WO2015003468A1 - 封框胶及其制备方法和含该封框胶的显示装置 - Google Patents

封框胶及其制备方法和含该封框胶的显示装置 Download PDF

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Publication number
WO2015003468A1
WO2015003468A1 PCT/CN2013/090927 CN2013090927W WO2015003468A1 WO 2015003468 A1 WO2015003468 A1 WO 2015003468A1 CN 2013090927 W CN2013090927 W CN 2013090927W WO 2015003468 A1 WO2015003468 A1 WO 2015003468A1
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Prior art keywords
acrylic resin
weight percentage
epoxy
frame sealing
manganese
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PCT/CN2013/090927
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English (en)
French (fr)
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王建
李伟
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京东方科技集团股份有限公司
北京京东方光电科技有限公司
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Priority to US14/386,491 priority Critical patent/US20160251551A1/en
Publication of WO2015003468A1 publication Critical patent/WO2015003468A1/zh

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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J163/00Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
    • C09J163/10Epoxy resins modified by unsaturated compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04Homopolymers or copolymers of esters
    • C09J133/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09J133/08Homopolymers or copolymers of acrylic acid esters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20Oxides; Hydroxides
    • C08K3/22Oxides; Hydroxides of metals
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04Homopolymers or copolymers of esters
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04Homopolymers or copolymers of esters
    • C08L33/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04Homopolymers or copolymers of esters
    • C08L33/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/062Copolymers with monomers not covered by C08L33/06
    • C08L33/068Copolymers with monomers not covered by C08L33/06 containing glycidyl groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • C08L63/10Epoxy resins modified by unsaturated compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04Homopolymers or copolymers of esters
    • C09J133/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09J133/062Copolymers with monomers not covered by C09J133/06
    • C09J133/068Copolymers with monomers not covered by C09J133/06 containing glycidyl groups
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/201Filters in the form of arrays
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1339Gaskets; Spacers; Sealing of cells
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/18Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20Oxides; Hydroxides
    • C08K3/22Oxides; Hydroxides of metals
    • C08K2003/2296Oxides; Hydroxides of metals of zinc
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber

Definitions

  • Embodiments of the present invention relate to a frame sealant, a method of preparing the same, and a display device including the frame sealant. Background technique
  • the liquid crystal display panel has been rapidly developed, and the liquid crystal display panel largely determines the brightness, contrast, color, viewing angle, and the like of the liquid crystal display device. Therefore, the manufacturing process of the liquid crystal display panel directly affects the quality of the display.
  • the conventional liquid crystal display panel is generally formed by an array substrate and a color film substrate pair box.
  • a schematic cross-sectional structure of the conventional liquid crystal panel includes an array substrate 1 , a color filter substrate 2 , and an array substrate 1 and color
  • the sealant 3 is used as an adhesive to bond the two together to form a complete liquid crystal panel, and is sealed by the sealant 3 on the array substrate 1 and color.
  • the inorganic filler in the existing sealant is generally composed of silica nanoparticles as a main component, and has a certain bond strength after curing, which can serve as a support, but the sealant is in the curing process and the array substrate.
  • the inorganic filler containing silica nanoparticles as a main component can play a good supporting role, but does not prevent the particulate precipitates.
  • the precipitated particulate precipitate easily causes an afterimage to appear on the screen, resulting in poor display.
  • the embodiment of the invention aims to provide a frame sealant, a preparation method thereof and a curing method, and a display device sealed by the frame sealant, so as to solve the problem that the frame sealant cannot prevent the precipitation of particulate precipitates in the prior art, resulting in display. Bad problem. Summary of the invention
  • the embodiment of the invention provides a frame sealant, which comprises an epoxy-acrylic resin, an acrylic resin, a heat curing agent, a coupling agent, a photoinitiator and an organic filler, and further comprises a ring and the ring
  • the oxygen-acrylic resin undergoes a crosslinking reaction as a one-dimensional nanomaterial as an inorganic filler.
  • the one-dimensional nanomaterial is an oxidized nanowire.
  • the one-dimensional nanomaterial has a weight percentage of 10% to 20%.
  • the oxidized nanowire has an outer diameter of 5 to 20 nm and a length of 50 to 500 nm.
  • the embodiment of the invention further provides a display device comprising an array substrate and a color filter substrate, and the frame sealant is disposed between the array substrate and the color filter substrate.
