WO2013155799A1 - 彩色滤光片及其制作方法 - Google Patents

彩色滤光片及其制作方法 Download PDF

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Publication number
WO2013155799A1
WO2013155799A1 PCT/CN2012/078546 CN2012078546W WO2013155799A1 WO 2013155799 A1 WO2013155799 A1 WO 2013155799A1 CN 2012078546 W CN2012078546 W CN 2012078546W WO 2013155799 A1 WO2013155799 A1 WO 2013155799A1
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Prior art keywords
color
resisting unit
unit
thickness
color resisting
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PCT/CN2012/078546
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English (en)
French (fr)
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陈孝贤
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深圳市华星光电技术有限公司
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Priority to US13/695,284 priority Critical patent/US20130279038A1/en
Publication of WO2013155799A1 publication Critical patent/WO2013155799A1/zh

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices

Definitions

  • the present invention relates to the field of liquid crystal display, and more particularly to a color filter and a method of fabricating the same.
  • the liquid crystal display uses a color filter to display a color image: when the backlight of the liquid crystal display emits light, the color filter is provided with red, green, and blue primary color filter layers, and the light passes through the color filter to form red and green. The blue primary light is finally mixed to form a color image. Therefore, color filters are a key component of liquid crystal displays.
  • the color filter is generally manufactured by forming a black matrix 50 on a transparent substrate 10. After the black matrix 50 is manufactured, the nozzle is directly used to red ink, Three kinds of pigment materials of green ink and blue ink are filled in the gaps of the black matrix 50, and then baked and cooled to form a red color resist 20, a green color resist 30, and a blue color resist 40. Since the material of the black matrix 50 is different from the three pigment materials of red ink, green ink and blue ink, that is, the pigment material and the black matrix 50 are mutually exclusive, resulting in the black matrix 50 and the red color resist 20 and the green color resist 30. The intersection area of the blue color resist 40 is not flat, causing poor alignment of the liquid crystal molecules, and the brightness of the dark state is increased, resulting in an abnormal contrast value between the bright picture and the dark picture of the liquid crystal panel.
  • the main object of the present invention is to provide a color filter and a method for fabricating the same according to the present invention, which can improve the contrast value of the liquid crystal display panel.
  • the invention provides a method for manufacturing a color filter, comprising the steps of:
  • the intensity of light received by each portion of the color unit is inversely proportional to its thickness
  • the color resisting unit is developed to form a color resist.
  • the exposing step to the color resisting unit is specifically: exposing the color resisting unit by using a photomask having a non-transmissive region, a semi-transmissive region, and a light transmissive region
  • the intensity of the ultraviolet light passing through the photomask is inversely proportional to the thickness of the color resistive unit.
  • the portion of the photomask corresponding to the minimum thickness of the color resisting unit is a light transmitting region, and the ultraviolet light can completely penetrate the photomask and then illuminate the position of the color resisting unit; the photomask is in the color
  • the portion corresponding to the other portion of the resistive unit is a semi-transmissive region, and the ultraviolet light may partially pass through the photomask and be irradiated onto the color resisting unit.
  • the developing the color resisting unit to form a color resist is specifically: developing the color resisting unit by a developing solution, and after the developing, the thickness of each part of the color resisting unit is reduced by receiving The intensity of the ultraviolet light is inversely proportional.
  • the portion of the color resisting unit having the smallest thickness is not reduced in thickness after development.
  • the pigment material contains a photoinitiator.
  • the step of developing the color resisting unit to form a color resisting step further comprises: forming a transparent conductive layer on the black matrix and the color resist surface.
  • the invention also provides a method for manufacturing a color filter, comprising the steps of:
  • the pigment material is a photosensitive material
  • the color resist has a junction area at a connecting black matrix, the color resisting the thickness of the outer portion except the intersection area and the black The thickness of the matrix is the same;
  • the color resisting unit is developed to form a color resist.
  • the exposing step to the color resisting unit is specifically: exposing the color resisting unit by using a photomask having a non-transmissive region, a semi-transmissive region, and a light transmissive region
  • the intensity of the ultraviolet light passing through the photomask is inversely proportional to the thickness of the color resistive unit.
  • the portion of the photomask corresponding to the minimum thickness of the color resisting unit is a light transmitting region, and the ultraviolet light can completely penetrate the photomask and then illuminate the position of the color resisting unit; the photomask is in the color
  • the portion corresponding to the other portion of the resistive unit is a semi-transmissive region, and the ultraviolet light may partially pass through the photomask and be irradiated onto the color resisting unit.
