WO2015147292A1 - Double fluid spraying device - Google Patents
Double fluid spraying device Download PDFInfo
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- WO2015147292A1 WO2015147292A1 PCT/JP2015/059744 JP2015059744W WO2015147292A1 WO 2015147292 A1 WO2015147292 A1 WO 2015147292A1 JP 2015059744 W JP2015059744 W JP 2015059744W WO 2015147292 A1 WO2015147292 A1 WO 2015147292A1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
- B05B7/02—Spray pistols; Apparatus for discharge
- B05B7/04—Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge
- B05B7/0416—Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid
- B05B7/0441—Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid with one inner conduit of liquid surrounded by an external conduit of gas upstream the mixing chamber
- B05B7/0475—Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid with one inner conduit of liquid surrounded by an external conduit of gas upstream the mixing chamber with means for deflecting the peripheral gas flow towards the central liquid flow
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
- B05B7/24—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas with means, e.g. a container, for supplying liquid or other fluent material to a discharge device
- B05B7/26—Apparatus in which liquids or other fluent materials from different sources are brought together before entering the discharge device
- B05B7/262—Apparatus in which liquids or other fluent materials from different sources are brought together before entering the discharge device a liquid and a gas being brought together before entering the discharge device
- B05B7/267—Apparatus in which liquids or other fluent materials from different sources are brought together before entering the discharge device a liquid and a gas being brought together before entering the discharge device the liquid and the gas being both under pressure
Definitions
- a two-fluid spray device includes a two-fluid nozzle that sprays an atomized fluid obtained by mixing a liquid and a gas, a liquid flow passage that supplies the liquid to the two-fluid nozzle, A liquid supply stop means provided in the liquid flow passage for stopping the supply of the liquid to the two-fluid nozzle; and the liquid in the liquid flow passage between the liquid supply stop means and the two-fluid nozzle. Liquid discharging means for discharging.
- FIG. 1 is a schematic configuration diagram of a system to which a two-fluid spray device according to an embodiment of the present invention is applied.
- FIG. 2 is a schematic configuration diagram showing a state during normal spraying in the two-fluid spraying device by the gas pressurization method of the present embodiment.
- FIG. 3 is a schematic configuration diagram illustrating a state in which stop control for preventing dripping is started in the two-fluid spray device of the present embodiment.
- FIG. 4 is a schematic configuration diagram showing a state in which the drain valve is opened during the pressure drop of the compressed gas in the two-fluid spray device of the present embodiment.
- FIG. 1 is a schematic configuration diagram of a system to which a two-fluid spray device according to an embodiment of the present invention is applied.
- FIG. 2 is a schematic configuration diagram showing a state during normal spraying in the two-fluid spraying device by the gas pressurization method of the present embodiment.
- FIG. 3 is a schematic configuration diagram illustrating
- the air conditioning control panel 39 detects the temperature and humidity in the clean room 31 with a detector.
- the air conditioning control panel 39 changes the command of the proportional control valve 41 of the chilled water supply system supplied to the cooling coil 34 built in the air conditioner 33 according to the difference between the detection result by the detector and the target value,
- the command of the proportional control valve 42 of the hot water supply system supplied to the heating coil 35 incorporated in the machine 33 is changed.
- the two-fluid spray header unit 36 having a plurality of two-fluid nozzles 9 and the atmosphere sprayed from the two-fluid spray header unit 36 are forcibly sent to the clean room 31.
- the fan 37 and the steam humidification unit 38 are provided.
- the steam humidification unit 38 is supplied with steam from a steam proportional control valve 43 installed outside the air conditioner 33.
- the two-fluid nozzle 9a includes two gas flow ejection units 91a and a liquid flow ejection unit 92a.
- the liquid flow ejecting unit 92a is provided to eject a liquid flow.
- the liquid output from the liquid flow ejecting unit 92a is a pressurized liquid in which the liquid is pressurized.
- the two gas flow ejecting units 91a are inclined in the direction of the liquid flow output from the liquid flow ejecting unit 92a, and eject the gas flow, respectively.
- the gas output from the gas flow injection unit 91a is a compressed gas in which the gas is compressed.
- Each of the two two-fluid nozzles 9b includes two gas flow ejection units 91b and a liquid flow ejection unit 92b.
- the two gas flows output from the two gas flow injection units 91b and the liquid flow output from the liquid flow injection unit 92b are all output in the same direction.
- the liquid flow is output from the liquid flow injection unit 92b so as to be sandwiched between the two gas flows output from the two gas flow injection units 91b.
- the two gas flows are output at high speed adjacent to the liquid flow, so that the liquid is atomized.
- the liquid pumped up by the siphon principle is supplied to the liquid flow ejection unit 92b.
- the gas supplied to the two gas flow ejection units 91b may be compressed or not compressed.
- the drainage system D branches off from the section between the valve 18 of the pressurized liquid piping 3 of the pressurized liquid supply system L and the two-fluid nozzle 9.
- the drainage system D discharges the liquid in the pressurized liquid pipe 19 to the outside.
- the drainage system D includes a drainage pipe 19 and a drainage valve 20.
- the drainage pipe 19 is a pipe branched from the pressurized liquid pipe 3.
- the drainage valve 20 is provided in the drainage pipe 19 and is located at a position lower than the injection part of the two-fluid nozzle 9.
- the drainage valve 20 is opened when the valve 18 is closed, so that the inside of the pressurized liquid pipe 19 is set to atmospheric pressure (or an external pressure connected to the drainage pipe 19), and the inside of the pressurized liquid pipe 19 is set. Drain the liquid. When the liquid is not discharged, the drain valve 20 is closed.
- FIG. 5 shows a state where the spraying operation of the two-fluid nozzle 9 is stopped.
- the drain valve 20 is closed.
- the drain valve 20 discharges an appropriate amount of liquid by opening a preset opening time Top.
- spraying can be stopped without causing dripping at the two-fluid nozzle 9.
- the liquid is a relatively valuable liquid such as pure water, it is desirable that the amount of discharged liquid is small.
- the gas in the pipe By configuring the gas in the pipe to be naturally discharged from the two-fluid nozzle 9, it is possible to prevent gas from being accumulated in the pipe of the pressurized liquid supply system L. Thereby, it can prevent taking time until gas escapes at the time of the next spraying start. Further, by preventing gas accumulation in the piping of the pressurized liquid supply system L, it is possible to reliably execute dripping prevention control when spraying is stopped.
- a configuration in which a liquid flow path in which the liquid header pipe 12 and the liquid buffer pipes 13 and 13e are integrally formed may be formed.
