WO2016002982A1 - Unité source d'évaporation et dispositif de dépôt - Google Patents

Unité source d'évaporation et dispositif de dépôt Download PDF

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Publication number
WO2016002982A1
WO2016002982A1 PCT/KR2014/005820 KR2014005820W WO2016002982A1 WO 2016002982 A1 WO2016002982 A1 WO 2016002982A1 KR 2014005820 W KR2014005820 W KR 2014005820W WO 2016002982 A1 WO2016002982 A1 WO 2016002982A1
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WO
WIPO (PCT)
Prior art keywords
substrate
source unit
evaporation source
deposition
rail
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PCT/KR2014/005820
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English (en)
Korean (ko)
Inventor
최재수
이정균
이현성
이경석
Original Assignee
주식회사 선익시스템
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Publication of WO2016002982A1 publication Critical patent/WO2016002982A1/fr

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof

Definitions

  • the present invention relates to an evaporation source unit and a deposition apparatus. More specifically, the present invention relates to an evaporation source unit and a deposition apparatus that can reduce the charging time when recharging the evaporation material to the evaporation source.
  • OLED Organic Luminescence Emitting Device
  • the flat panel display device using the organic light emitting diode has a fast response speed and a wide viewing angle, which has emerged as a next generation display device.
  • the manufacturing process is simple, the production cost can be reduced more than the existing liquid crystal display device.
  • the hole injection layer, the hole transport layer, the light emitting layer, the electron transport layer, and the electron injection layer which are the remaining constituent layers except the anode and the cathode electrode, are organic thin films, and the organic thin film is deposited on the substrate by a vacuum thermal deposition method. Will be deposited on.
  • a substrate is transferred into a vacuum chamber, a shadow mask in which a predetermined pattern is formed is aligned with the transferred substrate, and heat is applied to the crucible containing the organic material to sublimate the organic material on the substrate onto the substrate. It is made by deposition on.
  • the deposition process on the substrate is stopped during the transfer process and the shadow mask alignment process of the substrate, thereby causing a tack time (tack There was a problem that the time) is increased.
  • the present invention provides an evaporation source unit and a deposition apparatus that can reduce the charging time when the evaporation material is recharged in the evaporation source.
  • the present invention proceeds to the deposition process for a plurality of substrates in one chamber, the process of the transfer of the other substrate or alignment process during the deposition process of one substrate can reduce the tact time (tact time)
  • the present invention provides an evaporation source unit and a deposition apparatus capable of reducing the loss of evaporation material generated during a transfer process or an alignment process for a substrate.
  • an evaporation source unit disposed in a deposition chamber to perform deposition on a substrate, comprising: a lower case having an upper end opened; Located in the lower case, the heating portion of the tubular lifting; A rail unit coupled to the upper end of the lower case and guiding linear movement; An upper case which is open at a lower end thereof and which is mounted on the rail part and combined with or separated from the lower case as the rail part moves along the rail part; Located in the upper case, there is provided an evaporation source unit comprising a crucible drawn in and out of the heating unit in accordance with the lifting of the heating unit.
  • a door may be provided at one side of the deposition chamber, and in this case, the upper case having the crucible may be drawn in and out of the door as the linear movement moves along the rail.
  • the rail unit includes: a first rail coupled to the upper end of the lower case in a lateral direction; A second rail sliding along the longitudinal direction of the first rail; It may be coupled to the lower end of the upper case, and may include a third rail sliding in the longitudinal direction of the second rail.
  • the evaporation source unit may further include a nozzle unit including a transfer tube coupled to an upper end of the crucible, and a diffusion tube coupled to the transfer tube in a transverse direction to communicate with the transfer tube and having a plurality of injection nozzles formed along a length direction. It may include.
  • the deposition chamber is a substrate withdrawal; A substrate loading part located in the deposition chamber and on which the substrate is mounted; An evaporation source unit disposed opposite to the substrate and configured to eject evaporated particles toward the substrate;
  • the vapor deposition apparatus is provided, the vapor deposition apparatus including a source moving means for moving the evaporation source unit along the surface of the substrate.
