WO2014036712A1 - 复合材料、用其制作的高频电路基板及其制作方法 - Google Patents

复合材料、用其制作的高频电路基板及其制作方法 Download PDF

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Publication number
WO2014036712A1
WO2014036712A1 PCT/CN2012/081093 CN2012081093W WO2014036712A1 WO 2014036712 A1 WO2014036712 A1 WO 2014036712A1 CN 2012081093 W CN2012081093 W CN 2012081093W WO 2014036712 A1 WO2014036712 A1 WO 2014036712A1
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resin
polyetherimide
composite material
circuit substrate
curing
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PCT/CN2012/081093
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English (en)
French (fr)
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曾宪平
陈广兵
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广东生益科技股份有限公司
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Priority to PCT/CN2012/081093 priority Critical patent/WO2014036712A1/zh
Publication of WO2014036712A1 publication Critical patent/WO2014036712A1/zh

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/24Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
    • C08J5/246Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs using polymer based synthetic fibres
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/1046Polyimides containing oxygen in the form of ether bonds in the main chain
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/24Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs
    • C08J5/249Impregnating materials with prepolymers which can be polymerised in situ, e.g. manufacture of prepregs characterised by the additives used in the prepolymer mixture
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04Condensation polymers of aldehydes or ketones with phenols only
    • C08L61/06Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08L79/085Unsaturated polyimide precursors
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4611Manufacturing multilayer circuits by laminating two or more circuit boards
    • H05K3/4626Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials
    • H05K3/4632Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials laminating thermoplastic or uncured resin sheets comprising printed circuits without added adhesive materials between the sheets
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0213Electrical arrangements not otherwise provided for
    • H05K1/0237High frequency adaptations
    • H05K1/024Dielectric details, e.g. changing the dielectric material around a transmission line
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/0353Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
    • H05K1/0373Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement containing additives, e.g. fillers
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/02Fillers; Particles; Fibers; Reinforcement materials
    • H05K2201/0203Fillers and particles
    • H05K2201/0206Materials
    • H05K2201/0209Inorganic, non-metallic particles

Definitions

  • the present invention relates to a composite material, a high-frequency circuit substrate produced therewith, and a method of fabricating the same, and, in particular, to a thermosetting resin composite material, a high-frequency circuit substrate produced therefrom, and a method of fabricating the same. Background technique
  • Polyphenylene ether resin itself has good heat resistance and joint performance, but its molecular weight is too large, resulting in poor process and has not been able to achieve good application;
  • PTFE itself has the best dielectric in existing materials. Performance, but because it belongs to thermoplastic materials, its glass transition temperature is too low, which makes the processing process difficult. In addition, due to its strong chemical resistance, it is difficult to process subsequent circuit boards. In terms of reinforcing materials, the most widely used electronic circuit glass cloth is currently used in circuit boards, which has good reinforcing effect, heat resistance and chemical resistance, but its dielectric constant is high due to its own composition.
  • Another object of the present invention is to provide a high frequency circuit substrate produced using the above composite material, which has a lower dielectric constant, good heat resistance and flame retardancy.
  • Still another object of the present invention is to provide a method for fabricating the above-described high-frequency substrate, which is simple in operation and convenient in process.
  • the present invention provides a composite material comprising a component and a volume thereof as follows: a polyetherimide reinforcing material 10 to 90% and a thermosetting resin composition 10 to 90%;
  • the polyimide reinforcing material preferably has a volume percentage of 25 to 80%, further preferably 30 ⁇ 60%.
  • the polyetherimide reinforcing material is a polyetherimide fiber woven fabric, a polyetherimide nonwoven fabric or a polyetherimide glass fiber paper.
  • the thermosetting resin composition includes a thermosetting resin which is an epoxy resin, a phenol resin, a benzoxazine resin, a polyphenylene ether resin, a cyanate resin, a polyimide tree, a bimaleyl group.
  • a thermosetting resin which is an epoxy resin, a phenol resin, a benzoxazine resin, a polyphenylene ether resin, a cyanate resin, a polyimide tree, a bimaleyl group.
  • the thermosetting resin composition further comprises a curing agent and a curing accelerator
  • the curing agent is one or a mixture of dicyandiamide, an aromatic amine, a phenolic resin, an acid anhydride compound
  • the curing accelerator is an imidazole compound and a derivative thereof. a mixture of one or more of a compound, a piperidine compound, a Lewis acid, a triphenylphosphine, and an organometallic complex.
  • thermosetting resin composition further comprises a flame retardant, the flame retardant is a bromine-containing or halogen-free flame retardant, and the bromine-containing flame retardant is decabromodiphenyl ether, decabromodiphenylethane, brominated Styrene or ethylene bistetrabromophthalimide; the no [3 ⁇ 4 flame retardant is tris(2,6-dimercaptophenyl)phosphine, 10-(2,5-dihydroxyphenyl) -9,10-Dihydro-9-oxa-10-phosphinophen-10-oxide, 2,6-bis(2,6-diamidinophenyl)phosphinobenzene or 10-phenyl-9 , 10-dihydro-9-oxa-10-phosphaphenanthrene-10-oxide, phenoxyphosphine cyanide compound, phosphate ester, phosphate salt compound or hydrated metal compound.
  • the flame retardant is a bromine-containing or hal
  • the thermosetting resin composition further comprises an inorganic filler or an organic filler selected from the group consisting of crystalline silica, fused silica, spherical silica, hollow silica, glass powder, aluminum nitride, and boron nitride. , one of silicon carbide, aluminum hydroxide, magnesium hydroxide, titanium dioxide, barium titanate, barium titanate, aluminum oxide, barium sulfate, talc, calcium silicate, calcium carbonate, boehmite, boric acid and mica Or a plurality of; the organic filler is one or more selected from the group consisting of polytetrafluoroethylene powder, polyphenylene sulfide, and polyacid powder.
  • the present invention also provides a high-frequency circuit substrate made of the above composite material, comprising: a plurality of prepregs laminated on each other and a copper foil pressed on one or both sides of the laminated prepreg, the plurality of prepregs At least one prepreg is made from the composite material.
  • the present invention provides a method for fabricating the above high frequency circuit substrate, comprising the following steps:
  • Step 1 Provide the composite components by volume percentage: Polyetherimide reinforced material
  • thermosetting resin composition 10 ⁇ 90% and thermosetting resin composition 10 ⁇ 90%;
  • thermosetting resin composition is formulated into a glue
  • Step 3 impregnating the polyetherimide reinforcing material with the glue prepared above, baking, and obtaining a prepreg;
  • Step 4 taking a plurality of prepregs for lamination, laminating copper foil on one side or both sides of the laminated prepreg, and curing in a press to obtain the high-frequency circuit substrate, and the curing temperature is
  • the polyetherimide reinforcing material is a polyetherimide fiber woven fabric, a polyetherimide nonwoven fabric or a polyetherimide glass fiber paper.
  • a polyetherimide reinforced material having a dielectric constant of 3.0 can effectively reduce the dielectric constant of a circuit substrate compared to a conventional glass fiber reinforced material;
  • the present invention uses a polyetherimide reinforced material having high heat resistance, a glass transition temperature of more than 200 ° C, and intrinsic flame retardancy, compared with existing organic fibers, such as polyethylene fibers. Higher heat resistance and flame retardancy, more suitable for use in circuit substrates;
  • the composite material of the present invention is easy to fabricate, and the high-frequency circuit substrate produced therefrom has a low dielectric constant, good heat resistance, easy processing of the circuit board, and good flame retardancy.
  • the present invention provides a composite material comprising components and their volume percentages (calculated as a percentage of the total volume of the composite material) as follows: Polyetherimide reinforcing material 10 to 90% and thermosetting resin composition 10 to 90%.