  • the developing the color resisting unit to form a color resist is specifically: developing the color resisting unit by a developing solution, and after the developing, the thickness of each part of the color resisting unit is reduced by receiving The intensity of the ultraviolet light is inversely proportional.
  • the portion of the color resisting unit having the smallest thickness is not reduced in thickness after development.
  • the pigment material contains a photoinitiator.
  • the pigment material comprises a red pigment material, a green pigment material and a blue pigment material, which are correspondingly dropped into the space between the black matrices to form a red color resisting unit, a green color resisting unit and a blue color resist The unit; the red color resisting unit, the green color resisting unit, and the blue color resisting unit are sequentially disposed at intervals.
  • the step of developing the color resisting unit to form a color resisting step further comprises: forming a transparent conductive layer on the black matrix and the color resist surface.
  • the invention also proposes a color filter comprising:
  • the color resistance disposed on the substrate and located between the black matrix, the color resistance is formed by a photosensitive material, and the color resistance has a junction area at the connection black matrix, and the color resistance is different from the thickness of the outer portion of the intersection
  • the thickness of the black matrix is the same.
  • the photosensitive material contains a photoinitiator.
  • a transparent conductive layer is formed on the black matrix and the color resist.
  • the color filter and the manufacturing method thereof are provided, wherein the light intensity received by the color resisting unit during exposure is inversely proportional to the thickness thereof, and then developed to planarize the intersection of the color resist and the black matrix, thereby The contrast value of the color filter is increased.
  • FIG. 1 is a schematic structural view of a color filter in the prior art
  • FIG. 2 is a schematic flow chart of an embodiment of a method for fabricating a color filter according to the present invention
  • FIG. 3 is a schematic structural view of forming a black matrix in a method for fabricating a color filter according to the present invention
  • FIG. 4 is a schematic structural view of forming a color resisting unit between black matrices in a method of fabricating a color filter according to the present invention
  • Figure 5 is an enlarged view of the mark A in Figure 4.
  • FIG. 6 is a schematic view showing exposure of a color resistive unit in a method of fabricating a color filter of the present invention
  • FIG. 7 is a schematic diagram showing the correspondence between the light intensity passing through the photomask and the thickness of the color resisting unit
  • Figure 8 is a schematic view showing the structure of the color resist and the black matrix after development
  • Figure 9 is an enlarged view of the mark B in Figure 8.
  • FIG. 10 is a schematic structural view of an embodiment of a color filter of the present invention.
  • an embodiment of a method for fabricating a color filter of the present invention including the steps of:
  • a substrate 110 is provided, which may be made of glass or a plastic such as polymethylmethacrylate (PMMA) or polycarbonate (PC).
  • the substrate 110 is cleaned to remove various impurities on the surface thereof, and a photoresist layer is uniformly formed on the substrate 110.
  • the photoresist layer is irradiated, and then the photoresist layer is developed by the developer to make the photoresist layer
  • the photoresist layer forms a black matrix 120 having a spacer 121 between them, as shown in FIG.
  • it is not limited to the above method, and other methods that can be considered by those skilled in the art are equally applicable to the present embodiment.
  • the pigment material is a photosensitive material containing a photoinitiator, and the photoinitiator may be 2, 2'-bis(o-methylphenyl)-4, 4', 5, One of 5'-tetraphenyldiimidazole, 2,2'-bis(o-ethylphenyl)-4, 4', 5, 5'-tetraphenyldiimidazole or a combination of the two.
  • Multi-Head Ink-Jet Array (not shown) drops the dye material into the spacer 121, and forms the color resist unit 130 in the spacer 121, as shown in FIGS. 3 and 4.
  • the thickness of the intersection of the color resist unit 130 and the black matrix 120 is smaller than the thickness of other portions of the color resist unit 130, as shown in FIG. 5, because of the detachment between the coloring material and the black matrix 120.
  • FIG. 5 is an enlarged view of a junction area of the color resist unit 130 and the black matrix 120 of FIG.
  • the pigment material comprises a red pigment material, a green pigment material and a blue pigment material, which are correspondingly dropped into a spacer 121 to form a red color resist unit, a green color resist unit and a blue color resist unit, and the red color resist
  • the unit, the green color resisting unit, and the blue color resisting unit are sequentially arranged.
  • the photochromic unit is exposed by a photomask.
