WO2013169015A1 - Continuous plating apparatus - Google Patents

Continuous plating apparatus Download PDF

Info

Publication number
WO2013169015A1
WO2013169015A1 PCT/KR2013/004051 KR2013004051W WO2013169015A1 WO 2013169015 A1 WO2013169015 A1 WO 2013169015A1 KR 2013004051 W KR2013004051 W KR 2013004051W WO 2013169015 A1 WO2013169015 A1 WO 2013169015A1
Authority
WO
WIPO (PCT)
Prior art keywords
roller
plated body
frame
plating
cathode
Prior art date
Application number
PCT/KR2013/004051
Other languages
French (fr)
Korean (ko)
Inventor
정광춘
유명봉
한영구
온웅구
Original Assignee
주식회사 잉크테크
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 주식회사 잉크테크 filed Critical 주식회사 잉크테크
Priority to CN201380023789.6A priority Critical patent/CN104271814B/en
Publication of WO2013169015A1 publication Critical patent/WO2013169015A1/en

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/02Tanks; Installations therefor
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils
    • C25D7/0628In vertical cells
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils
    • C25D7/0642Anodes
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils
    • C25D7/0657Conducting rolls
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/06Wires; Strips; Foils
    • C25D7/0614Strips or foils
    • C25D7/0685Spraying of electrolyte

Definitions

  • the present invention relates to a continuous plating apparatus, and more particularly, to a continuous plating apparatus capable of forming a plating layer by spraying a plating solution only on a target portion to be plated.
  • a horizontal plating method for continuously plating the plated body is used.
  • Such plating is a plating bath in which a plating solution is stored and an inlet and an outlet through which a plated body is inserted and discharged are formed, an insoluble anode, a transfer roller that allows the plated body to be transported horizontally through the plating bath, and is located in front of the plating bath.
  • a plating apparatus including a negative electrode roller to charge the plated body with (-) electricity, and the guide roller for guiding the plated body to be smoothly transferred to the inlet and outlet of the plating bath.
  • the plating bath is inevitably leaked out through the inlet and outlet, the plating liquid is unnecessarily plated when the spilled plating liquid is buried in the negative electrode roller.
  • irregularities are generated in the drawing of the negative electrode roller, and scratches such as scratches are generated on the surface of the plated body, which causes product defects.
  • the entire plating apparatus since a large amount of plating liquid is required to perform plating and a plating bath capable of accommodating such plating liquid must also be enlarged, the entire plating apparatus has a large area.
  • the conventional technique is difficult to apply a high current, so the plating operation is performed for a long time with a low current, there is also a problem that the plating efficiency is lowered.
  • the present invention was created in order to solve the above-described problems, it is possible to form a plating layer by locally spraying the plating solution only on the portion requiring plating, thereby providing a continuous plating apparatus that maximizes the plating efficiency as well as miniaturization of the overall equipment. It aims to do it.
  • Continuous plating apparatus of the present invention for achieving the above object, the frame; A driving roller wound around the plated body extending in one direction while having a predetermined width and being rotated by receiving power by a rotating means; A driven roller installed on the frame, spaced apart from the driving roller, and wound around the plated body; A negative electrode roller installed on the frame and disposed between the driving roller and the driven roller on a moving path through which the plated body moves and contacting the plated body to charge cathode electricity to the plated body; And an anode nozzle unit installed in the frame and injecting a plating liquid containing anode ions into the contact portion between the cathode roller and the plated body.
  • the anode nozzle unit may include a plating liquid receiving space in which a plating liquid is filled, and a slot which communicates with the plating liquid receiving space and the outside and extends along the width direction of the plated body.
  • an acid resistant metal body may be disposed in the plating solution accommodation space to receive anode electricity from the outside to generate anode ions in the plating solution.
  • a nozzle spacing member may be disposed to change the distance between the slot from the contact portion of the cathode roll and the plated body.
  • the nozzle spacing member includes a long hole which is formed at a part of the anode nozzle part in contact with the frame and extends in one direction; And a fixing member which is movable in one direction along the long hole and is coupled to the anode nozzle part and the frame while passing through the long hole.
  • the cathode roller comprises a pair of tension holding rollers arranged to be in contact with the opposite surface of the plated body in contact with the negative roller and arranged in a zigzag form, the tension holding roller, the cathode
  • the plated body in contact with the roller may be arranged to have a curved shape having a constant radius of curvature.
  • the plating liquid sprayed from the anode nozzle portion is prevented from coming into direct contact with the cathode roller and guides the contact portion between the cathode roller and the plated body.
  • the partition may be arranged.
  • a tensioning roller may be disposed between the driven roller and the driving roller by pressing the plated body to contact the plated body to apply tension to the plated body.
  • the tensioning roller may be arranged with position adjusting means for varying the tension by being positioned so that the radius of curvature of the contacted object is increased or decreased.
  • the plating layer is formed while partially spraying the plating liquid on a desired portion by the nozzle spray type, the plating operation can be easily performed with a smaller amount of the plating liquid, and the overall size of the equipment is smaller. It has the advantage of maximizing space efficiency.
  • the continuous plating apparatus according to the present invention can also prevent the pit due to hydrogen embrittlement generated in a large amount, it is possible to apply a high current compared to the prior art, it is possible to exhibit a high plating efficiency in a shorter time have.
  • FIG. 1 is a view showing a continuous plating apparatus according to an embodiment of the present invention.
  • FIG. 2 is a side view of the anode nozzle unit as one component of the continuous plating apparatus of FIG. 1.
  • FIG. 2 is a side view of the anode nozzle unit as one component of the continuous plating apparatus of FIG. 1.
  • FIG. 3 is a sectional view taken along the line III-III of FIG. 2;
  • 4 to 6 are views showing the operation of the continuous plating apparatus of FIG.
  • the continuous plating apparatus 10 is to form a predetermined plating layer on the surface of the plated body 90 extending in one direction while having a predetermined width.
  • the plating layer can be continuously formed on the surface.
  • the plating layer is formed on the plated body 90 (a flexible or rigid substrate) by a printing method.
  • the continuous plating apparatus 10 includes a frame 20, a driving roller 30, a driven roller 40, a cathode roller 50, an anode nozzle portion 60, a tension holding roller 70, and a tension applying roller ( 80).
  • the frame 20 forms a body of the continuous plating apparatus 10, and has a casing 21 having a substantially rectangular cross section, a partition wall 22 partitioning a plurality of spaces inside the casing 21,
  • the upper plate 23 is disposed above the casing 21 and includes a driving roller 30, a driven roller 40, a negative roller 50, and an anode nozzle unit 60.
  • the rotation means (not shown) for providing a rotational force to the drive roller 30 and the power transmission means for transmitting the rotational force by the rotation means to the drive roller 30 in the frame 20 (not shown) Is included).
  • a supply pump (not shown) for supplying a plating liquid to the anode nozzle unit 60 is disposed inside the frame 20, and the supply pump (not shown) is located outside the frame 20.
  • a plating tank 24 connected by the anode nozzle unit 60 and the plating liquid supply pipe 91 may be disposed.
  • the driving roller 30 is a roller that is wound around the plated body 90 extending in one direction while having a predetermined width and is rotated by receiving power by a rotating means.
  • the drive roller 30 performs a function of transferring the plated body 90 so that the plating layer can be continuously formed on the plated body 90.
  • the driving roller 30 may be vertically placed with respect to the upper plate 23 of the frame 20.
  • the driven roller 40 is disposed perpendicular to the top plate 23 of the frame 20 and is spaced apart from the driving roller 30 by a predetermined distance.
  • the plated body 90 is wound around the outer circumferential surface of the driven roller 40, and as the driven roller 30 rotates, the driven roller 40 rotates together so that the plated body 90 can move on a constant path.
