WO2016173029A1 - 一种用于光配向的光罩装置及应用设备 - Google Patents

一种用于光配向的光罩装置及应用设备 Download PDF

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Publication number
WO2016173029A1
WO2016173029A1 PCT/CN2015/079703 CN2015079703W WO2016173029A1 WO 2016173029 A1 WO2016173029 A1 WO 2016173029A1 CN 2015079703 W CN2015079703 W CN 2015079703W WO 2016173029 A1 WO2016173029 A1 WO 2016173029A1
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WIPO (PCT)
Prior art keywords
opening portion
region
overlap region
overlapping
overlap
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
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PCT/CN2015/079703
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English (en)
French (fr)
Inventor
韩丙
施明宏
李蒙
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TCL China Star Optoelectronics Technology Co Ltd
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Shenzhen China Star Optoelectronics Technology Co Ltd
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Application filed by Shenzhen China Star Optoelectronics Technology Co Ltd filed Critical Shenzhen China Star Optoelectronics Technology Co Ltd
Priority to US14/765,800 priority Critical patent/US20170146831A1/en
Publication of WO2016173029A1 publication Critical patent/WO2016173029A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2045—Exposure; Apparatus therefor using originals with apertures, e.g. stencil exposure masks

Definitions

  • the present invention relates to the technical field of liquid crystal displays, and in particular to a photomask device and an application device for optical alignment.
  • the liquid crystal display generates an electrode by applying an electric field to the field of the upper and lower display panels, so that the liquid crystal in the liquid crystal layer is deflected by the electric field, and thus the display image can be realized by controlling the polarized light incident into the liquid crystal layer.
  • liquid crystal displays with vertical alignment (VA) mode have been widely studied and applied due to high contrast and wide standard viewing angle.
  • the friction alignment method generates static electricity and particle contamination
  • the light alignment method is a non-contact alignment technology, which uses linearly polarized light to illuminate the light-sensitive polymer alignment film to make liquid crystal in the liquid crystal layer. Forms an angle of inclination with the display panel.
  • the commonly used optical alignment method is UV 2 A (ultra violet vertical alignment) technology, which is based on the use of a certain angle of ultraviolet light to illuminate the photoalignment film layer of the array substrate or the color filter substrate through the reticle.
  • the photo-alignment film layer undergoes an alignment reaction to align the liquid crystal molecules at an angle (1-5°) to the array substrate or the color filter substrate normal.
  • the size of the mask used in the photo-alignment process is usually smaller than that of the liquid crystal display on the market, so it is necessary to use multiple masks to overlap and work simultaneously, and the overlap region (illumination area) illuminates the light twice.
  • FIG. 1a is a schematic structural view of an opening portion of an overlap region of two reticle for light alignment in the prior art.
  • the two reticle 110 and the reticle 120 have overlapping regions, wherein the overlapping area of the reticle 110 is 1101, and the non-overlapping area is 1102, and a plurality of openings 1103 and 1104 are respectively disposed thereon.
  • the opening portion is an exposure area capable of transmitting light; the overlapping area of the reticle 120 is denoted by 1201, and the non-overlapping area is denoted by 1202, and a plurality of opening portions 1203 and 1204 are also respectively disposed thereon.
  • FIG. 1b FIG.
  • FIG. 1b is a structural schematic diagram showing a variation trend of the opening portion (or the corresponding exposure amount) of the overlapping regions of the two masks in FIG. 1a.
  • the mask 120 is illustrated as an overlap region 1201.
  • the change trend of the opening portion 1203 is recorded as a curve 12011, which changes linearly
  • the change trend of the opening portion 1204 on the non-overlapping region 1202 is recorded as a curve (or a straight line) 1022112021, which is a straight line constant; similarly, the reticle 110 overlaps.
  • the change trend of the opening portion 1103 on the region 1101 is a curve 11011, which changes in a straight line, and the non-overlapping region 1102
  • the change trend of the upper opening portion 1104 is written as a curve (or straight line) 11021 (not shown in FIG. 1b), which is also a straight line constant and is the same as the constant of the curve 12021.
  • the overlap region satisfies the curve 11011 and the curve 12011 at the same position (same x) whose superimposed value is the same as the curve 11021 or 12021 of the opening portion of the non-overlapping region of the reticle 110 or 120, that is, through the reticle 110 and the light
  • the superimposed exposure amount of the overlap region opening portions 1101 and 1201 of the cover 120 is the same as the exposure amount of the opening portion 1102 or 1202 of the non-overlapping region of the reticle 110 or the reticle 120.
  • the opening portions of the plurality of mask overlapping regions for light alignment change linearly, that is, the corresponding exposure amount also changes linearly, so that the subsequently produced display panel has a strip-shaped mura defect, which hinders the display of the product. quality.
  • the technical problem to be solved by the present invention is to provide a reticle device and an application device for optical alignment, which can realize a curve (smooth) change in the exposure amount of the opening portions of the two reticle overlapping regions, thereby eliminating the band in the subsequent product.
  • the defect of mura improves the display quality of the product.
  • a technical solution adopted by the present invention is to provide a device, the device comprising:
  • the first reticle includes a first overlap region and a first non-overlapping region
  • the second reticle includes a second overlap region and a second non-overlapping region
  • the first overlap region and the second overlap region overlap each other;
  • the first overlap region includes a plurality of transmissive openings arranged in a first direction
  • the first non-overlapping region includes a plurality of transmissive openings arranged along the first direction;
  • the second overlap region includes a plurality of transmissive openings arranged in the first direction
  • the second non-overlapping region includes a plurality of transmissive openings arranged along the first direction;
  • the opening portion of the first non-overlapping region is the same as the opening portion of the second non-overlapping region
  • H is the height of the opening of the first non-overlapping region and the opening of the second non-overlapping region
  • X LM
  • L is the length of the first overlapping region and the second overlapping region
  • M is the first a distance between the overlap region and the second overlap region from the first non-overlapping region or the second non-overlapping region
  • the opening portion of the first non-overlapping region and the opening portion of the second non-overlapping region are first rectangles
  • the width direction of the first rectangle is the same as the first direction
  • the opening portion of the first overlap region and the opening portion of the second overlap region are a plurality of third rectangles; and a dimension of the third rectangle in the first direction is the same as or different from a width of the first rectangle;
  • the arrangement of the opening portion of the first overlap region and the opening portion of the second overlap region is symmetrical or asymmetrical.
  • the opening portion of the first overlap region and the opening portion of the second overlap region are obtained by a mosaic algorithm.
  • a device comprising:
  • the first reticle includes a first overlap region and a first non-overlapping region
  • the second reticle includes a second overlap region and a second non-overlapping region
  • the first overlap region and the second overlap region overlap each other;
  • the first overlap region includes a plurality of transmissive openings arranged in a first direction
  • the first non-overlapping region includes a plurality of transmissive openings arranged along the first direction;
  • the second overlap region includes a plurality of transmissive openings arranged in the first direction
  • the second non-overlapping region includes a plurality of transmissive openings arranged along the first direction;
  • the opening portion of the first non-overlapping region is the same as the opening portion of the second non-overlapping region
  • H is the height of the opening of the first non-overlapping region and the opening of the second non-overlapping region
  • X LM
  • L is the length of the first overlapping region and the second overlapping region
  • M is the first The distance between the overlap region and the second overlap region from the first non-overlapping region or the second non-overlapping region.
