WO2015180449A1 - 基板及其制作方法、3d显示装置以及掩模板 - Google Patents

基板及其制作方法、3d显示装置以及掩模板 Download PDF

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Publication number
WO2015180449A1
WO2015180449A1 PCT/CN2014/093736 CN2014093736W WO2015180449A1 WO 2015180449 A1 WO2015180449 A1 WO 2015180449A1 CN 2014093736 W CN2014093736 W CN 2014093736W WO 2015180449 A1 WO2015180449 A1 WO 2015180449A1
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Prior art keywords
substrate
mask
mark
spacer
transparent electrode
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PCT/CN2014/093736
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English (en)
French (fr)
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汪栋
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京东方科技集团股份有限公司
北京京东方显示技术有限公司
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Publication of WO2015180449A1 publication Critical patent/WO2015180449A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods

Definitions

  • Embodiments of the present invention relate to a substrate, a method of fabricating the same, a 3D display device, and a reticle.
  • a naked-eye 3D display can be implemented by using a liquid crystal grating.
  • the liquid crystal grating device 100 can be disposed on the light-emitting side of the display device 200, which splits the light emitted by the display device 200 so that the light emitted by the left-eye pixel is emitted. Light emitted from the left eye of the viewer and the right eye pixel is directed to the right eye of the viewer, thereby achieving a 3D display effect.
  • the liquid crystal grating device includes: a first substrate and a second substrate disposed opposite to each other, and a liquid crystal layer between the first substrate and the second substrate; wherein the first substrate is provided with a plurality of strip electrodes arranged in parallel with each other, A common electrode is disposed on the two substrates; the liquid crystal molecules are deflected by an electric field between the strip electrodes and the common electrodes to form light and dark stripes, and the light emitted by the left eye pixels of the left eye image and the right image of the right eye image are controlled.
  • the light emitted by the eye pixel enters the left and right eyes of the person, respectively, and the left eye image and the right eye image are images having parallax, and the human brain synthesizes the received image information to generate a 3D effect.
  • Embodiments of the present invention provide a substrate, a manufacturing method thereof, a 3D display device, and a mask plate, which can reduce cost, improve yield, and improve production efficiency.
  • an embodiment of the present invention provides a method of fabricating a substrate, comprising: preparing a substrate; forming a process mark and a spacer on the same layer by a patterning process on the substrate; A transparent electrode is formed on the base substrate.
  • embodiments of the present invention provide a substrate including: a substrate substrate; a process identification And a spacer formed on the base substrate and on the same layer.
  • an embodiment of the present invention provides a 3D display device, including: a display panel for displaying an image; and a liquid crystal grating device including the substrate as described above and disposed on a light exiting side or a light incident side of the display panel.
  • an embodiment of the present invention provides a mask, comprising: a light transmissive area and an opaque area on the substrate, a process identification pattern and a spacer pattern in the light transmissive area or the opaque area, and A monitor identification pattern for indicating the relative position of the mask to the mask carrier.
  • Figure 1 is a schematic diagram of a 3D display technology
  • FIG. 2 is a partial plan view showing a structure of a liquid crystal grating device
  • FIG. 3 is a schematic cross-sectional view of a 3D display device in accordance with an embodiment of the present invention.
  • FIG. 4 is a schematic cross-sectional view of a liquid crystal grating device according to an embodiment of the invention.
  • FIG. 5 is a schematic cross-sectional view of a second substrate in a liquid crystal grating device according to an embodiment of the present invention.
  • FIG. 6 is a schematic top plan view of a mask provided by an embodiment of the present invention.
  • FIG. 7 is a schematic structural diagram of a process identification in a second substrate according to an embodiment of the present invention.
  • FIG. 8 is a schematic top plan view of a reticle structure according to an embodiment of the present invention.
  • FIG. 2 shows a plan view of the substrate.
  • the substrate includes: a substrate substrate 300, a plurality of process marks 400 for forming a liquid crystal grating device on the substrate substrate 300, and a common electrode (Fig. Not shown in 2) and a plurality of spacers 600.
  • the process mark 400 is located in a peripheral area of the base substrate 300, the spacer 600 is located in the display area; the process mark 400 is located on the base substrate 300, the common electrode is located on the process mark 400 and covers the entire base substrate 300, the spacer 600 is located on the common electrode.
  • embodiments of the present invention provide a method of fabricating a substrate as shown in FIG. 2, including the following steps:
  • Step 1 forming a plurality of process identifiers on the substrate by using a first patterning process, such as an exposure alignment mark, a spacer alignment mark, and the like;
  • Step 2 forming a transparent conductive layer on the base substrate on which the process mark is formed by a film forming process, the transparent conductive layer covering at least the display area of the base substrate;
  • Step 3 On the basis of the second step, a plurality of spacers on the substrate are formed by the second patterning process.
  • the process identification and the spacer on the second substrate are respectively formed by two patterning processes, and each patterning process includes: resin coating, exposure, development, etching, etc., each step in the patterning process may be A pattern other than the target pattern remains on the second substrate, for example, there is a possibility that resin remains on the second substrate, resulting in a high probability that the entire liquid crystal grating device is defective.
  • the process identification and the spacer are separately formed by two patterning processes, and the cost of forming the liquid crystal grating device is high.
  • an embodiment of the present invention provides a substrate, a manufacturing method thereof, and a 3D display device, which can reduce cost, improve yield, and improve production efficiency, thereby realizing a substrate and a 3D display device having a high yield.
  • the left eye viewing zone and the right eye viewing zone are arranged by the liquid crystal grating device (also called the slit grating), and the light rays of the left eye viewing zone and the right eye viewing zone are respectively It is incident on the left and right eyes of a person, producing a 3D visual effect.
  • the liquid crystal grating device also called the slit grating
  • FIG. 3 is a schematic cross-sectional view of a 3D display device according to an embodiment of the present invention, including: a display panel 10 and a liquid crystal grating device 20 on the display panel 10; the display panel 10 and the liquid crystal grating device 20 are joined to each other.
  • Light is incident from the light incident side of the display panel 10 through the liquid crystal grating device 20 is incident on the left or right eye of the person.
  • the line of rays with arrows in Fig. 3 indicates the light.
  • the liquid crystal grating device 20 shown in Fig. 3 will be specifically described below.
