WO2013185401A1 - 一种光罩及其修正方法 - Google Patents
一种光罩及其修正方法 Download PDFInfo
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- WO2013185401A1 WO2013185401A1 PCT/CN2012/078669 CN2012078669W WO2013185401A1 WO 2013185401 A1 WO2013185401 A1 WO 2013185401A1 CN 2012078669 W CN2012078669 W CN 2012078669W WO 2013185401 A1 WO2013185401 A1 WO 2013185401A1
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- reticle
- area
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- region
- light
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
Definitions
- the present invention relates to the field of liquid crystal display technology, and in particular, to a photomask and a method for modifying the same.
- the mask In the production of liquid crystal displays, the mask (MASK) is an indispensable component, such as the fabrication of thin film field effect transistors (Thin Film Transistor, TFT) Pixel area of the substrate, or color filter (Color In the process of the color-resistance regions (R, G, and B) of the Filter, CF) substrate, a photomask is required.
- TFT thin film field effect transistors
- Color filter Color In the process of the color-resistance regions (R, G, and B) of the Filter, CF) substrate.
- the production of the photomask is not only long in cycle time but also high in cost, such as the cost of a single-piece photomask of up to one million yuan.
- FIG. 1 is a schematic top view of a reticle of the prior art
- FIG. 2 is a partial cross-sectional structural view of FIG.
- the reticle 10 shown in FIG. 1 includes a transparent glass 11 , and a chrome film layer 12 superposed on the transparent glass 11 , located in the same layer as the chrome film layer 12 and formed between the chrome film layers 12 .
- the light transmissive region 13 wherein the chromium film layer 12 is opaque, the chromium film layer 12 and the light transmissive region 13 together form a reticle pattern.
- the reticle 10 Since the reticle 10 is used at a relatively high frequency, it is highly susceptible to damage; moreover, it is sometimes necessary to partially adjust the reticle pattern of the reticle 10, such as widening the chrome layer 12 . In both cases, the mask 10 needs to be returned to the original factory for recoating to be corrected, and the portion that is damaged or needs to be widened is plated with a chromium film layer.
- this method is not only expensive (basically costs hundreds of thousands of yuan), but also has a long correction period, which affects the production efficiency of liquid crystal.
- An object of the present invention is to provide a method for correcting a reticle to solve the technical problems of high cost, long cycle, and affecting liquid crystal production efficiency of the reticle in the prior art.
- the present invention constructs a method of modifying a reticle, wherein the method comprises the following steps:
- the reticle having a opaque area to be supplemented
- the reticle template having a schematic pattern, the schematic pattern not forming the shading to be supplemented
- the mask pattern of the mask before the area is the same shape
- the pattern of the printing area is the same as the pattern shape of the reference area, and the printing area has the same ratio as the reticle pattern of the reticle;
- An emptying member may be embossed and the printable area is imprinted on the smearable member to form the repaired area on the smearable member, the pattern of the repaired area having the same reticle pattern as the reticle proportion;
- the stencil that is formed with the hollowed out area is attached to the reticle, and the hollowed out area corresponds to the opaque area to be supplemented;
- the method further comprises the steps of:
- the method further comprises the following steps: performing hollowing treatment on the repaired area of the detachable part to form a hollowed out area:
- the four aligning regions constitute a square region, and the four aligning regions are respectively located in the square region.
- the detachable member is square, the detachable member includes four alignment portions, and the four alignment portions are respectively located at four corners of the detachable member;
- the four alignment portions of the detachable member and the four alignment regions of the reticle are respectively separated by light rays and a magnifying glass Perform a four-corner alignment.
- the light shielding material is a black ink.
- the opaque area to be supplemented is a defective defect on the reticle that needs to be repaired.
- the opaque area to be supplemented is a opaque area on the reticle that needs to be expanded.
- Another object of the present invention is to provide a method for modifying a reticle to solve the technical problems of high cost, long cycle, and affecting liquid crystal production efficiency of the reticle in the prior art.
