WO2016155445A1 - 彩膜基板、彩膜基板的制造方法、触摸屏及显示装置 - Google Patents

彩膜基板、彩膜基板的制造方法、触摸屏及显示装置 Download PDF

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Publication number
WO2016155445A1
WO2016155445A1 PCT/CN2016/074826 CN2016074826W WO2016155445A1 WO 2016155445 A1 WO2016155445 A1 WO 2016155445A1 CN 2016074826 W CN2016074826 W CN 2016074826W WO 2016155445 A1 WO2016155445 A1 WO 2016155445A1
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Prior art keywords
concave curved
color filter
touch screen
filter substrate
tsp
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PCT/CN2016/074826
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English (en)
French (fr)
Inventor
王茜
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京东方科技集团股份有限公司
成都京东方光电科技有限公司
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Priority to US15/326,066 priority Critical patent/US10114490B2/en
Publication of WO2016155445A1 publication Critical patent/WO2016155445A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/13338—Input devices, e.g. touch panels
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133504—Diffusing, scattering, diffracting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/13356—Structural association of cells with optical devices, e.g. polarisers or reflectors characterised by the placement of the optical elements
    • G02F1/133562—Structural association of cells with optical devices, e.g. polarisers or reflectors characterised by the placement of the optical elements on the viewer side
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04107—Shielding in digitiser, i.e. guard or shielding arrangements, mostly for capacitive touchscreens, e.g. driven shields, driven grounds
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display

Definitions

  • the present invention relates to the field of touch screen technologies, and in particular, to a color film substrate, a method for manufacturing a color film substrate, a touch screen, and a display device.
  • touch screen As an intelligent human-computer interaction interface product, touch screen has been widely used in production and life. Users can control the touch screen to display corresponding images by touching the touch screen.
  • the touch screen is disposed in the display device, and the touch screen includes an array substrate and a color filter substrate, and a liquid crystal filled between the array substrate and the color filter substrate, wherein the backlight side of the array substrate is provided with a lower polarizer, the color film An upper polarizer is disposed on the display side of the substrate.
  • the display device is further provided with a backlight, and the light emitted by the backlight can sequentially pass through the lower polarizer, the array substrate, the liquid crystal, the color filter substrate and the upper polarizer on the touch screen, so that the touch screen emits light, and the image is displayed,
  • the color filter substrate includes a transparent substrate, a TSP (English: Touch Screen Panel) pattern formed on one side of the transparent substrate, and a color resist layer formed on the other side of the transparent substrate, the TSP pattern including a TSP wire,
  • the upper surface and the side surface of the TSP wire are both planar, and the upper surface of the TSP wire is not in the same plane as the side surface.
  • the portion of the color filter substrate having the TSP wire and the portion of the color filter substrate having no TSP wire are different from the light emitted by the backlight;
  • the upper surface and the side surface of the TSP wire reflect light, and the direction of reflection of the light is different. Therefore, the color is displayed during the process of displaying the image. Stripes appear on the surface of the film substrate, which affects the display effect.
  • the present invention provides a color film substrate, a method for manufacturing the color film substrate, a touch screen and a display device.
  • the technical solution is as follows:
  • a color film substrate comprising:
  • the plurality of concave curved surfaces include a first concave curved surface and a second concave curved surface.
  • the TSP pattern includes a plurality of TSP wires, and an upper surface of each of the TSP wires is formed with a plurality of first concave arcuate faces arranged in an array, and a side of each of the TSP wires is formed with the second concave shape Curved surface.
  • the opening of the first concave curved surface is circular.
  • the color filter substrate further includes: a color resist layer on the other side of the transparent substrate.
  • the color resist layer includes color pixels and a black matrix between each two adjacent color pixels.
  • a method for fabricating a color filter substrate comprises:
  • a TSP pattern having a plurality of concave curved faces on the surface is formed on one side of the transparent substrate.
  • the plurality of concave curved surfaces include: a first concave curved surface and a second concave curved surface.
  • the step of forming a TSP pattern having a plurality of concave curved surfaces on one side of the transparent substrate comprises:
  • ITO indium tin oxide
  • the TSP pattern Forming the TSP pattern by a second patterning process, the TSP pattern comprising a plurality of TSP wires, and an upper surface of each of the TSP wires is formed with a plurality of first concave arcuate faces arranged in an array, each of the The second concave curved surface is formed on a side of the TSP wire.
  • the photoresist used in the first patterning process and the second patterning process are both negative photoresists.
  • the opening of the first concave curved surface is circular, when the thickness of the ITO film is When the diameter of the circle is The maximum depth of the first concave curved surface is
  • the method for manufacturing the color film substrate further includes:
  • a color resist layer is formed on the other side of the transparent substrate, the color resist layer including color pixels, and a black matrix between each two adjacent color pixels.
  • a touch screen comprising the color film substrate of the first aspect.
  • a display device comprising the touch screen of the third aspect.
  • the invention provides a color film substrate, a method for manufacturing a color film substrate, a touch screen and a display device, wherein a plurality of concave curved surfaces are formed on a surface of a TSP pattern on a transparent substrate side of the color film substrate, when the backlight emits When the light passes through the TSP pattern on the color filter substrate, the plurality of concave curved surfaces can refract light in a plurality of different directions, which reduces the intensity of the light after passing through the TSP pattern, and reduces the color filter substrate.
  • the plurality of concave curved surfaces can Scattering the light in multiple directions reduces the intensity of the light reflected by the color filter substrate after the light is reflected. Therefore, the streaks on the surface of the color filter substrate during the display of the image are reduced, and the display effect is enhanced.
  • 1 is a schematic structural view of a color filter substrate
  • FIG. 2 is a schematic structural view of a color filter substrate according to an embodiment of the present invention.
  • FIG. 3 is a schematic structural view of still another color film substrate according to an embodiment of the present invention.
  • FIG. 4 is a flow chart of a method for fabricating a color filter substrate according to an embodiment of the present invention.
  • FIG. 5 is a flowchart of a method for forming a TSP graphics method according to an embodiment of the present invention
  • FIG. 6 is a schematic structural diagram of a transparent substrate according to an embodiment of the present invention.
  • FIG. 7 is a schematic structural diagram of another transparent substrate according to an embodiment of the present invention.