  • FIG. 6 is a schematic diagram of exposure of the color resistive unit
  • FIG. 7 is a schematic diagram corresponding to the thickness of the light passing through the photomask and the thickness of the color resisting unit.
  • the photomask 200 of the present embodiment has a non-transmissive region, a semi-transmissive region, and a light-transmitting region, and the intensity of the ultraviolet light (shown by an arrow in FIG. 6) passing through the photomask 200 and the color resist.
  • the thickness of the unit is inversely proportional, that is, the intensity of the ultraviolet light irradiated to the portion having the large thickness in the color resist unit 130 is low, and the intensity of the ultraviolet light irradiated to the portion of the color resist unit 130 having a small thickness is high, and the color resist unit 130 is irradiated.
  • the intensity of the ultraviolet light at the intersection with the black matrix 120 is greater than the intensity of the other portions irradiated to the color resist unit 130.
  • the portion of the photomask 200 corresponding to the minimum thickness of the color resisting unit 130 is a light transmitting region, and the ultraviolet light can completely penetrate the photomask 200 and then illuminate the position of the color resisting unit 130, and the light masks
  • the portion of the film 200 corresponding to the other portions of the color resisting unit 130 is a semi-transmissive region, and the ultraviolet light may partially pass through the photomask 200 and then be irradiated onto the color resisting unit 130, and the thickness of the color resisting unit 130 increases. Larger, the intensity of ultraviolet light transmitted through the photomask 200 is smaller.
  • the portion of the photomask 200 above the black matrix 120 is a non-transmissive region, and ultraviolet light cannot be irradiated onto the black matrix 120.
  • the color resist unit 130 is developed by the developer. Since the intensity of the ultraviolet light received by each portion of the color resisting unit 130 is different, the thickness of each portion of the color resisting unit 130 is removed by the developing solution during the developing process, and the thickness of each portion of the color resisting unit 130 is different.
  • the degree of reduction is inversely proportional to the intensity of the ultraviolet light received therefrom, that is, the portion of the color resisting unit 130 that receives the intensity of the ultraviolet light is less removed by the developer, and the color resisting unit 130 receives the ultraviolet light. The portion having a small strength is largely removed by the developer.
  • the intensity of the ultraviolet light received at the interface of the color resist unit 130 and the black matrix 120 is large, the intensity of the ultraviolet light received by the other portions of the color resist unit 130 is relatively small, and the portion having the smallest thickness of the color resisting unit 130 is received.
  • the ultraviolet light intensity is the largest, so that the portion where the thickness of the color resist unit 130 is the smallest is minimized by the developer.
  • the portion of the color resist unit 130 having the smallest thickness is not reduced in thickness after development, and the thickness of other portions is small.
  • the color resisting unit 130 is developed to form a color resist 140. As shown in FIG. 8, FIG.
  • FIG. 8 is a schematic structural view of the color resist 140 and the black matrix on the substrate 110, except for the intersection area, other parts of the color resist 140
  • the thickness is the same as the thickness of the black matrix 120.
  • the intersection of the color resist 140 and the black matrix 120 is flatter than the intersection of the color resisting unit 130 and the black matrix 120 before development, as shown in FIG. 9, which is the intersection of the color resist 140 and the black matrix 120 in FIG. Enlarged image.
  • the color resist 140 includes a red color resist, a green color resist, and a blue color resist formed by a red color resist unit, a green color resist unit, and a blue color resist unit.
  • the color resist 140 is baked, and a transparent conductive layer 150 is formed on the surface of the black matrix 120 and the color resist 140, as shown in FIG.
  • the transparent conductive layer 150 may be indium tin oxide (Indium Tin Oxide, ITO) film, etc.
  • the surface of the transparent electrode layer 150 covering the interface is relatively flat, so that the alignment of the liquid crystal molecules (not shown) on the transparent conductive layer 150 is uniform.
  • the contrast value of the color filter is also improved.
  • the present invention also provides a color filter produced by the above method for fabricating a color filter.
  • the color filter includes a substrate 110 on which a black matrix 120 is formed.
  • a color resist 140 is formed between the matrices 120, and the color resist 140 includes a red color resist, a green color resist, and a blue color resist which are sequentially disposed.
  • a transparent conductive layer 150 is formed on the color resist 140 and the black matrix 120.
  • the color resist 140 is formed of a pigment material including a red pigment material, a green pigment material, and a blue pigment material.
