WO2013176178A1

WO2013176178A1 - Exposure device, exposure method, and method for manufacturing device

Info

Publication number: WO2013176178A1
Application number: PCT/JP2013/064213
Authority: WO
Inventors: 福井　達雄
Original assignee: 株式会社ニコン
Priority date: 2012-05-22
Filing date: 2013-05-22
Publication date: 2013-11-28
Also published as: JP2013242488A

Abstract

The present invention provides an exposure device for exposing a plate while causing an illumination optical system to move relative to a mask at high speed, an exposure method for same, and a method for manufacturing the device. An exposure device for transferring a pattern onto the plate using illumination light outputted by a light source is provided with a mask-support mechanism for supporting a mask on which the pattern is formed, and a plate-support mechanism for supporting the plate, wherein the exposure device has: an illumination optical system for irradiating illumination light onto the mask, a lens array for projecting onto the plate the image of a pattern illuminated using the illumination optical system, and a moving device, provided with a support part for supporting at least a portion of the illumination optical system and the lens array, the moving device moving the support part relative to the light source in a direction along the mask and plate.

Description

Exposure apparatus, exposure method, and device manufacturing method

The present invention relates to an exposure apparatus, an exposure method, and a device manufacturing method for projecting and exposing a pattern on a mask onto a plate.

In recent years, thin display panels using elements such as liquid crystal or organic EL (Electro Luminescence) have been widely used as information display devices. These display panels are manufactured by patterning transparent thin film electrodes on a thin glass substrate by a photolithography technique. As an apparatus that projects and exposes a pattern formed on a mask onto a photosensitive substrate (hereinafter also referred to as a plate) in this photolithography process, there is an exposure apparatus that projects an image of a pattern onto a plate using an MLA (Micro-Lens-Array). (For example, patent document 1). In the exposure apparatus described in Patent Document 1, when a pattern image is exposed on a plate, a mask and a wafer, an illumination optical system that illuminates the mask, and an MLA as a projection optical system that projects the pattern image are relative to each other. Displacement is disclosed.

JP-A-9-244255

Generally, in order to improve the tact time in an exposure apparatus, it is required to increase the moving speed (scanning speed) of a stage or the like that is moved when the plate is exposed. However, in the exposure apparatus using the MLA described in Patent Document 1, when the illumination optical system and the MLA are moved relative to the mask and the wafer, the illumination optical system provided with a high-pressure mercury lamp as a light source is moved ( Scanning), and it may be difficult to increase the moving speed.

An object of an aspect of the present invention is to provide an exposure apparatus, an exposure method, and a device manufacturing method that can expose a plate while relatively moving illumination light with respect to a mask at high speed.

According to the first aspect of the present invention, a mask support mechanism for supporting a mask on which a pattern is formed and a plate support mechanism for holding a plate are provided, and the pattern is placed on the plate using illumination light output from a light source. An illumination optical system that irradiates the mask with the illumination light, a lens array that projects an image of the pattern illuminated by the illumination optical system onto the plate, and an illumination optical system. There is provided an exposure apparatus comprising: a support unit that supports at least a part of the lens array; and a moving device that moves the support unit in a direction along the mask and the plate relative to the light source. The

According to the second aspect of the present invention, there is provided an exposure method in which illumination light output from a light source is irradiated onto a mask via an illumination optical system, and a pattern formed on the mask is transferred to a plate via a lens array. The illumination light is transferred from the illumination optical system to the pattern while moving at least a part of the illumination optical system and the lens array in a direction along the mask and the plate relative to the light source. And an image of the pattern is projected onto the plate through the lens array.

According to the third aspect of the present invention, the pattern formed on the mask is transferred to a plate by the above exposure method, and the plate to which the pattern is transferred is transferred to the plate based on the transferred pattern. And a device manufacturing method is provided.

According to the aspect of the present invention, the plate is exposed while moving the illumination light relative to the mask at a high speed by exposing the plate while moving at least a part of the illumination optical system relative to the mask at a high speed. be able to.

FIG. 1 is a side view of the exposure apparatus according to the first embodiment. FIG. 2 is a view of the exposure apparatus according to the first embodiment as seen from between the projection optical system and the mask. FIG. 3 is a view of the exposure apparatus according to the first embodiment as viewed from the direction in which the illumination optical unit and the projection optical system move. FIG. 4 is a side view showing a state where the illumination optical unit and the projection optical system of the exposure apparatus shown in FIG. 1 are moved. FIG. 5 is a side view showing a state where the illumination optical unit and the projection optical system of the exposure apparatus shown in FIG. 1 are moved. FIG. 6 is a side view of the exposure apparatus according to the second embodiment. FIG. 7 is a side view of the exposure apparatus according to the third embodiment. FIG. 8 is a side view showing a state where the illumination optical unit and the projection optical system of the exposure apparatus shown in FIG. 7 are moved. FIG. 9 is a side view of the exposure apparatus according to the fourth embodiment. FIG. 10 is a side view showing a state where the illumination optical unit and the projection optical system of the exposure apparatus shown in FIG. 9 are moved. FIG. 11 is a side view of the exposure apparatus according to the fifth embodiment. FIG. 12 is a side view showing a state where the illumination optical unit and the projection optical system of the exposure apparatus shown in FIG. 11 are moved. FIG. 13 is a side view of the exposure apparatus according to the sixth embodiment. FIG. 14 is a view of the exposure apparatus according to the sixth embodiment as seen from between the projection optical system and the mask. FIG. 15 is a view of the exposure apparatus according to the sixth embodiment as viewed from the direction in which the illumination optical unit and the projection optical system move. FIG. 16 is a side view showing a state where the illumination optical unit and the projection optical system of the exposure apparatus shown in FIG. 13 are moved. FIG. 17 is a side view showing a state where the illumination optical unit and the projection optical system of the exposure apparatus shown in FIG. 13 are moved. FIG. 18 is a flowchart showing each step of the device manufacturing method according to the present embodiment.

DETAILED DESCRIPTION OF EMBODIMENTS Embodiments (embodiments) for carrying out the present invention will be described in detail with reference to the drawings. The present invention is not limited to the embodiments described below. In the following, the lower side is the direction (vertical direction) in which gravity acts, and the upper side is the direction opposite to the direction in which gravity acts.

(Embodiment 1)
The exposure apparatus according to the first embodiment will be described below with reference to FIGS. FIG. 1 is a side view of the exposure apparatus according to the first embodiment. FIG. 2 is a view of the exposure apparatus according to the first embodiment as seen from between the projection optical system and the mask. FIG. 3 is a view of the exposure apparatus according to the first embodiment as viewed from the direction in which the illumination optical unit and the projection optical system move. The exposure apparatus 1 uses a micro lens array (MLA) as a projection optical system, and moves (scans) the illumination optical unit and the projection optical system with respect to the mask and the plate (photosensitive substrate), thereby forming a mask pattern on the plate. This is a scanning type exposure apparatus that exposes (mask pattern). In the following, the Z axis is taken in a direction parallel to the optical axis AXL (see FIG. 1) of the projection optical system, the X axis is taken in the scanning direction of the illumination optical system and the projection optical system, and orthogonal to the Z axis and the X axis. The Y axis is taken in the direction of First, the outline of the exposure apparatus 1 will be described.

