WO2015190363A1 - Structure mems - Google Patents

Structure mems Download PDF

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Publication number
WO2015190363A1
WO2015190363A1 PCT/JP2015/066008 JP2015066008W WO2015190363A1 WO 2015190363 A1 WO2015190363 A1 WO 2015190363A1 JP 2015066008 W JP2015066008 W JP 2015066008W WO 2015190363 A1 WO2015190363 A1 WO 2015190363A1
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WO
WIPO (PCT)
Prior art keywords
fixed electrode
mems structure
movable weight
main body
substrate
Prior art date
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PCT/JP2015/066008
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English (en)
Japanese (ja)
Inventor
崇 溝田
威 岡見
夕輝 植屋
潤弥 松岡
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株式会社村田製作所
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Publication of WO2015190363A1 publication Critical patent/WO2015190363A1/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
    • G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
    • G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
    • G01C19/5719—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using planar vibrating masses driven in a translation vibration along an axis
    • G01C19/5733—Structural details or topology
    • G01C19/5755—Structural details or topology the devices having a single sensing mass
    • G01C19/5762—Structural details or topology the devices having a single sensing mass the sensing mass being connected to a driving mass, e.g. driving frames
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/84—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by variation of applied mechanical force, e.g. of pressure

Definitions

  • the present invention relates to a MEMS structure manufactured using MEMS (Micro Electro Mechanical Systems) technology.
  • MEMS structures manufactured using MEMS technology have been used in various sensors (for example, acceleration sensors and gyro sensors) for detecting physical quantities.
  • the MEMS structure used for such a sensor has a movable part that can be displaced by an external factor, and detects a physical quantity by converting the deformation and displacement of the movable part into an electrical signal and outputting it. Composed.
  • An angular velocity sensor described in Patent Document 1 includes a driving mass unit supported to be vibrated in a predetermined direction using a driving beam, and a detection mass supported to be swingable around the detection beam inside the driving mass unit. And the angular velocity is detected by the displacement accompanying the oscillation of the detection mass unit.
  • the detection mass unit is formed in a substantially rectangular flat plate shape, and can be swung so as to approach and separate from the detection electrode by a detection beam connected to one end side. It is supported by.
  • the detection weight portion is shaken by the detection beam with respect to the drive mass portion that is arranged so as to be able to vibrate in a predetermined direction horizontal to the substrate surface.
  • the drive mass unit and the movable unit are arranged so as to constantly vibrate in a direction orthogonal to the swing axis direction of the detection beam, and the gap is placed above the detection electrode fixed on the substrate surface. It will move apart.
  • the detection electrode disposed on the substrate surface is disposed in a range narrower than the range of the movable portion in plan view (see FIGS. 1 and 3 in Patent Document 1). ), Electrostatic attraction generated in the detection electrode acts on the movable portion so as to be drawn toward the detection electrode.
  • a part of the movable part moves so as to deviate from immediately above the detection electrode in accordance with the vibration of the drive mass part or the like, so that the facing area between the movable part and the detection electrode varies. Due to the change in the facing area, the electrostatic attractive force generated between the movable part and the detection electrode changes, and thus the torque in the movable part changes.
  • the position of the swing shaft (for example, the detection beam) that supports the movable part is displaced in accordance with the vibration of the drive mass part and the like.
  • the detection electrode is not displaced because it is fixed on the substrate. Therefore, since the distance between the point of action where the electrostatic attractive force generated by the detection electrode acts on the movable part and the swinging shaft that supports the movable part so as to swing is changed according to the vibration of the driving mass part, etc. The fluctuation of the torque in the movable part occurs.
  • the movable part swings due to a factor other than the Coriolis force.
  • the capacitance between the movable part and the detection electrode changes, and an interference signal (Quadrature Error) that may be confused with the Coriolis force may occur.
  • the present invention has been made in view of the above-described problems, and relates to a MEMS structure having a movable portion that is swingably disposed above a fixed electrode fixed to a substrate, and constitutes a sensor with less interference signal.
  • a possible MEMS structure is provided.
  • a MEMS structure is disposed so as to be able to vibrate in a first direction that is positioned above a substrate, a fixed electrode fixed on the substrate, and above the substrate, and is horizontal to the substrate plane.
  • the fixed electrode is disposed in a range wider than the end of the weight portion in the first direction.
  • the MEMS structure includes a substrate, a fixed electrode, a drive unit, a weight unit, and a torsion bar, and the displacement of the weight unit in a state where the drive unit vibrates in the first direction is fixed electrode.
