WO2015029622A1 - ラジカル重合型接着剤組成物、及び電気接続体の製造方法 - Google Patents
ラジカル重合型接着剤組成物、及び電気接続体の製造方法 Download PDFInfo
- Publication number
- WO2015029622A1 WO2015029622A1 PCT/JP2014/068781 JP2014068781W WO2015029622A1 WO 2015029622 A1 WO2015029622 A1 WO 2015029622A1 JP 2014068781 W JP2014068781 W JP 2014068781W WO 2015029622 A1 WO2015029622 A1 WO 2015029622A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- radical polymerization
- adhesive layer
- adhesive composition
- photoacid generator
- thermal radical
- Prior art date
Links
- 238000010526 radical polymerization reaction Methods 0.000 title claims abstract description 91
- 239000000203 mixture Substances 0.000 title claims abstract description 86
- 239000000853 adhesive Substances 0.000 title claims abstract description 71
- 230000001070 adhesive effect Effects 0.000 title claims abstract description 71
- 238000004519 manufacturing process Methods 0.000 title claims description 19
- 150000001875 compounds Chemical class 0.000 claims abstract description 51
- 239000007870 radical polymerization initiator Substances 0.000 claims abstract description 27
- 150000001451 organic peroxides Chemical group 0.000 claims abstract description 17
- 239000002253 acid Substances 0.000 claims abstract description 15
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical class I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 claims abstract description 5
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium group Chemical group [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 claims abstract description 4
- 239000012790 adhesive layer Substances 0.000 claims description 46
- 238000010438 heat treatment Methods 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 18
- -1 iron arene Chemical class 0.000 claims description 17
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- 239000012933 diacyl peroxide Substances 0.000 claims description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 4
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- 239000003822 epoxy resin Substances 0.000 description 3
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- LWNGJAHMBMVCJR-UHFFFAOYSA-N (2,3,4,5,6-pentafluorophenoxy)boronic acid Chemical compound OB(O)OC1=C(F)C(F)=C(F)C(F)=C1F LWNGJAHMBMVCJR-UHFFFAOYSA-N 0.000 description 2
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
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- 239000010931 gold Substances 0.000 description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Natural products OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 2
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- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- MCVVDMSWCQUKEV-UHFFFAOYSA-N (2-nitrophenyl)methyl 4-methylbenzenesulfonate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)OCC1=CC=CC=C1[N+]([O-])=O MCVVDMSWCQUKEV-UHFFFAOYSA-N 0.000 description 1
- DLDWUFCUUXXYTB-UHFFFAOYSA-N (2-oxo-1,2-diphenylethyl) 4-methylbenzenesulfonate Chemical compound C1=CC(C)=CC=C1S(=O)(=O)OC(C=1C=CC=CC=1)C(=O)C1=CC=CC=C1 DLDWUFCUUXXYTB-UHFFFAOYSA-N 0.000 description 1
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- 229930185605 Bisphenol Natural products 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 235000005633 Chrysanthemum balsamita Nutrition 0.000 description 1
- 244000260524 Chrysanthemum balsamita Species 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- AMFGWXWBFGVCKG-UHFFFAOYSA-N Panavia opaque Chemical compound C1=CC(OCC(O)COC(=O)C(=C)C)=CC=C1C(C)(C)C1=CC=C(OCC(O)COC(=O)C(C)=C)C=C1 AMFGWXWBFGVCKG-UHFFFAOYSA-N 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical class C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 1
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
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- 230000015572 biosynthetic process Effects 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
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- 125000000524 functional group Chemical group 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
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- 150000002432 hydroperoxides Chemical class 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J4/00—Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
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- C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/10—Esters
- C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
- C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
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- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/14—Peroxides
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J4/00—Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J5/00—Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J5/00—Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers
- C09J5/06—Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers involving heating of the applied adhesive
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L24/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/40—Additional features of adhesives in the form of films or foils characterized by the presence of essential components
- C09J2301/416—Additional features of adhesives in the form of films or foils characterized by the presence of essential components use of irradiation
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2433/00—Presence of (meth)acrylic polymer
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2471/00—Presence of polyether
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
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- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
- H01L2224/16227—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation the bump connector connecting to a bond pad of the item
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
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- H01L2224/2919—Material with a principal constituent of the material being a polymer, e.g. polyester, phenolic based polymer, epoxy
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
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- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
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- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
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- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
- H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/832—Applying energy for connecting
- H01L2224/83201—Compression bonding
- H01L2224/83203—Thermocompression bonding, e.g. diffusion bonding, pressure joining, thermocompression welding or solid-state welding
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
- H01L2224/8385—Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester
- H01L2224/83855—Hardening the adhesive by curing, i.e. thermosetting
- H01L2224/83874—Ultraviolet [UV] curing
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L24/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
Definitions
- the present invention relates to a radical polymerization type adhesive composition containing a radical polymerizable compound, a thermal radical polymerization initiator, and a photoacid generator.
