WO2015067047A1 - 显示面板及其制造方法、显示装置 - Google Patents

显示面板及其制造方法、显示装置 Download PDF

Info

Publication number
WO2015067047A1
WO2015067047A1 PCT/CN2014/079744 CN2014079744W WO2015067047A1 WO 2015067047 A1 WO2015067047 A1 WO 2015067047A1 CN 2014079744 W CN2014079744 W CN 2014079744W WO 2015067047 A1 WO2015067047 A1 WO 2015067047A1
Authority
WO
WIPO (PCT)
Prior art keywords
display panel
electrochromic
electrochromic structure
substrate
forming
Prior art date
Application number
PCT/CN2014/079744
Other languages
English (en)
French (fr)
Inventor
石岳
柳在健
Original Assignee
京东方科技集团股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 京东方科技集团股份有限公司 filed Critical 京东方科技集团股份有限公司
Priority to US14/422,205 priority Critical patent/US20160033842A1/en
Publication of WO2015067047A1 publication Critical patent/WO2015067047A1/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on an electrochromic effect
    • G02F1/163—Operation of electrochromic cells, e.g. electrodeposition cells; Circuit arrangements therefor
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on an electrochromic effect
    • G02F1/153—Constructional details
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on an electrochromic effect
    • G02F1/153—Constructional details
    • G02F1/157—Structural association of cells with optical devices, e.g. reflectors or illuminating devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133357—Planarisation layers
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/15—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on an electrochromic effect
    • G02F1/163—Operation of electrochromic cells, e.g. electrodeposition cells; Circuit arrangements therefor
    • G02F2001/1635—Operation of electrochromic cells, e.g. electrodeposition cells; Circuit arrangements therefor the pixel comprises active switching elements, e.g. TFT