  • the external factors acting on the MEMS structure can be detected.
  • the fixed electrode is disposed in a wider range than the end portion of the weight portion in the first direction. Therefore, according to the MEMS structure, the state in which the entire weight portion is positioned on the fixed electrode can be lengthened in the process in which the driving portion and the weight portion vibrate in the first direction, and the torque acting on the weight portion can be increased. Variations can be reduced.
  • production of an interference signal (Quadrature Error) can be reduced by reducing the fluctuation
  • a MEMS structure according to another aspect of the present invention is the MEMS structure according to claim 1, wherein the weight portion is swingably supported by a torsion bar at one end portion in the first direction.
  • the fixed electrode is disposed on the other end side of the weight portion in the first direction in a range wider than the vibration width of the driving portion in the first direction.
  • the weight portion is swingably supported by a torsion bar at one end portion in the first direction, and the fixed electrode is related to the first direction at the other end side of the weight portion in the first direction. It is arranged in a range wider than the vibration width of the drive unit. Therefore, according to the MEMS structure, it is possible to reduce fluctuations in electrostatic attraction in the process of vibration in the first direction with respect to the other end side of the weight portion having a large displacement with respect to the fixed electrode. As a result, according to the MEMS structure, it is possible to reduce the variation in torque related to the weight portion and to suppress the generation of interference signals.
  • a MEMS structure according to another aspect of the present invention is the MEMS structure according to claim 2, wherein the fixed electrode is a vibration of the drive unit with respect to the first direction at one end side of the weight portion in the first direction. It is arranged in a range wider than the width.
  • the fixed electrode is arranged in a range wider than the vibration width of the driving unit in the first direction on one end side of the weight portion in the first direction. That is, the fluctuation of the electrostatic attractive force in the process of vibration in the first direction can be reduced also on one end side of the weight portion supported by the torsion bar. As a result, according to the MEMS structure, it is possible to eliminate the fluctuation of the torque related to the weight portion and to suppress the generation of the interference signal.
  • a MEMS structure according to another aspect of the present invention is the MEMS structure according to any one of claims 1 to 3, wherein the fixed electrode is associated with the vibration of the drive unit in the first direction. Regardless of the position of the drive unit, the drive unit is arranged in a range that is always below the drive unit or a range that is not always below the drive unit.
  • the fixed electrode is always in a range that is always below the drive unit or is always driven regardless of the position of the drive unit in accordance with the vibration of the drive unit in the first direction. It is arrange
  • the drive unit and the like are arranged in the first direction by disposing the fixed electrode in a range wider than the end of the weight unit with respect to the first direction in which the drive unit and the weight unit vibrate.
  • the state in which the entire weight portion is located on the fixed electrode can be lengthened, and fluctuations in torque acting on the weight portion can be reduced.
  • the MEMS structure reduces the occurrence of an interference signal (Quadrature Error) as the torque fluctuation acting on the weight portion is reduced.
  • FIG. 5 is a side cross-sectional view of a MEMS structure in a state where the MEMS structure is moved to a maximum amplitude in a ⁇ X direction.
  • the MEMS structure 1 according to the present embodiment is manufactured using a known MEMS (Micro Electro Mechanical Systems) technology, and constitutes a capacitive angular velocity sensor.
  • MEMS Micro Electro Mechanical Systems
  • the MEMS structure 1 has a main body 20 and a movable weight 30 disposed above a fixed electrode 10 fixed on the surface of a substrate 2 by an anchor 22 or the like formed on the substrate 2. Configured.
  • the substrate 2 is chipped into a plate shape having a substantially rectangular shape.
  • the direction along the longitudinal direction of the substrate 2 is the X direction
  • the direction perpendicular to the X direction and along the short direction of the substrate 2 is the Y direction
  • the direction perpendicular to both the X direction and the Y direction is defined as the Z direction.
  • the substrate 2 has an insulating layer formed so as to cover the upper surface of the flat core substrate, and the fixed electrode 10 is formed on the surface of the insulating layer of the substrate.
  • the fixed electrode 10 is formed to have a length dimension of the fixed electrode range L in the X direction (see FIGS. 2 to 4).
  • a main body portion 20, a movable weight 30, and the like are formed by performing an etching process on a conductive low resistance silicon material or the like.
