WO2015100801A1 - 液晶面板及其制作方法 - Google Patents

液晶面板及其制作方法 Download PDF

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Publication number
WO2015100801A1
WO2015100801A1 PCT/CN2014/070609 CN2014070609W WO2015100801A1 WO 2015100801 A1 WO2015100801 A1 WO 2015100801A1 CN 2014070609 W CN2014070609 W CN 2014070609W WO 2015100801 A1 WO2015100801 A1 WO 2015100801A1
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Prior art keywords
substrate
spacer
liquid crystal
crystal panel
tft
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PCT/CN2014/070609
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English (en)
French (fr)
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吕启标
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深圳市华星光电技术有限公司
吕启标
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Priority to US14/235,794 priority Critical patent/US9305982B2/en
Publication of WO2015100801A1 publication Critical patent/WO2015100801A1/zh

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/50—OLEDs integrated with light modulating elements, e.g. with electrochromic elements, photochromic elements or liquid crystal elements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136209—Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136286—Wiring, e.g. gate line, drain line
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G02F1/13396—Spacers having different sizes

Definitions

  • the present invention relates to the field of liquid crystal display, and more particularly to a liquid crystal panel and a method of fabricating the same.
  • Display is indispensable in people's daily life, and the types of displays include CRT (Cathode Ray Tube, cathode ray tube, LED (Light Emitting Diode), TFT-LCD (Thin Film Transistor-Liquid) Crystal Display, thin film transistor liquid crystal display), PDP (Plasma Display Panel, plasma, etc., most of the current displays on the market are TFT-LCD types.
  • the TFT-LCD display is mainly composed of a color film substrate and an array substrate which are oppositely arranged.
  • the array substrate forms a circuit matrix (scanning line, data line, etc.) on the substrate through an array process, and the color filter substrate passes through a color filter process on the substrate.
  • the finished product for example, a TFT-LCD TV, a display, etc. is formed through subsequent module processes.
  • the main object of the present invention is to provide a liquid crystal panel and a manufacturing method thereof, which aim to effectively avoid the phenomenon of light leakage in the edge region of the scanning line and improve the display effect of the large-sized liquid crystal panel.
  • the present invention provides a liquid crystal panel comprising: a first substrate and a second substrate disposed opposite to each other, wherein a first light spacer is disposed on a side of the first substrate facing the second substrate, Providing a pad on a side of the second substrate facing the first substrate, the pad corresponding to the first optical spacer, and a side of the second substrate facing the first substrate a TFT is disposed, the TFT is provided with a plurality of scanning lines and a plurality of data lines that intersect perpendicularly, and a second optical spacer and a third optical gap are further disposed on a side of the first substrate facing the second substrate.
  • the second photo spacer corresponds to a side of the TFT along the scanning line direction
  • the third spacer corresponds to the other side of the TFT along the scanning line direction.
  • an end of the third spacer away from the first substrate has a gap with the second substrate.
  • a side of the third spacer close to the TFT has a gap with the TFT.
  • the thickness of the first spacer is smaller than the thickness of the second spacer, and the thickness of the second spacer is the same as the thickness of the third spacer.
  • the first substrate is a color filter substrate
  • the second substrate is an array substrate
  • the TFT The gate insulating layer, the active layer, and the passivation layer are disposed on a side of the array substrate facing the color filter substrate, and the pad includes a single layer or more of the gate insulating layer, the active layer or the passivation layer material formed Floor.
  • the first substrate is a color filter substrate
  • the second substrate is an array substrate
  • the color film substrate is provided with a black matrix on one side of the array substrate, a color resistance disposed between the black matrices, and Covering the color resistance and the common electrode of the black matrix, the first spacer, the second spacer, and the third spacer are disposed on the common electrode.
  • the first substrate is a color filter substrate
  • the second substrate is an array substrate
  • the plurality of scan lines and the plurality of data lines enclose a plurality of pixel units
  • each of the pixel units further includes a pixel electrode connected to the drain of the TFT.
  • the invention further provides a method for fabricating a liquid crystal panel, the method comprising the steps of:
  • a liquid crystal layer is poured between the first substrate and the second substrate, and the first substrate and the second substrate are bonded to form a liquid crystal panel.
  • the step of providing a first substrate, forming a first optical spacer, a second optical spacer, and a third spacer on the first substrate comprises:
  • a first spacer, a second spacer, and a third spacer are formed on the common electrode.
  • the first spacer, the second spacer and the third spacer are formed simultaneously, the thickness of the first spacer is smaller than the thickness of the second spacer, and the thickness of the second spacer The same as the thickness of the third spacer.
  • the present invention is provided with a second spacer and a third spacer on both sides of the TFT in the scanning line direction, and a groove is formed between the second spacer and the third spacer.
  • the TFT card is held in the recess, and the offset is not easy to occur, thereby avoiding the phenomenon that the alignment of the second substrate and the first substrate is shifted due to the large size of the liquid crystal panel, and the light leakage occurs at the edge region of the scan line.
  • FIG. 1 is a schematic structural view of a preferred embodiment of a liquid crystal panel of the present invention.
  • FIG. 2 is a schematic flow chart of a preferred embodiment of a method for fabricating a liquid crystal panel of the present invention.
  • the liquid crystal panel includes a first substrate 10 and a second substrate 20 disposed opposite to each other, and the first substrate 10 faces the second substrate 20 .