<Outline of exposure apparatus>
The exposure apparatus 1 includes a frame 1F, an illumination optical system 2, a projection optical system 3, a moving device 21, and a moving mechanism 40. The illumination optical system 2 includes a guide optical unit 30 and an illumination optical unit 31. In the exposure apparatus 1, the guide optical unit (second unit) 30, the illumination optical unit (first unit) 31, and the moving mechanism 40 serve as an illumination apparatus. The illumination device may include the light source 6 in addition to the illumination optical unit 31, the guide optical unit 30, and the moving mechanism 40. The exposure apparatus 1 is controlled by the control device 9. The frame 1F includes a base 1V, side portions 1W attached to the base 1V, a pair of illumination system guides 5L that support the illumination optical unit 31, and a pair of projection system guides 5P that support the projection optical system 3. . The base 1 V is attached to an installation target (for example, a foundation) of the exposure apparatus 1 and is positioned below the exposure apparatus 1. A side portion 1W is attached to the upper portion of the base portion 1V. A pair of illumination system guides 5L and a pair of projection system guides 5P are attached to the side portion 1W. As for a pair of illumination system guide 5L and a pair of projection system guide 5P, the former is arrange | positioned above the latter and is supported by the side part 1W.

The illumination system guide 5L and the projection system guide 5P extend in a direction parallel to the X axis. The pair of illumination system guides 5L and the pair of projection system guides 5P are arranged at a predetermined interval in the Y-axis direction. The illumination optical unit 31 is supported by these across the pair of illumination system guides 5L. The illumination optical unit 31 moves in the X-axis direction (the direction indicated by the arrow xl in FIG. 1) along the pair of illumination system guides 5L. The projection optical system 3 is supported by these across the pair of projection system guides 5P. Then, the projection optical system 3 moves along the pair of projection system guides 5P in the X-axis direction (the direction indicated by the arrow xp in FIG. 1). Since the illumination system guide 5L is disposed above the projection system guide 5P, the illumination optical unit 31 is disposed above the projection optical system 3.

A plate stage 1S is provided above the base 1V. The plate stage 1S places and supports the plate P to be exposed. In the present embodiment, the plate stage 1S is placed with the plate P held by the holder. In addition, the plate P of this embodiment is a flat glass plate with a length of one side or a diagonal length of 500 mm or more coated with a photoresist (photosensitive material) for manufacturing a liquid crystal display element as an example. As the plate P, a ceramic substrate for manufacturing a thin film magnetic head or a circular semiconductor wafer for manufacturing a semiconductor element can be used. The mask stage 1T supports the mask M. The mask M is supported above the plate stage 1S by the mask stage 1T protruding from the side 1W to the inside of the frame 1F. In the present embodiment, the mask stage 1T is placed and supported while the mask M is held by a holder. By doing so, the plate stage 1S supports the plate P in a state of being opposed to the mask M supported by the mask stage 1T. While the mask pattern is projected and exposed onto the plate P, the mask M is air-adsorbed and fixed by a vacuum chuck provided on the mask stage 1T. When replacing the mask M, the air suction is released, and the mask M can be replaced with a desired one. The mask M is disposed above the plate P. When exposing the plate P, the plate P is disposed at the bottom, and the projection optical system 3, the mask M, and the illumination optical unit 31 are disposed in this order upward. The illumination optical unit 31 and the projection optical system 3 project and expose the mask pattern onto the plate P while moving in the X-axis direction in synchronization. The exposure apparatus 1 includes a moving device 21. The moving device 21 includes a support unit 22 that supports the illumination optical unit 31 and the projection optical system 3, and moves the support unit 22 in the X direction along the illumination system guide 5 L and the projection system guide 5 P. The unit 31 and the projection optical system 3 are moved in the X direction along the illumination system guide 5L and the projection system guide 5P. That is, the moving device 21 moves the illumination optical unit 31 and the projection optical system 3 in the X direction by moving the support 22 in a direction along the surfaces of the mask M and the plate P.

In the exposure apparatus 1, a mask stage 1T and a plate stage 1S are attached to a frame 1F and fixed. The illumination optical unit 31 and the projection optical system 3 project and expose the mask pattern onto the plate P while moving in the X-axis direction with respect to the mask stage 1T and the plate stage 1S. The illumination optical unit 31 and the projection optical system 3 move in the X-axis direction with respect to the mask stage 1T and the plate stage 1S when projecting and exposing the mask pattern onto the plate P.

The exposure apparatus 1 is provided with a light source 6 that outputs light toward the illumination optical unit 31. The light source 6 is fixed to a support base 20 that does not move during exposure, and the relative position does not change with the stator side of the moving mechanism 40 during exposure. The support table 20 is connected to the frame 1F and the like. The support base 20 is a separate member from the support unit 22 of the moving device 21 that supports a part of the illumination optical system 2 and the projection optical system 3, and is independent of the moving unit. That is, the moving device 21 can move the support portion 22 relative to the support base 20. The exposure apparatus 1 supports the mask M using the mask stage 1T, but various configurations can be used as a mask support mechanism for supporting the mask M. The exposure apparatus 1 supports the plate P using the plate stage 1S, but various configurations can be used as a plate support mechanism for supporting the plate P.

<Illumination optics>
The illumination optical system 2 guides the light emitted from the light source 6 and enters it as light for illuminating the mask M. The illumination optical system 2 includes a guide optical unit 30 and an illumination optical unit 31. The guide optical unit 30 is an optical system that guides the light output from the light source 6 to the illumination optical unit 31. A part of the guide optical unit 30 on the light source 6 side is supported by the support base 20. Further, a part of the guide optical unit 30 on the illumination optical unit 31 side is supported by the moving mechanism 40. The moving mechanism 40 is a mechanism that moves the guide optical unit 30, and is fixed to a member that does not move during exposure, such as the frame 1F. The illumination optical unit 31 causes the light guided by the guide optical unit 30 to enter as light for illuminating the mask M. The illumination optical unit 31 is supported by the support unit 22 and moved by the moving device 21. In the exposure apparatus 1, a mechanism for moving the illumination optical unit 31, that is, the moving device 21 is also included in a part of the moving mechanism 40.

<Guiding optical unit>
The guide optical unit 30 is an optical system that guides the laser light (light) output from the light source 6 to the illumination optical unit 31. The guide optical unit 30 includes a plurality of condensing lenses 6L, a plurality of optical fibers (light guiding fibers) 7, and a bundle 32. In the guide optical unit 30, a part (first end) on the light source 6 side of the condenser lens 6 L and the optical fiber 7 is supported by the support base 20. Further, in the guide optical unit 30, a part (second end) of the optical fiber 7 on the side of the illumination optical unit 31 is supported by the moving mechanism 40. The exposure apparatus 1 includes a plurality of light sources 6. In addition, the exposure apparatus 1 should just be provided with two or more output parts which output light, and you may implement | achieve the several light source 6 with one apparatus. In the present embodiment, the light source 6 is a laser light source, but is not limited thereto. In the guide optical unit 30, a condenser lens 6 L and an optical fiber 7 are arranged corresponding to the light source 6. The guide optical unit 30 condenses the light output from the light source 6 with the condenser lens 6 L and makes it incident on the optical fiber 7. In the present embodiment, the optical fiber 7 is a single quartz fiber. One end (first end) of the optical fiber 7 is disposed in the vicinity of the focal point of the condensing lens 6L, and the other end (second end) is disposed facing the illumination optical unit 31. . The other end of the optical fiber 7 is fixed to a movable element of a moving mechanism of the illumination optical unit 31 and moves together with the illumination optical unit 31. In the optical fiber 7, the light condensed by the condenser lens 6L enters from one end. The optical fiber 7 causes light input from one end to be output from the other end. In the bundle 32, portions other than the vicinity of the ends of the plurality of optical fibers 7 are combined into one. In the optical fiber 7 of the present embodiment, one end (the end on the first end side) is fixed to the light source 6 and the other end (the end on the second end side) is illuminated. It is fixed with respect to the optical unit 31. Thereby, the guide optical unit 30 can make it difficult to produce a shift in the relative relationship between the light source 6 and the illumination optical unit 31.