  • the structural formula of the polyetherimide of the polyetherimide reinforcing material is as follows:
  • the polyimide reinforcing material preferably has a volume percentage of 25 to 80%, and more preferably 30 to 60%.
  • the polyetherimide reinforcing material may be a polyetherimide fiber woven fabric, a polyetherimide nonwoven fabric or a polyetherimide glass fiber paper.
  • the polyetherimide reinforcing material of the invention such as polyetherimide fiber cloth, has a dielectric constant of 3.0, and has a lower dielectric constant than the conventional glass fiber reinforced material, and can effectively reduce the material. Dielectric constant.
  • the thermosetting resin composition contains a thermosetting resin.
  • the thermosetting resin of the present invention is not particularly limited, and may be an epoxy resin, a phenol resin, a benzoxazine resin, a polyphenylene ether resin, a cyanate resin, or a polyamido.
  • Amine resin, bismaleimide resin, hydrocarbon resin, polysiloxane resin, polytetrafluoroethylene resin, polyether sulfone resin, polyether ketone resin, and modified resin of each of the aforementioned thermosetting resins One or more compositions.
  • thermosetting resin is preferably a cyanate resin, a bismaleimide resin, a polyolefin resin, a modified polyolefin tree, a polytetrafluoroethylene resin, and a polyphenylene ether resin.
  • a cyanate resin preferably a bismaleimide resin, a polyolefin resin, a modified polyolefin tree, a polytetrafluoroethylene resin, and a polyphenylene ether resin.
  • the epoxy resin may be bisphenol A type brominated epoxy resin, bromine-free bisphenol A type epoxy resin, phenol phenolic resin, phenolic phenolic resin, bisphenol A novolac epoxy resin, DCPC type ring Oxygen resin, biphenyl type epoxy resin, naphthol type epoxy resin, alkylphenol type epoxy resin, aliphatic epoxy resin, trifunctional epoxy resin or nitrogen-containing epoxy resin; said cyanate resin It may be a bisphenol A type cyanate tree, a DCPD type cyanate resin, a bisphenol M type cyanate resin, a bisphenol F type cyanate resin, a phenolic type cyanate resin, an alkylphenol type cyanide.
  • an acid ester resin or a naphthol type cyanate may be a DDM type bismaleimide resin, a diamine modified bismaleimide resin or an allyl modification Bismaleimide resin;
  • the benzoxazine resin may be an aniline type benzoxazine resin, a bisphenol A type benzoxazine resin, a bisphenol F type benzoxazine resin, a naphthol type a benzoxazine resin or a phenolphthalein type benzoxazine resin;
  • the polyphenylene ether resin may be a hydroxylated polyphenylene ether resin or an epoxy group.
  • Modified polyphenylene ether resin vinylated modified polyphenylene ether resin or acylation modification Polybenzoic acid resin
  • the unsaturated resin may be selected from polybutadiene resin, butadiene-styrene copolymer resin, maleimide modified polybutadiene resin, epoxy modified polybutadiene Diene resin, hydroxyl terminated polybutadiene resin, styrene resin, mercaptostyrene resin, ethylstyrene resin, divinylbenzene resin, isopentenyl resin, acrylate, acrylonitrile resin or benzocyclobutene Alkene resin.
  • the above thermosetting resin accounts for 50 to 99% by weight of the thermosetting resin composition, based on 100 parts by weight of the thermosetting resin composition.
  • the thermosetting resin composition may further contain a curing agent and a curing accelerator as needed, and the selection of the curing agent is not particularly limited, and mainly serves to increase the crosslinking density. It may be one or a mixture of dicyandiamide, aromatic amine, phenol resin, acid anhydride compound or the like.
  • the aromatic amine may be selected from the group consisting of diaminodiphenyl sulfone, diaminodiphenyl ether diphenyl sulfone, diaminophenyl ether diphenyl ether, diaminodiphenyl ether bisphenol A, diaminodiphenyl ether-6F-bisphenol.
  • the phenolic resin may be selected from the group consisting of bisphenol A type phenolic resin, phenol novolac resin, cresol novolac resin, dicyclopentadiene type phenol resin, biphenol novolak resin, naphthol novolac resin, alkyl group a phenolic resin or a trisphenol phenolic resin;
  • the acid anhydride compound being selected from the group consisting of mercaptotetrahydroanhydride, mercaptohexahydroanhydride or styrene bismaleic anhydride; calculated as 100 parts by weight of the thermosetting resin composition, the curing agent It accounts for 1 to 50% by weight of the thermosetting resin composition.
  • the curing accelerator is not particularly limited as long as it can catalyze the reaction of the thermosetting resin composition and lower the reaction temperature of the curing system, and is preferably an imidazole compound and a derivative compound thereof, a piperidine compound, a Lewis acid, and a triphenylphosphine. , one or more mixtures of organometallic complexes.
  • the imidazole compound may, for example, be 2-mercaptoimidazole, 2-phenylimidazole or 2-ethyl-4-mercaptoimidazole, and the piperidine compound may be exemplified by 2,3-diaminopiperidine.
  • the Lewis acid catalyst may be selected from boron trifluoride monoethylamine
  • the complex may be selected from copper acetylacetonate, cobalt acetylacetonate, zinc octoate or vanadium naphthenate.
  • the curing accelerator is added in an amount of 0.05 part by weight, preferably 0.1 to 2.5 parts by weight, more preferably 0.15 to 2.0 parts by weight, particularly preferably 0.15 to 1.0 part by weight, based on 100 parts by weight of the thermosetting resin composition.
  • thermosetting resin composition of the present invention may optionally contain a flame retardant, and the flame retardant to be added as needed is not particularly limited, and a non-reactive flame retardant is preferably used so as not to affect the dielectric properties.
  • the bromine-containing or halogen-free flame retardant may be used, and the bromine-containing flame retardant may be decabromodiphenyl ether, decabromodiphenylethane, brominated styrene or ethylene bis-tetrabromophthaloyl hydrazide.
  • the imine; the [3 ⁇ 4 flame retardant is tris(2,6-dimercaptophenyl)phosphine, 10-(2,5-dihydroxyphenyl)-9,10-dihydro-9-oxygen Hetero- 10-phosphonium-10-oxide, 2,6-bis(2,6-diamidinophenyl)phosphinobenzene or 10-phenyl-9, 10-dihydro-9-oxa-10 -phosphonium-10-oxide, phenoxyphosphine cyanide compound, phosphate ester, phosphate esterification Compound or hydrated metal compound.
  • the flame retardant is preferably added in an amount of 5 to 100 parts by weight, more preferably 5 to 90 parts by weight, particularly preferably 5 to 80 parts by weight, based on 100 parts by weight of the thermosetting resin composition.
  • the thermosetting resin composition of the present invention may further contain a filler, if necessary, as an organic filler or an inorganic filler.
  • a filler if necessary, as an organic filler or an inorganic filler.
  • the filler to be added as needed is not particularly limited, and the inorganic filler may be selected from the group consisting of crystalline silica, fused silica, spherical silica, hollow silica, glass powder, aluminum nitride, boron nitride, and carbonization.
  • a plurality of; the organic filler may be selected from one or more of polytetrafluoroethylene powder, polyphenylene sulfide, and polyethersulfone powder.
  • the shape, particle diameter, and the like of the inorganic filler are also not particularly limited, and usually have a particle diameter of 0.01 to 50 ⁇ m, preferably 0.01 to 20 ⁇ m, particularly preferably 0.1 to 10 ⁇ m, and an inorganic filler having such a particle size range. It is more easily dispersed in the resin liquid.
