WO2015080149A1 - 切削工具 - Google Patents
切削工具 Download PDFInfo
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- WO2015080149A1 WO2015080149A1 PCT/JP2014/081228 JP2014081228W WO2015080149A1 WO 2015080149 A1 WO2015080149 A1 WO 2015080149A1 JP 2014081228 W JP2014081228 W JP 2014081228W WO 2015080149 A1 WO2015080149 A1 WO 2015080149A1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/044—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material coatings specially adapted for cutting tools or wear applications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23C—MILLING
- B23C5/00—Milling-cutters
- B23C5/16—Milling-cutters characterised by physical features other than shape
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/308—Oxynitrides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/36—Carbonitrides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/403—Oxides of aluminium, magnesium or beryllium
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
- B23B2228/10—Coatings
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23C—MILLING
- B23C2228/00—Properties of materials of tools or workpieces, materials of tools or workpieces applied in a specific manner
- B23C2228/10—Coating
Definitions
- the present invention relates to a cutting tool, and particularly to a cutting tool having a coating layer.
- a cutting tool widely used for metal cutting is widely used in which a multilayer coating layer such as a TiCN layer or an Al 2 O 3 layer is deposited on the surface of a substrate such as cemented carbide. Yes. It is also known that the cemented carbide contains a Cr component in addition to WC to enhance the corrosion resistance of the cemented carbide.
- Patent Document 1 a cutting tool in which a TiN layer, a TiCN layer, a TiC layer, a TiCNO layer, an Al 2 O 3 layer, and a TiN layer are sequentially coated on the surface of a cemented carbide substrate by a CVD (chemical vapor deposition) method. Is disclosed, and W and Co are diffused and contained in the crystal grain boundaries of the TiN layer, TiCN layer, and TiC layer on the substrate side.
- CVD chemical vapor deposition
- Patent Document 2 discloses a method of increasing the oxidation resistance of the Ti-based coating layer by diffusing the Cr component together with the Co component in the cemented carbide substrate into the Ti-based coating layer on the substrate side.
- An object of the present invention is to provide a cutting tool capable of exhibiting excellent wear resistance by suppressing the oxidation of the coating layer even when the cutting blade is subjected to high temperature processing such as high speed processing.
- the cutting tool of the present embodiment includes a base made of a cemented carbide containing Cr, and at least one layer of Ti (C x1 N y1 O z1 ) (0 ⁇ x1 ⁇ 1, 0 ⁇ y1 ⁇ on the surface of the base.
- the Ti-based layer, the Al 2 O 3 layer and the outermost layer coated on the surface of the cemented carbide substrate contain Cr, and the content of Cr contained in the substrate
- the oxidation resistance of the coating layer containing Ti can be improved and the wear resistance of the cutting tool can be improved.
- FIG. 1A is a scanning electron microscope (SEM) photograph of a cross section including a coating layer of a cutting tool
- FIG. 1B is a glow discharge emission spectroscopic analysis (GDS) in the depth direction from the surface of the coating layer. Analysis) data
- FIG. 2 is a partially enlarged view for viewing the distribution state of trace components of the GDS analysis data in FIG. 1 and 2 specify the structure of each layer determined by the distribution of each element and the correspondence with an electron micrograph (SEM).
- SEM scanning electron microscope
- 1 is a base (hard metal)
- 4 is (Ti, Al) (C x2 N y2 O z2 ) (0 ⁇ x2 ⁇ 1, 0 ⁇ y2 ⁇ 1, 0 ⁇
- the intermediate layer 4 can be omitted.
- the first Ti-based layer 2a on the substrate 1 side is a TiCN layer
- the second Ti-based layer 2b is also a TiCN layer having a different CN ratio.
- the thickness of each layer can be calculated by GDS analysis, but if the etching rate of each layer is different, the error in the thickness of each layer becomes large. Therefore, while checking the configuration of each layer while checking with a scanning electron microscope (SEM) photograph and electron microanalysis (EPMA) data (not shown), the peak shape of the GDS analysis data is confirmed. The range was fixed. As can be seen from the SEM photograph in FIG. 1A, there is a portion where the thickness of each layer in the SEM photograph and the thickness of each layer detected by GDS analysis are not proportional. Further, in the SEM photograph of FIG.