<Movement mechanism>
The moving mechanism 40 moves the position of the guide optical unit 30 while maintaining the optical path length from the light source 6 side end (first end) of the guide optical unit 30 to the illumination optical unit 31 within a predetermined range. It is. Here, maintaining the optical path length in a predetermined range means maintaining the optical path length from the end (first end) on the light source 6 side of the guide optical unit 30 to the illumination optical unit 31 at a substantially constant optical path length. It is. That is, the moving mechanism 40 moves the guide optical unit 30 in accordance with the movement of the illumination optical unit 31 by the moving device 21, and the optical path length from the end of the guide optical unit 30 on the light source 6 side to the illumination optical unit 31 is increased. This is a mechanism that keeps the change below a predetermined threshold. Further, when the first end of the guide optical unit 30 is supported at a predetermined position with respect to the light source 6 and the second end of the guide optical unit 30 is supported at a predetermined position with respect to the illumination optical unit 31, the guide It can be said that the portion from the end of the optical unit 30 on the light source 6 side to the illumination optical unit 31 is the portion supported by the support portion 22 of the illumination optical system 2 from the light source 6.

The moving mechanism 40 includes a fixed pulley 44 and a linear actuator 46. The fixed pulley 44 is held on the frame 1F by a holding mechanism (not shown), and supports the bundle 32 in a movable state. The linear actuator 46 includes a mover 48 and a stator 50. The linear actuator 46 is arranged in a state where the movable element 48 can move in the X direction with respect to the stator 50. The stator 50 is held on the frame 1F by a holding mechanism (not shown). The mover 48 is, for example, a pulley, and is connected to the stator 50 in a state where the fulcrum can move in the X direction while being rotatable. The mover 48 rotates as the bundle 32 moves. In the linear actuator 46, the pulley of the movable element 48 supports the bundle 32.

The moving mechanism 40 moves the position of the bundle 32 by moving the mover 48 of the linear actuator 46 in the X direction. In the moving mechanism 40 of the present embodiment, the fixed pulley 44 and the stator 50 are fixed to the frame 1F, for example. However, the moving mechanism 40 may be fixed to a portion that does not move during exposure of the exposure apparatus 1, that is, a portion that does not scan. .

<Illumination optical unit>
The illumination optical unit 31 guides light emitted from the light source 6 and guided and output by the guide optical unit 30 and enters as light for illuminating the mask M. The illumination optical unit 31 includes partial illumination

optical units

10L and 10R that form the illumination fields SR and SL shown in FIG. 2, and a partial illumination optical unit 10C that forms the illumination field SC. The light output from the optical fiber 7 of the guide optical unit 30 is incident on the partial illumination

optical units

10L and 10R, and the relay

optical systems

11 and 12 cause the emission end face of the optical fiber 7 of the guide optical unit 30 to pass through the fly-eye lens 13. Project onto the entrance surface. At this time, the relay

optical systems

11 and 12 enlarge the exit end face of the optical fiber 7 of the guide optical unit 30 to a predetermined multiple and project it onto the incident surface of the fly-eye lens 13. The fly-eye lens 13 has a plurality of element lenses arranged and joined. In the present embodiment, eight element lenses are arranged in the column direction and ten element lenses are arranged in the row direction, and a total of 80 elements are joined.

The light emitted from the fly-eye lens 13 passes through the σ stop 14. The σ stop 14 determines the illumination NA by limiting the diameter of light. The light that has passed through the σ stop 14 is condensed on the surface of the mask M (the surface on the side of the illumination optical system 2) via the two condenser lenses 15 and the mirror 16 to form an illumination field. The entrance surface of the fly-eye lens 13 and the surface of the mask M have a conjugate relationship, and the illuminance distribution on the entrance surface of the fly-eye lens 13 is averaged so as to overlap each element lens of the fly-eye lens 13. A uniform illuminance distribution can be obtained on the surface. The illumination fields SR and SL shown in FIG. 2 are formed on the surface of the mask M by the partial illumination

optical units

10L and 10R. The partial illumination optical unit 10C that forms the illumination field SC also has the same structure as the partial illumination

optical units

10L and 10R, except that the arrangement of the condenser lens 15 and the mirror 16 is different.

<Projection optical system>
Next, the projection optical system 3 will be described in more detail. The projection optical system 3 is an optical system for forming an image of the mask pattern on the surface of the plate P and projecting it. The projection optical system 3 includes a lens array movably provided between a mask M supported by the mask stage 1T and a plate P supported by the plate stage 1S, and an image of a pattern formed on the mask M is obtained. Project onto the plate P. In the present embodiment, the projection optical system 3 forms an image of the mask pattern on the surface of the plate P and projects it using an imaging optical system using a microlens array. A microlens array is an imaging element in which a number of element lenses are two-dimensionally arranged. The projection optical system 3 has a plurality of micro lens arrays (MLA) 8. As shown in FIGS. 1 and 2, the MLA 8 is mounted on the stage 3 S of the projection optical system 3. As the stage 3S moves along the projection system guide 5P, the MLA 8 moves in the X-axis direction. Although the projection optical system 3 of the present embodiment uses the MLA 8, a lens array other than the micro lens array can be used.

In the present embodiment, MLA8R, MLA8C, and MLA8L are arranged at positions corresponding to the illumination fields SR, SC, and SL formed by the illumination optical system 2, respectively. Hereinafter, when MLA8R, MLA8C, and MLA8L are not distinguished, they are simply referred to as MLA8. In the present embodiment, the illumination visual fields SR, SC, SL are arranged in a staggered manner with a predetermined distance from each other in the X-axis direction toward the Y-axis direction. By doing in this way, since MLA8R, MLA8C, and MLA8L are also arranged in a staggered manner in the Y-axis direction, these interferences can be avoided. As a result, the illumination visual field in the Y-axis direction can be enlarged. Since the MLA 8 is thin, the projection optical system 3 is also thin.

Further, the exposure apparatus 1 includes a distance meter that measures the distance between the mask stage 1T and the plate stage 1S as a detection unit. The exposure apparatus 1 can detect the distance between the mask M and the plate P by measuring the distance between the mask stage 1T and the plate stage 1S with a distance meter. The exposure apparatus 1 adjusts the relative position of the mask stage 1T and the plate stage 1S in the optical axis direction based on the distance between the mask M and the plate P measured by the distance meter when projecting and exposing the mask pattern onto the plate P. To do. Thereby, the exposure apparatus 1 can correctly arrange the mask and the plate at the in-focus position of the projection lens (in this embodiment, the MLA 8 included in the projection optical system 3). The exposure apparatus 1 can correct a focus shift caused by the variation in the thickness of the plate P, and can suppress a decrease in exposure performance.

Further, the exposure apparatus 1 includes a measurement system that measures position information of each stage. As the measurement system, a measurement system that measures position information of each stage using an interferometer system including a laser interferometer may be used, or an encoder system that detects a scale (diffraction grating) provided in each stage. May be used.

<Exposure method>
Next, an exposure method will be described with reference to FIGS. The exposure method according to the present embodiment can be realized by the exposure apparatus 1. 4 and 5 are side views showing a state where the illumination optical unit and the projection optical system of the exposure apparatus shown in FIG. 1 are moved. FIG. 4 shows a state in which the illumination optical unit 31 is arranged at the end on the + side (right side in the figure) in the X direction, and FIG. 5 shows the illumination optical unit 31 on the − side (left side in the figure) in the X direction. It is the state arrange | positioned at the edge part.

When the mask M is air adsorbed on the vacuum chuck of the mask stage 1T of the exposure apparatus 1 and the exposure target plate P is placed on the plate stage 1S, the control device 9 starts projection exposure of the mask pattern on the plate P.