  • FIG. 4 is a schematic cross-sectional view of a liquid crystal grating device 20 according to an embodiment of the present invention, including: a first substrate and a second substrate 222, and a liquid crystal layer therebetween.
  • the liquid crystal grating device 20 of the embodiment of the present invention includes:
  • liquid crystal layer 3 between the first substrate 1 and the second substrate 2, a spacer 6 on the second substrate 2;
  • a first transparent electrode 11 located on a side of the first substrate 1 adjacent to the liquid crystal layer 3;
  • a second transparent electrode 21 located on the side of the second substrate 2 adjacent to the liquid crystal layer 3;
  • the second substrate 2, the spacers 6 on the second substrate 2, and the second transparent electrodes 21 on the second substrate 2 together constitute the second substrate 222.
  • one of the first transparent electrode 11 and the second transparent electrode 21 is a plurality of strip electrodes arranged in parallel with each other, and the other is a planar electrode.
  • the first transparent electrode 11 is a plurality of strip electrodes arranged in parallel with each other, and the second transparent electrode 21 is a planar electrode.
  • the liquid crystal molecules in the vicinity of the second transparent electrode 21 are deflected, so that the liquid crystal grating device 20 partially transmits light.
  • the light-transmitting region and the opaque region are alternately arranged to be opaque, so that the liquid crystal grating device functions as a grating.
  • FIG. 5 an exemplary cross-sectional structural view of a second substrate in accordance with an embodiment of the present invention is shown.
  • the second substrate 2 is provided with a process mark 4 for the first substrate and the second substrate 222 of the case, a spacer 6 disposed in the same layer as the process mark 4, and
  • the process mark 4 has a second transparent electrode (not shown in FIG. 5) disposed in different layers; the process mark 4 is located in a peripheral region of the second substrate 2, and the spacer 6 is located in a display region of the second substrate 2.
  • the second substrate 222 shown in FIG. 5 has a simple overall structure because the process mark 4 is disposed in the same layer as the spacer 6.
  • the manufacturing materials of the two may be the same during the manufacturing process. Both are completed in the same patterning process, simplifying the process.
  • the manufacturing method of the second substrate comprises the following steps:
  • a process mark, a spacer, and a second transparent electrode are formed on the second substrate.
  • forming a process mark, a spacer, and a second transparent electrode on the second substrate include:
  • Forming the process mark and the spacer on the second substrate formed with the transparent electrode illustratively comprising:
  • Forming a first film layer on the second substrate adopting a pattern corresponding to the process mark, a pattern corresponding to the spacer, and at least one monitoring mark for positioning the relative position of the mask and the mask carrier
  • a mask of the corresponding pattern is patterned by the first film layer to form a pattern including the process mark, the spacer, and the monitor mark.
  • forming a process mark, a spacer, and a second transparent electrode on the second substrate include:
  • Forming the process identification and spacer on the second substrate illustratively, comprising:
  • Forming a first film layer on the second substrate Forming a pattern corresponding to the process mark, a pattern corresponding to the spacer, and at least one monitoring mark for positioning the relative position of the mask and the mask carrier Forming a mask of the corresponding pattern, patterning the first film layer to form a pattern including the process mark, the spacer, and the monitor mark;
  • a transparent electrode is formed on the second base substrate on which the process mark and the spacer are formed.
  • the transparent electrode is a planar electrode or a strip electrode.
  • the first film layer may be an organic resin layer such as a transparent photoresist layer or the like.
  • the reticle may comprise at least two monitoring markers, for example two, three or four or the like. Each monitor mark is located on an edge region of either side of the reticle.
  • the reticle includes two of the monitoring identities, the monitoring identities being respectively located in regions of the opposite sides of the rim on the opposite sides of the reticle. It is of course also possible to be located in the region near the edge of the two adjacent sides of the mask.
  • the shape of the monitoring mark is not limited and may be any shape, for example, may be a rectangle, a circle, or the like.
  • the shape of the monitoring indicator is a rectangle.
  • the patterning process of the first film layer on the second substrate substrate includes processes such as alignment, exposure, development, and etching.
  • the alignment may refer to the alignment of the reticle and the substrate to be exposed on the exposure pedestal prior to exposure.
  • the aligning process includes: aligning the reticle with the reticle carrier device according to the monitoring identifier and the reticle position control unit disposed on the reticle to smoothly implement the substrate to be exposed A pattern of spacers and process marks is formed in one layer at a time.
  • the reticle may also include a reticle alignment mark.
  • the alignment process further includes: using a mask alignment mark provided on the mask, positioning a positioning mark on the surface of the exposure machine base, and a mask position control unit, and carrying the mask and the mask The device is aligned. This can be done prior to the process of controlling unit alignment based on the monitoring identification and mask position.
  • the process identifier includes: an automatic optical detector positioning a positioning identifier of a coordinate origin on the substrate, a position identifier of the spacer covering area relative to the edge of the substrate, a alignment mark when the substrate is to the box, and a sealant formed on the substrate.
  • the process identification and the spacer on the second substrate are formed by one patterning process, and the process identification and the spacer are respectively formed by using two patterning processes. This not only simplifies the process flow, but also reduces the defect rate of the display panel caused by multiple patterning processes.
  • the spacer and the process mark are formed by two patterning processes, the mask forming the spacer and the mask forming the process mark are different, and therefore, the masks used in the two patterning processes are different, and the mask is used.
  • the more templates the higher the production cost. Therefore, the formation of the process mark and the spacer by one patterning process can reduce the number of masks and reduce the manufacturing cost as compared with the case where the spacer and the process mark are formed by two patterning processes.
  • the process identification may be a registration mark and a test mark during or after the production of the display panel.
  • the spacers are arranged in a matrix form on the second substrate.
  • the process identification may include: an automatic optical detector positioning a positioning identifier of a coordinate origin on the second substrate, a position identification of the spacer covering area relative to the edge of the second substrate, the first substrate and the second substrate a registration mark for the cartridge, a position mark for forming the sealant on the second substrate, a cutting mark for cutting the second substrate after the first substrate and the second substrate, and a name of the second substrate At least one of the logos.
  • an embodiment of the present invention provides a mask including: a pattern of the process mark 400, a pattern of the spacer 600, and a graphic of the monitor mark 71 for indicating the relative position of the mask and the mask carrier.
  • the type may be a light transmissive area or an opaque area depending on whether the layer to be exposed is positive or negative.