  • a first optical spacer (not shown) is disposed on the side, and a side of the second substrate 20 facing the first substrate 10 is provided with a pad (not shown), the pad
  • a TFT 201 is further disposed on a side of the second substrate 20 facing the first substrate 10, and the TFT 201 is provided with a plurality of scanning lines and a plurality of data lines vertically intersecting each other.
  • a second optical spacer 101 and a third optical spacer 102 are further disposed on a side of the first substrate 10 facing the second substrate 20, and the second optical spacer 101 Corresponding to one side of the TFT 201 in the scanning line direction, the third photo spacer 102 corresponds to the other side of the TFT 201 in the scanning line direction.
  • the first substrate 10 is a color filter substrate 10
  • the second substrate 20 is an array substrate 20
  • the liquid crystal panel further includes a color film substrate 10 and the array substrate 20 a liquid crystal layer; a black matrix 103, a color resist 104 disposed between the black matrices 103, and a common electrode 105 overlying the color resist 104 and the black matrix 103 are disposed on the color filter substrate 10, the first A spacer, the second optical spacer 101, and the third optical spacer 102 are formed on the common electrode 105.
  • a plurality of scan lines and a plurality of data lines are formed on the array substrate 20, the scan lines and the data lines are perpendicularly intersected, and a TFT 201 is formed at a position where the plurality of scan lines and the plurality of data lines intersect.
  • the plurality of scan lines and the plurality of data lines are surrounded by a plurality of pixel units (not shown), and each of the pixel units further includes a pixel electrode 208 connected to the drain 202 of the TFT 201.
  • the TFT 201 is a bottom gate structure, and the TFT 201 includes a gate 203 (scanning line), a gate insulating layer 204, an active layer 205, a source 206, and a drain 203 which are sequentially disposed on the array substrate 20. And a passivation layer 207; a position of the drain 202 connected to the pixel electrode 208 is provided with a contact hole 209 for interrupting the passivation layer 207 to enable the pixel electrode 208 to The pole 202 is connected.
  • a spacer on the gate insulating layer 204 is further formed on the array substrate 20, and the pad is located at a position corresponding to the first optical spacer located on the color filter substrate 10, and the pad and the pad are The first optical spacer is in contact with each other.
  • the spacer cooperates with the first optical spacer located on the color filter substrate 10 for supporting the first box thickness of the liquid crystal panel under external force.
  • the liquid crystal panel includes a display area and a non-display area (not shown) for blocking the non-display area, for example, blocking the TFT 201; the color resistance 104 and the array
  • the pixel units on the substrate 20 are in one-to-one correspondence, and the color resists 104 include a red resistance, a green resistance, and a blue resistance (not shown in the figure), and cooperate with corresponding pixel units to form a color to be displayed;
  • the common electrode 105 and the pixel electrode 208 are both transparent electrodes, and the liquid crystal layer is located between the common electrode 105 and the pixel electrode 208.
  • the common electrode 105 is loaded with a common voltage
  • the pixel electrode 208 of each pixel unit is loaded with a corresponding pixel voltage
  • the common electrode 105 and the pixel electrode 208 are coordinated to control the location.
  • the deflection of the liquid crystal molecules between the common electrode 105 and the pixel electrode 208 is formed to form a color to be displayed.
  • the material of the pixel electrode 208 and the common electrode 105 is indium tin oxide (ITO). In other embodiments of the invention, the pixel electrode The material of 208 and the common electrode 105 may also be other conductive materials.
  • the second optical spacer 101 corresponds to one side of the TFT 201 in the scanning line direction
  • the third optical spacer 102 corresponds to the other side of the TFT 201 in the scanning line direction. That is, the first optical spacers and the second optical spacers 101 respectively correspond to the two sides of the TFT 201 in the scanning line direction, and the TFT 201 is in the second optical spacer 101 and the Between the third optical spacers 102; the second optical spacers 101 and the third optical spacers 102 are protruded from the color filter substrate 10 on the color filter substrate 10, and have a certain thickness.
  • the second optical spacer 101 and the third optical spacer 102 form a groove, and the second optical spacer 101 and the third optical spacer 102 hold the TFT 201 in the groove.
  • One end of the second optical spacer 101 and the third optical spacer 102 away from the color filter substrate 10 has a gap with the array substrate 20, and the liquid crystal panel is deformed when pressed by an external force, or, due to the liquid crystal panel itself When the size is too large and the substrate is deformed, the second optical spacer 101 and/or the third optical spacer 102 respectively cooperate with the array substrate 20 to support the second thickness of the liquid crystal panel.
  • the second optical spacer 101 and the third optical spacer 102 are disposed on both sides of the TFT 201 along the scanning line direction, between the second optical spacer 101 and the third optical spacer 102.
  • Forming a recess to hold the TFT 201 in the recess is not easy to be offset, thereby avoiding the edge of the scan line caused by the offset of the alignment between the array substrate 20 and the color filter substrate 10 due to the large size of the liquid crystal panel. Light leakage occurs and the display effect of the liquid crystal panel is improved.
  • the second optical spacer 101 and the third optical spacer 102 are synchronously formed, and the second optical spacer 101 and the third optical gap
  • the thickness of the object 102 is the same, that is, the distance from the end of the second optical spacer 101 away from the end of the color filter substrate 10 to the array substrate 20 is equal to the distance from the third optical spacer 102 to the color filter substrate 10 .