When the projection exposure is started, the control device 9 moves (scans) the illumination optical unit 31 and the projection optical system 3 in the X-axis direction on the movement direction side of the MLA 8, that is, on the movement direction side of the projection optical system 3. For example, the exposure apparatus 1 moves the illumination optical unit 31 and the projection optical system 3 from the position shown in FIG. 4 to the position shown in FIG. 5 or from the position shown in FIG. 5 to the position shown in FIG. Thus, the illumination optical unit 31 and the projection optical system 3 are scanned with respect to the mask M and the plate P. Thus, the exposure apparatus 1 transfers the pattern formed on the mask M to the plate P. Note that the exposure apparatus 1 does not have to move the illumination optical unit 31 and the projection optical system 3 over the entire area in the X direction, that is, from the position shown in FIG. 4 to the position shown in FIG. Depending on the shape of the mask M, the exposure apparatus 1 may perform pattern transfer by scanning that moves the illumination optical unit 31 and the projection optical system 3 to a position between the position shown in FIG. 4 and the position shown in FIG. .

In the exposure apparatus 1, the illumination optical unit 31 and the projection optical system 3 are moved by the moving device 21, and the light path length of the guide optical unit 30, that is, the light source 6 side end (first end) is illuminated by the moving mechanism 40. The position of the optical path is moved while maintaining the optical path length to the optical unit 31 within a predetermined range, that is, substantially the same. The moving mechanism 40 of the present embodiment moves the mover 48 of the linear actuator 46 in the same direction as the movement of the illumination optical unit 31 and the projection optical system 3 in the X direction, the same distance as the illumination optical unit 31 and the projection optical system 3, Move. When the mover 48 of the moving mechanism 40 moves, the bundle 32 supported by the mover 48 also moves. When the mover 48 moves, the relative position between the mover 48 and the fixed pulley 44 changes. The bundle 32 moves at a position in contact with the fixed pulley 44 in response to a change in the relative position between the movable element 48 and the fixed pulley 44. The fixed pulley 44 can rotate and change the position where it comes into contact with the bundle 32, so that the contact position can be changed smoothly.

In the exposure apparatus 1, the guide optical unit 30 that guides the light output from the light source 6 to the illumination optical unit 31 includes the optical fiber 7, and fixes one end of the optical fiber 7 to the light source 6. Are fixed to the illumination optical unit 31. Thereby, the exposure apparatus 1 can maintain the optical path length until the light output from the light source 6 reaches the illumination optical unit 31 within a predetermined range. That is, even if the illumination optical unit 31 moves in the Z direction during exposure, the optical path length between the fixed light source 6 and the moving illumination optical unit 31 can be maintained within a predetermined range. As a result, the exposure apparatus 1 can suppress the light that illuminates the mask M from fluctuating depending on the position of the mask M in the X direction, and can irradiate the mask M with stable light. The pattern of M can be transferred more appropriately.

In the exposure apparatus 1, the optical fiber 7 of the guide optical unit 30 is arranged on the optical path of the illumination light whose one end (the end on the first end side) is output from the light source 6 and the other end ( The moving device 21 may move the second end portion side end) together with the illumination optical unit 31. That is, the exposure apparatus 1 does not have to fix the end of the guide optical unit 30 on the light source 6 side to the light source 6. In this case, the optical path length can be maintained within a predetermined range by adjusting the optical path amount based on the relative position shift between the light source 6 and the guide optical unit 30. Thereby, even when it is set as the structure which can adjust the position of the light source 6, the process similar to the above is realizable.

Further, the exposure apparatus 1 fixes the light source 6 to a position at which the light source 6 is not scanned at the time of exposure, such as the frame 1F, in this embodiment, to the support base 20, that is, the light source is a scanning optical system (illumination optical unit and projection optical system). By separating, the structure for scanning at the time of exposure can be reduced in weight. Thereby, the enlargement of the drive source which scans the structure to scan can be suppressed, and the enlargement of the mechanism which supports the structure to scan can be suppressed. Therefore, the exposure apparatus 1 can reduce the size of the scanning exposure system and can reduce the energy required for scanning of the scanning exposure system.

Further, the exposure apparatus 1 maintains the optical path amount between the light source 6 and the illumination optical unit 31 within a predetermined range with the guide optical unit 30, so that the scanning optical system can be separated from the scanning optical system. The exposure conditions can be prevented from fluctuating depending on the position, and exposure can be performed with performance comparable to that when the light source is integrated with the scanning optical system. In addition, the exposure apparatus 1 can be enlarged in size by leaving the scanning configuration as it is by separating the light source from the scanning optical system. Thereby, the output of a light source can be enlarged easily, the illumination intensity of light can be improved, and production efficiency can be improved. For example, the exposure apparatus 1 is provided with a plurality of light sources that output laser light for one optical fiber 7 (or one partial illumination optical unit), and the light output from the plurality of light sources is incident on one optical fiber. By doing so, the illuminance can be increased.

Further, the exposure apparatus 1 uses the moving mechanism 40 to move the guide optical unit 30 in accordance with the movement of the illumination optical unit 31 and the projection optical system 3, thereby guiding the light output from the light source 6. 7 can be moved smoothly. In the exposure apparatus 1, a part of the other end of the optical fiber 7 is supported by a housing that supports the illumination optical unit 31. For this reason, in the exposure apparatus 1, a housing that supports the illumination optical unit 31 and a movement mechanism that moves the illumination optical unit 31 are also part of the movement mechanism 40.

Further, in the moving mechanism 40, it is preferable that the diameter (radius) of the pulley of the fixed pulley 44 and the movable element 48 is larger than the allowable bending of the optical fiber 7 (or the bundle 32). Thereby, light can be guided without impairing the light guide characteristics of the optical fiber 7 guided by the moving mechanism 40.

In addition, although the exposure apparatus 1 is provided with the fixed pulley 44 and the linear actuator 46 that assist the movement of the optical fiber 7 as the moving mechanism 40, it is not always necessary to provide it. Since the moving mechanism that moves the guide optical unit 30 only needs to maintain the optical path length of the guide optical unit 30 within a predetermined range, when using the optical fiber 7 as in the present embodiment, both ends of the optical fiber 7 are fixed, What is necessary is just to make it the state which can move at least one part of another area | region. That is, the exposure apparatus 1 can use the optical fiber 7 as part of a moving mechanism that maintains the optical path length within a predetermined range.

<Embodiment 2>
Hereinafter, the exposure apparatus of Embodiment 2 will be described with reference to FIG. FIG. 6 is a side view of the exposure apparatus according to the second embodiment. The exposure apparatus 101 of Embodiment 2 shown in FIG. 6 has the same configuration as the exposure apparatus 1 except for the configuration of the guide optical unit 130 and the moving mechanism 140 of the illumination optical system 102. A description of the same configuration as that of the exposure apparatus 1 will be omitted, and a configuration unique to the exposure apparatus 101 will be described.

The exposure apparatus 101 includes a frame 1F, an illumination optical system 102, a projection optical system 3, a moving device 21, and a moving mechanism 140. The illumination optical system 102 includes a guide optical unit 130 and an illumination optical unit 31. The guide optical unit 130 includes a plurality of partial guide optical units 131. The partial guide optical unit 131 includes a beam expander including a concave lens 132 and a convex lens 133, a bundle fiber 134, a condenser lens 135, and a rod integrator 136. One partial guide optical unit 131 is provided for each of the partial illumination

optical units

10C, 10R, and 10L. In the partial illumination

optical units

10C, 10R, and 10L of the present embodiment, the relay optical system 11 is not disposed. The support base 20 supports the light source 6 and a part of the partial guide optical unit 131 on the light source 6 side.

The partial guide optical unit 131 expands the light output from the light source 6 with a beam expander composed of a concave lens 132 and a convex lens 133 and makes the light enter the bundle fiber 134. The bundle fiber 134 is an aggregate of optical fibers in which a plurality of optical fibers are collected, and guides light through each optical fiber. The bundle fiber 134 has one end fixed to the light source 6 and the other end fixed to the illumination optical unit 31. The other end of the bundle fiber 134 is supported by the housing of the illumination optical unit 31. The bundle fiber 134 of the present embodiment has a configuration in which 130 optical fibers having an NA of 0.2 and φ0.25 mm are bundled, and the overall φ is 3 mm. The light output from the bundle fiber 134 enters the condenser lens 135. The condenser lens 135 is supported by the housing of the illumination optical unit 31.

