WO2016026733A1 - Projecteur - Google Patents

Projecteur Download PDF

Info

Publication number
WO2016026733A1
WO2016026733A1 PCT/EP2015/068449 EP2015068449W WO2016026733A1 WO 2016026733 A1 WO2016026733 A1 WO 2016026733A1 EP 2015068449 W EP2015068449 W EP 2015068449W WO 2016026733 A1 WO2016026733 A1 WO 2016026733A1
Authority
WO
WIPO (PCT)
Prior art keywords
projector
light
light sources
pattern
microlens
Prior art date
Application number
PCT/EP2015/068449
Other languages
German (de)
English (en)
Inventor
Anton Schick
Original Assignee
Siemens Aktiengesellschaft
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Aktiengesellschaft filed Critical Siemens Aktiengesellschaft
Publication of WO2016026733A1 publication Critical patent/WO2016026733A1/fr

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/24Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/25Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object
    • G01B11/2513Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures by projecting a pattern, e.g. one or more lines, moiré fringes on the object with several lines being projected in more than one direction, e.g. grids, patterns

Definitions

  • the invention relates to a projector, in particular for Tie ⁇ fenbeées a partial area of a surface of a Whether ⁇ jektes, lens array having a plurality of light sources and a micro-.
  • a projector for the three-dimensional detection of large objects, in particular of objects greater than or equal to 2x2x2 m 3 , known prior art projectors can only be used inadequately.
  • known projectors are typically provided for the visible spectral range and consequently the power (light output) of the projectors or the light sources used within the projectors is distributed approximately over the entire visible spectral range.
  • LEDs are disadvantageous due to their comparatively high etendue.
  • the object of the present invention is to improve a projector, in particular for depth determination of a partial area of a surface of an object.
  • the projector according to the invention for projecting a pattern onto at least a partial area of a surface of an object comprises a plurality of light sources and a microlens array, the microlens array having a plurality of microlenses.
  • the light sources are designed as lasers.
  • each microlens at least one laser is arranged as a light source.
  • the light emitted by the laser arranged behind the microlens passes through the microlens associated with the laser.
  • Each of the microlenses thus has its own light source, which is ⁇ forms as a laser.
  • the power (light output) of the projector is advantageously increased significantly compared to a homogeneous illumination of the microlens array by means of only a single light source.
  • Another advantage of the projector according to the invention is that the individual light sources, which are designed as lasers, have a significantly lower etendue compared to light-emitting diodes or xenon lamps. In other words, approximately the entire out of one of the laser light passes through the rising ⁇ associated with the laser microlens. It is so ⁇ lost with hardly any light, which increases the light output of the projector.
  • a particular advantage of the projector according to the invention that the sum of the individual Etendues the laser always less than a usable etendue (Lagrangeinponent) a pro ⁇ jemiesoptik is. In this case, approximately the whole of one of the outgoing laser light passes through the pupil of the optics projek ⁇ tion.
  • projection optics other optical components, such as lenses, mirrors and / or diaphragms, are referred to here, which are used for the projection.
  • the he ⁇ inventive projector therefore has over known projectors increased light output and a reduced Automatetendue. Due to the increased light output and the reducedPoletendue the use of a diaphragm with a small diameter is made possible, so that advantageous ⁇ increases the depth of field of the projector.
  • the inventive arrangement of the light sources and the microlens array has a certain similarity with a Wa ⁇ benkondensator, according to the invention miniaturized Zwi ⁇ rule mappings of a light source of the honeycomb capacitor by real light sources, that are replaced by the laser. Characterized the Inteletendue is reduced and Annae ⁇ hernd the entire light of the light sources may be used for projection.
  • Another advantage of the projector according to the invention is that the light emitted and projected by the projector is particularly spectrally due to the use of lasers
  • ⁇ adhesive can be used a lying outside the visible spectral wavelength of the laser so that the image projected onto the surface of the object or light pattern for a test person is not recognizable visually.
  • a wavelength of the laser in the infrared spectral range that is with a wavelength in the range of 1 mm to 780 nm. Due to the possibly high laser or light output, it is expedient to take appropriate and sufficient safety measures for the person testing.
