WO2014103524A1 - 循環冷却加熱装置 - Google Patents
循環冷却加熱装置 Download PDFInfo
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- WO2014103524A1 WO2014103524A1 PCT/JP2013/080121 JP2013080121W WO2014103524A1 WO 2014103524 A1 WO2014103524 A1 WO 2014103524A1 JP 2013080121 W JP2013080121 W JP 2013080121W WO 2014103524 A1 WO2014103524 A1 WO 2014103524A1
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- WIPO (PCT)
- Prior art keywords
- tank
- circulating
- circulating fluid
- cooling
- heating
- Prior art date
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32522—Temperature
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28D—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
- F28D1/00—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators
- F28D1/02—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators with heat-exchange conduits immersed in the body of fluid
- F28D1/0206—Heat exchangers immersed in a large body of liquid
- F28D1/0213—Heat exchangers immersed in a large body of liquid for heating or cooling a liquid in a tank
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32715—Workpiece holder
- H01J37/32724—Temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67069—Apparatus for fluid treatment for etching for drying etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67109—Apparatus for thermal treatment mainly by convection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/334—Etching
Definitions
- the present invention relates to a circulating cooling / heating apparatus, and more particularly to a circulating cooling / heating apparatus used in a plasma etching apparatus.
- a semiconductor processing apparatus such as a plasma etching apparatus
- an apparatus having a temperature controller on the side of the apparatus is known (for example, see Patent Document 1).
- the temperature controller circulates and supplies a circulating fluid adjusted to a predetermined temperature to a chamber provided in the semiconductor processing apparatus, and controls the chamber temperature to be a target temperature. Therefore, the temperature controller is provided with a circulating cooling and heating device for cooling or heating the circulating fluid.
- a triple tube structure having an outer tube, an inner tube disposed inside the outer tube, and a glass tube disposed inside the inner tube is employed. Cooling water flows into and out of the outer pipe, and circulating fluid flows into and out of the inner pipe. A heating lamp is accommodated in the glass tube.
- the circulating fluid that has flowed into the inner pipe is cooled by heat exchange with the cooling water in the outer pipe on the outside, and is heated by irradiation from the inner heating lamp to be adjusted to a predetermined temperature.
- the temperature-controlled circulating fluid is pumped from the inner tube to the chamber by a pump, used for temperature control of the chamber, and then returns to the circulating cooling / heating device.
- the circulating fluid is cooled only by the cooling water through the tube wall of the inner tube, so that the circulating fluid that flows along the wall of the inner tube
- the circulating fluid may not be cooled well on the center side of the inner pipe. Therefore, in order to reliably cool the circulating fluid even in the center side of the inner pipe without changing the circulating flow rate of the circulating fluid, conventionally, the outer pipe has a large diameter and a large amount of cooling water is introduced to flow the circulating fluid. There is a problem that the entire apparatus is enlarged because it must be cooled.
- An object of the present invention is to provide a circulating cooling and heating apparatus that can efficiently cool a circulating fluid and that can downsize the entire apparatus.
- a circulating cooling and heating apparatus is a circulating cooling and heating apparatus that cools and heats a circulating fluid supplied to a chamber of a plasma etching apparatus, a tank that stores the circulating fluid, A pump that circulates between the chambers, a heat exchanger that exchanges heat between the circulating fluid and the cooling water, and a heating unit that heats the circulating fluid in the tank, the heat exchanger including the tank It is immersed in the circulating fluid inside.
- the tank includes a bottomed box-shaped tank body and a lid that closes an upper portion of the tank body, and the heat exchanger and the heating means are attached to the lid. It is attached.
- a liquid level sensor having a float that floats on the circulating fluid in the tank is attached to the lid.
- the tank has an air chamber formed by a space other than a portion filled with the circulating fluid, and a breather for communicating the air chamber with the outside of the tank. Is provided.
- an inflow path through which a circulating fluid flows is connected to the heat exchanger, and a relief valve that allows the circulating fluid flowing through the inflow path to escape into the tank is connected to the inflow path.
