WO2014146357A1 - 制备液晶面板的方法 - Google Patents

制备液晶面板的方法 Download PDF

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Publication number
WO2014146357A1
WO2014146357A1 PCT/CN2013/077020 CN2013077020W WO2014146357A1 WO 2014146357 A1 WO2014146357 A1 WO 2014146357A1 CN 2013077020 W CN2013077020 W CN 2013077020W WO 2014146357 A1 WO2014146357 A1 WO 2014146357A1
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Prior art keywords
liquid crystal
crystal panel
shielding layer
substrate
array substrate
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English (en)
French (fr)
Inventor
程凌志
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Beijing BOE Optoelectronics Technology Co Ltd
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Beijing BOE Optoelectronics Technology Co Ltd
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/133308—Support structures for LCD panels, e.g. frames or bezels
    • G02F1/133325—Assembling processes
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/08—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 light absorbing layer
    • G02F2201/086—UV absorbing

Definitions

  • Embodiments of the present invention relate to a method of preparing a liquid crystal panel. Background technique
  • the liquid crystal panel mainly comprises: a color filter substrate connected to the cartridge, an array substrate, and a liquid crystal molecular layer between the color filter substrate and the array substrate.
  • the method for preparing a liquid crystal panel in the prior art comprises the steps of: coating a sealant on a color filter substrate or an array substrate, and injecting liquid crystal molecules between the color filter substrate and the array substrate, and then using the color filter substrate and the array substrate; And the liquid crystal molecular layer between the color film substrate and the array substrate is placed in a box to form a liquid crystal panel, and then the liquid crystal panel is taken out, and ultraviolet curing is performed in the ultraviolet curing device.
  • ultraviolet curing is performed in the ultraviolet curing device.
  • Embodiments of the present invention provide a method for preparing a liquid crystal panel, which improves alignment accuracy of a substrate in a liquid crystal panel, and reduces occurrence of undesirable phenomena such as light leakage and crosstalk of the liquid crystal panel.
  • a method for fabricating a liquid crystal panel comprising: forming a shielding layer covering a liquid crystal panel display region to block ultraviolet light on an array substrate and/or a color film substrate; The frame film is coated around the color film substrate and the box is coated, wherein the framed rubber coating area is outside the shielding layer; the frame sealing glue is cured by ultraviolet light; and the shielding layer is removed by an etching process.
  • the material of the occlusion layer may be a metal.
  • the shielding layer for blocking ultraviolet light may include:
  • removing the occlusion layer by an etching process may include: etching the occlusion layer with an acid solution to remove the occlusion layer.
  • the acid solution may include one or more of hydrochloric acid, nitric acid, and phosphoric acid.
  • removing the shielding layer by an etching process may include: etching the shielding layer with an etching solution to remove the shielding layer and thin the substrate of the array substrate and/or the color filter substrate.
  • the composition of the etching solution may include: hydrofluoric acid having a mass fraction of 10% to 50%, phosphoric acid having a mass fraction of 1% to 10%, nitric acid having a mass fraction of 0.1% to 1%, and mass The fraction is 0.1% to 1% acetic acid.
  • the shielding layer located on the back surface of the array substrate and/or the color filter substrate can prevent ultraviolet light from damaging the liquid crystal molecules in the liquid crystal molecular layer, and therefore, the liquid crystal panel is in the box device.
  • the UV exposure can be directly performed in the box device to achieve the curing of the liquid crystal panel without moving the liquid crystal panel to a separate ultraviolet exposure device for exposure curing, avoiding the above mentioned mentioned in the background art.
  • the phenomenon that the color filter substrate and the array substrate are misaligned during the movement of the liquid crystal panel from the cartridge device to the ultraviolet exposure device; and, after the ultraviolet light curing of the liquid crystal panel is completed, the mask layer can be removed by an etching process. The shielding layer on the back surface of the substrate and/or the color filter substrate is removed, and the influence of the shielding layer on the display effect of the display panel is avoided.
  • the method for preparing a liquid crystal panel provided by the embodiment of the invention can improve the alignment accuracy of the substrate in the liquid crystal panel, and reduce the occurrence of undesirable phenomena such as light leakage and cross-color of the liquid crystal panel.