  • the distance from one end to the array substrate 20 is not limited to this.
  • the first spacer, the second optical spacer 101 and the third optical spacer 102 are formed simultaneously.
  • the thickness of the first spacer is smaller than the thickness of the second spacer, but the invention is not limited thereto.
  • the liner includes a single layer or a plurality of layers in the material of the gate insulating layer 204, the active layer 205, or the passivation layer 207 formed. That is, the spacer is formed in synchronization with a single layer or a plurality of layers of the gate insulating layer 204, the active layer 205, or the passivation layer 207 formed.
  • FIG. 2 is a schematic flow chart of a first embodiment of a method for fabricating a liquid crystal panel according to the present invention.
  • the manufacturing method of the liquid crystal panel includes the following steps:
  • Step S11 providing a first substrate, forming a first optical spacer, a second optical spacer, and a third spacer on the first substrate;
  • Step S12 providing a second substrate, and sequentially forming TFTs on the second substrate a gate, a gate insulating layer, an active layer, a source/drain metal layer, a passivation layer, and at the same time, forming a spacer at a corresponding first optical spacer, the second optical spacer and the TFT along One side of the scan line direction corresponding to the other side of the TFT along the scan line direction;
  • step S13 a contact hole is formed in the passivation layer, and a pixel electrode is formed on the passivation layer, and the pixel electrode is electrically connected through the contact hole and the drain metal layer.
  • Step S14 pouring a liquid crystal layer between the first substrate and the second substrate, and bonding the first substrate and the second substrate to form a liquid crystal panel.
  • a first substrate is provided, a black matrix is deposited and etched on the first substrate, and a color resistance is formed on the first substrate between the black matrices, where the color resistance includes but not Limited to a red resistance, a green resistance, and a blue resistance; forming a common electrode covering the color resistance and the black matrix, forming a first spacer, a second spacer, and a third spacer on the common electrode; a second substrate on which TFTs are sequentially formed on the second substrate a gate, a gate insulating layer, an active layer, a source/drain metal layer, a passivation layer, and at the same time, forming a spacer at a corresponding first optical spacer, the second optical spacer and the TFT along One side of the scanning line direction corresponding to the other side of the TFT along the scanning line direction; a contact hole is formed in the passivation layer, and a pixel is formed on the passivation layer An electrode, the pixel electrode being electrically connected through the contact hole
  • the TFT, the plurality of scan lines and the plurality of data lines enclose a plurality of pixel units, and each of the pixel units further includes a pixel electrode connected to a drain of the TFT.
  • the TFT is a bottom gate structure, and the TFT includes a gate, a gate insulating layer, an active layer, a source, a drain, and a passivation layer sequentially disposed on the second substrate; the drain A contact hole is disposed at a position connected to the pixel electrode for interrupting the passivation layer to enable the pixel electrode to be connected to the drain.
  • Forming a spacer on the gate insulating layer on the second substrate, the pad is located at a position corresponding to the first optical spacer located on the first substrate, and the pad and the first A light gap is in contact with each other. The pad cooperates with the first optical spacer on the first substrate for supporting a first cell thickness of the liquid crystal panel under an external force.
  • the liquid crystal panel includes a display area and a non-display area, the black matrix is used to block the non-display area, for example, the TFT is blocked; and the color resistance is in one-to-one correspondence with the pixel unit on the second substrate.
  • the color resistance includes a red resistance, a green resistance, and a blue resistance, and cooperate with corresponding pixel units to form a color to be displayed; the common electrode and the pixel electrode are transparent electrodes, and the liquid crystal layer is located at Between the common electrode and the pixel electrode.
  • the common electrode is loaded with a common voltage
  • the pixel electrode of each pixel unit is loaded with a corresponding pixel voltage
  • the common electrode and the pixel electrode are cooperatively controlled to be located at the common electrode and Deflection of liquid crystal molecules between the pixel electrodes to form a color to be displayed.
  • the material of the pixel electrode and the common electrode is indium tin oxide (ITO).
  • ITO indium tin oxide
  • the pixel electrode and the common The material of the electrode can also be other conductive materials.
  • the second photo spacer corresponds to a side of the TFT along the scanning line direction
  • the third spacer corresponds to the other side of the TFT along the scanning line direction. That is, the first optical spacer and the second optical spacer correspond to the two sides of the TFT in the scanning line direction, respectively, and the TFT is in the second optical spacer and the third Between the optical spacers; the second spacer and the third spacer are protruded from the first substrate on the first substrate, and have a certain thickness, and therefore, the second spacer and the The third spacer constitutes a recess, and the second spacer and the third spacer hold the TFT in the recess.
  • the end of the second spacer and the third spacer away from the first substrate has a gap with the second substrate, and the liquid crystal panel is deformed when pressed by an external force, or the substrate is too large due to the size of the liquid crystal panel itself.
  • the second spacer and/or the third spacer respectively cooperate with the second substrate for supporting a second thickness of the liquid crystal panel.
  • a second spacer and a third spacer are disposed on both sides of the TFT in the scanning line direction, and a groove is formed between the second spacer and the third spacer to clamp the TFT card. Holding in this groove, it is not easy to be offset, thereby avoiding the phenomenon that the alignment of the second substrate and the first substrate is shifted due to the large size of the liquid crystal panel, causing light leakage in the edge region of the scanning line, and the liquid crystal panel is improved. display effect.