- the two-fluid nozzle 9 may be directly attached to the openings of the liquid buffer pipes 13 and 13 e without providing the pipe connection joint 14 and the pressurized liquid pipe 15.
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Abstract
The double fluid spraying device is provided with: double fluid nozzles (9) for spraying an atomized fluid obtained by mixing a liquid and a gas; a liquid flow passage for supplying the liquid to the double fluid nozzles (9); a valve (18), which is provided in the liquid flow passage and is for stopping the supply of the liquid to the double fluid nozzles (9); and a liquid discharge valve (20), which is for discharging the liquid in the liquid flow passage between the valve (18) and the double fluid nozzles (9).
Description
本発明は、気体及び液体を混合して噴霧する二流体噴霧装置に関する。
The present invention relates to a two-fluid spray device that mixes and sprays gas and liquid.
噴霧システムにおいて、水を吸い上げるサイフォンの特性を持ったノズルと、ノズルが液体をくみ上げるための連続給水式タンクにより、二流体ノズルから液だれを防止しながら噴霧することが開示されている（特許文献１参照）。
In a spraying system, it is disclosed to spray while preventing dripping from a two-fluid nozzle by a nozzle having siphon characteristics for sucking water and a continuous water supply tank for the nozzle to pump liquid (Patent Document) 1).
二流体ノズルを用いる加湿器において、貯水室内の液体を少量に保持し、簡単な構成とすることが開示されている（特許文献２参照）。
In a humidifier using a two-fluid nozzle, it is disclosed that the liquid in the water storage chamber is held in a small amount and has a simple configuration (see Patent Document 2).
液だれを防止するために、気流が放出される風洞部と、風洞部を構成する排風開口部の直径範囲内に配設された噴霧ノズルとを備える噴霧装置が開示されている（特許文献３参照）。
In order to prevent dripping, a spray device is disclosed that includes a wind tunnel portion from which airflow is discharged and a spray nozzle disposed within a diameter range of a wind exhaust opening that forms the wind tunnel portion (Patent Document). 3).
複数のポンプを用いて液体の連続吐出を可能とする液体供給システムにおいて、各ポンプにおける液体吐出状態を安定化させ、高精度な吐出量制御を実現することが開示されている（特許文献４参照）。
In a liquid supply system that enables continuous liquid discharge using a plurality of pumps, it is disclosed that the liquid discharge state in each pump is stabilized and high-precision discharge amount control is realized (see Patent Document 4). ).
しかしながら、二流体噴霧装置の構造によっては、噴霧を停止した時に、液だれが発生することがある。例えば、液体の供給を停止した後に、液体流通路に残った圧縮空気が膨張して、液体が押出されることで、液だれが発生することがある。
However, depending on the structure of the two-fluid spray device, dripping may occur when spraying is stopped. For example, after the supply of the liquid is stopped, the compressed air remaining in the liquid flow path expands and the liquid is pushed out, so that dripping may occur.
本発明の目的は、液だれを防止することのできる二流体噴霧装置を提供することにある。
An object of the present invention is to provide a two-fluid spray device that can prevent dripping.
本発明の観点に従った二流体噴霧装置は、液体と気体とを混合して得られる霧化流体を噴霧する二流体ノズルと、前記二流体ノズルに前記液体を供給する液体流通路と、前記液体流通路に設けられ、前記二流体ノズルへの前記液体の供給を停止する液体供給停止手段と、前記液体供給停止手段と前記二流体ノズルとの間の前記液体流通路内にある前記液体を排出する液体排出手段とを備える。
A two-fluid spray device according to an aspect of the present invention includes a two-fluid nozzle that sprays an atomized fluid obtained by mixing a liquid and a gas, a liquid flow passage that supplies the liquid to the two-fluid nozzle, A liquid supply stop means provided in the liquid flow passage for stopping the supply of the liquid to the two-fluid nozzle; and the liquid in the liquid flow passage between the liquid supply stop means and the two-fluid nozzle. Liquid discharging means for discharging.
以下、実施形態について、図面を参照して説明する。
Hereinafter, embodiments will be described with reference to the drawings.
（実施形態）
図１を参照して、本実施形態に係る二流体噴霧装置が適用されるシステムの概要について説明する。なお、図面における同一部分には同一符号を付して重複する説明を適宜省略し、異なる部分について主に述べる。 (Embodiment)
With reference to FIG. 1, the outline | summary of the system with which the two-fluid spraying apparatus which concerns on this embodiment is applied is demonstrated. In addition, the same code | symbol is attached | subjected to the same part in drawing, the overlapping description is abbreviate | omitted suitably, and a different part is mainly described.
図１を参照して、本実施形態に係る二流体噴霧装置が適用されるシステムの概要について説明する。なお、図面における同一部分には同一符号を付して重複する説明を適宜省略し、異なる部分について主に述べる。 (Embodiment)
With reference to FIG. 1, the outline | summary of the system with which the two-fluid spraying apparatus which concerns on this embodiment is applied is demonstrated. In addition, the same code | symbol is attached | subjected to the same part in drawing, the overlapping description is abbreviate | omitted suitably, and a different part is mainly described.
本体ユニット１００は、二流体噴霧装置を構成するユニットである。クリーンルーム３１内には、半導体製造装置３２が設置される。クリーンルーム３１内の温度及び湿度が所定値になるように、クリーンルーム３１と空調機３３との間で給気及び還気が行われる。
The main unit 100 is a unit constituting a two-fluid spray device. A semiconductor manufacturing apparatus 32 is installed in the clean room 31. Air supply and return air are performed between the clean room 31 and the air conditioner 33 so that the temperature and humidity in the clean room 31 become predetermined values.
空調制御盤３９は、クリーンルーム３１内の温度及び湿度を検出器で検出する。空調制御盤３９は、検出器による検出結果と目標値との差に応じて、空調機３３に内蔵された冷却コイル３４に供給する冷水供給系の比例制御弁４１の指令を変更したり、空調機３３に内蔵された加熱コイル３５に供給する温水供給系の比例制御弁４２の指令を変更したりする。
The air conditioning control panel 39 detects the temperature and humidity in the clean room 31 with a detector. The air conditioning control panel 39 changes the command of the proportional control valve 41 of the chilled water supply system supplied to the cooling coil 34 built in the air conditioner 33 according to the difference between the detection result by the detector and the target value, The command of the proportional control valve 42 of the hot water supply system supplied to the heating coil 35 incorporated in the machine 33 is changed.