  • FIG. 8 is a schematic structural diagram of still another transparent substrate according to an embodiment of the present invention.
  • FIG. 9 is a schematic structural diagram of a color resist layer provided by an embodiment of the present invention.
  • FIG. 1 is a schematic structural view of a color filter substrate 10.
  • the color filter substrate 10 can be packaged.
  • a transparent substrate 101 and a touch screen panel (TSP) pattern 102 on the side of the transparent substrate 101 are included.
  • the TSP pattern 102 can include a TSP wire 1021.
  • the upper surface P of the TSP wire 1021 and the side surface Q of the TSP wire 1021 are both planar, and the upper surface P and the side surface Q are not in the same plane.
  • the difference from the thickness of the portion of the transparent substrate 101 where the TSP wire 1021 is absent is different, and the refraction of the light is different, so that streaks appear on the surface of the color filter substrate 10.
  • the TSP wire 1021 can reflect light. Since the upper surface P and the side surface Q of the TSP wire 1021 are not in the same plane, the TSP wire 1021 is After the upper surface P and the side surface Q reflect the light, the light is reflected in different directions. Therefore, the difference between the upper surface P and the side surface Q of the TSP wire is large, so that the surface of the color filter substrate 10 has streaks.
  • an embodiment of the present invention provides another color filter substrate 00, which may include a transparent substrate 001 and a TSP pattern 002 on a side of the transparent substrate 001, and a surface of the TSP pattern is formed. There are a plurality of concave curved faces A.
  • a plurality of concave curved surfaces are formed on the surface of the TSP pattern on the transparent substrate side of the color filter substrate, and the light emitted by the backlight passes through the color film.
  • the plurality of concave curved surfaces can refract light in a plurality of different directions, weakening the intensity of the light after passing through the TSP pattern, and reducing the portion of the color film substrate having the TSP pattern a difference in refraction of light emitted from the backlight with a portion of the color filter substrate that does not have a TSP pattern, and the plurality of concave curved surfaces can direct light in multiple directions when the light is struck on the display side of the color filter substrate
  • the scattering reduces the intensity of the light reflected by the color filter substrate after the light is reflected. Therefore, the stripe on the surface of the color filter substrate during the display of the image is reduced, and the display effect is enhanced.
  • the color filter substrate 00 may include a transparent substrate 001 and a TSP pattern 002 on a side of the transparent substrate 001, and a surface of the TSP pattern is formed with a plurality of concave curved surfaces A.
  • the TSP pattern 002 may include a plurality of TSP wires 0021, and the plurality of concave cam faces A may include: a first concave curved surface A1 and a second concave curved surface A2.
  • each of the plurality of TSP wires 0021 is formed with a plurality of first concave arc faces A1 arranged in an array, and the side b of each TSP wire is formed with a second concave arc Face A2.
  • the material of the TSP wire is ITO (Indium Tin Oxide; Chinese: Indium Tin Oxide).
  • the color filter substrate 00 in the embodiment of the present invention is made by using a single layer of ITO (Single ITO) technology.
  • the ITO layer in which the wire is located can be considered as a single layer of ITO in a single layer of ITO technology.
  • the plurality of first concave curved faces A1 on the upper surface a of the TSP wire 0021 are arranged in an array, that is, the plurality of first concave curved faces A1 are evenly arranged on the upper surface a of the TSP wire 0021, Therefore, the difference between the first concave curved surface A1 formed on the upper surface a of the TSP wire 0021 and the first concave curved surface A1 formed on the upper surface a of the prior art TSP wire 0021 is reduced; and the TSP The side surface b of the wire 0021 is formed with a second concave curved surface A2.
  • the light emitted by the backlight passes through the color filter substrate 00, a plurality of concave curved surfaces A on the upper surface a and the side surface b of the TSP wire 0021
  • the light can be refracted in a plurality of different directions, which reduces the intensity of the prior art light passing through the upper surface a and the side surface b of the TSP wire 0021, and reduces the portion of the color filter substrate 00 having the TSP pattern and the portion
  • the difference in the refraction of the light emitted from the backlight on the portion of the color filter substrate 00 without the TSP pattern is reduced, and the portion having the TSP pattern on the color filter substrate 00 and the portion having no TSP pattern on the color filter substrate 00 are reduced.
  • the opening of the first concave curved surface A1 may be circular, and the circular opening may make the distribution of the first concave curved surface A1 of the plurality of arrays more uniform on the upper surface a of the TSP wire 0021. Further, the difference between the first concave curved surface A1 formed on the upper surface a of the TSP wire 0021 and the first concave curved surface A1 formed on the upper surface a of the TSP wire 0021 in the prior art is further reduced. It should be noted that the opening of the first concave curved surface A1 may also be an ellipse, which is not limited in the embodiment of the present invention.
  • the color filter substrate 00 may further include: a color resist layer 003 on the other side of the transparent substrate 001, the color resist layer 003 may include a color pixel 0031, and is located in every two adjacent colors. Black matrix 0032 between pixels 0031.
  • the specific structure of the color resist layer 003 can be referred to the description of the specific structure of the color resist layer 003 in the prior art, and the embodiments of the present invention are not described herein.
  • the color filter substrate 00 provided by the embodiment of the present invention can be applied to a touch screen manufactured by directly forming an ITO conductive film and a sensor on a protective glass, and a method of forming an ITO conductive film and a sensor on the liquid crystal panel.
  • a touch sensor is provided on the liquid crystal panel with a touch sensor touch screen on the liquid crystal panel.
  • a plurality of concave curved surfaces are formed on the surface of the TSP pattern on the transparent substrate side of the color filter substrate, and the light emitted by the backlight passes through the color film.
  • the plurality of concave curved surfaces can refract light in a plurality of different directions, weakening the intensity of the light after passing through the TSP pattern, and reducing the portion of the color film substrate having the TSP pattern a difference in refraction of light emitted from the backlight with a portion of the color filter substrate that does not have a TSP pattern, and the plurality of concave curved surfaces can direct light in multiple directions when the light is struck on the display side of the color filter substrate Scattering, reducing the light reflected from the color filter substrate The intensity of the line, therefore, reduces the streaks on the surface of the color filter substrate during the display of the image, enhancing the display effect.