- an electrical connection body After superposing an electrical component such as a liquid crystal panel or an organic EL panel and another electrical component such as an IC chip or a flexible substrate via an uncured adhesive layer formed from a curable adhesive composition, It is widely performed to manufacture an electrical connection body by curing an uncured adhesive layer to form a cured adhesive layer. In this case, if excessive heating is performed to cure the uncured adhesive layer, the electrical connection body may be warped or the electrical component may be damaged. For this reason, as a curable adhesive composition, a cationic photopolymerizable adhesive composition in which a photoacid generator is mixed as a cationic photopolymerization initiator with a cationically polymerizable compound such as an epoxy compound is used. Yes.
- the photocation polymerization type adhesive composition is blended with a thermal radical polymerizable compound such as an acrylate monomer or oligomer and a thermal radical polymerization initiator such as an organic peroxide to impart thermosetting properties.
- a thermal radical polymerizable compound such as an acrylate monomer or oligomer
- a thermal radical polymerization initiator such as an organic peroxide
- the heating temperature at the time of thermocompression bonding when conducting conductive connection using a curable adhesive composition as disclosed in Patent Document 1 is an electrical connection created using the curable adhesive composition.
- the temperature is generally 130 to 180 ° C.
- thermocompression treatment when thermocompression treatment is performed at such a temperature, there is a problem that warpage that cannot be ignored in practice occurs in the electrical connection body. For this reason, it is conceivable to lower the heating temperature to about 100 ° C. However, since the thermosetting reaction becomes insufficient, the light-shielding portion is not sufficiently cured, resulting in an increase in conduction resistance value or die shear strength. There is concern that it will cause a decline.
- An object of the present invention is to solve the above-described problems of the conventional technology, and an electrical component such as a liquid crystal panel or an organic EL panel and another electrical component such as an IC chip or a flexible substrate are bonded to each other.
- the electrical connection body is manufactured by superposing the uncured adhesive layer formed from the adhesive composition and then curing the uncured adhesive layer to form a cured adhesive layer. Even if there is a light-shielding part such as a metal wiring in an electrical component, it will not cause a warp that is not negligible in practical use in the electrical connection body, and it will be possible to realize sufficient die shear strength and low conduction resistance value. is there.
- the present inventors have always used a photoacid generator, which is a photocationic polymerization initiator, integrally with a cationically polymerizable compound, so that a radically polymerizable compound, a thermal radical polymerization initiator, a cationically polymerizable compound, and a photopolymerizable compound.
- a photoacid generator which is a photocationic polymerization initiator, integrally with a cationically polymerizable compound, so that a radically polymerizable compound, a thermal radical polymerization initiator, a cationically polymerizable compound, and a photopolymerizable compound.
- the present invention includes radical polymerization that contains a radical polymerizable compound, a thermal radical polymerization initiator, and a photoacid generator, and does not contain a cation polymerizable compound that is cationically polymerized by the acid generated by the photoacid generator.
- a mold adhesive composition is provided.
- the present invention also includes a step of disposing an adhesive layer on the terminal of one of the two electrical components to be opposed to each other, Placing the terminals of the other electrical component on the adhesive layer; While pressing one of the two electrical components facing each other toward the other, heating and irradiating the adhesive layer, the adhesive layer is cured and the two electrical components disposed facing each other
- the adhesive layer is formed from the above-mentioned radical polymerization type adhesive composition, Provided a manufacturing method for curing an adhesive layer by generating an acid from a photoacid generator by light irradiation when curing the adhesive layer, thereby promoting a thermal radical polymerization reaction of the radical polymerization type adhesive composition To do.
- the present invention includes a step of disposing an adhesive layer on a terminal of one of the two electrical components to be opposed to each other, Placing the terminals of the other electrical component on the adhesive layer; While pressing one of the two electrical components facing each other toward the other, heating and irradiating the adhesive layer, the adhesive layer is cured and the two electrical components disposed facing each other
- the adhesive layer is formed from the above-mentioned radical polymerization type adhesive composition, A manufacturing method in which heating to the adhesive layer is performed at a temperature lower than the thermal radical polymerization reaction temperature of the radical polymerization control composition corresponding to the radical polymerization adhesive composition from which the photoacid generator has been removed. provide.