  • the process identification pattern and the spacer pattern correspond to the process identification and the spacer on the second substrate shown in FIG. 2.
  • the mask includes at least two monitor marks, the monitor marks being respectively located in regions of the opposite sides of the mask having edges opposite to the edges.
  • Two monitor marks 71 are located in the vicinity of opposite sides of the reticle, and the monitor mark 71 is used to identify the position of the reticle opposite the reticle carrier.
  • the shape of the monitoring indicator is not limited. Illustratively, the shape of the monitoring indicator is rectangular.
  • a region near the opposite two sides of the mask is further provided with a mask alignment mark 72.
  • the mask shown in FIG. 6 is a mask for fabricating process marks and spacers in a second substrate in accordance with an embodiment of the present invention.
  • the process identification includes:
  • the automatic optical detector locates the positioning mark of the coordinate origin on the second substrate, for example, an automatic optical detector (AOI) locates the positioning mark of the coordinate origin on the second substrate, referred to as AOI mark 41; automatic optical detector (AOI) A microscopic defect for detecting a spacer (PS) on the second substrate, and determining a coordinate position of the poor spacer;
  • the AOI logo includes four cross cursors respectively located at an area near the four corners of the second substrate, And four cross cursors are symmetrically arranged, and the center of the four cross cursors is the origin (0, 0) of the two-dimensional coordinates established on the second substrate, that is, the AOI identifier is used for AOI positioning the coordinates on the second substrate.
  • the identity of the origin The position of the spacer relative to the origin can be determined after the origin coordinates on the second substrate are determined.
  • a positional identification of the spacer covering area with respect to the edge of the second substrate for example, a positional indication of the covering area of the spacer 6 with respect to the edge of the second base substrate 2, also referred to as a TP mark 42; a control spacer 6 a position on the second substrate 2 relative to the edge of the second substrate 2; the position determines a position at which the spacer is formed on the second substrate;
  • the second base substrate is generally a substrate capable of forming a plurality of liquid crystal grating devices.
  • it is a larger-sized glass substrate (Glass substrate);
  • the pattern on the reticle only corresponds to the pattern of the structure in the second substrate of the liquid crystal grating device, that is, the pattern on the reticle includes only the process identification corresponding to the liquid crystal grating device and a pattern of the spacers, forming a pattern identification and a spacer pattern corresponding to the plurality of liquid crystal grating devices on a second substrate, which need to be formed by exposure at a plurality of positions;
  • the alignment mark 43 for the first substrate and the second substrate paired box also referred to as Edge Mark; in other words, the alignment is used to control the first substrate and the second substrate used for the cartridge. Registration mark.
  • a position mark for forming the sealant on the second substrate that is, a position mark 44 for forming a sealant on the second substrate, also called an ODF Key.
  • the control mark for the box for the sealant, the mark can also be used for the first substrate and the second substrate to test the coordinate system of the Recipe.
  • the first substrate and the second substrate are cut to the cutting mark 45 of the second substrate after the cartridge, that is, the Cutting Mark, and the cut Mark after the box.
  • the second substrate naming mark 46 that is, Glass ID: Glass name.
  • the process marking and the spacer are formed by the same patterning process in the manufacturing method of the second substrate of the embodiment of the invention, the patterning process is reduced, the coating of the primary organic resin, the primary mask and the second substrate are reduced.
  • the process of alignment At the same time, the alignment mark (ie, PS Alignment Mark) of the mask and the second substrate when the PS is formed on the second substrate is avoided, that is, the PS Alignment Mark for Mask and Glass alignment used in the PS process for avoiding exposure is avoided.
  • the alignment process with the already formed process mark during the manufacture of the spacer is also avoided, and the process is also called PS Overlay Mark, that is, after the organic resin layer coating process is completed, the organic resin is controlled.
  • PS Overlay Mark that is, after the organic resin layer coating process is completed, the organic resin is controlled.
  • the embodiment of the present invention needs to include the above six kinds of marks in the second substrate.
  • the prior art requires eight types of marks to be formed on the second substrate.
  • the six types of marks in the embodiment of the present invention can reduce the occupied area of the process mark.
  • the organic resin layer is a photoresist layer.
  • Step a placing a second substrate formed with an organic resin layer on the exposure machine base, and mounting a mask corresponding to the process identification and the spacer to be formed to a mask above the exposure machine base On the board carrying device;
  • Step b placing the second substrate substrate at a preset position of the exposure machine base according to the alignment mark of the second substrate and the exposure machine base; the alignment mark is located at the exposure machine On the abutment
  • Step c using a Mask Alignment Mark set on the reticle, a positioning mark on the exposure machine base positioning reference mirror (Reticle Mark on the Stage Bar Mirror), and a mask carrier (Mask Hold) a mask position control unit, such as an image monitoring device (such as a CCD camera), which performs alignment of the mask and the mask carrier; the mask position control unit may also be any other position detection and / or device with position control function;
  • Step d moving the exposure machine base to the first preset position according to the position of the area to be exposed on the current second substrate;
  • Step e adjusting a vertical distance between the exposure machine base and the mask plate above the exposure machine base is a first preset distance
  • Step f aligning the mask board with the mask board carrying device according to the monitoring identifier provided on the mask board for indicating the relative position of the mask board and the mask board carrying device and the mask board position control unit;
  • Step g controlling the exposure light source to expose the organic resin layer.
  • the above steps are exemplified by forming a substrate in a liquid crystal grating device on the second substrate.
  • a second substrate as a glass substrate and a substrate in more than one liquid crystal grating device on the glass substrate will be described as an example.
  • the process of making the process mark, the spacer, and the second transparent electrode on the second substrate includes at least two embodiments.
  • Embodiment 1 includes the following steps:
  • Step 1 forming a first film layer on the surface of the glass substrate by using a coating process, the first film layer being a transparent conductive film layer (such as an indium tin oxide ITO conductive film layer); the coating process may be performed by evaporation or sputtering. Law and so on.
  • a transparent conductive film layer such as an indium tin oxide ITO conductive film layer
  • the first film layer needs to be patterned to form a strip-shaped second transparent electrode.
  • the second transparent electrode is planar, it is not necessary to perform a patterning process on the first film layer, and the planar first film layer is a second transparent electrode.
  • the second transparent electrode is planar
  • the second transparent electrode is a common electrode with respect to the first transparent electrode, and exemplarily, the second transparent electrode is applied with a common direct current voltage Vcom.