  • the amount of the filler to be added is not particularly limited, and the filler is added in an amount of from 5 to 1000 parts by weight, preferably from 5 to 300 parts by weight, more preferably from 5 to 200, based on 100 parts by weight of the thermosetting resin composition. It is particularly preferably 15 to 100 parts by weight based on parts by weight.
  • the high-frequency circuit substrate produced using the above composite material comprises a plurality of layers of prepreg which are superposed on each other and a copper foil which is coated on one or both sides, and at least one or all of the plurality of prepregs are made of the composite material.
  • the method for manufacturing the high-frequency circuit substrate includes the following steps:
  • Step 1 Provide the composite components by volume percentage: Polyetherimide reinforced material
  • thermosetting resin composition 10 ⁇ 90% and thermosetting resin composition 10 ⁇ 90%.
  • thermosetting resin composition is formulated into a glue: ⁇
  • the thermosetting resin composition is formulated into a certain solid content of the glue solution in a certain ratio with a suitable solvent.
  • Step 3 impregnating the polyetherimide reinforcing material with the glue prepared above, and controlling the appropriate thickness, that is, controlling the thickness of the glue impregnated on the polyetherimide reinforcing material to a suitable thickness range, and then baking Bake off the solvent to obtain a prepreg;
  • Step 4 taking a plurality of prepregs for lamination, laminating copper foil on one side or both sides of the laminated prepreg, and curing in a press to obtain the high-frequency circuit substrate, and the curing temperature is 150-300 ° C, curing pressure 5 ⁇ 50Kg/cm 2 .
  • dielectric properties of the above-described high-frequency circuit substrate that is, the dielectric constant and the dielectric loss tangent, and the heat resistance are further described and described in the following examples.
  • the polyetherimide fiber cloth (manufactured by KURARAY Co., Ltd., Japan) was treated at 80 to 150 ° C for 30 to 90 minutes, and then the polyetherimide fiber cloth was impregnated with the prepared glue, and the fiber cloth was controlled.
  • the volume content is 50%, and then baked at 155 ° C for 5 to 10 minutes, and the solvent is removed to obtain a prepreg.
  • the prepregs obtained by using a plurality of sheets are superposed on each other, and a copper foil is pressed on both sides thereof to be cured in a hot press to obtain a high-frequency circuit substrate having a curing temperature of 180 ° C and a curing pressure of 25 Kg/cm 2 , curing time is 45 min.
  • the polyetherimide fiber cloth (manufactured by KURARAY Co., Ltd., Japan) was treated at 80 to 150 ° C for 30 to 90 minutes, and then the polyetherimide fiber cloth was impregnated with the prepared glue, and the fiber cloth was controlled.
  • the volume content is 50%, and then baked at 155 ° C for 5 to 10 minutes, and the solvent is removed to obtain a prepreg.
  • the prepregs obtained by using a plurality of sheets are superposed on each other, and a copper foil is pressed on both sides thereof to be cured in a hot press to obtain a high-frequency circuit substrate having a curing temperature of 190 ° C and a curing pressure of 30. Kg/cm 2 , curing time is 90 min.
  • Polyetherimide fiber cloth (manufactured by KURARAY, Japan) at 80 to 150 ° C After treating for 30 to 90 minutes, the polyetherimide fiber cloth is impregnated with the prepared glue, and the volume content of the fiber cloth is controlled to be 50%, and then baked at 155 ° C for 5 to 10 minutes to remove the solvent.
  • a prepreg was prepared. The prepreg obtained by using a plurality of sheets is superposed on each other, and a copper foil is pressed on both sides thereof to be cured in a hot press to obtain a high-frequency circuit substrate having a curing temperature of 200 ° C and a curing pressure of 35. Kg/cm 2 , curing time is 1000 min.
  • the polyetherimide fiber cloth (manufactured by KURARAY Co., Ltd., Japan) was treated at 80 to 150 ° C for 30 to 90 minutes, and then the polyetherimide fiber cloth was impregnated with the prepared glue, and the fiber cloth was controlled.
  • the volume content is 50%, and then baked at 155 ° C for 5 to 10 minutes, and the solvent is removed to obtain a prepreg.
  • the prepregs obtained by using a plurality of sheets are superposed on each other, and a copper foil is pressed on both sides thereof to be cured in a hot press to obtain a high-frequency circuit substrate having a curing temperature of 220 ° C and a curing pressure of 25 Kg/cm 2 , curing time is 120 min.
  • the polyetherimide fiber cloth (manufactured by KURARAY Co., Ltd., Japan) was treated at 80 to 150 ° C for 30 to 90 minutes, and then the polyetherimide fiber cloth was impregnated with the prepared glue, and the fiber cloth was controlled.
  • the volume content is 30%, and then baked at 155 ° C for 5 to 10 minutes, and the solvent is removed to obtain a prepreg.
  • the prepregs obtained by using a plurality of sheets are superposed on each other, and a copper foil is pressed on both sides thereof to be cured in a hot press to obtain a high-frequency circuit substrate having a curing temperature of 220 ° C and a curing pressure of 25 Kg/cm 2 , curing time is 120 min.
  • Refining of resin glue Take a container and add 70 parts by weight of dicyclopentadiene type phenolic epoxy resin HP-7200-H (Japan DIC, EEW is 288 g/eq), and then 30 parts by weight of cyanate ester (Shanghai Huifeng Co., Ltd.) Solubilized in methyl ethyl ketone solvent, added to the above resin and stirred, and then added 0.075 parts by weight of curing accelerator octanoic acid, and finally added an appropriate amount of methyl ethyl ketone solvent, continue to stir and form a glue.
  • the polyetherimide fiber cloth (manufactured by KURARAY Co., Ltd., Japan) was treated at 80 to 150 ° C for 30 to 90 minutes, and then the polyetherimide fiber cloth was impregnated with the prepared glue, and the fiber cloth was controlled.
  • the volume content is 75%, and then baked at 155 ° C for 5 to 10 minutes, and the solvent is removed to obtain a prepreg.
  • the prepregs obtained by using a plurality of sheets are superposed on each other, and a copper foil is pressed on both sides thereof to be cured in a hot press to obtain a high-frequency circuit substrate having a curing temperature of 220 ° C and a curing pressure of 25 Kg/cm 2 , curing time is 120 min.
  • the polyetherimide nonwoven fabric (manufactured by KURARAY Co., Ltd.) is treated at 80 to 150 ° C for 30 to 90 minutes, and then the polyetherimide fiber cloth is impregnated with the prepared glue, and the fiber is controlled.
  • the cloth has a volume content of 50%, and then baked at 155 ° C for 5 to 10 minutes, and the solvent is removed to obtain a prepreg.
  • the prepregs obtained by using a plurality of sheets are superposed on each other, and a copper foil is pressed on both sides thereof to be cured in a hot press to obtain a high-frequency circuit substrate having a curing temperature of 220 ° C and a curing pressure of 25 Kg/cm 2 , curing time is 120 min.
  • Prepreg and sheet production The company's '0.09iln' and control the volume content of the fiber cloth is 50%, then bake at 155 °C for 5 to 10 minutes, remove the solvent to obtain a prepreg.
  • the prepregs obtained by using a plurality of sheets are laminated on each other, and a copper foil is laminated on both sides thereof, and cured in a hot press to obtain a circuit substrate having a curing temperature of 180 ° C and a curing pressure of 25 Kg / Cm 2 , curing time is 45 min.