これ以外の構成として、空調機３３の内部には、複数の二流体ノズル９を備えた二流体噴霧ヘッダーユニット３６、二流体噴霧ヘッダーユニット３６から噴霧される雰囲気をクリーンルーム３１に強制的に送るためのファン３７、及び蒸気加湿ユニット３８を備えている。蒸気加湿ユニット３８には、空調機３３の外部に設置された蒸気系の比例制御弁４３からの蒸気が供給される。
As a configuration other than this, in the air conditioner 33, the two-fluid spray header unit 36 having a plurality of two-fluid nozzles 9 and the atmosphere sprayed from the two-fluid spray header unit 36 are forcibly sent to the clean room 31. The fan 37 and the steam humidification unit 38 are provided. The steam humidification unit 38 is supplied with steam from a steam proportional control valve 43 installed outside the air conditioner 33.
二流体噴霧制御盤４０には、空調制御盤３９から蒸気加湿指令が与えられる。二流体噴霧制御盤４０は、蒸気加湿指令に基づいて、比例制御弁４３に指令を与える。二流体噴霧制御盤４０には、加圧液体供給系Ｌ及び圧縮気体供給系Ｇが接続される。加圧液体供給系Ｌは、液体として、例えば、純水を供給する。圧縮気体供給系Ｇは、気体として、例えば、空気を供給する。加圧液体供給系Ｌからの加圧液体及び圧縮気体供給系Ｇからの圧縮気体は、それぞれ二流体噴霧ヘッダーユニット３６の各二流体ノズル９に供給されるように配管が設けられている。
A steam humidification command is given to the two-fluid spray control panel 40 from the air conditioning control panel 39. The two-fluid spray control panel 40 gives a command to the proportional control valve 43 based on the steam humidification command. A pressurized liquid supply system L and a compressed gas supply system G are connected to the two-fluid spray control panel 40. The pressurized liquid supply system L supplies, for example, pure water as a liquid. The compressed gas supply system G supplies, for example, air as a gas. Pipes are provided so that the pressurized liquid from the pressurized liquid supply system L and the compressed gas from the compressed gas supply system G are supplied to the two-fluid nozzles 9 of the two-fluid spray header unit 36, respectively.
二流体ノズル９は、液体と気体を混合させて、霧化された流体（霧化流体）を使用先に噴霧するノズルである。
The two-fluid nozzle 9 is a nozzle that mixes a liquid and a gas and sprays the atomized fluid (atomized fluid) on the use destination.
図８及び図９を参照して、二流体ノズル９として、２つの形式の二流体ノズル９ａ，９ｂについて説明する。なお、ここでは、２つの形式の二流体ノズル９ａ，９ｂについて説明するが、その他の形式の二流体ノズルを本実施形態に係る二流体ノズル９として用いてもよい。
8 and FIG. 9, two types of two- fluid nozzles 9 a and 9 b will be described as the two-fluid nozzle 9. Although two types of two- fluid nozzles 9a and 9b will be described here, other types of two-fluid nozzles may be used as the two-fluid nozzle 9 according to this embodiment.
図８に示す逆圧方式（気体加圧方式）の二流体ノズル９ａについて説明する。
A description will be given of the two-fluid nozzle 9a of the reverse pressure method (gas pressurization method) shown in FIG.
二流体ノズル９ａは、２つの気体流噴射部９１ａ及び液体流噴射部９２ａを備える。液体流噴射部９２ａは、液体流を噴射するように設けられている。液体流噴射部９２ａが出力する液体は、液体が加圧された加圧液体である。２つの気体流噴射部９１ａは、液体流噴射部９２ａから出力される液体流の方向に傾けて、それぞれ気体流を噴射する。気体流噴射部９１ａが出力する気体は、気体が圧縮された圧縮気体である。２つの気体流噴射部９１ａからそれぞれ出力される気体流は、互いに衝突し、かつ液体流噴射部９２ａから出力される液体流に衝突する。液体流は、２つの気体流と衝突し、混合されることにより、霧化される。二流体ノズル９ａは、内部に設けられた混合エリアで液体流と２つの気体流が混合される内部混合型のノズルである。液体が霧化されるのであれば、二流体ノズル９ａの外部で混合されてもよい。二流体ノズル９ａは、噴霧を停止させると、液体流噴射部９２ａから圧縮気体が逆流する逆圧方式のノズルである。気体加圧方式の二流体ノズル９ａは、高水圧、高精度、及び高速応答であり、噴霧量を制御することができる。
The two-fluid nozzle 9a includes two gas flow ejection units 91a and a liquid flow ejection unit 92a. The liquid flow ejecting unit 92a is provided to eject a liquid flow. The liquid output from the liquid flow ejecting unit 92a is a pressurized liquid in which the liquid is pressurized. The two gas flow ejecting units 91a are inclined in the direction of the liquid flow output from the liquid flow ejecting unit 92a, and eject the gas flow, respectively. The gas output from the gas flow injection unit 91a is a compressed gas in which the gas is compressed. The gas flows respectively output from the two gas flow ejection units 91a collide with each other and collide with the liquid flow output from the liquid flow ejection unit 92a. The liquid stream collides with the two gas streams and is atomized by mixing. The two-fluid nozzle 9a is an internal mixing type nozzle in which a liquid flow and two gas flows are mixed in a mixing area provided inside. If the liquid is atomized, it may be mixed outside the two-fluid nozzle 9a. The two-fluid nozzle 9a is a counter-pressure type nozzle in which the compressed gas flows backward from the liquid flow ejection unit 92a when spraying is stopped. The gas pressurization type two-fluid nozzle 9a has high water pressure, high accuracy, and high-speed response, and can control the spray amount.
図９に示すサイフォン特性を持つ二流体ノズル９ｂについて説明する。
A two-fluid nozzle 9b having siphon characteristics shown in FIG. 9 will be described.