  • the embodiment of the invention provides a method for manufacturing a color filter substrate, and the method for manufacturing the color filter substrate may include:
  • a touch screen panel (TSP) pattern having a plurality of concave curved surfaces on the surface is formed on one side of the transparent substrate.
  • a plurality of concave arc surfaces are formed on the surface of the TSP pattern on the transparent substrate side of the color filter substrate, and the light emitted by the backlight is transmitted through
  • the plurality of concave curved surfaces can refract light in a plurality of different directions, which reduces the intensity of the light after passing through the TSP pattern, and reduces the TSP on the color filter substrate.
  • the plurality of concave curved surfaces can direct the light toward The scattering in a plurality of directions reduces the intensity of the light reflected by the color filter substrate after the light is reflected. Therefore, the stripe on the surface of the color filter substrate during the process of displaying the image is reduced, and the display effect is enhanced.
  • the step of forming a TSP pattern having a plurality of concave curved surfaces on one side of the transparent substrate may include: forming an ITO film on one side of the transparent substrate; forming a plurality of arrays by a first patterning process a first concave curved ITO pattern; a TSP pattern formed by a second patterning process, the TSP pattern comprising a plurality of TSP wires, the upper surface of each TSP wire being formed with a plurality of first concave arcuate surfaces arranged in an array, A side of each TSP wire is formed with a second concave curved surface.
  • the photoresist used in the first patterning process and the second patterning process is a negative photoresist.
  • the opening of the first concave curved surface is circular, when the thickness of the ITO film is (Angstrom), the diameter of the circle is The maximum depth of the first concave curved surface is
  • the method for manufacturing the color filter substrate may further include: forming a color resist layer on the other side of the transparent substrate, the color resist layer comprising a color pixel and a black matrix between each two adjacent color pixels.
  • a plurality of concave arc surfaces are formed on the surface of the TSP pattern on the transparent substrate side of the color filter substrate, and the light emitted by the backlight is transmitted through
  • the plurality of concave curved surfaces can refract light in a plurality of different directions, which reduces the intensity of the light after passing through the TSP pattern, and reduces the TSP on the color filter substrate.
  • the plurality of concave curved surfaces can direct the light toward Scattering in multiple directions reduces the intensity of the light reflected by the color filter substrate after the light is reflected, thereby reducing the streaks on the surface of the color filter substrate during display of the image. Strong display effect.
  • the embodiment of the present invention provides another method for manufacturing a color filter substrate.
  • the method for manufacturing the color filter substrate may include:
  • Step 401 Form a TSP pattern having a plurality of concave curved surfaces on one side of the transparent substrate.
  • the plurality of concave curved surfaces may include: a first concave curved surface and a second concave curved surface.
  • step 401 can include:
  • Step 4011 forming an ITO film on one side of the transparent substrate.
  • an ITO film can be formed on the transparent substrate by sputtering.
  • the ITO film is formed on the transparent substrate by deposition or coating, which is not limited in the embodiment of the present invention.
  • FIG. 6 is a front view and a plan view of a transparent substrate 601 according to step 4011.
  • An ITO film 602 is formed on one side of the transparent substrate 601.
  • the surface of the transparent substrate 601 is flat, so that the surface is formed.
  • the surface of the ITO film 602 on the side of the transparent substrate 601 is also flat.
  • the thickness x of the ITO film 602 can be
  • Step 4012 Form an ITO pattern including a plurality of first concave curved surfaces arranged in an array by a first patterning process.
  • the ITO film formed in step 4011 may be sequentially coated with a photoresist, exposed using a mask, developed with a developing solution, etched with an etching solution, and stripped with a photoresist for the first patterning process.
  • an ITO pattern comprising a plurality of first concave arcuate faces arranged in a plurality of arrays, the openings of the first concave curved faces being circular.
  • FIG. 7 is a front view and a top view of a transparent substrate 601 formed after a first patterning process.
  • One side of the transparent substrate 601 is formed with an ITO pattern 701, and the ITO pattern 701 may include a plurality of array rows.
  • the diameter B of the opening of the first concave curved surface A1 and the maximum depth C of the first concave curved surface A1 are all related to the thickness of the ITO film formed in step 4011.
  • the ITO formed in step 4011 The thickness of the film is
  • the diameter B of the opening of the first concave curved surface A1 may be
  • the maximum depth C of the first concave curved surface A1 may be The plurality of first concave curved surfaces A1 are uniformly arranged in an array on the ITO film.
  • the photoresist used in the first patterning process is a negative photoresist
  • the mask used in the first patterning process may be provided with a plurality of arrays arranged in an array.
  • a mask for a circular hole and when etching using an etching solution, a plurality of array-arranged openings formed on the surface of the ITO film are circular by controlling parameters such as time and temperature used for etching
  • the first concave curved surface is circular, so that the first concave curved surface of the plurality of arrays is uniformly distributed on the surface of the ITO film, and is reduced.
  • the surface of the ITO film is formed with a first concave curved surface which is different from the surface of the prior art ITO film in which the first concave curved surface is not formed.
  • the mask used may also be a mask having a plurality of elliptical through holes arranged in an array, which is not limited in the embodiment of the present invention.
  • the opening of the first concave curved surface formed after the first patterning process is an ellipse.
  • Step 4013 Form a TSP pattern by a second patterning process, the TSP pattern includes a plurality of TSP wires, and the upper surface of each TSP wire is formed with a plurality of first concave arc faces arranged in an array, and sides of each TSP wire are formed There is a second concave curved surface.
  • the ITO pattern formed by the first concave curved surface formed in the step 4012 may be sequentially coated with photoresist, exposed with a mask, developed with a developing solution, and etched with an etchant.
  • a second patterning process such as etching and stripping photoresist, is performed to form a TSP pattern, which may include a TSP wire.
  • the photoresist used in the second patterning process is a negative photoresist
  • the mask used in the second patterning process can be used in the prior art to form a TSP pattern.
  • the mask is the same, but when etching is performed, the etching time used in the second patterning process is smaller than that used in the prior art etching.
  • the TSP pattern 801 may include TSP wires 8011, each of which The upper surface W of the TSP wire 8011 is formed with a plurality of arrayed first concave curved faces A1, and the side V of each TSP wire 8011 is formed with a second concave curved surface A2, and the upper surface W of the TSP wire 8011
  • the first concave arc surface A1 of the plurality of arrays is formed in step 4012.
