WO2015146029A1 - Appareil de traitement à micro-ondes - Google Patents
Appareil de traitement à micro-ondes Download PDFInfo
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- WO2015146029A1 WO2015146029A1 PCT/JP2015/001326 JP2015001326W WO2015146029A1 WO 2015146029 A1 WO2015146029 A1 WO 2015146029A1 JP 2015001326 W JP2015001326 W JP 2015001326W WO 2015146029 A1 WO2015146029 A1 WO 2015146029A1
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- WIPO (PCT)
- Prior art keywords
- opening
- propagation
- microwave
- heating chamber
- waveguide
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/64—Heating using microwaves
- H05B6/70—Feed lines
- H05B6/707—Feed lines using waveguides
- H05B6/708—Feed lines using waveguides in particular slotted waveguides
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/64—Heating using microwaves
- H05B6/70—Feed lines
Definitions
- microwave treatment treatment apparatus such as a microwave oven that heats an object to be heated by microwaves.
- a microwave processing apparatus supplies microwaves generated by a magnetron, which is a typical microwave generation unit, to a heating chamber via a waveguide, and is to be heated such as food placed in the heating chamber. Is to heat.
- the electric field distribution generated in the heating chamber by the supplied microwave is not necessarily uniform.
- the turntable is rotated by a motor and the object to be heated is rotated in the heating chamber, or the antenna is rotated by the motor and the microwave is agitated to enter the heating chamber.
- the feeding method is used.
- FIG. 6 is a diagram showing the current flowing through the surface of the waveguide in the conventional microwave processing apparatus.
- a rectangular waveguide type waveguide 100 in which microwaves propagate in the TE10 mode has a rectangular shape with a cross section orthogonal to the longitudinal direction, that is, the microwave propagation direction, and a narrow surface ( Narrow plain) 102 and a wide surface (Wide plain) 103 wider than the narrow surface 102.
- circular polarization can be generated, for example, by providing a combination of two openings.
- Patent Document 1 describes a configuration in which two rectangular slot-like openings 107 a and 107 b that are not perpendicular to each other are provided on the wide surface 103 of the waveguide 106. .
- the waveguide 106 must be designed to be long in order to avoid the influence of disturbance of the electromagnetic field distribution near the magnetron. Further, in the configuration in which the opening is provided in the wide surface 103, the direction from the opening toward the heating chamber and the microwave propagation direction are orthogonal to each other, so that high radiation efficiency is hardly obtained.
- An object of the present disclosure is to provide a microwave processing apparatus capable of generating circularly or elliptically polarized waves with high efficiency using a compact waveguide. To do.
- a microwave processing apparatus includes a heating chamber that houses an object to be heated, a microwave generation unit that generates a microwave, a first propagation unit, A waveguide including the second propagation part, and a pair of openings communicating the waveguide and the heating chamber.
- the first propagation unit propagates the microwave toward the heating chamber, and the second propagation unit propagates the microwave in parallel to the heating chamber.
- the pair of openings includes a first opening and a second opening, and generates circularly polarized waves.
- a cross-section projection region partitioned by virtually projecting a cross section of the first propagation section perpendicular to the tube axis of the first propagation section onto the side surface of the heating chamber along the tube axis of the first propagation section;
- the first opening is provided so that at least a part of the opening overlaps.
- FIG. 1 is a cross-sectional view of the microwave processing apparatus according to the first embodiment of the present disclosure.
- FIG. 2 is an enlarged cross-sectional view of the vicinity of the waveguide in the microwave processing apparatus according to the first embodiment.
- FIG. 3 is a diagram showing an opening that connects the heating chamber and the waveguide in the microwave processing apparatus according to the first embodiment.
- FIG. 4 is a cross-sectional view of the microwave processing apparatus according to the second embodiment of the present disclosure.
- FIG. 5 is an enlarged cross-sectional view of the vicinity of the waveguide of the microwave processing apparatus according to the third embodiment of the present disclosure.
- FIG. 6 is a diagram illustrating a current flowing through a wall surface of a waveguide in a conventional microwave processing apparatus.
