WO2015010376A1 - 阵列基板及其制造方法、触摸屏和显示装置 - Google Patents

阵列基板及其制造方法、触摸屏和显示装置 Download PDF

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Publication number
WO2015010376A1
WO2015010376A1 PCT/CN2013/085797 CN2013085797W WO2015010376A1 WO 2015010376 A1 WO2015010376 A1 WO 2015010376A1 CN 2013085797 W CN2013085797 W CN 2013085797W WO 2015010376 A1 WO2015010376 A1 WO 2015010376A1
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WIPO (PCT)
Prior art keywords
touch
electrode
common electrode
touch sensing
signal line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/CN2013/085797
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English (en)
French (fr)
Inventor
刘红娟
董学
王海生
杨盛际
王磊
王春雷
刘英明
任涛
赵卫杰
丁小梁
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOE Technology Group Co Ltd
Beijing BOE Optoelectronics Technology Co Ltd
Original Assignee
BOE Technology Group Co Ltd
Beijing BOE Optoelectronics Technology Co Ltd
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Application filed by BOE Technology Group Co Ltd, Beijing BOE Optoelectronics Technology Co Ltd filed Critical BOE Technology Group Co Ltd
Priority to US14/388,971 priority Critical patent/US9772710B2/en
Publication of WO2015010376A1 publication Critical patent/WO2015010376A1/zh
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0416—Control or interface arrangements specially adapted for digitisers
    • G06F3/04166—Details of scanning methods, e.g. sampling time, grouping of sub areas or time sharing with display driving
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/13338—Input devices, e.g. touch panels
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/136286—Wiring, e.g. gate line, drain line
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412—Digitisers structurally integrated in a display
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04111—Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0448—Details of the electrode shape, e.g. for enhancing the detection of touches, for generating specific electric field shapes, for enhancing display quality

Definitions

  • the present invention relates to the field of display technologies, and in particular, to an array substrate and a method of manufacturing the same, a touch screen, and a display device. Background technique
  • the touch screen can be divided into: an add on cell touch panel and an embedded touch screen (In Cel l Touch Panel).
  • the current mainstream touch screen basically adopts an external touch screen, which is a touch-enabled liquid crystal display formed by separately manufacturing a touch panel and a liquid crystal display panel and then bonding the touch panel and the liquid crystal display panel together.
  • the external touch screen has disadvantages such as high manufacturing cost, low light transmittance, and heavy structure of the whole machine, which is difficult to meet the requirements of the consumer for the thin and light touch screen.
  • the Glass To Glass (GTG) type touch screen usually needs to be fabricated twice, which greatly increases the manufacturing cost of the product, greatly reduces the yield of the product, and increases the thickness of the whole structure. It is even more difficult to meet consumer demand for thin and light touch screens.
  • the embedded touch screen embeds the touch electrodes of the touch screen inside the liquid crystal display panel, thereby greatly reducing the thickness of the whole structure and reducing the manufacturing cost.
  • the existing in-cell touch panel directly adds a touch scan line and a touch sensor line on the array substrate, and the intersection of the touch scan line and the touch sensor line forms a sensing capacitor.
  • the touch scan signal is loaded on the touch scan line.
  • the invention provides an array substrate and a manufacturing method thereof, a touch screen and a display device, which do not need to add a new film layer on the array substrate, and do not need to add a new process step in the manufacturing process, thereby reducing the production cost and improving the production cost.
  • Productivity
  • the present invention provides an array substrate including a base substrate and gate lines, data lines, and common electrode layers formed on the base substrate, the gate lines and the data lines defining pixel units
  • the common electrode layer includes: a touch scan electrode and a touch sensing electrode, wherein the touch scan electrode is configured to load a common electrode signal during a display time period and load a touch scan signal during a touch time period;
  • the touch sensing electrode is configured to load a common electrode signal during a display time period and output a touch sensing signal during a touch time period.
  • the array substrate further includes: a touch scan signal line and a touch sensing signal line, wherein the touch scan signal line is connected to the corresponding touch scan electrode, and the touch sensing signal line and the corresponding The touch sensing signal line and the touch sensing signal line are both disposed in the same layer as the gate line.
  • the touch scan signal line and the corresponding touch scan electrode are connected through a plurality of vias
  • the touch sensing signal line and the corresponding touch sensing electrode are connected through a plurality of vias.
  • the common electrode layer further includes: a common electrode, configured to load the common electrode signal during the display period.
  • the array substrate further includes: a common electrode signal line, the common electrode signal line is connected to the corresponding common electrode, and the common electrode signal line is disposed in the same layer as the gate line.
  • the common electrode signal line and the corresponding common electrode are connected by a plurality of via holes.
  • the touch scan electrode and the touch sensing electrode form an interposer electrode array structure.
  • the touch scan electrode and the touch sensing electrode form an interposer electrode array structure, and the common electrode is located between the touch scan electrode and the touch sensing electrode Gap.
  • each row of the touch scan electrodes includes a plurality of touch scan sub-electrodes, and each adjacent two rows of touch scan electrodes form a group, and two touch scan sub-electrodes are located at two positions in each group.
  • the touch sensing electrodes of adjacent groups are integrated.
  • the common electrode includes: a first common sub-electrode and a second common sub-electrode, wherein the touch scan electrode and the touch sensing electrode form an interpolated electrode array structure, the first common sub- The electrode is located at a gap between the touch scan electrode and the touch sensing electrode, and the second common sub-electrode is located at a gap between adjacent pin electrode array structures.
  • each adjacent two rows of pixel units form a group, and two rows of the gate lines are formed between two rows of the pixel units in each group, the touch scan signal lines and the touch sensing signals.
  • One of the lines or any combination thereof is located at a gap between adjacent groups.
  • each adjacent two rows of pixel units form a group, and two rows of the gate lines are formed between the two rows of the pixel units in each group, and the touch scan signal line and the touch sensing signal are formed.
  • the lines and/or the common electrode signal lines are located at gaps between adjacent groups.
  • the invention also provides a touch screen comprising: the above array substrate.
  • the invention also provides a display device comprising: the above touch screen.
  • the present invention also provides a method of fabricating an array substrate, comprising: forming a gate line and a data line on a base substrate, the gate line and the data line defining a pixel unit; forming on the base substrate
  • the common electrode layer includes a touch scan electrode and a touch sensing electrode, and the touch scan electrode is configured to load the common electrode signal during the display time period and load the touch scan signal during the touch time period.
  • the touch sensing electrode is configured to load a common electrode signal during a display time period and output a touch sensing signal during a touch time period.
  • the common electrode layer further includes a common electrode for loading the common electrode signal during the display period.
  • the manufacturing method further includes: forming a metal signal line while forming a gate line on the base substrate, wherein the metal signal line includes a touch scan signal line, a touch sensing signal line, and a common electrode signal One of the lines or any combination thereof.
  • the common electrode layer includes a touch scan electrode, a touch sensing electrode and a common electrode, and the display signal and the touch signal are time-divisionally driven, so that the display signal is displayed.
  • the touch scan electrode, the touch sensing electrode and the common electrode jointly realize the transmission of the common electrode signal.
  • the touch scan electrode and the touch sensing electrode realize the transmission of the touch sensing signal. Since the touch scan electrode and the touch sense electrode are formed in the common electrode layer, there is no need to add a new film layer on the array substrate, and there is no need to add a new process step in the manufacturing process, thereby reducing production cost and improving production. effectiveness.
  • FIG. 1 is a schematic structural view of a common electrode layer in the first embodiment of the present invention.
  • Figure 2 is an enlarged schematic view of A in Figure 1.
  • Embodiment 3 is a schematic structural view of a common electrode layer in Embodiment 2 of the present invention.
  • Embodiment 4 is a schematic structural view of a common electrode layer in Embodiment 3 of the present invention.
