WO2016192314A1 - 隔垫物的对位标识的制备方法和位置精度检测方法、彩色滤光片及其制备方法 - Google Patents

隔垫物的对位标识的制备方法和位置精度检测方法、彩色滤光片及其制备方法 Download PDF

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Publication number
WO2016192314A1
WO2016192314A1 PCT/CN2015/094555 CN2015094555W WO2016192314A1 WO 2016192314 A1 WO2016192314 A1 WO 2016192314A1 CN 2015094555 W CN2015094555 W CN 2015094555W WO 2016192314 A1 WO2016192314 A1 WO 2016192314A1
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Prior art keywords
sub
pixel opening
opening region
layer
size
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PCT/CN2015/094555
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English (en)
French (fr)
Inventor
黎敏
姜晶晶
肖宇
李晓光
杨同华
Original Assignee
京东方科技集团股份有限公司
北京京东方显示技术有限公司
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Application filed by 京东方科技集团股份有限公司, 北京京东方显示技术有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US15/036,352 priority Critical patent/US9946109B2/en
Priority to EP15892057.9A priority patent/EP3306382B1/en
Publication of WO2016192314A1 publication Critical patent/WO2016192314A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
    • G01B11/27—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes
    • G01B11/272—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes for testing the alignment of axes using photoelectric detection means
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306—Details
    • G02F1/1309—Repairing; Testing
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133354—Arrangements for aligning or assembling substrates
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133519—Overcoatings

Definitions

  • Embodiments of the present invention relate to a method for preparing a registration mark of a spacer and a method for detecting a positional accuracy, a color filter, and a method of fabricating the same.
  • Color filters are an important part of liquid crystal technology.
  • the structure of the color filter mainly comprises a substrate, a black matrix (BM, a black matrix), a color film layer, a protective film layer (ie, a flat layer), and a spacer film layer.
  • BM black matrix
  • a color film layer a color film layer
  • a protective film layer ie, a flat layer
  • a spacer film layer ie, a flat layer
  • the color filter is still formed by the proximity exposure process, and the positional accuracy between the layers directly affects the quality of the color filter or even the entire liquid crystal panel, especially for the spacer layer, because of the position when the box is paired with the TFT. It often corresponds to the corresponding position of the TFT, and its precision is very high.
  • a registration mark In operation, it is usually necessary to form a registration mark by forming a respective mask layer through the mask to serve as an automatic pair between different film layers, between the spacers and the color filters, and between the spacers and the TFTs.
  • the alignment of the bit In general, for conventional size products (display area size is smaller than the mask size), a set of alignment marks can be made around the periphery (outside the display area) for each exposure unit to be accurately controlled during each process. Positional accuracy of each component or film layer.
  • stitching exposure technology is increasing. For oversized products (the size of the display area is larger than the size of the mask), the display area often requires multiple exposure units to be stitched and exposed.
  • the size of the mask is smaller than the size of the display area, it will not be produced when each exposure unit is exposed.
  • the alignment mark located outside the display area. Therefore, the positional accuracy of each component or film layer, particularly the positional accuracy of the spacer, cannot be accurately controlled during each process. Moreover, when positional deviation occurs (found by microscopic observation), it is impossible to measure and compensate for the positional deviation quickly.
  • Embodiments of the present invention provide a method for preparing a alignment mark of a spacer and a method for detecting the accuracy thereof. Color filter and preparation method thereof.
  • a method for preparing a registration mark of a spacer comprising:
  • the black matrix layer of the color filter When the black matrix layer of the color filter is fabricated, at least one first sub-pixel opening region and a plurality of second sub-pixel opening regions are formed on the substrate, wherein the size of the first sub-pixel opening region is smaller than the first The size of the two sub-pixel opening area;
  • the alignment mark of the spacer layer is formed at a predetermined position around the first sub-pixel opening area.
  • the method further includes:
  • the making the spacer layer comprises:
  • a spacer layer is formed on the flat layer.
  • a method for detecting a positional accuracy of a spacer includes:
  • the first sub-pixel opening region Acquiring at least one first sub-pixel opening region formed on the substrate and a registration mark formed at a specified position around the first sub-pixel opening region, wherein the first sub-pixel opening region has a size smaller than that on the substrate a size of the plurality of second sub-pixel opening regions formed, the first sub-pixel opening region and the second sub-pixel opening region being formed when a black matrix layer of the color filter is formed;
  • the positional accuracy of the spacer is calculated.
  • a color filter including:
  • a color film layer formed on the at least one first sub-pixel opening region and the plurality of second sub-pixel opening regions on the substrate; wherein a size of the first sub-pixel opening region is smaller than the second sub-pixel a size of the opening region; a size of the color film layer on the first sub-pixel opening region is smaller than a size of the color film layer on the second sub-pixel opening region;
  • liquid crystal panel comprising the above color filter.
  • a method of preparing a color filter comprising:
  • An alignment mark and a spacer layer are formed on the flat layer, the alignment mark being located at a specified position around the first sub-pixel opening area.