- the circulating cooling and heating apparatus of the first aspect of the present invention by having the heat exchanger for cooling the circulating fluid with the cooling water, the circulating fluid can be cooled with the same cooling efficiency as the conventional one, and the heat exchanger is Since it is immersed in the circulating fluid in the tank, the circulating fluid in the heat exchanger can be cooled through the surface of the heat exchanger that only dissipates heat, and the cooling efficiency can be further improved. And since such a heat exchanger is accommodated in a tank, it is not necessary to ensure the space for arrange
- the heat exchanger and the heating means are attached to the lid, so that they can be easily taken out by simply removing the lid from the tank body during maintenance. Further, since the heat exchanger and the heating means are attached to the removed lid, it is not necessary to work in a state where it is incorporated in the circulating cooling / heating device, and the work can be facilitated by external setup.
- the circulating cooling and heating device of the third aspect of the invention by providing the liquid level sensor, the amount of circulating fluid stored in the tank can be detected, and the circulating fluid can be replenished accurately. Further, since the liquid level sensor is attached to the lid, maintenance of the liquid level sensor can be facilitated as in the second invention.
- the air chamber is formed in the tank, there is no need to provide a member, an accumulator, or the like for securing a predetermined capacity space in the circulating flow path of the circulating fluid. In both cases, it is possible to reliably cope with the thermal expansion of the circulating fluid, and also in this respect, the downsizing of the apparatus can be promoted.
- the relief valve is provided in the inflow path of the circulating fluid connected to the heat exchanger, even if a situation occurs that disturbs the inflow of the circulating fluid in the heat exchanger.
- the circulating fluid can be relieved to escape into the tank, and the damage to the heat exchanger and piping for circulation or the influence on the pump can be suppressed.
- the relief valve is disposed in the tank, the recirculated fluid can be immediately released into the tank, and it is not necessary to form a long flow path for the relief, and the structure can be simplified.
- FIG. 1 is a perspective view showing a plasma etching apparatus 1 according to this embodiment.
- FIG. 2 is a schematic diagram showing the chamber 2 and the temperature control device 3 provided in the plasma etching apparatus 1.
- a plasma etching apparatus 1 is an apparatus that performs an etching process on a semiconductor wafer W by a dry process using plasma, and includes a plurality of chambers 2 (only one is shown in FIG. 2). . These chambers 2 are controlled to a predetermined target temperature by a temperature-controlled circulating fluid supplied from the temperature control device 3.
- the temperature control device 3 of the present embodiment is provided for each of the plurality of chambers 2 and is accommodated in an operator step 4 provided on the side of the plasma etching device 1.
- the chamber 2 is evacuated and maintained at a predetermined low pressure. In this state, an etching gas (process gas) is introduced into the chamber 2. The introduced etching gas is turned into plasma, and the semiconductor wafer W is etched.
- the temperature of the chamber 2 is controlled to the target temperature by the circulating fluid from the temperature control device 3.
- the chamber 2 in the present embodiment includes a lower electrode 2A on which the semiconductor wafer W is placed and an upper electrode 2B disposed above the lower electrode 2A, and an internal flow path of these electrodes 2A and 2B.
- the temperature is controlled by circulating a circulating fluid.
- capacitively coupled plasma is generated using an RF (Radio-Frequency) electric field applied between the electrodes 2A and 2B.
- the structure of the chamber may be one that generates an electron cyclotron resonance plasma, a helicon wave excitation plasma, an inductively coupled plasma, a microwave excitation surface wave plasma, or the like in addition to the one that generates a capacitively coupled plasma. .
- FIG. 3 is a perspective view of the inside of the entire temperature control device 3 as viewed from the rear side.
- FIG. 4 shows a schematic configuration and a fluid circuit of the circulating cooling / heating unit 5 provided in the temperature control device 3.
- the temperature control device 3 cools and heats the circulating fluid, and circulates the circulating fluid between the chamber 2 and the circulating cooling heating unit 5 as a circulating cooling heating device, and the circulating cooling heating unit.
- a control unit 6 that adjusts the temperature of the circulating fluid based on various parameters output from the control unit 5, and thus controls the temperature of the chamber 2 to a target temperature, and a housing 7 in which the circulating cooling and heating unit 5 and the control unit 6 are accommodated.