  • the opening portion of the first non-overlapping region and the opening portion of the second non-overlapping region are first rectangles
  • the width direction of the first rectangle is the same as the first direction
  • the opening portion of the first overlap region and the opening portion of the second overlap region are second rectangles, and the size of the second rectangle in the first direction is the same as the width of the first rectangle.
  • the opening portion of the first non-overlapping region and the opening portion of the second non-overlapping region are first rectangles
  • the width direction of the first rectangle is the same as the first direction
  • the opening portion of the first overlap region and the opening portion of the second overlap region are a plurality of third rectangles; and
  • the dimension of the third rectangle in the first direction is the same as or different from the width of the first rectangle.
  • the opening portion of the first overlap region and the opening portion of the second overlap region are obtained by a mosaic algorithm.
  • the opening portion of the first overlap region and the opening portion of the second overlap region overlap each other.
  • the opening portion of the first overlap region and the opening portion of the second overlap region do not overlap each other.
  • the arrangement of the opening portion of the first overlap region and the opening portion of the second overlap region is symmetrical or asymmetrical.
  • an apparatus comprising:
  • the first light source is configured to provide light to an opening of the first reticle
  • the second light source is for supplying light to the opening of the second reticle.
  • the first source and the second source are ultraviolet light.
  • the invention has the beneficial effects that the device and the device provided by the invention comprise a first reticle and a second reticle partially overlapping each other, such that the first reticle comprises a first overlapping area and a first non-overlapping area, the first
  • the second mask includes a second overlapping area and a second non-overlapping area, and the first overlapping area and the second overlapping area overlap each other; and the first overlapping area includes a plurality of transmissive openings arranged in the first direction
  • the first non-overlapping region includes a plurality of transmissive openings arranged along the first direction;
  • the present invention changes the opening portion of the two reticle overlapping regions to a curve conforming to the square of the trigonometric function, so that the opening portion is exposed.
  • the amount of exposure of the opening portion of the non-overlapping region is the same, and the exposure amount of the overlapping region of the two masks is the same as that of the non-overlapping region, so that the display effect in the subsequent liquid crystal display is uniform, and the opening of the curve changes.
  • the department can eliminate the defects of the strip-shaped mura in the subsequent liquid crystal display and improve the display quality of the product.
  • 1a is a schematic structural view of an opening portion of an overlap region of two reticle for light alignment in the prior art
  • FIG. 1b is a schematic structural view showing a variation trend of an opening portion (or a corresponding exposure amount) of the overlapping regions of the two masks in FIG. 1a;
  • FIG. 2a is a schematic structural view of a first embodiment of a photomask device for optical alignment provided by the present invention
  • Figure 2b is a schematic view showing the structure of the height of the opening portion of the overlap region of the two masks in Figure 2a;
  • FIG. 2c is a schematic structural view showing an arrangement of the opening portions of the overlapping regions of the two masks in FIG. 2a;
  • Figure 2d is a schematic view showing the structure in which the opening portions of the overlapping regions of the two masks in Figure 2a overlap each other;
  • Figure 2e is a schematic view showing the structure in which the opening portions of the overlapping regions of the two masks in Figure 2a do not overlap each other;
  • FIG. 3a is a schematic structural view of a second embodiment of a photomask device for photoalignment provided by the present invention.
  • Figure 3b is a schematic structural view of the opening portion of the overlapping regions of the two masks of Figure 3a including a plurality of third rectangles;
  • Figure 3c is a schematic view showing another structure of the overlapping portion of the two masks of Figure 3a including a plurality of third rectangles;
  • FIG. 4 is a schematic structural view of a third embodiment of an exposure apparatus for optical alignment provided by the present invention.
  • FIG. 2a is a schematic structural view of a first embodiment of a photomask device for photoalignment provided by the present invention
  • FIG. 2b is a view showing a variation trend of an opening height of an overlap region of two photomasks in FIG. 2a. Schematic.
  • the reticle device 20 includes:
  • the first mask 210 includes a first overlap region 2101 and a first non-overlapping region 2102;
  • the second mask 220 includes a second overlap region 2201 and a second non-overlapping region 2202;
  • the first overlap region 2101 and the second overlap region 2201 overlap each other;
  • the first overlap region 2101 includes a plurality of transmissive openings 2103 arranged along the first direction Da;
  • the first non-overlapping region 2102 includes a plurality of transmissive openings 2104 arranged along the first direction Da;
  • the second overlap region 2201 includes a plurality of transmissive openings 2203 arranged along the first direction Da;
  • the second non-overlapping region 2202 includes a plurality of transmissive openings 2204 arranged along the first direction Da;
  • the opening portion 2104 of the first non-overlapping region 2102 is the same as the opening portion 2204 of the second non-overlapping region 2202;
  • H is the height of the opening portion 2104 of the first non-overlapping region 2102 and the opening portion 2204 of the second non-overlapping region 2202
  • X LM
  • L is the length of the first overlapping region 2101
  • M is the distance between the first overlap region 2101 and the second overlap region 2201 from the first non-overlapping region 2102 or the second non-overlapping region 2202.
  • the opening portion 2104 and the opening portion 2204 are the same, indicating that they have the same shape and size.
  • the height H of the non-overlapping area of the reticle can be designed according to the size of the liquid crystal display, and the length L of the overlapping area, that is, the height H of the non-overlapping area and the length L of the overlapping area are known or preset. data. Further, the opening portions 2103 and 2203 of the two mask overlapping regions 2101 and 2201 are changed in a curve conforming to the square of the trigonometric function, so that the exposure amount of the opening portion is more smoothly changed, and the defect of the strip-shaped mura in the subsequent liquid crystal display can be eliminated. Improve the display quality of the product.
  • the trend of the change of the opening portion 2203 in the overlap region 2201 is recorded as a curve 22011, which is a trigonometric function squared as sin 2 ( ⁇ X/2L), and
  • the change trend of the opening portion 2204 on the non-overlapping region 2202 is referred to as a curve (or straight line) 22021, which is a straight line constant H.
  • the change trend of the opening portion 2103 on the overlap region 2101 of the reticle 210 is a curve 21011, which is also The square of the trigonometric function changes as cos 2 ( ⁇ X/2L), and the trend of the change of the opening portion 2104 in the non-overlapping region 2102 is recorded as a curve 21021 (not shown in Fig. 1b), which is also a straight line constant H.
  • the opening portion 2104 of the first non-overlapping region 2102 and the opening portion 2204 of the second non-overlapping region 2202 are first rectangles;
  • the width direction of the first rectangle is the same as the first direction Da;
  • the opening portion 2103 of the first overlap region 2101 and the opening portion 2203 of the second overlap region 2201 are second rectangles, and the size of the second rectangle in the first direction Da is the same as the width of the first rectangle. Further, the effective exposure areas and sizes of the openings 2103 and 2203 which are overlapped with each other by the first reticle 210 and the second reticle 220 are the same as the exposure areas and sizes of the non-overlapping regions 2102 or 2203 of the openings 2104 or 2204, The exposure amount through the opening portion of the mask 210 and the mask 220 that overlaps the overlap region is made the same as the exposure amount of the non-overlap region opening portion.