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  • Materials Engineering (AREA)
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  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
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Abstract

提供一种复合材料、用其制作的高频电路基板及其制作方法。该复合材料包括10-90体积%的聚醚酰亚胺增强材料和10-90体积%的热固性树脂组合物。该高频电路基板包括数层叠合的由所述复合材料形成的半固化片及压覆于该半固化片上的铜箔,其介电常数低,且耐热性和阻燃性良好。

Description

复合材料、 用其制作的高频电路基板及其制作方法 技术领域
本发明涉及一种复合材料、 用其制作的高频电路基板及其制作方法, 尤其涉及一种热固性树脂复合材料、 用其制作的高频电路基板及其制作方 法。 背景技术
近年来, 随着信息技术的发展, 通讯设备朝着高性能化、 多功能化以 及网络化的发展越来越明显, 电子信号传输的频率越来越高。 为了实现高 速传输及处理大容量信息, 高频化已经是一个不可阻挡的趋势, 电子产品 的使用频率不断升高, 对于作为线路板的基板材料的介电特性要求越来越 高, 主要表现为低的介电常数和介质损耗正切值。
目前, 为了实现高频电路基板的低介电常数和介质损耗正切值做了大 量技术工作, 主要包括树脂和增强材料两个方面。 首先, 作为电路基板的 树脂以环氧最为普通, 因为其具有良好的耐热性、 工艺性和粘结性, 但是 其介电常数偏高, 限制了其在高频电路基板上的使用。 氰酸酯、 聚苯醚、 双马来酰亚胺、 聚酰亚胺、 聚四氟乙烯等树脂在介电性能方面要比环氧树 脂优越很多, 但是由于氰酸酯的耐热性较差, 往往需要进行改性才能使 用, 这也就大大牺牲了其本身优异的介电性能。 聚苯醚树脂本身具有良好 的耐热性和节点性能, 但是由于其分子量太大, 导致其工艺差而一直无法 取得很好的应用; 聚四氟乙烯本身具有现有材料中最好的介电性能, 但是 由于其属于热塑性材料, 本身的玻璃化转变温度太低、 导致加工过程困 难, 另外由于其本身的耐化学性强, 导致后续线路板加工困难。 增强材料 方面, 目前在电路基板中应用最为广泛的为电子级玻璃纤维布, 其具有很 好的增强效果、 耐热性和耐化学性, 但由于其本身成份的原因, 其介电常 数很高, 达到 6.6; 为了进一步改进其介电性能, 出现低介电常数 NE布, 通过调整其组分, 可以在一定程度上降低其介电常数, 一般为 4.6 左右。 但是其介电常数值仍然比树脂体系的要高很多, 给覆铜板材料的介电常数 降低带来很大的限制。 发明内容
本发明的目的在于提供一种复合材料, 通过釆用聚醚酰亚胺增强材 料, 具有更低的介电常数和介质损耗角正切, 以及具有高耐热性和良好的 工艺加工性, 适合高频高速印制线路板领域。
本发明的另一目的还在于提供一种使用上述复合材料制作的高频电路 基板, 具有更低的介电常数, 良好的耐热性和阻燃性。
本发明的再一目的在于提供一种上述高频基板的制作方法, 操作简 单, 工艺方便。
为实现上述目的, 本发明提供一种复合材料, 其包括组分及其体积百 分比如下: 聚醚酰亚胺增强材料 10~90%及热固性树脂组合物 10~90%;
Figure imgf000003_0001
所述聚酰亚胺增强材料体积百分比优选为 25~80% , 进一步优选为 30~60%。
所述聚醚酰亚胺增强材料为聚醚酰亚胺纤维编织布、 聚醚酰亚胺无纺 布或聚醚酰亚胺玻纤纸。
所述热固性树脂组合物包括有热固性树脂, 该热固性树脂为环氧树 脂、 酚醛树脂、 苯并恶嗪树脂、 聚苯醚树脂、 氰酸酯树脂、 聚酰亚胺树 月旨、 双马来酰亚胺树脂、 碳氢树脂、 聚硅氧烷树脂、 聚四氟乙烯树脂、 聚 醚砜树脂、 聚醚酮树脂、 及前述各热固性树脂的改性树脂中的一种或多种 组合物。
所述热固性树脂组合物还包括有固化剂及固化促进剂, 固化剂为双氰 胺、 芳香胺、 酚醛树脂、 酸酐化合物中的一种或多种混合物, 固化促进剂 为咪唑类化合物及其衍生化合物、 哌啶类化合物、 路易斯酸、 三苯基膦及 有机金属络合物中的一种或多种混合物。
所述热固性树脂组合物还包括有阻燃剂, 阻燃剂釆用含溴或无卤阻燃 剂, 所述含溴阻燃剂为十溴二苯醚、 十溴二苯乙烷、 溴化苯乙烯或乙撑双 四溴邻苯二曱酰亚胺; 所述无 [¾阻燃剂为三 (2,6-二曱基苯基) 膦、 10- ( 2,5-二羟基苯基) -9,10-二氢 -9-氧杂 -10-膦菲 -10-氧化物、 2,6-二 ( 2,6-二 曱基苯基)膦基苯或 10-苯基 -9 , 10-二氢 -9-氧杂 -10-膦菲 -10-氧化物、 苯氧 基膦氰化合物、 磷酸酯、 磷酸酯盐化合物或水合金属化合物。
所述热固性树脂组合物还包括有无机填料或有机填料, 无机填料选自 结晶型二氧化硅、 熔融二氧化硅、 球形二氧化硅、 空心二氧化硅、 玻璃 粉、 氮化铝、 氮化硼、 碳化硅、 氢氧化铝、 氢氧化镁、 二氧化钛、 钛酸 锶、 钛酸钡、 氧化铝、 硫酸钡、 滑石粉、 硅酸钙、 碳酸钙、 勃姆石、 硼酸 辞及云母中的一种或多种; 有机填料选自聚四氟乙烯粉末、 聚苯硫醚及聚 酸 粉末中的一种或多种。
本发明还提供一种用上述复合材料制作的高频电路基板, 其包括: 数 层互相叠合的半固化片及压覆于该叠合的半固化片一侧或两侧上的铜箔, 该数层半固化片中至少一张半固化片由所述复合材料制作。
进一步地, 本发明还提供一种上述高频电路基板的制作方法, 包括如 下步骤:
步骤一、 按体积百分比提供复合材料各组分: 聚醚酰亚胺增强材料
10~90%及热固性树脂组合物 10~90%;
步骤二、 将热固性树脂组合物配制成胶液;
步骤三、 用上述制成的胶液浸渍聚醚酰亚胺增强材料, 烘烤, 得到半 固化片; 步骤四、 取上述半固化片数张进行叠合, 在叠合的半固化片的一侧或 两侧覆上铜箔, 在压机中进行固化制得所述高频电路基板, 固化温度为
150-300 °C , 固化压力 5~50Kg/cm2
所述聚醚酰亚胺增强材料为聚醚酰亚胺纤维编织布、 聚醚酰亚胺无纺 布或聚醚酰亚胺玻纤纸。
本发明的有益效果: 首先, 釆用聚醚酰亚胺增强材料, 其介电常数为 3.0, 相比较传统的玻璃纤维增强材料, 可以有效地降低电路基板的介电常 数;
其次, 本发明釆用聚醚酰亚胺增强材料, 具有高耐热性, 玻璃化转变 温度大于 200 °C , 同时具有本征阻燃性, 相比较现有的有机纤维, 如聚乙 烯纤维具有更高的耐热性和阻燃性, 更适合在电路基板中使用;