  • Fig. 5 is a flow chart showing a method of fabricating an array substrate according to a sixth embodiment of the present invention. detailed description
  • Embodiment 1 of the present invention provides an array substrate including a base substrate and gate lines, data lines, and common electrode layers formed on the base substrate, the gate lines and the data lines defining pixel units.
  • the common electrode layer may include: a touch scan electrode and a touch sensing electrode, wherein the touch scan electrode is configured to load the common electrode signal during the display time period and load the touch scan signal during the touch time period, and the touch sensing electrode It is used to load the common electrode signal during the display time period and output the touch sensing signal during the touch time period.
  • the common electrode layer of the whole surface is optimized, so that the touch scan electrode and the touch sensing electrode are formed in the common electrode layer, and the touch screen is realized by using the time-division driving display and the touch technology.
  • the time-division driving display and the touch technology are: dividing a frame time into a display time period and a touch time period, wherein the touch scan signal is loaded on the touch scan electrode during the touch time period, and the touch sensing electrode The touch sensing signal is coupled to generate a touch sensing signal and output the touch sensing signal during the touch period; and the scanning electrode is touched during the display period
  • the common electrode signal is loaded on the touch sensing electrode, and the touch scan electrode and the touch sensing electrode function as a common electrode.
  • the material of the common electrode layer is a transparent conductive material, such as Tin Indium Oxide (ITO).
  • the common electrode layer includes: a touch scan electrode 1, a touch sensing electrode 2, and a common electrode 3.
  • the common electrode 3 is used to load the common electrode signal during the display period.
  • the touch scan electrode 1 and the touch sensing electrode 2 form an interposer electrode array structure, and the touch scan electrode 1 and the touch sensing electrode 2 are disposed in the same layer and insulated from each other, thereby forming a touch scan of the interdigitated structure.
  • each row of the touch scan electrodes 1 may include a plurality of touch scan sub-electrodes, and each adjacent two rows of touch scan electrodes 1 form a group, and two touch scans are located in opposite positions in each group and located in two rows.
  • the sub-electrodes are integrated, and the touch sensing electrodes 2 of the adjacent groups are integrated.
  • the first row of the touch scan electrode 1 includes the touch scan sub-electrode 11 , the touch scan sub-electrode 12 and the touch scan sub-described in the first row (the top row in the figure) and the second behavior example in FIG. 1 .
  • the electrode 13 , the touch scan sub-electrode 11 , the touch scan sub-electrode 12 and the touch scan sub-electrode 13 are disposed in the same layer and insulated from each other;
  • the second row of touch scan electrodes 1 includes the touch scan sub-electrode 14 and the touch scan
  • the electrode 15 and the touch scan sub-electrode 16 , the touch scan sub-electrode 14 , the touch scan sub-electrode 15 and the touch scan sub-electrode 16 are disposed in the same layer and insulated from each other.
  • the first row of touch scan electrodes 1 and the second row of touch scan electrodes 1 form a group, and the oppositely-positioned touch scan sub-electrodes 11 and the touch scan sub-electrodes 14 are integrated, and the oppositely-positioned touch scan sub-electrodes 12 are formed.
  • the touch scan sub-electrode 15 and the touch scan sub-electrode 15 are integrated.
  • the touch sensing electrodes 2 of the adjacent groups are integrated.
  • the touch sensing electrodes of the second row form the touch sensing electrodes 2 of the finger structure and the touches of the third row.
  • the scanning electrode forms the touch sensing electrode 2 of the finger structure as a unitary structure.
  • the common electrode 3 may be located at a gap between the touch scan sub-electrode and the touch sensing electrode 2.
  • the touch scan electrodes are vertical electrodes, and the touch sensing electrodes are lateral electrodes.
  • the touch scan electrode may be a lateral electrode, and the touch sensing electrode is a vertical electrode, which is not specifically drawn.
  • touch scanning The electrode and the touch sensing electrode may also be other structures, for example, a strip structure or a diamond structure, which is not limited herein.
  • the touch scan electrode and the touch sensing electrode adopt an interpolated electrode array structure, which can increase the mutual inductance of the touch scan electrode and the touch sensing electrode, thereby improving the sensitivity and accuracy of the touch.
  • the mutual inductance of the touch scanning electrode and the touch sensing electrode is further increased, thereby further improving the sensitivity and accuracy of the touch.
  • the accuracy of the touch screen is usually in the order of millimeters, and the required precision can be ensured by selecting the density and width of the touch scanning electrodes and the touch sensing electrodes.
  • the touch scanning electrode has a width dl of 5 ram to 6 ram
  • the touch sensing electrode has a width d2 of 5 to 6.
  • the array substrate may further include: a touch scan signal line, a touch sensing signal line, and a common electrode signal line.
  • the touch scan signal line is configured to output a common electrode signal to the touch scan electrode during the display period and output the touch scan signal to the touch scan electrode during the touch period.
  • the touch sensing signal line is configured to output a common electrode signal to the touch sensing electrode during the display period and receive the touch sensing signal output by the touch sensing electrode during the touch period.
  • the common electrode signal line is for outputting a common electrode signal to the common electrode during the display period.
  • the touch scan signal line is connected to the corresponding touch scan electrode, the touch sensing signal line is connected to the corresponding touch sensing electrode, and the common electrode signal line is connected to the corresponding common electrode.
  • each touch scan sub-electrode can correspond to at least one touch scan signal line. Therefore, each touch scan sub-electrode can be connected to at least one touch scan signal line.
  • the touch scan sub-electrode 11 is connected to the corresponding touch scan signal line 31 and the touch scan signal line 32
  • the touch scan sub-electrode 12 and the corresponding touch scan signal line 33 and the touch The scanning signal line 34 is connected
  • the touch scanning sub-electrode 13 is connected to the corresponding touch scanning signal line 35 and the touch scanning signal line 36.
  • each touch sensing electrode can correspond to at least one touch sensing signal line. Therefore, each touch sensing electrode can be connected to at least one touch sensing signal line.
  • the touch sensing electrode 2 is connected to the corresponding touch sensing signal line 37 , the touch sensing signal line 38 , the touch sensing signal line 39 , and the touch sensing signal line 40 .
  • the touch scan signal line and the corresponding touch scan electrode are connected through a plurality of via holes 41.
  • the touch sensing signal line and the corresponding touch sensing electrode can be connected through a plurality of via holes 42.
  • the solid dot in Figure 1 is a via, and only the two labels 41 and 42 are indicated in the figure, and the remaining vias are no longer one by one. Note.
  • each of the common electrodes may correspond to at least one common electrode signal line, and thus, each of the common electrodes may be connected to at least one common electrode signal line.
  • the common electrode 3 is connected to a corresponding common electrode signal line 43, a common electrode signal line 44, a common electrode signal line 45, and a common electrode signal line 46.
  • the common electrode signal line and the corresponding common electrode may be connected by a plurality of via holes. Since the common electrode layer is usually made of a transparent conductive material, the touch scan signal line and the corresponding touch scan electrode are connected through a plurality of via holes, the touch sensing signal line and the corresponding touch sensing electrode are connected through a plurality of via holes.
  • the common electrode signal line and the corresponding common electrode are connected by a plurality of via holes corresponding to connecting an electrode made of a transparent conductive material and a plurality of metal resistors composed of signal lines in parallel, so as to minimize the resistance of the electrode. Thereby increasing the signal to noise ratio of the electrode transfer signal.
  • the touch scan signal line, the touch sensing signal line, and the common electrode signal line are all disposed in the same layer as the gate line.
  • the touch scan signal line, the touch sensing signal line, and the common electrode signal line may also be disposed in different layers from the gate line, that is, in the touch scan signal line, the touch sensing signal line, and the public.
  • An insulating layer is disposed between the electrode signal line and the gate line.
