WO2015170556A1 - Polishing carrier and method for manufacturing same - Google Patents

Polishing carrier and method for manufacturing same Download PDF

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Publication number
WO2015170556A1
WO2015170556A1 PCT/JP2015/061513 JP2015061513W WO2015170556A1 WO 2015170556 A1 WO2015170556 A1 WO 2015170556A1 JP 2015061513 W JP2015061513 W JP 2015061513W WO 2015170556 A1 WO2015170556 A1 WO 2015170556A1
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Prior art keywords
resin
polishing
thickness
laminate
resin layer
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PCT/JP2015/061513
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French (fr)
Japanese (ja)
Inventor
竜次 妹尾
準 白髪
隆行 小林
水野 裕之
Original Assignee
冨士ベークライト株式会社
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Priority to JP2015534843A priority Critical patent/JP5834331B1/en
Publication of WO2015170556A1 publication Critical patent/WO2015170556A1/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/27Work carriers
    • B24B37/28Work carriers for double side lapping of plane surfaces
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304Mechanical treatment, e.g. grinding, polishing, cutting

Definitions

  • the present invention relates to an abrasive carrier comprising a laminate having a base material layer and a resin layer.
  • the present invention also relates to a method for manufacturing the abrasive carrier. Furthermore, this invention relates to the grinding
  • a polishing carrier is used to hold the plate-like body.
  • the polishing carrier has a plurality of through holes, and the plate-like body is held by the through holes. Then, the plate-like body is polished by driving the polishing carrier.
  • polishing carrier may be damaged during the polishing or foreign matter may fall off from the polishing carrier.
  • foreign matter adheres to the surface of the plate-like body, or scratches (polishing scratches) occur on the plate-like body, so that a product with excellent quality cannot be obtained.
  • various polishing carriers with improved strength and durability have been proposed.
  • Patent Document 1 describes a polishing carrier including a holding material body and a surface layer coated on the surface of the holding material body.
  • the holding material body includes a holding part having a holding hole for holding the plate-like body, a core part to which the holding part is attached, and a gear part attached to the outer periphery of the core part.
  • the core part can be formed by laminating a prepreg impregnated with an epoxy resin on a glass fiber substrate and dried.
  • the holding part and gear part impregnate an organic fiber base material such as aramid fiber base material, polyester fiber base material, polyphenylene sulfide fiber base material, polyvinyl alcohol fiber base material with epoxy resin, phenol resin, diallyl phthalate resin, etc.
  • the prepreg can be laminated and molded by heating and pressing. Thereby, it is supposed that it can suppress generation
  • Patent Document 2 describes a manufacturing method of a polishing carrier. In this manufacturing method, a laminated plate obtained by heat-press molding a plurality of sheets of a thermosetting resin-impregnated sheet-like fiber substrate (prepreg) and a thermosetting resin-unimpregnated sheet-like fiber substrate is processed into a polishing carrier. It is a method to do.
  • the sheet-like fiber base material is preferably composed of organic fibers. More preferably, it is also described that the sheet-like fiber base material is an aramid fiber nonwoven fabric. It also describes the use of an epoxy resin as the thermosetting resin.
  • the molten thermosetting resin in the prepreg penetrates into the resin-impregnated sheet-like fiber base material at the time of heat and pressure molding, and a laminate having a low resin content as a whole is easily produced. be able to. Since the resin content can be reduced, it is said that the reinforcing effect of the sheet-like fiber base material can be sufficiently exerted to obtain a highly rigid abrasive carrier.
  • Patent Document 3 includes a base layer in which a base material made of organic fibers is impregnated with a resin, and a surface film layer laminated on the surface of the base layer, and the surface film layer F has a tensile elastic modulus of 4000 N / mm 2 or more.
  • An object-holding material comprising an organic resin film is described.
  • a polyester nonwoven fabric was impregnated with an epoxy resin varnish, and then dried to obtain a prepreg for constituting a base layer. Seven prepregs were laminated, and polyethylene naphthalate films were laminated on both front and back sides. Thereafter, an example is described in which a laminate is obtained by sandwiching and pressing the laminate between mirror plates.
  • a polishing jig used when polishing a thin plate-like workpiece such as a silicon wafer or liquid crystal glass the polishing jig is composed of a reinforcing fiber layer and a resin layer. Describes a polishing jig in which an ultrahigh molecular weight polyethylene layer is melted and bonded.
  • the example describes an example in which a reinforcing fiber layer made of a glass woven fabric, an epoxy resin layer, and an ultrahigh molecular weight polyethylene layer are laminated.
  • the present invention has been made in order to solve the above-described problems, and has excellent strength and durability capable of suppressing foreign matter from adhering to the polished plate-like body and generation of scratches.
  • the object is to provide an abrasive carrier.
  • the subject is a polishing carrier comprising a laminate having a base material layer and a resin layer, wherein the base material layer comprises an organic fiber assembly impregnated with a resin, and the resin layer is a cyclic olefin polymer.
  • the said resin layer consists of a resin composition containing a cyclic olefin polymer (A) and a soft copolymer (B).
  • the resin layer comprises at least two monomers selected from the group consisting of 100 parts by mass of a cyclic olefin polymer (A) having a glass transition temperature of 60 to 200 ° C., an olefin, a diene, and an aromatic vinyl hydrocarbon. 1 to 50 parts by weight of a soft copolymer (B) having a glass transition temperature of 0 ° C. or lower, 0.001 to 1 part by weight of a radical initiator (C), and a radical polymerizable functional group It is preferably made of a resin composition obtained by melt-kneading 0 to 1 part by mass of a polyfunctional compound (D) having two or more thereof.
  • the cyclic olefin polymer (A) is preferably an acid-modified cyclic olefin polymer.
  • the organic fiber assembly is preferably at least one fiber selected from the group consisting of wholly aromatic polyester fibers, aramid fibers, polyphenylene sulfide fibers, and polyparaphenylene benzobisoxazole fibers.
  • the organic fiber aggregate is preferably a nonwoven fabric. It is also preferable that the nonwoven fabric is a long fiber nonwoven fabric.
  • the thickness of the base layer is 10 to 1000 ⁇ m
  • the thickness of the resin layers on both surfaces of the laminate is 10 to 1000 ⁇ m
  • the thickness of the resin layer between the base layers is 20 to 1000 ⁇ m.
  • the polishing carrier has a thickness of 100 to 5000 ⁇ m.
  • the thickness of the resin layer between the said base material layers is 2 times or more of the thickness of the resin layer of the both surfaces of the said laminated board.
  • the subject is a method for manufacturing the abrasive carrier, wherein the resin sheet is the outermost layer of a plurality of fiber sheets made of the organic fiber aggregate and a plurality of resin sheets containing the cyclic olefin polymer (A).
  • the resin sheet is the outermost layer of a plurality of fiber sheets made of the organic fiber aggregate and a plurality of resin sheets containing the cyclic olefin polymer (A).
  • a polishing method in which the plate-like body is held by the polishing carrier and the plate-like body is polished is a preferred embodiment of the present invention.
  • the polishing carrier of the present invention has excellent strength and durability, it is possible to suppress foreign matter from adhering to the plate to be polished and the occurrence of scratches.
  • FIG. 1 is a plan view of a polishing carrier 1 in Example 1.
  • FIG. 1 is a cross-sectional image of a polishing carrier 1 in Example 1.
  • 3 is a cross-sectional image of a polishing carrier in Example 2.
  • 3 is a cross-sectional image of a resin carrier in Comparative Example 1.
  • 6 is a cross-sectional image of a resin carrier in Comparative Example 2.
  • 10 is a cross-sectional image of a resin carrier in Comparative Example 3.
  • the present invention is an abrasive carrier comprising a laminate having a base material layer and a resin layer, wherein the base material layer comprises an organic fiber assembly impregnated with a resin, and the resin layer comprises a cyclic olefin polymer.
  • It is a polishing carrier that contains (A) and does not contain the organic fiber, and the laminated plate has a resin layer between a plurality of base material layers and also has a resin layer on both surfaces.
  • a polishing carrier that satisfies the above configuration has excellent strength and is not easily damaged during the polishing operation. In addition, since it has excellent durability, it is possible to prevent foreign matter from falling off and to prevent the occurrence of whiskers.
  • the polishing carrier of the present invention no foreign matter adheres to the plate-like body and scratches are not generated.
  • the resin layer contains the cyclic olefin polymer (A).
  • the cyclic olefin polymer (A) is a polymer excellent in heat resistance, heat aging resistance, chemical resistance, weather resistance, solvent resistance, dielectric properties, rigidity, and the like, and the cyclic olefin polymer (A) is used.
  • an abrasive carrier having excellent strength and durability can be obtained. Since the cyclic olefin polymer (A) is amorphous, the dimensional accuracy of the obtained abrasive carrier is good.
  • the cyclic olefin polymer (A) is a thermoplastic resin, it can be melted by heating, and the productivity of the abrasive carrier is improved.
  • the resin layer does not contain the organic fiber. If the resin layer contains organic fibers, whiskers are generated in the resin layer, or the organic fibers are dropped from the resin layer, and foreign matter adheres to the plate-like body or scratches are generated. At this time, a trace amount of organic fibers may be contained in the resin layer as long as the effects of the present invention are not impaired. However, it is preferable that the resin layer does not contain any organic fiber from the viewpoint of completely suppressing generation of whiskers in the resin layer and dropping of the organic fiber from the resin layer.
  • the cyclic olefin polymer (A) may be obtained by polymerizing only an olefin monomer having an aliphatic cyclic skeleton, or may be copolymerized with an olefin monomer having an aliphatic cyclic skeleton. Copolymers with various monomers may be used. The copolymerization amount of other monomers is usually less than 50% by mass, and preferably less than 30% by mass.
  • the cyclic olefin polymer (A) may be a resin composition containing a cyclic olefin polymer as a main component and other components.
  • the main component is usually a component having a content of 50% by mass or more, and preferably a component having a content of 80% by mass or more.
  • the cyclic olefin polymer (A) is a non-crystalline and transparent polymer having a saturated hydrocarbon ring structure in the main chain or side chain of the polymer, and specifically, JP-A 63-264646.
  • Resin composition comprising cyclic diene addition polymer and hydrogenated product thereof, and cyclic olefin polymer and soft copolymer disclosed in WO 2006/025294 And the like.
  • resin compositions are, for example, trade names “e-mateX” from Fuji Bakelite Co., Ltd., trade names “Apel” and “Topas” from Mitsui Chemicals, Inc. and trade names from Nippon Zeon Co., Ltd. They are sold under the names “Zeonex” and “Zeonoa”, and it is possible to easily obtain commercial products.
  • These commercial products often contain additives for improving durability and moldability, so use the resin before adding additives from the viewpoint of preventing foreign matter from falling off during polishing. In some cases, it may be preferable to form them. In some cases, it is preferable to use a resin in which the catalyst residue and residual volatile matter are particularly reduced.
  • the resin layer is preferably made of a resin composition containing a cyclic olefin polymer (A) and a soft copolymer (B).
  • the abrasive carrier having such a resin layer can further improve the impact resistance and wear resistance of the abrasive carrier.
  • the resin layer has at least two or more types selected from the group consisting of 100 parts by mass of a cyclic olefin polymer (A) having a glass transition temperature of 60 to 200 ° C., an olefin, a diene, and an aromatic vinyl hydrocarbon. 1 to 50 parts by mass of a soft copolymer (B) having a glass transition temperature of 0 ° C.
  • a radical initiator (C) 0.001 to 1 part by mass of a radical initiator (C), and a radical polymerizable functional group More preferably, it is made of a resin composition obtained by melt-kneading 0 to 1 part by mass of a polyfunctional compound (D) having 2 or more in the molecule.
  • the cyclic olefin polymer (A) used in the present invention preferably has a glass transition temperature of 60 to 200 ° C. From the viewpoint of further improving the heat resistance of the polishing carrier, it is preferably 80 ° C. or higher, and more preferably 100 ° C. or higher. Moreover, since there exists a possibility of decomposition
  • the glass transition temperature in the present invention is a glass transition start temperature measured at a heating rate of 10 ° C./min using a differential scanning calorimeter (DSC).
  • the MFR (melt flow rate: measured at 230 ° C. under a load of 2.16 kg) of the cyclic olefin polymer (A) is 0.1 to 500 g / 10 minutes.
  • MFR melt flow rate: measured at 230 ° C. under a load of 2.16 kg
  • MFR is more preferably 0.5 g / 10 min or more, and even more preferably 1 g / 10 min or more.
  • MFR exceeds 500 g / 10 min, the mechanical strength of the resulting resin composition may be reduced.
  • MFR is more preferably 200 g / 10 min or less, and even more preferably 100 g / 10 min or less.
  • the cyclic olefin polymer (A) is obtained by polymerizing an olefin monomer having an aliphatic cyclic skeleton, and any polymer having an aliphatic cyclic skeleton in the obtained polymer may be used.
  • the cyclic olefin polymer (A) is preferably a polymer obtained by polymerizing a cyclic olefin represented by the following formula [I] or [II].
  • n is 0 or 1
  • m is 0 or a positive integer
  • q is 0 or 1
  • R 1 to R 18 and R a and R b are each independently A hydrogen atom, a halogen atom or a hydrocarbon group
  • R 15 to R 18 may be bonded to each other to form a monocyclic or polycyclic ring, and the monocyclic or polycyclic ring has a double bond
  • R 15 and R 16 , or R 17 and R 18 may form an alkylidene group.
  • R 1 to R 19 are each independently a hydrogen atom, a halogen atom or an aliphatic carbonization.
  • an ethylene-cyclic olefin random copolymer (a1) that is, a random copolymer of ethylene and a cyclic olefin represented by the above formula [I] or [II] is preferably used.
  • Such an ethylene-cycloolefin random copolymer (a1) is preferably used because it provides a resin composition having excellent abrasion resistance and a small amount of volatile components released.
  • the cyclic olefin represented by the above formula [I] or [II] used as a raw material for the ethylene-cyclic olefin random copolymer (a1) is preferable from the viewpoint of heat resistance and availability.
  • tetracyclo [4.4.0.1 2,5 .1 7,10] -3- dodecene and derivatives hydrocarbon group substituted thereto is illustrated, tetracyclo [4.4.0.1 2,5 .1 7 as particularly suitable , 10 ] -3-dodecene.
  • the ethylene content in the ethylene-cyclic olefin random copolymer (a1) is preferably 40 to 85 mol% from the viewpoints of heat resistance and rigidity.
  • the ethylene content is more preferably 50 mol% or more. Further, the ethylene content is more preferably 75 mol% or less.
  • the cyclic olefin content is preferably 15 to 60 mol%.
  • the content of the cyclic olefin is more preferably 25 mol% or more.
  • the content rate of a cyclic olefin is 50 mol% or less more suitably.
  • the glass transition temperature of the soft copolymer (B) is preferably 0 ° C. or lower.
  • the glass transition temperature is preferably ⁇ 10 ° C. or lower, more preferably ⁇ 20 ° C. or lower. Usually, the glass transition temperature is ⁇ 100 ° C. or higher.
  • the crystallinity measured by X-ray diffraction method is preferably 0-30%, more preferably 0-25%.
  • the MFR (melt flow rate: measured at 230 ° C. under a load of 2.16 kg based on ASTM® D1238) of the soft copolymer (B) is preferably 0.01 to 200 g / 10 minutes. If the MFR is less than 0.01 g / 10 min, the melt viscosity is too high, and the melt moldability of the resulting resin composition may be deteriorated.
  • the MFR is more preferably 0.05 g / 10 min or more, and even more preferably 0.1 g / 10 min or more. On the other hand, when the MFR exceeds 200 g / 10 min, the mechanical strength of the resulting abrasive carrier may be reduced.
  • MFR is more preferably 150 g / 10 min or less, and even more preferably 100 g / 10 min or less.
  • an intrinsic viscosity [ ⁇ ] measured in decalin at 135 ° C. 0.01 to 10 dl / g, preferably 0.08 to 7 dl / g.
  • the soft copolymer (B) is obtained by polymerizing at least two kinds of monomers selected from the group consisting of olefins, dienes and aromatic vinyl hydrocarbons.
  • preferred examples of the soft copolymer (B) include the following (b1), (b2), (b3), and (b4).
  • a soft copolymer (b2) obtained by polymerizing at least two monomers selected from the group consisting of: a random or block copolymer of an aromatic vinyl hydrocarbon and a conjugated diene, or a hydride
  • the radical initiator (C) is not particularly limited as long as it can be thermally decomposed by heating during melt kneading to generate radicals.
  • a peroxide, an azo compound, a redox initiator, etc. are mentioned.
  • those containing metal are not preferable because metal residues are mixed in the polishing carrier.
  • the thing containing a nitrogen element like an azo compound has a possibility that a nitrogen-containing compound may volatilize from a grinding
  • the radical initiator (C) is preferably decomposed at an appropriate rate during melt-kneading, and the one-minute half-life temperature thereof is preferably 30 to 250 ° C.
  • the 1-minute half-life temperature is more preferably 50 ° C. or more and 200 ° C. or less.
  • Organic peroxides used as radical initiator (C) include ketone peroxides such as methyl ethyl ketone peroxide and cyclohexanone peroxide; 1,1-bis (t-butylperoxy) cyclohexane, 2,2-bis Peroxyketals such as (t-butylperoxy) octane; t-butylhydroperoxide, cumene hydroperoxide, 2,5-dimethylhexane-2,5-dihydroxyperoxide, 1,1,3,3- Hydroperoxides such as tetramethylbutyl hydroperoxide; di-t-butyl peroxide, 2,5-dimethyl-2,5-bis (t-butylperoxy) hexane, 2,5-dimethyl-2,5 -Dialkyl peroxides such as bis (t-butylperoxy) hexyne-3; diacyl such as lauroyl peroxide and benzoyl per
  • polyfunctional compound (D) having two or more radical polymerizable functional groups in the molecule will be described.
  • examples of the polyfunctional compound (D) include divinylbenzene, vinyl acrylate, vinyl methacrylate, triaryl isocyanurate, diaryl phthalate, ethylene dimethacrylate, trimethylolpropane trimethacrylate, and the like.
  • the resin composition can be obtained by melt-kneading the cyclic olefin polymer (A), the soft copolymer (B), the radical initiator (C) and the polyfunctional compound (D).
  • the blending amount of the soft copolymer (B) is preferably 1 to 50 parts by mass with respect to 100 parts by mass of the cyclic olefin polymer (A).
  • the blending amount of the soft copolymer (B) is less than 1 part by mass, the improvement in wear resistance is insufficient, and is preferably 5 parts by mass or more.
  • the blending amount of the soft copolymer (B) exceeds 50 parts by mass, the rigidity of the resulting laminate may be reduced, making it difficult to use as an abrasive carrier, preferably 25 masses. Or less.
  • the blending amount of the radical initiator (C) is preferably 0.001 to 1 part by mass with respect to 100 parts by mass of the cyclic olefin polymer (A).
