WO2016160301A1 - Homogénéisation d'une dose d'exposition par l'intermédiaire de conditions de rotation, de translation et de traitement variable - Google Patents

Homogénéisation d'une dose d'exposition par l'intermédiaire de conditions de rotation, de translation et de traitement variable Download PDF

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Publication number
WO2016160301A1
WO2016160301A1 PCT/US2016/021771 US2016021771W WO2016160301A1 WO 2016160301 A1 WO2016160301 A1 WO 2016160301A1 US 2016021771 W US2016021771 W US 2016021771W WO 2016160301 A1 WO2016160301 A1 WO 2016160301A1
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Prior art keywords
source
substrate
flood
irradiation
translation
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PCT/US2016/021771
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English (en)
Inventor
Mark L. Schattenburg
Rudolf H. Hendel
Michael Carcasi
Original Assignee
Tokyo Electron Limited
Tokyo Electron U.S. Holdings, Inc.
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Filing date
Publication date
Priority claimed from US14/801,703 external-priority patent/US9612534B2/en
Application filed by Tokyo Electron Limited, Tokyo Electron U.S. Holdings, Inc. filed Critical Tokyo Electron Limited
Priority to JP2017551291A priority Critical patent/JP6893616B2/ja
Priority to EP16773709.7A priority patent/EP3278353B1/fr
Priority to CN201680024930.8A priority patent/CN107567597B/zh
Priority to KR1020177030664A priority patent/KR102475973B1/ko
Publication of WO2016160301A1 publication Critical patent/WO2016160301A1/fr

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure

Definitions

  • Substrate processing often involves exposing a substrate wafer to radiation.
  • a substrate may be exposed to ultraviolet (UV) light, including high power UV radiation.
  • Substrates may be exposed to high power light (e.g., UV light), for example during a photolithography process and/or other manufacturing processes.
  • Exposing an entire substrate to a substantially uniform intensity light source may ensure that the entire substrate is treated similarly at all locations, for example to ensure consistency in a photolithography operation across the entire substrate.
  • broadband and/or narrower band high power UV flood source options or any exposure source may have significant dose non-uniformity across an exposed area and through time.
  • High power UV flood exposure source or other source design and/or selection may be subject to several considerations in semiconductor processing. For example, considerations may include the following:
  • Throughput a combination of power and exposure method (e.g., whole wafer, rastering spot, etc.)
  • FIG. 2 is a sample UV intensity map 200. As shown in this example map 200, intensity may be greatest near the center of the UV lamp and may fall off towards the lamp edges. This map 200 is one example, but UV sources may have different intensity distributions based on variables such as source type, source age, presence of manufacturing defects, etc.
  • Systems and methods described herein relate to a radiation exposure process to achieve a selected flood exposure dose profile.
  • dosing may be performed with high exposure dose (>lJ/cm 2 ) UV flood exposure processes or other substrate processing exposure types.
  • the systems and methods described herein may use one or more of rotation, translation, and variable processing conditions to increase processing uniformity or achieve a selected dose profile of sources such as non-uniform high power UV flood exposure sources (e.g., yielding final non-uniformity of ⁇ 0.5% or lower) or any other exposure source.
  • the systems and methods described herein may further employ in-situ photo-sensor hardware that may allow real-time mapping of source average power and across-source non-uniformity that may be used in advanced process control schemes. Dose homogenization may be used for many potential radiation sources, such as the examples shown in table 100 of FIG. 1.
  • a substrate may be disposed on a substrate support in a flood exposure treatment system.
  • a flood exposure dose profile may be selected.
  • the substrate may be exposed to flood irradiation from a source, and the flood irradiation may be terminated when the selected flood exposure dose profile is achieved.
  • Exposing the substrate to flood irradiation may comprise controlling at least one of a substrate rotation rate, a source scanning rate, a substrate scanning rate, a source power setting, a distance from the source to the substrate, a source aperture setting, an angle of incidence of flood irradiation on the substrate, and a source focus position to achieve the selected flood exposure dose profile.