- the details of the circulating cooling heating unit 5 and the control unit 6 will be described later, but these are arranged in the front-rear positional relationship on the same plane. For this reason, when performing maintenance of the circulating cooling heating unit 5 and the control unit 6, by removing a part of the casing 7 of the temperature control device 3 to the upper side, they can be exposed in a wide range, Maintenance for the circulating cooling / heating unit 5 and the control unit 6 can be easily performed from above. Further, in the maintenance, it is not necessary to carry out the work by pulling out the temperature control device 3 from the accommodation location in Step 4 to a wider area, and therefore it is not necessary to secure a large arrangement space considering such an area.
- a chiller 8 is connected to the circulating cooling / heating unit 5.
- the chiller 8 supplies and circulates cooling water having a constant temperature to the circulating cooling / heating unit 5.
- the cooling water is used to cool the circulating fluid in the circulating cooling / heating unit 5.
- a fluorine-based refrigerant such as Galden (registered trademark of Augmond) or Fluorinert (registered trademark of 3M) is used.
- the circulating cooling / heating unit 5 is provided in a region occupying the rear side of the temperature control device 3. Since the circulating cooling / heating unit 5 is located on the rear side, the circulating fluid piping and the cooling water piping extend from the circulating cooling / heating unit 5 toward the rear side and pass under the plasma etching apparatus 1 main body. To the chamber 2 and the chiller 8. Therefore, these pipes are not exposed to the outside of the plasma etching apparatus 1, and it is not necessary to separately provide a dedicated pipe space in addition to the arrangement space of the plasma etching apparatus 1.
- the circulating cooling / heating unit 5 and the chamber 2 are in a close positional relationship, the length of the piping may be short, and the amount of circulating fluid used may be small. For this reason, the capacity
- the circulating cooling / heating unit 5 includes a tank 10 in which a circulating fluid is stored.
- An inflow passage 11 having an inflow portion 11A for circulating fluid and an outflow passage 12 having an outflow portion 12A are connected to the tank 10.
- Circulating fluid is stored in the tank 10, but there is a gap space that is not filled with the circulating fluid above the circulating fluid.
- An air chamber 10A is formed by the space.
- a breather 13 is provided on the side surface of the tank 10 in order to prevent excessive pressure fluctuation based on the volume change of the air chamber 10A.
- the breather 13 takes air in and out between the air chamber 10A and the outside according to the pressure of the air chamber 10A, and maintains the pressure of the air chamber 10A within a predetermined range.
- the heat exchanger 14 is accommodated in the tank 10 so as to be always immersed in the circulating fluid.
- the tip of the circulating fluid inflow path 11 is connected to the heat exchanger 14 in the tank 10.
- the heat exchanger 14 is provided with an outlet 14 ⁇ / b> A that allows the circulating fluid to flow into the tank 10.
- the heat exchanger 14 exchanges heat between the circulating fluid and the cooling water to cool the circulating fluid. For this reason, the heat exchanger 14 is connected to an inflow passage 15 having an inflow portion 15A for cooling water and an outflow passage 16 having an outflow portion 16A.
- the heat exchanger 14 Since the heat exchanger 14 is immersed in the circulating fluid, the circulating fluid flowing into the heat exchanger 14 is cooled from the outside of the heat exchanger 14 by the cooled circulating fluid.
- the size of the tank 10 is slightly increased by accommodating the heat exchanger 14 in the tank 10, it is not necessary to secure a space for arranging the heat exchanger 14 outside the tank 10. Even if the size of the heat sink is somewhat increased, the entire circulating cooling / heating unit 5 can be surely downsized.
- the tank 10 contains heating means 17 composed of three sheathed heaters.
- a terminal 17A of each heater is exposed at the upper part of the tank 10, and electric power is supplied through these terminals 17A, and the heater generates heat.
- the circulating fluid is heated by the heated heater.
- a relief valve 18 is provided in the inflow path 11 of the circulating fluid in the tank 10. If for some reason the flow of the circulating fluid into the heat exchanger 14 is restricted, the relief valve 18 is opened when the pressure of the circulating fluid in the heat exchanger 14 exceeds a predetermined pressure. The circulating fluid is allowed to escape into the tank 10.
- a pump 20 driven by a motor 19 is provided in the circulating fluid outflow passage 12, and a temperature sensor 21 and a pressure gauge 22 are provided downstream thereof.