  • the second spacer and the third spacer are formed in synchronization, and the second spacer has the same thickness as the third spacer, that is, The distance from the one end of the second spacer to the second substrate is equal to the distance of the third spacer from the end of the first substrate to the second substrate, but the present invention Not limited to this.
  • the first spacer, the second spacer and the third spacer are formed simultaneously. The thickness of the first spacer is smaller than the thickness of the second spacer, but the invention is not limited thereto.
  • the liner includes a single layer or a plurality of layers of the formed gate insulating layer, active layer or passivation layer material. That is, the spacer is formed in synchronization with a single layer or a plurality of layers of the formed gate insulating layer, active layer or passivation layer material.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
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Abstract

一种液晶面板及其制作方法。该液晶面板包括相对设置的第一基板（10）和第二基板（20）。第一基板（10）朝向第二基板（20）的一侧上设置有第一光间隙物，第二基板（20）朝向第一基板（10）的一侧上设置有衬垫，衬垫与第一光间隙物相对应。第二基板（20）朝向第一基板（10）的一侧上还设置有TFT（201），TFT（201）设置有垂直相交的多条扫描线和多条数据线。第一基板（10）朝向第二基板（20）的一侧上还设置有第二光间隙物（101）和第三光间隙物（102），第二光间隙物（101）与TFT（201）沿扫描线方向的一侧相对应，第三光间隙物（102）与TFT（201）沿扫描线方向的另一侧相对应。该液晶面板有效避免扫描线边缘区域出现漏光的现象。

Description

液晶面板及其制作方法
技术领域
　　　本发明涉及液晶显示领域，尤其涉及液晶面板及其制作方法。　　　
背景技术
　　　显示器在人们日常生活中已经无法或缺，显示器的类型包括CRT（Cathode Ray Tube，阴极射线管）、LED（Light Emitting Diode，发光二极管）、TFT-LCD（Thin Film Transistor-Liquid Crystal Display，薄膜晶体管液晶显示器）、PDP（Plasma Display Panel，等离子）等，目前市面上显示器绝大多数为TFT-LCD类型。
　　　TFT-LCD显示器主要是由对立设置的彩膜基板和阵列基板组成，阵列基板经过阵列工艺在基板上形成电路矩阵（扫描线、数据线等）等，彩膜基板经过彩色滤光片工艺在基板上形成黑色矩阵及红绿蓝相间的彩膜，然后通过对组工艺将阵列基板和彩膜基板对组贴合，并在两片基板间滴上液晶，涂上封框胶然后对盒，再经过后续模组工序就形成了成品（例如，TFT-LCD电视、显示器等）。
　　　然而，随着TFT-LCD显示器尺寸越来越大(一般在32寸以上)，在阵列基板和彩膜基板对组的过程中，处于对组上方的基板容易发生弯曲形变，使得阵列基板和彩膜基板的对位发生偏移，造成遮挡扫描线边缘区域的黑色矩阵的位置也发生偏移，不再遮挡扫描线边缘区域，导致扫描线边缘区域出现漏光的现象，严重影响了TFT-LCD显示器的显示效果。
　　　上述内容仅用于辅助理解本发明的技术方案，并不代表承认上述内容是现有技术。　　　
发明内容
　　　本发明的主要目的为提供液晶面板及其制作方法，旨在实现有效避免扫描线边缘区域出现漏光的现象，提高了大尺寸液晶面板的显示效果。　　　
