WO2015064685A1 - Dispositif d'application pour former un revêtement à motif discontinu sur un substrat de film en ruban, et procédé de fabrication d'un substrat de film en ruban à motif inégal - Google Patents

Dispositif d'application pour former un revêtement à motif discontinu sur un substrat de film en ruban, et procédé de fabrication d'un substrat de film en ruban à motif inégal Download PDF

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Publication number
WO2015064685A1
WO2015064685A1 PCT/JP2014/078882 JP2014078882W WO2015064685A1 WO 2015064685 A1 WO2015064685 A1 WO 2015064685A1 JP 2014078882 W JP2014078882 W JP 2014078882W WO 2015064685 A1 WO2015064685 A1 WO 2015064685A1
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WO
WIPO (PCT)
Prior art keywords
coating
film
roll
pattern
substrate
Prior art date
Application number
PCT/JP2014/078882
Other languages
English (en)
Japanese (ja)
Inventor
稔和 清原
宗孝 柴宮
匠 大村
一喜 加藤
Original Assignee
Ｊｘ日鉱日石エネルギー株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2013228452A external-priority patent/JP2015085659A/ja
Priority claimed from JP2014058353A external-priority patent/JP2015181979A/ja
Priority claimed from JP2014058393A external-priority patent/JP2015181981A/ja
Priority claimed from JP2014058264A external-priority patent/JP6157391B2/ja
Application filed by Ｊｘ日鉱日石エネルギー株式会社 filed Critical Ｊｘ日鉱日石エネルギー株式会社
Publication of WO2015064685A1 publication Critical patent/WO2015064685A1/fr

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/04—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts
    • B29C59/046—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing using rollers or endless belts for layered or coated substantially flat surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
    • B05C1/04—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length
    • B05C1/08—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line
    • B05C1/0826—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line the work being a web or sheets
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C21/00—Accessories or implements for use in connection with applying liquids or other fluent materials to surfaces, not provided for in groups B05C1/00 - B05C19/00
    • B05C21/005—Masking devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/32—Processes for applying liquids or other fluent materials using means for protecting parts of a surface not to be coated, e.g. using stencils, resists
    • B05D1/322—Removable films used as masks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
    • B05C1/04—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length
    • B05C1/08—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line
    • B05C1/0839—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length using a roller or other rotating member which contacts the work along a generating line the work being unsupported at the line of contact between the coating roller and the work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C1/00—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating
    • B05C1/04—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length
    • B05C1/16—Apparatus in which liquid or other fluent material is applied to the surface of the work by contact with a member carrying the liquid or other fluent material, e.g. a porous member loaded with a liquid to be applied as a coating for applying liquid or other fluent material to work of indefinite length only at particular parts of the work
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D2252/00—Sheets
    • B05D2252/02—Sheets of indefinite length
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0805—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation
    • B29C2035/0827—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using electromagnetic radiation using UV radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0866—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using particle radiation
    • B29C2035/0877—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using particle radiation using electron radiation, e.g. beta-rays

Definitions

  • the present invention manufactures a coating member and a coating film forming method for forming a coating film having a desired discontinuous pattern on a belt-shaped film substrate, and a film member having a concavo-convex pattern forming region spaced on the substrate.
  • the present invention relates to an apparatus and method for manufacturing a substrate, and a method for manufacturing a substrate having an uneven pattern.
  • the coating material is attached to a rotating coating roll, and the film substrate is brought into contact with the coating material on the coating roll while being transported.
  • a method such as a gravure coating method for forming a coating film on the surface is known.
  • Such coating film forming methods are used in various applications such as electrode material sheets for solar cells, fuel cells, storage batteries, antireflection films, and catalyst coatings.
  • a continuous non-application region in the longitudinal direction and the width direction can be formed by the method as described in Patent Document 1, and intermittent (with respect to the longitudinal direction and the width direction of the base material)
  • a coating having a (discontinuous) pattern can be formed.
  • the backing roll disposed so as to contact the coating roll via the substrate is intermittently separated from the coating roll
  • the film base is separated from the coating roll to form a continuous non-coating region in the width direction of the film base, whereby the film base is applied intermittently (discontinuously in the longitudinal direction) with respect to the longitudinal direction of the film base.
  • a film is formed.
  • using a coating roll in which a groove is formed along the circumferential direction on the outer peripheral surface while removing the coating material in the groove with a doctor blade or the like engaged with the groove, the film substrate is brought into contact with the coating roll.
  • a continuous non-coating region is formed in the longitudinal direction (conveying direction) of the film substrate, thereby being intermittent (discontinuous in the width direction) with respect to the width direction of the film substrate.
  • a coating film is formed.
  • a nanoimprint method is known in addition to the lithography method.
  • the nanoimprint method is a technique capable of transferring a nanometer order pattern by sandwiching a resin between a mold and a substrate, and thermal nanoimprint method, optical nanoimprint method, and the like have been studied depending on the material used.
  • the optical nanoimprint method comprises four steps of i) application of a resin layer, ii) press with a mold, iii) photocuring and iv) mold release, and can realize nano-size processing by such a simple process. Excellent in terms.
  • the resin layer uses a photocurable resin that is cured by light irradiation, the time required for the pattern transfer process is short, and high throughput can be expected. For this reason, practical application is expected not only in semiconductor devices but also in many fields such as optical members such as organic EL elements and LEDs, MEMS, and biochips.
  • organic EL devices organic light-emitting diodes
  • holes that have entered from the anode through the hole injection layer and electrons that have entered from the cathode through the electron injection layer are respectively transported to the light emitting layer, on the organic molecules in the light emitting layer. They recombine to excite organic molecules, thereby emitting light. Therefore, in order to use the organic EL element as a display device or a lighting device, it is necessary to efficiently extract light from the light emitting layer from the surface of the element. For this reason, a diffraction grating substrate having a concavo-convex pattern is used as the organic EL element. It is known from Patent Document 2 that it is provided on the light extraction surface.
  • Patent Document 3 discloses that a film-shaped mold can be produced by transferring a concavo-convex pattern of a roll-shaped metal mold to a film substrate by a roll process.
  • the objective of this invention is providing the method and manufacturing apparatus which manufacture the film member which has an uneven
  • Another object of the present invention is that a coating film having a desired discontinuous (separated) pattern can be formed on a substrate by a simple method, and is suitable for forming coating films having various patterns. It is to provide a coating apparatus and a coating method that are possible. Moreover, the apparatus and method for manufacturing the film member which has the uneven
  • a method for producing a substrate having a concavo-convex pattern using the film member produced according to the present invention as a mold is also provided.
  • a coating apparatus for forming a film on a coating film forming surface of a band-shaped film substrate, A coating roll that rotates by attaching a coating material on the outer peripheral surface; A coating liquid supply member for supplying the coating film material to the coating roll; A film base material transport section for continuously transporting the coating roll while contacting the coating film forming surface of the film base material, There is provided a coating apparatus including a non-coating region forming mechanism that forms a non-coating region continuous in at least one direction on the film substrate.
  • the non-coating region forming mechanism is urged and moved to the film base so as to displace a position where the film base is in contact with the coating roll and a position where the film base is separated from the coating roll.
  • An actuating roll that is provided on the upstream side or the downstream side in the transport direction of the film base with respect to the coating roll, and A transport direction non-coating region forming mechanism for forming a non-coating region continuous in the transport direction of the film base material.
  • the transport direction non-coating region forming mechanism is A tape that is positioned upstream of the coating roll in the transport direction of the film substrate and that gives a strip-shaped tape-shaped mask on the coating film forming surface of the film substrate along the transport direction of the film substrate.
  • a mask-applied part It may be located downstream of the coating roll in the transport direction of the film base material, and may include a tape-shaped mask peeling part that peels the tape-shaped mask from the film base material.
  • the transport direction non-coating region forming mechanism is located upstream of the coating roll in the transport direction of the film base material, and a liquid repellent material is disposed on the coating film forming surface of the film base material.
  • the liquid repellent material application part to apply may be included.
  • the coating roll includes the transport direction non-coating region forming mechanism,
  • the transport direction non-application area forming mechanism is formed on the outer peripheral surface of the application roll and two or more liquid carrying areas continuous in the circumferential direction of the application roll, and on the outer peripheral surface of the application roll.
  • a liquid non-carrying region formed between each of the liquid carrying regions may be included.
  • the coating liquid supply member includes the transport direction non-coating region forming mechanism
  • the transport direction non-application area forming mechanism may include at least two or more application liquid supply chambers that are spaced apart from each other in the rotation axis direction of the application roll.
  • the working roll may be provided separately from the coating roll on the downstream side in the transport direction of the film base.
  • the coating apparatus may include a tension control unit for keeping the tension of the film substrate constant while the film substrate is being conveyed.
  • the non-coating region forming mechanism may include an air knife that blows gas toward the coating film forming surface of the film base to bring the film base and the coating roll into non-contact.
  • the non-coating region forming mechanism is a suction roll disposed to face the air knife, and sucks the film base material when the film base material is not in contact with the coating roll. And holding the suction roll.
  • the suction roll may have a mechanism for discharging gas.
  • the non-application area forming mechanism may further include another air knife that blows gas toward the back surface of the coating film forming surface of the film base material.
  • the uncoated region forming mechanism may further include a transport direction non-coated region forming mechanism that forms a non-coated region continuous in the transport direction of the film substrate on the film substrate.
  • the transport direction non-coating region forming mechanism is A tape that is positioned upstream of the coating roll in the transport direction of the film substrate and that gives a strip-shaped tape-shaped mask on the coating film forming surface of the film substrate along the transport direction of the film substrate.
  • a mask-applied part It may be located downstream of the coating roll in the transport direction of the film base material, and may include a tape-shaped mask peeling part that peels the tape-shaped mask from the film base material.
  • the transport direction non-coating region forming mechanism is located upstream of the coating roll in the transport direction of the film base material, and a liquid repellent material is disposed on the coating film forming surface of the film base material.
  • the liquid repellent material application part to apply may be included.
  • the coating roll includes the transport direction non-coating region forming mechanism,
  • the transport direction non-application area forming mechanism is formed on the outer peripheral surface of the application roll and two or more liquid carrying areas continuous in the circumferential direction of the application roll, and on the outer peripheral surface of the application roll.
  • a liquid non-carrying region formed between each of the liquid carrying regions may be included.
  • the coating liquid supply member includes the transport direction non-coating region forming mechanism
  • the transport direction non-application area forming mechanism may include at least two or more application liquid supply chambers that are spaced apart from each other in the rotation axis direction of the application roll.
  • coating apparatus WHEREIN The said non-application area
  • the pattern which provides a pattern mask on the said coating-film formation surface of the said film base material A mask applying unit;
  • the pattern mask peeling part which is located in the downstream of the conveyance direction of the said film base material from the said application roll, and peels the said pattern mask from the said film base material may be included.
  • the pattern mask may have a pattern divided in the conveyance direction of the pattern mask.
  • the pattern mask may have a continuous pattern in the conveyance direction of the pattern mask.
  • the uncoated region forming mechanism may further include a transport direction non-coated region forming mechanism that forms a non-coated region continuous in the transport direction of the film substrate on the film substrate.
  • a manufacturing apparatus for a strip-shaped film member having an uneven pattern An application part for applying a concavo-convex forming material on a band-shaped film substrate to form a film;
  • a transfer roll having a concavo-convex pattern, and a transfer portion for transferring the concavo-convex pattern to the film;
  • a transport unit that continuously transports the film base material from the coating unit toward the transfer unit;
  • the coating section has the coating apparatus of the first aspect.
  • the film member manufacturing apparatus includes a detection unit that detects a rotation state of the transfer roll; And a control unit for controlling the application unit,
  • the transfer roll is a transfer roll in which a thin plate-shaped mold having the concavo-convex pattern is wound around a base roll, and ends of the thin plate mold are joined together on the outer peripheral surface of the base roll,
  • the transfer unit is configured such that, in the transfer unit, an uncoated portion where the unevenness forming material of the film base material is not applied is opposed to a joint portion of the thin plate mold of the transfer roll.
  • the application unit may be controlled based on the rotation state detected by the detection unit such that the film on the film base material is overlaid on the film base.
  • a method for forming a coating film on a film substrate using the coating apparatus of the first aspect there is provided a method of forming a coating comprising forming an uncoated region on the film substrate.
  • a method for producing a strip-shaped film member having a concavo-convex pattern An application step of forming a film by applying an unevenness forming material on the film substrate while conveying a belt-shaped film substrate; A transfer step of transferring the concavo-convex pattern of the transfer roll to the film while conveying the film substrate, In the coating step, the unevenness forming material is contacted with the film base material to form a coated portion on which the unevenness forming material is applied, and the unevenness forming material is separated from the film base material.
  • the transfer roll is formed by winding a thin plate-shaped mold having the uneven pattern around a base roll and joining the ends of the thin plate mold on the outer peripheral surface of the base roll.
  • the film on the film base is pressed against the transfer roll so that the uncoated part of the film base faces the joint of the thin plate mold of the transfer roll.
  • the method for manufacturing the film member may further include a detection step of detecting a rotation state of the transfer roll, Based on the rotation state detected in the detection step, the timing for applying the unevenness forming material on the film substrate in the application step may be controlled.
  • non-coating region forming mechanism that forms a non-coating region continuous in at least one direction on the film base material
  • a coating film having a desired discontinuous (separated) pattern can be formed.
  • a non-coating region continuous mechanism in the width direction of the film substrate by moving the film base so as to be in contact with or away from the coating roll while transporting the film base by a non-coating region forming mechanism Can do.
  • an uncoated area forming mechanism that moves or displaces the film substrate with respect to the coating roll using an air knife is used, the configuration of the apparatus can be simplified.
  • the non-coating region forming mechanism may further include means for forming a non-coating region continuous in the longitudinal direction (conveying direction) of the film substrate, whereby a coating film having various patterns can be simply formed on the substrate. Can be formed.
  • a film member in which a concavo-convex pattern is formed in a desired region on a substrate can be produced.
  • corrugated material is made into a film so that the uncoated part of an uneven
  • a coating apparatus and a coating method of the present invention and a manufacturing apparatus and a manufacturing method for a film member having a concavo-convex pattern include electrode material sheets such as organic EL elements, solar cells, fuel cells, and storage batteries, antireflection films, and catalyst coating. It is extremely effective for the production of substrates used for such as.
  • FIGS. 5A to 5C are views conceptually showing a coating apparatus according to a fifth embodiment for forming a discontinuous coating film in the longitudinal direction of the substrate. It is a figure which shows notionally the coating device of 6th Embodiment for forming a discontinuous coating film in the longitudinal direction and the width direction of a base material.
  • FIGS. 25A to 25C are diagrams conceptually showing pattern examples of a pattern mask used in the coating apparatus of the tenth embodiment.
  • the coating device 140a mainly applies a liquid on the film transport unit 120a that continuously feeds the film base 80 and the film base 80 fed by the film transport unit 120a.
  • the coating apparatus 140a may include a tension control unit for keeping the tension of the film substrate 80 constant.
  • the operation roll 42, the mask applying unit 270, and the mask peeling unit 290 function as a non-application region forming mechanism.
  • the mask applying unit 270 and the mask peeling unit 290 particularly serve as a transport direction non-application area forming mechanism. Below, the detail of the structure of each part is demonstrated.
  • the film transport unit 120 a mainly includes a transport roll 78 for transporting the band-shaped film substrate 80 in the transport direction (the arrow direction in FIG. 1). Further, although not shown in FIG. 1, a feeding roll for feeding out the film base 80 and a take-up roll that is provided downstream of the coating roll 40 and winds up the film base 80 may be provided (see FIG. 15). .
  • the film substrate 80 can be transported in the transport direction by the rotational drive of the transport roll 78 and / or the rotational drive of the feed roll and take-up roll.
  • the film substrate 80 is a strip-shaped or elongated film substrate in order to enable continuous processing while being conveyed.
  • the film substrate 80 is made of, for example, film-like glass, silicone resin, polyethylene terephthalate (PET), polyethylene terephthalate (PEN), polycarbonate (PC), cycloolefin polymer (COP), polymethyl methacrylate (PMMA), polystyrene ( PS), polyimide (PI), and an organic material such as polyarylate.
  • the film substrate may be transparent or opaque. In order to enhance the adhesion between the film substrate 80 and the coating film formed on the surface thereof, the film substrate 80 may be subjected to an easy adhesion treatment on the surface. A gas barrier layer may be provided.
  • the dimensions of the film substrate 80 can be appropriately set.
  • the film substrate 80 can have a width of 50 to 3000 mm and a thickness of 1 to 500 ⁇ m.
  • the coating roll 40 applies a liquid to the film substrate 80 to form the coating film 84.
  • a gravure roll is used as the coating roll 40.
  • the gravure roll has a liquid carrying region 40a having fine irregularities formed on the outer peripheral surface, and rotates around a rotation axis by a drive system (not shown).
  • the coating liquid supply member 82 includes a chamber in which the coating film material is stored, and a part of the coating roll 40 is immersed in the stored coating material. When the application roll 40 rotates, the coating material is supported on the liquid holding region 40a of the application roll 40 in the circumferential direction.
  • the coating roll 40 is disposed to face the surface (coating film forming surface) of the film substrate 80, and the coating material carried on the liquid carrying region 40a of the coating roll 40 is continuously conveyed while the coating roll 40 rotates. By contacting the substrate 80, the coating material adheres to the substrate 80 and the coating 84 is formed.
  • the dimensions of the coating roll 40 and its liquid carrying area 40a can be set as appropriate. From the viewpoint of preventing the coating material from protruding from the left and right ends of the film substrate 80 and entering the back surface of the film substrate 80, the length of the liquid carrying region 40 a in the rotation axis direction is the width of the film substrate 80. It may be smaller.
  • the operation roll 42 supports the back surface (the surface opposite to the coating film forming surface) of the film base material 80 and contacts the base material 80 with the coating roll 40 (the operation roll 42 shown by a solid line in FIG. 1). And a position where the base material 80 is separated from the coating roll 40 (hereinafter, a position of the working roll 42 shown by a broken line in FIG. It is alternatively displaced.
  • the movement trajectory for moving the contact position and the separation position of the operation roll 42 is indicated by arrows.
  • the position of the operation roll 42 can be changed by using a mechanism for moving the film substrate 80 relative to the application roll 40 such as an actuator (not shown).
  • the coating material carried on the coating roll 40 comes into contact with the substrate 80, and the coating material adheres onto the substrate 80 to form the coating 84.
  • the operation roll 42 is located at the separation position, the base material 80 is separated from the coating material carried on the coating roll 40, so that the coating material does not adhere to the base material 80 and a coating film is formed.
  • the discontinuous coating film 84 can be formed in the conveying direction of the film substrate 80 by changing the position of the operation roll 42 while conveying the film substrate 80.
  • the operation roll 42 is provided not at a position facing the application roll 40 but at a position separated from the application roll 40 by a predetermined distance ⁇ .
  • This arrangement has the following technical significance.
  • the working roll 42 when the working roll 42 is in the separated position, the base material 80 is not in contact with the coating roll 40, and the base material 80 is stretched between the working roll 42 and the upstream support roll 18. It is in.
  • the working roll 42 is moved from the separated position to the contact position, the distance moved by the working roll 42, that is, the moving distance d ⁇ b> 1 of the film base 80 in contact with the working roll, is the film base 80 and the coating roll 40. Is greater than the change d2 in the distance between the two.
  • the moving distance of the working roll 42 and the ratio of the distance between the film base 80 and the coating roll 40 that change accordingly are the distance between the supporting roll 18 and the working roll 42, the supporting roll 18 and the coating roll 40. This roughly corresponds to the ratio of the distances between the two. Therefore, the adjustment of the distance between the coating roll 40 and the film substrate 80 or the basis for the coating roll 40 is adjusted by adjusting the movement of the working roll that is separated from the support roll 18 by a longer interval than the coating roll 40. The accuracy of alignment of the material 80 can be increased. Furthermore, after the working roll 42 moves toward the contact position and the film base material 80 contacts the coating roll 40, the force that presses the film base material 80 against the coating roll 40 by changing the position of the working roll 42. Can be adjusted with high accuracy.