  • the blending amount of the radical initiator (C) is less than 0.001 part by mass, the crosslinking reaction does not proceed sufficiently, resulting in insufficient improvement in wear resistance. is there.
  • the compounding quantity of a radical initiator (C) exceeds 1 mass part, there exists a possibility that stain resistance may deteriorate, and it is 0.5 mass part or less suitably.
  • the compounding amount of the polyfunctional compound (D) is preferably 0 to 1 part by mass with respect to 100 parts by mass of the cyclic olefin polymer (A).
  • the polyfunctional compound (D) can be blended arbitrarily and may not be blended, but is preferably blended in order to advance the crosslinking reaction efficiently.
  • the suitable compounding quantity in that case is 0.001 mass part or more, More preferably, it is 0.01 mass part or more.
  • the compounding amount of the polyfunctional compound (D) exceeds 1 part by mass, the stain resistance may be deteriorated, and it is preferably 0.5 part by mass or less.
  • the cyclic olefin polymer (A) used in the present invention is preferably an acid-modified cyclic olefin polymer from the viewpoint of adhesion to the base material layer.
  • Such an acid-modified cyclic olefin polymer can be produced by blending a cyclic olefin polymer (A) with a modifier so as to obtain a desired acid-modified amount and graft polymerization. It can also be produced by preparing a product and then mixing this modified product with an unmodified cyclic olefin polymer.
  • the content of the unsaturated carboxylic acid unit or the unit derived from the anhydride thereof in the polymer contained in the resin layer is preferably 0.1 to 5% by mass.
  • the said content is less than 0.1 mass%, there exists a possibility that the adhesiveness excellent with the base material layer may not be obtained, and it is more preferable that it is 0.2 mass% or more.
  • the content exceeds 5% by mass, the stain resistance may be deteriorated, and it is more preferably 3% by mass or less.
  • unsaturated carboxylic acids are usually used. Specifically, (meth) acrylic acid, maleic acid, fumaric acid, tetrahydrophthalic acid, itaconic acid, citraconic acid, crotonic acid, isocrotonic acid, endocis-bicyclo [2.2.1] unsaturated carboxylic acids such as hept-5-ene-2,3-dicarboxylic acid (nadic acid), and derivatives of these unsaturated carboxylic acids such as unsaturated carboxylic acid anhydrides, unsaturated carboxylic acid halides, Examples thereof include unsaturated carboxylic acid amides, unsaturated carboxylic acid imides, and ester compounds of unsaturated carboxylic acids.
  • unsaturated carboxylic acid derivative examples include maleic anhydride, citraconic anhydride, maleenyl chloride, maleimide, monomethyl maleate, dimethyl maleate, glycidyl maleate, and the like.
  • ⁇ , ⁇ -unsaturated dicarboxylic acids and ⁇ , ⁇ -unsaturated dicarboxylic acid anhydrides such as maleic acid, nadic acid and anhydrides of these acids are preferably used.
  • These modifiers can be used in combination of two or more.
  • the base material layer is composed of an organic fiber aggregate impregnated with a resin. By doing in this way, it can prevent that an organic fiber falls off from a base material layer. In addition, it is possible to prevent the beard from being generated on the polishing carrier.
  • the resin impregnated in the organic fiber assembly is the cyclic polyolefin polymer (A).
  • the organic fiber is not particularly limited as long as it is formed from an organic polymer compound, and is preferably a synthetic fiber from the viewpoint of strength.
  • the organic fiber used in the present invention is selected from the group consisting of wholly aromatic polyester fiber, aramid fiber, polyphenylene sulfide fiber and polyparaphenylene benzobisoxazole fiber from the viewpoint of strength, abrasion resistance and chemical resistance.
  • polyphenylene sulfide fiber or wholly aromatic polyester fiber is more preferable, and wholly aromatic polyester fiber is more preferable from the viewpoint of excellent balance between workability when forming through holes and gears in the laminate and the strength of the obtained abrasive carrier. Further preferred.
  • the organic fiber aggregate contained in the base material layer is not particularly limited, and a woven fabric, a knitted fabric, a non-woven fabric, or the like can be used. Especially, it is preferable that an organic fiber assembly is a nonwoven fabric from a point with little anisotropy.
  • Nonwoven fabrics are classified as long fiber nonwoven fabrics or short fiber nonwoven fabrics. Although any nonwoven fabric can be used as the nonwoven fabric in the present invention, it is preferably a long-fiber nonwoven fabric from the viewpoint of less fluffing and fiber falling off.
  • the nonwoven fabric obtained by the direct method can also be mentioned.
  • Specific examples of the non-woven fabric obtained by the direct method include a melt blown non-woven fabric manufactured by a melt blow method, a spun bond non-woven fabric manufactured by a spun bond method, and the like.
  • the organic fiber aggregate used in the present invention is preferably a melt blown nonwoven fabric. What processed the liquid crystal polymer which consists of wholly aromatic polyester into the nonwoven fabric by the melt blow method is used suitably.
  • examples of the type of nonwoven fabric include a nonwoven fabric obtained by a wet method (wet nonwoven fabric) and a nonwoven fabric obtained by a dry method (dry nonwoven fabric).
  • any nonwoven fabric can be used as the nonwoven fabric in the present invention, it is preferable that the organic fiber aggregate used in the present invention is a wet nonwoven fabric from the viewpoint of high fiber density.
  • the wet nonwoven fabric is manufactured by dispersing short fibers in a dispersion medium such as water and can easily obtain a thin and dense fiber assembly with small thickness unevenness. Therefore, there is no fear that fibers will be mixed into the resin layer when it is used for the base material layer, and a polishing carrier with good thickness accuracy can be obtained.
  • an organic fiber aggregate having a density of 0.15 g / cm 3 or more.
  • the density is more preferably 0.3 g / cm 3 or more.
  • the density is usually 1.5 g / cm 3 or less and preferably 1.2 g / cm 3 or less.
  • the abrasive carrier of the present invention comprises a laminate having a base material layer and a resin layer.
  • the laminate has a resin layer between a plurality of substrate layers and has a resin layer on both surfaces.
  • the resin layer between the base layers may be referred to as an intermediate resin layer
  • the resin layers on both surfaces may be referred to as a surface resin layer.
  • the thickness of the base material layer is preferably 10 to 1000 ⁇ m. There exists a possibility that the intensity
  • the thickness of the base material layer is more preferably 20 ⁇ m or more. On the other hand, when the thickness of the base material layer exceeds 1000 ⁇ m, it may be difficult to produce the base material layer itself.
  • the thickness of the base material layer is more preferably 500 ⁇ m or less, and further preferably 300 ⁇ m or less.
  • the thickness of the surface resin layer is preferably 10 to 1000 ⁇ m. If the thickness of the surface resin layer is less than 10 ⁇ m, the organic fibers may fall off the surface of the polishing carrier.
  • the thickness of the surface resin layer is more preferably 20 ⁇ m or more. On the other hand, if the thickness of the surface resin layer exceeds 1000 ⁇ m, the strength of the polishing carrier may be reduced.
  • the thickness of the surface resin layer is more preferably 500 ⁇ m or less.
  • the surface resin layer is thinner. From this viewpoint, the thickness of the surface resin layer is preferably 200 ⁇ m or less, and more preferably 100 ⁇ m or less.
  • the thickness of the intermediate resin layer is preferably 20 to 1000 ⁇ m. When the thickness of the intermediate resin layer is less than 20 ⁇ m, it becomes easy to peel between the base material layers.
  • the thickness of the intermediate resin layer is more preferably 40 ⁇ m or more.
  • the intermediate resin layer is thick. From this viewpoint, the thickness of the intermediate resin layer is preferably 200 ⁇ m or more, and more preferably 300 ⁇ m or more. On the other hand, if the thickness of the intermediate resin layer exceeds 1000 ⁇ m, the overall strength of the polishing carrier may be reduced.
  • the thickness of the polishing carrier of the present invention is preferably 100 to 5000 ⁇ m. If the thickness of the polishing carrier is less than 100 ⁇ m, the strength and durability of the polishing carrier may be reduced. The thickness of the polishing carrier is more preferably 200 ⁇ m or more. On the other hand, when the thickness of the polishing carrier exceeds 5000 ⁇ m, the production cost may increase. The thickness of the polishing carrier is more preferably 3000 ⁇ m or less.
  • Examples of the layer configuration in the present invention include the following 5-layer configuration, 7-layer configuration, 9-layer configuration, and 11-layer configuration, and a 5-layer configuration is preferable.
  • (R) is a resin layer
  • (F) is a base material layer.
  • the bending elastic modulus (rigidity) of the abrasive carrier is improved by using a layer in which compressive stress and tensile stress are generated as a base material layer.
  • the thickness of the intermediate resin layer is preferably at least twice the thickness of the surface resin layer, more preferably at least 5 times.
  • the base material layer is disposed on the outer side. By disposing the base material layer on the outer side, the expansion and contraction of the polishing carrier surface due to bending can be constrained by the high elastic base material layer, so that the bending characteristics of the polishing carrier are further improved.
  • the thickness of the intermediate resin layer is usually 50 times or less the thickness of the surface resin layer.
  • the total thickness of the resin layer and the total thickness of the base material layer it is preferable that the total thickness of the resin layer is larger from the viewpoint of preventing the fibers from dropping from the cut surface.
  • the total thickness of the base material layer is large.
  • the total thickness of the resin layer is preferably 0.1 times or more of the thickness of the polishing carrier, more preferably 0.2 times or more, and 0.4 times or more. More preferably.
  • it is 0.8 times or less normally, Preferably it is 0.7 times or less.
  • the said resin sheet makes the outermost layer the several fiber sheet which consists of the said organic fiber assembly, and the several resin sheet containing the said cyclic olefin polymer (A).
  • A cyclic olefin polymer
  • a laminate is obtained by superposing a plurality of fiber sheets made of the organic fiber aggregate and a plurality of resin sheets containing the cyclic olefin polymer (A) so that the resin sheet is the outermost layer.
  • the number of fiber sheets and resin sheets to be used is not particularly limited as long as a laminate having a resin layer between a plurality of substrate layers and having a resin layer on both surfaces can be obtained when heated and pressurized.
  • Each base material layer may be formed from only one fiber sheet, or may be formed from a plurality of fiber sheets.
  • Each resin layer may be formed from only one resin sheet, or may be formed from a plurality of resin sheets.
  • both the base material layer and the resin layer are formed from a single sheet.
  • at least two fiber sheets and at least three resin sheets are prepared, and the sheets are alternately stacked one by one so that the resin sheet is the outermost layer.
  • the organic fiber described above can be used in the form of a sheet by a known method.
  • the resin sheet a resin composition containing the cyclic olefin polymer (A) described above in the form of a sheet by a known method can be used.
  • the number of sheets to be stacked is not particularly limited as long as there are at least three resin sheets and at least two fiber sheets.
  • the number of sheets to be stacked is usually 10 or less for both the resin sheet and the fiber sheet.
  • the method of heating and pressing is not particularly limited, and a known heating and pressing apparatus can be used.
  • the laminate is heated and pressed to melt the resin sheet, the molten resin is impregnated in the organic fiber assembly, and then cooled to obtain a laminate.
  • the laminate is heated and pressed for a predetermined time at a temperature equal to or higher than the melting point of the used resin sheet to impregnate the resin. This can prevent the fibers from dropping off.
  • the laminate is cooled to room temperature and then depressurized to obtain a laminate having good dimensional accuracy.
  • the pressure at this time is not particularly limited as long as it is a pressure capable of impregnating the molten resin into the organic fiber assembly.
  • the method of heating and pressing is not particularly limited, and a known heating and pressing apparatus can be used.
  • a through-hole for holding a plate to be polished is formed in the laminated plate to obtain a polishing carrier.
  • the number of holes formed in the laminate is not particularly limited, and may be one or more.
  • the forming method is not particularly limited, and a through hole may be formed in the laminated plate using a router machine or the like.
  • the laminated plate may be formed into a predetermined size or shape, or a driving gear may be formed as necessary.
  • a high-density organic fiber aggregate is used for a base material layer, it can suppress that a fiber falls from the cut surface formed when a through-hole and a gear are formed in a laminated board, or a beard is produced. Accordingly, since the fibers do not fall off from the polishing carrier during polishing, the generation of scratches can be suppressed.
  • the plate-like body is held by the polishing carrier of the present invention and the plate-like body is polished. Since the abrasive carrier of the present invention has excellent strength and durability, it is possible to prevent the foreign matter from falling off while preventing the abrasive carrier from being damaged. When the plate-like body is polished using such a polishing carrier, it is possible to prevent foreign matter from adhering to the plate-like body and generation of scratches.
  • the plate-like body to be polished is not particularly limited, and examples thereof include semiconductor wafers, aluminum disks and glass disks for hard disks, and glass substrates for liquid crystal displays.
  • Example 1 [Production of polishing carrier] (Production of resin sheet) The following cyclic olefin polymer (a) 100 parts by mass, ethylene / propylene random copolymer (b) 11 parts by mass, radical initiator (c) 0.022 parts by mass and polyfunctional compound (d) 0.022 parts by mass was melt-kneaded with an extruder to obtain a resin composition.
  • the resin composition is commercially available from Fuji Bakelite Co., Ltd. under the name “FB-0422X1”.
  • -Cyclic olefin polymer (a) Ethylene and tetracyclo [4.4.0.1 2,5 .1 7,10] -3- dodecene (hereinafter sometimes abbreviated as "TCD-3") and random copolymer (ethylene -TCD-3 random copolymer) .
  • TCD-3 content measured by 13 C-NMR is 77.8% by mass (38 mol%)
  • ethylene content is 22.2% by mass (62 mol%)
  • intrinsic viscosity [ ⁇ ] measured in decalin at 135 ° C. is 0.60 dl / g and a glass transition temperature (Tg) are 105 degreeC.
  • the MFR (measured at 230 ° C.
  • the obtained pellets were put into an extruder to form a film to obtain a resin sheet (resin sheet S1) having a thickness of 0.56 mm and a resin sheet (resin sheet S2) having a thickness of 0.11 mm.
  • Nonwoven fabric As the non-woven fabric, a non-woven fabric “Vecruz MBBK150FZSO” (weight per unit: 150 g / m 2 , thickness: 323 ⁇ m, density: 0.46 g / cm 3 ) manufactured by Kuraray Laflex Co., Ltd. was used. “Veculus MBBK150FZSO” is a non-woven fabric produced by a melt blow molding method, obtained by thermocompression bonding, and does not contain an adhesive.
  • a resin sheet S1, a nonwoven fabric, a resin sheet S2, a nonwoven fabric, and a resin sheet S1 were sequentially stacked on the press plate. And the release film was arrange
  • the thickness of the thinnest laminated plate was 1.035 mm
  • the thickness of the thickest laminated plate was 1.066 mm. It was found that a laminate with high thickness accuracy can be obtained.
  • the laminated plate was processed using a router machine to produce a polishing carrier 1.
  • a plan view of the obtained abrasive carrier 1 is shown in FIG.
  • the polishing carrier 1 has a driving gear 2 on the outer periphery and five through holes 3 for holding a plate-like body to be polished.
  • FIG. 2 is a cross-sectional image of the polishing carrier 1.
  • F 1 and F 2 each represent a base material layer
  • R 1 and R 3 each represent a surface resin layer
  • R 2 represents an intermediate resin layer.
  • the obtained abrasive carrier has alternating nonwoven fabric layers (F 1 , F 2 ) and resin layers (R 1 , R 2 , R 3 ) impregnated with a resin composition containing a cyclic olefin polymer. It has a laminated multilayer structure (R 1 / F 1 / R 2 / F 2 / R 3 ).
  • the thickness of the polishing carrier was 1066 ⁇ m (1.066 mm).
  • the thickness of each layer is as follows. R 1 : 36 ⁇ m F 1 : 248 ⁇ m R 2 : 482 ⁇ m F 2 : 258 ⁇ m R 3 : 42 ⁇ m
  • the abrasive is colloidal silica (10-fold diluted solution of trade name “COMPOL-80” manufactured by Fujimi Incorporated).
  • the abrasion thickness (micrometer) of a laminated board (average value of 5 laminated boards) was calculated
  • polishing test In the polishing test, the obtained polishing carrier was mounted on a polishing apparatus, the plate-like body was held by the through hole, and the polishing carrier was driven horizontally to polish the plate-like body for 6 minutes.
  • the plate-like body polished in this test is an aluminum substrate having a thickness of 1.27 mm.
  • the abrasive used in this test was “Disklite” manufactured by Fujimi Incorporated.
  • Example 2 (Production of resin sheet) Pellets obtained by the same method as in Example 1 were put into a twin screw extruder manufactured by Hitachi Zosen Corporation to form a film, and a resin sheet S3 having a thickness of 280 ⁇ m was obtained.
  • Nonwoven fabric The same non-woven fabric as in Example 1 was used.
  • the thickness of the thickest laminated plate was 1.115 mm
  • the thickness of the thinnest laminated plate was 1.095 mm. It was found that a laminate with high thickness accuracy can be obtained.
  • polishing carrier was produced in the same manner as in Example 1.
  • FIG. 3 is a cross-sectional image of the polishing carrier.
  • the obtained abrasive carrier has alternating nonwoven fabric layers (F 1 , F 2 ) and resin sheet layers (R 1 , R 2 , R 3 ) impregnated with a resin composition containing a cyclic olefin polymer. It has a multi-layer structure laminated.
  • the thickness of the polishing carrier was measured, the thickness was 1115 ⁇ m (1.115 mm).
  • the thickness of each layer is as follows.
  • R 2 135 ⁇ m
  • F 2 275 ⁇ m
  • R 3 222 ⁇ m
  • polishing test A polishing test was performed using a polishing carrier in the same manner as in Example 1.
  • Example 1 Evaluation of substrate after polishing
  • scratches present on the polished surface of the polished aluminum substrate were confirmed.
  • no scratch was observed on the polished surface of the aluminum substrate.
  • Example 2 using the same apparatus as in Example 1, it was confirmed whether or not foreign matter had adhered to the polished surface of the polished aluminum substrate.
  • few foreign substances were confirmed on the polished surface of the aluminum substrate.
  • Comparative Example 1 (Preparation of varnish) A varnish was prepared by adding a bisphenol A type epoxy resin as a thermosetting resin and an amine compound as a curing agent to a mixed solvent of toluene, methanol and methyl cellosolve and dissolving them.
  • the said varnish was put into the container and the polyphenylene sulfide nonwoven fabric (PPS nonwoven fabric) was immersed in the varnish in a container. Then, the PPS nonwoven fabric was dried and the varnish was semi-cured to obtain a prepreg.
  • the epoxy resin content (Rc) in the obtained prepreg was 61.6% by mass.
  • the PPS nonwoven fabric used here is a wet nonwoven fabric “Torcon Paper PS0100S” manufactured by Toray Industries, Inc. (weight per unit: 108 g / m 2 , thickness: 115 ⁇ m, density: 0.94 g / cm 3 ).