- the present invention constructs a method of correcting a reticle, the method comprising the following steps:
- the shape of the pattern is the same;
- the stencil that is formed with the hollowed out area is attached to the reticle, and the hollowed out area corresponds to the opaque area to be supplemented;
- a light shielding material is coated on the hollowable member on which the hollowed out region is formed to form a light shielding layer in the light shielding region to be supplemented.
- the step of forming a repairing area on the smearable member according to the pattern of the reference area comprises:
- the pattern of the printing area is the same as the pattern shape of the reference area, and the printing area and the light of the photomask
- the cover patterns have the same ratio
- the printable sheet is attached to the detachable member, and the printable area is embossed to the smearable member to form the repaired area on the smearable member.
- the method further comprises the steps of:
- the method further comprises the following steps: performing hollowing treatment on the repaired area of the detachable part to form a hollowed out area:
- the four aligning regions are selected on the reticle, the four aligning regions constitute a square region, and the four aligning regions are respectively located at four corners of the square region. ;
- the detachable member is square, the detachable member includes four alignment portions, and the four alignment portions are respectively located at four corners of the detachable member;
- the four alignment portions of the detachable member and the four alignment regions of the reticle are respectively separated by light rays and a magnifying glass Perform a four-corner alignment.
- the light shielding material is a black ink.
- the opaque area to be supplemented is a defective defect on the reticle that needs to be repaired.
- the opaque area to be supplemented is a opaque area on the reticle that needs to be expanded.
- the method further includes the following steps:
- the present invention constructs a photomask including a first light shielding region formed by a first light shielding material and a second light shielding region, wherein the second light shielding region is formed by a second light shielding material The coating is formed, wherein the second light shielding material is formed after the second light shielding material.
- the second light-shielding material is a black ink.
- the reticle of the present invention has a opaque area to be supplemented, such as a defective defect or a opaque area that needs to be expanded, and the present invention enlarges the pattern corresponding to the opaque area to be replenished into the stencilable member in the reticle template.
- the hollowed out area is a light-shielding area corresponding to the reticle to be supplemented
- the stencil is attached to the reticle so that the hollowed out area of the detachable member is aligned with the light a light-shielding region of the cover to be supplemented, and a light-shielding material is coated on the hollowable member, so that the light-shielding material is filled into the light-shielding region to be supplemented to form a light-shielding layer
- the invention is not only low in cost, but also has a short correction period, and The correction is more efficient.
- FIG. 1 is a schematic top plan view of a reticle in the prior art
- Figure 2 is a schematic cross-sectional view taken along line M-M' of Figure 1;
- FIG. 3 is a schematic flow chart of a preferred embodiment of a method for modifying a photomask according to the present invention
- FIG. 4A-4I are schematic structural views of the mask modification process of FIG. 3;
- 5A-5C are schematic structural views of another preferred embodiment of correcting a reticle in the present invention.
- FIG. 6 is a schematic structural view of a preferred embodiment of a photomask provided by the present invention.
- FIG. 3 is a schematic flow chart of a preferred embodiment of a method for modifying a photomask according to the present invention.
- step S301 the stencil 20, the reticle 30, and the reticle template 40 are provided. Please refer to the reticle 30 of FIG. 4A, the reticle template 40 of FIG. 4B, and the smearable member 20 of FIG. 4C.
- the reticle 30 of FIG. 4A has a light-shielding area 33 to be supplemented, and the light-shielding area 33 to be supplemented is a defect of the reticle 30, which may be generated during the process of using the reticle 30, and This may be produced during the process of making the reticle 30.
- the presence of the defective defect causes the substrate (such as a TFT substrate) formed by the photomask 30 to be defective, which affects the yield of the product.
- a reference area 43 is selected in the schematic pattern of the reticle template 40, and the reference area 43 is corresponding to the opaque area 33 of the reticle 30 to be supplemented. Please refer to FIG. 4A together. Figure 4D.
- the reference area 43 corresponds to a square area formed by the four alignment areas 34 on the reticle 30.