  • the negative electrode roller 50 is installed on the frame 20, and is disposed between the drive roller 30 and the driven roller 40, and is mounted on the frame 20.
  • the negative electrode roller 50 is disposed on a moving path through which the plated body 90 moves and contacts the surface of the plated body 90 to charge the plated body 90 with the negative electricity.
  • the negative electrode roller 50 grounded on the pattern of the plated body 90 is configured to charge the cathode electricity on the pattern of the plated body 90.
  • the partition 51 is disposed.
  • the partition 51 allows the plating liquid to be guided to a desired position (for example, the contact portion of the negative electrode roller 50 and the plated body 90 or the periphery thereof).
  • the partition walls 51 are vertically arranged with respect to the upper plate 23 of the frame 20, and are designed to cover most of the cathode rollers 50 when viewed from the anode nozzle unit 60.
  • the anode nozzle unit 60 is installed in the frame 20, and includes a cathode ion in a contact portion (eg, a ground region) or an adjacent portion of the cathode roller 50 and the plated body 90. It is to spray the plating solution.
  • the anode nozzle unit 60 is vertically arranged with respect to the upper plate 23 of the frame 20, and specifically, a nozzle lower plate 61 detachably fixed to the frame 20 and the nozzle lower plate ( And a positive electrode nozzle 63 coupled to the side plate 62 and vertically arranged with respect to the nozzle lower plate 61.
  • the anode nozzle 63 is a plating solution movement path 631 disposed on one side and connected from an upper end to a lower portion, and a plating solution connection path extending horizontally from the plating liquid movement path 631 and disposed at regular intervals in the vertical direction. 632, a plating liquid containing space 633 disposed on the other side and filled with a plating liquid, and a slot 634 communicating with the plating liquid containing space 633 and the outside.
  • a plating liquid supply pipe 91 for supplying a plating liquid may be connected to an upper end of the plating liquid movement path 631, and the plating liquid supplied from the plating liquid supply pipe 91 may be transferred to the plating liquid receiving space 633 through the plating liquid connection path 632. Is sent.
  • an acid resistant metal body 635 which receives anode electricity from the outside to generate anode ions in the plating liquid is disposed.
  • the acid resistant metal body 635 is disposed in the vertical direction at regular intervals, and the acid resistant metal body 635 is configured to generate positive ion in the plating liquid while penetrating the plating liquid.
  • platinum-based metal compounds such as platinum, palladium, iridium, and ruthenium may be adopted, but the present invention is not limited thereto, and any acid may be used as long as it can easily generate positive ions in the plating solution.
  • the slot 634 extends in a vertical direction with a fine spacing, specifically, in the width direction of the plated body 90, and is configured to allow the plating liquid to be injected to the outside through the slot 634.
  • the interval s of the slot 634 may be within 0.1 mm ⁇ 2.5mm, 0.2 ⁇ 2.0 mmm, preferably 0.3 ⁇ 1.5 mm.
  • the side plate 62 serves to fix the anode nozzle 63 to the nozzle lower plate 61, and may be bolted to the anode nozzle 63.
  • the nozzle lower plate 61 is detachably coupled to the frame 20, and specifically, a long hole 101 extending in one direction is formed.
  • the nozzle lower plate 61 is fixed to the frame 20 through a fixing member 102 such as a bolt.
  • the long hole 101 and the fixing member 102 performs a function as a nozzle spacing adjusting member 100.
  • the nozzle gap adjusting member 100 may change the distance between the cathode roll and the slot 634 from the contact portion between the plated body 90 and the fixing member 102. It is movable in one direction along the long hole 101, and is coupled to the anode nozzle unit 60 and the frame 20 while passing through the long hole 101.
  • the tension maintaining roller 70 is disposed to contact the opposite surface of the plated body 90 to which the negative electrode roller 50 is in contact, and is arranged to cross the negative roller 50 in a zigzag form. At this time, the tension maintaining roller 70 is arranged so that the pair is arranged spaced apart at a predetermined interval.
  • the tension holding roller 70 is disposed close to the negative electrode roller 50 so that the plated body 90 in contact with the negative electrode roller 50 has a constant radius of curvature so that the plated body 90 is fixed. Under the tension to pass through the cathode roller 50.
  • the tension holding roller 70 is to maintain the natural tension of the plated layer passing through the negative roller 50, the tension holding roller 70 is always a constant pressure while the plated body 90 is the negative roller (50) is made contactable. Accordingly, the cathode electricity can be stably charged on the surface of the plated body 90.
  • the tensioning roller 80 is disposed between the driven roller 40 and the driving roller 30 to press and contact the plated body 90, thereby applying tension to the plated body 90.
  • the tensioning roller 80 is positioned to increase or decrease the radius of curvature of the plated body 90 in contact so that the tension on the plated body 90 can be changed as necessary.
  • the long hole 81 provided in the nozzle lower plate 61 and the long hole 81 are fitted into the long hole 81, and the tensioning roller 80 is connected to the frame. It may include a fastening bolt 82 to be coupled to the (20).
  • Continuous plating apparatus 10 according to an embodiment of the present invention has the following effects.
  • the plated body 90 is wound around the driving roller 30, the driven roller 40, and the negative electrode roller 50, and then the negative electrode is applied to the negative roller 50 side so that the plated body 90 is applied.
  • the negative electrode is charged in the pattern of.
  • the positive electrode is applied to the acid resistant metal body 635 disposed in the plating liquid containing space 633 of the positive electrode nozzle unit 60 so that the positive electrode ions are included in the plating liquid disposed in the plating liquid containing space 633.
  • the plating liquid 90 is moved from the anode nozzle unit 60 while the plated body 90 is moved while the drive roller 30 is rotated. Spray towards. Specifically, when a new plating liquid is supplied into the plating liquid containing space 633, the plating liquid disposed in the plating liquid containing space 633 is ejected to the outside through the slot 634, and the ejected liquid is avoided in a state in which positive ion is contained. The plating liquid is sprayed on the contact portion between the plated body 90 and the negative electrode roller 50.
  • the sprayed plating solution 1 makes a predetermined electroplating layer on the pattern of the plated body 90 while contacting the pattern of the plated body 90 to which the cathode electricity is charged.
  • the injected plating liquid may be prevented from being directly injected to the negative electrode roller 50 by the partition wall 51 and may be induced to be injected into the contact point of the negative electrode roller 50 and the plated body 90 or an adjacent portion thereof. It is configured to be.
  • the nozzle spacing can be adjusted using the nozzle spacing member.
  • the fixing member 102 fixed to the frame 20 is released to place the anode nozzle part 60 in the required position, and then the fixing member 102 is fixed again. Can be easily performed.
  • the fixing member 102 is moved in one direction through the long hole 101 formed in the anode nozzle unit 60 and configured to be coupled to the frame 20 again after moving relative to the required distance along the long hole 101. do.
  • the continuous plating apparatus forms a plating layer while partially spraying a plating solution on a desired portion by a nozzle spray type, plating can be easily performed with a smaller amount of plating liquid, and the overall equipment is provided. Since the size of is smaller, the efficiency of the space can be maximized.
  • the continuous plating apparatus according to the present invention can also prevent the pit due to hydrogen embrittlement generated in a large amount, it is possible to apply a high current compared to the prior art, it is possible to exhibit a high plating efficiency in a shorter time have.
  • the continuous plating apparatus has an advantage of minimizing unnecessary contact of the plating liquid directly with the cathode roller by disposing the partition wall, thereby reducing current loss.
  • the continuous plating apparatus according to the present invention has an advantage in that the plating can be performed by setting desired conditions because the nozzle spacing can be adjusted as necessary.
  • the continuous plating apparatus can control the tension of the plated body by using a tensioning roller, so that it is possible to perform a good driving and the contact point between the plated body and the cathode roller can be formed to an appropriate degree. have.
  • the continuous nozzle apparatus according to the present invention is not limited thereto, and may be modified in various forms, and the scope of such modifications ranges from the claims to the reasonable interpretation.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