  • DRAWINGS 1 is a schematic structural view of a liquid crystal panel in front of a box according to an embodiment of the present invention
  • FIG. 2 is a flowchart of a method for preparing a liquid crystal panel according to an embodiment of the present invention.
  • FIG. 1 is a schematic structural view of a liquid crystal panel in front of a box according to an embodiment of the present invention
  • FIG. 2 is a flowchart of a method for preparing a liquid crystal panel according to an embodiment of the present invention.
  • Embodiments of the present invention provide a method for preparing a liquid crystal panel, including:
  • Step 301 forming a shielding layer 11 covering the display area 21 of the liquid crystal panel to block ultraviolet light on the back surface of the array substrate 1 and/or the color filter substrate 2;
  • Step 302 Apply a sealant and a box to the periphery of the array substrate 1 and the color filter substrate 2, wherein the sealant coated region is located outside the shielding layer 11;
  • Step 303 performing ultraviolet light curing on the sealant
  • Step 304 The occlusion layer 11 is removed by a unique process.
  • the shielding layer 11 on the back surface of the array substrate 1 and/or the color filter substrate 2 can prevent ultraviolet light from damaging the liquid crystal in the liquid crystal cell. Therefore, the liquid crystal panel is in the box device. After the sealant is applied, the UV exposure can be directly performed in the box device to achieve the curing of the liquid crystal panel without moving the liquid crystal panel to a separate ultraviolet exposure device for exposure curing, avoiding the above mentioned background art.
  • the phenomenon that the color filter substrate and the array substrate are misaligned during the movement of the liquid crystal panel from the cartridge device to the ultraviolet exposure device; and, after the ultraviolet exposure curing of the liquid crystal panel is completed, the array substrate 1 and/or may be performed through step 304.
  • the shielding layer on the back surface of the color filter substrate 2 is removed, and the influence of the shielding layer 11 on the display effect of the display panel is avoided.
  • the method for preparing a liquid crystal panel improves the alignment accuracy of the substrate in the liquid crystal panel, and reduces the occurrence of undesirable phenomena such as light leakage and cross-color of the liquid crystal panel.
  • the method for preparing the liquid crystal panel provided by the embodiment of the present invention does not require a separate ultraviolet exposure device, the cost of the equipment required in the preparation process is reduced, the process flow is reduced, the flow screen time is reduced, and the production efficiency is improved.
  • the material of the shielding layer 11 may be metal, such as molybdenum and aluminum, etc., and is not described here again.
  • the shielding layer 11 may also be an alloy having metal characteristics synthesized by two or more metals and nonmetals by a certain method.
  • the occlusion layer 11 can form a pattern corresponding to the display region 21 of the liquid crystal panel by patterning (specifically including exposure and etching, etc.).
  • the occlusion layer 11 needs to be removed by an etching process. There are several ways to remove the occlusion layer 11 by a unique process:
  • the acid solution is dropped on the shielding layer 11, and the shielding layer 11 is removed by the etching of the acid liquid.
  • the acid solution may include one or more of hydrochloric acid, nitric acid, and phosphoric acid.
  • the shielding layer 11 is etched by an etching solution to remove the shielding layer 11 and thin the substrate of the array substrate 1 and/or the color filter substrate 2, which is generally a glass substrate. After the LCD panel is cured, the LCD panel needs to be thinned.
  • the ratio of the etching liquid used for the thinning treatment can be changed so that the removal of the shielding layer 11 and the thinning of the liquid crystal panel are simultaneously performed.
  • the composition of the etching solution may include: hydrofluoric acid having a mass fraction of 10% to 50%, phosphoric acid having a mass fraction of 1% to 10%, nitric acid having a mass fraction of 0.1% to 1%, and The mass fraction is 0.1% to 1% acetic acid.
  • Hydrofluoric acid is mainly used to etch glass and metal.
  • Phosphoric acid and nitric acid are mainly used to etch metals.
  • Acetic acid is mainly used to improve the wettability of acid, metal and glass substrates. It is within the spirit and scope of the invention. Therefore, it is intended that the present invention cover the modifications and modifications of the invention as claimed.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)