  • the plurality of first concave arc surfaces A1 on the upper surface W of the TSP wire 8011 are arranged in an array, and the side surface V of the TSP wire 8011 is formed with the second concave curved surface A2, when the light emitted by the backlight passes through
  • the upper surface W and the side surface V of the TSP wire 8011 can refract light in a plurality of different directions, which weakens the intensity of the prior art light passing through the upper surface W and the side surface V of the TSP wire 8011.
  • the difference in the refraction of the portion of the color film substrate having the TSP pattern 801 and the portion of the color film substrate without the TSP pattern 801 on the backlight is reduced, and the portion of the color film substrate having the TSP pattern 801 is reduced.
  • the difference in appearance between the portion of the color film substrate having the TSP pattern 801 and the portion of the color film substrate without the TSP pattern 801 reduces the streaks on the color film substrate.
  • Step 402 forming a color resist layer on the other side of the transparent substrate.
  • the color resist layer 603 may include a color pixel 6031 and two adjacent color images.
  • the specific steps of the black matrix 6032 between the elements 6031 and the color resist layer 603 on the other side of the transparent substrate 601 can be referred to the prior art, and the embodiments of the present invention are not described herein.
  • step 402 and step 401 can be interchanged, which is not limited by the embodiment of the present invention.
  • a plurality of concave arc surfaces are formed on the surface of the TSP pattern on the transparent substrate side of the color filter substrate, and the light emitted by the backlight is transmitted through
  • the plurality of concave curved surfaces can refract light in a plurality of different directions, which reduces the intensity of the light after passing through the TSP pattern, and reduces the TSP on the color filter substrate.
  • the plurality of concave curved surfaces can direct the light toward The scattering in a plurality of directions reduces the intensity of the light reflected by the color filter substrate after the light is reflected. Therefore, the stripe on the surface of the color filter substrate during the process of displaying the image is reduced, and the display effect is enhanced.
  • the embodiment of the invention provides a touch screen, which may include the color film substrate shown in FIG. 2 or FIG.
  • a plurality of concave curved surfaces are formed on the surface of the TSP pattern on the transparent substrate side of the color filter substrate, and the light emitted by the backlight passes through the color filter substrate.