- FIG. 7 is a schematic perspective view of a waveguide that generates circularly polarized waves in a conventional microwave processing apparatus.
- a microwave processing apparatus includes a heating chamber that houses an object to be heated, a microwave generation unit that generates a microwave, and a waveguide that includes a first propagation unit and a second propagation unit. And a pair of openings communicating the waveguide and the heating chamber.
- the first propagation unit propagates the microwave toward the heating chamber, and the second propagation unit propagates the microwave in parallel to the heating chamber.
- the pair of openings includes a first opening and a second opening, and generates circularly polarized waves.
- a cross-section projection region partitioned by virtually projecting a cross section of the first propagation section perpendicular to the tube axis of the first propagation section onto the side surface of the heating chamber along the tube axis of the first propagation section;
- the first opening is provided so that at least a part of the opening overlaps.
- the microwave propagated in the first propagation part toward the side surface of the heating chamber is radiated into the heating chamber through the first opening in the same direction. Therefore, even if the length of the first propagation part in the tube axis direction is short, an electric field in a uniform direction is generated in the first propagation part. As a result, stable microwave excitation occurs in a predetermined direction in the first opening.
- the first propagation part suppresses the influence of disturbance of the electromagnetic field distribution in the vicinity of the magnetron. Therefore, even if the length of the second propagation part in the tube axis direction is short, an electric field in a uniform direction is generated in the second propagation part. As a result, in the second opening, stable microwave excitation is generated in a direction orthogonal to the excitation direction in the first opening.
- the microwave processing apparatus is the microwave processing apparatus according to the first aspect, in which the second opening is provided in the second propagation portion so that the center of the second opening is deviated from the cross-sectional projection region. . According to this aspect, it is possible to more reliably generate circularly polarized waves or elliptically polarized waves using a compact waveguide.
- the microwave excitation direction by the first opening and the microwave excitation direction by the second opening are not parallel to each other.
- a first opening and a second opening are provided. According to this aspect, it is possible to more reliably generate circularly polarized waves or elliptically polarized waves using a compact waveguide.
- the microwave processing apparatus of the present disclosure is not limited to a microwave oven, but a processing apparatus, a garbage disposal machine, or a semiconductor manufacturing apparatus that uses microwave heating. Including devices.
- FIG. 1 is a schematic cross-sectional view illustrating a configuration of a microwave oven 50, particularly a waveguide 3 and a heating chamber 1, which is a microwave processing apparatus according to Embodiment 1 of the present disclosure.
- a microwave oven 50 that is a microwave processing apparatus according to the present embodiment, an object to be heated 19 such as food is placed on a table 18 provided in the heating chamber 1.
- the magnetron 2 is a microwave generation unit that generates a microwave.
- the waveguide 3 is attached to the right side surface as viewed from the front of the heating chamber 1.
- the microwave generated by the magnetron 2 propagates through the waveguide 3 and is supplied into the heating chamber 1 through the openings 4 a and 4 b provided between the heating chamber 1 and the waveguide 3.
- the object to be heated 19 placed on the table 18 is heated by the microwave.
- FIG. 2 is an enlarged cross-sectional view of the vicinity of the waveguide 3 in FIG.
- the waveguide 3 is a rectangular waveguide having a rectangular shape in cross section perpendicular to the propagation direction of the microwave. Therefore, as described above, the waveguide 3 has a wide surface and a narrow surface.
- the waveguide 3 includes a propagation part 3a and a propagation part 3b whose narrow surfaces are bent in an L shape and are substantially orthogonal to each other.
- the magnetron 2 is attached to the propagation part 3a.
- the propagation unit 3a extends substantially perpendicular to the side surface of the heating chamber 1, and propagates the microwave 6a in a direction toward the heating chamber 1 (leftward in FIGS. 1 and 2).
- Propagation unit 3b extends downward from the end of propagation unit 3a along the side surface of heating chamber 1, and propagates microwave 6b parallel to the side surface of heating chamber 1 (downward in FIGS. 1 and 2). .
- the propagation unit 3a corresponds to the first propagation unit
- the propagation unit 3b corresponds to the second propagation unit.