- the pump 20 By driving the pump 20, the circulating fluid circulates between the circulating cooling / heating unit 5 and the chamber 2.
- the base end side of the outflow passage 12 is opened at an appropriate position in the tank 10 in consideration of the actual arrangement of the heat exchanger 14 and the heating means 17.
- the cooling water inflow passage 15 is provided with a pressure gauge 23 in the vicinity of the inflow portion 15A, and a proportional valve 24 is provided downstream thereof.
- a pressure gauge 25 is provided in the vicinity of the outflow portion 16 ⁇ / b> A, and a constant flow valve 26 is provided upstream thereof.
- a downstream side of the proportional valve 24 in the inflow path 15 and a downstream side of the constant flow valve 26 in the outflow path 16 communicate with each other by a bypass path 27.
- a proportional valve 28 is provided in the bypass path 27.
- the cooling performance in the heat exchanger can be adjusted by changing the opening of the throttle mechanism of each proportional valve 24, 28 and adjusting the flow rate of the cooling water flowing through the heat exchanger 14.
- the cooling water is circulated by a pump (not shown) on the chiller 8 (FIG. 2) side.
- the circulating fluid pump 20 is disposed between the front control unit 6 and the rear tank 10.
- the pressure gauge 22 for the circulating fluid is disposed above the tank 10.
- the proportional valves 24, 28, the constant flow valve 26, and the pressure gauges 23, 25 for cooling water are arranged in a concentrated manner on the side of the tank 10.
- the controller 6 controls the driving of the pump 20, changing the opening degree of the proportional valves 24 and 28, and switching the heating means 17 on and off based on the temperature detected by the temperature sensor 21 and other various parameters.
- a control part 6 is provided in the area
- the control unit 6 includes an SSR (Solid State Relay) 30 (FIG. 5) as switching means for switching the heating means 17 on and off, and an inverter 31 provided with a drive circuit for the pump 20.
- the control unit 6 includes a power connector 32, connectors for connecting various interface cables, a power switch box 33, a power substrate 34, a cooling fan 35 for cooling the inverter 31, a CPU (Central Processing Unit) substrate 36, and an operation panel. 37 etc. are provided.
- heaters are built in each electrode of the chamber, and on / off of these heaters is controlled by a temperature control device.
- a temperature control device it has been necessary to further heat the circulating fluid by incorporating a heater in the electrode, for example, because the temperature of the circulating fluid is lost during the long piping from the circulating cooling and heating device.
- about 90 ° C. was the limit for adjusting the temperature of the circulating fluid to the high temperature side.
- the heater built in the electrode becomes a noise source, and an expensive filter for noise suppression is required.
- the circulation pipe is short and the amount of the circulating fluid used is small, so that the temperature of the circulating fluid can be adjusted to about 150 ° C. even with the small heating means 17. From this, it is not necessary to incorporate a heater in each electrode 2A, 2B of the chamber 2, and the cost of the temperature control device 3 can be surely reduced.
- the housing 7 includes a bottom panel 41 on which the circulating cooling and heating unit 5 and the control unit 6 are mounted, and an upper cover 42 (illustrated by a two-dot chain line in FIG. 3) that covers the top and sides thereof.
- a front cover 43 fixed to the bottom panel 41 and the top cover 42 and covering the front side, a rear cover 44 (shown by a two-dot chain line in FIG. 3), and the inside of the temperature control device 3.
- a partition panel 45 that partitions the front and rear.
- the rear side of the partition panel 45 is a circulation chamber 46 in which the circulation cooling and heating unit 5 is provided, and the front side is a control chamber 47 in which the control unit 6 is provided. That is, the chambers 46 and 47 exist on the same plane.
- the bottom panel 41 is provided with a raised portion 41A along the periphery of the portion corresponding to the circulation chamber 46.
- the height H1 of the upright portion 41A is higher than the height H2 of the upright portion 41B provided along the outer periphery of the control chamber 47. That is, the bottom panel 41 has a pan 48 whose periphery on the bottom side of the circulation chamber 46 is surrounded by the upright portion 41A.
- a liquid leak sensor 49 that detects the circulating fluid is provided on the bottom surface of the pan 48.