２つの二流体ノズル９ｂは、それぞれ２つの気体流噴射部９１ｂ及び液体流噴射部９２ｂを備える。２つの気体流噴射部９１ｂから出力される２つの気体流及び液体流噴射部９２ｂから出力される液体流は、全て同一方向に出力される。２つの気体流噴射部９１ｂから出力される２つの気体流に挟まれるように、液体流噴射部９２ｂから液体流が出力される。液体流に隣接して２つの気体流が高速に出力されることで、液体が霧化される。液体流噴射部９２ｂには、サイフォンの原理により汲み上げられた液体が供給される。２つの気体流噴射部９１ｂに供給される気体は、圧縮されていても、圧縮されていなくてもよい。また、２つの二流体ノズル９ｂから出力される液体を衝突させることで、霧化された液体の粒子がさらに細くなる。二流体ノズル９ｂは、気体が液体流噴射部９２ｂから逆流（逆圧）しないノズルである。
Each of the two two-fluid nozzles 9b includes two gas flow ejection units 91b and a liquid flow ejection unit 92b. The two gas flows output from the two gas flow injection units 91b and the liquid flow output from the liquid flow injection unit 92b are all output in the same direction. The liquid flow is output from the liquid flow injection unit 92b so as to be sandwiched between the two gas flows output from the two gas flow injection units 91b. The two gas flows are output at high speed adjacent to the liquid flow, so that the liquid is atomized. The liquid pumped up by the siphon principle is supplied to the liquid flow ejection unit 92b. The gas supplied to the two gas flow ejection units 91b may be compressed or not compressed. In addition, the liquid particles output from the two two-fluid nozzles 9b collide with each other, so that the atomized liquid particles become thinner. The two-fluid nozzle 9b is a nozzle in which gas does not flow backward (reverse pressure) from the liquid flow ejecting unit 92b.
本実施形態の二流体噴霧装置は、図２～図５に示すように、加圧液体供給系Ｌ、圧縮気体供給系Ｇ、及び排液系Ｄを備える。
The two-fluid spraying device of this embodiment includes a pressurized liquid supply system L, a compressed gas supply system G, and a drainage system D as shown in FIGS.
加圧液体供給系Ｌは、加圧液体供給源１、加圧液体供給源１からの加圧液体を二流体ノズル９に供給する加圧液体配管３、及び、加圧液体配管３の途中に設けられ、加圧液体供給源１からの加圧液体の通路を開閉する弁１８（ＰＷ－２Ｖ）を備える。加圧液体供給源１は、例えば、加圧ポンプである。加圧液体供給源１は、二流体噴霧装置専用に設けてもよいし、工場内に配設されている別の目的の液体供給源などを利用してもよい。弁１８は、例えば電磁弁である。
The pressurized liquid supply system L is in the middle of the pressurized liquid supply source 1, the pressurized liquid pipe 3 that supplies the pressurized liquid from the pressurized liquid supply source 1 to the two-fluid nozzle 9, and the pressurized liquid pipe 3. A valve 18 (PW-2V) is provided that opens and closes the passage of the pressurized liquid from the pressurized liquid supply source 1. The pressurized liquid supply source 1 is, for example, a pressurized pump. The pressurized liquid supply source 1 may be provided exclusively for the two-fluid spraying device, or another purpose liquid supply source disposed in a factory may be used. The valve 18 is, for example, an electromagnetic valve.
圧縮気体供給系Ｇは、圧縮気体供給源６、圧縮気体供給源６からの圧縮気体を二流体ノズル９に供給する圧縮気体配管２２、圧縮気体配管２２の途中に設けられ、圧縮気体供給源６からの圧縮気体の通路を開閉する弁２３（ＰＡ－１Ｖ）、及び、弁２３と二流体ノズル９との間に配設される気体圧力制御器７（Ａ－ＥＰＲ）を備える。弁２３は、例えば電磁弁である。気体圧力制御器７は、二流体ノズル９に供給する圧縮気体の圧力を設定できる。気体圧力制御器７は、例えば、電空レギュレータである。
The compressed gas supply system G is provided in the middle of the compressed gas supply source 6, the compressed gas piping 22 that supplies the compressed gas from the compressed gas supply source 6 to the two-fluid nozzle 9, and the compressed gas piping 22. And a gas pressure controller 7 (A-EPR) disposed between the valve 23 and the two-fluid nozzle 9. The valve 23 is, for example, an electromagnetic valve. The gas pressure controller 7 can set the pressure of the compressed gas supplied to the two-fluid nozzle 9. The gas pressure controller 7 is, for example, an electropneumatic regulator.
排液系Ｄは、加圧液体供給系Ｌの加圧液体配管３の弁１８と二流体ノズル９との間の区間から分岐する。排液系Ｄは、加圧液体配管１９内の液体を外部に排出する。排液系Ｄは、排液管１９及び排液弁２０を備える。排液管１９は、加圧液体配管３から分岐する配管である。排液弁２０は、排液管１９に設けられ、二流体ノズル９の噴射部よりも低い位置にある。排液弁２０は、弁１８を閉止した状態で開放状態にすることで、加圧液体配管１９内を大気圧（又は、排液管１９と繋がる外部の気圧）にし、加圧液体配管１９内の液体を排出する。液体を排出しないときは、排液弁２０は、閉止される。
The drainage system D branches off from the section between the valve 18 of the pressurized liquid piping 3 of the pressurized liquid supply system L and the two-fluid nozzle 9. The drainage system D discharges the liquid in the pressurized liquid pipe 19 to the outside. The drainage system D includes a drainage pipe 19 and a drainage valve 20. The drainage pipe 19 is a pipe branched from the pressurized liquid pipe 3. The drainage valve 20 is provided in the drainage pipe 19 and is located at a position lower than the injection part of the two-fluid nozzle 9. The drainage valve 20 is opened when the valve 18 is closed, so that the inside of the pressurized liquid pipe 19 is set to atmospheric pressure (or an external pressure connected to the drainage pipe 19), and the inside of the pressurized liquid pipe 19 is set. Drain the liquid. When the liquid is not discharged, the drain valve 20 is closed.