- step S303 a printing plate 50 is provided, and a printing area 51 is formed on the printing plate 50 according to the reference area 43, the printing area 51 and the reticle pattern of the reticle 30 have the same ratio, please See Figure 4E together.
- step S304 the printing zone 51 is printed to the stencil 20 to form a repairing area 21 on the stencil 20, the patching area 21 and the reticle pattern of the reticle 30 having For the same ratio, please refer to Figure 4F.
- step S305 the hollowable member 20 is hollowed out to form the hollowed out region 23 in the repairing area 21, and four alignment portions 22 are formed at the same time. Please refer to FIG. 4G together.
- step S306 the stencil 20 formed with the hollowed out area 23 is attached to the reticle 30, and the hollowed out area 23 corresponds to the opaque area 33 to be supplemented. Please refer to FIG. 4H together.
- step S307 a light shielding material is coated on the hollowable member 20 on which the hollowed out region 23 is formed.
- the light-shielding material is preferably a black ink.
- the advantage of using the black ink is that the cost is low and the cost can be reduced.
- the light-shielding material of other materials may also be used in the specific implementation process, which is not enumerated here.
- step S308 the detachable member 20 is removed, please refer to FIG. 4I together.
- the light-shielding region 33 to be supplemented is formed with a light-shielding layer 35 by being coated with a light-shielding material.
- step S309 a certain photoresist layer is exposed using the photomask 30 on which the light shielding layer 35 is formed, and then development processing is performed. It is checked whether the light shielding layer 35 is shielded from light. If the photoresist layer corresponding to the light shielding layer 35 is not etched, the correction is successful. Otherwise, if the correction fails, the process proceeds to step S301.
- the photomask 30 has a light shielding area 31, a light transmission area 32, a light shielding area 33 to be supplemented, and a matching area 34 selected according to the light shielding area 33 to be supplemented.
- the light shielding area 31 is configured to block light in a mask process, and the light transmissive area 32 is used to transmit light in the mask process, and the photoresist layer corresponding to the light shielding area 31 is not irradiated with light, so It remains during the development process; the corresponding photoresist layer of the light-transmitting region 32 is irradiated with the transmitted light, and a chemical reaction occurs inside the film, so that it is etched away during the development process.
- the present invention in order to more accurately correct the to-be-replenished light-shielding region 33, the present invention also selects a registration region 34.
- the four alignment regions 34 selected by the present invention form a square region, and the four alignment regions 34 are respectively located at the four corners of the square region, and the alignment region 34 is used for the light shielding region 33 to be supplemented. Make accurate circled positioning.
- Each of the alignment regions 34 has a first alignment pattern, and the first alignment pattern includes a corner of each of the four annular adjacent light shielding regions 31, and the four light shielding regions 33 are surrounded by Light transmissive area 32.
- the alignment area 34 may also be selected in other forms as long as the accurate alignment of the light-shielding area 33 to be supplemented can be performed, which is not enumerated here.
- the reticle template 40 is marked with a schematic pattern having the same shape as the reticle pattern of the reticle 30 before the opaque region 33 to be supplemented is formed.
- the schematic pattern on the reticle template 40 is different from the reticle pattern on the reticle 30, and the schematic pattern on the reticle template 40 is on the reticle 30.
- the ratio of the mask pattern is, for example, 1:5.
- the schematic pattern on the mask template 40 can also be the same as the ratio of the mask pattern on the mask 30, as long as the mask template 40 is convenient. Imprint can be.
- the reticle pattern of the reticle 30 is a pattern formed by the opaque region 31 and the light transmissive region 32.
- the reticle template 40 includes a light-shielding identification area 41 for identifying the light-shielding area 31 of the reticle 30 for identifying the light-transmissive identification area of the light-transmissive area 32 of the reticle 30 . 42.
- the smokable member 20 is preferably square in shape that is substantially the same size as the square region circled by the four alignment regions 34 of the reticle 30.
- the squeezable member 20 is preferably a transparent film, and may of course be of other materials, such as a cleavable sheet, which will not be described in detail herein.
- the size of the print zone 51 is substantially the same as the square area circled by the four alignment zones 34 on the reticle 30.