  • the opening portions 2103 and 3303 of the first overlap region 2101 and the second overlap region 2201 in FIG. 2a have a symmetric arrangement, and may alternatively have an asymmetric arrangement in other embodiments.
  • FIG. 2c is a schematic structural view showing an arrangement of the openings of the overlapping regions of the two masks in FIG. 2a.
  • the opening portion 2103 of the first overlapping region 2101 has the same bottom horizontal position as the opening portion 2104 of the first non-overlapping region 2102
  • the opening portion 2203 of the second overlapping region 2201 has Regarding the self-symmetrical arrangement of the horizontal center line of the second reticle 220.
  • At least one of the openings 2103 of the first overlap region 2101 has the same top edge horizontal position as the opening portion 2104 of the first non-overlapping region 2102; or the opening portion 2203 of the second overlap region 2201. At least one of the openings has the same bottom or top horizontal position as the opening 2204 of the second non-overlapping region 2202, such that the opening portion 2103 of the first overlap region 2101 and the opening portion 2104 of the second non-overlapping region 2102 have Symmetrical or asymmetrical arrangement.
  • FIG. 2d is a schematic structural view showing the overlapping portions of the overlapping regions of the two masks in FIG. 2a overlapping each other.
  • the opening portion 2103 of the first overlapping region 2101 has the same bottom horizontal position as the opening portion 2104 of the first non-overlapping region 2102
  • the opening portion 2203 of the second overlapping region 2201 is also
  • Each of the openings 2204 of the second non-overlapping region 2202 has the same bottom horizontal position, and thus the opening portion 2104 of the first non-overlapping region 2102 is the same as the opening portion 2204 of the second non-overlapping region 2202.
  • the opening portion 2103 of the first overlap region 2101 and the opening portion 2203 of the second overlap region 2201 overlap each other.
  • the opening portions of the overlapping regions of the two masks 210 and 220 as shown in FIG. 2a are also arranged in an overlapping manner with each other, and the opening portions of the overlapping regions of the two masks 210 and 220 as shown in FIG. 2c have An arrangement that partially overlaps each other.
  • FIG. 2e is a schematic view showing the structure in which the opening portions of the overlapping regions of the two masks in FIG. 2a do not overlap each other.
  • the opening portion 2103 of the first overlapping region 2101 has the same bottom edge horizontal position as the opening portion 2104 of the first non-overlapping region 2102, but the second overlapping region 2201
  • the opening portion 2203 has the same top edge horizontal position as the opening portion 2204 of the second non-overlapping region 2202, and thus the opening portion 2104 of the first non-overlapping region 2102 and the opening portion 2204 of the second non-overlapping region 2202
  • the opening portion 2103 of the first overlap region 2101 and the opening portion 2203 of the second overlap region 2201 do not overlap each other.
  • the exposure amount of the overlapped overlapping area is the same as the exposure amount of the non-overlapping area, so that the display effect in the subsequent liquid crystal display is uniform, and the curved portion of the curved portion can eliminate the defect of the strip-shaped mura in the subsequent liquid crystal display, thereby improving the display quality of the product.
  • FIG. 3a is a schematic structural view of a second embodiment of a photomask device for optical alignment provided by the present invention.
  • the reticle device 30 includes:
  • the first mask 310 includes a first overlap region 3101 and a first non-overlapping region 3102;
  • the second mask 320 includes a second overlap region 3201 and a second non-overlapping region 3202;
  • the first overlap region 3101 and the second overlap region 3201 overlap each other;
  • the first overlap region 3101 includes a plurality of transmissive openings 3103 arranged along the first direction Da;
  • the first non-overlapping region 3102 includes a plurality of transmissive openings 3104 arranged along the first direction Da;
  • the second overlap region 3201 includes a plurality of transmissive openings 3203 arranged along the first direction Da;
  • the second non-overlapping region 3202 includes a plurality of transmissive openings 3204 arranged along the first direction Da;
  • the opening portion 3104 of the first non-overlapping region 3102 is the same as the opening portion 3204 of the second non-overlapping region 3202;
  • H is the height of the opening portion 3104 of the first non-overlapping region 3102 and the opening portion 3204 of the second non-overlapping region 3202
  • X LM
  • L is the length of the first overlap region 3101 and the second overlap region 3201
  • M is a distance between the first overlapping area 3101 and the second overlapping area 3201 from the first non-overlapping area 3102 or the second non-overlapping area 3202;
  • the opening portion 3104 of the first non-overlapping region 3102 and the opening of the second non-overlapping region 3202 The portion 3204 is a first rectangle;
  • the width direction of the first rectangle is the same as the first direction Da;
  • the opening portion 3103 of the first overlap region 3101 and the opening portion 3203 of the second overlap region 3201 are a plurality of third rectangles, and the size of the third rectangle in the first direction Da is the same as the width of the first rectangle Or different.
  • the height variation curve 32011 (not shown in FIG. 3a) of the opening portion 3203 on the second overlap region 3201 and the height variation curve 31011 (not shown in FIG. 3a) of the opening portion 3103 on the first overlap region 3101 satisfy the superposition.
  • the height of the opening portion 3204 is the same as that of the second non-overlapping region 3202.
  • an arrangement form of the openings 3103 and 3203 formed by the plurality of third rectangles is provided (the size of the third rectangle in the first direction and the opening portion 3104 or 3204 of the non-overlapping region 3102 or 3202 as shown in FIG.
  • the width is the same) such that the exposure amount of the same position of the overlap regions 3101 and 3202 of the overlapped first and second masks 310 and 302 is the same as that of the first non-overlap region 3102 and the second non-overlap region 3202 .
  • the shape and size of the plurality of third rectangles are the same or different, wherein the shape and size of the plurality of third rectangles are the same in FIG. 3a.
  • FIG. 3b is a structural schematic view of the overlapping portion of the two reticles of FIG. 3a including a plurality of rectangles. As shown in FIG. 3b, the shape and size of at least two of the plurality of third rectangles are different, and each of the openings of the first overlap region 3101 and the second overlap region 3201 is illustrated.
  • Each of 3103 and 3203 includes a plurality of third rectangles having different shapes and sizes, and the overlapping portions 3101 and 3202 of the first photomask 310 and the second mask 302 are exposed through the same position opening portions 3103 and 3203. The amount of exposure is the same as that of the openings 3104 and 3204 passing through the first non-overlapping region 3102 and the second non-overlapping region 3202.
  • the size of at least one third rectangle of the plurality of third rectangles in the first direction Da may be different from the width of the first rectangle of the opening portion of the non-overlap region.
  • FIG. 3c is another schematic structural view of the overlapping portion of the two masks of FIG. 3a including a plurality of rectangles.