  • Step 2 forming a second film layer covering the entire substrate on the glass substrate formed on the first step and on the second transparent electrode, the second film layer may be an organic resin layer; the organic resin layer is exemplarily used Photoresist layer.
  • Step 3 masking, aligning, exposing, developing etching, etc. of the organic resin layer by using a mask having a spacer pattern and a process marking pattern to form a spacer and a process mark on the glass substrate;
  • the spacer is located at least in an area corresponding to the display area, and the process identification is generally disposed in an area corresponding to the peripheral area of the display panel; therefore, the spacer and the process identification are located in different areas on the glass substrate, and the two do not affect each other. .
  • the relative position of the spacer and the process identification is determined by the relative position between the spacer pattern on the reticle and the process identification pattern.
  • spacers and process marks in a liquid crystal grating device are formed during the same exposure process, it is not necessary to form a spacer alignment mark (PS Alignment Mark) and a spacer overlay precision mark on the glass substrate (PS Overlay Mark). ).
  • two monitoring marks 71 are formed in the area near the opposite sides of the reticle for identifying the relative positions of the reticle and the reticle carrier, and the reticle is additionally opposed A region near the two sides forms a Mask Alignment Mark 72.
  • the position of the two monitoring marks 71 and the two mask alignment marks 72 on the mask is not limited to the above embodiment.
  • the exposure process includes:
  • the mask plate corresponding to the process identification and the spacer and the monitoring identifier is mounted on the mask carrier device above the exposure machine base;
  • the glass substrate formed with the organic resin layer is placed on a preset position on the base of the exposure machine, and the pre-alignment is performed at the same time to ensure the glass substrate and the exposure machine base. Positional accuracy between
  • the alignment is performed by using the Mask Alignment Mark on the mask, the Reticle Mark on the Stage Bar Mirror, and the optical camera CCD on the Mask Holder, and the mask and the mask carrier are accurately aligned. Bit, this match is the first match.
  • controlling a vertical distance between the exposure machine base and the mask plate above the exposure machine base is a first preset distance; specifically, adjusting a distance (Gap) between the mask and the glass substrate during exposure;
  • the embodiment of the invention further provides a substrate, which is fabricated by the method for manufacturing the substrate, comprising: a substrate substrate; a spacer and a process mark formed on the substrate and located in the same layer.
  • the substrate further includes: a transparent electrode formed between the layer where the spacer and the process mark are located and the substrate; or formed above the layer where the spacer and the process mark are located .