  • the touch scan signal line, the touch sensing signal line, and the common electrode signal line may also be disposed in the same layer as the data line.
  • the same mask can be used to simultaneously produce the touch scan signal line, the touch sensing signal line, and the common electrode.
  • Signal lines and gate lines eliminate the need for additional masks, simplifying production processes, reducing manufacturing costs and increasing productivity.
  • the touch scanning signal line, the touch sensing signal line, and the common electrode signal line are all disposed in the same layer as the data line, the production process is simplified, the manufacturing cost is reduced, and the production efficiency is improved.
  • the pixel unit may include a Thin Film Transistor (TFT) and a pixel electrode.
  • TFT Thin Film Transistor
  • the array substrate provided in this embodiment can be applied to an Advanced Super Dimension Switch (ADS) type display device or a Super Advanced Super Dimension Switch (HADS) type display device.
  • ADS Advanced Super Dimension Switch
  • HADS Super Advanced Super Dimension Switch
  • the accuracy of the structure with the touch function is usually on the order of millimeters, and the precision of the structure with the display function is on the order of micrometers. Therefore, usually one touch scan electrode and the touch sense electrode can cover multiple rows or columns of pixels. unit.
  • the precision refers to the size of one touch unit or the size of one pixel unit in the touch screen.
  • FIG. 1 is enlarged to form Fig. 2.
  • FIG. 2 is an enlarged view of A in FIG. 1.
  • the gate line 6 and the data line 7 define a pixel unit 5, and the pixel unit 5 includes a thin film transistor 51 and a pixel electrode 52, and each adjacent two rows of pixels
  • the cells 5 are formed in a group, and two gate lines 6 are formed between the two rows of pixel cells 5 in each group.
  • the two gate lines 6 respectively control the upper and lower rows of pixel units 5, the gate lines 6 adjacent to the upstream pixel units 5 control the upstream pixel units 5, and the gate lines 6 adjacent to the downstream pixel units 5 control the downstream pixel units 5.
  • the position of a part of the gate lines is saved, so that one of the touch scanning signal lines, the touch sensing signal lines and the common electrode signal lines or any combination thereof can be disposed at the gap between the adjacent groups.
  • one of the touch scanning signal line, the touch sensing signal line, and the common electrode signal line, or any combination thereof, may be located at a gap between adjacent groups, and the touch scanning signal line and the touch sensing signal line
  • the common electrode signal line and the common electrode signal line can be disposed in the same layer as the gate line 6.
  • the common electrode signal line 46 is disposed above the upstream pixel electrode 5 and connected to the common electrode 3 through the via 48.
  • the scanning signal line 34 is disposed below the downstream pixel unit 5 and connected to the touch scan electrode 1 through the via 49.
  • one or more signal lines may be disposed at the gap between adjacent groups.
  • the structure change saves a part of the gate lines to arrange the touch scan signal lines, the touch sense signal lines and the common electrode signal lines, so as not to occupy the open area too much, so that the aperture ratio of the touch screen pixels is maximized.
  • the common electrode layer of the array substrate provided by the embodiment includes a touch scan electrode, a touch sensing electrode and a common electrode, and the display signal and the touch signal are time-divisionally driven, so that the touch scan electrode and the touch are displayed during the display signal transmission period.
  • the control sensing electrode and the common electrode jointly realize the transmission of the common signal.
  • the touch scanning electrode and the touch sensing electrode realize the transmission of the touch signal sensing.
  • the touch scan electrode and the touch sensing electrode are formed in the common electrode layer, there is no need to add a new film layer on the array substrate, and there is no need to add a new process step in the manufacturing process, thereby reducing production. Cost increases production efficiency.
  • the touch scan electrode and the touch drive electrode are formed in the common electrode layer, and the mutual inductance of the touch scan electrode and the touch drive electrode are fully considered, and the capacitance and touch of the touch scan electrode are reduced.
  • the capacitance of the sensing electrode to the ground and the time-division driving of the display signal and the touch signal reduce the RC delay of the touch screen, reduce the noise, and increase the signal-to-noise ratio (SNR) of the touch screen. Since the display signal and the touch signal are time-divisionally driven, mutual interference between the touch and display functions can be reduced, thereby improving the quality of the touch screen display screen and the accuracy of the touch display.
  • Embodiment 2 of the present invention provides an array substrate including a base substrate and gate lines, data lines, and common electrode layers formed on the base substrate, the gate lines and the data lines defining pixel units.
  • the common electrode layer may include: a touch scan electrode and a touch sensing electrode, wherein the touch scan electrode is configured to load the common electrode signal during the display time period and load the touch scan signal during the touch time period, and the touch sensing electrode It is used to load the common electrode signal during the display time period and output the touch sensing signal during the touch time period.
  • FIG. 3 is a schematic structural diagram of a common electrode layer according to Embodiment 2 of the present invention.
  • the common electrode layer includes: a touch scan electrode 1 and a touch sensing electrode 2.
  • the touch scan electrode 1 and the touch sensing electrode 2 form an array of interposer electrodes, and the touch scan electrodes 1 and the touch sensing electrodes 2 are disposed in the same layer and insulated from each other.
  • each row of the touch scan electrodes 1 may include a plurality of touch scan sub-electrodes, and each adjacent two rows of touch scan electrodes 1 form a group, and two touch scans are located in opposite positions in each group and located in two rows.
  • the sub-electrodes are integrated, and the touch sensing electrodes 2 of the adjacent groups are integrated.
  • the touch scan electrode 1 and the touch sensing electrode 2 refer to the description of the first embodiment, and details are not described herein again.
  • the array substrate may further include: a touch scan signal line and a touch sensing signal line.
  • a touch scanning signal line and the touch sensing signal line For a detailed description of the touch scanning signal line and the touch sensing signal line, refer to the description in the first embodiment, and details are not described herein again.
  • the touch scanning signal line and the touch sensing signal line are both disposed in the same layer as the gate line.
  • the touch scan signal line and the touch sensing signal line may also be disposed in different layers from the gate line, and the insulating layer is disposed between the touch scan signal line and the touch sensing signal line and the gate line.
  • the touch scan signal line and the touch sense signal line may also be disposed in the same layer as the data line.
  • each adjacent two rows of touch scan signal lines and/or touch sense signal lines are located at gaps between adjacent groups.
  • the common electrode is not included in the common electrode layer. Specifically, the common electrode is not disposed at a gap between the touch scan sub-electrode and the touch sensing electrode. Since the common electrode is not disposed in the common electrode layer, the common electrode signal is loaded on the touch scan electrode and the touch sensing electrode during the display period, so that the touch scan electrode and the touch sensing electrode function as a common electrode. .
  • This embodiment and the above embodiment In contrast, since the common electrode is not disposed in the common electrode layer, the pattern complexity of the common electrode layer is simplified, and manufacturing difficulty is reduced.
  • Embodiment 3 of the present invention provides an array substrate including a base substrate and gate lines, data lines, and common electrode layers formed on the base substrate, the gate lines and the data lines defining pixel units.
  • the common electrode layer may include: a touch scan electrode and a touch sensing electrode, wherein the touch scan electrode is configured to load the common electrode signal during the display time period and load the touch scan signal during the touch time period, and the touch sensing electrode It is used to load the common electrode signal during the display time period and output the touch sensing signal during the touch time period.
  • the common electrode layer includes: a touch scan electrode 1, a touch sensing electrode 2, and a common electrode 3.
  • the common electrode 3 is used to load the common electrode signal during the display period.
  • the touch scanning electrode 1 and the touch sensing electrode 2 form an interposer electrode array structure, and the touch scanning electrode 1 and the touch sensing electrode 2 are disposed in the same layer and insulated from each other.