Definitions

  • Display panel manufacturing method thereof, and display device
  • the present invention relates to the field of display technologies, and in particular, to a display panel, a method of manufacturing the same, and a display device. Background technique
  • liquid crystal displays have been widely used by people, playing a vital role in industrial production and people's lives. At present, high-quality liquid crystal displays are increasingly favored by people. Many companies in the display technology field have invested enormous manpower and resources in the direction of high contrast, fast response, and low power consumption.
  • the contrast of a liquid crystal display refers to the ratio of the maximum brightness to the minimum brightness of the liquid crystal display device during display. Therefore, the contrast of the liquid crystal display device is related to both the maximum brightness of the display device in the bright state and the minimum brightness of the display device in the dark state. Often, in order to improve contrast, researchers tend to start with both maximum brightness and minimum brightness.
  • the process (Ce ll ) process implements a means to achieve a reduction in the minimum brightness of the display device, for example: using a liquid crystal with a high scattering coefficient, optimizing the orientation in a process of the process of the cartridge process, or optimizing the thickness of the cell (Ce ll Gap).
  • the invention provides a display panel, a manufacturing method thereof and a display device, Simple technical means can effectively improve the contrast of the display device.
  • the present invention provides a display panel including an array substrate, a counter substrate, and an electrochromic structure, which are located on the array substrate or the pair of cassette substrates, and the electrochromic structure is used for
  • the display panel absorbs light leakage of the display panel when it is in a dark state.
  • the pair of substrates comprises: a first substrate and a color film, the color film is formed on the first substrate, and wherein, when the electrochromic structure is located in the pair of boxes On the substrate, the electrochromic structure is formed on the color film.
  • the pair of substrates further comprises: a flat layer formed between the electrochromic structure and the color film.
  • the electrochromic structure includes a plurality of electrochromic subunits;
  • the color film includes: a color matrix pattern and a black matrix, the black matrix defines a pixel region, and the color matrix pattern is formed on the In the pixel region, wherein the electrochromic subunit is disposed in one-to-one correspondence with the pixel region;
  • the present invention further provides a display device, the display device comprising: a display panel, wherein the display panel adopts the above display panel.
  • the present invention further provides a method for manufacturing a display panel, comprising: forming an array substrate and a counter substrate, the manufacturing method further comprising the following steps:
  • An electrochromic structure is formed on the array substrate or the pair of cassette substrates, and the electrochromic structure is configured to absorb light leakage of the display panel when the display panel assumes a dark state.
  • the step of forming a counter substrate comprises: forming a first substrate; and forming a color film on the first substrate, and when forming an electrochromic structure on the pair of substrates
  • the step of forming an electrochromic structure includes: forming the electrochromic structure on the color film.
  • the step of forming a color film on the first substrate and the step of forming the electrochromic structure on the color film further comprise the step of forming a flat layer on the color film .
  • the electrochromic structure includes a plurality of electrochromic subunits, and the color film is formed to include a color matrix pattern and a black matrix, and the color matrix pattern is formed in the In the pixel area;
  • the step of forming the electrochromic structure on the color film further includes the following steps:
  • the electrochromic structure is patterned to form a plurality of electrochromic subunits, and the electrochromic subunits are disposed in one-to-one correspondence with the pixel regions.
  • the invention provides a display panel, a manufacturing method thereof, and a display device.
  • the display panel comprises an electrochromic structure.
  • the electrochromic structure When the display panel is in a bright state, the electrochromic structure exhibits a transparent state; when the display panel exhibits a dark state, the electrophoresis
  • the color-changing structure exhibits a colored state, and the electrochromic structure exhibiting a colored state can absorb light, thereby minimizing light leakage of the display panel in a dark state, so that the minimum brightness of the display panel is lowered, thereby effectively improving the contrast of the display panel.
  • FIG. 1 is a schematic structural diagram of a display panel according to Embodiment 1 of the present invention.
  • FIG. 2a is a schematic structural view of the counter substrate of FIG. 1;
  • Figure 2b is a schematic view showing the absorption of light leakage from the electrochromic structure on the substrate of the cartridge shown in Figure 2a;
  • FIG. 3 is a schematic structural diagram of a display panel according to Embodiment 2 of the present invention
  • FIG. 4 is a schematic structural diagram of a display panel when an electrochromic subunit is disposed corresponding to a pixel area
  • Figure 5 is a flow chart showing a method of manufacturing the display panel shown in Figure 4.
  • Figure 6a is a schematic view showing the formation of a black matrix and a color matrix pattern on a first substrate
  • FIG. 6b is a schematic view showing formation of a flat layer on a black matrix and a color matrix pattern
  • FIG. 6c is a schematic view showing formation of a first transparent electrode on a flat layer
  • Figure 6d is a schematic view showing the formation of an electrochromic layer on the first transparent substrate; and Figure 6e is a schematic view showing the formation of an alignment layer on the second transparent electrode.
  • FIG. 1 is a schematic structural view of a display panel according to Embodiment 1 of the present invention
  • FIG. 2a is a schematic structural view of the counter substrate of FIG. 1
  • FIG. 2b is a schematic view of the electrochromic structure of the cartridge substrate for absorbing light leakage shown in FIG.
  • the display panel comprises an array substrate 6, a counter substrate 7 and an electrochromic structure 1, and the electrochromic structure 1 is used for absorbing the display panel when the display panel is in a dark state. Light leaks.
  • the electrochromic structure 1 includes: an electrochromic layer 12, a first transparent electrode 11 and a second transparent electrode 13, and the electrochromic layer 12 is located at the first transparent electrode 1 1 and the second transparent electrode 13
  • the materials of the first transparent electrode 11 and the second transparent electrode 13 are both indium tin oxide (IT0).
  • the present invention improves the contrast of the display panel by reducing the minimum brightness of the display panel.
  • the principles of the present invention are described in detail below.
  • the electrochromic structure 1 is located on the array substrate 6 or the counter substrate 7, and in Fig. 2a, the electrochromic structure 1 is located on the counter substrate 7.
  • the driving chip drives the first transparent electrode 1 1 and the second transparent electrode 13 and causes a first voltage difference to be generated between the first transparent electrode 11 and the second transparent electrode 13 at the first
  • the electrochromic layer 12 exhibits a transparent state.
  • the entire electrochromic structure 1 also exhibits a transparent state, and the light emitted from the light source can also pass through the electrochromic structure 1.
  • the display panel can be presented. Maximum brightness.
  • the driving chip drives the first transparent electrode 11 and the second transparent electrode 13, and causes a second voltage difference to be generated between the first transparent electrode 11 and the second transparent electrode 13, in the second
  • the electrochromic layer 12 exhibits a colored state, at which time the entire electrochromic structure 1 assumes a colored state, and the rendered electrochromic structure 1 absorbs light, effectively preventing the display panel from being dark.
  • the occurrence of light leakage during the state causes the minimum brightness of the display panel to decrease.
  • the display panel Since the maximum brightness of the display panel has not changed, the display panel is slightly brighter. The degree is lowered, so the contrast of the display panel is improved.
  • the material of the electrochromic layer 12 may be an organic electrochromic material, an electroless electrochromic material or an organic-inorganic composite electrochromic material.
  • the organic electrochromic material may include polythiophenes and derivatives thereof, viologen, tetrathiafulvalene, metal phthalocyanine compounds or polyanilines;
  • the inorganic electrochromic material may include: W0 3 , 0 6» 3 or V 2 0 5 .
  • the electrochromic structure can also be located on the array substrate, and the electrochromic structure on the array substrate can also absorb the light leakage of the display panel in the dark state, which will not be described herein.
  • the electrochromic structure 1 is located on the front side of the counter substrate 7 (i.e., the surface facing the cartridge toward the surface of the counter substrate) or the back surface.
  • the electrochromic structure 1 is located on the front side of the counter substrate 7, and the electrochromic structure 1 is located on the back side of the counter substrate 7, and the corresponding drawings are not given.
  • the electrochromic structure 1 is used to transmit or absorb light, and thus the electrochromic structure 1 is located on the front or the back of the substrate 7 without affecting its function.
  • Embodiment 1 of the present invention provides a display panel having an electrochromic structure formed thereon.
  • the electrochromic structure When the display panel is in a bright state, the electrochromic structure exhibits a transparent state; when the display panel exhibits a dark state, the electrochromic structure The structure exhibits a colored state, and the electrochromic structure exhibiting a colored state can absorb light, thereby minimizing light leakage of the display panel in a dark state, so that the minimum brightness of the display panel is lowered, thereby effectively improving the contrast of the display panel.
  • Embodiment 2 Embodiment 2
  • the display panel includes: an array substrate 6 and a counter substrate 7, and the counter substrate 7 includes a first substrate 2.
  • the electrochromic structure 1 is located on the counter substrate. Specifically, the electrochromic structure 1 is located on the front surface of the first substrate 2.
