WO2016152385A1 - Anisotropically conductive film, connection method and bonded structure - Google Patents

Anisotropically conductive film, connection method and bonded structure Download PDF

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Publication number
WO2016152385A1
WO2016152385A1 PCT/JP2016/055866 JP2016055866W WO2016152385A1 WO 2016152385 A1 WO2016152385 A1 WO 2016152385A1 JP 2016055866 W JP2016055866 W JP 2016055866W WO 2016152385 A1 WO2016152385 A1 WO 2016152385A1
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Prior art keywords
conductive film
anisotropic conductive
electronic component
organic peroxide
heating
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PCT/JP2016/055866
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French (fr)
Japanese (ja)
Inventor
将大 伊藤
克哉 工藤
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デクセリアルズ株式会社
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Application filed by デクセリアルズ株式会社 filed Critical デクセリアルズ株式会社
Priority to CN201680014311.0A priority Critical patent/CN107429125B/en
Priority to KR1020177023549A priority patent/KR102026547B1/en
Publication of WO2016152385A1 publication Critical patent/WO2016152385A1/en
Priority to HK18104772.6A priority patent/HK1245316A1/en

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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/10Adhesives in the form of films or foils without carriers
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J201/00Adhesives based on unspecified macromolecular compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J9/00Adhesives characterised by their physical nature or the effects produced, e.g. glue sticks
    • C09J9/02Electrically-conducting adhesives
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/36Assembling printed circuits with other printed circuits
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00Additional features of adhesives in the form of films or foils
    • C09J2301/30Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier
    • C09J2301/314Additional features of adhesives in the form of films or foils characterized by the chemical, physicochemical or physical properties of the adhesive or the carrier the adhesive layer and/or the carrier being conductive
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/28Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L2224/29Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector

Definitions

  • the present invention relates to an anisotropic conductive film, a connection method, and a joined body.
  • ACF anisotropic conductive film
  • the anisotropic conductive film is prepared by applying a resin mixture containing conductive particles on a film and drying it.
  • a method for connecting electronic components one of the circuits to be connected (or both of the circuits to be connected) is placed on the anisotropic conductive film, and a predetermined temperature and pressure are applied. The electrical connection between them is performed.
  • a cation-curing anisotropic conductive film (ACF) is used for mounting an IC chip or a flexible substrate on a glass substrate such as a liquid crystal display.
  • the cationic curable anisotropic conductive film has excellent adhesion to glass, but the acid generated when using a cationic curing agent has contributed to the polymerization of the curable resin. Since it remains in the film, there arises a problem of corroding metal parts such as wiring of electronic parts.
  • an object of the present invention is to solve the above-described problems and achieve the following objects. That is, an object of the present invention is to provide an anisotropic conductive film excellent in adhesion and corrosion resistance without reducing curing reactivity.
  • Means for solving the problems are as follows. That is, ⁇ 1> An anisotropic conductive film for anisotropically conductively connecting a terminal of a first electronic component and a terminal of a second electronic component,
  • the anisotropic conductive film contains at least conductive particles, a cationic curable resin, a cationic curing agent, an organic peroxide, and a radical scavenger,
  • the anisotropic conductive film is characterized in that a reaction start temperature of the organic peroxide is higher than a reaction start temperature of the cationic curing agent.
  • connection method for anisotropically conductively connecting a terminal of a first electronic component and a terminal of a second electronic component A first disposing step of disposing the anisotropic conductive film according to ⁇ 1> on a terminal of the second electronic component; A second disposing step of disposing the first electronic component on the anisotropic conductive film such that a terminal of the first electronic component is in contact with the anisotropic conductive film; And a heating and pressing step in which the first electronic component is heated and pressed by a heating and pressing member.
  • ⁇ 4> A joined body connected by the connection method according to any one of ⁇ 2> to ⁇ 3>.
  • an anisotropic conductive film that solves the above-described problems and can achieve the above-described object, has excellent adhesion without reducing curing reactivity, and excellent corrosion resistance. Can be provided.
  • the anisotropic conductive film of the present invention contains at least conductive particles, a cationic curable resin, a cationic curing agent, an organic peroxide, and a radical scavenger, preferably a film-forming resin, and further necessary. Depending on the situation, other components are contained.
  • the anisotropic conductive film is an anisotropic conductive film that anisotropically connects the terminals of the first electronic component and the terminals of the second electronic component.
  • the inventors of the present invention have conducted research on a cationically curable anisotropic conductive film.
  • the cationic curable anisotropic conductive film is polymerized with at least a cationic curing agent, an organic peroxide, and a radical scavenger.
  • an organic peroxide having a reaction initiation temperature higher than the reaction initiation temperature of the cationic curing agent is contained, the corrosion due to the acid generated by the cationic curing agent can be effectively prevented and the curing reaction can be performed.
  • the present inventors have found that an anisotropic conductive film having good adhesiveness without affecting the above can be obtained. This is probably because the acid was trapped as follows to effectively prevent the corrosiveness.
  • the organic peroxide is thermally decomposed to generate radical compounds.
  • the radical of the generated radical compound is trapped by the radical scavenger.
  • a compound formed by removing radicals from a radical compound traps acid generated from a cationic curing agent (acid trapping by an organic peroxide).
  • the use of an organic peroxide whose reaction start temperature is higher than that of the cationic curing agent and delaying the timing of trapping the acid ensured good adhesion without impairing the reactivity of the curing reaction. I think that the.
  • metal particle there is no restriction
  • the metal-coated resin particles are not particularly limited as long as the surfaces of the resin particles are coated with metal, and can be appropriately selected according to the purpose.
  • the surface of the resin particles is nickel, copper, gold And particles coated with at least any one metal of palladium.
  • the material of the resin particles is not particularly limited and may be appropriately selected depending on the intended purpose. For example, styrene-divinylbenzene copolymer, benzoguanamine resin, cross-linked polystyrene resin, acrylic resin, styrene-silica composite resin, etc. Is mentioned.
  • the conductive particles only need to have conductivity during anisotropic conductive connection. For example, even if the surface of the metal particle has an insulating coating, it functions as the conductive particle as long as the particle is deformed during the anisotropic conductive connection and the metal particle is exposed. .
  • the content of the conductive particles in the anisotropic conductive film is not particularly limited and can be appropriately adjusted depending on the wiring pitch of the circuit member, the connection area, and the like.
  • the cationic curable resin is not particularly limited as long as it is a resin that is cured by the action of a cationic curing agent, and can be appropriately selected according to the purpose.
  • examples thereof include an epoxy resin.
  • the cationic curing agent is not particularly limited as long as it is a curing agent that generates a cationic species, and can be appropriately selected according to the purpose.
  • Examples thereof include onium salts.
  • Examples of the onium salt include a sulfonium salt and an iodonium salt.
  • Examples of the sulfonium salt include a triarylsulfonium salt.
  • the counter anion in the onium salt is not particularly limited and may be appropriately selected depending on the intended purpose. For example, SbF 6 ⁇ , AsF 6 ⁇ , PF 6 ⁇ , BF 4 ⁇ , CH 3 SO 3 ⁇ , CF 3 SO 3- and the like.
  • the cationic curing agent may be a commercial product.
  • Examples of the commercially available products include Adeka optomer SP-172 (manufactured by ADEKA Corporation), Adeka optomer SP-170 (manufactured by ADEKA Corporation), Adeka optomer SP-152 (manufactured by ADEKA Corporation), and Adeka optomer.
  • SP-150 (manufactured by ADEKA Corporation), Sun Aid SI-60L (manufactured by Sanshin Chemical Industry Co., Ltd.), Sun Aid SI-80L (manufactured by Sanshin Chemical Industry Co., Ltd.), Sun Aid SI-100L (manufactured by Sanshin Chemical Industry Co., Ltd.) ), Sun Aid SI-150L (manufactured by Sanshin Chemical Industry Co., Ltd.), CPI-100P (manufactured by San Apro Co., Ltd.), CPI-101A (manufactured by San Apro Co., Ltd.), CPI-200K (manufactured by San Apro Co., Ltd.), IRGACURE250 (BASF Corporation) Manufactured).
  • Film formation resin and cation contained in the said anisotropic conductive film The amount is preferably 10 to 40 parts by mass and more preferably 15 to 30 parts by mass with respect to 100 parts by mass of the total amount of the curable resin.
  • Organic peroxide is not particularly limited and may be appropriately selected depending on the intended purpose.
  • diacyl peroxide, peroxydicarbonate, peroxyketal, dialkyl peroxide, hydroperoxide, peroxyester , Ketone peroxide, and other peroxides are examples of organic peroxides.
  • the reaction start temperature of the organic peroxide is preferably higher than the reaction start temperature of the cationic curing agent.
  • the reaction start temperature of the cationic curing agent refers to the heat generation start temperature of DSC measurement.
  • the reaction start temperature of the organic peroxide refers to the heat generation start temperature by the rapid heating test, for example, the heat generation start temperature described in NOF 10th edition, Table-3.
