WO2015016041A1 - Filtre coloré, son procédé de production, composition durcissable colorée, élément d'imagerie à l'état solide et composition durcissable colorée et trousse - Google Patents

Filtre coloré, son procédé de production, composition durcissable colorée, élément d'imagerie à l'état solide et composition durcissable colorée et trousse Download PDF

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Publication number
WO2015016041A1
WO2015016041A1 PCT/JP2014/068565 JP2014068565W WO2015016041A1 WO 2015016041 A1 WO2015016041 A1 WO 2015016041A1 JP 2014068565 W JP2014068565 W JP 2014068565W WO 2015016041 A1 WO2015016041 A1 WO 2015016041A1
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Prior art keywords
colored
curable composition
colored curable
group
pixel
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PCT/JP2014/068565
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English (en)
Japanese (ja)
Inventor
和也 尾田
恭平 荒山
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富士フイルム株式会社
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Priority to KR1020157034956A priority Critical patent/KR20160005778A/ko
Priority to KR1020177030996A priority patent/KR101949774B1/ko
Publication of WO2015016041A1 publication Critical patent/WO2015016041A1/fr

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H01L27/14601—Structural or functional details thereof
    • H01L27/1462—Coatings
    • H01L27/14621—Colour filter arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144—Devices controlled by radiation
    • H01L27/146—Imager structures
    • H01L27/14683—Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
    • H01L27/14685—Process for coatings or optical elements

Definitions

  • the present invention relates to a color filter, a production method thereof, a colored curable composition, a solid-state imaging device, a colored curable composition, and a kit.
  • the color filter is an indispensable component for the display of a solid-state image sensor or liquid crystal display device.
  • a colored composition is employed (for example, Patent Documents 1 and 2).
  • FIG. 13 is a conceptual diagram showing an example of a conventional color filter manufacturing method, in which 200 is a color filter, 201 is a first colored pixel, 202 is a second colored pixel, 203 is a mask, Reference numeral 204 denotes a colored curable composition for forming a second colored pixel, and 205 denotes a residue of the second colored pixel.
  • a mask 203 having a predetermined pattern is formed.
  • the light irradiated through the first colored pixel 201 is reflected by the surface of the first colored pixel 201 without passing through the first colored pixel 201, and is reflected in a portion other than the portion that is to be irradiated with light in the colored curable composition 204. May be irradiated. As a result, an unnecessary curing reaction of the colored curable composition 204 occurs. As a result, a residue 205 of the colored curable composition 204 may be generated on the first colored pixel 201 and / or the second colored pixel 202 after the colored curable composition 204 is developed. all right.
  • This invention solves this problem, and it aims at providing the manufacturing method of the color filter which can suppress generation
  • the above problem can be solved by reducing the difference in refractive index between the colored curable compositions used in the first colored pixel and the second colored pixel.
  • the above-mentioned problem has been solved by the following means ⁇ 1>, preferably ⁇ 2> to ⁇ 18>.
  • ⁇ 1> a support, a first colored pixel formed on the support, and a second colored pixel adjacent to the first colored pixel, A color filter in which a difference in refractive index between a first colored pixel and a second colored pixel at a wavelength of 535 nm is 0.10 or less.
  • the first colored pixel or the second colored pixel includes at least one of inorganic particles and a resin having a refractive index of 1.60 or more, ⁇ 1> or ⁇ 2>, wherein the inorganic particles and the resin are included in the first colored pixel and the second colored pixel that have a smaller refractive index when the inorganic particles and the resin are not included.
  • Color filter is not included.
  • the first colored pixel or the second colored pixel contains inorganic particles
  • the color filter according to ⁇ 1> or ⁇ 2> wherein the inorganic particles are included in the first colored pixel and the second colored pixel that have a smaller refractive index when the inorganic particles and the resin are not included.
  • ⁇ 5> The color filter according to ⁇ 3>, wherein the phthalocyanine pigment is contained in the first colored pixel and the second colored pixel having a smaller refractive index in a state where the inorganic particles and the resin are not included.
  • ⁇ 6> The color filter according to any one of ⁇ 3> to ⁇ 5>, which contains at least one of titanium dioxide and zirconium oxide as inorganic particles.
  • ⁇ 7> forming a first colored pixel on the support using the first colored curable composition; Forming a second colored pixel adjacent to the first colored pixel by photolithography using the second colored curable composition; Have The manufacturing method of a color filter whose difference in refractive index in wavelength 535nm of the 1st colored curable composition and the 2nd colored curable composition is 0.10 or less.
  • ⁇ 8> The method for producing a color filter according to ⁇ 7>, wherein at least one of the first colored curable composition and the second colored curable composition contains a phthalocyanine pigment.
  • the first colored curable composition or the second colored curable composition contains at least one of inorganic particles and a resin having a refractive index of 1.60 or more, ⁇ 7>
  • the inorganic particles and the resin are included in the first colored curable composition and the second colored curable composition having a smaller refractive index in a state in which the inorganic particles and the resin are not included.
  • the phthalocyanine pigment is contained in the one having a smaller refractive index in the state containing no inorganic particles and the resin, ⁇ 9> The manufacturing method of the color filter of description.
  • the first colored curable composition contains at least one of inorganic particles and a resin having a refractive index of 1.60 or more, and The refractive index of the first colored curable composition in a state containing inorganic particles and the resin is higher than the refractive index of the first colored curable composition in a state not containing inorganic particles and the resin by 0.05 or more, ⁇ 7> The method for producing a color filter according to any one of ⁇ 11>.
  • ⁇ 13> A color filter obtained by the method for producing a color filter according to any one of ⁇ 7> to ⁇ 12>.
  • ⁇ 14> A solid-state imaging device having the color filter according to any one of ⁇ 1> to ⁇ 6> and ⁇ 13>.
  • ⁇ 15> A solid-state imaging device having a color filter obtained by the method for producing a color filter according to any one of ⁇ 7> to ⁇ 12>.
  • ⁇ 16> a colored curable composition comprising a colorant and at least one of a resin having an inorganic particle and a refractive index of 1.60 or more, A colored curable composition, wherein the refractive index of the colored curable composition is 0.05 or more higher than the refractive index in a state in which the inorganic particles and the resin are not included.
  • the colored curable composition according to ⁇ 16> which contains at least one of titanium dioxide and zirconium oxide as inorganic particles.
  • a first colored curable composition and a second colored curable composition A kit for producing a color filter, wherein a difference in refractive index between a first colored curable composition and a second colored curable composition at a wavelength of 535 nm is 0.10 or less.
  • FIG. 1 is a plan view schematically showing an example of the color filter of the present invention.
  • FIG. 2 is a conceptual diagram showing an example of a method for producing a color filter of the present invention.
  • FIG. 3 is a schematic cross-sectional view of the first colored layer.
  • FIG. 4 is a schematic cross-sectional view showing a state in which a photoresist layer is formed on the first colored layer.
  • FIG. 5 is a schematic cross-sectional view showing a state in which a resist pattern is formed on the first colored layer.
  • FIG. 6 is a schematic cross-sectional view showing a state in which a first colored pattern is formed by providing a removal portion group in the first colored layer by etching.
  • FIG. 7 is a schematic cross-sectional view showing a state where the resist pattern in FIG. 6 is removed.
  • FIG. 8 is a schematic cross-sectional view showing a state in which the second colored pattern and the second colored curable composition layer are formed.
  • FIG. 9 is a schematic cross-sectional view showing a state in which the second colored curable composition layer in FIG. 8 and a part of the second colored pixels constituting the second colored pattern have been removed.
  • FIG. 10 is a schematic cross-sectional view showing a state in which the third colored pattern and the third colored curable composition layer are formed.
  • FIG. 11 is a schematic cross-sectional view showing a state in which the third colored curable composition layer in FIG. 10 has been removed.
  • FIG. 12 is a schematic cross-sectional view illustrating a configuration example of a color filter and a solid-state imaging device.
  • FIG. 13 is a plan view schematically showing an example of a conventional color filter manufacturing method.
  • the contents of the present invention will be described in detail.
  • the description of the constituent elements described below may be made based on typical embodiments of the present invention, but the present invention is not limited to such embodiments.
  • “to” is used in the sense of including the numerical values described before and after it as lower and upper limits.
  • the notation which does not describe substitution and unsubstituted includes what has a substituent with what does not have a substituent.
  • the “alkyl group” includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
  • the “colored layer” means a pixel used for a color filter.
  • the pigment in this specification means, for example, an insoluble coloring compound that does not dissolve in a solvent.
  • the solvent includes the solvent exemplified in the solvent column described later. Therefore, the coloring compound which does not melt
  • a colored film formed on a substrate for example, a silicon substrate
  • a “colored radiation sensitive) layer” for example, a film formed on a substrate (for example, a silicon substrate) without dividing the region
  • the coloring formed by dividing the region into a pattern is referred to as a “colored pattern”.
  • a film for example, a film patterned in a stripe shape
  • a colored pattern is a component of a color filter that exists in a plurality of colored patterns.
  • the weight average molecular weight of the compound used in the present invention is defined as a polystyrene converted value by GPC measurement.
  • the weight average molecular weight is, for example, HLC-8220 (manufactured by Tosoh Corporation), TSKgel Super AWM-H (manufactured by Tosoh Corporation, 6.0 mm ID ⁇ 15.0 cm) as a column, and 10 mmol / L as an eluent. It can be determined by using a lithium bromide NMP (N-methylpyrrolidinone) solution.
  • the color filter of the present invention includes a substrate, a first colored pixel formed on the substrate, and a second colored pixel adjacent to the first colored pixel, and the first colored pixel and the second colored pixel.
  • the difference in refractive index of the colored pixel at 535 nm is 0.10 or less.
  • the difference in refractive index at the wavelength 535 nm between the first colored pixel and the second colored pixel in the color filter is 0.10 or less, thereby suppressing the generation of residue when forming the color filter. Can do.
  • the difference in refractive index between the first colored pixel and the second colored pixel at a wavelength of 535 nm is preferably 0.10 or less, more preferably 0.06 or less, and further preferably 0.02 or less. 0 is particularly preferable.
  • the refractive index of the first colored pixel at a wavelength of 535 nm is preferably 1.58 to 1.85, and more preferably 1.58 to 1.83.
  • the refractive index of the second colored pixel at a wavelength of 535 nm is not particularly limited as long as the difference in refractive index between the first colored pixel and the second colored pixel at a wavelength of 535 nm is 0.10 or less. .
  • the refractive index of the first colored pixel and the second colored pixel at a wavelength of 535 nm can be measured using, for example, an ellipsometer UVISEL / 460-FUV-AGAS (manufactured by Horiba, Ltd.).
  • the color filter of the present invention preferably includes, for example, at least a plurality of first colored pixels arranged two-dimensionally and a plurality of second colored pixels adjacent to the first colored pixels. It is more preferable to further have a plurality of third colored pixels adjacent to.