  • the front surface of the first substrate 2 is further provided with a color film 3, and the color film 3 includes A color matrix pattern 31 and a black matrix 32 defining respective pixel regions, a color matrix pattern 31 formed in the pixel region, and an electrochromic structure 1 formed on the color film 3.
  • the difference between this embodiment and the first embodiment is that the electrochromic structure 1 is formed on the color film 3 in this embodiment.
  • the electrochromic structure 1 is straight Whether it is formed on the first base substrate 2 or formed on the color film 3, the minimum brightness of the display panel in the dark state is lowered.
  • the electrochromic structure 1 When the electrochromic structure 1 is formed on the color film 3, the surface of the color film 3 composed of the color matrix pattern 31 and the black matrix 32 is uneven, and optionally, the electrochromic structure 1 and the color film 3 are A flat layer 4 is formed between them, and the formation of the electrochromic structure 1 can be facilitated by providing the flat layer 4.
  • the electrochromic structure 1 includes a plurality of electrochromic subunits 14, an electrochromic subunit 14 and a pixel. The area is set one by one.
  • the electrochromic structure 1 may be an integral structure equal to the surface size of the first base substrate 2, or the overall structure may be patterned so that the electrochromic structure 1 includes several
  • the dispersing structure of the electrochromic subunit 14 is provided in one-to-one correspondence with the pixel regions, that is, an electrochromic subunit 14 is corresponding to each of the pixel regions.
  • the display panel performs pixel display, only the pixel area has light emission, and the coverage area of the black matrix 32 has no light emission. Therefore, it is only necessary to set the electrochromic sub-unit 14 corresponding to the pixel area, and the display panel can also be realized. Contrast.
  • an alignment layer is further provided on the uppermost layer of the counter substrate, and the alignment layer is not shown in the drawing.
  • the first transparent electrode or the second transparent electrode in the electrochromic structure may be multiplexed into a common electrode, and the common electrode and the pixel electrode on the array substrate drive the liquid crystal together The deflection is carried out.
  • the array substrate comprises: a second substrate, on which the gate lines and the data lines are formed, and the gate lines and the data lines define the pixel units. Since both the gate line and the data line are electrically conductive, and the first transparent electrode and the second transparent electrode in the electrochromic structure are both electrically conductive, when the electrochromic structure is adjacent to the gate line or the data line, it must be electrochromic. An insulating layer is formed between the structure and the gate line or the data line.
  • a second embodiment of the present invention provides a display panel having an electrochromic structure formed thereon.
  • the electrochromic structure When the display panel is in a bright state, the electrochromic structure exhibits a transparent state; when the display panel exhibits a dark state, the electrochromic structure The structure exhibits a colored state, and the electrochromic structure exhibiting a colored state can absorb light, thereby minimizing light leakage of the display panel in a dark state, so that the minimum brightness of the display panel is lowered, thereby effectively improving the contrast of the display panel.
  • Embodiment 3 Embodiment 3
  • the third embodiment of the present invention provides a display device.
  • the display device includes: a display panel, and the display panel of the first embodiment or the second embodiment is used. For details, refer to the first embodiment and the second embodiment. No longer.
  • the display device can be: a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigation device, and the like, or any display product or component.
  • a third embodiment of the present invention provides a display device including a display panel, wherein the display panel is formed with an electrochromic structure, and when the display panel is in a bright state, the electrochromic structure exhibits a transparent state; When the dark state is present, the electrochromic structure exhibits a colored state, and the electrochromic structure exhibiting a colored state can absorb light, thereby minimizing light leakage of the display panel in a dark state, so that the minimum brightness of the display panel is lowered, thereby effectively improving The contrast of the display panel.
  • Embodiment 4 Embodiment 4
  • the fourth embodiment provides a manufacturing method of a display panel, the manufacturing method comprising: Step S1: forming an electrochromic structure, the electrochromic structure is configured to absorb the display when the display panel assumes a dark state Light leakage from the panel.
  • step S1 includes:
  • Step 101 Form an electrochromic structure on the array substrate or the counter substrate.
  • Embodiment 4 of the present invention provides a method for manufacturing a display panel.
  • an electrochromic structure is formed on the first substrate, and when the display panel is in a bright state, the electrochromic structure is formed.
  • Presenting a transparent state when the display panel is in a dark state, the electrochromic structure exhibits a colored state, and the electrochromic structure exhibiting a colored state absorbs light. Therefore, the light leakage of the display panel in the dark state is minimized, so that the minimum brightness of the display panel is reduced by the manufacturing method provided by the embodiment, thereby effectively improving the contrast of the display panel.
  • Embodiment 5 is a method for manufacturing a display panel.
  • a fifth embodiment of the present invention provides a method for manufacturing a display panel, wherein the electrochromic structure is located on a front surface of the first substrate, and the electrochromic structure comprises: an electrochromic layer, a first transparent electrode, and a second transparent electrode.
  • a color film is further disposed on the front surface of the first substrate, the color film includes a color matrix pattern and a black matrix, the black matrix defines a pixel region, the color matrix pattern is formed in the pixel region, and the electrochromic structure is located on the color film.
  • FIG. 5 is a flowchart of a method of manufacturing the display panel shown in FIG. 4. As shown in FIG. 5, the manufacturing method includes:
  • Step 201 Form a black matrix and a color matrix pattern on the first base substrate.
  • FIG. 6a is a schematic view showing formation of a black matrix and a color matrix pattern on a first substrate, as shown in FIG. 6a, a black matrix substrate is formed on the first substrate, and then the black matrix substrate is patterned.
  • the matrix pattern 31 is located in the pixel area.
  • Step 202 Form a flat layer on the black matrix and the color matrix pattern.
  • FIG. 6b is a schematic view showing the formation of a flat layer on the black matrix and the color matrix pattern. As shown in FIG. 6b, since the surface of the color film formed by the black matrix 32 and the color matrix pattern 31 is uneven, it can be chemically vapor deposited.
  • the flat layer 4 is formed on the black matrix 32 and the color matrix pattern 31.
  • the flat layer 4 not only functions to protect the black matrix 32 and the color matrix pattern 31, but the flat surface of the flat layer 4 also facilitates the formation of the electrochromic structure.
  • Step 203 forming a first transparent electrode on the flat layer.
  • Figure 6c is a schematic view showing the formation of a first transparent electrode on a flat layer, as shown in Figure 6c, a first transparent electrode 1 1 is formed on the planar layer 4 by chemical vapor deposition or magnetron sputtering. Alternatively, The material of the first transparent electrode 11 is ⁇ .
  • Step 204 Form an electrochromic layer on the first transparent substrate.
  • 6d is a schematic view showing the formation of an electrochromic layer on the first transparent substrate. As shown in FIG. 6d, an electrochromic material is uniformly formed on the first transparent substrate 11. The electrochromic material is electrically Color changing layer 12.
  • Step 205 forming a second transparent electrode on the electrochromic layer.
  • the electrochromic layer is formed by chemical vapor deposition or magnetron sputtering.
  • a second transparent electrode 13 is formed on 12, and optionally, the material of the second transparent electrode is IT0.
  • Step 206 A patterning process is performed on the first transparent electrode, the electrochromic layer, and the second transparent electrode.
  • the discoloration structure 1 is a dispersion structure including a plurality of electrochromic subunits 14, each Each of the pixel regions corresponds to an electrochromic subunit 14.
  • the patterning process referred to in the embodiments of the present invention includes some or all processes such as photoresist coating, masking, exposure, development, etching, and photoresist stripping.
  • Step 207 forming an alignment layer on the second transparent electrode, which is completed for the cassette substrate.
  • FIG. 6e is a schematic view showing the formation of an alignment layer on the second transparent electrode. As shown in FIG. 6e, an alignment layer substrate is formed on the second transparent electrode 13, and the alignment layer substrate is processed by an alignment process to form an alignment layer. 5.
  • step 207 is directly executed.
  • the display panel formed by the above execution sequence has an electrochromic structure located above the color film, but this embodiment can realize that the electrochromic structure is located on the first substrate by changing the execution order of the above steps. Between the substrate and the color film.
  • Step 208 Form an array substrate.
  • Step 209 The array substrate and the counter substrate are paired, and the process ends.
  • this embodiment only describes the case where the electrochromic structure is located on the counter substrate.
  • the electrochromic structure is located on the array substrate, the corresponding changes can be made with reference to the embodiment.
  • Embodiment 5 of the present invention provides a method for manufacturing a display panel, which is manufactured in the display During the process of the display panel, an electrochromic structure is formed on the substrate of the box, and when the display panel is in a bright state, the electrochromic structure exhibits a transparent state; when the display panel exhibits a dark state, the electrochromic structure exhibits a colored state, presenting The colored electrochromic structure can absorb light, thereby minimizing the light leakage of the display panel in the dark state, so that the minimum brightness of the display panel is reduced by the manufacturing method provided by the embodiment, thereby effectively improving the display panel. Contrast.