- the circulation chamber 46 since the circulating fluid and the cooling water flow in and out, even if the circulating fluid and the cooling water leak in the circulation chamber 46, they are received by the pan 48. Therefore, it is possible to prevent the circulating fluid and the cooling water from flowing into the control chamber 47 and affecting the electronic parts and the like and leaking outside. Further, the circulating fluid and cooling water leaking to the pan 48 are detected by a liquid leak sensor 49 and this situation is displayed on the operation panel 37 or a display device provided in the plasma etching apparatus 1.
- the upper cover 42 has a shape having an upper surface portion 51 and left and right side portions 52, 52, and uses the left and right handles after releasing the fixing to the bottom panel 41, the front cover 43, and the rear cover 44. It is possible to remove it upward.
- the above-described operation panel 37 is attached to the upper surface 51 of the upper cover 42 in the control chamber 47.
- openings are provided in positions corresponding to the pressure gauges 22 and 23 of the circulating cooling and heating unit 5 in the upper surface portion 51 and the side surface portion 52 of the upper cover 42, and even when the upper cover 42 is attached, The pressure gauges 22 and 23 can be read.
- a power connector 32, a signal transmission / reception connector, a power switch box 33, and the like are attached to the front cover 43 via a plate 38.
- the front cover 43 is provided with a number of slits 39 for releasing heat from the electrical and electronic components that constitute the control unit 6.
- Such a slit 39 is also provided in the side surface 52 and the rear cover 44 of the upper cover 42.
- a plurality of openings for avoiding interference with the circulating fluid inflow portion 11A, the outflow portion 12A, the cooling water inflow portion 15A, and the outflow portion 16A, and the pressure gauge 25 on the outflow passage 16 are visually recognized.
- An opening is provided on the rear cover 44.
- the partition panel 45 has a first planar portion 45A and a second planar portion 45B, so that it is formed in a crank shape in plan view.
- the SSR 30, the inverter 31, the power switch box 33, the power supply board 34, the cooling fan 35, the operation panel 37, and the like in the control room 47 are arranged in a wider one divided by the first planar portion 45 ⁇ / b> A in the control room 47. Arranged in space.
- the CPU board 36 and the like are arranged on the narrow arrangement space side of the control chamber 47 partitioned by the second planar portion 45B.
- the rear side of the wide arrangement space of the control chamber 47 is a narrow arrangement space divided by the first planar portion 45A in the circulation chamber 46, and the proportional valves 24, 28, A constant flow valve 26 and pressure gauges 23 and 25 for cooling water are arranged.
- the rear side of the narrow arrangement space of the control chamber 47 is in the circulation chamber 46 and is a wider arrangement space partitioned by the second planar portion 45B.
- the arrangement space includes the tank 10 and the pump. 20, a temperature sensor 21, a pressure gauge 22, and the like are arranged.
- a suction fan 55 attached to the attachment piece 53 is arranged in the narrower arrangement space of the circulation chamber 46.
- a discharge fan 56 attached to the attachment piece 54 is arranged in the wider arrangement space of the circulation chamber 46.
- an opening through which cooling air flows in and out is provided at a position corresponding to the fans 55 and 56.
- FIG. 5 shows a plan view of the inside of the temperature control device 3.
- the state of the cooling air flowing in the circulation chamber 46 is depicted by shaded arrows.
- the cooling air sucked by the right suction fan 55 from the outside of the temperature control device 3 first flows to the left along the back surface of the first planar portion 45 ⁇ / b> A constituting the partition panel 45.
- Heat generating components such as the SSR 30 and the inverter 31 are attached to the front surface of the first planar portion 45A, and the back surface of the first planar portion 45A is a heat dissipation surface for the heat generated. Therefore, when the cooling air flows along such a back surface, the heat dissipated through the first planar portion 45A can be immediately released to the outside of the casing 7, and the accumulation in the circulation chamber 46 can be suppressed. .
- the cooling air moves to the wider arrangement space of the circulation chamber 46 and flows between the second planar portion 45B and the tank 10. As a result, the cooling air cools the motor 19 and the pump 20 driven thereby. Thereafter, the cooling air is discharged to the outside of the temperature control device 3 through the discharge fan 56 on the left side.