Abstract

一种液晶面板的制备方法，包括在阵列基板（1）和/或彩膜基板（2）的背面形成覆盖液晶面板显示区（21）的以阻挡紫外光的遮挡层（11）；在阵列基板（1）和彩膜基板（2）的四周涂覆封框胶并对盒，其中封框胶涂覆区域位于遮挡层（11）之外；对封框胶进行紫外光照固化；通过蚀刻工艺去除遮挡层（11）。通过该制备方法，阵列基板（1）和/或彩膜基板（2）背面的遮挡层能够防止紫外光对液晶盒中的液晶造成损伤；因此，液晶面板在对盒设备中涂覆封框胶之后可直接在对盒设备中进行紫外线曝光，实现对液晶面板的固化。因此，该液晶面板的制备方法提高了液晶面板中基板的对位精度，减少液晶面板漏光、串色等不良现象的发生。

Description

制备液晶面板的方法 技术领域
本发明的实施例涉及一种制备液晶面板的方法。 背景技术
液晶面板主要包括： 对盒连接的彩膜基板、 阵列基板以及位于彩膜基板 和阵列基板之间的液晶分子层。
现有技术中的制备液晶面板的方法包括以下步骤： 在彩膜基板或阵列基 板上涂覆封框胶， 并在彩膜基板和阵列基板之间注入液晶分子， 再将彩膜基 板、 阵列基板以及位于彩膜基板和阵列基板之间的液晶分子层放入对盒设备 进行对盒， 形成液晶面板， 随后取出液晶面板， 并; 紫外光固化设备中进 行紫外固化。 在紫外固化时， 为了防止紫外光对液晶分子造成损伤， 需要使 用紫外光掩模板对液晶面板的显示区进行遮挡。
但是， 在这种制备方法中， 由于对盒后的封框胶处于未固化状态， 所以 在将对盒后的液晶面板从对盒设备移动到紫外固化设备的过程中， 液晶面板 中的彩膜基板和阵列基板容易发生错位， 从而发生开口区变小、 漏光和串色 等现象， 进而影响液晶板面的品质。 发明内容
本发明的实施例提供了一种制备液晶面板的方法， 该方法提高了液晶面 板中基板的对位精度， 降低液晶面板漏光、 串色等不良现象的发生。
根据本发明的一个方面， 提供了一种制备液晶面板的方法， 该方法包括： 在阵列基板和 /或彩膜基板的背面形成覆盖液晶面板显示区以阻挡紫外光的遮 挡层； 在阵列基板和彩膜基板的四周涂覆封框胶并对盒， 其中封框胶涂覆区 域位于遮挡层之外； 对封框胶进行紫外光照固化； 通过蚀刻工艺去除遮挡层。
在实施例中， 遮挡层的材料可以为金属。
在实施例中， 在阵列基板和 /或彩膜基板的背面形成覆盖液晶面板显示区 以阻挡紫外光的遮挡层可以包括：
在阵列基板和 /或彩膜基板背面形成舰；
对! ¾ 进行构图以形成遮挡层。
在实施例中， 通过蚀刻工艺去除遮挡层可以包括： 采用酸液对遮挡层进 行刻蚀， 以去除遮挡层。
在实施例中， 酸液可以包括盐酸、 硝酸、 磷酸中的一种或几种。
在实施例中， 通过蚀刻工艺去除遮挡层可以包括： 采用刻蚀液对遮挡层 进行过刻蚀， 以去除遮挡层并薄化阵列基板和 /或彩膜基板的基板。
在实施例中， 刻蚀液的组分可以包括： 质量分数为 10%~50%的氢氟酸、 质量分数为 1%~10%的磷酸、 质量分数为 0.1%~1%的硝酸和质量分数为 0.1%~1%的醋酸。
在本发明实施例提供的制备液晶面板的方法中， 位于阵列基板和 /或彩膜 基板背面的遮挡层能够防止紫外光对液晶分子层中的液晶分子造成损伤， 因 此， 液晶面板在对盒设备中涂覆封框胶之后可以直接在对盒设备中进行紫外 线曝光， 实现对液晶面板的固化， 而无需再将液晶面板移动到单独的紫外曝 光设备中进行曝光固化， 避免上述背景技术中提到的在将液晶面板从对盒设 备搬运至紫外曝光设备的移动过程中发生的彩膜基板和阵列基板错位的现 象； 而且， 在液晶面板紫外光照固化完成之后， 通过蚀刻工艺去除遮挡层可 以将阵列基板和 /或彩膜基板背面的遮挡层去除， 避免遮挡层对显示面板的显 示效果的影响。
所以， 本发明实施例提供的制备液晶面板的方法可以提高液晶面板中基 板的对位精度， 减少液晶面板漏光、 串色等不良现象的发生。