  • FIG. 1 is a plan view schematically showing an example of the color filter of the present invention.
  • the color filter 1 includes a first colored pixel 2, a second colored pixel 3, and a third colored pixel 6.
  • the color filter 1 includes a first colored pixel 2 formed in a checkered pattern, and a second colored pixel 3 and a third colored pixel 6 between the first colored pixels 2. It is preferable to be formed.
  • the 1st coloring pixel 2 is formed more than the 2nd coloring pixel 3 and the 3rd coloring pixel 6.
  • the first colored pixel 2 or the second colored pixel 3 contains at least one of inorganic particles and a resin having a refractive index of 1.60 or more (hereinafter also referred to as “high refractive resin”), and includes inorganic particles and high refractive resin. Is preferably included in the first colored pixel and the second colored pixel that have a smaller refractive index in a state where the inorganic particles and the high refractive resin are not included. In particular, it is preferable that a phthalocyanine pigment is further included in the first colored pixel and the second colored pixel that have a smaller refractive index in a state in which the inorganic particles and the high refractive resin are not included.
  • the first coloring pixel is a green pixel
  • the second coloring pixel is a red pixel
  • the first pixel includes at least one of inorganic particles and a high refractive resin
  • the second coloring It is preferable that the pixel does not substantially contain inorganic particles and high refractive resin, and the difference in refractive index between the first colored pixel and the second colored pixel at a wavelength of 535 nm is 0.10 or less.
  • the first colored pixel is a blue pixel
  • the second colored pixel is a green pixel
  • the first pixel includes at least one of inorganic particles and a high refractive resin
  • the second colored pixel is inorganic particles and It is preferable that the refractive index difference between the first colored pixel and the second colored pixel at a wavelength of 535 nm is substantially 0.10 or less without substantially containing a high refractive resin.
  • the inorganic particles and the high refractive resin will be described in detail later.
  • the second colored pixel substantially does not contain inorganic particles and a high refractive resin.
  • the total amount of the inorganic particles and the high refractive resin in the second colored pixel is 1% by mass or less. That is, it is preferably 0% by mass.
  • the color filter 1 preferably has a thickness of 1.0 ⁇ m or less, and preferably 0.8 ⁇ m or less.
  • the thickness of the first colored pixel 2 and the second colored pixel 3 is preferably 1.0 ⁇ m or less, and preferably 0.8 ⁇ m or less.
  • the length of one side of the first colored pixel 2 and the second colored pixel 3 (the length of one side when the pixel is a rectangle, the length of one side when the pixel is a square) Is preferably from 1.0 to 0.4 ⁇ m, more preferably from 0.8 to 0.4 ⁇ m from the viewpoint of image resolution.
  • the method for producing a color filter of the present invention includes a step of forming a first colored pixel on a support using a first colored curable composition, a first colored curable composition, and a first colored curable composition.
  • a step of forming a second colored pixel adjacent to the colored pixel by photolithography, and a difference in refractive index between the first colored curable composition and the second colored curable composition at a wavelength of 535 nm is 0. 10 or less.
  • the difference in refractive index between the first colored pixel and the second colored curable composition is the difference in refractive index between the first colored pixel and the second colored pixel, and the first colored curable property.
  • FIG. 2 is a conceptual diagram showing an example of a method for producing a color filter of the present invention.
  • the color filter 1 includes a first colored pixel 2 and a second colored pixel 3 adjacent to the first colored pixel 2.
  • the second colored pixel having the predetermined pattern is formed. According to the method for producing a color filter of the present invention, it is possible to suppress the generation of a residue of the second colored curable composition when forming the color filter 1.
  • the “residue of the second colored curable composition” means that the second colored curable composition is formed in addition to the desired portion.
  • the reason why the generation of the residue of the second colored curable composition is suppressed is estimated as follows. By reducing the refractive index difference between the first colored curable composition for forming the first colored pixel 2 and the second colored curable composition for forming the second colored pixel, When the second colored pixel 3 is formed, the light irradiated through the mask 4 is not reflected on the surface of the first colored pixel 2 without being transmitted to the first colored pixel 2.
  • the first colored pixel can be formed by dry etching or photolithography, and it is preferable to form the first colored pixel by dry etching.
  • the first colored layer 11 is formed from the first colored curable composition (step (A)).
  • the first colored layer 11 is preferably a green transmission layer. By making the first colored layer 11 a green transmissive layer, color sensitivity can be further improved. Details of the first colored curable composition will be described later.
  • the first colored layer 11 is formed by applying a first colored curable composition on a support by spin coating, slit coating, spray coating, spin coating, spin coating, cast coating, roll coating, or the like. It can be formed by applying and drying. In particular, it is preferable to apply by spin coating.
  • the support is not particularly limited as long as it is used for a color filter in addition to a silicon substrate. Examples of the support include soda glass, borosilicate glass, quartz glass used for liquid crystal display elements and the like, and those obtained by attaching a transparent conductive film to these, and photoelectric conversion element substrates used for solid-state imaging elements, for example, oxidation Examples thereof include a film and silicon nitride.
  • the thickness of the first colored layer 11 after drying is preferably in the range of 0.3 to 1 ⁇ m, more preferably in the range of 0.35 to 0.8 ⁇ m, and still more preferably in the range of 0.35 to 0.7 ⁇ m.
  • the first colored curable composition contains a thermosetting compound
  • a heating device such as a hot plate or an oven.
  • the heating temperature is preferably 90 to 250 ° C, more preferably 100 to 230 ° C.
  • the heating time varies depending on the heating means, but is usually about 3 to 30 minutes when heated on a hot plate, and usually about 30 to 90 minutes when heated in an oven.
  • step (B) patterning is performed by dry etching so that the removed portion group 120 is formed in the first colored layer 11 (step (B)).
  • the first colored pattern 12 is formed.
  • the first colored layer 11 is formed from the first colored curable composition, and then the first colored layer 11 is exposed and developed to provide the removal portion group 120 as compared with the case where the removed portion group 120 is provided.
  • the removal portion group 120 having a desired shape (particularly rectangular shape) can be more reliably formed.
  • Dry etching can be performed on the first colored layer 11 using an etching gas with the patterned photoresist layer 51 as a mask. For example, as shown in the schematic cross-sectional view of FIG. 4, first, a photoresist layer 51 is formed on the first colored layer 11.
  • a positive or negative colored curable composition (photoresist) is applied on the first colored layer 11 and dried to form the photoresist layer 51.
  • photoresist a positive or negative colored curable composition
  • a pre-bake treatment it is desirable to perform a heat treatment after exposure (PEB) and a heat treatment after development (post-bake treatment).
  • a positive colored curable composition is used as the photoresist.
  • positive type colored curable composition positive type photo sensitive to radiation such as ultraviolet rays (g rays, h rays, i rays), deep ultraviolet rays including excimer lasers, electron beams, ion beams and X rays.
  • a positive resist composition suitable for resist can be used.
  • the radiation g-line, h-line and i-line are preferable, and i-line is particularly preferable.
  • the positive colored curable composition is preferably a composition containing a quinonediazide compound and an alkali-soluble resin. Examples of the quinonediazide compound include a naphthoquinonediazide compound.
  • the thickness of the photoresist layer 51 after drying is preferably from 0.1 to 3 ⁇ m, more preferably from 0.2 to 2.5 ⁇ m, still more preferably from 0.3 to 2 ⁇ m.
  • the application of the photoresist layer 51 can be suitably performed by using a method for applying the first colored curable composition in the first colored layer 11.
  • the photoresist layer 51 is exposed and developed to form a resist pattern (patterned photoresist layer) 52 provided with a resist removal group 51A.
  • the formation of the resist pattern 52 is not particularly limited, and a conventionally known photolithography technique can be used.
  • the resist pattern 52 is provided on the first colored layer 11 by providing the resist removal portion group 51 ⁇ / b> A in the photoresist layer 51 by exposure and development.
  • the resist pattern 52 functions as an etching mask for subsequent etching.
  • the exposure of the photoresist layer 51 can be performed by exposing with a g-line, h-line, i-line, etc., preferably i-line, through a predetermined mask pattern.
  • the photoresist is removed in accordance with the region where the colored pattern is to be formed by developing with a developer.
  • a developer Any developer can be used as long as it does not affect the first colored layer 11 and dissolves the exposed portion of the positive resist and the uncured portion of the negative resist.
  • the developer for example, a combination of various organic solvents or an alkaline aqueous solution can be used.
  • an alkaline aqueous solution an alkaline aqueous solution prepared by dissolving an alkaline compound so as to have a concentration of 0.001 to 10% by mass, preferably 0.01 to 5% by mass is suitable.
  • Alkaline compounds include, for example, sodium hydroxide, potassium hydroxide, sodium carbonate, sodium oxalate, sodium metasuccinate, aqueous ammonia, ethylamine, diethylamine, dimethylethanolamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropyl Examples thereof include ammonium hydroxide, tetrabutylammonium hydroxide, trimethylbenzylammonium hydroxide, choline, pyrrole, piperidine, 1,8-diazabicyclo [5.4.0] -7-undecene and the like.
  • alkaline aqueous solution is used as a developing solution, generally a washing process is performed with water after development.
  • the removal unit group 120 is provided in a checkered pattern on the first colored layer 11.
  • the removal unit group 120 includes a plurality of removal units that are rectangular spaces, and each removal unit is arranged in a checkered pattern.
  • the first coloring pattern 12 in which the removal portion group 120 is provided in the first coloring layer 11 has a plurality of square-shaped first coloring pixels in a checkered pattern. In the first coloring pattern 12, a plurality of first coloring pixels and a plurality of removal portions are formed in a checkered pattern.
  • the removal unit group 120 includes a first removal unit group 121 and a second removal unit group 122.
  • the first removal unit group 121 and the second removal unit group 122 are alternately arranged with respect to the removal unit group 120 formed in a checkered pattern.
  • the first colored pattern 12 includes the first colored pixels, the removed portions included in the first removed portion group 121, the first colored pixels, A pattern in which the removal portion and the first colored layer included in the removal portion group 122 are arranged in this order is repeated.
  • dry etching include JP-A-59-126506, JP-A-59-46628, JP-A-58-9108, JP-A-58-2809, JP-A-57-148706, JP-A-61-41102, and the like. And the contents thereof are incorporated herein by reference.
  • Dry etching is preferably performed in the following manner from the viewpoint of forming a pattern cross section closer to a rectangle and reducing damage to the support.
  • a mixed gas of fluorine-based gas and oxygen gas (O 2 ) the first stage etching is performed up to a region (depth) where the support is not exposed, and after this first stage etching, nitrogen gas ( N 2 ) and oxygen gas (O 2 ), and a second stage etching is preferably performed to the vicinity of the region (depth) where the support is exposed, and over-etching is performed after the support is exposed.