- FIG. 6 shows an exploded perspective view of the tank 10. The tank 10 will be described in more detail based on FIG.
- the tank 10 includes a bottomed box-like tank body 61 and a plate-like lid body 62 that closes the upper portion of the tank body 61.
- an inner flange 61A is provided along the outer peripheral edge.
- the lid 62 is fixed to the inner flange 61A by appropriate fastening means such as a screw.
- a sealing material is appropriately interposed between the inner flange 61 ⁇ / b> A and the back surface of the lid 62.
- the side surface of the tank body 61 is provided with a leveler 63 for confirming the amount of circulating fluid stored inside, and a drain pipe 64 for discharging the circulating fluid, in addition to the breather 13 described above.
- a replenishment port 65 for replenishing the circulating fluid is provided on the back surface of the tank body 61.
- a suction pipe 66 constituting the base end side of the outflow passage 12 is provided inside the front surface of the tank body 61. The circulating fluid in the tank 10 is sucked out by the pump 20 from the suction pipe 66.
- the heat exchanger 14 and the heating means 17 described above are attached to the lid 62 in a state of hanging from the back surface of the lid.
- a pair of liquid level sensors 67 and 67 are attached to the lid 62.
- Each liquid level sensor 67 has a float 67A floating in the circulating fluid. Whether or not the liquid level (reserved amount) of the circulating fluid has reached the lower limit level and the upper limit level can be detected based on the position of the float 67A output from the liquid level sensor 67. When the amount of circulating fluid exceeds each limit level, the status is displayed on the operation panel 37 or the like.
- the lid 62 is removed from the tank body 61 during the maintenance thereof, and the inflow passages 11, 15 and By dividing the outflow passages 12 and 15 from the joint portion, the entire lid body 62 can be taken out and easily set up outside. Further, by removing the lid 62, the heat exchanger 14 and the heating means 17 are also removed, so that the upper part of the tank body 61 can be largely opened, and maintenance inside the tank body 61 can be simplified.
- the present invention is not limited to the above-described embodiments, and modifications, improvements, and the like within the scope that can achieve the object of the present invention are included in the present invention.
- the relief valve 18 for allowing the circulating fluid to escape to the tank 10 is provided in the tank 10.
- such a relief valve 18 is provided outside the tank 10, for example, immediately downstream of the pump 20. It is good also as a structure which is provided in and is made to escape the relief
- the air chamber 10A is provided in the tank 10 and the breather 13 is provided in the tank 10, but an accumulator or the like may be provided in the circulation channel instead of providing the air chamber 10A or the breather 13.
- the accumulator requires a predetermined space, it is not suitable for downsizing of the apparatus.
- the tank 10 may be provided with the air chamber 10A and the breather 13 as in the above embodiment. preferable.
- the heat exchanger 14, the heating means 17, and the liquid level sensor 67 are attached to the lid 62.
- the present invention is included.
- the effect of facilitating maintenance can be obtained by attaching them to the lid 62, it is preferable to perform the same as in the above embodiment.
- the circulating cooling / heating unit 5 incorporated in the casing 7 of the temperature control device 3 together with the control unit 6 has been described.
- the circulating cooling / heating device of the present invention is a casing different from the control unit 6. It may be constructed as a device having
- the present invention can be suitably used as a circulating cooling and heating apparatus for a plasma etching apparatus.
- SYMBOLS 1 Plasma etching apparatus, 2 ... Chamber, 5 ... Circulation cooling heating part which is a circulation cooling heating apparatus, 10 ... Tank, 10A ... Air chamber, 11 ... Inflow path, 13 ... Breather, 14 ... Heat exchanger, 17 ... Heating Means, 18 ... relief valve, 20 ... pump, 61 ... tank body, 62 ... lid, 67 ... liquid level sensor, 67A ... float.