  • the light sources or the lasers can be designed as continuous-line lasers (in short CW lasers) or as pulsed lasers.
  • a pattern is projected onto the partial area by means of the projector according to the invention. Furthermore, an image of light reflected from the at least a portion of the pattern is detected by a detection device and by means of proji ⁇ ed pattern and the image of a depth determining the at least one partial area of the object.
  • the projector according to the invention is used for depth determination of the subarea.
  • the projector according to the invention is therefore of advantage for the depth tuning since it has a high light output and at the same time a low total set.
  • the projector according to the invention which has already been mentioned results in similar and equivalent advantages of the method according to the invention.
  • the projector comprises a condenser, wherein the spatial distance of the light sources and the condenser relative to an optical axis of the projector is at least 5 cm, in particular at least 10 cm.
  • the spatial distance between the microlens array and the condenser relative to the optical axis of the projector can be at least 5 cm, in particular at least 10 cm.
  • the microlens array is in this case disposed in close proximity to the light sources, with the individual microlenses of the microlens array for collimation of the light of a ⁇ individual light sources are provided.
  • the light output of the projector is improved at a large depth of field by said large distance between the light sources and the condenser or the microlens array and the condenser. Due to the large distance-called use of a large plurality of light sources and thus a high light output is possible at a constant small diameter of the aperture of the projector, whereby the depth of field is equal to lead- ⁇ bend large.
  • the projector is advantageous due to its depth of field and light output. For example, a sharpness ⁇ deep in the range of 2 m to 3 m is made possible by the projector.
  • larger distances, beispielswei ⁇ se is greater than 30 cm, between the light sources and the con- densor are still provided. Appropriately, a distance is less than or equal to 1 m.
  • the depth of field of the projector is increased.
  • the usable etendue would sink and some of the lasers, or part of the laser's light, would be faded out, causing the light flux through the projection optics or the projection lens.
  • the number of light sources, whose light is passed through the diaphragm advantageously ⁇ obtained.
  • the light output of the projector success ⁇ Lich not reduced by the above-mentioned adjustments also at a high depth of field.
  • the projector comprises at least ten light sources and microlenses.
  • An advantage of the large number of greater than or equal to ten light sources and microlenses is that the light output of the projector can be further increased.
  • the Inteletendue the projector increases due to the use of lasers only slightly, so that the Truetendue of the projector through the use of a large number of light sources and micro lenses, the depth of field of the projector is not or only slightly beeintrrait ⁇ Untitled as a light source advantageously.
  • Another advantage of using a plurality of light sources is that speckles resulting from a coherent superposition of light reflected at the surface of the object are suppressed.
  • the individual light sources do not have a fixed phase relation to one another and consequently an incoherent superimposition of the light of the lasers occurs.
  • the intensity of speckle is reduced by a factor N ⁇ 1 2 .
  • the light output of the projector by using a high number of light sources, that is, in a number of at least ten light sources, improved, as well as reduces the Messunsi ⁇ uncertainties.
  • the plurality of light sources is formed by means of a laser bar.
  • the light sources form a laser array.
  • a one-dimensional or two-dimensional laser array can be provided.
  • Laser bars are particularly advantageous in the infrared spectral range.
  • the projector comprises at least three light sources, one of the three light sources having a wavelength in the optically red, one of the three light sources having a wavelength in the optically green and one of the three light sources having a wavelength in the optically blue spectral range.
  • each microlens has a fundamental ⁇ colors red, green and blue (RGB).
  • RGB red, green and blue
  • targeted control of the three light sources can take place.
  • a mixed color is caused by additive color mixing of the primary colors red, green and blue.
  • each colored light source is associated with a micro ⁇ lens of the microlens array.
  • the light of the color gen light sources to the image plane is additively mixed after passing through the Mikrolinsenar- rays in the range ⁇ projecting means of the projector a.
  • the arrangement egg ⁇ nes projection element is provided in the image plane to be projected.