  • N 2 nitrogen gas
  • O 2 oxygen gas
  • a second stage etching is preferably performed to the vicinity of the region (depth) where the support is exposed, and over-etching is performed after the support is exposed.
  • the form containing these is preferable.
  • a specific method of dry etching and the first stage etching, second stage etching, and over-etching will be described.
  • Dry etching is performed by obtaining etching conditions in advance by the following method.
  • (1) The etching rate (nm / min) in the first stage etching and the etching rate (nm / min) in the second stage etching are calculated respectively.
  • (2) The time for etching the desired thickness in the first stage etching and the time for etching the desired thickness in the second stage etching are respectively calculated.
  • (3) The first stage etching is performed according to the etching time calculated in (2) above.
  • the second stage etching is performed according to the etching time calculated in (2) above. Alternatively, the etching time may be determined by endpoint detection, and the second stage etching may be performed according to the determined etching time.
  • Overetching time is calculated with respect to the total time of (3) and (4) above, and overetching is performed.
  • the mixed gas used in the first stage etching step preferably contains a fluorine-based gas and an oxygen gas (O 2 ) from the viewpoint of processing the organic material that is the film to be etched into a rectangular shape.
  • the first step etching process can avoid damage to the support by etching to a region where the support is not exposed.
  • the second-stage etching process and the over-etching process are performed in the first-stage etching process after etching to a region where the support is not exposed by the mixed gas of fluorine-based gas and oxygen gas, and from the viewpoint of avoiding damage to the support. Therefore, it is preferable to perform the etching process using a mixed gas of nitrogen gas and oxygen gas.
  • the ratio between the etching amount in the first stage etching process and the etching amount in the second stage etching process is preferably in the range of more than 0% and not more than 50%. 10 to 20% is more preferable.
  • the etching amount is an amount calculated from the difference between the remaining film thickness to be etched and the film thickness before etching.
  • the etching preferably includes an over-etching process.
  • the overetching process is preferably performed by setting an overetching ratio. Moreover, it is preferable to calculate the overetching ratio from the etching process time to be performed first.
  • the over-etching ratio can be arbitrarily set, but it is preferably 30% or less of the etching processing time in the etching process, and preferably 5 to 25% from the viewpoint of etching resistance of the photoresist and maintaining the rectangularity of the pattern to be etched. Is more preferable.
  • the resist pattern (etching mask) 52 remaining after the etching is removed.
  • the removal of the resist pattern 52 includes a step of applying a stripping solution or a solvent to the resist pattern 52 so that the resist pattern 52 can be removed, and a step of removing the resist pattern 52 using cleaning water.
  • a step of applying a stripping solution or a solvent on at least the resist pattern 52 and stagnating for a predetermined time to perform paddle development can be included.
  • the resist pattern 52 may be removed by spraying cleaning water onto the resist pattern 52 from a spray type or shower type spray nozzle.
  • cleaning water pure water can be preferably used.
  • the injection nozzle include an injection nozzle in which the entire support is included in the injection range, and an injection nozzle that is a movable injection nozzle and in which the movable range includes the entire support.
  • the first colored pixel is formed by photolithography, it is preferable to form the first colored layer using the first colored curable composition, and to expose and develop the first colored layer.
  • the method for forming the first colored layer is synonymous with the case where the first colored pixel is formed by dry etching, and the preferred range is also the same.
  • radiation (light) that can be used for exposure ultraviolet rays such as g-line and i-line are particularly preferable (particularly preferably i-line).
  • Irradiation dose (exposure dose) is more preferably 30 ⁇ 3000mJ / cm 2 is preferably 50 ⁇ 2500mJ / cm 2, particularly preferably 100 ⁇ 500mJ / cm 2.
  • the developer described in the step of forming the first colored pixels described above can be used.
  • a development method for example, a method in which a substrate is immersed in a tank filled with a developer for a certain period of time (dip method), a method in which the developer is raised on the surface of the substrate by surface tension and is left stationary for a certain time (paddle) Method), a method of spraying the developer on the substrate surface (spray method), a method of continuously discharging the developer while scanning the developer discharge nozzle on the substrate rotating at a constant speed (dynamic dispensing method) Etc.
  • the paddle method is particularly preferable.
  • the development time is not particularly limited as long as the colored layer in the unexposed area is sufficiently dissolved, and is usually 10 to 300 seconds. Preferably, it is 20 to 120 seconds.
  • the temperature of the developer is preferably 0 to 50 ° C, more preferably 15 to 35 ° C.
  • Step of Forming Second Colored Pixel the second colored pixel adjacent to the first colored pixel is formed by photolithography using the second colored curable composition.
  • the number of steps can be reduced as compared with the case where all steps are performed by dry etching.
  • the second colored curable composition is used on the first colored pattern 12 by using the second colored curable composition. 21 layers are formed.
  • the second colored curable composition enters the removed portions of the first removed portion group 121 and the second removed portion group 122, and the second colored pattern 22 is formed in this portion.
  • the second colored curable composition is embedded in each of the removal portions in the first removal portion group 121 and the second removal portion group 122, and the first coloring pixel (that is, the first removal pixel group).
  • the second colored curable composition layer 21 is laminated with the second colored curable composition on the first colored pattern 12) in which the removed portion group 120 is formed on the colored layer 11 (step (C)). ).
  • the 2nd coloring pattern 22 which has a some 2nd coloring pixel in the removal part group 120 of the 1st coloring layer 11 is formed.
  • the second colored pixel is preferably a square pixel.
  • the second colored curable composition layer 21 can be formed in the same manner as the method for forming the first colored layer 11 described above.
  • the thickness of the second colored curable composition layer 21 after post-baking is preferably 0.1 to 1.5 ⁇ m, and more preferably 0.1 to 1.0 ⁇ m.
  • step (D) by exposing and developing the position 21A corresponding to the first removal portion group 121 of the second colored curable composition layer 21, the second colored curable composition layer 21 and the second removal
  • the plurality of second colored pixels 22 ⁇ / b> R provided inside each removal part of the part group 122 are removed (step (D)) (see the schematic cross-sectional view of FIG. 9).
  • the 2nd coloring pixel adjacent to the 1st coloring pixel is formed.
  • the radiation (light) that can be used for the exposure is the same as the development method described in the method for forming the first colored pixels by photolithography described above, and the preferable range is also the same.
  • the developer the developer described in the step of forming the first colored pixels described above can be used.
  • the developing method is synonymous with the developing method described in the method of forming the first colored pixel by photolithography described above, and the preferable range is also the same.
  • the development time is not particularly limited as long as the colored layer in the unexposed area is sufficiently dissolved, and is usually 10 to 300 seconds. Preferably, it is 20 to 120 seconds.
  • the temperature of the developer is preferably 0 to 50 ° C, more preferably 15 to 35 ° C.
  • the manufacturing method of the color filter of this invention may further have the process of forming a 3rd colored pixel after the process of forming a 2nd colored pixel.
  • the third colored curable composition is used on the first colored pattern 12 and the second colored pattern 22 as shown in the schematic sectional view of FIG. 3 colored curable composition layer 31 is formed.
  • the third colored curable composition enters the removed portion of the second removed portion group 122, and the third colored pattern 32 is formed in this portion.
  • the third colored curable composition is embedded in each removal portion in the second removal portion group 122, and the first colored pixel and the second colored pixel (that is, the first removal portion).
  • the third colored curable composition layer 31 is formed from the third colored curable composition on the first colored pattern 12 in which the second colored pattern 22 is formed in the group 121 (Step ( E)). Thereby, the 3rd coloring pattern 32 which has a some 3rd coloring pixel in the 2nd removal part group 122 of the 1st coloring layer 11 is formed.
  • the third colored pixel is preferably a square pixel.
  • the formation of the third colored curable composition layer 31 can be performed in the same manner as the step of forming the second colored curable composition layer 21 described above.
  • the thickness of the third colored curable composition layer 31 after post-baking is preferably in the range of 0.1 to 1 ⁇ m, more preferably in the range of 0.2 to 0.8, and 0.3 to 0.6 ⁇ m. A range is more preferred.
  • the third colored curable composition layer 31 is removed by exposing and developing the position 31A of the third colored curable composition layer 31 corresponding to the second removal portion group 122.
  • the color filter 100 having the first colored pattern 12, the second colored pattern 22, and the third colored pattern 32 is manufactured (step (F) )).
  • the first colored curable composition or the second colored curable composition contains at least one of inorganic particles and a high refractive resin, and contains inorganic particles and a high refractive resin.
  • the first colored curable composition that does not contain and the second colored curable composition that does not contain the inorganic particles and the high refractive resin, the one having a smaller refractive index contains at least one of the inorganic particles and the high refractive resin.
  • the “first (or second) colored curable composition in a state not containing inorganic particles and a high refractive resin” is inorganic from the composition constituting the first (or second) colored composition.
  • the first (or second) coloring composition is composed of “inorganic particles, a colorant, a pigment dispersion, and a curable compound”
  • the “first (or second) containing no inorganic particles” is used.
  • Cold curable composition means a composition comprising “colorant, pigment dispersion and curable compound”. It is preferable that one having a small refractive index when the inorganic particles and the high refractive resin are removed from the first colored curable composition and the second colored curable composition contains at least one of the inorganic particles and the high refractive resin. .
  • the inorganic particles and the high refractive resin are included in the first colored curable composition and the second colored curable composition having a smaller refractive index in a state where the inorganic particles and the high refractive resin are not included.
  • the first colored curable composition containing no inorganic particles and a high refractive resin has a smaller refractive index than the second colored curable composition containing no inorganic particles and a high refractive resin.
  • the colored curable composition preferably contains at least one of inorganic particles and a highly refractive resin.
  • at least one of the first colored curable composition and the second colored curable composition contains a phthalocyanine pigment.
  • the first colored curable composition and the second colored curable composition inorganic particles and the high refractive resin were removed from the first colored curable composition and the second colored curable composition.
  • the colored curable composition having a smaller refractive index preferably contains a phthalocyanine pigment in addition to at least one of the inorganic particles and the high refractive resin.
  • the difference in refractive index between the first colored curable composition and the second colored curable composition at a wavelength of 535 nm is preferably 0.10 or less, more preferably 0.06 or less, and It is more preferably 02 or less, and particularly preferably 0.
  • the first colored curable composition is a colored curable composition containing a colorant and at least one of inorganic particles and a highly refractive resin, and the refractive index of the colored curable composition is Further, the refractive index is 0.05 or more higher than the refractive index in the state not containing inorganic particles and high refractive resin.
  • the first colored curable composition can be used for pattern formation by dry etching or photolithography, and is preferably used for pattern formation by dry etching.