  • Trocon Paper PS0100S was obtained by dispersing fibers made of a high-melting point PPS resin and fibers made of a PPS resin having a melting point lower than that of the resin in a dispersion medium, and then rolling and thermocompression bonding. And does not contain adhesive.
  • polishing carrier was produced in the same manner as in Example 1.
  • FIG. 4 is a cross-sectional image of the polishing carrier.
  • the obtained abrasive carrier has a multilayer structure in which PPS nonwoven fabric layers (F 1 to F 5 ) containing epoxy resin and epoxy resin layers (R 2 to R 5 ) are alternately laminated. Yes, the surface layers (R 1 , R 6 ) are epoxy resin layers.
  • the thickness of the polishing carrier was measured, the thickness was 992 ⁇ m.
  • the thickness of F 1 was 101 ⁇ m, the thickness of F 2 was 98 ⁇ m, the thickness of F 3 was 122 ⁇ m, the thickness of F 4 was 96 ⁇ m, and the thickness of F 5 was 94 ⁇ m.
  • the thickness of R 1 is 52 ⁇ m, the thickness of R 2 is 100 ⁇ m, the thickness of R 3 is 92 ⁇ m, the thickness of R 4 is 84 ⁇ m, the thickness of R 5 is 95 ⁇ m, and the thickness of R 6 is It was 58 ⁇ m.
  • polishing test A polishing test was performed using a polishing carrier in the same manner as in Example 1.
  • Example 1 Evaluation of substrate after polishing
  • scratches present on the polished surface of the polished aluminum substrate were confirmed.
  • no scratch was observed on the polished surface of the aluminum substrate.
  • Example 2 using the same apparatus as in Example 1, it was confirmed whether or not foreign matter had adhered to the polished surface of the polished aluminum substrate.
  • few foreign substances were confirmed on the polished surface of the aluminum substrate.
  • Comparative Example 2 is an example in which a test was performed using a resin carrier “aramid carrier” manufactured by Sagami PC Co., Ltd. This carrier is an aramid fiber non-woven fabric impregnated with an epoxy resin. The cross section of the obtained abrasive carrier was observed using a laser microscope.
  • FIG. 5 is a cross-sectional image of the resin carrier. As shown in FIG. 5, the resin carrier did not have a multilayer structure, and did not have a resin layer on the surface. Moreover, as shown by the part enclosed with the line in FIG. 5, it turned out that the beard has generate
  • Comparative Example 3 is an example in which a test was performed using a resin carrier “EG (epoxy glass) carrier” manufactured by Sagami PC Co., Ltd. This carrier is obtained by overlapping and curing glass fiber woven fabric impregnated with an epoxy resin. The cross section of the obtained abrasive carrier was observed using a laser microscope.
  • FIG. 6 is a cross-sectional image of the resin carrier. As shown in FIG. 6, the resin carrier was found to have a multilayer structure having three glass fiber woven fabric layers. However, the resin carrier did not have a resin layer containing no fiber between the glass fiber layers or the surface.
  • polishing test A polishing test was performed using a polishing carrier in the same manner as in Example 1.

Abstract

A polishing carrier that comprises a laminate comprising base material layers and resin layers, wherein: the base material layers are formed of an organic fiber assembly impregnated with a resin; the resin layers contain not the aforesaid organic fibers but cyclic olefin polymer (A); and, in the laminate, the resin layers are disposed between a plurality of base material layers and also formed on both surfaces of the laminate. This polishing carrier has high strength and excellent durability and, therefore, can prevent the adhesion of foreign matters to a plate to be polished and occurrence of scratches.

Description

研磨キャリア及びその製造方法Polishing carrier and manufacturing method thereof
 本発明は、基材層と樹脂層とを有する積層板からなる研磨キャリアに関する。また本発明は、上記研磨キャリアの製造方法に関する。さらにまた本発明は、上記研磨キャリアを用いた研磨方法に関する。 The present invention relates to an abrasive carrier comprising a laminate having a base material layer and a resin layer. The present invention also relates to a method for manufacturing the abrasive carrier. Furthermore, this invention relates to the grinding | polishing method using the said grinding | polishing carrier.
 半導体ウェハやハードディスク用のアルミニウム基板の製造工程には、これら板状体の表面を研磨する工程がある。この研磨工程では、板状体を保持するために研磨キャリアが用いられる。一般的に、研磨キャリアは複数の貫通孔を有し、板状体はこの貫通孔で保持される。そして、研磨キャリアを駆動させることにより板状体が研磨される。 In the manufacturing process of an aluminum substrate for a semiconductor wafer or hard disk, there is a process of polishing the surface of these plate-like bodies. In this polishing step, a polishing carrier is used to hold the plate-like body. Generally, the polishing carrier has a plurality of through holes, and the plate-like body is held by the through holes. Then, the plate-like body is polished by driving the polishing carrier.
 このとき、研磨キャリアの強度や耐久性が不十分であると、研磨中に研磨キャリアが破損したり研磨キャリアから異物が脱落したりする。その結果、板状体の表面に異物が付着したり、板状体にスクラッチ(研磨傷)が発生したりして、品質の優れた製品が得られない。そのため、強度や耐久性を向上させた研磨キャリアが種々提案されている。 At this time, if the strength and durability of the polishing carrier are insufficient, the polishing carrier may be damaged during the polishing or foreign matter may fall off from the polishing carrier. As a result, foreign matter adheres to the surface of the plate-like body, or scratches (polishing scratches) occur on the plate-like body, so that a product with excellent quality cannot be obtained. For this reason, various polishing carriers with improved strength and durability have been proposed.
 特許文献1には、保持材本体と、この保持材本体の表面に被覆された表面層とからなる研磨キャリアが記載されている。保持材本体は、板状体を保持すべき保持孔を有する保持部と、この保持部が取り付けられる芯材部と、この芯材部の外周に取り付けられたギヤ部とを備えている。 Patent Document 1 describes a polishing carrier including a holding material body and a surface layer coated on the surface of the holding material body. The holding material body includes a holding part having a holding hole for holding the plate-like body, a core part to which the holding part is attached, and a gear part attached to the outer periphery of the core part.
 そして、特許文献1には、芯材部はガラス繊維基材にエポキシ樹脂を含侵して乾燥させたプリプレグを積層して成形できると記載されている。保持部やギヤ部は、アラミド繊維基材、ポリエステル繊維基材、ポリフェニレンサルファイド繊維基材、ポリビニルアルコール繊維基材などの有機繊維基材に、エポキシ樹脂、フェノール樹脂、ジアリルフタレート樹脂等を含侵させたプリプレグを積層して加熱加圧して成形できると記載されている。これにより、研磨キャリアの充分な強度を確保しつつ、板状体の損傷及びガラス粉等の不純物の発生を抑制することができるとされている。 In Patent Document 1, it is described that the core part can be formed by laminating a prepreg impregnated with an epoxy resin on a glass fiber substrate and dried. The holding part and gear part impregnate an organic fiber base material such as aramid fiber base material, polyester fiber base material, polyphenylene sulfide fiber base material, polyvinyl alcohol fiber base material with epoxy resin, phenol resin, diallyl phthalate resin, etc. It is described that the prepreg can be laminated and molded by heating and pressing. Thereby, it is supposed that it can suppress generation | occurrence | production of impurities, such as damage to a plate-shaped body and glass powder, ensuring sufficient intensity | strength of a grinding | polishing carrier.
 特許文献2には、研磨キャリアの製造方法が記載されている。この製造方法は、熱硬化性樹脂含浸シート状繊維基材(プリプレグ)と熱硬化性樹脂未含浸シート状繊維基材を重ね合せた複数枚を加熱加圧成形した積層板を、研磨キャリアに加工する方法である。特許文献2には、シート状繊維基材は、好ましくは有機繊維で構成することが記載されている。さらに好ましくは、シート状繊維基材は、アラミド繊維不織布であることも記載されている。また、熱硬化性樹脂としてエポキシ樹脂を使用することも記載されている。この製造方法によれば、加熱加圧成形時に、プリプレグ中の溶融した熱硬化性樹脂が樹脂未含浸シート状繊維基材へも浸透し、全体として樹脂含有量の少ない積層板を簡単に製造することができる。樹脂含有量を少なくできることから、シート状繊維基材の補強効果を十分に発揮させて剛性の大きい研磨キャリアとすることができるとされている。 Patent Document 2 describes a manufacturing method of a polishing carrier. In this manufacturing method, a laminated plate obtained by heat-press molding a plurality of sheets of a thermosetting resin-impregnated sheet-like fiber substrate (prepreg) and a thermosetting resin-unimpregnated sheet-like fiber substrate is processed into a polishing carrier. It is a method to do. Patent Document 2 describes that the sheet-like fiber base material is preferably composed of organic fibers. More preferably, it is also described that the sheet-like fiber base material is an aramid fiber nonwoven fabric. It also describes the use of an epoxy resin as the thermosetting resin. According to this production method, the molten thermosetting resin in the prepreg penetrates into the resin-impregnated sheet-like fiber base material at the time of heat and pressure molding, and a laminate having a low resin content as a whole is easily produced. be able to. Since the resin content can be reduced, it is said that the reinforcing effect of the sheet-like fiber base material can be sufficiently exerted to obtain a highly rigid abrasive carrier.
 特許文献3には、有機繊維からなる基材に樹脂を含浸させた基層と、この基層の表面に積層された表面フィルム層とを備え、この表面フィルム層Fが引張弾性率4000N/mm以上の有機樹脂フィルムからなる被研磨物保持材が記載されている。その実施例には、ポリエステル不織布にエポキシ樹脂ワニスを含浸させた後、乾燥させ基層を構成するためのプリプレグを得て、このプリプレグを7枚重ね、表裏両面側にそれぞれポリエチレンナフタレートフイルムを積層した後、この積層品を鏡面板に挟み込みプレスして積層体を得る例が記載されている。 Patent Document 3 includes a base layer in which a base material made of organic fibers is impregnated with a resin, and a surface film layer laminated on the surface of the base layer, and the surface film layer F has a tensile elastic modulus of 4000 N / mm 2 or more. An object-holding material comprising an organic resin film is described. In that example, a polyester nonwoven fabric was impregnated with an epoxy resin varnish, and then dried to obtain a prepreg for constituting a base layer. Seven prepregs were laminated, and polyethylene naphthalate films were laminated on both front and back sides. Thereafter, an example is described in which a laminate is obtained by sandwiching and pressing the laminate between mirror plates.
 特許文献4には、シリコンウェハ、液晶用ガラスなどの薄板状のワークを研磨する際に用いられる研磨治具において、この研磨治具が、補強繊維層と樹脂層とからなり、その表面及び層間には超高分子量ポリエチレン層が溶融、接着されてなる研磨治具が記載されている。その実施例には、ガラス織布からなる補強繊維層とエポキシ樹脂層と超高分子量ポリエチレン層とを積層した例が記載されている。 In Patent Document 4, a polishing jig used when polishing a thin plate-like workpiece such as a silicon wafer or liquid crystal glass, the polishing jig is composed of a reinforcing fiber layer and a resin layer. Describes a polishing jig in which an ultrahigh molecular weight polyethylene layer is melted and bonded. The example describes an example in which a reinforcing fiber layer made of a glass woven fabric, an epoxy resin layer, and an ultrahigh molecular weight polyethylene layer are laminated.
 しかしながら、近年、研磨後の製品に求められる品質が高くなっていて、研磨中に研磨キャリアから脱落した繊維や異物が極めて微量であっても板状体にスクラッチを発生させてしまうことがあった。また、板状体に極めて微量の繊維や異物が付着していても製品の品質低下を引き起こしていた。そのため、強度や耐久性のより優れた研磨キャリアが望まれているが、特許文献1~4に記載されている研磨キャリアはその要求を満足できるものではなかった。 However, in recent years, the quality required for a product after polishing has been increased, and even when a very small amount of fibers or foreign matter has fallen off from the polishing carrier during polishing, the plate-like body may be scratched. . Further, even if a very small amount of fibers or foreign matter is adhered to the plate-like body, the quality of the product is deteriorated. For this reason, an abrasive carrier having better strength and durability is desired, but the abrasive carriers described in Patent Documents 1 to 4 cannot satisfy the requirements.
特開2003-225857号公報JP 2003-225857 A 特開2003-260659号公報JP 2003-260659 A 特開2002-59362号公報JP 2002-59362 A 特開平11-58224号公報Japanese Patent Application Laid-Open No. 11-58224
 本発明は上記課題を解決するためになされたものであり、研磨される板状体に異物が付着したりスクラッチが発生したりすることを抑制することのできる、優れた強度及び耐久性を有する研磨キャリアを提供することを目的とするものである。 The present invention has been made in order to solve the above-described problems, and has excellent strength and durability capable of suppressing foreign matter from adhering to the polished plate-like body and generation of scratches. The object is to provide an abrasive carrier.
 上記課題は、基材層と樹脂層とを有する積層板からなる研磨キャリアであって、前記基材層が、樹脂が含浸された有機繊維集合体からなり、前記樹脂層が、環状オレフィン重合体(A)を含み前記有機繊維を含まず、前記積層板が複数の基材層の間に樹脂層を有するとともに両表面にも樹脂層を有することを特徴とする研磨キャリアを提供することによって解決される。このとき、前記樹脂層が、環状オレフィン重合体(A)と軟質共重合体(B)とを含む樹脂組成物からなることが好ましい。 The subject is a polishing carrier comprising a laminate having a base material layer and a resin layer, wherein the base material layer comprises an organic fiber assembly impregnated with a resin, and the resin layer is a cyclic olefin polymer. Solved by providing a polishing carrier comprising (A), not containing the organic fibers, wherein the laminate has a resin layer between a plurality of substrate layers and also has a resin layer on both surfaces Is done. At this time, it is preferable that the said resin layer consists of a resin composition containing a cyclic olefin polymer (A) and a soft copolymer (B).
 前記樹脂層が、ガラス転移温度が60~200℃の環状オレフィン重合体(A)100質量部、オレフィン、ジエン及び芳香族ビニル炭化水素からなる群から選択される少なくとも2種以上の単量体を重合してなり、ガラス転移温度が0℃以下である軟質共重合体(B)1~50質量部、ラジカル開始剤(C)0.001~1質量部、及びラジカル重合性の官能基を分子内に2個以上有する多官能化合物(D)0~1質量部を溶融混練してなる樹脂組成物からなることが好ましい。 The resin layer comprises at least two monomers selected from the group consisting of 100 parts by mass of a cyclic olefin polymer (A) having a glass transition temperature of 60 to 200 ° C., an olefin, a diene, and an aromatic vinyl hydrocarbon. 1 to 50 parts by weight of a soft copolymer (B) having a glass transition temperature of 0 ° C. or lower, 0.001 to 1 part by weight of a radical initiator (C), and a radical polymerizable functional group It is preferably made of a resin composition obtained by melt-kneading 0 to 1 part by mass of a polyfunctional compound (D) having two or more thereof.
 前記環状オレフィン重合体(A)が、酸変性環状オレフィン重合体であることが好ましい。 The cyclic olefin polymer (A) is preferably an acid-modified cyclic olefin polymer.
 前記有機繊維集合体が全芳香族ポリエステル繊維、アラミド繊維、ポリフェニレンサルファイド繊維及びポリパラフェニレンベンゾビスオキサゾール繊維からなる群から選択される少なくとも1種の繊維であることが好ましい。このとき、前記有機繊維集合体が不織布であることが好ましい。前記不織布が長繊維不織布であることも好ましい。 The organic fiber assembly is preferably at least one fiber selected from the group consisting of wholly aromatic polyester fibers, aramid fibers, polyphenylene sulfide fibers, and polyparaphenylene benzobisoxazole fibers. At this time, the organic fiber aggregate is preferably a nonwoven fabric. It is also preferable that the nonwoven fabric is a long fiber nonwoven fabric.
 前記基材層の厚みが10~1000μmであり、前記積層板の両表面の樹脂層の厚みがいずれも10~1000μmであり、かつ前記基材層の間の樹脂層の厚みが20~1000μmであることが好ましい。前記研磨キャリアの厚みが100~5000μmであることも好ましい。また前記基材層の間の樹脂層の厚みが、前記積層板の両表面の樹脂層の厚みの2倍以上であることも好ましい。 The thickness of the base layer is 10 to 1000 μm, the thickness of the resin layers on both surfaces of the laminate is 10 to 1000 μm, and the thickness of the resin layer between the base layers is 20 to 1000 μm. Preferably there is. It is also preferable that the polishing carrier has a thickness of 100 to 5000 μm. Moreover, it is also preferable that the thickness of the resin layer between the said base material layers is 2 times or more of the thickness of the resin layer of the both surfaces of the said laminated board.
 上記課題は、上記研磨キャリアの製造方法であって、前記有機繊維集合体からなる複数の繊維シートと前記環状オレフィン重合体(A)を含む複数の樹脂シートとを該樹脂シートが最外層になるように重ね合わせて積層体を得てから、該積層体を加熱加圧して該樹脂シートを溶融させ、溶融した樹脂を前記有機繊維集合体に含浸させてから冷却して積層板を得て、引き続き、前記積層板に、研磨される板状体を保持するための貫通孔を形成することを特徴とする研磨キャリアの製造方法を提供することによっても解決される。 The subject is a method for manufacturing the abrasive carrier, wherein the resin sheet is the outermost layer of a plurality of fiber sheets made of the organic fiber aggregate and a plurality of resin sheets containing the cyclic olefin polymer (A). To obtain a laminated body, and then heat and press the laminated body to melt the resin sheet, impregnate the molten resin into the organic fiber assembly, and then cool to obtain a laminated board, Subsequently, the problem can be solved by providing a manufacturing method of a polishing carrier, wherein a through hole for holding a plate to be polished is formed in the laminated plate.
 上記研磨キャリアで板状体を保持して該板状体を研磨する研磨方法が本発明の好適な実施態様である。 A polishing method in which the plate-like body is held by the polishing carrier and the plate-like body is polished is a preferred embodiment of the present invention.
 本発明の研磨キャリアは、優れた強度、耐久性を有しているので、研磨される板状体に異物が付着したりスクラッチが発生したりすることを抑制できる。 Since the polishing carrier of the present invention has excellent strength and durability, it is possible to suppress foreign matter from adhering to the plate to be polished and the occurrence of scratches.
実施例1における研磨キャリア1の平面図である。1 is a plan view of a polishing carrier 1 in Example 1. FIG. 実施例1における研磨キャリア1の断面画像である。1 is a cross-sectional image of a polishing carrier 1 in Example 1. 実施例2における研磨キャリアの断面画像である。3 is a cross-sectional image of a polishing carrier in Example 2. 比較例1における樹脂キャリアの断面画像である。3 is a cross-sectional image of a resin carrier in Comparative Example 1. 比較例2における樹脂キャリアの断面画像である。6 is a cross-sectional image of a resin carrier in Comparative Example 2. 比較例3における樹脂キャリアの断面画像である。10 is a cross-sectional image of a resin carrier in Comparative Example 3.