  • FIG. 1 is a table of light source options.
  • FIG. 2 is a sample UV intensity map.
  • FIG. 3 is a dose homogenization system according to an embodiment of the invention.
  • FIG. 4 is a substrate treatment method according to an embodiment of the invention.
  • FIG. 5 is a path taken by a point on a wafer according to an embodiment of the invention.
  • FIG. 6 is an uncorrected dose error vs. radius for a wafer according to an embodiment of the invention.
  • FIG. 7 is a corrected dose error vs. radius for a wafer according to an embodiment of the invention.
  • FIG. 8 is a dose homogenization simulation method according to an embodiment of the invention.
  • FIG. 9 is a wafer grid according to an embodiment of the invention.
  • FIG. 10 is an illumination map according to an embodiment of the invention.
  • FIG. 11 is a traversal map according to an embodiment of the invention.
  • FIG. 12 is a dose homogenization simulation method according to an embodiment of the invention.
  • FIG. 13 is a dose homogenization simulation according to an embodiment of the invention.
  • FIGS. 14-16 are sensor arrays according to embodiments of the invention.
  • FIG. 17 is a wafer according to an embodiment of the invention.
  • FIG. 18 is a set of equations for a circular light spot shape according to an embodiment of the invention.
  • FIG. 19 is a processing recipe according to an embodiment of the invention.
  • FIG. 3 is a dose homogenization system 310 for use with a UV source 300 according to an embodiment of the invention.
  • the system 310 may include one or more processing circuits (e.g., homogenization circuit 320 and/or processing control circuit 340), one or more sensors 330, memory 350, and/or other elements.
  • Sensors 330 may measure UV source 300 lamp intensity and fall-off
  • Homogenization circuit 320 may determine UV source 300 system settings to optimize UV light dosing homogeneity.
  • Processing control circuit 340 may control elements of the UV source 300 (e.g., motors, UV light, etc.) to implement the determined UV optimization. Functions and features of these elements 320-350 are described in greater detail below. These elements 320-350 may be interconnected via a bus 360.
  • elements may be combined (e.g., a single processing circuit may perform homogenization circuit 320 and processing control circuit 340 functions in some embodiments).
  • elements such as the homogenization circuit 320 and/or processing control circuit 340 may be special purpose circuits constructed and arranged to perform the functions described below.
  • FIG. 4 is a substrate treatment method 400 according to an embodiment of the invention.
  • a substrate may be disposed on a substrate support 410 in a UV flood exposure treatment system.
  • a UV flood exposure dose profile 420 may be selected.
  • the substrate may be exposed to UV flood irradiation 430 from a UV source 300.
  • exposing the substrate to UV flood irradiation may comprise dose homogenization.
  • UV source 300 radiation may be measured 440, and the system 310 may determine if changes to the control settings are required to meet the profile (e.g., if UV source 300 performance has degraded) 450. If changes are needed, the control parameters may be modified 460. When the selected UV flood exposure dose profile is achieved, the UV flood irradiation may be terminated 470.
  • Achieving a selected dose profile, such as a homogenous profile, during UV flood irradiation exposure may be performed to improve a desired exposure for a substrate.
  • a selected dose profile may be acheived by controlling at least one of a substrate rotation rate, a UV source scanning rate, a substrate scanning rate, a UV source power setting, a distance from the UV source to the substrate, a UV source aperture setting, an angle of incidence of UV flood irradiation on the substrate, and/or a UV source focus position to achieve the selected UV flood exposure dose profile.
  • Homogenization circuit 320 or a dose profile selection circuit may determine settings, and processing control circuit 340 may use the settings to control substrate processing.
  • a fixed rotation speed and fixed translation speed may be combined to homogenize a non-uniform slit constant dose exposure (e.g., created by a light bar without an aperture or a source that has a slit aperture between itself and the substrate) or otherwise achieve a selected profile.
