WO2015147292A1 - Dispositif de pulvérisation à double fluide - Google Patents
Dispositif de pulvérisation à double fluide Download PDFInfo
- Publication number
- WO2015147292A1 WO2015147292A1 PCT/JP2015/059744 JP2015059744W WO2015147292A1 WO 2015147292 A1 WO2015147292 A1 WO 2015147292A1 JP 2015059744 W JP2015059744 W JP 2015059744W WO 2015147292 A1 WO2015147292 A1 WO 2015147292A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- liquid
- fluid
- gas
- fluid nozzle
- nozzle
- Prior art date
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
- B05B7/02—Spray pistols; Apparatus for discharge
- B05B7/04—Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge
- B05B7/0416—Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid
- B05B7/0441—Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid with one inner conduit of liquid surrounded by an external conduit of gas upstream the mixing chamber
- B05B7/0475—Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid with one inner conduit of liquid surrounded by an external conduit of gas upstream the mixing chamber with means for deflecting the peripheral gas flow towards the central liquid flow
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
- B05B7/24—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas with means, e.g. a container, for supplying liquid or other fluent material to a discharge device
- B05B7/26—Apparatus in which liquids or other fluent materials from different sources are brought together before entering the discharge device
- B05B7/262—Apparatus in which liquids or other fluent materials from different sources are brought together before entering the discharge device a liquid and a gas being brought together before entering the discharge device
- B05B7/267—Apparatus in which liquids or other fluent materials from different sources are brought together before entering the discharge device a liquid and a gas being brought together before entering the discharge device the liquid and the gas being both under pressure
Definitions
- a two-fluid spray device includes a two-fluid nozzle that sprays an atomized fluid obtained by mixing a liquid and a gas, a liquid flow passage that supplies the liquid to the two-fluid nozzle, A liquid supply stop means provided in the liquid flow passage for stopping the supply of the liquid to the two-fluid nozzle; and the liquid in the liquid flow passage between the liquid supply stop means and the two-fluid nozzle. Liquid discharging means for discharging.
- FIG. 1 is a schematic configuration diagram of a system to which a two-fluid spray device according to an embodiment of the present invention is applied.
- FIG. 2 is a schematic configuration diagram showing a state during normal spraying in the two-fluid spraying device by the gas pressurization method of the present embodiment.
- FIG. 3 is a schematic configuration diagram illustrating a state in which stop control for preventing dripping is started in the two-fluid spray device of the present embodiment.
- FIG. 4 is a schematic configuration diagram showing a state in which the drain valve is opened during the pressure drop of the compressed gas in the two-fluid spray device of the present embodiment.
- FIG. 1 is a schematic configuration diagram of a system to which a two-fluid spray device according to an embodiment of the present invention is applied.
- FIG. 2 is a schematic configuration diagram showing a state during normal spraying in the two-fluid spraying device by the gas pressurization method of the present embodiment.
- FIG. 3 is a schematic configuration diagram illustrating
- the air conditioning control panel 39 detects the temperature and humidity in the clean room 31 with a detector.
- the air conditioning control panel 39 changes the command of the proportional control valve 41 of the chilled water supply system supplied to the cooling coil 34 built in the air conditioner 33 according to the difference between the detection result by the detector and the target value,
- the command of the proportional control valve 42 of the hot water supply system supplied to the heating coil 35 incorporated in the machine 33 is changed.
- the two-fluid spray header unit 36 having a plurality of two-fluid nozzles 9 and the atmosphere sprayed from the two-fluid spray header unit 36 are forcibly sent to the clean room 31.
- the fan 37 and the steam humidification unit 38 are provided.
- the steam humidification unit 38 is supplied with steam from a steam proportional control valve 43 installed outside the air conditioner 33.
- the two-fluid nozzle 9a includes two gas flow ejection units 91a and a liquid flow ejection unit 92a.
- the liquid flow ejecting unit 92a is provided to eject a liquid flow.
- the liquid output from the liquid flow ejecting unit 92a is a pressurized liquid in which the liquid is pressurized.
- the two gas flow ejecting units 91a are inclined in the direction of the liquid flow output from the liquid flow ejecting unit 92a, and eject the gas flow, respectively.
- the gas output from the gas flow injection unit 91a is a compressed gas in which the gas is compressed.
- Each of the two two-fluid nozzles 9b includes two gas flow ejection units 91b and a liquid flow ejection unit 92b.
- the two gas flows output from the two gas flow injection units 91b and the liquid flow output from the liquid flow injection unit 92b are all output in the same direction.
- the liquid flow is output from the liquid flow injection unit 92b so as to be sandwiched between the two gas flows output from the two gas flow injection units 91b.
- the two gas flows are output at high speed adjacent to the liquid flow, so that the liquid is atomized.
- the liquid pumped up by the siphon principle is supplied to the liquid flow ejection unit 92b.
- the gas supplied to the two gas flow ejection units 91b may be compressed or not compressed.