The present invention relates to a continuous plating apparatus, and more particularly, to a continuous plating apparatus comprising: a frame; a driving roller on which an object to be plated, having a predetermined width and extending in one direction, is wound, wherein the driving roller rotates by means of power transmitted by rotating means, and the driving roller is installed in the frame; a slave roller installed in the frame and spaced apart from the driving roller such that the object to be plated gets caught at the slave roller; a cathode roller installed in the frame and disposed on the path between the driving roller and the slave roller, along which the object to be plated moves, wherein the cathode roller contacts the object to be plated so as to charge the object to be plated with electricity of a cathode; and an anode nozzle unit installed in the frame, which sprays a plating solution including a cation on the contact area between the cathode roller and the object to the plated.

Description

연속 도금 장치Continuous plating equipment
본 발명은 연속 도금 장치에 대한 것으로서, 더욱 상세하게는 도금하고자 하는 목적 부위에만 도금액을 분사하여 도금층을 형성할 수 있는 연속 도금 장치에 대한 것이다.The present invention relates to a continuous plating apparatus, and more particularly, to a continuous plating apparatus capable of forming a plating layer by spraying a plating solution only on a target portion to be plated.
일반적으로 PCB기판과 같은 박판형상의 제품을 도금하는 경우에는 피도금체를 연속적으로 도금시키는 수평식 도금방식을 사용한다. 이러한 도금은 도금액이 저장되며 피도금체가 투입, 배출되는 투입구 및 배출구가 형성된 도금조와, 불용성 양극과, 피도금체가 상기 도금조를 관통하여 수평방향으로 이송되도록 하는 이송롤러와, 도금조의 전방으로 위치되어 피도금체를 (-)전기로 대전시키는 음극롤러를 포함하는 도금장치로 이루어지며, 상기 도금조의 투입구와 배출구에는 피도금체가 원활하게 이송되도록 가이드하는 가이드롤러가 구비된다. In general, when plating a thin plate-like product, such as a PCB substrate, a horizontal plating method for continuously plating the plated body is used. Such plating is a plating bath in which a plating solution is stored and an inlet and an outlet through which a plated body is inserted and discharged are formed, an insoluble anode, a transfer roller that allows the plated body to be transported horizontally through the plating bath, and is located in front of the plating bath. It is made of a plating apparatus including a negative electrode roller to charge the plated body with (-) electricity, and the guide roller for guiding the plated body to be smoothly transferred to the inlet and outlet of the plating bath.
한편, 상기 도금조는 투입구와 배출구를 통해 도금액이 불가피하게 외부로 유출되며, 유출된 도금액이 음극롤러에 묻으면 음극롤러가 불필요하게 도금된다. 이와 같이 음극롤러가 도금되면 음극롤러의 도면에 요철이 발생하게 되어, 피도금체의 표면에는 스크래치 등의 흠이 발생되는데, 이는 제품불량의 원인이 된다. 또한, 도금을 수행하기 위하여 많은 양의 도금액이 필요하게 되고 이러한 도금액을 수용할 수 있는 도금조도 대형화되어야 하기 때문에 전체적인 도금 장치는 대면적을 가지도록 이루어진다. On the other hand, the plating bath is inevitably leaked out through the inlet and outlet, the plating liquid is unnecessarily plated when the spilled plating liquid is buried in the negative electrode roller. As such, when the negative roller is plated, irregularities are generated in the drawing of the negative electrode roller, and scratches such as scratches are generated on the surface of the plated body, which causes product defects. In addition, since a large amount of plating liquid is required to perform plating and a plating bath capable of accommodating such plating liquid must also be enlarged, the entire plating apparatus has a large area.
또한 종래의 기술은 높은 전류의 인가가 어렵기 때문에 낮은 전류로 장시간에 걸쳐 도금작업을 수행하고 있으므로 도금 효율이 떨어지는 문제점도 있다.In addition, the conventional technique is difficult to apply a high current, so the plating operation is performed for a long time with a low current, there is also a problem that the plating efficiency is lowered.
본 발명은 상술한 문제점을 해결하기 위하여 창출된 것으로서, 도금액을 도금이 필요한 부위에만 국부적으로 분사시켜 도금층을 형성할 수 있어 전체적인 설비의 소형화를 달성함은 물론 도금 효율을 극대화하는 연속 도금 장치를 제공하는 것을 목적으로 한다.The present invention was created in order to solve the above-described problems, it is possible to form a plating layer by locally spraying the plating solution only on the portion requiring plating, thereby providing a continuous plating apparatus that maximizes the plating efficiency as well as miniaturization of the overall equipment. It aims to do it.
상술한 목적을 달성하기 위한 본 발명의 연속 도금장치는, 프레임; 일정한 폭을 가지면서 일방향으로 연장되는 피도금체를 감아걸고 있으며 회전수단에 의하여 동력을 전달받아 회전하고 상기 프레임에 설치되는 구동롤러; 상기 프레임에 설치되고, 상기 구동롤러와 이격되어 배치되며 상기 피도금체가 감아걸리는 종동롤러; 상기 프레임에 설치되되, 상기 구동롤러와 종동롤러의 사이로서 상기 피도금체가 이동하는 이동경로상에 배치되며 상기 피도금체와 접촉하여 상기 피도금체에 음극 전기를 대전시키는 음극롤러; 및 상기 프레임에 설치되되, 상기 음극롤러와 상기 피도금체의 접촉부분에 양극 이온을 포함하는 도금액을 분사하는 양극 노즐부;을 포함한다.Continuous plating apparatus of the present invention for achieving the above object, the frame; A driving roller wound around the plated body extending in one direction while having a predetermined width and being rotated by receiving power by a rotating means; A driven roller installed on the frame, spaced apart from the driving roller, and wound around the plated body; A negative electrode roller installed on the frame and disposed between the driving roller and the driven roller on a moving path through which the plated body moves and contacting the plated body to charge cathode electricity to the plated body; And an anode nozzle unit installed in the frame and injecting a plating liquid containing anode ions into the contact portion between the cathode roller and the plated body.
상기 연속도금장치에서, 상기 양극 노즐부는, 도금액이 채워지는 도금액 수용공간과, 상기 도금액 수용공간과 외부를 연통시키며 상기 피도금체의 폭방향을 따라서 연장되는 슬롯을 포함할 수 있다.In the continuous plating apparatus, the anode nozzle unit may include a plating liquid receiving space in which a plating liquid is filled, and a slot which communicates with the plating liquid receiving space and the outside and extends along the width direction of the plated body.
상기 연속도금장치에서, 상기 도금액 수용공간에는 외부에서 양극전기를 공급받아 도금액 내에 양극 이온을 생성시키는 내산성 금속체가 배치될 수 있다.In the continuous plating apparatus, an acid resistant metal body may be disposed in the plating solution accommodation space to receive anode electricity from the outside to generate anode ions in the plating solution.
상기 연속도금장치에서, 상기 양극 노즐부는, 상기 음극롤과 상기 피도금체의 접촉부분으로부터 상기 슬롯간의 거리가 변경될 수 있도록 하는 노즐 간격 조절부재가 배치될 수 있다.In the continuous plating apparatus, the anode nozzle unit, a nozzle spacing member may be disposed to change the distance between the slot from the contact portion of the cathode roll and the plated body.
상기 연속도금장치에서, 상기 노즐 간격 조절부재는, 양극 노즐부에서 상기 프레임과 접촉되는 부분에 형성되며 일방향으로 길게 연장되는 장공; 및 상기 장공을 따라서 일방향으로 이동가능하되, 상기 장공을 통과하면서 상기 양극 노즐부와 상기 프레임에 결합되는 고정부재를 포함할 수 있다.In the continuous plating apparatus, the nozzle spacing member includes a long hole which is formed at a part of the anode nozzle part in contact with the frame and extends in one direction; And a fixing member which is movable in one direction along the long hole and is coupled to the anode nozzle part and the frame while passing through the long hole.
상기 연속도금장치에서, 상기 음극롤러가 접촉하는 피도금체의 반대편 면에 접촉되도록 배치되되 음극롤러와 지그재그 형태로 교차 배열되는 한 쌍의 장력유지롤러를 포함하되, 상기 장력유지롤러는, 상기 음극롤러와 접촉하는 피도금체가 일정한 곡률반경을 가지는 곡면형상이 될 수 있도록 배치될 수 있다.In the continuous plating apparatus, the cathode roller comprises a pair of tension holding rollers arranged to be in contact with the opposite surface of the plated body in contact with the negative roller and arranged in a zigzag form, the tension holding roller, the cathode The plated body in contact with the roller may be arranged to have a curved shape having a constant radius of curvature.