  • FIG. 5 is a path 500 taken by a point on a wafer according to an embodiment of the invention. As the wafer is rotated and translated under the
  • any given point on the wafer may be exposed to varying light intensity due to the inconsistent light intensity of the source.
  • the point when the point is rotated and translated to be directly under the center of the UV source, it may receive more intense light than when it is rotated and translated to be directly under an outer corner of the source.
  • rotation speed and translation speed are optimized, fixed speed rotation alone may partially normalize/average a non-uniform intensity slit to produce a radially dependent intensity signature that may be significantly uniform through rotation angle theta for any given radius.
  • the lamp source may need to be a minimum length of the radius of the wafer and positioned such that one short axis of the light bar is at/near the origin of the rotating wafer to ensure complete exposure of the wafer.
  • Adding fixed scan rate translation of a constant speed with a rotating wafer under a light slit may allow for some alteration of the radially dependent signature due to integrated time differences experienced by different parts of the rotating wafer under the source (e.g. center to edge).
  • FIG. 6 is a dose error vs. radius graph 600 for a wafer.
  • a variable dose error percentage (approximately 9% variation in this example) may be exhibited based on radial location on the wafer, with 0 representing the center, and +/-150 representing the outer edges.
  • a centered light bar e.g., center of light bar is over center origin of rotating wafer
  • the center of the wafer may experience exposure for only a short time under the lamp (as defined by slit width/scan rate).
  • alteration of the radially dependent signature may be dependent on some or all of the following criteria:
  • source slit non-uniformity signature (e.g., as shown in FIG.2)
  • FIG. 7 is a dose error vs. radius graph 700 for a wafer according to an embodiment of the invention.
  • dose error variation may be reduced significantly (e.g., to approximately 0.9% variation in this example).
  • a variable exposure dose may be provided through translation at constant scan rate and constant rotation speed to homogenize for intensity differences across the slit and integrated exposure time differences from rotation and translation.
  • the default radial signature e.g., with constant exposure dose, constant scan rate translation, and constant rotation rate as shown in FIG. 6 may be obtained.
  • the inverse functional form may be approximately applied to source power through the translation (time) to further homogenize the signature (e.g., to improve the signature from that shown in FIG. 6 to the signature of FIG. 7 or better).
  • the inverse functional form for this embodiment as well as subsequent embodiments may be obtained by normalizing the function of FIG. 6 and subtracting the normalized function from 1.
  • alteration of the radially dependent signature may be dependent on some or all of the following criteria:
  • source slit non-uniformity signature (e.g., as shown in FIG.2)
  • a variable scan rate may be provided through translation at constant power and constant rotation speed to homogenize for intensity differences across the slit as well as integrated exposure time differences from rotation and translation.
  • the default radial signature e.g., with constant exposure dose, constant scan rate translation, and constant rotation rate as shown in FIG. 6
  • the inverse functional form may be approximately applied to the scan rate (e.g., scan velocity) through translation (time) to further homogenize the signature (e.g., to improve the signature from that shown in FIG. 6 to the signature of FIG. 7 or better).
  • alteration of the radially dependent signature may be dependent on some or all of the following criteria:
  • source slit non-uniformity signature (e.g., as shown in FIG. 2)
  • a variable scan rate and variable power may be provided through translation with a constant rotation speed to homogenize for intensity differences across the slit and integrated exposure time differences from rotation and translation.
  • the default radial signature (e.g., with constant exposure dose, constant scan rate translation, and constant rotation rate as shown in FIG. 6) may be obtained.
  • An optimized co-dependent functional form may be applied to scan rate/power through translation (time) to further homogenize the signature (e.g., to improve the signature from that shown in FIG. 6 to the signature of FIG. 7 or better).