  • each of the opening portions 3103 and 3203 of the first overlap region 3101 and the second overlap region 3201 includes a plurality of third rectangles having the same shape and size, and the third rectangle is sufficiently small so that The formed openings 3103 and 3203 are randomly distributed in the corresponding overlapping regions 3101 and 3201, but satisfy the openings 3103 and the overlapping portions 3101 and 3202 of the first photomask 310 and the second photomask 302 that pass through the same position and
  • the exposure amount of 3203 is the same as the exposure amount through the opening portion 3104 or 3204 of the first non-overlapping region 3102 or the second non-overlapping region 3202.
  • the third rectangle may include, but is not limited to, a square shape.
  • the randomly distributed plurality of third rectangles are obtained by a mosaic algorithm.
  • the shape and size of the third rectangle are preset, and the heights Y1 and Y2 of the openings are selected, and further A plurality of third rectangles are randomly distributed by the mosaic algorithm to form an opening portion of the overlapping region.
  • first reticle 310 and the first overlapping region 3101 of the second reticle and the openings 3103 and 3203 of the second overlapping region 3201 are arranged symmetrically or asymmetrically.
  • first reticle 310 and the first overlapping region 3101 of the second reticle and the openings 3103 and 3203 of the second overlapping region 3201 are arranged symmetrically or asymmetrically.
  • first overlapping region 3101 of the first reticle 310 and the second reticle 320 and the opening portions 3103 and 3203 of the second overlapping region 3201 overlap or do not overlap each other.
  • first overlapping region 3101 of the first reticle 310 and the second reticle 320 and the opening portions 3103 and 3203 of the second overlapping region 3201 overlap or do not overlap each other.
  • the present embodiment sets the opening portion of the two mask overlapping regions to a structure including a plurality of third rectangles, such as a mosaic arrangement, and the opening portion of the overlap region
  • the effect of the display is uniform, and the curved portion of the curve can eliminate the defects of the strip-shaped mura in the subsequent liquid crystal display, thereby improving the display quality of the product.
  • FIG. 4 is a schematic structural diagram of a third embodiment of an exposure apparatus for optical alignment provided by the present invention.
  • the exposure device 40 includes the reticle device 410 and the first light source 420 and the second light source 430 according to the first and second embodiments;
  • the first light source 420 is configured to provide light to the opening of the first mask 411;
  • the second light source 430 is configured to supply light to the opening of the second mask 412.
  • the first light source 420 and the second light source 430 are the same as those in the existing exposure apparatus, and are optionally disposed on the side of the exposure apparatus, and are respectively irradiated to the first portion through different mirrors and polarizers at different angles.
  • the first light source and the second light source are ultraviolet light, which are the same as the prior art, and are not described herein again.
