WO2016004550A1 - 大数值孔径移相式双针孔衍射干涉仪及其测试方法 - Google Patents

大数值孔径移相式双针孔衍射干涉仪及其测试方法 Download PDF

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WO2016004550A1
WO2016004550A1 PCT/CN2014/000951 CN2014000951W WO2016004550A1 WO 2016004550 A1 WO2016004550 A1 WO 2016004550A1 CN 2014000951 W CN2014000951 W CN 2014000951W WO 2016004550 A1 WO2016004550 A1 WO 2016004550A1
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test
pinhole
light source
optical
laser light
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PCT/CN2014/000951
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English (en)
French (fr)
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尼古拉⋅沃兹尼森斯基
马冬梅
金春水
张海涛
于杰
玛利亚⋅沃兹尼森斯卡亚
塔蒂亚娜⋅沃兹尼森斯卡亚
张文龙
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中国科学院长春光学精密机械与物理研究所
Vtt-Ntm有限责任公司
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Priority to JP2016532200A priority Critical patent/JP6042586B2/ja
Priority to US15/310,025 priority patent/US10012491B2/en
Priority to DE112014002949.1T priority patent/DE112014002949B4/de
Publication of WO2016004550A1 publication Critical patent/WO2016004550A1/zh

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02034—Interferometers characterised by particularly shaped beams or wavefronts
    • G01B9/02038—Shaping the wavefront, e.g. generating a spherical wavefront
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02041—Interferometers characterised by particular imaging or detection techniques
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/0207—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
    • G01B9/02072—Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer by calibration or testing of interferometer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/005—Testing of reflective surfaces, e.g. mirrors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
    • G01M11/0271—Testing optical properties by measuring geometrical properties or aberrations by using interferometric methods

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  • the invention relates to the technical field of a point diffraction interferometer, in particular to a large numerical aperture phase shift type double pinhole diffraction interferometer and a test method thereof.
  • the point diffraction interferometer uses its unique interference test wavefront reference generation technology to make it a metering-level optical wavefront test instrument, which is mainly used in the calibration of standard lenses for commercial interferometers and the development of high-precision lithography objectives.
  • the working mechanism of the point diffraction interferometer in the world is mainly divided into two types: one is to inscribe a pinhole of less than 1 micrometer on an optical substrate, and when the illumination light path passes, diffraction produces a high-precision spherical wave, which is One part is used as the test light, and the other part is used as the test reference light.
  • the interferogram is generated by interference, and a plurality of different phase interferograms are generated by moving the test mirror, and then the wave surface of the tested mirror (or optical system) is obtained by analysis. Wavefront error between the shape and the test reference.
  • the other is to use the diffraction generated by the outgoing light of the optical fiber to generate the reference spherical wave, and the short-phase dry light source is used to achieve high-precision testing of the tested mirror.
  • the first type of diffraction interferometer divides the diffraction wavefront into two parts, and the testable angle is only half of the wavefront diffraction angle through the pinhole. Therefore, the testable angle is limited, and the maximum is NA0.3. . Due to the use of the mobile test mirror, the length of the interference cavity changes, resulting in reduced test accuracy, and the stripe contrast is not adjustable, resulting in low contrast and reduced test accuracy when testing the uncoated mirror.
  • a problem with the second point diffraction interferometer is that since the fabrication of the small core diameter fiber is difficult, the wavefront diffraction angle emitted from the end face of the fiber is small, so the numerical aperture NA that can be tested is small. At the same time, due to the use of a short coherent light source, there is a limit on the matching of the radius of curvature of the tested mirror, resulting in a complicated test process. petty.
  • the invention solves the technical problems that the point diffraction interferometer in the prior art has limited test angle, low test precision, unadjustable contrast, and cumbersome test process.
  • the invention provides a large numerical aperture phase shifting double pinhole diffraction interferometer and a test method thereof, which can not interfere with the reference light and the reference light, can realize high-accuracy test of large numerical aperture (NA).