  • Embodiments of the present invention provide a method of fabricating a substrate, including: a process of fabricating a process mark and a spacer disposed on a substrate on a substrate, and a process of fabricating a transparent electrode; wherein the process mark and the spacer are fabricated
  • the process includes: forming a first film layer to be patterned on the substrate, using a pattern corresponding to the process mark, a pattern corresponding to the spacer, and at least one for positioning the mask and the mask Monitoring of the relative position of the device identifies a corresponding mask of the pattern, and the first film layer is patterned to form a pattern including the process mark, the spacer, and the monitor mark.
  • the process mark and the spacer are formed by the same patterning process by a mask having a pattern of the process identification pattern and the monitor mark of the spacer.
  • Each patterning process includes at least: resin coating, exposure, development, etching, etc., each step in the patterning process may have a pattern other than the target pattern remaining on the substrate, for example, there is a possibility that resin remains on the substrate. , The chances of causing the entire display panel to be bad are high.
  • Embodiments of the present invention can simultaneously form a process identification and a spacer by a patterning process, and can obtain a liquid crystal grating device with a high yield and a 3D display device using the liquid crystal grating device, and also reduce the number of masks and save costs. .

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Abstract

提供一种基板及其制作方法、3D显示装置以及掩模板。基板的制作方法包括：准备衬底基板（1，2），在衬底基板（1，2）上通过一次构图工艺形成位于同一层的工艺标识（4）和隔垫物（6）；和在衬底基板（1，2）上形成透明电极。通过一次构图工艺同时形成工艺标识（4）和隔垫物（6），能够得到良率较高的液晶光栅装置以及采用该液晶光栅装置的3D显示装置，同时也降低了掩模板的数量，节约了成本。

Description

基板及其制作方法、3D显示装置以及掩模板 技术领域
本发明的实施例涉及一种基板及其制作方法、3D显示装置以及掩模板。
背景技术
目前，裸眼式3D显示技术备受关注。示例性地，可以采用液晶光栅实现裸眼式3D显示，参见图1，液晶光栅装置100可以设置在显示装置200的出光侧，其将显示装置200发出的光线分光，使得左眼像素发出的光射向观看者的左眼，右眼像素发出的光射向观看者的右眼，从而实现3D显示效果。
一般地，液晶光栅装置包括：相对设置的第一基板和第二基板，位于第一基板和第二基板之间的液晶层；第一基板上设置有多个相互平行排列的条状电极，第二基板上设置有公共电极；通过条状电极和公共电极之间的电场控制液晶分子偏转，从而形成明暗相间的条纹，控制显示左眼图像的左眼像素发出的光和显示右眼图像的右眼像素发出的光分别进入人的左、右眼，而左眼图像和右眼图像为具有视差的图像，人脑将接收到的图像信息合成从而产生3D效果。
然而，形成有公共电极的第二基板在形成时，需要通过两次构图工艺分别形成工艺标识和隔垫物，从而使得液晶光栅装置的生产效率降低，其成本很高。
发明内容
本发明实施例提供了一种基板及其制作方法、3D显示装置以及掩模板，能够降低成本、提高良率且提高生产效率。
一方面，本发明的实施例提供一种基板的制作方法，包括：准备衬底基板；在所述衬底基板上通过一次构图工艺形成位于同一层的工艺标识和隔垫物；和在所述衬底基板上形成透明电极。
另一方面，本发明的实施例提供一种基板，包括：衬底基板；工艺标识 和隔垫物，形成在所述衬底基板上且位于同一层。
再一方面，本发明实施例提供一种3D显示装置，包括：显示面板，用于显示图像；液晶光栅装置，包括如上所述的基板且设置在所述显示面板的出光侧或入光侧。
再一方面，本发明实施例提供一种掩模板，包括：基板上的透光区域和不透光区域，位于所述透光区域或不透光区域的工艺标识图形、隔垫物图形，以及用于指示掩模板与掩模板承载装置相对位置的监控标识图形。
附图说明
为了更清楚地说明本发明实施例的技术方案，下面将对实施例的附图作简单地介绍，显而易见地，下面描述中的附图仅仅涉及本发明的一些实施例，而非对本发明的限制。
图1为3D显示技术的原理图；
图2为液晶光栅装置中的部分平面结构示意图；
图3为根据本发明实施例的3D显示装置截面示意图；
图4为根据本发明实施例提供的液晶光栅装置的截面结构示意图；
图5为本发明实施例提供的液晶光栅装置中的第二基板的截面示意图；
图6为本发明实施例提供的掩模板的俯视示意图；
图7为本发明实施例提供的第二基板中的工艺标识结构示意图；
图8为本发明实施例提供的掩模板结构俯视示意图。
具体实施方式
为使本发明实施例的目的、技术方案和优点更加清楚，下面将结合本发明实施例的附图，对本发明实施例的技术方案进行清楚、完整地描述。显然，所描述的实施例是本发明的一部分实施例，而不是全部的实施例。基于所描述的本发明的实施例，本领域普通技术人员在无需创造性劳动的前提下所获得的所有其他实施例，都属于本发明保护的范围。