- the radical polymerization type adhesive composition of the present invention contains a radical polymerizable compound, a thermal radical polymerization initiator, and a photoacid generator, and is cationically polymerizable that undergoes cationic polymerization with an acid generated by the photoacid generator. Contains no compounds. For this reason, the acid generated by the photoacid generator by light irradiation is not consumed for the cationic polymerization of the cationic polymerizable compound, and consequently promotes the thermal radical polymerization reaction of the radical polymerization type adhesive composition. Is possible.
- the thermal radical polymerization reaction of the radical polymerization adhesive composition is a radical polymerization control composition (corresponding to the radical polymerization adhesive composition in which the photoacid generator is further removed from the radical polymerization adhesive composition). It is possible to promote the thermal radical polymerization reaction (corresponding to the compositions of Comparative Examples 2 and 3 described later). This is presumably because the acid generated from the photoacid generator by light irradiation accelerates the decomposition of the thermal radical polymerization initiator.
- the radical polymerization type adhesive composition of the present invention contains a radical polymerizable compound, a thermal radical polymerization initiator, and a photoacid generator, and is cationically polymerizable that undergoes cationic polymerization with an acid generated by the photoacid generator.
- a compound, specifically, an epoxy compound, an oxetane compound, or a vinyl ether compound is not contained.
- the radical polymerizable compound constituting the radical polymerization type adhesive composition of the present invention is a compound capable of undergoing radical polymerization reaction with active radicals generated by thermal decomposition of a thermal radical polymerization initiator, preferably one or more in the molecule. It has a carbon unsaturated bond, and includes so-called monofunctional radical polymerizable compounds and polyfunctional radical polymerizable compounds.
- the radical polymerizable compound contains a polyfunctional radical polymerizable compound, the die shear strength of the cured product of the radical polymerization adhesive composition can be further improved. Therefore, the radically polymerizable compound preferably contains at least 30% by mass of the polyfunctional radically polymerizable compound, more preferably at least 50% by mass.
- Examples of the monofunctional radical polymerizable compound include monofunctional vinyl compounds such as styrene and methylstyrene, and monofunctional (meth) acrylate compounds such as butyl acrylate and butyl methacrylate.
- monofunctional vinyl compounds such as styrene and methylstyrene
- monofunctional (meth) acrylate compounds such as butyl acrylate and butyl methacrylate.
- (meth) acrylate” is a term including acrylate and methacrylate.
- Polyfunctional radical polymerizable compounds include polyfunctional vinyl compounds such as divinylbenzene, 1,6-hexanediol diacrylate, trimethylolpropane trimethacrylate, bisphenol A glycidyl methacrylate (EA-1020, Shin-Nakamura Chemical Co., Ltd.) And polyfunctional (meth) acrylate compounds such as isocyanuric acid EO-modified diacrylate (M-215, Toagosei Co., Ltd.). These may be monomers or oligomers. Of these, polyfunctional (meth) acrylate compounds, particularly bisphenol A-type glycidyl methacrylate and isocyanuric acid EO-modified diacrylate are preferable from the viewpoint of heat resistance.
- the polyfunctional radically polymerizable compound may be composed of a polyfunctional vinyl compound and a polyfunctional (meth) acrylate compound.
- the thermal radical polymerization initiator constituting the radical polymerization type adhesive composition of the present invention generates an active radical for radical polymerization of a radical polymerizable compound by thermal decomposition, and is a known thermal radical polymerization initiator.
- an organic peroxide or an azo compound can be preferably used.
- an organic peroxide can be preferably used from the viewpoint that excellent storage stability and low-temperature rapid curability can be realized.
- an organic peroxide known as a thermal radical polymerization initiator for example, from the viewpoint of chemical structural classification, diacyl peroxide, peroxydicarbonate, peroxyester, peroxyketal, dialkyl peroxide is used. Examples thereof include oxides, hydroperoxides, and silyl peroxides. Among these, peroxyesters and diacyl peroxides can be preferably used from the viewpoint that less organic acid is generated after thermal decomposition. From the viewpoint of half-life temperature for 1 minute, a temperature of 80 to 170 ° C. is preferable from the viewpoint of reactivity, and from the viewpoint of molecular weight, a temperature of 180 to 1000 is preferable.
- azo compound a known azo compound can be used as a thermal radical polymerization initiator.
- the amount of the thermal radical polymerization initiator in the radical polymerization adhesive composition is such that the radical polymerization compound 100 is sufficiently cured to prevent the radical polymerization adhesive composition from curing and cause foaming.
- the amount is preferably 0.5 to 30 parts by mass, more preferably 1.0 to 20 parts by mass with respect to parts by mass.