  • the separation distance ⁇ between the working roll 42 and the application roll 40 is equal to or larger than the diameter of the working roll 42.
  • the separation distance ⁇ may be 150 mm to 250 mm apart.
  • the tape-shaped mask (mask sheet) 11 is transported together with the film base material 80 and continuously processed while masking a region continuous in the transport direction on the film base material 80.
  • the tape-shaped mask 11 is a band-shaped or long-shaped member.
  • a film made of the same material as the film substrate 80 can be used.
  • the surface of the tape-shaped mask 11 may be subjected to a liquid repellent treatment with fluororesin, silicone, or the like so that the surface of the tape-shaped mask 11 (the surface opposite to the surface in contact with the film substrate 80) repels the coating material. Also good. By making the tape-shaped mask 11 repel the coating material, the amount of the coating material used can be suppressed.
  • the back surface of the tape-shaped mask 11 (the surface in contact with the film substrate 80) may have adhesiveness so that the position of the tape-shaped mask 11 is fixed on the film substrate 80.
  • the width of the tape-shaped mask 11 is appropriately set according to the width of the non-application area continuous in the transport direction of the film substrate 80 in the coating film pattern formed on the film substrate 80, the form of the required product, and the like. However, it may be smaller than the width of the film substrate 80.
  • the thickness of the tape-shaped mask 11 can be, for example, 5 ⁇ m to 1000 ⁇ m. However, in terms of handling properties, it is easy to tear if it is too thin, and if it is too thick, it is difficult to wind with a winding roll. On the other hand, if it is too thick, the coating roll 40 and the film substrate 80 do not come into contact with each other, and coating becomes difficult.
  • the tape-shaped mask 11 is fed from a tape-shaped mask feed roll 13 and wound up by a tape-shaped mask take-up roll 15.
  • the tape-shaped mask applying unit 270 is a pair of rolls that are positioned upstream of the tape-shaped mask feeding roll 13 and the coating roll 40 in the transport direction of the film base and rotate opposite to each other, that is, a bonding roll 17 and a support roll 18.
  • the tape-shaped mask 11 fed from the tape-shaped mask feeding roll 13 is overlapped on the film base material 80 and sandwiched between the laminating roll 17 and the support roll 18, whereby the film base material 80.
  • a tape-shaped mask 11 is applied on the film substrate 80 along the conveying direction.
  • the application position of the tape-shaped mask 11 in the width direction of the film base material 80 is appropriately set according to the position of the non-application area continuous in the transport direction of the film base material 80 in the coating film pattern formed on the film base material 80. It is possible to provide a mechanism that allows the tape-shaped mask feed roll 13 to move in a direction (width direction of the film substrate 80) perpendicular to the transport direction.
  • the tape-shaped mask peeling part 290 is composed of a pair of rolls that are located on the downstream side in the transport direction of the film base with respect to the coating roll 40 and rotate opposite to each other, that is, the peeling roll 19 and the support roll 20. .
  • the tape-shaped mask peeling part 290 by transporting the tape-shaped mask 11 that has passed between the peeling roll 19 and the support roll 20 while being superimposed on the film base material 80 in a direction away from the film base material 80, The tape-shaped mask 11 is peeled off from the film substrate 80.
  • the peeled tape-shaped mask 11 can be taken up by a tape-shaped mask take-up roll 15 provided at a position deviated from the conveyance path of the film substrate 80.
  • the tape-shaped mask 11 is driven by the rotation of the laminating roll 17 and the peeling roll 19 and / or by the rotational driving of the tape-shaped mask feeding roll 13 and the tape-shaped mask take-up roll 15 or by the conveyance of the film substrate 80. Then, it can be transported in the transport direction.
  • the coating apparatus 140a may further include a tension control unit (not shown) that keeps the tension of the film substrate 80 constant in any part of the film transport unit.
  • the tension control unit cancels the fluctuation in the tension of the film substrate 80 stretched over the coating apparatus 140a, which is caused by the movement of the operation roll 42 to the contact position or the separation position, and thereby adjusts the tension of the film substrate 80. It works to keep it constant.
  • a tension control unit for example, a dancer roll may be provided in the conveyance path of the film base 80. Further, the driving of the film feeding roll may be directly controlled according to the tension of the film substrate 80.
  • a tension sensor such as a roll having a tension detection function is installed in contact with the film substrate 80.
  • a tension sensor is connected to a control device for controlling the driving of the feeding roll, for example, a motor control system for rotating the feeding roll, and the rotation speed of the feeding roll changes according to the tension value detected by the tension sensor. So that the motor can be controlled.
  • tensile_strength of the film base material 80 is kept constant, and the looseness and tension
  • a torque motor (not shown) may be connected to the feeding roll.
  • the torque motor can adjust the rotation speed and torque according to the change in the load applied to the feeding roll. Therefore, if the torque of the torque motor is set to be constant, the rotational force (torque) for rotating the feeding roll is always kept constant even if the tension applied to the film substrate 80 changes.
  • a powder clutch (not shown) may be provided on the feeding roll.
  • powder clutches powder such as iron powder exists on the joint surface between the drive shaft (input shaft) that transmits the motive power of the motor and the transmission shaft (output shaft) that transmits the motive power.
  • the transmission of the motive power is controlled by controlling with a magnetic field generated from an electromagnet provided in the motor.
  • the torque of the feeding roll can be controlled to be constant by setting the powder clutch to start sliding.
  • the torque of the feeding roll can be controlled through slipping of the clutch by providing the tension sensor as described above and adjusting the powder density according to the value of the tension applied to the film substrate 80.
  • the film conveyance unit 120 a conveyance by the film conveyance unit 120 a is started, and the film base material 80 is sent from the feed roll to the tape-shaped mask applying unit 270 via the conveyance roll 78.
  • the surface of the film substrate 80 (coating film) is obtained by sandwiching the tape-shaped mask 11 fed from the tape-shaped mask feeding roll 13 together with the film substrate 80 by the bonding roll 17 and the support roll 18.
  • the tape-shaped mask 11 is overlaid at a predetermined position on the forming surface.
  • the film base material 80 on which the tape-shaped mask 11 is superimposed is conveyed to a position facing the coating roll 40 (front surface of the coating roll 40).
  • the actuator roll 42 is moved to the contact position (position indicated by the solid line in FIG. 1) by an actuator or the like.
  • the movement of the operation roll 42 causes the base material 80 and the tape-shaped mask 11 to contact the coating roll 40 while moving in the transport direction, whereby the coating film 84 has a predetermined film thickness on the base material 80 and the tape-shaped mask 11. Formed with.
  • the tape-shaped mask 11 When the tape-shaped mask 11 is formed of a material that repels the coating film material or when the surface of the tape-shaped mask 11 is subjected to a liquid repellent treatment, no coating film is formed on the tape-shaped mask 11.
  • the operating roll 42 is separated by an actuator or the like (illustrated by a broken line in FIG. 1). Position). Since the base material 80 and the tape-shaped mask 11 moving in the transport direction are separated from the coating roll 40 by the movement of the operation roll 42, no coating film is formed on the base material 80 and the tape-shaped mask 11. A non-application area that is continuous in the width direction of the substrate is formed.
  • a discontinuous coating film 84 is formed on the film base 80 and the tape-shaped mask 11 in the transport direction of the film base 80. can do.
  • the film base material 80 and the tape-shaped mask 11 are conveyed to the tape-shaped mask peeling part 290.
  • the tape-shaped mask 11 is transported in a direction away from the film substrate 80, and the tape-shaped mask 11. Is peeled off from the film substrate 80.
  • the peeled tape-shaped mask 11 is wound up by a tape-shaped mask winding roll 15. Since the coating film formed on the tape-shaped mask 11 together with the tape-shaped mask 11 is also peeled off from the film base material 80, the coating film is not formed in the region where the tape-shaped mask 11 of the film base material 80 is overlapped. It becomes a non-application area.
  • region continuous in the conveyance direction of the film base material 80 is formed, and the discontinuous coating film 84 can be formed in the width direction of the film base material 80.
  • the tape-shaped mask 11 shown in FIG. 1 has a linear shape, the tape-shaped mask 11 may have a shape such as a curve or a polygonal line, and a film base material according to the shape of the tape-shaped mask 11.
  • region continuous in the conveyance direction of 80 is formed.
  • the coating film 84 discontinuous in the transport direction and the width direction of the film base material 80 can be formed on the film base material 80 using the coating apparatus 140a.
  • the coating film 84 on the film substrate 80 has a pattern defined by a plurality of areas (uneven pattern forming regions) that are separated from each other in the transport direction and the width direction of the film substrate 80.
  • one strip-shaped tape-shaped mask 11 is used, but two or more strip-shaped tape-shaped masks may be used.
  • a plurality of non-application areas extending in the transport direction of the film substrate can be formed.
  • the film base 80 has a desired length in the width direction and is separated by a desired distance in the width direction of the film base 80.
  • a coated film 84 can be formed.
  • the coating device 140a has a desired length in the transport direction of the film substrate 80 and is separated by a desired distance in the transport direction of the film substrate 80 according to the timing of displacement of the working roll 42.
  • a coating film 84 can be formed. Therefore, the coating apparatus 140a can be used to easily form various patterns of coating films.
  • the coating device 140b mainly applies a film onto the film transport unit 120a that continuously feeds the film base material 80, and a film by applying a liquid onto the film base material 80 fed out by the film transport unit 120a.
  • a coating liquid supply member 82 that supplies a coating liquid to the coating roll 40, an operating roll 42 that displaces the transport path of the film base 80, and a film positioned upstream of the coating roll 40.
  • a liquid repellent material application part 310 for applying a liquid repellent material on the substrate 80.
  • the coating apparatus 140b may include a tension control unit for keeping the tension of the film base material 80 constant.
  • the operation roll 42 and the liquid repellent material application unit 310 function as a non-application region forming mechanism.
  • the liquid repellent material application unit 310 particularly serves as a non-application region forming mechanism in the transport direction.
  • the film transport unit 120a, the coating roll 40, the coating liquid supply member 82, the operation roll 42, and the tension control unit of the coating apparatus 140b are the film transport unit 120a, the coating roll 40, and the coating liquid supply member of the coating apparatus 140a of the first embodiment.
  • 82, the operation roll 42 and the tension control unit are configured in the same manner, and the description thereof is omitted.
  • the liquid repellent material application unit 310 includes a liquid repellent material application roll 22 and a liquid repellent material supply chamber 24.
  • the length of the application surface of the liquid repellent material application roll 22 in the rotation axis direction depends on the width of the non-application area continuous in the conveying direction of the film substrate 80 formed on the film substrate 80, the required product form, and the like. Although it can set suitably, it may be smaller than the width
  • Liquid repellent material is stored in the liquid repellent material supply chamber 24.
  • the liquid repellent material is preferably, for example, a material having a surface energy greatly different from that of the coating film.
  • the coating film is a hydrophilic material, for example, a liquid repellent material containing fluorine is preferable.
  • a hydrophobic material for example, a hydrophilic material containing oxygen is preferable.
  • the liquid repellent material application roll 22 is provided so as to rotate in a state in which a part of the application surface is immersed in the liquid repellent material in the liquid repellent material supply chamber 24. When the liquid repellent material application roll 22 is rotated while being immersed in the liquid repellent material, the liquid repellent material is supported on the application surface of the liquid repellent material application roll 22 in the circumferential direction.
  • the liquid repellent material application roll 22 applies a liquid repellent material to the film base material 80 by rotating while contacting the surface (coating surface) of the film base material 80, thereby forming the liquid repellent film 26.
  • the installation position of the liquid repellent material application roll 22 in the width direction of the film base material 80 is appropriately set according to the position of the non-application area continuous in the transport direction of the film base material 80 formed on the film base material 80.
  • a mechanism capable of moving the liquid repellent material supply chamber 24 that accommodates the liquid repellent material application roll 22 in a direction orthogonal to the transport direction may be provided.
  • a heater or a heat roll for drying or curing the liquid repellent material may be installed behind the liquid repellent material application roll on the back surface (the surface opposite to the coating film forming surface). Good.
  • the temperature may be between 50 degrees and 250 degrees, and the temperature setting may be changed depending on the heat resistance of the film substrate 80.
  • a UV irradiator may be installed instead of a heater or a heat roll.
  • conveyance by the film conveyance unit 120 a is started, and the film base material 80 is sent from the feed roll to the liquid repellent material application unit 310 via the conveyance roll 78.
  • the application surface carrying the liquid repellent material is brought into contact with a predetermined position of the film substrate 80 while rotating the liquid repellent material application roll 22.
  • the liquid repellent film 26 continuous in the transport direction of the film substrate 80 is formed at a predetermined position on the surface (coating film forming surface) of the film substrate 80.
  • the film substrate 80 on which the liquid repellent film 26 is formed is conveyed to a position facing the coating roll 40 (front surface of the coating roll 40).
  • an actuator roll or the like is used. 42 is moved to a contact position (a position indicated by a solid line in FIG. 2). Due to the movement of the operation roll 42, the substrate 80 comes into contact with the coating roll 40 while moving in the transport direction. Thereby, the coating film 84 is formed on the base material 80 with a predetermined film thickness.
  • the film material is repelled, so that no film is formed. Therefore, the non-application area
  • the base material 80 moving in the transport direction is separated from the coating roll 40, so that no coating film is formed on the base material 80, and no coating is applied in the width direction of the film base material. A region is formed.
  • a discontinuous coating film 84 can be formed on the film substrate 80 in the transport direction of the film substrate 80.
  • the coating film 84 that is discontinuous in the conveying direction and the width direction of the film base 80 can be formed on the film base 80 using the coating apparatus 140b.
  • the coating film 84 on the film substrate 80 has a pattern partitioned by a plurality of areas spaced from each other in the transport direction and the width direction of the film substrate 80.
  • one line-shaped liquid repellent film 26 is formed using a liquid repellent material application roll 22 having one application surface, but a liquid repellent material application roll having a plurality of application surfaces is used.
  • a plurality of line-shaped liquid repellent films 26 may be formed.
  • a plurality of non-coating regions extending in the film substrate transport direction can be formed.
  • the liquid repellent material application roll 22 may be movable in the rotation axis direction. Thereby, the non-application area
  • the film base 80 has a desired length in the width direction and is desired in the width direction of the film base 80. It is possible to form the coating film 84 separated by a distance of. Further, the coating device 140b has a desired length in the transport direction of the film base material 80 and is separated by a desired distance in the transport direction of the film base material 80 according to the timing of displacement of the working roll 42. A coating film 84 can be formed. Therefore, various patterns of coating films can be easily formed using the coating apparatus 140b.
  • the coating device 140c mainly applies a liquid on the film substrate 120a that continuously sends out the film substrate 80 and the film substrate 80 that is sent out by the film carrier 120a.
  • the coating roll 41 which forms the film
  • the coating apparatus 140c may include a tension control unit for keeping the tension of the film base material 80 constant.
  • the operation roll 42 and the coating roll 41 function as a non-coating region forming mechanism.
  • the coating roll 41 particularly has a transport direction non-coated area forming mechanism.
  • the film transport unit 120a, the coating liquid supply member 82, the operation roll 42, and the tension control unit of the coating apparatus 140c are the film transport unit 120a, the coating liquid supply member 82, the operation roll 42, and the tension of the coating apparatus 140a of the first embodiment. It is comprised similarly to a control part.
  • the coating roll 41 applies a liquid to the film substrate 80 to form a coating film 84.
  • a gravure roll having two or more liquid carrying regions 41a having fine irregularities formed on the outer peripheral surface is used.
  • the two or more liquid carrying regions 41 a are regions that are continuous in the circumferential direction of the application roll 41.
  • the coating material supplied from the coating liquid supply member 82 is carried on the liquid carrying area 41 a of the coating roll 41.
  • the area 41b sandwiched between the liquid holding areas 41a in the direction of the rotation axis of the coating roll 41 is subjected to a process for preventing the coating material from being carried.
  • Such a process includes, for example, making the region 41b a flat surface without unevenness, and subjecting the surface of the region 41b to a liquid repellent process.
  • the region 41b can be recessed with respect to the liquid carrying region 41a to form a recess.
  • the coating roll 41 is disposed to face the surface (coating film forming surface) of the film base material 80, and the base material 80 on which the coating material carried on the liquid carrying region 41a is continuously conveyed while the coating roll 41 rotates. , The coating material adheres onto the substrate 80 and the coating 84 is formed.
  • the length and position of the liquid carrying region 41a of the coating roll 41 in the rotation axis direction are appropriately set according to the length and position of the coating film 84 formed on the film substrate 80 in the width direction of the film substrate 80. be able to.
  • the coating 84 Since the coating material is supported on the liquid holding area 41 a of the coating roll 41, the coating 84 is formed with a predetermined film thickness on the area facing the liquid holding area 41 a on the film substrate 80. On the other hand, since no coating material is supported on the liquid non-supporting region 41 b of the coating roll 41, the coating film 84 is not formed in the region facing the liquid non-supporting region 41 a on the film substrate 80. Therefore, the non-application area
  • the operating roll 42 is separated by an actuator or the like (illustrated by a broken line in FIG. 3). Position). Since the base material 80 moving in the transport direction is separated from the coating roll 41 by the movement of the operation roll 42, no coating film is formed on the base material 80, and the non-coating continuous in the width direction of the film base material. A region is formed. By changing the position of the operation roll 42 as described above at a predetermined cycle, a discontinuous coating film 84 can be formed on the film substrate 80 in the transport direction of the film substrate 80.
  • the coating film 84 discontinuous in the transport direction and the width direction of the film base material 80 can be formed on the film base material 80 using the coating apparatus 140c.
  • the coating film 84 on the film substrate 80 has a pattern partitioned by a plurality of areas spaced from each other in the transport direction and the width direction of the film substrate 80.
  • the application roll 41 having two liquid carrying areas 41a and one liquid non-carrying area 41b is used. However, the application roll having three or more liquid carrying areas and two or more liquid non-carrying areas is used. May be used.
  • a plurality of non-coating regions extending in the film substrate transport direction can be formed.
  • the film substrate 80 has a desired length in the width direction and a desired distance in the width direction of the film substrate 80. Separated coatings 84 can be formed.
  • the coating device 140c has a desired length in the transport direction of the film substrate 80 and is separated by a desired distance in the transport direction of the film substrate 80 according to the timing of displacement of the working roll 42.
  • a coating film 84 can be formed. Therefore, various patterns of coating films can be easily formed using the coating apparatus 140c.
  • the coating device 140d mainly applies a liquid on the film transport unit 120a that continuously feeds the film base material 80 and the film base material 80 that is fed by the film transport unit 120a.
  • An application roll 40 that forms the film 84
  • a coating liquid supply member 82 ′ that includes two or more coating liquid supply chambers 82 a that supply the coating liquid to the coating roll 40
  • an operation roll that displaces the conveyance path of the film substrate 80. 42.
  • the coating apparatus 140d may include a tension control unit for keeping the tension of the film base 80 constant.
  • the operation roll 42 and the coating liquid supply member 82 ′ function as a non-coating region forming mechanism.
  • the coating liquid supply member 82 ′ particularly has a transport direction non-application area forming mechanism.
  • the film transport unit 120a, the coating roll 40, the working roll 42, and the tension control unit of the coating device 140d are the same as the film transport unit 120a, the coating roll 40, the working roll 42, and the tension control unit of the coating device 140a of the first embodiment. Configured.
  • the coating liquid supply member 82 ′ includes two or more coating liquid supply chambers 82a in which the coating material is stored, and a part of the coating roll 40 is immersed in the stored coating material.
  • the coating material is supported on the area of the liquid carrying area 40a of the coating roll 40 that is immersed in the coating material, and the area of the coating roll 40 that is not immersed in the coating material is coated with the coating material. Is not supported.
  • the size and installation position of the coating liquid supply chamber 82a in the width direction of the film substrate 80 are appropriately determined according to the length and position of the coating film 84 formed on the film substrate 80 in the width direction of the film substrate 80. Can be set.