另外， 由于本发明实施例提供的液晶面板的制备方法无需单独的紫外曝 光设备， 所以降低了制备过程中所需设备的成本， 筒化了工艺流程， 同时减 少了流屏时间， 提高了生产效率。 附图说明 图 1为本发明实施例提供的液晶面板在对盒前的结构示意图； 和 图 2为本发明实施例提供的制备液晶面板的方法的流程图。 具体实施方式
下面将结合本发明实施例中的附图， 对本发明实施例中的技术方案进行 清楚、 完整地描述， 显然， 所描述的实施例仅仅是本发明一部分实施例， 而 不是全部的实施例。 基于本发明中的实施例， 本领域普通技术人员在没有做 出创造性劳动前提下所获得的所有其他实施例， 都属于本发明保护的范围。
实施例一
图 1为本发明实施例提供的液晶面板在对盒前的结构示意图， 图 2为本 发明实施例提供的制备液晶面板的方法的流程图。 本发明实施例提供了一种 制备液晶面板的方法， 包括：
步骤 301: 在阵列基板 1和 /或彩膜基板 2的背面形成覆盖液晶面板的显 示区 21以阻挡紫外光的遮挡层 11 ;
步骤 302: 在阵列基板 1和彩膜基板 2的四周涂覆封框胶并对盒， 其中 所封框胶涂覆区域位于遮挡层 11之外；
步骤 303: 对封框胶进行紫外光照固化；
步骤 304: 通过独刻工艺去除遮挡层 11。
在本发明实施例提供的制备液晶面板的方法，阵列基板 1和 /或彩膜基板 2背面的遮挡层 11能够防止紫外光对液晶盒中的液晶造成损伤， 因此， 液晶 面板在对盒设备中涂覆封框胶之后可以直接在对盒设备中进行紫外线曝光， 实现对液晶面板的固化， 而无需再将液晶面板移动到单独的紫外曝光设备中 进行曝光固化， 避免上述背景技术中提到的在将液晶面板从对盒设备搬运至 紫外曝光设备的移动过程中发生彩膜基板和阵列基板错位的现象； 而且， 在 液晶面板紫外曝光固化完成后，通过步骤 304可以将阵列基板 1和 /或彩膜基 板 2背面的遮挡层去除， 避免遮挡层 11对显示面板的显示效果的影响。
所以， 本发明实施例提供的制备液晶面板的方法提高了液晶面板中基板 的对位精度， 减少液晶面板漏光、 串色等不良现象的发生。
另外， 由于本发明实施例提供的制备液晶面板的方法无需单独的紫外曝 光设备， 所以降低了制备过程中所需设备的成本， 筒化了工艺流程， 同时减 少了流屏时间， 提高了生产效率。 遮挡层 11的材料可以为金属， 例如钼和铝等， 这里就不再——赘述。 当 然，遮挡层 11还可以是由两种或两种以上的金属与非金属经一定方法所合成 的具有金属特性的合金。
遮挡层 11可以通过! ¾ 、构图（具体包括曝光和刻蚀等 )而形成与液晶 面板的显示区域 21相对应的图案。
上述液晶面板在对盒和紫外曝光之后， 需要通过蚀刻工艺去除遮挡层 11。 通过独刻工艺去除遮挡层 11的方式可以有多种：
方式一
通过酸液腐蚀去除。在遮挡层 11上滴加酸液，通过酸液的腐蚀去除遮挡 层 11。
优选地， 酸液可以包括盐酸、 硝酸、 磷酸中的一种或几种。
方式二
采用刻蚀液对遮挡层 11进行过刻蚀， 以去除遮挡层 11并薄化阵列基板 1和 /或彩膜基板 2的基板， 所述基板一般为玻璃基板。 液晶面板固化后， 需 要对液晶面板打薄处理。 可以更改打薄处理所用的刻蚀液的配比， 使得去除 遮挡层 11和打薄液晶面板同时进行。
优选地， 刻蚀液的组分可以包括： 质量分数为 10%~50%的氢氟酸、质量 分数为质量分数为 1%~10%的磷酸、质量分数为 0.1%~1%的硝酸和质量分数 为 0.1%~1%的醋酸。 氢氟酸主要用于刻蚀玻璃和金属， 磷酸和硝酸主要用于 刻蚀金属， 醋酸主要是用于提高酸液、 金属及玻璃基板的浸润性。 脱离本发明的精神和范围。 这样， 倘若本发明的这些修改和变型属于本发明 权利要求及其等同技术的范围之内， 则本发明也意图包含这些改动和变型在 内。