二流体噴霧制御盤４０は、制御部２１を備える。制御部２１は、プログラム等に従って、マイクロプロセッサ等で演算処理を行う構成である。制御部２１は、次のようにして、二流体ノズル９の噴霧を停止する。制御部２１は、弁１８を閉止することで二流体ノズル９への加圧液体の供給を停止する。制御部２１は、弁１８を閉止した状態で、二流体ノズル９に印加している圧縮気体の圧力を下げる。制御部２１は、圧縮気体の圧力を下げ切る前に、排液弁２０を開放し、加圧液体配管１９内の液体圧力を大気圧に開放する。これにより、排液弁２０と二流体ノズル９の噴射部との高低差によるサイフォンの原理と、二流体ノズル９に印加されている圧縮気体が加圧液体配管１９を逆流する力の両方が働き、二流体ノズル９側から排液弁２０の方向に加圧液体配管１９内に液体が流れる。このようにして、制御部２１は、加圧液体配管１９内の液体を本来の流れの方向と逆方向に流して、二流体ノズル９の先端から液体が垂れる液だれが発生しないように噴霧を停止する。
The two-fluid spray control panel 40 includes a control unit 21. The control unit 21 is configured to perform arithmetic processing with a microprocessor or the like according to a program or the like. The controller 21 stops spraying of the two-fluid nozzle 9 as follows. The controller 21 stops the supply of the pressurized liquid to the two-fluid nozzle 9 by closing the valve 18. The controller 21 reduces the pressure of the compressed gas applied to the two-fluid nozzle 9 with the valve 18 closed. The controller 21 opens the drain valve 20 before releasing the pressure of the compressed gas and releases the liquid pressure in the pressurized liquid pipe 19 to atmospheric pressure. As a result, both the siphon principle based on the height difference between the drain valve 20 and the injection part of the two-fluid nozzle 9 and the force that the compressed gas applied to the two-fluid nozzle 9 flows backward through the pressurized liquid pipe 19 work. The liquid flows into the pressurized liquid pipe 19 from the two-fluid nozzle 9 side toward the drain valve 20. In this way, the control unit 21 causes the liquid in the pressurized liquid pipe 19 to flow in the direction opposite to the original flow direction and sprays so that no dripping occurs from the tip of the two-fluid nozzle 9. Stop.
次に、二流体噴霧装置における液だれ防止をする制御について、噴霧をするときに行われる停止制御を主に説明する。なお、ここで説明する設定値等は、一例である。
Next, stop control performed when spraying will be mainly described as control for preventing dripping in the two-fluid spray device. Note that the setting values and the like described here are examples.
図６は、制御部２１の制御を説明するためのタイムチャートである。具体的には、気体圧力制御器７から出力される圧力及び３つの弁１８，２０の開閉のタイミングの関係を示すタイムチャートである。時刻ｔ１は、噴霧指令が停止され、かつ弁１８が閉止したときである。時刻ｔ２は、噴霧指令が再度与えられたときである。時刻ｔ３は、弁１８が開放されたときである。
FIG. 6 is a time chart for explaining the control of the control unit 21. Specifically, it is a time chart showing the relationship between the pressure output from the gas pressure controller 7 and the timing of opening and closing the three valves 18 and 20. Time t1 is when the spray command is stopped and the valve 18 is closed. Time t2 is when the spray command is given again. Time t3 is when the valve 18 is opened.
図２は、二流体ノズル９の通常の噴霧中の状態を示している。気体圧力制御器７から出力される気体の圧力は、３５０ｋＰａに設定される。加圧液体供給源１から出力される液体の圧力は、３３０ｋＰａに設定される。弁２３及び弁１８は開路状態である。排液弁２０は閉止状態である。
FIG. 2 shows a state during normal spraying of the two-fluid nozzle 9. The pressure of the gas output from the gas pressure controller 7 is set to 350 kPa. The pressure of the liquid output from the pressurized liquid supply source 1 is set to 330 kPa. The valve 23 and the valve 18 are in an open circuit state. The drain valve 20 is in a closed state.
図３は、二流体ノズル９の噴霧動作を停止する状態を示している。図３を参照して、二流体ノズル９の停止制御の開始について説明する。弁２３は開路状態である。排液弁２０は閉止状態である。液だれ防止制御開始指令により、弁１８が閉止されて、加圧液体供給源１からヘッダ液体配管への液体の供給が停止される。これと同時に、気体圧力制御器７の出力圧力が３５０ｋＰａから０ｋＰａまで、図６に示すエア圧下降変化率制限に従って、圧縮気体配管２２内の圧力が徐々に０ｋＰａになる。
FIG. 3 shows a state where the spraying operation of the two-fluid nozzle 9 is stopped. The start of stop control of the two-fluid nozzle 9 will be described with reference to FIG. The valve 23 is in an open circuit state. The drain valve 20 is in a closed state. In response to the dripping prevention control start command, the valve 18 is closed, and the supply of liquid from the pressurized liquid supply source 1 to the header liquid pipe is stopped. At the same time, the pressure in the compressed gas pipe 22 gradually becomes 0 kPa in accordance with the air pressure drop change rate restriction shown in FIG. 6 from the output pressure of the gas pressure controller 7 to 350 kPa to 0 kPa.
図４は、排液弁２０が開放される状態を説明するための図である。図３に示す圧縮気体の圧力の低下中に、排液弁２０が開放される。具体的には、気体圧力制御器７の出力の圧力計測値が予め設定された開放許可圧力Ｐｏｐ（例えば、１５０ｋＰａ）になったときに、排液弁２０が開放される。排液弁２０が開放されると、加圧液体供給系Ｌに圧縮空気が逆流する逆圧が生じるとともに、サイフォンの原理により、ノズルヘッダ（弁１８と二流体ノズル９との間の配管）内の液体が排液弁２０から外部に放出される方向に引き込まれる。
FIG. 4 is a diagram for explaining a state in which the drain valve 20 is opened. While the pressure of the compressed gas shown in FIG. 3 is decreasing, the drain valve 20 is opened. Specifically, when the pressure measurement value of the output of the gas pressure controller 7 reaches a preset opening permission pressure Pop (for example, 150 kPa), the drain valve 20 is opened. When the drain valve 20 is opened, a back pressure is generated in the pressurized liquid supply system L so that the compressed air flows backward, and in the nozzle header (pipe between the valve 18 and the two-fluid nozzle 9) due to the siphon principle. Of the liquid is drawn in the direction in which the liquid is discharged from the drain valve 20 to the outside.
ここでは、気体圧力制御器７の出力圧力がある程度下がった後に、排液弁２０を開放しているが、弁１８を閉止した後であれば、排液弁２０をいつ開放してもよい。弁１８を閉止した直後では、気体圧力制御器７の出力圧力がほとんど下がっていない。このため、排液弁２０を開放すると、圧縮空気による逆圧が強く、必要以上に液体が排出される可能性がある。一方、気体圧力制御器７の出力圧力をほぼ下げ切ると、圧縮空気による逆圧が弱い。このとき、配管内に気体溜りがあると、逆圧が弱くなることにより、気体溜りが膨らむことで、二流体ノズル９で液だれをする可能性がある。二流体ノズル９が液だれをしないのであれば、気体圧力制御器７の出力圧力をなるべく低くして、排液弁２０を開放するのが望ましい。
Here, the drain valve 20 is opened after the output pressure of the gas pressure controller 7 drops to some extent, but the drain valve 20 may be opened anytime after the valve 18 is closed. Immediately after the valve 18 is closed, the output pressure of the gas pressure controller 7 has hardly decreased. For this reason, when the drain valve 20 is opened, the back pressure by the compressed air is strong, and the liquid may be discharged more than necessary. On the other hand, when the output pressure of the gas pressure controller 7 is almost lowered, the back pressure by the compressed air is weak. At this time, if there is a gas pool in the pipe, the back pressure is weakened, and the gas pool swells, so that there is a possibility that the two-fluid nozzle 9 causes liquid dripping. If the two-fluid nozzle 9 does not dripping, it is desirable to lower the output pressure of the gas pressure controller 7 and open the drain valve 20 as much as possible.