  • the optical coupling of a light source with the associated one of the light source ⁇ microlens means of a fiberoptic ters occurs.
  • an optical waveguide which is designed as a monomode optical waveguide, that is to say an optical waveguide which essentially only guides one mode, typically the fundamental mode. Due to the advantageous from ⁇ design of the coupling between the light source and the light source associated microlens means of a Lichtwel ⁇ lenleiters the geometrical arrangement of the light sources of the geometrical configuration of the microlens array and / or the microlenses can be decoupled. As a result, a packing density can be provided for the microlenses, which is increased in comparison with a packing density of the light sources. As a result, it is ensured, for example, that the light sources, that is to say the lasers, can experience sufficient cooling. In addition, the number of light sources can be further increased and is almost arbitrary. Furthermore, space is saved by the use of optical waveguides and the distance between the microlens array and the condenser can be selected as small as possible.
  • the projector includes a projection element, the projection ⁇ element has at least one slide.
  • the pattern which is provided for the Tiefenbe ⁇ humor is generated by means of the slide.
  • the structuring or shaping of the light can also be effected by means of a spatial modulator (English: Spatial Light Modulator; short SLM).
  • Other optical components may be provided for the projector.
  • phase position Is used as a method of determining a depth Phasentriangulati- on, so ei ⁇ ne adjustment of the phase position can be effected by means of a displacement of the slide.
  • Further possibilities for adjusting the phase position are a digital light processor (English: Digital Light Processor, short DLP), a digital micromirror device (abbreviated to DMD) and / or further projection methods by means of a liquid crystal display (Liquid Crystal display, short LCD) and / or liquid crystals on one
  • Silicon substrate liquid-crystal-on-silicon, LCoS for short.
  • Light sources the microlens array and the projection member arranged such that the projection element is almost completely illuminated by at least a portion of the light of each light source.
  • the projection element for example the slide, is completely detected and illuminated by each light source.
  • the light from the light source first passes through the associated one of the light source microlens, then impinges on the condenser, and is finally guided to the projection element such that an approximately full ⁇ constant illumination or lighting of the projection element takes place.
  • the light Leis ⁇ processing of the projector is increased by the multiple illumination of product j etationsiatas.
  • speckles are reduced by the incoherent superposition of the light emitted by the light sources.
  • the measurement uncertainties in depth determination can be further reduced.
  • a color-coded color pattern is projected as a pattern on the surface of the object.
  • the projection of a farbco- all official color pattern enables a color-coded triangulation of ilias we ⁇ a partial area of the surface of the project.
  • the depth is determined by means of active, color-coded triangulation.
  • a phase-modeled and monochromatic pattern is projected onto the subregion of the surface of the object.
  • the projector enables phasenco ⁇ ied triangulation of the portion of the surface of the Ob ⁇ jektes.
  • a rotating disk may be provided for modulating the light emanating from the projector.
  • a spatial modu lator for ⁇ light is preferably used. This allows an advantageous coding of the light emanating from the projector. It may be provided a Modula ⁇ tion of the intensity and / or phase of the outgoing light from the projector. Further advantages, features and details of the invention ⁇ follow from the following described embodiments and from the drawings. Showing:
  • FIG. 1 shows a schematic representation of a projector with a plurality of lasers and a microlens array
  • Figure 2 shows a schematic representation of a projector with a plurality of lasers and a Mikrolin- senarray, wherein the light of the laser is guided by means of Einzel ⁇ ner optical waveguide to the microlens array
  • FIG. 1 shows a schematic representation of a projector with a plurality of lasers and a microlens array
  • Figure 2 shows a schematic representation of a projector with a plurality of lasers and a Mikrolin- senarray, wherein the light of the laser is guided by means of Einzel ⁇ ner optical waveguide to the microlens array
  • Figure 3 is a schematic representation of a projector having a plurality of lasers and a microlens array, wherein the projector comprises a DMD or LCoS.
  • FIG. 1 schematically shows a side view of a projector 1 comprising a microlens array 4 with a plurality of microlenses 41.