The rod integrator 136 is disposed at a position facing the other end of the bundle fiber 134, that is, the end on the light output side through the condenser lens 135. The rod integrator 136 is output from the bundle fiber 134 and receives light collected by the condenser lens 135. The rod integrator 136 is supported by the housing of the illumination optical unit 31, specifically, the support portion 22 that supports the illumination optical unit 31. The rod integrator 136 emits the incident light toward the illumination optical unit 31. The rod integrator 136 of this embodiment is a hexagonal rod integrator.

The moving mechanism 140 has a plurality of partial moving mechanisms 141 arranged corresponding to the partial guide optical unit 131. The partial moving mechanism 141 maintains the optical path length from the end (first end) on the light source 6 side of the corresponding partial guide optical unit 131 to the illumination optical unit 31 within a predetermined range, while the partial guide optical unit 131 This is a mechanism for moving the position, and the corresponding partial guide optical unit 131 is moved in accordance with the movement of the illumination optical unit 31. The partial movement mechanism 141 includes a fixed pulley 144 and a linear actuator 146 that are mechanisms for moving the bundle fiber 134. As described above, the condenser lens 135 and the rod integrator 136 are supported by the casing of the illumination optical unit 31 and move together with the illumination optical unit 31. The linear actuator 146 includes a mover 148 and a stator 150. The fixed pulley 144 and the linear actuator 146 have the same configuration as the fixed pulley 44 and the linear actuator 46 of the moving mechanism 40.

The exposure apparatus 101 is configured as described above. By using a bundle fiber as an optical member for guiding light, the number of fibers can be increased, and output from the end face of the guide optical unit 130 (end face of the bundle fiber). Can be averaged, and fluctuations in the total amount of emitted light on the exit end face can be reduced.

In addition, the exposure apparatus 101 can be provided for each partial guide optical unit 131 as in the moving mechanism 140 of the present embodiment. However, like the exposure apparatus 1, all the partial guide optical units 131 are formed by one mechanism. May be moved.

<Embodiment 3>
Hereinafter, the exposure apparatus of Embodiment 3 will be described with reference to FIGS. 7 and 8. FIG. 7 is a side view of the exposure apparatus according to the third embodiment. FIG. 8 is a side view showing a state where the illumination optical unit and the projection optical system of the exposure apparatus shown in FIG. 7 are moved. The exposure apparatus 201 of Embodiment 3 shown in FIGS. 7 and 8 has the same configuration as the exposure apparatus 101 except for the configuration of the guide optical unit 230 and the moving mechanism 240 of the illumination optical system 202. A description of the same configuration as that of the exposure apparatus 101 is omitted, and a configuration unique to the exposure apparatus 201 will be described. The exposure apparatus 201 uses a reflecting member instead of an optical fiber as a guide optical unit.

The exposure apparatus 201 includes a frame 1F, an illumination optical system 202, a projection optical system 3, a moving device 21, and a moving mechanism 240. The illumination optical system 202 includes a guide optical unit 230 and an illumination optical unit 31. The guide optical unit 230 includes a plurality of partial guide optical units 231. The partial guide optical unit 231 includes a beam expander including a concave lens 232 and a convex lens 233, a mirror 234, a mirror 235, a condenser lens 236, and a rod integrator 237. One partial guide optical unit 231 is provided for each of the partial illumination

optical units

10C, 10R, and 10L. Note that the relay optical system 11 is not arranged in the partial illumination

optical units

10C, 10R, and 10L of the present embodiment. The support base 20 supports the light source 6 and a part of the partial guide optical unit 231 on the light source 6 side.

The partial guide optical unit 231 expands the light output from the light source 6 with a beam expander composed of a concave lens 232 and a convex lens 233 to obtain parallel light. The light that has passed through the convex lens 233 is reflected by the mirror 234 and then reflected by the mirror 235. The light reflected by the mirror 235 enters the condenser lens 236 and is condensed. The light condensed by the condenser lens 236 is incident on the rod integrator 237. The rod integrator 237 emits the incident light toward the illumination optical unit 31.

Here, the mirror 234 is supported by the mirror driving unit 242. The mirror 235 is supported by the mirror driving unit 243. The condenser lens 236 and the rod integrator 237 are supported by the housing of the illumination optical unit 31. The mirror driving unit 243 is supported by the housing of the illumination optical unit 31. Therefore, the mirror 235, the condenser lens 236, and the rod integrator 237 move integrally with the illumination optical unit 31.

The moving mechanism 240 has a plurality of partial moving mechanisms 241 arranged corresponding to the partial guide optical units 231. The partial moving mechanism 241 maintains the optical path length from the end (first end) on the light source 6 side of the corresponding partial guide optical unit 231 to the illumination optical unit 31 within a predetermined range, while the partial guide optical unit 231 It is a mechanism for moving the position, and the corresponding partial guide optical unit 231 is moved in accordance with the movement of the illumination optical unit 31. The partial movement mechanism 241 includes a mirror driving unit 242 that moves the mirror 234 and a mirror driving unit 243 that moves the mirror 235. Further, in the exposure apparatus 201, as described above, the mirror 235, the condenser lens 236, and the rod integrator 237 move integrally with the illumination optical unit 31. The mirror driving unit 242 is a mechanism that moves the mirror 234 in the X direction and rotates the mirror 234 around the Y axis. The mirror driving unit 243 is a mechanism that rotates the mirror 235 around the Y axis.

The partial movement mechanism 241 rotates the mirror 234 around the Y axis while moving the mirror 234 in the X direction by the mirror driving unit 242 in accordance with the movement of the illumination optical unit 31 and the projection optical system 3 in the X direction. The partial movement mechanism 241 rotates the mirror 235 around the Y axis by the mirror driving unit 243 in accordance with the movement of the illumination optical unit 31 and the projection optical system 3 in the X direction. In this way, the partial movement mechanism 241 rotates the

mirrors

234 and 235 so that the light source 6 can be moved even if the illumination optical unit 31 and the projection optical system 3 move in the X direction as shown in FIGS. The light output from is reflected by the

mirrors

234 and 235 to maintain the state of being incident on the illumination optical unit 31. Further, the partial moving mechanism 241 moves the mirror 234 in the X direction, so that the illumination optical unit 31 and the projection optical system 3 move in the X direction as shown in FIGS. The optical path length of the light from the end portion (first end portion) to the illumination optical unit 31 is maintained within a predetermined range.

As shown in the exposure apparatus 201 of Embodiment 3, even when the

mirrors

234 and 235 are used for the guide optical unit 230, the

mirrors

234 and 235 are moved in accordance with the movement of the illumination optical unit 31 and the projection optical system 3 in the X direction. The optical path length of light from the end (first end) on the light source 6 side to the illumination optical unit 31 is maintained within a predetermined range by moving the mirror 234, which is one of the mirrors, in the X direction while rotating. can do. Further, by using a mirror for the guide optical unit 230, it is possible to increase the efficient use of the light output from the light source 6.

<Embodiment 4>
Hereinafter, the exposure apparatus according to the fourth embodiment will be described with reference to FIGS. 9 and 10. FIG. 9 is a side view of the exposure apparatus according to the fourth embodiment. FIG. 10 is a side view showing a state where the illumination optical unit and the projection optical system of the exposure apparatus shown in FIG. 9 are moved. The exposure apparatus 301 of Embodiment 4 shown in FIGS. 9 and 10 has the same configuration as the exposure apparatus 201 except for the configuration of the guide optical unit 330 and the moving mechanism 340. A description of the same configuration as that of the exposure apparatus 201 will be omitted, and a configuration specific to the exposure apparatus 301 will be described.