 本発明は、基材層と樹脂層とを有する積層板からなる研磨キャリアであって、前記基材層が、樹脂が含浸された有機繊維集合体からなり、前記樹脂層が、環状オレフィン重合体(A)を含み前記有機繊維を含まず、前記積層板が複数の基材層の間に樹脂層を有するとともに両表面にも樹脂層を有する研磨キャリアである。上記の構成を満足する研磨キャリアは、優れた強度を有するので研磨作業中に破損しにくい。また、優れた耐久性を有するので異物の脱落を防ぐことができるとともにヒゲの発生を防ぐこともできる。本発明の研磨キャリアを用いて板状体を研磨すれば、板状体に異物が付着したりスクラッチを発生させたりすることがない。 The present invention is an abrasive carrier comprising a laminate having a base material layer and a resin layer, wherein the base material layer comprises an organic fiber assembly impregnated with a resin, and the resin layer comprises a cyclic olefin polymer. It is a polishing carrier that contains (A) and does not contain the organic fiber, and the laminated plate has a resin layer between a plurality of base material layers and also has a resin layer on both surfaces. A polishing carrier that satisfies the above configuration has excellent strength and is not easily damaged during the polishing operation. In addition, since it has excellent durability, it is possible to prevent foreign matter from falling off and to prevent the occurrence of whiskers. When the plate-like body is polished using the polishing carrier of the present invention, no foreign matter adheres to the plate-like body and scratches are not generated.
 本発明において、前記樹脂層が、環状オレフィン重合体(A)を含むことが重要である。環状オレフィン重合体(A)は、耐熱性、耐熱老化性、耐薬品性、耐侯性、耐溶剤性、誘電特性、剛性などに優れた重合体であり、環状オレフィン重合体(A)を用いることによって、強度及び耐久性に優れた研磨キャリアを得ることができる。環状オレフィン重合体(A)は、非晶性であることから、得られる研磨キャリアの寸法精度が良好である。また、環状オレフィン重合体(A)は熱可塑性樹脂であるから、加熱することによって溶融させることができ、研磨キャリアの生産性が良好になる。 In the present invention, it is important that the resin layer contains the cyclic olefin polymer (A). The cyclic olefin polymer (A) is a polymer excellent in heat resistance, heat aging resistance, chemical resistance, weather resistance, solvent resistance, dielectric properties, rigidity, and the like, and the cyclic olefin polymer (A) is used. Thus, an abrasive carrier having excellent strength and durability can be obtained. Since the cyclic olefin polymer (A) is amorphous, the dimensional accuracy of the obtained abrasive carrier is good. Moreover, since the cyclic olefin polymer (A) is a thermoplastic resin, it can be melted by heating, and the productivity of the abrasive carrier is improved.
 また、前記樹脂層が前記有機繊維を含まないことも重要である。樹脂層に有機繊維が含まれていると、樹脂層にヒゲが発生したり、樹脂層から有機繊維が脱落したりして、板状体に異物が付着したりスクラッチが発生したりする。このとき、本発明の効果を阻害しない範囲であれば、樹脂層に微量の有機繊維が含まれていてもかまわない。しかしながら、樹脂層におけるヒゲの発生や樹脂層からの有機繊維の脱落を完全に抑制する観点からは、樹脂層には有機繊維が全く含まれていない方が好ましい。 It is also important that the resin layer does not contain the organic fiber. If the resin layer contains organic fibers, whiskers are generated in the resin layer, or the organic fibers are dropped from the resin layer, and foreign matter adheres to the plate-like body or scratches are generated. At this time, a trace amount of organic fibers may be contained in the resin layer as long as the effects of the present invention are not impaired. However, it is preferable that the resin layer does not contain any organic fiber from the viewpoint of completely suppressing generation of whiskers in the resin layer and dropping of the organic fiber from the resin layer.
 前記環状オレフィン重合体(A)は、脂肪族環状骨格を有するオレフィン単量体のみを重合してなるものであっても構わないし、脂肪族環状骨格を有するオレフィン単量体と他の共重合可能な単量体との共重合体であってもよい。他の単量体の共重合量は通常、50質量%未満であり、好適には30質量%未満である。前記環状オレフィン重合体(A)は、環状オレフィン重合体を主成分とし、他の成分を含有する樹脂組成物であっても構わない。主成分とは、通常、含有量が50質量%以上である成分であり、好適には80質量%以上である成分である。 The cyclic olefin polymer (A) may be obtained by polymerizing only an olefin monomer having an aliphatic cyclic skeleton, or may be copolymerized with an olefin monomer having an aliphatic cyclic skeleton. Copolymers with various monomers may be used. The copolymerization amount of other monomers is usually less than 50% by mass, and preferably less than 30% by mass. The cyclic olefin polymer (A) may be a resin composition containing a cyclic olefin polymer as a main component and other components. The main component is usually a component having a content of 50% by mass or more, and preferably a component having a content of 80% by mass or more.
 環状オレフィン重合体(A)は、重合体の主鎖又は側鎖に飽和炭化水素環構造を有する、非結晶性、透明性のものであり、具体的には、特開昭63-264646号公報、特開昭64-1705号公報、特開平1-168724号公報、特開平1-168725号公報などに開示されるノルボルネン環を有するモノマーの開環重合体及びその水素添加物、特開昭60-168708号公報などに開示されるノルボルネン環を有するモノマーとα-オレフィン類との付加重合体、特開平6-136057号公報や、特開平7-258362号公報などに開示されている環状オレフィンや環状ジエンの付加重合体やその水素添加物、国際公開第2006/025294号に開示されている環状オレフィン重合体と軟質共重合体とを含む樹脂組成物などをあげることができる。このような樹脂組成物は、例えば、冨士ベークライト株式会社から商標名「e-mateX」の名称で、三井化学株式会社から商標名「アペル」、「トーパス」の名称で、日本ゼオン株式会社から商標名「ゼオネックス」、「ゼオノア」の名称で販売されており、市販品を容易に入手することが可能である。これらの市販品には、耐久性や成形性を改善するための添加剤が添加されていることも多いので、研磨時に異物が脱落することを防ぐ観点から添加剤を加える前の樹脂を使用して成形することが好ましい場合もある。また、触媒残渣や残存揮発分を特別に低減した樹脂を使用することが好ましい場合もある。 The cyclic olefin polymer (A) is a non-crystalline and transparent polymer having a saturated hydrocarbon ring structure in the main chain or side chain of the polymer, and specifically, JP-A 63-264646. A ring-opening polymer of a monomer having a norbornene ring and a hydrogenated product thereof disclosed in JP-A 64-1705, JP-A 1-168724, JP-A 1-168725, etc. Addition polymers of monomers having a norbornene ring and α-olefins disclosed in JP-A-168708 and the like, cyclic olefins disclosed in JP-A-6-136057, JP-A-7-258362, etc. Resin composition comprising cyclic diene addition polymer and hydrogenated product thereof, and cyclic olefin polymer and soft copolymer disclosed in WO 2006/025294 And the like. Such resin compositions are, for example, trade names “e-mateX” from Fuji Bakelite Co., Ltd., trade names “Apel” and “Topas” from Mitsui Chemicals, Inc. and trade names from Nippon Zeon Co., Ltd. They are sold under the names “Zeonex” and “Zeonoa”, and it is possible to easily obtain commercial products. These commercial products often contain additives for improving durability and moldability, so use the resin before adding additives from the viewpoint of preventing foreign matter from falling off during polishing. In some cases, it may be preferable to form them. In some cases, it is preferable to use a resin in which the catalyst residue and residual volatile matter are particularly reduced.
 前記樹脂層が、環状オレフィン重合体(A)と軟質共重合体(B)とを含む樹脂組成物からなることが好ましい。研磨キャリアがこのような樹脂層を有することで、研磨キャリアの耐衝撃性や耐摩耗性をより向上させることができる。前記樹脂層が、特に、ガラス転移温度が60~200℃の環状オレフィン重合体(A)100質量部、オレフィン、ジエン及び芳香族ビニル炭化水素からなる群から選択される少なくとも2種以上の単量体を重合してなり、ガラス転移温度が0℃以下である軟質共重合体(B)1~50質量部、ラジカル開始剤(C)0.001~1質量部、及びラジカル重合性の官能基を分子内に2個以上有する多官能化合物(D)0~1質量部を溶融混練してなる樹脂組成物からなることがより好ましい。 The resin layer is preferably made of a resin composition containing a cyclic olefin polymer (A) and a soft copolymer (B). The abrasive carrier having such a resin layer can further improve the impact resistance and wear resistance of the abrasive carrier. In particular, the resin layer has at least two or more types selected from the group consisting of 100 parts by mass of a cyclic olefin polymer (A) having a glass transition temperature of 60 to 200 ° C., an olefin, a diene, and an aromatic vinyl hydrocarbon. 1 to 50 parts by mass of a soft copolymer (B) having a glass transition temperature of 0 ° C. or less, 0.001 to 1 part by mass of a radical initiator (C), and a radical polymerizable functional group More preferably, it is made of a resin composition obtained by melt-kneading 0 to 1 part by mass of a polyfunctional compound (D) having 2 or more in the molecule.
 以下、環状オレフィン重合体(A)、軟質共重合体(B)、ラジカル開始剤(C)及びラジカル重合性の官能基を分子内に2個以上有する多官能化合物(D)について説明する。 Hereinafter, the cyclic olefin polymer (A), the soft copolymer (B), the radical initiator (C) and the polyfunctional compound (D) having two or more radical polymerizable functional groups in the molecule will be described.
 まず、環状オレフィン重合体(A)について説明する。本発明で用いられる環状オレフィン重合体(A)は、ガラス転移温度が60~200℃のものが好適である。研磨キャリアの耐熱性をより向上させる観点から、好適には80℃以上であり、より好適には100℃以上である。また、成形温度が高くなりすぎると分解のおそれがあるため、ガラス転移温度は200℃以下であることが好ましい。本発明におけるガラス転移温度は、示差走査熱量計(DSC)を用いて昇温速度10℃/分で測定したガラス転移開始温度である。 First, the cyclic olefin polymer (A) will be described. The cyclic olefin polymer (A) used in the present invention preferably has a glass transition temperature of 60 to 200 ° C. From the viewpoint of further improving the heat resistance of the polishing carrier, it is preferably 80 ° C. or higher, and more preferably 100 ° C. or higher. Moreover, since there exists a possibility of decomposition | disassembly when a shaping | molding temperature becomes high too much, it is preferable that a glass transition temperature is 200 degrees C or less. The glass transition temperature in the present invention is a glass transition start temperature measured at a heating rate of 10 ° C./min using a differential scanning calorimeter (DSC).
 環状オレフィン重合体(A)のMFR(メルトフローレート:ASTM D1238に基づいて、230℃、2.16kg荷重で測定)が0.1~500g/10分であることが好適である。MFRが0.1g/10分未満の場合には、溶融粘度が高すぎて、得られる樹脂組成物の溶融成形性が悪化するおそれがある。MFRは、より好適には0.5g/10分以上であり、さらに好適には1g/10分以上である。一方、MFRが500g/10分を超える場合には、得られる樹脂組成物の力学強度が低下するおそれがある。MFRは、より好適には200g/10分以下であり、さらに好適には100g/10分以下である。 It is preferable that the MFR (melt flow rate: measured at 230 ° C. under a load of 2.16 kg) of the cyclic olefin polymer (A) is 0.1 to 500 g / 10 minutes. When MFR is less than 0.1 g / 10 min, the melt viscosity is too high, and the melt moldability of the resulting resin composition may be deteriorated. MFR is more preferably 0.5 g / 10 min or more, and even more preferably 1 g / 10 min or more. On the other hand, when the MFR exceeds 500 g / 10 min, the mechanical strength of the resulting resin composition may be reduced. MFR is more preferably 200 g / 10 min or less, and even more preferably 100 g / 10 min or less.
 環状オレフィン重合体(A)は、脂肪族環状骨格を有するオレフィン単量体を重合してなり、得られた重合体中に脂肪族環状骨格を有するものであればよく、その種類は限定されないが、環状オレフィン重合体(A)が下記式[I]又は[II]で示される環状オレフィンを重合してなる重合体であることが好適である。 The cyclic olefin polymer (A) is obtained by polymerizing an olefin monomer having an aliphatic cyclic skeleton, and any polymer having an aliphatic cyclic skeleton in the obtained polymer may be used. The cyclic olefin polymer (A) is preferably a polymer obtained by polymerizing a cyclic olefin represented by the following formula [I] or [II].
Figure JPOXMLDOC01-appb-C000001
Figure JPOXMLDOC01-appb-C000001
(上式[I]中、nは0又は1であり、mは0又は正の整数であり、qは0又は1であり、R1~R18並びにRa及びRbは、それぞれ独立に、水素原子、ハロゲン原子又は炭化水素基であり、R15~R18は互いに結合して単環又は多環を形成していてもよく、かつ該単環又は多環が二重結合を有していてもよく、またR15とR16とで、又はR17とR18とでアルキリデン基を形成していてもよい。) (In the above formula [I], n is 0 or 1, m is 0 or a positive integer, q is 0 or 1, and R 1 to R 18 and R a and R b are each independently A hydrogen atom, a halogen atom or a hydrocarbon group, R 15 to R 18 may be bonded to each other to form a monocyclic or polycyclic ring, and the monocyclic or polycyclic ring has a double bond And R 15 and R 16 , or R 17 and R 18 may form an alkylidene group.)
Figure JPOXMLDOC01-appb-C000002
Figure JPOXMLDOC01-appb-C000002
(式[II]中、p及びqは0又は1以上の整数であり、m及びnは0、1又は2であり、R1~R19はそれぞれ独立に水素原子、ハロゲン原子、脂肪族炭化水素基、脂環族炭化水素基、芳香族炭化水素基又はアルコキシ基であり、R9(又はR10)が結合している炭素原子と、R13又はR11が結合している炭素原子とは直接あるいは炭素数1~3のアルキレン基を介して結合していてもよく、また、n=m=0のときR15とR12又はR15とR19とは互いに結合して単環又は多環の芳香族環を形成していてもよい。) (In the formula [II], p and q are 0 or an integer of 1 or more, m and n are 0, 1 or 2, and R 1 to R 19 are each independently a hydrogen atom, a halogen atom or an aliphatic carbonization. A hydrogen atom, an alicyclic hydrocarbon group, an aromatic hydrocarbon group or an alkoxy group, and a carbon atom to which R 9 (or R 10 ) is bonded, and a carbon atom to which R 13 or R 11 is bonded May be bonded directly or via an alkylene group having 1 to 3 carbon atoms, and when n = m = 0, R 15 and R 12 or R 15 and R 19 are bonded to each other to form a single ring or (A polycyclic aromatic ring may be formed.)
 上記式[I]又は[II]で示される環状オレフィンを重合してなる重合体としては、以下に示す(a1)、(a2)、(a3)及び(a4)が好適なものとして例示される。
(a1):エチレンと上記式[I]又は[II]で表される環状オレフィンとのランダム共重合体(エチレン-環状オレフィンランダム共重合体)
(a2):上記式[I]又は[II]で表される環状オレフィンの開環重合体又は開環共重合体
(a3):(a2)の水素化物
(a4):(a1)、(a2)、又は(a3)のグラフト変性物
As the polymer obtained by polymerizing the cyclic olefin represented by the above formula [I] or [II], the following (a1), (a2), (a3) and (a4) are exemplified as preferable examples. .
(A1): Random copolymer of ethylene and a cyclic olefin represented by the above formula [I] or [II] (ethylene-cyclic olefin random copolymer)
(A2): Ring-opening polymer or ring-opening copolymer of cyclic olefin represented by the above formula [I] or [II] (a3): hydride of (a2) (a4): (a1), (a2 ) Or (a3) graft modified product
 これらのうち、エチレン-環状オレフィンランダム共重合体(a1)、すなわち、エチレンと上記式[I]又は[II]で示される環状オレフィンとのランダム共重合体が好ましく用いられる。このようなエチレン-環状オレフィンランダム共重合体(a1)は、耐摩耗性に優れ、揮発成分の放出量が少ない樹脂組成物が得られることなどから、好適に使用される。 Among these, an ethylene-cyclic olefin random copolymer (a1), that is, a random copolymer of ethylene and a cyclic olefin represented by the above formula [I] or [II] is preferably used. Such an ethylene-cycloolefin random copolymer (a1) is preferably used because it provides a resin composition having excellent abrasion resistance and a small amount of volatile components released.
 このとき、エチレン-環状オレフィンランダム共重合体(a1)の原料として使用される上記式[I]又は[II]で示される環状オレフィンとしては、耐熱性や入手の容易性の点から好適なものとして、テトラシクロ[4.4.0.12,5.17,10]-3-ドデセン及びこれに炭化水素基が置換した誘導体が例示され、特に好適なものとしてテトラシクロ[4.4.0.12,5.17,10]-3-ドデセンが例示される。 At this time, the cyclic olefin represented by the above formula [I] or [II] used as a raw material for the ethylene-cyclic olefin random copolymer (a1) is preferable from the viewpoint of heat resistance and availability. as, tetracyclo [4.4.0.1 2,5 .1 7,10] -3- dodecene and derivatives hydrocarbon group substituted thereto is illustrated, tetracyclo [4.4.0.1 2,5 .1 7 as particularly suitable , 10 ] -3-dodecene.
 エチレン-環状オレフィンランダム共重合体(a1)におけるエチレン含有率は40~85モル%であることが、耐熱性や剛性などの点から好ましい。エチレン含有率はより好適には50モル%以上である。また、エチレン含有率はより好適には75モル%以下である。一方、環状オレフィンの含有量は15~60モル%であることが好ましい。環状オレフィンの含有率はより好適には25モル%以上である。また、環状オレフィンの含有率はより好適には50モル%以下である。 The ethylene content in the ethylene-cyclic olefin random copolymer (a1) is preferably 40 to 85 mol% from the viewpoints of heat resistance and rigidity. The ethylene content is more preferably 50 mol% or more. Further, the ethylene content is more preferably 75 mol% or less. On the other hand, the cyclic olefin content is preferably 15 to 60 mol%. The content of the cyclic olefin is more preferably 25 mol% or more. Moreover, the content rate of a cyclic olefin is 50 mol% or less more suitably.
 次に、軟質共重合体(B)について説明する。軟質共重合体(B)のガラス転移温度は0℃以下であることが好ましい。ガラス転移温度は、好適には-10℃以下であり、より好適には-20℃以下である。また通常、ガラス転移温度は-100℃以上である。またX線回析法により測定した結晶化度は、好適には0~30%であり、より好適には0~25%である。 Next, the soft copolymer (B) will be described. The glass transition temperature of the soft copolymer (B) is preferably 0 ° C. or lower. The glass transition temperature is preferably −10 ° C. or lower, more preferably −20 ° C. or lower. Usually, the glass transition temperature is −100 ° C. or higher. The crystallinity measured by X-ray diffraction method is preferably 0-30%, more preferably 0-25%.
