WO2014076290A1 - Divergenzänderungsvorrichtung - Google Patents
Divergenzänderungsvorrichtung Download PDFInfo
- Publication number
- WO2014076290A1 WO2014076290A1 PCT/EP2013/074135 EP2013074135W WO2014076290A1 WO 2014076290 A1 WO2014076290 A1 WO 2014076290A1 EP 2013074135 W EP2013074135 W EP 2013074135W WO 2014076290 A1 WO2014076290 A1 WO 2014076290A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- divergence
- mirror
- system area
- changing device
- focal point
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/0643—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/02—Catoptric systems, e.g. image erecting and reversing system
- G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
- G02B19/0019—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors)
- G02B19/0023—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having reflective surfaces only (e.g. louvre systems, systems with multiple planar reflectors) at least one surface having optical power
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
- G02B19/0028—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed refractive and reflective surfaces, e.g. non-imaging catadioptric systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
- G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/10—Scanning systems
- G02B26/105—Scanning systems with one or more pivoting mirrors or galvano-mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/02—Catoptric systems, e.g. image erecting and reversing system
- G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
- G02B17/0694—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror with variable magnification or multiple imaging planes, including multispectral systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0896—Catadioptric systems with variable magnification or multiple imaging planes, including multispectral systems
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/40—Solar thermal energy, e.g. solar towers
Definitions
- the invention relates to a divergence changing device, in particular a divergence changing device having a substantially telecentric optical arrangement for the variably adjustable change of a divergence angle of a
- Changing the divergence of electro-magnetic radiation e.g. of laser light is necessary in many fields, e.g. in material processing or microscopy.
- changing the divergence of radiation may be necessary to shift a focus of electro-magnetic radiation by changing the divergence.
- the laser beam is often directed over a workpiece at high speed by means of a plurality of controllable and movable mirrors.
- the laser beam is often directed over a workpiece at high speed by means of a plurality of controllable and movable mirrors.
- due to the dimensions of the workpiece to different distances between a laser source and the workpiece so it may be necessary to focus the laser beam quickly to achieve an efficient and precise energy transfer from the laser beam to the workpiece.
- a divergence changing device for changing the divergence of electromagnetic radiation is therefore desirable.
- the invention provides for a divergence changing device for variably adjustable change in the divergence of an electromagnetic beam, which is described by and a plurality of sub-beams, comprising a radiation source for providing the radiation beam with at least the plurality of sub-beams, a substantially telecentric arrangement with an optical system having a first focal point, a first system area and a first focal point second system area, and having a beam device disposed in or close to the first focal point and arranged and arranged so that the beam of the
- Radiation source strikes the beam deflecting device, wherein the main beam in the first focal point or near the first focal point on the beam deflecting device, and that they come from the radiation source beam from the first system area of the optical system with different
- optical system is configured such that the beam from the first system area is imaged such that the main beam of the beam supplied to the first system area of the first
- System area is deflected in a direction that is in the
- Main beam and a beam folding device arranged to deflect the beam imaged by the first system portion of the optical system onto the second system portion of the optical system, the beam from the second system portion of the optical system is imaged so that the beam again meets the beam deflecting device, wherein the main beam in the first focal point or near the first focal point again meets the beam deflecting device and wherein the plurality of secondary beams again on the beam deflecting device, the re-incident beam of the
- Beam deflecting device is deflected so that Main beam is substantially stationary and non-collinear and / or spatially separated from the main beam of the
- the invention further provides a
- Divergence change arrangement comprising at least or exactly two divergence changing devices, as described above, wherein the at least or exactly two
- Divergence changing devices are arranged so that they form an upstream Divergenz Sungsvortechnische and one of these downstream Divergenz Sungsvorides with a common beam path, the beam, whose main beam from the upstream
- the invention provides a beam position and divergence changer comprising
- Divergence change arrangement if provided respectively, arranged in front of the 2D scanner system, wherein the 2D scanner system is adapted to a propagation direction of one of the divergence changing device or the
- Figure 1 shows schematically from two perspectives
- Divergence changing device comprising an optical system serving as a refraction system
- Figure 2 shows schematically a divergence changing device according to the present invention having an optical
- Figure 3 shows schematically a divergence changing device according to the present invention having an optical
- Figure 4 shows schematically a divergence changing device according to the present invention, in which also a
- Figure 5 shows schematically a divergence changing device according to the present invention according to another
- FIG. 6 schematically shows a divergence change arrangement comprising two inventive devices
- Figure 7 shows schematically a divergence changing device with a retroreflector device according to the present invention
- FIG. 8 shows a schematic view of a divergence change device or a divergence change device according to the invention and a retroreflector device.
- Divergence changing device 1 has a radiation source 10 for generating an electro-magnetic radiation beam 5.
- the radiation source 10 may be configured to generate an electromagnetic radiation beam 5 (hereinafter also referred to briefly as
- Beam which may have any polarization, such as linear polarization, circular polarization or elliptical polarization.
- the radiation source 10 may be configured to provide radiation beams 5 of arbitrary wavelength.
- the radiation source 10 may be e.g. a laser beam source 10, a visible light beam source 10, or a radiation source 10 for UV or IR radiation.
- the radiation source 10 may be a pulsed laser radiation source 10 having a plurality of pulsed, i. temporally discontinued, beam 5 generated, or the radiation source 10 may be a laser beam source 10, which generates a continuous beam 5.
- Radiation source 10 may be a high power radiation source that generates radiation that may be suitable for material processing (e.g., melting or vaporizing metals such as steel).
- a beam 5 produced by the radiation source 10 may include a plurality (e.g., plurality) of beams (e.g.
- Cross-sectional area such as have a circular, elliptical or polygonal cross-sectional area.
- the beam 5 may have a divergence.
- the divergence can be the angle
- the radiation source 10 may be, for example, a laser radiation source 10 having a
- the laser radiation source 10 may be pulsed radiation having a pulse duration of less than 1 ⁇ s and pulse energy greater than 100 nJ or greater than 1 mJ and / or pulse energy less than a few Joules (e.g., less than 5 J).
- the laser beam source 10 may also generate pulsed radiation having a pulse duration of less than about 10 ps and a pulse energy of about 1 to 10 nJ, for example, when the inventive device is used to process or interact with biological tissues (eg To perform operations on the eye or the like).
- the radiation source 10 may also include a (e.g., virtual)
- the radiation source 10 need not be a physical, physical radiation source 10. In this case, a radiation beam 5 is generated via the radiation source 10
- a collimated beam 5 may have a divergence of zero, a divergent beam may have a positive value of divergence, and a convergent beam may have a negative value Accordingly, a beam 5 may collimate (ie, the beams of the beam 5 are substantially parallel to each other), divergent (ie, for example, the beams are substantially away from each other), or convergent (ie, for example, the beams are substantially toward each other), eg, as it leaves the radiation source 10.
- the beam 5 is mathematically represented below by a main beam 6, which runs essentially centrally in the beam 5 and characterizes the propagation direction of the beam 5, as well as a plurality of secondary beams, which are shown in FIG Bundles may be arranged around the main beam 6 around and whose direction relative to the main beam 6 may be tilted depending on the position within the beam 5, whereby the divergence of the beam 5 is described.
- the beam 5 may have a plurality of sub-beams and such a main beam 6, or the main beam may not be present at the beam 5, for example, be hidden (eg by means of a diaphragm) or not by the radiation source 10th
- the main beam 6 may be a main virtual beam 6, which is essentially the
- this definition of the functional description does not limit the possible manifestations of the beam 5, for example, a composition of the beam 5 from several sub-beams of different geometry,
- Intensity distribution over the cross section is inhomogeneous or asymmetric or their intensity distribution in the region of the main beam 6 have a minimum or a maximum.
- imaging or “mapping” 1
- a first beam is deflected or guided through an optics / optical device such that it subsequently Course after the optics is described by a second beam or beam bundle.In this sense, the first beam or the first beam to the second beam or imaged the second beam.
- the term “mapping” may be understood in terms of optical mapping.
- the divergence changing device 1 comprises an optical system 15 which, together with a beam deflection device 30, which is in or near a first focal point 16 of the optical
- System 15 is arranged, forms a substantially telecentric arrangement 31.
- a telecentric (optical) arrangement is considered to be a telecentric arrangement
- An imaging property is, for example, when a beam incident on the optical system 15 through the first focal point 16 of the optical system 15 is independent of that
- Angle of incidence and / or the position with which he encounters the optical system 15 is deflected in one direction.
- rays passing through the first focal point 16 and impinging on the optical system 15 are deflected parallel to each other in a direction independent of the angle of incidence or the incident position on the optical system 15.
- the optical system 15 may be configured to
- Parabolic mirror correspond (e.g., an incident
- a telecentric arrangement 31 having an optical system 15 with a reflection system 20 (e.g., a parabolic reflector 20) or a telecentric refraction system 25 (e.g., lens system) or otherwise.
- the telecentric assembly 31 may have such a structure and / or with such materials
- the optical system 15 has a first system area 17 and a second system area 18.
- the first system area 17 and the second system area 18 may be different
- optical properties or optical properties may be spatially separated (e.g., as separate regions) or may be monolithic (e.g.