- such a waveguide configuration is called an E-bend configuration.
- FIG. 3 is a diagram showing an opening that connects the heating chamber 1 and the waveguide 3 when viewed from the inside of the heating chamber 1 according to the present embodiment.
- openings 4a and 4b are provided on the wide surface of the propagation part 3b.
- the waveguide 3 and the heating chamber 1 communicate with each other through these openings.
- the opening 4a is a rectangular slot having a long side in the horizontal direction and perpendicular to the tube axis 7b of the propagation part 3b.
- the opening 4b is a rectangular slot having a long side in the vertical direction and parallel to the tube axis 7b of the propagation part 3b. That is, in FIG. 2, the opening 4a has a long side in the depth direction, and the opening 4b has a long side in the vertical direction.
- the openings 4a and 4b correspond to the first opening and the second opening, respectively.
- the side surface of the heating chamber 1 that is partitioned by virtually projecting the cross section of the propagation portion 3a perpendicular to the tube axis 7a (see FIG. 2) of the propagation portion 3a onto the side surface of the heating chamber 1 along the tube axis 7a.
- the opening 4a is arranged so that the upper area (hereinafter referred to as a cross-section projected area 3c) overlaps at least a part of the opening 4a.
- the opening 4b is disposed so that the center of the opening 4b is deviated from the cross-sectional projection region 3c.
- the microwave 6a propagating in the propagation part 3a toward the side surface of the heating chamber 1 is radiated into the heating chamber 1 through the opening 4a in the same direction. Therefore, even if the length of the propagation part 3a in the tube axis direction is short, an electric field 5a in a uniform direction (see FIG. 2) is generated in the propagation part 3a. As a result, stable microwave excitation is generated in the opening 4a in a predetermined direction.
- the propagation part 3a suppresses the influence of disturbance of the electromagnetic field distribution in the vicinity of the magnetron 2. Therefore, even if the length of the propagation part 3b in the tube axis direction is short, an electric field 5b in a uniform direction (see FIG. 2) is generated in the propagation part 3b. As a result, in the opening 4b, stable microwave excitation occurs in a direction orthogonal to the excitation direction in the opening 4a.
- circular polarization or elliptical polarization can be more reliably generated using the compact waveguide 3 having the pair of openings (openings 4a and 4b) configured as described above. Can do.
- two rectangular slits orthogonal to each other are used to generate circularly polarized waves.
- the present invention is not limited to this, and the same effect can be obtained by using an X-shaped opening where two slots intersect, or by using an L-shaped or T-shaped opening.
- the same effect can be obtained by combining one rectangular slot and another rectangular slot shorter and thinner than the rectangular slot.
- FIG. 4 is a front cross-sectional view of a microwave oven 51 that is a microwave processing apparatus according to the second embodiment of the present disclosure.
- the heating chamber 1 has a convex portion 8 a that is a part of the heating chamber 1 below the bottom surface.
- the waveguide 13 includes a propagation part 13a that is a first propagation part and a propagation part 13b that is a second propagation part.
- the cross section of the waveguide 13 parallel to the propagation direction of the microwave has an L shape.
- the waveguide 13 is attached to the convex part 8a so that the propagation part 13a and the propagation part 13b sandwich the lower right corner of the convex part 8a.
- An opening 14a that is a first opening is provided at the end of the propagation part 13a, and the propagation part 13a and the heating chamber 1 communicate with each other through the opening 14a.
- the opening 14a is a rectangular slot having a long side in the depth direction.
- the convex portion 8a is partitioned by virtually projecting the cross section of the propagation portion 13a perpendicular to the tube axis 17a of the propagation portion 13a onto the side surface of the convex portion 8a along the tube axis 17a.
- the opening 14a is provided so that almost all of the region on the side surface (cross-sectional projection region 13c) is an opening.
- the wide surface of the propagation part 13b is provided with an opening 14b as a second opening so as to be orthogonal to the tube axis 17b of the propagation part 13b, and the propagation part 13b and the heating chamber 1 communicate with each other through the opening 14b.