 軟質共重合体(B)のMFR(メルトフローレート:ASTM D1238に基づいて、230℃、2.16kg荷重で測定)が0.01~200g/10分であることが好適である。MFRが0.01g/10分未満の場合には、溶融粘度が高すぎて、得られる樹脂組成物の溶融成形性が悪化するおそれがある。MFRは、より好適には0.05g/10分以上であり、さらに好適には0.1g/10分以上である。一方、MFRが200g/10分を超える場合には、得られる研磨キャリアの力学強度が低下するおそれがある。MFRは、より好適には150g/10分以下であり、さらに好適には100g/10分以下である。また、135℃デカリン中で測定した極限粘度[η]が0.01~10dl/g、好ましくは0.08~7dl/gのものを使用するのが好ましい。 The MFR (melt flow rate: measured at 230 ° C. under a load of 2.16 kg based on ASTM® D1238) of the soft copolymer (B) is preferably 0.01 to 200 g / 10 minutes. If the MFR is less than 0.01 g / 10 min, the melt viscosity is too high, and the melt moldability of the resulting resin composition may be deteriorated. The MFR is more preferably 0.05 g / 10 min or more, and even more preferably 0.1 g / 10 min or more. On the other hand, when the MFR exceeds 200 g / 10 min, the mechanical strength of the resulting abrasive carrier may be reduced. MFR is more preferably 150 g / 10 min or less, and even more preferably 100 g / 10 min or less. In addition, it is preferable to use an intrinsic viscosity [η] measured in decalin at 135 ° C. of 0.01 to 10 dl / g, preferably 0.08 to 7 dl / g.
 軟質共重合体(B)が、オレフィン、ジエン及び芳香族ビニル炭化水素からなる群から選択される少なくとも2種以上の単量体を重合してなるものであることが好ましい。このとき、軟質共重合体(B)としては、以下に示す(b1)、(b2)、(b3)及び(b4)が好適なものとして例示される。
(b1):エチレン及び炭素数が3~20のα-オレフィンからなる群から選択される少なくとも2種以上の単量体を重合してなる非晶性又は低結晶性の軟質共重合体
(b2):エチレンと、炭素数が3~20のα-オレフィンと、環状オレフィンとを重合してなる軟質共重合体
(b3):非共役ジエンと、エチレン及び炭素数が3~20のα-オレフィンからなる群から選択される少なくとも2種以上の単量体とを重合してなる軟質共重合体
(b4):芳香族ビニル炭化水素と共役ジエンとのランダム若しくはブロック共重合体又はその水素化物である軟質共重合体
It is preferable that the soft copolymer (B) is obtained by polymerizing at least two kinds of monomers selected from the group consisting of olefins, dienes and aromatic vinyl hydrocarbons. At this time, preferred examples of the soft copolymer (B) include the following (b1), (b2), (b3), and (b4).
(B1): An amorphous or low crystalline soft copolymer (b2) obtained by polymerizing at least two monomers selected from the group consisting of ethylene and an α-olefin having 3 to 20 carbon atoms ): A soft copolymer obtained by polymerizing ethylene, an α-olefin having 3 to 20 carbon atoms, and a cyclic olefin (b3): a non-conjugated diene, ethylene and an α-olefin having 3 to 20 carbon atoms A soft copolymer (b4) obtained by polymerizing at least two monomers selected from the group consisting of: a random or block copolymer of an aromatic vinyl hydrocarbon and a conjugated diene, or a hydride thereof. A soft copolymer
 次に、ラジカル開始剤(C)について説明する。ラジカル開始剤(C)としては、溶融混練時の加熱によって熱分解してラジカルを発生することのできるものであればよく、その種類は特に限定されない。過酸化物、アゾ化合物、レドックス開始剤などが挙げられる。しかしながら、金属を含有するものは、研磨キャリア中に金属残渣が混入するため好ましくない。また、アゾ化合物のように窒素元素を含有するものは、研磨キャリアから含窒素化合物が揮発するおそれがあり、好ましくない場合がある。したがって、有機過酸化物が好適に採用される。ラジカル開始剤(C)は、溶融混練時に適度な速度で分解することが好ましく、その1分間半減期温度は30~250℃であることが好適である。1分間半減期温度は、より好適には50℃以上であり、200℃以下である。 Next, the radical initiator (C) will be described. The radical initiator (C) is not particularly limited as long as it can be thermally decomposed by heating during melt kneading to generate radicals. A peroxide, an azo compound, a redox initiator, etc. are mentioned. However, those containing metal are not preferable because metal residues are mixed in the polishing carrier. Moreover, the thing containing a nitrogen element like an azo compound has a possibility that a nitrogen-containing compound may volatilize from a grinding | polishing carrier, and may be unpreferable. Therefore, an organic peroxide is preferably employed. The radical initiator (C) is preferably decomposed at an appropriate rate during melt-kneading, and the one-minute half-life temperature thereof is preferably 30 to 250 ° C. The 1-minute half-life temperature is more preferably 50 ° C. or more and 200 ° C. or less.
 ラジカル開始剤(C)として使用される有機過酸化物としては、メチルエチルケトンパーオキシド、シクロヘキサノンパーオキシド等のケトンパーオキシド類;1,1-ビス(t-ブチルパーオキシ)シクロヘキサン、2,2-ビス(t-ブチルパーオキシ)オクタン等のパーオキシケタール類;t-ブチルヒドロパーオキシド、クメンヒドロパーオキシド、2,5-ジメチルヘキサン-2,5-ジヒドロキシパーオキシド、1,1,3,3-テトラメチルブチルヒドロパーオキシド等のヒドロパーオキシド類;ジ-t-ブチルパーオキシド、2,5-ジメチル-2,5-ビス(t-ブチルパーオキシ)ヘキサン、2,5-ジメチル-2,5-ビス(t-ブチルパーオキシ)ヘキシン-3等のジアルキルパーオキシド類;ラウロイルパーオキシド、ベンゾイルパーオキシド等のジアシルパーオキシド類;t-ブチルパーオキシアセテート、t-ブチルパーオキシベンゾエート、2,5-ジメチル-2,5-ビス(ベンゾイルパーオキシ)ヘキサン等のパーオキシエステル類等をあげることができる。 Organic peroxides used as radical initiator (C) include ketone peroxides such as methyl ethyl ketone peroxide and cyclohexanone peroxide; 1,1-bis (t-butylperoxy) cyclohexane, 2,2-bis Peroxyketals such as (t-butylperoxy) octane; t-butylhydroperoxide, cumene hydroperoxide, 2,5-dimethylhexane-2,5-dihydroxyperoxide, 1,1,3,3- Hydroperoxides such as tetramethylbutyl hydroperoxide; di-t-butyl peroxide, 2,5-dimethyl-2,5-bis (t-butylperoxy) hexane, 2,5-dimethyl-2,5 -Dialkyl peroxides such as bis (t-butylperoxy) hexyne-3; diacyl such as lauroyl peroxide and benzoyl peroxide Okishido acids; t-butyl peroxy acetate, t- butyl peroxybenzoate, 2,5-dimethyl-2,5-bis (benzoyl peroxy) may be mentioned hexane peroxy esters such like.
 次に、ラジカル重合性の官能基を分子内に2個以上有する多官能化合物(D)について説明する。当該多官能化合物(D)としては、たとえばジビニルベンゼン、アクリル酸ビニル、メタクリル酸ビニル、トリアリールイソシアヌレート、ジアリールフタレート、エチレンジメタクリレート、トリメチロールプロパントリメタクリレートなどをあげることができる。 Next, the polyfunctional compound (D) having two or more radical polymerizable functional groups in the molecule will be described. Examples of the polyfunctional compound (D) include divinylbenzene, vinyl acrylate, vinyl methacrylate, triaryl isocyanurate, diaryl phthalate, ethylene dimethacrylate, trimethylolpropane trimethacrylate, and the like.
 そして、環状オレフィン重合体(A)、軟質共重合体(B)、ラジカル開始剤(C)及び多官能化合物(D)を溶融混練することにより樹脂組成物を得ることができる。 The resin composition can be obtained by melt-kneading the cyclic olefin polymer (A), the soft copolymer (B), the radical initiator (C) and the polyfunctional compound (D).
 軟質共重合体(B)の配合量は、環状オレフィン重合体(A)100質量部に対して1~50質量部であることが好ましい。軟質共重合体(B)の配合量が1質量部未満の場合には、耐摩耗性の改善が不十分になり、好適には5質量部以上である。一方、軟質共重合体(B)の配合量が50質量部を超える場合には、得られる積層板の剛性が低下し、研磨キャリアとしての使用が困難になる場合があり、好適には25質量部以下である。 The blending amount of the soft copolymer (B) is preferably 1 to 50 parts by mass with respect to 100 parts by mass of the cyclic olefin polymer (A). When the blending amount of the soft copolymer (B) is less than 1 part by mass, the improvement in wear resistance is insufficient, and is preferably 5 parts by mass or more. On the other hand, if the blending amount of the soft copolymer (B) exceeds 50 parts by mass, the rigidity of the resulting laminate may be reduced, making it difficult to use as an abrasive carrier, preferably 25 masses. Or less.
 ラジカル開始剤(C)の配合量は、環状オレフィン重合体(A)100質量部に対して0.001~1質量部であることが好ましい。ラジカル開始剤(C)の配合量が0.001質量部未満の場合には、架橋反応が十分に進行せず耐摩耗性の改善が不十分になり、好適には0.01質量部以上である。一方、ラジカル開始剤(C)の配合量が1質量部を超える場合には耐汚染性が悪化するおそれがあり、好適には0.5質量部以下である。 The blending amount of the radical initiator (C) is preferably 0.001 to 1 part by mass with respect to 100 parts by mass of the cyclic olefin polymer (A). When the blending amount of the radical initiator (C) is less than 0.001 part by mass, the crosslinking reaction does not proceed sufficiently, resulting in insufficient improvement in wear resistance. is there. On the other hand, when the compounding quantity of a radical initiator (C) exceeds 1 mass part, there exists a possibility that stain resistance may deteriorate, and it is 0.5 mass part or less suitably.
 多官能化合物(D)の配合量は、環状オレフィン重合体(A)100質量部に対して0~1質量部であることが好ましい。多官能化合物(D)の配合は任意であり、配合しなくても良いが、効率的に架橋反応を進行させるためには配合させるほうが好ましい。その場合の好適な配合量は0.001質量部以上であり、より好適には0.01質量部以上である。一方、多官能化合物(D)の配合量が1質量部を超える場合には耐汚染性が悪化するおそれがあり、好適には0.5質量部以下である。 The compounding amount of the polyfunctional compound (D) is preferably 0 to 1 part by mass with respect to 100 parts by mass of the cyclic olefin polymer (A). The polyfunctional compound (D) can be blended arbitrarily and may not be blended, but is preferably blended in order to advance the crosslinking reaction efficiently. The suitable compounding quantity in that case is 0.001 mass part or more, More preferably, it is 0.01 mass part or more. On the other hand, when the compounding amount of the polyfunctional compound (D) exceeds 1 part by mass, the stain resistance may be deteriorated, and it is preferably 0.5 part by mass or less.
 本発明で用いられる環状オレフィン重合体(A)は、基材層との接着性の観点から、酸変性環状オレフィン重合体であることが好ましい。このような酸変性環状オレフィン重合体は、所望の酸変性量になるように環状オレフィン重合体(A)に変性剤を配合してグラフト重合させ製造することもできるし、予め高変性率の変性物を調製し、次いでこの変性物と未変性の環状オレフィン重合体とを混合することにより製造することもできる。このとき、樹脂層に含まれる重合体における、不飽和カルボン酸単位又はその無水物に由来する単位の含有量が0.1~5質量%であることが好ましい。当該含有量が0.1質量%未満の場合、基材層と優れた接着性が得られないおそれがあり、0.2質量%以上であることがより好ましい。一方、当該含有量が5質量%を超えると耐汚染性が劣るおそれがあり、3質量%以下であることがより好ましい。 The cyclic olefin polymer (A) used in the present invention is preferably an acid-modified cyclic olefin polymer from the viewpoint of adhesion to the base material layer. Such an acid-modified cyclic olefin polymer can be produced by blending a cyclic olefin polymer (A) with a modifier so as to obtain a desired acid-modified amount and graft polymerization. It can also be produced by preparing a product and then mixing this modified product with an unmodified cyclic olefin polymer. At this time, the content of the unsaturated carboxylic acid unit or the unit derived from the anhydride thereof in the polymer contained in the resin layer is preferably 0.1 to 5% by mass. When the said content is less than 0.1 mass%, there exists a possibility that the adhesiveness excellent with the base material layer may not be obtained, and it is more preferable that it is 0.2 mass% or more. On the other hand, when the content exceeds 5% by mass, the stain resistance may be deteriorated, and it is more preferably 3% by mass or less.
 変性剤としては、通常不飽和カルボン酸類が用いられ、具体的には、(メタ)アクリル酸、マレイン酸、フマル酸、テトラヒドロフタル酸、イタコン酸、シトラコン酸、クロトン酸、イソクロトン酸、エンドシス-ビシクロ[2.2.1]ヘプト-5-エン-2,3-ジカルボン酸(ナジック酸)などの不飽和カルボン酸、さらにこれら不飽和カルボン酸の誘導体たとえば不飽和カルボン酸無水物、不飽和カルボン酸ハライド、不飽和カルボン酸アミド、不飽和カルボン酸イミド、不飽和カルボン酸のエステル化合物などが挙げられる。 As the modifier, unsaturated carboxylic acids are usually used. Specifically, (meth) acrylic acid, maleic acid, fumaric acid, tetrahydrophthalic acid, itaconic acid, citraconic acid, crotonic acid, isocrotonic acid, endocis-bicyclo [2.2.1] unsaturated carboxylic acids such as hept-5-ene-2,3-dicarboxylic acid (nadic acid), and derivatives of these unsaturated carboxylic acids such as unsaturated carboxylic acid anhydrides, unsaturated carboxylic acid halides, Examples thereof include unsaturated carboxylic acid amides, unsaturated carboxylic acid imides, and ester compounds of unsaturated carboxylic acids.
 不飽和カルボン酸の誘導体として、より具体的には、無水マレイン酸、無水シトラコン酸、塩化マレニル、マレイミド、マレイン酸モノメチル、マレイン酸ジメチル、グリシジルマレエートなどが挙げられる。 Specific examples of the unsaturated carboxylic acid derivative include maleic anhydride, citraconic anhydride, maleenyl chloride, maleimide, monomethyl maleate, dimethyl maleate, glycidyl maleate, and the like.
 これらの変性剤のうちでも、α,β-不飽和ジカルボン酸及びα,β-不飽和ジカルボン酸無水物、例えばマレイン酸、ナジック酸及びこれら酸の無水物が好ましく用いられる。これらの変性剤は、2種以上組み合わせて用いることもできる。 Among these modifiers, α, β-unsaturated dicarboxylic acids and α, β-unsaturated dicarboxylic acid anhydrides such as maleic acid, nadic acid and anhydrides of these acids are preferably used. These modifiers can be used in combination of two or more.
 本発明において、基材層が、樹脂が含浸された有機繊維集合体からなることも重要である。このようにすることで基材層から有機繊維が脱落することを防ぐことができる。また、研磨キャリアにヒゲが発生することも防ぐことができる。ここで、有機繊維集合体に含浸させる樹脂は、前記環状ポリオレフィン重合体(A)である。 In the present invention, it is also important that the base material layer is composed of an organic fiber aggregate impregnated with a resin. By doing in this way, it can prevent that an organic fiber falls off from a base material layer. In addition, it is possible to prevent the beard from being generated on the polishing carrier. Here, the resin impregnated in the organic fiber assembly is the cyclic polyolefin polymer (A).
 有機繊維としては、特に限定されないが、有機高分子化合物から形成されたものであればよく、強度の観点から合成繊維であることが好ましい。本発明で用いられる有機繊維としては、強度、耐摩耗性及び耐薬品性の観点から、全芳香族ポリエステル繊維、アラミド繊維、ポリフェニレンサルファイド繊維及びポリパラフェニレンベンゾビスオキサゾール繊維からなる群から選択される少なくとも1種の繊維であることが好ましい。中でも、積層板に貫通孔やギヤを形成する際の加工性と、得られる研磨キャリアの強度のバランスに優れる点から、ポリフェニレンサルファイド繊維又は全芳香族ポリエステル繊維がより好ましく、全芳香族ポリエステル繊維がさらに好ましい。 The organic fiber is not particularly limited as long as it is formed from an organic polymer compound, and is preferably a synthetic fiber from the viewpoint of strength. The organic fiber used in the present invention is selected from the group consisting of wholly aromatic polyester fiber, aramid fiber, polyphenylene sulfide fiber and polyparaphenylene benzobisoxazole fiber from the viewpoint of strength, abrasion resistance and chemical resistance. Preferably at least one fiber. Among these, polyphenylene sulfide fiber or wholly aromatic polyester fiber is more preferable, and wholly aromatic polyester fiber is more preferable from the viewpoint of excellent balance between workability when forming through holes and gears in the laminate and the strength of the obtained abrasive carrier. Further preferred.
 基材層に含まれる有機繊維集合体は特に限定されず、織物、編物、不織布などを用いることができる。中でも、異方性が少ない点から、有機繊維集合体が不織布であることが好ましい。 The organic fiber aggregate contained in the base material layer is not particularly limited, and a woven fabric, a knitted fabric, a non-woven fabric, or the like can be used. Especially, it is preferable that an organic fiber assembly is a nonwoven fabric from a point with little anisotropy.
 不織布は、長繊維不織布又は短繊維不織布に分類される。本発明における不織布としては、いずれの不織布も使用することができるが、毛羽立ちや繊維の脱落が少ない観点から、長繊維不織布であることが好ましい。 Nonwoven fabrics are classified as long fiber nonwoven fabrics or short fiber nonwoven fabrics. Although any nonwoven fabric can be used as the nonwoven fabric in the present invention, it is preferably a long-fiber nonwoven fabric from the viewpoint of less fluffing and fiber falling off.
 また、不織布の種類としては、直接法で得られた不織布も挙げることができる。直接法によって得られる不織布の具体例として、メルトブロー法で製造したメルトブローン不織布、スパンボンド法で製造したスパンボンド不織布などを挙げることができる。寸法安定性の観点から、本発明で用いられる有機繊維集合体がメルトブローン不織布であることが好ましい。全芳香族ポリエステルからなる液晶ポリマーを、メルトブロー法で不織布に加工したものが好適に用いられる。 Moreover, as a kind of nonwoven fabric, the nonwoven fabric obtained by the direct method can also be mentioned. Specific examples of the non-woven fabric obtained by the direct method include a melt blown non-woven fabric manufactured by a melt blow method, a spun bond non-woven fabric manufactured by a spun bond method, and the like. From the viewpoint of dimensional stability, the organic fiber aggregate used in the present invention is preferably a melt blown nonwoven fabric. What processed the liquid crystal polymer which consists of wholly aromatic polyester into the nonwoven fabric by the melt blow method is used suitably.