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Abstract
Description
図1は、本実施形態に係るプラズマエッチング装置1を示す斜視図である。図2は、プラズマエッチング装置1に設けられたチャンバー2および温度制御装置3を示す模式図である。
図1、図2において、プラズマエッチング装置1は、プラズマを用いたドライプロセスにより半導体ウェハWにエッチング処理を施す装置であり、内部に複数のチャンバー2を備える(図2に1つのみを図示)。これらのチャンバー2は、温度制御装置3から供給される温調された循環流体により所定の目標温度に制御される。本実施形態の温度制御装置3は、複数のチャンバー2毎に設けられ、プラズマエッチング装置1の側方に設けられたオペレータ用のステップ4内に収容される。
図3には、温度制御装置3全体の内部を後方側から見た斜視図が示されている。図4には、温度制御装置3に設けられた循環冷却加熱部5の概略構成および流体回路が示されている。
循環冷却加熱部5は、温度制御装置3の後方側を占める領域に設けられている。循環冷却加熱部5が後方側に位置することで、循環流体用の配管や冷却水用の配管が循環冷却加熱部5から後方側に向けて延出され、プラズマエッチング装置1本体の下方を通ってチャンバー2やチラー8に接続される。従って、それらの配管は、プラズマエッチング装置1の外部に露出することがなく、プラズマエッチング装置1の配置スペースの他に配管専用のスペースを別途設ける必要がない。
制御部6は、ポンプ20の駆動、比例弁24,28の開度変更、および加熱手段17のオンオフの切り換え等を、温度センサ21での検出温度、その他の各種パラメータに基づいて制御する。このような制御部6は、図3に示すように、温度制御装置3の前方側を占める領域に設けられている。
図3において、筐体7は、循環冷却加熱部5および制御部6が搭載される底部パネル41と、それらの上方および側方を覆う上部カバー42(図3中に2点鎖線で図示)と、底部パネル41および上部カバー42に固定されて前方側を覆う前部カバー43と、同様に後方側を覆う後部カバー44(図3中に2点鎖線で図示)と、温度制御装置3内を前後に仕切る仕切パネル45とを備える。仕切パネル45の後方側は、循環冷却加熱部5が設けられる循環室46とされ、前方側は、制御部6が設けられる制御室47となっている。つまり、各室46,47が同一平面上に存在している。
図5には、温度制御装置3の内部の平面図が示されている。この図5には、循環室46内を流れる冷却空気の様子が網掛けされた矢印で描かれている。
図6には、タンク10の分解斜視図が示されている。図6に基づき、タンク10をより詳細に説明する。
例えば、前記実施形態では、循環流体をタンク10に逃がすためのリリーフ弁18がタンク10内に設けられていたが、このようなリリーフ弁18は、タンク10外において、例えばポンプ20の直ぐ下流側に設け、リリーフした循環流体を逃がし流路を通してタンク10内に戻す構成としてもよい。
Claims (5)
- プラズマエッチング装置のチャンバーに対して供給される循環流体を冷却、加熱する循環冷却加熱装置において、
循環流体を貯留するタンクと、
循環流体を前記タンクおよび前記チャンバーの間で循環させるポンプと、
循環流体と冷却水との間で熱交換を行う熱交換器と、
前記タンク内の循環流体を加熱する加熱手段とを備え、
前記熱交換器は、前記タンク内の循環流体に浸漬される
ことを特徴とする循環冷却加熱装置。 - 請求項1に記載の循環冷却加熱装置において、
前記タンクは、有底箱状のタンク本体と、タンク本体の上部を塞ぐ蓋体とを備え、
前記熱交換器および前記加熱手段は、前記蓋体に取り付けられる
ことを特徴とする循環冷却加熱装置。 - 請求項2に記載の循環冷却加熱装置において、
前記蓋体には、前記タンク内の循環流体に浮かぶフロートを有した液面センサが取り付けられる
ことを特徴とする循環冷却加熱装置。 - 請求項1ないし請求項3のいずれかに記載の循環冷却加熱装置において、
前記タンクには、循環流体で満たされている部分以外の空間により空気室が形成されるとともに、前記空気室と前記タンクの外部とを連通させるブリーザが設けられる
ことを特徴とする循環冷却加熱装置。 - 請求項1ないし請求項4のいずれかに記載の循環冷却加熱装置において、
前記熱交換器には、循環流体を流入させる流入路が接続され、
前記流入路には、当該流入路を流れる循環流体を前記タンク内に逃がすリリーフ弁が設けられる
ことを特徴とする循環冷却加熱装置。
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