  • alteration of the radially dependent signature may be dependent on some or all of the following criteria:
  • source slit non-uniformity signature (e.g., as shown in FIG. 2)
  • a variable exposure dose may be provided through translation at constant power and constant rotation speed to homogenize for intensity differences across the slit and integrated exposure time differences from rotation and translation.
  • the default radial signature (e.g., with constant exposure dose, constant scan rate translation, and constant rotation rate as shown in FIG. 6) may be obtained.
  • the inverse functional form may be approximately applied to the width of the slit-shaped source aperture through translation (time) to further homogenize the signature (e.g., to improve the signature from that shown in FIG. 6 to the signature of FIG. 7 or better).
  • the width of the slit-shaped source aperture may be controlled by a stepper motor, for example.
  • Varying the width may control the amount of light transmitting the aperture and thereby control the time dependent exposure dose of the substrate.
  • alteration of the radially dependent signature may be dependent on some or all of the following criteria:
  • source slit non-uniformity signature (e.g., as shown in FIG. 2)
  • variable aperture width applied during translation.
  • a variable exposure dose may be provided through translation at constant power and constant rotation speed to homogenize for intensity differences across the slit, formed by a slit-shaped source aperture, as well as integrated exposure time differences from rotation and translation.
  • the default radial signature e.g., with constant exposure dose, constant scan rate translation, and constant rotation rate as shown in FIG. 6
  • the inverse functional form may be approximately applied to the relative height between the source and rotating/translating substrate through translation (time) to further homogenize the signature (e.g., to improve the signature from that shown in FIG. 6 to the signature of FIG. 7 or better).
  • the relative height between the source and rotating/translating substrate may be controlled by a stepper motor, for example.
  • Varying the height may control the amount of light transmitting through the aperture for light sources that diverge significantly with distance and thereby control the time dependent exposure dose of the substrate.
  • the stepper motor may move the light source or the rotating/translating substrate. Under fixed (constant) rotation, fixed (constant) power, variable scan rate conditions, alteration of the radially dependent signature may be dependent on some or all of the following criteria:
  • source slit non-uniformity signature (e.g., as shown in FIG. 2)
  • a variable exposure condition may be provided through translation at constant power and constant rotation speed to homogenize for intensity differences across the slit as well as integrated exposure time differences from rotation and translation.
  • optical elements e.g., mirror or lens
  • An oscillating mirror may be used to vary the light signature relative position along the central scanning axis.
  • Other optical elements e.g., lenses
  • the oscillating mirror variant for changing the light signature relative position along the central scanning axis intentional high frequency jitter may be introduced into the light placement relative to the central axis of translation during rotation and translation to introduce some averaging of local non-uniformities with the light source.
  • the default radial signature e.g., with constant exposure dose, constant scan rate translation, and constant rotation rate as shown in FIG. 6
  • the inverse functional form may be approximately applied to the relative height or angle of optical element to that of the source through translation (time) to further homogenize the signature (e.g., to improve the signature from that shown in FIG. 6 to the signature of FIG. 7 or better).
  • the relative height or angle of the optical element to the source may be controlled by a stepper motor, for example. Varying the height or angle of optical element may control the amount of light transmitting through the aperture (e.g., by changing focal point) and thereby control the time dependent exposure dose of the substrate. Under fixed (constant) rotation, fixed (constant) power, variable scan rate conditions, alteration of the radially dependent signature may be dependent on some or all of the following criteria:
  • source slit non-uniformity signature (e.g., as shown in FIG. 2)
  • non-uniform slit e.g., created by a light bar without an aperture or a source that has a slit aperture between itself and substrate
  • the embodiments may be applied to systems having any shape of illumination for improved cross-substrate integrated dose uniformity.
  • FIG. 8 is a dose homogenization simulation method 800 according to an embodiment of the invention.
  • Homogenization circuit 320 may be configured to perform homogenization simulation in some embodiments.