  • the present embodiment changes the height of the opening in the two mask overlapping regions to the curve of the square of the trigonometric function, so that the exposure amount of the opening is more smoothly changed.
  • Hsin 2 ( ⁇ X/2L)+Hcos 2 ( ⁇ X/2L) H at the same position of the overlap region, that is, the exposure amount of the opening portion of the overlap region and the opening portion of the non-overlapping region after the two masks overlap
  • the exposure amount is the same, and the exposure amount of the overlapping area of the two masks is the same as that of the non-overlapping area, so that the display effect in the subsequent liquid crystal display is uniform, and the curved portion of the opening can eliminate the band in the subsequent liquid crystal display.
  • the defect of mura improves the display quality of the product.

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Abstract

一种用于光配向的光罩装置及应用设备，包括彼此部分重叠的第一光罩（210）和第二光罩（220），以使得该第一光罩（210）和第二光罩（220）分别包括第一重叠区（2101）、第一非重叠区（2102）和第二重叠区（2201）、第二非重叠区（2201），同时该第一重叠区（2101）、第一非重叠区（2102）、第二重叠区（2201）和第二非重叠区（2202）分别包括多个开口部（2103, 2104, 2203, 2204）；该第一重叠区开口部（2103）的高度和该第二重叠区开口部（2203）的高度分别按照三角函数平方平滑变化，且使得重叠区在相同位置处叠加后的开口部高度与第一或第二非重叠区开口部的高度相同。采用该光罩能够消除后续工艺中带状mura缺陷，提高产品的显示质量。

Description

一种用于光配向的光罩装置及应用设备 【技术领域】
本发明涉及液晶显示器的技术领域，特别是涉及一种用于光配向的光罩装置及应用设备。
【背景技术】
液晶显示器通过施加电场到其上、下显示面板的场产生电极，使得液晶层中的液晶在电场的作用下偏转方向，因此可通过控制入射到该液晶层中的偏振光实现显示图像。目前，垂直配向(VA，vertical alignment)模式的液晶显示器由于具有高对比度和宽标准视角已得到广泛研究和应用。
在液晶显示器的制作过程中，常使用摩擦配向和光配向两种方法。其中摩擦配向方法会产生静电和颗粒的污染，而光配向方法是一种非接触式的配向技术，其利用线偏振光照射在光敏感的高分子聚合物配向膜上，使得液晶层中的液晶与显示面板形成倾角。
目前常用的光配向方法是UV2A(ultra violet vertical alignment)技术，其原理是采用一定角度的紫外光(ultra violet)通过光罩照射到阵列基板或彩膜基板的光配向膜层上，使得光配向膜层发生配向反应进而使得液晶分子以与阵列基板或彩膜基板法线成一定夹角(1-5°)排列。而用于光配向工艺的光罩尺寸通常小于市场上液晶显示器的尺寸，因此需要使用多个光罩重叠设置且同时工作，其重叠区(overlap区)会照射两次光线。
请查阅图1a，图1a是现有技术中用于光配向的两个光罩的重叠区开口部的结构示意图。如图1所示，该两个光罩110和光罩120具有重叠区，其中该光罩110的重叠区记为1101，非重叠区记为1102，其上分别设有多个开口部1103和1104，其中开口部是能够透射光线的曝光区；该光罩120的重叠区记为1201，非重叠区记为1202，其上分别也设有多个开口部1203和1204。请查阅图1b，图1b是图1a中两个光罩的重叠区开口部(或对应的曝光量)变化趋势的结构示意图，具体的，以该光罩120进行示例说明，其重叠区1201上开口部1203的变化趋势记为曲线12011，其呈直线变化，且非重叠区1202上开口部1204的变化趋势记为曲线(或直线)1022112021，其为直线常数；同理，该光罩110重叠区域1101上的开口部1103的变化趋势为曲线11011，呈直线变化，且非重叠区域1102 上开口部1104的变化趋势记为曲线(或直线)11021(图1b中未示出)，其也为直线常数，并与曲线12021的常数相同。其中在重叠区满足曲线11011和曲线12011在相同位置(相同x)处其叠加值与该光罩110或120的非重叠区的开口部的曲线11021或12021数值相同，即通过该光罩110和光罩120重叠区开口部1101和1201的叠加曝光量与该光罩110或光罩120非重叠区域的开口部1102或1202的曝光量相同。
但是现有技术中用于光配向的多个光罩重叠区中开口部呈直线变化，即对应的曝光量也呈直线变化，使得后续生产的显示面板中具有带状mura缺陷，妨碍产品的显示质量。
【发明内容】
本发明主要解决的技术问题是提供一种用于光配向的光罩装置及应用设备，能够实现两个光罩重叠区的开口部的曝光量呈曲线(平滑)变化，进而消除后续产品中带状mura的缺陷，提高产品的显示质量。
为解决上述技术问题，本发明采用的一个技术方案是，提供一种装置，该装置包括：
第一光罩和第二光罩；
该第一光罩包括第一重叠区和第一非重叠区；
该第二光罩包括第二重叠区和第二非重叠区；
该第一重叠区和该第二重叠区彼此重叠；
该第一重叠区包括沿第一方向排列的多个透射的开口部；
该第一非重叠区包括沿该第一方向排列的多个透射的开口部；
该第二重叠区包括沿该第一方向排列的多个透射的开口部；
该第二非重叠区包括沿该第一方向排列的多个透射的开口部；
该第一非重叠区的开口部和该第二非重叠区域的开口部相同；
该第一重叠区的开口部的高度Y1满足Y1＝Hsin2(πX/2L)；
该第二重叠区的开口部的高度Y2满足Y2＝Hcos2(πX/2L)；
其中H是该第一非重叠区域的开口部和该第二非重叠区域的开口部的高度，X＝L-M，L是该第一重叠区和该第二重叠区的长度，M是该第一重叠区和该第二重叠区距离该第一非重叠区或该第二非重叠区的距离；
该第一非重叠区的开口部和该第二非重叠区的开口部是第一长方形；
该第一长方形的宽度方向与该第一方向相同；
该第一重叠区的开口部和该第二重叠区的开口部是多个第三长方形；且该第三长方形的在该第一方向上的尺寸与该第一长方形的宽度相同或不同；
该第一重叠区的开口部和该第二重叠区的开口部的布置形式对称或不对称。
其中，该第一重叠区的开口部和该第二重叠区的开口部是通过马赛克算法得到。
为解决上述技术问题，本发明采用的又一个技术方案是，提供一种装置，该装置包括：
第一光罩和第二光罩；
该第一光罩包括第一重叠区和第一非重叠区；
该第二光罩包括第二重叠区和第二非重叠区；
该第一重叠区和该第二重叠区彼此重叠；
该第一重叠区包括沿第一方向排列的多个透射的开口部；
该第一非重叠区包括沿该第一方向排列的多个透射的开口部；
该第二重叠区包括沿该第一方向排列的多个透射的开口部；
该第二非重叠区包括沿该第一方向排列的多个透射的开口部；
该第一非重叠区的开口部和该第二非重叠区的开口部相同；
该第一重叠区的开口部的高度Y1满足Y1＝Hsin2(πX/2L)；
该第二重叠区的开口部的高度Y2满足Y2＝Hcos2(πX/2L)；
其中H是该第一非重叠区域的开口部和该第二非重叠区域的开口部的高度，X＝L-M，L是该第一重叠区和该第二重叠区的长度，M是该第一重叠区和该第二重叠区距离该第一非重叠区或该第二非重叠区的距离。