- first system area 17 and the second system area 18 may be separated by a respective individual, separate
- Reflection system e.g., parabolic mirrors
- each by an individual, separate refraction system e.g.
- Lens system e.g. comprising one or more transmissive optical elements or e.g. a telecentric lens.
- the first system area 17 and the second system area 18, which form the optical system 15, can cooperate with the beam deflecting device 30 in common with the telecentric imaging property of the telecentric arrangement 31
- the first system area 17 may have a telecentric imaging property
- the second system area 18 may have a telecentric imaging property, with one (the object side) focal point of the first
- System area 17 and a (the image side) focus of the second system area 18 substantially coincide in the location of the first focal point 16 so that they together form the first focal point 16.
- a beam which does not strike the first system area 17 of the optical system 15 through the first focal point 16 is emitted from the first system area 17 of the first system area 17 of the optical system 15
- optical system 15 at an angle to a beam passing through the first focal point 16 to the first system area 17 of the optical system 15, deflected.
- Beam 5 may be a subset of the beams provided or generated by the radiation source 10.
- the angle at which a secondary beam of a beam 5 is deflected to the main beam 6 of the beam 5 from the first system area 17 is dependent on the angle of incidence (and / or the place of incidence) with which the beam 5 on the first system Area 17 of the optical system 15 meets.
- the divergence of a beam 5 imaged by the first system region 17 of the optical system 15 may be different (eg, smaller or larger) than the divergence of the same beam 5 prior to imaging by the first system region 17 of FIG optical
- the angle can be a
- Secondary beam with the main beam 6 defined by an image by the first system area 17 of the optical system 15, depending on the location and / or the angle to be, at / with the
- Beam 5 on the optical system 15 (or the first system area 17 thereof) occurs.
- the main beam 6, which passes through the first focal point 16, causes the main beam 6, which passes through the first focal point 16, to travel in a direction that is independent of the angle of incidence and / or the position at which the main beam 6 impinges on the first system area 17, is distracted.
- the other rays of the beam 5, referred to herein as minor rays, passing through the first ray System area 17 of the optical system 15, define an angle to this running through the first focus 16 main beam 6, wherein the angle is dependent on the angle of incidence and / or the incident position of the beam 5 on the first system area 17th
- Secondary beam of a beam 5 (or for example between two secondary beams, which is a plane with the main beam
- System 15 is different, for example, smaller or larger than the divergence angle before imaging. This can e.g. cause a divergent or collimated beam 5 incident on the optical system 15 via the first focus 16 to be imaged as a convergent beam 5 through the first system area 17 of the optical system 15, or a divergent one Beam 5 through the first system area 17 optical system 15 as a
- divergent beam 5 is imaged with a lower divergence.
- a convergent e.g. a convergent
- optical system 15 as a convergent beam 5, wherein a convergent property of the
- Beam beam 5 may be more pronounced after imaging through the first system area 17 of the optical system 15 than before the figure.
- this convergent beam 5 may form a focal point 5a or a focus line 5a.
- the focal point 5a may be the point at which several (e.g., all) rays of the convergent beam 5 converge after the beam 5 passes through the first system region 17 of the first
- the focus line 5a can a line that occurs when, for example, the formation of the focal point by elements in the beam path before and / or within and / or after the Divergenz selectedungsvorraum is prevented, as may be the case when the optical system 15 according to the invention additional cylindrical lenses or additional
- Parabolic mirror has (or is formed accordingly) or the mirror of the jet folding device 34 have appropriate cylindrical refractive power (for example, as a parabolic mirror are formed).
- cylindrical refractive power for example, as a parabolic mirror are formed.
- the focal point 5a does not have to be formed as an exact point, but may also be out of focus due to the aberrations caused by the first system area 17
- the aberrations may be e.g. be at least partially compensated by a suitable (e.g., symmetrical) guidance of the beam through the second system area 18.
- An optical system 15, which is designed as a reflection system 20, may be better suited in some applications than an optical system 15, which is designed as a refraction system 25, since less or no chromatic
- Focus point 5a / b is formed (resulting in a lesser
- Divergence change device 1 occur. For example, a divergence of the first system area 17 of the
- optical system 15 imaged beam 5 so that no actual focal point 5a within the
- Divergence Variation Vorrich device 1 occurs (i.e., for example, as set forth below before a second deflection of the beam 5 by the beam deflector 30), although the beam 5 imaged by the first system region 17 of the optical system 15 may be convergent.
- the beam path of the divergence changing device 1 may be formed such that a convergent beam 5 forms a focal point 5a only outside the divergence changing device 1 (which may be the working focus point, for example) or never forms an actual focal point 5a, but only so it will be pictured without another one
- Influencing the beam path of the divergence changing device 1 would form a virtual focal point 5b.
- the focus points 5a / b can depend on the angle of incidence of the
- Beam 5 may be disposed on the first system area 17 of the optical system 15 on a focus area (e.g., focal plane), i.
- a focal point 5a / b can be arranged on the first system area 17 of the optical system 15 at a different position in the focus area, depending on the angle of incidence and / or the incidence position of the beam 5.
- Focus area can be a curved focus area or a flat focus area (focal plane).
- the focus area may also be an actual focus area 15a or a virtual focus area 15b on which the virtual focus points 5b would lie if the beam 5 does not interfere with components of the
- a virtual focal point 5b and at the same time an actual focal point 5a may also be present, wherein the virtual focal point 5b may be the focal point, the beam 5 depicted by the first system region 17 of the optical system 15 would form, if no interaction with components of the
- the actual focal point 5a may be a focal point, the position of which differs from that of the virtual focus point 5b due to interaction of the beam 5 with components of the divergence changing device 1.
- the optical system 15 can be arranged such that the focus points 5a (or the virtual focus points 5b) of all the beams 5, the main beam 6 of which over the first focal point 16 (or a point close thereto) to the first
- the properties and the position of the focus area 15a lie on a focus area 15a (which may be a virtual focus area 15b in analogy to the virtual focus points 5b).
- the optical system 15 may be formed such that the focal surface 15a / b is a curved focus surface 15a / b or may be one with respect to an optical axis of the optical system
- optical system 15 tilted focal plane 15a / b (for
- the tilted focal plane may be formed such that the main beam 6 of a beam 5 imaged by the first system region 17 of the optical system 15 is the beam
- the focus points 5a / b of all the beams 5 passing over the first focal point 16 of the optical system 15 and imaged through the first system area 17 of the optical system 15 may lie on a curved focus area 15a / b.
- the curvature of the curved focus surface 15a / b may be caused by the formation of the optical system 15 and may be, for example, a parabolic-shaped focus surface 15a / b and / or a paraboloid-shaped curved focus surface 15a / b.
- the curved focus surface 15a / b can at
- the curved focus area 15a / b may also be replaced by one function (e.g., a polynomial) with another
- Exponents may be defined as two (as in the case of the parabola), e.g., the exponent may be 4 or 6 (or, for example, 3 or 5) and / or may also be a rational value in the range of 2 to 6. Also parameters like the parabola parameter or others
- Parameters of a function defining the curved focus area 15a / b may be arbitrary.
- the beam deflecting device 30 is located in or near (e.g., adjacent to, e.g., adjacent to) the first focal point 16 of the optical system 15 and is intended to receive a beam 5 incident on the first focal point 16 of the optical system 15
- Beam deflector 30 falls to deflect to the first system area 17 of the optical system 15.
- Beam deflection device 30 is adapted to the
- the beam deflection device 30 can cooperate with the optical system 15 to move the (possibly virtual) focal point 5a / b of a beam 5 on a (possibly virtual) focus surface 15a / b by the impact point and / or angle of incidence of
- Beam 5 on the first system area 17 of the optical System 15 is adjusted by means of the beam deflecting device 30.
- the beam deflecting device 30 may be e.g. a rotatable mirror 30 with one degree of freedom (i.e., for example, that it can have a pivot axis 32).
- an actuator e.g., non-rotatable
- An actuator may e.g. be a scanner or a galvanometer drive, which can allow rapid rotation of the rotatable mirror 30.
- the beam deflector 30 may be a galvanometer scanner having a mirror rotatably connected to a galvanometer drive.
- Beam deflector 30 may be of such construction and / or made with such materials as to be capable of imaging high energy / power beams 5.
- Divergence changing device 1 may be provided with a controller 50 (see, for example, Figs.
- Beam deflector 30 to control that they have a
- Angle of incidence or an incidence position of the beam 5 can be set to the optical system 15 selectively and controllable.
- the beam deflecting device 30 includes a rotatable mirror 30 that is rotatable by means of an actuator
- the controller may control the actuator, which in turn may generate rotation of the mirror by a predetermined angle of rotation by mechanical rotation of the mirror.
- the control device 50 can also be connected to the radiation source 10 in order to control the operation of the
- the controller 50 may be configured to detect a divergence
- Divergence change of the incident from the second system area 18 on the beam deflecting device 30 beam set in dependence of an input value and / or an algorithm.
- the controller 50 of FIG a desired divergence value may be provided to a user or another controller, and the controller may determine the divergence by means of a corresponding adjustment of the divergence value
- Set jet deflecting device 30 for example, also using a scheme that as a feedback variable
- the rotatable mirror 30 may comprise a first mirror surface 30a, which may be implemented as a plane mirror or which may be embodied as a mirror surface 30a with a different geometry, e.g. as parabolic mirror surface, parabolic mirror surface or as free-form mirror surface.
