WO2014012415A1 - 一种紫外激光变倍扩束系统及激光加工设备 - Google Patents
一种紫外激光变倍扩束系统及激光加工设备 Download PDFInfo
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- WO2014012415A1 WO2014012415A1 PCT/CN2013/077734 CN2013077734W WO2014012415A1 WO 2014012415 A1 WO2014012415 A1 WO 2014012415A1 CN 2013077734 W CN2013077734 W CN 2013077734W WO 2014012415 A1 WO2014012415 A1 WO 2014012415A1
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- 238000012545 processing Methods 0.000 title claims abstract description 36
- 230000003287 optical effect Effects 0.000 claims description 48
- 230000005540 biological transmission Effects 0.000 claims description 6
- 239000011295 pitch Substances 0.000 claims description 3
- 230000000694 effects Effects 0.000 description 6
- 210000001747 pupil Anatomy 0.000 description 6
- 238000013461 design Methods 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000007493 shaping process Methods 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010330 laser marking Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
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- 238000011160 research Methods 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
- G02B19/0009—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only
- G02B19/0014—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only at least one surface having optical power
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/095—Refractive optical elements
- G02B27/0955—Lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
- G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
- G02B19/0095—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with ultraviolet radiation
Definitions
- the invention belongs to the field of laser processing technology, and in particular relates to an ultraviolet laser zoom beam expanding system and a laser processing device.
- the light beam diameter ⁇ of the laser beam is very small (about 1 mm), and if such a thin beam is directly focused, the Rayleigh spot will be large.
- ⁇ 2.44 ⁇ f / D
- ⁇ the diameter of the Rayleigh plaque
- D the diameter of the entrance pupil of the focusing mirror
- f the focal length. It can be seen that the smaller D is, the larger the ⁇ is, and the weaker the energy of the focus point is, which will greatly reduce the processing precision of the system. Therefore, the optical system used for laser processing is generally equipped with a beam expander to expand the beam from the laser and then focus the laser to focus the mirror.
- variable magnification beam expanders are mostly 2 x ⁇ 8 x , and the zoom factor is small, which can not meet the needs of laser processing.
- large-magnification expansion it is only necessary to use a fixed-magnification beam expander, and it is impossible to achieve various magnification expansion requirements through one beam expander, which brings inconvenience to laser processing and affects the efficiency of laser processing.
- the object of the present invention is to provide an ultraviolet laser zoom-magnification system, which aims to solve the problem that the existing beam expanding mirror has limited beam expanding ability and a small adapting range.
- an ultraviolet laser zoom-magnification system including a first lens, a second lens, and a third lens that are sequentially disposed coaxially along a transmission direction of incident light rays; the first lens and the third lens All are plano-convex positive lenses, and the second lens is a convex-concave negative lens;
- the first lens includes a first curved surface and a second curved surface
- the second lens includes a third curved surface and a fourth curved surface
- the third lens includes a fifth curved surface and a sixth curved surface; the first to sixth curved surfaces Arranged in sequence along the direction of transmission of incident light;
- the curvature radii of the first to sixth curved surfaces are: ⁇ , -30 mm, 10 mm, 2.2 mm, ⁇ , -81 mm;
- the center thickness of the first to third lenses is: 2 mm, 1 mm, 4 mm;
- the outer diameters of the first to third lenses are: 10 mm, 3 mm, 34 mm;
- the ratio of the refractive index of the first to third lenses to the Abbe number is: 1.57:41, 1.48:68, 1.57:41;
- the distance between the second curved surface and the third curved surface on the optical axis is 6 ⁇ 37 mm; the distance between the fourth curved surface and the fifth curved surface on the optical axis is 114 ⁇ 125 mm.
- Each of the radius of curvature, the center thickness, the outer diameter, the ratio of the refractive index to the Abbe number, and the tolerance range of each of the pitches are both 5%.
- Another object of the present invention is to provide a laser processing apparatus including an ultraviolet laser, a beam expanding system for expanding a laser beam emitted from the ultraviolet laser, and focusing for focusing the beam after beam expansion
- the mirror, the beam expanding system adopts the ultraviolet laser zoom expansion beam system.
- the system can expand the incident ultraviolet laser beam to 2 to 16 times, and the beam expanding range greatly exceeds the conventional beam expanding mirror. It can adapt to more UV lasers with different exit diameters and divergence angles, which further expands the range of use of the beam expander system and improves the efficiency of laser processing. Moreover, the maximum beam expansion factor of the system is higher than that of the conventional beam expander, so that the shaping effect of the beam is better, thereby effectively improving the focusing effect of the beam, and improving the precision of the laser processing.