其中，该第一非重叠区的开口部和该第二非重叠区的开口部是第一长方形；
该第一长方形的宽度方向与该第一方向相同；
该第一重叠区的开口部和该第二重叠区的开口部是第二长方形，且该第二长方形在该第一方向上的尺寸与该第一长方形的宽度相同。
可选的，该第一非重叠区的开口部和该第二非重叠区的开口部是第一长方形；
该第一长方形的宽度方向与该第一方向相同；
该第一重叠区的开口部和该第二重叠区的开口部是多个第三长方形；且该 第三长方形的在该第一方向上的尺寸与该第一长方形的宽度相同或不同。
进一步的，该第一重叠区的开口部和该第二重叠区的开口部是通过马赛克算法得到。
进一步可选的，该第一重叠区的开口部和该第二重叠区的开口部彼此重叠。
该第一重叠区的开口部和该第二重叠区的开口部彼此不重叠。
该第一重叠区的开口部和该第二重叠区的开口部的布置形式对称或不对称。
为解决上述技术问题，本发明采用的另一个技术方案是，提供一种设备，该设备包括：
上述又一技术方案中涉及的装置以及第一光源和第二光源；
该第一光源用于向该第一光罩的开口部提供光；
该第二光源用于向该第二光罩的开口部提供光。
该第一光源和该第二光源是紫外光。
本发明的有益效果是：本发明提供的装置及设备包括彼此部分重叠的第一光罩和第二光罩，以使得该第一光罩包括第一重叠区和第一非重叠区，该第二光罩包括第二重叠区和第二非重叠区，且该第一重叠区和该第二重叠区彼此重叠；同时该第一重叠区包括沿第一方向排列的多个透射的开口部，该第一非重叠区包括沿该第一方向排列的多个透射的开口部；该第二重叠区包括沿该第一方向排列的多个透射的开口部，该第二非重叠区包括沿该第一方向排列的多个透射的开口部；具体的，该第一非重叠区的开口部和该第二非重叠区的开口部相同；该第一重叠区的开口部的高度Y1满足Y1＝Hsin2(πX/2L)，该第二重叠区的开口部的高度Y2满足Y2＝Hcos2(πX/2L)；其中H是该第一非重叠区域的开口部和该第二非重叠区域的开口部的高度，X＝L-M，L是该第一重叠区和该第二重叠区的长度，M是该第一重叠区和该第二重叠区距离该第一非重叠区或该第二非重叠区的距离。与现有用于光配向的多个光罩重叠区域中开口部呈直线变化的技术相比，本发明将两个光罩重叠区中开口部呈符合三角函数平方的曲线变化，使得开口部的曝光量更平滑(smooth)变化，且在重叠区域的相同位置满足Hsin2(πX/2L)+Hcos2(πX/2L)＝H，即该两个光罩重叠后其重叠区的开口部的曝光量与非重叠区的开口部的曝光量相同，进而实现该两个光罩衔接的重叠区的曝光量与非重叠区的曝光量相同，使得后续液晶显示器中显示效果均匀，同时曲线变化的开口部能够实现消除后续液晶显示器中带状mura的缺陷，提高 产品的显示质量。
【附图说明】
图1a是现有技术中用于光配向的两个光罩的重叠区开口部的结构示意图；
图1b是图1a中两个光罩的重叠区开口部(或对应曝光量)变化趋势的结构示意图；
图2a是本发明提供的用于光配向的光罩装置第一实施方式的结构示意图；
图2b是图2a中两个光罩的重叠区开口部高度变化趋势的结构示意图；
图2c是图2a中两个光罩的重叠区开口部的布置形式不对称的结构示意图；
图2d是图2a中两个光罩的重叠区开口部彼此重叠的结构示意图；
图2e是图2a中两个光罩的重叠区开口部彼此不重叠的结构示意图；
图3a是本发明提供的用于光配向的光罩装置第二实施方式的结构示意图；
图3b是图3a中两个光罩的重叠区开口部包括多个第三长方形的一结构示意图；
图3c是图3a中两个光罩的重叠区开口部包括多个第三长方形的另一结构示意图；
图4是本发明提供的用于光配向的曝光设备第三实施方式的结构示意图。
【具体实施方式】
下面结合附图和实施方式对本发明进行详细说明。
请参阅图2a和图2b，图2a是本发明提供的用于光配向的光罩装置第一实施方式的结构示意图；图2b是图2a中两个光罩的重叠区开口部高度变化趋势的结构示意图。
该光罩装置20包括：
第一光罩210和第二光罩220；
该第一光罩210包括第一重叠区2101和第一非重叠区2102；
该第二光罩220包括第二重叠区2201和第二非重叠区2202；
该第一重叠区2101和该第二重叠区2201彼此重叠；
该第一重叠区2101包括沿第一方向Da排列的多个透射的开口部2103；
该第一非重叠区2102包括沿该第一方向Da排列的多个透射的开口部2104；
该第二重叠区2201包括沿该第一方向Da排列的多个透射的开口部2203；
该第二非重叠区2202包括沿该第一方向Da排列的多个透射的开口部2204；
该第一非重叠区2102的开口部2104和该第二非重叠区2202的开口部2204相同；
该第一重叠区2101的开口部2103的高度Y1满足Y1＝Hsin2(πX/2L)；
该第二重叠区2201的开口部2203的高度Y2满足Y2＝Hcos2(πX/2L)；
其中H是该第一非重叠区2102的开口部2104和该第二非重叠区2202的开口部2204的高度，X＝L-M，L是该第一重叠区2101和该第二重叠区2201的长度，M是该第一重叠区2101和该第二重叠区2201距离该第一非重叠区2102或该第二非重叠区2202的距离。
其中开口部2104和开口部2204相同，表示其具有相同的形状和尺寸。
在其他实施方式中，可选第一重叠区2101的开口部2103的高度Y1满足Y1＝Hcos2(πX/2L)，同理，该第二重叠区2201的开口部2203的高度Y2满足Y2＝Hsin2(πX/2L)。
具体实施时，可根据应用液晶显示器的尺寸设计光罩非重叠区开口部高度H，及重叠区的长度L，即非重叠区开口部高度H及重叠区域的长度L是已知或预设的数据。进一步的，将两个光罩重叠区2101和2201中开口部2103和2203呈符合三角函数平方的曲线变化，使得开口部的曝光量更平滑变化，能够实现消除后续液晶显示器中带状mura的缺陷，提高产品的显示质量。
请继续参阅图2b，具体的，以该光罩220进行示例说明，其重叠区2201上开口部2203的变化趋势记为曲线22011，其呈三角函数平方如sin2(πX/2L)变化，且非重叠区域2202上开口部2204的变化趋势记为曲线(或直线)22021，其为直线常数H；同理，该光罩210重叠区2101上的开口部2103的变化趋势为曲线21011，其也呈三角函数平方如cos2(πX/2L)变化，且非重叠区2102上开口部2104的变化趋势记为曲线21021(图1b中未示出)，其也为直线常数H。
其中该第一重叠区2101的开口部2103的高度Y1满足Y1＝Hsin2(πX/2L)，且该第二重叠区2201的开口部2203的高度Y2满足Y2＝Hcos2(πX/2L)，那么该第一光罩210和该第二光罩220重叠后，在彼此重叠区的开口部，对于相同位置(相同x)处满足叠加后的开口部高度为Y1+Y2＝H，即与非重叠区域的开口部具有相同的高度，使得能够良好匹配现有的光照曝光工艺条件。
具体的，该第一非重叠区2102的开口部2104和该第二非重叠区2202的开口部2204是第一长方形；
该第一长方形的宽度方向与该第一方向Da相同；
该第一重叠区2101的开口部2103和该第二重叠区2201的开口部2203是第二长方形，且该第二长方形在该第一方向Da上的尺寸与该第一长方形的宽度相同。进而使得通过该第一光罩210和该第二光罩220彼此重叠的开口部2103和2203的有效曝光面积和尺寸与非重叠区2102或2203开口部2104或2204的曝光面积和尺寸相同，以使得通过该光罩210和该光罩220的衔接重叠区开口部的曝光量与非重叠区开口部的曝光量相同。
其中图2a中的第一重叠区2101和第二重叠区2201的开口部2103和3303具有对称布置形式，在其他实施方式中可选具有不对称布置形式。
请查阅图2c，图2c是图2a中两个光罩的重叠区开口部的布置形式不对称的结构示意图。如图2c所示，其中该第一重叠区2101的开口部2103均与该第一非重叠区2102的开口部2104具有相同的底边水平位置，而该第二重叠区2201的开口部2203具有关于第二光罩220水平中线自对称的布置形式。
