WO2015174412A1 - Cadre de pellicule, pellicule, élément de cadre, plaque originale d'exposition, dispositif d'exposition, et procédé de fabrication d'un dispositif semi-conducteur - Google Patents

Cadre de pellicule, pellicule, élément de cadre, plaque originale d'exposition, dispositif d'exposition, et procédé de fabrication d'un dispositif semi-conducteur Download PDF

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Publication number
WO2015174412A1
WO2015174412A1 PCT/JP2015/063633 JP2015063633W WO2015174412A1 WO 2015174412 A1 WO2015174412 A1 WO 2015174412A1 JP 2015063633 W JP2015063633 W JP 2015063633W WO 2015174412 A1 WO2015174412 A1 WO 2015174412A1
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Prior art keywords
pellicle
frame member
frame
original plate
exposure
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PCT/JP2015/063633
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English (en)
Japanese (ja)
Inventor
高村　一夫
陽介 小野
大樹 種市
泰之 佐藤
俊明 廣田
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三井化学株式会社
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Priority to JP2016519264A priority Critical patent/JPWO2015174412A1/ja
Publication of WO2015174412A1 publication Critical patent/WO2015174412A1/fr

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor

Definitions

  • the present invention relates to a pellicle frame, a pellicle, a frame member, an exposure original plate, an exposure apparatus, and a method for manufacturing a semiconductor device.
  • EUV light has the property of being easily absorbed by any substance. Therefore, in photolithography using EUV light as exposure light (hereinafter also referred to as “EUV lithography”), exposure is performed using a reflective optical system. Specifically, the EUV light is reflected by the original plate reflecting the exposure pattern, and the resist is exposed by the EUV light as reflected light. At this time, if a foreign substance adheres to the original, the EUV light is absorbed by the foreign substance or the EUV light is scattered, so that a desired pattern may not be exposed. Thus, it has been studied to protect the EUV light irradiation surface of the original plate with a pellicle.
  • the configuration of the pellicle has a pellicle film for protecting the EUV light irradiation surface of the original and a pellicle frame that supports the pellicle film.
  • the pellicle film used in EUV lithography is required to have high transparency to EUV light and not to be decomposed or deformed by irradiation with EUV light.
  • a silicon crystal film such as a single crystal silicon film (for example, see References 1 and 2), an aluminum nitride film (see, for example, Reference 3) laminated on a metal mesh, a graphene film ( For example, refer to Document 4).
  • Literature 1 JP 2010-256434 A Literature 2: JP 2009-116284 A Literature 3: JP 2005-43895 A Literature 4: International Publication No. 2011/160861 Pamphlet
  • a pellicle provided with a pellicle frame and a pellicle film may be used by being arranged in a decompressed exposure apparatus.
  • an exposure original plate that includes a pellicle and an original plate is disposed in an area of the exposure apparatus that is decompressed to, for example, 100 Pa or less (preferably 10 Pa or less).
  • the pellicle pellicle frame
  • the function of the flow path is the pressure between the area surrounded by the pellicle frame (hereinafter also referred to as “inside the pellicle”) and the area outside the pellicle frame (hereinafter also referred to as “outside the pellicle”). It is to adjust (vent).
  • the function of the flow path in this case is to capture foreign matter in the exposure apparatus (for example, on the original plate).
  • foreign matter in the exposure apparatus include scattered particles (debris) generated by an EUV light source, and foreign particles mixed in the gas that moves back and forth between the pellicle and the outside of the pellicle when the exposure apparatus is depressurized or pressurized.
  • the flow path that penetrates the outer peripheral surface and the inner peripheral surface of the pellicle frame may have both a ventilation function and a foreign matter capturing function.
  • the processing (formation) may be difficult.
  • the shape of the flow path may be a shape having a bent portion (for example, a bent portion and a curved portion), a branched portion, and the like.
  • the more complicated the shape of the flow path the more difficult it is to process (form) the flow path.
  • the processing (formation) of the flow path tends to be difficult.
  • an object of the present invention is to provide a pellicle frame excellent in processability (ease of processing) when forming a flow path penetrating between an outer peripheral surface and an inner peripheral surface of the pellicle frame by processing, and the pellicle frame
  • a pellicle frame including a first frame member and a second frame member arranged so that one end faces in the thickness direction face each other, At least one of an end surface of the first frame member facing the second frame member and an end surface of the second frame member facing the first frame member has a recess that communicates with the outer peripheral surface and the inner peripheral surface of the pellicle frame.
  • the pellicle frame wherein the shape of the recess viewed from a direction perpendicular to the end surface provided with the recess is a groove shape having at least one of a bent portion and a branch portion.
  • ⁇ 3> The pellicle frame according to ⁇ 2>, wherein a flow path penetrating between the outer peripheral surface and the inner peripheral surface of the pellicle frame is formed by at least the concave portion and a part of the adhesive layer.
  • ⁇ 4> The pellicle frame according to any one of ⁇ 1> to ⁇ 3>, wherein a total number of the bent portion and the branch portion in the concave portion is 6 or more.
  • ⁇ 5> Any one of ⁇ 1> to ⁇ 5>, wherein the shape of the recess viewed from a direction perpendicular to the end surface provided with the recess is a groove shape extending over at least three sides of the pellicle frame.
  • At least one of the first frame member and the second frame member is A groove provided on at least one of the end faces in the thickness direction and not connected to the recess; A through hole penetrating between the outer peripheral surface and the wall surface of the groove;
  • ⁇ 7> The pellicle frame according to any one of ⁇ 1> to ⁇ 6>, A pellicle film supported on an end surface side of the first frame member not facing the second frame member, or an end surface side of the second frame member not facing the first frame member; A pellicle.
  • a frame member for a pellicle frame At least one end surface in the thickness direction has a recess that communicates with the outer peripheral surface and the inner peripheral surface,
  • a frame member in which the shape of the concave portion viewed from a direction perpendicular to the end surface provided with the concave portion is a groove shape having at least one of a bent portion and a branch portion.
  • ⁇ 10> The pellicle according to ⁇ 7>, An original plate disposed on the opposite side of the pellicle film from the pellicle frame; An exposure original plate.
  • An exposure apparatus comprising the exposure original plate described in ⁇ 10>.
  • ⁇ 12> a light source that emits exposure light;
  • Have The exposure original plate is arranged such that exposure light emitted from the light source passes through the pellicle film and is irradiated onto the original plate.
  • ⁇ 14> exposing the exposure light emitted from the light source through the pellicle film of the exposure original plate according to ⁇ 10>, irradiating the original plate, and reflecting the original plate; Exposing the sensitive substrate in a pattern by irradiating the sensitive substrate with the exposure light reflected by the original plate through the pellicle film; and A method for manufacturing a semiconductor device, comprising: ⁇ 15> The method for manufacturing a semiconductor device according to ⁇ 14>, wherein the exposure light is EUV light.
  • the pellicle frame excellent in workability (ease of processing) when forming a flow path penetrating between the outer peripheral surface and the inner peripheral surface of the pellicle frame by processing, and the pellicle frame are provided.
  • a pellicle, a frame member suitable as a member of the pellicle frame, an exposure original plate including the pellicle, an exposure apparatus using the exposure original plate, and a method of manufacturing a semiconductor device are provided.
  • FIG. 6 is an exploded view showing an end surface of the first frame member facing the second frame member and an end surface of the second frame member facing the first frame member in the pellicle frame according to an example of the present embodiment.
  • FIG. 2 is a sectional view taken along line AA in FIG. 1. It is a fragmentary sectional view of the pellicle frame concerning the modification of this embodiment. It is a fragmentary sectional view of the pellicle frame concerning the modification of this embodiment.