- the laser processing equipment using the beam expanding system has higher processing precision and higher processing efficiency.
- FIG. 1 is a schematic structural view of an ultraviolet laser zoom double beam expanding system according to an embodiment of the present invention
- FIG. 2 is a focus point dispersion diagram of an ultraviolet laser zoom-magnification system according to an embodiment of the present invention
- FIG. 3 is a graph showing a transfer function of an ultraviolet laser zoom-magnification system according to an embodiment of the present invention.
- FIG. 4 is a graph showing the energy concentration of the ultraviolet laser zoom-expansion system of the embodiment of the present invention.
- FIG. 1 is a schematic structural view of an ultraviolet laser zoom-expanding system according to an embodiment of the present invention. For convenience of description, only parts related to the present embodiment are shown.
- the ultraviolet light zooming system is mainly suitable for ultraviolet light beam expanding, especially ultraviolet light of 355 nm.
- the system includes a first lens L1, a second lens L2, and a third lens L3 that are coaxially disposed along a transmission direction of incident light.
- the first lens L1 is a plano-convex positive lens
- the second lens L2 is a convex-concave negative lens
- the third lens L3 is a plano-convex positive lens.
- the first lens L1 includes a first curved surface S1 and a second curved surface S2 arranged along the transmission direction of the incident light, that is, the first curved surface S1 and the second curved surface S2 serve as a light incident surface and a light exit surface, respectively.
- the second lens L2 includes a third curved surface S3 and a fourth curved surface S4, and the third lens L3 includes a fifth curved surface S5 and a sixth curved surface S6.
- the incident ray is transmitted along the first curved surface S1 toward the sixth curved surface S6, and is expanded and amplified after passing through the entire beam expanding system.
- the first curved surface S1 of the first lens L1 is a plane, the radius of curvature is ⁇ , the second curved surface S2 is convex outward with respect to the first curved surface S1, and the radius of curvature is -30 mm, wherein the negative sign represents the curved surface
- the center of the sphere is located in the object space of the curved surface.
- the positive sign (which is positive in the present embodiment without the negative sign) indicates that the center of the curved surface is located in the image space of the curved surface.
- the center thickness d1 of the first lens L1 was 2 mm, and the outer diameter D1 was 10 mm.
- Refractive index Nd1 and Abbe number of the first lens L1 The ratio of V d 1 is 1.57:41.
- the third curved surface S3 of the second lens L2 is convex toward the object side, the radius of curvature is 10 mm, and the fourth curved surface S4 is also convex toward the object side, but concave with respect to the third curved surface S3, the radius of curvature is 2.2 mm, and the second lens Refractive index Nd3 and Abbe number of L2
- the ratio of V d 3 is 1.48:68, and the center thickness d3 of the second lens L2 is 1 mm, and the outer diameter D2 is 3 mm.
- the tolerance range of each parameter of the second lens L2 is still 5%.
- the fifth curved surface S5 of the third lens L3 is a plane, the curvature is ⁇ , the sixth curved surface S6 is convex outward with respect to the fifth curved surface S5, the radius of curvature is -81 mm, and the refractive index Nd5 of the third lens L3 and the Abbe number V d
- the ratio of 5 is 1.57:41, the center thickness d5 is 4 mm, and the outer diameter D3 is 34 mm.
- the tolerance range of each parameter of the third lens L3 is 5%.
- the present invention defines the distance between the first lens L1 and the second lens L2, and the distance between the second lens L2 and the third lens L3, specifically, the exit surface of the first lens L1 (second The distance d2 between the curved surface S2) and the incident surface of the second lens L2 (the third curved surface S3) on the optical axis is 6 to 37 mm, the tolerance is 5%, and the exit surface of the second lens L2 (fourth curved surface S4) and the third surface
- the incident surface (the fifth curved surface S5) of the lens L3 has a pitch d4 on the optical axis of 114 to 125 mm and a tolerance of 5%.
- the beam expanding system can expand the incident ultraviolet laser beam to 2 to 16 times, and the beam expanding range greatly exceeds the traditional beam expanding mirror, which can adapt to more different exits.
- the ultraviolet laser with diameter and divergence angle further expands the range of use of the beam expander system and improves the efficiency of laser processing.
- the pull-in invariant quantification when the beam is enlarged, its divergence angle will decrease, and the maximum beam expansion factor of the system is higher than that of the conventional beam expander, which also makes the beam divergence angle smaller than the beam divergence angle.
- the shrinking effect of the traditional beam expander on the beam makes the parallelism of the outgoing beam better, and the focusing effect is better, which is more conducive to subsequent shaping and focusing in the laser processing process, and improve the processing precision.