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)

Abstract

一种显示面板及其制造方法、显示装置，该显示面板包括：阵列基板（6）和对盒基板（7），该显示面板还包括：电致变色结构（1），其位于所述阵列基板（6）或所述对盒基板上（7），所述电致变色结构（1）用于当所述显示面板呈现暗态时吸收所述显示面板的漏光。当显示面板呈现亮态时，电致变色结构（1）呈现透明态；当显示面板呈现暗态时，电致变色结构（1）呈现着色态，呈现着色态的电致变色结构（1）能吸收光线，从而最大限度的减少显示面板在暗态的漏光，使得显示面板的最小光亮下降，进而有效提高了显示面板的对比度。

Description

显示面板及其制造方法、 显示装置
技术领域
本发明涉及显示技术领域， 特别涉及一种显示面板及其制造方 法、 显示装置。 背景技术
随着科技的发展和社会的进步， 液晶显示器已经越来越广泛的 被人们所应用，在工业生产、人民生活中起着至关重要的作用。 目前， 高品质液晶显示器越来越受到人们的青睐。众多显示技术领域的企业 在高对比度、 快速响应、 低功耗等方向上投入了巨大的人力物力。
液晶显示器的对比度是指液晶显示装置在显示过程中的最大亮 度与最小亮度的比值。 因此， 液晶显示器件的对比度既与该显示装置 的处于亮态时的最大亮度相关，也和该显示装置的处于暗态时的最小 亮度相关。 通常， 为了提高对比度， 研究人员往往从提升最大亮度和 降低最小亮度两个方面着手。
在现有技术中， 在提升最大亮度方面， 研究人员通常采用提升 显示面板的开口率的手段来实现对显示装置的最大亮度的提升；在降 低最小亮度方面， 研究人员通常采用优化面板的对盒制程（Ce l l )工 艺实现的手段来实现对显示装置的最小亮度的降低， 例如： 使用高散 射系数的液晶、 优化对盒制程工艺中的取向 （Rubb ing ) 工艺或优化 液晶盒厚 （Ce l l Gap ) 。
但是， 在提升最大亮度方面， 提升开口率只能在一定范围内提 升显示装置的最大亮度，但是在提升开口率的过程中会产生一些新的 工艺及设计问题； 另外， 在降低最小亮度方面， 对 Ce l l工艺进行优 化时， 采用的优化方案均相对复杂。 综上所述， 现有技术在提高显示 装置的对比度时所采用的技术手段较为复杂， 不易于实现。 发明内容
本发明提供一种显示面板及其制造方法、 显示装置， 通过较为 简单的技术手段便能有效提升显示装置的对比度。
为实现上述目的， 本发明提供一种显示面板， 包括阵列基板、 对盒基板和电致变色结构， 其位于所述阵列基板或所述对盒基板上， 所述电致变色结构用于当所述显示面板呈现暗态时吸收所述显示面 板的漏光。
可选地， 所述对盒基板包括： 第一衬底基板和彩膜， 所述彩膜 形成于所述第一衬底基板上， 并且其中， 当所述电致变色结构位于所 述对盒基板上时， 所述电致变色结构形成于所述彩膜上。
可选地， 所述对盒基板还包括： 平坦层， 所述平坦层形成于所 述电致变色结构和所述彩膜之间。
可选地， 所述电致变色结构包括若干个电致变色子单元； 所述 彩膜包括： 彩色矩阵图形和黑矩阵， 所述黑矩阵限定出像素区域， 所 述彩色矩阵图形形成于所述像素区域中， 其中， 所述电致变色子单元 与所述像素区域一一对应设置；
为实现上述目的， 本发明还提供一种显示装置，该显示装置包 括： 显示面板， 所述显示面板采用上述的显示面板。
为实现上述目的， 本发明还提供一种显示面板的制造方法， 包 括： 形成阵列基板和对盒基板， 该制造方法还包括以下步骤：
在所述阵列基板或所述对盒基板上形成电致变色结构， 所述电 致变色结构用于当所述显示面板呈现暗态时吸收所述显示面板的漏 光。
可选地， 所述形成对盒基板的步骤包括： 形成第一衬底基板； 以及在所述第一衬底基板上形成彩膜，并且当在所述对盒基板上形成 电致变色结构时， 所述形成电致变色结构的步骤包括： 在所述彩膜上 形成所述电致变色结构。
可选地， 在所述第一衬底基板上形成彩膜的步骤和在所述彩膜 上形成所述电致变色结构的步骤之间还包括以下步骤：在所述彩膜上 形成平坦层。
可选地， 述电致变色结构包括若干个电致变色子单元， 所述彩 膜被形成为包括彩色矩阵图形和黑矩阵，所述彩色矩阵图形形成于所 述像素区域中；
在在所述彩膜上形成所述电致变色结构的步骤之后还包括以下 步骤：
对所述电致变色结构进行构图工艺以形成若干电致变色子单 元， 所述电致变色子单元与所述像素区域一一对应设置。
本发明具有以下有益效果：
本发明提供一种显示面板及其制造方法、 显示装置， 该显示面 板包括电致变色结构， 当显示面板呈现亮态时， 电致变色结构呈现透 明态； 当显示面板呈现暗态时， 电致变色结构呈现着色态， 呈现着色 态的电致变色结构能吸收光线，从而最大限度的减少显示面板在暗态 时的漏光， 使得显示面板的最小亮度下降， 进而有效提高了显示面板 的对比度。 附图说明
图 1为本发明实施例一提供的显示面板的结构示意图
图 2a为图 1中的对盒基板的结构示意图；
图 2b为图 2a所示对盒基板上的电致变色结构吸收漏光的示意 图；
图 3为本发明实施例二提供的显示面板的结构示意图； 图 4 为电致变色子单元与像素区域对应设置时的显示面板的结 构示意图；
图 5为图 4所示的显示面板的制造方法的流程图；
图 6a 为在第一衬底基板上形成黑矩阵和彩色矩阵图形的示意 图；
图 6b为在黑矩阵和彩色矩阵图形上形成平坦层的示意图； 图 6c为在平坦层上形成第一透明电极的示意图；
图 6d为在第一透明基板上形成电致变色层的示意图； 以及 图 6e为在第二透明电极上形成取向层的示意图。 具体实施方式
为使本领域的技术人员更好地理解本发明的技术方案， 下面结 合附图对本发明提供的显示面板及其制造方法、显示装置进行详细描 述。
实施例一
图 1为本发明实施例一提供的显示面板的结构示意图， 图 2a为 图 1中的对盒基板的结构示意图；图 2b为图 2a所示对盒基板上的电 致变色结构吸收漏光的示意图； 如图 1、 图 2a和图 2b所示， 该显示 面板包括阵列基板 6、 对盒基板 7和电致变色结构 1， 电致变色结构 1用于当显示面板呈现暗态时吸收显示面板的漏光。