  • a main body 20 and a plate-shaped movable weight 30 are disposed in the central portion of the substrate 2, and the main body 20 and the movable weight 30 are erected at the four corners of the substrate 2.
  • the anchor 22 and the like are arranged in parallel to the surface of the substrate 2 at a predetermined interval.
  • the main body 20 has a vibration movable electrode (not shown), and cooperates with a vibration fixed electrode (not shown) disposed on the surface of the substrate 2 to thereby have a predetermined maximum amplitude d.
  • a vibration movable electrode not shown
  • a vibration fixed electrode not shown
  • the anchor 22 is erected in a rectangular parallelepiped shape at the four corners of the substrate 2, and a drive spring 21 formed at a corner of the main body 20 is connected thereto.
  • Each driving spring 21 has one end connected to the corner of the main body 20 and the other end connected to the anchor 22, and is configured to be expandable and contractable in the X direction. Therefore, the main body portion 20 is held in a state of being floated on the substrate 2 by being supported by the driving springs 21 on the respective anchors 22 fixed to the four corners of the substrate 2.
  • Each anchor 22 has a through hole 23 in which a conductive material is embedded. The through hole 23 is electrically connected to an electrode layer formed in the substrate 2.
  • a movable weight 30 is formed at the center of the main body 20. As shown in FIGS. 1 to 4, the movable weight 30 is formed in a substantially rectangular plate shape in plan view, and is arranged so that the long side is along the X direction. The movable weight 30 is formed to be movable relative to the main body portion 20 via the torsion bar 31 and faces the fixed electrode 10 disposed on the surface of the substrate 2 with a predetermined interval. Are arranged to be.
  • a pair of torsion bars 31 is formed on one end side in the long side direction of the movable weight 30 (that is, the end portion on the ⁇ X direction side), and the gap between the movable weight 30 and the main body portion 20 is formed. Connected. Therefore, the movable weight 30 is supported so as to be swingable with respect to the main body 20 around the torsion bar 31 as an axis, and the other end side of the movable weight 30 can be displaced in the Z direction. Thereby, since the electrostatic capacitance between the movable weight 30 and the fixed electrode 10 can be changed, the change in angular velocity can be detected by the change in the electrostatic capacitance.
  • the movable weight 30 in a normal state (that is, a state in which no external factor is acting), the movable weight 30 is formed so as to be located on substantially the same plane as the main body portion 20, The upper surface of the movable weight 30 has the same position in the Z direction as the upper surface of the main body 20.
  • the torsion bar 31 is formed on one end side of the movable weight 30 in the long side direction (that is, the end portion on the ⁇ X direction side) and has a rod shape extending along the short side direction (Y direction) of the movable weight 30. ing.
  • One end of the torsion bar 31 is connected to the main body 20, and the other end is connected to one end of the movable weight 30 in the X direction. Therefore, the torsion bar 31 supports one end side of the movable weight 30 in the X direction so as to be swingable with respect to the main body 20, and twists and deforms as the movable weight 30 swings.
  • the main body 20 and the movable weight 30 are provided with the vibration movable electrode disposed on the main body 20 and the vibration disposed on the surface of the substrate 2.
  • the fixed electrode By cooperating with the fixed electrode, it is possible to vibrate in the X direction (that is, + X direction and ⁇ X direction) with a predetermined maximum amplitude d.
  • the positional relationship between the main body 20 and the movable weight 30 accompanying the vibration in the X direction and the fixed electrode 10 will be described in three cases.
  • FIG. 2 is a cross-sectional view taken along the line II of the MEMS structure 1 according to the present embodiment, and shows the positional relationship between the main body 20 and the movable weight 30 and the fixed electrode 10 in the initial state.
  • the initial state means a state in which the main body 20 and the movable weight 30 are not vibrating in the X direction, and the movable weight 30 is not displaced in the Z direction at all and is substantially horizontal.
  • the movable weight 30 is located above the substrate 2 and the fixed electrode 10 in the central portion of the substrate 2 and the fixed electrode 10 in the X direction.
  • the fixed electrode 10 is configured to have a dimension of the fixed electrode range L with respect to the X direction, and is a dimension obtained by adding the maximum amplitude d to the end of the movable weight 30 showing a substantially horizontal posture.
  • the edge of the fixed electrode 10 is formed so as to be located at a position further separated in the + X direction and the ⁇ X direction.