  • the reaction start temperature of the organic peroxide is preferably 15 ° C. or more higher than the reaction start temperature of the cationic curing agent, and more preferably 30 ° C. or more. However, it is difficult to activate the organic peroxide at a temperature of 50 ° C. away from the heat at the time of mounting, so that the corrosion prevention effect is exhibited. is there. When the annealing treatment is performed, the corrosion prevention effect can be sufficiently exerted.
  • the reaction initiation temperature between the organic peroxide and the cationic curing agent is preferably 25 ° C. to 45 ° C., more preferably 30 ° C. to 40 ° C.
  • the annealing treatment refers to a heat treatment step in which heating is performed at a temperature equal to or higher than the reaction start temperature of the organic peroxide as described in the section ⁇ Heat treatment step> in the following (connection method).
  • the content of the organic peroxide is preferably 1 to 10 parts by mass with respect to 100 parts by mass of the total amount of the film-forming resin, the cationic curable resin, and the cationic curing agent.
  • radical scavenger There is no restriction
  • the content of the radical scavenger is preferably 0.1 to 3 parts by mass with respect to 100 parts by mass of the total amount of the film-forming resin, the cationic curable resin, and the cationic curing agent.
  • ⁇ Film forming resin> There is no restriction
  • the film forming resin may be used alone or in combination of two or more. Among these, phenoxy resin is preferable from the viewpoint of film forming property, processability, and connection reliability.
  • the phenoxy resin include a resin synthesized from bisphenol A and epichlorohydrin. As the phenoxy resin, an appropriately synthesized product or a commercially available product may be used.
  • ⁇ Other ingredients> There is no restriction
  • a silane coupling agent etc. are mentioned.
  • the silane coupling agent is not particularly limited and may be appropriately selected depending on the intended purpose. Examples thereof include an epoxy silane coupling agent, an acrylic silane coupling agent, a thiol silane coupling agent, and an amine silane. A coupling agent etc. are mentioned.
  • the average thickness of the anisotropic conductive film is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 3 ⁇ m to 30 ⁇ m, more preferably 5 ⁇ m to 25 ⁇ m, and particularly preferably 8 ⁇ m to 20 ⁇ m.
  • the method for producing the anisotropic conductive film is not particularly limited and may be appropriately selected depending on the purpose.
  • the conductive particles, the cationic curable resin, and the cationic curing agent Polyethylene terephthalate (PET) containing the organic peroxide and the radical scavenger, and preferably mixed with the film-forming resin, so that the mixture is uniformly mixed, and then the mixture is peeled.
  • PET Polyethylene terephthalate
  • a method of coating on a film A method of coating on a film.
  • the first electronic component and the second electronic component are not particularly limited as long as they are electronic components having terminals, which are targets for anisotropic conductive connection using the anisotropic conductive film.
  • a glass substrate, a flexible substrate, a rigid substrate, an IC (Integrated Circuit) chip, a TAB (Tape Automated Bonding), a liquid crystal panel, and the like can be given.
  • IC Integrated Circuit
  • TAB Tape Automated Bonding
  • liquid crystal panel and the like
  • the IC chip include a liquid crystal screen control IC chip in a flat panel display (FPD).
  • connection method and joined body The connection method of the present invention includes at least a first arrangement step, a second arrangement step, and a heating and pressing step, and further includes other steps as necessary.
  • the connection method is a method in which the terminal of the first electronic component and the terminal of the second electronic component are anisotropically conductively connected.
  • the joined body of the present invention is obtained by the connection method of the present invention.
  • the connection method may further include a heat treatment step of heating at a temperature equal to or higher than a reaction start temperature of the organic peroxide after the heating and pressing step.
  • the first arrangement step is not particularly limited as long as it is a step of arranging the anisotropic conductive film of the present invention on the terminal of the second electronic component, and can be appropriately selected according to the purpose. it can.
  • the second electronic component is a substrate such as a glass substrate or a flexible substrate and the first electronic component is an IC chip, a TAB, or the like
  • the first arrangement step for example, the second electronic component
  • the anisotropic conductive film is disposed on the terminal of the electronic component so that the terminal and the conductive particle-containing layer of the anisotropic conductive film are in contact with each other.
  • the second placement step is a step of placing the first electronic component on the anisotropic conductive film so that a terminal of the first electronic component is in contact with the anisotropic conductive film.
  • the second placement step is a step of placing the first electronic component on the anisotropic conductive film so that a terminal of the first electronic component is in contact with the anisotropic conductive film.
  • the heating and pressing step is not particularly limited as long as it is a step of heating and pressing the electronic component with a heating and pressing member, and can be appropriately selected according to the purpose.
  • Examples of the heating and pressing member include a pressing member having a heating mechanism.
  • Examples of the pressing member having the heating mechanism include a heat tool.
  • the heating temperature is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 160 ° C. to 190 ° C.
  • the pressing pressure is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 40 MPa to 80 MPa.
  • the heating and pressing time is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 5 seconds to 10 seconds.
  • connection method may further include a heat treatment step (annealing) for heating at a temperature equal to or higher than the reaction start temperature of the organic peroxide after the heating and pressing step.
  • a heat treatment step of heating at a temperature equal to or higher than the reaction temperature of the organic peroxide to the joined body obtained after the heating and pressing step, the activation of the organic peroxide is performed at the time of mounting. Even if the amount of heat is insufficient, it can be sufficiently activated after mounting. Thereby, the prevention performance of corrosion can be raised.
  • a temperature equal to or higher than the reaction start temperature of the organic peroxide is applied.
  • the heating time in the heat treatment step may be a level at which it is considered that the acid trap reaction by the organic peroxide has been sufficiently performed. For example, after reaching a predetermined temperature equal to or higher than the reaction start temperature, heating is performed for about 1 minute. do it. Specifically, the assembled assembly is placed in a heater manufactured by SU-222, ESPEC (Espec) Co., Ltd., which is set to the predetermined temperature, heat treated for several minutes, and then removed from the heater. A treated bonded body (annealed product) can be obtained.
  • Example 1 ⁇ Preparation of anisotropic conductive film> 34.5 parts by mass of phenoxy resin (trade name: YP-50, manufactured by Nippon Steel & Sumitomo Chemical Co., Ltd.), 35 parts by mass of epoxy resin (EP828, manufactured by Mitsubishi Chemical Co., Ltd.), cationic curing agent (Sun-Aid SI-60L, Sanshin) Chemical Industry Co., Ltd., 10 parts by mass of a sulfonium salt type cationic curing agent (reaction start temperature 90 ° C.), 5 parts by mass of a silane coupling agent (KBE403, manufactured by Shin-Etsu Silicone Co., Ltd.), conductive particles (AUL704, Sekisui Chemical) Manufactured by Kogyo Co., Ltd., 10 parts by mass of metal-coated resin particles having an Ni / Au plating film formed on the surface of acrylic resin particles, average particle diameter of 4.0 ⁇ m, organic peroxide (Perbutyl L, manufactured
  • the joined body was manufactured by the following method and evaluated as follows. The results are shown in Table 2-1.
  • the anisotropic conductive film obtained above was arrange
  • Teflon registered trademark
  • annealed product ⁇ Joint after annealing (annealed product) >> After the above mounting, the bonded product was put into a heater manufactured by SU-222, ESPEC Co., Ltd. set at 110 ° C. and taken out from the heater after 5 minutes to obtain an annealed product subjected to a heat treatment step. . The annealed product was also evaluated for corrosivity similar to the following.
  • Adhesion evaluation >> -Test IC chip and glass substrate-
  • a test IC chip (size 1.8 mm ⁇ 20 mm, thickness 0.5 mm, gold-plated bump size 30 ⁇ m ⁇ 85 ⁇ m, bump height 15 ⁇ m) was used as the first electronic component.
  • the second electronic component a glass substrate having a thickness of 0.5 mm having an ITO film formed on the entire surface was used.
  • Example 2 (Examples 2 to 7)
  • Example 1 the anisotropic compositions of Examples 2-7 were changed in the same manner as in Example 1 except that the composition of the anisotropic conductive film was changed as shown in Table 1-1 and Table 1-2.
  • a conductive film and a joined body were produced.
  • Example 2 and Examples 4 to 7 an annealed product was obtained in the same manner as in Example 1 except that the annealing temperature was set to 125 ° C.
  • Example 3 an annealed product was obtained in the same manner as in Example 1 except that the set temperature of the heater was 150 ° C. Evaluation similar to Example 1 was performed about the obtained joined body. The results are shown in Table 2-1 and Table 2-2.
  • Comparative Examples 1 to 3 The anisotropic conductive films and joined bodies of Comparative Examples 1 to 3 were obtained in the same manner as in Example 1, except that the composition of the anisotropic conductive film was changed as shown in Table 1-2. Produced.
  • Comparative Examples 1 and 2 an annealed product was obtained in the same manner as in Example 1 except that the set temperature of the heater was 125 ° C. as the annealing treatment.