  • the plurality of concave curved surfaces can refract light in a plurality of different directions, weakening the intensity of the light after passing through the TSP pattern, and reducing the portion of the color filter substrate having the TSP pattern and the a portion of the color film substrate that does not have a TSP pattern refracts light from the backlight, and when the light hits the display side of the color filter substrate, the plurality of concave curved surfaces can scatter light in multiple directions. The intensity of the light reflected by the color filter substrate after the light is reduced, so that the stripe on the surface of the color filter substrate during the process of displaying the image is reduced, and the display effect is enhanced.
  • the embodiment of the invention provides a display device, which may include a touch screen, and the touch screen may include the color filter substrate shown in FIG. 2 or FIG.
  • the display device may be any device having a display function, such as a liquid crystal panel, an OLED panel, a mobile phone, a tablet computer, a display, a notebook computer, a navigator, and the like.
  • a plurality of concave curved surfaces are formed on the surface of the TSP pattern on the transparent substrate side of the color filter substrate, and the light emitted by the backlight passes through the color filter substrate.
  • the plurality of concave curved surfaces can refract light in a plurality of different directions, weakening the intensity of the light after passing through the TSP pattern, and reducing the portion of the color film substrate having the TSP pattern and a portion of the color filter substrate having no TSP pattern, a difference in refraction of light emitted from the backlight, and when the light is struck on the display side of the color filter substrate
  • the plurality of concave curved surfaces can scatter the light in a plurality of directions, thereby reducing the intensity of the light reflected by the color filter substrate after the light is reflected, thereby reducing the stripe on the surface of the color filter substrate during the process of displaying the image. , enhanced display.

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Abstract

一种彩膜基板（00）、彩膜基板（00）的制造方法、触摸屏及显示装置。该彩膜基板（00）包括：透明基板（001）；位于所述透明基板（001）一侧的触摸屏面板图形（002），所述触摸屏面板图形（002）的表面形成有多个凹形弧面（A）。该技术方案解决了在显示图像的过程中该彩膜基板（00）的表面会出现条纹，影响显示效果的问题。

Description

彩膜基板、彩膜基板的制造方法、触摸屏及显示装置
本申请要求于2015年3月27日递交的、申请号为201510142859.0、发明名称为“彩膜基板、彩膜基板的制造方法、触摸屏及显示装置”的中国专利申请的优先权，其全部内容通过引用并入本申请中。
技术领域
本发明涉及触摸屏技术领域，特别涉及一种彩膜基板、彩膜基板的制造方法、触摸屏及显示装置。
背景技术
触摸屏作为一种智能化的人机交互界面产品，在生产和生活中得到了广泛的应用，用户通过触摸该触摸屏能够控制该触摸屏显示相应的图像。
现有技术中，触摸屏设置于显示装置中，触摸屏包括阵列基板和彩膜基板，及填充在阵列基板和彩膜基板之间的液晶，该阵列基板的背光侧设置有下偏光片，该彩膜基板的显示侧设置有上偏光片。该显示装置中还设置有背光源，背光源发出的光能够依次透过该触摸屏上的下偏光片、阵列基板、液晶、彩膜基板和上偏光片使得该触摸屏发光，进行图像的显示，其中彩膜基板包括透明基板、形成于透明基板一侧的TSP(英文：Touch Screen Panel；中文：触摸屏面板)图形，以及形成于透明基板另一侧的色阻层，该TSP图形包括TSP导线，该TSP导线的上表面和侧面均为平面，且该TSP导线的上表面与侧面不在同一平面。
当背光源发出的光透过该彩膜基板上的TSP导线时，该彩膜基板上有TSP导线的部分与该彩膜基板上没有TSP导线的部分对背光源发出的光的折射存在差异；此外，当位于该彩膜基板显示侧的光打在该彩膜基板上时，该TSP导线的上表面与侧面将光线反射后，光线的反射方向不同，因此，在显示图像的过程中该彩膜基板的表面会出现条纹，影响显示效果。
发明内容
为了解决在显示图像的过程中彩膜基板的表面会出现条纹，影响显示效果的问题，本发明提供了一种彩膜基板、彩膜基板的制造方法、触摸屏及显示装置。所述技术方案如下：
第一方面，提供了一种彩膜基板，所述彩膜基板包括：
透明基板；
位于所述透明基板一侧的触摸屏面板(TSP)图形，所述TSP图形的表面形成有多个凹形弧面。
可选的，所述多个凹形弧面包括第一凹形弧面和第二凹形弧面。
所述TSP图形包括多个TSP导线，每个所述TSP导线的上表面形成有多个阵列排布的第一凹形弧面，每个所述TSP导线的侧面形成有所述第二凹形弧面。
可选的，所述第一凹形弧面的开口呈圆形。
可选的，所述彩膜基板还包括：位于所述透明基板的另一侧的色阻层。