  • This method 800 may be used to determine settings for dose homogenization during UV exposure, for example based on controlling at least one of a substrate rotation rate, a UV source scanning rate, a substrate scanning rate, a UV source power setting, a distance from the UV source to the substrate, a UV source aperture setting, an angle of incidence of UV flood irradiation on the substrate, and/or a UV source focus position to achieve the selected UV flood exposure dose profile as described above.
  • a wafer grid may be defined 810 for a substrate to be processed. As shown in FIG. 9, the wafer grid may be based on Cartesian spacing 900 or polar spacing 910. Grid points may be indexed, and an (r, ⁇ ) location of each indexed point may be determined.
  • An illumination grid and map may be defined 820.
  • FIG. 10 shows an example illumination map 1000.
  • An illumination shape may be defined either by defining options (e.g., specifying known characteristics of a UV source) or by inputting a custom map (e.g., via a text file).
  • a uniform rectangular grid matrix may be assigned to the illumination map, and the power for each grid point may be interpolated. This grid may be at a higher spatial resolution than the wafer grid.
  • the center of the illumination map may be defined as the illumination origin.
  • the illumination origin may be assumed to be traversing along the central axis of the wafer plane and may be assumed to pass through the wafer plane origin. Under this assumption, there may be no mathematical difference whether the wafer or the illumination source is moving with respect to the other.
  • a simulation using the defined wafer grid, illumination grid and map, and traversal may be performed 840, in which the wafer is traversed along the source.
  • An example simulation process is described in greater detail with respect to FIG. 12 below.
  • R n ,6 n may represent the wafer location that is directly under the illumination origin at the time step.
  • the illumination map is over a wafer indexed location 860. First, if a pacman aperture is defined, then all wafer indexed grid ⁇ points outside of ⁇ ⁇ - pacman ang i e /2 ⁇ ⁇ ⁇ + pacman ang i e /2 may be excluded. Next, based on R n ,6 n , the relative distance of all remaining wafer indexed grid points may be determined. If a wafer indexed grid point is found to be under the illumination (for the current simulation step), then the power at that point may be determined.
  • Wafer Pos(x,y)p OW er (n) Wafer Pos(x,y)p OW er(n-i) + illumination time
  • step*Illumination Power Map(relX, relY). If a wafer indexed grid point is not under the illumination, Wafer Pos(x,y) Power (n) Wafer Pos(x,y) Power(n -i).
  • the simulation may end 870 after all iterations are complete.
  • Pos(x,y)power (n) may be plotted, and statistics may be determined. Based on this,
  • homogenization settings may be determined 880.
  • at least one of a substrate rotation rate, a UV source scanning rate, a substrate scanning rate, a UV source power setting, a distance from the UV source to the substrate, a UV source aperture setting, an angle of incidence of UV flood irradiation on the substrate, and a UV source focus position may be selected to homogenize dosing for the simulated system.
  • FIG. 12 is a dose homogenization simulation method 1200 according to an embodiment of the invention.
  • FIG. 13 is an example dose homogenization simulation 1300 according to an embodiment of the invention.
  • the illumination shape may be defined 1210 (e.g., from the illumination grid and map generated above).
  • a current version of a processing recipe (scan rate vs. radial position) may be loaded 1220.
  • Integrated power for the recipe may be calculated 1230 and converted to normalized average radial power 1240 (e.g., normalized to the mean).
  • Recipe conditions e.g., scan rate and/or radial position
  • Steps 1220-1250 may be repeated multiple times (e.g., 3-8 iterations) until error is reduced to a satisfactory level.
  • Sensor Feedback e.g., Sensor Feedback
  • wafer edge mounted photo-sensors 330 may be used to obtain real time slit non-uniformity information.
  • 3 or more UV photo-sensors 330 e.g., 3 or more for redundancy to sensor failure and/or sensor mis-calibration
  • the UV photo-sensors 330 may be equally spaced along the arc of the mounting annulus (e.g., 3 sensors mounted at 120 degree intervals).