  • a large numerical aperture phase shifting double pinhole diffraction interferometer comprising:
  • the pinhole substrate is provided with a test pinhole and a test reference pinhole;
  • the laser light emitted by the laser light source on the test optical path may sequentially pass the test laser beam expanding system and the test laser convergence system to illuminate the test pinhole on the pinhole substrate;
  • the laser light emitted by the laser light source on the test reference optical path passes through the test reference laser beam expanding system, the wedge phase shifting mechanism and the test reference laser convergence system, and illuminates the test reference pinhole on the pinhole substrate;
  • the diffracted wave emitted by the test pinhole is reflected by the optical element to be tested near the pinhole substrate and is concentrated near the test reference pinhole, and the wavefront has the shape information of the optical element to be tested. After being reflected by the pinhole substrate, interference with the diffraction wavefront emitted by the test reference pinhole forms interference fringes;
  • an interference image can be obtained; a plurality of phase shifting interferograms can be obtained by the wedge phase shifting mechanism; and the image information of the plurality of phase shifting interferograms can be obtained to obtain the surface of the optical component to be tested with high precision. Shape error.
  • the light intensity attenuation mechanism is further disposed on the test reference optical path, and the light intensity attenuation mechanism is adjusted to optimize the interference fringe contrast.
  • the laser light source includes: a working laser light source and a debugging laser light source.
  • a test method for a large numerical aperture phase shifting type double pinhole diffraction interferometer wherein the large numerical aperture phase shifting type double pinhole diffraction interferometer further comprises: a debugging observation optical imaging system, a star point image photoelectric acquisition system, Small field of view interferogram optical imaging system, interferogram photoelectric acquisition system; tested optical element azimuth debugging mechanism for mounting the optical component to be tested; laser light source includes working laser light source and debugging laser light source, said working laser a light-reflecting prism is provided at the light source and the laser source for debugging;
  • the test method includes the following steps:
  • Iv Align the optical imaging system and the star point image photoelectric acquisition system with the test reference optical path, and observe the star point image of the star point image photoelectric acquisition system, adjust the orientation of the optical component to be tested, and adjust the position of the optical component to be tested. Varying so that the diffracted light emitted by the test pinhole is reflected back through the optical element to be tested, and the concentrated spot falls on the pinhole substrate and is near the test reference pinhole;
  • the debug observation optical imaging system and the star point image photoelectric acquisition system are moved out of the optical path, and the small field of view interferogram optical imaging system and the interferogram photoelectric acquisition system are aligned with the test reference optical path, and the reference light wave diffracted by the test reference pinhole is The test optical wave reflected back by the tested optical element to converge near the test reference pinhole interferes;
  • Viii control the wedge phase shifting mechanism and the small field of view interferogram optical imaging system, the interferogram photoelectric acquisition system, to achieve the acquisition of multiple phase shifting interferograms;
  • the large numerical aperture phase shifting double pinhole diffraction interferometer of the invention realizes the separation of the test optical path and the reference optical path by using the double pinhole substrate and the double optical path convergence illumination mode, and prevents the mutual interference of the two optical paths, thereby causing the interference image in the phase shifting process.
  • the status changes.
  • the small field of view interferogram optical imaging system only aligns with the reference optical path imaging, avoiding the influence of the test optical path on the image, and implementing the large numerical aperture (NA) test of the phase shifting mode.
  • the stepwise optical phase shifting plate is used to change the thickness of the optical phase shifting plate in the test reference optical path by laterally moving the wedge-shaped optical phase shifting plate, thereby changing the optical path difference between the test reference optical path and the test optical path, and reducing the shifting The accuracy of the phase mechanism.
  • the working light source uses a 632.8nm HeNe laser source with a large coherence length for high dynamic range testing. It has the characteristics of high test accuracy, large test aperture and wide test range.
  • FIG. 1 is a schematic view showing the optical path structure of a large numerical aperture phase shifting type double pinhole diffraction interferometer according to the present invention.
  • the inventive idea of the invention is:
  • the large numerical aperture phase shifting double pinhole diffraction interferometer of the invention adopts a double pinhole substrate and a double optical path convergence illumination form to realize separation of the test optical path and the reflected optical path, and prevents mutual interference of the two optical paths, thereby causing interference images in the phase shifting process.
  • the status changes.
