WO2016129270A1 - Électrode, son procédé de fabrication, écran tactile et élément d'éclairage électroluminescent organique pourvus chacun de ladite électrode - Google Patents

Électrode, son procédé de fabrication, écran tactile et élément d'éclairage électroluminescent organique pourvus chacun de ladite électrode Download PDF

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Publication number
WO2016129270A1
WO2016129270A1 PCT/JP2016/000673 JP2016000673W WO2016129270A1 WO 2016129270 A1 WO2016129270 A1 WO 2016129270A1 JP 2016000673 W JP2016000673 W JP 2016000673W WO 2016129270 A1 WO2016129270 A1 WO 2016129270A1
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metal nanowire
electrode
evaluation
layer
producing
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PCT/JP2016/000673
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English (en)
Japanese (ja)
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井上　純一
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デクセリアルズ株式会社
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/28—Processes for applying liquids or other fluent materials performed by transfer from the surfaces of elements carrying the liquid or other fluent material, e.g. brushes, pads, rollers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
    • B05D7/24—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials for applying particular liquids or other fluent materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41F—PRINTING MACHINES OR PRESSES
    • B41F3/00—Cylinder presses, i.e. presses essentially comprising at least one cylinder co-operating with at least one flat type-bed
    • B41F3/18—Cylinder presses, i.e. presses essentially comprising at least one cylinder co-operating with at least one flat type-bed of special construction or for particular purposes
    • B41F3/20—Cylinder presses, i.e. presses essentially comprising at least one cylinder co-operating with at least one flat type-bed of special construction or for particular purposes with fixed type-beds and travelling impression cylinders
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M1/00—Inking and printing with a printer's forme
    • B41M1/02—Letterpress printing, e.g. book printing
    • B41M1/04—Flexographic printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M1/00—Inking and printing with a printer's forme
    • B41M1/26—Printing on other surfaces than ordinary paper
    • B41M1/30—Printing on other surfaces than ordinary paper on organic plastics, horn or similar materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M1/00—Inking and printing with a printer's forme
    • B41M1/26—Printing on other surfaces than ordinary paper
    • B41M1/34—Printing on other surfaces than ordinary paper on glass or ceramic surfaces
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/52—Electrically conductive inks
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/16—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which all the silicon atoms are connected by linkages other than oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables

Definitions

  • the present invention relates to an electrode, a manufacturing method thereof, a touch panel including the electrode, and an organic EL lighting device, and more particularly, an electrode on which a metal nanowire layer including a metal nanowire is formed as a conductive film, a manufacturing method thereof, and the electrode.
  • the present invention relates to a touch panel and an organic EL lighting element.
  • Metal oxides such as indium tin oxide (ITO) have been used for transparent conductive films that require light transmission, such as transparent conductive films formed on plastic substrates.
  • a metal nanowire dispersion liquid is applied to the entire surface of the substrate using a die coater or the like ( Flat plate slit die coating), followed by a method of forming a circuit by exposure and development, etc.
  • a mask on which a pattern with openings is formed is placed on a substrate, and then metal nanowires are sprayed by spraying (spraying)
  • a method of performing application, etc. has been proposed (see, for example, Patent Document 3).
  • the metal nanowire dispersion liquid is applied to an extra place. In addition to being wasted, there was a problem that it took time and effort to remove the metal nanowire layer applied to an extra place.
  • the spray coating method can form a circuit only on a part of the base material, it is necessary to move the spray nozzle or the base material in the XY direction, which takes time. is there.
  • the application method by spray includes (i) the problem of nozzle clogging, (ii) the problem of troublesome cleaning, and (iii) the problem that the yield of the metal nanowire dispersion remains in the pipe after use, and the yield deteriorates. , Etc.
  • Patent Documents a method of applying a metal nanowire dispersion liquid to a part of a substrate by a printing method and then forming a circuit by exposure development or the like has been studied (for example, Patent Documents). 4, 5).
  • Patent Documents Patent Documents
  • the metal nanowire dispersion liquid has a low viscosity, it is difficult to apply it by ordinary screen printing or letterpress printing.
  • a thickener is added to the metal nanowire dispersion to increase the viscosity, coating by printing becomes possible, but the thickener that is a nonconductor remains in the coating after drying. There was a problem of hindering conductivity.
  • the present invention makes it a subject to solve the said various problems in the past and to achieve the following objectives. That is, the present invention provides an electrode capable of easily forming a low-resistance metal nanowire layer (conductive film) on only a part of a substrate, a method for manufacturing the electrode, a touch panel including the electrode, and an organic EL lighting element. The purpose is to provide.
  • the inventors of the present invention have a viscosity of the metal nanowire dispersion liquid of 40 mPa ⁇ s to 300 mPa ⁇ s, and a boiling point of 160 m in the metal nanowire dispersion liquid. It has been found that by containing 60% by mass or more of a main solvent having a temperature of not lower than ° C., a low-resistance metal nanowire layer (conductive film) can be easily formed only on a part of the substrate, and the present invention has been completed. It was.
  • the present invention is based on the above findings by the present inventors, and means for solving the above problems are as follows. That is, ⁇ 1> An application step of applying a metal nanowire dispersion liquid to a part of a base material by a flexographic printing method, and drying a dispersion film formed of the metal nanowire dispersion liquid formed on the base material.
  • a metal nanowire dispersion liquid having a low viscosity can be applied to a part of a substrate.
  • the viscosity of the nanowire dispersion liquid is 40 mPa ⁇ s (cp) to 300 mPa ⁇ s (cp)
  • a sufficient coating thickness can be obtained, and The resistance value can be reduced by reducing the variation in coating thickness.
  • the metal nanowire dispersion liquid contains the main solvent having a boiling point of 160 ° C.
  • electrode means “a structure including a base material and a metal nanowire layer formed on the base material”.
  • ⁇ 4> The method for producing an electrode according to any one of ⁇ 1> to ⁇ 3>, wherein the substrate is a polymer film having a glass transition temperature of 150 ° C. or higher.
  • the method for producing an electrode according to ⁇ 4> by making the base material a polymer film having a glass transition temperature of 150 ° C. or higher, deformation of the base material is suppressed, and unevenness in coating thickness is caused by the deformation. It is possible to prevent the occurrence of a high resistance portion.
  • the drying temperature it is necessary to set the drying temperature to a high temperature of about 150 ° C., for example. At that time, if the glass transition temperature is less than 150 ° C., the polymer film may be slightly deformed. Due to such deformation of the polymer film, there is a problem that unevenness occurs in the coating thickness and a high resistance portion may be generated. Here, if the drying temperature is lower than the glass transition temperature of the polymer film, the above problem does not occur, but the drying process takes time, which is not preferable for production. In addition, when flexibility is required, or when it is desired to reduce the thickness of the substrate, it is desirable to use a film-like substrate instead of a plate-like substrate.
  • a polymer film having a glass transition temperature of 150 ° C. or higher it is desirable to use a polymer film having a glass transition temperature of 150 ° C. or higher.