  • the first colored curable composition When the first colored curable composition is used for pattern formation by dry etching, the first colored curable composition comprises a colorant, at least one of inorganic particles and a high refractive resin, and polymerization as a curable compound. It is preferable to contain an ionic compound. Further, it may contain a solvent, a surfactant, a pigment dispersant and the like.
  • the first colored curable composition When the first colored curable composition is used for pattern formation by photolithography, the first colored curable composition includes a colorant, at least one of inorganic particles and a high refractive resin, an alkali-soluble resin, and a polymerization agent. It is preferable that an organic compound and a photoinitiator are included. Further, it may contain a solvent, a surfactant, a pigment dispersant and the like.
  • the first colored curable composition is preferably green. Hereinafter, each component of the first colored curable composition will be described in detail.
  • the inorganic particles used in the present invention preferably have a refractive index of 1.64 or more at a wavelength of 500 nm, more preferably 1.80 to 3.0, and 1.80 to 2.80. Is more preferable.
  • the weight average diameter of the primary particles of the inorganic particles is preferably 150 nm or less, more preferably 100 nm or less, and particularly preferably 80 nm or less. It is practical that the lower limit of the primary particles of the inorganic particles is 1 nm or more.
  • the weight average diameter of the inorganic particles in the colored pixel is preferably 200 nm or less, more preferably 150 nm or less, still more preferably 100 nm or less, and particularly preferably 80 nm or less. Although there is no lower limit in particular, 1 nm or more is preferable, 5 nm or more is more preferable, and 10 nm or more is further more preferable.
  • the particle size range of the primary particles is defined as a range different from the particle size range in the colored pixel is that the primary particles are aggregated in the colored pixel.
  • the refractive index measuring method of the substance which comprises inorganic particles is based on Japanese Industrial Standard (JIS K 0062: 1992).
  • Examples of inorganic particles include at least one element selected from Ti, Zr, Sn, Sb, Cu, Fe, Mn, Pb, Cd, As, Cr, Hg, Zn, Al, Mg, Si, P, and S And particles containing a metal oxide having Specifically, particles of titanium dioxide (TiO 2 ), tin oxide, indium oxide, zinc oxide, or zirconium oxide (ZrO 2 ) can be given. Among these, particles of titanium dioxide, tin oxide, indium oxide, or zirconium oxide are particularly preferable, and particles of titanium dioxide and zirconium oxide are more preferable.
  • the inorganic particles are mainly composed of oxides of these metals and can further contain other elements.
  • the main component means a component having the largest content (mass%) among the components constituting the particles.
  • examples of other elements include Ti, Zr, Sn, Sb, Cu, Fe, Mn, Pb, Cd, As, Cr, Hg, Zn, Al, Mg, Si, P, and S.
  • the crystal structure of the inorganic fine particles mainly composed of titanium dioxide is preferably a rutile, rutile / anatase mixed crystal, anatase or amorphous structure, and particularly preferably a rutile structure.
  • the inorganic particles are preferably surface-treated.
  • the surface treatment can be performed using an inorganic compound or an organic compound.
  • inorganic compounds used for the surface treatment include alumina, silica, zirconium oxide, and iron oxide. Of these, alumina and silica are preferable.
  • organic compound used for the surface treatment include polyols, alkanolamines, stearic acid, silane coupling agents, and titanate coupling agents.
  • an inorganic fine particle mainly composed of titanium dioxide contains at least one element selected from cobalt, aluminum, and zirconium.
  • the inorganic particles may be treated by combining two or more kinds of surface treatments.
  • the shape of the inorganic particles is preferably a rice grain shape, a spherical shape, a cubic shape, a spindle shape, or an indefinite shape.
  • the inorganic particles are preferably blended into the first colored curable composition and / or the second colored curable composition as a dispersion composition.
  • a dispersion composition for details, for example, the description in JP-A-2007-277514 can be referred to. It is particularly preferable to disperse using the dispersion resin described in Examples of JP-A-2007-277514.
  • the content of the inorganic particles in the first colored curable composition is 0.05 or more than the refractive index when the refractive index of the first colored curable composition does not include the inorganic particles and the high refractive resin. Higher amounts are preferred. Specifically, it is preferably 1.8 parts by mass or more and more preferably 2.0 parts by mass or more with respect to 100 parts by mass in total of the total solid content of the first colored curable composition. Although it does not specifically limit as an upper limit, 30 mass parts or less are preferable with respect to a total of 100 mass parts of total solid content of 1st colored curable composition, and, as for an upper limit, 20 mass parts or less are more preferable. 10 parts by mass or less is more preferable. Only one type of inorganic particles may be used, or two or more types may be used in combination. When using 2 or more types together, it is preferable that total amount satisfy
  • the high refractive resin means, for example, a resin having a refractive index of 1.60 or more at a wavelength of 500 nm, and the refractive index is preferably 1.60 to 2.00, more preferably 1.65 to 2.00. preferable.
  • the highly refractive resin preferably has a repeating unit having an aromatic ring group.
  • One type of repeating unit having an aromatic ring group may be used, or two or more types may be used.
  • the repeating unit having an aromatic ring group may have an aromatic ring group in the main chain, or may have an aromatic ring group in the side chain.
  • the aromatic ring group may be either an aromatic hydrocarbon group or an aromatic heterocyclic group, or may include both.
  • the aromatic ring group may be monocyclic or polycyclic, but is preferably polycyclic and more preferably a condensed aromatic ring group.
  • the condensed aromatic ring group is a group having two or more aromatic ring structures, and each ring has a structure sharing two or more atoms.
  • condensed aromatic hydrocarbon group for example, naphthyl group, acenaphthylenyl group, anthryl group, phenanthryl group, pyrenyl group, acephenanthrenyl group, aceanthrylenyl group, chrysenyl group, dibenzochrysenyl group, benzoanthryl group Group, dibenzoanthryl group, naphthacenyl group, picenyl group, pentacenyl group, fluorenyl group, 9,9-dihydroanthryl group, triphenylenyl group, perylenyl group, fluoranthenyl group, benzo [k] fluoranthenyl group, etc.
  • a naphthyl group is preferred.
  • the condensed aromatic heterocyclic group include indolyl group, quinolyl group, isoquinolyl group, phthalazinyl group, quinoxalinyl group, quinazolinyl group, carbazolyl group (including both 3-carbazolyl group and 9-carbazolyl group), acridinyl group, Examples include phenazinyl group, benzofuryl group, isothiazolyl group, isoxazolyl group, furazanyl group, phenoxazinyl group, benzothiazolyl group, benzoxazolyl group, benzimidazolyl group, benzotriazolyl group, pyranyl group, carbazolyl group, benzothiazolyl group, A benzoxazolyl group and a benzotriazolyl group are preferable, and a carbazolyl group is more preferable.
  • the repeating unit having a monocyclic aromatic ring group
  • the highly refractive resin preferably has a repeating unit represented by the formula (X).
  • R 1 represents a hydrogen atom or an alkyl group.
  • the alkyl group an alkyl group having 1 to 3 carbon atoms is preferable, and a methyl group is preferable.
  • L 1 represents a single bond or a divalent linking group. Examples of the divalent linking group include a divalent aliphatic hydrocarbon group (preferably having 1 to 8 carbon atoms), a divalent aromatic hydrocarbon group (preferably having 6 to 12 carbon atoms), —O—, —S.
  • A represents an aromatic ring group and has the same meaning as the aromatic ring group described above.
  • a in formula (X) may have a substituent, and examples of the substituent include an alkyl group, an aryl group, an alkenyl group, an alkynyl group, an alkoxy group, an aryloxy group, an alkylthioxy group, and an aryl group.
  • acyloxy group alkylsulfanyl group, arylsulfanyl group, alkylsulfinyl group, arylsulfinyl group, alkylsulfonyl group, arylsulfonyl group, acyl group, acyloxy group, alkoxycarbonyl group, amino group, phosphinoyl group, heterocyclic group Silyl ether group, thiol group, sulfonamide group, amide group, urea group, thiourea group, carboxyl group, urethane group, halogen atom, nitro group and the like.
  • the content of the repeating unit represented by the formula (X) is preferably 40 to 95% by mass, and more preferably 60 to 90% by mass with respect to all the repeating units in the high refractive resin.
  • the highly refractive resin preferably further has a repeating unit having an acid group in addition to the repeating unit having an aromatic ring group.
  • a repeating unit having an acid group By having a repeating unit having an acid group, the photolithography performance can be further improved.
  • the acid group include a carboxyl group, an active methylene group, a phosphoric acid group, a sulfonic acid group, a phenolic hydroxyl group, a carboxylic acid anhydride group, and the like, and a carboxyl group is preferable. These acid groups may be used alone or in combination of two or more.
  • the high refractive resin preferably has a repeating unit represented by the formula (Y) as a repeating unit having an acid group.
  • R 2 represents a hydrogen atom or an alkyl group.
  • the alkyl group is preferably an alkyl group having 1 to 3 carbon atoms, and specific examples include a methyl group.
  • L 2 represents a single bond or a divalent linking group.
  • the divalent linking group represented by L 2 has the same meaning as the divalent linking group represented by L 1 in formula (X), and the preferred range is also the same.
  • B represents the acid group described above.
  • the content of the repeating unit represented by the formula (Y) is preferably 5 to 60% by mass and more preferably 10 to 40% by mass with respect to all the repeating units in the high refractive resin.
  • the highly refractive resin preferably further has a repeating unit having a hydrophilic group in addition to the repeating unit having an aromatic ring group and the repeating unit having an acid group.
  • the hydrophilic group include a hydroxy group, an alkylene oxide group, a pyrrolidone group, a morpholine group, a 1,3-diketone group, an amino group, and an ammonium group, and a hydroxy group is preferable.
  • the alkylene oxide group a group represented by the following formula (W) is preferable. In the following formula (W), * represents a bonding position.
  • A represents an alkylene group (preferably an alkylene group having 2 or 3 carbon atoms)
  • R represents a hydrogen atom or an alkyl group (preferably an alkyl group having 1 or 2 carbon atoms)
  • n represents an integer of 1 or more (preferably an integer of 1 to 25).
  • the pyrrolidone group, morpholine group and 1,3-diketone group each represent the following group. Note that * represents a bonding position.
  • the amino group is a concept including primary, secondary, and tertiary amino groups, and a group represented by the following formula (P) is preferable.
  • R represents a hydrogen atom or an alkyl group each independently.
  • the highly refractive resin preferably has a repeating unit represented by the formula (Z) as a repeating unit having a hydrophilic group.
  • R 3 represents a hydrogen atom or an alkyl group.
  • An alkyl group is synonymous with the alkyl group represented by R ⁇ 1 > in Formula (X).
  • L 3 represents a single bond or a divalent linking group.
  • the divalent linking group represented by L 3 has the same meaning as the divalent linking group represented by L 1 in formula (X).