  • the small field of view interferogram optical imaging system only aligns with the reference optical path imaging, avoids the influence of the test optical path on the image, and realizes the large NA numerical aperture test of the phase shifting mode.
  • the stepwise optical phase shifting plate is used to change the thickness of the optical phase shifting plate in the test reference optical path by laterally moving the wedge-shaped optical phase shifting plate, thereby changing the optical path difference between the test reference optical path and the test optical path, and reducing the shifting The accuracy of the phase mechanism.
  • the coherence length is large, enabling large dynamic range testing. It has the characteristics of high test accuracy, large test aperture and wide test range.
  • the large numerical aperture phase shifting double pinhole diffraction interferometer of the invention has an optical image debugging alignment observation system for conveniently and quickly debugging the orientation of the tested optical component, so that the convergence spot of the test light return is easily aligned to the reference On the pinhole substrate.
  • the test device has been developed, and the device has a small volume, which can realize the use of the optical axis level and the optical axis vertical state, and can realize the ultra-high precision test of the tested mirror under the use state.
  • a large numerical aperture phase shift type double pinhole diffraction interferometer includes:
  • the test optical element azimuth debugging mechanism 20 for mounting the optical component 19 to be tested; the laser light source, including the working laser light source 1 and the debugging laser light source 2.
  • the working laser light source 1 is a high-stability laser light source, and is suitable for long-term stable operation;
  • the debugging laser light source 2 is a high-power laser light source, which is suitable for debugging and testing of the optical path.
  • the working laser light source 1 and the debugging laser light source 2 are provided with a folding and reflecting beam splitting prism 3; the pinhole substrate 14 is provided with a test pin hole 24 and a test reference pinhole 23.
  • the laser light emitted by the laser light source on the test optical path 22 may pass through the test laser beam expanding system 11 and the test laser convergence system 13 in turn, and reach the test pinhole 24 on the pinhole substrate 14:
  • the laser light emitted by the laser light source on the test reference optical path 21 passes through the test reference laser beam expanding system 6, the wedge phase shifting mechanism 7 and the test reference laser convergence system 10, and reaches the test reference pinhole 23 on the pinhole substrate 14. Controlling the wedge phase shifting mechanism 7 to obtain a plurality of phase shifting interferograms.
  • the diffracted wave emitted from the test pinhole 24 is reflected by the optical element 19 to be tested near the pinhole substrate 14 and condensed to the vicinity of the test reference pinhole 23 with the optical element 19 to be tested in the wavefront.
  • the surface shape information is reflected by the pinhole substrate 14 and forms interference fringes with the diffraction wavefront interference emitted by the test reference pinhole 23; the test reference optical path 21 is provided with a light intensity attenuation mechanism 9 to adjust the light intensity attenuation.
  • Mechanism 9 optimizes interference fringe contrast.
  • the large numerical aperture phase shift type double pinhole diffraction interferometer of the present invention forms the test reference optical path 21 and the test optical path 22 by the transmission and reflection of the work-dissecting prism beam 3 by the working laser light source 1.
  • the two paths of light pass the test reference laser beam expanding system 6, the wedge phase shifting mechanism 7, the test reference beam reflection refracting mirror 8, the light intensity attenuating mechanism 9, the test reference laser concentrating system 10 and the test laser beam expanding system 11, and the test beam reflection
  • the refracting mirror 12 and the test laser concentrating system 13 are concentrated, they are respectively aligned with the test reference pinhole 23 and the test pinhole 24 which are irradiated on the pinhole substrate 14, and are diffracted.
  • the diffracted wavefront serves as an interference test reference wavefront; the diffracted wavefront emitted by the test pinhole 24 is reflected by the tested optical element 19 and condenses to the vicinity of the test reference pinhole 23 with the tested optical element 19 in the wavefront.
  • the surface information is reflected by the pinhole substrate 14 with the double pinhole and forms interference fringes with the diffraction wavefront interference emitted by the test reference pinhole 23, and passes through the small field of view interferogram optical imaging system 17 and the interferogram photoelectric acquisition.
  • the system 18 obtains an interference image, debugs the interference fringe contrast by the light intensity attenuating mechanism, obtains a plurality of phase shifting interferograms through the wedge phase shifting mechanism, and obtains a surface shape error of the tested optical element component 19 with high precision by analyzing the image information.