总之, 本发明的复合材料制作容易, 用其制作的高频电路基板具有低 的介电常数, 耐热性好, 电路板加工容易, 并具有良好的阻燃性。 具体实施方式
本发明提供一种复合材料, 其包括组分及其体积百分比 (按复合材料 总体积百分比比计算)如下: 聚醚酰亚胺增强材料 10~90%及热固性树脂 组合物 10~90%。
所述聚醚酰亚胺增强材料的聚醚酰亚胺的结构式如下式所示:
Figure imgf000005_0001
Figure imgf000005_0002
Figure imgf000005_0003
Figure imgf000006_0001
或一 (CH2 ) m―, m为 2~10 的 整数。
所述聚酰亚胺增强材料体积百分比优选为 25~80%, 更进一步优选为 30~60%。
所述聚醚酰亚胺增强材料可为聚醚酰亚胺纤维编织布、 聚醚酰亚胺无 纺布或聚醚酰亚胺玻纤纸。 本发明釆用聚醚酰亚胺增强材料, 如聚醚酰亚 胺纤维布其介电常数为 3.0 , 相比较传统的玻璃纤维增强材料, 具有更低 的介电常数, 可以有效地降低材料的介电常数。
所述热固性树脂组合物包含有热固性树脂, 本发明对该热固性树脂并 未特别限定, 可以为环氧树脂、 酚醛树脂、 苯并恶嗪树脂、 聚苯醚树脂、 氰酸酯树脂、 聚酰亚胺树脂、 双马来酰亚胺树脂、 碳氢树脂、 聚硅氧烷树 月旨、 聚四氟乙烯树脂、 聚醚砜树脂、 聚醚酮树脂、 及前述各热固性树脂的 改性树脂中的一种或多种组合物。 从考虑更优的介电性能角度考虑, 热固 性树脂优选氰酸酯树脂、 双马来酰亚胺树脂、 聚烯烃树脂、 改性聚烯烃树 月旨、 聚四氟乙烯树脂及聚苯醚树脂中的一种或多种。 所述的环氧树脂可以 为双酚 A型溴化环氧树脂、 无溴双酚 A型环氧树脂、 苯酚酚醛树脂、 临 曱酚酚醛树脂、 双酚 A型酚醛环氧树脂、 DCPC型环氧树脂、 联苯型环氧 树脂、 萘酚型环氧树脂、 烷基苯酚型环氧树脂、 脂肪族环氧树脂、 三官能 团环氧树脂或含氮环氧树脂; 所述的氰酸酯树脂可以为双酚 A型氰酸酯树 月旨、 DCPD型氰酸酯树脂、 双酚 M型氰酸酯树脂、 双酚 F型氰酸酯树脂、 酚醛型氰酸酯树脂、 烷基酚型氰酸酯树脂或萘酚型氰酸酯; 所述的马来酰 亚胺树脂可选为 DDM型双马来酰亚胺树脂、 二胺改性双马来酰亚胺树脂 或烯丙基改性双马来酰亚胺树脂; 所述的苯并恶嗪树脂可选为苯胺型苯并 恶嗪树脂、 双酚 A型苯并恶嗪树脂、 双酚 F型苯并恶嗪树脂、 萘酚型苯并 恶嗪树脂或酚酞型苯并恶嗪树脂; 所述的聚苯醚树脂可选为端羟基化聚苯 醚树脂、 环氧基改性聚苯醚树脂、 乙烯基化改性聚苯醚树脂或酰基化改性 聚苯酸树脂; 所述的不饱和树脂可选为聚丁二烯树脂、 丁二烯 -苯乙烯共聚 物树脂、 马来酰亚胺改性聚丁二烯树脂、 环氧基改性聚丁二烯树脂、 端羟 基聚丁二烯树脂、 苯乙烯树脂、 曱基苯乙烯树脂、 乙基苯乙烯树脂、 二乙 烯基苯树脂、 异戊烯树脂、 丙烯酸酯、 丙烯腈树脂或苯并环丁烯树脂。 以 100 重量份热固性树脂组合物来计算, 上述的热固性树脂占所述热固性树 脂组合物 50~99%重量份。
所述热固性树脂组合物中还可以根据需要包含固化剂和固化促进剂, 固化剂的选择没有特别的限定, 主要起到提高交联密度作用。 可以为双氰 胺、 芳香胺、 酚醛树脂、 酸酐化合物等中的一种或几种混合物。 所述的芳 香胺可选为二氨基二苯砜、 二氨基二苯醚二苯砜、 二氨基苯醚二苯醚、 二 氨基二苯醚双酚 A、 二氨基二苯醚 -6F-双酚 A或芴胺化合物; 所述酚醛树 脂可选为双酚 A型酚醛树脂、 苯酚酚醛树脂、 临甲酚酚醛树脂、 双环戊二 烯型酚醛树脂、 联苯酚醛树脂、 萘酚酚醛树脂、 烷基苯酚醛树脂或三酚酚 醛树脂; 所述酸酐化合物可选为曱基四氢酸酐、 曱基六氢酸酐或苯乙烯双 马来酸酐; 以 100份重量热固性树脂组合物来计算, 所述固化剂占热固性 树脂组合物 1~50%重量份。
所述固化促进剂没有特别限定, 只要能催化热固性树脂组合物的反 应、 降低固化体系的反应温度即可, 优选为咪唑类化合物及其衍生化合 物、 哌啶类化合物、 路易斯酸、 三苯基膦、 有机金属络合物中的一种或多 种混合物。 所述的咪唑类化合物可以列举有 2-曱基咪唑、 2-苯基咪唑及 2- 乙基 -4-曱基咪唑, 所述的哌啶化合物可以列举有 2,3-二氨基哌啶、 2,5-二 氨基哌啶 2,6-二氨基哌啶、 2,5-二氨基、 2-氨基 -3-曱基哌啶、 2-氨基 -4-4 曱 基哌啶、 2-tt-3-硝基哌啶、 2-氨基 -5-硝基哌啶及 4-二曱基氨基哌啶; 所 述的路易斯酸催化剂可选为三氟化硼单乙胺; 所述的有机金属络合物可选 为乙酰丙酮铜、 乙酰丙酮钴、 辛酸锌或环烷酸钒。 以所述热固性树脂组合 物 100重量份计算, 固化促进剂的添加量为 0.05 3重量份, 优选为 0.1-2.5 重量份, 更优选为 0.15-2.0重量份, 特优选为 0.15-1.0重量份。
本发明的热固性树脂组合物可视需要添加阻燃剂, 对视需要而添加的 阻燃剂并无特别限定, 选定使用非反应型的阻燃剂, 以不影响介电性能为 佳。 可以釆用含溴或无卤阻燃剂, 所述的含溴阻燃剂可为十溴二苯醚、 十 溴二苯乙烷、 溴化苯乙烯或乙撑双四溴邻苯二曱酰亚胺; 所述的无[¾阻燃 剂为三 (2,6-二曱基苯基) 膦、 10- ( 2,5-二羟基苯基) -9,10-二氢 -9-氧杂- 10-膦菲 -10-氧化物、 2,6-二(2,6-二曱基苯基)膦基苯或 10-苯基 -9 , 10-二 氢 -9-氧杂 -10-膦菲 -10-氧化物、 苯氧基膦氰化合物、 磷酸酯、 磷酸酯盐化 合物或水合金属化合物。 相对于所述热固性树脂组合物 100 重量份计算, 阻燃剂的添加量优选为 5-100重量份, 更优选为 5-90重量份, 特优选为 5- 80重量份。
如有需要, 本发明的热固性树脂组合物中还可以进一步含有填料, 为 有机填料或无机填料。 对视需要而添加的填料并无特别限定, 无机填料可 选自结晶型二氧化硅、 熔融二氧化硅、 球形二氧化硅、 空心二氧化硅、 玻 璃粉、 氮化铝、 氮化硼、 碳化硅、 氢氧化铝、 氢氧化镁、 二氧化钛、 钛酸 锶、 钛酸钡、 氧化铝、 硫酸钡、 滑石粉、 硅酸钙、 碳酸钙、 勃姆石、 硼酸 辞及云母等中的一种或多种; 有机填料可以选自聚四氟乙烯粉末、 聚苯硫 醚及聚醚砜粉末等中的一种或多种。 另外, 无机填料的形状、 粒径等也无 特别限定, 通常粒径为 0.01-50 μ πι, 优选为 0.01-20 μ πι, 特优选为 0.1-10 μ πι, 这种粒径范围的无机填料在树脂液中更易分散。 再者, 填料的添加 量也无特别限定, 相对于所述热固性树脂组合物 100重量份计算, 填料的 添加量为 5-1000重量份, 优选为 5-300重量份, 更优选为 5-200重量份, 特优选为 15-100重量份。
使用上述复合材料制作的高频电路基板, 包括数层互相叠合的半固化 片及分别覆于一面或两面的铜箔, 该数层半固化片中至少一张或全部由所 述复合材料制作。