  • the display panel can be conveniently processed.
  • the position of the spacer is aligned, and the positional accuracy of the spacer can be detected, thereby achieving precise control of the positional accuracy between the layers.
  • FIG. 1 is a flow chart of a method for preparing a registration mark of a spacer according to an embodiment of the present invention
  • FIG. 2 is a first sub-pixel opening region 200 and a second sub-pixel opening formed after a black matrix layer is formed. Schematic diagram of the area;
  • Figure 3 is a schematic view of an RGB layer of a color film layer
  • 4A-4D are schematic diagrams showing relative positions of the first sub-pixel opening region 400 and the alignment mark 410;
  • FIG. 5 is a flowchart of a method for preparing a registration mark of a spacer according to another embodiment of the present invention.
  • FIG. 6 is a flowchart of a method for detecting accuracy according to an embodiment of the present invention.
  • the method includes: 101. forming at least one first sub-pixel opening region and a plurality of second sub-pixel opening regions on a substrate when fabricating a black matrix layer of a color filter, wherein The size of one sub-pixel opening area is smaller than the size of the second sub-pixel opening area.
  • first and second sub-pixel opening regions are used to form a sub-pixel display unit thereon.
  • the three sub-pixel display units constitute one pixel display unit, that is, R, G, and B can constitute one pixel display unit. Therefore, in order to realize color display, it is necessary to create a black matrix layer for each sub-pixel.
  • the display unit leaves an opening area, that is, when the black matrix layer is formed, a region on the substrate that is not covered by the black matrix layer forms a plurality of sub-pixel opening regions.
  • two sizes of sub-pixel opening areas may be prepared, wherein the size of the first sub-pixel opening area is smaller than Second subpixel
  • the opening area optionally, the number of the first sub-pixel opening areas may be one to avoid affecting the overall display effect. It should be understood that when the dimensions of the first sub-pixel opening area are appropriate, two or more first sub-pixel opening areas may also be prepared to make a plurality of alignment marks. In this case, when measuring the accuracy, an average value can be taken to improve the measurement accuracy.
  • a substrate may be provided to form a black matrix layer on the substrate, and the specific fabrication process may be a process of exposing the black matrix material based on a certain pattern.
  • the disclosed embodiments are not specifically limited thereto.
  • FIG. 2 is a schematic diagram showing the first sub-pixel opening region 200 obtained after the black matrix layer is formed.
  • Other rectangular opening areas having a larger size are second sub-pixel opening areas, which are transparent after preparation, and areas outside the opening area are black matrix layer areas.
  • the process of fabricating the color film layer may be performed by partially coating a photoresist on a black matrix layer or a substrate, and performing exposure development using a mask to form a color film layer.
  • the number of coatings and the number of developments may vary depending on the product requirements and the specific process, and will not be specifically described herein.
  • the process of exposure and development in order to leave a vacant space for the subsequent preparation of the alignment mark in the vicinity of the first sub-pixel opening area, and the subsequent preparation of the spacer layer, it is not affected by the position of the alignment mark, The masks are aligned according to the first sub-pixel opening area provided in step 101 to determine the color film layer regions that need to be distinguished in size.
  • a color film layer in this step is to form a sub-pixel display unit on the first sub-pixel opening region and the second sub-pixel opening region, thereby forming a pixel display unit.
  • the color film layer on the first sub-pixel opening area and the second sub-pixel opening area is any one of R, G or B film layers.
  • FIG 3 is a schematic illustration of a RGB layer of a colored film layer.
  • the area 300 in the figure is the color film layer on the first sub-pixel opening area.
  • the flat layer serves to protect the above-mentioned film layer and functions as a smooth surface, which is not specifically limited in the present disclosure.
  • the positional accuracy of the spacer layer relative to other layers can be conveniently detected based on the alignment mark, so that the component can be precisely controlled when the liquid crystal panel is fabricated.
  • the designated position around the first sub-pixel opening area is at a preset distance above or below the first sub-pixel opening area. It can be understood that if the shape of the first sub-pixel opening area allows, it can also be located at the left preset distance or the right preset distance.
  • 4A is a schematic diagram showing the relative positions of the first sub-pixel opening region 400 and the alignment mark 410.
  • the alignment mark 410 is located at a predetermined distance below the first sub-pixel opening area 400.
  • 4B is a schematic diagram showing the relative positions of the first sub-pixel opening region 400 and the alignment mark 410.
  • the alignment mark 410 is located at a preset distance above the first sub-pixel opening area 400.
  • 4C is a schematic diagram showing the relative positions of the first sub-pixel opening region 400 and the alignment mark 410.
  • the alignment mark 410 is located at a predetermined distance to the left of the first sub-pixel opening area 400.
  • 4D is a schematic diagram showing the relative positions of the first sub-pixel opening region 400 and the alignment mark 410.
  • the alignment mark 410 is located at a predetermined distance to the right of the first sub-pixel opening area 400.
  • the shape of the alignment mark is a square, a circle or other shapes.