  • the pellicle frame of the present embodiment is a pellicle frame including a first frame member and a second frame member arranged so that one end surfaces in the thickness direction face each other, and the second frame of the first frame member. At least one of the end surface facing the frame member and the end surface of the second frame member facing the first frame member has a recess communicating with the outer peripheral surface and the inner peripheral surface of the pellicle frame, and the recess is provided.
  • the shape of the concave portion viewed from a direction perpendicular to the end face is a groove shape having at least one of a bent portion and a branched portion.
  • the outer peripheral surface of the pellicle frame is formed by the outer peripheral surface of the first frame member and the outer peripheral surface of the second frame member.
  • the inner peripheral surface of the pellicle frame is formed by the inner peripheral surface of the first frame member and the inner peripheral surface of the second frame member.
  • the pellicle frame of the present embodiment may include other members (for example, an adhesive layer described later) other than the first frame member and the second frame member. Further, the pellicle frame of the present embodiment may have only one concave portion or two or more concave portions. In the following description, the end face in the thickness direction of the frame member may be simply referred to as “end face of the frame member”.
  • the recess includes a flow path that penetrates between the outer peripheral surface and the inner peripheral surface of the pellicle frame (for example, together with a frame member facing the recess, an adhesive layer described later, and the like).
  • the pellicle frame of the present embodiment has a recess communicating with the outer peripheral surface and the inner peripheral surface of the first frame member on the end surface of the first frame member facing the second frame member, and The end surface of the second frame member facing the first frame member satisfies at least one of having a recess communicating with the outer peripheral surface and the inner peripheral surface of the second frame member, and the pellicle is formed by at least the recess.
  • a flow path penetrating between the outer peripheral surface and the inner peripheral surface of the frame is formed. That is, in the pellicle frame of this embodiment, the flow path is not formed as a through-hole penetrating the frame member, but is formed by processing a recess in the end surface of the frame member. The processing of the concave portion on the end surface of the frame member is easier than the processing of the through hole penetrating the frame member. Therefore, the pellicle frame of this embodiment is excellent in workability (ease of processing) when forming a flow path that penetrates between the outer peripheral surface and the inner peripheral surface of the pellicle frame by processing.
  • the recess can be processed by a known method such as etching (dry etching, wet etching, etc.) or grinding.
  • the function of the flow path is not particularly limited.
  • the function of adjusting pressure (venting) between the region surrounded by the pellicle frame and the region outside the pellicle frame (hereinafter also referred to as “venting function”). ), A function of capturing foreign matter in the exposure apparatus (hereinafter also referred to as “foreign matter capturing function”), and the like.
  • the flow path may have two or more functions. Further, when the pellicle frame has two or more of the flow paths, each flow path may have a different function.
  • the shape of the concave portion viewed from a direction perpendicular to the end surface provided with the concave portion is a groove shape having at least one of a bent portion and a branch portion.
  • bent portion examples include a bent portion and a curved portion.
  • the shape of the concave portion is preferably a groove shape having at least one of a bent portion, a branch portion, and a curved portion.
  • the “bent portion” refers to a bent portion that leads to a straight portion (for example, bent portions 113, 114, 115, 116, 117, and 118 in FIG. 2 described later).
  • the “bent part” can also be called a “corner part”.
  • the “curved portion” refers to a bent portion that does not communicate with the straight portion.
  • the pellicle frame of the present embodiment further includes an adhesive layer that bonds the first frame member and the second frame member. Thereby, the 1st frame member and the 2nd frame member are fixed firmly.
  • the adhesive layer includes an adhesive.
  • Adhesives include acrylic resin adhesives, epoxy resin adhesives, polyimide resin adhesives, silicone resin adhesives, inorganic adhesives, double-sided adhesive tapes, silicone resin adhesives, acrylic adhesives, polyolefin adhesives, etc. Is mentioned. Among these, acrylic resin adhesives, epoxy resin adhesives, polyimide resin adhesives, silicone resin adhesives, and inorganic adhesives are preferable.
  • a flow path that penetrates between the outer peripheral surface and the inner peripheral surface of the pellicle frame is formed by at least the concave portion and a part of the adhesive layer.
  • foreign substances can be effectively captured by a part of the adhesive layer constituting a part of the flow path. That is, the foreign matter capturing performance in the flow path is further improved.
  • the total number of bent portions and branch portions in the concave portion is preferably 6 or more.
  • This aspect is not necessarily limited to the concave portion having both the bent portion and the branched portion.
  • the total number of the bent portions is preferably 6 or more.
  • a groove for example, described later
  • the total number of bent portions can be 6.
  • the pellicle frame of the present embodiment preferably has an aspect in which the shape of the recess viewed from a direction perpendicular to the end surface provided with the recess is a groove shape extending over at least three sides of the pellicle frame. That is, the pellicle frame of the present embodiment extends on at least three sides of the first frame member on the end surface of the first frame member facing the second frame member, and one end is on the outer peripheral surface of the first frame member. The other end has a recess that communicates with the inner peripheral surface of the first frame member, and the end surface of the second frame member that faces the first frame member extends over at least three sides of the second frame member.
  • the channel length of the channel formed by the recess can be increased, the foreign matter capturing performance in the channel is further improved.
  • a recess 112 in the second frame member 200 described later
  • a recess 32 in the first frame member 102 described later
  • a recess 142 in the second frame member 206 described later. And the like.
  • the pellicle frame of the present embodiment at least one of the first frame member and the second frame member is provided on at least one of the end surfaces in the thickness direction, the groove not connected to the recess, the outer peripheral surface, and the above It is preferable to have a through hole penetrating between the wall surfaces of the groove.
  • the pellicle frame of the present embodiment has the groove and the through hole, at least one of the first frame member and the second frame member (hereinafter also referred to as “specific frame member”) and another member (for example, , Pellicle film, other frame member, original plate, etc.) can be fixed without contacting the front and back surfaces of each of the specific frame member and other members.
  • the said through-hole has penetrated between a part of outer peripheral surface of a specific frame member, and a part of wall surface (a side surface or a bottom face.
  • the following is same) of the said groove
  • the end surface of the specific frame member provided with the groove and the other member (for example, a pellicle film, another frame member, or an original plate) are arranged to face each other through the through hole.
  • a pressing force can be exerted between the specific frame member and the other member.
  • both can be fixed, without contacting the front and back of a specific frame member and another member (by an apparatus, a jig
  • the pellicle frame of the present embodiment has the groove and the through hole, the front and back surfaces of the specific frame member and the other member are brought into contact when the specific frame member and the other member are fixed. There is an effect that both can be fixed.
  • the “force for pressing” is synonymous with the force for attracting each other.
  • front surface refers to one end surface in the thickness direction (hereinafter also referred to as “one end surface”)
  • rear surface refers to the other end surface in the thickness direction (hereinafter referred to as “ It is also referred to as “the other end face”.
  • front surface and back surface refer to one film surface and the other film surface.
  • front surface refers to the light irradiation surface
  • rear surface refers to the surface opposite to the light irradiation surface.
  • the pellicle film has a property that it is very easily broken. For this reason, careful handling is required for handling the pellicle membrane.
  • a pellicle film containing an inorganic material for example, described in JP 2010-256434 A, JP 2009-116284 A, JP 2005-43895 A, or International Publication No. 2011/160861 pamphlet.
  • the pellicle film is not only a film that is easily torn and difficult to be self-supporting, but also causes mechanical scratches and dust generation.
  • self-supporting indicates that the film shape can be maintained independently.