上述高频电路基板的制作方法, 包括如下步骤:
步骤一、 按体积百分比提供复合材料各组分: 聚醚酰亚胺增强材料
10~90%及热固性树脂组合物 10~90%。
步骤二、 将热固性树脂组合物配制成胶液: 釆用适当的溶剂将热固性 树脂组合物按照一定比例配制成一定固体含量的胶液。
步骤三、 用上述制成的胶液浸渍聚醚酰亚胺增强材料, 并控制合适的 厚度, 即控制聚醚酰亚胺增强材料浸渍上的胶液的厚度至合适的厚度范 围, 然后进行烘烤去除溶剂, 得到半固化片;
步骤四、 取上述半固化片数张进行叠合, 在叠合的半固化片的一侧或 两侧覆上铜箔, 在压机中进行固化制得所述高频电路基板, 固化温度为 150-300 °C , 固化压力 5~50Kg/cm2
针对上述制成的高频电路基板的介电性能, 即介电常数和介质损耗正 切值, 及耐热性能, 如下实施例进一步给予详细说明与描述。
实施例 1
树脂胶液的调配:
取一容器, 加入 100 重量份的溴化双酚 A型环氧树脂 DER530A80 ( DOW公司, EEW 为 435 g/eq ) , 然后将 2.0 重量份的双氰胺固化剂 (宁夏大荣, 氨基当量 21 g/eq )溶剂与 DMF溶剂中, 加入上述树脂中并 搅拌均匀, 再加入 0.075重量份的固化促进剂 2-乙基 -4-曱基咪唑, 最后加 入适量的溶剂 DMF, 继续搅拌均匀即成胶液。
半固化片及板材制作:
将聚醚酰亚胺纤维布 (日本 KURARAY公司制) , 在 80~150°C条件下 处理 30~90分钟, 然后用上述调配好的胶液浸渍聚醚酰亚胺纤维布, 并控 制纤维布的体积含量为 50%, 然后在 155°C条件下烘烤 5~10分钟, 除去溶 剂制得半固化片。 使用数张所制得的半固化片相互叠合, 在其两侧上各压 覆一张铜箔, 在热压机中固化制得高频电路基板, 其固化温度为 180°C , 固化压力为 25 Kg/cm2 , 固化时间为 45min。
实施例 2
树脂胶液的调配:
取一容器, 加入 100 重量份的溴化双酚 A型环氧树脂 DER530A80 ( DOW公司, EEW为 435 g/eq ) , 然后将 24.1重量份的酚醛固化剂 TD- 2090 (宁夏大荣, 羟基当量 105 g/eq )溶解于丁酮溶剂中, 加入上述树脂 中并搅拌均匀, 再加入 0.075重量份的固化促进剂 2-乙基 -4-曱基咪唑, 最 后加入适量的溶剂 PM, 继续搅拌均匀即成胶液。
半固化片及板材制作:
将聚醚酰亚胺纤维布 (日本 KURARAY公司制) , 在 80~150°C条件下 处理 30~90分钟, 然后用上述调配好的胶液浸渍聚醚酰亚胺纤维布, 并控 制纤维布的体积含量为 50%, 然后在 155°C条件下烘烤 5~10分钟, 除去溶 剂制得半固化片。 使用数张所制得的半固化片相互叠合, 在其两侧上各压 覆一张铜箔, 在热压机中固化制得高频电路基板, 其固化温度为 190°C , 固化压力为 30 Kg/cm2, 固化时间为 90min。
实施例 3
树脂胶液的调配:
取一容器, 加入 70 重量份的双环戊二烯型酚醛环氧树脂 HP-7200-H (日本 DIC公司, EEW为 288 g/eq ) , 然后将 30重量份的氰酸酯(上海 慧丰公司制) 溶解于丁酮溶剂中, 加入上述树脂中并搅拌均勾, 再加入 0.075 重量份的固化促进剂辛酸辞, 最后加入适量的丁酮溶剂, 继续搅拌 均匀即成胶液。
半固化片及板材制作:
将聚醚酰亚胺纤维布(日本 KURARAY公司制) , 在 80~150°C条件下 处理 30~90分钟, 然后用上述调配好的胶液浸渍聚醚酰亚胺纤维布, 并控 制纤维布的体积含量为 50%, 然后在 155°C条件下烘烤 5~10分钟, 除去溶 剂制得半固化片。 使用数张所制得的半固化片相互叠合, 在其两侧上各压 覆一张铜箔, 在热压机中固化制得高频电路基板, 其固化温度为 200°C , 固化压力为 35 Kg/cm2 , 固化时间为 1 OOmin。
实施例 4
树脂胶液的调配:
取一容器, 加入 100 重量份聚丁二烯 B3000 (日本曹达公司, 1,2-乙 烯含量 90% ) , 然后将 3.0重量份的过氧化异丙苯固化剂 (上海高桥公司 制)溶剂与曱苯溶剂中, 加入上述树脂中并搅拌均匀, 继续搅拌均匀即成 胶液。
半固化片及板材制作:
将聚醚酰亚胺纤维布 (日本 KURARAY公司制) , 在 80~150°C条件下 处理 30~90分钟, 然后用上述调配好的胶液浸渍聚醚酰亚胺纤维布, 并控 制纤维布的体积含量为 50%, 然后在 155°C条件下烘烤 5~10分钟, 除去溶 剂制得半固化片。 使用数张所制得的半固化片相互叠合, 在其两侧上各压 覆一张铜箔, 在热压机中固化制得高频电路基板, 其固化温度为 220°C , 固化压力为 25 Kg/cm2, 固化时间为 120min。
实施例 5
树脂胶液的调配:
取一容器, 加入 70 重量份的双环戊二烯型酚醛环氧树脂 HP-7200-H (日本 DIC公司, EEW为 288 g/eq ) , 然后将 30重量份的氰酸酯(上海 慧丰公司制) 溶解于丁酮溶剂中, 加入上述树脂中并搅拌均勾, 再加入 0.075 重量份的固化促进剂辛酸辞, 最后加入适量的丁酮溶剂, 继续搅拌 均匀即成胶液。
半固化片及板材制作:
将聚醚酰亚胺纤维布 (日本 KURARAY公司制) , 在 80~150°C条件下 处理 30~90分钟, 然后用上述调配好的胶液浸渍聚醚酰亚胺纤维布, 并控 制纤维布的体积含量为 30%, 然后在 155°C条件下烘烤 5~10分钟, 除去溶 剂制得半固化片。 使用数张所制得的半固化片相互叠合, 在其两侧上各压 覆一张铜箔, 在热压机中固化制得高频电路基板, 其固化温度为 220°C , 固化压力为 25 Kg/cm2 , 固化时间为 120min。
实施例 6
树脂胶液的调配: 取一容器, 加入 70 重量份的双环戊二烯型酚醛环氧树脂 HP-7200-H (日本 DIC公司, EEW为 288 g/eq ) , 然后将 30重量份的氰酸酯(上海 慧丰公司制) 溶解于丁酮溶剂中, 加入上述树脂中并搅拌均勾, 再加入 0.075 重量份的固化促进剂辛酸辞, 最后加入适量的丁酮溶剂, 继续搅拌 均匀即成胶液。
半固化片及板材制作:
将聚醚酰亚胺纤维布 (日本 KURARAY公司制) , 在 80~150°C条件下 处理 30~90分钟, 然后用上述调配好的胶液浸渍聚醚酰亚胺纤维布, 并控 制纤维布的体积含量为 75%, 然后在 155°C条件下烘烤 5~10分钟, 除去溶 剂制得半固化片。 使用数张所制得的半固化片相互叠合, 在其两侧上各压 覆一张铜箔, 在热压机中固化制得高频电路基板, 其固化温度为 220°C , 固化压力为 25 Kg/cm2, 固化时间为 120min。