상기 연속도금장치에서, 상기 음극롤러와 상기 양극 노즐부의 사이에는 상기 양극 노즐부로부터 분사되는 도금액이 음극롤러와 직접적으로 접촉하는 것을 방지하고 상기 음극롤러와 피도금체의 접촉부분에 접촉하도록 안내하는 격벽이 배치될 수 있다.In the continuous plating apparatus, between the cathode roller and the anode nozzle portion, the plating liquid sprayed from the anode nozzle portion is prevented from coming into direct contact with the cathode roller and guides the contact portion between the cathode roller and the plated body. The partition may be arranged.
상기 연속도금장치에서, 상기 종동롤러와 상기 구동롤러의 사이에는 피도금체를 눌러 접촉함으로서 피도금체에 장력을 부여하는 장력부여롤러가 배치될 수 있다.In the continuous plating apparatus, a tensioning roller may be disposed between the driven roller and the driving roller by pressing the plated body to contact the plated body to apply tension to the plated body.
상기 연속도금장치에서, 상기 장력부여롤러는, 상기 접촉되는 피도금체의 곡률반경이 증가하거나 감소되도록 위치조절됨으로서 장력을 변화가능하게 하는 위치조정수단이 배치될 수 있다.In the continuous plating apparatus, the tensioning roller may be arranged with position adjusting means for varying the tension by being positioned so that the radius of curvature of the contacted object is increased or decreased.
본 발명에 의한 연속 도금 장치는, 노즐 분사 타입으로 원하는 부위에 부분적으로 도금액을 분사하면서 도금층을 형성하기 때문에, 보다 적은 양의 도금액으로서 용이하게 도금작업을 수행할 수 있으며, 전체적인 설비의 크기가 작아지므로 공간의 효율성을 극대화할 수 있다는 장점이 있다.In the continuous plating apparatus according to the present invention, since the plating layer is formed while partially spraying the plating liquid on a desired portion by the nozzle spray type, the plating operation can be easily performed with a smaller amount of the plating liquid, and the overall size of the equipment is smaller. It has the advantage of maximizing space efficiency.
또한, 본 발명에 의한 연속 도금 장치는, 다량으로 발생하는 수소 취성에 의한 피트도 예방 할 수 있어, 종전의 기술에 비해 높은 전류가 인가 가능하여 보다 짧은 시간에 높은 도금 효율을 나타낼 수 있는 장점이 있다.In addition, the continuous plating apparatus according to the present invention can also prevent the pit due to hydrogen embrittlement generated in a large amount, it is possible to apply a high current compared to the prior art, it is possible to exhibit a high plating efficiency in a shorter time have.
도 1은 본 발명의 일실시예에 따른 연속 도금 장치를 도시한 도면.1 is a view showing a continuous plating apparatus according to an embodiment of the present invention.
도 2는 도 1의 연속 도금 장치의 일구성인 양극 노즐부의 측면도.FIG. 2 is a side view of the anode nozzle unit as one component of the continuous plating apparatus of FIG. 1. FIG.
도 3은 도 2의 Ⅲ-Ⅲ 단면도.3 is a sectional view taken along the line III-III of FIG. 2;
도 4 내지 도 6는 도 1의 연속 도금 장치의 작동모습을 나타내는 도면.4 to 6 are views showing the operation of the continuous plating apparatus of FIG.
이하, 본 발명의 일 실시예에 따른 연속 도금 장치를 첨부된 도면을 참조하면서 상세하게 설명한다.Hereinafter, a continuous plating apparatus according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings.
본 발명의 일실시예에 따른 연속 도금 장치(10)는, 일정한 폭을 가지면서 일방향으로 연장되는 피도금체(90)의 표면에 소정의 도금층을 형성하는 것으로서, 상기 피도금체(90)의 표면에 연속적으로 도금층을 형성할 수 있는 것이다. 구체적으로는 인쇄방식에 의하여 피도금체(90; Flexible 또는 Rigid 기판) 상에 도금층을 형성하는 것이다. The continuous plating apparatus 10 according to the embodiment of the present invention is to form a predetermined plating layer on the surface of the plated body 90 extending in one direction while having a predetermined width. The plating layer can be continuously formed on the surface. Specifically, the plating layer is formed on the plated body 90 (a flexible or rigid substrate) by a printing method.
이러한 연속 도금 장치(10)는, 프레임(20), 구동롤러(30), 종동롤러(40), 음극롤러(50), 양극 노즐부(60), 장력유지롤러(70) 및 장력부여롤러(80)를 포함하여 구성된다. The continuous plating apparatus 10 includes a frame 20, a driving roller 30, a driven roller 40, a cathode roller 50, an anode nozzle portion 60, a tension holding roller 70, and a tension applying roller ( 80).
상기 프레임(20)은 연속 도금 장치(10)의 몸체를 이루는 것으로서, 대략 직사각형 단면을 가지는 케이싱(21)과, 상기 케이싱(21) 내부의 공간을 다수개로 구획하는 구획용 벽체(22)와, 상기 케이싱(21)의 상부에 배치되며 구동롤러(30), 종동롤러(40), 음극롤러(50) 및 양극 노즐부(60) 등이 설치되는 상판(23)을 포함하여 구성된다. 이때, 상기 프레임(20)의 내부에는 상기 구동롤러(30)에 회전력을 제공하기 위한 회전수단(미도시) 및 상기 회전수단에 의한 회전력을 상기 구동롤러(30)에 전달하는 동력전달수단(미도시)이 포함된다. 이외에 상기 프레임(20)의 내부에는 도금액을 상기 양극 노즐부(60)로 공급하기 위한 공급용 펌프(미도시)가 배치되며, 상기 프레임(20)의 외부에는 상기 공급용 펌프(미도시) 및 상기 양극 노즐부(60)와 도금액 공급관(91)에 의하여 연결되는 도금수조(24)가 배치될 수 있다.The frame 20 forms a body of the continuous plating apparatus 10, and has a casing 21 having a substantially rectangular cross section, a partition wall 22 partitioning a plurality of spaces inside the casing 21, The upper plate 23 is disposed above the casing 21 and includes a driving roller 30, a driven roller 40, a negative roller 50, and an anode nozzle unit 60. At this time, the rotation means (not shown) for providing a rotational force to the drive roller 30 and the power transmission means for transmitting the rotational force by the rotation means to the drive roller 30 in the frame 20 (not shown) Is included). In addition, a supply pump (not shown) for supplying a plating liquid to the anode nozzle unit 60 is disposed inside the frame 20, and the supply pump (not shown) is located outside the frame 20. A plating tank 24 connected by the anode nozzle unit 60 and the plating liquid supply pipe 91 may be disposed.
상기 구동롤러(30)는, 일정한 폭을 가지면서 일방향으로 연장되는 피도금체(90)를 감아걸고 있으며 회전수단에 의하여 동력을 전달받아 회전하는 롤러이다. 이러한 구동롤러(30)는 피도금체(90)에 연속적으로 도금층이 형성될 수 있도록 피도금체(90)를 이송시키는 기능을 수행한다. 상기 구동롤러(30)는 프레임(20)의 상판(23)에 대하여 수직으로 세워져 배치될 수 있다.The driving roller 30 is a roller that is wound around the plated body 90 extending in one direction while having a predetermined width and is rotated by receiving power by a rotating means. The drive roller 30 performs a function of transferring the plated body 90 so that the plating layer can be continuously formed on the plated body 90. The driving roller 30 may be vertically placed with respect to the upper plate 23 of the frame 20.
상기 종동롤러(40)는, 상기 프레임(20)의 상판(23)에 수직으로 세워져 배치되며 상기 구동롤러(30)와 일정간격 이격되어 배치되는 것이다. 상기 종동롤러(40)의 외주면에는 피도금체(90)가 감아걸리며 상기 구동롤러(30)가 회전함에 따라서 상기 종동롤러(40)가 함께 회전하여 피도금체(90)가 일정한 경로상에서 이동할 수 있도록 한다.The driven roller 40 is disposed perpendicular to the top plate 23 of the frame 20 and is spaced apart from the driving roller 30 by a predetermined distance. The plated body 90 is wound around the outer circumferential surface of the driven roller 40, and as the driven roller 30 rotates, the driven roller 40 rotates together so that the plated body 90 can move on a constant path. Make sure
상기 음극롤러(50)는, 프레임(20)에 설치되되, 상기 구동롤러(30)와 종동롤러(40)의 사이에 배치되는 것으로서, 프레임(20)에 세워져 설치된다. 이러한 음극롤러(50)는 상기 피도금체(90)가 이동하는 이동경로 상에 배치되며 상기 피도금체(90)의 표면과 접촉하여 상기 피도금체(90)에 음극 전기를 대전시키는 것이다. 구체적으로는 피도금체(90)의 패턴 상에 접지되어 있는 음극롤러(50)는 상기 피도금체(90)의 패턴 상에 음극 전기를 대전시키도록 구성된다. 상기 음극롤러(50)와, 상기 양극 노즐부(60)의 사이에는 상기 양극 노즐부(60)로부터 분사되는 도금액이 음극롤러(50)에 직접적으로 접촉하는 것을 방지하여, 전류 손실을 최소화하기 위한 격벽(51)이 배치된다. 이러한 격벽(51)은 상기 도금액이 목표하는 위치(예컨데, 음극롤러(50)와 피도금체(90)의 접촉부분 또는 그 주변)에 유도되도록 하는 것이다. 이러한 격벽(51)은 프레임(20)의 상판(23)에 대하여 수직으로 세워져 배치되어 있으며, 양극 노즐부(60)에서 바라보았을 때 음극롤러(50)의 대부분을 가릴 수 있도록 설계된다. The negative electrode roller 50 is installed on the frame 20, and is disposed between the drive roller 30 and the driven roller 40, and is mounted on the frame 20. The negative electrode roller 50 is disposed on a moving path through which the plated body 90 moves and contacts the surface of the plated body 90 to charge the plated body 90 with the negative electricity. Specifically, the negative electrode roller 50 grounded on the pattern of the plated body 90 is configured to charge the cathode electricity on the pattern of the plated body 90. Between the cathode roller 50 and the anode nozzle unit 60 prevents the plating liquid injected from the anode nozzle unit 60 from directly contacting the cathode roller 50 to minimize current loss. The partition 51 is disposed. The partition 51 allows the plating liquid to be guided to a desired position (for example, the contact portion of the negative electrode roller 50 and the plated body 90 or the periphery thereof). The partition walls 51 are vertically arranged with respect to the upper plate 23 of the frame 20, and are designed to cover most of the cathode rollers 50 when viewed from the anode nozzle unit 60.