  • a door may be provided at one side of the deposition chamber, and in this case, the upper case having the crucible may be drawn in and out of the door as it moves linearly along the rail.
  • a first substrate is divided into a first deposition region and a second deposition region, and a first substrate is drawn in and out of the first deposition region in a first radial direction at one center point, and the second at the center point.
  • the evaporation source unit includes a linear nozzle unit to spray evaporation particles linearly, and the evaporation source unit is mounted on the first substrate or the evaporation unit so that the evaporation particles are sprayed onto a surface of the first substrate or the second substrate.
  • a scanner including source moving means for linearly moving along the surface of the second substrate and rotating means for rotating the source moving means so that the linear nozzle portion is parallel to one side of the first substrate or the second substrate ( scanner; And a scanner moving means for reciprocating the scanner such that the scanner is located in the first deposition region or the second deposition region.
  • the scanner moving means includes a pair of scanner guide portions disposed in parallel to each other across the first deposition region and the second deposition region, and the source movement means includes the substrate as the rotation means rotates.
  • a support frame disposed parallel to the support frame;
  • the evaporation source unit may include a source guide portion disposed in the longitudinal direction on the support frame to move in the longitudinal direction of the support frame.
  • the rotating means may include: a rotation guide part coupled to any one of the pair of scanner guide parts to guide rotation of the support frame; It may be coupled to the other one of the pair of scanner guide portion, the support frame may include a rotating portion rotatably coupled.
  • a door may be provided at one side of the deposition chamber.
  • the scanner is moved to face the door by the scanner moving means, and after the evaporation source unit is close to the door by the source moving means, As the linear movement along the rail portion, the upper case having the crucible may be drawn in and out of the door.
  • the evaporation source unit and the deposition apparatus according to the embodiment of the present invention can reduce the process time by reducing the charging time when recharging the evaporation material to the evaporation source.
  • the deposition process for a plurality of substrates in one chamber, the transfer process or alignment process for the other substrate during the deposition process of one substrate can reduce the tact time, the substrate It is possible to reduce the loss of organic material generated during the transfer process or the alignment process.
  • FIG. 1 is a perspective view for explaining the configuration of the evaporation source unit according to an embodiment of the present invention.
  • FIGS. 2 and 3 are views for explaining the operation of the evaporation source unit according to an embodiment of the present invention.
  • FIG. 4 is a view for explaining the configuration of a deposition apparatus according to another embodiment of the present invention.
  • FIG. 5 is a state diagram used in the deposition apparatus according to another embodiment of the present invention.
  • FIG. 6 is a view for explaining a deposition apparatus according to another embodiment of the present invention.
  • FIG. 7 is a view for explaining the scanner and the scanner moving means of the deposition apparatus according to another embodiment of the present invention.
  • FIG. 1 is a perspective view for explaining the configuration of the evaporation source unit according to an embodiment of the present invention
  • Figures 2 and 3 are views for explaining the operation of the evaporation source unit according to an embodiment of the present invention.
  • the evaporation source unit 10 the lower case 12, the heating unit 14, the support 16, the transfer guide 18, the rail unit 20, the first rail 22, and the first
  • the two rails 24, the third rail 26, the upper case 28, the nozzle portion 30, the transfer pipe 32, the diffusion pipe 34, the injection nozzle 36, the crucible 38 are shown have.
  • the evaporation source unit 10 includes an evaporation source unit 10 disposed in a deposition chamber and performing deposition on a substrate, the lower case 12 having an upper end open; It is located in the lower case 12, and the heating portion 14 of the tubular lifting; A rail unit 20 coupled to the upper end of the lower case 12 and guiding linear movement; An upper case 28 having a lower end opened and mounted on the rail part 20 and being combined with or separated from the lower case 12 as the rail part 20 moves along the rail part 20; Located in the upper case 28, and includes a crucible (38) drawn in and out of the heating unit 14 in accordance with the lifting of the heating unit (14).
  • the evaporation source unit 10 may reduce the charging time when recharging the evaporation material to the evaporation source unit 10.