- the photoacid generator constituting the radical polymerization type adhesive composition of the present invention generates acid when irradiated with light such as ultraviolet rays, and promotes decomposition of the thermal radical polymerization initiator.
- the photoacid generator has the property of promoting the thermal radical polymerization reaction of the radical polymerization type adhesive composition. More specifically, the thermal radical polymerization reaction of the radical polymerization adhesive composition is carried out using a radical polymerization control composition corresponding to the radical polymerization adhesive composition in which the photoacid generator is further removed from the radical polymerization adhesive composition. It is possible to promote the thermal radical polymerization reaction.
- thermal radical polymerization reaction temperature T 0 of containing no photoacid generator radical polymerization type control composition thermal radical polymerization reaction temperature T 1 of the radical polymerization type adhesive composition containing a photoacid generator, It will be low.
- the thermal radical polymerization reaction temperature is a reaction temperature necessary for realizing the desired characteristics of the polymer, and is set according to the type of the polymerization system components, the blending ratio thereof, the desired characteristics, etc. Polymerization reaction temperature.
- the thermal radical polymerization reaction temperature T 0 of the radical polymerization control composition containing no photoacid generator is preferably in the range of 100 to 130 ° C.
- the thermal radical polymerization reaction temperature T 1 of the radical polymerization type adhesive composition containing the photoacid generator is preferably 10 ° C. or more lower than T 0 .
- Such a photoacid generator can be appropriately selected from photoacid generators used as a photocationic polymerization initiator, and is an onium salt such as an aromatic diazonium salt; an aromatic sulfonium salt, an aliphatic sulfonium.
- Sulfonium salts such as salts; pyridinium salts; selenonium salts; iodonium salts such as aromatic iodonium salts; complex compounds including metal arene complexes such as iron arene complexes; tosylate compounds such as benzoin tosylate and o-nitrobenzyl tosylate Etc.
- sulfonium salts iodonium salts, and iron arene complexes can be preferably mentioned because they can improve the generation efficiency of cationic species.
- an aromatic sulfonium salt that reacts with high sensitivity to I-line (365 nm) from an LED light source as light specifically, a triarylsulfonium salt can be preferably exemplified.
- the photoacid generator is a salt
- hexafluoroborate, hexafluorophosphate, tetrafluoroborate, tetrakis (pentafluorophenyl) borate are used as counter anions constituting the salt from the viewpoint of improving reactivity.
- Etc. can be preferably employed.
- tetrakis (pentafluorophenyl) borate can be preferably employed.
- the blending amount of the photoacid generator in the radical polymerization type adhesive composition is preferably 1.0 to 30 parts by mass, more preferably 2 to 20 parts by mass with respect to 100 parts by mass of the thermal radical polymerization initiator. If it is this range, the effect of promoting decomposition
- the radical polymerization type adhesive composition of the present invention can further contain a thermoplastic resin such as a phenoxy resin as a film-forming resin.
- the blending amount of such a thermoplastic resin is preferably 10 to 70 parts by mass, more preferably 20 to 60 parts by mass with respect to 100 parts by mass of the radical polymerizable compound.
- the radical polymerization type adhesive composition of the present invention can contain a known silane coupling agent.
- the blending amount of the silane coupling agent is preferably 0.1 to 20 parts by mass, more preferably 0.5 to 10 parts by mass with respect to 100 parts by mass of the radical polymerizable compound. If it is this range, the effect that the adhesiveness with respect to an inorganic and metal type material will improve is acquired.
- the radical polymerization type adhesive composition of the present invention can contain a known radical photopolymerization initiator, an inorganic filler, an organic filler, a conductive filler, an insulating filler, etc., if necessary.
- the radical polymerization type adhesive composition of the present invention includes a radical polymerizable compound, a thermal radical polymerization initiator, a photoacid generator, and other components such as a thermoplastic resin blended as necessary. It can prepare by mixing uniformly by the mixing means.
- Part 1 The method for manufacturing an electrical connection body according to the present invention (part 1) includes the following steps (a) to (c). Below, it demonstrates for every process.
- An adhesive layer is disposed on a terminal of one of the two electrical components to be disposed to face each other according to a known technique.
- a rigid circuit board, a flexible wiring board, etc. are mentioned as one of the two electric components which should be arrange
- these terminals include pad electrodes, line electrodes, and bump electrodes formed from electrode materials such as copper, aluminum, silver, gold, and ITO.
- the adhesive layer is formed from the radical polymerization type adhesive composition of the present invention described above. Such an adhesive layer can be formed by using a known method, for example, various coating methods, printing methods, and photolithographic techniques.