- the opening 14b is a rectangular slot having a long side in the depth direction.
- the opening 14a is arranged so that the cross-sectional projection region 13c and at least a part of the opening 14a overlap, and the center of the opening 14b from the cross-sectional projection region 3c is centered.
- the opening 14b is disposed so as to be detached.
- the propagation direction of the microwave (left direction in FIG. 4) is perpendicular to the side surface of the convex part 8a.
- the propagation direction of the microwave (left direction in FIG. 4) is parallel to the bottom surface of the convex part 8a.
- the magnetron 2 is provided on the lower right side of the waveguide 13.
- the microwave 6a propagating toward the convex portion 8a is radiated into the convex portion 8a through the opening 14a in the same direction. Therefore, even if the length of the propagation part 13a in the tube axis direction is short, an electric field 5a in a uniform direction is generated in the propagation part 13a. As a result, as in the first embodiment, stable microwave excitation occurs in the predetermined direction in the opening 14a.
- the propagation part 13a suppresses the influence of disturbance of the electromagnetic field distribution in the vicinity of the magnetron 2. Therefore, even if the length of the propagation part 13b in the tube axis direction is short, an electric field 5b in a uniform direction is generated in the propagation part 13b. As a result, in the opening 14b, stable microwave excitation is generated in a direction orthogonal to the excitation direction in the opening 14a.
- the circularly polarized wave or the elliptically polarized wave can be more reliably generated by using the compact waveguide 13 having the pair of openings (openings 14a and 14b) configured as described above. Can do.
- FIG. 5 is an enlarged cross-sectional view of the vicinity of the waveguide of the microwave oven 52 that is the microwave processing apparatus according to the third embodiment of the present disclosure.
- the heating chamber 1 includes, as a part of the heating chamber 1, a convex portion 8 b having a horizontal upper surface and an obliquely inclined side surface.
- the waveguide 23 includes a propagation part 23a that is a first propagation part and a propagation part 23b that is a second propagation part.
- the waveguide 23 is attached to the convex portion 8b so that the wide surface of the propagation portion 23a and the wide surface of the propagation portion 23b sandwich the convex portion 8b.
- the magnetron 2 is provided in the vicinity of the intersection of the propagation part 23a and the propagation part 23b.
- An opening 24a that is a first opening is provided at the end of the propagation part 23a, and the propagation part 13a and the heating chamber 1 communicate with each other through the opening 24a.
- the opening 24a is a rectangular slot having a long side in the depth direction.
- the heating chamber 1 is partitioned by virtually projecting the cross section of the propagation portion 23a perpendicular to the tube axis 27a of the propagation portion 23a onto the side surface of the heating chamber 1 along the tube axis 27a.
- the opening 24a is provided so that almost all of the region on the side surface (cross-sectional projection region 23c) is an opening.
- An opening 24b which is a second opening, is provided on the wide surface of the propagation part 23b so as to be orthogonal to the tube axis 27b of the propagation part 23b, and the propagation part 23b and the heating chamber 1 communicate with each other through the opening 24b.
- the opening 24b is a rectangular slot having a long side in the depth direction.
- the opening 24a is arranged so that the cross-sectional projection region 23c and at least a part of the opening 24a overlap, and the center of the opening 24b from the cross-sectional projection region 23c is the center.
- the opening 24b is arranged so as to be detached.
- the propagation direction of the microwave (left direction in FIG. 5) is perpendicular to the side surface of the heating chamber 1.
- the propagation direction of the microwave in the diagonally lower left direction in FIG. 5) is parallel to the side surface of the convex part 8b.
- the microwave 6a propagating toward the heating chamber 1 is radiated into the heating chamber 1 through the opening 24a in the same direction. Therefore, even if the length of the propagation part 23a in the tube axis direction is short, an electric field 5a in a uniform direction is generated in the propagation part 23a. As a result, as in the first embodiment, stable microwave excitation is generated in the predetermined direction in the opening 24a.