図５は、二流体ノズル９の噴霧動作を停止する状態を示している。図４に示す状態において開放状態にある排液弁２０を、ノズルヘッダ内の液体が程よく排出されたところで、排液弁２０を閉止する。例えば、排液弁２０は、予め設定された開放時間Ｔｏｐ開放することで、適切な量の液体を排出する。このように液体を排出することで、二流体ノズル９で液だれを発生させることなく、噴霧を停止することができる。ここで、ノズルヘッダ内の液体を全て排出する必要はなく、二流体ノズル９の液だれが生じない最低限の液体が排出されればよい。液体が純水などの比較的貴重な液体の場合、液体の排出量は少ない方が望ましい。
FIG. 5 shows a state where the spraying operation of the two-fluid nozzle 9 is stopped. In the state shown in FIG. 4, when the liquid in the nozzle header is discharged moderately, the drain valve 20 is closed. For example, the drain valve 20 discharges an appropriate amount of liquid by opening a preset opening time Top. By discharging the liquid in this way, spraying can be stopped without causing dripping at the two-fluid nozzle 9. Here, it is not necessary to discharge all the liquid in the nozzle header, and it is sufficient to discharge the minimum liquid that does not cause the two-fluid nozzle 9 to drip. When the liquid is a relatively valuable liquid such as pure water, it is desirable that the amount of discharged liquid is small.
図７は、二流体ノズル９と加圧液体供給系Ｌの配管及び圧縮気体供給系Ｇの配管とを接続する構成を示す構成図である。この構成は、気体溜りが加圧液体供給系Ｌの配管内に局所的に留まらないように、気体が二流体ノズル９から自然に排出されるように設計されている。
FIG. 7 is a configuration diagram showing a configuration in which the two-fluid nozzle 9 is connected to the piping of the pressurized liquid supply system L and the piping of the compressed gas supply system G. This configuration is designed so that the gas is naturally discharged from the two-fluid nozzle 9 so that the gas reservoir does not stay locally in the piping of the pressurized liquid supply system L.
本体ユニット１００の入力側には、気体供給配管１０１の接続口１０３及び液体供給配管１０２の接続口１０４が接続される。本体ユニット１００の出力側には、気体ヘッダ配管（気体主流配管）１１及び液体ヘッダ配管(液体主流通路)１２が接続される。
The connection port 103 of the gas supply pipe 101 and the connection port 104 of the liquid supply pipe 102 are connected to the input side of the main unit 100. A gas header pipe (gas main flow pipe) 11 and a liquid header pipe (liquid main flow passage) 12 are connected to the output side of the main unit 100.
気体ヘッダ配管１１は、圧縮気体供給源６からの圧縮気体を二流体ノズル９に供給する圧縮気体供給系Ｇの圧縮気体配管２２である。
The gas header pipe 11 is a compressed gas pipe 22 of a compressed gas supply system G that supplies the compressed gas from the compressed gas supply source 6 to the two-fluid nozzle 9.
液体ヘッダ配管１２及び液体バッファ配管（液体枝流通路）１３，１３ｅは、加圧液体供給源１からの加圧液体を二流体ノズル９に供給する加圧液体供給系Ｌの加圧液体配管１９である。加圧液体の供給が停止されている状態では、液体ヘッダ配管１２は、内部にある加圧液体が終端（下流）側から始端（上流）側に流れるような構造をしている。例えば、液体ヘッダ配管１２は、直線的な配管が加圧液体を供給する方向に対して上り勾配の傾斜をしている構造である。
The liquid header pipe 12 and the liquid buffer pipes (liquid branch passages) 13 and 13 e are pressurized liquid pipes 19 of the pressurized liquid supply system L that supply the pressurized liquid from the pressurized liquid supply source 1 to the two-fluid nozzle 9. It is. In a state where the supply of the pressurized liquid is stopped, the liquid header pipe 12 has a structure in which the pressurized liquid inside flows from the end (downstream) side to the start end (upstream) side. For example, the liquid header pipe 12 has a structure in which the straight pipe is inclined upward with respect to the direction in which the pressurized liquid is supplied.
液体バッファ配管１３ｅは、液体ヘッダ配管１２の終端に、終端の高さより高い位置で、鉛直方向の上向きに開口部が位置するように接続される。液体ヘッダ配管１２の終端部に液体バッファ配管１３ｅを設けることで、液体ヘッダ配管１２に気体溜りが残らないようにする。複数の液体バッファ配管１３は、液体ヘッダ配管１２の終端部以外の部位で、鉛直方向の上向きに開口部が位置するように接続される。液体バッファ配管１３の終端の高さは、液体ヘッダ配管１２の終端の高さより高い位置まで延びている。液体バッファ配管１３は、少なくとも１つの二流体ノズル９に繋がる。なお、液体バッファ配管１３，１３ｅは、内部に気体の気泡が残らないように、凸型部分が無いような構造が望ましい。
The liquid buffer pipe 13e is connected to the end of the liquid header pipe 12 at a position higher than the end height so that the opening is positioned upward in the vertical direction. By providing the liquid buffer pipe 13 e at the terminal end of the liquid header pipe 12, no gas pool remains in the liquid header pipe 12. The plurality of liquid buffer pipes 13 are connected at positions other than the terminal end of the liquid header pipe 12 so that the openings are positioned upward in the vertical direction. The end height of the liquid buffer pipe 13 extends to a position higher than the end height of the liquid header pipe 12. The liquid buffer pipe 13 is connected to at least one two-fluid nozzle 9. The liquid buffer pipes 13 and 13e preferably have a structure having no convex portion so that no gas bubbles remain inside.