  • the base material is glass.
  • deformation of the base material is suppressed, and the deformation causes unevenness in the coating thickness, resulting in a high resistance portion. Can be prevented.
  • the base material is made of a material with high heat resistance such as glass, quartz, sapphire, etc. Good.
  • the method for producing an electrode according to ⁇ 6> by forming the metal nanowire layer on the anchor layer, the adhesion between the substrate and the electrode is improved, and an electrode having excellent durability is obtained. Can do.
  • polysilazane is applied on the base material, and the applied polysilazane is reacted to form the anchor layer on the base material. It is a manufacturing method of this electrode.
  • the method for producing an electrode according to ⁇ 7> by applying polysilazane on the base material and reacting the applied polysilazane to form the anchor layer on the base material, The adhesion between the material and the metal nanowire layer can be improved. Polysilazane is particularly preferable because it has excellent adhesion to glass and organic matter. ⁇ 8> In the metal nanowire layer forming step, when the reaction rate of polysilazane in the anchor layer is 50% to 95%, the metal nanowire layer is formed on the anchor layer, ⁇ 7> It is a manufacturing method of the electrode as described in above.
  • ⁇ 10> The method for producing an electrode according to any one of ⁇ 1> to ⁇ 9>, wherein the number of anilox rolls used in the flexographic printing method is 150 lines / inch to 400 lines / inch.
  • the resistance value of the produced electrode is increased by setting the number of wires of the anilox roll used in the flexographic printing method to 150 lines / inch to 400 lines / inch. Can be prevented.
  • the number of lines of the anilox roll is less than 150 lines / inch, the coating amount is small and the resistance value increases, and if it is more than 400 lines / inch, the coating amount is too large and uneven coating occurs. The resistance value increases.
  • ⁇ 11> The method for producing an electrode according to any one of ⁇ 1> to ⁇ 10>, wherein a printing speed in the flexographic printing method is 5 m / min to 30 m / min.
  • a printing speed in the flexographic printing method is 5 m / min to 30 m / min.
  • the printing speed in the flexographic printing method is 5 m / min to 30 m / min.
  • the printing speed in the flexographic printing method is less than 5 m / min, drying of the solvent proceeds on the roll, coating unevenness occurs, the resistance value increases partially, and if it is greater than 30 m / min, the transfer time is sufficient. However, uneven coating occurs, and the resistance value partially increases.
  • ⁇ 12> The method for producing an electrode according to any one of ⁇ 1> to ⁇ 11>, wherein the metal nanowire is a silver nanowire.
  • the electrode can have a low resistance.
  • ⁇ 14> A touch panel comprising the electrode according to ⁇ 13>.
  • ⁇ 15> An organic EL lighting device comprising the electrode according to ⁇ 13>.
  • the said various problems in the past are solved, the low resistance metal nanowire layer (conductive film) can be easily formed only in a part of base material, its manufacturing method, and the said electrode It is possible to provide a touch panel and an organic EL lighting element including According to the present invention, not printing on the entire surface of the substrate (solid coating) but printing on a part of the substrate (spot application is possible), so a rough electrode of the order of several hundred ⁇ m If there is, the electrode can be formed as it is without etching by exposure development or the like (direct printing becomes possible).
  • FIG. 1 is a schematic diagram for explaining a flexographic printing method used in a coating process in an electrode manufacturing method according to an embodiment of the present invention.
  • FIG. 2 is a schematic diagram of a touch panel according to an embodiment of the present invention.
  • FIG. 3 is a schematic diagram of an organic EL lighting element according to an embodiment of the present invention.
  • the electrode manufacturing method of the present invention includes at least an application step and a metal nanowire layer formation step, and further includes an anchor layer formation step, an overcoat layer formation step, and other steps, which are appropriately selected as necessary. Including.
  • the application step is a step of applying the metal nanowire dispersion liquid to a part of the substrate by a flexographic printing method.
  • the transparent base material which consists of material which has transparency with respect to visible light, such as an inorganic material and a plastic material, is preferable.
  • the transparent substrate has a film thickness required for a transparent electrode having a transparent conductive film.
  • the film is formed into a film (sheet) thinned to such an extent that flexible flexibility can be realized, or an appropriate amount. It can be made into the flat form which has a film thickness of the grade which can implement
  • limiting in particular as said inorganic material According to the objective, it can select suitably, For example, quartz, sapphire, glass, etc. are mentioned.
  • glass is preferable in that the deformation of the base material can be suppressed and unevenness in the coating thickness can be prevented by the deformation, thereby preventing the generation of a high resistance portion.
  • plastic material there is no restriction
  • TAC triacetyl cellulose
  • TPEE
  • a high glass transition temperature of 150 ° C. or higher is possible in that the deformation of the polymer film can be suppressed and unevenness in the coating thickness caused by the deformation can be prevented, thereby producing a high resistance portion.
  • Molecular films for example, polyethylene naphthalate (PEN, glass transition temperature 155 ° C.), polyimide film (PI, Upilex S, Ube Industries, Ltd., glass transition temperature 359 ° C.) are preferable.
  • the film thickness of the transparent substrate is preferably 5 ⁇ m to 500 ⁇ m from the viewpoint of productivity, but is not particularly limited to this range.
  • the film thickness of a transparent base material can be measured in MD direction (flow direction) and TD direction (perpendicular to a flow) using a micro gauge.
  • the metal nanowire dispersion liquid contains at least metal nanowires and a main solvent, and, if necessary, water, a secondary solvent, carbon nanotubes, a transparent resin material (binder), a dispersant, and other components. , Etc.
  • a metal nanowire dispersion having a low viscosity of less than 20 mPa ⁇ s it is preferable to use a metal nanowire dispersion having a low viscosity of less than 20 mPa ⁇ s.
  • a low-viscosity metal nanowire dispersion is used in flexographic printing, uneven coating in the running direction often becomes a problem.
  • a uniform printed film can be formed without the printed film repelling or uneven due to bias.
  • a metal nanowire dispersion liquid having a composition with a high boiling point solvent having a boiling point of 160 ° C. or higher.
  • the dispersion method of the metal nanowire dispersion is not particularly limited and can be appropriately selected depending on the purpose.For example, stirring, ultrasonic dispersion, bead dispersion, kneading, homogenizer treatment, pressure dispersion treatment, Etc. are preferable.
  • the viscosity of the metal nanowire dispersion is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 40 mPa ⁇ s to 300 mPa ⁇ s, more preferably 60 mPa ⁇ s to 200 mPa ⁇ s.
  • a sufficient coating thickness may not be obtained, or the coating thickness may vary widely, resulting in an increase in resistance value. -If it exceeds s, the coating thickness variation will increase and the resistance value may increase.
  • the metal nanowire is composed of a metal and is a fine wire having a diameter on the order of nm, and has an aspect ratio of 1: 100 or more.
  • the aspect ratio is not particularly limited as long as it is 1: 100 or more, and can be appropriately selected according to the purpose. However, it is preferably 1: 500 or more from the viewpoint of forming a conductive film network.