进一步可选的，该第一重叠区2101的开口部2103中至少一个具有与该第一非重叠区2102的开口部2104具有相同的顶边水平位置；或该第二重叠区2201的开口部2203中至少一个具有与该第二非重叠区2202的开口部2204具有相同的底边或顶边水平位置，以使得第一重叠区2101的开口部2103与第二非重叠区2102的开口部2104具有对称或不对称的布置形式。
请查阅图2d，图2d是图2a中两个光罩的重叠区域开口部彼此重叠的结构示意图。如图2d所示，其中该第一重叠区2101的开口部2103均与该第一非重叠区2102的开口部2104具有相同的底边水平位置，且该第二重叠区2201的开口部2203也均与该第二非重叠区2202的开口部2204具有相同的底边水平位置，因此在该第一非重叠区2102的开口部2104与该第二非重叠区2202的开口部2204相同的情况下，在该第一光罩210和该第二光罩220重叠时，该第一重叠区2101的开口部2103与该第二重叠区2201的开口部2203彼此重叠。
其中，如图2a所示的该两个光罩210和220的重叠区的开口部也是彼此重叠的布置形式，如图2c所示的该两个光罩210和220的重叠区的开口部具有彼此部分重叠的布置形式。
请查阅图2e，图2e是图2a中两个光罩的重叠区域开口部彼此不重叠的结构示意图。如图2e所示，其中该第一重叠区2101的开口部2103均与该第一非重叠区2102的开口部2104具有相同的底边水平位置，但该第二重叠区2201 的开口部2203均与该第二非重叠区2202的开口部2204具有相同的顶边水平位置，因此在该第一非重叠区2102的开口部2104与该第二非重叠区2202的开口部2204相同的情况下，在该第一光罩210和该第二光罩220重叠时，该第一重叠区2101的开口部2103与该第二重叠区2201的开口部2203彼此不重叠。
区别于现有技术的情况，本实施方式将两个光罩重叠区中开口部呈符合三角函数平方的曲线变化，使得开口部的曝光量更平滑变化，且在重叠区中相同位置满足Hsin2(πX/2L)+Hcos2(πX/2L)＝H，即该两个光罩重叠后其重叠区开口部的曝光量与非重叠区开口部的曝光量相同，进而实现该两个光罩衔接的重叠区的曝光量与非重叠区的曝光量相同，使得后续液晶显示器中显示效果均匀，同时曲线变化的开口部能够实现消除后续液晶显示器中带状mura的缺陷，提高产品的显示质量。
请参阅图3a，图3a是本发明提供的用于光配向的光罩装置第二实施方式的结构示意图。该光罩装置30包括：
第一光罩310和第二光罩320；
该第一光罩310包括第一重叠区3101和第一非重叠区3102；
该第二光罩320包括第二重叠区3201和第二非重叠区3202；
该第一重叠区3101和该第二重叠区3201彼此重叠；
该第一重叠区3101包括沿第一方向Da排列的多个透射的开口部3103；
该第一非重叠区3102包括沿该第一方向Da排列的多个透射的开口部3104；
该第二重叠区3201包括沿该第一方向Da排列的多个透射的开口部3203；
该第二非重叠区3202包括沿该第一方向Da排列的多个透射的开口部3204；
该第一非重叠区3102的开口部3104和该第二非重叠区3202的开口部3204相同；
该第一重叠区3101的开口部3103的高度Y1满足Y1＝Hsin2(πX/2L)；
该第二重叠区2201的开口部3203的高度Y2满足Y2＝Hcos2(πX/2L)；
其中H是该第一非重叠区3102的开口部3104和该第二非重叠区3202的开口部3204的高度，X＝L-M，L是该第一重叠区3101和该第二重叠区3201的长度，M是该第一重叠区3101和该第二重叠区3201距离该第一非重叠区3102或该第二非重叠区3202的距离；
其中，该第一非重叠区3102的开口部3104和该第二非重叠区3202的开口 部3204是第一长方形；
该第一长方形的宽度方向与该第一方向Da相同；
该第一重叠区3101的开口部3103和该第二重叠区3201的开口部3203是多个第三长方形，且该第三长方形在该第一方向Da上的尺寸与该第一长方形的宽度相同或不同。
其中第二重叠区3201上开口部3203的高度变化曲线32011(图3a中未示出)和第一重叠区3101上开口部3103的高度变化曲线31011(图3a中未示出)，满足叠加后与第二非重叠区3202上开口部3204的高度相同，具体可参考上述第一实施方式中的相关内容，此处不再赘述。进而设置该多个第三长方形形成的开口部3103和3203的布置形式(如图3a所示的该第三长方形在第一方向上的尺寸与非重叠区3102或3202的开口部3104或3204的宽度相同)，使得重叠后的该第一光罩310和第二光罩302的重叠区3101和3202的同一位置的曝光量与第一非重叠区3102和第二非重叠区3202的曝光量相同。
进一步的，该多个第三长方形的形状和尺寸相同或不同，其中图3a中以该多个第三长方形的形状和尺寸相同为示例。
请参阅图3b，图3b是图3a中两个光罩的重叠区域开口部包括多个长方形的一结构示意图。如图3b所示，以该多个第三长方形中至少两个第三长方形的形状和尺寸不相同为例进行说明，其中该第一重叠区3101和该第二重叠区3201的每个开口部3103和3203均包括多个形状和尺寸不相同的第三长方形，且使得重叠后的该第一光罩310和第二光罩302的重叠区3101和3202通过同一位置开口部3103和3203的曝光量与通过第一非重叠区3102和第二非重叠区3202的开口部3104和3204的曝光量相同。
其中，可选多个第三长方形中至少一个第三长方形在该第一方向Da上的尺寸与非重叠区开口部的第一长方形的宽度不同。
请参阅图3c，图3c是图3a中两个光罩的重叠区开口部包括多个长方形的另一结构示意图。如图3c所示，该第一重叠区3101和该第二重叠区3201的每个开口部3103和3203均包括多个形状和尺寸相同的第三长方形，且该第三长方形足够小，以使得组成的开口部3103和3203随机分布在对应的重叠区3101和3201，但满足使得重叠后的该第一光罩310和第二光罩302的重叠区3101和3202通过同一位置的开口部3103和3203的曝光量与通过第一非重叠区3102或第二非重叠区3202的开口部3104或3204的曝光量相同。
其中第三长方形可选包括但不限于是正方形的形状。
可选的，该随机分布的多个第三长方形是通过马赛克(mosaic)算法得到，具体实施时，预设该第三长方形的形状和尺寸，并选取需要设置开口部的高度Y1和Y2，进而通过马赛克算法可获得多个第三长方形随机分布组成重叠区域的开口部。
进一步的，该第一光罩310和该第二光罩的第一重叠区3101和第二重叠区3201的开口部3103和3203的布置形式对称或不对称。具体可参考上述第一实施方式中相关内容，此处不再赘述。
进一步可选的，该第一光罩310和该第二光罩320的第一重叠区3101和第二重叠区3201的开口部3103和3203彼此重叠或不重叠。具体可参考上述第一实施方式中相关内容，此处不再赘述。
区别于现有技术、上述第一实施方式的情况，本实施方式将两个光罩重叠区域中开口部设置为包括多个第三长方形的结构，如马赛克的布置形式，且重叠区开口部的高度变化符合三角函数平方的曲线变化，使得开口部的曝光量更平滑变化，且在重叠区域的相同位置满足Hsin2(πX/2L)+Hcos2(πX/2L)＝H，即该两个光罩重叠后其重叠区开口部的曝光量与非重叠区开口部的曝光量相同，进而实现该两个光罩衔接的重叠区的曝光量与非重叠区的曝光量相同，使得后续液晶显示器中显示效果均匀，同时曲线变化的开口部能够实现消除后续液晶显示器中带状mura的缺陷，提高产品的显示质量。
请参阅图4，图4是本发明提供的用于光配向的曝光设备第三实施方式的结构示意图。
其中该曝光设备40包括上述第一、第二实施方式中涉及的光罩装置410以及第一光源420和第二光源430；
该第一光源420用于向该第一光罩411的开口部提供光；
该第二光源430用于向该第二光罩412的开口部提供光。
其中该第一光源420和该第二光源430与现有曝光设备中配置相同，其可选设置于该曝光设备的侧面，并分别通过多个反射镜和偏振器以不同角度照射到该第一光罩411和该第二光罩412上。