  • the shape of the alignment mark can take any shape having a symmetry such that the center position of the alignment mark can be determined based on at least three points thereof.
  • FIG. 5 is a flow chart of a method for preparing a registration mark of a spacer according to another embodiment of the present invention. Referring to Figure 1, the method includes:
  • the alignment mark of the spacer layer is formed at a designated position around the first sub-pixel opening area.
  • the step of preparing the alignment mark of the spacer can be made in the process.
  • the color filter is carried out during the process.
  • a black matrix layer, first and second sub-pixel opening regions may be first formed on the substrate; and a registration mark is formed at a specified position around the first sub-pixel opening region; Color film layer, flat layer, and the like.
  • the film layers do not cover the alignment mark located around the opening area of the first sub-pixel or set the position of the alignment mark to be transparent, so as to be subsequently
  • the alignment mark is the positional accuracy of the reference detection spacer layer.
  • FIG. 6 is a flowchart of a method for detecting accuracy according to an embodiment of the present disclosure.
  • the accuracy detection may provide a registration mark of the spacer based on the method shown in FIG. 1 or FIG. 5 above.
  • the accuracy detection method includes:
  • the positional accuracy of the spacer is calculated according to the position difference and the preset design position difference. It should be understood that when there are a plurality of first sub-pixel opening regions, the positional accuracy of the spacers may be calculated according to the mean value of the position differences between the plurality of first sub-pixel opening regions and the corresponding position identifiers.
  • the color film layer on the first sub-pixel opening area and the second sub-pixel opening area is any one of R, G or B film layers.
  • the specified position around the first sub-pixel opening area is a preset distance above the first sub-pixel opening area, a preset distance below, a left preset distance, and a right preset distance Anywhere in the office.
  • the shape of the alignment mark is a shape having a symmetry, and optionally, the shape is a square, a circle or other shape.
  • calculating a position difference between the first sub-pixel opening area and the alignment identifier includes:
  • a positional difference between a center position of the first sub-pixel opening area and a center position of the alignment mark is calculated.
  • calculating the positional accuracy of the spacer according to the position difference includes:
  • the positional accuracy of the spacer is calculated according to the position difference and the preset design position difference.
  • Embodiments of the present disclosure provide a color filter including: a substrate, a black matrix, a color film layer, a flat layer, and a spacer film layer.
  • a color film layer is formed on the at least one first sub-pixel opening region and the plurality of second sub-pixel opening regions on the substrate, wherein a size of the first sub-pixel opening region of the substrate is smaller than a second sub-pixel opening region a size of the color film layer on the first sub-pixel opening area is smaller than a size of the color film layer on the second sub-pixel opening area;
  • a spacer layer is formed on the flat layer.
  • the color film layer on the first sub-pixel opening area and the second sub-pixel opening area is any one of R, G or B film layers.
  • the first sub-pixel opening region and the second sub-pixel opening region are located on a region of the substrate that is not covered by the black matrix.
  • the specified position around the first sub-pixel opening area is a preset distance above the first sub-pixel opening area, a preset distance below, a left preset distance, and a right preset distance Anywhere in the office.
  • the shape of the alignment mark is a square, a circle or other shape.
  • the spacer by arranging the alignment mark in the vicinity of the first sub-pixel opening area having a smaller size, the spacer can be detected in time during the manufacturing process of the large-size liquid crystal display panel.
  • the positional accuracy is corrected according to the detection result, thereby achieving a more accurate alignment between the color filter and other components of the liquid crystal display panel, thereby increasing the yield of the product.
  • the embodiment of the invention further provides a liquid crystal panel comprising the above color filter.
  • the embodiment of the invention further provides a method for preparing a color filter, comprising:
  • An alignment mark and a spacer layer are formed on the flat layer, the alignment mark being located at a specified position around the first sub-pixel opening area.
  • the spacer in the vicinity of the first sub-pixel opening region having a small size, the spacer can be detected in time during the manufacturing process of the large-sized liquid crystal display panel.
  • the positional accuracy of the mat is corrected according to the detection result, thereby achieving a more accurate alignment between the color filter and other components of the liquid crystal display panel, thereby increasing the yield of the product.
  • a person skilled in the art may understand that all or part of the steps of implementing the above embodiments may be completed by hardware, or may be instructed by a program to execute related hardware, and the program may be stored in a computer readable storage medium.
  • the storage medium mentioned may be a read only memory, a magnetic disk or an optical disk or the like.