  • metal nanowires are used in the electrode manufacturing method of the present invention.
  • the constituent element of the metal nanowire is not particularly limited as long as it is a metal element, and can be appropriately selected according to the purpose.
  • a metal element for example, Ag, Au, Ni, Cu, Pd, Pt, Rh, Ir, Examples include Ru, Os, Fe, Co, Sn, Al, Tl, Zn, Nb, Ti, In, W, Mo, Cr, Fe, V, Ta, and the like. These may be used individually by 1 type and may use 2 or more types together. Among these, Ag is preferable in terms of low resistance and high conductivity. Moreover, it is also possible to use the carbon nanotube mentioned later instead of metal nanowire.
  • the average minor axis diameter of the metal nanowire is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably more than 1 nm and not more than 500 nm, and more preferably 10 nm to 100 nm.
  • the average minor axis diameter of the metal nanowire is 1 nm or less, the conductivity of the metal nanowire deteriorates, and the transparent conductive film containing the metal nanowire may not function as a conductive film. If it exceeds, the total light transmittance and haze of the transparent conductive film containing the metal nanowires may deteriorate.
  • the average minor axis diameter of the metal nanowire is within the more preferable range, it is advantageous in that the transparent conductive film including the metal nanowire has high conductivity and high transparency.
  • the average major axis length of the metal nanowire is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 1 ⁇ m to 1000 ⁇ m, and more preferably 1 ⁇ m to 100 ⁇ m.
  • the metal nanowires are not easily connected to each other, and the transparent conductive film containing the metal nanowires may not function as a conductive film.
  • the total light transmittance and haze of the transparent conductive film containing the metal nanowire may deteriorate, or the dispersibility of the metal nanowire in the metal nanowire dispersion used when forming the transparent conductive film may deteriorate. is there.
  • the metal nanowire may have a wire shape in which metal nanoparticles are connected in a bead shape.
  • the length of the metal nanowire is not limited.
  • the weight per unit area of the metal nanowires is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 0.001g / m 2 ⁇ 1.000g / m 2, 0.003g / m 2 ⁇ 0.3 g / m 2 is more preferable.
  • the basis weight of the metal nanowire is less than 0.001 g / m 2 , the metal nanowire is not sufficiently present in the metal nanowire layer, and the conductivity of the transparent conductive film may be deteriorated. If it exceeds .000 g / m 2 , the total light transmittance and haze of the transparent conductive film may deteriorate.
  • the basis weight of the metal nanowire is within the more preferable range, it is advantageous in that the conductivity of the transparent conductive film is high and the transparency is high.
  • the metal nanowire network means a network structure formed by connecting a plurality of metal nanowires to each other in a network.
  • the said metal nanowire network is formed by passing through the pressurization process mentioned later.
  • the main solvent is not particularly limited as long as the boiling point is 160 ° C. or higher, and can be appropriately selected according to the purpose.
  • ethyl carbitol (boiling point 202 ° C.), diacetone alcohol (boiling point 168 ° C.) , Diethylene glycol (boiling point 244 ° C.), triethylene glycol (boiling point 287 ° C.), dibutyl phthalate (boiling point 340 ° C.), butyl cellosolve (boiling point 171 ° C.), cyclohexanol (boiling point 161 ° C.), and the like.
  • ethyl carbitol (boiling point 202 ° C.), diethylene glycol (boiling point 244 ° C.), and triethylene glycol (boiling point 287 ° C.) having a boiling point of 200 ° C. or more and less than 300 ° C.
  • ethyl carbitol (boiling point 202 ° C.)
  • diethylene glycol (boiling point 244 ° C.)
  • triethylene glycol (boiling point 287 ° C.) having a boiling point of 200 ° C. or more and less than 300 ° C.
  • the boiling point of the main solvent is 160 ° C. or higher, the metal nanowire dispersion liquid can be applied to a part of the substrate, but if it is 200 ° C. or higher, coating unevenness due to drying is further suppressed.
  • the main solvent in the said metal nanowire dispersion liquid As content of the main solvent in the said metal nanowire dispersion liquid, as long as it is 60 mass% or more, there is no restriction
  • the content of the main solvent in the metal nanowire dispersion liquid is 60% by mass or more, the metal nanowire dispersion liquid can be applied to a part of the substrate, and on the roll at the time of printing. It is possible to prevent drying unevenness by slowing drying.
  • “coating unevenness” is a local film thickness difference, and a portion with a low film thickness tends to have poor conduction or high resistance. Since content of the main solvent in the said metal nanowire dispersion liquid exists in a preferable range or a more preferable range, since it can be made uniform thickness, the electrode excellent in electroconductivity can be obtained.
  • auxiliary solvent is not particularly limited and may be appropriately selected depending on the intended purpose. Examples thereof include ethanol (boiling point 78 ° C.), isopropanol (boiling point 82 ° C.), methyl isobutyl ketone boiling point 116 ° C.), ethyl lactate (boiling point). 155 ° C.), isobutyl alcohol (boiling point 108 ° C.), toluene (boiling point 111 ° C.), and the like.
  • combined by the conventional synthesis method may be sufficient, and a commercially available thing may be used.
  • combining method of the said carbon nanotube According to the objective, it can select suitably, For example, an arc discharge method, a laser evaporation method, a thermal CVD method etc. are mentioned.
  • limiting in particular as said carbon nanotube According to the objective, it can select suitably, A single-walled carbon nanotube (SWNT) may be sufficient, and a multi-walled carbon nanotube (MWNT) may be sufficient. However, the single-walled carbon nanotube is preferable.
  • the carbon nanotube may be a mixture of metallic and semiconducting carbon nanotubes, or may be a selectively separated semiconducting carbon nanotube.
  • Carbon nanotube network-- The carbon nanotube network means a network structure formed by connecting a plurality of carbon nanotubes in a network.
  • the carbon nanotube network is formed through a pressure treatment described later.
  • the transparent resin material (binder) is for dispersing the metal nanowires and / or the carbon nanotubes.
  • transparent resin material (binder) There is no restriction
  • the thermoplastic resin is not particularly limited and may be appropriately selected depending on the intended purpose.
  • thermosetting (photo) curable resin is not particularly limited and may be appropriately selected depending on the intended purpose. Examples thereof include silicon resins such as melamine acrylate, urethane acrylate, isocyanate, epoxy resin, polyimide resin, and acrylic-modified silicate. And a polymer in which a photosensitive group such as an azide group or a diazirine group is introduced into at least one of a main chain and a side chain.
  • the dispersant is not particularly limited and may be appropriately selected depending on the intended purpose. Examples thereof include polyvinyl pyrrolidone (PVP); amino group-containing compounds such as polyethyleneimine; sulfo groups (including sulfonates) and sulfonyl groups.
  • PVP polyvinyl pyrrolidone
  • amino group-containing compounds such as polyethyleneimine
  • sulfo groups including sulfonates
  • the dispersing agent when added to the metal nanowire dispersion liquid, it is preferable to add the dispersing agent so that the conductivity of the finally obtained conductive film does not deteriorate.