  • the vaporization particles may be prevented from being parasitic deposited in the respective components disposed in the upper case 28 and the lower case 12 during the deposition process.
  • the lower case 12 has an open top
  • the upper case 28 has an open lower end.
  • the lower case 12 and the upper case 28 are combined with each other to form a single case. Parasitic deposition of evaporated particles to the crucible 38, the heating unit 14, etc., which are located, is prevented.
  • the lower case 12 and the upper case 28 may be formed in a box shape or may be formed by forming a frame and combining panels outside the frame.
  • the cylindrical heating part 14 is located in the lower case 12, and raises and lowers. As the heating unit 14 rises or falls, the crucible 38 is drawn in or drawn out inside the tubular heating unit 14. That is, when the cylindrical heating part 14 rises, the crucible 38 located in the upper end is inserted into the heating part 14, and when the heating part 14 descends, the crucible 38 heats up. It is configured to be drawn out from the unit 14.
  • the rail unit 20 is coupled to the upper end of the lower case 12 in the lateral direction and guides the linear movement of the upper case 28.
  • the upper case 28 is mounted on the rail 20, and the upper case 28 and the lower case 12 are combined or separated as the upper case 28 moves with respect to the lower case 12. That is, when the upper case 28 moves to the upper end of the lower case 12 along the rail portion 20, the upper case 28 is coalesced with each other, and the upper case 28 is lowered from the lower case 12 along the rail portion 20. If they are far apart, they are separated from each other.
  • the rail unit 20 stably supports the upper case 28 and is configured in multiple stages to secure the moving distance of the upper case 28. That is, the first rail 22 coupled to the upper end of the lower case 12 in the transverse direction, the second rail 24 sliding along the longitudinal direction of the first rail 22, and the upper case 28 It is coupled to the lower end, it may be composed of a third rail (26) sliding along the longitudinal direction of the second rail (24).
  • the upper case 28 is open at the lower end, and is mounted on the rail unit 20 and coalesced or separated from the lower case 12 as the rail case 20 moves. As described above, when the upper case 28 moves to the upper end of the lower case 12 along the rail portion 20, the upper case 28 is formed with each other, and the upper case 28 is lower case along the rail portion 20. If they are separated from (12) they are separated from each other.
  • the lower case 12 and the upper case 28 are separated as the rail unit 20 composed of the first rail 22, the second rail 24, and the third rail 26 is extended. As the rail unit 20 shrinks, the lower case 12 and the upper case 28 are combined.
  • the crucible 38 is located in the upper case 28 and is drawn in or withdrawn from the heating unit 14 as the heating unit 14 moves up and down.
  • the crucible 38 can be attached to and detached from the upper case 28.
  • the crucible 38 is separated from the upper case 28 to fill the evaporation material.
  • the made crucible 38 may be coupled to the upper case 28 again.
  • the tubular heating portion 14 of the lower case 12 is raised to raise the crucible 38 into the heating portion 14.
  • the crucible 38 is taken out in the heating part 14.
  • the evaporation source unit 10 In order to raise and lower the heating unit 14, the evaporation source unit 10 according to the present embodiment is vertically disposed in the lower case 12 in a vertical direction along the conveying guide 18 and the conveying guide 18. Is moved, and may include a support 16 on which the heating unit 14 is mounted.
  • the transfer guide 18 is disposed in the up and down direction inside the lower case 12, and the support 16 on which the heating unit 14 is mounted is coupled to the transfer guide 18 for transfer.
  • the guide 18 moves up and down.
  • the cylindrical heating portion 14 mounted on the support 16 is raised and lowered so that the crucible 38 is drawn into or drawn out from the heating portion 14. do.
  • the transfer pipe 32 is coupled to the upper end of the crucible 38, and the length of the transfer pipe 32 so as to communicate with the transfer pipe 32 in the transverse direction and the length
  • the nozzle unit 30 may include a diffusion pipe 34 in which a plurality of injection nozzles 36 are formed along a direction.
  • the transfer pipe 32 is coupled to the top of the crucible 38 so that the lower end is in communication with the crucible 38, the diffusion pipe 34 is transverse to the top of the transfer pipe 32 so as to communicate with the transfer pipe 32.