  • the film transport unit 120a transport by the film transport unit 120a is started, and the film base 80 is transported from the feed roll to a position facing the coating roll 40 via the transport roll 78 (front surface of the coating roll 40).
  • an actuator roll or the like is used. 42 is moved to a contact position (a position indicated by a solid line in FIG. 4). Due to the movement of the operation roll 42, the substrate 80 comes into contact with the coating roll 40 while moving in the transport direction.
  • the liquid carrying region 40a of the coating roll 40 is a region where the coating material supplied by two or more coating liquid supply chambers 82a is supported, and the coating material is not supplied and no coating material is supported. A region is formed.
  • the coating film material adheres to the area of the film substrate 80 facing the area where the coating film material of the coating roll 40 is carried, and the coating film 84 is formed with a predetermined film thickness.
  • the coating film 84 is not formed in the region of the film base 80 facing the region where the coating material of the coating roll 40 is not carried. Therefore, the non-application area
  • the operating roll 42 is separated by an actuator or the like (illustrated by a broken line in FIG. 4). Position). Due to the movement of the operation roll 42, the base material 80 moving in the transport direction is separated from the coating roll 40, so that no coating film is formed on the base material 80, and no coating is applied in the width direction of the film base material. A region is formed.
  • a discontinuous coating film 84 can be formed on the film substrate 80 in the transport direction of the film substrate 80.
  • the coating film 84 discontinuous in the conveying direction and the width direction of the film base material 80 can be formed on the film base material 80 using the coating apparatus 140d.
  • the coating film 84 on the film substrate 80 has a pattern partitioned by a plurality of areas spaced from each other in the transport direction and the width direction of the film substrate 80.
  • two coating liquid supply chambers 82a are used, but three or more coating liquid supply chambers may be used.
  • a plurality of areas where the coating material is supported are formed on the liquid holding area 40a of the coating roll 40, and the coating material is provided between the areas where each coating material is supported. An unsupported region is formed.
  • a plurality of non-application areas extending in the transport direction of the film substrate can be formed according to the number of areas on the liquid carrying area 40a of the application roll 40 where the coating material is not supported.
  • a plurality of coating rolls each having one coating liquid supply chamber may be used.
  • the coating rolls are arranged at different positions in the transport direction of the film substrate 80, and the coating liquid supply chambers of the coating rolls are arranged at positions separated from each other in the width direction of the film substrate 80.
  • a mechanism that can move the coating liquid supply chambers independently in the axial direction may be provided.
  • the film substrate 80 has a desired length in the width direction and is separated by a desired distance in the width direction of the film substrate 80.
  • the coated film 84 can be formed.
  • the coating device 140d has a desired length in the transport direction of the film base material 80 and is separated by a desired distance in the transport direction of the film base material 80 according to the timing of displacement of the operation roll 42.
  • a coating film 84 can be formed. Therefore, the coating apparatus 140d can be used to easily form various patterns of coating films.
  • [Fifth Embodiment] 5th Embodiment demonstrates the coating device 140e for forming a discontinuous coating film in the longitudinal direction (conveyance direction) of a base material.
  • the coating device 140e mainly applies a liquid onto the film substrate 120a that continuously sends out the film substrate 80 and the film substrate 80 that is sent out by the film carrier 120a.
  • an air knife 44 that displaces the transport path of the film base material 80 by blowing gas onto the surface of the film base material 80 (the surface on which the coating film 84 is formed).
  • the air knife 44 functions as a non-coating region forming mechanism. Below, the detail of the structure of each part is demonstrated.
  • the film transport unit 120a, the coating roll 40, and the coating liquid supply member 82 of the coating apparatus 140e are configured in the same manner as the film transport unit 120a, the coating roll 40, and the coating liquid supply member 82 of the coating apparatus 140a of the first embodiment. The description is omitted.
  • the air knife 44 is provided on the upstream side with respect to the coating roll in the conveyance direction of the film substrate 80, and extends in a direction (width direction) orthogonal to the conveyance direction of the film substrate 80.
  • the air knife 44 is formed with a slit for blowing out high-pressure gas along the extending direction (longitudinal direction of the air knife 44).
  • the air knife 44 blows a high-pressure gas onto the surface of the film substrate 80 (coating surface) so that the wind pressure causes the film substrate 80 to come in contact with the coating roll 40 through the conveyance path of the film substrate 80 ( 5A is a path illustrated by a solid line, hereinafter referred to as “contact path” as appropriate, and is a path where the film substrate 80 is separated from the coating roll 40 (a path illustrated by a broken line in FIG. 5).
  • the film base 80 can be moved out of contact with the coating roll 40 by appropriately moving to a “separation path”.
  • the conveyance path of the film base material 80 follows the contact path.
  • the coating material carried on the coating roll 40 comes into contact with the substrate 80, and the coating material adheres on the substrate 80 to form the coating 84.
  • the conveyance path of the film substrate 80 follows the separation path.
  • the coating material does not adhere to the base material 80 and no coating film is formed. Therefore, the discontinuous coating film 84 can be formed in the conveying direction of the film substrate 80 by switching on / off of the gas blowing from the air knife 44 while conveying the film substrate 80.
  • the coating device 140e may further include a control device for controlling on / off switching of gas blowing from the air knife 44.
  • the distance between the film base material 80 and the coating roll 40 in a state where the transport path of the film base material 80 is separated is within a range of 5 to 50 mm. This distance is adjusted by the slit width and jet gas pressure of the air knife 44, the distance between the contact path of the film substrate 80 and the air knife 44, the distance between the air knife 44 and the coating roll 40, the tension of the film substrate 80, and the like. be able to.
  • air clean dry air
  • an inert gas such as nitrogen
  • air such as clean dry air is preferable.
  • transport by the film transport unit 120a is started, and the film base 80 is transported from the feed roll to a position facing the coating roll 40 via the transport roll 78 (front surface of the coating roll 40).
  • gas is blown out from the air knife 44, and the transport path of the film base 80 is separated. To be a route. Thereby, the non-application area
  • the blowing of gas from the air knife 44 is stopped, and the transport path of the film base material 80 comes into contact.
  • the base material 80 contacts the coating roll 40 while moving in the transport direction, and the coating film 84 is formed on the base material 80 with a predetermined film thickness.
  • the discontinuous coating film 84 can be formed on the film substrate 80 in the transport direction of the film substrate 80 using the coating apparatus 140e.
  • the coating films 84 on the film substrate 80 are separated from each other in the transport direction of the film substrate 80.
  • the coating device 140e has a desired length in the transport direction of the film substrate 80 and a desired distance in the transport direction of the film substrate 80 by changing the timing of start and stop of the gas blowing of the air knife 44. It is possible to easily form the coating film 84 separated by. Since the coating device 140e moves the film substrate with respect to the coating roll using an air knife, a complicated device configuration for keeping the tension of the film substrate constant is unnecessary, and a discontinuous coating film with a simple device configuration. Can be formed.
  • the coating apparatus may further include a suction roll 46 as shown in FIG.
  • the suction roll 46 is provided on the back surface (surface opposite to the coating film forming surface) side of the film substrate 80 so as to face the air knife 44.
  • the suction roll 46 can hold the film substrate 80 on the separation path by sucking the film substrate 80 moved on the separation path by the gas ejected by the air knife 44.
  • the suction roll 46 is a roll capable of generating a suction force from the outer side to the inner side on the outer peripheral surface of the roll. Further, the suction roll 46 may be capable of exhausting from the inner side toward the outer side on the outer peripheral surface of the roll. Since the suction roll normally includes a blower having a suction port and a discharge port, the suction roll and the discharge port can be evacuated to replace each other.
  • the suction roll 46 has, for example, a cylindrical roll body, and a large number of through holes that penetrate the peripheral wall of the roll body are provided on the outer peripheral surface of the roll body. You may provide a through-hole by making the material of the outer peripheral surface of the suction roll 46 into porous bodies, such as a ceramic.
  • the shape of the through hole can be a circle, an ellipse, a diamond, a slit, or the like.
  • the suction roll 46 can suck the gas and the object outside the roll toward the inside of the roll through the through hole, and can discharge the gas inside the roll toward the outside of the roll.
  • the suction and exhaust ON / OFF switching by the suction roll 46 may be performed in synchronization with the ON / OFF switching of the air knife 44 as described later.
  • the coating device 140e ' may include a control device that controls the air knife 44 and the suction roll 46 to operate in synchronization.
  • the gas blowing from the air knife 44 may be stopped.
  • the blowing of gas from the air knife 44 is stopped, and further on the outer peripheral surface of the suction roll 46.
  • the conveyance path of the film substrate 80 is changed to the contact path.
  • the base material 80 contacts the coating roll 40 while moving in the transport direction, whereby the coating film 84 is formed on the base material 80 with a predetermined film thickness.
  • the suction roll 46 may be sucking
  • the suction roll 46 In the coating apparatus 140 e ′ using the suction roll 46, it is only necessary to blow out gas from the air knife 46 when the conveyance path of the film base 80 is changed from the contact path to the separation path, and the suction roll 46 holds the film base 80. During the operation, the gas blowing from the air knife 44 can be stopped. Therefore, it is possible to prevent the film substrate 80 from fluttering due to the flow of gas blown from the air knife 44 while the transport path of the film substrate 80 is at the separation position.
  • the coating device may further include an air knife 48 in addition to the suction roll 46.
  • the air knife 48 is provided in the vicinity of the suction roll 46 so as to blow gas toward the back surface of the film substrate 80.
  • the transport path of the film substrate 80 is changed to a contact path by discharging the gas from the inside to the outside of the suction roll 46, but in the coating apparatus 140e ′′, instead, While the suction roll 46 stops the suction, the air knife 48 blows gas toward the back surface of the film substrate 80, whereby the conveyance path of the film substrate 80 can be changed to the contact path. Therefore, the suction roll 46 used in the coating apparatus 140e ′′ may not be capable of discharging gas from the inner side toward the outer side on the outer peripheral surface of the roll.
  • a coating apparatus 140f for forming a discontinuous coating film in the longitudinal direction (conveying direction) and the width direction of the substrate will be described.
  • the coating device 140f mainly applies a film to the film transport unit 120a that continuously feeds the film base 80, and a film by coating a liquid on the film base 80 fed by the film transport unit 120a.
  • a coating liquid supply member 82 for supplying a coating liquid (coating material) to the coating roll 40, an upstream side of the coating roll 40 in the conveying direction of the film substrate 80, and a film base
  • An air knife 44 that moves a transport path of the film base material 80 by blowing gas onto the surface of the material 80 (surface on which the film 84 is formed), and a film that is positioned upstream of the air knife 44 in the transport direction of the film base material 80
  • a tape-shaped mask applying unit 270 for applying a tape-shaped mask (mask sheet) 11 on the substrate 80, and a coating roll 4 in the conveying direction of the film substrate 80
  • a tape-shaped mask peeling unit 290 for separating the tape-shaped mask 11 on the positioned downstream film substrate 80.
  • the air knife 44, the tape-shaped mask applying unit 270, and the tape-shaped mask peeling unit 290 function as an uncoated region forming mechanism.
  • the tape-shaped mask applying unit 270 and the tape-shaped mask peeling unit 290 particularly serve as a transport direction non-application area forming mechanism.
  • the film transport unit 120a, the coating roll 40, the coating liquid supply member 82, and the air knife 44 of the coating device 140f are the same as the film transport unit 120a, the coating roll 40, the coating liquid supply member 82, and the air knife 44 of the coating device 140e of the fifth embodiment. Since the configuration is the same, the description thereof is omitted. Further, the tape-shaped mask applying unit 270 and the tape-shaped mask peeling unit 290 of the coating device 140f are configured in the same manner as the tape-shaped mask applying unit 270 and the tape-shaped mask peeling unit 290 of the coating device 140a of the first embodiment. The tape-shaped mask applying unit 270 of the coating apparatus 140f shown in FIG.
  • the tape-shaped mask applying unit 270 the tape-shaped mask 11 fed from the tape-shaped mask feeding roll 13 is sandwiched between the film base 80 and the laminating roll 17, so that the film base 80 is placed on the film base 80.
  • a tape-shaped mask 11 is applied along the transport direction.
  • the application position of the tape-shaped mask 11 in the width direction of the film substrate 80 can be appropriately set according to the position of the non-application area continuous in the conveyance direction of the film substrate 80 formed on the film substrate 80.
  • conveyance by the film conveyance unit 120 a is started, and the film base material 80 is sent from the feed roll to the tape-shaped mask applying unit 270 via the conveyance roll 78.
  • the surface of the film base 80 (the surface of the film base 80 is sandwiched between the film base 80 that has been fed from the tape-shaped mask feed roll 13 and the laminating roll 17 ( The tape-shaped mask 11 is overlaid at a predetermined position on the coating film forming surface.
  • the film base material 80 on which the tape-shaped mask 11 is superimposed is conveyed to a position facing the coating roll 40 (front surface of the coating roll 40).
  • gas is blown out from the air knife 44, and the film base 80 and the tape-shaped mask 11. Is separated from the coating roll 40, that is, the conveyance path of the film substrate 80 is a separation path.
  • region which followed the width direction of the film base material on the film base material 80 and the tape-shaped mask 11 is formed.
  • the blowing of gas from the air knife 44 is stopped, and the film base 80 and the tape-shaped mask 11. Is in contact with the coating roll 40, that is, the transport path of the film substrate 80 is a contact path. Thereby, the base material 80 and the tape-shaped mask 11 come into contact with the coating roll 40 while moving in the transport direction, and the coating film 84 is formed with a predetermined film thickness on the base material 80 and the tape-shaped mask 11.
  • the tape-shaped mask 11 When the tape-shaped mask 11 is formed of a material that repels the coating film material or when the surface of the tape-shaped mask 11 is subjected to a liquid repellent treatment, no coating film is formed on the tape-shaped mask 11.
  • a discontinuous coating film 84 is formed on the film substrate 80 and the tape-shaped mask 11 in the transport direction of the film substrate 80. Can do.
  • the film base material 80 and the tape-shaped mask 11 are conveyed to the tape-shaped mask peeling part 290.
  • the tape-shaped mask 11 is transported in a direction away from the film substrate 80, and the tape-shaped mask 11. Is peeled off from the film substrate 80.
  • the peeled tape-shaped mask 11 is wound up by a tape-shaped mask winding roll 15. Since the coating film formed on the tape-shaped mask 11 together with the tape-shaped mask 11 is also peeled off from the film base material 80, the coating film is not formed in the region where the tape-shaped mask 11 of the film base material 80 is overlapped. It becomes a non-application area.
  • region continuous in the conveyance direction of the film base material 80 is formed, and the discontinuous coating film 84 can be formed in the width direction of the film base material 80.
  • the tape-shaped mask 11 shown in FIG. 6 has a linear shape, the tape-shaped mask 11 may have a curved shape or a polygonal shape, and a film base material according to the shape of the tape-shaped mask 11.
  • region continuous in the conveyance direction of 80 is formed.
  • the coating film 84 discontinuous in the conveying direction and the width direction of the film base material 80 can be formed on the film base material 80 using the coating apparatus 140f.
  • the coating film 84 on the film base material 80 has a plurality of areas (patterns having a concavo-convex pattern forming region) that are separated from each other in the transport direction and the width direction of the film base material 80.
  • the shape of the region can be an arbitrary shape such as a rectangle, a circle, or a polygon.
  • belt-shaped tape-shaped mask 11 was used, you may use two or more strip
  • a plurality of non-application areas extending in the transport direction of the film substrate can be formed.
  • the film base 80 has a desired length in the width direction and is separated by a desired distance in the width direction of the film base 80.
  • a coated film 84 can be formed.
  • the coating device 140f has a desired length in the transport direction of the film base material 80 and a desired length in the transport direction of the film base material 80 according to the start and stop timing of the gas blowing of the air knife 44.
  • a coating 84 can be formed that is separated by a distance. Therefore, the coating apparatus 140f can be used to easily form various patterns of coating films.
  • FIG. 7th Embodiment demonstrates the coating device 140g for forming a discontinuous coating film in the longitudinal direction (conveyance direction) and width direction of a base material.
  • the coating device 140g mainly applies a liquid onto the film transport unit 120a that continuously feeds the film base material 80 and the film base material 80 that is sent out by the film transport unit 120a.
  • a liquid repellent material application unit 310 for applying a liquid repellent material on the material 80.
  • the air knife 44 and the liquid repellent material application unit 310 function as a non-application region forming mechanism.
  • the liquid repellent material application unit 310 particularly serves as a non-application region forming mechanism in the transport direction.
  • the film transport unit 120a, the coating roll 40, the coating liquid supply member 82, and the air knife 44 of the coating apparatus 140g are the same as the film transport unit 120a, the coating roll 40, the coating liquid supply member 82, and the air knife 44 of the coating apparatus 140e of the fifth embodiment. Since the configuration is the same, the description thereof is omitted. Further, since the liquid repellent material application unit 310 of the application device 140g is configured in the same manner as the liquid repellent material application unit 310 of the application device 140b of the second embodiment, the description thereof is also omitted.
  • conveyance by the film conveyance unit 120 a is started, and the film base material 80 is sent from the feed roll to the liquid repellent material application unit 310 via the conveyance roll 78.
  • the application surface carrying the liquid repellent material is brought into contact with a predetermined position of the film substrate 80 while rotating the liquid repellent material application roll 22.
  • the liquid repellent film 26 continuous in the transport direction of the film substrate 80 is formed at a predetermined position on the surface (coating film forming surface) of the film substrate 80.
  • the film substrate 80 on which the liquid repellent film 26 is formed is conveyed to a position facing the coating roll 40 (front surface of the coating roll 40).
  • the film substrate 80 on which the liquid repellent film 26 is formed is conveyed to a position facing the coating roll 40 (front surface of the coating roll 40).
  • gas is blown out from the air knife 44 so that the film substrate 80 is separated from the coating roll 40, that is, the conveyance path of the film substrate 80 is a separation path.
  • region continuous in the width direction of the film base material is formed.
  • the blowing of gas from the air knife 44 is stopped, and the film base material 80 is brought into contact with the coating roll 40. It is made to contact, ie, the conveyance path of the film base material 80 becomes a contact path. Thereby, the base material 80 contacts the coating roll 40 while moving in the transport direction, and the coating film 84 is formed on the base material 80 with a predetermined film thickness. At this time, in the region where the liquid repellent film 26 is formed on the film substrate 80, the film material is repelled, so that no film is formed.
  • region continuous in the conveyance direction of the film base material 80 is formed according to the area
  • a discontinuous coating film 84 can be formed on the film base 80 in the transport direction of the film base 80.
  • the coating film 84 that is discontinuous in the conveying direction and the width direction of the film base material 80 can be formed on the film base material 80 using the coating apparatus 140g.
  • the coating film 84 on the film substrate 80 has a pattern partitioned by a plurality of areas spaced from each other in the transport direction and the width direction of the film substrate 80.
  • one line-shaped liquid repellent film 26 is formed by using the liquid repellent material application roll 22 having one application surface.
  • a plurality of liquid repellent films 26 are formed.
  • a plurality of line-shaped liquid repellent films 26 may be formed using a liquid repellent material application roll having a coating surface.
  • a plurality of non-coating regions extending in the film substrate transport direction can be formed.
  • the liquid repellent material application roll 22 may be movable in the rotation axis direction. Thereby, the non-application area
  • the film base 80 has a desired length in the width direction and is desired in the width direction of the film base 80. It is possible to form the coating film 84 separated by a distance of. Further, the coating device 140g has a desired length in the transport direction of the film base 80 and a desired length in the transport direction of the film base 80 according to the start and stop timing of the gas blowing of the air knife 44. A coating 84 can be formed that is separated by a distance. Therefore, it is possible to easily form coating films having various patterns using the coating apparatus 140g.
  • the coating device 140 h mainly forms a film by applying a liquid onto the film transporting unit 120 a that continuously feeds the film base 80 and the film base 80 sent out by the film transporting unit 120 a.