  • the common electrode 3 may include: a first common sub-electrode 301 and a second common sub-electrode 302, the first common sub-electrode 301 is located at a gap between the touch scan electrode and the touch-sensing electrode, and the second common sub-electrode 302 is located at a phase
  • the adjacent rows are interposed between the gaps between the electrode array structures.
  • each row of the touch scan electrodes 1 may include a plurality of touch scan sub-electrodes, as shown in FIG. 4 , for example, the first row (the top row in the figure) of the touch scan electrodes 1 includes touches.
  • the scanning sub-electrode 11 , the touch scanning sub-electrode 12 and the touch scanning sub-electrode 13 , the first common sub-electrode 301 can be located at a gap between the touch scanning sub-electrode and the touch sensing electrode 2 .
  • the array substrate may further include: a touch scan signal line, a touch sensing signal line, and a common electrode signal line.
  • the touch scan signal line, the touch sensing signal line, and the common electrode signal line are all disposed in the same layer as the gate line.
  • the common electrode 3 includes a first common sub-electrode 301 and a second common sub-electrode 302, and the first common sub-electrode 301 and the corresponding common electrode signal line 43.
  • the common electrode signal line 44, the common electrode signal line 45, and the common electrode signal line 46 are connected; the second common sub-electrode 302 is connected to the corresponding common electrode signal line 47.
  • the common electrode signal line and the corresponding common electrode may be connected by a plurality of via holes.
  • a fourth embodiment of the present invention provides a touch panel, which includes an array substrate.
  • the array substrate may be the array substrate in the first embodiment, the second embodiment, or the third embodiment, and is not described in detail.
  • the fifth embodiment of the present invention provides a display device, which includes a touch screen, and the touch screen can adopt the touch screen in the fourth embodiment, which is not described in detail herein.
  • FIG. 5 is a flow chart showing a method of fabricating an array substrate according to Embodiment 6 of the present invention. As shown in FIG. 5, the method includes the following steps:
  • Step 101 Form a gate line and a data line on the base substrate, and the gate line and the data line define the pixel unit.
  • the pixel unit includes a thin film transistor TFT and a pixel electrode.
  • the TFT includes a gate, a source, a drain, and an active layer.
  • step 101 includes the following sub-steps:
  • Step 1011 forming a gate and a gate line on the base substrate, and forming a metal signal line while forming the gate line, the metal signal line may include a touch scan signal line, a touch sensing signal line, and a common electrode signal line. One or any combination thereof;
  • Step 1012 forming a gate insulating layer on the gate, the gate line and the metal signal line, the gate insulating layer covering the entire substrate;
  • Step 1013 forming an active layer pattern on the gate insulating layer
  • Step 1014 forming a source, a drain, and a data line connected to the source on the base substrate on which the active layer pattern is formed, and the gate line and the data line define the pixel unit;
  • Step 1015 forming a pixel electrode connected to the drain in the pixel unit
  • Step 1016 forming a passivation layer on the substrate substrate on which the pixel electrode is formed, and forming a via hole on the passivation layer.
  • Step 102 forming a common electrode layer on the substrate formed with the passivation layer, the common electrode layer includes a touch scan electrode and a touch sensing electrode, and the touch scan electrode is configured to load the common electrode signal during the display period and Loading a touch scan signal during a touch period, the touch sense The electrode is configured to load the common electrode signal during the display time period and output the touch sensing signal during the touch time period.