- the thickest layer in the coating layer 7 is the TiCN layer that is the first Ti-based layer 2 a of the Ti-based layer 2, and then the layer thickness is the largest.
- the Al 2 O 3 layer 5 can be confirmed to be the Al 2 O 3 layer 5, and from the shape of the peak of the GDS analysis data in FIG. 1B, a region where the Ti distribution changes at a high concentration and a region where the Al distribution changes at a high concentration, Was confirmed to exist.
- the region where the Ti distribution changes at a high concentration is the region of the first Ti-based layer 2a and the region of the second Ti-based layer 2b, and the region where the distribution of Al changes at a high concentration is the region of the Al 2 O 3 layer 5 Is identified.
- the center position of the thickness of each layer, the middle L Ti of the 1Ti based layer 2a, is specified as the center L Al of the Al 2 O 3 layer 5.
- the intermediate layer 4 and the outermost layer 6 are determined by specifying the region of the Ti-based layer 2 and the region of the Al 2 O 3 layer 5 of the first Ti-based layer 2a and the second Ti-based layer 2b. For the center position of 6, the center position in the region is specified as the center position (not shown).
- the boundary of each layer is a bending point where the content of each element changes abruptly.
- the boundary of each layer is specified by the following method. That is, the boundary between the region of the first Ti-based layer 2a and the region of the second Ti-based layer 2b is 10% lower than the maximum Ti content in the region of the first Ti-based layer 2a. It is defined as a position that is a quantity.
- the boundary between the region of the second Ti-based layer 2b and the region of the intermediate layer 4 is such that the content of Ti is 10% lower than the maximum value of the Ti content in the region of the second Ti-based layer 2b. Is defined as the position.
- the boundary between the region of the intermediate layer 4 and the region of the Al 2 O 3 layer 5 is such that the content of Al is 10% lower than the maximum value of the Al content in the Al 2 O 3 layer 5 Is defined as
- the measurement area in the in-plane direction of the coating layer is as wide as about 1 mm, if there are irregularities between the layers, the components of other layers adjacent to each layer are mixed and detected. Sometimes. Further, due to the difference in etching rate of each layer, components contained in the substrate 1 are mixed on the substrate side in the region identified as the first Ti-based layer 2a in the GDS analysis. Further, the component contained in the lower Ti-based layer 2 is mixed on the substrate side in the region identified as the intermediate layer 4, and the upper Al layer is present on the surface side in the region identified as the intermediate layer 4. The components contained in the 2 O 3 layer 5 are detected in a mixed state. As a result, the region of the intermediate layer 4 in the GDS analysis is observed wider than the actual thickness observed in the SEM photograph.
- substrate 1 is formed from the WC phase, the binder phase, and the B1 type solid solution phase depending on necessity.
- WC is 80 to 94% by mass
- Co is 5 to 15% by mass
- Cr is 0.1 to 1% by mass in terms of Cr 3 C 2, and groups of Group 4, 5, and 6 metals in the periodic table excluding Cr
- the surface of the substrate 1 has the coating layer 7 in which the Ti-based layer 2, the intermediate layer 4, the Al 2 O 3 layer 5, and the outermost layer 6 are laminated in order from the substrate 1 side.
- the content of Cr contained in the center position of the thickness of the first Ti-based layer 2 a on the substrate 1 side in the Ti-based layer 2 is contained in the substrate 1.
- the content of Cr is lower than the content of Cr, and is higher than the content of Cr contained in the center position of the thickness of the Al 2 O 3 layer 5.
- the content of Cr contained in the central position of the thickness of the outermost layer 6 is higher than the content of Cr contained in the central position of the thickness of the Al 2 O 3 layer.