- the beam deflecting device 30 can also be designed as a rotatable double mirror 30 with a first 30 a and a second 30 b mirror surface
- Mirror surface 30a may also be at an angle with the second
- the beam deflecting device 30 may be e.g. also be an acousto-optic beam deflecting device, be an electro-optical beam deflecting device or a piezo-electrically driven Strahlablenkvorraum or one of these additionally or alternatively have.
- the divergent change device 1 has a
- the beam folding device 34 is designed so that it again a beam 5, which was imaged by the first system area 17 of the optical system 15, via the optical system 15, namely via the second system area 18 of the optical system 15
- the beam folding device 34 may deflect a beam 5 which is deflected by means of the beam deflection device 30 onto the first system area 17 of the optical system 15 and by means of the optical beam System 15 from the first system area 17 is deflected to the second system area 18 of the optical system 15.
- the jet folding device 34 may be formed so that a main beam 6 of a beam 5, which in the
- Beam folding device 34 is incident, is substantially parallel to the main beam 6 of the beam 5, the
- Jet folder 34 leaves, and the failing
- Beam 5 may have an opposite propagation direction to the incident.
- the jet folding device 34 may also be formed so that the main beam 6 of a
- Beam 5 which is incident on the beam folding device 34 is not parallel to the main beam 6 of the beam 5 leaving the beam folding device, for example when the first and second system sections 17 are tilted with respect to their optical axes and the beam folding device 34 is so is designed and arranged to compensate for the tilt.
- the jet folding device 34 may be arranged and arranged such that a main beam 6 of an incident on it
- Beam 5 has a distance from the main beam 6 of the precipitating from her beam 5, and the main beam 6 of the incident beam 5 and the main beam 6 of the
- outgoing beam 5 may be symmetrical with respect to a plane of the optical system 15 containing the optical axis.
- the jet folding device 34 may also be arranged and arranged such that there is no such symmetry.
- the jet-folding device 34 can with respect to the optical
- the jet folding device 34 may include a first beam folding mirror 35 and / or a second beam folding mirror 40.
- the first 35 and / or second 40 beam folding mirrors may be stationary with respect to the optical system 15 and may each comprise one (e.g.
- the first beam folding mirror 35 and / or the second beam folding mirror 40 can each have or be a planar mirror.
- Jet folding device 34 (e.g., the first 35 and / or second 40 beam folding mirrors) may be configured to be to the
- Reflecting high power laser radiation e.g. is used in material processing, is suitable.
- the first beam folding mirror 35 may be arranged so that the beam 5 after the e.g. essentially
- the first beam folding mirror 35 may be arranged so that a light passing through the optical system 15
- converging imaging beam 5 converges (i.e., geometrically, for example, before the beam 5 encounters a focal point 5a on the first beam folding mirror 35)
- the first beam folding mirror 35 i.e., e.g., geometrically after the beam 5 hits the focal point 5a on the first focal plane mirror 35
- the first beam folding mirror 35 can do so
- the second beam folding mirror 40 may be arranged such that the one deflected by the first beam folding mirror 35
- the second Beam folding mirror 40 may be arranged so that a through the first system area 17 of the optical system 15
- Beam folding mirror 35 deflected beam 5 converges on the second beam folding mirror 40 (i.e.
- the second beam folding mirror 40 can do so
- Beam folding mirror 40 may be arranged further jet folding intermediate mirrors, via which the beam 5 can be deflected from the first beam folding mirror 35 to the second beam folding mirror 40.
- the jet folder 34 may also have a different number of beam folding mirrors than two beam folding mirrors.
- Beam folding mirror for example, the first beam folding mirror 35, which is located in the beam path after the first system area 17, and the second beam folding mirror 40, which is in the beam path in front of the second system area 18, provided with a cylindrical imaging property be (for example, be designed as a parabolic mirror that is) to high power to prevent the formation of a "point-shaped focal point 5a * 1 / energy density.
- the beam folding device 34 may also include a plurality of prisms through which a beam 5 is deflected, eg, from a first system area 17 of the optical system 15 to a second system area 18 of the optical system 15.
- the beam folding device 34 may also be at least one lens
- convergent lens e.g convergent lens
- mirror which is arranged in (or near) the focal point of this lens, wherein the lens and the mirror can be arranged and arranged such that a beam 5 emerging from the first system area 17 of the optical system 15 coming to the
- Jet folding device 34 hits, by means of
- Beam deflector 34 is deflected as described above to the second system portion 18 of the optical system 15.
- Arrangement 31 striking beams 5 can be functionally reversed by the optical system 15 (or the second system portion 18 thereof) (eg, reverse-telecentric) and the main beam 6 of the beam 5 can from the second system portion 18 of the optical system 15th can be deflected again to the first focus 16 of the optical system 15, and other rays of the beam 5 can be imaged at an angle to the principal ray imaged on the first focus 16 so as to produce a convergent, collimated, or divergent beam 5 can be.
- the optical system 15 or the second system portion 18 thereof
- the main beam 6 of the beam 5 can from the second system portion 18 of the optical system 15th can be deflected again to the first focus 16 of the optical system 15, and other rays of the beam 5 can be imaged at an angle to the principal ray imaged on the first focus 16 so as to produce a convergent, collimated, or divergent beam 5 can be.
- Divergence changing device leaves can thus be adjusted by the adjustment of a deflection angle of the beam deflection in a setting range.
- the components of the divergence changing device 1 e.g.
- Radiation source 10, optical system 15, beam deflector 30, jet folder 34) may be arranged so that a beam 5 generated by the radiation source 10 may optionally immediately ("directly” herein mean no other optical component is located between two components, except for a medium such as air or another gas), to which beam deflection device 30 may strike.
- the beam deflecting device 30 is located in the first focal point 16 of the optical system 15 or (e.g., near) adjacent to the first focal point 16 and is arranged to deflect the beam 5 onto the first system region 17 of the optical system 15.
- the beam 5 can by means of the beam deflecting device 30 in a different
- System area 17 is imaged with a lower divergence compared to before the figure so that the beam 5 from the first system area 17 of the optical system 15th
- the beam 5 is imaged as a converging beam 1 5, the beam can form a (eg virtual) focus point 5 a / b, which depends on the angle of incidence of the beam 5 on the first system area 17 of the optical system 15 on a (possibly. virtual) curved focus area or (possibly virtual) tilted (eg virtual) focus plane 15a / b may be.
- Focus plane 15a / b may e.g. be tilted with respect to an optical axis of the optical system 15, i. the optical axis may be the tilted focal plane in a direction that is not the
- the divergence changing device 1 may be provided with a working focus point (e.g., on a
- illustrated beam 5 can by means of
- Beam deflector 34 are deflected back to the optical system 15 (on the second system area 18 thereof) and are represented by the second system area 18 of the optical system 15 function-inverse-telecentric, so that the main beam 6 of the imaged beam 5 again the beam deflector 30 meets at the first focal point 16 (or a point near the focal point 16).
- Beam deflection device 30 emergent beam (which comes from the second system area 18) substantially independently of an angle of incidence or a position of incidence, in which or on which the beam 5 strikes the first system area 17 of the optical system 15, kept constant ,
- Divergence changing device 1 can therefore, with or without an additional focusing device, have an adjustable focus in its position along the beam propagation direction of beam 5 in a working plane, e.g. except for
- Divergence changing device 1, be realized, wherein the position and direction of the beam deflecting device 30 beam (after a two-time imaging by means of the optical system 15) may be constant and independent of the position of the focus.
- first and second system regions 17 and 18 that is, for example, two symmetrical or similar (eg scaled) lens halves or identically oriented paraboloid segments, or the system regions 17 and 18 monolithic -integral axisymmetric paraboloids or monolithic-integral axisymmetric lens systems.
- the divergence changing device 1 may be arranged and configured such that a focal point 5a of the beam between the optical system 15 and the first beam folding mirror 35, between the first beam folding mirror 35 and the second beam folding mirror 40 (eg in the beam path in front or behind a beam-fold intermediate mirror (see below)), and / or between the second beam-folding mirror 40 and the optical system 15, and / or the divergence changing device 1 may be formed so that a focal point is only outside the divergence change device 1 occurs and / or no actual and / or virtual focus point 5a / b occurs. All components of the divergence changing device 1 may be arranged so as to be located away from a focal point 5a of the radiation beam 5, whereby the maximum
- High-power radiation sources 10 as e.g. may be necessary for material processing.
- the divergence changing device 1 may include additional optical components, such as optical components. have one or more cylindrical lenses in the beam path, through which an actual formation of a "point-shaped" focus point 5 a can be prevented, so a high power density
- a first optical element with a cylindrical
- Figure characteristic in the beam path after the first beam folding mirror 35 may be arranged and another optical
- Imaging property in the beam path in front of the second beam folding mirror 40 (or, for example, more generally in front of the last in the beam path beam folding mirror before a second
- the focal point may thus be a virtual focus line 5b and / or may be an (actual) focus line 5a.