  • the common electrode layer may further include a common electrode for loading the common electrode signal during the display period.
  • the common electrode layer is formed on the passivation layer and filled in the via hole, so that the touch scan signal line and the corresponding touch scan electrode are connected through the via hole, and the touch sensing signal line and the corresponding touch sensing electrode pass through The via connection, and the common electrode signal line and the corresponding common electrode are connected through the via.
  • the gate, the gate line, the metal signal line, the active layer pattern, the source, the drain, the data line, the touch scan electrode, the touch sensing electrode, and the common electrode may all be formed by a patterning method.
  • the patterning method may at least include: photoresist coating, mask exposure, development, etching, and photoresist stripping.
  • the method for fabricating the array substrate provided in this embodiment can be used to fabricate the array substrate described in the first embodiment, the second embodiment, or the third embodiment.
  • the structure of the array substrate refer to the above embodiments, and details are not described herein.
  • the array substrate manufactured by the method for manufacturing the array substrate includes a touch scan electrode, a touch sensing electrode, and a common electrode, and the display signal and the touch signal are time-divisionally driven, so that the touch signal is displayed during the transmission period.
  • the control scanning electrode, the touch sensing electrode and the common electrode jointly realize the transmission of the common signal.
  • the touch scanning electrode and the touch sensing electrode realize the transmission of the touch signal sensing.
  • the touch scan electrode and the touch sense electrode are formed in the common electrode layer, there is no need to add a new film layer on the array substrate, and there is no need to add a new process step in the manufacturing process, thereby reducing production. Cost increases production efficiency.
  • the same mask can be used to simultaneously produce the touch scan signal line, the touch sensing signal line, and the common electrode.
  • Signal lines and gate lines eliminate the need for additional masks, simplifying production processes, reducing manufacturing costs and increasing productivity.

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Abstract

提供了一种阵列基板及其制造方法、触摸屏和显示装置。该阵列基板包括衬底基板和形成于衬底基板上的栅线（6）、数据线（7）和公共电极层，栅线（6）和数据线（7）限定像素单元（5），公共电极层包括：触控扫描电极（1）和触控感应电极（2）；触控扫描电极（1），用于在显示时间段内加载公共电极信号以及在触控时间段内加载触控扫描信号；触控感应电极（2），用于在显示时间段内加载公共电极信号以及在触控时间段内输出触控感应信号。由于触控扫描电极（1）和触控感应电极（2）是形成于公共电极层中的，因此无需在阵列基板上增加新的膜层，也无需在制造过程中增加新的工艺流程，从而降低了生产成本，提高了生产效率。

Description

阵列基板及其制造方法、 触摸屏和显示装置 技术领域
本发明涉及显示技术领域， 特别涉及阵列基板及其制造方法、 触摸 屏和显示装置。 背景技术
随着显示技术的发展， 触摸屏 （Touch Panel )技术进入快速发展的 时期。触摸屏按照结构可分为： 外挂式触摸屏（Add on cell Touch Panel ) 和嵌入式触摸屏 （In Cel l Touch Panel ) 。 当前主流的触摸屏基本上采 用的是外挂式触摸屏，外挂式触摸屏是分别制造触摸面板和液晶显示面板 然后将触摸面板和液晶显示面板贴合到一起而形成的具有触摸功能的液 晶显示屏。但是， 外挂式触摸屏存在制造成本高、 光透过率低以及整机结 构厚重等缺点， 其难以满足消费者对触摸屏轻薄化的要求。特别是， 通常 外挂（Glass To Glass, 简称： GTG)式触摸屏需要经过两次贴合才能制 成， 使得产品的制造成本大幅增加， 产品的良品率大幅降低， 并且增加了 整机结构的厚度， 更加难以满足消费者对触摸屏轻薄化的要求。
随着消费者对触摸屏轻薄化的要求越来越高， 嵌入式触摸屏成为触 摸屏技术领域未来发展的一个重要方向。嵌入式触摸屏是将触摸屏的触控 电极内嵌在液晶显示面板内部， 从而极大地减小了整机结构的厚度， 并且 降低了制造成本。 目前，现有的内嵌式触摸屏是在阵列基板上直接增加异 面相交的触控扫描线和触控感应线，触控扫描线和触控感应线的相交处形 成感应电容。在触控扫描线上加载触控扫描信号， 当人体对触摸屏进行触 摸时， 人体电场会作用在感应电容上， 使感应电容的电容值发生变化， 触 控感应线耦合出的电压信号被改变，从而根据电压信号的变化确定出触摸 点位置。
现有技术中的嵌入式触摸屏的结构中， 形成触控扫描线和触控感应 线需要在阵列基板上增加新的膜层结构，导致在制造阵列基板的过程中需 要增加新的流程步骤， 从而增加了生产成本， 降低了生产效率。 发明内容
本发明提供一种阵列基板及其制造方法、 触摸屏和显示装置， 其无 需在阵列基板上增加新的膜层， 也无需在制造过程中增加新的流程步骤， 从而降低了生产成本， 并提高了生产效率。