  • Comparative Example 3 an annealed product was obtained in the same manner as in Example 1 except that the set temperature of the heater was 90 ° C. Evaluation similar to Example 1 was performed about the obtained joined body. The results are shown in Table 2-2.
  • PKHH represents a phenoxy resin manufactured by Sakai Chemical Industry Co., Ltd.
  • JER806 indicates a bisphenol F type epoxy resin manufactured by Mitsubishi Chemical Corporation.
  • Parmec N indicates an organic peroxide (reaction start temperature 90 ° C.) manufactured by NOF Corporation.
  • Perbutyl L represents an organic peroxide (reaction start temperature: 108 ° C.) manufactured by NOF Corporation.
  • Percure HB indicates an organic peroxide (reaction start temperature 125 ° C.) manufactured by NOF Corporation.
  • Park mill P represents an organic peroxide (reaction start temperature 149 ° C.) manufactured by NOF Corporation.
  • the radical scavenger MEHQ methylhydroquinone
  • the anisotropic conductive film of the present invention can suppress the corrosion of the wiring and has good corrosion resistance.
  • Example 2 showed the most preferable result in terms of good corrosivity and good adhesion without annealing.
  • Example 3 can improve corrosion performance by performing an annealing process. It was confirmed that Example 3 also showed good results in both corrosiveness and adhesiveness, although there was a condition of annealing treatment.
  • the anisotropic conductive film of the present invention can be suitably used for production of a bonded body having excellent corrosion resistance and adhesiveness.

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Non-Insulated Conductors (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Wire Bonding (AREA)
  • Electric Connection Of Electric Components To Printed Circuits (AREA)
  • Adhesive Tapes (AREA)

Abstract

This anisotropically conductive film connects a terminal of a first electronic component and a terminal of a second electronic component in an anisotropically conductive manner, and is characterized by containing at least conductive particles, a cation-curable resin, a cationic curing agent, an organic peroxide and a radical scavenger, and in that the reaction start temperature of the organic peroxide is higher than the reaction start temperature of the cationic curing agent.

Description

異方性導電フィルム、接続方法、及び接合体Anisotropic conductive film, connection method, and joined body
 本発明は、異方性導電フィルム、接続方法、及び接合体に関する。 The present invention relates to an anisotropic conductive film, a connection method, and a joined body.
 従来より、電子部品同士を接続する手段として、異方性導電フィルム(ACF;Anisotropic Conductive Film)が用いられている。 Conventionally, an anisotropic conductive film (ACF) has been used as means for connecting electronic components.
 前記異方性導電フィルムは、導電性粒子を含有する樹脂混合物を、フィルム上に塗布し、乾燥して作製されるものである。電子部品間の接続方法としては、接続しようとする回路の一方に(もしくは接続しようとする回路の両方の場合もある)、前記異方性導電フィルムを載せ、所定の温度、圧力を加え、回路間の電気的接続を行うというものである。 The anisotropic conductive film is prepared by applying a resin mixture containing conductive particles on a film and drying it. As a method for connecting electronic components, one of the circuits to be connected (or both of the circuits to be connected) is placed on the anisotropic conductive film, and a predetermined temperature and pressure are applied. The electrical connection between them is performed.
 液晶ディスプレイなどのガラス基板にICチップやフレキシブル基板を実装するのに、カチオン硬化系の異方性導電フィルム(ACF)が使用されている。
 しかし、カチオン硬化系の異方性導電フィルムは、ガラスへの接着性に優れたものであるが、カチオン系硬化剤を用いた際に発生する酸が、硬化性樹脂の重合に寄与した後もフィルム内に残存するため、電子部品が有する配線など金属部分を腐食するという問題が生じる。
A cation-curing anisotropic conductive film (ACF) is used for mounting an IC chip or a flexible substrate on a glass substrate such as a liquid crystal display.
However, the cationic curable anisotropic conductive film has excellent adhesion to glass, but the acid generated when using a cationic curing agent has contributed to the polymerization of the curable resin. Since it remains in the film, there arises a problem of corroding metal parts such as wiring of electronic parts.
 そこで、配線の腐食を防止するため、酸を中和する目的で、水酸化アルミニウムなどのアルカリフィラーを配合することが知られている(例えば、特許文献1参照)。 Therefore, in order to prevent corrosion of the wiring, it is known to add an alkali filler such as aluminum hydroxide for the purpose of neutralizing the acid (for example, see Patent Document 1).
特開2014-62184号公報JP 2014-62184 A
 しかし、アルカリフィラーを異方性導電フィルムに配合しただけでは、カチオン系硬化剤が酸を発生する当初から中和反応が始まり、硬化反応における反応性に影響を与える。
 上記特許文献1に記載の技術では、硬化反応性を低下させず良好な接着性と、良好な耐腐食性のいずれも満足した異方性導電フィルムを得るという観点からは、十分なものとはいえなかった。
 本発明は、従来における前記諸問題を解決し、以下の目的を達成することを課題とする。即ち、本発明は、硬化反応性を低下させず接着性に優れ、かつ耐腐食性にも優れた異方性導電フィルムを提供することを目的とする。
However, if the alkali filler is simply blended in the anisotropic conductive film, the neutralization reaction starts from the beginning when the cationic curing agent generates an acid, which affects the reactivity in the curing reaction.
From the viewpoint of obtaining an anisotropic conductive film satisfying both good adhesiveness and good corrosion resistance without lowering the curing reactivity, the technique described in Patent Document 1 is sufficient. I couldn't.
An object of the present invention is to solve the above-described problems and achieve the following objects. That is, an object of the present invention is to provide an anisotropic conductive film excellent in adhesion and corrosion resistance without reducing curing reactivity.
 前記課題を解決するための手段としては、以下の通りである。即ち、
 <1> 第1の電子部品の端子と第2の電子部品の端子とを異方性導電接続させる異方性導電フィルムであって、
 前記異方性導電フィルムが、少なくとも導電性粒子、カチオン硬化性樹脂、カチオン系硬化剤、有機過酸化物、及びラジカル捕捉剤を含有し、
 前記有機過酸化物の反応開始温度が、前記カチオン系硬化剤の反応開始温度より高いことを特徴とする異方性導電フィルムである。
 <2> 第1の電子部品の端子と第2の電子部品の端子とを異方性導電接続させる接続方法であって、
 前記第2の電子部品の端子上に前記<1>に記載の異方性導電フィルムを配置する第1の配置工程と、
 前記異方性導電フィルム上に前記第1の電子部品を、前記第1の電子部品の端子が前記異方性導電フィルムと接するように配置する第2の配置工程と、
 前記第1の電子部品を加熱押圧部材により加熱及び押圧する加熱押圧工程、とを含むことを特徴とする接続方法である。
 <3> 前記加熱押圧工程後に、前記有機過酸化物の反応開始温度以上の温度で加熱する熱処理工程をさらに含む前記<2>に記載の接続方法である。
 <4> 前記<2>から<3>のいずれかに記載の接続方法により接続されたことを特徴とする接合体である。
Means for solving the problems are as follows. That is,
<1> An anisotropic conductive film for anisotropically conductively connecting a terminal of a first electronic component and a terminal of a second electronic component,
The anisotropic conductive film contains at least conductive particles, a cationic curable resin, a cationic curing agent, an organic peroxide, and a radical scavenger,
The anisotropic conductive film is characterized in that a reaction start temperature of the organic peroxide is higher than a reaction start temperature of the cationic curing agent.
<2> A connection method for anisotropically conductively connecting a terminal of a first electronic component and a terminal of a second electronic component,
A first disposing step of disposing the anisotropic conductive film according to <1> on a terminal of the second electronic component;
A second disposing step of disposing the first electronic component on the anisotropic conductive film such that a terminal of the first electronic component is in contact with the anisotropic conductive film;
And a heating and pressing step in which the first electronic component is heated and pressed by a heating and pressing member.
<3> The connection method according to <2>, further including a heat treatment step of heating at a temperature equal to or higher than a reaction start temperature of the organic peroxide after the heating and pressing step.
<4> A joined body connected by the connection method according to any one of <2> to <3>.
 本発明によれば、従来における前記諸問題を解決し、前記目的を達成することができ、硬化反応性を低下させず接着性に優れ、かつ耐腐食性にも優れた異方性導電フィルムを提供することができる。 According to the present invention, an anisotropic conductive film that solves the above-described problems and can achieve the above-described object, has excellent adhesion without reducing curing reactivity, and excellent corrosion resistance. Can be provided.
(異方性導電フィルム)
 本発明の異方性導電フィルムは、少なくとも導電性粒子、カチオン硬化性樹脂、カチオン系硬化剤、有機過酸化物、及びラジカル捕捉剤を含有し、好ましくは膜形成樹脂を含有し、更に必要に応じて、その他の成分を含有する。
 前記異方性導電フィルムは、第1の電子部品の端子と第2の電子部品の端子とを異方性導電接続させる異方性導電フィルムである。
(Anisotropic conductive film)
The anisotropic conductive film of the present invention contains at least conductive particles, a cationic curable resin, a cationic curing agent, an organic peroxide, and a radical scavenger, preferably a film-forming resin, and further necessary. Depending on the situation, other components are contained.