示例性地，本发明的实施例提供一种基板，可以作为液晶光栅装置的一个基板，图2给出了该基板的平面图。如图2所示，基板包括：衬底基板300、衬底基板300上的用于形成液晶光栅装置的多个工艺标识400、公共电极(图 2中未体现)以及多个隔垫物600。
这里，工艺标识400位于衬底基板300的外围区域，隔垫物600位于显示区域；工艺标识400位于衬底基板300上，公共电极位于工艺标识400上且覆盖整个衬底基板300，隔垫物600位于公共电极上。
示例性地，本发明的实施例提供如图2所示的基板的制造方法，包括以下步骤：
步骤一：通过第一次构图工艺形成衬底基板上的多个工艺标识，例如曝光对位标识、隔垫物对位标识等；
步骤二：在形成所述工艺标识的衬底基板上通过成膜工艺形成一层透明导电层，该透明导电层至少覆盖衬底基板的显示区域；
步骤三：在步骤二的基础上，通过第二次构图工艺形成衬底基板上的多个隔垫物。
上述制作第二基板上的工艺标识和隔垫物分别通过两次构图工艺形成，每一次构图工艺包括：树脂涂覆、曝光、显影、蚀刻等过程，构图工艺中的每一步骤均有可能在第二基板上残留目标图形之外的图形，例如很有可能在第二基板上残留树脂，导致整个液晶光栅装置出现不良的几率较高。并且，通过两次构图工艺分别形成工艺标识和隔垫物，形成液晶光栅装置的成本较高。
进一步地，本发明实施例提供了一种基板及其制作方法、3D显示装置，能够降低成本、提高良率且提高生产效率，而实现一种良品率较高的基板和3D显示装置。
首先说明采用液晶光栅装置的裸眼3D显示的原理，通过液晶光栅装置(也称狭缝光栅)实现间隔排列的左眼视区和右眼视区，左眼视区和右眼视区的光线分别入射到人的左右眼，产生3D的视觉效果。
以下将结合附图对本发明实施例提供的基板及其制作方法、3D显示装置进行详细地说明。附图中各层厚度和区域大小形状不反映真实比例，目的只是示意说明本发明实施例的内容。
参见图3，为本发明实施例提供的3D显示装置的截面示意图，包括：显示面板10和位于显示面板10上的液晶光栅装置20；显示面板10和液晶光栅装置20彼此接合。光线从显示面板10的入光侧入射，经过液晶光栅装置 20入射到人的左眼或右眼。如图3中带箭头的线段表示所述光线。
以下将具体介绍图3所示的液晶光栅装置20。
参见图4，为本发明实施例提供的液晶光栅装置20的截面示意图，包括：第一基板和第二基板222，以及二者之间的液晶层。
如图4所示，本发明实施例的液晶光栅装置20，包括：
相对设置的第一衬底基板1和第二衬底基板2；
位于第一衬底基板1和第二衬底基板2之间的液晶层3，位于第二衬底基板2上的隔垫物6；
位于第一衬底基板1靠近液晶层3一侧的第一透明电极11；
位于第二衬底基板2靠近液晶层3一侧的第二透明电极21；
第二衬底基板2、第二衬底基板2上的隔垫物6、第二衬底基板2上的第二透明电极21一起构成了所述第二基板222。
示例性地，第一透明电极11和第二透明电极21其中之一为多个相互平行排列的条状电极，另一为面状电极。
示例性地，第一透明电极11为多个相互平行排列的条状电极，第二透明电极21为面状电极。
通过对第一透明电极11(条状电极)和每一第二透明电极21(面状电极)施加电压引起第二透明电极21附近的液晶分子偏转，从而使得液晶光栅装置20部分透光而部分不透光，而形成交替布置的透光区域和不透光区域，使得液晶光栅装置起到光栅的作用。
示例性地，参见图5，示出了根据本发明实施例的第二基板的示例性截面结构示意图。如图5所示，第二衬底基板2上设置有对盒第一基板和第二衬底基板222所使用的工艺标识4，与该工艺标识4同层设置的隔垫物6，以及与工艺标识4不同层设置的第二透明电极(图5中未示出)；工艺标识4位于第二衬底基板2的外围区域，隔垫物6位于第二衬底基板2的显示区域。
根据本发明实施例的如图5所示的第二衬底基板222，由于工艺标识4与隔垫物6同层设置，整体结构较简单，在制作过程中，二者的制作材料可以相同，二者在同一次构图工艺中完成，从而简化了工艺流程。
示例性地，以下将说明第二基板222的制作方法。
第二基板的制作方法包括以下步骤：
准备第二衬底基板；
在第二衬底基板上形成工艺标识、隔垫物以及第二透明电极。
示例性地，在第二衬底基板上形成工艺标识、隔垫物以及第二透明电极，包括：
在所述第二衬底基板上形成透明电极；以及
在形成有所述透明电极的第二衬底基板上形成所述工艺标识和隔垫物，示例性地，包括：
在所述第二衬底基板上形成第一膜层；采用同时具有所述工艺标识对应的图形、隔垫物对应的图形以及至少一个用于定位掩模板与掩模板承载装置相对位置的监控标识对应的图形的掩模板，对所述第一膜层进行构图工艺形成包括所述工艺标识、隔垫物以及所述监控标识的图案。
示例性地，在第二衬底基板上形成工艺标识、隔垫物以及第二透明电极，包括：
在第二衬底基板上形成所述工艺标识和隔垫物，示例性地，包括：
在所述第二衬底基板上形成第一膜层；采用同时具有所述工艺标识对应的图形、隔垫物对应的图形以及至少一个用于定位掩模板与掩模板承载装置相对位置的监控标识对应的图形的掩模板，对所述第一膜层进行构图工艺形成包括所述工艺标识、隔垫物以及所述监控标识的图案；以及
在形成有所述工艺标识和隔垫物的所述第二衬底基板上形成透明电极。
示例性地，所述透明电极为面状电极或条状电极。
所述第一膜层可以为有机树脂层，例如透明的光刻胶层等。
示例性地，所述掩模板可以包括至少两个监控标识，例如可以包括两个、三个或四个等。每一监控标识位于掩模板上靠近任一边的边缘区域。
示例性地，所述掩模板上包括两个所述监控标识，所述监控标识分别位于掩模板上两个相对的边靠近边缘的区域。当然也可以位于掩模板上相邻的两个边的靠近边缘的区域。
所述监控标识的形状不限，可以为任意形状，例如可以为矩形、圆形等。
示例性地，所述监控标识的形状为矩形。
对所述第二衬底基板上的第一膜层进行构图工艺包括对位、曝光、显影和蚀刻等过程。
示例性地，以下将说明对位、曝光和显影的过程。
示例性地，所述对位可以指曝光之前掩模板和待曝光基板在曝光基台上的对位。
所述对位过程，至少包括：根据掩模板上设置的所述监控标识和掩模板位置控制单元，将所述掩模板与所述掩模板承载装置进行对位，以顺利实现待曝光基板的第一膜层中一次性形成隔垫物和工艺标识的图案。
所述掩模板还可以包括掩模板对位标识。
进一步地，所述对位过程还包括：利用掩模板上设置的掩模板对位标识、曝光机基台定位基准镜面上的定位标识、掩模板位置控制单元，将所述掩模板和掩模板承载装置进行对位。这可在根据所述监控标识和掩模板位置控制单元对位的过程之前进行。
所述工艺标识包括：自动光学检测器定位基板上坐标原点的定位标识、隔垫物覆盖区域相对于基板边缘的位置标识、所述基板对盒时的对位标识、基板上形成封框胶的位置标识、基板对盒后切割时的切割标识，以及基板的命名标识至少之一。
在根据本发明实施例的第二基板的制作方法中，所述第二衬底基板上的工艺标识和隔垫物通过一次构图工艺形成，相比较采用两次构图工艺分别形成工艺标识和隔垫物，这不但简化了工艺流程，还降低了因多次构图工艺引起的显示面板不良的不良率。另外，在隔垫物和工艺标识通过两次构图工艺形成时，形成隔垫物的掩模板和形成工艺标识的掩模板的图形不同，因此，两个构图工艺中用到的掩模板不同，掩模板数量越多，制作成本越高。因此，与隔垫物和工艺标识通过两次构图工艺形成的情况相比，通过一次构图工艺形成工艺标识和隔垫物可以减少掩模板数量，降低制作成本。