需要说明的是， 电致变色结构 1包括： 电致变色层 12、 第一透 明电极 1 1和第二透明电极 13， 电致变色层 12位于第一透明电极 1 1 和第二透明电极 13之间， 可选地， 第一透明电极 1 1和第二透明电极 13的材料均为氧化铟锡 （IT0 ) 。
本发明通过降低显示面板的最小亮度来提高显示面板的对比 度， 下面讲对本发明的原理进行详细描述。
可选地， 电致变色结构 1位于阵列基板 6或对盒基板 7上， 在 图 2a中， 电致变色结构 1位于对盒基板 7上。 当显示面板呈现亮态 时， 驱动芯片驱动第一透明电极 1 1和第二透明电极 13， 且使得在第 一透明电极 1 1和第二透明电极 13之间产生第一电压差，在第一电压 差的作用下， 电致变色层 12呈现出透明态， 此时整个电致变色结构 1也呈现为透明态， 光源发射出的光线也能透过电致变色结构 1， 显 示面板可呈现出最大亮度。
当显示面板呈现暗态时， 驱动芯片驱动第一透明电极 1 1和第二 透明电极 13， 且使得在第一透明电极 1 1和第二透明电极 13之间产 生第二电压差， 在第二电压差的作用下， 电致变色层 12呈现出着色 态， 此时整个电致变色结构 1呈现为着色态， 呈现的着色态的电致变 色结构 1可吸收光线，有效的防止显示面板在暗态时的漏光现象的发 生， 使得显示面板的最小亮度下降。
由于显示面板的最大亮度没有发生变化， 而显示面板的最小亮 度下降， 因此显示面板的对比度得到提高。
其中， 电致变色层 12的材料可为有机电致变色材料、 无机电致 变色材料或有机无机复合电致变色材料。具体地， 有机电致变色材料 可以包括聚噻吩类及其衍生物、 紫罗精类、 四硫富瓦烯、 金属酞菁类 化合物或聚苯胺类；无机电致变色材料可以包括： W03， 06»3或 V205。
电致变色结构也可位于阵列基板上， 电致变色结构位于阵列基 板上也能吸收显示面板在暗态时的漏光， 此处不再赘述。
需要说明的是， 本实施例中， 电致变色结构 1 位于对盒基板 7 的正面（即， 对盒后朝向对盒基板的表面） 或者背面。 在图 2所示的 结构图中， 电致变色结构 1是位于对盒基板 7的正面， 而电致变色结 构 1位于对盒基板 7的背面的情况未给出相应的附图。 本实施例中， 电致变色结构 1 用于使光线透过或吸收光线， 因此电致变色结构 1 位于对盒基板 7的正面或者背面均不影响其功能的实现。
本发明实施例一提供了一种显示面板， 该显示面板上形成有电 致变色结构， 当显示面板呈现亮态时， 电致变色结构呈现透明态； 当 显示面板呈现暗态时， 电致变色结构呈现着色态， 呈现着色态的电致 变色结构能吸收光线， 从而最大限度的减少显示面板在暗态时的漏 光， 使得显示面板的最小亮度下降， 进而有效提高了显示面板的对比 度。 实施例二
图 3 为本发明实施例二提供的显示面板的结构示意图， 如图 3 所示， 显示面板包括： 阵列基板 6和对盒基板 7， 对盒基板 7包括第 一衬底基板 2。 电致变色结构 1位于为对盒基板上， 具体地， 电致变 色结构 1位于第一衬底基板 2的正面，在第一衬底基板 2的正面还设 置有彩膜 3， 彩膜 3包括： 彩色矩阵图形 31和黑矩阵 32， 黑矩阵 32 限定出各个像素区域， 彩色矩阵图形 31形成于像素区域中， 电致变 色结构 1形成于彩膜 3上。
需要说明的是， 本实施例与实施例一的区别在于， 本实施例中 电致变色结构 1是形成于彩膜 3上。然而， 无论电致变色结构 1是直 接形成于第一衬底基板 2上还是形成于彩膜 3上，该显示面板在暗态 时的最小亮度都会下降。
在电致变色结构 1形成于彩膜 3之上时， 由彩色矩阵图形 31和 黑矩阵 32所构成的彩膜 3 的表面不平整， 可选地， 电致变色结构 1 和所述彩膜 3之间形成有平坦层 4， 通过设置平坦层 4可有利于电致 变色结构 1的形成。
图 4 为电致变色子单元与像素区域对应设置时的显示面板的结 构示意图， 如图 4所示， 电致变色结构 1包括若干个电致变色子单元 14， 电致变色子单元 14与像素区域一一对应设置。 在形成电致变色 结构 1时，电致变色结构 1可以为与第一衬底基板 2的表面尺寸相等 的一个整体结构， 或者将整体结构进行构图工艺， 使得电致变色结构 1为包括若干个电致变色子单元 14的分散结构， 电致变色子单元 14 与像素区域一一对应设置，即每个像素区域的上方都对应有一个电致 变色子单元 14。 因为显示面板在进行像素显示时， 只有像素区域有 光线射出， 而黑矩阵 32的覆盖区域没有光线射出， 因此只需将电致 变色子单元 14与像素区域对应设置，也可实现显示面板的高对比度。
可选地， 在对盒基板的最上层还设置有取向层， 取向层在附图 中没有示出。
需要说明的是， 当电致变色结构位于对盒基板上时， 电致变色 结构中的第一透明电极或者第二透明电极可复用为公共电极，公共电 极与阵列基板上像素电极共同驱动液晶的进行偏转。
另外， 当电致变色结构位于阵列基板 6 上时， 阵列基板包括： 第二衬底基板， 在第二衬底基板上形成有栅线和数据线， 栅线和数据 线限定出像素单元。 由于栅线和数据线均导电， 且电致变色结构中的 第一透明电极和第二透明电极均导电， 因此， 当电致变色结构与栅线 或数据线相邻时，必须在电致变色结构与栅线或数据线之间形成绝缘 层。
此外， 当电致变色结构位于阵列基板 6 上时， 电致变色结构中 的第一透明电极或者第二透明电极可复用为像素电极，像素电极公共 电极共同驱动液晶进行偏转。 本发明实施例二提供了一种显示面板， 该显示面板上形成有电 致变色结构， 当显示面板呈现亮态时， 电致变色结构呈现透明态； 当 显示面板呈现暗态时， 电致变色结构呈现着色态， 呈现着色态的电致 变色结构能吸收光线， 从而最大限度的减少显示面板在暗态时的漏 光， 使得显示面板的最小亮度下降， 进而有效提高了显示面板的对比 度。 实施例三