  • the present inventors have fixed the specific frame member and other members (for example, a pellicle film, another frame member, an original plate, etc.) on the front and back surfaces of the specific frame member and the other members. Were examined for a method of fixing them so as not to contact each other by an apparatus, a jig, a hand or the like. The present inventors have found that such a method can be realized when the pellicle frame of the present embodiment has the groove and the through hole.
  • the pellicle frame of the present embodiment has the groove and the through hole, it is possible to prevent foreign matter from adhering to the specific frame member and the other member by contacting the specific frame member and the other member.
  • the pellicle film can be prevented from being broken due to contact with the pellicle film.
  • the pellicle frame of the present embodiment is a pellicle for lithography using exposure light having a short wavelength (for example, EUV light, light having a shorter wavelength than EUV light, etc.), and particularly an inorganic pellicle. It is suitable for manufacturing a pellicle provided with a pellicle film containing a material.
  • EUV (Extreme Ultra Violet) light refers to light having a wavelength of 5 nm to 30 nm.
  • the wavelength of EUV light is preferably 5 nm to 13.5 nm.
  • EUV light and light having a shorter wavelength than EUV light are collectively referred to as “EUV light or the like”.
  • a more preferable aspect in the case where the pellicle frame of the present embodiment has the groove and the through hole is an aspect in which the specific frame member has the groove on both one end face and the other end face in the thickness direction. Since the specific frame member of this aspect has the above-described pressure reducing groove on both the one end surface and the other end surface, the selection range of the surface for fixing the pellicle film, the other frame member, or the original plate is wide. Have advantages. Further, in the pellicle frame of this aspect, a pellicle film or other frame member (or original plate) is arranged on one end surface of the specific frame member, and an original plate (or pellicle film or other frame member) is arranged on the other end surface. This is suitable for producing an exposure original plate. In the production of the exposure original plate, the pellicle can be produced without contacting the specific frame member and the pellicle film, and the exposure original plate can be produced without contacting the pellicle and the original plate.
  • FIG. 1 is a schematic perspective view of a pellicle frame 300 according to an example of the pellicle frame of the present embodiment.
  • FIG. 1 is a schematic perspective view of a pellicle frame 300 according to an example of the pellicle frame of the present embodiment.
  • FIG. 2 is an exploded view showing the end surface of the pellicle frame 300 facing the second frame member of the first frame member and the end surface of the second frame member facing the first frame member.
  • illustration of the adhesive layer is omitted.
  • 3 is a cross-sectional view taken along line AA in FIG.
  • FIG. 6 is a schematic perspective view of a first frame member, which is one of the constituent members of the pellicle frame 300, as viewed from a direction in which an end surface that does not face the second frame member can be observed.
  • the pellicle frame 300 includes a rectangular first frame member 100 and a rectangular second frame member 200.
  • the first frame member 100 and the second frame member 200 include an end surface 10 that is one end surface in the thickness direction of the first frame member 100 and an end surface 110 that is one end surface in the thickness direction of the second frame member 200.
  • the first frame member 100 and the second frame member 200 have respective inner peripheral surfaces (inner peripheral surface 40, inner peripheral surface 140) and respective outer peripheral surfaces (outer peripheral surface 30).
  • the outer peripheral surfaces 130) are arranged so as to overlap.
  • the pellicle frame 300 which is an integral frame member is formed.
  • the outer peripheral surface of the pellicle frame 300 is formed by the outer peripheral surface 30 of the first frame member 100 and the outer peripheral surface 130 of the second frame member 200.
  • the inner peripheral surface of the pellicle frame 300 is formed by the inner peripheral surface 40 of the first frame member 100 and the inner peripheral surface 140 of the second frame member 200.
  • first frame member 100 and the second frame member 200 are rectangular as described above, but the shapes of the first frame member and the second frame member of the present embodiment are not limited to rectangular shapes, and are rectangular. It may be a shape other than the shape (for example, a trapezoidal shape, a shape having a protrusion on the outer side of the frame, etc.).
  • a groove-shaped recess 112 is provided on the end surface 110 of the second frame member 200.
  • the recess 112 communicates with the outer peripheral surface 130 and the inner peripheral surface 140 of the second frame member 200. That is, the recess 112 penetrates between the outer peripheral surface 130 and the inner peripheral surface 140 of the second frame member 200.
  • the shape of the concave portion 112 is such that when viewed from a direction perpendicular to the end surface 110, the outer peripheral surface 130 of one specific side of the four sides of the second frame member 200 is a starting point and passes through the other three sides. Then, the shape returns to the specific side, and the inner peripheral surface 140 of the specific side is the end point.
  • the recess 112 extends over at least three sides (substantially four sides) of the four sides of the second frame member 200, one end thereof communicates with the outer peripheral surface 130, and the other end communicates with the inner peripheral surface 140. Since the concave portion 112 has the above shape, it has six bent portions, specifically six bent portions (bent portions 113, 114, 115, 116, 117, 118). The shape of the recess in this embodiment is not limited to the shape of the recess 112. A modification of the recess will be described later.
  • a groove 12 is provided on the end face 10 of the first frame member 100.
  • the groove 12 of the first frame member 100 and the recess 112 of the second frame member 200 are provided so as not to be connected to each other (particularly, see FIGS. 2 and 3). That is, the groove 12 and the recess 112 are provided in an arrangement that does not overlap each other when viewed from the thickness direction of the first frame member 100 and the second frame member 200 (hereinafter also simply referred to as “thickness direction”). . More specifically, in the pellicle frame 300, the groove 12 is disposed outside the recess 112.
  • the groove 12 has a shape that makes one round over the four sides of the first frame member 100 when viewed from the thickness direction, but it is not a shape that makes a full circle, and has ends 16 and 17. It has a shape.
  • the arrangement of the groove 12 and the recess 112 as viewed from the thickness direction is such that a part of the recess 112 passes between the end 16 and the end 17 of the groove 12.
  • the first frame member 100 has a through hole 14A and a through hole 14B.
  • the through hole 14 ⁇ / b> A and the through hole 14 ⁇ / b> B penetrate between the bottom surface of the groove 12 and the outer peripheral surface 30 of the first frame member 100.
  • each of the through holes 14 ⁇ / b> A and 14 ⁇ / b> B may penetrate between the side surface of the groove 12 and the outer peripheral surface 30. Further, either one of the through holes 14A and 14B may be omitted. That is, in the first frame member 100, two through holes (through holes 14A and 14B) are connected to one groove (for example, the groove 12), but the present embodiment is not limited to this aspect. In the present embodiment, it is sufficient that at least one through hole is connected to one groove (for example, the groove 12). In the present embodiment, two or more grooves connected to at least one through hole may be provided per one end surface.
  • a groove 22 is provided on the end surface 20 opposite to the end surface 10.
  • the shape of the groove 22 is an endless shape that goes around the shape of the first frame member 100.
  • the first frame member 100 has a through hole 24A and a through hole 24B.
  • the through hole 24 ⁇ / b> A and the through hole 24 ⁇ / b> B penetrate between the bottom surface of the groove 22 and the outer peripheral surface 30.
  • the variations of the through holes 24A and 24B are the same as the variations of the through holes 14A and 14B.
  • the adhesive layer 160 is provided in a region other than the groove 12 on the end surface 10 of the first frame member 100.
  • the recess 112 and a part of the adhesive layer 160 provide a gap between the inner peripheral surface and the outer peripheral surface of the pellicle frame 300.
  • a flow path that penetrates is formed. This flow path has a function (venting function) for adjusting pressure (venting function) between a region surrounded by the pellicle frame 300 and a region outside the pellicle frame, and a function for capturing foreign objects in the exposure apparatus (foreign matter).
  • the adhesive layer 160 is formed on the first frame member 100 side (not on the second frame member 200 side).