为了实现上述目的， 本发明提供了一种阵列基板， 其包括衬底基板 和形成于衬底基板上的栅线、数据线和公共电极层， 所述栅线和所述数据 线限定像素单元， 所述公共电极层包括： 触控扫描电极和触控感应电极， 其中，所述触控扫描电极用于在显示时间段内加载公共电极信号以及在触 控时间段内加载触控扫描信号，所述触控感应电极用于在显示时间段内加 载公共电极信号以及在触控时间段内输出触控感应信号。
可选地， 所述阵列基板还包括： 触控扫描信号线和触控感应信号线， 所述触控扫描信号线与对应的所述触控扫描电极连接，所述触控感应信号 线与对应的所述触控感应电极连接，所述触控扫描信号线和所述触控感应 信号线均与所述栅线同层设置。
可选地， 所述触控扫描信号线和对应的所述触控扫描电极通过多个 过孔连接，所述触控感应信号线和对应的所述触控感应电极通过多个过孔 连接。
可选地， 所述公共电极层还包括： 公共电极， 所述公共电极用于在 显示时间段内加载公共电极信号。
可选地， 所述阵列基板还包括： 公共电极信号线， 所述公共电极信 号线与对应的所述公共电极连接，所述公共电极信号线与所述栅线同层设 置。
可选地， 所述公共电极信号线和对应的所述公共电极通过多个过孔 连接。
可选地， 所述触控扫描电极和所述触控感应电极形成插指电极阵列 结构。
可选地， 所述触控扫描电极和所述触控感应电极形成插指电极阵列 结构，所述公共电极位于所述触控扫描电极和所述触控感应电极之间的间 隙处。
可选地， 每行触控扫描电极包括多个触控扫描子电极， 每相邻的两 行触控扫描电极形成一组，每组中位置相对且位于两行的两个触控扫描子 电极为一体结构， 相邻组的触控感应电极为一体结构。
可选地， 所述公共电极包括： 第一公共子电极和第二公共子电极， 其中， 所述触控扫描电极和所述触控感应电极形成插指电极阵列结构， 所 述第一公共子电极位于所述触控扫描电极和所述触控感应电极之间的间 隙处，所述第二公共子电极位于相邻行所述插指电极阵列结构之间的间隙 处。
可选地， 每相邻的两行像素单元形成一组， 每组中两行所述像素单 元之间形成有两条所述栅线，所述触控扫描信号线和所述触控感应信号线 中之一或其任意组合位于相邻组之间的间隙处。
可选地， 每相邻的两行像素单元形成一组， 每组中两行所述像素单 元之间形成有两条所述栅线， 所述触控扫描信号线、所述触控感应信号线 和 /或所述公共电极信号线位于相邻组之间的间隙处。
本发明还提供了一种触摸屏， 包括： 上述阵列基板。
本发明还提供了一种显示装置， 包括： 上述触摸屏。
此外， 本发明还提供了一种阵列基板的制造方法， 包括： 在衬底基 板上形成栅线和数据线， 所述栅线和所述数据线限定像素单元； 在所述衬 底基板上形成公共电极层，所述公共电极层包括触控扫描电极和触控感应 电极，所述触控扫描电极用于在显示时间段内加载公共电极信号以及在触 控时间段内加载触控扫描信号，所述触控感应电极用于在显示时间段内加 载公共电极信号以及在触控时间段内输出触控感应信号。
可选地， 所述公共电极层还包括公共电极， 所述公共电极用于在显 示时间段内加载公共电极信号。
可选地， 所述制造方法还包括： 在衬底基板上形成栅线的同时， 形 成金属信号线， 其中， 所述金属信号线包括触控扫描信号线、触控感应信 号线和公共电极信号线中之一或其任意组合。
本发明提供的技术方案中， 公共电极层包括触控扫描电极、 触控感 应电极和公共电极， 对显示信号和触控信号进行分时驱动， 使得在显示信 号传送时段， 触控扫描电极、触控感应电极和公共电极共同实现公共电极 信号的传送， 在触控信号传送时段， 触控扫描电极和触控感应电极实现触 摸感应信号的传送。由于触控扫描电极和触控感应电极形成于公共电极层 中， 因此无需在阵列基板上增加新的膜层， 也无需在制造过程中增加新的 流程步骤， 从而降低了生产成本， 提高了生产效率。 附图说明
图 1为本发明的实施例一中的公共电极层的结构示意图。
图 2为图 1中的 A处的放大示意图。
图 3为本发明的实施例二中的公共电极层的结构示意图。
图 4为本发明的实施例三中的公共电极层的结构示意图。
图 5为根据本发明的实施例六提供的一种阵列基板的制造方法的流 程图。 具体实施方式
为了使本领域的技术人员更好地理解本发明的技术方案， 下面结合 附图对本发明的实施例提供的阵列基板及其制造方法、触摸屏和显示装置 进行详细描述。
本发明的实施例一提供了一种阵列基板， 该阵列基板包括衬底基板 和形成于衬底基板上的栅线、数据线和公共电极层， 栅线和数据线限定像 素单元。其中， 公共电极层可包括： 触控扫描电极和触控感应电极， 触控 扫描电极用于在显示时间段内加载公共电极信号以及在触控时间段内加 载触控扫描信号，触控感应电极用于在显示时间段内加载公共电极信号以 及在触控时间段内输出触控感应信号。
本实施例中， 对传统的整面连接的公共电极层进行优化设计， 使得 公共电极层中形成触控扫描电极和触控感应电极，并采用分时驱动显示和 触控技术实现触控屏的功能。其中， 分时驱动显示和触控技术是指： 将一 帧时间划分为显示时间段和触控时间段，在触控时间段内触控扫描电极上 加载触控扫描信号，而触控感应电极在该触控时间段内耦合触控扫描信号 生成触控感应信号并输出该触控感应信号；在显示时间段内触控扫描电极 和触控感应电极上均加载公共电极信号，此时触控扫描电极和触控感应电 极起到公共电极的作用。本实施例中， 优选地， 公共电极层的材料为透明 导电材料， 例如氧化铟锡 （Tin Indium Oxide, ITO) 。
图 1为本发明的实施例一中的公共电极层的结构示意图， 如图 1所 示， 该公共电极层包括： 触控扫描电极 1、 触控感应电极 2和公共电极 3。 公共电极 3用于在显示时间段内加载公共电极信号。本实施例中， 触控扫 描电极 1和触控感应电极 2形成插指电极阵列结构，触控扫描电极 1和触 控感应电极 2同层设置且相互绝缘， 因此形成插指结构的触控扫描电极 1 和触控感应电极 2之间存在间隙，这样在触控扫描电极 1和触控感应电极 2之间的间隙处可设置公共电极 3，因此公共电极 3可位于触控扫描电极 1 和触控感应电极 2之间的间隙处。优选地， 每行触控扫描电极 1可包括多 个触控扫描子电极， 每相邻的两行触控扫描电极 1形成一组， 每组中位置 相对且位于两行的两个触控扫描子电极为一体结构，相邻组的触控感应电 极 2为一体结构。 以图 1中的第一行（图中最上面一行）和第二行为例进 行描述，第一行触控扫描电极 1包括触控扫描子电极 11、触控扫描子电极 12和触控扫描子电极 13，触控扫描子电极 11、触控扫描子电极 12和触控 扫描子电极 13同层设置且相互绝缘； 第二行触控扫描电极 1包括触控扫 描子电极 14、触控扫描子电极 15和触控扫描子电极 16， 触控扫描子电极 14、触控扫描子电极 15和触控扫描子电极 16同层设置且相互绝缘。第一 行触控扫描电极 1和第二行触控扫描电极 1形成一组，位置相对的触控扫 描子电极 11和触控扫描子电极 14为一体结构，位置相对的触控扫描子电 极 12和触控扫描子电极 15为一体结构， 位置相对的触控扫描子电极 13 和触控扫描子电极 16为一体结构。 并且， 相邻组的触控感应电极 2为一 体结构， 如图 1所示， 例如， 与第二行的触控扫描电极形成插指结构的触 控感应电极 2和与第三行的触控扫描电极形成插指结构的触控感应电极 2 为一体结构。 具体地， 如图 1所示， 公共电极 3可位于触控扫描子电极和 触控感应电极 2之间的间隙处。
本实施例中， 触控扫描电极为纵向电极， 触控感应电极为横向电极。 但在实际应用中， 可选地， 触控扫描电极可以为横向电极， 而触控感应电 极为纵向电极， 此种情况不再具体画出。 此外， 在实际应用中， 触控扫描 电极和触控感应电极还可以为其它结构， 例如， 条状结构或者菱形结构， 在此不做限定。本实施例中， 触控扫描电极和触控感应电极采用插指电极 阵列结构， 能够增大触控扫描电极和触控感应电极的互感电容， 从而提高 了触控的灵敏性和准确性。并且可以通过调整公共电极和插指电极阵列结 构之间的间距， 进一步地增大触控扫描电极和触控感应电极的互感电容， 从而进一步地提高了触控的灵敏性和准确性。
本实施例中， 触摸屏的精度通常在毫米级， 可通过选择触控扫描电 极和触控感应电极的密度和宽度以保证所需的精度。 例如， 如图 1所示， 触控扫描电极的宽度 dl可以为 5ram至 6ram， 触控感应电极的宽度 d2可以 为 5讓至 6讓。