  • the transfer pipe 32 and the diffusion pipe 34 coupled to each other have an approximately T shape.
  • Transfer tube 32 is a tube shape, the lower end is coupled to communicate with the open upper end of the crucible 38, the evaporation particles are evaporated by the evaporation material is evaporated in the crucible 38 in accordance with the heating of the heating unit 14 Guided to the diffusion pipe 34 through the transfer pipe (32).
  • the diffusion tube 34 has a tube shape in which both ends are blocked, and an injection nozzle 36 is formed at the upper end of the diffusion tube 34 in the longitudinal direction of the diffusion tube 34.
  • the injection nozzles 36 may have a shape in which a plurality of nozzle holes are spaced apart in the longitudinal direction of the diffusion tube 34, or may have a long slit shape formed in the longitudinal direction of the diffusion tube 34. In this embodiment, as the injection nozzles 36, a plurality of nozzle holes are provided along the longitudinal direction of the diffusion pipe 34.
  • the evaporated particles ejected from the crucible 38 move to the diffusion pipe 34 through the transfer pipe 32 and are evaporated through the injection nozzles 36 arranged linearly while the evaporated particles diffuse along the diffusion pipe 34.
  • the particles are ejected linearly.
  • the evaporation particles are moved along the surface of the substrate by evaporating linear evaporation source unit 10 to perform deposition on the entire substrate.
  • FIGS. 2 and 3 when the operation of the evaporation source unit 10 according to the present embodiment is looked at, when the upper case 28 moves along the rail portion 20 and the lower case 12 is coalesced, FIG. As shown in FIG. 2, as the support 16 is lifted by the transfer guide 18, the heating unit 14 is raised to introduce the crucible 38 into the heating unit 14. In this state, when the crucible 38 is heated by the heating unit 14, the evaporation material in the crucible 38 is evaporated and the evaporated particles are ejected toward the substrate through the nozzle unit 30.
  • the support 16 is supported by the transfer guide 18.
  • the crucible 38 and the heating part 14 are separated.
  • the upper case 28 is moved along the rail 20 so that the upper case 28 is separated from the lower case 12, and then the crucible 38 is separated from the lower end of the upper case 28 to evaporate. Charge or service the crucible (38).
  • FIG. 4 is a view for explaining the configuration of a deposition apparatus according to another embodiment of the present invention
  • Figure 5 is a state diagram used in the deposition apparatus according to another embodiment of the present invention.
  • the evaporation source unit 10 the substrate 11, the lower case 12, the rail portion 20, the upper case 28, the deposition chamber 40, the substrate loading portion 42, the source The vehicle 44, the door 46, is shown.
  • the deposition apparatus includes a deposition chamber 40 into which the substrate 11 is drawn in and out, a substrate loading part 42 positioned in the deposition chamber 40, and the substrate 11 seated thereon, and the substrate 11.
  • Evaporation source unit 10 and the evaporation source unit 10 according to the embodiment for ejecting the evaporation particles toward the mounting source moving means for moving the evaporation source unit 10 along the surface of the substrate (11) 44).
  • the deposition chamber 40 is a place where evaporation particles are deposited on the substrate 11 therein, and the inside of the deposition chamber 40 may be maintained in a vacuum state by a vacuum pump. When the evaporated particles are deposited at atmospheric pressure, the interior may be maintained at atmospheric pressure.
  • the substrate 11 is loaded and seated on the substrate loading part 42 from the outside of the deposition chamber 40.
  • the substrate loading part 42 is positioned above the deposition chamber 40 so that the evaporation particles may be sprayed upward in the evaporation source unit 10 and deposited on the substrate 11, and the substrate 11 may be a substrate. It is attached to the lower portion of the loading portion (42).
  • the shadow mask When the substrate 11 is loaded and seated on the substrate loading part 42, the shadow mask is disposed on the surface of the substrate 11 in the substrate loading part 42, and the substrate 11 and the shadow mask may be aligned with each other. have.