The exposure apparatus 301 includes a frame 1F, an illumination optical system 302, a projection optical system 3, a moving device 21, and a moving mechanism 340. The illumination optical system 302 includes a guide optical unit 330 and an illumination optical unit 31. The guide optical unit 330 includes a plurality of partial guide optical units 331. The partial guide optical unit 331 includes a beam expander including a concave lens 332 and a convex lens 333, mirrors 334, 335, 336, 337, a condenser lens 338, and a rod integrator 339. One partial guide optical unit 331 is provided for each of the partial illumination

optical units

10C, 10R, and 10L of the present embodiment. The support base 20 supports the light source 6 and a part of the partial guide optical unit 331 on the light source 6 side.

The partial guide optical unit 331 expands the light output from the light source 6 with a beam expander composed of a concave lens 332 and a convex lens 333 to obtain parallel light. The light that has passed through the convex lens 333 is reflected by the mirror 334 and then is reflected in the order of the mirror 335, the

mirrors

336, and 337. The light reflected by the mirror 337 enters the condenser lens 338 and is condensed. The light condensed by the condenser lens 338 is incident on the rod integrator 339. The rod integrator 339 emits incident light toward the illumination optical unit 31.

Here, the mirror 334 is fixed to the frame 1F and fixed to a predetermined position with respect to the light source 6. The mirror 335 is supported by the mirror driving unit 342. The mirror 336 is supported by the mirror driving unit 343. The mirror 337, the condenser lens 338, and the rod integrator 339 are supported by the housing of the illumination optical unit 31. Accordingly, in the partial guide optical unit 331, the mirror 334 is fixed at a predetermined position, and the mirror 337, the condenser lens 338, and the rod integrator 339 move integrally with the illumination optical unit 31.

The moving mechanism 340 includes a plurality of partial moving mechanisms 341 arranged corresponding to the partial guide optical unit 331. The partial movement mechanism 341 maintains the optical path length from the end portion (first end portion) on the light source 6 side of the corresponding partial guide optical unit 331 to the illumination optical unit 31 within a predetermined range, while the partial guide optical unit 331 This is a mechanism for moving the position, and the corresponding partial guide optical unit 331 is moved in accordance with the movement of the illumination optical unit 31. The partial movement mechanism 341 includes a mirror driving unit 342 that moves the mirror 335 and a mirror driving unit 343 that moves the mirror 336. In the exposure apparatus 301, as described above, the mirror 337, the condenser lens 338, and the rod integrator 339 move together with the illumination optical unit 31. The mirror driving unit 342 is a mechanism that moves the mirror 335 in the Y direction. The mirror driving unit 343 is a mechanism that moves the mirror 336 in the X direction and the Y direction.

The partial movement mechanism 341 moves the mirror 335 in the Y direction by the mirror driving unit 342 in accordance with the movement of the illumination optical unit 31 and the projection optical system 3 in the X direction. The partial movement mechanism 341 moves the mirror 336 in the X direction and the Y direction by the mirror driving unit 343 in accordance with the movement of the illumination optical unit 31 and the projection optical system 3 in the X direction. Here, in the present embodiment, the light source 6 outputs light in the X direction, and the

mirrors

334, 335, 336, and 337 are in a direction to refract the light at right angles on the XY plane. The mirror driving unit 343 moves the mirror 336 to a position where the X coordinate is the same as the mirror 337 and the Y coordinate is the same as the mirror 335. As described above, the partial movement mechanism 341 moves the

mirrors

335 and 336, so that the light source 6 can be moved even if the illumination optical unit 31 and the projection optical system 3 move in the X direction as shown in FIGS. 9 and 10. The light output from is reflected by the

mirrors

334, 335, 336, and 337 to maintain the state of being incident on the illumination optical unit 31. Further, the partial movement mechanism 341 moves the mirror 335 and the mirror 336 in the Y direction, so that when the distance between the mirror 335 and the mirror 336 increases, the distance between the mirror 334 and the mirror 335, and the mirror 336 and the mirror 337. Reduce the distance to When the distance between the mirror 335 and the mirror 336 decreases, the partial movement mechanism 341 increases the distance between the mirror 334 and the mirror 335 and increases the distance between the mirror 336 and the mirror 337. 9 and 10, even if the illumination optical unit 31 and the projection optical system 3 move in the X direction, the light source 6 side end (first end) to the illumination optical unit 31 can be moved. The optical path length of light is maintained within a predetermined range.

As shown in the exposure apparatus 301 of the fourth embodiment, even when the light guiding path by the guide optical unit 330 is a different path, the mirror is adjusted in accordance with the movement of the illumination optical unit 31 and the projection optical system 3 in the X direction. By moving one of the

mirrors

335 and 336, the optical path length of light from the end (first end) on the light source 6 side to the illumination optical unit 31 can be maintained within a predetermined range. Further, the exposure apparatus 301 can maintain a state in which light is incident on the illumination optical unit 31 without rotating the mirror even if the positions of the illumination optical unit 31 and the projection optical system 3 in the X direction change. it can. Thereby, control can be simplified.

<Embodiment 5>
Hereinafter, the exposure apparatus of Embodiment 5 will be described with reference to FIGS. 11 and 12. FIG. 11 is a side view of the exposure apparatus according to the fifth embodiment. FIG. 12 is a side view showing a state where the illumination optical unit and the projection optical system of the exposure apparatus shown in FIG. 11 are moved. The exposure apparatus 401 of Embodiment 4 shown in FIGS. 11 and 12 has the same configuration as the exposure apparatus 301 except for the configuration of the guide optical unit 430 and the moving mechanism 440. A description of the same configuration as that of the exposure apparatus 301 will be omitted, and a configuration specific to the exposure apparatus 401 will be described.

The exposure device 401 includes a frame 1F, an illumination optical system 402, a projection optical system 3, a moving device 21, and a moving mechanism 440. The illumination optical system 402 includes a guide optical unit 430 and an illumination optical unit 31. The guide optical unit 430 includes a plurality of partial guide optical units 431. The partial guide optical unit 431 includes a beam expander including a concave lens 432 and a convex lens 433, a mirror 434, a corner cube 435, a mirror 436, a condenser lens 437, and a rod integrator 438. One partial guide optical unit 431 is provided for each of the partial illumination

optical units

10C, 10R, and 10L of the present embodiment. The support base 20 supports a part of the light source 6 and the partial guide optical unit 431 on the light source 6 side.

The partial guide optical unit 431 expands the light output from the light source 6 with a beam expander composed of a concave lens 432 and a convex lens 433 to obtain parallel light. The light that has passed through the convex lens 433 is reflected by the mirror 434 and then is reflected in the order of the corner cube 435 and the mirror 436. The light reflected by the mirror 436 enters the condenser lens 437 and is condensed. The light condensed by the condenser lens 437 enters the rod integrator 438. The rod integrator 438 emits the incident light toward the illumination optical unit 31.

Here, the

mirrors

434 and 436 are fixed to the frame 1F and fixed to a predetermined position with respect to the light source 6. The corner cube 435 is supported by the drive unit 442. The condenser lens 437 and the rod integrator 438 are supported by the housing of the illumination optical unit 31. Accordingly, in the partial guide optical unit 431, the

mirrors

434 and 436 are fixed at predetermined positions, and the condenser lens 437 and the rod integrator 438 move integrally with the illumination optical unit 31.