Claims

权利要求书
1、 一种制备液晶面板的方法， 包括：
在阵列基板和 /或彩膜基板的背面形成覆盖液晶面板的显示区以阻挡紫 外光的遮挡层；
在所述阵列基板和所述彩膜基板的四周涂覆封框胶并对盒， 其中所述封 框胶涂覆区域位于所述遮挡层之外；
对所述封框胶进行紫外光照固化；
通过蚀刻工艺去除所述遮挡层。
2、根据权利要求 1所述的制备液晶面板的方法，其中所述遮挡层的材料 为金属。
3、根据权利要求 1所述的制备液晶面板的方法，其中所述在阵列基板和 /或彩膜基板的背面形成覆盖液晶面板显示区的以阻挡紫外光的遮挡层包括： 在所述阵列基板和 /或所述彩膜基板背面形成髓;
对所述 莫进行构图以形成所述遮挡层。
4、根据权利要求 1所述的制备液晶面板的方法，其中所述通过蚀刻工艺 去除所述遮挡层包括：
采用酸液对所述遮挡层进行刻蚀， 以去除所述遮挡层。
5、根据权利要求 4所述的制备液晶面板的方法，其中所述酸液包括盐酸、 硝酸、 磷酸中的一种或几种。
6、根据权利要求 1所述的制备液晶面板的方法，其中所述通过蚀刻工艺 去除所述遮挡层包括：
采用刻蚀液对所述遮挡层进行过刻蚀， 以去除所述遮挡层并薄化所述阵 列基板和 /或所述彩膜基板的基板。
7、根据权利要求 6所述的制备液晶面板的方法，其中所述刻蚀液的组分 包括： 质量分数为 10%~50%的氢氟酸、质量分数为 1%~10%的磷酸、质量分 数为 0.1%~1%的硝酸和质量分数为 0.1%~1%的醋酸。
PCT/CN2013/077020 2013-03-19 2013-06-08 制备液晶面板的方法 Ceased WO2014146357A1 (zh)

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