-01-05 (주)효진엔지니어링 복수기능의 기액접촉수단을 이용한 산성 폐가스 처리 스크러버
KR101513682B1 (ko) * 2014-12-19 2015-04-21 (주)한국테크 세정식 다단 탈취장치

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