- the terminal of the other electrical component is placed on the adhesive layer formed in the step (A) according to a known method.
- the other electrical component include an IC chip, a liquid crystal panel, an organic EL panel, an IC module, and a solar cell module.
- these terminals include pad electrodes, line electrodes, and bump electrodes formed from electrode materials such as copper, aluminum, silver, gold, and ITO.
- the adhesive layer is heated while pressing one of the two electric components opposed to each other with a known heating and pressing tool. Simultaneously with this heating or waiting for softening or melting of the composition, after the heating is started, the heating is continued, preferably after 2 or 3 seconds, light such as ultraviolet rays, preferably the I-line of the LED light source is applied to the adhesive layer. It is irradiated with light to cure the adhesive layer.
- light irradiation to the adhesive layer is performed from the other side of the transparent substrate of the electrical component. Is preferred.
- An electrical connector is obtained by curing in this way.
- an acid is generated from the photoacid generator by light irradiation, whereby the thermal radical polymerization of the radical polymerization adhesive composition is equivalent to the radical polymerization adhesive composition from which the photoacid generator is removed.
- the adhesive layer is cured by accelerating the thermal radical polymerization of the radical polymerization control composition.
- the manufacturing method (part 2) of the electrical connection body of the present invention has the same steps as steps (a) to (c) of the manufacturing method (part 1).
- the adhesive layer is heated. Clarify the specific heating conditions to be performed at a temperature lower than the thermal radical polymerization reaction temperature of the radical polymerization control composition corresponding to the radical polymerization adhesive composition from which the photoacid generator is further removed. It differs in that it is. Since heat curing is performed at a temperature lower than the thermal radical polymerization reaction temperature T 0, it is possible to suppress the warpage of the electric bonded body, and the heat radical of the radical polymerization type adhesive composition is generated by the acid generated by the photoacid generator.
- the polymerization reaction temperature T 1 is lower than T 0, it can be sufficiently cured, and the two electric components arranged opposite to each other can be connected with a low conductive resistance value. In addition, good die shear strength can be achieved, and warpage of the electrical connection body can be suppressed.
- the obtained adhesive sheet is provided with an IC (outside dimension: 1.8 mm ⁇ 20 mm, bump height 15 ⁇ m) as an evaluation base, and a 200 ⁇ m wide 500 nm-thick aluminum line electrode (light-shielding portion) on the back surface at a pitch of 200 ⁇ m.
- the die shear strength of the created electrical connection body was measured using a die shear tester (universal bond tester series 4000, Daisy Japan Co., Ltd.) under the condition of a tool speed of 100 ⁇ m / second. The obtained results are shown in Table 1. Practically, it is desired to be 100 kgf or more.
- the adhesive composition of Comparative Example 2 containing a radical polymerizable compound contains an organic peroxide but does not contain a photoacid generator. Therefore, it is considered that the reaction start temperature of the adhesive composition cannot be lowered. Therefore, since sufficient radical reaction (curing reaction) does not proceed under the heating condition of 100 ° C., the conduction resistance value is very high and the die shear strength is very low.
- the adhesive composition of Comparative Example 3 containing a radical polymerizable compound contains an organic peroxide but does not contain a photoacid generator. Therefore, it is considered that the reaction start temperature of the adhesive composition cannot be lowered. Therefore, the corresponding radical reaction (curing reaction) finally progressed under the heating condition of 160 ° C., and the conduction resistance value became a practical level, but the die shear strength was insufficient. Furthermore, since the strength heating temperature was too high, warpage that could not be ignored occurred in the electrical connection body.
- the adhesive composition of Comparative Example 4 containing a radical polymerizable compound contains a radical photopolymerization initiator, it contains neither a photoacid generator nor an organic peroxide. Accordingly, although photo radical polymerization proceeds, since photo radical polymerization does not proceed at the light-shielding portion, the conduction resistance value and the amount of warpage are at a practical level, but the die shear strength is insufficient.
- the adhesive composition of Comparative Example 5 containing a radical polymerizable compound contains both an organic peroxide and a photoacid generator, but contains an epoxy resin as a cationic polymerizable compound. For this reason, the photoacid generator is consumed in the cationic polymerization of the epoxy resin and cannot sufficiently contribute to the promotion of the decomposition of the organic peroxide, resulting in a decrease in the reaction initiation temperature of the adhesive composition. I can't. Therefore, since sufficient radical reaction (curing reaction) does not proceed under the heating condition of 100 ° C., the conduction resistance value is very high and the die shear strength is very low.
- the adhesive compositions of Examples 1 to 10 containing a radical polymerizable compound contain both an organic peroxide and a photoacid generator, but do not contain an epoxy resin as a cationic polymerizable compound. .