  • the pigment material is a photosensitive material containing a photoinitiator, and the photoinitiator may be 2. 2'-bis(o-methylphenyl)-4, 4', 5, 5'-tetraphenyldiimidazole, 2, 2'-bis(o-ethylphenyl)-4, 4', 5 , One of 5'-tetraphenyldiimidazole or a combination of the two.
  • the pigment material is multi-head inkjet device (Multi-Head Ink-Jet) Array, MHIJA) (not shown) will drop into the black matrix 120 to form the color resist unit 130, as shown in FIG. Due to the detachment between the pigment material and the black matrix 120, the thickness of the intersection of the color resist unit 130 and the black matrix 120 is smaller than the thickness of other portions of the color resist unit 130.
  • MHIJA multi-head inkjet device
  • the color resist unit 130 is exposed to the color resisting unit 130 by the photomask 200 after being dried.
  • the photomask 200 is a continuous energy change photomask, and the intensity of the ultraviolet light passing through the photomask 200 is inversely proportional to the thickness of the color resistive unit, that is, irradiated into the color resisting unit 130.
  • the intensity of the ultraviolet light of the portion having a large thickness is low, and the intensity of the ultraviolet light irradiated to the portion having the small thickness of the color resist unit 130 is high, and the intensity of the ultraviolet light irradiated to the intersection of the color resist unit 130 and the black matrix 120 is greater than the irradiation.
  • the intensity to other parts of the color resist unit 130 is a continuous energy change photomask, and the intensity of the ultraviolet light passing through the photomask 200 is inversely proportional to the thickness of the color resistive unit, that is, irradiated into the color resisting unit 130.
  • the color resist unit 130 is developed by the developer to form the color resist 140.
  • the thickness of each portion of the color resist unit 130 is removed by the developer, and the portion of the color resist unit 130 that receives the high intensity of the ultraviolet light is removed by the developer, and the color resist unit 130 is small.