  • C represents the hydrophilic group described above.
  • the content of the repeating unit represented by the formula (Z) is preferably 5 to 80% by mass and more preferably 10 to 50% by mass with respect to all the repeating units in the high refractive resin.
  • the highly refractive resin can be produced, for example, by a known radical polymerization method.
  • Polymerization conditions such as temperature, pressure, type and amount of radical initiator, type of solvent, etc. when producing a high refractive resin by radical polymerization can be easily set by those skilled in the art, and experimental conditions are determined. It can also be done.
  • the following monomer hereinafter also referred to as monomer a
  • monomer a the following monomer (hereinafter also referred to as monomer a) can be used.
  • monomer b the following monomer (hereinafter also referred to as monomer b) can be used.
  • monomer c the following monomer (hereinafter also referred to as monomer c) can be used.
  • the high refractive resin include, but are not limited to, the exemplary resins described in Tables 1 and 2 below. Specifically, the exemplary resins 1 to 64 obtained by using the monomer a and the monomer b in the mass ratio described in Table 1 and the monomer a, the monomer b and the monomer c in the mass ratio described in Table 2 are used. Exemplified resins 65 to 118 obtained in this way are listed.
  • a compound having a repeating unit derived from a compound represented by the following general formula (ED) and / or a compound represented by the following general formula (ED2) (hereinafter, these compounds may be referred to as “ether dimer”).
  • ether dimer a compound having a repeating unit derived from a compound represented by the following general formula (ED) and / or a compound represented by the following general formula (ED2) (hereinafter, these compounds may be referred to as “ether dimer”).
  • ether dimer a compound having a repeating unit derived from a compound represented by the following general formula (ED) and / or a compound represented by the following general formula (ED2) (hereinafter, these compounds may be referred to as “ether dimer”).
  • R 1 and R 2 each independently represent a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms which may have a substituent.
  • the hydrocarbon group having 1 to 25 carbon atoms which may have a substituent represented by R 1 and R 2 includes an alkyl group substituted with alkoxy, an alkyl group substituted with an aryl group such as benzyl, and the like.
  • primary or secondary carbon substituents that are difficult to be removed by acid or heat such as a methyl group, an ethyl group, a cyclohexyl group, and a benzyl group, are preferable.
  • R represents a hydrogen atom or an organic group having 1 to 30 carbon atoms.
  • the description in JP 2010-168539 A can be referred to.
  • Specific examples of the ether dimer include specific examples of the ether dimer described in paragraph 0565 of JP2012-208494A (paragraph 0694 of the corresponding US Patent Application Publication No. 2012/235099). Is incorporated herein.
  • dimethyl-2,2 ′-[oxybis (methylene)] bis-2-propenoate, diethyl-2,2 ′-[oxybis (methylene)] bis-2-propenoate, dicyclohexyl-2,2 ′-[oxybis ( Methylene)] bis-2-propenoate, dibenzyl-2,2 ′-[oxybis (methylene)] bis-2-propenoate are preferred. Only one type of ether dimer may be used, or two or more types may be used.
  • the acid value is not particularly limited, but is preferably 30 to 200 mgKOH / g, more preferably 50 to 150 mgKOH / g, and further preferably 100 to 150 mgKOH / g.
  • the weight average molecular weight (Mw) of the high refractive resin is preferably 2000 or more, more preferably 5000 or more, and further preferably 7000 or more.
  • the upper limit is preferably 50000 or less, more preferably 30000 or less, and even more preferably 20000 or less.
  • the content of the high refractive resin in the first colored curable composition is 0.05 more than the refractive index in the state where the refractive index of the first colored curable composition does not include the inorganic particles and the high refractive resin. Higher amounts are preferred. Specifically, the content of the high refractive resin in the first colored curable composition is preferably 1% by mass or more and more preferably 2% by mass or more in the total solid content of the first colored curable composition. 3 mass% or more is more preferable. Only one type of high refractive resin may be used, or two or more types may be used in combination. When using 2 or more types together, it is preferable that total amount satisfy
  • the mass ratio of the high refractive resin in the first colored curable composition to a resin other than the high refractive resin is preferably 50:50 to 100: 0.
  • the highly refractive resin can also be used as a pigment or inorganic particle dispersant contained in the first pixel.
  • the first colored curable composition usually contains a colorant.
  • a colorant a dye and / or a pigment can be used, and a pigment is preferably used. Only one colorant may be used, or two or more colorants may be used in combination.
  • the pigment used in the first colored curable composition include a pigment for making the first colored curable composition green, for example, C.I. I. Pigment Green 7, 10, 36, 37, 58, or one or more selected from these green pigments, and C.I. I.
  • the pigment used in the first colored curable composition it is preferable to use a yellow pigment in combination with a green pigment.
  • the green pigment is C.I. which is a halogenated phthalocyanine pigment. I. One or more selected from Pigment Green 36 and 58 are preferred.
  • the yellow pigment is C.I. I. One or more selected from Pigment Yellow 139, 150, and 185 are preferred.
  • the pigment for making a 1st colored curable composition blue for example, C.I. I.
  • the blue pigment is phthalocyanine pigment C.I. I.
  • One or more selected from Pigment Blue 15, 15: 1, 15: 2, 15: 3, 15: 4, 15: 5, 15: 6, 16, 17: 1, 75, 79 are preferable.
  • the dye include, for example, JP-A No. 64-90403, JP-A No. 64-91102, JP-A No. 1-94301, JP-A No. 6-11614, No.
  • the first colored curable composition is made green or blue. It is preferable to use the dye.
  • the content of the colorant in the first colored curable composition is preferably 1 to 20 parts by mass with respect to 100 parts by mass in total of the total solid content of the first colored curable composition. It is more preferable that it is 10 mass parts.
  • Pigment dispersion When a pigment is used for preparing the composition of the present invention, it is usually used as a pigment dispersion. From the viewpoint of improving the dispersibility of the pigment, it is preferable to further add a pigment dispersant.
  • a pigment dispersant may be used independently and may be used in combination of 2 or more type. Examples of the pigment dispersant include polymer dispersants [for example, polyamidoamine and its salt, polycarboxylic acid and its salt, high molecular weight unsaturated acid ester, modified polyurethane, modified polyester, modified poly (meth) acrylate, (meth) acrylic.
  • the polymer dispersant can be further classified into a linear polymer, a terminal-modified polymer, a graft polymer, and a block polymer from the structure thereof.
  • the polymer dispersant acts to adsorb on the surface of the pigment and prevent reaggregation. Therefore, a terminal-modified polymer, a graft polymer and a block polymer having an anchor site to the pigment surface can be mentioned as preferred structures.
  • the pigment derivative has an effect of promoting the adsorption of the polymer dispersant by modifying the pigment surface.
  • the pigment dispersant that can be used in the present invention is also available as a commercial product. Specific examples of such a pigment dispersant include “Disperbyk-101 (polyamidoamine phosphate), 107 (carboxylic acid ester)”, 110 (manufactured by BYK Chemie).
  • Copolymer containing acid groups 130 (polyamide), 161, 162, 163, 164, 165, 166, 170 (polymer copolymer) "," BYK-P104, P105 (high molecular weight unsaturated polycarboxylic acid) ), EFKA 4047, 4050-4010-4165 (polyurethane type), EFKA 4330-4340 (block copolymer), 4400-4402 (modified polyacrylate), 5010 (polyesteramide), 5765 (high molecular weight polycarboxylic acid) Salt), 6220 (fatty acid polyester), 6745 Phthalocyanine derivatives), 6750 (azo pigment derivatives) ”,“ Ajisper PB821, PB822 ”manufactured by Ajinomoto Fan Techno,“ Floren TG-710 (urethane oligomer) ”manufactured by Kyoeisha Chemical Co.,“ Polyflow No.
  • the pigment dispersant preferably contains a monomer derived from an acid group.
  • the pigment dispersant contains a monomer derived from an acid group, when a colored pixel is formed by photolithography, a residue generated on the base of the colored pixel can be further reduced.
  • the monomer derived from an acid group include a vinyl monomer having a carboxyl group and a vinyl monomer having a sulfonic acid group.
  • vinyl monomer having a carboxyl group examples include (meth) acrylic acid, vinyl benzoic acid, maleic acid, maleic acid monoalkyl ester, fumaric acid, itaconic acid, crotonic acid, cinnamic acid, and acrylic acid dimer.
  • an addition reaction product of a monomer having a hydroxyl group such as 2-hydroxyethyl (meth) acrylate and a cyclic anhydride such as maleic anhydride, phthalic anhydride, succinic anhydride, cyclohexanedicarboxylic anhydride, ⁇ - Carboxy-polycaprolactone mono (meth) acrylate and the like can also be used.
  • anhydride containing monomers such as maleic anhydride, itaconic anhydride, and citraconic anhydride, as a precursor of a carboxyl group.
  • monomers having a hydroxyl group such as 2-hydroxyethyl (meth) acrylate and maleic anhydride, phthalic anhydride, succinic anhydride, cyclohexanedicarboxylic anhydride from the viewpoint of developing removability of unexposed areas.
  • An addition reaction product with a cyclic anhydride such as
  • Examples of the vinyl monomer having a sulfonic acid group include 2-acrylamido-2-methylpropanesulfonic acid, and examples of the vinyl monomer having a phosphoric acid group include phosphoric acid mono (2-acryloyloxyethyl ester) and phosphoric acid mono (1-methyl-2-acryloyloxyethyl ester) and the like. Etc. are preferred.
  • the content of the pigment dispersant in the composition of the present invention is preferably 1 to 80 parts by weight, more preferably 5 to 70 parts by weight, with respect to 100 parts by weight of the pigment as the colorant. More preferably, it is part by mass.
  • the first colored curable composition may further contain, for example, a solvent, a curable compound, a surfactant, a photopolymerization initiator, an alkali-soluble resin, and the like.
  • ⁇ solvent >>>> Only one type of solvent may be used, or two or more types may be used in combination. Examples of solvents include esters such as ethyl acetate, n-butyl acetate, isobutyl acetate, amyl formate, isoamyl acetate, isobutyl acetate, butyl propionate, isopropyl butyrate, ethyl butyrate, butyl butyrate, methyl lactate, and lactic acid.
  • Ethyl, alkyl oxyacetate eg, methyl oxyacetate, ethyl oxyacetate, butyl oxyacetate (eg, methyl methoxyacetate, ethyl methoxyacetate, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxyacetate)
  • 3-oxypropionic acid Alkyl esters (eg, methyl 3-oxypropionate, ethyl 3-oxypropionate, etc.
  • thermosetting compound for example, a compound having at least one group selected from an epoxy group, a methylol group, an alkoxymethyl group, and an acyloxymethyl group is preferable.
  • an epoxy compound is preferable, and a polyfunctional epoxy compound is more preferable.