  • the projector 1 has a plurality of light sources 2, which are formed as a laser 2 and arranged as laser arrays 3.
  • the projector 1 comprises a condenser 8, lenses 12, a slide 10 and a diaphragm 14.
  • the microlens array 4, the lenses 12, the slide 10, the condenser 8 and the diaphragm 14 are about a common op ⁇ tables axis 100 of the projector 1 arranged.
  • a distance 101 of the condenser 8 and the laser array 3 be ⁇ contributes here at least 10 cm, in particular, a distance 101 is greater than or equal to 30 cm and less than 100 cm provided.
  • Each microlens 41 of the microlens array 4 is associated with at least one of the lasers 2.
  • a plurality of microlens arrays 4 arranged one behind the other can be provided.
  • a microlens 41 are assigned.
  • the un ⁇ teretzlichen colors of the laser 2 for example, red, green and blue are represented by a hatch corresponding to the color.
  • the outgoing of one of the laser 2 light 6 is guided to the laser 2 associated microlens 41 of the microlens array 4 and formed by means of the microlens 41 on the condenser 8 ⁇ .
  • the microlens array 4 and the condensate ⁇ sor 8 are arranged such that the slide is nearly completely illuminated by each individual ⁇ NEN laser 2 10th
  • the size of the slide 10 is indicated in Figure 1 by arrows.
  • a pattern corresponding to the slide 10 is projected onto the surface of the object.
  • the size of the projected pattern is indicated by a double arrow 21 shown in FIG.
  • the projected pattern corresponds to a ver ⁇ amateurten image of Dias 10th
  • the number of lasers 2 may be greater than or equal to 100, in particular greater than or equal to 144. With a number of 144 lasers 2, a distance 101 of 40 cm is provided between the laser array 3 and the condenser 8. An acceptance angle of the slide 10 is ⁇ here in about 8 °.
  • FIG. 2 shows a schematic section of a projector 1 with a plurality of lasers 2 and a microlens array 4, wherein the light of the laser 2 is guided to the microlens array 4 by means of optical waveguides 24. In this case, each laser 2 or each optical waveguide 24 is assigned a microlens 41 of the microlens array 4.
  • the light from a laser 2 is received by an op ⁇ table coupled with the laser 2 optical waveguide 24 and led to the laser 2 associated microlens 42 of the microlens array. 4
  • a monomode optical waveguide 24 is advantageous.
  • the light is again imaged onto a condenser 8 by means of the microlens array 4.
  • a packing density of the lasers 2 can be decoupled from a packing density of the microlenses 41 within the microlens array 4.
  • Microlens arrays 4 are arranged denser than the laser 2 within the laser arrays 3. This is advantageous because the closest possible arrangement of the laser 2 possibly prevents sufficient cooling of the individual laser 2.
  • FIG. 3 shows a schematic representation of a projector 1 which comprises a DMD 16 (digital micromirror device) or an LCoS 16 (liquid-crystal-on-semiconductor).
  • the projector 1 forms a DMD or an LCoS projector.
  • the projector 1 has a plurality of lasers 2 and a microlens array 4 with a plurality of microlenses 41. Each laser 2 is assigned at least one microlens 41 of the microlens array 4.
  • the projector 1 comprises a condenser 8, a diaphragm 14 and a plurality of lenses 12.
  • the light 6 of the laser 2 is reflected on the DMD 16 or LCoS 16 after passing through the microlens array 4 and the condenser 8 and to the further lenses 12 or to the diaphragm 14 of the projector 1 out.
  • the spatial phase position of the light 6 is adjusted by the DMD 16 or LCoS 16, so that a depth determination of a surface of an object is made possible by means of a phase triangulation. If a DMD 16 is used, the said reflection and spatial structuring of the light 6 takes place by means of micromirrors of the micromirror system (DMD).
  • DMD micromirrors of the micromirror system
  • the projector 1 may generally to image or projection of the pattern further optical components, for example Lin- sen, mirrors, gratings, beam splitters and / or prisms and / or all of the optical devices such as lenses to take ⁇ .
  • a camera in particular a three-chip camera, can be provided for receiving an image of the projected pattern which is reflected by the surface of the object. By a computer-aided evaluation of the image taken by means of the camera, the depth determinations can be made.
  • the projector according to the invention is a high-performance projection of the pattern at a low
  • the projector can be used for the depth determination of large objects whose subarea of the surface is, for example, greater than or equal to 25 m 2 .
  • the total generated by the light sources of the projector light for the pro jection ⁇ is approximately usable. This is especially at a high depth of field advantageous because light is even with a small diam ⁇ ser the projector's aperture still sufficient for depth determination.
  • the projector according to the invention thus allows a high depth of field with egg ⁇ ner high light output.