  • the main body 20 has a movable weight 30 at the center thereof, and has a certain gap with the outer edge of the movable weight 30. And since the main-body part 20 is connected to the movable weight 30 via the torsion bar 31, the main-body part 20 is located in the center part of the board
  • FIG. 3 is a cross-sectional view taken along the line II of the MEMS structure 1 according to this embodiment, and shows the positional relationship between the main body 20 and the movable weight 30 and the fixed electrode 10 in a state where the MEMS structure 1 vibrates in the + X direction with the maximum amplitude d. ing.
  • the fixed electrode 10 is located at a position further separated in the + X direction and the ⁇ X direction than the dimension obtained by adding the maximum amplitude d to the end of the movable weight 30 showing a substantially horizontal posture.
  • the fixed electrode 10 is formed so that the end edge thereof is located. Therefore, when moving in the + X direction by the maximum amplitude d, the end of the movable weight 30 in the + X direction is located above the fixed electrode 10. At this time, the end of the movable weight 30 in the ⁇ X direction is also located above the fixed electrode 10.
  • the inner opening edge of the main body portion 20 formed so as to surround the movable weight 30 is located at a position away from the end edge of the fixed electrode 10 toward the + X side and the ⁇ X side by the maximum amplitude d with respect to the X direction. Is located. Therefore, like the movable weight 30, even when the main body 20 moves in the + X direction by the maximum amplitude d, the inner opening edge of the main body 20 on the ⁇ X direction side is fixed on the ⁇ X direction side. It is not located on the electrode 10 but located outside the fixed electrode 10 in the X direction (see FIG. 3).
  • the inner opening edge of the main body 20 on the + X direction side is located in the + X direction with respect to the end portion of the fixed electrode 10 on the + X direction side. Therefore, even when the main body 20 moves in the + X direction by the maximum amplitude d, the inner opening edge of the main body 20 on the + X direction side is not located on the fixed electrode 10, It is located outside the fixed electrode 10.
  • FIG. 4 is a cross-sectional view of the MEMS structure 1 according to the present embodiment taken along the line II, showing the positional relationship between the main body 20 and the movable weight 30 and the fixed electrode 10 in a state of oscillating with the maximum amplitude d in the ⁇ X direction. Show.
  • the fixed electrode 10 has an end edge of the fixed electrode 10 at a position further separated in the + X direction and the ⁇ X direction than the dimension obtained by adding the maximum amplitude d to the end of the movable weight 30 showing a substantially horizontal posture. Is formed to be positioned. Therefore, as shown in FIG. 4, when moving by the maximum amplitude d in the ⁇ X direction, the end of the movable weight 30 in the ⁇ X direction (the end on the side supported by the torsion bar 31) is fixed. Located above the electrode 10. At this time, the end of the movable weight 30 in the + X direction is also located above the fixed electrode 10.
  • the inner opening edge of the main body 20 formed so as to surround the movable weight 30 is located at a position farther from the maximum amplitude d on the + X side and the ⁇ X side than the end edge of the fixed electrode 10 in the X direction. positioned. Accordingly, like the movable weight 30, even when the main body 20 moves in the ⁇ X direction by the maximum amplitude d, the inner opening edge of the main body 20 on the + X direction side is fixed electrode on the + X direction side. It is not located on 10 but located outside the fixed electrode 10 in the X direction (see FIG. 4).
  • the inner opening edge of the main body 20 on the ⁇ X direction side is located in the ⁇ X direction with respect to the end portion of the fixed electrode 10 on the ⁇ X direction side. Therefore, even when the main body 20 moves in the ⁇ X direction by the maximum amplitude d, the inner opening edge of the main body 20 on the ⁇ X direction side is not positioned on the fixed electrode 10, and X Located outside the fixed electrode 10 in the direction.
  • the movable weight 30 is always placed above the fixed electrode 10 in the process in which the main body 20 and the movable weight 30 vibrate in the X direction. Can be located.
  • the electrostatic attractive force acting between the fixed electrode 10 and the movable weight 30 does not fluctuate.
  • the action point where the electrostatic attractive force generated by the fixed electrode 10 acts on the movable weight 30 that is, the start point or the end point of the electric lines of force
  • the movable weight 30 can be swung.
  • the distance from the torsion bar 31 to be supported does not change as the main body 20 vibrates in the X direction.
  • the MEMS structure 1 in the process in which the main body portion 20 and the like vibrate in the X direction, torque fluctuation in the movable weight 30 does not occur, and the movable weight 30 is a factor other than the Coriolis force. And the capacitance between the fixed electrode 10 and the movable weight 30 does not fluctuate. As a result, according to the MEMS structure 1, it is possible to suppress the generation of an interference signal (Quadrature Error) that may be confused with the Coriolis force in the process of vibrating in the X direction.