  • the evaporation source unit 10 is mounted on the source moving means 44, and the source moving means 44 moves the evaporation source unit 10 along the surface of the substrate 11.
  • the source moving means 44 is located at the lower end of the deposition chamber 40 to face the substrate 11 and moves the evaporation source unit 10 from one side of the substrate 11 to the other side. During the movement of the evaporation source unit 10, evaporated particles are ejected from the evaporation source unit 10 to deposit evaporated particles on the entire substrate 11.
  • the source moving means 44 may include a linear motor (LM) guide for guiding linear movement.
  • LM linear motor
  • a door 46 may be provided at one side of the deposition chamber 40, and the upper case 28 having the crucible by opening the door 46 moves linearly along the rail part 20. Can be withdrawn via 46).
  • the door 46 is provided to face the end of the source moving means 44, and the evaporation source unit 10 opens the door 46 with the source moving means 44 moved to the end.
  • the upper case 28 may be moved along the rail 20 to draw out to the outside of the door 46.
  • the evaporation source unit 10 is the source moving means 44. Move along to position the door 46 close, and lower the heating portion to separate the crucible and heating portion. Next, open the door 46 and move the upper case 28 along the rail portion 20 so that the upper case 28 is separated from the lower case 12 to move the upper case 28 through the door 46. It is drawn out of the deposition chamber 40. Next, the crucible is separated from the lower end of the upper case 28 to fill the evaporation material or to maintain the crucible.
  • the crucible is coupled to the upper case 28 and the upper case 28 is moved along the rail portion 20 through the door 46 to lower the case 12. And coalesce with.
  • the deposition on the substrate 11 is performed while moving the coalescing evaporation unit 10 along the source moving means 44.
  • FIG. 6 is a view for explaining a deposition apparatus according to another embodiment of the present invention
  • Figure 7 is a view for explaining a scanner and a scanner moving means of the deposition apparatus according to another embodiment of the present invention
  • 8 is a state diagram of use of the deposition apparatus according to another embodiment of the present invention.
  • the evaporation source unit 10 the lower case 12, the rail unit 20, the upper case 28, the heating unit 14, the nozzle unit 30, the deposition chamber 40, and the door. 46, the center point 48, the robot arm 50, the first radial direction 52, the second radial direction 54, the first substrate 56, the second substrate 58, and the first deposition region ( 60, the second deposition region 62, the source moving means 64, the rotating means 66, the first substrate loading part 68, the second substrate loading part 70, the scanner 72, and the scanner moving means.
  • the deposition apparatus is divided into a first deposition region 60 and a second deposition region 62, and the first substrate 56 is moved in the first radial direction 52 at one center point 48.
  • a deposition chamber 40 which draws in and out of the first deposition region 60 and draws in and out of the second deposition region 62 in the second radial direction 54 at the center point 48.
  • the evaporation source unit 10 and the evaporation source unit 10 according to the embodiment including the linear nozzle unit 30 to spray the evaporation particles in a linear manner is mounted on the first substrate 56 or the second Source moving means 64 for linearly moving the evaporation source unit 10 along the surface of the first substrate 56 or the second substrate 58 so that the evaporation particles are sprayed onto the surface of the substrate 58;
  • a scanner moving means 74 for reciprocating the scanner 72 so that the scanner 72 is located in the first deposition region 60 or the second deposition region 62.
  • a deposition process is performed on a plurality of substrates in one chamber, and a tack time is performed by performing a transfer process or an alignment process on another substrate during the deposition process of one substrate. ), And the loss of evaporated materials generated during the transfer or alignment process to the substrate can be reduced.
  • the charging time can be reduced.
  • the deposition chamber 40 is divided into a first deposition region 60 and a second deposition region 62, and the first substrate 56 is firstly disposed in the first radial direction 52 at one center point 48.
  • the second substrate 58 is drawn in and out of the deposition region 60, and the second substrate 58 is drawn in and out of the second deposition region 62 in the second radial direction 54 at the center point 48.
  • the deposition chamber 40 is a place where evaporation particles are deposited on the substrate therein, and the deposition chamber 40 includes a plurality of deposition regions so as to deposit a plurality of substrates in one deposition chamber 40. (60, 62).