实施例 7
树脂胶液的调配:
取一容器, 加入 100 重量份聚丁二烯 B3000 (日本曹达公司, 1,2-乙 烯含量 90% ) , 然后将 3.0重量份的过氧化异丙苯固化剂 (上海高桥公司 制)溶剂与曱苯溶剂中, 加入上述树脂中并搅拌均匀, 继续搅拌均匀即成 胶液。
半固化片及板材制作:
将聚醚酰亚胺无纺布(日本 KURARAY公司制) , 在 80~150°C条件下 处理 30~90分钟, 然后用上述调配好的胶液浸渍聚醚酰亚胺纤维布, 并控 制纤维布的体积含量为 50%, 然后在 155°C条件下烘烤 5~10分钟, 除去溶 剂制得半固化片。 使用数张所制得的半固化片相互叠合, 在其两侧上各压 覆一张铜箔, 在热压机中固化制得高频电路基板, 其固化温度为 220°C , 固化压力为 25 Kg/cm2 , 固化时间为 120min。
比较例 1
树脂胶液的调配:
取一容器, 加入 100 重量份的溴化双酚 A型环氧树脂 DER530A80 ( DOW公司, EEW 为 435 g/eq ) , 然后将 2.0 重量份的双氰胺固化剂 (宁夏大荣, 氨基当量 21 g/eq )溶剂与 DMF溶剂中, 加入上述树脂中并 搅拌均匀, 再加入 0.075重量份的固化促进剂 2-乙基 -4-曱基咪唑, 最后加 入适量的溶剂 DMF, 继续搅拌均勾即成胶液。
半固化片及板材制作:
然后用上述调配好的胶液浸渍电子级 E玻纤布 2116(日东纺公司, 厚度 0.09mm)并控制纤维布的体积含量为 50%, 然后在 155 °C条件下烘烤 5~10 分钟, 除去溶剂制得半固化片。 使用数张所制得的半固化片相互叠合, 在 其两侧上各压覆一张铜箔, 在热压机中固化制得电路基板, 其固化温度为 180 °C , 固化压力为 25 Kg/cm2, 固化时间为 45min。
比较例 2
树脂胶液的调配:
取一容器, 加入 100 重量份的溴化双酚 A型环氧树脂 DER530A80 ( DOW公司, EEW 为 435 g/eq ) , 然后将 2.0 重量份的双氰胺固化剂 (宁夏大荣, 氨基当量 21 g/eq )溶剂与 DMF溶剂中, 加入上述树脂中并 搅拌均匀, 再加入 0.075重量份的固化促进剂 2-乙基 -4-曱基咪唑, 最后加 入适量的溶剂 DMF, 继续搅拌均匀即成胶液。
半固化片及板材制作: 公司' 度 0.09iln)并控制纤维布的体积含量为 50%, 然后在 155 °C^件 下烘烤 5~10 分钟, 除去溶剂制得半固化片。 使用数张所制得的半固化片 相互叠合, 在其两侧上各压覆一张铜箔, 在热压机中固化制得电路基板, 其固化温度为 180 °C , 固化压力为 25 Kg/cm2 , 固化时间为 45min。
比较例 3
树脂胶液的调配:
取一容器, 加入 100 重量份的溴化双酚 A型环氧树脂 DER530A80
( DOW公司, EEW 为 435 g/eq ) , 然后将 2.0 重量份的双氰胺固化剂 (宁夏大荣, 氨基当量 21 g/eq )溶剂与 DMF溶剂中, 加入上述树脂中并 搅拌均匀, 再加入 0.075重量份的固化促进剂 2-乙基 -4-曱基咪唑, 最后加 入适量的溶剂 DMF, 继续搅拌均匀即成胶液。
半固化片及板材制作:
然后用上述调配好的胶液渍聚乙烯纤维布 UHMWPE (上海瑞斯公司)并 控制纤维布的体积含量为 50%, 然后在 155 °C条件下烘烤 5~10分钟, 除去 溶剂制得半固化片。 使用数张所制得的半固化片相互叠合, 在其两侧上各 压覆一张铜箔, 在热压机中固化制得电路基板, 其固化温度为 180 °C , 固 化压力为 25 Kg/cm2 , 固化时间为 45min。
表 1.各实施例物性数据
实施 实施 实施 实施 实施 实施 实施 性能
例 1 例 2 例 3 例 4 例 5 例 6 例 7
Dk(lOG) 3.7 3.6 3.4 2.7 3.6 3.2 2.68 Df(10G) 0.012 0.0012 0.008 0.0038 0.0085 0.007 0.035 阻燃性 V-0 V-0 V-0 V-0 V-0 V-0 V-0
表 2.各比较例物性数据
Figure imgf000013_0001
物性分析
从表 1及表 2中的物性数据结果可以看出, 实施例 1~4制作的高频电 路基板材料具有更低的介电常数和介质损耗正切值, 高频特性好, 而比较 例 1~2中使用电子级 E玻纤布和 E玻纤布作为增强材料介电常数和介质 损耗正切值都较高, 比较例 3使用聚乙烯纤维布作为增强材料, 虽然具有 低的介电常数和介质损耗, 但由于聚乙烯本身不具备阻燃性, 无法满足电 子产品的 UL 94 V-0的要求。
以上实施例, 并非对本发明的组合物的含量作任何限制, 凡是依据本 发明的技术实质或组合物成份或含量对以上实施例所作的任何细微修改、 等同变化与修饰, 均仍属于本发明技术方案的范围内。

Claims

权 利 要 求
1、 一种复合材料, 包括组分及其体积百分比如下: 聚醚酰亚胺增强 材料 10~90%及热固性树脂组合物 10~90%;
Figure imgf000014_0001
体积百分比为 25~80%。
3、 如权利要求 2 所述的复合材料, 其中, 所述聚酰亚胺增强材料的 体积百分比为 30~60%。
4、 如权利要求 1 所述的复合材料, 其中, 所述聚醚酰亚胺增强材料 为聚醚酰亚胺纤维编织布、 聚醚酰亚胺无纺布或聚醚酰亚胺玻纤纸。
5、 如权利要求 1 所述的复合材料, 其中, 所述热固性树脂组合物包 括有热固性树脂, 该热固性树脂为环氧树脂、 酚醛树脂、 苯并恶嗪树脂、 聚苯醚树脂、 氰酸酯树脂、 聚酰亚胺树脂、 双马来酰亚胺树脂、 碳氢树 月旨、 聚硅氧烷树脂、 聚四氟乙烯树脂、 聚醚砜树脂、 聚醚酮树脂、 及前述 各热固性树脂的改性树脂中的一种或多种组合物。
6、 如权利要求 5 所述的复合材料, 其中, 所述热固性树脂组合物还 包括有固化剂及固化促进剂, 固化剂为双氰胺、 芳香胺、 酚醛树脂及酸酐 化合物中的一种或多种混合物, 固化促进剂为咪唑类化合物及其衍生化合 物、 哌啶类化合物、 路易斯酸、 三苯基膦及有机金属络合物中的一种或多 种混合物。
7、 如权利要求 5 所述的复合材料, 其中, 所述热固性树脂组合物还 包括有阻燃剂及填料, 阻燃剂釆用含溴或无卤阻燃剂, 所述含溴阻燃剂为 十溴二苯醚、 十溴二苯乙烷、 溴化苯乙烯或乙撑双四溴邻苯二曱酰亚胺; 所述无卤阻燃剂为三 (2,6-二曱基苯基)膦、 10- ( 2,5-二羟基苯基) -9,10- 二氢 -9-氧杂 -10-膦菲 -10-氧化物、 2,6-二(2,6-二曱基苯基)膦基苯或 10-苯 基 -9 , 10-二氢 -9-氧杂 -10-膦菲 -10-氧化物、 苯氧基膦氰化合物、 磷酸酯、 磷酸酯盐化合物或水合金属化合物, 所述填料为有无机填料或有机填料, 无机填料选自结晶型二氧化硅、 熔融二氧化硅、 球形二氧化硅、 空心二氧 化硅、 玻璃粉、 氮化铝、 氮化硼、 碳化硅、 氢氧化铝、 氢氧化镁、 二氧化 钛、 钛酸锶、 钛酸钡、 氧化铝、 硫酸钡、 滑石粉、 硅酸钙、 碳酸钙、 勃姆 石、 硼酸锌及云母中的一种或多种; 有机填料选自聚四氟乙烯粉末、 聚苯 石充醚及聚醚砜粉末中的一种或多种。