  • a polymerizable compound is also preferable as the curable compound.
  • a polymerizable compound having at least one, preferably two or more terminal ethylenically unsaturated bonds is preferred.
  • dipentaerythritol triacrylate (KAYARAD D-330 as a commercial product; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetraacrylate (KAYARAD D-320 as a commercial product; manufactured by Nippon Kayaku Co., Ltd.).
  • Dipentaerythritol penta (meth) acrylate (commercially available product is KAYARAD D-310; manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa (meth) acrylate (commercially available product is KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd.), Ethyleneoxy-modified dipentaerythritol hexaacrylate (commercially available is A-DPH-12E; manufactured by Shin-Nakamura Chemical Co., Ltd.) and a structure in which these (meth) acryloyl groups are via ethylene glycol and propylene glycol residues are preferred. Yes. These oligomer types can also be used.
  • KAYARAD DPCA series (DPCA-20, DPCA-30, DPCA-60, DPCA-120 (manufactured by Nippon Kayaku Co., Ltd.), EHPE3150 (manufactured by Daicel Chemical Industries, Ltd.), etc. can be used.
  • descriptions in Japanese Patent Application Laid-Open No. 2012-208494, paragraphs 0466 to 0495 (corresponding to [0571] to [0606] of the corresponding US Patent Application Publication No. 2012/0235099) can be referred to, and the contents thereof are described in the present specification. Embedded in the book. Only one type of curable compound may be used, or two or more types may be used in combination.
  • the content of the curable compound in the first colored curable composition is preferably 0.1 to 20 parts by mass with respect to a total of 100 parts by mass of the total solid content of the first colored curable composition. It is more preferably 1 to 15 parts by mass.
  • ⁇ Surfactant Only one surfactant may be used, or two or more surfactants may be used in combination.
  • various surfactants such as a fluorine-based surfactant, a nonionic surfactant, a cationic surfactant, an anionic surfactant, and a silicone-based surfactant can be used.
  • the composition of the present invention contains a fluorosurfactant, the liquid properties (particularly fluidity) when prepared as a coating liquid are further improved. Sex can be improved more.
  • the fluorine-containing surfactant preferably has a fluorine content of 3 to 40% by mass, more preferably 5 to 30% by mass, and still more preferably 7 to 25% by mass.
  • a fluorine-based surfactant having a fluorine content within this range is effective in terms of uniformity of coating film thickness and liquid-saving properties, and has good solubility in the composition.
  • the fluorosurfactant include Megafac F-171, F-172, F-173, F-176, F-177, F-141, F-142, and F-143.
  • nonionic surfactants include glycerol, trimethylolpropane, trimethylolethane, and ethoxylates and propoxylates thereof (for example, glycerol propoxylate, glycerin ethoxylate, etc.), polyoxyethylene lauryl ether, polyoxyethylene Stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octylphenyl ether, polyoxyethylene nonylphenyl ether, polyethylene glycol dilaurate, polyethylene glycol distearate, sorbitan fatty acid ester (Pluronic L10, L31, L61, L62 manufactured by BASF, 10R5, 17R2, 25R2, Tetronic 304, 701, 704, 901, 904, 150R1, Sol Perth 20000 (manufactured by Nippon Lubrizol Corporation), and the like.
  • cationic surfactant examples include phthalocyanine derivatives (trade name: EFKA-745, manufactured by Morishita Sangyo Co., Ltd.), organosiloxane polymer KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.), (meth) acrylic acid ( Co) polymer polyflow no. 75, no. 90, no. 95 (manufactured by Kyoeisha Chemical Co., Ltd.), W001 (manufactured by Yusho Co., Ltd.) and the like.
  • anionic surfactant examples include W004, W005, W017 (manufactured by Yusho Co., Ltd.) and the like.
  • silicone-based surfactants include Torre Silicone DC3PA, Torre Silicone SH7PA, Torre Silicone DC11PA, Torresilicone SH21PA, Torree Silicone SH28PA, Torree Silicone SH29PA, Torree Silicone SH30PA, Torree Silicone SH8400 (above, Toray Dow Corning Co., Ltd.) )), TSF-4440, TSF-4300, TSF-4445, TSF-4460, TSF-4442 (above, manufactured by Momentive Performance Materials), KP341, KF6001, KF6002 (above, manufactured by Shin-Etsu Silicone Co., Ltd.) , BYK307, BYK323, BYK330 (above, manufactured by BYK Chemie) and the like.
  • the content of the surfactant in the first colored curable composition is preferably 0.001 to 2 parts by mass with respect to a total of 100 parts by mass of the total solid content of the first colored curable composition. 0.005 to 1 part by mass is more preferable.
  • a photoinitiator is synonymous with the photoinitiator in the 2nd coloring curable composition mentioned later, and its preferable range is also the same. Only 1 type may be used for a photoinitiator and it may use 2 or more types together.
  • content of a photoinitiator is 0.01 with respect to a total of 100 mass parts of total solid of a 1st colored curable composition. It is preferably ⁇ 10 parts by mass, more preferably 0.1 to 1 part by mass.
  • Alkali-soluble resin is synonymous with alkali-soluble resin in the 2nd coloring curable composition mentioned later, and its preferable range is also the same. Only 1 type may be used for alkali-soluble resin, and 2 or more types may be used together.
  • the content of the alkali-soluble resin is 0.1 to 20 with respect to a total of 100 parts by mass of the total solid content of the first colored curable composition. The amount is preferably mass parts, more preferably 1 to 15 mass parts.
  • the first colored curable composition is prepared by mixing the above-described components.
  • the components constituting the first colored curable composition may be combined at once, or the components may be combined sequentially after dissolving and dispersing each component in a solvent. May be.
  • the composition may be prepared by dissolving and dispersing all components in a solvent at the same time. If necessary, each component may be suitably used as two or more solutions / dispersions at the time of use (at the time of application). ) May be mixed to prepare a composition.
  • the first colored curable composition is preferably filtered with a filter for the purpose of removing foreign substances and reducing defects. If it is conventionally used for the filtration use etc., it can use without being specifically limited.
  • fluorine resin such as PTFE (polytetrafluoroethylene), polyamide resin such as nylon-6 and nylon-6,6, polyolefin resin such as polyethylene and polypropylene (PP) (including high density and ultra high molecular weight), etc. Filter.
  • polypropylene including high density polypropylene
  • the pore size of the filter is preferably 0.01 ⁇ m or more, and more preferably 0.05 ⁇ m or more.
  • the pore size of the filter is preferably 7.0 ⁇ m or less, more preferably 3.0 ⁇ m or less, further preferably 2.5 ⁇ m or less, still more preferably 2.0 ⁇ m or less, and particularly preferably 0.5 ⁇ m or less.
  • different filters may be combined. At that time, the filtering by the first filter may be performed only once or may be performed twice or more. Moreover, you may combine the 1st filter of a different hole diameter within the range mentioned above.
  • the pore diameter here can refer to the nominal value of the filter manufacturer.
  • a commercially available filter for example, it can be selected from various filters provided by Nippon Pole Co., Ltd., Advantech Toyo Co., Ltd., Japan Entegris Co., Ltd. (formerly Japan Microlith Co., Ltd.) or KITZ Micro Filter Co., Ltd. .
  • the second filter a filter formed of the same material as the first filter described above can be used.
  • the filtering by the first filter may be performed only with the dispersion, and the second filtering may be performed after mixing other components.
  • the second colored curable composition preferably has a higher refractive index than the first colored curable composition containing no inorganic particles and a high refractive resin, and substantially contains the above-described inorganic particles and high refractive resin. It is preferable not to contain.
  • the second colored curable composition preferably contains at least a colorant and is red or green.
  • the second colored curable composition may further contain an alkali-soluble resin, a polymerizable compound, a photopolymerization initiator, a polymerization inhibitor, a surfactant, a solvent, an ultraviolet absorber, and the like. It is preferable to be used for pattern formation by.
  • each component of the second colored curable composition will be described in detail.
  • ⁇ Colorant a dye and / or a pigment can be used, and a pigment is preferably used. Only one colorant may be used, or two or more colorants may be used in combination.
  • the pigment used in the second colored curable composition include C.I. I. Pigment Orange 2, 5, 13, 16, 17: 1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, 73, and , C.I. I.
  • the pigment for making the 2nd colored curable composition green for example, for making the 1st colored curable composition mentioned above green
  • these pigments can be used.
  • One or more selected from 80 can also be used.
  • the dye it is preferable to use a dye for making the second colored curable composition red or green among the dyes mentioned in the first colored curable composition.
  • the content of the colorant in the second colored curable composition is preferably 1 to 20 parts by mass with respect to 100 parts by mass in total of the total solid content of the second colored curable composition. It is more preferable that it is 10 mass parts.
  • the alkali-soluble resin is, for example, a linear organic high molecular polymer having at least one alkali-soluble in a molecule (preferably a molecule having an acrylic copolymer or a styrene copolymer as a main chain). It can be suitably selected from alkali-soluble resins having groups to promote. One kind of alkali-soluble resin may be used, or two or more kinds may be used in combination. From the viewpoint of heat resistance, polyhydroxystyrene resins, polysiloxane resins, acrylic resins, acrylamide resins, and acryl / acrylamide copolymer resins are preferable.
  • acrylic resins and acrylamide resins are preferable.
  • Resins and acrylic / acrylamide copolymer resins are preferred.
  • the group (acid group) that promotes alkali solubility include a carboxyl group, a phosphoric acid group, a sulfonic acid group, and a phenolic hydroxyl group, but those that are soluble in an organic solvent and can be developed with a weak alkaline aqueous solution.
  • (meth) acrylic acid is mentioned as a particularly preferable thing.
  • These acid groups may be used alone or in combination of two or more.
  • the alkali-soluble resin may contain a structural unit derived from an ethylenically unsaturated monomer represented by the following formula (X).
  • formula (X) R 1 represents a hydrogen atom or a methyl group
  • R 2 represents an alkylene group having 2 to 10 carbon atoms
  • R 3 represents a hydrogen atom or a benzene ring that may contain a benzene ring.
  • n represents an integer of 1 to 15.
  • the alkylene group of R 2 preferably has 2 to 3 carbon atoms.
  • the alkyl group of R 3 has 1 to 20 carbon atoms, more preferably 1 to 10, and the alkyl group of R 3 may contain a benzene ring.
  • Examples of the alkyl group containing a benzene ring represented by R 3 include a benzyl group and a 2-phenyl (iso) propyl group.
  • alkali-soluble resin examples include paragraphs 0558 to 0575 of JP2012-208494A (corresponding to [0685] to [0705] of the corresponding US Patent Application Publication No. 2012/0235099). Is incorporated herein.
  • the content of the alkali-soluble resin in the second colored curable composition is preferably 0.1 to 20 parts by mass with respect to a total of 100 parts by mass of the total solid content of the second colored curable composition. It is more preferably 1 to 15 parts by mass.