- the system is suitable for UV lasers with a divergence angle of ⁇ 2 ⁇ 4 radians (ie, the divergence angle is 2 ⁇ 4 radians).
- the diameter of the entrance pupil is 2 ⁇ 8mm, and the diameter of the exit pupil can reach 4 ⁇ 32mm, the total optical length can be controlled within 135mm.
- the beam expander system can expand it 2 to 16 times; for a UV laser beam with a maximum exit diameter of 8 mm, the beam expander system can expand it 2 to 4 times.
- the beam splitting system has better focusing power (the shape of the diffuse spot is regular and the dispersion range is small, and the energy concentration is high, so that the precision and efficiency of the laser processing are high.
- the parameters of the surface curvature radius, the ratio of the refractive index to the Abbe number, the center thickness and the outer diameter of the first, second, and third lenses may be selected from the specific parameters provided above. That is, the radius of curvature of the first curved surface S1 of the first lens L1 is ⁇ , the radius of curvature of the second curved surface S2 is -30 mm, the center thickness d1 is 2 mm, and the outer diameter D1 is 10 mm. Refractive index Nd1 and Abbe number of the first lens L1 The ratio of V d 1 is 1.57:41. The second lens L2 and the third lens L3 are similar. This preferred solution has a better beam expanding effect, and is particularly suitable for UV expansion at 355 nm.
- the distance d2 on the optical axis of the second curved surface S2 and the third curved surface S3 and the distance d4 on the optical axis of the fourth curved surface S4 and the fifth curved surface S5 may be adopted.
- Different designs are used to obtain different beam expansion factors ⁇ .
- the distance d2 between the second curved surface S2 and the third curved surface S3 on the optical axis may be set to 36.9 mm, and the distance d4 between the fourth curved surface S4 and the fifth curved surface S5 on the optical axis may be set. It is set at 114.3 mm, of course, this parameter is a preferred parameter, which also has a tolerance range of 5%. At this time, the expansion ratio ⁇ of the system is twice.
- the distance d2 between the second curved surface S2 and the third curved surface S3 on the optical axis may be set to 32.6 mm, and the distance d4 between the fourth curved surface S4 and the fifth curved surface S5 on the optical axis may be set. Set to 118.8mm with a tolerance of 5%. At this time, the system's beam expansion factor ⁇ is 4 times.
- the distance d2 between the second curved surface S2 and the third curved surface S3 on the optical axis may be set to 27.8 mm, and the distance d4 between the fourth curved surface S4 and the fifth curved surface S5 on the optical axis may be set. Set to 120mm with a tolerance of 5%. At this time, the system has a beam expansion factor ⁇ of 6 times.
- the distance d2 between the second curved surface S2 and the third curved surface S3 on the optical axis may be set to 23.3 mm, and the distance d4 between the fourth curved surface S4 and the fifth curved surface S5 on the optical axis may be set. Set to 120.5mm with a tolerance of 5%. At this time, the expansion ratio ⁇ of the system is 8 times.
- the distance d2 between the second curved surface S2 and the third curved surface S3 on the optical axis may be set to 19.6 mm, and the distance d4 between the fourth curved surface S4 and the fifth curved surface S5 on the optical axis may be set. Set to 120.8mm with a tolerance of 5%. At this time, the expansion ratio ⁇ of the system is 10 times.
- the distance d2 between the second curved surface S2 and the third curved surface S3 on the optical axis may be set to 14.4 mm, and the distance d4 between the fourth curved surface S4 and the fifth curved surface S5 on the optical axis may be set. Set to 121.1mm with a tolerance of 5%. At this time, the system's beam expansion factor ⁇ is 12 times.
- the distance d2 between the second curved surface S2 and the third curved surface S3 on the optical axis may be set to 9.8 mm, and the distance d4 between the fourth curved surface S4 and the fifth curved surface S5 on the optical axis may be set. Set to 121.3mm with a tolerance of 5%. At this time, the system's beam expansion factor ⁇ is 14 times.
- the distance d2 between the second curved surface S2 and the third curved surface S3 on the optical axis may be set to 6 mm, and the distance d4 between the fourth curved surface S4 and the fifth curved surface S5 on the optical axis may be set. It is 121.4mm with a tolerance of 5%. At this time, the system's beam expansion factor ⁇ is 16 times.
- a beam expanding effect of 2 to 16 times can be obtained.