  • the said dispersing agent can be made to adsorb
  • the other components are not particularly limited and may be appropriately selected depending on the purpose.
  • a leveling agent e.g., a surfactant, a viscosity modifier, a curing accelerator catalyst, plasticity, an antioxidant, an antioxidant, and the like.
  • Stabilizers e.g., sodium tartrate, sodium tartrate, sodium tartrate, sodium tartrate, sodium tartrate, sodium tartrate, sodium tartrate, sodium tartrate, sodium tartrate, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium metabisulfite, sodium
  • FIG. 1 is a schematic diagram for explaining a flexographic printing method used in a coating process in an electrode manufacturing method according to an embodiment of the present invention.
  • the flexographic printing method uses a doctor blade 1 to fill an ink 2 with an anilox roll (metal roll) 3, and ink is applied to a flexographic resin plate 5 formed on a plate cylinder 4. 2 is transferred and printed on a substrate 7 on a printing stage (thick cylinder) 6.
  • the printing speed in the flexographic printing method is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 5 m / min to 30 m / min, and more preferably 10 m / min to 20 m / min.
  • the printing speed is less than 5 m / min, the appearance of the printed film may be deteriorated due to uneven printing, and when it exceeds 30 m / min, the ink transfer is insufficient and a uniform film thickness cannot be obtained. There is.
  • the printing speed is within the more preferable range, a uniform thickness can be obtained, which is advantageous in terms of forming an electrode film having excellent conductivity.
  • the number of lines of the anilox roll used in the flexographic printing method is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 150 lines / inch to 400 lines / inch, and 200 lines / inch to 350 Line / inch is more preferred. If the number of lines of the anilox roll is less than 150 lines / inch, the resolution may be low, and the amount of ink supplied to the printing plate may be uneven. Since the resolution increases depending on the pattern shape, the amount of ink supplied to the printing plate may be reduced. On the other hand, if the number of lines of the anilox roll is within the more preferable range, it is advantageous in that an appropriate printing effect can be obtained because the supplied ink can be delivered to the printing plate after being uniformly and quantitatively received. is there.
  • the said metal nanowire layer formation process is a process of drying the dispersion film which consists of a metal nanowire dispersion liquid formed on the said base material, and forming a metal nanowire layer on the said base material.
  • the heating temperature in the drying is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 100 ° C to 200 ° C, more preferably 120 ° C to 180 ° C, and particularly preferably about 150 ° C. If the heating temperature in the drying is less than 100 ° C., the time required for drying may become long and workability may deteriorate, and if it exceeds 200 ° C., it is based on the glass transition temperature (Tg) of the substrate. The material may be distorted. On the other hand, when the heating temperature is within the more preferable range or the particularly preferable range, it is advantageous in terms of forming a network of metal nanowires.
  • the heating time in the drying is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 1 minute to 30 minutes, more preferably 2 minutes to 10 minutes, and particularly preferably about 5 minutes. If the heating time in the drying is less than 1 minute, the solvent may not be sufficiently removed, and if it exceeds 30 minutes, workability and electrode productivity may be deteriorated. On the other hand, when the heating time is within the more preferable range or the particularly preferable range, it is advantageous in terms of network formation of metal nanowires, workability, and electrode productivity.
  • the metal nanowire layer is formed using a metal nanowire dispersion, and the metal nanowire dispersion is as described above.
  • the metal nanowire, the main solvent, water, the secondary solvent, the carbon nanotube, the transparent resin material (binder), the dispersant, and other components that can be contained in the metal nanowire dispersion are all metal nanowire dispersions. As described above.
  • the resistance value of the metal nanowire layer is measured in the MD direction (flow direction) and the TD direction (perpendicular to the flow) by using a resistivity meter EC-80P to bring the measurement probe into contact with the surface of the metal nanowire layer. It can be measured every 20 mm. Usually, 20 points or more are measured.
  • the thickness of the metal nanowire layer is not particularly limited and may be appropriately selected depending on the intended purpose.
  • the wet thickness of the dispersion film is preferably 3 ⁇ m to 20 ⁇ m, and more preferably 5 ⁇ m to 15 ⁇ m. If the dispersion film has a wet thickness of less than 3 ⁇ m, it may be difficult to form a metal nanowire layer. If the thickness of the dispersion film exceeds 20 ⁇ m, the distribution of the surface resistance of the transparent conductive film obtained may be uneven. is there. On the other hand, when the wet thickness of the dispersion film is within the more preferable range, it is advantageous in terms of good formation of the dispersion film and uniformity of the surface resistance distribution of the transparent conductive film obtained.
  • the anchor layer forming step is a step of forming an anchor layer on the base material.
  • the method for manufacturing an electrode of the present invention further includes the anchor layer forming step, the metal nanowire layer is formed on the anchor layer.
  • the layer for example, layer formed using the compound etc. which contain Si atom and organic substance simultaneously in a molecule
  • the thickness of the anchor layer is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 0.001 ⁇ m to 5 ⁇ m, and more preferably 0.01 ⁇ m to 1 ⁇ m. If the thickness of the anchor layer is less than 0.001 ⁇ m, poor adhesion between the substrate and the metal nanowire layer may occur. If the thickness exceeds 5 ⁇ m, the optical properties such as chromaticity and total light transmittance of the electrode film A characteristic defect may occur in the characteristic.
  • the thickness of the anchor layer is within the more preferable range, it is advantageous in terms of adhesion and optical characteristics. Due to the barrier film performance of the polysilazane film as the anchor layer, deterioration of the electrode over time can be reduced.
  • the polysilazane is particularly excellent in adhesion to glass and organic matter, it is preferably used as an anchor layer component.
  • the weight average molecular weight of the polysilazane is not particularly limited and may be appropriately selected depending on the intended purpose, but is preferably 500 to 5000. There is no restriction
  • the perhydropolysilazane is represented by the following formula (1) (n represents an arbitrary integer) and reacts with moisture in the atmosphere to be converted into silica glass (see the following reaction formula (2)).
  • the reaction rate of polysilazane in the anchor layer at the time of forming the metal nanowire layer on the anchor layer is not particularly limited and can be appropriately selected according to the purpose, but is preferably 50% to 95%, 70% to 95% is more preferable, and 82.5% to 87.5% is particularly preferable.
  • the reaction rate is less than 50%, the solvent resistance may be inferior, and when it exceeds 95%, the anchor layer has almost the same structure as glass, so the adhesion of the metal nanowires may be inferior. is there.
  • the reaction rate is within the more preferable range or the particularly preferable range, it is advantageous in terms of solvent resistance and adhesion.
  • the reaction rate of polysilazane in the anchor layer is a ratio (%) calculated using an infrared spectroscopy (IR) spectrum of a sample to be measured.
  • IR infrared spectroscopy
  • the anchor layer becomes a so-called primer layer, and the intermediate layer between the base material and the metal nanowire layer can improve adhesion.
  • the anchor layer desirably has good adhesion to both the metal nanowire layer and the transparent substrate.