- the printing plate 50 can be an ordinary paper, as long as the reference area 43 can be enlarged and imprinted on the printing plate 50 to form the printing area 51, which is not enumerated here.
- the repairing area 21 has a pattern identical to the shape and size of the printing area 51, and the repairing area 21 includes a repairing light-shielding area 211 and a repairing light-transmitting area 212.
- the printing area 51 can be directly expanded to the removable member 20 to form the repairing area 21, which can omit the printing plate 50 in step S303, thereby saving cost.
- the hollowed out area 23 corresponds to the light-shielding area 33 of the reticle 30 to be supplemented
- the four aligning parts 22 respectively correspond to the four aligning areas 34 of the reticle 30.
- Each of the alignment portions 22 has a second alignment pattern that is the same size and shape as the first alignment pattern of each of the positioning regions 34 on the reticle 30.
- the four alignment portions 22 respectively correspond to the four alignment regions 34 on the reticle 30. So that the hollowed out area 23 is aligned with the light-shielding area 33 to be supplemented.
- the stencil 20 in which the hollowed-out region 23 is formed is attached to the reticle 30, the four corners are aligned using light rays and a magnifying glass, so that the four alignment portions 22 of the detachable member 20 are The four alignment regions 34 of the reticle 30 are respectively aligned, thereby achieving accurate alignment of the hollow region 23 and the light-shielding region 33 to be supplemented.
- the method of correcting the reticle of the present invention is not limited to correcting the defective defect.
- the reticle that is complete but needs to expand the opaque area can be corrected, as shown in FIGS. 5A to 5C.
- the photomask 50 includes a light-shielding region 51 and a light-transmitting region 52. Due to the requirements of the product to be produced, it is necessary to enlarge the width of the light-shielding region 51 in the direction A, as shown in FIG. 5A. At this time, if the photomask 50 is returned to the original factory for expansion, there is no doubt that there is still a problem of high cost and long cycle, and the above-mentioned problem can be avoided by using the correction method of the photomask provided by the present invention.
- a stencil 60 and a reticle template are provided, wherein the reticle template is, for example, the specification of the reticle 50, and the reticle template has the same shape as the reticle 50.
- Mask pattern The pattern of the mask template is then enlarged and printed to the hollowable member 60, and then the hollowable member 60 is hollowed out to form an expanded hollow region 61, as shown in FIG. 5B.
- the expansion hollow area 61 corresponds to the light shielding area 53 to be supplemented by the photomask 50.
- the stencil 60 formed in the expanded hollow region 61 of FIG. 5B is then attached to the reticle 50 of FIG. 5A such that the expanded hollow region 61 on the detachable member 60 is aligned with the reticle 50.
- the light shielding area 53 is to be supplemented.
- a light-shielding material is coated on the hollowable member 60 on which the expanded hollow region 61 is formed, and finally the hollowable member 60 in which the expanded hollowed portion 61 is formed is removed, and the photomask 50 is formed as shown in FIG. 5C.
- the shape of the light-shielding material coated on the light-shielding region 53 to be supplemented forms the light-shielding layer 70.
- FIG. 6 is a schematic structural view of a photomask according to a preferred embodiment of the present invention.
- the reticle 80 includes a light shielding area 81 and a light transmission area 82, and the light shielding area 81 includes a first light shielding area 811 and a second light shielding area 812, wherein the first light shielding area 811 and the second light shielding area 812
- the light shielding material of the first light shielding region 811 is, for example, metallic chromium
- the material of the second light shielding region 812 is, for example, a lower cost light shielding material such as black ink.
- the second light-shielding region 812 is formed by coating after forming the first light-shielding region 811.
- FIGS. 4A to 4I please refer to the schematic diagram of the mask repair process of FIGS. 4A to 4I, which will not be described in detail herein.
- the reticle of the present invention has a opaque area to be supplemented, such as a defective defect or a opaque area that needs to be expanded, and the present invention enlarges the pattern corresponding to the opaque area to be replenished into the stencilable member in the reticle template.