在其他实施方式中可选只有一个光源，其通过多个反射镜及分束器使得光线分别以不同角度照射到该第一光罩410和该第二光罩420上。其与现有技术相同，此处不再赘述。
其中该第一光源和该第二光源是紫外光，与现有技术相同，此处不再赘述。
区别于现有技术、上述第一、二实施方式的情况，本实施方式将两个光罩重叠区域中开口部的高度变化分别符合三角函数平方的曲线变化，使得开口部的曝光量更平滑变化，且在重叠区域的相同位置满足Hsin2(πX/2L)+Hcos2(πX/2L)＝H，即该两个光罩重叠后其重叠区开口部的曝光量与非重叠区域开口部的曝光量相同，进而实现该两个光罩衔接的重叠区的曝光量与非重叠区的曝光量相同，使得后续液晶显示器中显示效果均匀，同时曲线变化的开口部能够实现消除后续液晶显示器中带状mura的缺陷，提高产品的显示质量。
以上仅为本发明的实施方式，并非因此限制本发明的专利范围，凡是利用本发明说明书及附图内容所作的等效结构或等效流程变换，或直接或间接运用在其他相关的技术领域，均同理包括在本发明的专利保护范围内。

Claims (17)

  1. 一种用于光配向的光罩装置，其中，包括：
    第一光罩和第二光罩；
    所述第一光罩包括第一重叠区和第一非重叠区；
    所述第二光罩包括第二重叠区和第二非重叠区；
    所述第一重叠区和所述第二重叠区彼此重叠；
    所述第一重叠区包括沿第一方向排列的多个透射的开口部；
    所述第一非重叠区包括沿所述第一方向排列的多个透射的开口部；
    所述第二重叠区包括沿所述第一方向排列的多个透射的开口部；
    所述第二非重叠区包括沿所述第一方向排列的多个透射的开口部；
    所述第一非重叠区的开口部和所述第二非重叠区域的开口部相同；
    所述第一重叠区的开口部的高度Y1满足Y1＝Hsin2(πX/2L)；
    所述第二重叠区的开口部的高度Y2满足Y2＝Hcos2(πX/2L)；
    其中H是所述第一非重叠区域的开口部和所述第二非重叠区域的开口部的高度，X＝L-M，L是所述第一重叠区和所述第二重叠区的长度，M是所述第一重叠区和所述第二重叠区距离所述第一非重叠区或所述第二非重叠区的距离；
    所述第一非重叠区的开口部和所述第二非重叠区的开口部是第一长方形；
    所述第一长方形的宽度方向与所述第一方向相同；
    所述第一重叠区的开口部和所述第二重叠区的开口部是多个第三长方形；且所述第三长方形在所述第一方向上的尺寸与所述第一长方形的宽度相同或不同；
    所述第一重叠区的开口部和所述第二重叠区的开口部的布置形式对称或不对称。
  2. 根据权利要求1所述的装置，其中，
    所述第一重叠区的开口部和所述第二重叠区的开口部是通过马赛克算法得到。
  3. 一种用于光配向的光罩装置，其中，包括：
    第一光罩和第二光罩；
    所述第一光罩包括第一重叠区和第一非重叠区；
    所述第二光罩包括第二重叠区和第二非重叠区；
    所述第一重叠区和所述第二重叠区彼此重叠；
    所述第一重叠区包括沿第一方向排列的多个透射的开口部；
    所述第一非重叠区包括沿所述第一方向排列的多个透射的开口部；
    所述第二重叠区包括沿所述第一方向排列的多个透射的开口部；
    所述第二非重叠区包括沿所述第一方向排列的多个透射的开口部；
    所述第一非重叠区的开口部和所述第二非重叠区域的开口部相同；
    所述第一重叠区的开口部的高度Y1满足Y1＝Hsin2(πX/2L)；
    所述第二重叠区的开口部的高度Y2满足Y2＝Hcos2(πX/2L)；
    其中H是所述第一非重叠区域的开口部和所述第二非重叠区域的开口部的高度，X＝L-M，L是所述第一重叠区和所述第二重叠区的长度，M是所述第一重叠区和所述第二重叠区距离所述第一非重叠区或所述第二非重叠区的距离。
  4. 根据权利要求3所述的装置，其中，
    所述第一非重叠区的开口部和所述第二非重叠区的开口部是第一长方形；
    所述第一长方形的宽度方向与所述第一方向相同；
    所述第一重叠区的开口部和所述第二重叠区的开口部是第二长方形，且所述第二长方形在所述第一方向上的尺寸与所述第一长方形的宽度相同。
  5. 根据权利要求3所述的装置，其中，
    所述第一非重叠区的开口部和所述第二非重叠区的开口部是第一长方形；
    所述第一长方形的宽度方向与所述第一方向相同；
    所述第一重叠区的开口部和所述第二重叠区的开口部是多个第三长方形；且所述第三长方形的在所述第一方向上的尺寸与所述第一长方形的宽度相同或不同。
  6. 根据权利要求5所述的装置，其中，
    所述第一重叠区的开口部和所述第二重叠区的开口部是通过马赛克算法得到。
  7. 根据权利要求3所述的装置，其中，
    所述第一重叠区的开口部和所述第二重叠区的开口部彼此重叠。
  8. 根据权利要求3所述的装置，其中，
    所述第一重叠区的开口部和所述第二重叠区的开口部彼此不重叠。
  9. 根据权利要求3所述的装置，其中，
    所述第一重叠区的开口部和所述第二重叠区的开口部的布置形式对称或不对称。
  10. 一种曝光设备，其中，
    所述曝光设备包括光罩装置以及第一光源和第二光源；
    所述光罩装置包括：
    第一光罩和第二光罩；
    所述第一光罩包括第一重叠区和第一非重叠区；
    所述第二光罩包括第二重叠区和第二非重叠区；
    所述第一重叠区和所述第二重叠区彼此重叠；
    所述第一重叠区包括沿第一方向排列的多个透射的开口部；
    所述第一非重叠区包括沿所述第一方向排列的多个透射的开口部；
    所述第二重叠区包括沿所述第一方向排列的多个透射的开口部；
    所述第二非重叠区包括沿所述第一方向排列的多个透射的开口部；
    所述第一非重叠区的开口部和所述第二非重叠区域的开口部相同；
    所述第一重叠区的开口部的高度Y1满足Y1＝Hsin2(πX/2L)；
    所述第二重叠区的开口部的高度Y2满足Y2＝Hcos2(πX/2L)；
    其中H是所述第一非重叠区域的开口部和所述第二非重叠区域的开口部的高度，X＝L-M，L是所述第一重叠区和所述第二重叠区的长度，M是所述第一重叠区和所述第二重叠区距离所述第一非重叠区或所述第二非重叠区的距离；
    所述第一光源用于向所述第一光罩的开口部提供光；
    所述第二光源用于向所述第二光罩的开口部提供光。
  11. 根据权利要求10所述的曝光设备，其中，
    所述第一非重叠区的开口部和所述第二非重叠区的开口部是第一长方形；
    所述第一长方形的宽度方向与所述第一方向相同；
    所述第一重叠区的开口部和所述第二重叠区的开口部是第二长方形，且所述第二长方形在所述第一方向上的尺寸与所述第一长方形的宽度相同。
  12. 根据权利要求10所述的曝光设备，其中，
    所述第一非重叠区的开口部和所述第二非重叠区的开口部是第一长方形；
    所述第一长方形的宽度方向与所述第一方向相同；
    所述第一重叠区的开口部和所述第二重叠区的开口部是多个第三长方形；且所述第三长方形的在所述第一方向上的尺寸与所述第一长方形的宽度相同或 不同。
  13. 根据权利要求12所述的曝光设备，其中，
    所述第一重叠区的开口部和所述第二重叠区的开口部是通过马赛克算法得到。
  14. 根据权利要求10所述的曝光设备，其中，
    所述第一重叠区的开口部和所述第二重叠区的开口部彼此重叠。
  15. 根据权利要求10所述的曝光设备，其中，
    所述第一重叠区的开口部和所述第二重叠区的开口部彼此不重叠。
  16. 根据权利要求10所述的曝光设备，其中，
    所述第一重叠区的开口部和所述第二重叠区的开口部的布置形式对称或不对称。
  17. 根据权利要求10所述的曝光设备，其中，
    所述第一光源和所述第二光源是紫外光。
PCT/CN2015/079703 2015-04-27 2015-05-25 一种用于光配向的光罩装置及应用设备 Ceased WO2016173029A1 (zh)

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