示例性地，所述工艺标识可以为制作显示用面板过程中或制作完成之后的对位标识和测试标识。
示例性地，所述隔垫物在所述第二衬底基板上排列为矩阵形式。
示例性地，所述工艺标识可以包括：自动光学检测器定位第二基板上坐标原点的定位标识、隔垫物覆盖区域相对于第二基板边缘的位置标识、所述第一基板和第二基板对盒时的对位标识、第二基板上形成封框胶的位置标识、第一基板和第二基板对盒后切割第二基板的切割标识，以及第二基板的命名 标识中至少之一。
参见图6，本发明实施例提供一种掩模板，包括：工艺标识400的图形、隔垫物600的图形以及用于指示掩模板与掩模板承载装置相对位置的监控标识71的图形，这些图型可以为透光区域或不透光区域，这取决于待曝光层为正性还是负性。并且，所述工艺标识图形、隔垫物图形与图2所示的第二衬底基板上的工艺标识和隔垫物对应。
再次说明，所述掩模板上至少包括两个监控标识，所述监控标识分别位于掩模板上两个相对的边靠近边缘的区域。
两个监控标识71位于掩模板相对的两个边附近的区域，该监控标识71用于标识掩模板与掩模板承载装置相对的位置。所述监控标识的形状不限，示例性地，所述监控标识的形状为矩形状。
进一步地，掩模板另外相对的两个边附近的区域还设置有掩模板对位标识(Mask Alignment Mark)72。
图6所示的掩模板为用于制作根据本发明实施例的第二基板中的工艺标识和隔垫物的掩模板。
参见图7，为所述工艺标识中包括的具体标识示意图；
示例性地，所述工艺标识，包括：
(1)自动光学检测器定位第二基板上坐标原点的定位标识，例如：自动光学检测器(AOI)定位第二基板上坐标原点的定位标识，简称AOI标识41；自动光学检测器(AOI)用于检测第二基板上的隔垫物(PS)的微观不良，且确定存在不良的隔垫物的坐标位置；AOI标识包括四个十字光标，分别位于第二基板靠近四个角的区域，且四个十字光标两两对称设置，四个十字光标的中心为在第二基板上建立的二维坐标的原点(0，0)，也就是说，AOI标识用于AOI定位第二基板上坐标原点的标识。当第二基板上原点坐标确定后就可以确定隔垫物相对于该原点的位置。
(2)隔垫物覆盖区域相对于第二基板边缘的位置标识，例如：隔垫物6覆盖区域相对于第二衬底基板2边缘的位置标识，也称TP标识42；控制隔垫物6在第二衬底基板2上相对于第二衬底基板2边缘的位置；该位置确定了隔垫物在第二基板上的形成位置；
需要说明的是，第二衬底基板一般为能够形成多个液晶光栅装置的基板， 一般为较大尺寸的玻璃基板(Glass基板)；掩模板上的图形仅对应一个液晶光栅装置的第二基板中结构的图形，即掩模板上的图形仅包括一个液晶光栅装置对应的工艺标识和隔垫物的图形，在一张第二衬底基板上形成与多个液晶光栅装置对应的工艺标识和隔垫物的图形，需要经过多个位置曝光形成；
因此，需要确定每一液晶光栅装置对应的隔垫物相对于该液晶光栅装置对应的边缘的距离。
(3)所述第一基板和第二基板对盒时的对位用标识43，也称Edge Mark；换句话说，对位用标识为对盒时使用的控制第一基板和第二基板的对位标识。
(4)第二基板上形成封框胶的位置标识，即，控制第二基板上形成封框胶的位置标识44，也称ODF Key。用于对盒用于封框胶的控制Mark，该标识还可以用于第一基板和第二基板测试Recipe编制的坐标系四角Mark。
(5)第一基板和第二基板对盒后切割第二基板的切割标识45，即Cutting Mark，对盒后的切割Mark。
(6)第二基板命名标识46，即Glass ID：Glass命名。
由于本发明实施例的第二基板的制造方法中采用同一次构图工艺形成上述工艺标识和隔垫物，减少了一次构图工艺过程，减少了一次有机树脂的涂覆、一次掩模板与第二基板对位等过程。同时还避免了在第二基板上形成PS时掩模板和第二基板的对位标识(即PS Alignment Mark)，即避免了PS工序进行曝光时使用的Mask与Glass对位用PS Alignment Mark。也避免了隔垫物制作时与已经形成的工艺标识的对位过程，该过程也称为隔垫物套刻精度标识(PS Overlay Mark)，即有机树脂层涂覆工序完成后，控制有机树脂层上待形成的PS Pattern与工艺标识的相对位置。
本发明的实施例需要上第二基板中包括上述六种标识，现有技术需要在第二衬底基板上形成八种标识，本发明实施例六种标识可以减少工艺标识的占用面积。
示例性地，所述有机树脂层为光刻胶层。
上述任一实施方式的液晶光栅装置中的基板，对所述有机树脂层进行曝光，包括：
步骤a、将形成有有机树脂层的第二衬底基板置于曝光机基台上，将与所述待形成的工艺标识和隔垫物对应的掩模板安装到曝光机基台上方的掩模 板承载装置上；
步骤b、根据第二衬底基板和曝光机基台的对位标识，将所述第二衬底基板置于所述曝光机基台的预设位置；所述对位标识位于所述曝光机基台上；
步骤c、利用设置在掩模板上的掩模板对位标识(Mask Alignment Mark)、曝光机基台定位基准镜面上的定位标识(Stage Bar Mirror上的Reticle Mark)、以及掩模板承载装置(Mask Hold)上的掩模板位置控制单元，例如图像监控装置(例如CCD摄像机)，三者进行掩模板和掩模板承载装置的对位；所述掩模板位置控制单元还可以是其他任意的具有位置检测和/或位置控制功能的器件；
步骤d、根据当前第二衬底基板上待曝光区域的位置移动所述曝光机基台至第一预设位置；
步骤e、调节曝光机基台与曝光机基台上方的掩模板之间的垂直距离为第一预设距离；
步骤f、根据掩模板上设置的用于指示掩模板与掩模板承载装置相对位置的监控标识和所述掩模板位置控制单元，再次将所述掩模板与所述掩模板承载装置进行对位；
步骤g、控制曝光用光源对所述有机树脂层进行曝光。
上述步骤以在第二衬底基板上形成一个液晶光栅装置中的基板为例说明。
以下将以第二衬底基板为玻璃基板，且在玻璃基板上制作不止一个液晶光栅装置中的基板为例说明。
制作第二衬底基板上的工艺标识、隔垫物和第二透明电极的过程至少包括两种实施方式。
实施方式一包括以下步骤：
步骤一：在玻璃基板表面，利用镀膜工艺形成第一膜层，所述第一膜层为透明导电膜层(如铟锡氧化物ITO导电膜层)；镀膜工艺可以采用蒸镀法或溅射法等。
当所述第二透明电极为条状时，需要对所述第一膜层进行构图工艺形成条状第二透明电极。当所述第二透明电极为面状时，不需要对所述第一膜层进行构图工艺，所述面状的第一膜层为第二透明电极。
当所述第二透明电极为面状时，所述第二透明电极相对于所述第一透明电极为公共电极，示例性地，第二透明电极被施加公共直流电压Vcom。
步骤二：在步骤一形成的玻璃基板上且在所述第二透明电极上形成覆盖整个基板的第二膜层，所述第二膜层可以为有机树脂层；该有机树脂层示例性地采用光刻胶层。
步骤三：采用具有隔垫物图形和工艺标识图形的掩模板对所述有机树脂层进行掩模、对位、曝光、显影蚀刻等过程形成玻璃基板上的隔垫物、工艺标识；
所述隔垫物至少位于与显示区域对应的区域，工艺标识一般设置在与显示面板的外围区域对应的区域；因此，隔垫物与工艺标识位于玻璃基板上的不同区域，二者互不影响。
隔垫物和工艺标识的相对位置由掩模板上的隔垫物图形和工艺标识图形之间的相对位置决定。