  • test method of the large numerical aperture phase shift type double pinhole diffraction interferometer of the present invention comprises the following steps:
  • Step 1 Turn on the power switch of the phase shifting point diffraction interferometer main body, so that the working laser light source 1 and the debugging laser light source 2 start to emit light and stabilize;
  • Step 2 installing the tested optical element 19 on the tested optical element azimuth debugging mechanism 20;
  • Step 3 the computer 25 is controlled to open the debug light source shutter 4, so that the light emitted by the debugging laser light source 2 enters the interferometer system through the folded-back splitting prism 3;
  • Step 4 Control the servo motor by the computer 25 to align the debug observation optical imaging system 15 and the star point image photoelectric acquisition system 16 with the test reference optical path 21, and observe the star point image of the star point image photoelectric acquisition system 16 to adjust the test.
  • the optical element orientation debugging mechanism 20 causes the position of the optical element 19 to be tested to be changed such that the diffracted light emitted by the test pinhole 24 is reflected back through the optical element 19 to be tested, and the concentrated spot falls on the pinhole with the double pinhole.
  • Step 5 Turn off the debug light source shutter 4 by the computer 25, and open the working light source shutter 5 so that the light emitted by the working laser light source 1 enters the interferometer system through the folded-back splitting prism 3 to form the test reference optical path 21 and the test optical path 22. ;
  • Step 6 The debug observation optical imaging system 15 and the star point image photoelectric acquisition system 16 are moved out of the optical path by the computer 25, and the small field of view interferogram optical imaging system 17 and the interferogram photoelectric acquisition system 18 are enabled. Aligning the test reference optical path 21, the reference light wave diffracted by the test reference pinhole 23 interferes with the test light wave reflected by the optical element component 19 to be tested and concentrated near the test reference pinhole 23;