　　　为了实现上述目的，本发明提出一种液晶面板，包括：相对设置的第一基板和第二基板，所述第一基板朝向所述第二基板的一侧上设置有第一光间隙物，所述第二基板朝向所述第一基板的一侧上设置有衬垫，所述衬垫与所述第一光间隙物相对应，所述第二基板朝向所述第一基板的一侧上还设置有TFT，所述TFT设置有垂直相交的多条扫描线和多条数据线，所述第一基板朝向所述第二基板的一侧上还设置有第二光间隙物和第三光间隙物，所述第二光间隙物与所述TFT沿所述扫描线方向的一侧相对应，所述第三间隙物与所述TFT沿所述扫描线方向的另一侧相对应。
　　　优选地，所述第三间隙物远离所述第一基板的一端与所述第二基板具有间隙。
　　　优选地，所述第三间隙物靠近所述TFT的一侧与所述TFT具有间隙。
　　　优选地，所述第一间隙物的厚度小于所述第二间隙物的厚度，所述第二间隙物的厚度与所述第三间隙物的厚度相同。
　　　优选地，所述第一基板为彩膜基板，所述第二基板为阵列基板，所述TFT 包括位于阵列基板朝向彩膜基板一侧的栅绝缘层、有源层、钝化层，所述衬垫包括所述形成的栅绝缘层、有源层或钝化层材料中的单层或多层。
　　　优选地，所述第一基板为彩膜基板，所述第二基板为阵列基板，所述彩膜基板朝所述阵列基板的一侧设置有黑色矩阵、设置于黑色矩阵之间的色阻及覆盖所述色阻和所述黑色矩阵的公用电极，所述第一间隙物、所述第二间隙物及所述第三间隙物设置在所述公用电极上。
　　　优选地，所述第一基板为彩膜基板，所述第二基板为阵列基板，所述多条扫描线和所述多条数据线围成多个像素单元，每个所述像素单元还包括与TFT的漏极相连的像素电极。　　　
　　　本发明进一步提出一种液晶面板的制作方法，该方法包括步骤：
　　　提供第一基板，在所述第一基板上形成第一光间隙物、第二光间隙物及第三间隙物；
　　　提供第二基板，在所述第二基板上依次形成TFT 的栅极、栅绝缘层、有源层、源极/漏极金属层、钝化层，同时，在对应第一光间隙物处形成衬垫，所述第二光间隙物与所述TFT沿所述扫描线方向的一侧相对应，所述第三间隙物与所述TFT沿所述扫描线方向的另一侧相对应；
　　　在钝化层内形成接触孔，在钝化层上形成像素电极，所述像素电极通过接触孔和漏极金属层电连接；
　　　在第一基板和第二基板之间灌注液晶层，并贴合所述第一基板、第二基板以形成液晶面板。
　　　优选地，所述提供第一基板，在所述第一基板上形成第一光间隙物、第二光间隙物及第三间隙物的步骤包括：
　　　提供第一基板，在所述第一基板上沉积并蚀刻出黑色矩阵，在所述黑色矩阵之间的所述第一基板上形成色阻；
　　　形成覆盖所述色阻和所述黑色矩阵的公用电极；
　　　在所述公用电极上形成第一间隙物、第二间隙物和第三间隙物。
　　　优选地，所述第一间隙物、第二间隙物和所述第三间隙物同步形成，所述第一间隙物的厚度小于所述第二间隙物的厚度，所述第二间隙物的厚度与所述第三间隙物的厚度相同。　　　
　　　相对现有技术，本发明在TFT沿扫描线方向的两侧，设置有第二间隙物和第三间隙物，在所述第二间隙物和所述第三间隙物之间形成一个凹槽，将TFT卡持在这个凹槽内，不容易发生偏移，进而避免由于液晶面板尺寸较大，第二基板和第一基板的对位发生偏移，而造成扫描线边缘区域出现漏光的现象，提高液晶面板的显示效果。　　　
附图说明
　　　图1为本发明液晶面板的较佳实施例的结构示意图；
　　　图2为本发明液晶面板的制作方法的较佳实施例的流程示意图。　　　
　　　本发明目的的实现、功能特点及优点将结合实施例，参照附图做进一步说明。　　　
具体实施方式
　　　应当理解，此处所描述的具体实施例仅仅用以解释本发明，并不用于限定本发明。
　　　本发明提供一种液晶面板，参照图1，在一实施例中，该液晶面板包括相对设置的第一基板10和第二基板20，所述第一基板10朝向所述第二基板20的一侧上设置有第一光间隙物（图中未示出），所述第二基板20朝向所述第一基板10的一侧上设置有衬垫（图中未示出），所述衬垫与所述第一光间隙物相对应，所述第二基板20朝向所述第一基板10的一侧上还设置有TFT201，所述TFT201设置有垂直相交的多条扫描线和多条数据线（图中未示出），所述第一基板10朝向所述第二基板20的一侧上还设置有第二光间隙物101和第三光间隙物102，所述第二光间隙物101与所述TFT201沿所述扫描线方向的一侧相对应，所述第三光间隙物102与所述TFT201沿所述扫描线方向的另一侧相对应。
　　　在本实施例中，所述第一基板10为彩膜基板10，所述第二基板20为阵列基板20，所述液晶面板还包括设置在所述彩膜基板10和所述阵列基板20之间的液晶层；在所述彩膜基板10上设置有黑色矩阵103、设置于黑色矩阵103之间的色阻104、覆盖于色阻104和黑色矩阵103上的公用电极105，所述第一间隙物、所述第二光间隙物101和所述第三光间隙物102形成于所述公用电极105上。