配管接続用継手（マニホールド）１４は、各液体バッファ配管１３，１３ｅの開口部に接続される。各加圧液体配管１５の両端には、配管接続用継手１４の上端部と二流体ノズル９の液体供給部が接続される。加圧液体配管１５は、二流体ノズル９に加圧液体を供給する。例えば、加圧液体配管１５は、可撓性のビニール管である。
The pipe connection joint (manifold) 14 is connected to the openings of the liquid buffer pipes 13 and 13e. At both ends of each pressurized liquid pipe 15, the upper end of the pipe connection joint 14 and the liquid supply part of the two-fluid nozzle 9 are connected. The pressurized liquid pipe 15 supplies pressurized liquid to the two-fluid nozzle 9. For example, the pressurized liquid pipe 15 is a flexible vinyl pipe.
このような構成により、二流体ノズル９の噴霧中又は噴霧を一時的に停止したときに、液体ヘッダ配管１２の内部に空気溜りが出来難く、かつ、次回の噴霧再開時に速やかに配管内の気体が二流体ノズル９から吐出される。
With such a configuration, when the two-fluid nozzle 9 is spraying or when spraying is temporarily stopped, it is difficult for air to accumulate inside the liquid header pipe 12, and the gas in the pipe is promptly restored when the next spraying is resumed. Is discharged from the two-fluid nozzle 9.
本実施形態によれば、二流体ノズル９と二流体ノズル９への液体の供給を止める弁１８との間にある液体を排出するための排液弁２０を設け、噴霧を停止するときに、排液弁２０から液体を排出することで、二流体ノズル９の液だれを防止することができる。
According to the present embodiment, the drainage valve 20 for discharging the liquid between the two-fluid nozzle 9 and the valve 18 that stops the supply of the liquid to the two-fluid nozzle 9 is provided, and when spraying is stopped, By discharging the liquid from the drain valve 20, dripping of the two-fluid nozzle 9 can be prevented.
排液弁２０を二流体ノズル９の噴霧口よりも低い位置に設けることで、重力に加えて、サイフォンの原理を利用して、液体を排出することができる。サイフォンの原理を利用することで、二流体ノズル９を満たしている液体も、配管内に引き込んで排出することができる。
By providing the drain valve 20 at a position lower than the spray port of the two-fluid nozzle 9, in addition to gravity, the liquid can be discharged using the principle of siphon. By utilizing the siphon principle, the liquid filling the two-fluid nozzle 9 can also be drawn into the pipe and discharged.
気体圧力制御器７の出力圧力が下がり切る前に、排液弁２０を開放することで、二流体ノズル９に掛かる圧縮空気による逆圧を利用して、配管内の液体を排出することができる。
By opening the drain valve 20 before the output pressure of the gas pressure controller 7 is lowered, the liquid in the pipe can be discharged using the reverse pressure due to the compressed air applied to the two-fluid nozzle 9. .
二流体ノズル９から配管内の気体が自然に排出されるように構成することで、加圧液体供給系Ｌの配管に気体溜りができるのを防止することができる。これにより、次回の噴霧開始時に、気体が抜けるまでに時間が掛かるのを防止することができる。また、加圧液体供給系Ｌの配管内の気体溜りを防止することで、噴霧停止時の液だれ防止制御を確実に実行することができる。
By configuring the gas in the pipe to be naturally discharged from the two-fluid nozzle 9, it is possible to prevent gas from being accumulated in the pipe of the pressurized liquid supply system L. Thereby, it can prevent taking time until gas escapes at the time of the next spraying start. Further, by preventing gas accumulation in the piping of the pressurized liquid supply system L, it is possible to reliably execute dripping prevention control when spraying is stopped.
例えば、加圧液体供給系Ｌの配管内に気体溜りがある場合、サイフォンの原理が働かない可能性がある。また、二流体ノズル９に圧縮気体による逆圧が掛かることで、二流体ノズル９からの液だれが抑えられている場合、気体圧力制御器７の出力圧力が下がると、逆圧により圧縮されていた気体溜りが膨らむことで、二流体ノズル９から液だれする可能性がある。従って、気体溜りを作らないようにすることで、これらのような液だれが発生する状態を無くすことができる。
For example, if there is a gas reservoir in the piping of the pressurized liquid supply system L, the siphon principle may not work. In addition, when the reverse pressure by the compressed gas is applied to the two-fluid nozzle 9 and the dripping from the two-fluid nozzle 9 is suppressed, when the output pressure of the gas pressure controller 7 decreases, the two-fluid nozzle 9 is compressed by the reverse pressure. If the gas pool expands, there is a possibility that the liquid will leak from the two-fluid nozzle 9. Therefore, by avoiding the formation of a gas reservoir, it is possible to eliminate such a state in which dripping occurs.
本実施形態の二流体ノズル９として、図８に示す二流体ノズル９ａを用いることで、欠点である液だれを抑制することができ、利点である高性能な噴霧制御を実現することができる。
By using the two-fluid nozzle 9a shown in FIG. 8 as the two-fluid nozzle 9 of the present embodiment, it is possible to suppress the dripping that is a defect, and to realize the high-performance spray control that is an advantage.
なお、実施形態において、液体ヘッダ配管１２及び液体バッファ配管１３，１３ｅが一体形成された液体流通路が形成された構成でもよい。また、配管接続用継手１４、及び加圧液体配管１５を設けずに、液体バッファ配管１３，１３ｅの開口部に二流体ノズル９を直付けしてもよい。
In the embodiment, a configuration in which a liquid flow path in which the liquid header pipe 12 and the liquid buffer pipes 13 and 13e are integrally formed may be formed. Alternatively, the two-fluid nozzle 9 may be directly attached to the openings of the liquid buffer pipes 13 and 13 e without providing the pipe connection joint 14 and the pressurized liquid pipe 15.
排液弁２０は、二流体ノズル９の噴射部よりも低い位置で、二流体ノズル９への加圧液体の供給を停止する弁１８と二流体ノズル９との間の液体を一部でも排出できる位置あれば、何処に設けられていてもよい。具体的には、二流体ノズル９よりも低い位置であれば、液体ヘッダ配管１２、液体バッファ配管（液体枝流通路）１３，１３ｅ、配管接続用継手１４、及び加圧液体配管１５のいずれの液体流通路に、排液弁２０が設けられていてもよい。
The drainage valve 20 discharges even a part of the liquid between the valve 18 that stops the supply of pressurized liquid to the two-fluid nozzle 9 and the two-fluid nozzle 9 at a position lower than the injection part of the two-fluid nozzle 9. It may be provided anywhere as long as it is possible. Specifically, if the position is lower than the two-fluid nozzle 9, any of the liquid header pipe 12, the liquid buffer pipe (liquid branch passage) 13 and 13 e, the pipe connection joint 14, and the pressurized liquid pipe 15 is selected. A drain valve 20 may be provided in the liquid flow path.