 また、不織布の種類としては、湿式法で得られた不織布(湿式不織布)、乾式法で得られた不織布(乾式不織布)を挙げることもできる。本発明における不織布としては、いずれの不織布も使用することができるが、繊維密度が高い観点から本発明で用いられる有機繊維集合体が湿式不織布であることが好ましい。湿式不織布は、短繊維を水などの分散媒に分散させてから漉いて製造したものであり、厚みむらが小さく、薄くて緻密な繊維集合体を容易に得ることができる。したがって、それを基材層に用いたときに樹脂層に繊維が混入するおそれがないし、厚み精度の良好な研磨キャリアを得ることができる。 In addition, examples of the type of nonwoven fabric include a nonwoven fabric obtained by a wet method (wet nonwoven fabric) and a nonwoven fabric obtained by a dry method (dry nonwoven fabric). Although any nonwoven fabric can be used as the nonwoven fabric in the present invention, it is preferable that the organic fiber aggregate used in the present invention is a wet nonwoven fabric from the viewpoint of high fiber density. The wet nonwoven fabric is manufactured by dispersing short fibers in a dispersion medium such as water and can easily obtain a thin and dense fiber assembly with small thickness unevenness. Therefore, there is no fear that fibers will be mixed into the resin layer when it is used for the base material layer, and a polishing carrier with good thickness accuracy can be obtained.
 また、研磨キャリアの強度や耐久性を向上させるためには、密度が0.15g/cm以上である有機繊維集合体を用いることが好ましい。密度は0.3g/cm以上であることがより好ましい。このように、密度の高い有機繊維集合体を用いることによって、基材層から樹脂層への繊維の混入を防ぐことができる。また、積層板に貫通孔やギヤを形成するために切削加工する場合にも、有機繊維が端面できれいに切断され、ヒゲが発生しにくい。一方、密度は通常、1.5g/cm以下であり、1.2g/cm以下であることが好ましい。 In order to improve the strength and durability of the abrasive carrier, it is preferable to use an organic fiber aggregate having a density of 0.15 g / cm 3 or more. The density is more preferably 0.3 g / cm 3 or more. Thus, by using a high-density organic fiber assembly, it is possible to prevent fibers from being mixed from the base material layer to the resin layer. Also, when cutting to form through holes and gears in the laminate, the organic fibers are cut cleanly at the end face, and beards are unlikely to occur. On the other hand, the density is usually 1.5 g / cm 3 or less and preferably 1.2 g / cm 3 or less.
 本発明の研磨キャリアは、基材層と樹脂層とを有する積層板からなる。本発明において、積層板が複数の基材層の間に樹脂層を有するとともに両表面に樹脂層を有することが重要である。以下、基材層の間の樹脂層を中間樹脂層と、両表面の樹脂層を表面樹脂層ということがある。積層板が複数の基材層の間に中間樹脂層を有することで、研磨キャリアの強度や耐久性が向上するとともに、研磨キャリアの寸法安定性が良好になる。また、積層板の両表面に表面樹脂層を有することで、有機繊維が研磨キャリアの表面から脱落することを防ぐことができる。 The abrasive carrier of the present invention comprises a laminate having a base material layer and a resin layer. In the present invention, it is important that the laminate has a resin layer between a plurality of substrate layers and has a resin layer on both surfaces. Hereinafter, the resin layer between the base layers may be referred to as an intermediate resin layer, and the resin layers on both surfaces may be referred to as a surface resin layer. When the laminate has the intermediate resin layer between the plurality of base material layers, the strength and durability of the abrasive carrier are improved, and the dimensional stability of the abrasive carrier is improved. Moreover, it can prevent that an organic fiber falls off from the surface of a grinding | polishing carrier by having a surface resin layer on both surfaces of a laminated board.
 基材層の厚みが10~1000μmであることが好ましい。基材層の厚みが10μm未満であると、研磨キャリアの強度が低下するおそれがある。基材層の厚みは20μm以上であることがより好ましい。一方、基材層の厚みが1000μmを超えると基材層自体の製造が困難になるおそれがある。基材層の厚みは500μm以下であることがより好ましく、300μm以下であることがさらに好ましい。 The thickness of the base material layer is preferably 10 to 1000 μm. There exists a possibility that the intensity | strength of a grinding | polishing carrier may fall that the thickness of a base material layer is less than 10 micrometers. The thickness of the base material layer is more preferably 20 μm or more. On the other hand, when the thickness of the base material layer exceeds 1000 μm, it may be difficult to produce the base material layer itself. The thickness of the base material layer is more preferably 500 μm or less, and further preferably 300 μm or less.
 表面樹脂層の厚みがいずれも10~1000μmであることが好ましい。表面樹脂層の厚みが10μm未満であると、研磨キャリアの表面から有機繊維が脱落するおそれがある。表面樹脂層の厚みはいずれも20μm以上であることがより好ましい。一方、表面樹脂層の厚みが1000μmを超えると研磨キャリアの強度が低下するおそれがある。表面樹脂層の厚みはいずれも500μm以下であることがより好ましい。ここで、研磨キャリアの剛性を高くするためには、表面樹脂層の厚みが薄い方が好ましい。かかる観点から、表面樹脂層の厚みがいずれも200μm以下であることが好ましく、100μm以下であることがより好ましい。 The thickness of the surface resin layer is preferably 10 to 1000 μm. If the thickness of the surface resin layer is less than 10 μm, the organic fibers may fall off the surface of the polishing carrier. The thickness of the surface resin layer is more preferably 20 μm or more. On the other hand, if the thickness of the surface resin layer exceeds 1000 μm, the strength of the polishing carrier may be reduced. The thickness of the surface resin layer is more preferably 500 μm or less. Here, in order to increase the rigidity of the polishing carrier, it is preferable that the surface resin layer is thinner. From this viewpoint, the thickness of the surface resin layer is preferably 200 μm or less, and more preferably 100 μm or less.
 中間樹脂層の厚みが20~1000μmであることが好ましい。中間樹脂層の厚みが20μm未満であると基材層の間で剥離しやすくなる。中間樹脂層の厚みは40μm以上であることがより好ましい。ここで、研磨キャリアの剛性を高くするためには、中間樹脂層の厚みが厚い方が好ましい。かかる観点から、中間樹脂層の厚みが200μm以上であることが好ましく、300μm以上であることがより好ましい。一方、中間樹脂層の厚みが1000μmを超えると研磨キャリアの全体の強度が低下するおそれがある。 The thickness of the intermediate resin layer is preferably 20 to 1000 μm. When the thickness of the intermediate resin layer is less than 20 μm, it becomes easy to peel between the base material layers. The thickness of the intermediate resin layer is more preferably 40 μm or more. Here, in order to increase the rigidity of the polishing carrier, it is preferable that the intermediate resin layer is thick. From this viewpoint, the thickness of the intermediate resin layer is preferably 200 μm or more, and more preferably 300 μm or more. On the other hand, if the thickness of the intermediate resin layer exceeds 1000 μm, the overall strength of the polishing carrier may be reduced.
 本発明の研磨キャリアの厚みが100~5000μmであることが好ましい。研磨キャリアの厚みが100μm未満であると研磨キャリアの強度や耐久性が低下するおそれがある。研磨キャリアの厚みは200μm以上であることがより好ましい。一方、研磨キャリアの厚みが5000μmを超えると製造コストが上昇するおそれがある。研磨キャリアの厚みは3000μm以下であることがより好ましい。 The thickness of the polishing carrier of the present invention is preferably 100 to 5000 μm. If the thickness of the polishing carrier is less than 100 μm, the strength and durability of the polishing carrier may be reduced. The thickness of the polishing carrier is more preferably 200 μm or more. On the other hand, when the thickness of the polishing carrier exceeds 5000 μm, the production cost may increase. The thickness of the polishing carrier is more preferably 3000 μm or less.
 本発明における層構成の一例として、以下に示す5層構成、7層構成、9層構成、11層構成を挙げることができ、5層構成であることが好ましい。(R)は樹脂層であり、(F)は基材層である。 Examples of the layer configuration in the present invention include the following 5-layer configuration, 7-layer configuration, 9-layer configuration, and 11-layer configuration, and a 5-layer configuration is preferable. (R) is a resin layer, and (F) is a base material layer.
  5層構成:(R)/(F)/(R)/(F)/(R)
  7層構成:(R)/(F)/(R)/(F)/(R)/(F)/(R)
  9層構成:(R)/(F)/(R)/(F)/(R)/(F)/(R)/(F)/(R)
  11層構成:(R)/(F)/(R)/(F)/(R)/(F)/(R)/(F)/(R)/(F)/(R)
 研磨キャリアを曲げようとする外力が加わると、その外力に反発する力として研磨キャリア内部には中間の層に対して両側の基材層にそれぞれ圧縮応力と引張応力が生じる。圧縮応力及び引張応力が生じる層を基材層とすることで研磨キャリアの曲げ弾性率(剛性)が向上する。このとき、前記中間樹脂層の厚みが前記表面樹脂層の厚みの2倍以上であることが好ましく、5倍以上であることがより好ましい。表面樹脂層に対して中間樹脂層の厚みを厚くすることで、より外側に基材層が配置されることになる。基材層をより外側に配置することで、高弾性率の基材層によって曲げによる研磨キャリア表面の伸縮を拘束できるので研磨キャリアの曲げ特性がより向上する。前記中間樹脂層の厚みは、通常、前記表面樹脂層の厚みの50倍以下である。
5-layer structure: (R) / (F) / (R) / (F) / (R)
7-layer structure: (R) / (F) / (R) / (F) / (R) / (F) / (R)
9-layer configuration: (R) / (F) / (R) / (F) / (R) / (F) / (R) / (F) / (R)
Eleven layers: (R) / (F) / (R) / (F) / (R) / (F) / (R) / (F) / (R) / (F) / (R)
When an external force is applied to bend the polishing carrier, a compressive stress and a tensile stress are generated in the base material layer on both sides of the intermediate layer in the polishing carrier as a force repelling the external force. The bending elastic modulus (rigidity) of the abrasive carrier is improved by using a layer in which compressive stress and tensile stress are generated as a base material layer. At this time, the thickness of the intermediate resin layer is preferably at least twice the thickness of the surface resin layer, more preferably at least 5 times. By increasing the thickness of the intermediate resin layer relative to the surface resin layer, the base material layer is disposed on the outer side. By disposing the base material layer on the outer side, the expansion and contraction of the polishing carrier surface due to bending can be constrained by the high elastic base material layer, so that the bending characteristics of the polishing carrier are further improved. The thickness of the intermediate resin layer is usually 50 times or less the thickness of the surface resin layer.
 また、樹脂層の合計厚みと基材層の合計厚みについては、切断面からの繊維脱落防止の観点からは、樹脂層の合計の厚みが大きい方が好ましい。一方、研磨キャリアの強度の観点からは、基材層の合計の厚みが大きい方が好ましい。これらのバランスの観点から、前記樹脂層の合計厚みが、研磨キャリアの厚みの0.1倍以上であることが好ましく、0.2倍以上であることがより好ましく、0.4倍以上であることがさらに好ましい。また通常0.8倍以下であり、好適には0.7倍以下である。 Further, regarding the total thickness of the resin layer and the total thickness of the base material layer, it is preferable that the total thickness of the resin layer is larger from the viewpoint of preventing the fibers from dropping from the cut surface. On the other hand, from the viewpoint of the strength of the abrasive carrier, it is preferable that the total thickness of the base material layer is large. From the viewpoint of these balances, the total thickness of the resin layer is preferably 0.1 times or more of the thickness of the polishing carrier, more preferably 0.2 times or more, and 0.4 times or more. More preferably. Moreover, it is 0.8 times or less normally, Preferably it is 0.7 times or less.
 本発明の研磨キャリアの製造方法としては特に限定されないが、前記有機繊維集合体からなる複数の繊維シートと前記環状オレフィン重合体(A)を含む複数の樹脂シートとを該樹脂シートが最外層になるように重ね合わせて積層体を得てから、該積層体を加熱加圧して該樹脂シートを溶融させ、溶融した樹脂を前記有機繊維集合体に含浸させてから冷却して積層板を得て、引き続き、前記積層板に、研磨される板状体を保持するための貫通孔を形成することを特徴とする研磨キャリアの製造方法が好適である。 Although it does not specifically limit as a manufacturing method of the grinding | polishing carrier of this invention, The said resin sheet makes the outermost layer the several fiber sheet which consists of the said organic fiber assembly, and the several resin sheet containing the said cyclic olefin polymer (A). To obtain a laminate, and then heat and pressure the laminate to melt the resin sheet, impregnate the molten resin into the organic fiber assembly, and then cool to obtain a laminate Subsequently, a method for manufacturing a polishing carrier, wherein a through hole for holding a plate to be polished is formed in the laminated plate is preferable.
 まず、前記有機繊維集合体からなる複数の繊維シートと前記環状オレフィン重合体(A)を含む複数の樹脂シートとを該樹脂シートが最外層になるように重ね合わせて積層体を得る。このとき、加熱加圧したときに、複数の基材層の間に樹脂層を有するとともに両表面に樹脂層を有する積層板を得ることができれば、用いる繊維シート及び樹脂シートの枚数は特に限定されない。それぞれの基材層が1枚の繊維シートのみから形成されてもよいし、複数枚の繊維シートから形成されてもよい。それぞれの樹脂層が1枚の樹脂シートのみから形成されてもよいし、複数枚の樹脂シートから形成されてもよい。積層板の生産性や基材層と樹脂層との密着性の観点から、基材層及び樹脂層がいずれも1枚のシートから形成されることが好ましい。この場合、繊維シートを少なくとも2枚以上、かつ樹脂シートを少なくも3枚以上用意して、樹脂シートが最外層になるように、シートを1枚ずつ交互に積層することになる。 First, a laminate is obtained by superposing a plurality of fiber sheets made of the organic fiber aggregate and a plurality of resin sheets containing the cyclic olefin polymer (A) so that the resin sheet is the outermost layer. At this time, the number of fiber sheets and resin sheets to be used is not particularly limited as long as a laminate having a resin layer between a plurality of substrate layers and having a resin layer on both surfaces can be obtained when heated and pressurized. . Each base material layer may be formed from only one fiber sheet, or may be formed from a plurality of fiber sheets. Each resin layer may be formed from only one resin sheet, or may be formed from a plurality of resin sheets. From the viewpoint of the productivity of the laminate and the adhesion between the base material layer and the resin layer, it is preferable that both the base material layer and the resin layer are formed from a single sheet. In this case, at least two fiber sheets and at least three resin sheets are prepared, and the sheets are alternately stacked one by one so that the resin sheet is the outermost layer.
 繊維シートとしては、上記で説明した有機繊維を公知の方法によりシート状にしたものを用いることができる。樹脂シートも上記で説明した環状オレフィン重合体(A)を含む樹脂組成物を公知の方法によりシート状にしたものを用いることができる。重ねる枚数は、樹脂シートが少なくとも3枚以上で、かつ繊維シートが少なくとも2枚以上であれば特に限定されない。重ねる枚数は、通常、樹脂シート、繊維シートいずれも10枚以下である。加熱加圧する方法も特に限定されず、公知の加熱加圧装置を用いることができる。 As the fiber sheet, the organic fiber described above can be used in the form of a sheet by a known method. As the resin sheet, a resin composition containing the cyclic olefin polymer (A) described above in the form of a sheet by a known method can be used. The number of sheets to be stacked is not particularly limited as long as there are at least three resin sheets and at least two fiber sheets. The number of sheets to be stacked is usually 10 or less for both the resin sheet and the fiber sheet. The method of heating and pressing is not particularly limited, and a known heating and pressing apparatus can be used.
 次に、積層体を加熱加圧して該樹脂シートを溶融させ、溶融した樹脂を前記有機繊維集合体に含浸させてから冷却して積層板を得る。具体的には、積層体を、用いた樹脂シートの融点以上の温度で所定時間加熱加圧して樹脂を含浸させる。これにより繊維の脱落を防止することができる。その後、室温まで冷却してから除圧することにより寸法精度が良好な積層板を得ることができる。このときの圧力は、溶融した樹脂を有機繊維集合体に含浸させることのできる圧力であれば特に限定されない。加熱加圧する方法も特に限定されず、公知の加熱加圧装置を用いることができる。 Next, the laminate is heated and pressed to melt the resin sheet, the molten resin is impregnated in the organic fiber assembly, and then cooled to obtain a laminate. Specifically, the laminate is heated and pressed for a predetermined time at a temperature equal to or higher than the melting point of the used resin sheet to impregnate the resin. This can prevent the fibers from dropping off. Thereafter, the laminate is cooled to room temperature and then depressurized to obtain a laminate having good dimensional accuracy. The pressure at this time is not particularly limited as long as it is a pressure capable of impregnating the molten resin into the organic fiber assembly. The method of heating and pressing is not particularly limited, and a known heating and pressing apparatus can be used.
 引き続き、前記積層板に、研磨される板状体を保持するための貫通孔を形成して研磨キャリアを得る。積層板に形成される孔の個数は特に限定されず1個でも複数個であってもよい。形成方法は特に限定されず、ルーターマシンなどを用いて積層板に貫通孔を形成すればよい。このとき、積層板を所定の寸法や形状に成形したり、必要に応じて駆動用のギヤを形成したりしてもよい。また、密度の高い有機繊維集合体を基材層に用いれば、積層板に貫通孔やギヤを形成するときにできる切断面から繊維が脱落したり、ヒゲが生じたりすることを抑制できる。したがって、研磨中に研磨キャリアから繊維が脱落することがないのでスクラッチの発生を抑制することができる。 Subsequently, a through-hole for holding a plate to be polished is formed in the laminated plate to obtain a polishing carrier. The number of holes formed in the laminate is not particularly limited, and may be one or more. The forming method is not particularly limited, and a through hole may be formed in the laminated plate using a router machine or the like. At this time, the laminated plate may be formed into a predetermined size or shape, or a driving gear may be formed as necessary. Moreover, if a high-density organic fiber aggregate is used for a base material layer, it can suppress that a fiber falls from the cut surface formed when a through-hole and a gear are formed in a laminated board, or a beard is produced. Accordingly, since the fibers do not fall off from the polishing carrier during polishing, the generation of scratches can be suppressed.
 本発明の研磨キャリアで板状体を保持して該板状体を研磨する。本発明の研磨キャリアは、優れた強度及び耐久性を有するので、研磨キャリアの破損を防ぎながら、異物の脱落を防ぐことができる。このような研磨キャリアを用いて板状体を研磨すれば、板状体に異物が付着したりスクラッチが発生したりするのを抑制することができる。研磨される板状体は特に限定されず、半導体ウェハ、ハードディスク用のアルミニウムディスクやガラスディスク、液晶表示用のガラス基板などが例示される。 The plate-like body is held by the polishing carrier of the present invention and the plate-like body is polished. Since the abrasive carrier of the present invention has excellent strength and durability, it is possible to prevent the foreign matter from falling off while preventing the abrasive carrier from being damaged. When the plate-like body is polished using such a polishing carrier, it is possible to prevent foreign matter from adhering to the plate-like body and generation of scratches. The plate-like body to be polished is not particularly limited, and examples thereof include semiconductor wafers, aluminum disks and glass disks for hard disks, and glass substrates for liquid crystal displays.