- the relative distances of the three lenses can be adjusted according to the exit pupil diameter, the divergence angle of the actual laser, and the specific conditions of the focusing mirror. , that is, adjusting the surface spacing d2 and d4, and then appropriately expanding the laser beam, so that the expanded laser beam can meet the requirements of laser processing precision and Achieve ideal coupling with different laser processing focusing mirrors to improve the quality and efficiency of laser processing.
- the ultraviolet laser zoom expansion beam expanding system provided by the invention can realize 2 ⁇ 16 times expansion, the beam expanding range is much larger than the traditional beam expanding mirror, can obviously improve the laser processing precision and quality, has wide application range, and is suitable for various ultraviolet lasers.
- the light emitted by the laser is expanded by a beam expander system as a device, and then the beam after the beam is focused by the focusing mirror of the laser processing apparatus onto the workpiece to be processed.
- the laser processing equipment using the beam expanding system has higher processing precision and higher processing efficiency.
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Abstract
Description
d2(mm) | d4(mm) | β |
36.9 | 114.3 | 2 |
32.6 | 118.8 | 4 |
27.8 | 120 | 6 |
23.3 | 120.5 | 8 |
19.6 | 120.8 | 10 |
14.4 | 121.1 | 12 |
9.8 | 121.3 | 14 |
6 | 121.4 | 16 |
Claims (10)
- 一种紫外激光变倍扩束系统,其特征在于,包括沿入射光线的传输方向依次共轴设置的第一透镜、第二透镜及第三透镜;所述第一透镜和第三透镜均为平凸型正透镜,所述第二透镜为凸凹型负透镜;所述第一透镜包括第一曲面和第二曲面,所述第二透镜包括第三曲面和第四曲面,所述第三透镜包括第五曲面和第六曲面;所述第一至第六曲面沿入射光线的传输方向依次排布;所述第一至第六曲面的曲率半径依次为:∞,-30mm,10mm,2.2mm,∞,-81mm;所述第一至第三透镜的中心厚度依次为:2mm,1mm,4mm;所述第一至第三透镜的外径依次为:10mm,3mm,34mm;所述第一至第三透镜的折射率与阿贝数的比例依次为:1.57:41,1.48:68,1.57:41;所述第二曲面与第三曲面在光轴上的间距为6~37mm;所述第四曲面与第五曲面在光轴上的间距为114~125mm。各所述曲率半径、中心厚度、外径、折射率与阿贝数的比例以及各所述间距的公差范围均为5%。
- 如权利要求1所述的紫外激光变倍扩束系统,其特征在于,所述第二曲面与第三曲面在光轴上的间距为36.9mm;所述第四曲面与第五曲面在光轴上的间距为114.3mm。
- 如权利要求1所述的紫外激光变倍扩束系统,其特征在于,所述第二曲面与第三曲面在光轴上的间距为32.6mm;所述第四曲面与第五曲面在光轴上的间距为118.8mm。
- 如权利要求1所述的紫外激光变倍扩束系统,其特征在于,所述第二曲面与第三曲面在光轴上的间距为27.8mm;所述第四曲面与第五曲面在光轴上的间距为120mm。
- 如权利要求1所述的紫外激光变倍扩束系统,其特征在于,所述第二曲面与第三曲面在光轴上的间距为23.3mm;所述第四曲面与第五曲面在光轴上的间距为120.5mm。
- 如权利要求1所述的紫外激光变倍扩束系统,其特征在于,所述第二曲面与第三曲面在光轴上的间距为19.6mm;所述第四曲面与第五曲面在光轴上的间距为120.8mm。
- 如权利要求1所述的紫外激光变倍扩束系统,其特征在于,所述第二曲面与第三曲面在光轴上的间距为14.4mm;所述第四曲面与第五曲面在光轴上的间距为121.1mm。
- 如权利要求1所述的紫外激光变倍扩束系统,其特征在于,所述第二曲面与第三曲面在光轴上的间距为9.8mm;所述第四曲面与第五曲面在光轴上的间距为121.3mm。
- 如权利要求1所述的紫外激光变倍扩束系统,其特征在于,所述第二曲面与第三曲面在光轴上的间距为6mm;所述第四曲面与第五曲面在光轴上的间距为121.4mm。
- 一种激光加工设备,包括紫外激光器、用于对所述紫外激光器发出的激光进行扩束的扩束系统,以及用于将经过扩束后的光束进行聚焦的聚焦镜,其特征在于,所述扩束系统采用权利要求1~9任一项所述的紫外激光变倍扩束系统。
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JP2015521953A JP5905995B2 (ja) | 2012-07-18 | 2013-06-24 | 紫外線レーザーズームビーム拡大システム及びレーザー加工機器 |
US14/415,838 US9069170B1 (en) | 2012-07-18 | 2013-06-24 | Ultraviolet laser zoom beam expanding system and laser processing equipment |