상기 양극 노즐부(60)는 상기 프레임(20)에 설치되되, 상기 음극롤러(50)와 상기 피도금체(90)의 접촉부분(예컨데, 접지영역) 또는 그 인접한 부분에 양극이온이 포함되어 있는 도금액을 분사시키는 것이다. 이러한 양극 노즐부(60)는, 프레임(20)의 상판(23)에 대하여 수직하게 세워져 배치되어 있으며, 구체적으로는 프레임(20)에 착탈가능하게 고정되는 노즐 하판(61), 상기 노즐 하판(61)에 대하여 수직하게 세워져 배치되는 측판(62) 및 상기 측판(62)과 결합되며 상기 노즐 하판(61)에 대하여 수직하게 세워져 배치되는 양극노즐(63)을 포함하여 구성된다.The anode nozzle unit 60 is installed in the frame 20, and includes a cathode ion in a contact portion (eg, a ground region) or an adjacent portion of the cathode roller 50 and the plated body 90. It is to spray the plating solution. The anode nozzle unit 60 is vertically arranged with respect to the upper plate 23 of the frame 20, and specifically, a nozzle lower plate 61 detachably fixed to the frame 20 and the nozzle lower plate ( And a positive electrode nozzle 63 coupled to the side plate 62 and vertically arranged with respect to the nozzle lower plate 61.
상기 양극노즐(63)은, 일측에 배치되며 상단으로부터 하부까지 연결되는 도금액 이동로(631)와, 상기 도금액 이동로(631)로부터 수평하게 연장되며 상하방향으로 일정간격을 두고 배치되는 도금액 연결로(632)와, 타측에 배치되며 도금액이 채워지는 도금액 수용공간(633) 및, 상기 도금액 수용공간(633)과 외부를 연통시키는 슬롯(634)을 포함하여 구성된다. 상기 도금액 이동로(631)의 상단에는 도금액을 공급하는 도금액 공급관(91)이 연결될 수 있으며 도금액 공급관(91)으로부터 공급된 도금액은 상기 도금액 연결로(632)를 통하여 상기 도금액 수용공간(633)으로 보내어진다. 한편, 상기 도금액 수용공간(633) 내에는 외부에서 양극 전기를 공급받아 도금액 내에 양극 이온을 생성시키는 내산성 금속체(635)가 배치되어 있게 된다. 이러한 내산성 금속체(635)는 일정간격을 두고 상하방향으로 다수 배치되어 있으며 상기 내산성 금속체(635)가 상기 도금액을 관통하면서 도금액 내에 양극 이온을 생성시킬 수 있도록 구성된다. 이때, 사용되는 내산성 금속은 백금, 팔라듐, 이리듐, 루테늄 등 백금계 금속화합물이 채택될 수 있으나, 이에 한정되는 것은 아니며 도금액 내에 양극 이온을 용이하게 생성시킬 수 있는 것이라면 무엇이나 가능함은 물론이다.The anode nozzle 63 is a plating solution movement path 631 disposed on one side and connected from an upper end to a lower portion, and a plating solution connection path extending horizontally from the plating liquid movement path 631 and disposed at regular intervals in the vertical direction. 632, a plating liquid containing space 633 disposed on the other side and filled with a plating liquid, and a slot 634 communicating with the plating liquid containing space 633 and the outside. A plating liquid supply pipe 91 for supplying a plating liquid may be connected to an upper end of the plating liquid movement path 631, and the plating liquid supplied from the plating liquid supply pipe 91 may be transferred to the plating liquid receiving space 633 through the plating liquid connection path 632. Is sent. On the other hand, in the plating liquid receiving space 633, an acid resistant metal body 635 which receives anode electricity from the outside to generate anode ions in the plating liquid is disposed. The acid resistant metal body 635 is disposed in the vertical direction at regular intervals, and the acid resistant metal body 635 is configured to generate positive ion in the plating liquid while penetrating the plating liquid. In this case, as the acid resistant metal used, platinum-based metal compounds such as platinum, palladium, iridium, and ruthenium may be adopted, but the present invention is not limited thereto, and any acid may be used as long as it can easily generate positive ions in the plating solution.
상기 슬롯(634)은 미세한 간격을 가지면서 상하방향, 구체적으로는 피도금체(90)의 폭방향을 따라서 연장되는 것으로서, 상기 슬롯(634)을 통하여 도금액이 외부로 분사될 수 있도록 구성된다. 이때, 슬롯(634)의 간격(s)은 0.1 mm ~ 2.5mm 이내일 수 있으며, 0.2 ~ 2.0 mmm, 바람직하게는 0.3 ~ 1.5 mm 인 것이 좋다.  The slot 634 extends in a vertical direction with a fine spacing, specifically, in the width direction of the plated body 90, and is configured to allow the plating liquid to be injected to the outside through the slot 634. At this time, the interval s of the slot 634 may be within 0.1 mm ~ 2.5mm, 0.2 ~ 2.0 mmm, preferably 0.3 ~ 1.5 mm.
상기 측판(62)은, 상기 양극노즐(63)을 노즐 하판(61)에 고정하는 기능을 수행하는 것으로서, 상기 양극 노즐(63)과 볼트결합될 수 있다. 상기 노즐 하판(61)은, 상기 프레임(20)에 착탈가능하게 결합되는 것으로서, 구체적으로는, 일방향으로 길게 연장되는 장공(101)이 형성된다. 이러한 노즐 하판(61)은, 볼트와 같은 고정부재(102)를 통하여 프레임(20)에 고정된다. 한편, 본 발명의 일 실시예에서는 상기 장공(101)과 상기 고정부재(102)가 노즐 간격 조절부재(100)로서 기능을 수행한다. 구체적으로 상기 노즐 간격 조절부재(100)는, 상기 음극롤과 상기 피도금체(90)의 접촉부분으로부터 상기 슬롯(634)과의 거리가 변경될 수 있도록 하는 것으로서, 상기 고정부재(102)는 장공(101)을 따라서 일방향으로 이동가능하되, 상기 장공(101)을 통과하면서 상기 양극 노즐부(60)와 상기 프레임(20)에 결합된다.The side plate 62 serves to fix the anode nozzle 63 to the nozzle lower plate 61, and may be bolted to the anode nozzle 63. The nozzle lower plate 61 is detachably coupled to the frame 20, and specifically, a long hole 101 extending in one direction is formed. The nozzle lower plate 61 is fixed to the frame 20 through a fixing member 102 such as a bolt. On the other hand, in one embodiment of the present invention, the long hole 101 and the fixing member 102 performs a function as a nozzle spacing adjusting member 100. In detail, the nozzle gap adjusting member 100 may change the distance between the cathode roll and the slot 634 from the contact portion between the plated body 90 and the fixing member 102. It is movable in one direction along the long hole 101, and is coupled to the anode nozzle unit 60 and the frame 20 while passing through the long hole 101.
상기 장력유지롤러(70)는, 상기 음극롤러(50)가 접촉하는 피도금체(90)의 반대편 면에 접촉하도록 배치되며 음극롤러(50)와 지그재그 형태로 교차배치되는 것이다. 이때, 장력유지롤러(70)는 한 쌍이 배치되며 일정간격을 두고 이격되어 배치되도록 구성된다. 이러한 장력유지롤러(70)는, 상기 음극롤러(50)와 접촉하는 피도금체(90)가 일정한 곡률반경을 가지도록 상기 음극롤러(50)에 근접하게 배치되어 피도금체(90)가 일정한 장력하에서 상기 음극롤러(50)를 통과할 수 있도록 한다. 이러한 장력유지롤러(70)는, 음극롤러(50)를 지나는 피도금층이 자연장력을 유지하도록 하며, 상기 장력유지롤러(70)가 항상 일정한 압력을 가지면서 상기 피도금체(90)가 음극롤러(50)에 접촉가능하게 한다. 이에 따라서 안정적으로 피도금체(90)의 표면에 음극 전기가 대전될 수 있도록 한다.The tension maintaining roller 70 is disposed to contact the opposite surface of the plated body 90 to which the negative electrode roller 50 is in contact, and is arranged to cross the negative roller 50 in a zigzag form. At this time, the tension maintaining roller 70 is arranged so that the pair is arranged spaced apart at a predetermined interval. The tension holding roller 70 is disposed close to the negative electrode roller 50 so that the plated body 90 in contact with the negative electrode roller 50 has a constant radius of curvature so that the plated body 90 is fixed. Under the tension to pass through the cathode roller 50. The tension holding roller 70 is to maintain the natural tension of the plated layer passing through the negative roller 50, the tension holding roller 70 is always a constant pressure while the plated body 90 is the negative roller (50) is made contactable. Accordingly, the cathode electricity can be stably charged on the surface of the plated body 90.
상기 장력부여롤러(80)는, 종동롤러(40)와 상기 구동롤러(30)의 사이에 배치되어 상기 피도금체(90)를 눌러 접촉함으로서, 상기 피도금체(90)에 장력을 부여하는 것이다. 이러한 장력부여롤러(80)는, 접촉되는 피도금체(90)의 곡률반경이 증가하거나 감소되도록 위치조절됨으로서 피도금체(90)에 대한 장력이 필요에 따라서 변화될 수 있도록 한다. The tensioning roller 80 is disposed between the driven roller 40 and the driving roller 30 to press and contact the plated body 90, thereby applying tension to the plated body 90. will be. The tensioning roller 80 is positioned to increase or decrease the radius of curvature of the plated body 90 in contact so that the tension on the plated body 90 can be changed as necessary.