  • the portion of the portion where the intensity of the ultraviolet light received is removed by the developer is large, so that the intersection of the color resist 140 and the black matrix 120 is compared with the intersection of the color resist unit 130 and the black matrix 120 before development.
  • Flat as shown in Figures 8 and 9.
  • the surface of the transparent electrode layer 150 covering the interface is relatively flat, so that the alignment of the liquid crystal molecules (not shown) on the transparent conductive layer 150 is uniform.
  • the contrast value of the color filter is also improved.

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  • Optics & Photonics (AREA)
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Abstract

公开了一种彩色滤光片及其制作方法。制作方法包括：在基板（110）上形成黑矩阵（120）；在黑矩阵之间填充色素材料，并形成色阻单元（130），色素材料为感光材料；对色阻单元进行曝光，色阻单元各部分所受到的曝光能量不同；对色阻单元进行显影形成色阻（140），色阻与黑矩阵的交接区比色阻单元与黑矩阵的交接区平坦，因此覆盖在交接区的透明电极层（150）的表面也比较平坦，从而使液晶分子在透明导电层上的排列一致，提高了彩色滤光片的对比值。

Description

彩色滤光片及其制作方法
技术领域
本发明涉及到液晶显示领域，尤其涉及一种彩色滤光片及其制作方法。
背景技术
液晶显示器利用彩色滤光片呈现彩色的影像：当液晶显示器的背光源发出光线，彩色滤光片上因设置有红、绿、蓝三原色滤光层，光线通过彩色滤光片后形成红、绿、蓝三原色光，最后混合形成彩色影像。因此，彩色滤光片是液晶显示器的关键组件。
参照图1，在现今液晶显示面板的制作工艺中，彩色滤光片的制造方法通常是：在一透明基板10上形成黑矩阵50，黑矩阵50制造完成后，直接使用喷头，将红墨水、绿墨水、蓝墨水三种色素材料填入黑矩阵50的空隙内，然后对其进行烘烤和冷却，形成红光色阻20、绿光色阻30、蓝光色阻40。由于黑矩阵50的材质与红墨水、绿墨水、蓝墨水三种色素材料均具有疏性，即色素材料与黑矩阵50互相排斥，造成黑矩阵50与红光色阻20、绿光色阻30、蓝光色阻40的交接区域不平坦，造成液晶分子排列不良，产生暗态的亮度上升，造成液晶面板的亮画面和暗画面的对比值异常。
发明内容
本发明的主要目的为提供一种本发明提出彩色滤光片及其制作方法，可提高液晶显示面板的对比值。
本发明提出一种彩色滤光片的制作方法，包括步骤：
在基板上形成黑矩阵；
在所述黑矩阵之间填充色素材料形成色阻单元，所述色素材料为感光材料；
对所述色阻单元进行曝光，所述色组单元各部分接收到的光强度与其厚度成反比；
对所述色阻单元进行显影形成色阻。
优选地，所述对所述色阻单元进行曝光步骤具体为：为利用一光掩膜对所述色阻单元进行曝光，该光掩膜具有非透光区、半透光区以及透光区，经过该光掩膜的紫外光的强度与所述色阻单元的厚度成反比。
优选地，所述光掩膜对应所述色阻单元厚度最小处的部分为透光区，紫外光可完全穿透光掩膜后照射到色阻单元的该位置；光掩膜在所述色阻单元其他部分对应位置的部分为半透光区，紫外光可部分穿过该光掩膜后照射到色阻单元上。
优选地，所述对所述色阻单元进行显影形成色阻具体为：由显影液对所述色阻单元进行显影，经过显影后，所述色阻单元的各部分厚度的减小程度与其接收到的紫外光的强度成反比。
优选地，所述色阻单元厚度最小的部分经过显影后，其厚度没有减小。
优选地，所述色素材料含有光起始剂。
优选地，所述对所述色阻单元进行显影形成色阻步骤之后还包括：在黑矩阵和色阻表面形成透明导电层。