The anisotropic conductive film is an anisotropic conductive film that anisotropically connects the terminals of the first electronic component and the terminals of the second electronic component.
 本発明者らは、カチオン硬化系の異方性導電フィルムについて研究を重ねたところ、カチオン硬化系の異方性導電フィルムに、少なくともカチオン系硬化剤と有機過酸化物とラジカル捕捉剤である重合禁止剤とを含有させ、該カチオン系硬化剤の反応開始温度より、反応開始温度の高い有機過酸化物を用いると、カチオン系硬化剤により発生した酸による腐食を有効に防止でき、かつ硬化反応に影響せず接着性が良好な異方性導電フィルムが得られることを見出した。
 これは、以下のようにして酸をトラップして、腐食性を効果的に防止したためと思われる。
・有機過酸化物が熱分解してラジカル化合物が発生する。
・発生したラジカル化合物のラジカルがラジカル捕捉剤にトラップされる。
・ラジカル化合物からラジカルが除かれ生成した化合物が、カチオン系硬化剤から発生した酸をトラップする(有機過酸化物による酸のトラップ)。
また、反応開始温度がカチオン系硬化剤のそれより高い有機過酸化物を使用し、酸をトラップするタイミングを遅らせたため、硬化反応の反応性を損なうことなく、良好な接着性が担保できたものと思われる。
The inventors of the present invention have conducted research on a cationically curable anisotropic conductive film. As a result, the cationic curable anisotropic conductive film is polymerized with at least a cationic curing agent, an organic peroxide, and a radical scavenger. When an organic peroxide having a reaction initiation temperature higher than the reaction initiation temperature of the cationic curing agent is contained, the corrosion due to the acid generated by the cationic curing agent can be effectively prevented and the curing reaction can be performed. The present inventors have found that an anisotropic conductive film having good adhesiveness without affecting the above can be obtained.
This is probably because the acid was trapped as follows to effectively prevent the corrosiveness.
・ The organic peroxide is thermally decomposed to generate radical compounds.
-The radical of the generated radical compound is trapped by the radical scavenger.
A compound formed by removing radicals from a radical compound traps acid generated from a cationic curing agent (acid trapping by an organic peroxide).
In addition, the use of an organic peroxide whose reaction start temperature is higher than that of the cationic curing agent and delaying the timing of trapping the acid ensured good adhesion without impairing the reactivity of the curing reaction. I think that the.
<導電性粒子>
 前記導電性粒子としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、金属粒子、金属被覆樹脂粒子などが挙げられる。
<Conductive particles>
There is no restriction | limiting in particular as said electroconductive particle, According to the objective, it can select suitably, For example, a metal particle, a metal covering resin particle, etc. are mentioned.
 前記金属粒子としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、ニッケル、コバルト、銀、銅、金、パラジウムなどが挙げられる。これらは、1種単独で使用してもよいし、2種以上を併用してもよい。
 これらの中でも、ニッケル、銀、銅が好ましい。これらの金属粒子は、表面酸化を防ぐ目的で、その表面に金、パラジウムを施していてもよい。更に、表面に金属突起や有機物で絶縁被膜を施したものを用いてもよい。
There is no restriction | limiting in particular as said metal particle, According to the objective, it can select suitably, For example, nickel, cobalt, silver, copper, gold | metal | money, palladium etc. are mentioned. These may be used individually by 1 type and may use 2 or more types together.
Among these, nickel, silver, and copper are preferable. These metal particles may be provided with gold or palladium on the surface for the purpose of preventing surface oxidation. Furthermore, you may use what gave the metal film and the insulating film with the organic substance on the surface.
 前記金属被覆樹脂粒子としては、樹脂粒子の表面を金属で被覆した粒子であれば、特に制限はなく、目的に応じて適宜選択することができ、例えば、樹脂粒子の表面をニッケル、銅、金、及びパラジウムの少なくともいずれかの金属で被覆した粒子などが挙げられる。更に、表面に金属突起や有機物で絶縁被膜を施したものを用いてもよい。
 前記樹脂粒子への金属の被覆方法としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、無電解めっき法、スパッタリング法などが挙げられる。
 前記樹脂粒子の材質としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、スチレン-ジビニルベンゼン共重合体、ベンゾグアナミン樹脂、架橋ポリスチレン樹脂、アクリル樹脂、スチレン-シリカ複合樹脂などが挙げられる。
The metal-coated resin particles are not particularly limited as long as the surfaces of the resin particles are coated with metal, and can be appropriately selected according to the purpose. For example, the surface of the resin particles is nickel, copper, gold And particles coated with at least any one metal of palladium. Furthermore, you may use what gave the metal film and the insulating film with the organic substance on the surface.
There is no restriction | limiting in particular as the coating method of the metal to the said resin particle, According to the objective, it can select suitably, For example, an electroless-plating method, sputtering method, etc. are mentioned.
The material of the resin particles is not particularly limited and may be appropriately selected depending on the intended purpose. For example, styrene-divinylbenzene copolymer, benzoguanamine resin, cross-linked polystyrene resin, acrylic resin, styrene-silica composite resin, etc. Is mentioned.
 前記導電性粒子は、異方性導電接続の際に、導電性を有していればよい。例えば、金属粒子の表面に絶縁被膜を施した粒子であっても、異方性導電接続の際に前記粒子が変形し、前記金属粒子が露出するものであれば、前記導電性粒子として機能する。 The conductive particles only need to have conductivity during anisotropic conductive connection. For example, even if the surface of the metal particle has an insulating coating, it functions as the conductive particle as long as the particle is deformed during the anisotropic conductive connection and the metal particle is exposed. .
 前記異方性導電フィルムにおける前記導電性粒子の含有量としては、特に制限はなく、回路部材の配線ピッチや、接続面積などによって適宜調整することができる。 The content of the conductive particles in the anisotropic conductive film is not particularly limited and can be appropriately adjusted depending on the wiring pitch of the circuit member, the connection area, and the like.
<カチオン硬化性樹脂>
 前記カチオン硬化性樹脂としては、カチオン系硬化剤の作用により硬化する樹脂であれば、特に制限はなく、目的に応じて適宜選択することができ、例えば、エポキシ樹脂などが挙げられる。
 前記エポキシ樹脂としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、ノボラック型エポキシ樹脂、それらの変性エポキシ樹脂などが挙げられる。
 前記異方性導電フィルムにおける前記カチオン硬化性樹脂の含有量としては、特に制限はなく、目的に応じて適宜選択することができる。
<Cation curable resin>
The cationic curable resin is not particularly limited as long as it is a resin that is cured by the action of a cationic curing agent, and can be appropriately selected according to the purpose. Examples thereof include an epoxy resin.
There is no restriction | limiting in particular as said epoxy resin, According to the objective, it can select suitably, For example, bisphenol A type epoxy resin, bisphenol F type epoxy resin, novolak type epoxy resin, those modified epoxy resins etc. are mentioned. .
There is no restriction | limiting in particular as content of the said cationic curable resin in the said anisotropic conductive film, According to the objective, it can select suitably.
<カチオン系硬化剤>
 前記カチオン系硬化剤としては、カチオン種を発生する硬化剤であれば、特に制限はなく、目的に応じて適宜選択することができ、例えば、オニウム塩などが挙げられる。
 前記オニウム塩としては、例えば、スルホニウム塩、ヨードニウム塩などが挙げられる。
 前記スルホニウム塩としては、例えば、トリアリールスルホニウム塩などが挙げられる。
 前記オニウム塩における対アニオンとしては、特に制限はなく、目的に応じて適宜選択することができ、例えば、SbF 、AsF 、PF 、BF 、CHSO 、CFSO などが挙げられる。
 前記カチオン系硬化剤は市販品であってもよい。前記市販品としては、例えば、アデカオプトマーSP-172(株式会社ADEKA製)、アデカオプトマーSP-170(株式会社ADEKA製)、アデカオプトマーSP-152(株式会社ADEKA製)、アデカオプトマーSP-150(株式会社ADEKA製)、サンエイドSI-60L(三新化学工業株式会社製)、サンエイドSI-80L(三新化学工業株式会社製)、サンエイドSI-100L(三新化学工業株式会社製)、サンエイドSI-150L(三新化学工業株式会社製)、CPI-100P(サンアプロ株式会社製)、CPI-101A(サンアプロ株式会社製)、CPI-200K(サンアプロ株式会社製)、IRGACURE250(BASF社製)などが挙げられる。
<Cationic curing agent>
The cationic curing agent is not particularly limited as long as it is a curing agent that generates a cationic species, and can be appropriately selected according to the purpose. Examples thereof include onium salts.