이러한 장력부여롤러(80)의 위치조절을 가능하게 하는 것으로는, 노즐 하판(61)에 마련되는 장공(81)과, 상기 장공(81)에 끼워져 결합되며 상기 장력부여롤러(80)를 상기 프레임(20)에 결합하는 체결볼트(82)를 포함할 수 있다.In order to enable the position adjustment of the tensioning roller 80, the long hole 81 provided in the nozzle lower plate 61 and the long hole 81 are fitted into the long hole 81, and the tensioning roller 80 is connected to the frame. It may include a fastening bolt 82 to be coupled to the (20).
이러한 본 발명의 일 실시예에 따른 연속 도금 장치(10)는 다음과 같은 작용효과를 가진다. Continuous plating apparatus 10 according to an embodiment of the present invention has the following effects.
먼저, 구동롤러(30), 종동롤러(40), 음극롤러(50)에 피도금체(90)를 감아걸은 후에, 음극롤러(50) 측에는 음극전기가 부여되도록 하여 상기 피도금체(90)의 패턴에 음극전기가 대전되도록 한다. 이와 함께 양극 노즐부(60)의 도금액 수용공간(633) 내에 배치된 내산성 금속체(635)에 양극 전기를 인가함으로서 상기 도금액 수용공간(633) 내에 배치된 도금액 내에 양극 이온이 포함되도록 한다.First, the plated body 90 is wound around the driving roller 30, the driven roller 40, and the negative electrode roller 50, and then the negative electrode is applied to the negative roller 50 side so that the plated body 90 is applied. The negative electrode is charged in the pattern of. In addition, the positive electrode is applied to the acid resistant metal body 635 disposed in the plating liquid containing space 633 of the positive electrode nozzle unit 60 so that the positive electrode ions are included in the plating liquid disposed in the plating liquid containing space 633.
이후에, 도 4에 도시된 바와 같이, 구동롤러(30)를 회전시키면서 피도금체(90)를 이동시킴과 동시에 양극 노즐부(60)로부터 도금액(l)을 상기 피도금체(90)를 향하여 분사시킨다. 구체적으로는, 도금액 수용공간(633) 내에 새로운 도금액을 공급하면 상기 도금액 수용공간(633) 내에 배치된 도금액이 슬롯(634)을 통하여 외부로 분출되고 분출된 도금액은 양극 이온이 포함된 상태에서 피도금체(90)와 음극롤러(50)의 접촉부분에 상기 도금액이 분사된다. 분사된 도금액(l)은 음극 전기가 대전된 피도금체(90)의 패턴과 접촉하면서 상기 피도금체(90)의 패턴 상에 소정의 전해 도금층을 생성시키게 한다. 이때, 상기 분사된 도금액은 격벽(51)에 의하여 직접적으로 음극롤러(50)에 분사되는 것이 방지되며 음극롤러(50)와 피도금체(90)의 접점 또는 그 인접부위에 분사되도록 유도될 수 있도록 구성된다.Subsequently, as shown in FIG. 4, the plating liquid 90 is moved from the anode nozzle unit 60 while the plated body 90 is moved while the drive roller 30 is rotated. Spray towards. Specifically, when a new plating liquid is supplied into the plating liquid containing space 633, the plating liquid disposed in the plating liquid containing space 633 is ejected to the outside through the slot 634, and the ejected liquid is avoided in a state in which positive ion is contained. The plating liquid is sprayed on the contact portion between the plated body 90 and the negative electrode roller 50. The sprayed plating solution 1 makes a predetermined electroplating layer on the pattern of the plated body 90 while contacting the pattern of the plated body 90 to which the cathode electricity is charged. In this case, the injected plating liquid may be prevented from being directly injected to the negative electrode roller 50 by the partition wall 51 and may be induced to be injected into the contact point of the negative electrode roller 50 and the plated body 90 or an adjacent portion thereof. It is configured to be.
한편, 필요에 따라서 슬릿과 피도금체(90) 사이의 거리조정이 필요한 경우에는 도 5에 도시된 바와 같이, 노즐 간격 부재를 이용하여 노즐 간격을 조정할 수 있다. 이를 위해서는, 먼저 필요한 노즐 간격을 산정한 후에, 프레임(20)에 고정된 고정부재(102)를 풀어서 상기 양극 노즐부(60)를 필요한 위치에 놓이게 한 후에, 상기 고정부재(102)를 다시 고정시킴으로서 용이하게 수행될 수 있다. 이때 상기 고정부재(102)는 양극 노즐부(60)에 형성된 장공(101)을 통하여 일방향으로 이동되며 장공(101)을 따라서 필요한 거리만큼 상대이동한 후에 다시 프레임(20)에 결합될 수 있도록 구성된다.On the other hand, when the distance between the slit and the plated body 90 is required as necessary, as shown in FIG. 5, the nozzle spacing can be adjusted using the nozzle spacing member. To this end, after first calculating the required nozzle interval, the fixing member 102 fixed to the frame 20 is released to place the anode nozzle part 60 in the required position, and then the fixing member 102 is fixed again. Can be easily performed. At this time, the fixing member 102 is moved in one direction through the long hole 101 formed in the anode nozzle unit 60 and configured to be coupled to the frame 20 again after moving relative to the required distance along the long hole 101. do.
또한, 필요에 따라서 피도금체(90)의 장력조절이 필요한 경우에는 도 6에 도시된 바와 같이, 장력부여롤러(80)의 위치를 변경하고 이에 따라서 필요한 장력이 피도금체(90)에 부여되도록 할 수 있다. 구체적으로, 장력을 다소 완화할 필요가 있는 경우에는 장력부여롤러(80)를 상측(도 6에 도시된 도면을 기준)으로 이동시킴으로서 장력부여롤러(80)와 접촉된 피도금체(90)의 곡률반경을 감소시키게 한다. In addition, when the tension of the plated body 90 is required as necessary, as shown in FIG. 6, the position of the tensioning roller 80 is changed, and thus the necessary tension is applied to the plated body 90. You can do that. Specifically, when it is necessary to relax the tension somewhat, by moving the tensioning roller 80 to the upper side (based on the drawing shown in Figure 6) of the plated body 90 in contact with the tensioning roller 80 This reduces the radius of curvature.
이러한 본 발명의 일실시예에 따른 연속 도금 장치는 노즐 분사 타입으로 원하는 부위에 부분적으로 도금액을 분사하면서 도금층을 형성하기 때문에, 보다 적은 양의 도금액으로서 용이하게 도금작업을 수행할 수 있으며, 전체적인 설비의 크기가 작아지므로 공간의 효율성을 극대화할 수 있다는 장점이 있다.Since the continuous plating apparatus according to an embodiment of the present invention forms a plating layer while partially spraying a plating solution on a desired portion by a nozzle spray type, plating can be easily performed with a smaller amount of plating liquid, and the overall equipment is provided. Since the size of is smaller, the efficiency of the space can be maximized.
또한, 본 발명에 의한 연속 도금 장치는, 다량으로 발생하는 수소 취성에 의한 피트도 예방 할 수 있어, 종전의 기술에 비해 높은 전류가 인가 가능하여 보다 짧은 시간에 높은 도금 효율을 나타낼 수 있는 장점이 있다.In addition, the continuous plating apparatus according to the present invention can also prevent the pit due to hydrogen embrittlement generated in a large amount, it is possible to apply a high current compared to the prior art, it is possible to exhibit a high plating efficiency in a shorter time have.
또한, 본 발명에 의한 연속 도금 장치는, 격벽을 배치함으로서 불필요하게 도금액이 음극롤러에 직접 접촉되는 것을 최소화하여 전류 손실을 감소할 수 있는 장점이 있다.In addition, the continuous plating apparatus according to the present invention has an advantage of minimizing unnecessary contact of the plating liquid directly with the cathode roller by disposing the partition wall, thereby reducing current loss.
또한, 본 발명에 의한 연속 도금 장치는, 노즐 간격이 필요에 따라 조절가능하기 때문에 원하는 조건을 설정하여 도금작업을 진행할 수 있다는 장점이 있다.In addition, the continuous plating apparatus according to the present invention has an advantage in that the plating can be performed by setting desired conditions because the nozzle spacing can be adjusted as necessary.
또한, 본 발명에 의한 연속 도금 장치는, 장력부여롤러를 이용하여 피도금체의 장력을 조절할 수 있으므로 양호한 구동을 가능하게 하고 피도금체와 음극롤러 간의 접점이 적정한 정도로 형성될 수 있게 하는 장점이 있다.In addition, the continuous plating apparatus according to the present invention can control the tension of the plated body by using a tensioning roller, so that it is possible to perform a good driving and the contact point between the plated body and the cathode roller can be formed to an appropriate degree. have.
이러한 본 발명에 따른 연속 노즐 장치는 이에 한정되는 것은 아니며 다양한 형태로 변형되는 것도 가능하며 이러한 변형의 범위는 특허청구범위에서 합리적으로 해석되는 범위까지에 이른다.The continuous nozzle apparatus according to the present invention is not limited thereto, and may be modified in various forms, and the scope of such modifications ranges from the claims to the reasonable interpretation.