  • the embodiment of the invention further provides a preparation method of the above sealant, comprising:
  • the kneaded mixture was defoamed.
  • the one-dimensional nanomaterial is an oxidized nanowire or a carbon nanowire.
  • the oxidized nanowires were produced by chemical vapor deposition using powdered powder and manganese oxide powder.
  • the oxidized nanowires are produced by chemical vapor deposition using pulverized powder and manganese oxide powder, including:
  • the powdered and manganese oxide powder having a weight ratio of 9:1 is continuously subjected to a mixed gas of oxygen and argon at a temperature of 600 to 700 ° C for 20 to 40 minutes to form the oxidized nanowire.
  • the flow rate of argon gas is SOO - SSOcm ⁇ min- 1
  • the flow rate of oxygen gas is 10 ⁇ 15 cm 3 'min -1 .
  • FIG. 1 is a schematic structural view of a liquid crystal display panel in the prior art
  • FIG. 2 is a schematic diagram of generating an interlaced network structure according to an embodiment of the present invention.
  • FIG. 3 is a schematic view showing the fabrication of an oxidized nanowire according to an embodiment of the present invention.
  • the frame sealant provided by the embodiment of the invention comprises an epoxy-acrylic resin, an acrylic resin, a heat curing agent, a coupling agent, a photoinitiator and an organic filler, and further comprises a one-dimensional nano material as an inorganic filler, the one The nano-materials can crosslink with the epoxy-acrylic resin to form a staggered network structure.
  • the epoxy-acrylic resin has a cross-linking group, and the one-dimensional nano material is used as an inorganic filler. After the cross-linking reaction between the one-dimensional nano material and the epoxy-acrylic resin, a network-like staggered structure is formed, and the mesh is formed. The staggered structure prevents the precipitation of particulate matter and improves display quality.
  • the epoxy-acrylic resin is an epoxy-acrylic resin known in the art and can be used for this purpose, and is commercially available, for example, from Showa Polymer Co., Ltd., Tianhong Yunda, Nanjing Jing Culture, and the like.
  • the oxidized nanowire is preferably used as an inorganic filler, instead of the existing sealant with silica nanoparticles as a filler, because the cost of preparing the oxidized nanowire is low, and the production method can be promoted. application.
  • the one-dimensional nanomaterial is not limited, and as long as it can be cross-linked with the epoxy-acrylic resin, a network-like staggered structure may be formed, for example, a carbon nanowire.
  • the oxidized nanowire can be cross-linked with the epoxy-acrylic resin cross-linking group, as shown in FIG. 2, which is a schematic diagram of cross-linking reaction between the oxidized nanowire and the epoxy-acrylic resin cross-linking group.
  • FIG. 2 is a schematic diagram of cross-linking reaction between the oxidized nanowire and the epoxy-acrylic resin cross-linking group.
  • the oxidized nanowire is selected as the inorganic filler, and when ultraviolet curing is performed, when the framed rubber containing the oxidized nanowire is irradiated with ultraviolet light, the oxidized nanowire can act as a photocatalyst and accelerate the ring.
  • the curing speed of the oxygen structure material, the ordinary oxidation material is the non-light sensitivity of the inorganic non-metal material, and the nanowire structure oxidation word migrates when the ultraviolet radiation is received, generates electricity, generates electricity, and then generates heat, and promotes the epoxy. - Curing of acrylic resin.
  • the size of the oxidized nanowires is not too large or too small, and the size is too large to make it unevenly distributed in the sealant composition, and the adhesion of the sealant composition is lowered, and the size is too small, the price is relatively low.
  • the outer diameter of the oxidized nanowire as the inorganic filler in the embodiment of the present invention is preferably 5 to 20 nm, and the length is preferably 50 to 500 nm.
  • the oxidized nanowire is preferably prepared by using a re-edulating powder as a raw material, adding a certain amount of manganese oxide powder, and using a thermal evaporation chemical vapor deposition method. As shown in Figure 3, the powder is mixed with manganese oxide powder and evenly placed on the bottom of the porcelain boat. The cleaned silicon wafer is fixed on the top of the porcelain boat, and the temperature is set at 600 ⁇ 700 °C.
  • a mixed gas of argon and oxygen is introduced, the flow rate of argon gas is 300 ⁇ 320cm 3 -mm 1 , the flow rate of oxygen is 10 ⁇ 15 cm ⁇ min" 1 , and the reaction is 20-40 minutes, and a large number of uniform one-dimensional lines can be obtained.