なお、本発明は上記実施形態そのままに限定されるものではなく、実施段階ではその要旨を逸脱しない範囲で構成要素を変形して具体化できる。また、上記実施形態に開示されている複数の構成要素の適宜な組み合わせにより、種々の発明を形成できる。例えば、実施形態に示される全構成要素から幾つかの構成要素を削除してもよい。さらに、異なる実施形態にわたる構成要素を適宜組み合わせてもよい。
Note that the present invention is not limited to the above-described embodiment as it is, and can be embodied by modifying constituent elements without departing from the scope of the invention in the implementation stage. In addition, various inventions can be formed by appropriately combining a plurality of components disclosed in the embodiment. For example, some components may be deleted from all the components shown in the embodiment. Furthermore, constituent elements over different embodiments may be appropriately combined.
Claims (10)
- 液体と気体とを混合して得られる霧化流体を噴霧する二流体ノズルと、
前記二流体ノズルに前記液体を供給する液体流通路と、
前記液体流通路に設けられ、前記二流体ノズルへの前記液体の供給を停止する液体供給停止手段と、
前記液体供給停止手段と前記二流体ノズルとの間の前記液体流通路内にある前記液体を排出する液体排出手段と
を備えることを特徴とする二流体噴霧装置。 A two-fluid nozzle that sprays an atomized fluid obtained by mixing liquid and gas;
A liquid flow path for supplying the liquid to the two-fluid nozzle;
A liquid supply stop means provided in the liquid flow passage for stopping the supply of the liquid to the two-fluid nozzle;
A two-fluid spraying device comprising: a liquid discharging unit that discharges the liquid in the liquid flow path between the liquid supply stop unit and the two-fluid nozzle. - 前記液体排出手段は、前記二流体ノズルに前記液体を供給する流れの方向と逆方向に前記液体を流して排出すること
を特徴とする請求項１に記載の二流体噴霧装置。 2. The two-fluid spraying device according to claim 1, wherein the liquid discharging means flows and discharges the liquid in a direction opposite to a flow direction of supplying the liquid to the two-fluid nozzle. - 前記液体排出手段は、前記二流体ノズルより低い位置にあること
を特徴とする請求項１に記載の二流体噴霧装置。 The two-fluid spraying device according to claim 1, wherein the liquid discharge unit is located at a position lower than the two-fluid nozzle. - 前記液体排出手段は、重力を利用して前記液体を排出すること
を特徴とする請求項１に記載の二流体噴霧装置。 The two-fluid spraying device according to claim 1, wherein the liquid discharging means discharges the liquid using gravity. - 前記液体排出手段は、サイフォンの原理を利用して前記液体を排出すること
を特徴とする請求項１に記載の二流体噴霧装置。 The two-fluid spraying device according to claim 1, wherein the liquid discharging means discharges the liquid using a siphon principle. - 前記気体は、圧力を掛けられた圧縮気体であること
を特徴とする請求項１に記載の二流体噴霧装置。 The two-fluid spray device according to claim 1, wherein the gas is a compressed gas under pressure. - 前記圧縮気体に掛ける圧力を制御する気体圧力制御手段
を備えることを特徴とする請求項６に記載の二流体噴霧装置。 The two-fluid spraying device according to claim 6, further comprising a gas pressure control unit that controls a pressure applied to the compressed gas. - 前記二流体ノズルは、前記圧縮気体が前記液体流通路を逆流する方向に圧力が掛かること
を特徴とする請求項６に記載の二流体噴霧装置。 The two-fluid spray device according to claim 6, wherein the two-fluid nozzle is pressurized in a direction in which the compressed gas flows backward through the liquid flow path. - 液体流通路から供給される液体と気体とを混合して得られる霧化流体を噴霧する二流体ノズルを備える二流体噴霧装置の制御方法であって、
噴霧を停止するときに、前記液体流通路に設けられた弁を閉止して、前記二流体ノズルへの前記液体の供給を停止し、
前記弁の閉止後に、前記弁と前記二流体ノズルとの間の前記液体流通路内にある前記液体を排出すること
を含むことを特徴とする二流体噴霧装置の制御方法。 A control method for a two-fluid spraying device comprising a two-fluid nozzle for spraying an atomizing fluid obtained by mixing liquid and gas supplied from a liquid flow path,
When stopping spraying, close the valve provided in the liquid flow passage to stop the supply of the liquid to the two-fluid nozzle,
A control method for a two-fluid spraying device, comprising: discharging the liquid in the liquid flow path between the valve and the two-fluid nozzle after the valve is closed. - 前記気体は、圧力が掛けられた圧縮気体であり、
前記気体の圧力を下げた後に、前記液体の排出を行うこと
を特徴とする請求項９に記載の二流体噴霧装置の制御方法。 The gas is a compressed gas under pressure,
The method for controlling a two-fluid spray device according to claim 9, wherein the liquid is discharged after the pressure of the gas is lowered.
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| JP2014068758A JP6446808B2 (en) | 2014-03-28 | 2014-03-28 | Two-fluid spray device and method for stopping two-fluid spray device |
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| CN108262197A (en) * | 2018-04-01 | 2018-07-10 | 山西汤荣机械制造股份有限公司 | Painting line increases the device of spray anti-rust oil |
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| JPS6035775U (en) * | 1983-08-11 | 1985-03-12 | 株式会社 東洋製作所 | Residual water removal circuit for spray equipment |
| JP2009148677A (en) * | 2007-12-19 | 2009-07-09 | Norihiko Hirano | System and method for atomizing liquid |
| JP2014034027A (en) * | 2012-08-10 | 2014-02-24 | Toshiba Mitsubishi-Electric Industrial System Corp | Two-fluid sprayer |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6035775U (en) * | 1983-08-11 | 1985-03-12 | 株式会社 東洋製作所 | Residual water removal circuit for spray equipment |
| JP2009148677A (en) * | 2007-12-19 | 2009-07-09 | Norihiko Hirano | System and method for atomizing liquid |
| JP2014034027A (en) * | 2012-08-10 | 2014-02-24 | Toshiba Mitsubishi-Electric Industrial System Corp | Two-fluid sprayer |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN108262197A (en) * | 2018-04-01 | 2018-07-10 | 山西汤荣机械制造股份有限公司 | Painting line increases the device of spray anti-rust oil |
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| JP2017100048A (en) | 2017-06-08 |
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