Examples of the onium salt include a sulfonium salt and an iodonium salt.
Examples of the sulfonium salt include a triarylsulfonium salt.
The counter anion in the onium salt is not particularly limited and may be appropriately selected depending on the intended purpose. For example, SbF 6 , AsF 6 , PF 6 , BF 4 , CH 3 SO 3 , CF 3 SO 3- and the like.
The cationic curing agent may be a commercial product. Examples of the commercially available products include Adeka optomer SP-172 (manufactured by ADEKA Corporation), Adeka optomer SP-170 (manufactured by ADEKA Corporation), Adeka optomer SP-152 (manufactured by ADEKA Corporation), and Adeka optomer. SP-150 (manufactured by ADEKA Corporation), Sun Aid SI-60L (manufactured by Sanshin Chemical Industry Co., Ltd.), Sun Aid SI-80L (manufactured by Sanshin Chemical Industry Co., Ltd.), Sun Aid SI-100L (manufactured by Sanshin Chemical Industry Co., Ltd.) ), Sun Aid SI-150L (manufactured by Sanshin Chemical Industry Co., Ltd.), CPI-100P (manufactured by San Apro Co., Ltd.), CPI-101A (manufactured by San Apro Co., Ltd.), CPI-200K (manufactured by San Apro Co., Ltd.), IRGACURE250 (BASF Corporation) Manufactured).
 前記異方性導電フィルムにおける前記カチオン系硬化剤の含有量としては、特に制限はなく、目的に応じて適宜選択することができるが、前記異方性導電フィルムに含有される膜形成樹脂及びカチオン硬化性樹脂の総量100質量部に対して、10質量部~40質量部が好ましく、15質量部~30質量部がより好ましい。 There is no restriction | limiting in particular as content of the said cationic hardening | curing agent in the said anisotropic conductive film, Although it can select suitably according to the objective, Film formation resin and cation contained in the said anisotropic conductive film The amount is preferably 10 to 40 parts by mass and more preferably 15 to 30 parts by mass with respect to 100 parts by mass of the total amount of the curable resin.
<有機過酸化物>
 前記有機過酸化物としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、ジアシルパーオキサイド、パーオキシジカーボネート、パーオキシケタール、ジアルキルパーオキサイド、ハイドロパーオキサイド、パーオキシエステル、ケトンパーオキサイド、その他のパーオキサイドなどが挙げられる。
<Organic peroxide>
The organic peroxide is not particularly limited and may be appropriately selected depending on the intended purpose. For example, diacyl peroxide, peroxydicarbonate, peroxyketal, dialkyl peroxide, hydroperoxide, peroxyester , Ketone peroxide, and other peroxides.
 本発明において、前記有機過酸化物の反応開始温度は、前記カチオン系硬化剤の反応開始温度より高いものであることが好ましい。
 本発明では、カチオン系硬化剤の反応開始温度は、DSC測定の発熱開始温度をいう。
 有機過酸化物の反応開始温度は、急速加熱試験による発熱開始温度をいい、例えば、日油有機過酸化物第10版、表-3に記載の発熱開始温度をいう。
In the present invention, the reaction start temperature of the organic peroxide is preferably higher than the reaction start temperature of the cationic curing agent.
In the present invention, the reaction start temperature of the cationic curing agent refers to the heat generation start temperature of DSC measurement.
The reaction start temperature of the organic peroxide refers to the heat generation start temperature by the rapid heating test, for example, the heat generation start temperature described in NOF 10th edition, Table-3.
 前記有機過酸化物の反応開始温度は、前記カチオン系硬化剤の反応開始温度より高温側に15℃以上離れているとよく、30℃以上離れているとより好ましい。しかし、50℃程度離れると実装時の熱量で、腐食防止効果が発揮されるほど有機過酸化物を活性化させることは難しく、実装後に有機過酸化物が活性化する温度でアニール処理する必要がある。アニール処理を施すと、腐食防止効果を十分発揮させることができる。
 前記有機過酸化物と前記カチオン系硬化剤との反応開始温度は、25℃~45℃離れていることが好ましく、30℃~40℃離れていることがより好ましい。
 また、前記アニール処理とは、下記(接続方法)の<熱処理工程>の欄で記載しているように、前記有機過酸化物の反応開始温度以上の温度で加熱する熱処理工程をいう。
The reaction start temperature of the organic peroxide is preferably 15 ° C. or more higher than the reaction start temperature of the cationic curing agent, and more preferably 30 ° C. or more. However, it is difficult to activate the organic peroxide at a temperature of 50 ° C. away from the heat at the time of mounting, so that the corrosion prevention effect is exhibited. is there. When the annealing treatment is performed, the corrosion prevention effect can be sufficiently exerted.
The reaction initiation temperature between the organic peroxide and the cationic curing agent is preferably 25 ° C. to 45 ° C., more preferably 30 ° C. to 40 ° C.
The annealing treatment refers to a heat treatment step in which heating is performed at a temperature equal to or higher than the reaction start temperature of the organic peroxide as described in the section <Heat treatment step> in the following (connection method).
 前記有機過酸化物の含有量は、膜形成樹脂、カチオン硬化性樹脂、及びカチオン系硬化剤の総量100質量部に対して、1質量部~10質量部含有させるとよい。 The content of the organic peroxide is preferably 1 to 10 parts by mass with respect to 100 parts by mass of the total amount of the film-forming resin, the cationic curable resin, and the cationic curing agent.
<ラジカル捕捉剤>
 前記ラジカル捕捉剤としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、ハイドロキノン誘導体など、一般に重合禁止剤として使用されているものが適用できる。
<Radical scavenger>
There is no restriction | limiting in particular as said radical scavenger, According to the objective, it can select suitably, For example, what is generally used as a polymerization inhibitor, such as a hydroquinone derivative, is applicable.
 前記ラジカル捕捉剤の含有量は、膜形成樹脂、カチオン硬化性樹脂、及びカチオン系硬化剤の総量100質量部に対して、0.1質量部~3質量部含有させるとよい。 The content of the radical scavenger is preferably 0.1 to 3 parts by mass with respect to 100 parts by mass of the total amount of the film-forming resin, the cationic curable resin, and the cationic curing agent.
<膜形成樹脂>
 前記膜形成樹脂としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、フェノキシ樹脂、不飽和ポリエステル樹脂、飽和ポリエステル樹脂、ウレタン樹脂、ブタジエン樹脂、ポリイミド樹脂、ポリアミド樹脂、ポリオレフィン樹脂などが挙げられる。前記膜形成樹脂は、1種単独で使用してもよいし、2種以上を併用してもよい。これらの中でも、製膜性、加工性、接続信頼性の点からフェノキシ樹脂が好ましい。
 前記フェノキシ樹脂としては、例えば、ビスフェノールAとエピクロルヒドリンより合成される樹脂などが挙げられる。
 前記フェノキシ樹脂は、適宜合成したものを使用してもよいし、市販品を使用してもよい。
 前記異方性導電フィルムにおける前記膜形成樹脂の含有量としては、特に制限はなく、目的に応じて適宜選択することができる。
<Film forming resin>
There is no restriction | limiting in particular as said film formation resin, According to the objective, it can select suitably, For example, phenoxy resin, unsaturated polyester resin, saturated polyester resin, urethane resin, butadiene resin, polyimide resin, polyamide resin, polyolefin Resin etc. are mentioned. The film forming resin may be used alone or in combination of two or more. Among these, phenoxy resin is preferable from the viewpoint of film forming property, processability, and connection reliability.
Examples of the phenoxy resin include a resin synthesized from bisphenol A and epichlorohydrin.
As the phenoxy resin, an appropriately synthesized product or a commercially available product may be used.
There is no restriction | limiting in particular as content of the said film formation resin in the said anisotropic conductive film, According to the objective, it can select suitably.
<その他の成分>
 前記その他の成分としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、シランカップリング剤などが挙げられる。
 前記シランカップリング剤としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、エポキシ系シランカップリング剤、アクリル系シランカップリング剤、チオール系シランカップリング剤、アミン系シランカップリング剤などが挙げられる。
 前記異方性導電フィルムにおける前記シランカップリング剤の含有量としては、特に制限はなく、目的に応じて適宜選択することができる.
<Other ingredients>
There is no restriction | limiting in particular as said other component, According to the objective, it can select suitably, For example, a silane coupling agent etc. are mentioned.
The silane coupling agent is not particularly limited and may be appropriately selected depending on the intended purpose. Examples thereof include an epoxy silane coupling agent, an acrylic silane coupling agent, a thiol silane coupling agent, and an amine silane. A coupling agent etc. are mentioned.
There is no restriction | limiting in particular as content of the said silane coupling agent in the said anisotropic conductive film, According to the objective, it can select suitably.
 前記異方性導電フィルムの平均厚みとしては、特に制限はなく、目的に応じて適宜選択することができるが、3μm~30μmが好ましく、5μm~25μmがより好ましく、8μm~20μmが特に好ましい。 The average thickness of the anisotropic conductive film is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 3 μm to 30 μm, more preferably 5 μm to 25 μm, and particularly preferably 8 μm to 20 μm.