  • the deposition regions 60 and 62 refer to virtual spaces in which evaporation particles may be deposited on one substrate as the evaporation source unit 10 moves. Referring to FIG. 6, one point in FIG.
  • the deposition chamber 40 may be partitioned into the first deposition region 60 and the second deposition region 62 by the center line of the deposition chamber 40 indicated by the dashed line. Evaporation particles are deposited on the first substrate 56 in the first deposition region 60 and evaporation particles on the second substrate 58 in the second deposition region 62 adjacent to the first deposition region 60. Deposition takes place.
  • the first substrate 56 is drawn into or withdrawn from one center point 48 to the first deposition region 60 of the deposition chamber 40 in the first radial direction 52, and the second substrate 58 is the center point.
  • the lead is drawn into or withdrawn from the second deposition region 62 of the deposition chamber 40 in the second radial direction 54. That is, the first substrate 56 and the second substrate 58 are drawn in or drawn out with a predetermined inclination to the deposition chamber 40.
  • the substrate may be drawn into or withdrawn from the deposition chamber 40 by a robot arm 50 provided in a transfer chamber connected to the deposition chamber 40. Since the substrate is withdrawn in and out of the deposition chamber 40 in the radial direction from the center of rotation of the substrate), the substrate is withdrawn at a constant inclination to the deposition chamber 40.
  • the robot arm 50 constituting the center point 48 is rotated at the center of rotation.
  • the first substrate 56 is drawn in and out of the deposition chamber 40 in the first radial direction 52 with respect to the center of rotation of the robot arm 50 constituting the center point 48.
  • the first substrate 56 and the second substrate 58 are not limited to drawing in and out of the deposition chamber 40 by the robot arm 50.
  • the deposition apparatus according to the present exemplary embodiment may be applied.
  • the rotation center of the robot arm 50 is the center point described above.
  • the center point 48 is formed by the point where two virtual inclined lines formed by the inclination directions of the first substrate 56 and the second substrate 58 meet each other without forming the 48.
  • the first substrate 56 and the second substrate 58 are loaded on the first substrate loading portion 68 and the second substrate loading portion 70, respectively.
  • the evaporation particles are sprayed upward from the evaporation source unit 10 so that the evaporation particles are deposited on the substrate so that the first substrate loading portion 68 and the second substrate loading portion 70 are disposed on the lower surface of the first substrate loading portion. Top surfaces of the substrate 56 and the second substrate 58 are respectively attached.
  • the shadow mask is disposed on the surface of the substrate in each substrate loading portion.
  • the substrate and the shadow mask 36 may be aligned with each other.
  • the scanner 72 includes an evaporation source unit 10 including a linear nozzle unit 30 so as to eject evaporated particles linearly, and an evaporation source unit 10 mounted thereon, the first substrate 56 or the Source moving means 64 for linearly moving the evaporation source unit 10 along the surface of the first substrate 56 or the second substrate 58 so that the evaporation particles are sprayed onto the surface of the second substrate 58;
  • the rotating nozzle 66 rotates the source moving means 64 such that the linear nozzle part 30 is parallel to one side of the first substrate 56 or the second substrate 58.
  • the scanner 72 linearly reciprocates the evaporation source unit 10 along the surface of the substrate so that evaporated particles ejected from the evaporation source unit 10 are deposited on the surface of the substrate.
  • the evaporation source unit 10 including the linear nozzle unit 30 injects evaporated particles onto the surface of the first substrate 56 or the second substrate 58.
  • the evaporation source unit 10 deposits evaporated particles on the substrate by linearly moving in the direction of the other side facing one side of the substrate, and includes a linear nozzle unit 30 corresponding to the width of the substrate.
  • the linear nozzle unit 30 includes a transfer tube coupled to the upper end of the crucible, and a diffusion tube coupled to the transfer tube in a transverse direction so as to communicate with the transfer tube, and having a plurality of injection nozzles formed along the longitudinal direction. Including, it is configured to eject the evaporated particles linearly.
  • the diffusion tube of the nozzle unit 30 is disposed to be parallel to one side of the first substrate 56 or the second substrate 58.