- the wear resistance of the cutting tool 8 can be improved by suppressing the coating layer 7 from being oxidized and reducing its hardness.
- the Al 2 O 3 layer 5 has an effect that wear resistance is improved because the Cr content is lower than that of the other layers.
- the outermost layer 6 has an effect of improving the welding resistance on the surface of the coating layer 7 by containing Cr.
- the content of Cr contained in the central position of the thickness of the first Ti-based layer 2 a is the same as or less than the content of Cr contained in the central position of the thickness of the Al 2 O 3 layer 5. Then, the oxidation of the coating layer 7 tends to proceed easily.
- the content of Cr contained in the central position of the thickness of the Al 2 O 3 layer 5 is the content of Cr contained in the central position of the thickness of the first Ti-based layer 2a, or the center of the thickness of the outermost layer 6 If the content of Cr is the same as or greater than the content of Cr, the wear resistance of the Al 2 O 3 layer 5 tends to decrease.
- the coating layer 7 There is a tendency for the welding resistance of the steel to decrease.
- the Cr content contained in the center of the thicknesses of the first Ti-based layer 2a, the Al 2 O 3 layer 5 and the outermost layer 6 with respect to the Cr content contained in the substrate 1 is further increased.
- the ratio of Cr Ti , Cr Al and Cr s is 0.5 ⁇ Cr Ti ⁇ 0.9, 0.01 ⁇ Cr Al ⁇ 0.2, 0.4 ⁇ Cr s ⁇ 0.7, respectively. It is.
- the content of Cr contained in the substrate 1 is measured in a region where the change rate of the contents of W and C is within 5% in the GDS analysis data.
- the oxidation resistance of the first Ti-based layer 2a, the second Ti-based layer 2b containing Ti, and the outermost layer 6 is improved, and the coating layer 7 is formed even in processing where the cutting edge becomes high temperature such as high-speed cutting. It is possible to increase the wear resistance of the cutting tool 8 by suppressing the decrease in hardness due to oxidation. Note that the same effect can be obtained even in a coating layer in which the intermediate layer 4 is omitted.
- the coating layer 7 contains W and Co in addition to Cr.
- the ratio of the contents of W and Co contained in each of the first Ti-based layer 2a, the Al 2 O 3 layer 5 and the outermost layer 6 with respect to the contents of W and Co contained in the substrate 1 is determined. , W Ti , W Al , W s , Co Ti , Co Al and Co s , respectively, 0.05 ⁇ W Ti ⁇ 0.3, W Al ⁇ 0.01, W s ⁇ 0.01, 0 .05 ⁇ Co Ti ⁇ 0.3, Co Al ⁇ 0.01, and Co s ⁇ 0.01.
- W and Co diffusing from the base body 1 can diffuse into the Ti-based layer 2 and further improve the adhesion between the base body 1 and the coating layer 7.
- W and Co easily oxidize at high temperatures, they hardly diffuse into the Al 2 O 3 layer 5 and the outermost layer 6, and the oxidation of the coating layer 7 can be suppressed.
- the substrate 1 contains Si and Fe as inevitable impurity components, and these are diffused in the coating layer 7.
- the ratio of the content of Si and Fe contained in each of the first Ti-based layer 2a, the Al 2 O 3 layer 5 and the outermost layer 6 with respect to the contents of Si and Fe contained in the substrate 1, respectively, is Si Ti , Si Al and Si s, when the Fe Ti, Fe Al and Fe s, 0.05 ⁇ Si Ti ⁇ 0.4, Si Al ⁇ 0.01, Si s ⁇ 0.01,0.05 ⁇ Fe Ti ⁇ 0.4, Fe Al ⁇ 0.01, and Fe s ⁇ 0.01.
- Si and Fe diffusing from the base body 1 can diffuse into the Ti-based layer 2 to further enhance the adhesion between the base body 1 and the coating layer 7.
- Si and Fe are easily oxidized at a high temperature, they hardly diffuse into the Al 2 O 3 layer 5 and the outermost layer 6, and the oxidation of the coating layer 7 can be suppressed.