  • each sensor 330 may sample a large portion of the light bar area, because each sensor 330 may see multiple areas of the light bar through time (see FIG. 5, for example).
  • Sensed information may be used to understand the current average power of the lamp as well as the current light bar non-uniformity signature.
  • Homogenization circuit 320 may receive sensed information and use it to determine settings, and processing control circuit 340 may use the settings to control substrate processing. Both current average power and current non-uniformity signature may be used in a process control scheme to feedback settings to a next wafer or lot, for example to modify one or more of the following:
  • variable source aperture width applied during translation.
  • a bar/slit CCD array 330 of length equal to or greater than the rotating wafer diameter may be mounted on the translation stage either in front of or behind the rotating stage (e.g., so as not to be under the rotating stage/wafer, but still obtain scanned data under the light bar with each translation), as shown in sensor array 1500 of FIG. 15.
  • the scanned data may be used to understand the current average power of the lamp as well as the current light bar non-uniformity signature.
  • Homogenization circuit 320 may receive sensed information and use it to determine settings, and processing control circuit 340 may use the settings to control substrate processing. Both current average power and current non-uniformity signature may be used in a process control scheme to feedback settings to a next wafer or lot, for example to modify one or more of the following:
  • a motorized scanning bar/slit CCD array 330 of length equal to or greater than the illumination spread along the scanning/stage translating axis may be mounted perpendicular to the translation stage (e.g., so as not to strike the rotating/translating stage during non-use), as shown in sensor array 1600 of FIG. 16.
  • the motorized scanning bar/slit CCD array 330 may scan under the light source and collect data. The collected data may be used to understand the current average power of the lamp as well as the current light bar non-uniformity signature.
  • Homogenization circuit 320 may receive sensed information and use it to determine settings, and processing control circuit 340 may use the settings to control substrate processing. Both current average power and current non-uniformity signature may be used in a process control scheme to feedback settings to a next wafer or lot, for example to modify one or more of the following:
  • the dose homogenization above may be applied to the example wafer 1700 of FIG. 17.
  • the wafer 1700 may spin counterclockwise, and a wafer annulus of interest may be located at a specific radius away from the center of the wafer 1700. If wafer 1700 is spinning much faster than the light spot scan velocity (or wafer scan velocity if light spot is at fixed position along central axis of scanning wafer), then we may assume the wafer annulus will pass under all areas of the light spot.
  • the dwell time for any single rotation of the wafer 1700 may be the distance across the light spot divided by the angular velocity.
  • the dwell time for all the rotations of the annulus under the light spot, after integrating may be the area of the light spot divided by the product of circumference and light spot velocity (or wafer scan velocity if light spot is at fixed position along central axis of scanning wafer), as follows (where r is light spot radius and R is wafer radius):
  • the dwell time for any radius may be a function of the light spot velocity (or wafer scan velocity if light spot is at fixed position along central axis of scanning wafer), which may be rearranged to give the light spot velocity as a function of dwell time, as follows: wafer L dwell
  • the inverse light spot velocity formula may be integrated as follows:
  • the light spot velocity may go to infinity at the center, so calculation may begin at some fixed distance from the center. Accordingly, a definite integral may be obtained from the start radius to the end radius as follows: ⁇ T ⁇ O ⁇ TA ⁇ L ⁇
  • v r center Equations 1800 for the calculations for a circular light spot shape may thus be as shown in FIG. 18.
  • the equations 1800 may be used to achieve a goal, for example to find a scan recipe to fit within 60 seconds, given a light spot radius of 8mm. This may proceed as follows:
  • Tdwdi (60 - 20/10) * 82 / (1472 - 202)
  • systems and methods relating to dose homogenization of a flood exposure process may combine rotation and translation to homogenize a non-uniform slit (or spot) exposure.
  • Variable power at constant scan rate thru translation may be used to homogenize for intensity differences across slit (or spot) as well as exposure time differences from rotation and translation method— leading to a homogenized integrated power across wafer.