- the hollowed out area is a light-shielding area corresponding to the reticle to be supplemented
- the stencil is attached to the reticle so that the hollowed out area of the detachable member is aligned with the light a light-shielding region of the cover to be supplemented, and a light-shielding material is coated on the hollowable member, so that the light-shielding material is filled into the light-shielding region to be supplemented to form a light-shielding layer
- the invention is not only low in cost, but also has a short correction period, and The correction is more efficient.
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Abstract
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Claims (16)
- 一种光罩的修正方法,其中所述方法包括以下步骤:提供可镂空件、光罩、光罩模板、打印板以及光刻胶层,所述光罩具有待补充遮光区,所述光罩模板具有示意图案,该示意图案与未形成所述待补充遮光区之前的光罩的光罩图案形状相同;在所述光罩模板的示意图案中选定一参照区,并使得所述参照区对应所述光罩的待补充遮光区,根据所述光罩模板中选定的参照区在所述打印板上形成一打印区,所述打印区的图案与所述参照区的图案形状相同,且所述打印区与所述光罩的光罩图案具有相同的比例;将所述打印板贴合所述可镂空件,并将所述打印区压印于所述可镂空件,以在所述可镂空件上形成所述修补区,该修补区的图案与所述光罩的光罩图案具有相同的比例;对所述可镂空件的修补区进行镂空处理形成镂空区,所述镂空区对应所述光罩的待补充遮光区;将形成有所述镂空区的可镂空件贴合所述光罩,并使得所述镂空区对应所述待补充遮光区;在形成有所述镂空区的可镂空件上涂布遮光材料,以在所述待补充遮光区形成一遮光层;使用形成有所述遮光层的光罩对所述光刻胶层进行曝光,之后对所述光刻胶层进行显影处理;检查所述遮光层对应的光刻胶层是否刻蚀掉,若被刻蚀掉,则重新对所述光罩进行修正。
- 根据权利要求1所述的光罩的修正方法,其中在提供具有待补充遮光区的光罩后,所述方法还包括以下步骤:在所述待补充遮光区所属区域选定定位区;其中对所述可镂空件的修补区进行镂空处理形成镂空区的同时,还包括以下步骤:在所述可镂空件上形成对位部,并使得所述对位部对应所述光罩上选定的定位区;其中在将形成有所述镂空区的可镂空件贴合所述光罩时,还包括以下步骤:将所述可镂空件的对位部对齐所述光罩的对位区,以使得所述可镂空件的镂空区对齐所述光罩的待补充遮光区。
- 根据权利要求2所述的光罩的修正方法,其中所述光罩上选定四个对位区,该四个对位区构成一方形区域,且所述四个对位区分别位于该方形区域的四角;其中所述可镂空件为方形,所述可镂空件上包括四个对位部,该四个对位部分别位于所述可镂空件的四角;在将所述可镂空件的对位部对齐所述光罩的对位区时,通过光线以及放大镜将所述可镂空件的四个对位部与所述光罩的四个对位区分别进行四角对位。
- 根据权利要求1所述的光罩的修正方法,其中所述遮光材料为黑色油墨。
- 根据权利要求1所述的光罩的修正方法,其中所述待补充遮光区为所述光罩上需要修补的残缺缺陷。
- 根据权利要求1所述的光罩的修正方法,其中所述待补充遮光区为所述光罩上需要扩充的遮光区。