  • the coating device 140 h mainly forms a film by applying a liquid onto the film transporting unit 120 a that continuously feeds the film base 80 and the film base 80 sent out by the film transporting unit 120 a.
  • an application roll 41 that forms a coating 84
  • a coating liquid supply member 82 that supplies a coating liquid to the application roll 41, and an upstream side of the application roll 40 in the transport direction of the film base 80.
  • the operation roll 42 and the coating roll 41 function as a non-coating region forming mechanism.
  • the coating roll 41 particularly has a transport direction non-coated area forming mechanism.
  • the film transport unit 120a, the coating liquid supply member 82, and the air knife 44 of the coating device 140h are configured in the same manner as the film transport unit 120a, the coating liquid supply member 82, and the air knife 44 of the coating device 140e of the fifth embodiment. Description is omitted. Moreover, since the coating roll 41 of the coating device 140h is comprised similarly to the coating roll 41 of the coating device 140c of 3rd Embodiment, the description is also abbreviate
  • the blowing of gas from the air knife 44 is stopped, and the film base 80 is connected to the coating roll 41. It is made to contact, ie, the conveyance path of the film base material 80 becomes a contact path. Since the coating material is supported on the liquid holding area 41 a of the coating roll 41, the coating 84 is formed with a predetermined film thickness on the area facing the liquid holding area 41 a on the film substrate 80. On the other hand, since no coating material is supported on the liquid non-supporting region 41 b of the coating roll 41, the coating film 84 is not formed in the region facing the liquid non-supporting region 41 a on the film substrate 80.
  • region continuous in the conveyance direction of the film base material 80 is formed, and the discontinuous coating film 84 can be formed in the width direction of the film base material 80.
  • a discontinuous coating film 84 can be formed on the film base 80 in the transport direction of the film base 80.
  • the coating film 84 discontinuous in the conveying direction and the width direction of the film base material 80 can be formed on the film base material 80 using the coating apparatus 140h.
  • the coating film 84 on the film substrate 80 has a pattern partitioned by a plurality of areas spaced from each other in the transport direction and the width direction of the film substrate 80.
  • the application roll 41 having two liquid carrying areas 41a and one liquid non-carrying area 41b is used.
  • three or more liquid carrying areas and A coating roll having two or more liquid non-carrying regions may be used.
  • a plurality of non-coating regions extending in the film substrate transport direction can be formed.
  • the film substrate 80 has a desired length in the width direction and a desired distance in the width direction of the film substrate 80. Separated coatings 84 can be formed.
  • the coating device 140h has a desired length in the transport direction of the film base material 80 and a desired length in the transport direction of the film base material 80 in accordance with the start and stop timing of the gas blowing of the air knife 44.
  • a coating 84 can be formed that is separated by a distance. Therefore, it is possible to easily form coating films having various patterns using the coating apparatus 140h.
  • the coating apparatus 140 i mainly applies a film to the film transport unit 120 a that continuously feeds the film base 80, and applies a liquid onto the film base 80 that is fed by the film transport unit 120 a. 84, a coating liquid supply member 82 ′ for supplying a coating liquid to the coating roll 40, and an upstream side of the coating roll 40 in the conveying direction of the film base 80. And an air knife 44 for displacing the transport path of the film substrate 80 by blowing gas onto the surface (the surface on which the film 84 is formed).
  • the air knife 44 and the coating liquid supply member 82 ′ function as a non-coated area forming mechanism.
  • the coating liquid supply member 82 ′ particularly has a transport direction non-application area forming mechanism.
  • the film transport unit 120a, the coating roll 40, and the air knife 44 of the coating device 140i of the ninth embodiment are configured in the same manner as the film transport unit 120a, the coating roll 40, and the air knife 44 of the coating device 140e of the fifth embodiment. Therefore, the description is omitted. Further, the coating liquid supply member 82 'of the coating apparatus 140i is configured in the same manner as the coating liquid supply member 82' of the coating apparatus 140d of the fourth embodiment, and thus the description thereof is also omitted.
  • the liquid carrying region 40a of the coating roll 40 is a region where the coating material supplied by two or more coating liquid supply chambers 82a is supported, and the coating material is not supplied and no coating material is supported. A region is formed.
  • the coating film material adheres to the area of the film substrate 80 facing the area where the coating film material of the coating roll 40 is carried, and the coating film 84 is formed with a predetermined film thickness.
  • the coating film 84 is not formed in the region of the film base 80 facing the region where the coating material of the coating roll 40 is not carried. Therefore, the non-application area
  • a discontinuous coating film 84 can be formed on the film base 80 in the transport direction of the film base 80.
  • the coating film 84 discontinuous in the conveying direction and the width direction of the film base material 80 can be formed on the film base material 80 using the coating apparatus 140i.
  • the coating film 84 on the film substrate 80 has a pattern partitioned by a plurality of areas spaced from each other in the transport direction and the width direction of the film substrate 80.
  • two coating liquid supply chambers 82a are used.
  • three or more coating liquid supply chambers may be used as in the coating apparatus 140d of the fourth embodiment.
  • a plurality of areas where the coating material is supported are formed on the liquid holding area 40a of the coating roll 40, and the coating material is provided between the areas where each coating material is supported. An unsupported region is formed.
  • a plurality of non-application areas extending in the transport direction of the film substrate can be formed according to the number of areas on the liquid carrying area 40a of the application roll 40 where the coating material is not supported.
  • a plurality of coating rolls each having one coating liquid supply chamber may be used.
  • the coating rolls are arranged at different positions in the transport direction of the film substrate 80, and the coating liquid supply chambers of the coating rolls are arranged at positions separated from each other in the width direction of the film substrate 80. Further, the coating liquid supply chambers may be moved independently in the axial direction. Depending on the distance between the coating liquid supply chambers, the width and position of each chamber, etc., the film substrate 80 has a desired length in the width direction and is separated by a desired distance in the width direction of the film substrate 80.
  • the coated film 84 can be formed.
  • the coating device 140i has a desired length in the transport direction of the film base material 80 and a desired length in the transport direction of the film base material 80 according to the start and stop timing of the gas blowing of the air knife 44. A coating 84 can be formed that is separated by a distance. Therefore, it is possible to easily form coating films having various patterns using the coating apparatus 140i.
  • the coating device 140j mainly applies a liquid onto the film transport unit 120a that continuously feeds the film base 80 and the film base 80 fed by the film transport unit 120a.
  • the pattern mask applying unit 170 and the pattern mask peeling unit 190 function as an uncoated region forming mechanism. Below, the detail of the structure of each part is demonstrated.
  • the coating roll 40 Since the film transport unit 120a, the coating roll 40, and the coating liquid supply member 82 of the coating apparatus 140j are configured similarly to the film transport unit 120a, the coating roll 40, and the coating liquid supply member 82 of the coating apparatus 140a of the first embodiment. The description is omitted.
  • the coating roll 40 is arrange
  • the pattern mask 50 a belt-like or long sheet having a shape corresponding to the shape of the non-application area in the pattern of the coating film formed on the film substrate 80 is used.
  • the coating film 84 formed on the film substrate 80 is divided into a plurality of areas separated by a lattice-like non-application area (uneven pattern formation). Region).
  • the plurality of separated areas refers to a plurality of isolated regions, and the shape of the regions is not limited.
  • the size of the pattern mask 50 may be set as appropriate.
  • the pattern mask 50 may have the same width and length as the film base material 80 because the pattern mask 50 is conveyed and continuously processed together with the film base material 80. By doing so, it becomes easy to manage the alignment of the film base 80 and the pattern mask 50 in the width direction.
  • the width of the pattern mask 50 may be appropriately set depending on the required product form, and the width of the pattern mask 50 may be smaller or larger than the film substrate 80 depending on the application. If the pattern mask 50 has a function of masking the liquid carrying area 40a of the coating roll 40, the width of the pattern mask 50 is desirably larger than the width of the liquid carrying area 40a, but may be small depending on the coating film pattern to be formed. (For example, when masking only the center of the liquid carrying region 40a in the width direction).
  • the same film as the film substrate 80 can be used.
  • the surface of the pattern mask 50 may be subjected to a liquid repellent treatment with fluororesin, silicone, or the like so that the surface of the pattern mask 50 (the surface opposite to the surface in contact with the film substrate 80) repels the coating material. .
  • the pattern mask 50 repel the coating material, the amount of coating material used can be suppressed.
  • the back surface of the pattern mask 50 may have adhesiveness so that the position of the pattern mask 50 is fixed on the film substrate 80.
  • the thickness of the pattern mask 50 can be, for example, 5 ⁇ m to 1000 ⁇ m. However, from the viewpoint of handling properties, it is easy to tear when it is too thin, and when it is too thick, it is difficult to wind it with a winding roll. On the other hand, there is an advantage that the thickness of the pattern mask can be appropriately selected according to the film thickness of the coating film in the thickness range of 5 ⁇ m to 1000 ⁇ m, thereby making it possible to easily control the film thickness of the coating film. .
  • the pattern mask 50 is fed from the pattern mask feed roll 51 and taken up by the pattern mask take-up roll 52.
  • the pattern mask 50 may have various patterns (blank regions) depending on the shape (pattern) of the coating film formed on the film substrate 80.
  • a pattern (blank area) divided in the pattern mask transport direction the direction indicated by the arrow in FIGS. 25A and 25B.
  • Pattern masks 50 and 50 ′ having 50p and 50p ′ can be used.
  • “a pattern mask having a pattern divided in the conveyance direction” means only a pattern mask having a pattern divided in a direction perpendicular to the conveyance direction as shown in FIGS. 25 (a) and 25 (b).
  • a plurality of formed pattern masks are also included.
  • a pattern mask 50 ′′ having a pattern 50p ′′ that is continuous in the pattern mask transport direction (the direction indicated by the arrow in FIG. 25C) is used. Also good.
  • a pattern mask having a continuous pattern in the transport direction means that a pattern (blank region) and a mask region extend in a direction parallel to the transport direction as shown in FIG.
  • Pattern masks such as these pattern masks 50, 50 ′, 50 ′′ can be formed, for example, by cutting a strip-shaped sheet.
  • a pattern mask is a conveyance direction so that the area
  • a mask region extending in a direction parallel to the mask region may be provided.
  • the film thickness and the like of the coating film to be formed may be nonuniform in the region in contact with the end of the liquid carrying region 40a of the coating roll 40 of the film base 80.
  • the pattern mask applying unit 170 is a pattern mask feeding roll 51 and a pair of rolls that are positioned upstream of the coating roll 40 in the transport direction of the film base material and rotate opposite to each other, that is, a bonding roll 54 and And a support roll 55.
  • the pattern mask 50 fed out from the pattern mask feeding roll 51 is overlaid on the film base material 80 and sandwiched between the laminating roll 54 and the support roll 55, whereby a film is formed on the film base material 80.
  • a pattern mask 50 is applied along the conveyance direction of the substrate 80.
  • the pattern mask peeling unit 190 is composed of a pair of rolls that are positioned on the downstream side in the transport direction of the film base with respect to the coating roll 40 and rotate opposite to each other, that is, the peeling roll 56 and the support roll 57.
  • the pattern mask 50 that has passed between the peeling roll 56 and the support roll 57 while being superimposed on the film base material 80 is conveyed in a direction away from the film base material 80, thereby The mask 50 is peeled from the film substrate 80.
  • the peeled pattern mask 50 can be taken up by a pattern mask take-up roll 52 provided at a position deviated from the conveyance path of the film substrate 80.
  • the film substrate 80 is sent from the feeding roll to the pattern mask applying unit 170.
  • the pattern mask applying unit 170 the pattern mask 50 fed from the pattern mask feeding roll 51 is sandwiched together with the film base 80 by the bonding roll 54 and the support roll 55, whereby the surface of the film base 80 (coating film forming surface). )
  • the pattern mask 50 is overlaid at a predetermined position on the top.
  • the film base material 80 on which the pattern mask 50 is superimposed is conveyed to a position facing the coating roll 40 (front surface of the coating roll 40).
  • the film base material 80 on which the pattern mask 50 is superimposed comes into contact with the coating roll 40 while moving in the transport direction, and a coating film 84 is formed on the base material 80 and the pattern mask 50 with a predetermined film thickness. Note that when the pattern mask 50 is formed of a material that repels the coating material or when the surface of the pattern mask 50 is subjected to a liquid repellent treatment, no coating film is formed on the pattern mask 50.
  • the film substrate 80 is then conveyed to the pattern mask peeling unit 190.
  • the pattern mask 50 is conveyed in a direction away from the film substrate 80, and the pattern mask 50 is moved to the film base. Peel from material 80.
  • the peeled pattern mask 50 is taken up by a mask take-up roll 52. Since the coating film formed on the pattern mask 50 together with the pattern mask 50 is also peeled off from the film base material 80, the area overlapped with the pattern mask 50 of the film base material 80 is an uncoated area where no coating film is formed.
  • the coating film 84 is formed only in the region on the film substrate 80 that did not overlap the pattern mask 50. In this way, the coating film 84 having a desired pattern can be formed on the film substrate 80.
  • the coating apparatus 140j can easily form the coating film 84 having a desired pattern by changing the shape of the pattern mask 50 to be used.
  • the film substrate 80 is applied by using the pattern masks 50 and 50 ′ having the patterns 50p and 50p ′ divided in the direction orthogonal to the transport direction as shown in FIGS. 25 (a) and 25 (b).
  • a coating film having an intermittent (discontinuous) pattern in the conveying direction of the film substrate 80 can be formed while being in contact with the roll 40.
  • the film substrate 80 is separated from the coating roll 40 or Although it is necessary to move the conveyance path of the film base so as to come into contact, this is not necessary in the coating apparatus 140j of this embodiment. Therefore, the coating device 140j does not require a complicated device configuration for controlling fluctuations in the tension of the film base material accompanying the movement of the transport path of the film base material. Further, by using the pattern masks 50 and 50 ′ having the pattern mask 50p ′′ having a continuous pattern in the transport direction as shown in FIG. A coating having a (discontinuous) pattern can be formed.
  • Patent Document 1 In order to form an intermittent coating film pattern in the width direction of such a film substrate, the method described in Patent Document 1 uses a coating roll in which grooves are formed on the outer peripheral surface along the circumferential direction. Although necessary, it is not necessary in the coating apparatus 140j of the present embodiment. Therefore, by using the coating apparatus 140j, it is possible to easily form a coating film having a desired discontinuous pattern with a simple apparatus configuration.
  • the coating device 140k mainly applies a film to the film transport unit 120a that continuously feeds the film base 80, and a film by coating a liquid on the film base 80 fed by the film transport unit 120a.
  • a coating liquid supply member 82 for supplying a coating liquid (coating material) to the coating roll 40, an upstream side of the coating roll 40 in the conveying direction of the film substrate 80, and a film base
  • a pattern mask applying unit 170 for applying a pattern mask 50 ′ on the material 80, and a pattern mask for peeling the pattern mask 50 ′ on the film base 80 located on the downstream side of the coating roll 40 in the transport direction of the film base 80.
  • the tape-shaped mask 11 is located on the film base 80 and located on the upstream side of the coating roll 40 in the transporting direction of the peeling unit 190 and the film base 80.
  • the coating apparatus 140k Comprises a tape-shaped mask applying unit 270 that applies, the tape-shaped mask peeling unit 290 for separating the tape-shaped mask 11 on positioned on the downstream side the film substrate 80 of the applicator roll 40 in the transport direction of the film substrate 80.
  • the pattern mask applying unit 170, the pattern mask peeling unit 190, the tape-shaped mask applying unit 270, and the tape-shaped mask peeling unit 290 function as a non-application area forming mechanism.
  • the tape-shaped mask applying unit 270 and the tape-shaped mask peeling unit 290 particularly serve as a transport direction non-application area forming mechanism.
  • the film transport unit 120a, the coating roll 40, the coating liquid supply member 82, the pattern mask applying unit 170, and the pattern mask peeling unit 190 of the coating device 140k are the film transport unit 120a, the coating roll 40, and the coating device 140j of the tenth embodiment. Since it is comprised similarly to the coating liquid supply member 82, the pattern mask provision part 170, and the pattern mask peeling part 190, the description is abbreviate
  • the tape-shaped mask applying unit 270 and the tape-shaped mask peeling unit 290 of the coating device 140k are configured similarly to the tape-shaped mask applying unit 270 and the tape-shaped mask peeling unit 290 of the coating device 140a of the first embodiment. The description is also omitted.
  • the pattern mask applying unit 170 sandwiches the pattern mask 50 ′ fed out from the pattern mask feeding roll 51 together with the film base 80 with the bonding roll 54 and the support roll 55, thereby forming the surface of the film base 80 (coating film formation).
  • the pattern mask 50 ' is overlaid at a predetermined position on the surface).
  • the film substrate 80 on which the pattern mask 50 ′ is superimposed is conveyed to the tape-shaped mask applying unit 270.
  • the tape-shaped mask applying unit 270 the tape-shaped mask 11 fed from the tape-shaped mask feeding roll 13 is sandwiched with the film base 80 by the bonding roll 17 and the support roll 18. Thereby, the tape-shaped mask 11 is further superimposed at a predetermined position on the film substrate 80 on which the pattern mask 50 'is superimposed.
  • the film substrate 80 on which the pattern mask 50 ′ and the tape-shaped mask 11 are overlapped is conveyed to a position facing the application roll 40 (front surface of the application roll 40).
  • the film base material 80 on which the pattern mask 50 ′ and the tape-shaped mask 11 are superimposed comes into contact with the coating roll 40 while moving in the transport direction, and a coating film is formed on the base material 80, the pattern mask 50 ′, and the tape-shaped mask 11. 84 is formed with a predetermined film thickness.
  • the pattern mask 50 'and / or the tape-shaped mask 11 is formed of a material that repels the coating material, or the surface of the pattern mask 50' and / or the tape-shaped mask 11 is subjected to a liquid repellent treatment. In that case, no coating film is formed on the pattern mask 50 ′ and / or the tape-shaped mask 11.
  • the film substrate 80 is then conveyed to the tape-shaped mask peeling part 290.
  • the tape-shaped mask 11 is conveyed in a direction away from the film substrate 80.
  • the tape-shaped mask 11 is peeled from the film substrate 80.
  • the peeled tape-shaped mask 11 is wound up by a tape-shaped mask winding roll 15. Since the coating film formed on the tape-shaped mask 11 together with the tape-shaped mask 11 is also peeled off from the film base material 80, the region overlapped with the tape-shaped mask 11 of the film base material 80 and the pattern mask 50 ′ is the coating film. Is not formed, and a coating film is formed only in a region that is not overlapped with the tape-shaped mask 11. Thus, a non-application area
  • the film substrate 80 and the pattern mask 50 ′ from which the tape-shaped mask 11 has been peeled are then conveyed to the pattern mask peeling unit 190.
  • the pattern mask 50 ′ is conveyed in a direction away from the film substrate 80, and the pattern mask 50 ′. Is peeled off from the film substrate 80.
  • the peeled pattern mask 50 ′ is wound up by a mask winding roll 52. Since the coating film formed on the pattern mask 50 ′ together with the pattern mask 50 ′ is also peeled off from the film base material 80, the coating film is not formed in the region overlapped with the pattern mask 50 ′ of the film base material 80.
  • the coating film 84 is formed only in a region that is a non-application region and does not overlap the pattern mask 50 ′ on the film substrate 80.
  • an uncoated region was formed in the region of the film substrate 80 that was overlapped with the tape-shaped mask 11 or the pattern mask 50 ′, and did not overlap either the tape-shaped mask 11 or the pattern mask 50 ′.
  • a coating 84 is formed in the region. In this way, the coating film 84 having a desired pattern can be formed on the film substrate 80.
  • the coating device 140k can easily form the coating film 84 having a desired pattern by changing the shape of the pattern mask 50 'to be used. Moreover, the coating apparatus 140k uses the pattern mask 50 ′ having a pattern divided in a direction orthogonal to the transport direction, so that the film base 80 is kept in contact with the coating roll 40 in the transport direction of the film base 80.