- the ratio of the content of Si and Fe contained in the intermediate layer 4 to the content of Si and Fe contained in the substrate 1 is Si m and Fe m , respectively. , Si m ⁇ 0.05 and Fe m ⁇ 0.05. That is, Si and Fe diffusing from the substrate 1 hardly diffuse into the intermediate layer 4 and can suppress the oxidation of the coating layer 7.
- the substrate 1 and the coating layer 7 contain C (carbon).
- the ratio of the content of C contained in each of the first Ti-based layer 2a, the intermediate layer 4, the Al 2 O 3 layer 5 and the outermost layer 6 with respect to the content of C contained in the substrate 1 is represented by C Ti ,
- C Ti carbon
- C m , C Al, and C s are satisfied, 0.2 ⁇ C Ti ⁇ 0.7, 0.01 ⁇ C m ⁇ 0.18, C Al ⁇ 0.01, and C s ⁇ 0.30.
- More preferable range of C Ti is 0.3 ⁇ C Ti ⁇ 0.6.
- the Ti-based layer 2 in the present embodiment is a TiCN layer in which both the first Ti-based layer 2a and the second Ti-based layer 2b on the substrate 1 side are laminated.
- a single layer may be sufficient, and the multilayer of 3 or more layers may be sufficient. With this configuration, the degree of diffusion of Cr, W, Co, Fe, Si, and C components into the coating layer 7 can be easily adjusted.
- the surface of a cemented carbide alloy is grind
- the coating layer 2 is formed on the surface of the obtained substrate by chemical vapor deposition (CVD).
- CVD chemical vapor deposition
- a TiN (titanium nitride) layer which is a first Ti-based layer, is formed on the surface of the substrate.
- the preferred film forming conditions include a mixed gas composition containing titanium tetrachloride (TiCl 4 ) gas in a ratio of 0.5 to 10% by volume and nitrogen (N 2 ) gas in a ratio of 10 to 60% by volume, with the remainder being hydrogen ( A mixed gas comprising H 2 ) gas is used, the film forming temperature is 800 to 940 ° C., and the pressure is 8 to 50 kPa.
- TiCN layer that is a second Ti-based layer is formed on the TiN layer.
- the film forming conditions are 0.5 to 10% by volume of titanium tetrachloride (TiCl 4 ) gas, 1 to 60% by volume of nitrogen (N 2 ) gas, and 0.2% of acetonitrile (CH 3 CN) gas as the mixed gas composition.
- Examples include a mixed gas containing 1 to 3.0% by volume and the balance of hydrogen (H 2 ) gas, a film forming temperature of 780 to 850 ° C., and a pressure of 5 to 25 kPa.
- An MT (Moderate Temprature) -TiCN layer composed of so-called columnar crystals is formed.
- the crystal width of the columnar crystals can be adjusted by increasing or decreasing the flow rate of acetonitrile (CH 3 CN) gas during film formation.
- an HT (High Temprature) -TiCN layer made of so-called granular crystals is formed on the MT-TiCN layer.
- titanium tetrachloride (TiCl 4 ) gas is 0.1 to 3% by volume
- nitrogen (N 2 ) gas is 0 to 15% by volume
- methane (CH 4 ) gas or acetonitrile is 0.1 to 3% by volume.
- the film forming temperature is 900 to 1020 ° C., and the pressure is 5 to 40 kPa.
- the HT-TiCN layer is formed by switching to the film formation conditions.
- titanium tetrachloride (TiCl 4 ) gas is 0.1 to 3% by volume
- nitrogen (N 2 ) gas is 1 to 15% by volume
- methane (CH 4 ) 0.1 to 10% by volume of gas or acetonitrile (CH 3 CN) gas is 1 to 15% by volume
- methane (CH 4 ) 0.1 to 10% by volume of gas or acetonitrile (CH 3 CN) gas 0.5 to 3.0% by volume of carbon monoxide (CO) gas
- AlCl 3 aluminum trichloride
- a mixed gas containing 3.0% by volume and the remainder consisting of hydrogen (H 2 ) gas is used, the film forming temperature is 900 to 1020 ° C., and the pressure is 5 to 40 kPa.