  • An interference fringe image can be observed by the small field of view interferogram optical imaging system 17 and the interferogram photodetection system 18.
  • an interference fringe image conforming to the acquisition requirement can be observed on the computer 25 by the interferogram photoelectric acquisition system 18 (the interference fringes are as small as possible);
  • Step 7 Adjust the light intensity attenuation mechanism 9 so that the interference fringe contrast is optimal
  • Step 8 Control the cooperation of the wedge phase shifting mechanism 7 and the small field of view interferogram optical imaging system 17 and the interferogram photoelectric acquisition system 18 by the computer 25 to realize the acquisition function of the multiple phase shifting interferograms;
  • Step 9 Perform optical wavefront high-precision testing of the optical component 19 to be tested by phase shifting interferogram processing software.

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Abstract

一种大数值孔径移相式双针孔衍射于涉仪及其测试方法，该衍射干涉仪包括：测试基准光路（21），测试光路（22），针孔基板（14）；所述针孔基板（14）上设有测试针孔（24）和测试基准针孔（23）；在所述测试针孔（24）发出的衍射波前经所述针孔基板（14）附近的被测试光学元部件（19）反射后会聚到测试基准针孔（23）附近，其波前中带有被测试光学元部件（19）的面形信息，其经过针孔基板（14）反射后与由测试基准针孔（23）发出的衍射波前千涉形成干涉条纹。

Description

大数值孔径移相式双针孔衍射干涉仪及其测试方法 技术领域
本发明涉及点衍射干涉仪技术领域，特别涉及一种大数值孔径移相式双针孔衍射干涉仪及其测试方法。
背景技术
点衍射干涉仪以其独特的干涉测试波前基准生成技术使得其成为计量级别的光学波前测试仪器，主要用于对商用干涉仪标准镜头的计量标定和高精度光刻物镜的研制中。
目前，国际上的点衍射干涉仪的工作机理主要分为两种：一种是在光学基板上刻制小于1微米的针孔，当照明光路通过时发生衍射产生高精度球面波，把其中的一部分作为测试光，另一部分作为测试基准光，两部分光经光路折转后干涉产生干涉图，通过移动测试镜产生多幅不同位相干涉图，进而分析获得被测试镜(或光学系统)波面面形与测试基准之间的波面误差。另外一种是采用光纤出射光发生的衍射产生基准球面波，采用短相干光源实现对被测试镜的高精度测试。
其中，第一种点衍射干涉仪由于把衍射波前分为两部分，可测试的角度仅相当于通过针孔的波前衍射角度的一半，因此，可测试角度受限，最大为NA0.3。由于采用移动测试镜，干涉腔长有变化，导致测试精度降低，而且条纹对比度不可调，导致在测试无镀膜镜时对比度低，测试精度下降。
第二种点衍射干涉仪存在的问题是，由于小纤芯直径光纤的制作很困难，导致由光纤端面出射的波前衍射角度小，因此可测试的数值孔径NA小。同时，由于采用短相干光源，对被测试镜曲率半径匹配有限制要求，导致测试过程繁 琐。