- sufficient radical reaction proceeds even under heating conditions of 100 ° C. or 90 ° C., the conduction resistance value, the die shear strength, and the warpage amount were practical levels.
- the radical polymerization type adhesive composition of the present invention contains a radical polymerizable compound, a thermal radical polymerization initiator, and a photoacid generator, and is cationically polymerizable that undergoes cationic polymerization with an acid generated by the photoacid generator. Contains no compounds. Therefore, the thermal radical polymerization reaction temperature is lower than the thermal radical polymerization reaction temperature of the radical polymerization control composition corresponding to the radical polymerization adhesive composition obtained by removing the photoacid generator.
- the radical polymerization type adhesive composition of the present invention has a low conductive resistance value, a good die shear strength, and an electrical connection body produced by connecting electrical components having a light-shielding portion at the joint portion, This is useful for realizing a small amount of warpage.
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Abstract
Description
前記接着剤層に、他方の電気部品の端子を配置する工程と、
対向配置された二つの電気部品の一方を他方に向かって押圧しながら、接着剤層に対し加熱と光照射とを行うことにより接着剤層を硬化させて対向配置された二つの電気部品同士を電気的に接続する工程と
を有する電気接続体の製造方法において、
当該接着剤層が、上述のラジカル重合型接着剤組成物から形成されたものであって、
接着剤層の硬化の際、光照射により光酸発生剤から酸を発生させ、それによりラジカル重合型接着剤組成物の熱ラジカル重合反応を促進させて接着剤層の硬化を行う製造方法を提供する。
前記接着剤層に、他方の電気部品の端子を配置する工程と、
対向配置された二つの電気部品の一方を他方に向かって押圧しながら、接着剤層に対し加熱と光照射とを行うことにより接着剤層を硬化させて対向配置された二つの電気部品同士を電気的に接続する工程と
を有する電気接続体の製造方法において、
当該接着剤層が、上述のラジカル重合型接着剤組成物から形成されたものであって、
接着剤層に対する加熱を、当該ラジカル重合型接着剤組成物から光酸発生剤が取り除かれているものに相当するラジカル重合型対照組成物の熱ラジカル重合反応温度よりも低い温度で行う製造方法を提供する。
本発明のラジカル重合型接着剤組成物は、ラジカル重合性化合物と、熱ラジカル重合開始剤と、光酸発生剤とを含有し、該光酸発生剤が発生する酸によりカチオン重合するカチオン重合性化合物、具体的にはエポキシ化合物、オキセタン化合物、ビニルエーテル化合物を含有しないものである。
本発明のラジカル重合型接着剤組成物を構成するラジカル重合性化合物は、熱ラジカル重合開始剤の熱分解により生ずる活性ラジカルによりラジカル重合反応し得る化合物であり、好ましくは分子内に1個以上の炭素不飽和結合を有するものであり、いわゆる単官能ラジカル重合性化合物、多官能ラジカル重合性化合物を包含する。ラジカル重合性化合物が、多官能ラジカル重合性化合物を含有した場合には、ラジカル重合型接着剤組成物の硬化物のダイシェア強度をより向上させることが可能となる。従って、ラジカル重合性化合物は、多官能ラジカル重合性化合物を好ましくは少なくとも30質量%以上、より好ましくは少なくとも50質量%以上含有する。