- AlCl 3 aluminum trichloride (AlCl 3 ) gas is 0.5 to 5.0% by volume
- hydrogen chloride (HCl) gas is 0.5 to 3.5% by volume
- carbon dioxide ( CO 2 ) gas of 0.5 to 5.0% by volume
- hydrogen sulfide (H 2 S) gas of 0 to 0.5% by volume
- the balance is hydrogen (H 2 ) gas. Is 930 to 1010 ° C., and the pressure is 5 to 10 kPa.
- the film forming conditions for forming the TiN layer as the outermost layer include: a mixed gas composition of 0.1 to 10% by volume of titanium tetrachloride (TiCl 4 ) gas and 0.005 to of chromium chloride (CrCl 2 ) gas.
- TiCl 4 titanium tetrachloride
- CrCl 2 chromium chloride
- the film forming temperature is 855 to 1010 ° C.
- the pressure is 10 It is set to ⁇ 85 kPa.
- the inside of the deposition chamber is maintained at a pressure of 350 kPa to 850 kPa and a temperature of 1000 to 1200 ° C. for 30 minutes to 120 minutes, and then the chamber is cooled to thereby provide Cr present on the substrate surface.
- the components and W, Co, Fe, Si and C components are diffused to the coating layer side, and are contained in a predetermined ratio in the Ti-based layer, the intermediate layer, and the Al 2 O 3 layer.
- a raw material gas containing a Cr component is flowed at the time of film formation, so that the outermost layer contains the Cr component.
- the cutting edge portion of the surface of the formed coating layer is polished.
- the cutting edge portion is processed smoothly, the welding of the work material is suppressed, and the tool is further excellent in fracture resistance.
- this granulated powder is used to form a cutting tool shape (CNMG120408PS) by press molding, degreased at 450 ° C. for 3 hours in a firing furnace, and then fired at 1450 ° C. for 1 hour to obtain super A hard alloy was produced.
- CNMG120408PS cutting tool shape
- the cutting edge portion was further subjected to honing on the surface of the substrate.
- a surface treatment was performed using a slurry containing Cr 3 C 2 to increase the Cr concentration on the substrate surface by the method shown in Table 2 to increase the Cr content on the substrate surface.
- coating layers having the structures shown in Tables 2 to 5 were sequentially formed on the surface of the processed cemented carbide by chemical vapor deposition (CVD) under the film forming conditions shown in Table 1.
- CVD chemical vapor deposition
- a TiN layer was formed as a first Ti-based layer
- the second Ti-based layer was a laminate of an MT-TiCN layer and an HT-TiCN layer.
- the thickness of the second Ti-based layer was constant at 0.5 ⁇ m for the HT-TiCN layer, and the thickness of the MT-TiCN layer was adjusted so that the total thickness was as shown in Table 2.
- Sample No. No. 9 was formed without adding chromium chloride (CrCl 4 ) gas to the mixed gas when forming the outermost layer.
- the film was formed by adding chromium chloride (CrCl 4 ) gas only to the latter half after the middle of the film formation time into the mixed gas when forming the outermost layer.
- the chamber was filled with N 2 gas so as to be 500 kPa, and the inside of the chamber was cooled through a high temperature holding step after film formation in which the temperature shown in Table 2 was held for 60 minutes. The thickness of each layer was confirmed by observing the cross section of the coating layer with a scanning electron microscope.
- GDS analysis (GD-PROFLER, manufactured by HORIBA, Ltd., analysis conditions: power 20 W, Ar pressure 600 Pa, discharge range 2 mm ⁇ , sampling time 0.3 sec / point)
- the distribution of each element of Cr, W, Co, Fe, Si and C at the center of each layer was confirmed, and the concentrations of each element are shown in Tables 2 to 5.
- SEM observation was performed about the cross section of the cutting tool.