　　　所述阵列基板20上形成有多条扫描线和多条数据线，所述扫描线和所述数据线垂直相交，在所述多条扫描线和所述多条数据线相交位置处形成有TFT201，所述多条扫描线和所述多条数据线围成多个像素单元（图中未示出），每个所述像素单元还包括与TFT201漏极202相连的像素电极208。在本实施例中，所述TFT201为底栅结构，所述TFT201包括依次位于阵列基板20上的栅极203（扫描线）、栅绝缘层204、有源层205、源极206、漏极203及钝化层207；所述漏极202与所述像素电极208相连的位置设置一接触孔209，用于将所述钝化层207打断，以使所述像素电极208能与所述漏极202连接。所述阵列基板20上还形成有位于栅绝缘层204上的衬垫，所述衬垫的位置与位于所述彩膜基板10上的第一光间隙物相对应，且所述衬垫与所述第一光间隙物相接触。所述衬垫与位于所述彩膜基板10上的所述第一光间隙物相配合，用于支持液晶面板在不受外力下的第一盒厚。
　　　所述液晶面板包括显示区域和非显示区域（图中未示出），所述黑色矩阵103用于遮挡所述非显示区域，例如，将所述TFT201遮挡；所述色阻104与所述阵列基板20上的像素单元一一对应，所述色阻104包括红色阻、绿色阻及蓝色阻（图中未一一示出），与相应的像素单元相互配合形成所要显示的颜色；所述公用电极105和所述像素电极208均为透明电极，所述液晶层，即位于所述公用电极105和所述像素电极208之间。在液晶显示面板显示过程中，所述公用电极105上加载有公共电压、各个像素单元的像素电极208上加载有相应的像素电压，所述公用电极105和所述像素电极208相配合控制位于所述公用电极105和所述像素电极208之间的液晶分子的偏转，以形成所要显示的颜色。
　　　为了提高所述公用电极105和所述像素电极208的导电性，所述像素电极208和所述公用电极105的材料为氧化铟锡(ITO)，在本发明其他实施例中，所述像素电极208和所述公用电极105的材料也还可以是其他导电材料。
　　　所述第二光间隙物101与所述TFT201沿所述扫描线方向的一侧相对应，所述第三光间隙物102与所述TFT201沿所述扫描线方向的另一侧相对应。即，所述第一光间隙物和所述第二光间隙物101与TFT201沿所述扫描线方向的两侧分别相对应，且所述TFT201处在所述第二光间隙物101和所述第三光间隙物102之间；位于所述彩膜基板10上所述第二光间隙物101和所述第三光间隙物102相对彩膜基板10凸出，且具有一定的厚度，因此，所述第二光间隙物101和所述第三光间隙物102构成一个凹槽，所述第二光间隙物101和所述第三光间隙物102将所述TFT201卡持在所述凹槽内。所述第二光间隙物101和所述第三光间隙物102远离所述彩膜基板10的一端与所述阵列基板20具有间隙，当液晶面板受到外力按压发生变形，或者，由于液晶面板自身尺寸过大导致基板变形时，所述第二光间隙物101及/或所述第三光间隙物102分别与所述阵列基板20相配合，用于支撑液晶面板的第二盒厚。
　　　在本实施例在TFT201沿扫描线方向的两侧，设置有第二光间隙物101和第三光间隙物102，在所述第二光间隙物101和所述第三光间隙物102之间形成一个凹槽，将TFT201卡持在这个凹槽内，不容易发生偏移，进而避免由于液晶面板尺寸较大，阵列基板20和彩膜基板10的对位发生偏移而造成扫描线边缘区域出现漏光的现象，提高液晶面板的显示效果。　　　
　　　进一步地，为了节约工艺，加快液晶面板的制作过程，所述第二光间隙物101和所述第三光间隙物102同步形成，且所述第二光间隙物101与所述第三光间隙物102的厚度相同，即，所述第二光间隙物101远离所述彩膜基板10的一端到所述阵列基板20的距离，等于所述第三光间隙物102远离所述彩膜基板10的一端到所述阵列基板20的距离，但本发明不仅限于此。为了更加节约工艺，加快液晶面板的制作过程，所述第一间隙物、第二光间隙物101和所述第三光间隙物102同步形成。所述第一间隙物的厚度小于所述第二光间隙物101的厚度，但本发明不仅限于此。　　　
　　　进一步地，为了节约工艺，所述衬垫包括所述形成的栅绝缘层204、有源层205或钝化层207材料中的单层或多层。即，所述衬垫与所述形成的栅绝缘层204、有源层205或钝化层207材料中的单层或多层同步形成。　　　
　　　如图2所示，为本发明液晶面板的制作方法第一实施例的流程示意图。所述液晶面板的制作方法包括如下步骤：
　　　步骤S11，提供第一基板，在所述第一基板上形成第一光间隙物、第二光间隙物及第三间隙物；
　　　步骤S12，提供第二基板，在所述第二基板上依次形成TFT 的栅极、栅绝缘层、有源层、源极/漏极金属层、钝化层，同时，在对应第一光间隙物处形成衬垫，所述第二光间隙物与所述TFT沿所述扫描线方向的一侧相对应，所述第三间隙物与所述TFT沿所述扫描线方向的另一侧相对应；
　　　步骤S13，在钝化层内形成接触孔，在钝化层上形成像素电极，所述像素电极通过接触孔和漏极金属层电连接。
　　　步骤S14，在第一基板和第二基板之间灌注液晶层，并贴合所述第一基板、第二基板以形成液晶面板。