 以下、実施例を用いて本発明を更に具体的に説明する。 Hereinafter, the present invention will be described more specifically using examples.
実施例1
[研磨キャリアの作製]
(樹脂シートの作製)
 下記の環状オレフィン重合体(a)100質量部、エチレン・プロピレンランダム共重合体(b)11質量部、ラジカル開始剤(c)0.022質量部及び多官能化合物(d)0.022質量部を押出機で溶融混練して樹脂組成物を得た。当該樹脂組成物は、冨士ベークライト株式会社から「FB-0422X1」の名称で市販されているものである。
Example 1
[Production of polishing carrier]
(Production of resin sheet)
The following cyclic olefin polymer (a) 100 parts by mass, ethylene / propylene random copolymer (b) 11 parts by mass, radical initiator (c) 0.022 parts by mass and polyfunctional compound (d) 0.022 parts by mass Was melt-kneaded with an extruder to obtain a resin composition. The resin composition is commercially available from Fuji Bakelite Co., Ltd. under the name “FB-0422X1”.
・環状オレフィン重合体(a)
エチレンとテトラシクロ[4.4.0.12,5.17,10]-3-ドデセン(以下「TCD-3」と略すことがある)とのランダム共重合体(エチレン-TCD-3ランダム共重合体)。13C-NMRで測定したTCD-3含有量が77.8質量%(38mol%)、エチレン含量が22.2質量%(62mol%)、135℃のデカリン中で測定した極限粘度[η]が0.60dl/g、ガラス転移温度(Tg)が105℃である。MFR(ASTM D1238に基づいて230℃、2.16kg荷重で測定)は8.2g/10分である。TCD-3の構造式は、上記式[I]において、n=0、m=1かつR、R、R、R10、R11、R12、R13、R14、R15、R16、R17、R18が水素原子の場合である。
-Cyclic olefin polymer (a)
Ethylene and tetracyclo [4.4.0.1 2,5 .1 7,10] -3- dodecene (hereinafter sometimes abbreviated as "TCD-3") and random copolymer (ethylene -TCD-3 random copolymer) . TCD-3 content measured by 13 C-NMR is 77.8% by mass (38 mol%), ethylene content is 22.2% by mass (62 mol%), and intrinsic viscosity [η] measured in decalin at 135 ° C. is 0.60 dl / g and a glass transition temperature (Tg) are 105 degreeC. The MFR (measured at 230 ° C. and 2.16 kg load based on ASTM D1238) is 8.2 g / 10 min. The structural formula of TCD-3 is as follows. In the above formula [I], n = 0, m = 1 and R 7 , R 8 , R 9 , R 10 , R 11 , R 12 , R 13 , R 14 , R 15 , This is a case where R 16 , R 17 and R 18 are hydrogen atoms.
・軟質共重合体(b)
三井化学株式会社製エチレン-プロピレンランダム共重合体「P-0880」。エチレン含量が80mol%、極限粘度[η]が2.5dl/g、ガラス転移温度(Tg)が-54℃である。MFR(ASTM D1238に基づいて、230℃、2.16kg荷重で測定)が0.4g/10分、密度が0.867g/cm、X線回折法により測定した結晶化度が約10%である。
・ Soft copolymer (b)
Ethylene-propylene random copolymer “P-0880” manufactured by Mitsui Chemicals, Inc. The ethylene content is 80 mol%, the intrinsic viscosity [η] is 2.5 dl / g, and the glass transition temperature (Tg) is −54 ° C. MFR (measured based on ASTM D1238 at 230 ° C. and 2.16 kg load) is 0.4 g / 10 min, density is 0.867 g / cm 3 , and crystallinity measured by X-ray diffraction method is about 10%. is there.
・ラジカル開始剤(c)
日本油脂株式会社製「パーヘキシン25B」。2,5-ジメチル-2,5-ビス(t-ブチルパーオキシ)ヘキシン-3を主成分(90%以上)とする。1分間半減期温度は194.3℃である。
-Radical initiator (c)
“Perhexine 25B” manufactured by Nippon Oil & Fat Co., Ltd. 2,5-dimethyl-2,5-bis (t-butylperoxy) hexyne-3 is the main component (90% or more). The 1 minute half-life temperature is 194.3 ° C.
・多官能化合物(d)
ジビニルベンゼン
・ Polyfunctional compound (d)
Divinylbenzene
 そして、上記樹脂組成物、2,5ジメチル-2,5-ジ-(t-ブチルパーオキシン)-ヘキシン-3、無水マレイン酸を混合して混合物を得た。この混合物における上記樹脂組成物の含有量は98.5質量%であり、2,5ジメチル-2,5-ジ-(t-ブチルパーオキシン)の含有量は0.5質量%であり、無水マレイン酸の含有量は1.0質量%であった。混合物を二軸押出機(株式会社日本製鋼所製「TEX30α」)に投入して溶融混練して反応させた後、ペレット化してペレットを得た。2,5ジメチル-2,5-ジ-(t-ブチルパーオキシン)-ヘキシン-3は日本油脂株式会社製の「パーヘキシン25B」であった。 Then, the above resin composition, 2,5 dimethyl-2,5-di- (t-butylperoxin) -hexyne-3, and maleic anhydride were mixed to obtain a mixture. The content of the resin composition in this mixture is 98.5% by mass, the content of 2,5 dimethyl-2,5-di- (t-butylperoxin) is 0.5% by mass, and anhydrous The content of maleic acid was 1.0% by mass. The mixture was put into a twin-screw extruder (“TEX30α” manufactured by Nippon Steel Co., Ltd.), melt-kneaded and reacted, and then pelletized to obtain pellets. 2,5dimethyl-2,5-di- (t-butylperoxin) -hexyne-3 was “Perhexin25B” manufactured by NOF Corporation.
 得られたペレットを押出機に投入して製膜を行い、厚さ0.56mmの樹脂シート(樹脂シートS1)、及び厚さ0.11mmの樹脂シート(樹脂シートS2)を得た。 The obtained pellets were put into an extruder to form a film to obtain a resin sheet (resin sheet S1) having a thickness of 0.56 mm and a resin sheet (resin sheet S2) having a thickness of 0.11 mm.
(不織布)
 不織布としては、クラレクラフレックス株式会社製の不織布「ベクルス MBBK150FZSO」(目付:150g/m、厚み:323μm、密度:0.46g/cm)を用いた。「ベクルス
MBBK150FZSO」は、メルトブロー成形法により製造した不織布であり、熱圧着して得られたものであり、接着剤を含まない。
(Nonwoven fabric)
As the non-woven fabric, a non-woven fabric “Vecruz MBBK150FZSO” (weight per unit: 150 g / m 2 , thickness: 323 μm, density: 0.46 g / cm 3 ) manufactured by Kuraray Laflex Co., Ltd. was used. “Veculus MBBK150FZSO” is a non-woven fabric produced by a melt blow molding method, obtained by thermocompression bonding, and does not contain an adhesive.
(積層板の作製)
 プレスプレートに、順に、樹脂シートS1、不織布、樹脂シートS2、不織布、樹脂シートS1を重ねた。そして、最上面と最下面に離型フィルムを配置した。これを1セットとして、10セット用意した。加圧を開始し、プレス圧力が3.5MPaになったことを確認した後、このプレス圧力を保持したままプレスプレートを加熱した。プレスプレートの温度が180℃に達したことを確認したらすぐに、プレス圧力を7.5MPaにするとともに冷却水でプレスプレートを冷却した。プレスプレートの温度が室温に戻ったら加圧を停止して、プレスプレートから積層板を取り出した。加熱を開始してからプレスプレートの温度が180℃に達するまでの時間は60分であり、冷却を開始してからプレスプレートの温度が室温に戻るまでの時間は60分であった。
(Production of laminates)
A resin sheet S1, a nonwoven fabric, a resin sheet S2, a nonwoven fabric, and a resin sheet S1 were sequentially stacked on the press plate. And the release film was arrange | positioned to the uppermost surface and the lowermost surface. Ten sets were prepared as one set. After pressurization was started and the press pressure was confirmed to be 3.5 MPa, the press plate was heated while maintaining the press pressure. As soon as it was confirmed that the temperature of the press plate reached 180 ° C., the press pressure was set to 7.5 MPa and the press plate was cooled with cooling water. When the temperature of the press plate returned to room temperature, the pressurization was stopped and the laminated plate was taken out from the press plate. The time from the start of heating until the temperature of the press plate reached 180 ° C. was 60 minutes, and the time from the start of cooling until the temperature of the press plate returned to room temperature was 60 minutes.
 得られた10枚の積層板の厚みをそれぞれマイクロメーターで測定したところ、最も薄い積層板の厚みは1.035mmであり、最も厚い積層板の厚みは1.066mmであった。厚み精度の高い積層板が得られることがわかった。 When the thicknesses of the 10 laminated plates obtained were each measured with a micrometer, the thickness of the thinnest laminated plate was 1.035 mm, and the thickness of the thickest laminated plate was 1.066 mm. It was found that a laminate with high thickness accuracy can be obtained.
(研磨キャリアの作製)
 上記積層板を、ルーターマシンを用いて加工して研磨キャリア1を作製した。得られた研磨キャリア1の平面図を図1に示す。図1に示すように、研磨キャリア1は、外周に駆動用のギヤ2を有するとともに、研磨される板状体を保持するための貫通孔3を5つ有する。
(Production of polishing carrier)
The laminated plate was processed using a router machine to produce a polishing carrier 1. A plan view of the obtained abrasive carrier 1 is shown in FIG. As shown in FIG. 1, the polishing carrier 1 has a driving gear 2 on the outer periphery and five through holes 3 for holding a plate-like body to be polished.
(断面観察)
 得られた研磨キャリア1の断面をレーザー顕微鏡を用いて観察した。図2は、研磨キャリア1の断面画像である。図2において、F及びFはそれぞれ基材層を示し、R及びRはそれぞれ表面樹脂層を示し、Rは中間樹脂層を示す。図2に示すとおり、得られた研磨キャリアは環状オレフィン重合体を含む樹脂組成物が含浸した不織布層(F、F)と樹脂層(R、R、R)とが交互に積層された多層構造(R/F/R/F/R)を有するものである。研磨キャリアの厚みを測定したところ、厚みは1066μm(1.066mm)であった。各層の厚さは以下の通りである。
  R:36μm
  F:248μm
  R:482μm
  F:258μm
  R:42μm
(Cross section observation)
The cross section of the obtained abrasive carrier 1 was observed using a laser microscope. FIG. 2 is a cross-sectional image of the polishing carrier 1. In FIG. 2, F 1 and F 2 each represent a base material layer, R 1 and R 3 each represent a surface resin layer, and R 2 represents an intermediate resin layer. As shown in FIG. 2, the obtained abrasive carrier has alternating nonwoven fabric layers (F 1 , F 2 ) and resin layers (R 1 , R 2 , R 3 ) impregnated with a resin composition containing a cyclic olefin polymer. It has a laminated multilayer structure (R 1 / F 1 / R 2 / F 2 / R 3 ). When the thickness of the polishing carrier was measured, the thickness was 1066 μm (1.066 mm). The thickness of each layer is as follows.
R 1 : 36 μm
F 1 : 248 μm
R 2 : 482 μm
F 2 : 258 μm
R 3 : 42 μm
[評価]
(曲げ特性の評価)
 JIS K7171に準拠して、得られた積層板の曲げ特性を測定した。具体的には、測定装置として株式会社島津製作所製「AG-10TB」を用いて、得られた10枚の研磨キャリアを1.0mm×25mm×20mm(厚さ×幅×長さ)に切断して試験片を得た。そして、これらの試験片を用いて、25℃において、試験速度1mm/min、支点間距離16mmの条件で曲げ強度(MPa)及び曲げ弾性率(MPa)を測定し、研磨キャリア10枚の平均値を求めた。その結果、曲げ強度は142.9MPaであり、曲げ弾性率は4374MPaであった。
[Evaluation]
(Evaluation of bending properties)
In accordance with JIS K7171, the bending properties of the obtained laminate were measured. Specifically, using “AG-10TB” manufactured by Shimadzu Corporation as a measuring device, the 10 obtained abrasive carriers were cut into 1.0 mm × 25 mm × 20 mm (thickness × width × length). A test piece was obtained. Then, using these test pieces, the bending strength (MPa) and the bending elastic modulus (MPa) were measured at 25 ° C. under the conditions of a test speed of 1 mm / min and a fulcrum distance of 16 mm. Asked. As a result, the bending strength was 142.9 MPa and the bending elastic modulus was 4374 MPa.
(摩耗試験)
 得られた積層板を直径100mmの円盤状に加工した後、この積層板5枚をエポキシガラス(EG)からなる研磨キャリアで保持した。そして、研磨装置を用いてEGからなる研磨キャリアを水平に移動させて、円盤状に加工された積層板を660分間研磨(荷重:178g/cm、回転数:30rpm)した。研磨材はコロイダルシリカ(株式会社フジミインコーポテッド製商品名「COMPOL-80」の10倍希釈液)である。そして、研磨試験前の積層板の厚みと研磨試験後の積層板の厚みとの差を求めることにより積層板の摩耗厚さ(μm)(積層板5枚の平均値)を求めた。この値が小さいほど耐久性に優れている。その結果、摩耗厚さは、1μmであった。
(Abrasion test)
After processing the obtained laminated plate into a disk shape having a diameter of 100 mm, the five laminated plates were held with an abrasive carrier made of epoxy glass (EG). Then, the polishing carrier made of EG was moved horizontally using a polishing apparatus, and the laminated plate processed into a disk shape was polished for 660 minutes (load: 178 g / cm 3 , rotation speed: 30 rpm). The abrasive is colloidal silica (10-fold diluted solution of trade name “COMPOL-80” manufactured by Fujimi Incorporated). And the abrasion thickness (micrometer) of a laminated board (average value of 5 laminated boards) was calculated | required by calculating | requiring the difference of the thickness of the laminated board before a grinding | polishing test, and the thickness of the laminated board after a grinding | polishing test. The smaller this value, the better the durability. As a result, the wear thickness was 1 μm.
(研磨試験)
 研磨試験では、得られた研磨キャリアを研磨装置に装着し板状体を貫通孔で保持して、研磨キャリアを水平に駆動させて板状体を6分間研磨した。本試験で研磨される板状体は、厚み1.27mmのアルミニウム基板である。また、本試験で用いた研磨材は株式会社フジミインコーポレーテッド製の「ディスクライト」であった。
(Polishing test)
In the polishing test, the obtained polishing carrier was mounted on a polishing apparatus, the plate-like body was held by the through hole, and the polishing carrier was driven horizontally to polish the plate-like body for 6 minutes. The plate-like body polished in this test is an aluminum substrate having a thickness of 1.27 mm. Further, the abrasive used in this test was “Disklite” manufactured by Fujimi Incorporated.
(研磨後の基板の評価)
 KLA-Tencor社製のウェハ検査装置「Candela 7100」を用いて、研磨後のアルミニウム基板の研磨面に存在するスクラッチを確認した。その結果、アルミニウム基板の研磨面にはスクラッチは確認されなかった。また、上記の装置を用いて、研磨後のアルミニウム基板の研磨面に異物が付着しているか否かを確認した。その結果、アルミニウム基板の研磨面で確認された異物はわずかであった。
(Evaluation of substrate after polishing)
Using a wafer inspection apparatus “Candela 7100” manufactured by KLA-Tencor, scratches present on the polished surface of the polished aluminum substrate were confirmed. As a result, no scratch was observed on the polished surface of the aluminum substrate. Moreover, it was confirmed whether the foreign material had adhered to the grinding | polishing surface of the aluminum substrate after grinding | polishing using said apparatus. As a result, few foreign substances were confirmed on the polished surface of the aluminum substrate.
実施例2
(樹脂シートの作製)
 実施例1と同様の方法で得られたペレットを日立造船株式会社製の二軸押出機に投入して製膜を行い、厚さ280μmの樹脂シートS3を得た。
Example 2
(Production of resin sheet)
Pellets obtained by the same method as in Example 1 were put into a twin screw extruder manufactured by Hitachi Zosen Corporation to form a film, and a resin sheet S3 having a thickness of 280 μm was obtained.
(不織布)
 実施例1と同様の不織布を用いた。
(Nonwoven fabric)
The same non-woven fabric as in Example 1 was used.
(積層板の作製)
 プレスプレートの間に、樹脂シートS3を3枚、上記不織布を2枚重ねた。このとき、樹脂シートS3と上記不織布とを交互に積層し、かつ両表面が樹脂シートS3になるようにした。そして、最上面と最下面に離型フィルムを配置した。これを1セットとして、15セット用意した。加圧を開始し、プレス圧力が3.5MPaになったことを確認した後、このプレス圧力を保持したままプレスプレートを加熱した。プレスプレートの温度が160℃に達したことを確認したらすぐに、プレス圧力を7.5MPaにするとともに冷却水でプレスプレートを冷却した。プレスプレートの温度が室温に戻ったら加圧を停止して、プレスプレートから積層板を取り出した。加熱を開始してからプレスプレートの温度が160℃に達するまでの時間は40分であり、冷却を開始してからプレスプレートの温度が室温に戻るまでの時間は40分であった。
(Production of laminates)
Three resin sheets S3 and two non-woven fabrics were stacked between the press plates. At this time, the resin sheet S3 and the non-woven fabric were alternately laminated so that both surfaces became the resin sheet S3. And the release film was arrange | positioned to the uppermost surface and the lowermost surface. 15 sets were prepared as one set. After pressurization was started and the press pressure was confirmed to be 3.5 MPa, the press plate was heated while maintaining the press pressure. As soon as it was confirmed that the temperature of the press plate reached 160 ° C., the press pressure was set to 7.5 MPa and the press plate was cooled with cooling water. When the temperature of the press plate returned to room temperature, the pressurization was stopped and the laminated plate was taken out from the press plate. The time from the start of heating until the temperature of the press plate reached 160 ° C. was 40 minutes, and the time from the start of cooling until the temperature of the press plate returned to room temperature was 40 minutes.
 得られた15枚の積層板の厚みをそれぞれマイクロメーターで測定したところ、最も厚い積層板の厚みは1.115mmであり、最も薄い積層板の厚みは1.095mmであった。厚み精度の高い積層板が得られることがわかった。 When the thicknesses of the 15 laminated plates obtained were each measured with a micrometer, the thickness of the thickest laminated plate was 1.115 mm, and the thickness of the thinnest laminated plate was 1.095 mm. It was found that a laminate with high thickness accuracy can be obtained.
(研磨キャリアの作製)
 実施例1と同様にして研磨キャリアを作製した。
(Production of polishing carrier)
A polishing carrier was produced in the same manner as in Example 1.