本発明のラジカル重合型接着剤組成物を構成する熱ラジカル重合開始剤は、熱分解により、ラジカル重合性化合物をラジカル重合するための活性ラジカルを発生するものであり、公知の熱ラジカル重合開始剤、例えば、有機過酸化物やアゾ系化合物等を好ましく使用することができる。中でも、優れた保存安定性と低温速硬化性とを実現可能である点から、有機過酸化物を好ましく使用することができる。
本発明のラジカル重合型接着剤組成物を構成する光酸発生剤は、紫外線などの光の照射を受けると酸を発生し、熱ラジカル重合開始剤の分解を促進するものである。換言すれば、光酸発生剤は、ラジカル重合型接着剤組成物の熱ラジカル重合反応を促進させる性質を有するものである。より具体的には、ラジカル重合型接着剤組成物の熱ラジカル重合反応を、当該ラジカル重合型接着剤組成物から更に光酸発生剤が取り除かれているものに相当するラジカル重合型対照組成物の熱ラジカル重合反応よりも促進させることが可能となる。
本発明のラジカル重合型接着剤組成物は、更に、フェノキシ樹脂等の熱可塑性樹脂を成膜用樹脂として含有することができる。このような熱可塑性樹脂の配合量は、ラジカル重合性化合物100質量部に対し、好ましくは10~70質量部、より好ましくは20~60質量部である。
本発明のラジカル重合型接着剤組成物は、ラジカル重合性化合物と、熱ラジカル重合開始剤と、光酸発生剤と、必要に応じて配合される熱可塑性樹脂等の他の成分とを、公知の混合手段により均一に混合することにより調製することができる。
本発明の電気接続体の製造方法(その1)は、以下の工程(イ)~(ハ)を有する。以下に工程毎に説明する。
対向配置されるべき二つの電気部品の一方の電気部品の端子上に、公知の手法に従って接着剤層を配置する。ここで、対向配置されるべき二つの電気部品の一方としては、リジッド回路基板、フレキシブル配線基板等が挙げられる。それらの端子としては、銅、アルミニウム、銀、金、ITO等の電極材料から形成されたパッド電極、ライン電極、バンプ電極等が挙げられる。また、接着層は、前述した本発明のラジカル重合型接着剤組成物から形成されたものである。かかる接着層の形成は、公知の手法、例えば、各種塗布法や印刷法、更にはフォトリソグラフ技術などを利用して行うことができる。
次に、工程(イ)で形成された接着剤層に、他方の電気部品の端子を公知の手法に従って配置する。他方の電気部品としては、ICチップ、液晶パネル、有機ELパネル、ICモジュール、太陽電池モジュール等が挙げられる。それらの端子としては、銅、アルミニウム、銀、金、ITO等の電極材料から形成されたパッド電極、ライン電極、バンプ電極等が挙げられる。
工程(ロ)において対向配置された二つの電気部品の一方を他方に向かって、公知の加熱加圧ツールを用いて押圧しながら、接着剤層に対し加熱を行う。この加熱と同時に若しくは組成物の軟化若しくは溶融を待って、加熱開始後、加熱を継続しながら好ましくは2、3秒後から接着剤層に対し紫外線等の光、好ましくはLED光源のI線を用いて光照射を行い、接着剤層を硬化させる。ここで、少なくとも一方の電気部品が透明基板の片面に遮光部となり得る金属端子が形成されたものである場合、接着剤層への光照射を、電気部品の透明基板の他面側から行うことが好ましい。このように硬化させることにより電気接続体が得られる。この際、光照射により光酸発生剤から酸を発生させ、それによりラジカル重合型接着剤組成物の熱ラジカル重合を、当該ラジカル重合型接着剤組成物から光酸発生剤を取り除いたものに相当するラジカル重合型対照組成物の熱ラジカル重合よりも促進させて接着剤層の硬化を行う。これにより、遮光部が存在したとしても接着剤層を十分に硬化させることができ、対向配置された二つの電気部品同士を低い導電抵抗値で接続することができる。しかも、良好なダイシェア強度を実現することができ、また、電気接続体に反りが発生することを抑制することができる。
本発明の電気接続体の製造方法(その2)は、製造方法(その1)の工程(イ)~(ハ)と同様の工程を有するが、工程(ハ)において、接着剤層に対する加熱を、当該ラジカル重合型接着剤組成物から更に光酸発生剤が取り除かれているものに相当するラジカル重合型対照組成物の熱ラジカル重合反応温度よりも低い温度で行うという具体的な加熱条件を明示している点で異なる。熱ラジカル重合反応温度T0よりも低い温度で加熱硬化を行うので、電気接合体の反りの発生を抑制でき、しかも光酸発生剤が発生する酸により、ラジカル重合型接着剤組成物の熱ラジカル重合反応温度T1がT0よりも低くなっているので、十分に硬化させることが可能となり、対向配置された二つの電気部品同士を低い導電抵抗値で接続することができる。しかも、良好なダイシェア強度を実現することができ、また、電気接続体に反りが発生することを抑制することができる。
表1に示す配合組成の成分を常法にて混合して得た混合物(接着剤組成物)を剥離ポリエステルフィルムに塗布し、70℃で乾燥することにより、20μm厚の接着シートを得た。