8、 一种使用如权利要求 1 所述的复合材料制作的高频电路基板, 包 括: 数层互相叠合的半固化片及压覆于该叠合的半固化片一侧或两侧上的 铜箔, 该数层半固化片中至少一张半固化片由所述复合材料制作。
9、 一种如权利要求 8 所述的高频电路基板的制作方法, 包括如下步 骤:
步骤一、 按体积百分比提供复合材料各组分: 聚醚酰亚胺增强材料
10〜90%及热固性树脂组合物 10〜90%;
步骤二、 将热固性树脂组合物配制成胶液;
步骤三、 用上述制成的胶液浸渍聚醚酰亚胺增强材料, 烘烤, 得到半 固化片;
步骤四、 取上述半固化片数张进行叠合, 在叠合的半固化片的一侧或 两侧覆上铜箔, 在压机中进行固化制得所述高频电路基板, 固化温度为
150-300 °C , 固化压力 5~50Kg/cm2
10、 如权利要求 9所述的高频电路基板的制作方法, 其中, 所述聚醚 酰亚胺增强材料为聚醚酰亚胺纤维编织布、 聚醚酰亚胺无纺布或聚醚酰亚 胺玻纤纸。
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CN104723572A (zh) * 2015-03-31 2015-06-24 鹰领航空高端装备技术秦皇岛有限公司 耐高温、透微波的高硅氧耐火纤维-聚苯硫醚-聚醚砜复合材料的制备方法
CN106675322A (zh) * 2016-11-29 2017-05-17 安徽腾龙泵阀制造有限公司 一种耐腐耐磨的砂浆泵用涂料
CN112280252A (zh) * 2020-10-31 2021-01-29 武汉双键开姆密封材料有限公司 一种环氧组合物以及该组合物的应用
CN113337077A (zh) * 2021-07-29 2021-09-03 吉林大学 一种具有隔离结构的高导热电磁屏蔽聚醚醚酮复合材料及其制备方法和应用
CN114103306A (zh) * 2021-11-05 2022-03-01 江苏耀鸿电子有限公司 一种无卤无铅高Tg覆铜板及其加工工艺
CN115181419A (zh) * 2022-07-14 2022-10-14 重庆工商大学 一种乙烯基介孔二氧化硅及聚酰亚胺改性氰酸酯的方法
CN115466485A (zh) * 2022-09-20 2022-12-13 杭州老板电器股份有限公司 一种抽油烟机外壳用热固性树脂复合材料及其制备方法和应用
CN115926224A (zh) * 2022-10-20 2023-04-07 电子科技大学 一种高导热的封装载板用半固化片及使用其的覆铜板的制作
CN116656084A (zh) * 2023-06-26 2023-08-29 江苏耀鸿电子有限公司 一种用于高频覆铜板的阻燃型碳氢树脂及其制备方法
CN117549638A (zh) * 2023-11-15 2024-02-13 江苏耀鸿电子有限公司 一种耐高温阻燃bt树脂基覆铜板及其制备方法

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Cited By (17)

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CN104723572A (zh) * 2015-03-31 2015-06-24 鹰领航空高端装备技术秦皇岛有限公司 耐高温、透微波的高硅氧耐火纤维-聚苯硫醚-聚醚砜复合材料的制备方法
CN106675322A (zh) * 2016-11-29 2017-05-17 安徽腾龙泵阀制造有限公司 一种耐腐耐磨的砂浆泵用涂料
CN112280252A (zh) * 2020-10-31 2021-01-29 武汉双键开姆密封材料有限公司 一种环氧组合物以及该组合物的应用
CN112280252B (zh) * 2020-10-31 2023-04-25 武汉双键开姆密封材料有限公司 一种环氧组合物以及该组合物的应用
CN113337077A (zh) * 2021-07-29 2021-09-03 吉林大学 一种具有隔离结构的高导热电磁屏蔽聚醚醚酮复合材料及其制备方法和应用
CN113337077B (zh) * 2021-07-29 2022-05-17 吉林大学 一种具有隔离结构的高导热电磁屏蔽聚醚醚酮复合材料及其制备方法和应用
CN114103306A (zh) * 2021-11-05 2022-03-01 江苏耀鸿电子有限公司 一种无卤无铅高Tg覆铜板及其加工工艺
CN114103306B (zh) * 2021-11-05 2023-08-01 江苏耀鸿电子有限公司 一种无卤无铅高Tg覆铜板及其加工工艺
CN115181419A (zh) * 2022-07-14 2022-10-14 重庆工商大学 一种乙烯基介孔二氧化硅及聚酰亚胺改性氰酸酯的方法
CN115466485B (zh) * 2022-09-20 2024-02-27 杭州老板电器股份有限公司 一种抽油烟机外壳用热固性树脂复合材料及其制备方法和应用
CN115466485A (zh) * 2022-09-20 2022-12-13 杭州老板电器股份有限公司 一种抽油烟机外壳用热固性树脂复合材料及其制备方法和应用
CN115926224A (zh) * 2022-10-20 2023-04-07 电子科技大学 一种高导热的封装载板用半固化片及使用其的覆铜板的制作
CN115926224B (zh) * 2022-10-20 2024-05-14 电子科技大学 一种高导热的封装载板用半固化片及使用其的覆铜板的制作
CN116656084B (zh) * 2023-06-26 2023-12-29 江苏耀鸿电子有限公司 一种用于高频覆铜板的阻燃型碳氢树脂及其制备方法
CN116656084A (zh) * 2023-06-26 2023-08-29 江苏耀鸿电子有限公司 一种用于高频覆铜板的阻燃型碳氢树脂及其制备方法
CN117549638A (zh) * 2023-11-15 2024-02-13 江苏耀鸿电子有限公司 一种耐高温阻燃bt树脂基覆铜板及其制备方法
CN117549638B (zh) * 2023-11-15 2024-04-30 江苏耀鸿电子有限公司 一种耐高温阻燃bt树脂基覆铜板及其制备方法

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