- the radiation source 10 the optical system 15, the
- the beam deflecting device 30 and the jet folding device 34 can optionally be arranged such that there are no other optical components between them, ie they can be arranged in be arranged directly successively a beam path. It can be an optical component, eg with positive
- Refractive power e.g., a positive lens
- Refractive power in the optical path between the radiation source 10 and the beam deflecting device 30 or in the optical path after a second imaging by the optical system 15, e.g. after a (second) distraction through the
- Beam deflector 30 or at another location
- Refractive power e.g., a diffusing lens
- Refractive power in the optical path between the radiation source 10 and the beam deflecting device 30 or in the optical path after a second imaging by the optical system 15, e.g. after a (second) distraction through the
- Beam deflector 30 or at another location
- the beam deflecting device 30, the optical system 15 and the beam folding device 34 may be arranged and arranged such that the main beam 6 of a beam 5, which is incident on the beam deflecting device 30 for the first time from the radiation source 10, along a first half-line (eg straight line) meets this.
- An end point of the first half-line may be in or near the first focal point 16, and the beam 5 may be traveling from the radiation source 10 along the first half-line to the end point of the first half-line on the
- the second beam folding mirror 40 can be arranged so that it deflects the beam 5 so that it again strikes the optical system 15, ie the second system area 18 of the optical system 15, so that the main beam 6 of this beam 5 is deflected back to the first focus 16 by the second system area 18 of the optical system 15 to meet the beam deflector 30 there (or close to) again, and so that the minor beams (or a part of the minor beams) of this beam 5 again on the Strahlablenkvortechnisch 30 meeting.
- the main beam 6 of this beam 5 may then be deflected away from the beam deflector 30 along a second half-line (eg, second straight line) whose end point may be at or near the first focus 16, the second half-line being substantially constant and independent Has the position of the angle of incidence or the
- Half-line and the second half-line in / close to the first focal point 16 are not identical to the first half-line, but may be collinear with it (for example, in a divergence changing device 1 shown in FIG. 5, described in more detail below)
- Embodiment is based). As a result, the beam 5, which leaves the beam deflecting device 30 coming from the optical system 15, spatially separated from that of the
- Radiation source 10 coming beam 5 and the
- FIG. 1 schematically shows an embodiment of the invention in which the optical system 15 as a refraction system 25, the beam deflecting device 30 as a rotatable mirror 30 with a first mirror surface 30a, and the jet folding device 34 as a first beam folding mirror 35 and a second Strahlfalt- Mirror 40 are formed.
- the refraction system 25 here has a first system area 17 and a second system area 18, which are monolithically formed integrally.
- FIG. 1 a shows a top view of this divergence changing device 1
- FIG. 1 b shows a side view of the substantially identical divergence changing device 1.
- the refraction system 25 may, for example, a lens (eg.
- the Lensesystem which has a first focal point 16.
- the first focal point 16 may have a finite distance to the
- Refraction system 25 have.
- the refraction system 25 is provided with the rotatable mirror 30 as a single-sided telecentric arrangement 31.
- the refraction system 25 is here
- Diffraction system 25 converging (as shown in Figure 1 also shown), a focal point of the
- Beam 5 result. It can be seen from FIGS. 1 a and 1 b that the beam 5 passes through the first system region 17 of the refraction system 25 to a virtual one
- Focus point 5b is mapped, but due to the arrangement and formation of the first beam folding mirror 35, the converging beam 5 is deflected so that an actual
- Focus point 5a occurs, which has a different position than the virtual focal point 5b.
- the refraction system 25 (or the first system area 17 thereof) is arranged such that all the virtual focus points 5b of the beam 5 lie on a curved virtual focus area 15b and the position of a virtual focus point 5b on the virtual focus area 15b depends on the latter
- Refraction system 25 hits. Accordingly, the actual focus points 5a lie on a corresponding curved Focus surface 15a (see Figure lb), however, due to the beam-Faltspiegeis 35 has a different position and orientation than the virtual focus surface 15b.
- the rotatable mirror 30 is so
- Radiation source 10 on the rotatable mirror 30 i.e., the first mirror surface 30 a thereof is incident, by means of the rotatable
- Refraction system 25 is supplied in the first system area 17, in such a way that the angle of incidence of the beam 5 to the first system area 17 of the refraction system 25 is dependent on the angle of rotation of the rotatable mirror 30 (or the first mirror surface 30 a).
- the first one.
- Beam folding mirror 35 and the second beam folding mirror 40 arranged so that the beam 5 imaged by the first system portion 17 of the refraction system 25 is deflected back to the refractive system 25, on the second system portion 18 thereof.
- the beam 5 is deflected so that it is on the same side on which it
- Refraction system 25 has left in the first system area 17, back to the second system area 18 of the
- Refraction system 25 hits.
- the main beam 6 of the beam 5, which strikes the second system area 18, is deflected again to the first focal point 16 and meets there (or near) again on the first mirror surface 30 a of the rotatable
- FIG. 2 shows an embodiment of the invention in which the optical system 15 of the telecentric arrangement 31 is designed as a reflection system 20 with a parabolic mirror 20, and, similar to that shown in Figure 1, a rotatable mirror 30 having a first mirror surface 30a as
- the parabolic mirror 20 has a first focal point 16 and a first system area 17 and a second system area 18, wherein the first focal point 16 is a finite
- the parabolic mirror 20 has the property that a beam passing through (or through a point close to) the first focal point 16 on the
- Parabolic mirror 20 is incident in a direction which is substantially independent of the angle of incidence (and the incident position) of the beam on the parabolic mirror 20, so that such rays substantially parallel to each other and in
- the parabolic mirror 20 here has a shape or reflection surface, which is essentially described by a Paraboloidmaschineung. With reference to Figures 2 and 3, the parabolic mirror 20 may have a paraboloidal shape (or reflecting surface), e.g. he may have a Rotationsparaboloid surface. It is an imaging property of the parabolic mirror 20 that rays passing through the first focus 16 onto the parabolic mirror 20
- the geometrical dimensions of the components of the divergence changing device 1 e.g., the parabolic mirror 20, i.e., for example, FIG
- Rotation angles spanned by a (rotational) parabolic mirror 20 according to the invention may be chosen to correspond substantially to the minimum required dimensions according to the desired properties of the divergence changing device 1.
- Divergence changing device 1 shown in Figs. 2 and 3 comprises a beam deflecting device 30 formed as a rotatable mirror 30 having a first mirror surface 30a, and a jet folding device 34 serving as a first 35 and a second 40 beam folding mirrors is trained.
- a beam 5 from the radiation source 10 strikes the first mirror surface 30a of the rotatable mirror 30 and is deflected by it onto the first system region 17 of the parabolic mirror 20, the rotatable mirror 30 (or the first mirror surface 30a thereof) at the first focus 16 or near (eg adjacent) at the first
- Focus 16 may be arranged. Depending on the
- Parabolic mirror 20 hits (main beam), is reflected by the first system area 17 of the parabolic mirror 20 in a direction that is constant and independent of the angle of incidence or the point of incidence of the beam, and a beam that does not (eg directly) through the first focal point 16 is running, is deflected at an angle relative to the main beam 6.
- Beam 5 from the radiation source 10 is thus reflected by the first system region 17 of the parabolic mirror 20 so that it leaves the parabolic mirror 20 with a divergence, which is less than the divergence here
- Beam 5 has, before it hits the first system area 17 of the parabolic mirror 20, wherein the divergence in other embodiments, however, may be greater than the divergence before imaging.
- the divergence in other embodiments, however, may be greater than the divergence before imaging.
- a focal point 5a may be present at the point at which rays of the beam 5, which reflects at an angle to the main beam 6 of the beam 5 were, or there may be a virtual focal point 5b present at a point at which the rays would intersect without further influencing the beam 5. Due to the different curvatures of the
- Parabolic mirror 20 e.g. along its reflection surface
- Parabolic mirror 20 In the case of a beam 5 imaged by the parabolic mirror 20 as a converging beam 5, a (e.g.
- a virtual focus area 15b is qualitatively and schematically indicated by a dashed line in FIG.
- Focusing surface may also be designed differently, e.g.
- the focus surface 15b may have a curvature other than that shown.
- a beam path in the divergence changing device 1 can be selected which includes the selection of a (eg virtual) focus point 5a / b in the (eg virtual) focus surface 15a / b can correspond.
- first beam folding mirror 35 which is arranged and arranged such that the beam 5 reflected on the parabolic mirror 20 is incident on the first beam folding mirror 35 and deflected to be at an angle to the incident beam 5 ,
- the first beam folding mirror 35 may be arranged so that a main beam of the beam 5, which by means of the parabolic mirror 20 to the second focus of the
- Parabolic mirror 20 is deflected and incident on the first Strahlfalt- mirror 35 is deflected at an angle of substantially about 90 ° to the incident main beam 6 and, for example, all secondary beams of the beam 5 are deflected according to their respective angle of incidence.
- a second beam folding mirror 40 is provided, which is set up and arranged in such a way that the light reflected by the first beam folding mirror 35
- the deflected beam 5 is incident on the second beam folding mirror 40 and deflected by the second beam-folding mirror 40.