  • the coating film 84 having an intermittent (discontinuous) pattern can be formed. In order to form an intermittent coating film pattern in the longitudinal direction (conveying direction) of such a film substrate, in the method described in Patent Document 1, the film substrate 80 is separated from the coating roll 40 or Although it is necessary to move the conveyance path of a film base so that it may contact, in coating device 140k of this embodiment, it is not necessary.
  • tensile_strength of the film base material accompanying the movement of the conveyance path of a film base material is unnecessary. Therefore, the coating apparatus 140k can easily form a coating film having a desired discontinuous pattern while having a simple apparatus configuration.
  • the number, position, and width of the non-application areas that are continuous in the transport direction on the film substrate 80 are changed by changing the number of tape-shaped masks 11 to be used, the width, and the position of the film substrate 80 in the width direction. can do. Therefore, for example, when forming a coating film having a pattern in which the number, position, or width of non-application areas continuous in the conveyance direction are different for each of a plurality of film bases, the number of tape-shaped masks used is changed. Coating film with a desired pattern on each film substrate by using tape masks with different widths, or by adjusting the position of the tape mask in the width direction of the film substrate 80 as appropriate. It becomes possible to do.
  • each pattern mask 50 ' having a shape corresponding to the shape of the non-application area of each coating film pattern, and the coating film pattern can be changed only by changing the tape-like mask. Therefore, a coating film having various patterns can be more easily formed by using the coating apparatus 140k of this embodiment.
  • the tape-shaped mask 11 shown in FIG. 11 has a linear shape
  • the tape-shaped mask 11 may have a curved line shape or a polygonal line shape.
  • region continuous in the conveyance direction of 80 is formed.
  • the pattern mask applying unit 170, the tape-shaped mask applying unit 270, the tape-shaped mask peeling unit 290, and the pattern mask peeling unit 190 are formed in this order from the upstream side in the conveyance direction of the film substrate 80.
  • the order of the pattern mask applying unit 170 and the tape-shaped mask applying unit 270 and the order of the tape-shaped mask peeling unit 290 and the pattern mask peeling unit 190 may be reversed.
  • the coating apparatus 140m for forming a discontinuous pattern coating film on a substrate will be described.
  • the coating apparatus 140m mainly applies a film to the film transport unit 120a that continuously feeds the film base material 80, and a film by coating a liquid on the film base material 80 fed by the film transport unit 120a.
  • a coating liquid supply member 82 for supplying a coating liquid to the coating roll 40, and a pattern on the film substrate 80, located on the upstream side of the coating roll 40 in the conveying direction of the film substrate 80.
  • the pattern mask applying unit 170, the pattern mask peeling unit 190, and the liquid repellent material coating unit 310 function as a non-coated region forming mechanism.
  • the liquid repellent material application unit 310 particularly serves as a non-application region forming mechanism in the transport direction.
  • the film transport unit 120a, the coating roll 40, the coating liquid supply member 82, the pattern mask applying unit 170, and the pattern mask peeling unit 190 of the coating device 140m are the film transport unit 120a, the coating roll 40, and the coating device 140j of the tenth embodiment. Since it is comprised similarly to the coating liquid supply member 82, the pattern mask provision part 170, and the pattern mask peeling part 190, the description is abbreviate
  • the pattern mask applying unit 170 sandwiches the pattern mask 50 ′ fed out from the pattern mask feeding roll 51 together with the film base 80 with the bonding roll 54 and the support roll 55, thereby forming the surface of the film base 80 (coating film formation).
  • the pattern mask 50 ' is overlaid at a predetermined position on the surface).
  • the film substrate 80 on which the pattern mask 50 ′ is superimposed is sent to the liquid repellent material application unit 310.
  • the application surface carrying the liquid repellent material is brought into contact with predetermined positions of the film substrate 80 and the pattern mask 50 'while rotating the liquid repellent material application roll 22.
  • the liquid repellent film 26 continuous in the transport direction of the film substrate 80 is formed at predetermined positions on the film substrate 80 and the pattern mask 50 ′.
  • the film substrate 80 on which the liquid repellent film 26 is formed is conveyed to a position facing the coating roll 40 (front surface of the coating roll 40).
  • the film substrate 80 contacts the coating roll 40 while moving in the transport direction, and the coating film 84 is formed with a predetermined film thickness on the substrate 80 and the pattern mask 50 ′.
  • the film material is repelled, so the film is not formed, and the region where the liquid repellent film 26 is not formed is formed. Only a coating film is formed.
  • a non-application region that is continuous in the transport direction of the film substrate 80 is formed according to the region where the liquid repellent film 26 is formed.
  • the pattern mask 50 ′ is formed of a material that repels the coating material, or if the surface of the pattern mask 50 ′ is subjected to a liquid repellent treatment, a coating film is formed on the pattern mask 50 ′.
  • the film substrate 80 is then conveyed to the pattern mask peeling unit 190.
  • the pattern mask 50 ′ is conveyed in a direction away from the film substrate 80, and the pattern mask 50 ′. Is peeled off from the film substrate 80.
  • the peeled pattern mask 50 ′ is wound up by a mask winding roll 52. Since the coating film formed on the pattern mask 50 ′ together with the pattern mask 50 ′ is also peeled off from the film base material 80, the coating film is not formed in the region overlapped with the pattern mask 50 ′ of the film base material 80.
  • the coating film 84 is formed only in a region that is a non-application region and does not overlap the pattern mask 50 ′ on the film substrate 80.
  • a non-application region is formed in the region where the pattern mask 50 ′ of the film base material 80 is overlapped and the region where the liquid repellent film 26 is formed, and does not overlap the pattern mask 50 ′.
  • the coating film 84 is formed only in the region where the film 26 is not formed. In this way, the coating film 84 having a desired pattern can be formed on the film substrate 80.
  • the coating device 140m can easily form the coating film 84 having a desired pattern by changing the shape of the pattern mask 50 'to be used. Moreover, the coating apparatus 140c uses the pattern mask 50 ′ having a pattern divided in a direction orthogonal to the transport direction, so that the film base 80 is kept in contact with the coating roll 40 in the transport direction of the film base 80.
  • the coating film 84 having an intermittent (discontinuous) pattern can be formed. In order to form an intermittent coating film pattern in the longitudinal direction (conveying direction) of such a film substrate, in the method described in Patent Document 1, the film substrate 80 is separated from the coating roll 40 or Although it is necessary to move the conveyance path of a film base so that it may contact, in the coating device 140m of this embodiment, it is not necessary.
  • tensile_strength of the film base material accompanying the movement of the conveyance path of a film base material is unnecessary. Therefore, the coating apparatus 140m can easily form a coating film having a desired discontinuous pattern while having a simple apparatus configuration.
  • the number, position, and width of the non-application areas that are continuous in the transport direction on the film substrate 80 are changed by changing the number, width, and position of the rotation axis direction of the application surface of the liquid repellent material application roll 22 to be used. Can be changed. Therefore, for example, when forming a coating film having a pattern in which the number, position, or width of the non-application areas continuous in the transport direction are different from each other on each of the plurality of film base materials, By changing the number of application surfaces, using a liquid repellent material application roll 22 having application surfaces with different widths, or moving the liquid repellent material application roll 22 appropriately in the direction of the rotation axis, each film substrate It is possible to form a coating film having a desired pattern thereon.
  • each pattern mask 50 ' having a shape corresponding to the shape of the non-application area of each coating film pattern, and the coating film pattern can be changed only by changing the liquid repellent material application roll. . Therefore, a coating film having various patterns can be more easily formed by using the coating apparatus 140m of this embodiment.
  • the coating apparatus 140n for forming a discontinuous pattern coating film on a substrate will be described. As shown in FIG. 13, the coating apparatus 140n mainly applies a liquid onto the film transport unit 120a that continuously feeds the film base material 80 and the film base material 80 that is sent out by the film transport unit 120a. 84, a coating liquid supply member 82 that supplies a coating liquid to the coating roll 41, and a pattern on the film base 80 that is positioned upstream of the coating roll 41 in the transport direction of the film base 80.
  • the pattern mask applying unit 170, the pattern mask peeling unit 190, and the coating roll 41 function as a non-coated region forming mechanism.
  • the coating roll 41 particularly has a transport direction non-coated area forming mechanism.
  • the film transport unit 120a, the coating liquid supply member 82, the pattern mask applying unit 170, and the pattern mask peeling unit 190 of the coating apparatus 140n are the film transport unit 120a, the coating liquid supply member 82, and the pattern mask of the coating apparatus 140j of the tenth embodiment. Since the configuration is the same as that of the applying unit 170 and the pattern mask peeling unit 190, description thereof is omitted. Moreover, since the application roll 41 of the application apparatus 140n is comprised similarly to the application roll 41 of the application apparatus 140c of 3rd Embodiment, the description is also abbreviate
  • the pattern mask applying unit 170 sandwiches the pattern mask 50 ′ fed out from the pattern mask feeding roll 51 together with the film base 80 with the bonding roll 54 and the support roll 55, thereby forming the surface of the film base 80 (coating film formation).
  • the pattern mask 50 ' is overlaid at a predetermined position on the surface).
  • the film base material 80 on which the pattern mask 50 ′ is superimposed is conveyed to a position facing the application roll 41 (front surface of the application roll 41). Since the coating material is supported on the liquid supporting area 41a of the coating roll 41, the coating film 84 has a predetermined film thickness in the area facing the liquid supporting area 41a on the film base 80 and the pattern mask 50 ′. Formed with. On the other hand, since no coating material is carried on the liquid non-carrying region 41b of the coating roll 41, the coating 84 is formed in the region facing the liquid non-carrying region 41b on the film substrate 80 and the pattern mask 50 ′. Not formed. Therefore, a non-coating region continuous in the transport direction is formed on the film substrate 80 and the pattern mask 50 '. If the pattern mask 50 ′ is formed of a material that repels the coating material, or if the surface of the pattern mask 50 ′ is subjected to a liquid repellent treatment, a coating film is formed on the pattern mask 50 ′. Not.
  • the film substrate 80 is then conveyed to the pattern mask peeling unit 190.
  • the pattern mask 50 ′ is conveyed in a direction away from the film substrate 80, and the pattern mask 50 ′. Is peeled off from the film substrate 80.
  • the peeled pattern mask 50 ′ is wound up by a mask winding roll 52. Since the coating film formed on the pattern mask 50 ′ together with the pattern mask 50 ′ is also peeled off from the film base material 80, the coating film is not formed in the region overlapped with the pattern mask 50 ′ of the film base material 80.
  • the coating film 84 is formed only in a region that is a non-application region and does not overlap the pattern mask 50 ′ on the film substrate 80.
  • a non-application area is formed in the area that overlaps the pattern mask 50 ′ of the film substrate 80 and the area that opposes the liquid non-carrying area 41b of the application roll 41, and overlaps the pattern mask 50 ′.
  • the coating film 84 is formed in a region facing the liquid carrying region 41 a of the coating roll 41. In this way, the coating film 84 having a desired pattern can be formed on the film substrate 80.
  • the coating apparatus 140n can easily form the coating film 84 having a desired pattern by changing the shape of the pattern mask 50 'to be used.
  • the coating apparatus 140n uses a pattern mask 50 ′ having a pattern divided in a direction perpendicular to the transport direction, so that the film base 80 is kept in contact with the coating roll 40 in the transport direction of the film base 80.
  • the coating film 84 having an intermittent (discontinuous) pattern can be formed.
  • the film substrate 80 is separated from the coating roll 40 or Although it is necessary to move the conveyance path of a film base so that it may contact, in coating device 140n of this embodiment, it is not necessary.
  • tensile_strength of the film base material accompanying the movement of the conveyance path of a film base material is unnecessary. Therefore, the coating device 140n can easily form a coating film having a desired discontinuous pattern while having a simple device configuration.
  • the number, position, and width of the non-application areas that are continuous in the transport direction on the film substrate 80 can be changed. Therefore, for example, when forming a coating film having a pattern in which the number, position, or width of the non-application areas continuous in the transport direction are different from each other for each of the plurality of film base materials, It is possible to form a coating film having a desired pattern on each film substrate by changing the number and the width in the rotation axis direction, or by appropriately moving the coating roll in the rotation axis direction.
  • the coating device 140p mainly applies a liquid onto the film transport unit 120a that continuously feeds the film base material 80 and the film base material 80 that is sent out by the film transport unit 120a.
  • a coating liquid supply member 82 ′ for supplying a coating liquid to the coating roll 40, and an upstream side of the coating roll 40 in the transport direction of the film base 80,
  • the pattern mask applying unit 170, the pattern mask peeling unit 190, and the coating liquid supply member 82 ′ function as a non-application region forming mechanism.
  • the coating liquid supply member 82 ′ particularly has a transport direction non-application area forming mechanism.
  • the film transport unit 120a, the coating roll 40, the pattern mask applying unit 170, and the pattern mask peeling unit 190 of the coating device 140p are the same as the film transport unit 120a, the coating roll 40, the pattern mask applying unit 170, and the coating device 140j of the tenth embodiment. Since the configuration is the same as that of the pattern mask peeling unit 190, the description thereof is omitted. Further, since the coating liquid supply member 82 'of the coating apparatus 140p is configured in the same manner as the coating liquid supply member 82' of the coating apparatus 140d of the fourth embodiment, the description thereof is also omitted.
  • the pattern mask applying unit 170 sandwiches the pattern mask 50 ′ fed out from the pattern mask feeding roll 51 together with the film base 80 with the bonding roll 54 and the support roll 55, thereby forming the surface of the film base 80 (coating film formation).
  • the pattern mask 50 ' is overlaid at a predetermined position on the surface).
  • the film substrate 80 on which the pattern mask 50 ′ is superimposed is conveyed to a position facing the application roll 40 (the front surface of the application roll 40).
  • the liquid carrying region 40a of the coating roll 40 is coated with the coating material supplied by the two or more coating liquid supply chambers 82a as described above, and the coating material without being supplied with the coating material. An unsupported region is formed.
  • the coating film material adheres to a region on the film substrate 80 and the pattern mask 50 'facing the region where the coating film material of the coating roll 40 is carried, and the coating film 84 is formed with a predetermined film thickness.
  • the coating film 84 is not formed in a region on the film substrate 80 and the pattern mask 50 ′ that faces the region where the coating film material of the coating roll 40 is not carried. Therefore, a non-coating region continuous in the transport direction is formed on the film substrate 80 and the pattern mask 50 '. If the pattern mask 50 ′ is formed of a material that repels the coating material, or if the surface of the pattern mask 50 ′ is subjected to a liquid repellent treatment, a coating film is formed on the pattern mask 50 ′. Not.
  • the film substrate 80 is then conveyed to the pattern mask peeling unit 190.
  • the pattern mask 50 ′ is conveyed in a direction away from the film substrate 80, and the pattern mask 50 ′. Is peeled off from the film substrate 80.
  • the peeled pattern mask 50 ′ is taken up by the pattern mask take-up roll 52. Since the coating film formed on the pattern mask 50 ′ together with the pattern mask 50 ′ is also peeled off from the film base material 80, the coating film is not formed in the region overlapped with the pattern mask 50 ′ of the film base material 80.
  • the coating film 84 is formed only in a region that is a non-application region and does not overlap the pattern mask 50 ′ on the film substrate 80.
  • a non-application region is formed in a region facing the pattern mask 50 ′ of the film substrate 80 and a region of the coating roll 40 facing the region where the liquid is not carried, and the pattern mask 50 ′.
  • the coating film 84 is formed in a region that does not overlap and is opposite to the region where the liquid of the coating roll 40 is carried. In this way, the coating film 84 having a desired pattern can be formed on the film substrate 80.
  • the coating device 140p can easily form the coating film 84 having a desired pattern by changing the shape of the pattern mask 50 'to be used. Moreover, the coating apparatus 140p uses the pattern mask 50 ′ having a pattern divided in a direction orthogonal to the transport direction, so that the film base 80 is kept in contact with the coating roll 40 in the transport direction of the film base 80.
  • the coating film 84 having an intermittent (discontinuous) pattern can be formed. In order to form an intermittent coating film pattern in the longitudinal direction (conveying direction) of such a film substrate, in the method described in Patent Document 1, the film substrate 80 is separated from the coating roll 40 or Although it is necessary to move the conveyance path of a film base so that it may contact, in coating device 140p of this embodiment, it is not necessary.
  • tensile_strength of the film base material accompanying the movement of the conveyance path of a film base material is unnecessary. Therefore, the coating device 140p can easily form a coating film having a desired discontinuous pattern while having a simple device configuration.
  • the number of coating liquid supply chambers to be used by changing the number of coating liquid supply chambers to be used, the width and the position of the coating roll in the rotation axis direction, the distance between the coating liquid supply chambers, etc. Number, position and width can be changed. Therefore, for example, in the case of forming a coating film having a pattern in which the number, position, or width of the non-application areas continuous in the transport direction are different from each other, the number of coating liquid supply chambers to be used and It is possible to form a coating film having a desired pattern on each film substrate by changing the width or appropriately moving in the direction of the rotation axis of the coating roll.
  • a plurality of coating rolls each having one coating liquid supply chamber may be used.
  • the coating rolls are arranged at different positions in the transport direction of the film substrate 80, and the coating liquid supply chambers of the coating rolls are arranged at positions separated from each other in the width direction of the film substrate 80.
  • the coating liquid supply chambers may be independently movable in the direction of the rotation axis of the coating roll.
  • the coating apparatuses 140a to 140p of the first to fourteenth embodiments include a non-application region forming mechanism that forms a non-application region continuous in at least one direction on the film substrate.
  • the film member manufacturing apparatus 100 a having a concavo-convex pattern mainly includes a film transport unit 120 that continuously feeds the film substrate 80, and the film substrate 80 that is fed by the film transport unit 120.
  • the film member manufacturing apparatus 100a of the embodiment manufactures a film base material (hereinafter referred to as a film member) 80a including an unevenness forming material provided with an uneven pattern.
  • the film transport unit 120 mainly includes a feed roll 72 that feeds the belt-shaped film substrate 80, a take-up roll 87 that is provided downstream of the transfer unit 160 and winds up the film member 80 a, It has the conveyance roll 78 for conveying the film base material 80 and the film member 80a in a conveyance direction.
  • the feed roll 72 and the take-up roll 87 are rotatably attached to a support base (not shown) that makes them removable.
  • the film base 80 can be transported in the transport direction by the rotational drive of the feed roll 72 and the take-up roll 87.
  • the film base material 80 is a belt-like or long film base material to enable continuous processing while being conveyed.
  • the film substrate 80 include silicone resin, film-like glass, polyethylene terephthalate (PET), polyethylene terephthalate (PEN), polycarbonate (PC), cycloolefin polymer (COP), polymethyl methacrylate (PMMA), polystyrene ( PS), polyimide (PI), and an organic material such as polyarylate.
  • the film substrate 80 may be transparent or opaque. In order to improve the adhesion between the film substrate 80 and the coating film of the unevenness forming material formed on the surface thereof, the film substrate 80 may be subjected to an easy adhesion treatment on the surface. Further, a gas barrier layer may be provided on the surface of the film substrate 80.
  • the dimensions of the film substrate 80 can be appropriately set.
  • the film substrate 80 can have a width of 50 to 3000 mm and a thickness of 1 to 500 ⁇ m.
  • ⁇ Applying part> 140 A of application parts are comprised by the coating device 140a, 140b, 140c or 140d of the above-mentioned embodiment, and form the coating film 84 of the uneven
  • FIG. The transport unit 120a of the coating apparatuses 140a to 140d of the above-described embodiment is a part of the film transport unit 120 of the manufacturing apparatus of the present embodiment.
  • the transfer unit 160 includes a transfer roll 90 and a pressing roll (nip roll) 74 facing the transfer roll 90.
  • the transfer roll 90 is a roll-shaped (columnar or cylindrical) mold having an uneven pattern on the outer peripheral surface.
  • the transfer roll 90 has a drive shaft, and is driven to rotate about the shaft by a drive device such as a motor.
  • the size of the concavo-convex pattern of the transfer roll can be appropriately set depending on the size of the film member to be manufactured, etc.