　　　在本实施例中，提供第一基板，在所述第一基板上沉积并蚀刻出黑色矩阵，在所述黑色矩阵之间的所述第一基板上形成色阻，所述色阻包括但不限于红色阻、绿色阻和蓝色阻；形成覆盖所述色阻和所述黑色矩阵的公用电极，在所述公用电极上形成第一间隙物、第二间隙物和第三间隙物；提供第二基板，在所述第二基板上依次形成TFT 的栅极、栅绝缘层、有源层、源极/漏极金属层、钝化层，同时，在对应第一光间隙物处形成衬垫，所述第二光间隙物与所述TFT沿所述扫描线方向的一侧相对应，所述第三间隙物与所述TFT沿所述扫描线方向的另一侧相对应；在钝化层内形成接触孔，在钝化层上形成像素电极，所述像素电极通过接触孔和漏极金属层电连接。在第一基板和第二基板按上述步骤制作完成后，在第一基板和第二基板之间灌注液晶层，并贴合所述第一基板、所述第二基板以形成液晶面板。
　　　在所述第二基板上形成有多条扫描线和多条数据线，所述扫描线和所述数据线垂直相交，在所述多条扫描线和所述多条数据线相交位置处形成有TFT，所述多条扫描线和所述多条数据线围成多个像素单元，每个所述像素单元还包括与TFT漏极相连的像素电极。在本实施例中，所述TFT为底栅结构，所述TFT包括依次位于第二基板上的栅极、栅绝缘层、有源层、源极、漏极、钝化层；所述漏极与所述像素电极相连的位置设置一接触孔，用于将所述钝化层打断，以使所述像素电极能与所述漏极连接。所述第二基板上还形成有位于栅绝缘层上的衬垫，所述衬垫的位置与位于所述第一基板上的第一光间隙物相对应，且所述衬垫与所述第一光间隙物相接触。所述衬垫与位于所述第一基板上的所述第一光间隙物相配合，用于支持液晶面板在不受外力下的第一盒厚。
　　　所述液晶面板包括显示区域和非显示区域，所述黑色矩阵用于遮挡所述非显示区域，例如，将所述TFT遮挡；所述色阻与所述第二基板上的像素单元一一对应，所述色阻包括红色阻、绿色阻及蓝色阻，与相应的像素单元相互配合形成所要显示的颜色；所述公共电极和所述像素电极均为透明电极，所述液晶层，即位于所述公用电极和所述像素电极之间。在液晶显示面板显示过程中，所述公共电极上加载有公共电压、各个像素单元的像素电极上加载有相应的像素电压，所述公共电极和所述像素电极相配合控制位于所述公共电极和所述像素电极之间的液晶分子的偏转，以形成所要显示的颜色。
　　　为了提高所述公用电极和所述像素电极的导电性，所述像素电极和所述公共电极的材料为氧化铟锡(ITO)，在本发明其他实施例中，所述像素电极和所述公共电极的材料也还可以是其他导电材料。
　　　所述第二光间隙物与所述TFT沿所述扫描线方向的一侧相对应，所述第三间隙物与所述TFT沿所述扫描线方向的另一侧相对应。即，所述第一光间隙物和所述第二光间隙物与TFT沿所述扫描线方向的两侧分别相对应，且所述TFT处在所述第二光间隙物和所述第三光间隙物之间；位于所述第一基板上所述第二间隙物和所述第三间隙物相对第一基板凸出，且具有一定的厚度，因此，所述第二间隙物和所述第三间隙物构成一个凹槽，所述第二间隙物和所述第三间隙物将所述TFT卡持在所述凹槽内。所述第二间隙物和所述第三间隙物远离所述第一基板的一端与所述第二基板具有间隙，当液晶面板受到外力按压发生变形，或者，由于液晶面板自身尺寸过大导致基板变形时，所述第二间隙物及/或所述第三间隙物分别与所述第二基板相配合，用于支撑液晶面板的第二盒厚。
　　　在本实施例在TFT沿扫描线方向的两侧，设置有第二间隙物和第三间隙物，在所述第二间隙物和所述第三间隙物之间形成一个凹槽，将TFT卡持在这个凹槽内，不容易发生偏移，进而避免由于液晶面板尺寸较大，第二基板和第一基板的对位发生偏移而造成扫描线边缘区域出现漏光的现象，提高液晶面板的显示效果。　　　
　　　进一步地，为了节约工艺，加快液晶面板的制作过程，所述第二间隙物和所述第三间隙物同步形成，且所述第二间隙物与所述第三间隙物的厚度相同，即，所述第二间隙物远离所述第一基板的一端到所述第二基板的距离，等于所述第三间隙物远离所述第一基板的一端到所述第二基板的距离，但本发明不仅限于此。为了更加节约工艺，加快液晶面板的制作过程，所述第一间隙物、第二间隙物和所述第三间隙物同步形成。所述第一间隙物的厚度小于所述第二间隙物的厚度，但本发明不仅限于此。　　　
　　　进一步地，为了节约工艺，所述衬垫包括所述形成的栅绝缘层、有源层或钝化层材料中的单层或多层。即，所述衬垫与所述形成的栅绝缘层、有源层或钝化层材料中的单层或多层同步形成。
　　　以上所述仅为本发明的优选实施例，并非因此限制本发明的专利范围，凡是利用本发明说明书及附图内容所作的等效结构或等效流程变换，或直接或间接运用在其他相关的技术领域，均同理包括在本发明的专利保护范围内。

Claims (19)

  1. 一种液晶面板，包括：相对设置的第一基板和第二基板，所述第一基板朝向所述第二基板的一侧上设置有第一光间隙物，所述第二基板朝向所述第一基板的一侧上设置有衬垫，所述衬垫与所述第一光间隙物相对应，所述第二基板朝向所述第一基板的一侧上还设置有TFT，所述TFT设置有垂直相交的多条扫描线和多条数据线，其特征在于，所述第一基板朝向所述第二基板的一侧上还设置有第二光间隙物和第三光间隙物，所述第二光间隙物与所述TFT沿所述扫描线方向的一侧相对应，所述第三间隙物与所述TFT沿所述扫描线方向的另一侧相对应。
  2. 根据权利要求1所述的液晶面板，其特征在于，所述第一间隙物的厚度小于所述第二间隙物的厚度，所述第二间隙物的厚度与所述第三间隙物的厚度相同。