得られた接着シートを、評価基材としてのIC(外寸:1.8mm×20mm、バンプ高さ15μm)と、裏面に200μm巾の500nm厚のアルミニウムライン電極(遮光部)を200μmピッチで設けたベースガラス基板としてのITOコーティングガラス(ガラス厚0.5mm、ITO厚200nm)との間に挟み、表1の加熱温度、80MPaの圧力、5秒間という条件でICを加熱加圧し、加熱開始2秒後に表1のUV照射条件(UV光源:UV照射器ZUV-C30H(オムロン(株))でUV照射を、ガラス基板の裏面側(アルミニウムライン電極形成面側)から3秒間行うことにより、試験評価用の電気接続体を作成した。
作成した電気接続体に2mAの電流を流した際の当該電気接続体の導通抵抗値を、抵抗測定機(デジタルマルチメータ7555、横河電機(株))を用いて4端子法にて測定した。得られた結果を表1に示す。実用上、1.0Ω以下であることが望まれる。
作成した電気接続体のダイシェア強度を、ダイシェアテスター(万能型ボンドテスターシリーズ4000、デイジ・ジャパン(株))を用いて、ツール速度100μm/秒という条件で測定した。得られた結果を表1に示す。実用上、100kgf以上であることが望まれる。
作成した電気接続体のガラス基板のアルミニウムライン電極形成面を、触針式表面粗度計(SE-3H、(株)小坂研究所)のプローブで走査し、反り量(μm)を測定した。得られた結果を表1に示す。実用上、10μm以下であることが望まれる。
ラジカル重合性化合物を含有する比較例1のラジカル重合型接着剤組成物は、光酸発生剤を含有するものの、有機過酸化物(熱ラジカル重合開始剤)を含有していない。このため、ラジカル反応(硬化反応)が進行しないために、導通抵抗値も非常に高く、またダイシェア強度も非常に低いものであった。
Claims (10)
- ラジカル重合性化合物と、熱ラジカル重合開始剤と、光酸発生剤とを含有し、該光酸発生剤が発生する酸によりカチオン重合するカチオン重合性化合物を含有しないラジカル重合型接着剤組成物。
- 光酸発生剤は、ラジカル重合型接着剤組成物の熱ラジカル重合反応を促進させる性質を有している請求項1記載のラジカル重合型接着剤組成物。
- 熱ラジカル重合開始剤が有機過酸化物であり、光酸発生剤がスルホニウム塩、ヨードニウム塩又は鉄アレーン錯体である請求項1又は2記載のラジカル重合型接着剤組成物。
- 熱ラジカル重合開始剤である有機過酸化物が1分間半減期温度80~170℃且つ分子量180~1000のパーオキシエステル又はジアシルパーオキサイドであり、光酸発生剤がトリアリールスルホニウム塩である請求項3記載のラジカル重合型接着剤組成物。
- 対向配置されるべき二つの電気部品の一方の電気部品の端子上に、接着剤層を配置する工程と、
前記接着剤層に、他方の電気部品の端子を配置する工程と、
対向配置された二つの電気部品の一方を他方に向かって押圧しながら、接着剤層に対し加熱と光照射とを行うことにより接着剤層を硬化させて対向配置された二つの電気部品同士を電気的に接続する工程と
を有する電気接続体の製造方法において、
当該接着剤層が、請求項1~4のいずれかに記載のラジカル重合型接着剤組成物から形成されたものであって、
接着剤層の硬化の際、光照射により光酸発生剤から酸を発生させ、それによりラジカル重合型接着剤組成物の熱ラジカル重合反応を促進させて接着剤層の硬化を行う製造方法。 - 対向配置されるべき二つの電気部品の一方の電気部品の端子上に、接着剤層を配置する工程と、
前記接着剤層に、他方の電気部品の端子を配置する工程と、
対向配置された二つの電気部品の一方を他方に向かって押圧しながら、接着剤層に対し加熱と光照射とを行うことにより接着剤層を硬化させて対向配置された二つの電気部品同士を電気的に接続する工程と
を有する電気接続体の製造方法において、
当該接着剤層が、請求項1~4のいずれかに記載のラジカル重合型接着剤組成物から形成されたものであって、
接着剤層に対する加熱を、当該ラジカル重合型接着剤組成物から光酸発生剤が取り除かれているものに相当するラジカル重合型対照組成物の熱ラジカル重合反応温度よりも低い温度で行う製造方法。 - 少なくとも一方の電気部品が透明基板の片面に金属端子が形成されたものであり、接着剤層への光照射を、該電気部品の透明基板の他面側から行う請求項5又は6記載の製造方法。
- 接着剤層に対する加熱を行った後に、光照射を行う請求項5~7のいずれかに記載の製造方法。
- 熱ラジカル重合開始剤が有機過酸化物であり、光酸発生剤がスルホニウム塩、ヨードニウム塩又は鉄アレーン錯体である請求項5~8のいずれかに記載の製造方法。
- 熱ラジカル重合開始剤である有機過酸化物が1分間半減期温度80~170℃且つ分子量180~1000のパーオキシエステル又はジアシルパーオキサイドであり、光酸発生剤がトリアリールスルホニウム塩である請求項9記載の製造方法。
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