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Abstract

一种隔垫物的对位标识的制备方法和精度检测方法，包括：在制作彩色滤光片的黑矩阵层时，在基板上形成至少一个第一亚像素开口区域（200,400）和多个第二亚像素开口区域，其中，所述第一亚像素开口区域（200,400）的尺寸小于所述第二亚像素开口区域的尺寸；在制作隔垫物层时，在所述第一亚像素开口区域（200,400）周围的指定位置，制作所述隔垫物层的对位标识（410）。

Description

隔垫物的对位标识的制备方法和位置精度检测方法、彩色滤光片及其制备方法
相关申请的交叉引用
本申请要求于2015年06月05日递交的中国专利申请第201510303502.6号的优先权，在此全文引用上述中国专利申请公开的内容以作为本申请的一部分。
技术领域
本发明的实施例涉及一种隔垫物的对位标识的制备方法和位置精度检测方法、彩色滤光片及其制备方法。
背景技术
彩色滤光片是液晶技术中的重要部分。彩色滤光片的结构主要包括基板、黑矩阵(BM，Black Matrix)、彩色膜层、保护膜层(即平坦层)和隔垫物膜层构成。目前彩色滤光片仍通过接近式曝光工艺形成，膜层间的位置精度直接影响着彩色滤光片甚至整个液晶面板的品质，尤其对于隔垫物层，因在与TFT对盒时，其位置往往与TFT相应位置对应，其精度要求很高。在操作中，通常需要通过掩膜板在形成各个膜层时形成对位标识，以作为不同膜层之间、隔垫物与彩色滤光片之间以及隔垫物与TFT之间的自动对位的对位基准。一般情况下，对于常规尺寸产品(显示区域尺寸小于掩膜板尺寸)，在每个曝光单元曝光时，可以在其周边(显示区域外)制作一组对位标识，以在各工序期间精确控制各部件或膜层的位置精度。然而，随着产品尺寸的增大，拼接曝光技术的应用越来越多。对于超大尺寸产品(显示区域尺寸大于掩膜板尺寸)，其显示区域往往需多个曝光单元拼接曝光完成制作，由于掩膜板尺寸小于显示区域尺寸，则将无法在每个曝光单元曝光时制作位于显示区域外的对位标识。因此，在各工序期间无法精确控制各部件或膜层的位置精度，特别是隔垫物的位置精度。而且，当出现位置偏差时(通过显微观察发现)，无法及时测量并快速补偿位置偏差。
发明内容
本发明实施例提供了一种隔垫物的对位标识的制备方法和精度检测方法、 彩色滤光片及其制备方法。
根据本发明的一个实施例，提供一种隔垫物的对位标识的制备方法，所述方法包括：
在制作彩色滤光片的黑矩阵层时，在基板上形成至少一个第一亚像素开口区域和多个第二亚像素开口区域，其中，所述第一亚像素开口区域的尺寸小于所述第二亚像素开口区域的尺寸；
在制作隔垫物层时，在所述第一亚像素开口区域周围的指定位置，制作所述隔垫物层的对位标识。
在一个示例中，所述方法进一步包括：
分别在所述第一亚像素开口区域和所述第二亚像素开口区域上制作彩色膜层，其中，所述第一亚像素开口区域上的彩色膜层的尺寸小于所述第二亚像素开口区域上的彩色膜层的尺寸；
在所述彩色膜层上制备平坦层；
所述制作隔垫物层包括：
在所述平坦层上制作隔垫物层。
根据本发明的一个实施例，进一步提供一种隔垫物的位置精度检测方法，包括：
获取在基板上形成的至少一个第一亚像素开口区域和形成在所述第一亚像素开口区域周围的指定位置的对位标识，其中，所述第一亚像素开口区域的尺寸小于在基板上形成的多个第二亚像素开口区域的尺寸，所述第一亚像素开口区域和第二亚像素开口区域在制作彩色滤光片的黑矩阵层时形成；
计算所述第一亚像素开口区域和所述对位标识之间的位置差异；
根据所述位置差异，计算所述隔垫物的位置精度。
根据本发明的一个实施例，进一步提供一种彩色滤光片，包括：
基板；
黑矩阵层，其形成在所述基板上；
彩色膜层，其形成在所述基板上的至少一个第一亚像素开口区域和多个第二亚像素开口区域上；其中，所述第一亚像素开口区域的尺寸小于所述第二亚像素开口区域的尺寸；所述第一亚像素开口区域上的彩色膜层的尺寸小于所述第二亚像素开口区域上的彩色膜层的尺寸；
平坦层，其形成在所述彩色膜层之上；
对位标识，其形成在所述平坦层上且位于所述第一亚像素开口区域周围的指定位置；
隔垫物层，其形成在所述平坦层上。
根据本发明的一个实施例，进一步提供一种液晶面板，所述液晶面板包括上述彩色滤光片。
根据本发明的一个实施例，进一步提供一种制备彩色滤光片的方法，包括：
提供基板；
在所述基板上形成黑矩阵层，并形成至少一个第一亚像素开口区域和多个第二亚像素开口区域，其中，所述第一亚像素开口区域的尺寸小于所述第二亚像素开口区域的尺寸；