  • the oxidized nanostructures are prepared to have a diameter of 5 to 20 nm and a length of 50 to 500 nm.
  • the weight percentage of the oxidized nanowire as the inorganic filler is preferably 10 to 20%. Specifically, it may be 10%, 12%, 13% or 15%, 18%, 20%, preferably 15%.
  • the components included in the sealant in the embodiment of the present invention may be as shown in the following table.
  • the ratio ranges are only illustrative and are not limited, and are acceptable within the set range. of.
  • the proportion of the precipitates can be reduced to 0%, and the original sealant with silica nanoparticles as the filler is precipitated.
  • the defect ratio is generally about 2%, that is, the sealant in the embodiment of the present invention can better prevent the precipitation of particulate matter, improve the precipitate defects during the curing process, and further improve the display quality.
  • Embodiment 2 The embodiment of the invention further provides a display device, which comprises an array substrate and a color filter substrate, and a frame sealant according to the first embodiment is disposed between the array substrate and the color filter substrate.
  • the display device may be: a liquid crystal panel, an electronic paper, an OLED panel, a mobile phone, a tablet computer, a television, a display, a notebook computer, a digital photo frame, a navigator, and the like, or any display product or component.
  • the display device provided in the embodiment of the invention includes a one-dimensional nano material capable of cross-linking reaction with an epoxy-acrylic resin, a one-dimensional nano material and an epoxy, which are disposed between the color film substrate and the array substrate. - After the cross-linking reaction of the acrylic resin, a network-like staggered structure can be formed, and the network-like staggered structure can prevent the precipitation of particulate matter and improve the display quality.
  • the third embodiment of the present invention further provides a method for preparing a sealant, as shown in FIG. 4, comprising:
  • S401 A one-dimensional nano material as an inorganic filler is mixed with other components in the sealant to form a stirred mixture.
  • a one-dimensional nanometer material having a weight percentage of 10% to 20% (specifically, 10%, 12%, 13% or 15%, 18%, 20%) and a weight percentage of 20% to 30% of the ring Oxygen-acrylic resin (specifically, 20%, 22%, 23% or 25%, 28%, 30%), 30% to 40% by weight of acrylic resin (specifically 30%, 32%, 33%) Or 35%, 38%, 40%), 10% to 20% by weight of heat curing agent (specifically, 10%, 12%, 13% or 15%, 18%, 20%), weight percentage 4 % ⁇ 5% coupling agent, 0.1% ⁇ 1% by weight of photoinitiator (specifically 0.1%, 0.2%, 0.3% or 0.5%, 0.8%, 1%) and 1% by weight ⁇ 10% organic filler (specifically, 1%, 2%, 3% or 5%, 8%, 10%), stirred at a temperature of 10 to 30 ° C for 30 to 60 minutes to form a stirred mixture.
  • the one-dimensional nano material contained in the inorganic filler and the epoxy-acrylic resin in the sealant can undergo cross-linking reaction to form a staggered network structure, and the network-shaped interlaced structure can block the particulate matter. Precipitate to improve display quality.
  • the process of forming the agitating mixture in the embodiment of the present invention may preferably be as follows: 25% by weight of epoxy-acrylic resin, 35% by weight of acrylic resin, and 5% by weight of epoxy-acrylic acid Resin, 15% by weight of heat curing agent, 4.5% by weight of coupling agent (4.5%), 0.5% by weight of photoinitiator, 5% by weight of organic filler, and weight percent 15% of the oxidation of nanowires in 10 ⁇ 30 Stir at a temperature of °C for 30 to 60 minutes to form a stirred mixture.
  • the one-dimensional nanomaterial in the embodiment of the present invention is preferably an oxidized nanowire, and may of course be other one-dimensional nanomaterial, which is not limited herein, and may be, for example, a carbon nanowire.
  • the method further comprises:
  • the oxidized nanowires were produced by chemical vapor deposition using powdered powder and manganese oxide powder. The process of making the oxidized nanowires can be repeated. Referring to Figure 3, the powder with a weight ratio of 9:1 is mixed with the manganese oxide powder and evenly placed on the bottom of the porcelain boat. The cleaned silicon wafer is fixed on the porcelain boat. Above, the temperature is set at 600 ⁇ 700 °C, and a mixed gas of argon and oxygen is continuously supplied into the tube, and the reaction is carried out for 30 minutes to prepare an oxidized nanowire having a diameter of 5 to 20 nm and a length of 50 to 500 nm.