  • a method of forming and then bonding the first frame member 100 on which the adhesive layer 160 is formed and the second frame member 200 is preferable.
  • the adhesive layer 160 may be provided in a region other than the recess 112 in the end face 110 of the second frame member.
  • a method of providing the adhesive layer 160 in a region other than the recess 112 when manufacturing the pellicle frame 300, the adhesive layer 160 is formed not on the first frame member 100 but on the second frame member 200 side, A method in which the second frame member 200 on which the adhesive layer 160 is formed and the first frame member 100 are bonded together is suitable.
  • the recess 112 forms a flow path that penetrates between the inner peripheral surface and the outer peripheral surface of the pellicle frame 300 together with a part of the adhesive layer 160.
  • a method of forming a flow path that penetrates between the inner peripheral surface and the outer peripheral surface of the pellicle frame there is also a method of processing a through hole in the frame member and using the through hole as a flow path. Conceivable.
  • the method of forming a flow path as a through hole it is difficult to form a complicated flow path having a bent portion such as the recess 112.
  • the present embodiment has an advantage that the formation (processing) of the flow path is easy because the recess is formed in the frame member instead of the through hole.
  • the recess can be processed by a known method such as etching (dry etching, wet etching, etc.), grinding, or the like.
  • foreign matter can be attached to a part of the adhesive layer 160 constituting a part of the flow path, so that the foreign matter capturing performance in the flow path is improved.
  • the recess 112 has six bent portions. As a result, the foreign matter is likely to collide with the wall surface of the concave portion 112, so that the foreign matter capturing performance of the flow path formed by the concave portion 112 is improved.
  • a groove 12 that is not connected to the recess 112 is provided on the end surface 10 of the first frame member 100. Further, the first frame member 100 is provided with a through hole 14 ⁇ / b> A and a through hole 14 ⁇ / b> B connected to the groove 12. With these configurations, the first frame member 100 and the second frame member 200 are fixed via the adhesive layer 160 without contacting the front surface (one end surface) and the back surface (the other end surface). Can do.
  • the first frame member 100 and the second frame member 200 can be fixed via the adhesive layer 160 without contacting the one film surface and the other film surface.
  • the inside of the groove 12 for example, a vacuum pump
  • the through holes 14A and 14B is formed through the through holes 14A and 14B. Or the like).
  • the groove 12 is a groove that is not connected to the concave portion 112, the pressing force can be effectively exerted. Further, the groove 12 does not hinder the function of the recess 112 (for example, a foreign matter capturing function, a ventilation function, etc.).
  • a groove 22 is provided on the end face 20 of the first frame member 100.
  • the first frame member 100 is provided with a through hole 24A and a through hole 24B connected to the groove 22. It has been.
  • a pressing force that is, a pulling force
  • the fixing may be performed via an adhesive layer.
  • a pellicle film may be fixed to the side of the end surface opposite to the end surface 110 of the second frame member 200 (via an adhesive layer as necessary).
  • the above-described pellicle frame 300 is also suitable for an application in which a pellicle having a pellicle film supported on the pellicle frame 300 is first manufactured, and then an exposure original plate is manufactured by fixing the pellicle and the original plate.
  • the pellicle and the original plate are fixed (via an adhesive layer as necessary) without contacting the front and back surfaces of the pellicle film, the pellicle frame 300, and the original plate. Can be produced.
  • the example of the dimension of the second frame member 200 is the same as the example of the dimension of the first frame member 100.
  • the length L1 of the first frame member 100 in the long side direction can be set to, for example, 135 mm to 153 mm, preferably 140 mm to 152 mm, and more preferably 145 mm to 151 mm.
  • the length L2 of the first frame member 100 in the short side direction can be, for example, 100 mm to 130 mm, preferably 105 mm to 125 mm, and more preferably 110 mm to 120 mm.
  • the length L1 in the long side direction and the length L2 in the short side direction may be the same dimension. That is, the shape of the first frame member 100 may be a square shape.
  • the frame width (frame width) W of the first frame member 100 can be, for example, 1.0 mm to 5.0 mm, preferably 1.2 mm to 3.5 mm, and more preferably 1.5 mm to 2.5 mm.
  • the frame width may be the same size or different size on the four sides of the rectangular first frame member 100.
  • the length in the long side direction of the opening (through hole) surrounded by the first frame member 100 can be, for example, 130 mm to 152 mm, preferably 135 mm to 151 mm, and more preferably 140 mm to 150 mm.
  • the width of the opening can be, for example, 95 mm to 130 mm, preferably 100 mm to 125 mm, and more preferably 105 mm to 120 mm.
  • the thickness t of the first frame member 100 can be, for example, 0.5 mm to 5.0 mm, preferably 0.5 mm to 3.0 mm, and more preferably 0.5 mm to 2.0 mm.
  • the widths of the grooves 12 and 22 can be appropriately set in consideration of the pressure loss reduction in the grooves, the relationship with the frame width of the first frame member 100, and the like.
  • the width is set to 10 ⁇ m to 1.0 mm. 50 ⁇ m to 700 ⁇ m are preferable, 100 ⁇ m to 600 ⁇ m are more preferable, and 200 ⁇ m to 500 ⁇ m are particularly preferable.
  • the depth of the groove 12 and the groove 22 can be appropriately set in consideration of the pressure loss reduction in the groove, the relationship with the thickness of the frame member, etc., but can be set to 10 ⁇ m to 1.0 mm, for example, 50 ⁇ m. ⁇ 700 ⁇ m is preferable, 100 ⁇ m to 600 ⁇ m is more preferable, and 200 ⁇ m to 500 ⁇ m is particularly preferable.
  • the widths of the through holes 14A, 14B, 24A, and 24B can be appropriately set in consideration of the pressure loss reduction in the through holes, the relationship with the thickness of the frame member, and the like. 50 ⁇ m to 700 ⁇ m are preferable, 100 ⁇ m to 600 ⁇ m are more preferable, and 200 ⁇ m to 500 ⁇ m are particularly preferable. Further, the lengths of the through holes 14A, 14B, 24A, and 24B can be appropriately set in consideration of the pressure loss reduction in the through holes, etc., but can be set to 0.5 mm to 10 mm, for example, 0.7 mm Is preferably 5.0 mm, more preferably 1.0 mm to 2.0 mm.
  • the width (flow path width) of the recess 112 provided in the second frame member 200 can be appropriately set in consideration of pressure loss reduction in the recess 112, but can be set to 10 ⁇ m or more, for example. 100 ⁇ m or more is preferable.
  • the width of the recess is preferably 1.0 mm or less, more preferably 700 ⁇ m or less, further preferably 600 ⁇ m or less, and further preferably 500 ⁇ m or less.
  • the width of the concave portion is 1.0 mm or less, foreign matter (particularly, particles having a particle size of 100 nm or less) easily collides with the wall surface of the concave portion due to Brownian motion, so that the foreign matter capturing performance in the concave portion is further enhanced.
  • a foreign substance (particle) having a particle size of about 10 ⁇ m collides with the wall surface of the recess (or flow path) by at least one of gravity and inertia and is captured in the recess (or flow path).
  • the depth of the recess can be appropriately set in consideration of the pressure loss reduction in the recess, the relationship with the thickness of the frame member, etc., but can be set to 10 ⁇ m to 1.0 mm, for example, 50 ⁇ m ⁇ 700 ⁇ m is preferable, 100 ⁇ m to 600 ⁇ m is more preferable, and 200 ⁇ m to 500 ⁇ m is particularly preferable.