在所述第一亚像素开口区域和所述第二亚像素开口区域上形成彩色膜层，其中，所述第一亚像素开口区域上的彩色膜层的尺寸小于所述第二亚像素开口区域上的彩色膜层的尺寸；
在所述彩色膜层之上形成平坦层；
在所述平坦层上形成对位标识和隔垫物层，所述对位标识位于所述第一亚像素开口区域周围的指定位置。
在本发明实施例提供的技术方案中，通过设置一个尺寸较小的亚像素开口区域，并在后续在该亚像素开口区域的附近设置对位标识，可以在制作显示面板的过程中，可以方便隔垫物位置的对准，并能够实现对隔垫物位置精度的检测，从而实现对层间位置精度的精确管控。
附图说明
为了更清楚地说明本发明实施例中的技术方案，下面将对实施例描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1是根据本发明实施例提供的一种隔垫物的对位标识的制备方法的流程图；图2是经过制作黑矩阵层后形成的第一亚像素开口区域200和第二亚像素开口区域的示意图；
图3是彩色膜层RGB层的示意图；
图4A-图4D是第一亚像素开口区域400和对位标识410的相对位置的示意图；
图5是根据本发明另一实施例提供的一种隔垫物的对位标识的制备方法的流程图；
图6是根据本发明实施例提供的一种精度检测方法的流程图。
具体实施方式
为使本发明的目的、技术方案和优点更加清楚，下面将结合附图对本发明实施方式作进一步地详细描述。显然，所描述的实施例是本发明的一部分实施例，而不是全部的实施例。基于所描述的本发明的实施例，本领域普通技术人员在无需创造性劳动的前提下所获得的所有其他实施例，都属于本发明保护的范围。
在本发明的描述中，需要说明的是，术语“上”、“下”、“顶”、“底”等指示的方位或位置关系为基于附图所示的方位或位置关系，仅是为了便于描述本发明和简化描述，而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作，因此不能理解为对本发明的限制。
此外，在本发明的描述中，除非另有说明，“多个”的含义是两个或两个以上。
图1是根据本发明实施例提供的一种隔垫物的对位标识的制备方法的流程图。参见图1，所述方法包括：101、在制作彩色滤光片的黑矩阵层时，在基板上形成至少一个第一亚像素开口区域和多个第二亚像素开口区域，其中，所述第一亚像素开口区域的尺寸小于所述第二亚像素开口区域的尺寸。
其中，所述第一和第二亚像素开口区域用于在其上形成亚像素显示单元。应当理解，三个亚像素显示单元构成一个像素显示单元，也即是，R、G、B才能构成一个像素显示单元，因此，为了实现颜色显示，需要在制作黑矩阵层时，为各个亚像素显示单元留出开口区域，也即是，在制作黑矩阵层时，基板上未被黑矩阵层覆盖的区域形成多个亚像素开口区域。其中，为了便于设置对位标识并进行精度检测，可以制备两种尺寸的亚像素开口区域(即第一亚像素开口区域和第二亚像素开口区域)，其中第一亚像素开口区域的尺寸小于第二亚像素 开口区域，可选地，该第一亚像素开口区域的数量可以为一个，以避免对整体显示效果造成影响。应当理解，在第一亚像素开口区域的尺寸合适时，还可以制备两个或两个以上的第一亚像素开口区域，以制作多个对位标识。在这种情况下，当测量精度时，可以取一个平均值，以提高测量准确性。
需要说明的是，在彩色滤光片的制作过程中，可以提供一基板，从而在该基板上制作黑矩阵层，该具体制作过程可以是基于一定图案在黑矩阵材料上进行曝光的过程，本公开实施例对此不作具体限定。
图2所示为经过制作黑矩阵层后所得到的第一亚像素开口区域200的示意图。其他尺寸较大的矩形开口区域为第二亚像素开口区域，这些开口区域在制备后的表现为透明态，而开口区域以外的区域，即为黑矩阵层区域。
102、分别在所述第一亚像素开口区域和所述第二亚像素开口区域上制作彩色膜层，其中，所述第一亚像素开口区域上彩色膜层的尺寸小于所述第二亚像素开口区域上彩色膜层的尺寸。
该制作彩色膜层的过程可以是在黑矩阵层或基板上所需部分涂覆光刻胶，并利用掩膜板进行曝光显影，以形成彩色膜层。在此过程中，涂覆次数以及显影次数可以根据产品需求和具体工艺的不同而有所不同，在此不作具体说明。在曝光显影过程中，为了在该第一亚像素开口区域的附近，给后续制备对位标识留出空余空间，并使得后续制备隔垫物层时，不受到该对位标识的位置影响，可以根据步骤101中所设置的第一亚像素开口区域，将掩膜板进行对准，从而确定需要在尺寸上区别制作的彩色膜层区域。
应当理解，在该步骤中形成彩色膜层的目的是为了在第一亚像素开口区域和第二亚像素开口区域上形成亚像素显示单元，进而形成像素显示单元。
在本发明实施例的一种可能实现方式中，第一亚像素开口区域和第二亚像素开口区域上的彩色膜层为R、G或B膜层中任一种。