所述色阻层包括彩色像素，及位于每两个相邻的彩色像素之间的黑矩阵。
第二方面，提供了一种彩膜基板的制造方法，所述彩膜基板的制造方法包括：
在透明基板的一侧形成表面具有多个凹形弧面的TSP图形。
可选的，所述多个凹形弧面包括：第一凹形弧面和第二凹形弧面。
所述在透明基板的一侧形成表面具有多个凹形弧面的TSP图形的步骤包括：
在透明基板的一侧形成氧化铟锡(ITO)薄膜；
通过第一次构图工艺形成包括多个阵列排布的第一凹形弧面的ITO图形；
通过第二次构图工艺形成所述TSP图形，所述TSP图形包括多个TSP导线，每个所述TSP导线的上表面形成有多个阵列排布的第一凹形弧面，每个所述TSP导线的侧面形成有所述第二凹形弧面。
可选的，所述第一次构图工艺和所述第二次构图工艺中使用的光刻胶均为负性光刻胶。
可选的，所述第一凹形弧面的开口呈圆形，当所述ITO薄膜的厚度为
Figure PCTCN2016074826-appb-000001
Figure PCTCN2016074826-appb-000002
时，所述圆形的直径为
Figure PCTCN2016074826-appb-000003
所述第一凹形弧面的最大深度为
Figure PCTCN2016074826-appb-000004
Figure PCTCN2016074826-appb-000005
可选的，所述彩膜基板的制造方法还包括：
在所述透明基板的另一侧形成色阻层，所述色阻层包括彩色像素，及位于每两个相邻的彩色像素之间的黑矩阵。
第三方面，提供了一种触摸屏，包括第一方面所述的彩膜基板。
第四方面，提供了一种显示装置，包括第三方面所述的触摸屏。
本发明提供了一种彩膜基板、彩膜基板的制造方法、触摸屏及显示装置，由于在彩膜基板上透明基板一侧的TSP图形表面形成有多个凹形弧面，当背光源发出的 光透过该彩膜基板上的TSP图形时，该多个凹形弧面能够将光线向多个不同的方向折射，减弱了光线在经过该TSP图形后的强度，减小了该彩膜基板上有TSP图形的部分与该彩膜基板上没有TSP图形的部分对背光源发出的光的折射的差异，且当光线打在该彩膜基板的显示侧时，该多个凹形弧面能够将光线向多个方向散射，减小了该彩膜基板对光线反射后光线的强度，所以，减少了在显示图像的过程中该彩膜基板表面的条纹，增强了显示效果。
应当理解的是，以上的一般描述和后文的细节描述仅是示例性和解释性的，并不能限制本发明。
附图说明
为了更清楚地说明本发明实施例中的技术方案，下面将对实施例描述中所需要使用的附图作简单地介绍，显而易见地，下面描述中的附图仅仅是本发明的一些实施例，对于本领域普通技术人员来讲，在不付出创造性劳动的前提下，还可以根据这些附图获得其他的附图。
图1是一种彩膜基板的结构示意图；
图2是本发明实施例提供的一种彩膜基板的结构示意图；
图3是本发明实施例提供的又一种彩膜基板的结构示意图；
图4是本发明实施例提供的一种彩膜基板的制造方法的方法流程图；
图5是本发明实施例提供的一种形成TSP图形方法的方法流程图；
图6是本发明实施例提供的一种透明基板的结构示意图；
图7是本发明实施例提供的另一种透明基板的结构示意图；
图8是本发明实施例提供的又一种透明基板的结构示意图；
图9是本发明实施例提供的一种色阻层的结构示意图。
通过上述附图，已示出本发明明确的实施例，后文中将有更详细的描述。这些附图和文字描述并不是为了通过任何方式限制本发明构思的范围，而是通过参考特定实施例为本领域技术人员说明本发明的概念。
具体实施方式
为使本发明的目的、技术方案和优点更加清楚，下面将结合附图对本发明实施方式作进一步地详细描述。
图1为一种彩膜基板10的结构示意图，如图1所示，该彩膜基板10可以包 括：透明基板101和位于该透明基板101一侧的触摸屏面板(TSP)图形102。该TSP图形102可以包括TSP导线1021，请参考图1，该TSP导线1021的上表面P和该TSP导线1021的侧面Q均为平面，且该上表面P与侧面Q不在同一平面。当光线从该彩膜基板10的背光侧射向该彩膜基板10的显示侧时，光线穿过该透明基板101和该TSP导线1021时会发生折射，该透明基板101上有TSP导线1021的部分与该透明基板101上没有TSP导线1021的部分的厚度不同，光线的折射情况存在差异，使得该彩膜基板10的表面出现条纹。当位于该彩膜基板10显示侧的光打在该彩膜基板10上时，该TSP导线1021能够反射光线，由于该TSP导线1021的上表面P和侧面Q不在同一平面，该TSP导线1021的上表面P与侧面Q将光线反射后，光线的反射方向不同，因此，该TSP导线的上表面P和侧面Q对光线的反射差异较大，使得该彩膜基板10的表面出现条纹。
如图2所示，本发明实施例提供了另一种彩膜基板00，该彩膜基板00可以包括：透明基板001和位于该透明基板001一侧的TSP图形002，该TSP图形的表面形成有多个凹形弧面A。
综上所述，由于本发明实施例提供的彩膜基板中，在彩膜基板上透明基板一侧的TSP图形表面形成有多个凹形弧面，当背光源发出的光透过该彩膜基板上的TSP图形时，该多个凹形弧面能够将光线向多个不同的方向折射，减弱了光线在经过该TSP图形后的强度，减小了该彩膜基板上有TSP图形的部分与该彩膜基板上没有TSP图形的部分对背光源发出的光的折射的差异，且当光线打在该彩膜基板的显示侧时，该多个凹形弧面能够将光线向多个方向散射，减小了该彩膜基板对光线反射后光线的强度，所以，减少了在显示图像的过程中该彩膜基板表面的条纹，增强了显示效果。
如图3所示，本发明实施例提供了又一种彩膜基板00。该彩膜基板00可以包括：透明基板001和位于该透明基板001一侧的TSP图形002，该TSP图形的表面形成有多个凹形弧面A。在该彩膜基板00中，TSP图形002可以包括多个TSP导线0021，多个凹形弧面A可以包括：第一凹形弧面A1和第二凹形弧面A2。该多个TSP导线0021中的每个TSP导线0021的上表面a都形成有多个以阵列排布的第一凹形弧面A1，每个TSP导线的侧面b都形成有第二凹形弧面A2。示例的，该TSP导线的材质为ITO(英文：Indium Tin Oxide；中文：氧化铟锡)，本发明实施例中的彩膜基板00是采用单层ITO(Single ITO)技术制成的，该TSP导线所在的ITO层可视为单层ITO技术中的单层ITO。
由于该TSP导线0021的上表面a上的多个第一凹形弧面A1呈阵列排布，即多个第一凹形弧面A1均匀的排布在该TSP导线0021的上表面a，由此，减小了该TSP导线0021上表面a上形成有第一凹形弧面A1与现有技术中TSP导线0021上表面a上没有形成有第一凹形弧面A1的差异；且该TSP导线0021的侧面b形成有第二凹形弧面A2，当背光源发出的光在经过该彩膜基板00时，该TSP导线0021的上表面a和侧面b上的多个凹形弧面A可以将光向多个不同的方向折射，减弱了现有技术中光线在经过TSP导线0021的上表面a和侧面b后的强度，减小了该彩膜基板00上有TSP图形的部分与该彩膜基板00上没有TSP图形的部分对背光源发出的光的折射的差异，减小了该彩膜基板00上有TSP图形的部分与该彩膜基板00上没有TSP图形的部分外观上的差异；此外，当光线打在该TSP导线0021的上表面a和侧面b时，该多个凹形弧面A能够对光线进行散射，进一步的减小了该彩膜基板00上有TSP图形的部分与该彩膜基板00上没有TSP图形的部分外观上的差异，减少了该彩膜基板上的条纹。