本发明实施例三提供一种显示装置，该显示装置包括： 显示面 板， 该显示面板采用上述实施例一或实施例二中的显示面板， 具体可 参见上述实施例一和实施例二， 此处不再赘述。
该显示装置可以为： 手机、 平板电脑、 电视机、 显示器、 笔记 本电脑、 数码相框、 导航仪等任何具有显示功能的产品或部件。
本发明实施例三提供了一种显示装置， 该显示装置包括显示面 板，其中该显示面板上形成有电致变色结构，当显示面板呈现亮态时， 电致变色结构呈现透明态； 当显示面板呈现暗态时， 电致变色结构呈 现着色态， 呈现着色态的电致变色结构能吸收光线， 从而最大限度的 减少显示面板在暗态时的漏光， 使得显示面板的最小亮度下降， 进而 有效提高了显示面板的对比度。 实施例四
本实施例四提供了一种显示面板的制造方法， 该制造方法包括： 步骤 S 1 : 形成电致变色结构， 所述电致变色结构用于当所述显 示面板呈现暗态时吸收所述显示面板的漏光。
具体地， 步骤 S 1包括：
步骤 101 : 在阵列基板或对盒基板上形成电致变色结构。
本发明实施例四提供了一种显示面板的制造方法， 在制造该显 示面板的过程中， 会在第一衬底基板上形成电致变色结构， 当显示面 板呈现亮态时， 电致变色结构呈现透明态； 当显示面板呈现暗态时， 电致变色结构呈现着色态， 呈现着色态的电致变色结构能吸收光线， 从而最大限度的减少显示面板在暗态时的漏光，使得通过本实施例提 供的制造方法制造出显示面板的最小亮度下降，进而有效提高了显示 面板的对比度。 实施例五
本发明实施例五提供一种显示面板的制造方法， 其中， 电致变 色结构位于第一衬底基板的正面， 电致变色结构包括： 电致变色层、 第一透明电极和第二透明电极，在第一衬底基板显的正面还设置有彩 膜， 彩膜包括彩色矩阵图形和黑矩阵， 黑矩阵限定出像素区域， 彩色 矩阵图形形成于像素区域中， 电致变色结构位于彩膜上。
图 5为图 4所示的显示面板的制造方法的流程图， 如图 5所示， 该制造方法包括：
步骤 201 : 在第一衬底基板上形成黑矩阵和彩色矩阵图形。
图 6a 为在第一衬底基板上形成黑矩阵和彩色矩阵图形的示意 图， 如图 6a所示， 先在第一衬底基板上形成一层黑矩阵基材， 再对 黑矩阵基材进行构图工艺以形成黑矩阵 32， 然后在第一衬底基板上 形成一层彩膜基材，再对彩膜基材进行构图工艺以形成彩色矩阵图形 31， 其中， 黑矩阵 32限定出像素区域， 彩色矩阵图形 31位于像素区 域中。
步骤 202 : 在黑矩阵和彩色矩阵图形上形成平坦层。
图 6b为在黑矩阵和彩色矩阵图形上形成平坦层的示意图， 如图 6b所示， 由于黑矩阵 32和彩色矩阵图形 31所构成的彩膜的表面不 平整， 因此可通过化学气相沉积技术在黑矩阵 32和彩色矩阵图形 31 上形成平坦层 4， 平坦层 4不仅起到保护黑矩阵 32和彩色矩阵图形 31的作用， 而且平坦层 4平整的表面还有利于电致变色结构的形成。
步骤 203 : 在平坦层上形成第一透明电极。
图 6c为在平坦层上形成第一透明电极的示意图， 如图 6c所示， 通过化学气相沉积或磁控溅射原理在平坦层 4 上形成一层第一透明 电极 1 1， 可选地， 第一透明电极 1 1的材料为 ιτο。
步骤 204 : 在第一透明基板上形成电致变色层。 图 6d 为在第一透明基板上形成电致变色层的示意图， 如图 6d 所示， 在第一透明基板 1 1上均匀形成一层电致变色材料， 该层电致 变色材料即为电致变色层 12。
步骤 205 : 在电致变色层上形成第二透明电极。
如图 2 所示， 通过化学气相沉积或磁控溅射原理在电致变色层
12上形成第二透明电极 13， 可选地， 第二透明电极的材料为 IT0。
步骤 206 : 对第一透明电极、 电致变色层和第二透明电极进行构 图工艺。
参见图 4所示， 对第一透明电极 1 1、 电致变色层 12和第二透明 电极 13进行构图工艺后， 使得致变色结构 1为包括若干个电致变色 子单元 14的分散结构， 每个像素区域的上方都对应有一个电致变色 子单元 14。
需要说明的是， 本发明的实施例中所称的构图工艺包括光刻胶 涂布、 掩模、 曝光、 显影、 刻蚀、 光刻胶剥离等部分或全部工艺。
步骤 207 : 在第二透明电极上形成取向层， 对盒基板完成。
图 6e为在第二透明电极上形成取向层的示意图， 如图 6e所示， 在第二透明电极 13上形成一层取向层基材， 再通过取向工艺对取向 层基材进行处理形成取向层 5。
需要说明的是， 若电致变色结构 1 为与第一衬底基板的表面尺 寸相等的一个整体结构时， 则完成步骤 205后， 直接执行步骤 207。
需要说明的是， 通过上述的执行顺序形成的显示面板， 其电致 变色结构位于彩膜的上方， 但是本实施例可以通过改变上述步骤的执 行顺序， 可实现电致变色结构位于第一衬底基板和彩膜之间。
步骤 208 : 形成阵列基板。
形成阵列基板的过程与现有技术一样， 此处不再赘述。
步骤 209 : 将阵列基板与对盒基板进行对盒， 流程结束。
需要说明的是， 本实施例只是描述了电致变色结构位于对盒基 板上的情况，对于电致变色结构位于阵列基板上的情况可参照本实施 例进行相应的变化。
本发明实施例五提供了一种显示面板的制造方法， 在制造该显 示面板的过程中， 在对盒基板上形成电致变色结构， 当显示面板呈现 亮态时， 电致变色结构呈现透明态； 当显示面板呈现暗态时， 电致变 色结构呈现着色态， 呈现着色态的电致变色结构能吸收光线， 从而最 大限度的减少显示面板在暗态时的漏光，使得通过本实施例提供的制 造方法制造出显示面板的最小亮度下降，进而有效提高了显示面板的 对比度。
可以理解的是， 以上实施方式仅仅是为了说明本发明的原理而 采用的示例性实施方式， 然而本发明并不局限于此。 对于本领域内 的普通技术人员而言， 在不脱离本发明的精神和实质的情况下， 可以 做出各种变型和改进， 这些变型和改进也视为本发明的保护范围。