  • the recessed part in this embodiment is a recessed part connected to an outer peripheral surface and an inner peripheral surface, if the length (flow path length) of a recessed part is more than a frame width (frame width), there will be no restriction
  • the length of the recess (flow path length) can be, for example, 10 mm to 500 mm, preferably 50 mm to 490 mm, more preferably 100 mm to 480 mm, and still more preferably 200 mm to 450 mm.
  • the longer the length of the recess (flow channel length) the more advantageous.
  • the material of the first frame member 100 and the second frame member 200 is not particularly limited, and can be a normal material used for a pellicle frame.
  • the material of the first frame member 100 aluminum, aluminum alloy (5000 series, 6000 series, 7000 series, etc.), stainless steel, silicon, silicon alloy, iron, iron-based alloy, carbon steel, tool steel, ceramics , Metal-ceramic composite materials, resins and the like.
  • aluminum and aluminum alloys are more preferable from the viewpoint of light weight and rigidity.
  • the material of the first frame member 100 and the material of the second frame member 200 may be the same or different.
  • a frame member made of aluminum or an aluminum alloy may be used as the first frame member 100
  • a frame member made of silicon may be used as the second frame member 200.
  • This aspect is suitable when a composite member having a structure in which the second frame member 200 that is a silicon substrate supports a pellicle film that is a crystalline silicon film is used. This composite member will be described later.
  • the 1st frame member 100 and the 2nd frame member 200 may have a protective film on the surface.
  • a protective film having resistance to hydrogen radicals, EUV light, etc. present in the exposure atmosphere is preferable.
  • An example of the protective film is an oxide film.
  • the oxide film can be formed by a known method such as anodic oxidation.
  • the oxide film may be colored with a black dye.
  • the first frame member 100 has an oxide film colored with a black dye, it is easier to detect foreign matter on the first frame member 100.
  • appropriately refer to configurations of known pellicle frames such as JP2014-021217A and JP2010-146027A. Can do.
  • the concave portion 112 communicating with the outer peripheral surface and the inner peripheral surface of the pellicle frame is provided in the second frame member 200.
  • the concave portion in the present embodiment is provided in the second frame member. Is not limited.
  • the recessed part in this embodiment should just be provided in at least one of the 1st frame member and the 2nd frame member.
  • the pellicle frame of the present embodiment has an outer peripheral surface and an inner peripheral surface of the pellicle frame (specifically, the first frame member) on the end surface of the first frame member facing the second frame member.
  • FIG. 4 and 5 are both partial cross-sectional views of a pellicle frame according to a modification of the present embodiment, and both correspond to the partial cross-sectional view of FIG.
  • the pellicle frame shown in FIG. 4 is an example in which the second frame member 202 is not provided with a recess, and instead the first frame member 102 is provided with a recess 32.
  • a channel is formed by the recess 32, a part of the adhesive layer 160 (specifically, an end face of the adhesive layer 160), and a part of the end face in the thickness direction of the second frame member 202. ing.
  • the recess 32 is provided at a position that does not contact the groove 12 (a position that does not overlap when viewed from the thickness direction of the frame member).
  • the pellicle frame shown in FIG. 5 is an example in which the concave portion 112 is provided in the second frame member 200 and the concave portion 32 is provided in the first frame member 102.
  • both are provided so that the concave portion 112 and the concave portion 32 overlap when viewed from the thickness direction of the frame member, whereby one channel is formed by the concave portion 112 and the concave portion 32. Is formed. More specifically, in this example, the flow path is formed by the recess 112, the recess 32, and a part of the adhesive layer 160 (specifically, the end surface of the adhesive layer 160).
  • one channel is formed by the recess 112 and the recess 32, but as a further modification, a separate channel is formed by the recess 112 and the recess 32. Also good. In short, it is only necessary that the recess 32 is provided at a position where it does not come into contact with the groove 12 (a position where it does not overlap when viewed from the thickness direction of the frame member).
  • FIG. 7 is a schematic perspective view of the first frame member 102 used in the pellicle frame according to the modification shown in FIGS. 4 and 5. As shown in FIG. 7, in the first frame member 102, a recess 32 that does not contact the groove 12 is provided on the end surface 10. Other configurations of the first frame member 102 are the same as those of the first frame member 100.
  • FIG. 8 is a schematic plan view of a second frame member 206 according to a modification of the second frame member 200 in the pellicle frame 300.
  • the recess 112 in the second frame member 200 has a groove shape like the recess 112, but is changed to a recess 142 including a branching portion and a meandering portion.
  • Other configurations of the second frame member 206 are the same as the configurations of the second frame member 200.
  • the pellicle frame of this embodiment may include other members other than the first frame member, the second frame member, and the adhesive layer interposed between the first frame member and the second frame member.
  • the pellicle frame of the present embodiment may include an adhesive layer on at least one of the end surface fixed to the pellicle film and the end surface fixed to the original plate.
  • Adhesives included in the adhesive layer include acrylic resin adhesives, epoxy resin adhesives, polyimide resin adhesives, silicone resin adhesives, inorganic adhesives, double-sided adhesive tapes, silicone resin adhesives, acrylic adhesives, And polyolefin pressure-sensitive adhesives.
  • an acrylic resin adhesive As an adhesive used for adhesion to the pellicle film, an acrylic resin adhesive, an epoxy resin adhesive, a polyimide resin adhesive, a silicone resin adhesive, and an inorganic adhesive are preferable.
  • an adhesive used for adhesion to the original plate a double-sided pressure-sensitive adhesive tape, a silicone resin pressure-sensitive adhesive, an acrylic pressure-sensitive adhesive, and a polyolefin-based pressure-sensitive adhesive are preferable.
  • the pellicle frame of the present embodiment may further have a release liner (also called a release film or a separator) on the adhesive layer.
  • a release liner also called a release film or a separator
  • Any known release liner can be used without particular limitation.
  • the frame member of the present embodiment is a frame member for a pellicle frame, and has at least one end surface in the thickness direction having a recess communicating with the outer peripheral surface and the inner peripheral surface, and the end surface provided with the recess.
  • the shape of the concave portion viewed from a direction perpendicular to the groove shape is a groove shape having at least one of a bent portion and a branched portion.
  • a frame member provided with a recess is mentioned, and a preferable range is also as described above.
  • Specific examples of the frame member of the present embodiment include the first frame member 102, the second frame member 200, and the second frame member 206 described above.
  • the frame member of the present embodiment further includes a groove that is provided on at least one end surface in the thickness direction and that does not connect to the recess, and a through hole that passes between the outer peripheral surface and the wall surface of the groove. Is preferred.
  • the first frame member 102 described above can be cited.
  • the frame member of the present embodiment may be a member that includes a frame member (hereinafter also referred to as a “frame main body”) and other members other than the frame main body.
  • the frame member (frame body) of the present embodiment may include an adhesive layer on at least one end surface in the thickness direction. Examples of the adhesive contained in the adhesive layer are as described above.
  • the frame member of this embodiment may further have a release liner (also called a release film or a separator) on the adhesive layer.
  • the pellicle according to the present embodiment includes the pellicle frame according to the present embodiment described above, the end surface side of the first frame member that does not face the second frame member, or the first frame member of the second frame member. And a pellicle film supported on the side of the end face that does not face each other. Since the pellicle of this embodiment includes the pellicle frame of this embodiment, the same effect as the pellicle frame of this embodiment can be obtained.
  • one of the first frame member and the second frame member that is closer to the pellicle film may be referred to as “frame member P”, and the other of the first frame member and the second frame member ( The frame member far from the pellicle film) may be referred to as “frame member Q”.
  • the second frame member is a frame member P (a frame member closer to the pellicle film) and the first frame member is a frame member Q (a frame member far from the pellicle film). The explanation is centered.