  • the flow rate of the argon gas is controlled to be SOO - SSOcm ⁇ min - 1
  • the flow rate of oxygen is lO - lS cn ⁇ min - 1 , and a large number of uniform one-dimensional linear oxidation atoms are obtained. structure.
  • the stirred mixture obtained in S401 is kneaded at 30 to 50 °C.
  • S403 Defoaming the mixture after kneading in S402.
  • the mixture after kneading in S402 can be defoamed using a SIENOX defoaming machine.
  • the inorganic filler comprises a one-dimensional nano material, which is mixed with other components in the sealant to form a stirring mixture, and is subjected to a sealing and defoaming process to form a sealant.
  • a network-like staggered structure can be formed, and the network-like staggered structure can prevent the precipitation of the particulate matter, thereby improving the display quality.

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Sealing Material Composition (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Liquid Crystal (AREA)

Abstract

一种封框胶及其制备方法和含该封框胶的显示装置。所述封框胶包括环氧-丙烯酸树脂、丙烯酸树脂、热固化剂、偶联剂、光引发剂和有机填充物,还包括能够与所述环氧-丙烯酸树脂发生交联反应、作为无机填充物的一维纳米材料。一维纳米材料与环氧-丙烯酸树脂发生交联反应后,能够形成网状的交错结构,该网状交错结构能够阻止颗粒状物质析出,进而改善显示品质。

Description

封框胶及其制备方法和含该封框胶的显示装置
技术领域
本发明实施例涉及一种封框胶及其制备方法和含所述封框胶的显示装 置。 背景技术
随着科技的进步, 液晶显示面板获得了快速发展, 液晶显示面板在很大 程度上决定液晶显示装置的亮度、 对比度、 色彩、 可视角度等。 因此, 液晶 显示面板的制作工艺直接影响着显示器的品质。
现有的液晶显示面板一般由阵列基板和彩膜基板对盒形成, 如图 1所示 为现有液晶面板的截面结构示意图, 包括阵列基板 1、 彩膜基板 2以及设置 于阵列基板 1和彩膜基板 2之间的液晶 4和封框胶 3。 阵列基板 1和彩膜基 板 2对盒时, 利用封框胶 3作为粘合剂将二者贴合在一起形成一个完整的液 晶面板,并通过封框胶 3密封滴注在阵列基板 1和彩膜基板 2之间的液晶 4。 因此, 封框胶是液晶显示面板制作工程中非常重要的组成部分。
现有的封框胶中的无机填充物一般以二氧化硅纳米颗粒为主要组成部 分, 在固化后具有一定的粘结强度, 能够起到支撑作用, 但是封框胶在固化 过程中以及阵列基板和彩膜基板对盒过程中, 很容易产生颗粒状的析出物, 以二氧化硅纳米颗粒为主要成分的无机填充物虽然能够起到很好的支撑作 用, 但是并不能阻止颗粒状析出物的析出, 析出的颗粒状析出物很容易使得 画面显示时产生残像, 造成显示不良。 本发明实施例旨在提供一种封框胶及 其制备方法和固化方法、 用所述封框胶密封的显示装置, 以解决现有技术中 封框胶不能阻止颗粒状析出物析出, 造成显示不良的问题。 发明内容