  • the source moving means 64 the evaporation source unit 10 to the surface of the first substrate 56 or the second substrate 58 so that the evaporation particles are injected onto the surface of the first substrate 56 or the second substrate 58. Move straight along. As described above, since the evaporation source unit 10 linearly moves in the other direction facing one side of the substrate to deposit evaporated particles on the substrate, the evaporation source unit 10 is linearly moved using the source moving means 64. .
  • the scanner moving means 74 reciprocates the scanner 72 so that the scanner 72 is located in the first deposition region 60 or the second deposition region 62.
  • the scanner moving means 74 may complete the deposition process in the first deposition region 60. Is moved to the second deposition region 62.
  • the scanner moving means 74 causes the scanner 72 to perform the deposition process on the substrate located in each deposition region while reciprocating between the first deposition region 60 and the second deposition region 62.
  • the scanner moving means 74 is configured such that the scanner 72 can linearly move the first deposition region 60 and the second deposition region 62.
  • FIG. 7 shows a scanner 72 and a scanner moving means 74 of the deposition apparatus according to the present embodiment, wherein the scanner moving means 74 includes a first deposition region 60 and a second deposition region 62. And a pair of scanner guide portions 92 arranged in parallel to each other across.
  • the source moving means 64 includes a support frame 80 disposed in parallel with the substrate as the rotating means 66 rotates, and the evaporation source unit 10 is mounted to support the length of the support frame 80. It may be composed of a source guide portion 82 disposed in the longitudinal direction on the support frame 80 to move in the direction.
  • the source guide portion 82 moves along the LM guide 84 and the LM guide 84 disposed in the longitudinal direction of the support frame 80 and includes a moving block 86 to which the evaporation source unit 10 is coupled. .
  • the moving block 86 moves along the LM guide 84 to move the evaporation source unit 10 along the support frame 80 in the longitudinal direction.
  • the rotation means 66 is coupled to any one of the pair of scanner guide portion 92, the rotation guide portion 88 for guiding the rotation of the support frame 80, and a pair of scanner guide portion 92 Is coupled to the other one of the, and the support frame 80 includes a pivot 90 is rotatably coupled.
  • a pair of scanner guide portions 92 are disposed in parallel with each other across the first deposition region 60 and the second deposition region 62 at upper and lower ends of the deposition chamber 40, and a support frame. 80 is coupled to the scanner guide portion 92 so that both ends thereof are supported by a pair of scanner guide portions 92, respectively.
  • the rotation guide portion 88 is interposed between the scanner guide portion 92 and the support frame 80 at the bottom and the scanner guide portion 92 and the support frame 80 at the top
  • the rotating frame 90 is rotatably coupled to the support frame 80 is coupled.
  • a normal linear motor (LM) guide is used as the source guide portion 82 and the scanner guide portion 92.
  • the scanner 72 is the LM guide 94 disposed on the upper and lower ends of the deposition chamber 40 ) Is moved from the second deposition region 62 on the left side to the first deposition region 60 on the right side.
  • the moving block 96 of the lower LM guide 94 is stopped to stop the movement of the lower end of the support frame 80.
  • the lower end of the support frame 80 is guided by the rotation guide 88 while rotating It may be rotated and the support frame 80 may be rotated to have an inclination.
  • the first substrate 56 is loaded with an inclination to the deposition chamber 40 in the first radial direction 52 and seated on the first substrate loading portion 68.
  • One side of the first substrate 56 and the nozzle portion In the state in which the rotating means 66 rotates the source moving means 64 so that the longitudinal direction of the 30 may be parallel, the evaporation source unit 10 is linearly directed toward the first substrate 56 by the source moving means 64. It is moved to deposit evaporated particles on the surface of the first substrate 56.
  • the rotating unit 90 includes a pair of LM guides 98 extending vertically from the LM guide 94 of the scanner guide unit 92 at the upper end, and a moving block 100 of the pair of LM guides 98. It may be composed of a support 102 for connecting, and a boss 106 extending vertically from the support 102.