(断面観察)
 実施例1と同様にして研磨キャリアの断面を観察した。図3は研磨キャリアの断面画像である。図3に示すとおり、得られた研磨キャリアは環状オレフィン重合体を含む樹脂組成物が含浸した不織布層(F、F)と樹脂シート層(R、R、R)とが交互に積層された多層構造を有するものである。ここで、研磨キャリアの厚みを測定したところ、厚みは1115μm(1.115mm)であった。各層の厚さは以下の通りである。
  R:215μm
  F:268μm
  R:135μm
  F:275μm
  R:222μm
(Cross section observation)
The cross section of the polishing carrier was observed in the same manner as in Example 1. FIG. 3 is a cross-sectional image of the polishing carrier. As shown in FIG. 3, the obtained abrasive carrier has alternating nonwoven fabric layers (F 1 , F 2 ) and resin sheet layers (R 1 , R 2 , R 3 ) impregnated with a resin composition containing a cyclic olefin polymer. It has a multi-layer structure laminated. Here, when the thickness of the polishing carrier was measured, the thickness was 1115 μm (1.115 mm). The thickness of each layer is as follows.
R 1 : 215 μm
F 1 : 268 μm
R 2 : 135 μm
F 2 : 275 μm
R 3 : 222 μm
[評価]
(曲げ特性の評価)
 実施例1と同様にして曲げ強度(MPa)及び曲げ弾性率(MPa)を測定した。その結果、曲げ強度は137.8MPaであり、曲げ弾性率は3219MPaであった。
[Evaluation]
(Evaluation of bending properties)
The bending strength (MPa) and bending elastic modulus (MPa) were measured in the same manner as in Example 1. As a result, the bending strength was 137.8 MPa and the bending elastic modulus was 3219 MPa.
(研磨試験)
 実施例1と同様にして研磨キャリアを用いて研磨試験を行った。
(Polishing test)
A polishing test was performed using a polishing carrier in the same manner as in Example 1.
(研磨後の基板の評価)
 実施例1と同様にして研磨後のアルミニウム基板の研磨面に存在するスクラッチを確認した。その結果、アルミニウム基板の研磨面にはスクラッチは確認されなかった。また、実施例1と同様の装置を用いて、研磨後のアルミニウム基板の研磨面に異物が付着しているか否かを確認した。その結果、アルミニウム基板の研磨面で確認された異物はわずかであった。
(Evaluation of substrate after polishing)
As in Example 1, scratches present on the polished surface of the polished aluminum substrate were confirmed. As a result, no scratch was observed on the polished surface of the aluminum substrate. Further, using the same apparatus as in Example 1, it was confirmed whether or not foreign matter had adhered to the polished surface of the polished aluminum substrate. As a result, few foreign substances were confirmed on the polished surface of the aluminum substrate.
比較例1
(ワニスの調製)
 熱硬化性樹脂としてのビスフェノールA型エポキシ樹脂と、硬化剤としてのアミン系化合物とをトルエン、メタノール及びメチルセロソルブの混合溶媒に加えて溶解させてワニスを調製した。
Comparative Example 1
(Preparation of varnish)
A varnish was prepared by adding a bisphenol A type epoxy resin as a thermosetting resin and an amine compound as a curing agent to a mixed solvent of toluene, methanol and methyl cellosolve and dissolving them.
(プリプレグの作製)
 上記ワニスを容器に入れ、ポリフェニレンサルファイド不織布(PPS不織布)を容器内のワニスに浸漬した。その後、PPS不織布を乾燥してワニスを半硬化させてプリプレグを得た。得られたプリプレグにおけるエポキシ樹脂の含有率(Rc)は61.6質量%であった。ここで用いたPPS不織布は、東レ株式会社製の湿式不織布「トルコンペーパー
PS0100S」(目付:108g/m、厚み:115μm、密度:0.94g/cm)である。「トルコンペーパー PS0100S」は、高融点のPPS樹脂からなる繊維と、当該樹脂よりも融点の低いPPS樹脂からなる繊維とを分散媒に分散させた後、漉きあげて熱圧着して得られたものであり、接着剤を含まない。
(Preparation of prepreg)
The said varnish was put into the container and the polyphenylene sulfide nonwoven fabric (PPS nonwoven fabric) was immersed in the varnish in a container. Then, the PPS nonwoven fabric was dried and the varnish was semi-cured to obtain a prepreg. The epoxy resin content (Rc) in the obtained prepreg was 61.6% by mass. The PPS nonwoven fabric used here is a wet nonwoven fabric “Torcon Paper PS0100S” manufactured by Toray Industries, Inc. (weight per unit: 108 g / m 2 , thickness: 115 μm, density: 0.94 g / cm 3 ). “Torcon Paper PS0100S” was obtained by dispersing fibers made of a high-melting point PPS resin and fibers made of a PPS resin having a melting point lower than that of the resin in a dispersion medium, and then rolling and thermocompression bonding. And does not contain adhesive.
(積層板の作製)
 プレスプレートの間に、上記プリプレグを5枚重ね最上面と最下面に離型フィルムを配置した。これを10セット用意して、温度160℃、圧力1.5MPaで60分間加熱加圧成形を行って樹脂を硬化させ、積層板を10枚得た。得られた積層板の厚みをそれぞれマイクロメーターで測定したところ、最も厚い積層板の厚みは1.015mmであり、最も薄い積層板の厚みは0.992mmであった。厚み精度の高い積層板が得られることがわかった。
(Production of laminates)
Five release prepregs were stacked between the press plates, and release films were placed on the uppermost and lowermost surfaces. Ten sets of these were prepared, and the resin was cured by heating and pressing at a temperature of 160 ° C. and a pressure of 1.5 MPa for 60 minutes to obtain 10 laminates. When the thickness of the obtained laminate was measured with a micrometer, the thickness of the thickest laminate was 1.015 mm, and the thickness of the thinnest laminate was 0.992 mm. It was found that a laminate with high thickness accuracy can be obtained.
(研磨キャリアの作製)
 実施例1と同様にして研磨キャリアを作製した。
(Production of polishing carrier)
A polishing carrier was produced in the same manner as in Example 1.
(断面観察)
 得られた研磨キャリアの断面をレーザー顕微鏡を用いて観察した。図4は、研磨キャリアの断面画像である。図4に示すとおり、得られた研磨キャリアはエポキシ樹脂を含むPPS不織布層(F~F)とエポキシ樹脂層(R~R)とが交互に積層された多層構造を有するものであり、表層(R、R)はエポキシ樹脂層である。ここで、研磨キャリアの厚みを測定したところ、厚みは992μmであった。Fの厚みは101μmであり、Fの厚みは98μmであり、Fの厚みは122μmであり、Fの厚みは96μmであり、Fの厚みは94μmであった。Rの厚みは52μmであり、Rの厚みは100μmであり、Rの厚みは92μmであり、Rの厚みは84μmであり、Rの厚みは95μmであり、Rの厚みは58μmであった。
(Cross section observation)
The cross section of the obtained abrasive carrier was observed using a laser microscope. FIG. 4 is a cross-sectional image of the polishing carrier. As shown in FIG. 4, the obtained abrasive carrier has a multilayer structure in which PPS nonwoven fabric layers (F 1 to F 5 ) containing epoxy resin and epoxy resin layers (R 2 to R 5 ) are alternately laminated. Yes, the surface layers (R 1 , R 6 ) are epoxy resin layers. Here, when the thickness of the polishing carrier was measured, the thickness was 992 μm. The thickness of F 1 was 101 μm, the thickness of F 2 was 98 μm, the thickness of F 3 was 122 μm, the thickness of F 4 was 96 μm, and the thickness of F 5 was 94 μm. The thickness of R 1 is 52 μm, the thickness of R 2 is 100 μm, the thickness of R 3 is 92 μm, the thickness of R 4 is 84 μm, the thickness of R 5 is 95 μm, and the thickness of R 6 is It was 58 μm.
[評価]
(摩耗試験)
 実施例1と同様にして摩耗試験を行った。その結果、摩耗厚さは7μmであった。
[Evaluation]
(Abrasion test)
A wear test was conducted in the same manner as in Example 1. As a result, the wear thickness was 7 μm.
(研磨試験)
 実施例1と同様にして研磨キャリアを用いて研磨試験を行った。
(Polishing test)
A polishing test was performed using a polishing carrier in the same manner as in Example 1.
(研磨後の基板の評価)
 実施例1と同様にして研磨後のアルミニウム基板の研磨面に存在するスクラッチを確認した。その結果、アルミニウム基板の研磨面にはスクラッチは確認されなかった。また、実施例1と同様の装置を用いて、研磨後のアルミニウム基板の研磨面に異物が付着しているか否かを確認した。その結果、アルミニウム基板の研磨面で確認された異物はわずかであった。
(Evaluation of substrate after polishing)
As in Example 1, scratches present on the polished surface of the polished aluminum substrate were confirmed. As a result, no scratch was observed on the polished surface of the aluminum substrate. Further, using the same apparatus as in Example 1, it was confirmed whether or not foreign matter had adhered to the polished surface of the polished aluminum substrate. As a result, few foreign substances were confirmed on the polished surface of the aluminum substrate.
比較例2
 比較例2は、相模ピーシーアイ株式会社製の樹脂キャリア「アラミドキャリア」を用いて試験を行った例である。このキャリアはアラミド繊維の不織布にエポキシ樹脂を含浸させたものである。得られた研磨キャリアの断面をレーザー顕微鏡を用いて観察した。図5は上記樹脂キャリアの断面画像である。図5に示すとおり、上記樹脂キャリアは多層構造を有するものではなく、表面に樹脂層を有していなかった。また、図5において線で囲んだ箇所に示されているように、上記樹脂キャリアにはヒゲが発生していることがわかった。
Comparative Example 2
Comparative Example 2 is an example in which a test was performed using a resin carrier “aramid carrier” manufactured by Sagami PC Co., Ltd. This carrier is an aramid fiber non-woven fabric impregnated with an epoxy resin. The cross section of the obtained abrasive carrier was observed using a laser microscope. FIG. 5 is a cross-sectional image of the resin carrier. As shown in FIG. 5, the resin carrier did not have a multilayer structure, and did not have a resin layer on the surface. Moreover, as shown by the part enclosed with the line in FIG. 5, it turned out that the beard has generate | occur | produced in the said resin carrier.
[評価]
(研磨試験)
 実施例1と同様にして研磨キャリアを用いて研磨試験を行った。
[Evaluation]
(Polishing test)
A polishing test was performed using a polishing carrier in the same manner as in Example 1.
(研磨後の基板の評価)
 研磨後のアルミニウム基板の研磨面に存在するスクラッチを確認したところ、スクラッチは確認されなかった。しかしながら、研磨後のアルミニウム基板の研磨面に異物が付着しているか否かを確認したところ、研磨面に実施例1の研磨キャリアに比べて倍以上の数の異物が付着していることが確認された。
(Evaluation of substrate after polishing)
When scratches present on the polished surface of the polished aluminum substrate were confirmed, no scratches were confirmed. However, when it was confirmed whether or not foreign matter had adhered to the polished surface of the aluminum substrate after polishing, it was confirmed that more than twice as many foreign matters had adhered to the polished surface as compared to the polishing carrier of Example 1. It was done.
比較例3
 比較例3は、相模ピーシーアイ株式会社製の樹脂キャリア「EG(エポキシガラス)キャリア」を用いて試験を行った例である。このキャリアはエポキシ樹脂を含浸させたガラス繊維の織布を重ねて硬化させたものである。得られた研磨キャリアの断面をレーザー顕微鏡を用いて観察した。図6は上記樹脂キャリアの断面画像である。図6に示すとおり、上記樹脂キャリアは3層のガラス繊維織布層を有する多層構造を有することがわかった。しかしながら、上記樹脂キャリアはガラス繊維層の間にも、表面にも、繊維の含まれていない樹脂層を有していなかった。
Comparative Example 3
Comparative Example 3 is an example in which a test was performed using a resin carrier “EG (epoxy glass) carrier” manufactured by Sagami PC Co., Ltd. This carrier is obtained by overlapping and curing glass fiber woven fabric impregnated with an epoxy resin. The cross section of the obtained abrasive carrier was observed using a laser microscope. FIG. 6 is a cross-sectional image of the resin carrier. As shown in FIG. 6, the resin carrier was found to have a multilayer structure having three glass fiber woven fabric layers. However, the resin carrier did not have a resin layer containing no fiber between the glass fiber layers or the surface.
[評価]
(摩耗試験)
 実施例1と同様にして摩耗試験を行った。その結果、摩耗厚さは10μmであった。
[Evaluation]
(Abrasion test)
A wear test was conducted in the same manner as in Example 1. As a result, the wear thickness was 10 μm.
(研磨試験)
 実施例1と同様にして研磨キャリアを用いて研磨試験を行った。
(Polishing test)
A polishing test was performed using a polishing carrier in the same manner as in Example 1.
(研磨後の基板の評価)
 研磨後のアルミニウム基板の研磨面に存在するスクラッチを確認したところ、スクラッチが確認された。
(Evaluation of substrate after polishing)
When scratches existing on the polished surface of the polished aluminum substrate were confirmed, scratches were confirmed.
  1 研磨キャリア
  2 ギヤ
  3 貫通孔
1 Polishing carrier 2 Gear 3 Through hole

Claims (12)

  1.  基材層と樹脂層とを有する積層板からなる研磨キャリアであって;
     前記基材層が、樹脂が含浸された有機繊維集合体からなり、
     前記樹脂層が、環状オレフィン重合体(A)を含み前記有機繊維を含まず、
     前記積層板が複数の基材層の間に樹脂層を有するとともに両表面にも樹脂層を有することを特徴とする研磨キャリア。
    A polishing carrier comprising a laminate having a base material layer and a resin layer;
    The base layer is composed of an organic fiber assembly impregnated with a resin,
    The resin layer contains a cyclic olefin polymer (A) and does not contain the organic fiber,
    An abrasive carrier, wherein the laminate has a resin layer between a plurality of base material layers and also has a resin layer on both surfaces.
  2.  前記樹脂層が、環状オレフィン重合体(A)と軟質共重合体(B)とを含む樹脂組成物からなる請求項1に記載の研磨キャリア。 The abrasive carrier according to claim 1, wherein the resin layer comprises a resin composition containing a cyclic olefin polymer (A) and a soft copolymer (B).
  3.  前記樹脂層が、ガラス転移温度が60~200℃の環状オレフィン重合体(A)100質量部、オレフィン、ジエン及び芳香族ビニル炭化水素からなる群から選択される少なくとも2種以上の単量体を重合してなり、ガラス転移温度が0℃以下である軟質共重合体(B)1~50質量部、ラジカル開始剤(C)0.001~1質量部、及びラジカル重合性の官能基を分子内に2個以上有する多官能化合物(D)0~1質量部を溶融混練してなる樹脂組成物からなる請求項2に記載の研磨キャリア。 The resin layer comprises at least two monomers selected from the group consisting of 100 parts by mass of a cyclic olefin polymer (A) having a glass transition temperature of 60 to 200 ° C., an olefin, a diene, and an aromatic vinyl hydrocarbon. 1 to 50 parts by weight of a soft copolymer (B) having a glass transition temperature of 0 ° C. or lower, 0.001 to 1 part by weight of a radical initiator (C), and a radical polymerizable functional group The abrasive carrier according to claim 2, comprising a resin composition obtained by melt-kneading 0 to 1 part by mass of a polyfunctional compound (D) having two or more thereof.
  4.  前記環状オレフィン重合体(A)が、酸変性環状オレフィン重合体である請求項1~3のいずれかに記載の研磨キャリア。 The abrasive carrier according to any one of claims 1 to 3, wherein the cyclic olefin polymer (A) is an acid-modified cyclic olefin polymer.
  5.  前記有機繊維集合体が全芳香族ポリエステル繊維、アラミド繊維、ポリフェニレンサルファイド繊維及びポリパラフェニレンベンゾビスオキサゾール繊維からなる群から選択される少なくとも1種の繊維である請求項1~4のいずれかに記載の研磨キャリア。 The organic fiber aggregate is at least one fiber selected from the group consisting of wholly aromatic polyester fibers, aramid fibers, polyphenylene sulfide fibers, and polyparaphenylene benzobisoxazole fibers. Polishing carrier.
  6.  前記有機繊維集合体が不織布である請求項1~5のいずれかに記載の研磨キャリア。 The abrasive carrier according to any one of claims 1 to 5, wherein the organic fiber aggregate is a nonwoven fabric.
  7.  前記不織布が長繊維不織布である請求項6に記載の研磨キャリア。 The polishing carrier according to claim 6, wherein the nonwoven fabric is a long-fiber nonwoven fabric.
  8.  前記基材層の厚みが10~1000μmであり、前記積層板の両表面の樹脂層の厚みがいずれも10~1000μmであり、かつ前記基材層の間の樹脂層の厚みが20~1000μmである請求項1~7のいずれかに記載の研磨キャリア。 The thickness of the base layer is 10 to 1000 μm, the thickness of the resin layers on both surfaces of the laminate is 10 to 1000 μm, and the thickness of the resin layer between the base layers is 20 to 1000 μm. The polishing carrier according to any one of claims 1 to 7.
  9.  前記研磨キャリアの厚みが100~5000μmである請求項1~8のいずれかに記載の研磨キャリア。 The polishing carrier according to any one of claims 1 to 8, wherein the thickness of the polishing carrier is 100 to 5000 µm.
  10.  前記基材層の間の樹脂層の厚みが、前記積層板の両表面の樹脂層の厚みの2倍以上である請求項1~9のいずれかに記載の研磨キャリア。 The abrasive carrier according to any one of claims 1 to 9, wherein the thickness of the resin layer between the base layers is at least twice the thickness of the resin layers on both surfaces of the laminate.
  11.  請求項1~10に記載の研磨キャリアの製造方法であって;
     前記有機繊維集合体からなる複数の繊維シートと前記環状オレフィン重合体(A)を含む複数の樹脂シートとを該樹脂シートが最外層になるように重ね合わせて積層体を得てから、
     該積層体を加熱加圧して該樹脂シートを溶融させ、溶融した樹脂を前記有機繊維集合体に含浸させてから冷却して積層板を得て、
     引き続き、前記積層板に、研磨される板状体を保持するための貫通孔を形成することを特徴とする研磨キャリアの製造方法。
    A method for producing an abrasive carrier according to claim 1;
    A plurality of fiber sheets made of the organic fiber aggregate and a plurality of resin sheets containing the cyclic olefin polymer (A) are stacked so that the resin sheet is an outermost layer, to obtain a laminate,
    The laminate is heated and pressurized to melt the resin sheet, the molten resin is impregnated into the organic fiber assembly, and then cooled to obtain a laminate,
    Then, the manufacturing method of the grinding | polishing carrier characterized by forming the through-hole for hold | maintaining the plate-shaped body grind | polished in the said laminated board.
  12.  請求項1~10のいずれかに記載の研磨キャリアで板状体を保持して該板状体を研磨する研磨方法。 A polishing method for polishing a plate by holding the plate with the polishing carrier according to any one of claims 1 to 10.
PCT/JP2015/061513 2014-05-08 2015-04-14 Polishing carrier and method for manufacturing same WO2015170556A1 (en)

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