本发明还提出一种彩色滤光片的制作方法，包括步骤：
在基板上形成黑矩阵；
在所述黑矩阵之间填充色素材料形成色阻单元，所述色素材料为感光材料；所述色阻在连接黑矩阵处具有交接区，该色阻除交接区外部分的厚度与所述黑矩阵的厚度相同；
对所述色阻单元进行曝光，所述色阻单元各部分接收到的光强度与其厚度成反比；
对所述色阻单元进行显影形成色阻。
优选地，所述对所述色阻单元进行曝光步骤具体为：为利用一光掩膜对所述色阻单元进行曝光，该光掩膜具有非透光区、半透光区以及透光区，经过该光掩膜的紫外光的强度与所述色阻单元的厚度成反比。
优选地，所述光掩膜对应所述色阻单元厚度最小处的部分为透光区，紫外光可完全穿透光掩膜后照射到色阻单元的该位置；光掩膜在所述色阻单元其他部分对应位置的部分为半透光区，紫外光可部分穿过该光掩膜后照射到色阻单元上。
优选地，所述对所述色阻单元进行显影形成色阻具体为：由显影液对所述色阻单元进行显影，经过显影后，所述色阻单元的各部分厚度的减小程度与其接收到的紫外光的强度成反比。
优选地，所述色阻单元厚度最小的部分经过显影后，其厚度没有减小。
优选地，所述色素材料含有光起始剂。
优选地，所述色素材料包括红色素材料、绿色素材料和蓝色素材料，其对应滴入所述黑矩阵之间的间隔部，形成红光色阻单元、绿光色阻单元和蓝光色阻单元；所述红光色阻单元、绿光色阻单元、蓝光色阻单元依次间隔设置。
优选地，所述对所述色阻单元进行显影形成色阻步骤之后还包括：在黑矩阵和色阻表面形成透明导电层。
本发明还提出一种彩色滤光片，包括：
基板；
黑矩阵，设于所述基板上；
色阻，设于所述基板上且位于黑距阵间，所述色阻由感光材料形成，所述色阻在连接黑矩阵处具有交接区，该色阻除交接区外部分的厚度与所述黑矩阵的厚度相同。
优选地，所述感光材料含有光起始剂。
优选地，所述黑矩阵及色阻上形成有透明导电层。
本发明提出的一种彩色滤光片及其制作方法，通过使色阻单元在曝光时接收到的光强度与其厚度成反比，然后进行显影，使色阻与黑矩阵的交接区平坦化，从而提高了该彩色滤光片的对比值。
附图说明
图1 为现在技术中彩色滤光片的结构示意图；
图2 为本发明彩色滤光片的制作方法一实施例的流程示意图；
图3 为本发明彩色滤光片的制作方法中形成黑矩阵的结构示意图；
图4 为本发明彩色滤光片的制作方法中在黑矩阵间形成色阻单元的结构示意图；
图5 为图4中标示A的放大图；
图6 为本发明彩色滤光片的制作方法中对色阻单元进行曝光的示意图；
图7 为经过光掩膜的光强度与色阻单元的厚度对应示意图；
图8 为显影后色阻与黑矩阵的结构示意图；
图9为图8中标示B的放大图；
图10 为本发明彩色滤光片一实施例的结构示意图。
本发明目的的实现、功能特点及优点将结合实施例，参照附图做进一步说明。
具体实施方式
应当理解，此处所描述的具体实施例仅仅用以解释本发明，并不用于限定本发明。
参照图2，提出本发明彩色滤光片的制作方法一实施例，包括步骤：
S10、形成黑矩阵；
首先提供一基板110，其材质可为玻璃，也可为聚甲基丙烯酸甲酯（Polymethylmethacrylate，PMMA）或聚碳酸脂（Polycarbonate，PC）等塑胶。清洗该基板110，去除其表面的各种杂质，在该基板110上均匀地形成一光阻层，紫外光经过光罩后照射该光阻层，然后由显影液对光阻层进行显影，使光阻层形成黑矩阵120，该黑矩阵120之间具有间隔部121，如图3所示。在实际应用中，不仅限于上述方法，其它本领域技术人员可以考虑到的方法同样适用于本实施例。
S11、形成色阻单元；
所述色素材料为感光材料，其含有光起始剂，所述光起始剂可以是2, 2’-双（邻-甲基苯基）-4, 4’, 5, 5’-四苯基二咪唑 、2, 2’-双（邻-乙基苯基）-4, 4’, 5, 5’-四苯基二咪唑中的一种或者是二者的组合。
以多头喷墨设备（Multi-Head Ink-Jet Array，MHIJA）（未图示）将色素材料滴入间隔部121，并在间隔部121形成色阻单元130，如图3及图4所示。由于所述色素材料与所述黑矩阵120之间具有疏离性，故所述色阻单元130与所述黑矩阵120的交接区的厚度小于色阻单元130其他部分的厚度，如图5所示，图5是图4中色阻单元130与黑矩阵120的交接区的放大图。
所述色素材料包括红色素材料、绿色素材料和蓝色素材料，其对应滴入一个间隔部121，形成红光色阻单元、绿光色阻单元和蓝光色阻单元，且该红光色阻单元、绿光色阻单元、蓝光色阻单元依次间隔设置。
S12、对色阻单元进行曝光。
将所形成的色阻单元进行预烘，使其干燥后，再利用一光掩膜对具有色阻单元进行曝光。