  • a compound containing Si atoms and organic substances in the molecule can be used.
  • the method for forming the anchor layer on the substrate is not particularly limited and may be appropriately selected depending on the intended purpose. For example, letterpress printing, flexographic printing, screen printing, slit die coating, spray coating, dipping The existing coating methods such as the method are listed. By using such a printing method, an anchor layer can be formed on only a part of the substrate in a short time.
  • a specific example of the method for forming the anchor layer on the substrate is not particularly limited and may be appropriately selected depending on the purpose.
  • polysilazane is applied on the substrate, and the coating is applied. Examples include a method of reacting polysilazane to form an anchor layer on the substrate.
  • the overcoat layer may be formed of an existing substance for the purpose of protecting the formed electrode.
  • the overcoat layer may be formed of an existing substance for the purpose of protecting the formed electrode.
  • the liquid containing an acrylate monomer on the said metal nanowire layer and a method of forming the overcoat layer on the metal nanowire layer by applying a material and curing the applied liquid material.
  • the curable material is not particularly limited as long as it can form a crosslinked structure, and can be appropriately selected according to the purpose, but from the viewpoint of transparency, fast curability, solvent resistance, environmental resistance test, Acrylic polymerized materials are preferred, and in particular from the viewpoint of improving solvent resistance and environmental resistance tests, polyfunctional acrylic monomer-containing materials are more preferred.
  • the curing reaction system of the curing material may be either thermal curing or photocuring, but a photocuring system is preferable in that there is little thermal damage to the member.
  • the electrode of the present invention is an electrode manufactured by the manufacturing method of the present invention, and has at least a base material and a metal nanowire layer formed on the base material. It has a member.
  • the base material and the metal nanowire layer are as described above. There is no restriction
  • FIG. 2 is a schematic diagram of a touch panel according to an embodiment of the present invention.
  • the touch panel 200 is formed on the image display member 11 having the electrode of the present invention, the light transmissive cured resin layer 12 formed on the image display member 11, and the light transmissive cured resin layer 12.
  • a light transmissive cover member 14 and a light shielding layer 13 interposed between the light transmissive cured resin layer 12 and the light transmissive cover member 14 are provided.
  • FIG. 3 is a schematic diagram of an organic EL lighting element according to an embodiment of the present invention.
  • an organic EL lighting element 300 of the present invention includes a base material 21 made of glass or the like, an anode 22 formed on the surface of the base material 21, and an organic light emitting layer 23 formed on the surface of the anode 22.
  • An adhesive 27 that bonds the base material 21 and the periphery of the sealing material 25 is provided.
  • the base material 21 and the anode 22 constitute an electrode of the present invention.
  • a silver nanowire ink (metal nanowire dispersion) was prepared with the following composition.
  • Metal nanowire Silver nanowire (manufactured by BlueNano, SLV-NW-35, average diameter 35 nm (manufacturer value), average length 10 ⁇ m (manufacturer value)): compounding amount 0.500 parts by mass
  • binder Hydroxypropyl methylcellulose (manufactured by Aldrich Co., Ltd., 2% aqueous solution with a viscosity of 2600 cP to 5600 cP at 20 ° C.): Blending amount 0.500 parts by mass
  • Thickener A-20L (Toagosei Co., Ltd.): Blending amount 0.005 parts by mass
  • Surfactant Triton X100 (manufactured by Aldrich Corporation): blending amount 0.005 parts by weight (5) Main solvent
  • ⁇ Preparation of silver nanowire transparent conductive film The prepared silver nanowire ink (dispersion) is printed on a PEN film (made by Teijin DuPont Films, trade name: “Q65HA”, thickness 125 um) as a base material using a flexographic printing apparatus (FIG. 1). Then, a transparent conductive film was produced, and then dried at 150 ° C./10 minutes in a clean oven.
  • the printing conditions were as follows. (1) Number of lines of anilox roll: 180 lines / inch (2) Printing speed: 15 m / min (3) Printing push-in amount: 0.15 mm
  • the resistance value of the silver nanowire transparent conductive film was measured as follows. A measurement probe of a manual nondestructive resistance measuring device (EC-80P, manufactured by Napson Co., Ltd.) is brought into contact with the surface of the silver nanowire transparent conductive film, and a predetermined area (100 mm) on the surface of the transparent conductive film (silver nanowire layer) For 2 ), after measuring every 20 mm, the average value ave and the in-plane distribution ⁇ were calculated from the measured values. The calculation results are shown in Table 1. ⁇ Evaluation of in-plane distribution ⁇ >> The in-plane distribution ⁇ of the resistance value calculated as described above was evaluated in four stages. The evaluation results are shown in Table 1.
  • Example 1 In Comparative Example 1, a transparent electrode was prepared in the same manner as in Comparative Example 1, except that a silver nanowire ink having a viscosity of 41 mPa ⁇ s was used instead of using a silver nanowire ink having a viscosity of 29 mPa ⁇ s.
  • the produced transparent electrode was subjected to measurement of resistance value, evaluation of in-plane distribution ⁇ , environmental test (evaluation of resistance value change), and evaluation of printed film appearance. The evaluation results are shown in Table 1.
  • Example 2 In Comparative Example 1, a transparent electrode was prepared in the same manner as in Comparative Example 1, except that a silver nanowire ink with a viscosity of 96 mPa ⁇ s was used instead of using a silver nanowire ink with a viscosity of 29 mPa ⁇ s.
  • the produced transparent electrode was subjected to measurement of resistance value, evaluation of in-plane distribution ⁇ , environmental test (evaluation of resistance value change), and evaluation of printed film appearance. The evaluation results are shown in Table 1.
  • Example 3 In Comparative Example 1, a transparent electrode was prepared in the same manner as in Comparative Example 1, except that a silver nanowire ink having a viscosity of 150 mPa ⁇ s was used instead of using a silver nanowire ink having a viscosity of 29 mPa ⁇ s.
  • the produced transparent electrode was subjected to measurement of resistance value, evaluation of in-plane distribution ⁇ , environmental test (evaluation of resistance value change), and evaluation of printed film appearance. The evaluation results are shown in Table 1.
  • ⁇ Preparation of silver nanowire ink> A silver nanowire ink was prepared with the following composition.
  • Metal nanowire Silver nanowire (manufactured by Blue Nano, SLV-NW-35, average minor axis diameter 15 nm (manufacturer value), average major axis length 35 ⁇ m (manufacturer value)): compounding amount 0.20 part by mass
  • Binder Hydroxypropyl methylcellulose (manufactured by Aldrich, viscosity 2600 cP to 5,600 cP (reference value) of 2% aqueous solution at 20 ° C.): blending amount 0.25 part by mass
  • Thickener thickening Agent (manufactured by Toa Gosei Co., Ltd., A-7185): 0.15 parts by mass of compound (4)
  • Solvent ethyl carbitol: 99.40 parts by mass of compound
  • Example 4 In Comparative Example 1, a transparent electrode was prepared in the same manner as in Comparative Example 1, except that a silver nanowire ink with a viscosity of 295 mPa ⁇ s was used instead of using a silver nanowire ink with a viscosity of 29 mPa ⁇ s.