  • a rotating shaft 104 protrudes from the support frame 80 and is inserted into the boss 106. As the upper end of the support frame 80 moves, the rotary shaft 104 is rotated in the boss 106.
  • the stop position of the lower end of the support frame 80 and the moving position of the upper end of the support frame 80 may be determined according to the inclination of the substrate.
  • the scanner 72 moves the scanner 72 so as to face the door 46.
  • the scanner 72 is moved along the scanner guide portion 92 so that the evaporation source unit 10 of the scanner 72 faces the door 46.
  • the evaporation source unit 10 is moved by the source moving means 74 to bring it closer to the door 46.
  • the heating part in the lower case is lowered to separate the crucible and the heating part.
  • the crucible is separated from the lower end of the upper case 28 to fill the evaporation material or to maintain the crucible.
  • the crucible is coupled to the upper case 28 and the upper case 28 is moved along the rail portion 20 through the door 46 to lower the case 12. And coalesce with.
  • the deposition on the substrate 11 is performed while moving the coalescing evaporation unit 10 along the source moving means 44.

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Abstract

La présente invention concerne une unité source d'évaporation et un dispositif de dépôt. Un aspect de la présente invention concerne une unité source d'évaporation agencée à l'intérieur d'une chambre de dépôt afin de mettre en œuvre un dépôt par rapport à un substrat. L'unité source d'évaporation comprend : un boîtier inférieur ayant une extrémité supérieure ouverte ; une unité de chauffage en forme de barillet, positionnée dans le boîtier inférieur et conçue de façon à se déplacer vers le haut/vers le bas ; une unité rail accouplée à l'extrémité supérieure du boîtier inférieur dans la direction transversale et conçue de façon à guider un mouvement rectiligne ; un boîtier supérieur ayant une extrémité inférieure ouverte montée sur l'unité rail de sorte que, lorsque celui-ci se déplace le long de l'unité rail, il forme un seul bloc avec le boîtier inférieur ou il est séparé de ce dernier ; et un creuset positionné dans le boîtier supérieur de sorte que, lorsque l'unité de chauffage se déplace vers le haut/vers le bas, le creuset soit amené dans l'unité de chauffage ou extrait de celle-ci.
PCT/KR2014/005820 2014-06-30 2014-06-30 Unité source d'évaporation et dispositif de dépôt WO2016002982A1 (fr)

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KR1020140080854A KR101530318B1 (ko) 2014-06-30 2014-06-30 증발원 유닛 및 증착 장치
KR10-2014-0080854 2014-06-30

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CN109423610B (zh) 2017-08-24 2020-12-04 京东方科技集团股份有限公司 一种蒸镀装置及蒸镀方法
KR20230064300A (ko) 2021-11-03 2023-05-10 (주)고성엔지니어링 Oled 증착 제어 시스템

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Publication number Priority date Publication date Assignee Title
JP2007305560A (ja) * 2006-05-11 2007-11-22 Samsung Sdi Co Ltd 有機発光素子の蒸着装置及び蒸着材料の充填方法
KR20090016898A (ko) * 2007-08-13 2009-02-18 세메스 주식회사 유기발광소자 박막 제작을 위한 이동식 선형증발원
KR20100120081A (ko) * 2009-05-04 2010-11-12 삼성모바일디스플레이주식회사 유기물 증착 장치 및 증착 방법
JP2012229476A (ja) * 2011-04-27 2012-11-22 Hitachi High-Technologies Corp 蒸発源および蒸着装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007305560A (ja) * 2006-05-11 2007-11-22 Samsung Sdi Co Ltd 有機発光素子の蒸着装置及び蒸着材料の充填方法
KR20090016898A (ko) * 2007-08-13 2009-02-18 세메스 주식회사 유기발광소자 박막 제작을 위한 이동식 선형증발원
KR20100120081A (ko) * 2009-05-04 2010-11-12 삼성모바일디스플레이주식회사 유기물 증착 장치 및 증착 방법
JP2012229476A (ja) * 2011-04-27 2012-11-22 Hitachi High-Technologies Corp 蒸発源および蒸着装置

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