参照图6及图7，图6为对色阻单元进行曝光的示意图，图7为经过光掩膜的光强度与色阻单元的厚度对应示意图。本实施例的光掩膜200具有非透光区、半透光区以及透光区，所述经过该光掩膜200的紫外光（如图6中箭头所示）的强度与所述色阻单元的厚度成反比，即照射到色阻单元130中厚度大的部分的紫外光的强度低，而照射到色阻单元130中厚度小的部分的紫外光的强度高，照射到色阻单元130与黑矩阵120交接区的紫外光的强度大于照射到色阻单元130其他部分的强度。优选的，所述光掩膜200对应所述色阻单元130厚度最小处的部分为透光区，紫外光可完全穿透光掩膜200后照射到色阻单元130的该位置，而光掩膜200在所述色阻单元130其他部分对应位置的部分为半透光区，紫外光可部分穿过该光掩膜200后照射到色阻单元130上，并且随着色阻单元130的厚度增大，紫外光透过所述光掩膜200照射到其上的强度越小。在本实施例中，由于无需对黑矩阵120曝光，故光掩膜200位于黑矩阵120上方的部分为非透光区，紫外光无法照射到黑矩阵120上。
S13、对色阻单元进行显影。
所述色阻单元130经过曝光后，由显影液对色阻单元130进行显影。由于色阻单元130中各部分接受到的紫外光的强度不同，使得在显影过程中，色阻单元130各部分被显影液去除的厚度也有差异，且所述色阻单元130的各部分厚度的减小程度与其接收到的紫外光的强度成反比，即色阻单元130中接收到紫外光的强度大的部分其被显影液去除的厚度较小，而色阻单元130中接收到紫外光的强度小的部分其被显影液去除的厚度较大。
由于色阻单元130与黑矩阵120交界处接收到的紫外光的强度大，而色阻单元130的其他部分接收到的紫外光的强度相对较小，并且色阻单元130厚度最小的部分接收到的紫外光强度最大，故色阻单元130厚度最小的部分被显影液去除的厚度最小。优选地，色阻单元130厚度最小的部分经过显影后，其厚度没有减小，而其他部分的厚度都被较小。所述色阻单元130经过显影形成色阻140，如图8所示，图8为色阻140及黑矩阵在基板110上的结构示意图，除交接区外，所述色阻140的其他部分的厚度与所述黑矩阵120的厚度相同。色阻140与黑矩阵120的交接区相比于显影前色阻单元130与黑矩阵120的交接区较平坦，如图9所示，其为图8中色阻140与黑矩阵120交接区的放大图。
所述色阻140包括由红光色阻单元、绿光色阻单元、蓝光色阻单元经显影形成的红光色阻、绿光色阻、蓝光色阻。
S14、形成透明导电层。
将色阻140进行烘烤，并在黑矩阵120和色阻140表面形成一透明导电层150，如图10所示。该透明导电层150可以是铟锡氧化物（Indium Tin Oxide，ITO）膜等。
由于色阻140与黑矩阵120的交接区已比较平坦，因此覆盖在交接区的透明电极层150其表面也比较平坦，使液晶分子（未图示）在透明导电层150上的排列一致，从而该彩色滤光片的对比值也得到提高。
本发明还提供一种上述彩色滤光片的制作方法制作的彩色滤光片，如图10所示，该彩色滤光片包括一基板110，该基板110上形成有黑矩阵120，所述黑矩阵120间形成色阻140，该色阻140包括依次设置的红光色阻、绿光色阻及蓝光色阻。所述色阻140及黑矩阵120上形成有透明导电层150。
所述色阻140由色素材料形成，该色素材料包括红色素材料、绿色素材料和蓝色素材料。所述色素材料为感光材料，其含有光起始剂，所述光起始剂可以是2, 2’-双（邻-甲基苯基）-4, 4’, 5, 5’-四苯基二咪唑、2, 2’-双（邻-乙基苯基）-4, 4’, 5, 5’-四苯基二咪唑中的一种或者是二者的组合。
所述色素材料被多头喷墨设备（Multi-Head Ink-Jet Array，MHIJA）（未图示）将滴入黑矩阵120形成色阻单元130，如图4所示。由于所述色素材料与所述黑矩阵120之间具有疏离性，故所述色阻单元130与所述黑矩阵120的交接区的厚度小于色阻单元130其他部分的厚度。
所述色阻单元130经过干燥后由光掩膜200对具有色阻单元130进行曝光。如前所述，该光掩膜200为连续型能量变化光掩膜，且经过该光掩膜200的紫外光的强度与所述色阻单元的厚度成反比，即照射到色阻单元130中厚度大的部分的紫外光的强度低，而照射到色阻单元130中厚度小的部分的的紫外光的强度高，照射到色阻单元130与黑矩阵120交接区的紫外光的强度大于照射到色阻单元130其他部分的强度。
所述色阻单元130经过曝光后，由显影液对色阻单元130进行显影形成色阻140。如前所述，色阻单元130各部分被显影液去除的厚度不尽相同，色阻单元130中接收到紫外光的强度大的部分其被显影液去除的厚度较小，而色阻单元130中接收到紫外光的强度小的部分其被显影液去除的厚度较大，使得所述色阻140与黑矩阵120的交接区相比于显影前色阻单元130与黑矩阵120的交接区较平坦，如图8及图9所示。
由于色阻140与黑矩阵120的交接区已比较平坦，因此覆盖在交接区的透明电极层150其表面也比较平坦，使液晶分子（未图示）在透明导电层150上的排列一致，从而该彩色滤光片的对比值也得到提高。