Claims (9)

  1. 프레임;frame;
    일정한 폭을 가지면서 일방향으로 연장되는 피도금체를 감아걸고 있으며 회전수단에 의하여 동력을 전달받아 회전하고 상기 프레임에 설치되는 구동롤러;A driving roller wound around the plated body extending in one direction while having a predetermined width and being rotated by receiving power by a rotating means;
    상기 프레임에 설치되고, 상기 구동롤러와 이격되어 배치되며 상기 피도금체가 감아걸리는 종동롤러;A driven roller installed on the frame, spaced apart from the driving roller, and wound around the plated body;
    상기 프레임에 설치되되, 상기 구동롤러와 종동롤러의 사이로서 상기 피도금체가 이동하는 이동경로 상에 배치되며 상기 피도금체와 접촉하여 상기 피도금체에 음극 전기를 대전시키는 음극롤러; 및A negative electrode roller installed on the frame and disposed between the driving roller and the driven roller on a moving path through which the plated body moves and contacting the plated body to charge cathode electricity to the plated body; And
    상기 프레임에 설치되되, 상기 음극롤러와 상기 피도금체의 접촉부분에 양극 이온을 포함하는 도금액을 분사하는 양극 노즐부;을 포함하는 것을 특징으로 하는 연속 도금 장치.And an anode nozzle unit installed in the frame and for injecting a plating liquid containing anode ions into a contact portion between the cathode roller and the plated body.
  2. 제1항에 있어서,The method of claim 1,
    상기 양극 노즐부는, The anode nozzle unit,
    도금액이 채워지는 도금액 수용공간과, 상기 도금액 수용공간과 외부를 연통시키며 상기 피도금체의 폭방향을 따라서 연장되는 슬롯을 포함하는 것을 특징으로 하는 연속 도금 장치.And a slot extending in the width direction of the plated body, the plating liquid containing space filled with a plating liquid, and the plating liquid containing space communicating with the outside.
  3. 제2항에 있어서,The method of claim 2,
    상기 도금액 수용공간에는 외부에서 양극전기를 공급받아 도금액 내에 양극 이온을 생성시키는 내산성 금속체가 배치되는 것을 특징으로 하는 연속 도금 장치.And the acid resistant metal body disposed in the plating liquid receiving space to generate anode ions in the plating liquid.
  4. 제2항에 있어서,The method of claim 2,
    상기 양극 노즐부는, The anode nozzle unit,
    상기 음극롤과 상기 피도금체의 접촉부분으로부터 상기 슬롯간의 거리가 변경될 수 있도록 하는 노즐 간격 조절부재가 배치되는 것을 특징으로 하는 연속 도금 장치.And a nozzle gap adjusting member arranged so that the distance between the slot from the contact portion of the cathode roll and the plated body can be changed.
  5. 제4항에 있어서,The method of claim 4, wherein
    상기 노즐 간격 조절부재는, The nozzle spacing member,
    양극 노즐부에서 상기 프레임과 접촉되는 부분에 형성되며 일방향으로 길게 연장되는 장공; 및A long hole formed in a part of the anode nozzle part in contact with the frame and extending in one direction; And
    상기 장공을 따라서 일방향으로 이동가능하되, 상기 장공을 통과하면서 상기 양극 노즐부와 상기 프레임에 결합되는 고정부재를 포함하는 것을 특징으로 하는 연속 도금 장치.A movable plating apparatus comprising: a fixing member which is movable in one direction along the long hole and is coupled to the anode nozzle part and the frame while passing through the long hole.
  6. 제1항에 있어서,The method of claim 1,
    상기 음극롤러가 접촉하는 피도금체의 반대편 면에 접촉되도록 배치되되 음극롤러와 지그재그 형태로 교차 배열되는 한 쌍의 장력유지롤러를 포함하되,It includes a pair of tension maintaining rollers disposed so as to be in contact with the opposite side of the plated body in contact with the negative electrode rollers are arranged in a cross-zigzag form with the negative electrode roller,
    상기 장력유지롤러는, 상기 음극롤러와 접촉하는 피도금체가 일정한 곡률반경을 가지는 곡면형상이 될 수 있도록 배치되는 것을 특징으로 하는 연속 도금 장치.The tension holding roller is a continuous plating apparatus, characterized in that the plated body in contact with the cathode roller is arranged so that the curved shape having a constant radius of curvature.
  7. 제1항에 있어서, The method of claim 1,
    상기 음극롤러와 상기 양극 노즐부의 사이에는 상기 양극 노즐부로부터 분사되는 도금액이 음극롤러와 직접적으로 접촉하는 것을 방지하고 상기 음극롤러와 피도금체의 접촉부분에 접촉하도록 안내하는 격벽이 배치되는 것을 특징으로 하는 연속 도금 장치.A partition wall is disposed between the cathode roller and the anode nozzle part to prevent the plating liquid sprayed from the anode nozzle part from directly contacting the cathode roller and to contact the contact portion between the cathode roller and the plated body. Continuous plating apparatus made with.
  8. 제1항에 있어서,The method of claim 1,
    상기 종동롤러와 상기 구동롤러의 사이에는 피도금체를 눌러 접촉함으로서 피도금체에 장력을 부여하는 장력부여롤러가 배치되는 것을 특징으로 하는 연속 도금 장치.And a tensioning roller for tensioning the plated body by pressing the plated body and contacting the driven roller with the driven roller.
  9. 제8항에 있어서,The method of claim 8,
    상기 장력부여롤러는, 상기 접촉되는 피도금체의 곡률반경이 증가하거나 감소되도록 위치조절됨으로서 장력을 변화가능하게 하는 위치조정수단이 배치되는 것을 특징으로 하는 연속 도금 장치.The tensioning roller is a continuous plating apparatus, characterized in that the positioning means for varying the tension is arranged by being positioned so that the radius of curvature of the plated body to be contacted increases or decreases.
PCT/KR2013/004051 2012-05-10 2013-05-09 Continuous plating apparatus WO2013169015A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201380023789.6A CN104271814B (en) 2012-05-10 2013-05-09 Continuous electroplating apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2012-0049803 2012-05-10
KR1020120049803A KR101441532B1 (en) 2012-05-10 2012-05-10 Continuous plating apparatus

Publications (1)

Publication Number Publication Date
WO2013169015A1 true WO2013169015A1 (en) 2013-11-14

Family

ID=49550979

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2013/004051 WO2013169015A1 (en) 2012-05-10 2013-05-09 Continuous plating apparatus

Country Status (4)