  3. 根据权利要求1所述的液晶面板，其特征在于，所述第一基板为彩膜基板，所述第二基板为阵列基板，所述TFT 包括位于阵列基板朝向彩膜基板一侧的栅绝缘层、有源层、钝化层，所述衬垫包括所述形成的栅绝缘层、有源层或钝化层材料中的单层或多层。
  4. 根据权利要求1所述的液晶面板，其特征在于，所述第一基板为彩膜基板，所述第二基板为阵列基板，所述彩膜基板朝所述阵列基板的一侧设置有黑色矩阵、设置于黑色矩阵之间的色阻及覆盖所述色阻和所述黑色矩阵的公用电极，所述第一间隙物、所述第二间隙物及所述第三间隙物设置在所述公用电极上。
  5. 根据权利要求1所述的液晶面板，其特征在于，所述第一基板为彩膜基板，所述第二基板为阵列基板，所述多条扫描线和所述多条数据线围成多个像素单元，每个所述像素单元还包括与TFT的漏极相连的像素电极。
  6. 根据权利要求1所述的液晶面板，其特征在于，所述第三间隙物远离所述第一基板的一端与所述第二基板具有间隙。
  7. 根据权利要求6所述的液晶面板，其特征在于，所述第一间隙物的厚度小于所述第二间隙物的厚度，所述第二间隙物的厚度与所述第三间隙物的厚度相同。
  8. 根据权利要求6所述的液晶面板，其特征在于，所述第一基板为彩膜基板，所述第二基板为阵列基板，所述TFT 包括位于阵列基板朝向彩膜基板一侧的栅绝缘层、有源层、钝化层，所述衬垫包括所述形成的栅绝缘层、有源层或钝化层材料中的单层或多层。
  9. 根据权利要求6所述的液晶面板，其特征在于，所述第一基板为彩膜基板，所述第二基板为阵列基板，所述彩膜基板朝所述阵列基板的一侧设置有黑色矩阵、设置于黑色矩阵之间的色阻及覆盖所述色阻和所述黑色矩阵的公用电极，所述第一间隙物、所述第二间隙物及所述第三间隙物设置在所述公用电极上。
  10. 根据权利要求6所述的液晶面板，其特征在于，所述第一基板为彩膜基板，所述第二基板为阵列基板，所述多条扫描线和所述多条数据线围成多个像素单元，每个所述像素单元还包括与TFT的漏极相连的像素电极。
  11. 根据权利要求1所述的液晶面板，其特征在于，所述第三间隙物靠近所述TFT的一侧与所述TFT具有间隙。
  12. 根据权利要求11所述的液晶面板，其特征在于，所述第一间隙物的厚度小于所述第二间隙物的厚度，所述第二间隙物的厚度与所述第三间隙物的厚度相同。
  13. 根据权利要求11所述的液晶面板，其特征在于，所述第一基板为彩膜基板，所述第二基板为阵列基板，所述TFT 包括位于阵列基板朝向彩膜基板一侧的栅绝缘层、有源层、钝化层，所述衬垫包括所述形成的栅绝缘层、有源层或钝化层材料中的单层或多层。
  14. 根据权利要求11所述的液晶面板，其特征在于，所述第一基板为彩膜基板，所述第二基板为阵列基板，所述彩膜基板朝所述阵列基板的一侧设置有黑色矩阵、设置于黑色矩阵之间的色阻及覆盖所述色阻和所述黑色矩阵的公用电极，所述第一间隙物、所述第二间隙物及所述第三间隙物设置在所述公用电极上。
  15. 根据权利要求11所述的液晶面板，其特征在于，所述第一基板为彩膜基板，所述第二基板为阵列基板，所述多条扫描线和所述多条数据线围成多个像素单元，每个所述像素单元还包括与TFT的漏极相连的像素电极。
  16. 一种液晶面板的制作方法，其特征在于，包括：
    　　　提供第一基板，在所述第一基板上形成第一光间隙物、第二光间隙物及第三间隙物；
    　　　提供第二基板，在所述第二基板上依次形成TFT 的栅极、栅绝缘层、有源层、源极/漏极金属层、钝化层，同时，在对应第一光间隙物处形成衬垫，所述第二光间隙物与所述TFT沿所述扫描线方向的一侧相对应，所述第三间隙物与所述TFT沿所述扫描线方向的另一侧相对应；
    　　　在钝化层内形成接触孔，在钝化层上形成像素电极，所述像素电极通过接触孔和漏极金属层电连接；
    　　　在第一基板和第二基板之间灌注液晶层，并贴合所述第一基板、第二基板以形成液晶面板。
  17. 根据权利要求16所述的液晶面板的制作方法，其特征在于，所述第一间隙物、第二间隙物和所述第三间隙物同步形成，所述第一间隙物的厚度小于所述第二间隙物的厚度，所述第二间隙物的厚度与所述第三间隙物的厚度相同。
  18. 根据权利要求16所述的液晶面板的制作方法，其特征在于，所述提供第一基板，在所述第一基板上形成第一光间隙物、第二光间隙物及第三间隙物的步骤包括：
    　　　提供第一基板，在所述第一基板上沉积并蚀刻出黑色矩阵，在所述黑色矩阵之间的所述第一基板上形成色阻；
    　　　形成覆盖所述色阻和所述黑色矩阵的公用电极；
    　　　在所述公用电极上形成第一间隙物、第二间隙物和第三间隙物。
  19. 根据权利要求18所述的液晶面板的制作方法，其特征在于，所述第一间隙物、第二间隙物和所述第三间隙物同步形成，所述第一间隙物的厚度小于所述第二间隙物的厚度，所述第二间隙物的厚度与所述第三间隙物的厚度相同。
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