发明内容
本发明要解决现有技术中的点衍射干涉仪存在的测试角度受限、测试精度低、对比度不可调、测试过程繁琐等技术问题。本发明提供一种测试光与基准光互不干扰，可实现大数值孔径(NA)高精度测试的，大数值孔径移相式双针孔衍射干涉仪及其测试方法。
为了解决上述技术问题，本发明的技术方案具体如下：
一种大数值孔径移相式双针孔衍射干涉仪，包括：
测试基准光路，测试光路，针孔基板；所述针孔基板上设有测试针孔和测试基准针孔；
在所述测试光路上激光光源发出的激光可依次经过测试激光扩束系统和测试激光会聚系统后，照明针孔基板上的测试针孔；
在所述测试基准光路上激光光源发出的激光依次经过测试基准激光扩束系统，光楔移相机构和测试基准激光会聚系统后，照明针孔基板上的测试基准针孔；
在所述测试针孔发出的衍射波前经所述针孔基板附近的被测试光学元部件反射后会聚到测试基准针孔附近，其波前中带有被测试光学元部件的面形信息，其经过针孔基板反射后与由测试基准针孔发出的衍射波前干涉形成干涉条纹；
根据形成的所述干涉条纹可以得到干涉图像；可通过光楔移相机构获得多幅移相干涉图；经过对多幅移相干涉图的图像信息分析可高精度获得被测试光学元部件的面形误差。
在上述技术方案中，所述测试基准光路上还设有光强衰减机构，调节该光强衰减机构可使干涉条纹对比度达到最佳。
在上述技术方案中，所述激光光源包括：工作用激光光源和调试用激光光源。
一种大数值孔径移相式双针孔衍射干涉仪的测试方法，所述大数值孔径移相式双针孔衍射干涉仪中还设有：调试观察光学成像系统，星点图像光电采集系统，小视场干涉图光学成像系统，干涉图光电采集系统；用来安装被测试光学元部件的被测试光学元部件方位调试机构；激光光源包括工作用激光光源和调试用激光光源，所述工作用激光光源和调试用激光光源处设有折反透分光棱镜；
该测试方法包括以下步骤：
i、接通电源，使得工作用激光光源和调试用激光光源开始出射光并稳定；
ii、在针孔基板附近沿测试光路光轴安装被测试光学元部件；
iii、打开调试用激光光源，使其发出的光经折反透分光棱镜进入干涉仪系统中；
iv、使调试观察光学成像系统和星点图像光电采集系统对准测试基准光路，通过观察星点图像光电采集系统的星点图像，调整被测试光学元部件方位调试机构使被测试光学元部件位置变动，使由测试针孔发出的衍射光通过被测试光学元部件后反射回来会聚光点落在针孔基板上并在测试基准针孔附近；
v、关闭调试用激光光源，打开工作用激光光源，使激光经折反透分光棱镜进入干涉仪系统中，形成测试基准光路和测试光路；
vi、将调试观察光学成像系统和星点图像光电采集系统移出光路，并使小视场干涉图光学成像系统和干涉图光电采集系统对准测试基准光路，由测试基准针孔衍射的基准光波与由被测试光学元部件反射回来会聚到测试基准针孔附近的测试光波发生干涉；
vii、调整测试基准光路上设有的光强衰减机构，使得干涉条纹对比度最佳；
viii、控制光楔移相机构和小视场干涉图光学成像系统、干涉图光电采集系统的配合，实现对多幅移相干涉图的采集；
ix、通过移相干涉图处理软件实现对被测试光学元部件的光学波前高精度测试。
本发明具有以下的有益效果：
本发明的大数值孔径移相式双针孔衍射干涉仪采用双针孔基板和双光路会聚照明形式实现测试光路与基准光路的分离，防止两光路的相互干扰导致移相式过程中的干涉图像状态改变。小视场干涉图光学成像系统仅对准基准光路成像，避开测试光路对图像的影响，实现移相方式的大数值孔径(NA)测试。同时，采用阶梯式光学移相板，通过横向移动楔形的光学移相板，改变光学移相板在测试基准光路中的厚度，从而改变测试基准光路与测试光路的光程差，降低了对移相机构精度的要求。工作光源采用632.8nm氦氖激光源，相干长度大，可实现大动态范围的测试。达到测试精度高、测试孔径大、测试范围广的特点。
附图说明
下面结合附图和具体实施方式对本发明作进一步详细说明。
图1为本发明的大数值孔径移相式双针孔衍射干涉仪的光路结构示意图。
图中的附图标记表示为：
1.工作用激光光源；2.调试用激光光源；3.折反透分光棱镜；4.调试光源快门；5.工作光源快门；6.测试基准激光扩束系统；7.光楔移相机构；8.测试基准光束反射折光镜；9.光强衰减机构；10.测试基准激光会聚系统；11.测试激光扩束系统；12.测试光束反射折光镜；13.测试激光会聚系统；14.针孔基板；15.调 试观察光学成像系统；16.星点图像光电采集系统；17.小视场干涉图光学成像系统；18.干涉图光电采集系统；19.被测试光学元部件；20.被测试光学元部件方位调试机构；21.测试基准光路；22.测试光路；23.测试基准针孔；24.测试针孔；25.计算机。
具体实施方式
本发明的发明思想为：