  • the produced transparent electrode was subjected to measurement of resistance value, evaluation of in-plane distribution ⁇ , environmental test (evaluation of resistance value change), and evaluation of printed film appearance. The evaluation results are shown in Table 1.
  • Comparative Example 2 In Comparative Example 1, a transparent electrode was prepared in the same manner as in Comparative Example 1, except that a silver nanowire ink having a viscosity of 421 mPa ⁇ s was used instead of using a silver nanowire ink having a viscosity of 29 mPa ⁇ s.
  • the produced transparent electrode was subjected to measurement of resistance value, evaluation of in-plane distribution ⁇ , environmental test (evaluation of resistance value change), and evaluation of printed film appearance. The evaluation results are shown in Table 1.
  • Example 3 a transparent electrode was produced and produced in the same manner as in Example 3 except that ethanol (boiling point 78 ° C.) was used instead of ethyl carbitol (boiling point 202 ° C.) as the main solvent.
  • the transparent electrode was subjected to measurement of resistance value, evaluation of in-plane distribution ⁇ , environmental test (evaluation of resistance value change), and evaluation of printed film appearance. The evaluation results are shown in Table 1.
  • Example 4 a transparent electrode was produced and produced in the same manner as in Example 3 except that isopropanol (boiling point 82 ° C.) was used instead of ethyl carbitol (boiling point 202 ° C.) as the main solvent.
  • the transparent electrode was subjected to measurement of resistance value, evaluation of in-plane distribution ⁇ , environmental test (evaluation of resistance value change), and evaluation of printed film appearance. The evaluation results are shown in Table 1.
  • Example 5 a transparent electrode was prepared in the same manner as in Example 3 except that methyl isobutyl ketone (boiling point 116 ° C.) was used instead of ethyl carbitol (boiling point 202 ° C.) as the main solvent.
  • the produced transparent electrode was subjected to measurement of resistance value, evaluation of in-plane distribution ⁇ , environmental test (evaluation of resistance value change), and evaluation of printed film appearance. The evaluation results are shown in Table 1.
  • Example 6 (Comparative Example 6) In Example 3, instead of using ethyl carbitol (boiling point 202 ° C.) as the main solvent, a transparent electrode was produced in the same manner as in Example 3, except that ethyl lactate (boiling point 155 ° C.) was used. The produced transparent electrode was subjected to measurement of resistance value, evaluation of in-plane distribution ⁇ , environmental test (evaluation of resistance value change), and evaluation of printed film appearance. The evaluation results are shown in Table 1.
  • Example 5 a transparent electrode was prepared in the same manner as in Example 3 except that diacetone alcohol (boiling point 168 ° C.) was used instead of ethyl carbitol (boiling point 202 ° C.) as the main solvent.
  • the produced transparent electrode was subjected to measurement of resistance value, evaluation of in-plane distribution ⁇ , environmental test (evaluation of resistance value change), and evaluation of printed film appearance. The evaluation results are shown in Table 1.
  • Example 6 a transparent electrode was produced in the same manner as in Example 3 except that diethylene glycol (boiling point 244 ° C.) was used instead of ethyl carbitol (boiling point 202 ° C.) as the main solvent.
  • the transparent electrode was subjected to measurement of resistance value, evaluation of in-plane distribution ⁇ , environmental test (evaluation of resistance value change), and evaluation of printed film appearance. The evaluation results are shown in Table 1.
  • Example 7 a transparent electrode was produced in the same manner as in Example 3 except that triethylene glycol (boiling point 287 ° C.) was used instead of ethyl carbitol (boiling point 202 ° C.) as the main solvent.
  • the produced transparent electrode was subjected to measurement of resistance value, evaluation of in-plane distribution ⁇ , environmental test (evaluation of resistance value change), and evaluation of printed film appearance. The evaluation results are shown in Table 1.
  • Example 7 In Example 3, instead of using the flexographic printing method by the flexographic printing apparatus (FIG. 1), a transparent electrode was produced in the same manner as in Example 3 except that the following screen printing method was used. The electrode was subjected to measurement of resistance value, evaluation of in-plane distribution ⁇ , environmental test (evaluation of resistance value change), and evaluation of printed film appearance. The evaluation results are shown in Table 2.
  • Example 8 In Example 3, a transparent electrode was produced in the same manner as in Example 3 except that instead of using ethyl carbitol (boiling point 202 ° C.) as the main solvent, dibutyl phthalate (boiling point 340 ° C.) was used.
  • the produced transparent electrode was subjected to measurement of resistance value, evaluation of in-plane distribution ⁇ , environmental test (evaluation of resistance value change), and evaluation of printed film appearance. The evaluation results are shown in Table 2.
  • Example 3 In Example 3, instead of using only ethyl carbitol (boiling point 202 ° C.) (ethyl carbitol 100 mass%) as a solvent, ethyl carbitol 50 mass% and methyl isobutyl ketone (boiling point 116 ° C.) 50 mass% A transparent electrode was produced in the same manner as in Example 3 except that a mixed solvent was used. For the produced transparent electrode, measurement of resistance value, evaluation of in-plane distribution ⁇ , environmental test (evaluation of change in resistance value) And the appearance of the printed film was evaluated. The evaluation results are shown in Table 2.
  • Example 9 In Example 3, instead of using only ethyl carbitol (boiling point 202 ° C.) (ethyl carbitol 100% by mass) as the solvent, 60% by mass of ethyl carbitol as the main solvent and methyl isobutyl ketone (boiling point) as the auxiliary solvent 116 ° C.) A transparent electrode was produced in the same manner as in Example 3 except that a mixed solvent of 40% by mass was used. For the produced transparent electrode, measurement of resistance value, evaluation of in-plane distribution ⁇ , environment The test (evaluation of resistance change) and the appearance of the printed film were evaluated. The evaluation results are shown in Table 2.
  • Example 3 a transparent electrode was produced in the same manner as in Example 3 except that pure water was used instead of ethyl carbitol (boiling point 202 ° C.) as the main solvent. The resistance value was measured, the in-plane distribution ⁇ was evaluated, the environmental test (evaluation of change in resistance value), and the printed film appearance was evaluated. The evaluation results are shown in Table 2.
  • Example 10 Comparative Example 10
  • ethyl carbitol (boiling point 202 ° C.) (ethyl carbitol 100% by mass)
  • a mixed solvent of ethyl carbitol 50% by mass and pure water 50% by mass was used. Except for the above, a transparent electrode was produced in the same manner as in Example 3. For the produced transparent electrode, measurement of resistance value, evaluation of in-plane distribution ⁇ , environmental test (evaluation of resistance value change), and printed film appearance Evaluation was performed. The evaluation results are shown in Table 2.