优选的，该第一凹形弧面A1的开口可以呈圆形，圆形的开口可以使得该多个阵列排布的第一凹弧面A1在该TSP导线0021的上表面a的分布更加均匀，进一步的减小了该TSP导线0021上表面a形成有第一凹形弧面A1与现有技术中TSP导线0021上表面a没有形成有第一凹形弧面A1的差异。需要说明的是，该第一凹形弧面A1的开口还可以为椭圆，本发明实施例对此不做限定。
如图3所示，该彩膜基板00还可以包括：位于该透明基板001的另一侧的色阻层003，该色阻层003可以包括彩色像素0031，及位于每两个相邻的彩色像素0031之间的黑矩阵0032。该色阻层003的具体结构可以参照现有技术中对该色阻层003具体结构的描述，本发明实施例在此不做赘述。
示例的，本发明实施例提供的彩膜基板00可以适用于通过在保护玻璃上直接形成ITO导电膜及传感器的方式制造的触摸屏，和通过在液晶面板上形成ITO导电膜及传感器的方式制造的在液晶面板上配触摸传感器在液晶面板上配触摸传感器触摸屏。
综上所述，由于本发明实施例提供的彩膜基板中，在彩膜基板上透明基板一侧的TSP图形表面形成有多个凹形弧面，当背光源发出的光透过该彩膜基板上的TSP图形时，该多个凹形弧面能够将光线向多个不同的方向折射，减弱了光线在经过该TSP图形后的强度，减小了该彩膜基板上有TSP图形的部分与该彩膜基板上没有TSP图形的部分对背光源发出的光的折射的差异，且当光线打在该彩膜基板的显示侧时，该多个凹形弧面能够将光线向多个方向散射，减小了该彩膜基板对光线反射后光 线的强度，所以，减少了在显示图像的过程中该彩膜基板表面的条纹，增强了显示效果。
本发明实施例提供了一种彩膜基板的制造方法，该彩膜基板的制造方法可以包括：
在透明基板的一侧形成表面具有多个凹形弧面的触摸屏面板(TSP)图形。
综上所述，由于本发明实施例提供的彩膜基板的制造方法中，在彩膜基板上透明基板一侧的TSP图形表面形成有多个凹形弧面，当背光源发出的光透过该彩膜基板上的TSP图形时，该多个凹形弧面能够将光线向多个不同的方向折射，减弱了光线在经过该TSP图形后的强度，减小了该彩膜基板上有TSP图形的部分与该彩膜基板上没有TSP图形的部分对背光源发出的光的折射的差异，且当光线打在该彩膜基板的显示侧时，该多个凹形弧面能够将光线向多个方向散射，减小了该彩膜基板对光线反射后光线的强度，所以，减少了在显示图像的过程中该彩膜基板表面的条纹，增强了显示效果。
具体的，在透明基板的一侧形成表面具有多个凹形弧面的TSP图形的步骤可以包括：在透明基板的一侧形成ITO薄膜；通过第一次构图工艺形成包括多个阵列排布的第一凹形弧面的ITO图形；通过第二次构图工艺形成TSP图形，TSP图形包括多个TSP导线，每个TSP导线的上表面形成有多个阵列排布的第一凹形弧面，每个TSP导线的侧面形成有第二凹形弧面。
示例的，第一次构图工艺和第二次构图工艺中使用的光刻胶均为负性光刻胶。第一凹形弧面的开口呈圆形，当ITO薄膜的厚度为
Figure PCTCN2016074826-appb-000006
(埃)时，圆形的直径为
Figure PCTCN2016074826-appb-000007
第一凹形弧面的最大深度为
Figure PCTCN2016074826-appb-000008
进一步的，该彩膜基板的制造方法还可以包括：在透明基板的另一侧形成色阻层，色阻层包括彩色像素及位于每两个相邻的彩色像素之间的黑矩阵。
综上所述，由于本发明实施例提供的彩膜基板的制造方法中，在彩膜基板上透明基板一侧的TSP图形表面形成有多个凹形弧面，当背光源发出的光透过该彩膜基板上的TSP图形时，该多个凹形弧面能够将光线向多个不同的方向折射，减弱了光线在经过该TSP图形后的强度，减小了该彩膜基板上有TSP图形的部分与该彩膜基板上没有TSP图形的部分对背光源发出的光的折射的差异，且当光线打在该彩膜基板的显示侧时，该多个凹形弧面能够将光线向多个方向散射，减小了该彩膜基板对光线反射后光线的强度，所以，减少了在显示图像的过程中该彩膜基板表面的条纹，增 强了显示效果。
本发明实施例提供了另一种彩膜基板的制造方法，如图4所示，该彩膜基板的制造方法可以包括：
步骤401、在透明基板的一侧形成表面具有多个凹形弧面的TSP图形。
具体的，该多个凹形弧面可以包括：第一凹形弧面和第二凹形弧面。
如图5所示，步骤401可以包括：
步骤4011、在透明基板的一侧形成ITO薄膜。
具体的，可以通过溅射的方式在该透明基板上形成ITO薄膜。实际应用中，也可以通过沉积或涂敷的方式在该透明基板上形成ITO薄膜，本发明实施例对此不做限定。图6为本发明实施例提供的基于步骤4011的一种透明基板601的正视图和俯视图，该透明基板601的一侧形成有ITO薄膜602，由于该透明基板601的表面是平整的，所以形成于该透明基板601一侧的ITO薄膜602的表面也是平整的。示例的，该ITO薄膜602的厚度x可以为
Figure PCTCN2016074826-appb-000009
步骤4012、通过第一次构图工艺形成包括多个以阵列排布的第一凹形弧面的ITO图形。
示例的，可以对步骤4011中形成的ITO薄膜依次进行涂光刻胶、使用掩膜板进行曝光、用显影液进行显影、用刻蚀液进行刻蚀和剥离光刻胶等第一次构图工艺，从而形成包括多个阵列排布的第一凹形弧面的ITO图形，该第一凹形弧面的开口可以呈圆形。如图7所示，图7为经过第一次构图工艺后形成的透明基板601的正视图和俯视图，该透明基板601的一侧形成有ITO图形701，该ITO图形701可以包括多个阵列排布的第一凹形弧面A1。该第一凹形弧面A1的开口的直径B以及该第一凹形弧面A1的最大深度C均与步骤4011中形成的该ITO薄膜的厚度相关，示例的，当步骤4011中形成的ITO薄膜的厚度为
Figure PCTCN2016074826-appb-000010
时，该第一凹形弧面A1的开口的直径B可以为
Figure PCTCN2016074826-appb-000011
该第一凹形弧面A1的最大深度C可以为
Figure PCTCN2016074826-appb-000012
该多个第一凹形弧面A1呈阵列均匀的排布在该ITO薄膜上。
需要说明的是，在该第一次构图工艺中使用的光刻胶为负性光刻胶，在该第一次构图工艺中使用的掩膜板可以为表面设置有多个以阵列排布的圆孔的掩膜板，且在使用刻蚀液进行刻蚀时，可以通过控制刻蚀所用的时间及温度等参数，使得在该ITO薄膜的表面形成多个阵列排布的开口呈圆形的第一凹形弧面。该第一凹形弧面的开口呈圆形可以使得该多个阵列排布的第一凹弧面均匀的分布在该ITO薄膜的表面，减小 了该ITO薄膜的表面形成有第一凹形弧面与现有技术中ITO薄膜的表面没有形成有第一凹形弧面的差异。示例的，该第一次构图工艺中，使用的掩膜板也可以为表面设置有多个阵列排布的椭圆形通孔的掩膜板，本发明实施例对此不做限定。当该掩膜板为表面设置有多个阵列排布的椭圆形通孔的掩膜板时，经过第一次构图工艺后形成的第一凹形弧面的开口为椭圆。
步骤4013、通过第二次构图工艺形成TSP图形，TSP图形包括多个TSP导线，每个TSP导线的上表面形成有多个阵列排布的第一凹形弧面，每个TSP导线的侧面形成有第二凹形弧面。