  • the pellicle structure of this embodiment is a structure in which the pellicle frame of this embodiment supports the pellicle film.
  • the manufacturing order of the pellicle according to the present embodiment does not necessarily have to be the order in which the pellicle film according to the present embodiment is manufactured and then the pellicle film is fixed to the pellicle frame.
  • the order in which the composite member having a structure in which the frame member P supports the pellicle membrane is manufactured and the obtained composite member and the frame member Q are fixed may be used.
  • the other frame member is bonded to the end surface side where the concave portion is provided in one of the first frame member and the second frame member as necessary.
  • the material of the pellicle film is not particularly limited, and may be an organic material, an inorganic material, or a mixed material of an organic material and an inorganic material.
  • the organic material include a fluorine-based polymer.
  • the inorganic material include crystalline silicon (eg, single crystal silicon, polycrystalline silicon, etc.), diamond-like carbon (DLC), graphite, amorphous carbon, graphene, silicon carbide, silicon nitride, aluminum nitride, and the like.
  • the pellicle film may contain one of the above materials alone or two or more of them.
  • examples of the pellicle film include a pellicle film containing at least one selected from the group consisting of fluorine-based polymer, crystalline silicon, diamond-like carbon, graphite, amorphous carbon, graphene, silicon carbide, silicon nitride, and aluminum nitride. It is done. Among them, crystalline silicon, diamond-like carbon, graphite, amorphous carbon, graphene, silicon carbide, silicon nitride are highly transparent to EUV light and the like and can suppress decomposition and deformation caused by irradiation with EUV light. And a pellicle film containing at least one inorganic material selected from the group consisting of aluminum nitride.
  • a pellicle film containing such an inorganic material is a film that is very easy to tear, and is liable to cause scratches and dust generation due to contact.
  • the pellicle of this embodiment when the frame member P has the groove not connected to the recess, the pellicle can be manufactured without contacting the front and back surfaces of the pellicle film and the pellicle frame. Therefore, in this case, even when a pellicle film containing such an inorganic material is used, it is possible to effectively prevent the pellicle film from being broken, scratched, or dusted by contact.
  • the configuration of the pellicle film may be a single layer configuration or a configuration composed of two or more layers.
  • the thickness of the pellicle film (the total thickness in the case of two or more layers) can be, for example, 10 nm to 200 nm, preferably 10 nm to 100 nm, more preferably 10 nm to 70 nm, and particularly preferably 10 nm to 50 nm.
  • the thickness of the pellicle film is thin (for example, 200 nm or less), the transparency to EUV light or the like is excellent.
  • the thickness of the pellicle film is thin (for example, 200 nm or less), the pellicle film tends to be easily broken.
  • the pellicle of the present embodiment when the frame member P has the above-described groove not connected to the recess, the pellicle film, the first frame member, and the second frame member are in contact with the front and back surfaces, respectively.
  • the pellicle can be manufactured without any problem. Therefore, in this case, even when a pellicle film having a small thickness (for example, 200 nm or less) is used, the pellicle film can be effectively prevented from being broken.
  • effect 1 when a groove that does not connect to the recess is provided on the end surface of the pellicle frame on the side that supports the pellicle film, the pellicle of this embodiment.
  • the pellicle of this embodiment when the groove not connected to the recess is provided on the opposite surface of the end surface of the pellicle frame on the side supporting the pellicle film, the pellicle of this embodiment is The exposure original plate can be manufactured without contacting the front and back surfaces of the pellicle and the original plate (hereinafter referred to as “effect 2”). Further, in the pellicle of the present embodiment, it is needless to say that both effects 1 and 2 are achieved when grooves are provided on both end faces of the pellicle frame.
  • a preferable aspect of the pellicle of the present embodiment is an aspect in which the frame member P includes a composite member having a structure in which the pellicle film is supported.
  • the pellicle film is a film that is difficult to stand by itself (for example, a pellicle film containing an inorganic material such as a silicon crystal film, a thin pellicle film, etc.)
  • the pellicle film is formed by the frame member P.
  • the pellicle can be manufactured while maintaining the film shape.
  • the pellicle having the above-described composite member is preferably manufactured by fixing the composite member having a structure in which the frame member P supports the pellicle film and the frame member Q.
  • An example of the composite member is a composite member including a silicon crystal film as a pellicle film and a frame-shaped silicon substrate (for example, a silicon wafer) as the frame member P.
  • the pellicle can be manufactured while the film shape of the pellicle film (silicon crystal film) is held by the frame member P (frame-shaped silicon substrate).
  • a silicon crystal film is formed on a silicon substrate, and then the center portion of the silicon substrate is etched from the silicon crystal film non-formation side of the silicon substrate. It can be produced by removing the silicon substrate. Only the silicon crystal film remains in the central portion of the composite member manufactured by this method, and the silicon crystal film in the central portion becomes a pellicle film. The silicon crystal film and the silicon substrate remain in the peripheral portion around the central portion, and the frame member P is formed by the silicon substrate remaining in the peripheral portion.
  • a circular silicon substrate for example, a silicon wafer
  • the circular silicon substrate and the silicon crystal film are not attached to the frame member Q before or after being bonded to the frame member Q.
  • the composite member having a structure in which the frame member P supports the pellicle film is a composite member other than the above example, it can be manufactured by the same method.
  • FIG. 9 is a schematic cross-sectional view of an example (pellicle 500) of the pellicle of this embodiment.
  • the pellicle 500 has a configuration in which a composite member 490 of a pellicle film 480 and a second frame member 482 (frame member P) and a frame member 420 with an adhesive layer are bonded together. It has become.
  • the frame member 420 with an adhesive layer includes a first frame member 400 (frame member Q), an adhesive layer 460 in contact with one end surface of the first frame member 400 (a surface facing the second frame member 482), and a first An adhesive layer 462 that contacts the other end surface of the frame member 400 and a release liner 470 that contacts the adhesive layer 462 are provided.
  • the composite member 490 and the frame member 420 with the adhesive layer are arranged such that the second frame member 482 of the composite member 490 and the adhesive layer 460 of the frame member 420 with the adhesive layer are in contact with each other. Yes.
  • the first frame member 400 (frame member Q) has grooves that are not connected to the recesses, similar to the first frame member 100 described above, on both end faces in the thickness direction. Further, the first frame member 400 has the same through-hole as the first frame member 100 described above. Moreover, the 2nd frame member 482 (frame member P) has the recessed part connected to the outer peripheral surface and inner peripheral surface of a 2nd frame member similarly to the above-mentioned 2nd frame member 200. As shown in FIG. A flow path is formed by the recess and the film surface of the adhesive layer 460 of the frame member 420 with the adhesive layer.
  • the pellicle 500 has a second frame member 482, an adhesive layer 460, a first frame member 400, an adhesive layer 462, and a release frame 470, and a first frame of the second frame member 482. And a pellicle film 480 fixed on the end surface side not facing the member 400. That is, the pellicle 500 fixes the pellicle film on the end surface of the second frame member 200 that does not face the first frame member 100 with respect to the pellicle frame 300, and the second frame member 200 of the first frame member 100.
  • the adhesive layer and the release liner are sequentially provided on the end surface that is not opposed to the surface.
  • the pellicle 500 is preferably manufactured by fixing (bonding) the composite member 490 and the frame member 420 with an adhesive layer. At this time, since the inside of the groove provided on the one end surface of the first frame member 400 can be decompressed through the through hole connected to the groove, the front surface and the back surface of the composite member 490 and the frame member 420 with the adhesive layer are provided. Both can be fixed without contacting.
  • the release liner 470 in the frame member 420 with the adhesive layer is provided to protect the exposed surface of the adhesive layer 462.