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Projection Apparatus (AREA)

Abstract

L'invention concerne un projecteur (1) destiné à projeter un motif sur au moins une zone partielle d'une surface d'un objet, lequel comprend une pluralité de sources de lumière (2) et un réseau de microlentilles (4). Le réseau de microlentilles (4) possède une pluralité de microlentilles (41) et au moins l'une des sources de lumière (4) est respectivement associée à l'une des microlentilles (41) et couplée optiquement à celle-ci de telle sorte qu'au moins une partie de la lumière (6) de la source de lumière (4) associée à la microlentille (41) traverse la microlentille (41). Les sources de lumière (2) sont des lasers (2).
PCT/EP2015/068449 2014-08-19 2015-08-11 Projecteur WO2016026733A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102014216390.0 2014-08-19
DE102014216390.0A DE102014216390A1 (de) 2014-08-19 2014-08-19 Projektor

Publications (1)

Publication Number Publication Date
WO2016026733A1 true WO2016026733A1 (fr) 2016-02-25

Family

ID=53872043

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2015/068449 WO2016026733A1 (fr) 2014-08-19 2015-08-11 Projecteur

Country Status (2)

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DE (1) DE102014216390A1 (fr)
WO (1) WO2016026733A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112945141A (zh) * 2021-01-29 2021-06-11 中北大学 基于微透镜阵列的结构光快速成像方法及系统

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US10761195B2 (en) * 2016-04-22 2020-09-01 OPSYS Tech Ltd. Multi-wavelength LIDAR system
JP7037830B2 (ja) 2017-03-13 2022-03-17 オプシス テック リミテッド 眼安全性走査lidarシステム
WO2019022941A1 (fr) 2017-07-28 2019-01-31 OPSYS Tech Ltd. Émetteur lidar à réseau vcsel à faible divergence angulaire
JP7388720B2 (ja) 2017-11-15 2023-11-29 オプシス テック リミテッド ノイズ適応ソリッドステートlidarシステム
JP7324518B2 (ja) 2018-04-01 2023-08-10 オプシス テック リミテッド 雑音適応型固体ライダシステム
DE102019106674A1 (de) 2019-03-15 2020-09-17 OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung Vorrichtung und Verfahren zur Projektion einer Mehrzahl von Strhalungspunkten auf eine Oberfläche
EP3953727A4 (fr) 2019-04-09 2023-01-04 Opsys Tech Ltd. Émetteur lidar à semi-conducteurs avec commande laser
KR20220003600A (ko) 2019-05-30 2022-01-10 옵시스 테크 엘티디 액추에이터를 사용하는 눈-안전 장거리 lidar 시스템

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US20100008588A1 (en) * 2008-07-08 2010-01-14 Chiaro Technologies LLC Multiple channel locating
EP2280239A1 (fr) * 2009-07-27 2011-02-02 Sick Ag Dispositif d'éclairage pour l'éclairage d'une zone de surveillance
US20120293625A1 (en) * 2011-05-18 2012-11-22 Sick Ag 3d-camera and method for the three-dimensional monitoring of a monitoring area
US20130250066A1 (en) * 2012-03-26 2013-09-26 Mantis Vision Ltd. Three dimensional camera and projector for same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112945141A (zh) * 2021-01-29 2021-06-11 中北大学 基于微透镜阵列的结构光快速成像方法及系统
CN112945141B (zh) * 2021-01-29 2023-03-14 中北大学 基于微透镜阵列的结构光快速成像方法及系统

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