- a TiN layer, a TiCN layer, and an Al 2 O 3 layer are laminated in this order, and in GDS analysis, Cr Ti is smaller than the Cr content of the substrate, Cr Al is larger, and Cr Al is Cr s.
- Sample No. smaller than Nos. 1 to 4 and 10 to 12 all had high cutting force with high coating layer adhesion and excellent wear resistance.
- sample No. 1 satisfying 0.5 ⁇ Cr Ti ⁇ 0.9, 0.01 ⁇ Cr Al ⁇ 0.2, and 0.4 ⁇ Cr s ⁇ 0.7.
- the wear resistance was particularly high.
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Abstract
Description
上述した本実施形態の切削工具を構成する超硬合金の製造方法の一例について説明する。まず、WC粉末を80~94質量%と、金属Co粉末を5~15質量%と、Cr3C2粉末を0.1~1質量%、所望により他の金属成分を含有する化合物粉末を0~10質量%以下の比率で調合する。
被削材 :SCM435
工具形状:CNMG120408PS
切削速度:300m/分
送り速度:0.3mm/rev
切り込み:2.0mm(3秒切削毎に切込変動)
切削時間:15分
切削液 :エマルジョン15%+水85%混合液
評価項目:顕微鏡にて切刃を観察し、フランク摩耗量・先端摩耗量を測定
(強断続切削条件)
被削材 :SCM440 4本溝入材
工具形状:CNMG120408PS
切削速度:300m/分
送り速度:0.35mm/rev
切り込み:1.5mm
切削液 :エマルジョン15%+水85%混合液
評価項目:欠損に至る衝撃回数
衝撃回数1000回時点で顕微鏡にて切刃の状態を観察
結果は表6に示した。
2 Ti系層
2a 第1Ti系層
2b 第2Ti系層
4 中間層
5 Al2O3層
6 最表層
7 被覆層
8 切削工具
Claims (10)
- Crを含有する超硬合金からなる基体と、該基体の表面に、少なくとも1層のTi(Cx1Ny1Oz1)(0≦x1≦1、0≦y1≦1、0≦z1≦1、x1+y1+z1=1)からなるTi系層、Al2O3層およびTi(Cx3Ny3Oz3)(0≦x3≦1、0≦y3≦1、0≦z3≦1、x3+y3+z3=1)からなる最表層を前記基体側から順に積層した被覆層とを有してなり、グロー放電発光分光分析(GDS分析)において、前記Ti系層中の前記基体側の第1Ti系層の厚みの中央の位置に含有されるCrの含有量が、前記基体に含有されるCrの含有量よりも低く、かつ、前記Al2O3層の厚みの中央の位置に含有されるCrの含有量よりも高く、前記最表層の厚みの中央の位置に含有されるCrの含有量が前記Al2O3層の厚みの中央の位置に含有されるCrの含有量よりも高い切削工具。
- グロー放電発光分光分析(GDS分析)において、前記基体に含有されるCrの含有量に対する前記Ti系層中の基体側の第1Ti系層、前記Al2O3層および前記最表層の各層の厚みの中央の位置に含有されるCrの含有量の比率を、それぞれ、CrTi、CrAlおよびCrsとしたとき、0.5≦CrTi≦0.9、0.01≦CrAl≦0.2、0.4≦Crs≦0.7である請求項1記載の切削工具。
- グロー放電発光分光分析(GDS分析)において、前記基体に含有されるWおよびCoの含有量に対する前記第1Ti系層、前記Al2O3層および前記最表層の各層に含有されるWおよびCoの含有量の比率を、それぞれ、WTi、WAl、Ws、CoTi、CoAlおよびCosとしたとき、0.05≦WTi≦0.3、WAl≦0.01、Ws≦0.01、0.05≦CoTi≦0.3、CoAl≦0.01、Cos≦0.01である請求項2記載の切削工具。
- 前記基体中にSiおよびFeが含有されており、グロー放電発光分光分析(GDS分析)において、前記基体に含有されるSiおよびFeの含有量に対する前記第1Ti系層、前記Al2O3層および前記最表層の各層に含有されるSiおよびFeの含有量の比率を、それぞれ、SiTi、SiAlおよびSis、FeTi、FeAlおよびFesとしたとき、0.05≦SiTi≦0.4、SiAl≦0.01、Sis≦0.01、0.05≦FeTi≦0.4、FeAl≦0.01、Fes≦0.01である請求項2または3記載の切削工具。