  • the polymerizable compound is synonymous with the polymerizable compound used in the first colored curable composition described above. Only one type of polymerizable compound may be used, or two or more types may be used in combination.
  • the content of the polymerizable compound in the second colored curable composition is preferably 0.1 to 25 parts by mass with respect to 100 parts by mass in total of the total solid content of the second colored curable composition. 1 to 20 parts by mass is more preferable.
  • the photopolymerization initiator is not particularly limited as long as it has the ability to initiate polymerization of the above polymerization components, and can be appropriately selected from known photopolymerization initiators. Only one type of photopolymerization initiator may be used, or two or more types may be used in combination. For example, those having photosensitivity to visible light from the ultraviolet region are preferable. Further, it may be an activator that generates some action with a photoexcited sensitizer and generates an active radical, or may be an initiator that initiates cationic polymerization according to the type of monomer.
  • the photopolymerization initiator examples include halogenated hydrocarbon derivatives (for example, those having a triazine skeleton, those having an oxadiazole skeleton, etc.), acylphosphine compounds such as acylphosphine oxide, hexaarylbiimidazole, oxime derivatives. Oxime compounds, organic peroxides, thio compounds, ketone compounds, aromatic onium salts, ketoxime ethers, aminoacetophenone compounds, hydroxyacetophenones, and the like, with oxime compounds being particularly preferred.
  • halogenated hydrocarbon derivatives for example, those having a triazine skeleton, those having an oxadiazole skeleton, etc.
  • acylphosphine compounds such as acylphosphine oxide, hexaarylbiimidazole, oxime derivatives. Oxime compounds, organic peroxides, thio compounds, ketone compounds, aromatic onium salts
  • Examples of the oxime compound include those represented by the following formula (OX-1) or (OX-2) in paragraph 0513 of JP2012-208494A (corresponding US Patent Application Publication No. 2012/235099, [0632]). Reference can be made to the description of the compounds represented, the contents of which are incorporated herein.
  • Examples of oxime compounds include TRONLY TR-PBG-304, TRONLY TR-PBG-309, TRONLY TR-PBG-305 (manufactured by CHANGZHOU TRONLY NEW ELECTRONIC MATERIALS CO., LTD. Arc), Commercial products such as Ruze NCI-831 and Adeka Arcles NCI-930 (manufactured by ADEKA) can also be used.
  • the content of the photopolymerization initiator in the second colored curable composition is 0.01 to 10 parts by mass with respect to 100 parts by mass in total of the total solid content of the second colored curable composition. The amount is preferably 0.1 to 1 part by mass.
  • polymerization inhibitors include hydroquinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrogallol, t-butylcatechol, benzoquinone, 4,4'-thiobis (3-methyl-6-t-butylphenol ), 2,2′-methylenebis (4-methyl-6-tert-butylphenol), N-nitrosophenylhydroxyamine primary cerium salt, and the like.
  • the content of the photopolymerization initiator in the second colored curable composition is 0.0001 to 0.1 parts by mass with respect to 100 parts by mass in total of the total solid content of the second colored curable composition. It is preferable.
  • ⁇ Surfactant and Solvent >>>
  • the surfactant and solvent used in the second colored curable composition are the same as the surfactant and solvent used in the first colored curable composition described above, and the preferred range is also the same.
  • UV absorber As the ultraviolet absorber, salicylate-based, benzophenone-based, benzotriazole-based, substituted acrylonitrile-based, triazine-based ultraviolet absorbers and the like can be used. As a commercial product, UV-503 (manufactured by Daito Chemical Co., Ltd.) can be used. Only one type of ultraviolet absorber may be used, or two or more types may be used in combination.
  • the content of the ultraviolet absorber in the second colored curable composition is preferably 0.01 to 1 part by mass with respect to 100 parts by mass in total of the total solid content of the second colored curable composition. .
  • the present invention relates to a first colored curable composition and a second colored curable composition in which the difference in refractive index between the first colored curable composition and the second colored curable composition at a wavelength of 535 nm is 0.10 or less.
  • the present invention also relates to a kit for producing a color filter comprising a sex composition. By using such a kit, generation
  • other colored curable compositions other than the first colored curable composition and the second colored curable composition described above may be used.
  • the 1st colored curable composition demonstrated green and the 2nd colored curable composition demonstrated red as a preferable form, it is not limited to this.
  • the refractive index of the first colored curable composition containing no inorganic particles and high refractive resin is smaller than that of the second colored curable composition containing no inorganic particles and high refractive resin, Color can be applied.
  • the inorganic particles and the high refractive resin are described as examples as means for adjusting the refractive index difference between the first colored curable composition and the second colored curable composition. It is not limited to an example, You may use means other than an inorganic particle and highly refractive resin.
  • the solid-state imaging device includes a color filter obtained by the color filter manufacturing method according to the present invention.
  • the configuration of the solid-state imaging device in the present invention is a configuration provided with a color filter for a solid-state imaging device, and is not particularly limited as long as it is a configuration that functions as a solid-state imaging device.
  • As a solid-state image sensor the following structures are mentioned, for example.
  • a transfer electrode made of a plurality of photodiodes and polysilicon constituting a light receiving area of a solid-state imaging device (CCD image sensor, CMOS image sensor, etc.) is provided on a support, and the photodiode and the transfer electrode are provided on the support.
  • a light condensing means for example, a microlens, etc., the same applies hereinafter
  • the solid-state imaging device 10 includes a light receiving element (photodiode) 42 provided on a silicon substrate, a color filter 13, a planarizing film 14, a microlens 15, and the like.
  • the planarizing film 14 is not necessarily provided.
  • FIG. 12 in order to clarify each part, the ratios of the thicknesses and widths are ignored, and some parts are exaggerated.
  • a P well 41 is provided on the silicon substrate, and a photodiode 42 is provided on a part of the surface of the P well.
  • An impurity diffusion layer 43 having an N-type impurity concentration higher than that of the photodiode 42 is provided on the surface of the P well 41 of the silicon substrate and in a region different from the above part.
  • An insulating film 47 such as SiO 2 or SiO 2 / SiN / SiO 2 is provided on the P well 41, the photodiode 42, and the impurity diffusion layer 43.
  • poly-Si, tungsten On the insulating film 47, poly-Si, tungsten, An electrode 44 made of tungsten silicide, Al, Cu or the like is provided.
  • a wiring layer 45 is formed above the electrode 44.
  • a BPSG film 46 and a P-SiN film 48 are provided above the wiring layer 45.
  • a planarizing film layer 49 is formed for the purpose of planarizing the surface of the P-SiN film 48 or uneven portions other than the pixel region.
  • the color filter 13 is formed on the planarizing film layer 49.
  • the color filter 13 includes a plurality of green pixels 20G, red pixels 20R, and blue pixels 20B that are two-dimensionally arranged. Each of the colored pixels 20R, 20G, and 20B is formed above the light receiving element 42.
  • the green pixels 20G are formed in a checkered pattern, and the blue pixels 20B and the red pixels 20R are formed between the green pixels 20G.
  • the colored pixels 20R, 20G, and 20B are displayed in a line in order to explain that the color filter 13 is composed of pixels of three colors.
  • the planarization film 14 is formed so as to cover the upper surface of the color filter 13 and planarizes the color filter surface.
  • the microlens 15 is a condensing lens arranged with the convex surface facing upward, and is provided above the planarizing film 14 (or a color filter when no planarizing film is provided) and above the light receiving element 42. Each microlens 15 efficiently guides light from the subject to each light receiving element 42.
  • the color filter of the present invention can also be preferably used for a micro O red type (micro OLED) display. This image display method is described, for example, on page 43 of "EL, PDP, LCD display -Technology and latest trends in the market- (issued by Toray Research Center Research Division 2001)".
  • PGMEA ether acetate
  • the prepared pigment dispersion was further subjected to a dispersion treatment at a flow rate of 500 g / min under a pressure of 2000 kg / cm 3 using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) with a decompression mechanism. I did it.
  • This dispersion treatment was repeated 10 times to obtain a Red pigment dispersion.
  • Green Pigment Dispersion Dispersion Containing Pigment Green (PG) 36 / Pigment Yellow (PY) 150 >> 7.80 parts of PG36, 6.38 parts of PY150, 4.49 parts of a pigment dispersant represented by the following formula (A), 1.50 parts of Resin Acryure-RD-F8 (Nippon Shokubai), and PGMEA The mixed liquid of 79.84 parts was mixed and dispersed for 3 hours by a bead mill (zirconia beads 0.3 mm diameter) to prepare a pigment dispersion.
  • the prepared pigment dispersion was further subjected to a dispersion treatment at a flow rate of 500 g / min under a pressure of 2000 kg / cm 3 using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) with a decompression mechanism. I did it.
  • This dispersion treatment was repeated 10 times to obtain a Green pigment dispersion.
  • k: l: m: n 25: 40: 5: 30 (polymerization molar ratio)
  • the weight average molecular weight is 10,000.
  • Green pigment dispersion B was obtained in the same manner as in the above Green pigment dispersion, except that the pigment dispersant represented by the formula (A) was changed to the following dispersant (B).
  • the numerical value written together with each structural unit represents the content (% by mass) of each structural unit.
  • the numerical value written together with the repeating part of the side chain indicates the number of repeating parts.
  • Blue pigment dispersion Dispersion containing Pigment Blue (PB) 15: 6 / Pigment Violet (PV) 23 >> 8.48 parts of PB15: 6, 3.81 parts of PV23, 2.65 parts of pigment dispersant BYK-161 (manufactured by BYK), 2.65 parts of Resin Acrycure-RD-F8 (Japan Catalyst), PGMEA was mixed and dispersed for 3 hours by a bead mill (zirconia beads 0.3 mm diameter) to prepare a pigment dispersion.
  • the prepared pigment dispersion was further subjected to a dispersion treatment at a flow rate of 500 g / min under a pressure of 2000 kg / cm 3 using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) with a decompression mechanism. I did it.
  • This dispersion treatment was repeated 10 times to obtain a Blue pigment dispersion.
  • Inorganic particle dispersion Dispersion containing TiO 2 ) TTO-51 (C) (Ishihara Sangyo) was mixed with 18.17 parts, the pigment dispersant represented by the above formula (A) was mixed with 4.91 parts, and PGMEA was mixed with 76.92 parts. 0.3 mm diameter) and mixed and dispersed for 3 hours. Thereafter, the mixture was further subjected to dispersion treatment at a flow rate of 500 g / min under a pressure of 2000 kg / cm 3 using a high-pressure disperser NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.) equipped with a decompression mechanism. This dispersion treatment was repeated 10 times to obtain an inorganic particle dispersion.
  • a high-pressure disperser NANO-3000-10 manufactured by Nippon BEE Co., Ltd.