进一步地， 该阵列基板还可以包括： 触控扫描信号线、 触控感应信 号线和公共电极信号线。触控扫描信号线用于在显示时间段内向触控扫描 电极输出公共电极信号以及在触控时间段内向触控扫描电极输出触控扫 描信号。触控感应信号线用于在显示时间段内向触控感应电极输出公共电 极信号以及在触控时间段内接收触控感应电极输出的触控感应信号并输 出。 公共电极信号线用于在显示时间段内向公共电极输出公共电极信号。 触控扫描信号线与对应的触控扫描电极连接，触控感应信号线与对应的触 控感应电极连接， 公共电极信号线与对应的公共电极连接。优选地， 每个 触控扫描子电极可对应于至少一条触控扫描信号线， 因此， 每个触控扫描 子电极可与至少一条触控扫描信号线连接。如图 1所示， 例如， 触控扫描 子电极 11与对应的触控扫描信号线 31和触控扫描信号线 32连接， 触控 扫描子电极 12与对应的触控扫描信号线 33和触控扫描信号线 34连接， 触控扫描子电极 13与对应的触控扫描信号线 35和触控扫描信号线 36连 接。优选地，每个触控感应电极可对应于至少一条触控感应信号线，因此， 每个触控感应电极可与至少一条触控感应信号线连接。如图 1所示，例如， 触控感应电极 2与对应的触控感应信号线 37、 触控感应信号线 38、 触控 感应信号线 39和触控感应信号线 40连接。优选地， 触控扫描信号线和对 应的触控扫描电极可通过多个过孔 41连接， 触控感应信号线和对应的触 控感应电极可通过多个过孔 42连接， 需要说明的是， 图 1中的实心圆点 即为过孔， 图中仅标注 41和 42两个标号进行说明， 其余过孔不再一一标 注。优选地， 每个公共电极可对应于至少一条公共电极信号线， 因此， 每 个公共电极可与至少一条公共电极信号线连接。如图 1所示， 例如， 公共 电极 3与对应的公共电极信号线 43、 公共电极信号线 44、 公共电极信号 线 45和公共电极信号线 46连接。优选地， 公共电极信号线和对应的公共 电极可通过多个过孔连接。 由于公共电极层通常采用透明导电材料制成， 因此触控扫描信号线和对应的触控扫描电极通过多个过孔连接、触控感应 信号线和对应的触控感应电极通过多个过孔连接、以及公共电极信号线和 对应的公共电极通过多个过孔连接相当于将透明导电材料制成的电极和 多个由信号线组成的金属电阻并联， 这样能够最大限度的减小电极的电 阻， 从而提高电极传递信号的信噪比。
本实施例中， 优选地， 触控扫描信号线、 触控感应信号线和公共电 极信号线均与栅线同层设置。 在实际应用中， 可选地， 触控扫描信号线、 触控感应信号线和公共电极信号线也可以与栅线非同层设置，即在触控扫 描信号线、 触控感应信号线和公共电极信号线与栅线之间设置有绝缘层。 在实际应用中， 可选地， 触控扫描信号线、 触控感应信号线和公共电极信 号线也可以与数据线同层设置。 当触控扫描信号线、触控感应信号线和公 共电极信号线均与栅线同层设置时，可以采用同一个掩膜板同时制作出触 控扫描信号线、 触控感应信号线、 公共电极信号线和栅线， 无需采用额外 的掩膜板， 从而简化了生产流程， 降低了制造成本， 提高了生产效率。 同 理， 当触控扫描信号线、触控感应信号线和公共电极信号线均与数据线同 层设置时， 也简化了生产流程， 降低了制造成本， 提高了生产效率。
本实施例中， 像素单元可包括薄膜晶体管（Thin Film Transistor, TFT)和像素电极。 优选地， 本实施例提供的阵列基板可应用于高级超维 场转换（Advanced Super Dimension Switch, ADS)型显示装置或者超高 级超维场转换（High Advanced Super Dimension Switch, HADS )型显示 装置。在触摸屏中， 通常具有触控功能的结构的精度在毫米级， 而具有显 示功能的结构的精度在微米级， 因此， 通常一个触控扫描电极和触控感应 电极可覆盖多行或者多列像素单元。其中， 精度指的是触摸屏中一个触控 单元的尺寸或者一个像素单元的尺寸。本实施例中， 由于具有触控功能的 结构和具有显示功能的结构在精度上存在数量级的差异， 因此为了能够更 清楚的表示出像素单元的结构， 对图 1中的局部结构进行放大形成图 2。 图 2为图 1中的 A处的放大图， 如图 2所示， 栅线 6和数据线 7限定像素 单元 5， 像素单元 5包括薄膜晶体管 51和像素电极 52， 每相邻的两行像 素单元 5形成一组， 每组中两行像素单元 5之间形成有两条栅线 6。 两条 栅线 6分别控制上下两行像素单元 5， 靠近上行像素单元 5的栅线 6控制 上行像素单元 5， 而靠近下行像素单元 5的栅线 6控制下行像素单元 5。 通过上述结构变换， 节省出一部分栅线的位置， 这样就可以在相邻组之间 的间隙处设置触控扫描信号线、触控感应信号线和公共电极信号线中之一 或其任意组合， 也就是说， 触控扫描信号线、 触控感应信号线和公共电极 信号线中之一或其任意组合可位于相邻组之间的间隙处，且触控扫描信号 线、 触控感应信号线和公共电极信号线均可与栅线 6同层设置， 具体地， 如图 1所示， 公共电极信号线 46设置于上行像素电极 5的上方且通过过 孔 48与公共电极 3连接，触控扫描信号线 34设置于下行像素单元 5的下 方且通过过孔 49与触控扫描电极 1连接。 综上所述， 在相邻组之间的间 隙处可设置一条或者多条信号线。上述结构变换节省出了一部分栅线的位 置， 以布置上述触控扫描信号线、 触控感应信号线和公共电极信号线， 不 会过多占用开口区域， 使得触摸屏像素的开口率达到最大化。
本实施例提供的阵列基板的公共电极层包括触控扫描电极、 触控感 应电极和公共电极， 对显示信号和触控信号进行分时驱动， 使得在显示信 号传送时段， 触控扫描电极、触控感应电极和公共电极共同实现公共信号 的传送， 在触控信号传送时段， 触控扫描电极和触控感应电极实现触摸信 号感应的传送。本实施例中， 由于触控扫描电极和触控感应电极形成于公 共电极层中， 因此无需在阵列基板上增加新的膜层， 也无需在制造过程中 增加新的流程步骤，从而降低了生产成本，提高了生产效率。本实施例中， 在公共电极层中形成触控扫描电极和触控驱动电极，充分考虑了触控扫描 电极和触控驱动电极的互感电容， 降低了触控扫描电极的对地电容和触控 感应电极的对地电容， 并对显示信号和触摸信号进行分时驱动， 从而减小 了触摸屏的 RC延迟， 降低了噪声， 增大了触摸屏的信噪比（SNR) 。 由于 对显示信号和触摸信号进行分时驱动， 因此能够降低触控和显示功能的相 互干扰， 从而提高了触摸屏显示画面的品质和触控的准确性。 本发明的实施例二提供了一种阵列基板， 该阵列基板包括衬底基板 和形成于衬底基板上的栅线、数据线和公共电极层， 栅线和数据线限定像 素单元。其中， 公共电极层可包括： 触控扫描电极和触控感应电极， 触控 扫描电极用于在显示时间段内加载公共电极信号以及在触控时间段内加 载触控扫描信号，触控感应电极用于在显示时间段内加载公共电极信号以 及在触控时间段内输出触控感应信号。
图 3为本发明的实施例二中的公共电极层的结构示意图， 如图 3所 示，该公共电极层包括：触控扫描电极 1和触控感应电极 2。本实施例中， 触控扫描电极 1和触控感应电极 2形成插指电极阵列结构，触控扫描电极 1和触控感应电极 2同层设置且相互绝缘。 优选地， 每行触控扫描电极 1 可包括多个触控扫描子电极， 每相邻的两行触控扫描电极 1形成一组， 每 组中位置相对且位于两行的两个触控扫描子电极为一体结构，相邻组的触 控感应电极 2为一体结构。本实施例中， 对触控扫描电极 1和触控感应电 极 2的具体描述可参见上述实施例一的描述， 此处不再赘述。
进一步地， 该阵列基板还可以包括： 触控扫描信号线和触控感应信 号线。对触控扫描信号线和触控感应信号线的具体描述可参见上述实施例 一中的描述， 此处不再赘述。
本实施例中， 优选地， 触控扫描信号线和触控感应信号线均与栅线 同层设置。在实际应用中， 可选地， 触控扫描信号线和触控感应信号线也 可以与栅线非同层设置，触控扫描信号线和触控感应信号线与栅线之间设 置有绝缘层。在实际应用中， 可选地， 触控扫描信号线和触控感应信号线 也可以与数据线同层设置。
本实施例中， 每相邻的两行触控扫描信号线和 /或触控感应信号线位 于相邻组之间的间隙处。具体描述可参见实施例一中的描述， 此处不再赘 述。
本实施例与上述实施例一的区别在于： 本实施例中， 公共电极层中 不包括公共电极， 具体地， 在触控扫描子电极和触控感应电极之间的间隙 处未设置公共电极。 由于公共电极层中未设置公共电极， 因此在显示时间 段内， 通过在触控扫描电极和触控感应电极上加载公共电极信号， 使得触 控扫描电极和触控感应电极起到公共电极的作用。本实施例与上述实施例 一相比， 由于在公共电极层未设置公共电极， 从而简化了公共电极层的图 形复杂度， 降低了制造难度。
本发明的实施例三提供了一种阵列基板， 该阵列基板包括衬底基板 和形成于衬底基板上的栅线、数据线和公共电极层， 栅线和数据线限定像 素单元。其中， 公共电极层可包括： 触控扫描电极和触控感应电极， 触控 扫描电极用于在显示时间段内加载公共电极信号以及在触控时间段内加 载触控扫描信号，触控感应电极用于在显示时间段内加载公共电极信号以 及在触控时间段内输出触控感应信号。
图 4为本发明的实施例三中的公共电极层的结构示意图， 如图 4所 示， 该公共电极层包括： 触控扫描电极 1、 触控感应电极 2和公共电极 3。 公共电极 3用于在显示时间段内加载公共电极信号。本实施例中， 触控扫 描电极 1和触控感应电极 2形成插指电极阵列结构，触控扫描电极 1和触 控感应电极 2同层设置且相互绝缘。公共电极 3可包括： 第一公共子电极 301和第二公共子电极 302， 第一公共子电极 301位于触控扫描电极和触 控感应电极之间的间隙处，第二公共子电极 302位于相邻行插指电极阵列 结构之间的间隙处。本实施例中， 优选地， 每行触控扫描电极 1可包括多 个触控扫描子电极， 如图 4所示， 例如， 第一行（图中最上面一行）触控 扫描电极 1包括触控扫描子电极 11、 触控扫描子电极 12和触控扫描子电 极 13，第一公共子电极 301可位于触控扫描子电极和触控感应电极 2之间 的间隙处。