  • Example 10 In Example 3, instead of using only ethyl carbitol (boiling point 202 ° C.) (ethyl carbitol 100% by mass) as a solvent, a mixed solvent of 70% by mass of ethyl carbitol and 30% by mass of pure water was used. Except for the above, a transparent electrode was produced in the same manner as in Example 3. For the produced transparent electrode, measurement of resistance value, evaluation of in-plane distribution ⁇ , environmental test (evaluation of resistance value change), and printed film appearance Evaluation was performed. The evaluation results are shown in Table 2.
  • Example 11 In Example 3, instead of using a PEN film (manufactured by Teijin DuPont Film Co., Ltd., trade name: “Q65HA”, thickness 125 um) as a base material, a PET film (trade name: “Lumirror U34” manufactured by Toray Industries, Inc.) A transparent electrode was produced in the same manner as in Example 3 except that a thickness of 125 um) was used, and for the produced transparent electrode, resistance value measurement, in-plane distribution ⁇ evaluation, environmental test (resistance value change evaluation) ) And the appearance of the printed film were evaluated. The evaluation results are shown in Table 2.
  • Example 12 In Example 3, instead of using a PEN film (manufactured by Teijin DuPont Film Co., Ltd., trade name: “Q65HA”, thickness 125 ⁇ m) as a base material, a glass plate (manufactured by Nippon Electric Glass Co., Ltd., trade name: “no alkali” A transparent electrode was prepared in the same manner as in Example 3 except that “Glass OA-10G” and a thickness of 700 ⁇ m) was used. (Evaluation of resistance change) and appearance of the printed film were evaluated. The evaluation results are shown in Table 2.
  • Example 13 In Example 3, instead of printing on the PEN film, the transparent electrode was formed in the same manner as in Example 3 except that an anchor layer was formed on the PEN film by the following method and printed on the anchor layer. The produced transparent electrode was subjected to measurement of resistance value, evaluation of in-plane distribution ⁇ , environmental test (evaluation of change in resistance value), and evaluation of printed film appearance. The evaluation results are shown in Table 2.
  • Perhydropolysilazane (NN120A manufactured by AZ Electronic Materials) is applied on a PEN film (manufactured by Teijin DuPont Films, trade name: “Q65HA”, thickness 125 ⁇ m) by spin coating (1,000 rpm / 20 seconds). After that, baking was performed at 100 ° C. for 30 seconds to form a perhydropolysilazane film (anchor layer). When the reaction rate of the perhydropolysilazane (anchor layer reaction rate) is 60%, the silver nanowire ink was applied by spin coating (700 rpm / 20 seconds) and then baked at 120 ° C. for 2 minutes to produce silver nanowires.
  • the anchor layer reaction rate is a ratio (%) calculated by using an infrared spectroscopy (IR) spectrum of a sample to be measured, and an absorption peak of the Si—N group of perhydropolysilazane in the anchor layer before the reaction. Is the ratio of the height of the absorption peak of the Si—N group of perhydropolysilazane in the anchor layer after the reaction when the height is 100%.
  • IR infrared spectroscopy
  • Example 14 In Example 13, instead of applying the silver nanowire ink when the anchor layer reaction rate was 60%, except that the silver nanowire ink was applied when the anchor layer reaction rate was 85%, Similarly, a transparent electrode was produced, and the produced transparent electrode was subjected to measurement of resistance value, evaluation of in-plane distribution ⁇ , environmental test (evaluation of resistance value change), and evaluation of printed film appearance. The evaluation results are shown in Table 2.
  • Example 15 In Example 13, instead of applying the silver nanowire ink when the anchor layer reaction rate was 60%, except that the silver nanowire ink was applied when the anchor layer reaction rate was 95%, Example 13 and Similarly, a transparent electrode was produced, and the produced transparent electrode was subjected to measurement of resistance value, evaluation of in-plane distribution ⁇ , environmental test (evaluation of resistance value change), and evaluation of printed film appearance. The evaluation results are shown in Table 2.
  • Example 16 In Example 3, a transparent electrode was produced in the same manner as in Example 3 except that a 120 line / inch anilox roll was used instead of the 180 line / inch anilox roll. The resistance value was measured, the in-plane distribution ⁇ was evaluated, the environmental test (evaluation of change in resistance value), and the printed film appearance was evaluated. The evaluation results are shown in Table 3.
  • Example 17 In Example 3, a transparent electrode was produced in the same manner as in Example 3 except that a 150 line / inch anilox roll was used instead of the 180 line / inch anilox roll. The resistance value was measured, the in-plane distribution ⁇ was evaluated, the environmental test (evaluation of change in resistance value), and the printed film appearance was evaluated. The evaluation results are shown in Table 3.
  • Example 18 In Example 3, a transparent electrode was produced in the same manner as in Example 3 except that a 200 line / inch anilox roll was used instead of the 180 line / inch anilox roll. The resistance value was measured, the in-plane distribution ⁇ was evaluated, the environmental test (evaluation of change in resistance value), and the printed film appearance was evaluated. The evaluation results are shown in Table 3.
  • Example 19 In Example 3, a transparent electrode was prepared in the same manner as in Example 3 except that a 300 line / inch anilox roll was used instead of the 180 line / inch anilox roll. The resistance value was measured, the in-plane distribution ⁇ was evaluated, the environmental test (evaluation of change in resistance value), and the printed film appearance was evaluated. The evaluation results are shown in Table 3.
  • Example 20 In Example 3, a transparent electrode was prepared in the same manner as in Example 3 except that a 400 line / inch anilox roll was used instead of the 180 line / inch anilox roll. The resistance value was measured, the in-plane distribution ⁇ was evaluated, the environmental test (evaluation of change in resistance value), and the printed film appearance was evaluated. The evaluation results are shown in Table 3.
  • Example 21 In Example 3, a transparent electrode was prepared in the same manner as in Example 3 except that a 500 line / inch anilox roll was used instead of the 180 line / inch anilox roll. The resistance value was measured, the in-plane distribution ⁇ was evaluated, the environmental test (evaluation of change in resistance value), and the printed film appearance was evaluated. The evaluation results are shown in Table 3.
  • Example 22 In Example 3, instead of setting the printing speed to 15 m / min, a transparent electrode was prepared in the same manner as in Example 3 except that the printing speed was set to 3 m / min. Measurement, evaluation of in-plane distribution ⁇ , environmental test (evaluation of change in resistance value), and evaluation of printed film appearance. The evaluation results are shown in Table 3.
  • Example 23 In Example 3, instead of setting the printing speed to 15 m / min, a transparent electrode was prepared in the same manner as in Example 3 except that the printing speed was set to 5 m / min. Measurement, evaluation of in-plane distribution ⁇ , environmental test (evaluation of change in resistance value), and evaluation of printed film appearance. The evaluation results are shown in Table 3.
  • Example 24 In Example 3, instead of setting the printing speed to 15 m / min, a transparent electrode was prepared in the same manner as in Example 3 except that the printing speed was set to 10 m / min. Measurement, evaluation of in-plane distribution ⁇ , environmental test (evaluation of change in resistance value), and evaluation of printed film appearance. The evaluation results are shown in Table 3.