本发明实施例提供了一种封框胶, 该封框胶中包括环氧-丙烯酸树脂、 丙 烯酸树脂、 热固化剂、 偶联剂、 光引发剂和有机填充物, 还包括能够与所述 环氧 -丙烯酸树脂发生交联反应、 作为无机填充物的一维纳米材料。 所述一维纳米材料为氧化辞纳米线。
所述一维纳米材料的重量百分比为 10%~20%。
所述氧化辞纳米线的外部直径为 5~20nm, 长度为 50~500nm。
本发明实施例还提供了一种显示装置,包括对盒的阵列基板和彩膜基板, 所述阵列基板与所述彩膜基板之间设置有上述封框胶。
本发明实施例还提供了上述封框胶的制备方法, 包括:
将重量百分比为 10%~20%的一维纳米材料以及重量百分比为 20%~30% 的环氧-丙烯酸树脂、 重量百分比为 30%~40%的丙烯酸树脂、 重量百分比为 10%~20%的热固化剂、 重量百分比为 4%~5%的偶联剂、 重量百分比为 0.1%~1%的光引发剂和重量百分比为 1%~10%的有机填充物, 在 10~30°C的 温度下搅拌 30~60分钟, 形成搅拌混合物;
将所述搅拌混合物混炼;
将混炼后的混合物脱泡。
所述一维纳米材料为氧化辞纳米线或碳纳米线。
在形成搅拌混合物之前还包括:
采用化学气相沉积法,利用辞粉和氧化锰粉末,制作所述氧化辞纳米线。 其中, 采用化学气相沉积法, 利用辞粉和氧化锰粉末, 制作所述氧化辞 纳米线, 包括:
将重量比为 9: 1的辞粉和氧化锰粉末, 在 600~700°C的温度下, 持续通 入氧气与氩气的混合气体, 反应 20~40分钟, 生成所述氧化辞纳米线。
其中,通入氩气的流量为 SOO - SSOcm^min-1 ,通入氧气的流量为 10 ~ 15 cm3'min-1。 附图说明
图 1为现有技术中液晶显示面板的结构示意图;
图 2为本发明实施例中生成交错网状结构示意图;
图 3为本发明实施例氧化辞纳米线制作示意图;
图 4为本发明实施例封框胶制备流程图。 具体实施方式 下面将结合本发明实施例中的附图, 对本发明实施例中的技术方案进行 清楚、 完整地描述。 显然, 所描述的实施例仅仅是本发明一部分实施例, 并 不是全部的实施例。 基于本发明中的实施例, 本领域普通技术人员在没有做 出创造性劳动前提下所获得的所有其他实施例, 都属于本发明保护的范围。
实施例一
本发明实施例提供的封框胶, 包括环氧-丙烯酸树脂、 丙烯酸树脂、 热固 化剂、 偶联剂、 光引发剂和有机填充物, 还包括作为无机填充物的一维纳米 材料, 该一维纳米材料能够与环氧-丙烯酸树脂发生交联反应, 形成交错的网 状结构。
具体的,环氧-丙烯酸树脂具有交联基,以一维纳米材料作为无机填充物, 一维纳米材料与环氧-丙烯酸树脂发生交联反应后, 会形成网状的交错结构, 该网状交错结构能够阻止颗粒状物质析出, 进而改善显示品质。环氧-丙烯酸 树脂是本领域已知的可用于该目的的环氧-丙烯酸树脂,其例如可商购自昭和 高分子株式会社、 天鸿运达所、 南京景文化工等。
本发明实施例中优选氧化辞纳米线作为无机填充物, 代替现有以二氧化 硅纳米颗粒为填充物的封框胶, 因为制备氧化辞纳米线的成本低, 制作方法 筒单, 能够得到推广应用。 当然本发明实施例中对一维纳米材料不做限定, 只要能够与环氧-丙烯酸树脂发生交联反应, 形成网状交错结构即可, 例如还 可以是碳纳米线。
本发明实施例中氧化辞纳米线能够与环氧-丙烯酸树脂交联基发生交联 反应,如图 2所示, 为氧化辞纳米线与环氧-丙烯酸树脂交联基发生交联反应 的示意图, 氧化辞纳米线与环氧-丙烯酸树脂交联基发生交联反应后, 能够形 成网状交错结构, 形成的网状交错结构与封框胶中的树脂均匀交错在一起, 与普通封框胶相比增加了粘结度, 并且能够阻止异物析出, 有效改善封框胶 易发生的析出物不良现象。