 前記異方性導電フィルムの製造方法としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、前記導電性粒子と、前記カチオン硬化性樹脂と、前記カチオン系硬化剤と、前記有機過酸化物と、前記ラジカル捕捉剤とを含有し、好ましくは前記膜形成樹脂を含有する配合物を均一になるように混合した後、混合した前記配合物を剥離処理したポリエチレンテレフタレート(PET)フィルム上に塗布する方法などが挙げられる。 The method for producing the anisotropic conductive film is not particularly limited and may be appropriately selected depending on the purpose. For example, the conductive particles, the cationic curable resin, and the cationic curing agent, Polyethylene terephthalate (PET) containing the organic peroxide and the radical scavenger, and preferably mixed with the film-forming resin, so that the mixture is uniformly mixed, and then the mixture is peeled. ) A method of coating on a film.
<第1の電子部品及び第2の電子部品>
 前記第1の電子部品及び前記第2の電子部品としては、前記異方性導電フィルムを用いた異方性導電接続の対象となる、端子を有する電子部品であれば、特に制限はなく、目的に応じて適宜選択することができ、例えば、ガラス基板、フレキシブル基板、リジッド基板、IC(Integrated Circuit)チップ、TAB(Tape Automated Bonding)、液晶パネルなどが挙げられる。前記ガラス基板としては、例えば、Al配線形成ガラス基板、ITO配線形成ガラス基板などが挙げられる。前記ICチップとしては、例えば、フラットパネルディスプレイ(FPD)における液晶画面制御用ICチップなどが挙げられる。
<First electronic component and second electronic component>
The first electronic component and the second electronic component are not particularly limited as long as they are electronic components having terminals, which are targets for anisotropic conductive connection using the anisotropic conductive film. For example, a glass substrate, a flexible substrate, a rigid substrate, an IC (Integrated Circuit) chip, a TAB (Tape Automated Bonding), a liquid crystal panel, and the like can be given. As said glass substrate, Al wiring formation glass substrate, ITO wiring formation glass substrate, etc. are mentioned, for example. Examples of the IC chip include a liquid crystal screen control IC chip in a flat panel display (FPD).
(接続方法及び接合体)
 本発明の接続方法は、第1の配置工程と、第2の配置工程と、加熱押圧工程とを少なくとも含み、更に必要に応じて、その他の工程を含む。
 前記接続方法は、第1の電子部品の端子と第2の電子部品の端子とを異方性導電接続させる方法である。
 本発明の接合体は、本発明の前記接続方法により得られる。
 本発明のより好ましい態様として、前記接続方法は、前記加熱押圧工程後に前記有機過酸化物の反応開始温度以上の温度で加熱する熱処理工程をさらに含んでいるとよい。
(Connection method and joined body)
The connection method of the present invention includes at least a first arrangement step, a second arrangement step, and a heating and pressing step, and further includes other steps as necessary.
The connection method is a method in which the terminal of the first electronic component and the terminal of the second electronic component are anisotropically conductively connected.
The joined body of the present invention is obtained by the connection method of the present invention.
As a more preferable aspect of the present invention, the connection method may further include a heat treatment step of heating at a temperature equal to or higher than a reaction start temperature of the organic peroxide after the heating and pressing step.
 前記第1の電子部品、及び前記第2の電子部品としては、特に制限はなく、目的に応じて適宜選択することができ、例えば、本発明の前記異方性導電フィルムの説明で例示した前記第1の電子部品、及び前記第2の電子部品がそれぞれ挙げられる。 There is no restriction | limiting in particular as said 1st electronic component and said 2nd electronic component, According to the objective, it can select suitably, For example, the said illustrated by description of the said anisotropic conductive film of this invention The first electronic component and the second electronic component can be cited respectively.
<第1の配置工程>
 前記第1の配置工程としては、前記第2の電子部品の端子上に本発明の前記異方性導電フィルムを配置する工程であれば、特に制限はなく、目的に応じて適宜選択することができる。
 前記第2の電子部品が、ガラス基板、フレキシブル基板などの基板であって、前記第1の電子部品が、ICチップ、TABなどの場合、前記第1の配置工程においては、例えば、前記第2の電子部品の端子上に前記異方性導電フィルムを、前記端子と前記異方性導電フィルムの導電性粒子含有層とが接するように配置する。
<First arrangement step>
The first arrangement step is not particularly limited as long as it is a step of arranging the anisotropic conductive film of the present invention on the terminal of the second electronic component, and can be appropriately selected according to the purpose. it can.
In the case where the second electronic component is a substrate such as a glass substrate or a flexible substrate and the first electronic component is an IC chip, a TAB, or the like, in the first arrangement step, for example, the second electronic component The anisotropic conductive film is disposed on the terminal of the electronic component so that the terminal and the conductive particle-containing layer of the anisotropic conductive film are in contact with each other.
<第2の配置工程>
 前記第2の配置工程としては、前記異方性導電フィルム上に前記第1の電子部品を、前記第1の電子部品の端子が前記異方性導電フィルムと接するように配置する工程であれば、特に制限はなく、目的に応じて適宜選択することができる。
<Second arrangement step>
The second placement step is a step of placing the first electronic component on the anisotropic conductive film so that a terminal of the first electronic component is in contact with the anisotropic conductive film. There is no particular limitation, and it can be appropriately selected according to the purpose.
<加熱押圧工程>
 前記加熱押圧工程としては、前記電子部品を加熱押圧部材により加熱及び押圧する工程であれば、特に制限はなく、目的に応じて適宜選択することができる。
 前記加熱押圧部材としては、例えば、加熱機構を有する押圧部材などが挙げられる。前記加熱機構を有する押圧部材としては、例えば、ヒートツールなどが挙げられる。
 前記加熱の温度としては、特に制限はなく、目的に応じて適宜選択することができるが、160℃~190℃が好ましい。
 前記押圧の圧力としては、特に制限はなく、目的に応じて適宜選択することができるが、40MPa~80MPaが好ましい。
 前記加熱及び押圧の時間としては、特に制限はなく、目的に応じて適宜選択することができるが、5秒間~10秒間が好ましい。
<Heat pressing process>
The heating and pressing step is not particularly limited as long as it is a step of heating and pressing the electronic component with a heating and pressing member, and can be appropriately selected according to the purpose.
Examples of the heating and pressing member include a pressing member having a heating mechanism. Examples of the pressing member having the heating mechanism include a heat tool.
The heating temperature is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 160 ° C. to 190 ° C.
The pressing pressure is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 40 MPa to 80 MPa.
The heating and pressing time is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 5 seconds to 10 seconds.
<熱処理工程>
 本発明の接続方法のさらなる好ましい態様として、前記接続方法は、前記加熱押圧工程後に、前記有機過酸化物の反応開始温度以上の温度で加熱する(アニール処理する)熱処理工程をさらに含むとよい。
 上記加熱押圧工程を経て得られた実装後の接合体に対し、前記有機過酸化物の反応温度以上の温度で加熱する熱処理工程を付与することで、有機過酸化物の活性化が実装時の熱量では不十分であった場合でも実装後に十分活性化させることができる。これにより、腐食の防止性能を上げることができる。
 前記熱処理工程において、前記有機過酸化物の反応開始温度以上の温度が付与される。熱処理工程における加熱時間としては、有機過酸化物による酸のトラップ反応が十分行われたと思われる程度であればよく、例えば、前記反応開始温度以上の所定の温度に到達した後、1分程度加熱すればよい。
 具体的には、前記所定の温度に設定したSU-222、ESPEC(エスペック)株式会社製の加熱器に、実装後の接合体を入れ、数分間熱処理し、その後、加熱器から取り出すと、アニール処理された接合体(アニール品)を得ることができる。
<Heat treatment process>
As a further preferred aspect of the connection method of the present invention, the connection method may further include a heat treatment step (annealing) for heating at a temperature equal to or higher than the reaction start temperature of the organic peroxide after the heating and pressing step.
By applying a heat treatment step of heating at a temperature equal to or higher than the reaction temperature of the organic peroxide to the joined body obtained after the heating and pressing step, the activation of the organic peroxide is performed at the time of mounting. Even if the amount of heat is insufficient, it can be sufficiently activated after mounting. Thereby, the prevention performance of corrosion can be raised.
In the heat treatment step, a temperature equal to or higher than the reaction start temperature of the organic peroxide is applied. The heating time in the heat treatment step may be a level at which it is considered that the acid trap reaction by the organic peroxide has been sufficiently performed. For example, after reaching a predetermined temperature equal to or higher than the reaction start temperature, heating is performed for about 1 minute. do it.
Specifically, the assembled assembly is placed in a heater manufactured by SU-222, ESPEC (Espec) Co., Ltd., which is set to the predetermined temperature, heat treated for several minutes, and then removed from the heater. A treated bonded body (annealed product) can be obtained.