  • the adhesive layer 462 is first exposed by removing the release liner 470 from the frame member 420 with the adhesive layer of the pellicle 500, and then the exposed adhesive layer By 462, the pellicle and the original plate are fixed.
  • the composite member 490 is preferably a composite member of a pellicle film 480 that is a polycrystalline silicon film (p-Si film) and a second frame member 482 that is a silicon substrate.
  • a method for manufacturing such a composite member is as described above.
  • the first frame member 400 is preferably an aluminum or aluminum alloy frame member.
  • an acrylic resin adhesive agent an epoxy resin adhesive agent, a polyimide resin adhesive agent, a silicone resin adhesive agent, and an inorganic adhesive agent are preferable.
  • an adhesive agent contained in the adhesive bond layer 462 a double-sided adhesive tape, a silicone resin adhesive, an acrylic adhesive, and a polyolefin adhesive are preferable.
  • Method 1 a method for manufacturing the pellicle frame and the pellicle film according to the present embodiment by a method of fixing via an adhesive layer as necessary.
  • the frame member P includes a composite member having a structure in which the pellicle film supports the frame member Q, and an adhesive layer as necessary.
  • Method 2 The method of fixing via the above.
  • the frame member P (the frame member closer to the pellicle film) has a groove that is not connected to the recess on the end surface facing the pellicle film, and penetrates between the wall surface of the groove and the outer peripheral surface. It is preferable that a through hole is provided. Further, the method 1 includes an arrangement step in which the end surface of the frame member P where the groove is provided and the pellicle film are opposed to each other, and the inside of the groove is decompressed through the through hole. It is preferable to include a fixing step of fixing the frame and the pellicle film.
  • the pressure can be applied between the pellicle frame and the pellicle film by the above-described decompression, so that both the pellicle frame and the pellicle film can be fixed without contacting the front and back surfaces. Can do.
  • the frame member Q (the frame member far from the pellicle membrane) includes a groove that is not connected to the concave portion on the end surface facing the composite member, and between the wall surface of the groove and the outer peripheral surface. It is preferable that a through-hole penetrating is provided. Further, the method 2 includes an arrangement step in which the end surface of the frame member Q provided with the groove and the frame member P included in the composite member are opposed to each other, and the inside of the groove through the through hole. It is preferable to have a fixing step of fixing the frame member Q and the composite member by reducing the pressure.
  • each of the frame member P, the frame member Q, and the pellicle film Both can be fixed without contacting the front surface and the back surface.
  • the pressure reduction in the fixing step is preferably performed in a state where the pellicle frame and the pellicle film to be fixed are arranged in a pressurized atmosphere.
  • the difference (differential pressure) between the pressure of the entire atmosphere in which the pellicle frame and the pellicle film are arranged and the pressure inside the groove can be increased, the pellicle frame and the pellicle film It is possible to increase the pressing force generated between the two. For this reason, both can be fixed more easily.
  • the pressing force force applied to the entire pellicle frame
  • the pressing force (force applied to the entire pellicle frame) is more preferably 10N or more, and particularly preferably 20N or more.
  • the upper limit of the pressing force (force applied to the entire pellicle frame) is not particularly limited, but is 500 N, preferably 400 N, from the viewpoint of productivity.
  • the pressure reduction in the fixing step is preferably performed in a state where the frame member Q and the composite member to be fixed are arranged in a pressurized atmosphere.
  • the frame member Q and the composite member can be combined.
  • the pressing force generated between the members can be increased. For this reason, both can be fixed more easily.
  • a preferable range of the pressing force is the same as the range described above for the method 1.
  • the flow path that penetrates the outer peripheral surface and the inner peripheral surface of the pellicle frame in the present embodiment functions effectively even when the pressure reduction in the fixing process is performed in a state where the object to be fixed is arranged in a pressurized atmosphere. That is, the difference between the inside of the pellicle (the region surrounded by the pellicle frame) and the outside of the pellicle (the region outside the pellicle frame) when a pressurized atmosphere is formed by the above flow path (for example, when the inside of the vacuum chamber is pressurized). The pressure can be reduced. Therefore, the flow path can effectively suppress deformation (dent or overhang) of the pellicle film due to the differential pressure.
  • the exposure original plate of the present embodiment includes the pellicle of the present embodiment and an original plate disposed on the opposite side of the pellicle film from the pellicle frame of the pellicle. Since the exposure original plate of this embodiment includes the pellicle of this embodiment, the same effects as the pellicle of this embodiment can be obtained.
  • the groove is provided on the end surface of the pellicle frame at least on the end surface facing the original plate (that is, at least the end surface on the side facing the original plate of the frame member Q). Preferably it is.
  • the exposure original plate of this aspect can be manufactured without contacting the front and back surfaces of the pellicle and the original plate.
  • an original including a support substrate, a reflective layer laminated on the support substrate, and an absorber layer formed on the reflective layer can be used.
  • the absorber layer partially absorbs EUV light, whereby a desired image is formed on a sensitive substrate (for example, a semiconductor substrate with a photoresist film).
  • the reflective layer can be a multilayer film of molybdenum (Mo) and silicon (Si).
  • the absorber layer can be a material having high absorbability such as EUV light, such as chromium (Cr) or tantalum nitride.
  • the manufacturing method of the exposure original plate of this embodiment is not particularly limited, but the groove is provided on the end surface of the pellicle of this embodiment, which is opposite to the end surface of the pellicle frame that supports the pellicle film.
  • the pellicle and the original plate are disposed so that the opposite surface and the original plate face each other, and the inside of the groove is decompressed through the through hole, whereby the pellicle and the original plate are It is preferable to have a fixing step of fixing According to the manufacturing method of the exposure original plate of the present embodiment, the pressing force between the pellicle and the original plate can be exerted by the reduced pressure inside the groove, so that the front and back surfaces of the pellicle and the original plate are not contacted. Both can be fixed.
  • the pressure reduction in the fixing step is preferably performed in a state where the pellicle and the original plate are arranged in a pressurized atmosphere.
  • the difference (differential pressure) between the pressure of the entire atmosphere in which the pellicle and the original plate are arranged and the pressure inside the groove can be increased, the pressing between the pellicle and the original plate is performed.
  • the matching power can be increased. For this reason, both can be fixed more easily.
  • the pressing force between the pellicle and the original plate is preferably 1N or more, and more preferably 2N or more.
  • the pressing force between the pellicle and the original plate is more preferably 10N or more, and particularly preferably 20N or more.
  • the upper limit of the pressing force between the pellicle and the original plate (the force applied to the entire pellicle frame) is not particularly limited, but is, for example, 500 N, preferably 400 N from the viewpoint of productivity.
  • the exposure apparatus of this embodiment includes the exposure original plate of this embodiment. For this reason, there exists an effect similar to the exposure original plate of this embodiment.
  • the exposure apparatus of the present embodiment includes a light source that emits exposure light (preferably EUV light or the like, more preferably EUV light; the same applies hereinafter), an exposure original plate of the present embodiment, and exposure light emitted from the light source. It is preferable that the exposure original plate is arranged so that the exposure light emitted from the light source passes through the pellicle film and is irradiated on the original plate.
  • EUV light or the like in addition to being able to form a fine pattern (for example, a line width of 32 nm or less) by EUV light or the like, EUV light or the like that tends to cause a problem of poor resolution due to foreign matter is used as exposure light. In addition, pattern exposure with reduced resolution failure due to foreign matter can be performed.