图3所示为彩色膜层RGB层的示意图。图中区域300即为第一亚像素开口区域上的彩色膜层。
103、在所述彩色膜层层上制备平坦层。
该平坦层是用于保护上述膜层，并起到平滑表面的作用，本公开对此不作具体限定。
104、在制作隔垫物层时，在所述第一亚像素开口区域周围的指定位置，制 作所述隔垫物层的对位标识。
应当理解，在形成对位标识之后，就可以方便地以该对位标识为基准检测隔垫物层相对于其他层(如黑矩阵层)的位置精度，以便在在制作液晶面板时精确控制部件内部的层与层(如黑矩阵层与隔垫物层)之间、部件与部件(如彩色滤光片和TFT)之间的相对位置。
作为可选的实施方式，所述第一亚像素开口区域周围的指定位置为所述第一亚像素开口区域的上方预设距离处或下方预设距离处。可以理解，如果第一亚像素开口区域的形状允许，还可以位于左方预设距离处或右方预设距离处。
图4A所示为第一亚像素开口区域400和对位标识410的相对位置的示意图。在本发明的一种实施例中，该对位标识410位于第一亚像素开口区域400下方的预设距离处。图4B所示为第一亚像素开口区域400和对位标识410的相对位置的示意图。在本发明的一种实施例中，该对位标识410位于第一亚像素开口区域400上方的预设距离处。图4C所示为第一亚像素开口区域400和对位标识410的相对位置的示意图。在本发明的一种实施例中，该对位标识410位于第一亚像素开口区域400左方的预设距离处。图4D所示为第一亚像素开口区域400和对位标识410的相对位置的示意图。在本发明的一种实施例中，该对位标识410位于第一亚像素开口区域400右方的预设距离处。
在本公开实施例的一种可能实现方式中，该对位标识的形状为方形、圆形或其他形状。对位标识的形状可以采用任一种具有对称性的形状，使得基于其至少三个点，即可以确定对位标识的中心位置。
上述所有可选技术方案，可以采用任意结合形成本发明的可选实施例，在此不再一一赘述。
图5是根据本发明另一实施例提供的一种隔垫物的对位标识的制备方法的流程图。参见图1，所述方法包括：
101、在制作彩色滤光片的黑矩阵层时，在基板上形成至少一个第一亚像素开口区域和多个第二亚像素开口区域，其中，所述第一亚像素开口区域的尺寸小于所述第二亚像素开口区域的尺寸。
102、在制作隔垫物层时，在所述第一亚像素开口区域周围的指定位置，制作所述隔垫物层的对位标识。
可以理解的是，在本实施例中，制备隔垫物的对位标识的步骤可以在制作 彩色滤光片的过程中进行。在彩色滤光片的制作过程中，可以首先在基板上形成黑矩阵层、第一和第二亚像素开口区域；再在第一亚像素开口区域周围的指定位置形成对位标识；然后依次形成彩色膜层、平坦层等。应当理解，在形成彩色膜层、平坦层的过程中，这些膜层不覆盖位于第一亚像素开口区域周围的对位标识或者将对位标识所在的位置之上设置为透明的，以便后续以该对位标识为参考检测隔垫物层的位置精度。
图6是本公开实施例提供的一种精度检测方法的流程图。该精度检测可以基于上述图1或图5中所示的方法提供隔垫物的对位标识，参见图6，该精度检测方法包括：
601、获取在基板上形成的至少一个第一亚像素开口区域和形成在所述第一亚像素开口区域周围的指定位置的对位标识，其中，所述第一亚像素开口区域的尺寸小于基板上形成的多个第二亚像素开口区域的尺寸，所述第一亚像素开口区域和第二亚像素开口区域在制作彩色滤光片的黑矩阵层时形成。
602、计算所述第一亚像素开口区域和所述对位标识之间的位置差异；
603、根据所述位置差异，计算所述隔垫物的位置精度。
具体地，根据所述位置差异和预设设计位置差，计算所述隔垫物的位置精度。应当理解，当第一亚像素开口区域为多个时，可以根据该多个第一亚像素开口区域与相应的位置标识之间的位置差异的均值，计算隔垫物的位置精度。
在上述过程中，通过测量第一亚像素开口区域(BM工序过程中形成)及对位标识，并计算二者之间的位置差异，根据经过多个工序后的位置差异以及理想的设计位置差之间的数值关系或比例关系，表征隔垫物PS位置精度(相对于BM层)，从而实现对层间位置精度的精确管控，防止相关不良发生并提高超大尺寸产品画面显示品质。
上述所有可选技术方案，可以采用任意结合形成本公开的可选实施例，在此不再一一赘述。
可选地，所述第一亚像素开口区域和所述第二亚像素开口区域上的彩色膜层为R、G或B膜层中任一种。
可选地，所述第一亚像素开口区域周围的指定位置为所述第一亚像素开口区域的上方预设距离处、下方预设距离处、左方预设距离处和右方预设距离处中的任一位置。
可选地，所述对位标识的形状为具有对称性的形状，可选地，其形状为方形、圆形或其他形状。