 以下、本発明の実施例を説明するが、本発明は、これらの実施例に何ら限定されるものではない。 Examples of the present invention will be described below, but the present invention is not limited to these examples.
(実施例1)
<異方性導電フィルムの作製>
 フェノキシ樹脂(商品名:YP-50、新日鉄住友化学株式会社製)34.5質量部、エポキシ樹脂(EP828、三菱化学株式会社製)35質量部、カチオン系硬化剤(サンエイドSI-60L、三新化学工業株式会社製、スルホニウム塩型カチオン系硬化剤(反応開始温度90℃))10質量部、シランカップリング剤(KBE403、信越シリコーン株式会社製)5質量部、導電性粒子(AUL704、積水化学工業株式会社製、アクリル樹脂粒子の表面にNi/Auメッキ被膜が形成された金属被膜樹脂粒子、平均粒子径4.0μm)10質量部、有機過酸化物(パーブチルL、日油株式会社製(反応開始温度108℃))5質量部、及びラジカル捕捉剤(テトラブチルヒドロキノン(TBHQ)東京化成工業株式会社製)0.5質量部を、均一になるように混合した。混合後の配合物を剥離処理したPETフィルム上に乾燥後の平均厚みが10μmとなるように塗布し、異方性導電フィルムを作製した。
 異方性導電フィルムの配合組成を表1-1に示す。
(Example 1)
<Preparation of anisotropic conductive film>
34.5 parts by mass of phenoxy resin (trade name: YP-50, manufactured by Nippon Steel & Sumitomo Chemical Co., Ltd.), 35 parts by mass of epoxy resin (EP828, manufactured by Mitsubishi Chemical Co., Ltd.), cationic curing agent (Sun-Aid SI-60L, Sanshin) Chemical Industry Co., Ltd., 10 parts by mass of a sulfonium salt type cationic curing agent (reaction start temperature 90 ° C.), 5 parts by mass of a silane coupling agent (KBE403, manufactured by Shin-Etsu Silicone Co., Ltd.), conductive particles (AUL704, Sekisui Chemical) Manufactured by Kogyo Co., Ltd., 10 parts by mass of metal-coated resin particles having an Ni / Au plating film formed on the surface of acrylic resin particles, average particle diameter of 4.0 μm, organic peroxide (Perbutyl L, manufactured by NOF CORPORATION ( Reaction start temperature 108 ° C.)) 5 parts by mass, and radical scavenger (tetrabutylhydroquinone (TBHQ) manufactured by Tokyo Chemical Industry Co., Ltd.) 0.5 quality The parts were mixed uniformly. The mixture after mixing was applied onto a PET film subjected to a release treatment so that the average thickness after drying was 10 μm, to prepare an anisotropic conductive film.
Table 1-1 shows the composition of the anisotropic conductive film.
<接合体の製造、及び接合体の評価>
 以下の方法により接合体を製造し、以下に示す評価を行った。結果を表2-1に示す。
 第2の電子部品上に、上記で得られた異方性導電フィルムを前記第2の電子部品と接するように配置した。続いて、異方性導電フィルム上に、第1の電子部品を配置した。続いて、平均厚み50μmのテフロン(登録商標)シートを緩衝材として用い、加熱ツールにより170℃、60MPa、5秒間の条件で、前記第1の電子部品を加熱及び押圧した。
<Manufacture of joined body and evaluation of joined body>
The joined body was manufactured by the following method and evaluated as follows. The results are shown in Table 2-1.
On the 2nd electronic component, the anisotropic conductive film obtained above was arrange | positioned so that the said 2nd electronic component might be contact | connected. Then, the 1st electronic component was arrange | positioned on the anisotropic conductive film. Subsequently, using a Teflon (registered trademark) sheet having an average thickness of 50 μm as a buffer material, the first electronic component was heated and pressed with a heating tool at 170 ° C. and 60 MPa for 5 seconds.
<<アニール処理後接合体(アニール品)>>
 上記実装後、110℃に設定したSU-222、ESPEC(エスペック)株式会社製の加熱器に接合体を入れ、5分後該加熱器から取り出すことにより、熱処理工程を施したアニール品を得た。
 該アニール品に対しても、下記と同様の腐食性の評価を行った。
<< Joint after annealing (annealed product) >>
After the above mounting, the bonded product was put into a heater manufactured by SU-222, ESPEC Co., Ltd. set at 110 ° C. and taken out from the heater after 5 minutes to obtain an annealed product subjected to a heat treatment step. .
The annealed product was also evaluated for corrosivity similar to the following.
<<腐食性評価>>
-試験用ICチップ及びガラス基板-
 第1の電子部品として、試験用ICチップ(サイズ1.8mm×20mm、厚み0.5mm、金メッキバンプのサイズ30μm×85μm、バンプ高さ15μm、)を用いた。
 第2の電子部品として、Al櫛型配線が形成された厚み0.7mmのガラス基板を用いた。
<< Corrosive evaluation >>
-Test IC chip and glass substrate-
A test IC chip (size 1.8 mm × 20 mm, thickness 0.5 mm, gold plating bump size 30 μm × 85 μm, bump height 15 μm) was used as the first electronic component.
As the second electronic component, a 0.7 mm thick glass substrate on which an Al comb wiring was formed was used.
-評価-
 得られた接合体のAl櫛型配線にDC5Vを12時間印加した。印加後のAl櫛型配線12組を金属顕微鏡により観察し、以下の評価基準で評価した。
〔評価基準〕
 5:腐食が観察されない
 4:腐食箇所が1箇所~2箇所観察された
 3:腐食箇所が3箇所~5箇所観察された
 2:腐食箇所が6箇所以上観察された
 1:断線が確認された
 但し、上記5段階評価のいずれに該当させるか迷うほど微妙な結果の場合には、両者の中間をとって、「.5」と表記する場合もある。例えば、2と3の中間であると判断した場合には、2.5と表記する。
-Evaluation-
DC 5 V was applied to the Al comb-shaped wiring of the obtained joined body for 12 hours. 12 sets of Al comb-shaped wirings after application were observed with a metallographic microscope and evaluated according to the following evaluation criteria.
〔Evaluation criteria〕
5: Corrosion is not observed 4: Corrosion spot is observed in 1 to 2 places 3: Corrosion spot is observed in 3 to 5 places 2: Corrosion spot is observed in 6 or more places 1: Disconnection is confirmed However, when the result is so subtle that it is unclear which of the above five-step evaluations is applicable, it may be expressed as “.5” in the middle of both. For example, when it is determined that it is between 2 and 3, 2.5 is written.
<<接着性評価>>
-試験用ICチップ及びガラス基板-
 第1の電子部品として、試験用ICチップ(サイズ1.8mm×20mm、厚み0.5mm、金メッキバンプのサイズ30μm×85μm、バンプ高さ15μm)を用いた。
 第2の電子部品として、全面にITO膜が形成された厚み0.5mmのガラス基板を用いた。
<< Adhesion evaluation >>
-Test IC chip and glass substrate-
A test IC chip (size 1.8 mm × 20 mm, thickness 0.5 mm, gold-plated bump size 30 μm × 85 μm, bump height 15 μm) was used as the first electronic component.
As the second electronic component, a glass substrate having a thickness of 0.5 mm having an ITO film formed on the entire surface was used.
-評価-
 プレッシャークッカーテスト(PCT)後の、ガラス基板に対する異方性導電フィルムの浮上りの程度を目視にて観察し、以下の評価基準で評価した。なお、PCTは、121℃、2atm、5時間の条件で行った。
〔評価基準〕
 5:浮上りが観察されない
 4:圧着面積に対して0%超10%未満の浮上りが観察された
 3:圧着面積に対して10%程度の浮上りが観察された
 2:圧着面積に対して20%程度の浮上りが観察された
 1:圧着面積に対して全面に浮上りが観察された
 但し、上記5段階評価のいずれに該当させるか迷うほど微妙な結果の場合には、両者の中間をとって、「.5」と表記する場合もある。例えば、2と3の中間であると判断した場合には、2.5と表記する。
-Evaluation-
The degree of floating of the anisotropic conductive film with respect to the glass substrate after the pressure cooker test (PCT) was visually observed and evaluated according to the following evaluation criteria. PCT was performed under the conditions of 121 ° C., 2 atm, and 5 hours.
〔Evaluation criteria〕
5: Lifting is not observed 4: Lifting of more than 0% and less than 10% is observed with respect to the crimping area 3: Lifting of approximately 10% is observed with respect to the crimping area 2: With respect to the crimping area About 20% lift was observed. 1: Lift was observed on the entire surface of the crimping area. However, if the result is so subtle that it falls into any of the above five-level evaluation, In some cases, it may be written as “.5” in the middle. For example, when it is determined that it is between 2 and 3, 2.5 is written.
