WO2015121790A3 - Procédé de placage au chrome trivalent en continu - Google Patents

Procédé de placage au chrome trivalent en continu Download PDF

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Publication number
WO2015121790A3
WO2015121790A3 PCT/IB2015/050974 IB2015050974W WO2015121790A3 WO 2015121790 A3 WO2015121790 A3 WO 2015121790A3 IB 2015050974 W IB2015050974 W IB 2015050974W WO 2015121790 A3 WO2015121790 A3 WO 2015121790A3
Authority
WO
WIPO (PCT)
Prior art keywords
trivalent chromium
continuous
plating method
chromium plating
ions
Prior art date
Application number
PCT/IB2015/050974
Other languages
English (en)
Spanish (es)
Other versions
WO2015121790A2 (fr
Inventor
Carlos Enrique MUÑOZ GARCIA
Sara Elisa MUÑOZ CASTAÑO
David MUÑOZ CASTAÑO
Marcela MUÑOZ CASTAÑO
Original Assignee
Muñoz Garcia Carlos Enrique
Muñoz Castaño Sara Elisa
Muñoz Castaño David
Muñoz Castaño Marcela
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Muñoz Garcia Carlos Enrique, Muñoz Castaño Sara Elisa, Muñoz Castaño David, Muñoz Castaño Marcela filed Critical Muñoz Garcia Carlos Enrique
Priority to CN201580019366.6A priority Critical patent/CN106164340A/zh
Priority to US15/118,460 priority patent/US20170167040A1/en
Priority to EP15748593.9A priority patent/EP3106544A4/fr
Priority to BR112016018584A priority patent/BR112016018584A2/pt
Priority to MX2016010449A priority patent/MX2016010449A/es
Priority to RU2016135556A priority patent/RU2016135556A/ru
Publication of WO2015121790A2 publication Critical patent/WO2015121790A2/fr
Publication of WO2015121790A3 publication Critical patent/WO2015121790A3/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C25D21/14—Controlled addition of electrolyte components
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/16—Regeneration of process solutions
    • C25D21/18—Regeneration of process solutions of electrolytes

Abstract

La présente invention appartient au domaine de la chimie et de la métallurgie et est reliée spécifiquement à un procédé de production électrolytique ou électrophorétique de revêtements électrochimiques avec un bain, à partir de solutions de chrome trivalent décoratif sur un substrat métallique ou plastique avec des ions de chrome trivalent, des ions sulfate, des anodes en graphite, avec un contrôle du chrome hexavalent et la purification de fausse cathode dans une opération industrielle en continu.
PCT/IB2015/050974 2014-02-11 2015-02-09 Procédé de placage au chrome trivalent en continu WO2015121790A2 (fr)

Priority Applications (6)

Application Number Priority Date Filing Date Title
CN201580019366.6A CN106164340A (zh) 2014-02-11 2015-02-09 三价铬酸盐电镀的连续方法
US15/118,460 US20170167040A1 (en) 2014-02-11 2015-02-09 Continuous trivalent chromium plating method
EP15748593.9A EP3106544A4 (fr) 2014-02-11 2015-02-09 Procédé de placage au chrome trivalent en continu
BR112016018584A BR112016018584A2 (pt) 2014-02-11 2015-02-09 processo de banho continuo de cromo trivalente
MX2016010449A MX2016010449A (es) 2014-02-11 2015-02-09 Proceso de cromado trivalente continuo.
RU2016135556A RU2016135556A (ru) 2014-02-11 2015-02-09 Способ непрерывного нанесения покрытия из трехвалентного хрома

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CO14-28206 2014-02-11
CO14028206A CO7190036A1 (es) 2014-02-11 2014-02-11 Proceso de cromado trivalente continuo

Publications (2)

Publication Number Publication Date
WO2015121790A2 WO2015121790A2 (fr) 2015-08-20
WO2015121790A3 true WO2015121790A3 (fr) 2016-01-21

Family

ID=53191871

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IB2015/050974 WO2015121790A2 (fr) 2014-02-11 2015-02-09 Procédé de placage au chrome trivalent en continu

Country Status (8)

Country Link
US (1) US20170167040A1 (fr)
EP (1) EP3106544A4 (fr)
CN (1) CN106164340A (fr)
BR (1) BR112016018584A2 (fr)
CO (1) CO7190036A1 (fr)
MX (1) MX2016010449A (fr)
RU (1) RU2016135556A (fr)
WO (1) WO2015121790A2 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4170071A1 (fr) 2017-04-04 2023-04-26 Atotech Deutschland GmbH & Co. KG Procédé de dépôt électrolytique d'une couche de chrome ou d'alliage de chrome sur au moins un substrat
AT520829B1 (de) * 2018-10-19 2019-08-15 Andritz Ag Maschf Verfahren zum Verchromen von Metallbändern
WO2020189802A1 (fr) * 2019-03-15 2020-09-24 유한회사 한국신기술 Antioxydan, comprenant un composite à groupe cyano-carboxyle exempt de constituant soufré, pour empêcher l'oxydation d'ions chrome trivalents en ions chrome divalents, et solution d'électrodéposition de chrome trivalent le comprenant
CN110760900A (zh) * 2019-11-29 2020-02-07 扬州大学 一种六价铬废水还原作电镀铬源的方法及其电镀方法
RU2734986C1 (ru) * 2020-03-23 2020-10-27 Федеральное государственное бюджетное образовательное учреждение высшего образования "Российский химико-технологический университет имени Д. И. Менделеева" (РХТУ им. Д. И. Менделеева) Способ электрохимического нанесения хромовых покрытий из саморегулирующегося электролита на основе соединений трехвалентного хрома
CN113774438A (zh) * 2021-08-24 2021-12-10 上原汽车铭牌（惠州）有限公司 汽车标识生产用三价铬电镀液配方及三价铬电镀工艺