Claims

权利要求书
1. 一种显示面板， 包括阵列基板和对盒基板， 其特征在于， 还 包括： 电致变色结构， 其位于所述阵列基板或所述对盒基板上， 所述 电致变色结构用于当所述显示面板呈现暗态时吸收所述显示面板的 漏光。
2.根据权利要求 1 所述的显示面板， 其特征在于， 所述对盒基 板包括：第一衬底基板和彩膜，所述彩膜形成于所述第一衬底基板上， 并且其中， 当所述电致变色结构位于所述对盒基板上时， 所述电致变 色结构形成于所述彩膜上。
3.根据权利要求 2 所述的显示面板， 其特征在于， 所述对盒基 板还包括： 平坦层， 所述平坦层形成于所述电致变色结构和所述彩膜 之间。
4.根据权利要求 2 所述的显示面板， 其特征在于， 所述电致变 色结构包括若干个电致变色子单元；
所述彩膜包括： 彩色矩阵图形和黑矩阵， 所述黑矩阵限定出像 素区域， 所述彩色矩阵图形形成于所述像素区域中，
其中， 所述电致变色子单元与所述像素区域一一对应设置。
5.—种显示装置，其特征在于， 包括： 显示面板， 所述显示面板 采用权利要求 1至 4中任一所述的显示面板。
6.—种显示面板的制造方法， 包括： 形成阵列基板和对盒基板 其特征在于， 该制造方法还包括以下步骤：
在所述阵列基板或所述对盒基板上形成电致变色结构， 所述电 致变色结构用于当所述显示面板呈现暗态时吸收所述显示面板的漏 光。
7.根据权利要求 6 所述的显示面板的制造方法， 其特征在于， 所述形成对盒基板的步骤包括： 形成第一衬底基板； 以及在所述第一 衬底基板上形成彩膜， 并且
当在所述对盒基板上形成电致变色结构时， 所述形成电致变色 结构的步骤包括：
在所述彩膜上形成所述电致变色结构。
8.根据权利要求 7 所述的显示面板的制造方法， 其特征在于， 在所述第一衬底基板上形成彩膜的步骤和在所述彩膜上形成所述电 致变色结构的步骤之间还包括以下步骤：
在所述彩膜上形成平坦层。
9.根据权利要求 7 所述的显示面板的制造方法， 其特征在于， 所述彩膜被形成为包括彩色矩阵图形和黑矩阵，所述彩色矩阵图形形 成于所述像素区域中；
在在所述彩膜上形成所述电致变色结构的步骤之后还包括以下 步骤：
对所述电致变色结构进行构图工艺以形成若干电致变色子单 元， 所述电致变色子单元与所述像素区域一一对应设置。
PCT/CN2014/079744 2013-11-06 2014-06-12 显示面板及其制造方法、显示装置 WO2015067047A1 (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US14/422,205 US20160033842A1 (en) 2013-11-06 2014-06-12 Display panel and manufacturing method thereof, and display device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201310546145.7 2013-11-06
CN201310546145.7A CN103529615B (zh) 2013-11-06 2013-11-06 显示面板及其制造方法、显示装置

Publications (1)

Publication Number Publication Date
WO2015067047A1 true WO2015067047A1 (zh) 2015-05-14

Family

ID=49931735

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/CN2014/079744 WO2015067047A1 (zh) 2013-11-06 2014-06-12 显示面板及其制造方法、显示装置

Country Status (3)