- 一种光罩的修正方法,其中所述方法包括以下步骤:提供可镂空件、光罩及光罩模板,所述光罩具有待补充遮光区,所述光罩模板具有示意图案,该示意图案与未形成所述待补充遮光区之前的光罩的光罩图案形状相同;在所述光罩模板的示意图案中选定一参照区,并使得所述参照区对应所述光罩的待补充遮光区,根据所述参照区的图案在所述可镂空件上形成一修补区,该修补区的图案与所述光罩的光罩图案具有相同的比例;对所述可镂空件的修补区进行镂空处理形成镂空区,所述镂空区对应所述光罩的待补充遮光区;将形成有所述镂空区的可镂空件贴合所述光罩,并使得所述镂空区对应所述待补充遮光区;在形成有所述镂空区的可镂空件上涂布遮光材料,以在所述待补充遮光区形成一遮光层。
- 根据权利要求7所述的光罩的修正方法,其中根据所述参照区的图案在所述可镂空件上形成一修补区的步骤具体包括:提供一打印板;根据所述光罩模板中选定的参照区在所述打印板上形成一打印区,所述打印区的图案与所述参照区的图案形状相同,所述打印区与所述光罩的光罩图案具有相同的比例;将所述打印板贴合所述可镂空件,并将所述打印区压印于所述可镂空件,以在所述可镂空件上形成所述修补区。
- 根据权利要求7所述的光罩的修正方法,其中在提供具有待补充遮光区的光罩后,所述方法还包括以下步骤:在所述待补充遮光区所属区域选定定位区;其中对所述可镂空件的修补区进行镂空处理形成镂空区的同时,还包括以下步骤:在所述可镂空件上形成对位部,并使得所述对位部对应所述光罩上选定的定位区;其中在将形成有所述镂空区的可镂空件贴合所述光罩时,还包括以下步骤:将所述可镂空件的对位部对齐所述光罩的对位区,以使得所述可镂空件的镂空区对齐所述光罩的待补充遮光区。
- 根据权利要求9所述的光罩的修正方法,其中所述光罩上选定四个对位区,该四个对位区构成一方形区域,且所述四个对位区分别位于该方形区域的四角;其中所述可镂空件为方形,所述可镂空件上包括四个对位部,该四个对位部分别位于所述可镂空件的四角;在将所述可镂空件的对位部对齐所述光罩的对位区时,通过光线以及放大镜将所述可镂空件的四个对位部与所述光罩的四个对位区分别进行四角对位。
- 根据权利要求7所述的光罩的修正方法,其中所述遮光材料为黑色油墨。
- 根据权利要求7所述的光罩的修正方法,其中所述待补充遮光区为所述光罩上需要修补的残缺缺陷。
- 根据权利要求7所述的光罩的修正方法,其中所述待补充遮光区为所述光罩上需要扩充的遮光区。
- 根据权利要求7所述的光罩的修正方法,其中在所述可镂空件上涂布遮光材料形成所述遮光层后,所述方法还包括以下步骤:提供一光刻胶层;使用形成有所述遮光层的光罩对所述光刻胶层进行曝光,之后对所述光刻胶层进行显影处理;检查所述遮光层对应的光刻胶层是否刻蚀掉,若被刻蚀掉,则重新对所述光罩进行修正。
- 一种光罩,其中包括第一遮光区和第二遮光区,所述第一遮光区由第一遮光材料形成,所述第二遮光区由第二遮光材料涂布形成,其中所述第二遮光材料是形成于所述第二遮光材料之后。
- 根据权利要求15所述的光罩,其中所述第二遮光材料为黑色油墨。
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CN110956196A (zh) * | 2019-10-11 | 2020-04-03 | 东南大学 | 一种城市建筑物窗墙比自动识别方法 |
WO2023108820A1 (zh) * | 2021-12-16 | 2023-06-22 | 武汉华星光电半导体显示技术有限公司 | 显示面板及其制作方法、移动终端 |
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CN103969945B (zh) * | 2013-01-25 | 2018-08-24 | 上海微电子装备(集团)股份有限公司 | 刮伤掩模修补装置及方法 |
CN106569387B (zh) * | 2015-10-09 | 2021-03-23 | 中芯国际集成电路制造(北京)有限公司 | 光罩及其修复方法 |
CN109471328A (zh) * | 2019-01-07 | 2019-03-15 | 成都中电熊猫显示科技有限公司 | 光配向掩膜版修复方法 |
CN110161800A (zh) * | 2019-04-26 | 2019-08-23 | 信利光电股份有限公司 | 一种光罩损伤修复方法 |
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DE112012006295B4 (de) | 2021-04-22 |
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