进一步地， 该阵列基板还可以包括： 触控扫描信号线、 触控感应信 号线和公共电极信号线。 本实施例中， 优选地， 触控扫描信号线、 触控感 应信号线和公共电极信号线均与栅线同层设置。 对上述触控扫描信号线、 触控感应信号线和公共电极信号线的描述可参见实施例一的描述，此处不 再赘述。 如图 4所示， 本实施例与上述实施例一的区别在于： 公共电极 3 包括第一公共子电极 301和第二公共子电极 302， 第一公共子电极 301与 对应的公共电极信号线 43、公共电极信号线 44、公共电极信号线 45和公 共电极信号线 46连接； 第二公共子电极 302与对应的公共电极信号线 47 连接。 优选地， 公共电极信号线和对应的公共电极可通过多个过孔连接。
需要说明的是： 在本发明的上述实施例一对应的图 1 中、 实施例二 对应的图 3中和实施例三对应的图 4中， 作为示意， 均仅在第一行的插指 电极阵列结构的对应位置上画出各种信号线， 其余行并未具体画出信号 线， 但本领域技术人员应当清楚， 在实际应用中其余行的插指电极阵列结 构的对应位置上也存在信号线。
本发明的实施例四提供了一种触摸屏， 该触摸屏包括阵列基板， 该 阵列基板可采用上述实施例一、实施例二或者实施例三中的阵列基板， 此 处不再具体描述。
本发明的实施例五提供了一种显示装置， 该显示装置包括触摸屏， 该触摸屏可采用上述实施例四中的触摸屏， 此处不再具体描述。
图 5为根据本发明的实施例六提供的一种阵列基板的制造方法的流 程图， 如图 5所示， 该方法包括以下步骤：
步骤 101、在衬底基板上形成栅线和数据线，栅线和数据线限定像素 单元。
本实施例中， 像素单元包括薄膜晶体管 TFT和像素电极。 其中， TFT 包括栅极、 源极、 漏极和有源层。
可选地， 步骤 101包括以下子步骤：
步骤 1011、 在衬底基板上形成栅极和栅线， 并且在形成栅线的同时 形成金属信号线， 该金属信号线可包括触控扫描信号线、触控感应信号线 和公共电极信号线中之一或其任意组合；
步骤 1012、 在栅极、 栅线和金属信号线上形成栅绝缘层， 该栅绝缘 层覆盖整个衬底基板；
步骤 1013、 在栅绝缘层上形成有源层图形；
步骤 1014、 在形成有有源层图形的衬底基板上形成源极、 漏极和与 源极连接的数据线， 栅线和数据线限定像素单元；
步骤 1015、 在像素单元中形成与漏极连接的像素电极；
步骤 1016、 在形成有像素电极的衬底基板上形成钝化层， 并在钝化 层上形成过孔。
步骤 102、在形成有钝化层的衬底基板上形成公共电极层，公共电极 层包括触控扫描电极和触控感应电极，触控扫描电极用于在显示时间段内 加载公共电极信号以及在触控时间段内加载触控扫描信号，所述触控感应 电极用于在显示时间段内加载公共电极信号以及在触控时间段内输出触 控感应信号。
可选地， 公共电极层还可以包括公共电极， 公共电极用于在显示时 间段内加载公共电极信号。
其中， 公共电极层形成于钝化层上并填充于过孔中， 以使触控扫描 信号线和对应的触控扫描电极通过过孔连接，触控感应信号线和对应的触 控感应电极通过过孔连接， 以及公共电极信号线和对应的公共电极通过过 孔连接。
本实施例中， 栅极、 栅线、 金属信号线、 有源层图形、 源极、 漏极、 数据线、触控扫描电极、触控感应电极和公共电极均可以通过构图方法形 成。 可选地， 构图方法至少可包括： 光刻胶涂覆、 掩膜曝光、 显影、 刻蚀 以及光刻胶剥离等步骤。
本实施例提供的阵列基板的制造方法可用于制造实施例一、 实施例 二或者实施例三中所述的阵列基板，对阵列基板结构的描述可参见上述实 施例， 此处不再赘述。
本实施例提供的阵列基板的制造方法制造出的阵列基板中包括触控 扫描电极、触控感应电极和公共电极， 对显示信号和触控信号进行分时驱 动， 使得在显示信号传送时段， 触控扫描电极、 触控感应电极和公共电极 共同实现公共信号的传送， 在触控信号传送时段， 触控扫描电极和触控感 应电极实现触摸信号感应的传送。本实施例中， 由于触控扫描电极和触控 感应电极形成于公共电极层中， 因此无需在阵列基板上增加新的膜层， 也 无需在制造过程中增加新的流程步骤， 从而降低了生产成本，提高了生产 效率。 当触控扫描信号线、触控感应信号线和公共电极信号线均与栅线同 层设置时， 可以采用同一个掩膜板同时制作出触控扫描信号线、触控感应 信号线、 公共电极信号线和栅线， 无需采用额外的掩膜板， 从而简化了生 产流程， 降低了制造成本， 提高了生产效率。
可以理解的是， 以上实施方式仅仅是为了说明本发明的原理而采用 的示例性实施方式， 然而本发明并不局限于此。本发明的实施例可以省略 上述技术特征中的一些技术特征， 仅解决现有技术中存在的部分技术问 题， 而且， 所公开的技术特征可以进行任意组合。对于本领域内的普通技 术人员而言， 在不脱离本发明的精神和实质的情况下， 可以做出各种变型 和改进， 这些变型和改进也视为本发明的保护范围。

Claims

1、 一种阵列基板， 包括衬底基板和形成于衬底基板上的栅线、 数据 线和公共电极层， 所述栅线和所述数据线限定像素单元， 其特征在于， 所 述公共电极层包括： 触控扫描电极和触控感应电极， 其中，
所述触控扫描电极用于在显示时间段内加载公共电极信号以及在触 控时间段内加载触控扫描信号，
所述触控感应电极用于在显示时间段内加载公共电极信号以及在触 控时间段内输出触控感应信号。
2、 根据权利要求 1所述的阵列基板， 其特征在于， 还包括： 触控扫 描信号线和触控感应信号线，所述触控扫描信号线与对应的所述触控扫描 电极连接， 所述触控感应信号线与对应的所述触控感应电极连接， 所述触 控扫描信号线和所述触控感应信号线均与所述栅线同层设置。
3、 根据权利要求 2所述的阵列基板， 其特征在于， 所述触控扫描信 号线和对应的所述触控扫描电极通过多个过孔连接，所述触控感应信号线 和对应的所述触控感应电极通过多个过孔连接。
4、 根据权利要求 1所述的阵列基板， 其特征在于， 所述公共电极层 还包括：公共电极，所述公共电极用于在显示时间段内加载公共电极信号。
5、 根据权利要求 4所述的阵列基板， 其特征在于， 还包括： 公共电 极信号线， 所述公共电极信号线与对应的所述公共电极连接， 所述公共电 极信号线与所述栅线同层设置。
6、 根据权利要求 5所述的阵列基板， 其特征在于， 所述公共电极信 号线和对应的所述公共电极通过多个过孔连接。
7、 根据权利要求 1所述的阵列基板， 其特征在于， 所述触控扫描电 极和所述触控感应电极形成插指电极阵列结构。
8、 根据权利要求 4所述的阵列基板， 其特征在于， 所述触控扫描电 极和所述触控感应电极形成插指电极阵列结构，所述公共电极位于所述触 控扫描电极和所述触控感应电极之间的间隙处。
9、 根据权利要求 7或 8所述的阵列基板， 其特征在于， 每行触控扫 描电极包括多个触控扫描子电极， 每相邻的两行触控扫描电极形成一组， 每组中位置相对且位于两行的两个触控扫描子电极为一体结构，相邻组的 触控感应电极为一体结构。
10、 根据权利要求 4所述的阵列基板， 其特征在于， 所述公共电极 包括： 第一公共子电极和第二公共子电极， 其中，
所述触控扫描电极和所述触控感应电极形成插指电极阵列结构， 所 述第一公共子电极位于所述触控扫描电极和所述触控感应电极之间的间 隙处，所述第二公共子电极位于相邻行所述插指电极阵列结构之间的间隙 处。
11、 根据权利要求 2所述的阵列基板， 其特征在于， 每相邻的两行 像素单元形成一组， 每组中两行所述像素单元之间形成有两条所述栅线， 所述触控扫描信号线和 /或所述触控感应信号线位于相邻组之间的间隙 处。
12、 根据权利要求 5所述的阵列基板， 其特征在于， 每相邻的两行 像素单元形成一组， 每组中两行所述像素单元之间形成有两条所述栅线， 所述触控扫描信号线、所述触控感应信号线和所述公共电极信号线中之一 或其任意组合位于相邻组之间的间隙处。
13、 一种触摸屏， 其特征在于， 包括： 权利要求 1至 12中任一项所 述的阵列基板。
14、一种显示装置，其特征在于，包括：权利要求 13所述的触摸屏。
15、 一种阵列基板的制造方法， 其特征在于， 包括：
在衬底基板上形成栅线和数据线， 所述栅线和所述数据线限定像素 单元；
在所述衬底基板上形成公共电极层， 所述公共电极层包括： 触控扫 描电极和触控感应电极，所述触控扫描电极用于在显示时间段内加载公共 电极信号以及在触控时间段内加载触控扫描信号，所述触控感应电极用于 在显示时间段内加载公共电极信号以及在触控时间段内输出触控感应信 号。
16、 根据权利要求 15所述的阵列基板的制造方法， 其特征在于， 所述公共电极层还包括： 公共电极， 所述公共电极用于在显示时间段内加 载公共电极信号。
17、 根据权利要求 16所述的阵列基板的制造方法， 其特征在于， 还 包括：
在衬底基板上形成栅线的同时， 形成金属信号线， 其中，
所述金属信号线包括触控扫描信号线、 触控感应信号线和公共电极 信号线中之一或其任意组合。
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