以上所述仅为本发明的优选实施例，并非因此限制本发明的专利范围，凡是利用本发明说明书及附图内容所作的等效结构或等效流程变换，或直接或间接运用在其他相关的技术领域，均同理包括在本发明的专利保护范围内。

Claims (19)

  1. 一种彩色滤光片的制作方法，其特征在于，包括步骤：
    在基板上形成黑矩阵；
    在所述黑矩阵之间填充色素材料形成色阻单元，所述色素材料为感光材料；所述色阻在连接黑矩阵处具有交接区，该色阻除交接区外部分的厚度与所述黑矩阵的厚度相同；
    对所述色阻单元进行曝光，所述色阻单元各部分接收到的光强度与其厚度成反比；
    对所述色阻单元进行显影形成色阻。
  2. 根据权利要求1所述的彩色滤光片的制作方法，其特征在于，所述对所述色阻单元进行曝光步骤具体为：为利用一光掩膜对所述色阻单元进行曝光，该光掩膜具有非透光区、半透光区以及透光区，经过该光掩膜的紫外光的强度与所述色阻单元的厚度成反比。
  3. 根据权利要求2所述的彩色滤光片的制作方法，其特征在于，所述光掩膜对应所述色阻单元厚度最小处的部分为透光区，紫外光可完全穿透光掩膜后照射到色阻单元的该位置；光掩膜在所述色阻单元其他部分对应位置的部分为半透光区，紫外光可部分穿过该光掩膜后照射到色阻单元上。
  4. 如权利要求1所述的彩色滤光片的制作方法，其特征在于，所述对所述色阻单元进行显影形成色阻具体为：由显影液对所述色阻单元进行显影，经过显影后，所述色阻单元的各部分厚度的减小程度与其接收到的紫外光的强度成反比。
  5. 如权利要求4所述的彩色滤光片的制作方法，其特征在于，所述色阻单元厚度最小的部分经过显影后，其厚度没有减小。
  6. 如权利要求1所述的彩色滤光片的制作方法，其特征在于，所述色素材料含有光起始剂。
  7. 如权利要求6所述的彩色滤光片的制作方法，其特征在于，所述色素材料包括红色素材料、绿色素材料和蓝色素材料，其对应滴入所述黑矩阵之间的间隔部，形成红光色阻单元、绿光色阻单元和蓝光色阻单元；所述红光色阻单元、绿光色阻单元、蓝光色阻单元依次间隔设置。
  8. 如权利要求1所述的彩色滤光片的制作方法，其特征在于，所述对所述色阻单元进行显影形成色阻步骤之后还包括：在黑矩阵和色阻表面形成透明导电层。
  9. 一种彩色滤光片的制作方法，其特征在于，包括步骤：
    在基板上形成黑矩阵；
    在所述黑矩阵之间填充色素材料形成色阻单元，所述色素材料为感光材料；
    对所述色阻单元进行曝光，所述色阻单元各部分接收到的光强度与其厚度成反比；
    对所述色阻单元进行显影形成色阻。
  10. 根据权利要求9所述的彩色滤光片的制作方法，其特征在于，所述对所述色阻单元进行曝光步骤具体为：为利用一光掩膜对所述色阻单元进行曝光，该光掩膜具有非透光区、半透光区以及透光区，经过该光掩膜的紫外光的强度与所述色阻单元的厚度成反比。
  11. 根据权利要求10所述的彩色滤光片的制作方法，其特征在于，所述光掩膜对应所述色阻单元厚度最小处的部分为透光区，紫外光可完全穿透光掩膜后照射到色阻单元的该位置；光掩膜在所述色阻单元其他部分对应位置的部分为半透光区，紫外光可部分穿过该光掩膜后照射到色阻单元上。
  12. 如权利要求9所述的彩色滤光片的制作方法，其特征在于，所述对所述色阻单元进行显影形成色阻具体为：由显影液对所述色阻单元进行显影，经过显影后，所述色阻单元的各部分厚度的减小程度与其接收到的紫外光的强度成反比。
  13. 如权利要求12所述的彩色滤光片的制作方法，其特征在于，所述色阻单元厚度最小的部分经过显影后，其厚度没有减小。
  14. 如权利要求9所述的彩色滤光片的制作方法，其特征在于，所述色素材料含有光起始剂。
  15. 如权利要求14所述的彩色滤光片的制作方法，其特征在于，所述色素材料包括红色素材料、绿色素材料和蓝色素材料，其对应滴入所述黑矩阵之间的间隔部，形成红光色阻单元、绿光色阻单元和蓝光色阻单元；所述红光色阻单元、绿光色阻单元、蓝光色阻单元依次间隔设置。
  16. 如权利要求9所述的彩色滤光片的制作方法，其特征在于，所述对所述色阻单元进行显影形成色阻步骤之后还包括：在黑矩阵和色阻表面形成透明导电层。
  17. 一种彩色滤光片，其特征在于，包括：
    基板；
    黑矩阵，设于所述基板上；
    色阻，设于所述基板上且位于黑距阵间，所述色阻由感光材料形成，所述色阻在连接黑矩阵处具有交接区，该色阻除交接区外部分的厚度与所述黑矩阵的厚度相同。
  18. 如权利要求17所述的彩色滤光片，其特征在于，所述感光材料含有光起始剂。
  19. 如权利要求18所述的彩色滤光片，其特征在于，所述黑矩阵及色阻上形成有透明导电层。
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