- the second beam-folding mirror 40 may be arranged and arranged such that the main beam 6 emerging from the second beam-folding mirror 40 is one of
- Beam 5 is parallel to the main beam 6 of the
- Beam 5 which hits the first beam folding mirror 35, and so that the beam emerging from the second beam folding mirror 40 again strikes the parabolic mirror 20, e.g. on the second system area 18 of them.
- Parabolic mirror 20 shown namely by the second system area 18 thereof.
- the beam 5 is imaged such that the main beam 6 of the beam 5 incident from the second beam folding mirror 40 on the parabolic mirror 20 is imaged by the second system portion 18 of the parabolic mirror 20 onto the first focus 16 of the parabolic mirror 20.
- the sub-beams of the beam 5 which are not parallel to the main beam 6 are imaged at an angle to the main beam imaged on the first focus 16, whereby a divergence of the beam 5 may be changed.
- Divergence changing device 1 can leave (see for example Figure 3), wherein the main beam 6 of the beam 5 is deflected from the first mirror surface 30 a of the rotatable mirror 30, such that it lies on an (imaginary) straight line, which is independent of the angle of rotation of the rotatable rotary mirror 30.
- the beam 5 is not transmissively passed through a material. Furthermore, in the divergence changing apparatus 1, non-linear optical influences can be avoided, and the field curvature (e.g., the characteristics of the (virtual) focus area 15a / b) can be substantially exclusively determined by the geometric ones
- Parabolic mirror 20 will be influenced, creating a precise
- the optical system 15 may include a
- first 21 and / or the second 22 reflection surface may be formed by different
- Paraboloid functions be defined, i. they can be defined by functions with different paraboloid parameters and / or different exponents.
- the exponent may be substantially two or, for example, may have a value in the range of about 1.8 to about 2.2.
- the first reflection surface 21 may have a first reflection surface focal point and the second
- Reflection surface 22 may have a second reflection surface focal point. The first 21 and the second 22
- Reflection surface can be arranged so that their
- Vertices lie in one point or are arranged at different points.
- the first 21 and the second 22 reflecting surfaces may be so be arranged so that their respective focal points, ie the first reflection surface focal point and the second reflection surface focal point, coincide and together form the first focal point 16 of the optical system 15.
- Components of the divergence changing device 1 are arranged according to Figure 4 so that the beam 5 from the first
- Reflecting surface 21 i.e., the first system region 17
- that the beam 5 after being deflected by the first 35 and second 40 beam folding mirrors, hits the second
- Reflection surface 22 (i.e., the second system region 18). As shown in Figure 4, e.g. by a different choice of parameters and / or exponents of the two functions defining the first reflecting surface 21 and the second reflecting surface 22, in addition to one
- Parabola parameter is e.g. a constant that with a
- an expansion of the diameter of the beam 5, which emanates from the radiation source 10 can be achieved.
- the parabola parameter of the function defining the first reflection surface 21 is set to a value smaller than that of the parabola parameter of the function defining the second reflection surface 22, the diameter of the beam 5 emanating from the radiation source 10 may be reduced , be achieved.
- the first beam folding mirror 35 may have a different size than the second beam folding mirror 40, for example, the second beam folding mirror 40 may have a larger mirror surface as the first beam folding mirror 35 or vice versa.
- the same divergent altering device 1, which is arranged as described above, can allow both an expansion and a reduction in the diameter of a beam 5 by passing the beam 5 through the beam
- Beam deflector 30 either first on the first
- Reflection surface 21 is directed or first directed to the second reflection surface 22 (wherein the further beam path of the beam 5 is then reverse to that described above). According to the invention can therefore in addition to the
- Beam reduction functionality (based on a
- Ratio of the change in cross section of the beam 5 may be provided.
- optical system 15 which is designed as a reflective system with parabolic mirror 20, with a first 17 and a second system area 18 with
- optical system 15 which as a transmittive
- Refractive system 25 is formed, a first and a second system area 17, 18 have, which have different optical properties. For example, that can
- Refraction system 25 a first lens system and a second lens
- Lens system (e.g., each having one or more lenses) that may form the first system area 17 and the second system area 18, respectively, and may have a first-lens-system focus and a second-lens system focal point, respectively.
- the first lens system may have other optical
- Properties have as the second lens system or the first and the second lens system can have the same optical
- the first lens system focus may coincide with the second lens system focus, so they together form the first focal point 16 of the optical system 15.
- FIG. 5 shows a further exemplary embodiment of a
- Beam deflection device 30 is formed as a rotatable double mirror 30.
- the rotatable double mirror 30 has a first, for example substantially flat, mirror surface 30a and a second, for example substantially flat, mirror surface 30b, wherein a surface normal of the first mirror surface 30a has a component that is substantially opposite to a component of FIG Surface normal of the second mirror surface 30b.
- the first mirror surface 30a may be disposed parallel to the second mirror surface 30b.
- the optical system is designed as a transmissive refractive system 25, wherein the first system area 17 and the second system area 18 are arranged spatially apart, and wherein a focal point of the first system area 17 and a focal point of the second system area 18 coincide and they together form the first focal point 16 of the optical system 15.
- the first focal point 16 of the optical system 15 is formed between the first system area 17 and the second system area 18, and the rotatable double mirror 30 is arranged so that both the first mirror area 30a and the second mirror area 30b are arranged in or near the first focal point 16 and between the first system area 17 and the second system area 18.
- Beam folding device 34 has a first beam folding mirror 35, a second beam folding mirror 40 and a beam folding intermediate mirror 41 (but may also have further beam folding intermediate mirrors 41). According to FIG. 5, the first beam folding mirror 35, a second beam folding mirror 40 and a beam folding intermediate mirror 41 (but may also have further beam folding intermediate mirrors 41). According to FIG. 5, the first beam folding mirror 35, a second beam folding mirror 40 and a beam folding intermediate mirror 41 (but may also have further beam folding intermediate mirrors 41). According to FIG. 5, the
- Double mirror 30 hits and the secondary rays on the first Mirror surface 30a meet.
- the radiation beam 5 can be fed to the first system area 17 at a different angle (and at a different position) by means of the rotatable double mirror 30 (or the first mirror surface 30 a thereof), according to a rotation angle of the double mirror 30
- Beam 5 from the first system area 17 is telecentrically imaged as described above with a divergence change.
- Beam 5 impinges on the first beam folding mirror 35 and is deflected by the same onto the beam folding intermediate mirror 41.
- the beam folding intermediate mirror 41 deflects the beam 5 onto the second beam folding mirror 40.
- the beam folding intermediate mirror 41 may have the same (optical) properties as the above-described first 35 or second 40 beam folding mirror.
- the beam 5 is deflected onto the second system area 18 of the optical system 15 and imaged by the second system area 18 as described above, such that the main beam 6 of the
- Beam beam 5 in or near the first focal point 16 on the second mirror surface 30b of the double-rotating mirror 30 hits, and the secondary rays (for example, partially) also hit the second mirror surface 30b. From the second
- the beam 5 is deflected so that the main beam 6 of the beam 5 has a substantially constant position, which is independent of the angle of rotation of the rotatable double mirror 30.
- the radiation beams 5 may be collinear with one another (for example, if the first and the second mirror surfaces 30a, 30b)
- FIG. 5 shows a focal point 5a, which is formed between the first beam folding mirror 35 and the beam folding intermediate mirror 41. As described above, a focal point 5a may also occur elsewhere, or it may not be a point-shaped focal point 5a within the
- Divergence changing device 1 occur, e.g. when the first and / or second beam folding mirrors 35, 40 and / or the
- Image feature are provided or in addition lenses are provided with cylindrical power.
- the components of the divergence changing device 1 are shown as lying in a plane in FIG.
- Components should be arranged three-dimensionally offset from one another.
- Intermediate mirror 41 may be arranged above or below the plane of Figure 5, so that, for example, that of the second
- Divergence changing device 1 can be passed, when the mirror of the jet folding device 34 are aligned correspondingly spatially on each other and on the optical system 15 (not shown). According to the invention, divergence changing devices 1 with two system areas 17, 18 with different optical properties are not applicable to versions with a rotatable mirror 30 or a rotatable double mirror 30 as the one
- Beam deflection device 30 for a two-time image of a Beam 5 are used. This is the
- Beam deflecting device 30 may be the only mechanically stressed component.
- Only one beam deflection device 30 is necessary for changing the divergence (for example for focusing) of a radiation beam 5, as a result of which drift effects, thermal effects, deviations and
- Tolerances can be minimized and a divergence with high precision and high directional stability of the beam propagation and can be set at high speed.
- only one optical system 15 is necessary, whereby manufacturing costs of the divergence changing device 1 can be reduced.
- a rotatable mirror 30 or dual mirror 30 as the beam deflector 34, a very high speed can be achieved in adjusting the divergence since only a small mass of the rotatable mirror 30 must be moved and
- Principal rays according to the invention always run in over a point near the center of the mirror, whereby its area size and moment of inertia can be minimized.