- the drainage system D branches off from the section between the valve 18 of the pressurized liquid piping 3 of the pressurized liquid supply system L and the two-fluid nozzle 9.
- the drainage system D discharges the liquid in the pressurized liquid pipe 19 to the outside.
- the drainage system D includes a drainage pipe 19 and a drainage valve 20.
- the drainage pipe 19 is a pipe branched from the pressurized liquid pipe 3.
- the drainage valve 20 is provided in the drainage pipe 19 and is located at a position lower than the injection part of the two-fluid nozzle 9.
- the drainage valve 20 is opened when the valve 18 is closed, so that the inside of the pressurized liquid pipe 19 is set to atmospheric pressure (or an external pressure connected to the drainage pipe 19), and the inside of the pressurized liquid pipe 19 is set. Drain the liquid. When the liquid is not discharged, the drain valve 20 is closed.
- FIG. 5 shows a state where the spraying operation of the two-fluid nozzle 9 is stopped.
- the drain valve 20 is closed.
- the drain valve 20 discharges an appropriate amount of liquid by opening a preset opening time Top.
- spraying can be stopped without causing dripping at the two-fluid nozzle 9.
- the liquid is a relatively valuable liquid such as pure water, it is desirable that the amount of discharged liquid is small.
- the gas in the pipe By configuring the gas in the pipe to be naturally discharged from the two-fluid nozzle 9, it is possible to prevent gas from being accumulated in the pipe of the pressurized liquid supply system L. Thereby, it can prevent taking time until gas escapes at the time of the next spraying start. Further, by preventing gas accumulation in the piping of the pressurized liquid supply system L, it is possible to reliably execute dripping prevention control when spraying is stopped.
- a configuration in which a liquid flow path in which the liquid header pipe 12 and the liquid buffer pipes 13 and 13e are integrally formed may be formed.
- the two-fluid nozzle 9 may be directly attached to the openings of the liquid buffer pipes 13 and 13 e without providing the pipe connection joint 14 and the pressurized liquid pipe 15.
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- Nozzles (AREA)
Abstract
Le dispositif de pulvérisation à double fluide comprend : des buses à double fluide (9), pour pulvériser un fluide atomisé obtenu par mélange d'un liquide et d'un gaz ; un passage pour écoulement du liquide, pour envoyer le liquide aux buses à double fluide (9) ; une valve (18), disposée dans le passage pour écoulement du liquide et destinée à arrêter l'apport du liquide aux buses à double fluide (9) ; et une valve d'évacuation du liquide (20), qui est destinée à évacuer le liquide dans le passage pour écoulement du liquide entre la valve (18) et les buses à double fluide (9).
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014-068758 | 2014-03-28 | ||
JP2014068758A JP6446808B2 (ja) | 2014-03-28 | 2014-03-28 | 二流体噴霧装置、二流体噴霧装置の停止方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2015147292A1 true WO2015147292A1 (fr) | 2015-10-01 |
Family
ID=54195796
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2015/059744 WO2015147292A1 (fr) | 2014-03-28 | 2015-03-27 | Dispositif de pulvérisation à double fluide |
Country Status (2)
Country | Link |
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JP (1) | JP6446808B2 (fr) |
WO (1) | WO2015147292A1 (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108262197A (zh) * | 2018-04-01 | 2018-07-10 | 山西汤荣机械制造股份有限公司 | 喷漆线增加喷涂防锈油的装置 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6035775U (ja) * | 1983-08-11 | 1985-03-12 | 株式会社 東洋製作所 | 噴霧装置の残溜水排除回路 |
JP2009148677A (ja) * | 2007-12-19 | 2009-07-09 | Norihiko Hirano | 液体の噴霧システム及び液体の噴霧方法 |
JP2014034027A (ja) * | 2012-08-10 | 2014-02-24 | Toshiba Mitsubishi-Electric Industrial System Corp | 二流体噴霧装置 |
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2014
- 2014-03-28 JP JP2014068758A patent/JP6446808B2/ja active Active
-
2015
- 2015-03-27 WO PCT/JP2015/059744 patent/WO2015147292A1/fr active Application Filing
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6035775U (ja) * | 1983-08-11 | 1985-03-12 | 株式会社 東洋製作所 | 噴霧装置の残溜水排除回路 |
JP2009148677A (ja) * | 2007-12-19 | 2009-07-09 | Norihiko Hirano | 液体の噴霧システム及び液体の噴霧方法 |
JP2014034027A (ja) * | 2012-08-10 | 2014-02-24 | Toshiba Mitsubishi-Electric Industrial System Corp | 二流体噴霧装置 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108262197A (zh) * | 2018-04-01 | 2018-07-10 | 山西汤荣机械制造股份有限公司 | 喷漆线增加喷涂防锈油的装置 |
Also Published As
Publication number | Publication date |
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JP6446808B2 (ja) | 2019-01-09 |
JP2017100048A (ja) | 2017-06-08 |
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