  • the method for manufacturing a semiconductor device includes a step of irradiating the original light of the exposure light emitted from a light source through the pellicle film of the exposure original plate of the present embodiment and reflecting the original light, and reflecting the original plate, Exposing the sensitive substrate in a pattern by irradiating the sensitive substrate with the exposure light reflected by the light through the pellicle film.
  • a semiconductor device in which the resolution failure due to foreign matter is reduced even when EUV light or the like that is likely to cause a resolution failure due to foreign matter is used as the exposure light. can do.
  • FIG. 10 is a schematic cross-sectional view of an EUV exposure apparatus 800 that is an example of the exposure apparatus of the present embodiment.
  • the EUV exposure apparatus 800 includes a light source 831 that emits EUV light, an exposure original plate 850 that is an example of an exposure original plate according to this embodiment, and an EUV light emitted from the light source 831.
  • an illumination optical system 837 that leads to The exposure original plate 850 includes a pellicle 810 including a pellicle film 812 and a pellicle frame 814, and an original plate 833.
  • the exposure original plate 850 is arranged such that EUV light emitted from the light source 831 passes through the pellicle film 812 and is irradiated onto the original plate 833.
  • the original 833 reflects the irradiated EUV light in a pattern.
  • the pellicle frame 814 and the pellicle 810 are examples of the pellicle frame and the pellicle of the present embodiment, respectively.
  • filter windows 820 and 825 are installed between the light source 831 and the illumination optical system 837 and between the illumination optical system 837 and the original 833, respectively. Further, the EUV exposure apparatus 800 includes a projection optical system 838 that guides the EUV light reflected by the original 833 to the sensitive substrate 834.
  • the EUV light reflected by the original 833 is guided onto the sensitive substrate 834 through the projection optical system 838, and the sensitive substrate 834 is exposed in a pattern. Note that exposure by EUV is performed under reduced pressure conditions.
  • the EUV light source 831 emits EUV light toward the illumination optical system 837.
  • the EUV light source 831 includes a target material, a pulse laser irradiation unit, and the like. EUV is obtained by irradiating this target material with a pulse laser to generate plasma.
  • EUV When the target material is Xe, EUV having a wavelength of 13 to 14 nm is obtained.
  • the wavelength of light emitted from the EUV light source is not limited to 13 to 14 nm, and may be light having a wavelength suitable for the purpose within a wavelength range of 5 to 30 nm.
  • the illumination optical system 837 collects the light emitted from the EUV light source 831, makes the illuminance uniform, and irradiates the original 833.
  • the illumination optical system 837 includes a plurality of multilayer mirrors 832 for adjusting the EUV optical path, an optical coupler (optical integrator), and the like.
  • the multilayer film mirror is a multilayer film in which molybdenum (Mo) and silicon (Si) are alternately stacked.
  • the method for attaching the filter windows 820 and 825 is not particularly limited, and examples thereof include a method of attaching via an adhesive or the like, and a method of mechanically fixing in the EUV exposure apparatus.
  • the filter window 820 disposed between the light source 831 and the illumination optical system 837 captures scattered particles (debris) generated from the light source, and the scattered particles (debris) are elements inside the illumination optical system 837 (for example, a multilayer film). Avoid sticking to the mirror 832).
  • the filter window 825 disposed between the illumination optical system 837 and the original 833 captures particles (debris) scattered from the light source 831 side and prevents the scattered particles (debris) from adhering to the original 833. .
  • the foreign matter adhering to the original plate absorbs or scatters EUV light, which causes poor resolution on the wafer. Therefore, the pellicle 810 is mounted so as to cover the EUV irradiation area of the original 833.
  • the EUV light passes through the pellicle film 812 and is irradiated on the original 833.
  • the EUV light reflected by the original 833 passes through the pellicle film 812 and is irradiated onto the sensitive substrate 834 through the projection optical system 838.
  • the projection optical system 838 condenses the light reflected by the original 833 and irradiates the sensitive substrate 834.
  • the projection optical system 838 includes a plurality of multilayer mirrors 835 and 836 for preparing an EUV optical path.
  • the sensitive substrate 834 is a substrate on which a resist is applied on a semiconductor wafer, and the resist is exposed in a pattern by EUV reflected by the original 833. By developing this resist and etching the semiconductor wafer, a desired pattern is formed on the semiconductor wafer.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

L'invention concerne un cadre de pellicule (300) équipé d'un premier élément de cadre (100) et d'un deuxième élément de cadre (200) agencés de façon qu'une face d'extrémité de chaque élément de cadre dans la direction de l'épaisseur soit opposée à une face d'extrémité de l'autre élément de cadre. De plus, au moins une des faces d'extrémité opposées dans le cadre de pellicule (300) est équipée d'une partie creux en forme de rainure (112), qui communique avec des faces périphériques extérieures (30, 130) et des faces périphériques intérieures (40, 140) du cadre de pellicule, et a une ou plusieurs sections courbées ou sections ramifiées dans la face d'extrémité, et au moins une des faces d'extrémité (10, 20 110) du premier élément de cadre et/ou du deuxième élément de cadre est équipée d'une rainure (12, 22) ayant des trous traversants (14A, 14B, 24A, 24B) qui ne sont pas reliés à la partie creux (112), mais communiquent avec les faces périphériques extérieures (30, 130). Ainsi, la facilité d'usinage d'un passage d'écoulement traversant est améliorée.
PCT/JP2015/063633 2014-05-16 2015-05-12 Cadre de pellicule, pellicule, élément de cadre, plaque originale d'exposition, dispositif d'exposition, et procédé de fabrication d'un dispositif semi-conducteur WO2015174412A1 (fr)

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US10712656B2 (en) 2015-09-02 2020-07-14 Asml Netherlands B.V. Method for manufacturing a membrane assembly
CN112088334A (zh) * 2018-03-05 2020-12-15 三井化学株式会社 防护膜组件、曝光原版、曝光装置及半导体装置的制造方法
JP2021073536A (ja) * 2017-10-10 2021-05-13 信越化学工業株式会社 Ｅｕｖ用ペリクルフレームの通気構造、ｅｕｖ用ペリクル、ｅｕｖ用ペリクル付露光原版、露光方法、半導体の製造方法及び液晶ディスプレイの製造方法
WO2021117817A1 (fr) 2019-12-13 2021-06-17 三井化学株式会社 Procédé de démontage de pellicule et dispositif de démontage de pellicule
JP2022121755A (ja) * 2019-02-01 2022-08-19 信越化学工業株式会社 ペリクル、ペリクル付露光原版、露光方法及び半導体の製造方法

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US10712656B2 (en) 2015-09-02 2020-07-14 Asml Netherlands B.V. Method for manufacturing a membrane assembly
JP2021073536A (ja) * 2017-10-10 2021-05-13 信越化学工業株式会社 Ｅｕｖ用ペリクルフレームの通気構造、ｅｕｖ用ペリクル、ｅｕｖ用ペリクル付露光原版、露光方法、半導体の製造方法及び液晶ディスプレイの製造方法
JP7451442B2 (ja) 2017-10-10 2024-03-18 信越化学工業株式会社 Ｅｕｖ用ペリクルフレームの通気構造、ｅｕｖ用ペリクル、ｅｕｖ用ペリクル付露光原版、露光方法及び半導体の製造方法
CN112088334A (zh) * 2018-03-05 2020-12-15 三井化学株式会社 防护膜组件、曝光原版、曝光装置及半导体装置的制造方法
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JP2022121755A (ja) * 2019-02-01 2022-08-19 信越化学工業株式会社 ペリクル、ペリクル付露光原版、露光方法及び半導体の製造方法
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WO2021117817A1 (fr) 2019-12-13 2021-06-17 三井化学株式会社 Procédé de démontage de pellicule et dispositif de démontage de pellicule

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