  • an interference signal Quadadrature Error
  • the main body 20 in the process in which the main body 20 and the movable weight 30 vibrate in the X direction, the main body 20 is always positioned outside the fixed electrode 10 in the X direction. (See FIGS. 2 to 4). That is, according to the MEMS structure 1, the relative situation between the main body 20 and the fixed electrode 10 is not changed in the process in which the main body 20 vibrates in the X direction. The capacitance does not change between the two. As a result, according to the MEMS structure 1, since no signal due to the variation in the capacitance is output, the generation of the interference signal is reduced without affecting the sensitivity of the sensor. be able to.
  • the MEMS structure according to the present embodiment includes the substrate 2, the fixed electrode 10, the main body 20, the movable weight 30, and the torsion bar 31, and the main body 20 is X.
  • the fixed electrode 10 is configured to detect the displacement of the movable weight 30 due to an external factor that has acted in a state of vibrating in the direction.
  • the fixed electrode 10 is disposed on the surface of the substrate 2 so as to have a fixed electrode range L wider than the movable weight 30 in the X direction. Therefore, according to the MEMS structure 1, the state in which the entire movable weight 30 is positioned above the fixed electrode 10 can be lengthened in the process in which the main body 20 and the movable weight 30 vibrate in the X direction. The fluctuation of the torque acting on 30 can be reduced.
  • the fixed electrode 10 is moved from the free end side of the movable weight 30 supported by the torsion bar 31 (that is, the + X direction side end) to the + X direction in the main body portion 20 and the like. It is arranged over a wider range than the maximum amplitude d.
  • the free end of the movable weight 30 has a large amount of displacement with respect to the fixed electrode 10, and is strongly affected by fluctuations in torque with respect to the movable weight 30.
  • at least the free end portion of the movable weight 30 is always positioned above the fixed electrode 10 in the process in which the main body 20 and the like vibrate in the X direction. (See FIGS.
  • the fluctuation of the electrostatic attractive force with respect to the movable weight 30 can be efficiently reduced, thereby reducing the fluctuation of the torque related to the movable weight 30 and suppressing the generation of the interference signal. can do.
  • the fixed electrode 10 has a main body in the ⁇ X direction from the fixed end side (that is, the end portion on the ⁇ X direction side) of the movable weight 30 on which the torsion bar 31 is formed. It is arranged over a wider range than the maximum amplitude d in the part 20 or the like. That is, according to the MEMS structure 1 according to the present embodiment, the entire movable weight 30 can always be positioned above the fixed electrode 10 in the process in which the main body 20 and the like vibrate in the X direction (see FIG. 2 to 4). Therefore, according to the MEMS structure 1, it is possible to eliminate the fluctuation of the electrostatic attractive force with respect to the movable weight 30, thereby reducing the fluctuation of the torque related to the movable weight 30 and suppressing the generation of the interference signal. .
  • the main-body part 20 is always located in the outer side of the fixed electrode 10 in a X direction in the process in which the main-body part 20 and the movable weight 30 vibrate in the X direction ( (See FIGS. 2 to 4). That is, according to the MEMS structure 1, the relative situation between the main body 20 and the fixed electrode 10 is not changed in the process in which the main body 20 vibrates in the X direction. The capacitance does not change between the two. As a result, according to the MEMS structure 1, since no signal due to the variation in the capacitance is output, the generation of the interference signal is reduced without affecting the sensitivity of the sensor. be able to.
  • the present invention has been described above based on the embodiments.
  • the present invention is not limited to the above-described embodiments, and various improvements and modifications can be made without departing from the spirit of the present invention.
  • the physical quantity detected by the sensor using the MEMS structure is not limited to the angular velocity described above, and the direction in which the physical quantity can be detected (such as the Z direction) can be changed as appropriate.
  • the shape and configuration of each part constituting the MEMS structure 1 is an example, and may be changed as appropriate.
  • the torsion bar 31 is formed in a bar shape extending in the Y direction on one end side of the movable weight 30 in the X direction, and is supported so as to be swingable with respect to the main body portion 20. It is not limited to this aspect. In other words, if the plate-like movable weight is swingably supported by a bar-like torsion bar extending in the Y direction, the position for swingably supporting can be set as appropriate.