本发明的大数值孔径移相式双针孔衍射干涉仪采用双针孔基板和双光路会聚照明形式实现测试光路与反射光路的分离，防止两光路的相互干扰导致移相式过程中的干涉图像状态改变。小视场干涉图光学成像系统仅对准基准光路成像，避开测试光路对图像的影响，实现移相方式的大NA数值孔径测试。同时，采用阶梯式光学移相板，通过横向移动楔形的光学移相板，改变光学移相板在测试基准光路中的厚度，从而改变测试基准光路与测试光路的光程差，降低了对移相机构精度的要求。采用632.8nm氦氖激光源，相干长度大，可实现大动态范围的测试。达到测试精度高、测试孔径大、测试范围广的特点。
本发明的大数值孔径移相式双针孔衍射干涉仪中带有光学图像调试对准观察系统，以方便快捷的调试被测试光学部件方位，使得测试光返回的会聚光点易于对准到基准针孔基板上。现已完成测试装置研制，装置体积小，可实现光轴水平与光轴垂直状态的使用，可实现被测试镜在使用状态下的超高精度测试。
下面结合附图对本发明做以详细说明。
如图1所示，一种大数值孔径移相式双针孔衍射干涉仪，包括：
测试基准光路21，测试光路22，针孔基板14；调试观察光学成像系统15，星点图像光电采集系统16，小视场干涉图光学成像系统17，干涉图光电采集系 统18；用来安装被测试光学元部件19的被测试光学元部件方位调试机构20；激光光源，包括工作用激光光源1和调试用激光光源2。所述工作用激光光源1为高稳定性激光光源，适用于长时间的稳定工作；所述调试用激光光源2为大功率激光光源，适用于光路的调试和测试。
所述工作用激光光源1和调试用激光光源2处设有折反透分光棱镜3；所述针孔基板14上设有测试针孔24和测试基准针孔23。
在所述测试光路22上激光光源发出的激光可依次经过测试激光扩束系统11和测试激光会聚系统13后，到达针孔基板14上的测试针孔24：
在所述测试基准光路21上激光光源发出的激光依次经过测试基准激光扩束系统6，光楔移相机构7和测试基准激光会聚系统10后，到达针孔基板上14的测试基准针孔23；控制所述光楔移相机构7可获得多幅移相干涉图。
在所述测试针孔24发出的衍射波前经所述针孔基板14附近的被测试光学元部件19反射后会聚到测试基准针孔23附近，其波前中带有被测试光学元部件19的面形信息，其经过针孔基板14反射后与由测试基准针孔23发出的衍射波前干涉形成干涉条纹；所述测试基准光路21上设有光强衰减机构9，调节该光强衰减机构9可使干涉条纹对比度达到最佳。
本发明的大数值孔径移相式双针孔衍射干涉仪在工作过程中，用工作用激光光源1经过折反透分光棱镜3的透射和反射形成测试基准光路21和测试光路22。两路光经过测试基准激光扩束系统6、光楔移相机构7、测试基准光束反射折光镜8、光强衰减机构9、测试基准激光会聚系统10和测试激光扩束系统11、测试光束反射折光镜12、测试激光会聚系统13后会聚分别对准照射在针孔基板14上的测试基准针孔23和测试针孔24上，发生衍射。由测试基准针孔23发出的 衍射波前作为干涉测试基准波前；由测试针孔24发出的衍射波前经被测试光学元部件19反射后会聚到测试基准针孔23附近，其波前中带有被测试光学元部件19的面形信息，其经过带有双针孔的针孔基板14反射后与由测试基准针孔23发出的衍射波前干涉形成干涉条纹，经过小视场干涉图光学成像系统17和干涉图光电采集系统18获得干涉图像，通过光强衰减机构调试干涉条纹对比度，通过光楔移相机构获得多幅移相干涉图，经过对图像信息的分析高精度获得被测试光学元部件19的面形误差。
本发明的大数值孔径移相式双针孔衍射干涉仪的测试方法包括以下步骤：
步骤1、打开移相式点衍射干涉仪主机电源开关，使得工作用激光光源1和调试用激光光源2开始出射光并稳定；
步骤2、安装被测试光学元部件19在被测试光学元部件方位调试机构20上；
步骤3、通过计算机25控制打开调试光源快门4，使得调试用激光光源2发出的光经折反透分光棱镜3进入干涉仪系统中；
步骤4、通过计算机25控制伺服电机使调试观察光学成像系统15和星点图像光电采集系统16组合系统对准测试基准光路21，通过观察星点图像光电采集系统16的星点图像，调整被测试光学元部件方位调试机构20使得被测试光学元部件19位置变动，使得由测试针孔24发出的衍射光通过被测试光学元部件19后反射回来会聚光点落在带有双针孔的针孔基板14上并在测试基准针孔23附近；
步骤5、通过计算机25控制关闭调试光源快门4，并打开工作光源快门5使得工作用激光光源1发出的光经折反透分光棱镜3进入干涉仪系统中，形成测试基准光路21和测试光路22；
步骤6、通过计算机25控制使调试观察光学成像系统15和星点图像光电采集系统16移出光路，并使小视场干涉图光学成像系统17和干涉图光电采集系统18 对准测试基准光路21，由测试基准针孔23衍射的基准光波与由被测试光学元部件19反射回来会聚到测试基准针孔23附近的测试光波发生干涉；