可选地，计算第一亚像素开口区域和对位标识之间的位置差异包括：
根据获取的所述第一亚像素开口区域的顶点位置，确定所述第一亚像素开口区域的中心位置；
根据获取的所述对位标识的顶点位置，确定所述对位标识的中心位置；
计算所述第一亚像素开口区域的中心位置和所述对位标识的中心位置之间的位置差异。
可选地，根据所述位置差异，计算所述隔垫物的位置精度包括：
根据所述位置差异和预设设计位置差，计算所述隔垫物的位置精度。
本公开实施例提供了一种彩色滤光片，该彩色滤光片包括：基板、黑矩阵、彩色膜层、平坦层和隔垫物膜层，
其中，黑矩阵层形成在所述基板上；
彩色膜层形成在所述基板上的至少一个第一亚像素开口区域和多个第二亚像素开口区域上，其中，所述基板的第一亚像素开口区域的尺寸小于第二亚像素开口区域的尺寸；所述第一亚像素开口区域上的彩色膜层的尺寸小于所述第二亚像素开口区域上的彩色膜层的尺寸；
平坦层形成在所述彩色膜层之上；
对位标识形成在所述平坦层上且位于所述第一亚像素开口区域周围的指定位置；
隔垫物层形成在所述平坦层上。
可选地，所述第一亚像素开口区域和所述第二亚像素开口区域上的彩色膜层为R、G或B膜层中任一种。
可选地，所述第一亚像素开口区域和所述第二亚像素开口区域位于所述基板上未被所述黑矩阵覆盖的区域。
可选地，所述第一亚像素开口区域周围的指定位置为所述第一亚像素开口区域的上方预设距离处、下方预设距离处、左方预设距离处和右方预设距离处中的任一位置。
可选地，所述对位标识的形状为方形、圆形或其他形状。
上述所有可选技术方案，可以采用任意结合形成本发明的可选实施例，在 此不再一一赘述。
在该实施例公开的彩色滤光片中，通过将对位标识设置在具有较小尺寸的第一亚像素开口区域附近，可以在大尺寸液晶显示面板的制作过程中，及时检测隔垫物的位置精度并根据检测结果进行矫正，从而实现将在彩色滤光片和液晶显示面板的其他部件之间较精确的对位，增加产品的良品率。
本发明实施例还提供了一种液晶面板，所述液晶面板包括上述彩色滤光片。
本发明实施例还提供了一种制备彩色滤光片的方法，包括：
提供基板；
在所述基板上形成黑矩阵层，并形成至少一个第一亚像素开口区域和多个第二亚像素开口区域，其中，所述第一亚像素开口区域的尺寸小于所述第二亚像素开口区域的尺寸；
在所述第一亚像素开口区域和所述第二亚像素开口区域上形成彩色膜层，其中，所述第一亚像素开口区域上的彩色膜层的尺寸小于所述第二亚像素开口区域上的彩色膜层的尺寸；
在所述彩色膜层之上形成平坦层；
在所述平坦层上形成对位标识和隔垫物层，所述对位标识位于所述第一亚像素开口区域周围的指定位置。
在该实施例公开的彩色滤光片的制备方法中，通过将隔垫物设置在具有较小尺寸的第一亚像素开口区域附近，可以在大尺寸液晶显示面板的制作过程中，及时检测隔垫物的位置精度并根据检测结果进行矫正，从而实现将在彩色滤光片和液晶显示面板的其他部件之间较精确的对位，增加产品的良品率。
上述所有可选技术方案，可以采用任意结合形成本发明的可选实施例，在此不再一一赘述。
本领域普通技术人员可以理解实现上述实施例的全部或部分步骤可以通过硬件来完成，也可以通过程序来指令相关的硬件完成，所述的程序可以存储于一种计算机可读存储介质中，上述提到的存储介质可以是只读存储器，磁盘或光盘等。
以上所述仅为本发明的较佳实施例，并不用以限制本发明，凡在本发明的精神和原则之内，所作的任何修改、等同替换、改进等，均应包含在本发明的保护范围之内。

Claims (23)

  1. 一种隔垫物的对位标识的制备方法，其中，所述方法包括：
    在制作彩色滤光片的黑矩阵层时，在基板上形成至少一个第一亚像素开口区域和多个第二亚像素开口区域，其中，所述第一亚像素开口区域的尺寸小于所述第二亚像素开口区域的尺寸；
    在制作隔垫物层时，在所述第一亚像素开口区域周围的指定位置，制作所述隔垫物层的对位标识。
  2. 根据权利要求1所述的方法，进一步包括：
    分别在所述第一亚像素开口区域和所述第二亚像素开口区域上制作彩色膜层，其中，所述第一亚像素开口区域上的彩色膜层的尺寸小于所述第二亚像素开口区域上的彩色膜层的尺寸；
    在所述彩色膜层上制备平坦层；
    所述制作隔垫物层包括：
    在所述平坦层上制作隔垫物层。
  3. 根据权利要求2所述的方法，其中，所述第一亚像素开口区域和所述第二亚像素开口区域上的所述彩色膜层为R、G或B膜层中任一种。
  4. 根据权利要求1-3中任一项所述的方法，其中，所述第一亚像素开口区域和所述第二亚像素开口区域位于所述基板上未被所述黑矩阵覆盖的区域。