  • Example 25 In Example 3, instead of setting the printing speed to 15 m / min, a transparent electrode was prepared in the same manner as in Example 3 except that the printing speed was set to 30 m / min. Measurement, evaluation of in-plane distribution ⁇ , environmental test (evaluation of change in resistance value), and evaluation of printed film appearance. The evaluation results are shown in Table 3.
  • Example 26 In Example 3, instead of setting the printing speed to 15 m / min, a transparent electrode was prepared in the same manner as in Example 3 except that the printing speed was set to 45 m / min. Measurement, evaluation of in-plane distribution ⁇ , environmental test (evaluation of change in resistance value), and evaluation of printed film appearance. The evaluation results are shown in Table 3.
  • Example 27 In Example 3, instead of setting the printing speed to 15 m / min, a transparent electrode was prepared in the same manner as in Example 3 except that the printing speed was set to 60 m / min. Measurement, evaluation of in-plane distribution ⁇ , environmental test (evaluation of change in resistance value), and evaluation of printed film appearance. The evaluation results are shown in Table 3.
  • Example 11 (Comparative Example 11) In Example 3, instead of using silver nanowire ink having only ethyl carbitol (boiling point 202 ° C.) as the solvent and having a viscosity of 150 mPa ⁇ s, ethyl lactate (boiling point 155 ° C.) is used as the main solvent, and the viscosity is A transparent electrode was produced in the same manner as in Example 3 except that the silver nanowire ink was 29 Pa ⁇ s. The produced transparent electrode was measured for resistance, evaluated for in-plane distribution ⁇ , and environmental test ( Evaluation of resistance change) and appearance of the printed film were evaluated. The evaluation results are shown in Table 3.
  • Example 3 instead of using silver nanowire ink having only ethyl carbitol (boiling point 202 ° C.) as the solvent and having a viscosity of 150 mPa ⁇ s, ethyl lactate (boiling point 155 ° C.) is used as the main solvent, and the viscosity is A transparent electrode was produced in the same manner as in Example 3 except that the silver nanowire ink was 421 Pa ⁇ s, and the produced transparent electrode was measured for resistance, evaluated for in-plane distribution ⁇ , and environmental test ( Evaluation of resistance change) and appearance of the printed film were evaluated. The evaluation results are shown in Table 3.
  • a metal nanowire dispersion is applied to a part of the substrate by flexographic printing, and the applied metal nanowire dispersion is dried to form a metal nanowire layer.
  • Examples 1-27 in which the viscosity of the liquid is 40 mPa ⁇ s to 300 mPa ⁇ s and the metal nanowire dispersion contains 60% by mass or more of the main solvent having a boiling point of 160 ° C. or higher are low resistance. It turns out that a metal nanowire layer (conductive film) can be formed easily and a metal nanowire layer can be formed only in a part of base material.
  • the electrode of the present invention is an alternative to an electrode formed with a conductive film using a metal oxide such as indium tin oxide (ITO) used in electronic devices such as notebook computers, smartphones, touch panels, LEDs, and liquid crystal panels.
  • ITO indium tin oxide
  • electronic devices such as notebook computers, smartphones, touch panels, LEDs, and liquid crystal panels.
  • ITO indium tin oxide
  • it can apply to various things as a thing, it can be used suitably especially for a touch panel and an organic EL lighting element.

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Abstract

L'invention concerne : une électrode dans laquelle une couche de nanofils métalliques (un film conducteur), présentant une faible résistance, peut être facilement formée seulement sur une partie d'une base ; un procédé de fabrication de cette électrode ; un écran tactile et un élément d'éclairage électroluminescent (EL) organique, chacun étant pourvu de cette électrode. Le procédé de fabrication d'une électrode selon la présente invention comprend : une étape de revêtement consistant à revêtir une partie d'une base avec un liquide de dispersion de nanofils métalliques par un procédé d'impression flexographique ; une étape de formation de couche de nanofils métalliques consistant à former une couche de nanofils métalliques sur la base par séchage d'un film de dispersion qui est formé sur la base par le liquide de dispersion de nanofils métalliques. À cet égard, le liquide de dispersion de nanofils présente une viscosité de 40 mPa·s à 300 mPa·s, et le liquide de dispersion de nanofils métalliques contient 60 % en masse ou plus d'un solvant principal dont le point d'ébullition est d'au moins 160 °C.
PCT/JP2016/000673 2015-02-13 2016-02-09 Électrode, son procédé de fabrication, écran tactile et élément d'éclairage électroluminescent organique pourvus chacun de ladite électrode WO2016129270A1 (fr)

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TWI826415B (zh) * 2018-01-24 2023-12-21 美商奈米 Ｃ有限公司 製造非均勻剛性桿網狀物的方法
US12007690B2 (en) 2020-06-19 2024-06-11 Eastman Kodak Company Flexographic printing with repeating tile of randomnly-positioned feature shapes

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114258201A (zh) * 2020-09-23 2022-03-29 天材创新材料科技(厦门)有限公司 叠构结构的制备方法、叠构结构及触控传感器

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006219523A (ja) * 2005-02-08 2006-08-24 Toyo Ink Mfg Co Ltd フレキソ印刷用活性エネルギー線硬化型導電性インキおよびそれを用いた印刷物、非接触型メディア
JP2008028164A (ja) * 2006-07-21 2008-02-07 Asahi Glass Co Ltd 透明導電膜およびその製造方法、ならびに透明導電膜を用いた電磁遮蔽体およびディスプレイ装置
JP2013544917A (ja) * 2010-10-22 2013-12-19 カンブリオス テクノロジーズ コーポレイション ナノワイヤーインク組成物およびその印刷
JP2014127286A (ja) * 2012-12-26 2014-07-07 Konica Minolta Inc 有機エレクトロルミネッセンス素子
WO2015005204A1 (fr) * 2013-07-08 2015-01-15 東洋紡株式会社 Pâte électroconductrice

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006219523A (ja) * 2005-02-08 2006-08-24 Toyo Ink Mfg Co Ltd フレキソ印刷用活性エネルギー線硬化型導電性インキおよびそれを用いた印刷物、非接触型メディア
JP2008028164A (ja) * 2006-07-21 2008-02-07 Asahi Glass Co Ltd 透明導電膜およびその製造方法、ならびに透明導電膜を用いた電磁遮蔽体およびディスプレイ装置
JP2013544917A (ja) * 2010-10-22 2013-12-19 カンブリオス テクノロジーズ コーポレイション ナノワイヤーインク組成物およびその印刷
JP2014127286A (ja) * 2012-12-26 2014-07-07 Konica Minolta Inc 有機エレクトロルミネッセンス素子
WO2015005204A1 (fr) * 2013-07-08 2015-01-15 東洋紡株式会社 Pâte électroconductrice

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI826415B (zh) * 2018-01-24 2023-12-21 美商奈米 Ｃ有限公司 製造非均勻剛性桿網狀物的方法
US12007690B2 (en) 2020-06-19 2024-06-11 Eastman Kodak Company Flexographic printing with repeating tile of randomnly-positioned feature shapes

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