The moving mechanism 440 has a plurality of partial moving mechanisms 441 arranged corresponding to the partial guide optical unit 431. The partial moving mechanism 441 maintains the optical path length from the end (first end) on the light source 6 side of the corresponding partial guide optical unit 431 to the illumination optical unit 31 within a predetermined range, while the partial guide optical unit 431 This is a mechanism for moving the position, and the corresponding partial guide optical unit 431 is moved in accordance with the movement of the illumination optical unit 31. The partial moving mechanism 441 includes a driving unit 442 that moves the corner cube 435. In the exposure apparatus 401, as described above, the condenser lens 437 and the rod integrator 438 move integrally with the illumination optical unit 31. The drive unit 442 is a mechanism that moves the corner cube 435 in the Y direction.

The partial movement mechanism 441 moves the corner cube 435 in the Y direction by the driving unit 442 in accordance with the movement of the illumination optical unit 31 and the projection optical system 3 in the X direction. Here, in the present embodiment, the light source 6 outputs light in the X direction, and the

mirrors

434 and 436 refract the light at right angles on the XY plane. The drive unit 442 moves in the Y direction by a distance that is half the amount of movement of the illumination optical unit 31 in the X direction. In this way, the partial movement mechanism 441 moves the corner cube 435 so that the illumination optical unit 31 and the projection optical system 3 move from the light source 6 even if the illumination optical unit 31 and the projection optical system 3 move in the X direction, as shown in FIGS. The output light is reflected by the mirror 434, the corner cube 435, and the mirror 436, and the state where the light is incident on the illumination optical unit 31 is maintained. Further, the partial movement mechanism 441 moves the corner cube 435 in the Y direction, so that even if the illumination optical unit 31 and the projection optical system 3 move in the X direction, the end of the partial guide optical unit 431 on the light source 6 side. The optical path length of light from the (first end) to the illumination optical unit 31 is maintained within a predetermined range.

As shown in the exposure apparatus 401 of the fifth embodiment, a corner cube 435 is provided as a mirror in the guide optical unit 430, and the corner cube 435 is moved by moving the position of the corner cube 435, which is one of the mirrors, by the moving mechanism 440. The optical path length of the light from the end (first end) on the light source 6 side of the partial guide optical unit 431 to the illumination optical unit 31 is maintained within a predetermined range only by controlling the movement in one direction of the position. Can be executed. Thereby, control can be simplified.

<Embodiment 6>
Hereinafter, the exposure apparatus 501 of Embodiment 6 will be described with reference to FIGS. 13 to 17. FIG. 13 is a side view of the exposure apparatus according to the sixth embodiment. FIG. 14 is a view of the exposure apparatus according to the sixth embodiment as seen from between the projection optical system and the mask. FIG. 15 is a view of the exposure apparatus according to the sixth embodiment as viewed from the direction in which the illumination optical unit and the projection optical system move. FIG. 16 is a side view showing a state where the illumination optical unit and the projection optical system of the exposure apparatus shown in FIG. 13 are moved. FIG. 17 is a side view showing a state where the illumination optical unit and the projection optical system of the exposure apparatus shown in FIG. 13 are moved.

The exposure apparatus 501 includes a frame 1F, an illumination optical system 502, a projection optical system 503, a moving apparatus 21, and a moving mechanism 540. The illumination optical system 502 includes a guide optical unit 530 and an illumination optical unit 550. The projection optical system 3 included in the exposure apparatus 1 (see FIG. 1 and the like) described above includes a plurality of MLAs 8, but the projection optical system 503 included in the exposure apparatus 501 of the present embodiment extends in the Y-axis direction. It has one MLA 508. Further, the illumination optical unit 550 emits light to the projection optical system 503 using one concave mirror 516. The exposure apparatus 1 guides the light output from one light source 506 by the guide optical unit 530 and causes the light to enter the illumination optical unit 550. The support 20 supports a part of the light source 506 and the guide optical unit 530 on the light source 506 side.

The guide optical unit 530 includes a condenser lens 531 and an optical fiber 532. The guide optical unit 530 condenses the light emitted from the light source 506 by the condenser lens 531 and enters the optical fiber 532. The light guided by the optical fiber 532 enters the illumination optical unit 550. Here, like the optical fiber 7, one end of the optical fiber 532 is fixed to the light source 506, and the other end is fixed to the illumination optical unit 550.

The moving mechanism 540 has the same configuration as the moving mechanism 40 of the exposure apparatus 1 and includes a fixed pulley 44 and a linear actuator 46. The moving mechanism 540 moves the mover 48 of the linear actuator 46 in the X direction in accordance with the movement of the illumination optical unit 550 and the projection optical system 503 in the X direction, and smoothly assists the movement of the optical fiber 532 in the X direction. .

The illumination optical unit 550 is configured to output the light guided by the guide optical unit 530 as light for illuminating the mask M. The illumination optical unit 550 has an optical system that forms an illumination field S shown in FIG. In the illumination optical unit 550, the light guided by the guide optical unit 530 is collimated by the relay optical system 511, reflected by the mirror 512, and enters the fly-eye lens 514 via the relay optical system 513. At this time, the relay

optical systems

511 and 513 enlarge the exit end face of the optical fiber 532 to a predetermined multiple and enter the incident face of the fly-eye lens 514. The fly-eye lens 514 has a plurality of element lenses arranged and joined. In this embodiment, five element lenses are arranged in the column direction and 17 element lenses are arranged in the row direction, and a total of 85 elements are joined. The light emitted from the fly-eye lens 514 passes through the σ stop 515. The σ stop 515 determines the illumination NA by limiting the diameter of light passing therethrough. The light that has passed through the σ stop 515 is condensed on the surface of the mask M (surface on the side of the illumination optical unit 550) by the concave mirror 516 to form an illumination field S.

The projection optical system 503 has one MLA 508 extending in the Y-axis direction. The MLA 508 is disposed at a position corresponding to the illumination visual field S formed by the illumination optical unit 550. The MLA 508 is mounted on the stage 503S of the projection optical system 503. As the stage 503S moves along the projection system guide 5P, the MLA 508 moves in the X-axis direction.

The exposure apparatus 501 is configured as described above. As shown in FIGS. 16 and 17, the movable element 48 of the linear actuator 46 is moved in the same direction as the movement of the illumination optical unit 550 and the projection optical system 503 in the X direction. Are moved the same distance as the illumination optical unit 550 and the projection optical system 503. That is, the exposure apparatus 501 performs the same control as the movement mechanism 40 of the exposure apparatus 1. In this manner, the optical fiber 532 can be moved more smoothly in the X direction by the moving mechanism 540, so that the optical fiber 532 can be driven more smoothly by the illumination optical unit 550.

As described above, even when the entire illumination field S is illuminated by one illumination optical unit 550, the light guide 6 side of the guide optical unit 530 is composed of the guide optical unit 530 and the moving mechanism 540 as described above. By maintaining the distance from the end portion (first end portion) to the illumination optical unit 550 within a predetermined range, the same effect as in the above embodiment can be obtained.

<Device manufacturing method>
FIG. 18 is a flowchart showing each step of the device manufacturing method according to the present embodiment. In manufacturing a device by the device manufacturing method according to the present embodiment, first, the function and performance of the device (electronic device) are designed (step S201). Next, a mask M based on the design in step S201 is manufactured (step S202). Next, a process in which the mask pattern of the mask M manufactured in step S202 is projected and exposed onto the plate P on which the resist has been applied, a process in which the exposed plate P is developed, a process in which the developed plate P is heated, and an etching process A substrate process including the above is performed (step S203).

In the process in which the mask pattern is projected and exposed to the plate P in the substrate processing, the pattern formed on the mask M by the

exposure apparatuses

1, 101, 201, 301, 401, and 501 executing the exposure method according to the present embodiment. That is, a pattern having the same shape as the mask pattern is transferred to the plate P. The plate P to which the mask pattern is transferred is processed based on the transferred pattern by development, heating, and etching. When the substrate processing is completed, device assembly including processing processes such as a dicing process, a bonding process, and a packaging process is performed (step S204), and the device is completed through subsequent inspection (step S205).