进一步的, 本发明实施例中选用氧化辞纳米线作为无机填充物, 进行紫 外固化时, 使用紫外光照射包含有氧化辞纳米线的封框胶时, 氧化辞纳米线 能够作为光催化剂, 加快环氧结构材料的固化速度, 普通氧化辞材料为无机 非金属材料无光照敏感性, 而纳米线结构氧化辞在收到紫外照射时, 载流子 发生迁移作用, 产生电, 进而发热, 促进环氧-丙烯酸树脂的固化。 氧化辞纳米线的尺寸不易过大, 也不易过小, 尺寸过大会使其在封框胶 组合物中分布不均匀, 降低封框胶组合物的粘接性, 而尺寸过小, 则价格较 高, 经济性降低, 因此本发明实施例作为无机填充物的氧化辞纳米线的外部 直径优选 5~20nm, 长度优选 50~500nm。
本发明实施例中氧化辞纳米线优选以辞粉作为原料, 加入一定量的氧化 锰粉末, 采用热蒸发化学气相沉积法制作而成。 如图 3所示, 将辞粉与氧化 锰粉末混合后均匀铺置于瓷舟底部, 将洗干净的硅片固定在瓷舟的上方, 并 将温度设定在 600~700°C , 向管内通入氩气与氧气的混合气体, 氩气流量为 300 ~ 320cm3-mm 1 , 氧气流量为 10 ~ 15 cm^min"1 , 反应 20-40分钟, 即可获 得大量均勾的一维线状氧化辞纳米结构, 制作的氧化辞纳米线直径为 5~20nm, 长度为 50~500nm。
进一步的, 本发明实施例中作为无机填充物的氧化辞纳米线重量百分比 优选 10~20%。 具体可以为 10%、 12%、 13%或 15%、 18%、 20%, 优选 15%。
具体的, 本发明实施例中封框胶所包括的各组成成份, 可按下表所示, 当然其中的比例范围只是示意性说明, 并不做限定, 在设定的范围内都是可 接受的。
Figure imgf000006_0001
本发明实施例中按照上表所示的各组分以及比例组成的封框胶, 可使析 出物不良比例降为 0%, 原有以二氧化硅纳米颗粒为填充物的封框胶, 析出 物不良比例一般会在 2%左右, 即采用本发明实施例中的封框胶能够较好的 阻止颗粒状物质析出,改善固化过程中的析出物不良,进而可提高显示品质。
实施例二 本发明实施例还提供了一种显示装置, 该显示装置包括对盒的阵列基板 和彩膜基板, 阵列基板与彩膜基板之间设置实施例一涉及的封框胶。
本发明实施例涉及的显示装置可以为: 液晶面板、 电子纸、 OLED面板、 手机、 平板电脑、 电视机、 显示器、 笔记本电脑、 数码相框、 导航仪等任何 具有显示功能的产品或部件。
本发明实施例中提供的显示装置, 设置于彩膜基板与阵列基板之间的封 框胶中包括能够与环氧-丙烯酸树脂发生交联反应的一维纳米材料,一维纳米 材料与环氧-丙烯酸树脂发生交联反应后, 能够形成网状的交错结构, 形成的 网状交错结构能够阻止颗粒状物质析出, 进而改善显示品质。
实施例三
本发明实施例三还提供了一种封框胶制备方法, 如图 4所示, 包括:
S401 : 将作为无机填充物的一维纳米材料与封框胶中其它组分混合, 形 成搅拌混合物。
具体的, 将重量百分比为 10%~20%的一维纳米材料(具体可以为 10%、 12%、 13%或 15%、 18%、 20% ) 以及重量百分比为 20%~30%的环氧-丙烯酸 树脂 (具体可以为 20%、 22%、 23%或者 25%、 28%、 30% )、 重量百分比为 30%~40%的丙烯酸树脂(具体可以为 30%、 32%、 33%或者 35%、 38%、 40% )、 重量百分比为 10%~20%的热固化剂(具体可以为 10%、 12%、 13%或者 15%、 18%、 20% )、 重量百分比为 4%~5%的偶联剂、 重量百分比为 0.1%~1%的光 引发剂 (具体可以为 0.1%、 0.2%、 0.3%或者 0.5%、 0.8%、 1% )和重量百分 比为 1%~10%的有机填充物(具体可以为 1%、 2%、 3%或者 5%、 8%、 10% ), 在 10~30°C的温度下搅拌 30~60分钟, 形成搅拌混合物。
本发明实施例中无机填充物中包含的一维纳米材料与封框胶中的环氧- 丙烯酸树脂能够发生交联反应, 形成交错的网状结构, 形成的网状交错结构 能够阻止颗粒状物质析出, 进而改善显示品质。
进一步的, 本发明实施例中形成搅拌混合物的过程可优选如下方式: 将重量百分比为 25%的环氧-丙烯酸树脂, 重量百分比为 35%的丙烯酸 树脂,重量百分比为 5%的环氧-丙烯酸树脂,重量百分比为 15%的热固化剂, 重量百分比为 4.5%的偶联剂 (4.5% ), 重量百分比为 0.5%的光引发剂, 重量 百分比为 5%的有机填充物,以及重量百分比为 15%的氧化辞纳米线在 10~30 °C的温度下搅拌 30~60分钟, 形成搅拌混合物。