- optical system 15 may be compensated by the two-time imaging. Another advantage of
- Divergence changing device 1 is that the divergence changing device can be made gas-tight due to the structure having a beam deflecting device 30 and an optical system 15 (eg, the divergence changing device may have a gas-tight casing therefor). Thereby, the divergence changing device 1 can be evacuated or with an optically substantially inert gas be operated filled, so that a disturbing interaction of a surrounding medium such as air and the beam path (eg focus point 5a) can be avoided in the Divergenz selectedungsvorraum 1. Likewise, a disturbing interaction of the divergence changing device can be made gas-tight due to the structure having a beam deflecting device 30 and an optical system 15 (eg, the divergence changing device may have a gas-tight casing therefor). Thereby, the divergence changing device 1 can be evacuated or with an optically substantially inert gas be operated filled, so that a disturbing interaction of a surrounding medium such as air and the beam path (eg focus point 5a) can be avoided in the Divergenz
- Divergence changing device 1 occurs but e.g. only a virtual focus point 5b or a focus line.
- the structure of the invention allows
- Reflection system 20) of the divergence changing device 1 can be easily achieved with a cooling device.
- the divergence changing device 1 can be used with a 2D scanner system, as for example for
- a 2D scanner system may e.g. with one or two
- the propagation direction of the beam 5 is additionally adjustable. Thereby, e.g. also possible deviations of the propagation direction of the beam 5 by means of the 2D scanner system are compensated (for example, stored in a control device
- Divergent change device 1 may be arranged in the beam path in front of the 2D scanner system, so that the beam in dependence of the beam deflecting device 30 with
- the beam 5 can be guided over a workpiece surface and different distances between the radiation source and points on the workpiece surface can by
- Divergence changing device 1 can be compensated.
- a control device can be provided which can be connected both to the 2D scanner system and to the divergent change device 1 (or to the beam deflection device 30 thereof) in order to control them.
- the controller may control the first beam deflector 30 (or the divergence change realized thereby) according to a target divergence change value.
- the target divergence change value corresponds to a desired one
- Divergence and / or a desired divergence change may be provided to the controller, e.g. by a user input, or by another controller, computer, process control computer or the like.
- the target divergence change value may also correspond to the distance of a working focus point from the radiation source 10, since this distance may depend on the divergence of the radiation beam 5.
- the target divergence change value can be calculated by the controller using an algorithm and in the
- the controller may be configured to control the 2D scanner system according to a target beam position and direction value.
- the target beam position and direction value can be one
- the target beam position and direction value may be provided to the controller, e.g. by a user input, or by another controller, computer, process control computer or the like. This means that the control device can the
- the target divergence value may be selected / calculated / stored such that a (working) focus point is provided outside of the divergence changing device 1 (e.g., on the surface of a workpiece) such that the focal point is e.g.
- Workpiece surface meets, with a predetermined cross-section hits the workpiece surface.
- a geometry of a workpiece in the form of point coordinates (eg, x, y, z) and lines extending between point coordinates may be stored in the controller, and at the same time a processing plan may be stored in the controller containing information which coordinates a beam 5 with which divergence (or with which bundle diameter) should strike the workpiece.
- the processing plan may also contain other and / or other information, such as how long a beam 5 is to act on a point, for example
- the control device can then calculate from the geometry of the workpiece and the machining plan a target divergence change value (or a plurality of) and at the same time a target beam position and direction value (s)
- the controller can also work with other components
- the radiation source 10 or a diaphragm or a "Pulspicker * for short-term Interruption of the beam path between the radiation source 10 and a workpiece, or with other beam deflecting devices.
- the controller may process 3D coordinates and may not have these coordinates, e.g. above
- the constant holding of the direction and attitude of the main beam 6 of the beam 5 failing from the divergence changing device 1 is obtained by taking a difference in the imaging angles in the beam path of the divergence changing device 1, the sum of the An imaging angle in the optical path observing the sense of rotation (ie, the sign) between a first image on the beam deflecting device 30 and a second image on the beam deflecting device 30 after imaging by the optical system 15 remains constant regardless of a setting / position of the beam deflecting device 30. That is, an e.g. positive change of the deflection angle of
- Beam deflecting device 30 is in the beam path of
- Beam 5 is achieved despite a divergence change.
- the axis of rotation 32 (see figures la, 2, 3, 4, 5, 7 and 8) of the beam deflecting device 30 is an axis about which
- this is, for example, the rotation axis 32 of the rotating mirror 30.
- the divergence change of the beam 5 as described above is achieved by
- the axis of rotation 32 of the beam deflection device 30 according to the invention is substantially parallel to the plane which is spanned by the main beam 6 of the beam 5 in the section after the (first) imaging by means of
- This folding plane is characterized by a change of the deflection angle, by means of the
- Beam deflector 30 is generated, e.g. in the embodiments shown in Figures 1 to 4 and 7, is displaced vertically parallel (i.e., displaced along the surface normal of the folding plane) and thus comes in one with a
- Deflection angle change associated divergence change (change from a first divergence to a different, second divergence) of the beam 5 to a three-dimensional beam guide. That is, the folding plane of the beam 5 having the first divergence after leaving the divergence changing device 1 is perpendicularly shifted in parallel to the folding plane of the beam 5 traveling out of the beam
- the folding plane is defined by a change in the deflection angle generated by the beam deflecting device 30, e.g. in the embodiments shown in Figures 1 to 4 and 7, moved vertically parallel.
- Beam guidance leads to a change in the above-mentioned distance ratio of the focal point 5a / b from the first or
- the location of all possible (possibly virtual) focus points 5a / b obtained by this substantially perpendicular parallel shift of the folding plane with simultaneous displacement of the focal point 5a / b within the folding planes may be as described above e.g. the (possibly virtual) focus area 15a / b
- FIG. 1a shows a plan view of the folding plane. It can be seen that the main beam 6 in the section after leaving the first system area 17 and before
- FIG. 3 also shows the axis of rotation 32 of FIG.
- Beam deflection device 30 (here the axis of rotation 32 of
- Rotating mirror 30 which is (substantially) parallel to the folding plane or to the main beam 6 of the beam in the portion of the beam path between the first beam folding mirror 35 and the second beam folding mirror 40 (this section in FIG Fold level lies).
- the axis of rotation 32 of the beam deflecting device 30 (here that of the rotary mirror 30) is shown. perpendicular to the folding plane (eg at least between the
- the beam 5 depicted by the beam deflecting device 30 (in this case by the second mirror surface 30b) is held stationary with respect to the main beam 6 by the use of two opposite, opposing ones
- Divergence change arrangement 2 is implemented, traversed, can be changed stepwise, wherein the total divergence change in the common beam path can be generated, but continuously (eg stepless) can be adjustable.
- upstream divergence change device 1 (left in FIG. 6) generates the divergence change " ⁇ DIV1" and a second divergence change device downstream of the first divergence change device
- Beam 5 (represented in FIG. 6 by the
- Main beam 6 thereof thus first experiences the divergence change " ⁇ DIVl" (which may be arbitrary), and then experiences the
- Divergence changing device 1 is arranged, be implemented by the emerging from this other divergence changing device 1 beam 5.
- all divergence changing devices 1 may be of the same type (eg with transmissive or reflective optical system 15) or of different types (ie, all embodiments described above and also those with retroreflector device 60 may be used). operated together and a common beam path to Form divergence change of a beam 5).
- Divergence change arrangement 2 are therefore shown schematically for clarity in the figure 6 by a dashed line.
- Divergence change assemblies 2 may have the same geometric dimensions or may have different dimensions. If e.g. the divergence of a radiation beam 5 provided by a radiation source 10 should be mainly reduced, which may be due to a divergence change device 1 in the common beam path
- Divergence changing device 1 for example, smaller (that is, of smaller dimensions) may be provided if it is expected under normal operating conditions that due to the pre-arranged in the beam path
- Beam path also be provided with increasing size, if the divergence of a beam 5 with a
- optical elements may be arranged between the divergence changing devices 1 of a divergence changing device 1, e.g. around the beam cross section of the
- a conventional divergence changing device e.g., having displaceable lenses
- Divergence change arrangement 2 form, possible. This can eg be useful to a highly dynamic (eg fast) divergence change with a lower Divergenzhub (eg
- minor / minor divergence change with a relatively slower divergence change with a larger divergence swing (e.g., greater / greater divergence change).
- FIG. 7 shows three different views a.), B.) And c.) Of a divergence changing device 1, wherein the three
- Coordinate system KS are marked.
- the beam 5 is represented by the main beam 6 thereof and the propagation direction of the beam 5 or that of the main beam 6 thereof is symbolized by arrows.
- the above-described three-dimensional beam guidance within the divergence change device 1 can also be seen again from FIG. 7 on the basis of the views a.), B.) And c.).
- the components of the divergence changing device 1 correspond to those described above, e.g. Components described with reference to Figures 2 and 3, and the Divergenz selectedungsvoruze 1 further comprises an optional folding assembly 60 and
- Retroreflector device 60 (hereinafter
- the retroreflector device 60 is configured and
- Focusing 16 again meets the first beam deflecting device 30, and also the secondary beams (or a part thereof) of the beam 5 again hit the beam deflecting device 30.
- This back picture by means of the Retroreflector device 60 causes the returned beam 5, the divergence changing device 1 as a coming of the radiation source 10 beam 5 again / again, whereby a gain of the
- the efficient use of the retroreflector device 60 is possible because the beam 5 emerging from the beam deflector 30 is stationary and has a direction and location that is independent of a divergence change. Therefore, it is efficiently possible to reflect the deflecting beam back so as to rejoin the beam deflecting device 30 at or near the first focal point 16 and again / again to traverse the divergence changing device 1 with enhancement of a divergence change.