DE112013003558.8T DE112013003558B4 (de) | 2012-07-18 | 2013-06-24 | Zoombares Strahlaufweitungssystem für einen Ultraviolettlaser und Laserbearbeitungsvorrichtung |
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CN201210248607.2 | 2012-07-18 | ||
CN201210248607.2A CN103576317B (zh) | 2012-07-18 | 2012-07-18 | 一种紫外激光变倍扩束系统及激光加工设备 |
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CN103576318B (zh) * | 2012-07-18 | 2015-09-09 | 大族激光科技产业集团股份有限公司 | 一种绿光激光变倍扩束系统及激光加工设备 |
CN105527716B (zh) * | 2016-02-03 | 2018-09-21 | 上海仪万光电科技有限公司 | 一种紫外激光连续变倍扩束镜 |
CN110398841A (zh) * | 2018-04-24 | 2019-11-01 | 天津凯普林激光科技有限公司 | 一种小型化紫外激光器变倍扩束装置 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0868936A (ja) * | 1994-08-31 | 1996-03-12 | Toshiba Corp | アフォ−カル結像光学装置およびその光学装置を用いたレ−ザ装置 |
JPH0961709A (ja) * | 1995-08-24 | 1997-03-07 | Dainippon Screen Mfg Co Ltd | 変倍ビームエキスパンダ |
CN101414052A (zh) * | 2008-11-26 | 2009-04-22 | 中国科学院上海技术物理研究所 | 伽利略式多波长可变倍激光扩束准直系统 |
KR20100048092A (ko) * | 2008-10-30 | 2010-05-11 | 삼성전기주식회사 | 줌 확대기 |
CN101887173A (zh) * | 2010-06-22 | 2010-11-17 | 深圳市大族激光科技股份有限公司 | 紫外激光变倍扩束镜 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55151612A (en) * | 1979-05-15 | 1980-11-26 | Canon Inc | Zoom expander |
US6654183B2 (en) * | 1999-12-15 | 2003-11-25 | International Business Machines Corporation | System for converting optical beams to collimated flat-top beams |
US7706078B2 (en) * | 2006-09-14 | 2010-04-27 | Semiconductor Energy Laboratory Co., Ltd. | Laser light irradiation apparatus and laser light irradiation method |
CN100476494C (zh) * | 2006-12-30 | 2009-04-08 | 深圳市大族激光科技股份有限公司 | 激光变倍扩束镜头 |
CN100510831C (zh) | 2006-12-31 | 2009-07-08 | 深圳市大族激光科技股份有限公司 | 变倍扩束镜 |
DE102009025182B4 (de) | 2008-06-12 | 2015-01-22 | Jenoptik Optical Systems Gmbh | Optischer Strahlaufweiter und Bearbeitungsverfahren mit einem solchen Strahlaufweiter |
CN101788716B (zh) * | 2010-02-24 | 2011-09-28 | 深圳市大族激光科技股份有限公司 | 一种激光扩束系统 |
CN102004319B (zh) * | 2010-09-30 | 2012-07-04 | 深圳市大族激光科技股份有限公司 | 一种紫外变倍扩束镜 |
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- 2013-06-24 JP JP2015521953A patent/JP5905995B2/ja active Active
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0868936A (ja) * | 1994-08-31 | 1996-03-12 | Toshiba Corp | アフォ−カル結像光学装置およびその光学装置を用いたレ−ザ装置 |
JPH0961709A (ja) * | 1995-08-24 | 1997-03-07 | Dainippon Screen Mfg Co Ltd | 変倍ビームエキスパンダ |
KR20100048092A (ko) * | 2008-10-30 | 2010-05-11 | 삼성전기주식회사 | 줌 확대기 |
CN101414052A (zh) * | 2008-11-26 | 2009-04-22 | 中国科学院上海技术物理研究所 | 伽利略式多波长可变倍激光扩束准直系统 |
CN101887173A (zh) * | 2010-06-22 | 2010-11-17 | 深圳市大族激光科技股份有限公司 | 紫外激光变倍扩束镜 |
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JP5905995B2 (ja) | 2016-04-20 |
DE112013003558B4 (de) | 2019-01-03 |
CN103576317A (zh) | 2014-02-12 |
US9069170B1 (en) | 2015-06-30 |
JP2015524940A (ja) | 2015-08-27 |
CN103576317B (zh) | 2015-10-14 |
US20150192778A1 (en) | 2015-07-09 |
DE112013003558T5 (de) | 2015-04-09 |
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