由于一个液晶光栅装置中的隔垫物和工艺标识在同一次曝光过程中形成，无需在玻璃基板上形成隔垫物对位标识(PS Alignment Mark)和隔垫物套刻精度标识(PS Overlay Mark)。
实现工艺标识和隔垫物的曝光过程，包括：
首先，参见图8，示例性地，在掩模板相对的两个边附近的区域形成两个监控标识71，该监控标识71用于标识掩模板与掩模板承载装置相对位置，掩模板另外相对的两个边附近的区域形成掩模板对位标识(Mask Alignment Mark)72。
当然所述两个监控标识71和两个掩模板对位标识72在掩模板上的位置不限于上述实施方式。
示例性地，该曝光过程，包括：
S21、将与工艺标识和隔垫物、监控标识对应图形的掩模板安装到曝光机基台上方的掩模板承载装置上；
S22、根据玻璃基板和曝光机基台的对位标识，将形成有有机树脂层的玻璃基板置于曝光机基台上的预设位置，同时进行预对位，保证玻璃基板与曝光机基台之间的位置精度；
S23、掩模板标记对位；
示例性地，利用掩模板上的Mask Alignment Mark、Stage Bar Mirror上的Reticle Mark、掩模板承载装置(Mask Hold)上的光学摄像头CCD三者进行对位，将掩模板和掩模板承载装置准确对位，该次对位为首次对位。
S24、根据当前待曝光区域的位置移动所述曝光机基台至第一预设位置；即Shot1移动，移动曝光基台至Shot1的设计位置；
S25、控制曝光机基台与曝光机基台上方的掩模板之间的垂直距离为第一预设距离；具体地，调节曝光时掩膜板与玻璃基板之间的距离(Gap)；
S26、根据掩模板上设置的掩模板与掩模板承载装置相对位置的监控标识和掩模板承载装置上的掩模板位置控制单元，将所述掩模板与所述掩模板承载装置对位，该次对位为二次对位，即利用Mask Monitor Mark和Mask Hold上的CCD进行对位。传统的对位(Alignment)过程为：基板上的对位标识和PS掩模板上的对位标识进行对位，二者对位不够准确；
S27、曝光进行。
当一次曝光无法将玻璃基板上的所有区域曝光时，需要移动玻璃基板多次进行曝光，此时再重复上述S24～S27。
本发明实施例还提供一种基板，采用所述基板的制作方法制作而成，包括：衬底基板；隔垫物和工艺标识，形成在所述衬底基板上且位于同一层。
示例性地，该基板还包括：透明电极，形成在所述隔垫物和工艺标识所在的层与所述衬底基板之间；或者，形成在所述隔垫物和工艺标识所在的层上方。
本发明实施例提供一种基板的制作方法，包括：制作衬底基板上同层设置的工艺标识和隔垫物的过程，以及制作透明电极的过程；其中，制作所述工艺标识和隔垫物的过程，包括：在所述衬底基板上形成待构图的第一膜层，采用同时具有所述工艺标识对应的图形、隔垫物对应的图形以及至少一个用于定位掩模板与掩模板承载装置相对位置的监控标识对应的图形的掩模板，对所述第一膜层进行构图工艺形成包括所述工艺标识、隔垫物以及所述监控标识的图案。所述工艺标识和隔垫物通过一个具有所述工艺标识图形、隔垫物的监控标识的图案的掩模板进行同一构图工艺形成。每一次构图工艺至少包括：树脂涂覆、曝光、显影、蚀刻等过程，构图工艺过程中的每一步骤均有可能在基板上残留目标图形之外的图形，例如很有可能在基板上残留树脂， 导致整个显示面板出现不良的几率较高。本发明的实施例通过一次构图工艺同时形成工艺标识和隔垫物，能够得到良率较高的液晶光栅装置以及采用该液晶光栅装置的3D显示装置，同时也降低了掩模板的数量，节约成本。
显然，本领域的技术人员可以对本发明的实施例进行各种改动和变型而不脱离本发明实施例的精神和范围。这样，倘若本发明的这些修改和变型属于本发明权利要求及其等同技术的范围之内，则本发明也意图包含这些改动和变型在内。
本申请要求于2014年5月29日递交的中国专利申请第201410234500.1号的优先权，在此全文引用上述中国专利申请公开的内容以作为本申请的一部分。

Claims (19)

  1. 一种基板的制作方法，包括：
    准备衬底基板；
    在所述衬底基板上通过一次构图工艺形成位于同一层的工艺标识和隔垫物；和
    在所述衬底基板上形成透明电极。
  2. 根据权利要求1所述的制作方法，其中在所述衬底基板上形成位于同一层的工艺标识和隔垫物，包括：
    在所述衬底基板上形成待构图的第一膜层；
    采用同时具有所述工艺标识对应的图形、所述隔垫物对应的图形以及至少一个用于定位掩模板与掩模板承载装置相对位置的监控标识对应的图形的掩模板，对所述第一膜层进行构图工艺形成包括所述工艺标识、隔垫物以及所述监控标识的图案。
  3. 根据权利要求2所述的制作方法，其中对所述第一膜层进行构图工艺包括对位、曝光和显影的过程。
  4. 根据权利要求3所述的制作方法，其中所述对位过程，包括：
    根据掩模板上设置的所述监控标识和掩模板位置控制单元，将所述掩模板与所述掩模板承载装置进行对位。
  5. 根据权利要求2所述的制作方法，其中在所述衬底基板上形成透明电极，包括；
    在形成有所述工艺标识和隔垫物的所述衬底基板上形成所述透明电极。
  6. 根据权利要求2所述的制作方法，其中在所述衬底基板上形成位于同一层的工艺标识和隔垫物，包括：
    在形成有所述透明电极的所述衬底基板上形成所述工艺标识和隔垫物。
  7. 根据权利要求5或6所述的制作方法，其中所述透明电极为面状电极或条状电极。
  8. 根据权利要求5或6所述的制作方法，其中所述工艺标识包括：自动光学检测器定位基板上坐标原点的定位标识、隔垫物覆盖区域相对于基板边缘的位置标识、所述基板对盒时的对位标识、基板上形成封框胶的位置标识、 基板对盒后切割时切割标识，以及所述基板的命名标识至少之一。
  9. 根据权利要求2所述的制作方法，其中所述掩模板包括两个所述监控标识，所述监控标识分别位于掩模板上两个相对的边靠近边缘的区域。
  10. 根据权利要求2所述的制作方法，其中所述监控标识的形状为矩形。
  11. 根据权利要求2所述的制作方法，其中所述衬底基板上的所述第一膜层为有机树脂层。
  12. 一种基板，包括：
    衬底基板；
    工艺标识和隔垫物，形成在所述衬底基板上且位于同一层。
  13. 根据权利要求12所述的基板，还包括：
    透明电极，形成在所述衬底基板与所述工艺标识和隔垫物所在的层之间。
  14. 根据权利要求12所述的基板，还包括：
    透明电极，形成在所述工艺标识和隔垫物所在的层之上。
  15. 根据权利要求12或13所述的基板，其中所述透明电极为面状电极或条状电极。
  16. 一种3D显示装置，包括：
    显示面板，用于显示图像；
    液晶光栅装置，包括权利要求12-15中任一项所述的基板且设置在所述显示面板的出光侧或入光侧。
  17. 一种掩模板，包括：基板上的透光区域和不透光区域，位于所述透光区域或不透光区域的工艺标识图形、隔垫物图形，以及用于指示掩模板与掩模板承载装置相对位置的监控标识图形。
  18. 根据权利要求17所述的掩模板，其中所述掩模板上包括两个监控标识，所述监控标识分别位于掩模板上两个相对的边靠近边缘的区域。
  19. 根据权利要求17所述的掩模板，其中所述监控标识的形状为矩形状。
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