- FIG. 8 shows a schematic partial view of a
- Retroreflector device 60 The beam path of the
- the beam deflecting device 30 shown in Fig. 8 is e.g. the
- FIG. 8 shows (like FIG. 7a) a 2D projection of the actually three-dimensional one
- Retroreflector device 60 run. In the illustration of FIG. 8, the beam 5 impinging on the retroreflector device 60 from the beam deflecting device 30 and the beam 5 impinging on the beam deflecting device 30 by the retroreflector device 60 (again / again) are of the beam 5 coming from the beam source 10 and that of FIG
- Beam 5 can be implemented.
- Retroreflector device 60 may be formed by means of two mirrors 60a, 60b, wherein the first mirror 60a may be arranged and arranged such that the beam deflected by the beam deflecting device 30 for the second time encounters the first mirror 60a and images it onto the second mirror 60b becomes.
- the second mirror 60b may be arranged and arranged such that the beam 5 incident from the first mirror 60a on the second mirror 60b is reflected back to the beam deflector 30 by the second mirror 60b such that the main beam 6 thereof is at or near the first focal point 16 again meet the beam deflecting device 30 and so that at least a portion of the secondary beams again hits the beam deflecting device 30.
- the retroreflector device 60 may be arranged and arranged to image the beam 5 coming back therefrom onto the beam deflector 30 so as to be at an angle to the beam deflector 30
- Beam deflector 30 which differs from the angle with which the beam 5 striking the retroreflector device 60 from the beam deflecting device 30 strikes is imaged by means of the beam deflecting device 30 (stationary).
- the retroreflector device 60 (eg, the first mirror 60a and the second mirror 60b thereof) may thus be arranged so that the beam 5 coming from the beam deflector 30 and incident on the retroreflector device 60 is spatially separated from each other by the beam 5 which is re-emerging from the retroreflector device 60 are as shown in Figures 7 and 8 (spatial separation at least with respect to the main beam 6 and apart from the first
- Focal point 16 and / or an area near it at which the beams 5 may intersect The different angles (e.g.
- Beam deflection device 30 on the optical system 15 striking beams 5, at least with respect to the main beam 6 is spatially separated from the beam 5, the of the
- polarization-optical beam separation can be dispensed with, but according to the invention, a collinear
- Retroreflector device 60 which consists of a single mirror
- a polarization-optical separation of incoming and outgoing beam 5 can be used, if it should be necessary for a particular application.
- Retroreflector devices also a three, four, five or n-times pass through the same
- the divergence change achieved by means of a divergence changing device 1 can be enhanced compared to only passing through the divergence changing device 1 at the same setting of the beam deflecting device 30.
- multiple passes require a smaller deflection angle of the beam deflecting device 30 , and to adjust the divergence change is a lesser
- FIG. 7 shows a divergence changing apparatus 1 having an optical system 15 formed as a reflection system 20, as shown schematically in FIG. 8, the divergence changing apparatuses 1 incorporating a transmissive refraction system 25 and / or a
- Beam deflecting device 30 having two mirror surfaces 30a, 30b (see Fig. La / b, Fig. 5), with the
- Retroreflector device 60 be provided, since it is a feature of each Divergenz Sungsvoroplasty invention 1 and Divergenz Sungsan extract 2 that one of them
- outgoing beam 5 with respect to the main beam 6 thereof is substantially stationary, i. essentially one
- Two or more divergence changing devices 1 having a retroreflector device 60 may be as above
- Retroreflector device 60 so along with one or more divergence change device (s) 1 that does not have a retroreflector device 60,
- These plurality of divergence changing devices 1 can also be provided in the beam path together with a 2D scanner system, wherein the divergence changing devices 1 and the
- Divergenz selectedungsan Aunt 2 can be provided in the beam path in front of the 2D scanner system. It may optionally also be as described above and e.g. in Figs. 2, 4 and 8, a control device 50 may be provided which, with each of the divergence changing devices 1 of Figs.
- Divergence change arrangement 2 is connected to control these (eg, the divergence change produced by them by means of a control of the respective beam deflection devices 30 thereof), and optionally, the control device 50 may also be connected to the 2D scanner system to this as described above be controlled so that a change in direction of the beam 5 can be controlled in two spatial dimensions. Even with a multiple pass through a
- Divergence changing device 1 may include additional optical components in the beam path between the passes (i.e., in the beam path between beam deflector 30 and 30, for example)
- Retroreflector device 60 may be arranged. This can e.g. for manipulating / changing the beam diameter, the
- Beam polarization e.g., polarization rotation
- Beam polarization rotation e.g., polarization rotation
- Beam profile (e.g., rotation of beam profile) of the beam
- Beam 5 serve. A reduction of the
- Beam diameter can be a reduction of the necessary
- a rotation of polarization and / or beam profile can reduce unwanted polarization effects and / or at least one
- Divergence changing device 1 in the beam path have additional optical devices that are arranged and arranged to at least partially compensate for aberrations (such as coma and / or coma-like aberrations), which may arise in multiple passes through the divergence changing device 1. That is, the inventive divergence changing device 1 may include optical devices that prevent errors due to undesired, non-ideal optical imaging
- Retroreflector device 60 does not reinforce or Be "added”, but at least partially compensated.
- Mirroring of the beam 5 with respect to the main beam 6 is generated. It can thus be achieved that the aberrations that occur in each case during the passes before and after the mirroring or rotation of the beam 5, at least in subregions of the beam 5 act in the opposite direction.
- a beam-rotating device (device which transmits a beam 5 around the main beam 6 or the
- Beam axis rotates or rotates as a rotation axis) in the beam path after the first pass of the beam 5 through the
- Divergence changing device 1 may be arranged.
- the aberrations e.g., coma and / or coma-like aberrations
- a beam rotation device for rotating a beam profile of the beam 5 by a fixed, preset amount or a dynamically selectable / adjustable amount can be realized according to the invention, for example, by a three-dimensional beam over several reflections.
- a beam-rotating device for example, "dove * prisms and / or so-called" K-mirror w -arrangements are used as a beam-rotating device, in which case the beam 5 within the
- Beam rotation device e.g. reflected three or more times.
- the beam 5 rotates by twice the rotation angle (about the beam axis or the
- the described beam rotation devices may optionally be further provided with a retroreflector (e.g., retroreflector device 60) from two mirrors (e.g., mirrors 60a / 60b) according to the invention, such that e.g.
- a beam rotation device with at least three instead of only two mirrors permits a beam rotation (for example 90 degrees) of the beam 5 together with the back reflection of the beam 5 so that it is again focused on the beam
- Beam deflector 5 hits, but it is the
- Beam axis or the main beam 6 rotates / rotated around
- This at least partial aberration compensation as described above can also be a reduction of
- Beam rotation device or in addition to polarization rotating elements in the beam path of
- Divergence changing device 1 may be provided to effect a targeted compensation of unwanted polarization effects in the divergence changing device 1.