Although the projection system (mainly the projection optical system) of the

exposure apparatuses

1, 101, 201, 301, 401, and 501 of the above embodiment has been described as a case where the projection magnification is 1, the present invention is not limited to this. The exposure apparatuses 1, 101, 201, 301, 401, and 501 can change the projection magnification to an arbitrary magnification by changing the arrangement and focal position of lenses that constitute the optical system of the projection system. The exposure apparatuses 1, 101, 201, 301, 401, and 501 have a configuration in which the projection magnification is less than 1, the line width of the mask pattern is reduced by the projection magnification, and an image is formed on the plate P, that is, the mask pattern The line width may be several times (2 times, 3 times) the line width of the pattern formed on the plate P. The

exposure apparatus

1, 101, 201, 301, 401, 501 has a configuration in which the projection magnification is larger than 1, the line width of the mask pattern is enlarged by the projection magnification, and an image is formed on the plate P, that is, The line width of the mask pattern may be a fraction (1/2, 1/3) of the line width of the pattern imaged on the plate P.

The plate P is not limited to a glass substrate for a display device, but also a semiconductor wafer for manufacturing a semiconductor device, a ceramic wafer for a thin film magnetic head, or a mask or reticle used in an exposure apparatus (synthetic quartz, A silicon wafer) or the like can be used.

Further, the present invention relates to a twin stage type exposure having a plurality of substrate stages as disclosed in US Pat. No. 6,341,007, US Pat. No. 6,208,407, US Pat. No. 6,262,796 and the like. It can also be applied to devices.

Further, the present invention relates to a substrate stage for holding a substrate as disclosed in US Pat. No. 6,897,963 and European Patent Application No. 1713113, and a reference mark without holding the substrate. The present invention can also be applied to an exposure apparatus that includes a formed reference member and / or a measurement stage on which various photoelectric sensors are mounted. An exposure apparatus including a plurality of substrate stages and measurement stages can be employed.

The types of

exposure apparatuses

1, 101, 201, 301, 401, and 501 are not limited to exposure apparatuses for manufacturing liquid crystal display elements or displays, but exposure apparatuses for manufacturing semiconductor elements that expose a semiconductor element pattern on a plate P. It can be widely applied to an exposure apparatus for manufacturing a thin film magnetic head, an imaging device (CCD), a micromachine, a MEMS, a DNA chip, a reticle, a mask, or the like.

In the above-described embodiment, a light-transmitting mask in which a predetermined light-shielding pattern (or phase pattern / dimming pattern) is formed on a light-transmitting substrate is used. As disclosed in US Pat. No. 6,778,257, a variable shaped mask (also called an electronic mask, an active mask, or an image generator) that forms a transmission pattern, a reflection pattern, or a light emission pattern based on electronic data of a pattern to be exposed. ) May be used. Further, a pattern forming apparatus including a self-luminous image display element may be provided instead of the variable molding mask including the non-luminous image display element.

The exposure apparatuses 1, 101, 201, 301, 401, and 501 according to the above-described embodiments are used to convert various subsystems including the constituent elements recited in the claims of the present application into predetermined mechanical accuracy, electrical accuracy, and optical accuracy. Manufactured by assembling to maintain accuracy. In order to ensure these various accuracies, before and after assembly, various optical systems are adjusted to achieve optical accuracy, various mechanical systems are adjusted to achieve mechanical accuracy, and various electrical systems are Adjustments are made to achieve electrical accuracy. The assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. After the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus. The exposure apparatus is preferably manufactured in a clean room in which the temperature and cleanliness are controlled.

It should be noted that the requirements of the above-described embodiments and modifications can be combined as appropriate. Some components may not be used. In addition, various omissions, substitutions, or changes of components can be made without departing from the scope of the present invention. In addition, as long as it is permitted by law, the disclosure of all published publications and US patents related to the exposure apparatus and the like cited in the above-described embodiments and modifications are incorporated herein by reference. As described above, all other embodiments and operation techniques made by those skilled in the art based on the above-described embodiments are all included in the scope of the present invention.

1, 101, 201, 301, 401, 501 Exposure apparatus 1S Plate stage 1T Mask stage 2 Illumination optical system 3 Projection optical system 3S Stage 6 Light source 7 Optical fiber 9

Controllers

10C, 10L, 10R Partial illumination

optical units

11, 12 511, 513 Relay

optical system

13, 514 Fly eye lens 15 Condenser lens 16 Mirror 20 Support base 21 Moving device 22 Support unit 30 Guide optical unit 31 Illumination optical unit 32 Bundle 40 Moving mechanism 44 Fixed pulley 46 Linear actuator 48 Movable element 50 Fixed Child 516 Concave mirror

Claims

An exposure apparatus comprising a mask support mechanism for supporting a mask on which a pattern is formed and a plate support mechanism for holding a plate, and transferring the pattern onto the plate using illumination light output from a light source,
An illumination optical system for irradiating the mask with the illumination light;
A lens array that projects an image of the pattern illuminated by the illumination optical system onto the plate;
A moving device that includes a support unit that supports at least a part of the illumination optical system and the lens array, and moves the support unit in a direction along the mask and the plate relative to the light source;
An exposure apparatus.
2. The exposure apparatus according to claim 1, wherein the illumination optical system includes an illumination optical unit supported by the support portion, and a guide optical unit that guides the illumination light to the illumination optical unit.
The guide optical unit has a first end on the light source side disposed on an optical path of the illumination light output from the light source, and a second end on the illumination optical unit side together with the illumination optical unit and the moving device. The exposure apparatus according to claim 2, wherein the exposure apparatus is moved by the step.
4. The exposure apparatus according to claim 3, wherein the guide optical unit maintains an optical path length from the first end to the illumination optical unit within a predetermined range as the second end is moved by the moving device.
The guide optical unit includes an optical fiber,
5. The exposure apparatus according to claim 3, wherein one end of the optical fiber is fixed to the light source, and the other end is fixed to the illumination optical system.
6. The exposure apparatus according to claim 5, wherein the moving device further includes a moving mechanism that moves the optical fiber in accordance with the movement of the illumination optical unit.
The guide optical unit includes at least one mirror that reflects the illumination light,
The exposure apparatus according to claim 3, wherein the moving device moves the mirror in accordance with the movement of the illumination optical unit and maintains an optical path length from the first end to the illumination optical unit within a predetermined range.
The exposure apparatus according to claim 7, wherein the at least one mirror includes a corner cube.
The illumination optical unit has a plurality of partial illumination optical units,
The guide optical unit has a plurality of partial guide optical units corresponding to the partial illumination optical unit,
The exposure apparatus according to claim 2, wherein the illumination light is incident on each of the plurality of partial guide optical units.
The exposure apparatus according to any one of claims 1 to 9, wherein the illumination light is laser light.
An exposure method of irradiating a mask with illumination light output from a light source via an illumination optical system, and transferring a pattern formed on the mask to a plate via a lens array,
The illumination optical system is irradiated with the illumination light from the illumination optical system while moving at least a part of the illumination optical system and the lens array in a direction along the mask and the plate relative to the light source. An exposure method comprising projecting an image of the pattern onto the plate through the lens array.
A first unit that is moved together with the illumination optical system and the lens array; and a second unit that guides the illumination light to the first unit;
The exposure method according to claim 11, wherein an end portion on the first unit side of the second unit is moved together with the first unit.
13. The exposure method according to claim 12, wherein the optical path length from the light source side end of the second unit to the first unit is maintained within a predetermined range as the end of the first unit moves.
Transferring the pattern formed on the mask to a plate by the exposure method according to any one of claims 11 to 13;
Processing the plate to which the pattern has been transferred based on the transferred pattern.