  • Variable scan rate at constant power thru translation may be used to homogenize for intensity differences across slit (or spot) as well as exposure time differences from rotation and translation method— leading to a homogenized integrated power across wafer.
  • Variable scan rate and variable power thru translation may be used to homogenize for intensity differences across slit (or spot) as well as exposure time differences from rotation and translation method— leading to a homogenized integrated power across wafer.
  • Variable source aperture at constant scan rate thru translation may be used to homogenize for intensity differences across slit (or spot) as well as exposure time differences from rotation and translation method— leading to a homogenized integrated power across wafer.
  • Variable relative height between source and substrate at constant scan rate thru translation may be used to homogenize for intensity differences across slit (or spot) as well as exposure time differences from rotation and translation method— leading to a homogenized integrated power across wafer.
  • Variable relative height or angle between source and lens at constant scan rate thru translation may be used to homogenize for intensity differences across slit (or spot) as well as exposure time differences from rotation and translation method— leading to a homogenized integrated power across wafer.
  • Oscillation of light signature relative position along central scanning axis during rotation and translation may be used to help average intensity differences across slit (or spot)— leading to a homogenized integrated power across wafer.
  • wafer edge mounted rotating photo-sensors or translating CCD arrays may be used to get real time slit (or spot) non-uniformity information as well as average power information for use in APC control loops.
  • a DC shift in power target may be applied for a next wafer (or next lot) due to observed average drift.
  • a variable scan rate or variable dose thru translation change may be applied for a next wafer (or next lot) due to observed slit non-uniformity changes.

Abstract

Selon l'invention, un substrat peut être disposé sur un support de substrat dans un système de traitement par exposition à une lumière divergente. Un profil de dose d'exposition à une lumière divergente peut être sélectionné. Le substrat peut être exposé à un rayonnement divergent émis par une source, et le rayonnement divergent peut être stoppé lorsque le profil de dose d'exposition à une lumière divergente sélectionné est obtenu. L'exposition du substrat à un rayonnement divergent peut consister à commander une vitesse de rotation du substrat et/ou une vitesse de balayage de la source et/ou une vitesse de balayage du substrat et/ou un réglage de puissance de la source et/ou une distance de la source au substrat et/ou un réglage d'ouverture de la source et/ou un angle d'incidence du rayonnement divergent sur le substrat et/ou une position de mise au point de la source pour obtenir le profil de dose d'exposition à une lumière divergente sélectionné.
PCT/US2016/021771 2015-03-31 2016-03-11 Homogénéisation d'une dose d'exposition par l'intermédiaire de conditions de rotation, de translation et de traitement variable WO2016160301A1 (fr)

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JP2017551291A JP6893616B2 (ja) 2015-03-31 2016-03-11 回転、並進、および可変の加工条件による露光線量の均一化
EP16773709.7A EP3278353B1 (fr) 2015-03-31 2016-03-11 Homogénéisation d'une dose d'exposition par l'intermédiaire de conditions de rotation, de translation et de traitement variable
CN201680024930.8A CN107567597B (zh) 2015-03-31 2016-03-11 通过旋转、平移及可变处理条件的曝光剂量均匀化
KR1020177030664A KR102475973B1 (ko) 2015-03-31 2016-03-11 회전, 병진이동, 및 가변 처리 조건을 통한 노광 선량 균질화

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US201562141033P 2015-03-31 2015-03-31
US62/141,033 2015-03-31
US14/801,703 US9612534B2 (en) 2015-03-31 2015-07-16 Exposure dose homogenization through rotation, translation, and variable processing conditions
US14/801,703 2015-07-16

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US10180248B2 (en) 2015-09-02 2019-01-15 ProPhotonix Limited LED lamp with sensing capabilities
WO2021013627A1 (fr) 2019-07-19 2021-01-28 Xeikon Prepress N.V. Appareil et procédé de d'exposition de précurseurs de relief

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