  • the range of the fixed electrode 10 is set so that the main body 20 does not be above the fixed electrode 10 in any state where the main body 20 and the movable weight 30 vibrate in the X direction.
  • the present invention is not limited to this mode.
  • the fixed electrode range L is set so that the edge of the fixed electrode 10 in the X direction is located at a position spaced apart from the outer edge of the main body 20 in the X direction by a maximum amplitude d in the + X direction and the ⁇ X direction. It is also possible to do.
  • the main body portion 20 is always positioned above the fixed electrode 10 when vibrating in the X direction.
  • the MEMS structure 1 is an example of the MEMS structure of the present invention.
  • the substrate 2 is an example of a substrate.
  • the fixed electrode 10 is an example of a fixed electrode.
  • the main body 20 is an example of a drive unit.
  • the movable weight 30 is an example of a weight portion.
  • the torsion bar 31 is an example of a torsion bar.
  • the X direction and the Y direction are examples of plane directions parallel to the plane of the substrate.
  • the Z direction is an example of a direction perpendicular to the plane of the substrate.

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Abstract

L'invention concerne une structure MEMS (1) qui comprend un substrat (2), une électrode fixe (10), une partie corps (20), un poids mobile (30), et une barre de torsion (31), et qui est conçue de façon à pouvoir détecter le déplacement du poids mobile (30) dans un état où la partie corps (20) est mise à vibrer dans une direction X par l'électrode fixe (10). L'électrode fixe (10) est disposée sur la surface du substrat (2) de manière à avoir une plage (L) d'électrode fixe plus large que le poids mobile (30) dans la direction X qui est la direction de vibration de la partie corps (20) et analogue, et le bord d'extrémité de l'électrode fixe (10) est situé au niveau d'une position éloignée du bord d'extrémité du poids mobile (30) dans la direction X de plus d'une amplitude maximale (d) associée à la vibration de la partie corps (20) et analogue. Dans le procédé de vibration de la partie corps (20) et du poids mobile (30) dans la direction X, le poids mobile (30) est toujours situé au-dessus de l'électrode fixe (10). La structure MEMS susceptible de constituer un capteur dans lequel quelques erreurs se produisent en quadrature est fournie par cette configuration.
PCT/JP2015/066008 2014-06-09 2015-06-03 Structure mems WO2015190363A1 (fr)

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0868637A (ja) * 1994-08-29 1996-03-12 Murata Mfg Co Ltd 捩れ振動型ジャイロ
JP2000509812A (ja) * 1996-10-07 2000-08-02 ハーン―シッカート―ゲゼルシャフト フア アンゲワンテ フォルシュンク アインゲトラーゲナー フェライン 直交する１次振動および２次振動の相互干渉を防止した回転速度ジャイロスコープ
JP2001513885A (ja) * 1997-02-24 2001-09-04 ザ チャールズ スターク ドレイパー ラボラトリー インコーポレイテッド 分割電極を有する音叉ジャイロ
JP2010096538A (ja) * 2008-10-14 2010-04-30 Murata Mfg Co Ltd 角速度センサ
JP2011112455A (ja) * 2009-11-25 2011-06-09 Seiko Epson Corp Ｍｅｍｓセンサー及びその製造方法並びに電子機器
JP2013221919A (ja) * 2012-04-19 2013-10-28 Seiko Epson Corp ジャイロセンサーおよび電子機器

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0868637A (ja) * 1994-08-29 1996-03-12 Murata Mfg Co Ltd 捩れ振動型ジャイロ
JP2000509812A (ja) * 1996-10-07 2000-08-02 ハーン―シッカート―ゲゼルシャフト フア アンゲワンテ フォルシュンク アインゲトラーゲナー フェライン 直交する１次振動および２次振動の相互干渉を防止した回転速度ジャイロスコープ
JP2001513885A (ja) * 1997-02-24 2001-09-04 ザ チャールズ スターク ドレイパー ラボラトリー インコーポレイテッド 分割電極を有する音叉ジャイロ
JP2010096538A (ja) * 2008-10-14 2010-04-30 Murata Mfg Co Ltd 角速度センサ
JP2011112455A (ja) * 2009-11-25 2011-06-09 Seiko Epson Corp Ｍｅｍｓセンサー及びその製造方法並びに電子機器
JP2013221919A (ja) * 2012-04-19 2013-10-28 Seiko Epson Corp ジャイロセンサーおよび電子機器

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