  • the weight average molecular weight is 12,000.
  • Green pigment dispersion in Table 4 below is the above-mentioned Green pigment dispersion.
  • Green pigment dispersion 2 (for dry etching) >> The compounds shown in Table 5 below were mixed and dissolved to prepare Green composition 2.
  • the “Green pigment dispersion” in Table 5 below is the Green pigment dispersion described above.
  • Green pigment dispersion in Table 6 below is the Green pigment dispersion described above.
  • Green pigment dispersion in Table 7 below is the above-mentioned Green pigment dispersion.
  • Green pigment dispersion in Table 8 below is the Green pigment dispersion described above.
  • Green pigment dispersion in Table 10 below is the Green pigment dispersion described above.
  • Green pigment dispersion 8 (for photolithography) >> The compounds shown in Table 11 below were mixed and dissolved to prepare Green composition 8.
  • the “Green pigment dispersion” in Table 11 below is the Green pigment dispersion described above.
  • Green pigment dispersion in Table 12 below is the above-mentioned Green pigment dispersion.
  • Green pigment dispersion in Table 13 below is the above-mentioned Green pigment dispersion.
  • Green pigment dispersion in Table 14 below is the above-mentioned Green pigment dispersion.
  • Green pigment dispersion in Table 15 below is the above-described Green pigment dispersion.
  • Green pigment dispersion in Table 16 below is the Green pigment dispersion described above.
  • Green pigment dispersion in Table 17 below is the above-mentioned Green pigment dispersion.
  • Green pigment dispersion in Table 18 below is the above-mentioned Green pigment dispersion.
  • Green pigment dispersion B in the following Table 19 is the above-mentioned Green pigment dispersion B.
  • Initiator A was synthesized following the synthesis of Specific Compound 1 described in paragraphs 0162 to 0166 of JP2011-158655A. Initiator A
  • Green pigment dispersion B in Table 20 below is the Green pigment dispersion B described above.
  • Initiator A is initiator A described above.
  • Example 1 The above-mentioned Green composition 1 was applied onto a silicon wafer by spin coating so that the film thickness after film formation was 0.7 ⁇ m, and then heated on a hot plate at 100 ° C. for 2 minutes, and then 220 It heated at 5 degreeC for 5 minute (s), and obtained the 1st colored curable composition layer. Next, a first colored pixel of 1.0 ⁇ m was obtained by using a dry etching method for the first colored curable composition layer. Next, the above-described Red composition 1 is applied on the silicon wafer on which the first colored pixels are formed by spin coating so that the film thickness after film formation becomes 0.7 ⁇ m, and then on the hot plate.
  • a second colored curable composition layer was obtained by heating at 100 ° C. for 2 minutes.
  • the obtained second colored curable composition layer was exposed to a 1.0 ⁇ m dot pattern through a mask using an i-line stepper exposure apparatus FPA-3000i5 + (manufactured by Canon Inc.).
  • paddle development was performed for 60 seconds at 23 ° C. using a 0.3% aqueous solution of tetramethylammonium hydroxide (TMAH) for the second colored curable composition layer after exposure.
  • TMAH tetramethylammonium hydroxide
  • the residue of the 2nd coloring curable composition layer remaining on the 1st coloring pixel at this time was observed with SEM (Scanning Electron Microscope). Judgment criteria are as follows. The results are shown in Table 24 below. A: No residue is observed B: Partial residue is observed on the first colored pixel C: Residue is observed on the entire first colored pixel ⁇ Example 2 >> The residue of the second colored curable composition layer remaining on the first colored pixels was observed by SEM in the same manner as in Example 1 except that the Green composition 1 was changed to the Green composition 2 described above. . The results are shown in Table 24 below.
  • Example 3 The residue of the second colored curable composition layer remaining on the first colored pixels was observed by SEM in the same manner as in Example 1 except that the Green composition 1 was changed to the Green composition 3 described above. . The results are shown in Table 24 below.
  • ⁇ Example 4 The residue of the second colored curable composition layer remaining on the first colored pixels was observed with an SEM in the same manner as in Example 1 except that the Green composition 1 was changed to the Green composition 4 described above. . The results are shown in Table 24 below.
  • ⁇ Example 5 The second composition remaining on the first colored pixel is the same as in Example 1 except that the Green composition 1 is changed to the above-described Blue composition 1 and the Red composition 1 is changed to the above-described Green composition 13.
  • Example 6 The second composition remaining on the first colored pixel is the same as in Example 1 except that the Green composition 1 is changed to the above-described Blue composition 2 and the Red composition 1 is changed to the above-described Green composition 13. The residue of the colored curable composition layer was observed with an SEM. The results are shown in Table 25 below.
  • Comparative Example 1 The residue of the second colored curable composition layer remaining on the first colored pixels was observed with an SEM in the same manner as in Example 1 except that the Green composition 1 was changed to the Green composition 5 described above. . The results are shown in Table 24 below.
  • ⁇ Comparative Example 2 >> The residue of the second colored curable composition layer remaining on the first colored pixels was observed by SEM in the same manner as in Example 1 except that the Green composition 1 was changed to the Green composition 6 described above. . The results are shown in Table 24 below.
  • ⁇ Comparative Example 3 >> The residue of the second colored curable composition layer remaining on the first colored pixel was observed by SEM in the same manner as in Example 1 except that the Green composition 1 was changed to the Green composition 7 described above. . The results are shown in Table 24 below.
  • ⁇ Comparative Example 4 >> The second composition remaining on the first colored pixel is the same as in Example 1 except that the Green composition 1 is changed to the above-described Blue composition 3 and the Red composition 1 is changed to the above-described Green composition 13. The residue of the colored curable composition layer was observed with an SEM. The results are shown in Table 25 below.
  • Example 7 The green composition 8 is applied on a silicon wafer by a spin coat method so that the film thickness after film formation becomes 0.7 ⁇ m, and then heated at 100 ° C. for 2 minutes on a hot plate for the first coloring. A curable composition layer was obtained. Next, the obtained first colored curable composition layer was exposed to a 1.0 ⁇ m dot pattern through a mask using an i-line stepper exposure apparatus FPA-3000i5 + (manufactured by Canon Inc.). Next, paddle development was performed for 60 seconds at 23 ° C. using a 0.3% aqueous solution of tetramethylammonium hydroxide (TMAH) for the first colored curable composition layer after exposure.
  • TMAH tetramethylammonium hydroxide
  • Example 9 The residue of the second colored curable composition layer remaining on the first colored pixels was observed with an SEM in the same manner as in Example 7 except that the Green composition 8 was changed to the Green composition 10. The results are shown in Table 26 below.
  • ⁇ Comparative Example 5 The residue of the second colored curable composition layer remaining on the first colored pixels was observed with an SEM in the same manner as in Example 7 except that the Green composition 8 was changed to the Green composition 11. The results are shown in Table 26 below.
  • ⁇ Comparative Example 6 The residue of the second colored curable composition layer remaining on the first colored pixels was observed with an SEM in the same manner as in Example 7 except that the Green composition 8 was changed to the Green composition 12. The results are shown in Table 26 below.
  • ⁇ Comparative Example 7 A residue of the second colored curable composition layer remaining on the first colored pixels was observed with an SEM in the same manner as in Example 7 except that the Green composition 8 was changed to the Green composition 13. The results are shown in Table 26 below.
  • Examples 10 to 14 Except for changing PG36 and PY150 in the Green pigment dispersion used in Green Composition 1 to the Green pigment type and Yellow pigment type shown in Table 27 below, it remains on the first colored pixel as in Example 1. The residue of the 2nd coloring curable composition layer was observed in SEM. The results are shown in Table 27 below.
  • Examples 15 to 19 The second colored curable composition remaining on the first colored pixel as in Example 7 except that PG36 and PY150 in the Green pigment dispersion were changed to the Green pigment type and Yellow pigment type shown in Table 27 below. The residue of the physical layer was observed with SEM. The results are shown in Table 27 below.
  • Comparative Examples 8 to 12 The second colored curable composition remaining on the first colored pixel as in Comparative Example 3, except that PG36 and PY150 in the Green pigment dispersion were changed to the Green pigment type and Yellow pigment type shown in Table 27 below. The residue of the physical layer was observed with SEM. The results are shown in Table 27 below.
  • Comparative Examples 13 to 17 The second colored curable composition remaining on the first colored pixel as in Comparative Example 7, except that PG36 and PY150 in the Green pigment dispersion were changed to the Green pigment type and Yellow pigment type shown in Table 27 below. The residue of the physical layer was observed with SEM. The results are shown in Table 27 below.
  • Examples 20 to 23 The second colored curing that remains on the first colored pixels is the same as in Example 1 except that the green composition 1 is changed to the green composition 14 and the exemplary resin shown in Table 28 below is used as the high refractive resin. The residue of the composition layer was observed with SEM. The results are shown in Table 28 below.
  • the exemplary resin 18, the exemplary resin 23, the exemplary resin 69, and the exemplary resin 96 correspond to the exemplary resin described above.
  • Examples 23 to 27 The second colored curing that remains on the first colored pixel is the same as in Example 7 except that the green composition 8 is changed to the green composition 15 and the exemplified resin shown in Table 28 below is used as the high refractive resin. The residue of the composition layer was observed with SEM.
  • the refractive indexes of the first colored pixel and the second colored pixel are the refractive indexes at the wavelength of 535 nm of the first colored pixel and the second colored pixel, and the ellipsometer UVISEL / 460-FUV. -Results of measurement using AGAS (Horiba Seisakusho).

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Abstract

La présente invention porte sur : un procédé de production de filtre coloré apte à supprimer l'apparition de résidu lors de la formation d'un filtre coloré ; un filtre coloré ; une composition durcissable colorée ; un élément d'imagerie à l'état solide ; et une composition durcissable colorée et une trousse. Le procédé de production de filtre coloré a : une étape dans laquelle une composition durcissable colorée est utilisée et de premiers pixels colorés sont formés sur un corps de support ; et une étape dans laquelle une seconde composition durcissable colorée est utilisée et de seconds pixels colorés adjacents aux premiers pixels colorés sont formés à l'aide de photolithographie. La différence entre l'indice de réfraction de la première composition durcissable colorée et celui de la seconde composition durcissable colorée dans la plage de longueur d'onde de 535 nm n'est pas supérieure à 0,10.
PCT/JP2014/068565 2013-07-29 2014-07-11 Filtre coloré, son procédé de production, composition durcissable colorée, élément d'imagerie à l'état solide et composition durcissable colorée et trousse WO2015016041A1 (fr)

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KR1020177030996A KR101949774B1 (ko) 2013-07-29 2014-07-11 컬러 필터, 그 제조 방법, 착색 경화성 조성물, 고체 촬상 소자, 착색 경화성 조성물 및 키트

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