- グロー放電発光分光分析(GDS分析)において、前記基体に含有されるCの含有量に対する前記第1Ti系層、前記Al2O3層および前記最表層の各層に含有されるCの含有量の比率を、それぞれ、CTi、CAlおよびCsとしたとき、0.2≦CTi≦0.7、CAl≦0.01、Cs≦0.30である請求項2乃至4のいずれか記載の切削工具。
- 前記Ti系層と前記Al2O3層との間に、(Ti,Al)(Cx2Ny2Oz2)(0≦x2≦1、0≦y2≦1、0≦z2≦1、x2+y2+z2=1)からなる中間層が存在する請求項1乃至5のいずれか記載の切削工具。
- グロー放電発光分光分析(GDS分析)において、前記基体に含有されるCrの含有量に対する前記中間層の厚みの中央の位置に含有されるCrの含有量の比率を、Crmとしたとき、0.2≦Crm≦0.5である請求項6記載の切削工具。
- グロー放電発光分光分析(GDS分析)において、前記基体に含有されるWおよびCoの含有量に対する前記中間層に含有されるWおよびCoの含有量の比率を、それぞれ、WmおよびComとしたとき、Wm≦0.05、Com≦0.05である請求項6または7記載の切削工具。
- グロー放電発光分光分析(GDS分析)において、前記基体に含有されるSiおよびFeの含有量に対する前記中間層に含有されるSiおよびFeの含有量の比率を、それぞれ、SimおよびFemとしたとき、Sim≦0.05、Fem≦0.05である請求項6乃至8のいずれか記載の切削工具。
- 前記基体に含有されるCの含有量に対する前記中間層に含有されるCの含有量の比率をCmとしたとき、0.01≦Cm≦0.18である請求項6乃至9のいずれか記載の切削工具。
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KR1020167014151A KR101813536B1 (ko) | 2013-11-29 | 2014-11-26 | 절삭공구 |
EP14865641.6A EP3075475A4 (en) | 2013-11-29 | 2014-11-26 | Cutting tool |
CN201480064946.2A CN105792967B (zh) | 2013-11-29 | 2014-11-26 | 切削工具 |
US15/039,927 US10113239B2 (en) | 2013-11-29 | 2014-11-26 | Cutting tool |
JP2015550959A JP6276288B2 (ja) | 2013-11-29 | 2014-11-26 | 切削工具 |
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Cited By (2)
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WO2017146200A1 (ja) * | 2016-02-24 | 2017-08-31 | 京セラ株式会社 | 被覆工具 |
JP2020157457A (ja) * | 2019-03-28 | 2020-10-01 | 三菱マテリアル株式会社 | 耐欠損性にすぐれた表面被覆切削工具 |
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JP6918951B2 (ja) * | 2017-09-27 | 2021-08-11 | 京セラ株式会社 | 被覆工具及びこれを備えた切削工具 |
US20230126815A1 (en) * | 2020-03-27 | 2023-04-27 | Kyocera Corporation | Coated tool |
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KR20160077181A (ko) | 2016-07-01 |
EP3075475A4 (en) | 2017-06-21 |
JPWO2015080149A1 (ja) | 2017-03-16 |
CN105792967B (zh) | 2017-11-10 |
JP6276288B2 (ja) | 2018-02-07 |
EP3075475A1 (en) | 2016-10-05 |
KR101813536B1 (ko) | 2017-12-29 |
CN105792967A (zh) | 2016-07-20 |
US20170009352A1 (en) | 2017-01-12 |
US10113239B2 (en) | 2018-10-30 |
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