示例的，可以对步骤4012中形成的包括多个阵列排布的第一凹形弧面的ITO图形依次进行涂光刻胶、使用掩膜板进行曝光、用显影液进行显影、用刻蚀液进行刻蚀和剥离光刻胶等第二次构图工艺形成TSP图形，该TSP图形可以包括TSP导线。需要说明的是，在该第二次构图工艺中使用的光刻胶为负性光刻胶，该第二次构图工艺中使用的掩膜板可以与现有技术中形成TSP图形时所使用的掩膜板相同，但在进行刻蚀时，该第二次构图工艺中所使用的刻蚀时间小于现有技术中刻蚀时所使用的时间。图8为经过第二次构图工艺后形成的透明基板601的正视图，该透明基板601的一侧形成有TSP图形801，如图8所示，该TSP图形801可以包括TSP导线8011，每个该TSP导线8011的上表面W形成有多个阵列排布的第一凹形弧面A1，每个TSP导线8011的侧面V形成有第二凹形弧面A2，该TSP导线8011的上表面W的多个阵列排布的第一凹形弧面A1为在步骤4012中形成的。
由于该TSP导线8011上表面W上的多个第一凹形弧面A1呈阵列排布，且该TSP导线8011的侧面V形成有第二凹形弧面A2，当背光源发出的光在经过彩膜基板时，该TSP导线8011的上表面W和侧面V可以将光向多个不同的方向折射，减弱了现有技术中光线在经过TSP导线8011的上表面W和侧面V后的强度，减小了彩膜基板上有TSP图形801的部分与彩膜基板上没有TSP图形801的部分对背光源发出的光的折射的差异，减小了彩膜基板上有TSP图形801的部分与彩膜基板上没有TSP图形801的部分外观上的差异；当光线打在该TSP导线8011的上表面W和侧面V时，该多个凹形弧面A能够对光线进行散射，进一步的减小了彩膜基板上有TSP图形801的部分与彩膜基板上没有TSP图形801的部分外观上的差异，减少了该彩膜基板上的条纹。
步骤402、在透明基板的另一侧形成色阻层。
如图9所示，该色阻层603可以包括彩色像素6031及位于每两个相邻的彩色像 素6031之间的黑矩阵6032，在该透明基板601的另一侧形成色阻层603的具体步骤可以参考现有技术，本发明实施例在此不做赘述。
需要说明的是，步骤402与步骤401的顺序可以相互调换，本发明实施例对此不做限定。
综上所述，由于本发明实施例提供的彩膜基板的制造方法中，在彩膜基板上透明基板一侧的TSP图形表面形成有多个凹形弧面，当背光源发出的光透过该彩膜基板上的TSP图形时，该多个凹形弧面能够将光线向多个不同的方向折射，减弱了光线在经过该TSP图形后的强度，减小了该彩膜基板上有TSP图形的部分与该彩膜基板上没有TSP图形的部分对背光源发出的光的折射的差异，且当光线打在该彩膜基板的显示侧时，该多个凹形弧面能够将光线向多个方向散射，减小了该彩膜基板对光线反射后光线的强度，所以，减少了在显示图像的过程中该彩膜基板表面的条纹，增强了显示效果。
本发明实施例提供了一种触摸屏，该触摸屏可以包括图2或图3所示的彩膜基板。
综上所述，由于本发明实施例提供的触摸屏中，在彩膜基板上透明基板一侧的TSP图形表面形成有多个凹形弧面，当背光源发出的光透过该彩膜基板上的TSP图形时，该多个凹形弧面能够将光线向多个不同的方向折射，减弱了光线在经过该TSP图形后的强度，减小了该彩膜基板上有TSP图形的部分与该彩膜基板上没有TSP图形的部分对背光源发出的光的折射的差异，且当光线打在该彩膜基板的显示侧时，该多个凹形弧面能够将光线向多个方向散射，减小了该彩膜基板对光线反射后光线的强度，所以，减少了在显示图像的过程中该彩膜基板表面的条纹，增强了显示效果。
本发明实施例提供了一种显示装置，该显示装置可以包括触摸屏，该触摸屏可以包括图2或图3所示的彩膜基板。具体的，该显示装置可以为：液晶面板、OLED面板、手机、平板电脑、显示器、笔记本电脑、导航仪等任何具有显示功能的装置。
综上所述，由于本发明实施例提供的显示装置中，在彩膜基板上透明基板一侧的TSP图形表面形成有多个凹形弧面，当背光源发出的光透过该彩膜基板上的TSP图形时，该多个凹形弧面能够将光线向多个不同的方向折射，减弱了光线在经过该TSP图形后的强度，减小了该彩膜基板上有TSP图形的部分与该彩膜基板上没有TSP图形的部分对背光源发出的光的折射的差异，且当光线打在该彩膜基板的显示侧 时，该多个凹形弧面能够将光线向多个方向散射，减小了该彩膜基板对光线反射后光线的强度，所以，减少了在显示图像的过程中该彩膜基板表面的条纹，增强了显示效果。
上述所有可选技术方案，可以采用任意结合形成本发明的可选实施例，在此不再一一赘述。
以上所述仅为本发明的较佳实施例，并不用以限制本发明，凡在本发明的精神和原则之内，所作的任何修改、等同替换、改进等，均应包含在本发明的保护范围之内。

Claims (11)

  1. 一种彩膜基板，所述彩膜基板包括：
    透明基板；
    位于所述透明基板一侧的触摸屏面板图形，所述触摸屏面板图形的表面形成有多个凹形弧面。
  2. 根据权利要求1所述的彩膜基板，其中，所述多个凹形弧面包括第一凹形弧面和第二凹形弧面，
    所述触摸屏面板图形包括多个触摸屏面板导线，每个所述触摸屏面板导线的上表面形成有多个阵列排布的第一凹形弧面，每个所述触摸屏面板导线的侧面形成有所述第二凹形弧面。
  3. 根据权利要求2所述的彩膜基板，其中，
    所述第一凹形弧面的开口呈圆形。
  4. 根据权利要求1至3任一权利要求所述的彩膜基板，其中，
    所述彩膜基板还包括：位于所述透明基板的另一侧的色阻层，
    所述色阻层包括彩色像素及位于每两个相邻的彩色像素之间的黑矩阵。
  5. 一种彩膜基板的制造方法，所述彩膜基板的制造方法包括：
    在透明基板的一侧形成表面具有多个凹形弧面的触摸屏面板图形。
  6. 根据权利要求5所述的彩膜基板的制造方法，其中，
    所述多个凹形弧面包括：第一凹形弧面和第二凹形弧面，
    所述在透明基板的一侧形成表面具有多个凹形弧面的触摸屏面板图形的步骤包括：
    在透明基板的一侧形成氧化铟锡薄膜；
    通过第一次构图工艺形成包括多个阵列排布的第一凹形弧面的氧化铟锡图形；
    通过第二次构图工艺形成所述触摸屏面板图形，所述触摸屏面板图形包括多个触摸屏面板导线，每个所述触摸屏面板导线的上表面形成有多个阵列排布的第一凹形弧面，每个所述触摸屏面板导线的侧面形成有所述第二凹形弧面。
  7. 根据权利要求6所述的彩膜基板的制造方法，其中，
    所述第一次构图工艺和所述第二次构图工艺中使用的光刻胶均为负性光刻胶。
  8. 根据权利要求6所述的彩膜基板的制造方法，其中，
    所述第一凹形弧面的开口呈圆形，当所述氧化铟锡薄膜的厚度为
    Figure PCTCN2016074826-appb-100001
    时，所述圆形的直径为
    Figure PCTCN2016074826-appb-100002
    所述第一凹形弧面的最大深度为
    Figure PCTCN2016074826-appb-100003
  9. 根据权利要求5至8任一权利要求所述的彩膜基板的制造方法，其中，所述彩膜基板的制造方法还包括：
    在所述透明基板的另一侧形成色阻层，所述色阻层包括彩色像素及位于每两个相邻的彩色像素之间的黑矩阵。
  10. 一种触摸屏，包括：权利要求1至4任意一项权利要求所述的彩膜基板。
  11. 一种显示装置，包括：权利要求10所述的触摸屏。
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