  • the diameter can be 50 to 1000 mm and the axial length can be 50 to 3000 mm.
  • the transfer roll 90 used in the present embodiment is configured by attaching a thin plate-shaped mold having a concavo-convex pattern on the outer peripheral surface of a cylindrical substrate roll.
  • a thin plate-shaped mold having a concavo-convex pattern on the outer peripheral surface of a cylindrical substrate roll.
  • the material of the base roll for example, iron, copper, titanium, stainless steel, aluminum, or the like can be used.
  • the base roll may have a diameter of 50 to 1000 mm and an axial length of 50 to 3000 mm.
  • the thin plate mold include a plate-shaped metal mold or a film-shaped resin mold manufactured by a method described later.
  • the resin constituting the resin mold includes rubber such as natural rubber or synthetic rubber.
  • the concave and convex pattern of the thin plate mold is a microlens array structure, a structure having functions such as light diffusion and diffraction, a stripe structure consisting of lines and spaces, a cylindrical shape, a conical shape, a truncated cone shape, Triangular prism, triangular pyramid, triangular frustum, quadratic prism, quadrangular pyramid, quadrangular frustum, polygonal pillar, polygonal pyramid, polygonal frustum, etc.
  • the irregular pitch pattern may be such that the pitch of the irregularities is not uniform and the direction of the irregularities has no directivity.
  • the average pitch of the irregularities can be in the range of 100 to 1500 nm, and is in the range of 200 to 1200 nm. It is more preferable.
  • the average value (average height) of the uneven depth distribution is preferably in the range of 20 to 200 nm, and more preferably in the range of 30 to 150 nm.
  • the standard deviation of the unevenness depth is preferably in the range of 10 to 100 nm, more preferably in the range of 15 to 75 nm.
  • the light scattered and / or diffracted from such a concavo-convex pattern has a relatively broad wavelength band, not light of a single or narrow band wavelength, and the scattered light and / or diffracted light is directed. There is no sex and heads in all directions.
  • the “irregular irregularity pattern” the Fourier transform image obtained by performing the two-dimensional fast Fourier transform processing on the irregularity analysis image obtained by analyzing the shape of the irregularity on the surface shows a circular or annular pattern. In other words, it includes such a quasi-periodic structure in which the distribution of the pitch of the projections and depressions has no directivity in the direction of the projections and depressions.
  • the member having such a quasi-periodic structure can be used for a member used for a light emitting element such as an organic EL element, LED, or ECL, or a photoelectric conversion element such as a solar cell. It is suitable as a member used or a member used for manufacturing them.
  • the thin plate mold may be wound around a base roll and attached.
  • two or more mold plates may be used as the thin plate mold, and they may be attached so as to wind the outer peripheral surface of the base roll.
  • the total length in the winding direction of the thin plate mold may be designed to be shorter than the length in the circumferential direction of the base roll.
  • the thin plate mold can be fixed to the base roll using an adhesive, a magnet, a screw or the like.
  • a metal mold metal mold
  • the metal mold is wound around the base roll, and the end of the metal mold is welded to the base roll, so that the metal mold is attached to the base roll.
  • the ends of the thin plate mold can be joined together. You may perform a mold release process to an uneven
  • a matrix pattern for forming the concave / convex pattern of the mold is prepared.
  • the irregular pattern of the matrix is, for example, a method using self-organization (microphase separation) by heating of a block copolymer described in WO2012 / 096368 by the present applicants (hereinafter referred to as “BCP (Block Copolymer” as appropriate).
  • BCP solvent annealing method a method using self-assembly of a block copolymer described in WO2013 / 161454 in a solvent atmosphere
  • BKL (Buckling) method a photolithography method
  • a micromachining method such as a cutting method, an electron beam direct drawing method, a particle beam beam machining method, and an operation probe machining method, and a micromachining method using self-organization of fine particles
  • a micromachining method such as a cutting method, an electron beam direct drawing method, a particle beam beam machining method, and an operation probe machining method, and a micromachining method using self-organization of fine particles
  • any material can be used as the material for forming the pattern, but a styrenic polymer such as polystyrene, a polyalkyl methacrylate such as polymethyl methacrylate, etc.
  • a block copolymer consisting of two combinations selected from the group consisting of polyethylene oxide, polybutadiene, polyisoprene, polyvinyl pyridine, and polylactic acid is preferred.
  • Etching by irradiating energy rays typified by ultraviolet rays such as excimer UV light, and etching by a dry etching method such as RIE (reactive ion etching) on the uneven pattern obtained by the solvent annealing treatment May be performed. Moreover, you may heat-process with respect to the uneven
  • a mold on which the pattern is further transferred can be formed by the electroforming method or the like as follows.
  • a seed layer that becomes a conductive layer for electroforming can be formed on a matrix having a pattern by electroless plating, sputtering, vapor deposition, or the like.
  • the seed layer is preferably 10 nm or more in order to make the current density uniform in the subsequent electroforming process and to make the thickness of the metal layer deposited by the subsequent electroforming process constant.
  • seed layer materials include nickel, copper, gold, silver, platinum, titanium, cobalt, tin, zinc, chromium, gold / cobalt alloy, gold / nickel alloy, boron / nickel alloy, solder, copper / nickel / chromium An alloy, a tin-nickel alloy, a nickel-palladium alloy, a nickel-cobalt-phosphorus alloy, or an alloy thereof can be used.
  • a metal layer is deposited on the seed layer by electroforming (electroplating).
  • the thickness of the metal layer can be, for example, 10 to 3000 ⁇ m in total including the thickness of the seed layer.
  • any of the above metal species that can be used as a seed layer can be used as a material for the metal layer deposited by electroforming.
  • the formed metal layer desirably has an appropriate hardness and thickness from the viewpoint of ease of processing such as pressing, peeling and cleaning of the resin layer for forming a subsequent mold.
  • the metal layer including the seed layer obtained as described above is peeled off from the matrix having the concavo-convex structure to obtain a metal substrate.
  • the peeling method may be physically peeled off, or the material forming the pattern may be removed by dissolving it using an organic solvent that dissolves them, for example, toluene, tetrahydrofuran (THF), chloroform or the like.
  • an organic solvent that dissolves them for example, toluene, tetrahydrofuran (THF), chloroform or the like.
  • the remaining material components can be removed by washing.
  • wet cleaning using a surfactant or the like, or dry cleaning using ultraviolet rays or plasma can be used.
  • remaining material components may be adhered and removed using an adhesive or an adhesive.
  • the metal substrate (metal mold) having the pattern transferred from the mother die thus obtained can be used as the thin plate mold of this embodiment.
  • a film-like resin mold can be produced by transferring the concavo-convex structure (pattern) of the metal substrate to a film-like support substrate using the obtained metal substrate. For example, after the curable resin is applied to the support substrate, the resin layer is cured while pressing the uneven structure of the metal substrate against the resin layer.
  • a support substrate for example, a substrate made of an inorganic material such as glass or silicon substrate, polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polycarbonate (PC), cycloolefin polymer (COP), polymethyl methacrylate (PMMA), Examples thereof include resin substrates such as polystyrene (PS), polyimide (PI), and polyarylate, and base materials made of metal materials such as nickel, copper, and aluminum.
  • the support substrate may be transparent or opaque.
  • a surface treatment or an easy adhesion layer may be provided on the substrate, or a gas barrier layer may be provided.
  • the thickness of the support substrate can be in the range of 1 to 500 ⁇ m.
  • the curable resin examples include epoxy, acrylic, methacrylic, vinyl ether, oxetane, urethane, melamine, urea, polyester, polyolefin, phenol, cross-linked liquid crystal, fluorine, and silicone. And various resins such as monomers, oligomers, polymers, and the like.
  • the thickness of the curable resin is preferably in the range of 0.5 to 500 ⁇ m. If the thickness is less than the lower limit, the height of the irregularities formed on the surface of the cured resin layer tends to be insufficient, and if the thickness exceeds the upper limit, the influence of the volume change of the resin that occurs during curing increases and the irregular shape is well formed. It may not be possible.
  • the method for applying the curable resin examples include spin coating, spray coating, dip coating, dropping, gravure printing, screen printing, letterpress printing, die coating, curtain coating, ink jet, and sputtering.
  • Various coating methods such as a method can be employed.
  • the conditions for curing the curable resin vary depending on the type of resin used.
  • the curing temperature is in the range of room temperature to 250 ° C.
  • the curing time is in the range of 0.5 minutes to 3 hours.
  • a method of curing by irradiating energy rays such as ultraviolet rays or electron beams may be used.
  • the irradiation amount is preferably in the range of 20 mJ / cm 2 to 5 J / cm 2 .
  • the metal substrate is removed from the cured resin layer after curing.
  • the method for removing the metal substrate is not limited to the mechanical peeling method, and a known method can be adopted.
  • a film-like resin mold having a cured resin layer in which irregularities are formed on a support substrate that can be obtained in this manner can be used as the thin plate-shaped mold of the present embodiment.
  • the concavo-convex pattern of the metal substrate can be obtained.
  • a transferred rubber mold can be produced. The obtained rubber mold can be used as the thin plate mold of this embodiment.
  • the pressing roll 74 sandwiches the film base material 80 on which the coating film 84 of the unevenness forming material is formed together with the transfer roll 90, and the back surface of the base material 80 (the surface on which the coating film of the unevenness forming material is formed).
  • the base material 80 is pressed from the opposite surface).
  • the upstream side and downstream side transport rolls 78 of the transfer unit 160 are arranged so that the base material 80 is wound approximately half a circumference of the transfer roll 90.
  • the base material 80 is in contact with the transfer roll 90 in front of or in the vicinity of the pressing roll 74, winds about half a circumference of the transfer roll 90, leaves the transfer roll 90, and is peeled from the transfer roll 90. .
  • the film member 80a is obtained.
  • the UV irradiation light source 85 is provided on the downstream side of the pressing roll 74 and on the upstream side from the position where the substrate 80 peels from the transfer roll 90.
  • a device for curing the coating film 84 of the unevenness forming material such as a heater may be provided.
  • the film member manufacturing apparatus 100a may further be provided with a static eliminator for neutralizing the film base material 80 fed from the feed roll 72 and the film member 80a before being taken up by the take-up roll 87. .
  • the film member manufacturing apparatus 100a further includes an inspection apparatus that observes the thickness and state of the coating film formed by the application unit 140A, an inspection apparatus that observes the uneven pattern of the coating film 84 after being peeled off from the transfer roll 90, and the like. Can be provided.
  • the manufacturing apparatus 100b shown in FIG. 16 mainly includes a film transport unit 120 that continuously feeds the film base material 80, and a coating film 84 of the unevenness forming material on the film base material 80 sent out by the film transport unit 120.
  • the film member manufacturing apparatus 100b manufactures a film base material (hereinafter referred to as a film member) 80a including an unevenness forming material provided with an uneven pattern.
  • the film member manufacturing apparatus 100b is the same as the film member manufacturing apparatus 100a of the fifteenth embodiment, except that the coating unit 140B is configured by the coating apparatuses 140e, 140f, 140g, 140h, or 140i of the above-described embodiment. Composed.
  • the manufacturing apparatus 100c shown in FIG. 17 mainly includes a film transport unit 120 that continuously feeds the film base material 80, and a coating film 84 of the unevenness forming material on the film base material 80 sent out by the film transport unit 120.
  • the film member manufacturing apparatus 100c manufactures a film base material (hereinafter referred to as a film member) 80a including an unevenness forming material provided with an uneven pattern.
  • the film member manufacturing apparatus 100c is configured in the same manner as the above-described film member manufacturing apparatus 100a, except that the coating unit 140C is configured by the coating apparatus 140j, 140k, 140m, 140n, or 140p of the above-described embodiment. .
  • the conveyance by the conveyance unit 120 is started, and the film substrate 80 is sent from the feeding roll 72 to the coating unit 140A, 140B, or 140C via the conveyance roll 78.
  • the coating film 84 of the unevenness forming material having a discontinuous pattern is formed on the film substrate 80 by any of the above-described coating apparatuses 140a to 140p. Thereby, the coating film 84 is formed in a desired discontinuous region on the substrate 80.
  • a photo-curing resin As the concavo-convex forming material, a photo-curing resin, a thermosetting resin, a thermoplastic resin can be used.
  • Various resins such as monomers, oligomers, polymers and the like such as polyester, polyolefin, phenol, cross-linked liquid crystal, fluorine, silicone, and polyamide are listed.
  • the unevenness forming material may be formed of an inorganic material because of its excellent heat resistance.
  • silica Ti-based material, ITO (indium-tin-oxide) -based material, ZnO, ZrO 2 , Al 2 O 3
  • a sol-gel material such as can be used.
  • a metal alkoxide (silica precursor) sol-gel material is prepared.
  • TMOS tetramethoxysilane
  • TEOS tetraethoxysilane
  • tetra-i-propoxysilane tetra-n-propoxysilane
  • tetra-i-butoxysilane tetra-n-butoxysilane
  • tetra-n-butoxysilane tetra-n-butoxysilane
  • tetra- Tetraalkoxide monomers represented by tetraalkoxysilane such as sec-butoxysilane, tetra-t-butoxysilane, methyltrimethoxysilane, ethyltrimethoxysilane, propyltrimethoxysilane, isopropyltrimethoxysilane, phenyltrimethoxysilane, Methyltriethoxysilane (MTES), ethyltriethoxysilane, propyltriethoxysilane,
  • alkyltrialkoxysilanes or dialkyldialkoxysilanes in which the alkyl group has C4-C18 carbon atoms can also be used.
  • Monomers having a vinyl group such as vinyltrimethoxysilane, vinyltriethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-glycidoxypropyltrimethoxy
  • Monomers having an epoxy group such as silane, 3-glycidoxypropylmethyldiethoxysilane, 3-glycidoxypropyltriethoxysilane, monomers having a styryl group such as p-styryltrimethoxysilane, 3-methacryloxypropylmethyl
  • Monomers having a methacrylic group such as dimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-methacryl
  • the metal alkoxides may be used.
  • some or all of the alkyl group and phenyl group of these compounds may be substituted with fluorine.
  • metal acetylacetonate, metal carboxylate, oxychloride, chloride, a mixture thereof and the like can be mentioned, but not limited thereto.
  • the metal species include, but are not limited to, Ti, Sn, Al, Zn, Zr, In, and a mixture thereof in addition to Si. What mixed suitably the precursor of the said metal oxide can also be used.
  • a silane coupling agent having a hydrolyzable group having affinity and reactivity with silica and an organic functional group having water repellency can be used as a precursor of silica.
  • silane monomers such as n-octyltriethoxysilane, methyltriethoxysilane, and methyltrimethoxysilane
  • vinylsilanes such as vinyltriethoxysilane, vinyltrimethoxysilane, vinyltris (2-methoxyethoxy) silane, vinylmethyldimethoxysilane
  • Methacrylic silane such as 3-methacryloxypropyltriethoxysilane, 3-methacryloxypropyltrimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane
  • 3-glycyl Epoxy silanes such as Sidoxypropyltriethoxysilane, 3-Mercaptopropyltrimethoxysilane, Mercaptosilanes such as 3-Mercaptopropyltriethoxysilane, 3-Octanoyl
  • the mixing ratio thereof can be 1: 1, for example, in a molar ratio.
  • This sol-gel material produces amorphous silica by performing hydrolysis and polycondensation reactions.
  • an acid such as hydrochloric acid or an alkali such as ammonia is added.
  • the pH is preferably 4 or less or 10 or more.
  • the amount of water to be added can be 1.5 times or more in molar ratio with respect to the metal alkoxide species.
  • Examples of the solvent of the concavo-convex material solution made of a sol-gel material include alcohols such as methanol, ethanol, isopropyl alcohol (IPA) and butanol, aliphatic hydrocarbons such as hexane, heptane, octane, decane and cyclohexane, benzene, Aromatic hydrocarbons such as toluene, xylene and mesitylene, ethers such as diethyl ether, tetrahydrofuran and dioxane, ketones such as acetone, methyl ethyl ketone, isophorone and cyclohexanone, butoxyethyl ether, hexyloxyethyl alcohol, methoxy-2-propanol , Ether alcohols such as benzyloxyethanol, glycols such as ethylene glycol and propylene glycol, ethylene glycol dimethyl ether, diethylene glycol Glycol
  • Additives for concavo-convex forming materials consisting of sol-gel materials include polyethylene glycol, polyethylene oxide, hydroxypropyl cellulose, polyvinyl alcohol for viscosity adjustment, alkanolamines such as triethanolamine which are solution stabilizers, ⁇ diketones such as acetylacetone , ⁇ -ketoester, formamide, dimethylformamide, dioxane and the like can be used. Further, as an additive of the sol-gel material solution, a material that generates acid or alkali by irradiating light such as energy rays typified by ultraviolet rays such as excimer UV light can be used. By adding such a material, the sol-gel material solution can be cured by irradiation with light.
  • the thickness of the coating film 84 of the uneven forming material to be formed is preferably in the range of 0.5 to 500 ⁇ m. If the thickness is less than the lower limit, the height of the unevenness formed on the surface of the unevenness forming material tends to be insufficient. May not be formed.
  • the base material 80 on which the coating film 84 of the unevenness forming material is formed in a desired discontinuous region is stretched over the transporting roll 78 downstream of the coating unit 140A, 140B or 140C, and transported.
  • the transfer roll 90 and the pressure roll 74 Toward the transfer roll 90 and the pressure roll 74.
  • the substrate 80 conveyed immediately below the pressing roll 74 is superimposed on the concave / convex pattern of the transfer roll 90 and pressed by the pressing roll 74, and the concave / convex pattern of the transfer roll 90 is transferred to the coating film 84.
  • UV light from the UV light source 85 may be applied to the base material 80 on which the concave / convex pattern has been transferred by the pressing roll 74 while the transfer roll 90 is being pressed, thereby promoting the curing of the coating film 84.
  • the conditions for curing the unevenness forming material vary depending on the type of material used as the unevenness forming material. For example, when the unevenness forming material is cured by heating, the curing temperature is in the range of room temperature to 250 ° C., and the curing time is Is preferably in the range of 0.5 minutes to 3 hours. Further, a method of curing by irradiating energy rays such as ultraviolet rays or electron beams may be used.
  • the irradiation amount is preferably in the range of 20 mJ / cm 2 to 5 J / cm 2 .
  • the UV light can be irradiated to the coating film 84 of the unevenness forming material by the UV irradiation light source 85 disposed below the transfer roll 90.
  • the film base material (film member 80 a) having the cured coating film 84 a of the unevenness forming material is changed in the course along the outer periphery of the transfer roll 90 and then conveyed away from the transfer roll 90. Peel off. Thereafter, the film member 80 a is wound around the winding roll 87.
  • the method of peeling the film member 80a from the transfer roll 90 is not limited to a mechanical peeling method, and any known method can be adopted. For example, in FIGS.
  • a film member 80a having a coating film (unevenness pattern layer) 84a of a concavo-convex forming material after curing is conveyed in a direction away from the transfer roll 90 on the downstream side of the pressing roll 74, thereby The member 80a can be peeled from the transfer roll 90.
  • a film member 80a having a cured uneven pattern layer 84a in which unevenness is formed on the film substrate 80 can be obtained.
  • the uneven pattern layer 84a is formed in a region having a desired discontinuous pattern on the film substrate 80.
  • this manufacturing method mainly includes a coating process for forming a coating film of a concavo-convex forming material on a film substrate, and a transfer for transferring a concavo-convex pattern of a transfer roll to a coating film on a film substrate. And a step of preparing a transfer roll having a concavo-convex pattern.
  • An example of the apparatus used for this manufacturing method is shown in FIG.
  • the film member manufacturing apparatus 100d mainly includes a coating unit 140D in which a coating process is performed, a transfer unit 160 in which a transfer process is performed, and a transport that transports the film substrate 80 to the coating unit 140D and the transfer unit 160. Part 120.
  • the transfer roll used in the transfer unit 160 will be described, and then the operation in each step and details of the structure of each unit will be described.