  5. 根据权利要求1-3中任一项所述的方法，其中，所述第一亚像素开口区域周围的指定位置为所述第一亚像素开口区域的上方预设距离处、下方预设距离处、左方预设距离处和右方预设距离处中的任一位置。
  6. 根据权利要求1-3中任一项所述的方法，其中，所述对位标识的形状为具有对称性的形状。
  7. 根据权利要求6所述的方法，其中，所述对位标识的形状为方形或圆形。
  8. 一种隔垫物的位置精度检测方法，包括：
    获取在基板上形成的至少一个第一亚像素开口区域和形成在所述第一亚像素开口区域周围的指定位置的对位标识，其中，所述第一亚像素开口区域的尺寸小于在基板上形成的多个第二亚像素开口区域的尺寸，所述第一亚像素开口区域和第二亚像素开口区域在制作彩色滤光片的黑矩阵层时形成；
    计算所述第一亚像素开口区域和所述对位标识之间的位置差异；
    根据所述位置差异，计算所述隔垫物的位置精度。
  9. 根据权利要求8所述的方法，其中，所述第一亚像素开口区域和所述第二亚像素开口区域上具有彩色膜层，所述第一亚像素开口区域上的彩色膜层的尺寸小于所述第二亚像素开口区域上的彩色膜层的尺寸。
  10. 根据权利要求9所述的方法，其中，所述第一亚像素开口区域和所述第二亚像素开口区域上的所述彩色膜层为R、G或B膜层中任一种。
  11. 根据权利要求8-10中任一项所述的方法，其中，所述第一亚像素开口区域周围的指定位置为所述第一亚像素开口区域的上方预设距离处、下方预设距离处、左方预设距离处和右方预设距离处中的任一位置。
  12. 根据权利要求8-10中任一项所述的方法，其中，所述对位标识的形状为具有对称性的形状。
  13. 根据权利要求12所述的方法，其中，所述对位标识的形状为方形、圆形。
  14. 根据权利要求8-13中任一项所述的方法，其中，所述计算所述第一亚像素开口区域和所述对位标识之间的位置差异包括：
    根据获取的所述第一亚像素开口区域的顶点位置，确定所述第一亚像素开口区域的中心位置；
    根据获取的所述对位标识的顶点位置，确定所述对位标识的中心位置；
    计算所述第一亚像素开口区域的中心位置和所述对位标识的中心位置之间的位置差异。
  15. 根据权利要求8-14中任一项所述的方法，其中，根据所述位置差异，计算所述隔垫物的位置精度包括：
    根据所述位置差异和预设设计位置差，计算所述隔垫物的位置精度。
  16. 一种彩色滤光片，包括：
    基板；
    黑矩阵层，其形成在所述基板上；
    彩色膜层，其形成在所述基板上的至少一个第一亚像素开口区域和多个第二亚像素开口区域上，其中，所述第一亚像素开口区域的尺寸小于所述第二亚像素开口区域的尺寸；所述第一亚像素开口区域上的彩色膜层的尺寸小于所述 第二亚像素开口区域上的彩色膜层的尺寸；
    平坦层，其形成在所述彩色膜层之上；
    对位标识，其形成在所述平坦层上且位于所述第一亚像素开口区域周围的指定位置；
    隔垫物层，其形成在所述平坦层上。
  17. 根据权利要求16所述的彩色滤光片，其中，所述第一亚像素开口区域和所述第二亚像素开口区域上的所述彩色膜层为R、G或B膜层中任一种。
  18. 根据权利要求16或17所述的彩色滤光片，其中，所述第一亚像素开口区域和所述第二亚像素开口区域位于所述基板上未被所述黑矩阵覆盖的区域。
  19. 根据权利要求16或17所述的彩色滤光片，其中，所述第一亚像素开口区域周围的指定位置为所述第一亚像素开口区域的上方预设距离处、下方预设距离处、左方预设距离处和右方预设距离处中的任一位置。
  20. 根据权利要求16或17所述的彩色滤光片，其中，所述对位标识的形状为具有对称性的形状。
  21. 根据权利要求20所述的彩色滤光片，其其中，
    所述对位标识的形状为方形或圆形。
  22. 一种液晶面板，包括上述权利要求16-21中任一项所述的彩色滤光片。
  23. 一种制备彩色滤光片的方法，包括：
    提供基板；
    在所述基板上形成黑矩阵层，并形成至少一个第一亚像素开口区域和多个第二亚像素开口区域，其中，所述第一亚像素开口区域的尺寸小于所述第二亚像素开口区域的尺寸；
    在所述第一亚像素开口区域和所述第二亚像素开口区域上形成彩色膜层，其中，所述第一亚像素开口区域上的彩色膜层的尺寸小于所述第二亚像素开口区域上的彩色膜层的尺寸；
    在所述彩色膜层之上形成平坦层；
    在所述平坦层上形成对位标识和隔垫物层，所述对位标识位于所述第一亚像素开口区域周围的指定位置。
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