优选的, 本发明实施例中一维纳米材料优选氧化辞纳米线, 当然也可以 是其他一维纳米材料, 在此不做限定, 比如还可以是碳纳米线。
本发明实施例中优选氧化辞纳米线作为一维纳米材料时, 在形成搅拌混 合物之前还包括:
采用化学气相沉积法,利用辞粉和氧化锰粉末,制作所述氧化辞纳米线。 具体的制作氧化辞纳米线的过程, 可再次参阅图 3 , 将重量比为 9: 1的 辞粉与氧化锰粉末混合后均匀铺置于瓷舟底部, 将洗干净的硅片固定在瓷舟 的上方, 并将温度设定在 600~700°C , 向管内持续通入氩气与氧气的混合气 体, 反应 30分钟, 制作直径为 5~20nm, 长度为 50~500nm的氧化辞纳米线。
进一步的,在温度为 600~700°C下,控制氩气流量为 SOO - SSOcm^min-1, 氧气流量为 lO - lS cn^min—1, 可获得大量均匀的一维线状氧化辞纳米结构。
S402: 将 S401中形成的搅拌混合物混炼。
具体的, 本发明实施例中将 S401得到的搅拌混合物在 30~50°C下混炼。 S403: 将 S402中混炼后的混合物脱泡。
具体的, 本发明实施例中可使用 SIENOX脱泡机对 S402中混炼后的混 合物进行脱泡。
本发明实施例提供的封框胶制备方法, 无机填充物中包含有一维纳米材 料, 其与封框胶中其它组分混合形成搅拌混合物, 经过混炼以及脱泡工艺制 作的封框胶, 进行固化过程中, 一维纳米材料与环氧-丙烯酸树脂发生交联反 应后, 能够形成网状的交错结构, 形成的网状交错结构能够阻止颗粒状物质 析出, 进而改善显示品质。 发明的精神和范围。 这样, 倘若本发明的这些修改和变型属于本发明权利要 求及其等同技术的范围之内, 则本发明也意图包含这些改动和变型在内。

Claims

权利要求书
1、 一种封框胶, 包括环氧-丙烯酸树脂、 丙烯酸树脂、 热固化剂、 偶联 剂、 光引发剂和有机填充物, 其中, 所述封框胶还包括: 能够与所述环氧- 丙烯酸树脂发生交联反应、 作为无机填充物的一维纳米材料。
2、如权利要求 1所述的封框胶, 其中, 所述一维纳米材料为氧化辞纳米 线。
3、如权利要求 1或 1所述的封框胶, 其中, 所述一维纳米材料的重量百 分比为 10%~15%。
4、 如权利要求 2或 3所述的封框胶, 其中, 所述氧化辞纳米线的外部直 径为 5~20nm, 长度为 50~500匪。
5、 一种显示装置, 包括对盒的阵列基板和彩膜基板, 其中, 所述阵列基 板与所述彩膜基板之间设置有如权利要求 1-4任一项所述的封框胶。
6、 一种权利要求 1-5任一项所述的封框胶的制备方法, 包括:
将重量百分比为 10%~20%的一维纳米材料以及重量百分比为 20%~30% 的环氧-丙烯酸树脂、 重量百分比为 30%~40%的丙烯酸树脂、 重量百分比为 10%~20%的热固化剂、 重量百分比为 4%~5%的偶联剂、 重量百分比为 0.1%~1%的光引发剂和重量百分比为 1%~10%的有机填充物, 在 10~30°C的 温度下搅拌 30~60分钟, 形成搅拌混合物;
将所述搅拌混合物混炼;
将混炼后的混合物脱泡。
7、如权利要求 6所述的方法,其中,所述一维纳米材料为氧化辞纳米线。
8、 如权利要求 7所述的方法, 其中, 在形成搅拌混合物之前还包括: 采用化学气相沉积法,利用辞粉和氧化锰粉末,制作所述氧化辞纳米线。
9、 如权利要求 8所述的方法, 其中, 所述采用化学气相沉积法, 利用辞 粉和氧化锰粉末, 制作所述氧化辞纳米线, 包括:
将重量比为 9: 1的辞粉和氧化锰粉末, 在 600~700°C的温度下, 持续通 入氧气与氩气的混合气体, 反应 20~40分钟, 生成所述氧化辞纳米线。
10、 如权利要求 9 所述的方法, 其中, 通入氩气的流量为 300 ~ 320cm3-min"1 , 通入氧气的流量为 10 ~ 15 cm3'min-1
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