- the length of the propagation portion 23b in the tube axis direction can be designed to be longer in a limited space. Therefore, an electric field 5b having a uniform direction is generated in the propagation part 23b. As a result, in the opening 24b, stable microwave excitation is generated in a direction orthogonal to the excitation direction in the opening 24a.
- the compact waveguide 23 having the pair of openings (openings 24a and 24b) configured as described above it is possible to more reliably generate circularly polarized waves or elliptically polarized waves. Can do.
- the microwave processing apparatus of the present disclosure it is possible to uniformly irradiate an object to be heated with microwaves. Therefore, the microwave processing apparatus of this indication is applicable to the microwave heating apparatus for cooking, sterilization, etc.
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Abstract
L'invention concerne un four à micro-ondes (50) qui comprend un guide d'ondes (3) comprenant une première partie de propagation et une seconde partie de propagation, ainsi qu'une paire d'ouvertures formées sur une surface latérale d'une chambre de chauffage (1), les ouvertures assurant une communication entre le guide d'ondes (3) et la chambre de chauffage (1). La première partie de propagation transmet des micro-ondes vers la chambre de chauffage (1) et la seconde partie de propagation transmet les micro-ondes en parallèle à la chambre de chauffage (1). Les ouvertures comprennent une première ouverture (4a) et une seconde ouverture (4b), des ondes à polarisation circulaire étant générées. La première ouverture (4a) est formée de telle sorte qu'au moins une partie de la première ouverture (4a) chevauche une région de projection de section transversale (3c) délimitée en projetant virtuellement une section transversale de la première partie de propagation orthogonale à l'axe du tube de la première partie de propagation sur la surface latérale de la chambre de chauffage (1) le long de l'axe du tube de la première partie de propagation. Des ondes à polarisation circulaire ou des ondes à polarisation elliptique sont ainsi générées de façon plus fiable à l'aide d'un guide d'ondes compact.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2014061330A JP2015185409A (ja) | 2014-03-25 | 2014-03-25 | マイクロ波処理装置 |
JP2014-061330 | 2014-03-25 |
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WO2015146029A1 true WO2015146029A1 (fr) | 2015-10-01 |
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PCT/JP2015/001326 WO2015146029A1 (fr) | 2014-03-25 | 2015-03-11 | Appareil de traitement à micro-ondes |
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Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54151944U (fr) * | 1978-04-13 | 1979-10-22 | ||
JPH10106741A (ja) * | 1996-08-31 | 1998-04-24 | Daewoo Electron Co Ltd | 電子レンジの導波管システム |
JPH11176570A (ja) * | 1997-12-02 | 1999-07-02 | Samsung Electron Co Ltd | 電子レンジ |
JP2000048946A (ja) * | 1998-07-22 | 2000-02-18 | Samsung Electronics Co Ltd | 電子レンジ |
JP3510523B2 (ja) * | 1998-04-06 | 2004-03-29 | エルジー電子株式会社 | 電子レンジおよび導波管システム |
WO2012073451A1 (fr) * | 2010-11-29 | 2012-06-07 | パナソニック株式会社 | Four à micro-ondes |
-
2014
- 2014-03-25 JP JP2014061330A patent/JP2015185409A/ja active Pending
-
2015
- 2015-03-11 WO PCT/JP2015/001326 patent/WO2015146029A1/fr active Application Filing
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54151944U (fr) * | 1978-04-13 | 1979-10-22 | ||
JPH10106741A (ja) * | 1996-08-31 | 1998-04-24 | Daewoo Electron Co Ltd | 電子レンジの導波管システム |
JPH11176570A (ja) * | 1997-12-02 | 1999-07-02 | Samsung Electron Co Ltd | 電子レンジ |
JP3510523B2 (ja) * | 1998-04-06 | 2004-03-29 | エルジー電子株式会社 | 電子レンジおよび導波管システム |
JP2000048946A (ja) * | 1998-07-22 | 2000-02-18 | Samsung Electronics Co Ltd | 電子レンジ |
WO2012073451A1 (fr) * | 2010-11-29 | 2012-06-07 | パナソニック株式会社 | Four à micro-ondes |
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JP2015185409A (ja) | 2015-10-22 |
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