通过小视场干涉图光学成像系统17和干涉图光电采集系统18可观察到干涉条纹图像。通过被测试光学元部件方位调试机构20细调被测试光学部件19的位置，可通过干涉图光电采集系统18在计算机25上观察到符合采集要求的干涉条纹图像(干涉条纹尽量少)；
步骤7、调整光强衰减机构9，使得干涉条纹对比度最佳；
步骤8、通过计算机25控制光楔移相机构7和小视场干涉图光学成像系统17、干涉图光电采集系统18部件的配合，实现对多幅移相干涉图的采集功能；
步骤9、通过移相干涉图处理软件实现对被测试光学元部件19的光学波前高精度测试。
显然，上述实施例仅仅是为清楚地说明所作的举例，而并非对实施方式的限定。对于所属领域的普通技术人员来说，在上述说明的基础上还可以做出其它不同形式的变化或变动。这里无需也无法对所有的实施方式予以穷举。而由此所引伸出的显而易见的变化或变动仍处于本发明创造的保护范围之中。

Claims (5)

  1. 一种大数值孔径移相式双针孔衍射干涉仪，其特征在于，包括：
    测试基准光路(21)，测试光路(22)，针孔基板(14)；所述针孔基板(14)上设有测试针孔(24)和测试基准针孔(23)；
    在所述测试光路(22)上激光光源发出的激光可依次经过测试激光扩束系统(11)和测试激光会聚系统(13)后，照明针孔基板(14)上的测试针孔(24)；
    在所述测试基准光路(21)上激光光源发出的激光依次经过测试基准激光扩束系统(6)，光楔移相机构(7)和测试基准激光会聚系统(10)后，照明针孔基板(14)上的测试基准针孔(23)；
    在所述测试针孔(24)发出的衍射波前经所述针孔基板(14)附近的被测试光学元部件(19)反射后会聚到测试基准针孔(23)附近，其波前中带有被测试光学元部件(19)的面形信息，其经过针孔基板(14)反射后与由测试基准针孔(23)发出的衍射波前干涉形成干涉条纹；
    根据形成的所述干涉条纹可以得到干涉图像；可通过光楔移相机构(7)获得多幅移相干涉图；经过对多幅移相干涉图的图像信息分析可高精度获得被测试光学元部件(19)的面形误差。
  2. 根据权利要求1所述的大数值孔径移相式双针孔衍射干涉仪，其特征在于，所述测试基准光路(21)上还设有光强衰减机构(9)，调节该光强衰减机构(9)可使干涉条纹对比度达到最佳。
  3. 根据权利要求1所述的大数值孔径移相式双针孔衍射干涉仪，其特征在于，所述激光光源包括：工作用激光光源(1)和调试用激光光源(2)。
  4. 根据权利要求1所述的大数值孔径移相式双针孔衍射干涉仪的测试方法，所述大数值孔径移相式双针孔衍射干涉仪中还设有：调试观察光学成像系统(15)，星点图像光电采集系统(16)，小视场干涉图光学成像系统(17)，干涉 图光电采集系统(18)；用来安装被测试光学元部件(19)的被测试光学元部件方位调试机构(20)；激光光源包括工作用激光光源(1)和调试用激光光源(2)，所述工作用激光光源(1)和调试用激光光源(2)处设有折反透分光棱镜(3)；
    其特征在于，该测试方法包括以下步骤：
    i、接通电源，使得工作用激光光源(1)和调试用激光光源(2)开始出射光并稳定；
    ii、在针孔基板(14)附近安装被测试光学元部件(19)；
    iii、打开调试用激光光源(2)，使其发出的光经折反透分光棱镜(3)进入干涉仪系统中；
    iv、使调试观察光学成像系统(15)和星点图像光电采集系统(16)对准测试基准光路，通过观察星点图像光电采集系统(16)的星点图像，调整被测试光学元部件方位调试机构(20)使被测试光学元部件(19)位置变动，使由测试针孔(24)发出的衍射光通过被测试光学元部件(19)后反射回来会聚光点落在针孔基板(14)上并在测试基准针孔(23)附近；
    v、关闭调试用激光光源(2)，打开工作用激光光源(1)，使激光经折反透分光棱镜(3)进入干涉仪系统中，形成测试基准光路(21)和测试光路(22)；
    vi、将调试观察光学成像系统(15)和星点图像光电采集系统(16)移出光路，并使小视场干涉图光学成像系统(17)和干涉图光电采集系统(18)对准测试基准光路(21)，由测试基准针孔(23)衍射的基准光波与由被测试光学元部件(19)反射回来会聚到测试基准针孔(23)附近的测试光波发生干涉；
    viii、控制光楔移相机构(7)和小视场干涉图光学成像系统(17)、干涉图光电采集系统(18)的配合，实现对多幅移相干涉图的采集；
    ix、通过移相干涉图处理软件实现对被测试光学元部件(19)的光学波前高 精度测试。
  5. 根据权利要求4所述的大数值孔径移相式双针孔衍射干涉仪的测试方法，其特征在于，步骤vi之后，步骤viii之前还设有步骤：
    vii、调整测试基准光路(21)上设有的光强衰减机构(9)，使得干涉条纹对比度最佳。
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