  • the transfer roll used in the present embodiment is a roll-shaped (columnar or cylindrical) mold having an uneven pattern 90p on the outer peripheral surface.
  • the transfer roll 90 has a drive shaft 90d, and is driven to rotate about the shaft 90d by a drive device such as a motor.
  • the size of the uneven pattern 90p of the transfer roll can be set as appropriate depending on the size of the film member to be manufactured. For example, the diameter can be 50 to 1000 mm and the length in the axial direction can be 50 to 3000 mm.
  • the concavo-convex pattern 90p of the transfer roll is exaggerated and drawn for explanation, but the concavo-convex pattern 90p of the actual transfer roll is intended to be a fine concavo-convex pattern as described later.
  • the transfer roll 90 used in the present embodiment is a thin plate mold having a concavo-convex pattern 90p on the outer peripheral surface of a cylindrical substrate roll 90a, like the transfer roll 90 of the film member manufacturing apparatus 100a of the fifteenth embodiment.
  • 90b is attached.
  • the material and size of the base roll 90a may be the same as those of the base roll of the film member manufacturing apparatus 100a of the fifteenth embodiment.
  • the material of the thin plate mold 90b and the uneven pattern 90p may be the same as the thin plate mold of the film member manufacturing apparatus 100a of the fifteenth embodiment.
  • the length in the winding direction of the thin plate-shaped mold 90b may be designed to be shorter than the length in the circumferential direction of the base roll 90a.
  • a single mold may be used as the thin plate mold 90b, and this may be wound around the base roll 90a and attached.
  • two or more mold plates may be used as the thin plate mold 90b, and these may be attached so as to wind the outer peripheral surface of the base roll 90a.
  • the thin plate mold 90b can be fixed to the base roll 90a using an adhesive, a magnet, a screw, or the like.
  • a metal mold metal mold
  • the metal mold is wound around the base roll 90a and the end of the metal mold is welded to the base roll 90a. It can be fixed to the base roll 90a.
  • the ends of the thin plate mold 90b can be joined together.
  • the ends of the thin plate-shaped mold 90b are joined together, not only the ends of the thin plate-shaped mold 90b are brought into contact with each other, but the ends of the thin plate-shaped mold 90b are opposed to each other with a predetermined interval. It also means that An area between the contact portions of the thin plate molds 90b joined together by fixing the thin plate mold 90b to the base roll 90a or between the opposing ends is referred to as a “joint portion” 90c. In addition, when the screw etc.
  • region where the screw etc. are provided is also connected to the joint part 90c.
  • the term “joint portion” used in the text refers to a region (mainly extending in the axial direction of the base roll) that cannot be used as a concave / convex pattern of the mold produced by attaching the thin plate mold 90b to the base roll 90a. Area).
  • a thin plate mold 90b composed of two mold plates having a concavo-convex pattern 90p as shown in FIG. ) Can be obtained.
  • the joint portion 90c is filled with resin. As needed, you may perform a mold release process to the uneven
  • the thin plate mold 90b having an uneven pattern can be manufactured by the same method as the thin plate mold of the film member manufacturing apparatus 100a of the fifteenth embodiment.
  • a thin plate-shaped mold 90 b having a concavo-convex pattern is wound around the base roll 90 a, and ends of the thin plate-shaped mold 90 b are connected to the base roll. You may obtain the transfer roll 90 joined on the outer peripheral surface of 90a from a manufacturer or a market.
  • An unevenness forming material is intermittently applied with a predetermined thickness on a band-shaped film substrate.
  • the irregularity forming material is intermittently applied with a predetermined thickness on a band-shaped film substrate.
  • the film base material the same film base material and unevenness forming material used in the film member manufacturing apparatus 100a of the fifteenth embodiment can be used.
  • corrugated material the thing similar to the uneven
  • the thickness of the coating film of the unevenness forming material is preferably in the range of 0.5 to 500 ⁇ m, as in the film member manufacturing method of the eighteenth embodiment.
  • various coating methods such as a gravure coating method, a screen printing method, a relief printing method, and a die coating method can be employed.
  • an application device such as an application roll, an application die or an application head used in the above application method is operated intermittently.
  • the unevenness forming material can be coated on the film substrate by bringing the film substrate into contact with the coating roll.
  • the base material film is separated from the coating roll at a predetermined timing to stop the coating, and then the base film is again brought into contact with the coating roll at a predetermined timing to restart the coating, thereby forming the unevenness forming material.
  • the unevenness forming material can be applied to the film substrate by applying pressure to the die so that the unevenness forming material is discharged from the die. At this time, the discharge of the unevenness forming material from the die is stopped by shutting off the pressure applied to the die at a predetermined timing, and then the die is pressurized again at the predetermined timing to discharge the unevenness forming material and restart the application. By repeating this, the unevenness forming material can be intermittently applied to the film substrate.
  • the length of the portion of the substrate 80 where the unevenness forming material is not coated (uncoated portion) in the film substrate conveyance direction is a circle of the transfer roll from the viewpoint of reliably avoiding transfer at the joint portion of the transfer roll. It may be slightly larger than the length of the joint portion in the circumferential direction.
  • the transfer roll is pressed against the coating film of the unevenness forming material formed on the substrate, and the uneven pattern of the transfer roll is transferred to the coating film.
  • the joint portion 90 c of the transfer roll 90 faces a portion (uncoated portion) 88 of the film base material 80 where the coating film of the unevenness forming material is not formed.
  • the base material 80 and the transfer roll 90 are overlapped so that the portion (coating portion) 86 on which the coating film of the unevenness forming material is formed faces the thin plate-shaped mold 90 b of the transfer roll 90.
  • the film base material 80 superimposed on the transfer roll 90 may be pressed from the back surface of the base material 80 toward the transfer roll 90 using a press roll (nip roll) 74.
  • the coating film 84 of the unevenness forming material is cured.
  • the conditions for curing the unevenness forming material may be the same as in the film member manufacturing method of the eighteenth embodiment.
  • the coating film and the film base material of the concavo-convex forming material having the cured concavo-convex pattern are peeled from the transfer roll.
  • the method of peeling the coating film and film substrate of the unevenness forming material after curing from the transfer roll may be the same as the peeling method in the film member manufacturing method of the eighteenth embodiment.
  • the rotation state of the transfer roll such as the rotational speed and the position of the joint portion, may be detected while the transfer roll is driven to rotate about the axis. Based on the detected rotation state information, the timing of applying the unevenness forming material in the above application process may be controlled.
  • the rotation state of the transfer roll can be detected by providing a reflection plate or the like on the transfer roll and detecting the position with an optical sensor, or using a servo motor or an encoder. As will be described later, the step of detecting the joint portion is not essential, and this step may be omitted.
  • the film member manufacturing apparatus 100d shown in FIG. 19 mainly includes a film transport unit 120 that continuously feeds the film base material 80, and irregularities on the film base material 80 that is sent out by the film transport unit 120.
  • the film member manufacturing apparatus 100d may further include a control unit 180 that controls the timing at which the unevenness forming material is intermittently applied onto the film substrate 80 by the application unit 140D.
  • the film transport unit 120 is mainly provided with a feeding roll 72 that feeds the belt-shaped film base material 80, a winding roll 87 that is provided downstream of the transfer unit 160 and winds up the film member 80 a, You may have the conveyance roll 78 for conveying the film base material 80 and the film member 80a in a conveyance direction.
  • the feeding roll 72 and the take-up roll 87 may be rotatably attached to a support base (not shown) that makes them removable.
  • the film base 80 can be transported in the transport direction by the rotational drive of the feed roll 72 and the take-up roll 87.
  • the film transport unit 120 may include a tension control unit 130 for keeping the tension of the film substrate 80 constant.
  • the tension control unit 130 is provided via the dancer roll 32, the guide roll 34, and the support shaft of the dancer roll 32. And an air cylinder (not shown) attached thereto.
  • the dancer roll 32 is configured such that a certain amount of force from the air cylinder is applied to the dancer roll 32 via a support shaft. The force by which the dancer roll 32 is pulled by the force from the air cylinder and the tension of the film substrate.
  • the dancer roll 32 can move to a position where the two balance. Thereby, the film base material 80 conveyed can always maintain a constant tension.
  • Application part 140D is provided with the container 82 by which the application roll 40, the action
  • the coating roll 40 opposes the surface of the film substrate 80 (the surface on which the unevenness forming material is applied) and applies the unevenness forming material to the film substrate 80 to form the coating film 84.
  • the actuating roll 42 supports the back surface of the film substrate 80 (the surface opposite to the surface on which the coating film 84 is formed) and contacts the substrate 80 with the coating roll 40 (illustrated by solid lines in FIGS. 19 and 21).
  • the position of the actuating roll 42 which will hereinafter be referred to as “contact position” as appropriate) and the position at which the base material 80 is separated from the coating roll 40 (the position of the actuating roll 42 shown by broken lines in FIGS. 19 and 21) In the following, it is alternatively displaced as “separated position” as appropriate.
  • the dimensions of the coating roll 40 can be set as appropriate. From the viewpoint of preventing the irregularity forming material from protruding from the left and right ends of the film base 80 and wrapping around the back surface of the film base 80, the length of the application surface of the coating roll in the rotation axis direction is It may be smaller than the width. Further, in order to transfer the concavo-convex pattern to the entire surface of the coating film 84 of the concavo-convex forming material, the length of the coating roll in the rotation axis direction may be smaller than the axial length of the concavo-convex pattern of the transfer roll 90.
  • the applicator roll 40 is provided in an arrangement that rotates in a state where a part of the applicator roll 40 is immersed in the liquid unevenness forming material stored in the container 82.
  • the unevenness forming material is supported on the outer peripheral surface (side surface) of the application roll 40.
  • the position of the operation roll 42 can be changed by using an actuator (not shown) or the like (a mechanism for moving the film substrate relative to the unevenness forming material).
  • the operation roll 42 is located at the contact position, the unevenness forming material carried on the coating roll 40 comes into contact with the base material 80, and the coating film 84 of the unevenness forming material is formed on the base material 80.
  • the coating film of the unevenness forming material is not formed on the base material 80 because the operation roll 42 is separated from the unevenness forming material carried on the base material 80 application roll 40.
  • the coated portion 86 and the uncoated portion 88 of the unevenness forming material can be formed on the film substrate 80.
  • the transfer unit 160 includes a transfer roll 90 and a pressing roll (nip roll) 74 facing the transfer roll 90, as shown in detail in FIG.
  • the transfer roll 90 may be manufactured by the method described in the description of the process of preparing the transfer roll in the film-shaped member manufacturing method of the nineteenth embodiment described above.
  • the joint part 90c which is not made is provided.
  • the pressing roll 74 sandwiches the film base material 80 on which the coating film 84 of the unevenness forming material is formed together with the transfer roll 90 and presses the base material 80 from the back surface of the base material 80.
  • the transport rolls 78 on the upstream side and the downstream side of the transfer unit 160 are arranged so that the base material 80 is wound around almost half the circumference of the transfer roll 90.
  • the base material 80 is in contact with the transfer roll 90 in front of or in the vicinity of the pressure roll 74, wound about half a circumference of the transfer roll 90, and then separated from the transfer roll 90. Peel from 90.
  • an apparatus for curing the coating film 84 of the unevenness forming material such as the UV irradiation light source 85 on the downstream side of the pressing roll 74 and the upstream side of the position where the substrate 80 peels from the transfer roll 90 is provided. Prepare.
  • the film member manufacturing apparatus may include a detection device and a control unit 180 for detecting the position of the joint portion 90c of the transfer roll 90, as shown in FIG.
  • a detection device and a control unit 180 for detecting the position of the joint portion 90c of the transfer roll 90 as shown in FIG.
  • a reflection plate 90e is provided on the drive shaft 90d of the transfer roll at a position corresponding to the position of the joint portion 90c of the transfer roll, and the light irradiated from the light irradiation section of the optical sensor 62 is optical By receiving light at the light receiving portion of the sensor 62, the position and rotation speed can be detected.
  • the control unit 180 also detects the position and rotational speed information of the joint portion 90c detected by the optical sensor 62, the circumferential length and interval of the joint portion 90c, and the base material 80 from the coating roll 40 to the transfer roll 90.
  • the position of the film substrate facing the joint portion 90c of the transfer roll 90 is calculated based on the distance and the transport speed, and the joint portion 90c of the transfer roll 90 is calculated in the transfer portion 160 based on the calculation result.
  • a computer 64 may be provided for calculating the formation position of a portion where the coating film is not formed (uncoated portion) and controlling the position of the working roll 42 of the application unit 140D based on the calculation result.
  • the film member manufacturing apparatus 100d may further be provided with a static eliminator for neutralizing the film substrate 80 fed from the feed roll 72 and the film member 80a before being taken up by the take-up roll 87. .
  • the film member manufacturing apparatus 100d further includes an inspection device for observing the thickness and state of the coating film formed by the application unit 140D, an inspection device for observing the uneven pattern of the coating film 84 after being peeled from the transfer roll 90, and the like. Can be provided.
  • the film substrate 80 is fed from the feed roll 72 and reaches the coating unit 140 ⁇ / b> D via the transport roll 78.
  • the control unit 180 moves the working roll 42.
  • the operating roll 42 is moved to the contact position (position indicated by a solid line in FIGS. 19 and 21) by controlling the actuator to be moved.
  • the base material 80 comes into contact with the coating roll 40 while moving in the transport direction, whereby a coating film 84 of the unevenness forming material is formed on the base material 80 with a predetermined film thickness.
  • the dancer roll 32 of the tension controller 130 is configured to move to a position where the force from the air cylinder balances with the force with which the dancer roll 32 is pulled by the tension of the film base. Since the movement of 42 increases the tension with which the film substrate 80 pulls the dancer roll 32, the dancer roll 32 moves (to the position indicated by the solid line in FIG. 19). Thereby, the tension of the film base 80 is kept constant.
  • the control unit 180 moves the working roll 42 to a separated position (see FIG. 19 and a position indicated by a broken line in FIG.
  • the base material 80 moving in the transport direction is separated from the coating roll 40, and thus an uncoated portion where the coating film 84 of the unevenness forming material is not formed on the base material 80 is formed.
  • the control unit 180 repeats changing the position of the working roll 42 as described above at a predetermined cycle, whereby intermittent coating is performed in the coating unit 140D.
  • the base material 80 on which the coating film 84 of the unevenness forming material is formed is laid and conveyed on the conveyance roll 78 downstream of the application unit 140D, and is directed to the transfer roll 90 and the pressing roll 74 of the transfer unit 160.
  • the conveyed film mold 80 is superimposed on the transfer roll 90 and pressed by the pressing roll 74.
  • the joint 90 c of the transfer roll 90 faces the unevenness forming material uncoated portion 88 in the film base material 80, and the unevenness forming material application portion in the film base material 80.
  • the substrate 80 and the transfer roll 90 overlap each other with the arrangement 86 facing the thin plate-shaped mold 90 b of the transfer roll 90.
  • corrugated pattern 90p of the transfer roll 90 is pressed against the coating part 86 on the base material 80, and an uneven
  • the joint portion 90c of the transfer roll 90 faces the uneven portion forming material uncoated portion 88 of the film base member 80, a defect occurs in the manufactured film member due to the unevenness or gaps of the joint portion 90c. And the film base material can be prevented from being damaged.
  • the substrate 80 on which the concave / convex pattern has been transferred by the pressing roll 74 is irradiated with UV light from the UV irradiation light source 85 in a state where the transfer roll 90 is pressed, thereby promoting the curing of the coating film 84.
  • the film base material (film member 80a) having the cured coating film of the unevenness forming material changes the course along the outer periphery of the transfer roll 90, and is then transported in a direction away from the transfer roll 90 to be transferred to the transfer roll 90. Is peeled off. Thereafter, the film member 80 a is taken up by the take-up roll 87.
  • a film member 80a in which the uneven pattern of the transfer roll 90 is transferred to the coating film is obtained. It is also possible to manufacture another form of transfer roll by using the obtained film member 80a instead of a metal mold or the like formed by an electroforming method, and winding and fixing it on a roll body as a thin plate mold. is there.
  • the film member manufacturing apparatus 100d is provided with a sensor for detecting the rotation state of the transfer roll 90, but such a detection apparatus may not be incorporated in the apparatus. In that case, for example, by performing the following operation, it is possible to apply intermittently so that the joint portion of the transfer roll and the uneven portion forming material uncoated portion of the film member overlap.
  • the length of the coating part and uncoated part formed in a film base material is determined from the length and the space
  • the time and period for contacting and separating the film substrate and the coating roll are calculated from the conveyance speed of the film substrate.
  • the operation roll is operated so that the coating roll and the film substrate come into contact with and separate from each other at the calculated time and cycle. Furthermore, from the transport distance of the film base material from the coating roll to the transfer roll and the diameter of the transfer roll, the coating start position of the film base material (the end portion on the transport direction side of the portion that becomes the coating part) The position (rotation angle) of the joint portion of the transfer roll when it is positioned is calculated. Next, the joint portion of the transfer roll is aligned with the position calculated above, and driving of the film member manufacturing apparatus is started. In this case, the cycle of contact and separation between the coating roll and the film substrate starts from the point of start of contact. By the above, the uneven
  • the tension of the film substrate 80 was kept constant by the movement of the dancer roll 32.
  • various mechanisms and control methods may be employed as the tension control unit 130 that keeps the tension of the film substrate 80 constant.
  • the driving of the feeding roll 72 may be directly controlled according to the tension of the film base material 80.
  • a tension sensor (not shown) such as a roll having a tension detection function is installed in contact with the film substrate 80.
  • Such a tension sensor is connected to a control device for controlling the driving of the feeding roll 72, for example, a control system of a motor that rotationally drives the feeding roll 72, and the rotation speed of the feeding roll 72 according to the tension value detected by the tension sensor.
  • the motor can be controlled so that changes.
  • tensile_strength of the film base material 80 is kept constant so that the looseness and tension
  • a torque motor (not shown) may be connected to the feeding roll 72 as another mechanism for keeping the tension of the film base material 80 constant in the tension controller 130.
  • the torque motor can adjust the rotation speed and torque according to the change in the load applied to the feeding roll 72. Therefore, if the torque of the torque motor is set to be constant, the rotational force (torque) for rotating the feeding roll 72 is always kept constant even if the tension applied to the film substrate 80 changes.
  • the torque motor By using the torque motor, the pair of guide rolls 34 and dancer rolls 32 in the tension control unit 130 of FIG. 19 can be omitted.
  • a powder clutch (not shown) may be provided on the feeding roll 72.
  • powder clutches powder such as iron powder exists on the joint surface between the drive shaft (input shaft) that transmits the motive power of the motor and the transmission shaft (output shaft) that transmits the motive power.
  • the transmission of the motive power is controlled by controlling with a magnetic field generated from an electromagnet provided in the motor. In this case, when a predetermined torque is applied to the feeding roll 72, the torque of the feeding roll 72 can be controlled to be constant by setting the powder clutch to slide out.
  • the torque of the feeding roll 72 can be controlled through slipping of the clutch by providing the tension sensor as described above and adjusting the powder density according to the value of the tension applied to the film substrate 80. Even if such a powder clutch is employed, the pair of guide rolls 34 and dancer rolls 32 in the tension control unit 130 of FIG. 19 can be omitted.
  • the tension set for the film base 80 fed from the feed roll 72 is different from the tension set by the tension control unit at the time of intermittent coating
  • the above-described tension sensor, torque motor, or The tension of the feeding roll 72 may be controlled by connecting a powder clutch, and the tension control of the tension controller 130 may be performed on the guide roll 34 side.
  • intermittent coating is performed by the coating unit 140D using the working roll 42, but the coating unit 140D is configured by any one of the coating devices 140a to 140p of the first to fourteenth embodiments. Good. Since the coating unit 140D is configured by any one of the coating devices 140a to 140p, a coating film having an intermittent (discontinuous) pattern can be formed, and thus the joint portion 90c of the transfer roll 90 is not coated. The concavo-convex pattern can be transferred by superimposing the working parts facing each other.