Country Link
US (1) US20160033842A1 (zh)
CN (1) CN103529615B (zh)
WO (1) WO2015067047A1 (zh)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103529615B (zh) * 2013-11-06 2016-04-20 京东方科技集团股份有限公司 显示面板及其制造方法、显示装置
CN103969905B (zh) * 2014-03-21 2016-08-17 京东方科技集团股份有限公司 一种电致变色显示器件及其制备方法
CN103941468B (zh) * 2014-04-03 2016-07-06 京东方科技集团股份有限公司 一种彩膜基板、液晶显示面板及显示装置
US10344208B2 (en) 2014-06-09 2019-07-09 iGlass Technology, Inc. Electrochromic device and method for manufacturing electrochromic device
US10294415B2 (en) 2014-06-09 2019-05-21 iGlass Technology, Inc. Electrochromic composition and electrochromic device using same
CN104749837A (zh) * 2015-04-24 2015-07-01 京东方科技集团股份有限公司 一种阵列基板及显示装置
CN104834146B (zh) * 2015-05-25 2018-05-01 京东方科技集团股份有限公司 一种显示器件、其制作方法、其驱动方法及显示装置
CN105093771A (zh) * 2015-08-20 2015-11-25 京东方科技集团股份有限公司 一种子像素结构、像素结构、显示面板、显示装置
CN105278199A (zh) * 2015-11-17 2016-01-27 深圳市华星光电技术有限公司 电致变色显示面板及其制作方法
DE102016111159A1 (de) * 2016-06-17 2017-12-21 Visteon Global Technologies, Inc. Displayanordnung und Verfahren zur Anzeige von Informationen
CN106292092B (zh) 2016-10-28 2017-11-21 京东方科技集团股份有限公司 反射型显示装置
CN107065325B (zh) * 2017-03-17 2020-07-03 京东方科技集团股份有限公司 显示面板及含有其的电子设备
CN108388059A (zh) * 2018-03-01 2018-08-10 上海天马微电子有限公司 一种固态全反射显示面板及显示装置
CN108490701B (zh) * 2018-03-13 2021-04-30 京东方科技集团股份有限公司 显示面板及其制造方法、显示装置
CN108987451B (zh) * 2018-08-01 2021-09-24 京东方科技集团股份有限公司 显示面板及其控制方法和显示装置
CN109696780B (zh) * 2019-01-15 2022-03-01 成都中电熊猫显示科技有限公司 显示模组及显示装置
CN110518148A (zh) * 2019-08-30 2019-11-29 京东方科技集团股份有限公司 显示基板的制备方法、显示基板、显示面板及控制方法
CN114074535B (zh) * 2020-08-20 2024-06-04 京东方科技集团股份有限公司 一种遮阳板
CN115280232B (zh) 2020-12-15 2023-11-17 京东方科技集团股份有限公司 显示基板、显示装置及显示基板的制作方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101097343A (zh) * 2006-06-29 2008-01-02 Lg.菲利浦Lcd株式会社 视角可控滤色器基板、具有该基板的液晶显示器及其制造方法
CN102111085A (zh) * 2009-12-27 2011-06-29 刘新月 一种用于沙漠太阳能发电的自我增值装置
CN102759834A (zh) * 2011-04-25 2012-10-31 三星移动显示器株式会社 显示装置以及操作该显示装置的方法
CN102944952A (zh) * 2012-11-13 2013-02-27 京东方科技集团股份有限公司 一种彩膜基板及其制作方法和显示面板
CN103529615A (zh) * 2013-11-06 2014-01-22 京东方科技集团股份有限公司 显示面板及其制造方法、显示装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5954559A (en) * 1997-01-13 1999-09-21 Image Quest Technologies, Inc. Color filter structure and method of making
TW200827828A (en) * 2006-12-29 2008-07-01 Innolux Display Corp Liquid crystal display device
KR20090063369A (ko) * 2007-12-14 2009-06-18 삼성전자주식회사 컬러 표시 장치
KR100941844B1 (ko) * 2008-01-29 2010-02-11 삼성에스디아이 주식회사 필름 필터 및 이를 구비하는 평판 표시장치
KR20100029633A (ko) * 2008-09-08 2010-03-17 삼성전자주식회사 능동형 반투과 소자를 구비하는 디스플레이 장치
TWI444944B (zh) * 2011-03-29 2014-07-11 E Ink Holdings Inc 彩色顯示器以及顯示器製造方法
CN102737576B (zh) * 2011-04-12 2014-12-10 神基科技股份有限公司 透明显示装置及其操作方法
JP2013003466A (ja) * 2011-06-20 2013-01-07 Japan Display West Co Ltd 表示装置および電子機器
CN202189212U (zh) * 2011-08-18 2012-04-11 京东方科技集团股份有限公司 一种透反型电致变色液晶显示器
KR101944035B1 (ko) * 2013-04-25 2019-01-30 엘지디스플레이 주식회사 투명표시장치

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101097343A (zh) * 2006-06-29 2008-01-02 Lg.菲利浦Lcd株式会社 视角可控滤色器基板、具有该基板的液晶显示器及其制造方法
CN102111085A (zh) * 2009-12-27 2011-06-29 刘新月 一种用于沙漠太阳能发电的自我增值装置
CN102759834A (zh) * 2011-04-25 2012-10-31 三星移动显示器株式会社 显示装置以及操作该显示装置的方法
CN102944952A (zh) * 2012-11-13 2013-02-27 京东方科技集团股份有限公司 一种彩膜基板及其制作方法和显示面板
CN103529615A (zh) * 2013-11-06 2014-01-22 京东方科技集团股份有限公司 显示面板及其制造方法、显示装置

Also Published As

Publication number Publication date
CN103529615A (zh) 2014-01-22
US20160033842A1 (en) 2016-02-04
CN103529615B (zh) 2016-04-20

Similar Documents

Publication Publication Date Title
WO2015067047A1 (zh) 显示面板及其制造方法、显示装置
US20200387018A1 (en) Liquid crystal display panel, fabrication method therefor and display device
US7580092B2 (en) Liquid crystal display device and method for fabricating the same
EP3156841A1 (en) Display base plate, display panel and display device
KR101386577B1 (ko) 면적이 최소화된 액정표시소자
JP2015511026A (ja) アレイ基板及びその製造方法、並びに表示装置
CN105116651B (zh) Boa型液晶面板
US8982303B2 (en) Transflective liquid crystal display and method thereof
US11271051B2 (en) Light source panel and display device
EP2919267B1 (en) Array substrate, manufacturing method therefor and display device
CN103515539A (zh) 有机发光装置及包含其的影像显示系统
JP2005301268A (ja) カラーフィルター基板、これを有する表示装置及びこれの製造方法。
KR20170071672A (ko) 윈도우 표시 장치
JP5736913B2 (ja) カラーフィルタ基板及びそれを備えた液晶表示装置
WO2020062489A1 (zh) 液晶显示模组、液晶显示器及显示设备
US11106100B2 (en) Display substrate, display panel, display device and manufacturing method thereof
WO2018113061A1 (zh) 阵列基板、彩膜基板及液晶面板
JP5109424B2 (ja) 反射型表示装置
US7224419B2 (en) Liquid crystal display device
KR20070071798A (ko) 액정 표시장치와 그의 제조방법
JP6943361B2 (ja) Ｃｏａ型液晶パネルの製造方法及びｃｏａ型液晶パネル
US20060146235A1 (en) Color filter substrate for liquid crystal display and method of fabricating the same
US10268093B2 (en) Array substrate and the preparation method thereof, liquid crystal panel
TW201701028A (zh) 顯示裝置
CN103744240A (zh) 阵列基板及用该阵列基板的液晶显示面板

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 14422205

Country of ref document: US

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 14860277

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

32PN Ep: public notification in the ep bulletin as address of the adressee cannot be established

Free format text: NOTING OF LOSS OF RIGHTS PURSUANT TO RULE 112(1) EPC (EPO FORM 1205A DATED 09.09.2016)

122 Ep: pct application non-entry in european phase

Ref document number: 14860277

Country of ref document: EP

Kind code of ref document: A1