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2748069A (en) * 1948-03-20 1956-05-29 Iexi Jean Jacques Georges Trivalent chromium plating solution
US3111464A (en) * 1961-09-29 1963-11-19 Battelle Development Corp Electrodeposition of chromium and chromium alloys
US3729392A (en) * 1971-02-19 1973-04-24 Du Pont Plating of titanium with chromium
US4477315A (en) * 1980-11-10 1984-10-16 Omi International Corporation Trivalent chromium electrolyte and process employing reducing agents
US20080169199A1 (en) * 2007-01-17 2008-07-17 Chang Gung University Trivalent chromium electroplating solution and an electroplating process with the solution
CN102443825A (zh) * 2011-12-07 2012-05-09 黄石振华化工有限公司 一种高浓度硫酸铬——氟化铵三价铬电镀液及其制备方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2112691A (en) * 1936-01-30 1938-03-29 Pyrene Mfg Co Electroplating anode unit
US4167460A (en) * 1978-04-03 1979-09-11 Oxy Metal Industries Corporation Trivalent chromium plating bath composition and process
US4439285A (en) * 1980-11-10 1984-03-27 Omi International Corporation Trivalent chromium electrolyte and process employing neodymium reducing agent
CA1244376A (fr) * 1983-05-12 1988-11-08 Thaddeus W. Tomaszewski Electrolyte de chrome trivalent et mode d'utilisation
US7052592B2 (en) * 2004-06-24 2006-05-30 Gueguine Yedigarian Chromium plating method
JP2009074168A (ja) * 2007-08-30 2009-04-09 Nissan Motor Co Ltd クロムめっき部品およびその製造方法
CN201172698Y (zh) * 2008-02-18 2008-12-31 佛山市昭信金属制品有限公司 一种硫酸型三价铬镀液防治金属离子杂质污染装置
US7780840B2 (en) * 2008-10-30 2010-08-24 Trevor Pearson Process for plating chromium from a trivalent chromium plating bath
CN101665960A (zh) * 2009-09-04 2010-03-10 厦门大学 一种硫酸盐三价铬电镀液与制备方法
JP5732721B2 (ja) * 2010-01-08 2015-06-10 上村工業株式会社 クロムめっき方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2748069A (en) * 1948-03-20 1956-05-29 Iexi Jean Jacques Georges Trivalent chromium plating solution
US3111464A (en) * 1961-09-29 1963-11-19 Battelle Development Corp Electrodeposition of chromium and chromium alloys
US3729392A (en) * 1971-02-19 1973-04-24 Du Pont Plating of titanium with chromium
US4477315A (en) * 1980-11-10 1984-10-16 Omi International Corporation Trivalent chromium electrolyte and process employing reducing agents
US20080169199A1 (en) * 2007-01-17 2008-07-17 Chang Gung University Trivalent chromium electroplating solution and an electroplating process with the solution
CN102443825A (zh) * 2011-12-07 2012-05-09 黄石振华化工有限公司 一种高浓度硫酸铬——氟化铵三价铬电镀液及其制备方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP3106544A4 *

Also Published As

Publication number Publication date
RU2016135556A3 (fr) 2018-10-29
BR112016018584A2 (pt) 2019-08-20
CN106164340A (zh) 2016-11-23
EP3106544A2 (fr) 2016-12-21
MX2016010449A (es) 2017-06-19
RU2016135556A (ru) 2018-03-15
US20170167040A1 (en) 2017-06-15
EP3106544A4 (fr) 2017-08-09
CO7190036A1 (es) 2015-02-19
WO2015121790A2 (fr) 2015-08-20

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Free format text: O PRESENTE PEDIDO FOI DEPOSITADO ATRAVES DO PCTIB2015/050974 EM 09/02/2015, DANDO ENTRADA NA FASE NACIONAL EM 12/08/2016, APESAR DO PRAZO EXPIRAR EM 11/08/2016 (30 MESES CONTADOS DA DATA DE PRIORIDADE QUE E 11/02/2014).JUNTAMENTE COM A PETICAO DE ENTRADA, O DEPOSITANTE SOLICITOU CONCESSAO DE PRAZO ADICIONAL OU RESTABELECIMENTO DE DIREITO DE ENTRADA NA FASE NACIONAL, JUSTIFICANDO QUE POR FALHA NO SISTEMA DE RECEBIMENTO DE PEDIDOS DO INPI, NAO FOI POSSIVEL REALIZAR O DEPOSITO DENTRO DO PRAZO.A ALEGACAO APRESENTADA CONFIGURA MOTIVO RELEVANTE PARA A FALTA DE EXECUCAO DOS ATOS E FOI ANEXADO A PETICAO O INFORME DO INSTITUTO SOBRE A FALHA EM QUESTAO. DIANTE DO EXPOSTO, CONSIDERA-SE QUE O PEDIDO DE

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