Country Link
KR (1) KR101441532B1 (en)
CN (1) CN104271814B (en)
TW (1) TWI486489B (en)
WO (1) WO2013169015A1 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107761144A (en) * 2017-11-03 2018-03-06 宁波康强电子股份有限公司 A kind of continuous electroplating apparatus of band cup LED lead frame
CN111465194A (en) * 2019-01-21 2020-07-28 (株)太星 Reverse coating prevention device for cathode roller in horizontal coating production line of printed circuit board
CN114808090A (en) * 2022-06-10 2022-07-29 江西勇骏实业有限公司 Tin plating equipment with copper plate and double plating units for production of electric equipment
CN115787038A (en) * 2023-01-05 2023-03-14 昆山元天电子有限公司 Novel fluid spraying equipment and process thereof

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20140094061A (en) * 2013-01-16 2014-07-30 주식회사 잉크테크 Continuous plating apparatus and continuous plating method
KR101594840B1 (en) * 2013-11-22 2016-02-26 한국생산기술연구원 The method of manufacturing superconducting and electroplating superconducting for enhanced thickness uniformity and electroplating device using the same
KR101575068B1 (en) * 2014-09-16 2015-12-07 주식회사 호진플라텍 Plating equipment for solar cell substrate using light-induced plating and forward bias plating jointly
KR101593887B1 (en) * 2015-10-23 2016-02-12 선호경 Spraying apparatus for plating solution on printed circuit board
KR102288006B1 (en) * 2020-02-07 2021-08-09 주식회사 포스코 Pre-wetting apparatus of LCC-H electroplating line
KR102363541B1 (en) * 2021-08-23 2022-02-16 (주)아이케이텍 Positioning control device for plating
KR102387315B1 (en) * 2021-10-01 2022-04-15 (주)태성이에스 Plating jig apparatus that moves up and down

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06212492A (en) * 1993-01-12 1994-08-02 Nkk Corp Continuous electroplating device
US5658441A (en) * 1995-12-18 1997-08-19 Cfc, Inc. Conveyorized spray plating machine
JP2005029820A (en) * 2003-07-09 2005-02-03 Toshiba Corp Plating method, method of producing semiconductor device, and plating device
KR20080079963A (en) * 2007-02-28 2008-09-02 삼성테크윈 주식회사 Apparatus for plating continuous
KR20100065814A (en) * 2008-12-09 2010-06-17 임명규 Barrel plating apparatus

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU525633B2 (en) * 1980-03-07 1982-11-18 Nippon Steel Corporation Metal strip treated by moving electrolyte
JPS6096797A (en) * 1983-10-31 1985-05-30 Nippon Steel Corp Method for preventing adhesion of plating metal to electroplating current supply roll
FR2653787B1 (en) * 1989-10-27 1992-02-14 Lorraine Laminage INSTALLATION AND METHOD FOR ELECTROLYTIC COATING OF A METAL STRIP.
JPH06228791A (en) * 1992-12-07 1994-08-16 Ebara Yuujiraito Kk Electroplating device
US5510171A (en) * 1995-01-19 1996-04-23 Minnesota Mining And Manufacturing Company Durable security laminate with hologram
JPH10183391A (en) * 1996-12-19 1998-07-14 Dainippon Printing Co Ltd Plating method and apparatus therefor
IT1298150B1 (en) * 1998-01-19 1999-12-20 Occleppo Di Francesco Occleppo DEVICE FOR ELECTROLYTIC DEPOSITION ON TRANSLATING METALLIC SHEETS IN SPECIES FOR PRINTED CIRCUITS, BY CLOSING A
JP4156086B2 (en) * 1998-08-07 2008-09-24 大日本印刷株式会社 Electrodeposition processing equipment
US6589413B2 (en) * 2001-08-09 2003-07-08 Gould Electronics Inc. Method of making a copper on INVAR® composite
CN1788324A (en) * 2003-05-12 2006-06-14 日本油漆株式会社 Method of coating a square wire and an insulated wire of a square wire
JP4586423B2 (en) * 2004-02-27 2010-11-24 Jfeスチール株式会社 Method for producing electroplated steel sheet
KR100647805B1 (en) * 2005-05-06 2006-11-23 (주) 에스엠씨 Continuous horizontal plating line with roller type cathodes
JP4694282B2 (en) * 2005-06-23 2011-06-08 富士フイルム株式会社 Apparatus and method for producing film with plating film
KR100748791B1 (en) * 2006-01-25 2007-08-13 엘에스전선 주식회사 Apparatus for perpendicular type coating and method thereof
KR100748793B1 (en) * 2006-01-25 2007-08-13 엘에스전선 주식회사 Apparatus for rapid metal coating and Method thereof
KR100776180B1 (en) * 2006-08-07 2007-11-16 주식회사 잉크테크 Manufacturing methods for metal clad laminates
KR100842043B1 (en) * 2006-12-15 2008-06-30 엘지전자 주식회사 A Process System For Organic-Inorganic Hybriultra Thin Film
CN101985767A (en) * 2010-11-29 2011-03-16 奥特斯维能源(太仓)有限公司 Plating bath capable of realizing different deposition rates
CN102220621B (en) * 2011-06-08 2013-04-17 太原西科纳米技术有限公司 Method for continuously forming silicon carbide coating on surfaces of carbon fibers

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06212492A (en) * 1993-01-12 1994-08-02 Nkk Corp Continuous electroplating device
US5658441A (en) * 1995-12-18 1997-08-19 Cfc, Inc. Conveyorized spray plating machine
JP2005029820A (en) * 2003-07-09 2005-02-03 Toshiba Corp Plating method, method of producing semiconductor device, and plating device
KR20080079963A (en) * 2007-02-28 2008-09-02 삼성테크윈 주식회사 Apparatus for plating continuous
KR20100065814A (en) * 2008-12-09 2010-06-17 임명규 Barrel plating apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107761144A (en) * 2017-11-03 2018-03-06 宁波康强电子股份有限公司 A kind of continuous electroplating apparatus of band cup LED lead frame
CN111465194A (en) * 2019-01-21 2020-07-28 (株)太星 Reverse coating prevention device for cathode roller in horizontal coating production line of printed circuit board
CN111465194B (en) * 2019-01-21 2023-04-28 (株)太星 Reverse coating preventing device for cathode roller in horizontal coating production line of printed circuit board
CN114808090A (en) * 2022-06-10 2022-07-29 江西勇骏实业有限公司 Tin plating equipment with copper plate and double plating units for production of electric equipment
CN115787038A (en) * 2023-01-05 2023-03-14 昆山元天电子有限公司 Novel fluid spraying equipment and process thereof

Also Published As

Publication number Publication date
CN104271814B (en) 2016-12-14
KR101441532B1 (en) 2014-09-17
KR20130126050A (en) 2013-11-20
TWI486489B (en) 2015-06-01
TW201404947A (en) 2014-02-01
CN104271814A (en) 2015-01-07

Similar Documents

Publication Publication Date Title
WO2013169015A1 (en) Continuous plating apparatus
RU2420616C2 (en) Device and procedure for electro-plating
CA2287274A1 (en) Apparatus for electrolytically treating printed circuit boards and conductor foils
US6176995B1 (en) Method and apparatus for electrolytically metallizing or etching material
US7767065B2 (en) Device and method for electrolytically treating an at least superficially electrically conducting work piece
CA1200528A (en) Apparatus and method of treating tabs of printed circuit boards and the like
CN1969065B (en) Device and method for electrolytically treating flat work pieces
KR20100109158A (en) A plating apparatus and plating system having the same
KR20140094061A (en) Continuous plating apparatus and continuous plating method
KR101493852B1 (en) Apparatus for coating of strip
CN116516450A (en) Contactless horizontal electroplating equipment
KR20070077870A (en) Apparatus for perpendicular type coating and method thereof
CN213295539U (en) Electroplating device for realizing single-side electroplating or deplating of steel strip
WO2016093460A1 (en) Edge mask of horizontal cell electroplating apparatus and horizontal cell electroplating apparatus comprising same
JP2008174827A (en) Guide device used for electroplating treatment system
KR20210010159A (en) Plating apparatus
KR100748793B1 (en) Apparatus for rapid metal coating and Method thereof
CN220665497U (en) Electroplating carrier and equipment
WO2016003111A1 (en) Plating device for solar cell substrate, using both electroplating and light induced plating
CN100439570C (en) Conveyorized plating line and method for electrolytically metal plating a workpiece
CN220265906U (en) Steel cord centralized control electroplating equipment
KR20000059567A (en) An apparatus and method for uniform coating of flexible board
CN114914032B (en) Enamelled iron wire production process
CN215163257U (en) Water retaining module
KR101627789B1 (en) Continuous plating apparatus and continuous plating method

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 13788422

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 13788422

Country of ref document: EP

Kind code of ref document: A1