<<総合評価>>
 腐食評価及び接着評価の結果が、3以上である場合、○とする。但し、腐食評価が2以上3未満であってもアニール処理後の腐食評価が3以上であればよい。
 腐食評価又は接着評価の結果のうち一方が3以上で、もう一方が2以上3未満である場合、△とする。
 腐食評価又は接着評価の結果のうち一つでも1が入っている場合、×とする。
<< Comprehensive evaluation >>
When the result of corrosion evaluation and adhesion evaluation is 3 or more, it is set as “◯”. However, even if the corrosion evaluation is 2 or more and less than 3, the corrosion evaluation after annealing may be 3 or more.
If one of the results of the corrosion evaluation or the adhesion evaluation is 3 or more and the other is 2 or more and less than 3, the result is Δ.
When at least one of the results of the corrosion evaluation or the adhesion evaluation contains 1, it is marked as x.
(実施例2~7)
 実施例1において、異方性導電フィルムの配合組成を表1-1、及び表1-2に示すとおりに変えた以外は、実施例1と同様にして、実施例2~7の異方性導電フィルム及び接合体を作製した。
 尚、実施例2、及び実施例4~7では、アニール処理として、加熱器の設定温度を125℃とした以外は、実施例1と同様にしてアニール品を得た。また、実施例3では、加熱器の設定温度を150℃とした以外は、実施例1と同様にしてアニール品を得た。
 得られた接合体について実施例1と同様の評価を行った。結果を表2-1、及び表2-2に示す。
(Examples 2 to 7)
In Example 1, the anisotropic compositions of Examples 2-7 were changed in the same manner as in Example 1 except that the composition of the anisotropic conductive film was changed as shown in Table 1-1 and Table 1-2. A conductive film and a joined body were produced.
In Example 2 and Examples 4 to 7, an annealed product was obtained in the same manner as in Example 1 except that the annealing temperature was set to 125 ° C. In Example 3, an annealed product was obtained in the same manner as in Example 1 except that the set temperature of the heater was 150 ° C.
Evaluation similar to Example 1 was performed about the obtained joined body. The results are shown in Table 2-1 and Table 2-2.
(比較例1~3)
 実施例1において、異方性導電フィルムの配合組成を表1-2に示すとおりに変えた以外は、実施例1と同様にして、比較例1~3の異方性導電フィルム及び接合体を作製した。
 尚、比較例1及び2では、アニール処理として、加熱器の設定温度を125℃とした以外は、実施例1と同様にしてアニール品を得た。また、比較例3では、加熱器の設定温度を90℃とした以外は、実施例1と同様にしてアニール品を得た。
 得られた接合体について実施例1と同様の評価を行った。結果を表2-2に示す。
(Comparative Examples 1 to 3)
The anisotropic conductive films and joined bodies of Comparative Examples 1 to 3 were obtained in the same manner as in Example 1, except that the composition of the anisotropic conductive film was changed as shown in Table 1-2. Produced.
In Comparative Examples 1 and 2, an annealed product was obtained in the same manner as in Example 1 except that the set temperature of the heater was 125 ° C. as the annealing treatment. In Comparative Example 3, an annealed product was obtained in the same manner as in Example 1 except that the set temperature of the heater was 90 ° C.
Evaluation similar to Example 1 was performed about the obtained joined body. The results are shown in Table 2-2.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000002
 
 表1-1及び表1-2において、PKHHは、巴化学工業株式会社製のフェノキシ樹脂を示す。JER806は、三菱化学株式会社製のビスフェノールF型エポキシ樹脂を示す。パーメックNは、日油株式会社製の有機過酸化物(反応開始温度90℃)を示す。パーブチルLは、日油株式会社製の有機過酸化物(反応開始温度108℃)を示す。パーキュアHBは、日油株式会社製の有機過酸化物(反応開始温度125℃)を示す。パークミルPは、日油株式会社製の有機過酸化物(反応開始温度149℃)を示す。ラジカル捕捉剤MEHQ(メチルヒドロキノン)は、東京化成工業株式会社製を示す。
Figure JPOXMLDOC01-appb-T000002

In Table 1-1 and Table 1-2, PKHH represents a phenoxy resin manufactured by Sakai Chemical Industry Co., Ltd. JER806 indicates a bisphenol F type epoxy resin manufactured by Mitsubishi Chemical Corporation. Parmec N indicates an organic peroxide (reaction start temperature 90 ° C.) manufactured by NOF Corporation. Perbutyl L represents an organic peroxide (reaction start temperature: 108 ° C.) manufactured by NOF Corporation. Percure HB indicates an organic peroxide (reaction start temperature 125 ° C.) manufactured by NOF Corporation. Park mill P represents an organic peroxide (reaction start temperature 149 ° C.) manufactured by NOF Corporation. The radical scavenger MEHQ (methylhydroquinone) is manufactured by Tokyo Chemical Industry Co., Ltd.
Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000004
Figure JPOXMLDOC01-appb-T000004
 実施例1~7の結果から、本発明の異方性導電フィルムは、配線の腐食を抑制でき、耐腐食性が良好であることが確認できた。
 上記評価中、腐食性又は接着性の評価に一つでも1の評価が入っているのは望ましくない。2より大きい評価になっている場合には、他の項目の評価結果との兼ね合いで総合評価する。腐食性又は接着性の評価が、3以上の評価になっていれば、実用上好ましい結果であるといえる。その結果、アニール処理しないでも腐食性がよく、接着性もよいという点で、実施例2がもっとも好ましい結果を示したといえる。
 また、実施例3は、アニール処理を施すことで、腐食性能を向上させることができる。アニール処理するという条件付きではあるが、実施例3も腐食性及び接着性ともに良好な結果を示すことが確認できた。
From the results of Examples 1 to 7, it was confirmed that the anisotropic conductive film of the present invention can suppress the corrosion of the wiring and has good corrosion resistance.
During the above evaluation, it is not desirable that at least one evaluation is included in the evaluation of corrosiveness or adhesiveness. If the evaluation is greater than 2, comprehensive evaluation is performed in consideration of the evaluation results of other items. If the evaluation of corrosivity or adhesiveness is an evaluation of 3 or more, it can be said that it is a practically preferable result. As a result, it can be said that Example 2 showed the most preferable result in terms of good corrosivity and good adhesion without annealing.
Moreover, Example 3 can improve corrosion performance by performing an annealing process. It was confirmed that Example 3 also showed good results in both corrosiveness and adhesiveness, although there was a condition of annealing treatment.
 本発明の異方性導電フィルムは、耐腐食性、及び接着性に優れた接合体の製造に好適に用いることができる。 The anisotropic conductive film of the present invention can be suitably used for production of a bonded body having excellent corrosion resistance and adhesiveness.

Claims (4)

  1.  第1の電子部品の端子と第2の電子部品の端子とを異方性導電接続させる異方性導電フィルムであって、
     前記異方性導電フィルムが、少なくとも導電性粒子、カチオン硬化性樹脂、カチオン系硬化剤、有機過酸化物、及びラジカル捕捉剤を含有し、
     前記有機過酸化物の反応開始温度が、前記カチオン系硬化剤の反応開始温度より高いことを特徴とする異方性導電フィルム。
    An anisotropic conductive film for anisotropic conductive connection between a terminal of a first electronic component and a terminal of a second electronic component,
    The anisotropic conductive film contains at least conductive particles, a cationic curable resin, a cationic curing agent, an organic peroxide, and a radical scavenger,
    An anisotropic conductive film, wherein the reaction start temperature of the organic peroxide is higher than the reaction start temperature of the cationic curing agent.
  2.  第1の電子部品の端子と第2の電子部品の端子とを異方性導電接続させる接続方法であって、
     前記第2の電子部品の端子上に請求項1に記載の異方性導電フィルムを配置する第1の配置工程と、
     前記異方性導電フィルム上に前記第1の電子部品を、前記第1の電子部品の端子が前記異方性導電フィルムと接するように配置する第2の配置工程と、
     前記第1の電子部品を加熱押圧部材により加熱及び押圧する加熱押圧工程、とを含むことを特徴とする接続方法。
    A method of connecting anisotropically conductively connecting a terminal of a first electronic component and a terminal of a second electronic component,
    A first disposing step of disposing the anisotropic conductive film according to claim 1 on a terminal of the second electronic component;
    A second disposing step of disposing the first electronic component on the anisotropic conductive film such that a terminal of the first electronic component is in contact with the anisotropic conductive film;
    A heating and pressing step of heating and pressing the first electronic component with a heating and pressing member.
  3.  前記加熱押圧工程後に、前記有機過酸化物の反応開始温度以上の温度で加熱する熱処理工程をさらに含む請求項2に記載の接続方法。 The connection method according to claim 2, further comprising a heat treatment step of heating at a temperature equal to or higher than a reaction start temperature of the organic peroxide after the heating and pressing step.
  4.  請求項2から3のいずれかに記載の接続方法により接続されたことを特徴とする接合体。 A joined body connected by the connection method according to any one of claims 2 to 3.
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