  • the film member manufacturing method and manufacturing apparatus capable of preventing the occurrence of transfer failure and peeling failure due to the joint part of the roll-shaped mold are not limited to the configurations of the 19th and 20th embodiments described above, Any structure may be used as long as the uncoated portion is opposed to the joint portion of the transfer roll so as to transfer the uneven pattern.
  • transferred can be manufactured by using the film member manufactured using the above methods and manufacturing apparatuses as a film-like mold. In this embodiment, this method will be described.
  • the concavo-convex structure layer In order to form the concavo-convex structure layer to which the concavo-convex pattern of the film-shaped mold is transferred by the sol-gel method, first, a solution of the sol-gel material is prepared.
  • the concavo-convex structure layer is preferably formed of an inorganic material because of its excellent heat resistance.
  • a sol-gel material such as 3 can be used.
  • the metal alkoxide (precursor), the solvent, and the additive used for the preparation of the solution of the sol-gel material the metal alkoxide (which can be used as the unevenness forming material in the embodiment of the manufacturing method of the band-shaped film member described above)
  • the metal alkoxide which can be used as the unevenness forming material in the embodiment of the manufacturing method of the band-shaped film member described above
  • the solvent, and the additive can be used.
  • Substrates made of inorganic materials such as glass, quartz and silicon substrates, polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polycarbonate (PC), cycloolefin polymer (COP), polymethyl methacrylate (PMMA), polystyrene Resin substrates such as (PS), polyimide (PI), and polyarylate can be used.
  • the substrate may be transparent or opaque. If the concavo-convex pattern substrate obtained from this substrate is used for manufacturing an organic EL element, the substrate is preferably a substrate having heat resistance, light resistance to UV light, and the like.
  • a substrate made of an inorganic material such as glass, quartz, or a silicon substrate is more preferable.
  • the substrate is formed of an inorganic material because a difference in refractive index between the substrate and the concavo-convex structure layer is small and unintended refraction and reflection in the optical substrate can be prevented.
  • a surface treatment or an easy-adhesion layer may be provided on the substrate, or a gas barrier layer may be provided for the purpose of preventing the ingress of gases such as moisture and oxygen.
  • the substrate may have an optical function layer having various optical functions such as light collection and light diffusion on the surface opposite to the surface on which the concavo-convex structure layer is formed.
  • any coating method such as a bar coating method, a spin coating method, a spray coating method, a dip coating method, a die coating method, and an ink jet method can be used as a coating method for the sol-gel material.
  • the bar coating method, die coating method and spin coating method are preferred because the material can be applied uniformly and the application can be completed quickly before the sol-gel material gels.
  • the desired concavo-convex pattern made of a sol-gel material is formed in a later step, the surface of the substrate (including the surface treatment and the easy adhesion layer) may be flat, and the substrate itself may have the desired concavo-convex pattern. Has no pattern.
  • the film thickness of the applied sol-gel material may be, for example, 100 to 500 nm.
  • the substrate After applying the sol-gel material, the substrate may be held in the air or under reduced pressure in order to evaporate the solvent in the coating film (hereinafter also referred to as “sol-gel material layer” as appropriate). If this holding time is short, the viscosity of the coating film becomes too low to transfer the uneven pattern in the subsequent pressing step, and if the holding time is too long, the polymerization reaction of the precursor proceeds and the viscosity of the coating film is high. Thus, the uneven pattern cannot be transferred in the pressing step. Further, after the application of the sol-gel material, the polymerization reaction of the precursor proceeds with the progress of the evaporation of the solvent, and the physical properties such as the viscosity of the sol-gel material change in a short time.
  • the drying time range in which the pattern transfer can be satisfactorily wide is sufficiently wide. It can be adjusted by the amount of solvent used at the time of material preparation (concentration of sol-gel material) or the like.
  • the concavo-convex structure layer is formed by transferring the concavo-convex pattern of the film mold to the sol-gel material layer using the film member manufactured by the above-described method and manufacturing apparatus as a film mold for transferring the concavo-convex pattern.
  • the mold may be pressed against the sol-gel material layer using a pressing roll.
  • the time for contact between the mold and the coating film is short compared to the press type, so that pattern breakage due to differences in the thermal expansion coefficients of the mold, the substrate, and the stage on which the substrate is installed is prevented.
  • the substrate may be heated while pressing the mold.
  • the film-shaped mold 80a is fed by feeding the film-shaped mold 80a between the pressing roll 122 and the substrate 10 conveyed immediately below. Can be transferred to the sol-gel material layer 12 on the substrate 10.
  • the film-shaped mold 80a when the film-shaped mold 80a is pressed against the sol-gel material layer 12 by the pressing roll 122, the film-shaped mold 80a is conveyed on the surface of the sol-gel material layer 12 on the substrate 10 while the film-shaped mold 80a and the substrate 10 are conveyed synchronously. Cover. At this time, the film-shaped mold 80a and the substrate 10 are brought into close contact with each other by rotating while pressing the pressing roll 122 against the back surface of the film-shaped mold 80a (the surface opposite to the surface on which the concavo-convex pattern is formed). In order to feed the strip-shaped film-shaped mold 80a toward the pressing roll 122, it is convenient to unwind and use the film-shaped mold 80a as it is from the film roll around which the strip-shaped film-shaped mold 80a is wound.
  • the sol-gel material layer may be temporarily fired.
  • pre-firing the gelation of the sol-gel material layer is promoted, the pattern is solidified, and it is difficult to collapse during peeling.
  • pre-baking it is preferably heated in the atmosphere at a temperature of 40 to 150 ° C. Note that the preliminary firing is not necessarily performed.
  • the mold is peeled off from the sol-gel material layer.
  • a known peeling method can be employed as a mold peeling method.
  • the mold may be peeled off while heating, whereby the gas generated from the sol-gel material layer can be released, and bubbles can be prevented from being generated in the sol-gel material layer.
  • the peeling force may be smaller than that of a plate mold used in the press method, and the mold can be easily peeled from the sol-gel material layer without the sol-gel material layer remaining in the mold.
  • the sol-gel material layer is pressed while being heated, the reaction easily proceeds, and the mold is easily peeled off from the sol-gel material layer immediately after pressing.
  • the peeling roll 123 is provided on the downstream side of the pressing roll 122, and the film-like mold 80 a is rotated and supported while being urged by the peeling roll 123 against the sol-gel material layer 12.
  • the state attached to the layer (coating film) 12 can be maintained only for the distance between the pressing roll 122 and the peeling roll 123 (a fixed time). Then, by changing the course of the film mold 80a so that the film mold 80a is pulled up above the peeling roll 123 on the downstream side of the peeling roll 123, the film mold 80a is pulled from the sol-gel material layer 12 on which the irregularities are formed. It is peeled off.
  • the sol-gel material layer 12 may be temporarily fired or heated during the period in which the film-shaped mold 80a is attached to the sol-gel material layer 12.
  • the mold 80a can be more easily peeled by peeling while heating to 40 to 150 ° C., for example.
  • the sol-gel material layer may be cured, thus forming an uneven structure layer.
  • the sol-gel material layer can be cured by the main baking.
  • the main baking is preferably performed at a temperature of 200 to 1200 ° C. for about 5 minutes to 6 hours.
  • the sol-gel material layer is cured to obtain a substrate having a concavo-convex pattern corresponding to the concavo-convex pattern of the mold, that is, a substrate in which a concavo-convex structure layer made of a sol-gel material is directly formed on a flat substrate.
  • the concavo-convex structure layer is made of silica, it becomes amorphous or crystalline, or a mixed state of amorphous and crystalline depending on the firing temperature and firing time.
  • an energy ray such as ultraviolet rays or excimer UV is irradiated to the concavo-convex structure layer when transferring the concavo-convex pattern.
  • the concavo-convex structure layer may be cured by.
  • the surface of the concavo-convex structure layer may be subjected to a hydrophobic treatment.
  • a known method may be used for the hydrophobizing treatment.
  • the surface is silica, it can be hydrophobized with dimethyldichlorosilane, trimethylalkoxysilane, or the like, or trimethylsilyl such as hexamethyldisilazane.
  • a method of hydrophobizing with an agent and silicone oil may be used, or a surface treatment method of metal oxide powder using supercritical carbon dioxide may be used.
  • the surface of the concavo-convex structure layer hydrophobic, moisture can be easily removed from the substrate in the manufacturing process when the concavo-convex pattern substrate manufactured by the manufacturing method of the embodiment is used for manufacturing a device such as an organic EL element. It is possible to prevent the occurrence of defects such as dark spots in the organic EL element and the deterioration of the device.
  • the sol-gel material is used as the material of the concavo-convex structure layer, but a curable resin material may be used in addition to the above-described inorganic material.
  • a curable resin for example, a resin such as photo-curing and thermosetting, moisture-curing type, and chemical-curing type (two-component mixing) can be used. Specifically, epoxy, acrylic, methacrylic, vinyl ether, oxetane, urethane, melamine, urea, polyester, polyolefin, phenol, cross-linkable liquid crystal, fluorine, silicone, polyamide And various resins such as monomers, oligomers and polymers.
  • a gas barrier layer may be provided on the surface of the concavo-convex structure layer for the purpose of preventing the entry of gas such as moisture and oxygen.
  • a concavo-convex structure layer using a curable resin for example, by applying a curable resin to a substrate and then curing the coating film while pressing a mold having a fine concavo-convex pattern on the applied curable resin layer
  • the concavo-convex pattern of the mold can be transferred to the curable resin layer.
  • the curable resin may be applied after being diluted with an organic solvent.
  • an organic solvent used in this case a solvent capable of dissolving the uncured resin can be selected and used.
  • the curable resin can be selected from known solvents such as alcohol solvents such as methanol, ethanol and isopropyl alcohol (IPA), and ketone solvents such as acetone, methyl ethyl ketone and methyl isobutyl ketone (MIBK).
  • solvents such as alcohol solvents such as methanol, ethanol and isopropyl alcohol (IPA), and ketone solvents such as acetone, methyl ethyl ketone and methyl isobutyl ketone (MIBK).
  • solvents such as alcohol solvents such as methanol, ethanol and isopropyl alcohol (IPA)
  • ketone solvents such as acetone, methyl ethyl ketone and methyl isobutyl ketone (MIBK).
  • MIBK isobutyl ketone
  • the method for applying the curable resin include spin coating, spray coating, dip coating, dropping, gravure printing, screen printing, letterpress printing, die coating, curtain coating
  • the irradiation amount is preferably in the range of 20 mJ / cm 2 to 5 J / cm 2 .
  • a silane coupling agent as a material of an uneven structure layer.
  • RSiX 3 R is selected from a vinyl group, a glycidoxy group, an acrylic group, a methacryl group, an amino group, and a mercapto group.
  • An organic functional group containing at least one selected from the above, and X is a halogen element or an alkoxyl group).
  • methods for applying the silane coupling agent include spin coating, spray coating, dip coating, dropping, gravure printing, screen printing, letterpress printing, die coating, curtain coating, ink jet, and sputtering. Various coating methods such as a method can be employed. Thereafter, a cured film can be obtained by drying under appropriate conditions according to each material. For example, heat drying may be performed at 100 to 150 ° C. for 15 to 90 minutes.
  • the material of the concavo-convex structure layer may be an inorganic material or a curable resin material containing an ultraviolet absorbing material.
  • the ultraviolet absorbing material has an action of suppressing deterioration of the film by absorbing ultraviolet rays and converting light energy into a harmless form such as heat.
  • As the ultraviolet absorber conventionally known ones can be used. For example, a benzotriazole-based absorbent, a triazine-based absorbent, a salicylic acid derivative-based absorbent, a benzophenone-based absorbent, or the like can be used.
  • the coating apparatus and coating method of this invention the manufacturing apparatus and manufacturing method of the film member which has an uneven
  • the manufacturing method is not limited to the above embodiment, and can be appropriately modified within the scope of the technical idea described in the claims.
  • the coating apparatus and the film member manufacturing apparatus of the present invention are not limited to the configuration of the above-described embodiment, and the arrangement of various elements such as a transport roll may be different from the arrangement shown in the drawings of the present application.
  • the liquid non-carrying region when the liquid carrying region and the liquid non-carrying region are formed on the outer peripheral surface of the coating roll, the liquid non-carrying region may have a flat surface or is liquid repellent. May be.
  • the liquid non-carrying region may be a recess with respect to the liquid carrying region.
  • membrane formed with the coating device of this invention may be a film
  • the non-application region forming mechanism includes a pattern mask applying unit and a pattern mask peeling unit, and further forms a non-application region continuous in the film substrate transport direction on the film substrate.
  • the transport direction non-coating region forming mechanism is located upstream of the coating roll in the transport direction of the film base and the coating film forming surface of the film base.
  • a tape-shaped mask peeling part which peels from the substrate.
  • the transport direction non-application area forming mechanism is located upstream of the coating roll in the transport direction of the film base material and applies a liquid repellent material on the coating film forming surface of the film base material.
  • a liquid material application part may be included.
  • the application roll includes the transport direction non-application area forming mechanism, and the transport direction non-application area formation mechanism is formed on the outer peripheral surface of the application roll and is continuous in the circumferential direction of the application roll. You may include the above liquid carrying area
  • the said coating liquid supply member contains the said conveyance direction non-application area
  • region formation mechanism is arrange
  • a coating liquid supply chamber may be included.
  • the coating portion may be formed using a coating roll carrying an unevenness forming material on the outer peripheral surface.
  • the tension of the film base material may be kept constant while the film base material is being transported.
  • a transfer roll in which a thin plate mold having a concavo-convex pattern is wound around a base roll, and ends of the thin plate mold are joined together on the outer peripheral surface of the base roll. May be provided.
  • the thin plate mold may be a metal mold, and the metal mold may be produced by an electroforming method.
  • the thin plate mold in the step of preparing the transfer roll, may be a film resin mold. Moreover, the joint portion of the thin plate mold may be filled with resin.
  • the thin plate-shaped mold may have two or more mold plates, and in the transfer roll, the ends of the mold plates may be connected to each other on the outer peripheral surface of the base roll.
  • the film member manufacturing apparatus of the present invention may include a tension control unit for keeping the tension of the film base material constant while the film base material is being transported. Furthermore, a movement mechanism for moving the film substrate relative to the unevenness forming material may be provided, the film substrate may be brought into contact with the unevenness forming material by the moving mechanism, and the film substrate may be separated from the unevenness forming material.
  • the coating device and the film member having a concavo-convex pattern according to the present invention can be used for various applications, for example, for manufacturing organic EL elements, optical filters, microlens arrays, prism arrays, optical waveguides, LEDs, and flat panel displays.
  • anti-fogging substrates water-repellent substrates, hydrophilic substrates, paper manufacturing, food manufacturing, DNA separation chips, immunoanalytical chips, cell culture sheets, nanobiodevices, etc.
  • various electronic devices in particular, semiconductor integrated circuits, flat screens, micro electro mechanical systems (MEMS), sensor elements, optical disks, high-density memory disks and other magnetic recording media, nano devices, optical devices, liquid crystal display thin film transistors, It can also be used for organic transistors, color filters, overcoat layers, pillar materials, rib materials for liquid crystal alignment, microlens arrays, microreactors, photonic liquid crystals, and the like.
  • MEMS micro electro mechanical systems
  • the coating apparatus of the present invention can form a coating film having a discontinuous pattern on a substrate by a simpler method. Furthermore, the film member which has the uneven
  • a substrate having a concavo-convex pattern such as an optical substrate manufactured by using the manufactured film member as a flexible mold is excellent in heat resistance, weather resistance, and corrosion resistance, and is also used in a manufacturing process of an element incorporating the optical substrate. There is resistance, and the lifetime of these elements can be extended. Therefore, such a board
  • substrate can be used suitably for various uses, such as an organic EL element and a solar cell.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)

Abstract

L'invention concerne un dispositif d'application qui forme un revêtement sur une surface de formation de revêtement d'un substrat de film en ruban et qui comprend : un cylindre d'application qui colle un matériau de revêtement sur la surface périphérique externe et qui pivote ; un élément fournissant un revêtement liquide qui amène le revêtement sur le cylindre d'application ; une unité d'acheminement d'un substrat de film qui achemine le substrat en continu, tout en faisant en sorte que la surface de formation de revêtement du substrat de film soit en contact avec le cylindre d'application ; et un mécanisme de formation d'une zone sans application qui forme une zone exempte d'application qui se poursuit dans au moins un sens sur le substrat de film. Le dispositif d'application est capable de former un revêtement ayant un motif discontinu sur le substrat par un procédé simple.
PCT/JP2014/078882 2013-11-01 2014-10-30 Dispositif d'application pour former un revêtement à motif discontinu sur un substrat de film en ruban, et procédé de fabrication d'un substrat de film en ruban à motif inégal WO2015064685A1 (fr)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
JP2013-228452 2013-11-01
JP2013228452A JP2015085659A (ja) 2013-11-01 2013-11-01 凹凸パターンを有する帯状のフィルム部材の製造方法及び製造装置
JP2014058353A JP2015181979A (ja) 2014-03-20 2014-03-20 帯状のフィルム基材の長手方向及び幅方向において不連続な塗膜を形成できる塗布装置及び塗膜形成方法
JP2014058393A JP2015181981A (ja) 2014-03-20 2014-03-20 帯状のフィルム基材上に不連続なパターンを有する塗膜を形成するための塗布装置及び塗膜形成方法
JP2014-058264 2014-03-20
JP2014058264A JP6157391B2 (ja) 2014-03-20 2014-03-20 帯状のフィルム基材上に不連続な塗膜を形成するための塗布装置及び塗布方法
JP2014-058393 2014-03-20
JP2014-058353 2014-03-20

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GB2559960A (en) * 2017-02-16 2018-08-29 Jetronica Ltd A system for applying a masking material to a substrate
CN111834583A (zh) * 2019-04-18 2020-10-27 住友化学株式会社 电池用隔膜的制造系统及制造方法
CN113926641A (zh) * 2021-11-22 2022-01-14 安徽华烨特种材料有限公司 浸胶增强材料表面除胶方法
US11241708B2 (en) 2019-04-12 2022-02-08 Airbus Operations Gmbh Device for lacquer transfer
US11267014B2 (en) 2019-03-29 2022-03-08 Airbus Operations Gmbh Device for lacquer transfer
US11331688B2 (en) 2019-03-29 2022-05-17 Airbus Operations Gmbh Device for lacquer transfer
US11369987B2 (en) 2019-03-29 2022-06-28 Airbus Operations Gmbh Device and system
US11413650B2 (en) 2019-04-11 2022-08-16 Airbus Operations Gmbh Lacquer transfer device
US11504739B2 (en) 2019-03-29 2022-11-22 Airbus Operations Gmbh Device for lacquer transfer
US11666935B2 (en) * 2018-11-15 2023-06-06 Hewlett-Packard Development Company, L.P. Selectively lifting substrates

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KR101816838B1 (ko) * 2016-07-08 2018-01-09 주식회사 기가레인 나노 임프린트용 레플리카 몰드, 그 제조방법 및 나노 임프린트용 레플리카 몰드 제조장치
JP7094240B2 (ja) * 2019-04-01 2022-07-01 ユニ・チャーム株式会社 吸収性物品を製造する方法
CN113613798A (zh) * 2020-03-04 2021-11-05 株式会社东芝 能用于形成器件的涂敷方法以及涂敷装置
CN113103776B (zh) * 2021-04-09 2022-05-27 福建省铭兴激光科技有限公司 一种制辊方法
CN113967560B (zh) * 2021-12-23 2022-03-04 广州雅策锐设备制造有限公司 一种锂电池涂布设备
CN117183578B (zh) * 2023-11-03 2024-01-26 博感科技(江苏)有限公司 一种可伸缩印刷基材的定位检测方法及印刷方法

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CN111834583A (zh) * 2019-04-18 2020-10-27 住友化学株式会社 电池用隔膜的制造系统及制造方法
CN113926641A (zh) * 2021-11-22 2022-01-14 安徽华烨特种材料有限公司 浸胶增强材料表面除胶方法

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