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Lenses (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Mechanical Optical Scanning Systems (AREA)
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015527008A JP5951134B2 (ja) | 2012-11-19 | 2013-11-19 | 発散変更装置 |
KR1020147034196A KR101737600B1 (ko) | 2012-11-19 | 2013-11-19 | 발산-변화 장치 |
CN201380047650.5A CN104620157B (zh) | 2012-11-19 | 2013-11-19 | 散度改变装置 |
US14/403,128 US9217853B2 (en) | 2012-11-19 | 2013-11-19 | Divergence-changing device |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102012111098.0 | 2012-11-19 | ||
DE102012111098.0A DE102012111098B4 (de) | 2012-11-19 | 2012-11-19 | Divergenzänderungsvorrichtung |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2014076290A1 true WO2014076290A1 (de) | 2014-05-22 |
Family
ID=49622823
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2013/074135 WO2014076290A1 (de) | 2012-11-19 | 2013-11-19 | Divergenzänderungsvorrichtung |
Country Status (6)
Country | Link |
---|---|
US (1) | US9217853B2 (de) |
JP (1) | JP5951134B2 (de) |
KR (1) | KR101737600B1 (de) |
CN (1) | CN104620157B (de) |
DE (1) | DE102012111098B4 (de) |
WO (1) | WO2014076290A1 (de) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102017202269A1 (de) | 2017-02-13 | 2018-08-16 | Sauer Gmbh | Verfahren zur bearbeitung einer werkstückoberfläche mittels eines lasers |
WO2019167587A1 (ja) * | 2018-02-28 | 2019-09-06 | パイオニア株式会社 | 受信装置、照射装置及び反射部材 |
JP6923570B2 (ja) * | 2019-01-23 | 2021-08-18 | 株式会社アマダ | レーザ加工装置及びレーザ加工ヘッド |
DE102022121239A1 (de) | 2022-08-23 | 2024-02-29 | Trumpf Laser- Und Systemtechnik Gmbh | Strahlweitenveränderungsvorrichtung, Fertigungsvorrichtung zum additiven Fertigen mit einer solchen Strahlweitenveränderungsvorrichtung, Verfahren zum additiven Fertigen mittels einer solchen Strahlweitenveränderungsvorrichtung und Verwendung einer solchen Strahlweitenveränderungsvorrichtung zum additiven Fertigen von Bauteilen |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4806728A (en) * | 1988-02-01 | 1989-02-21 | Raytheon Company | Laser process apparatus |
US4846550A (en) * | 1987-01-07 | 1989-07-11 | Allied-Signal Inc. | Optical wedges used in beam expander for divergence control of laser |
EP0649042A2 (de) * | 1993-10-16 | 1995-04-19 | British Aerospace Public Limited Company | Optischer Strahlaufweiter |
DE19960807C1 (de) * | 1999-12-16 | 2001-02-15 | T I L L Photonics Gmbh | Vorrichtung zum Ablenken eines Strahls |
EP1184700A1 (de) * | 2000-08-29 | 2002-03-06 | PerkinElmer International C.V. | Optisches System mit veränderlicher Vergrösserung |
US20050236381A1 (en) * | 2004-04-27 | 2005-10-27 | Disco Corporation | Laser beam processing machine |
CN102141672A (zh) * | 2011-04-18 | 2011-08-03 | 中国工程物理研究院应用电子学研究所 | 一种激光束散角实时调节装置 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2053505A (en) * | 1979-07-10 | 1981-02-04 | Plessey Co Ltd | Scanning Beam Deflection Amplifier |
US4682842A (en) * | 1984-08-31 | 1987-07-28 | Xerox Corporation | Scanning system with two reflections from scanning surface by mirrors with optical power |
JPH05333269A (ja) * | 1992-05-27 | 1993-12-17 | Dainippon Screen Mfg Co Ltd | アフォーカル光学系 |
JPH09265052A (ja) * | 1996-03-27 | 1997-10-07 | Seiko Epson Corp | 光走査装置 |
JP3689490B2 (ja) * | 1996-06-07 | 2005-08-31 | キヤノン株式会社 | ノズル部材の製造方法及びそれを用いた加工装置 |
JP2001042433A (ja) * | 1999-06-08 | 2001-02-16 | Karlheinz Strobl | 高性能光エンジンシステム、その構成要素、並びにその製造方法 |
US6522437B2 (en) * | 2001-02-15 | 2003-02-18 | Harris Corporation | Agile multi-beam free-space optical communication apparatus |
JP4095428B2 (ja) * | 2002-12-16 | 2008-06-04 | キヤノン株式会社 | 光走査光学系、画像投影装置、画像表示システム |
JP2008110384A (ja) * | 2006-10-31 | 2008-05-15 | Sumitomo Electric Ind Ltd | 多孔質樹脂膜とその穿孔方法、その樹脂膜を用いた異方性導電シート、電気検査方法及び回路接続方法 |
DE102007044298B3 (de) * | 2007-09-17 | 2009-02-26 | Coherent Gmbh | Verfahren und Anordnung zum Erzeugen eines Laserstrahls mit einem linienhaften Strahlquerschnitt |
JP5223868B2 (ja) * | 2007-11-28 | 2013-06-26 | 日本電気株式会社 | 光走査装置および画像出力装置 |
JP2010107596A (ja) * | 2008-10-28 | 2010-05-13 | Canon Inc | 反射型投影光学系、露光装置及びデバイス製造方法 |
HU0800781D0 (en) * | 2008-12-31 | 2009-03-02 | Femtonics Kft | Focusing system comprising acousto-optic deflectors for focusing an electromagnetic beam |
-
2012
- 2012-11-19 DE DE102012111098.0A patent/DE102012111098B4/de active Active
-
2013
- 2013-11-19 WO PCT/EP2013/074135 patent/WO2014076290A1/de active Application Filing
- 2013-11-19 JP JP2015527008A patent/JP5951134B2/ja active Active
- 2013-11-19 US US14/403,128 patent/US9217853B2/en active Active
- 2013-11-19 KR KR1020147034196A patent/KR101737600B1/ko active IP Right Grant
- 2013-11-19 CN CN201380047650.5A patent/CN104620157B/zh active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4846550A (en) * | 1987-01-07 | 1989-07-11 | Allied-Signal Inc. | Optical wedges used in beam expander for divergence control of laser |
US4806728A (en) * | 1988-02-01 | 1989-02-21 | Raytheon Company | Laser process apparatus |
EP0649042A2 (de) * | 1993-10-16 | 1995-04-19 | British Aerospace Public Limited Company | Optischer Strahlaufweiter |
DE19960807C1 (de) * | 1999-12-16 | 2001-02-15 | T I L L Photonics Gmbh | Vorrichtung zum Ablenken eines Strahls |
EP1184700A1 (de) * | 2000-08-29 | 2002-03-06 | PerkinElmer International C.V. | Optisches System mit veränderlicher Vergrösserung |
US20050236381A1 (en) * | 2004-04-27 | 2005-10-27 | Disco Corporation | Laser beam processing machine |
CN102141672A (zh) * | 2011-04-18 | 2011-08-03 | 中国工程物理研究院应用电子学研究所 | 一种激光束散角实时调节装置 |
Also Published As
Publication number | Publication date |
---|---|
JP5951134B2 (ja) | 2016-07-13 |
KR101737600B1 (ko) | 2017-05-18 |
US9217853B2 (en) | 2015-12-22 |
DE102012111098A1 (de) | 2014-05-22 |
US20150253555A1 (en) | 2015-09-10 |
JP2015531888A (ja) | 2015-11-05 |
KR20150006056A (ko) | 2015-01-15 |
CN104620157A (zh) | 2015-05-13 |
DE102012111098B4 (de) | 2016-03-03 |
CN104620157B (zh) | 2016-11-23 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP3094444B1 (de) | Bearbeitungsvorrichtung und -verfahren zur laserbearbeitung einer oberfläche | |
EP0525528B1 (de) | Anordnung zur Kohärenzreduktion und Strahlformung eines Laserstrahls | |
DE102012111090B4 (de) | Vorrichtung zum Ändern der Länge eines Strahlenganges, Fokussiervorrichtung und Strahllage-und-Strahldivergenz-Änderungsvorrichtung | |
EP1656234B1 (de) | Scankopf als teil einer laser bohr- und schneideinrichtung | |
EP1531963A1 (de) | Strahlformungseinheit mit zwei axicon-linsen und vorrichtung mit einer solchen strahlformungseinheit zum einbringen von strahlungsenergie in ein werkstück aus einem schwach absorbierenden material | |
EP1276586A1 (de) | Laser-mikro-dissektionsgerät | |
DE102004002221B3 (de) | Vorrichtung zur optischen Strahltransformation einer linearen Anordnung mehrerer Lichtquellen | |
EP2217961A1 (de) | Vorrichtung zur strahlformung | |
EP3045022B1 (de) | Strahlführungseinrichtung und euv-strahlungserzeugungsvorrichtung mit einer überlagerungseinrichtung | |
WO2014076290A1 (de) | Divergenzänderungsvorrichtung | |
DE102007018400A1 (de) | Optisches System für einen Lasermaterialbearbeitungskopf | |
DE19846532C1 (de) | Einrichtung zur Strahlformung eines Laserstrahls und Hochleistungs-Diodenlaser mit einer solchen Einrichtung | |
DE19841040A1 (de) | Vorrichtung zum Markieren einer Oberfläche mittels Laserstrahlen | |
DE112020000301T5 (de) | Systeme und verfahren zur ausrichtung von wellenlängenstrahlkombinierenden resonatoren | |
WO2022033923A1 (de) | Vorrichtung zum erzeugen einer definierten laserlinie auf einer arbeitsebene | |
DE102013212685A1 (de) | Strahlbeeinflussungsoptik und Strahlformungssystem | |
DE102012111091B4 (de) | Divergenzänderungsvorrichtung | |
EP3312656B1 (de) | Vorrichtung zum verlagern eines auf einer optischen achse einfallenden lichtstrahls | |
DE19820154A1 (de) | Vorrichtung und Verfahren zur optischen Strahltransformation | |
EP3042551B1 (de) | Strahlführungseinrichtung und euv-strahlungserzeugungsvorrichtung damit | |
DE10034408A1 (de) | Reflektiver Laser-Kolimator | |
DE19722561C2 (de) | Optische Anordnung zur Abbildung von Objekten oder Strahlquellen und Verwendungen einer solchen optischen Anordnung | |
WO2023186951A1 (de) | Auslenkvorrichtung für einen laserbearbeitungskopf und laserbearbeitungskopf mit derselben | |
DE102015107040A1 (de) | Corner-cube-artiger Reflektor | |
WO2021170579A1 (de) | Optische anordnung mit einem f-theta-objektiv |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
121 | Ep: the epo has been informed by wipo that ep was designated in this application |
Ref document number: 13792910 Country of ref document: EP Kind code of ref document: A1 |
|
WWE | Wipo information: entry into national phase |
Ref document number: 14403128 Country of ref document: US |
|
ENP | Entry into the national phase |
Ref document number: 20147034196 Country of ref document: KR Kind code of ref document: A |
|
ENP | Entry into the national phase |
Ref document number: 2015527008 Country of ref document: JP Kind code of ref document: A |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
122 | Ep: pct application non-entry in european phase |
Ref document number: 13792910 Country of ref document: EP Kind code of ref document: A1 |